An air intake chamber and exhaust gas treatment device

Abstract

This invention discloses an air intake chamber and an exhaust gas treatment device, belonging to the field of exhaust gas treatment technology, to solve the problem in existing technologies where dust particles in the recirculating airflow easily adhere to the air intake pipe, causing blockage. The air intake chamber includes a cavity, an air intake pipe, a continuous purging pipe, and a pulse purging unit. The air intake pipe communicates with the internal space of the cavity, and the outlets of the continuous purging pipe and the pulse purging unit are located on the side wall of the air intake pipe. This invention can be used for exhaust gas treatment.

Description

Technical Field

[0001] This invention belongs to the field of exhaust gas treatment technology, and specifically relates to an air intake chamber and an exhaust gas treatment device. Background Technology

[0002] With the continuous iteration of related industrial technologies, the processing technology for large-volume silicon-containing gases, such as silane, dichlorodihydrosilane, and TEOS, needs to be improved. These gases react with oxygen at high temperatures to generate solid dust particles.

[0003] Process exhaust gas enters the intake chamber through the intake pipe. Due to the slow airflow speed, backflow is likely to occur in the intake chamber. Dust particles in the backflow airflow are easy to adhere to the inside of the intake pipe, causing blockage. It is necessary to clean and maintain the intake pipe frequently. Summary of the Invention

[0004] Based on the above analysis, the present invention aims to provide an air intake chamber and an exhaust gas treatment device to solve the problem in the prior art where dust particles in the recirculating airflow easily adhere to the air intake pipe, causing blockage of the air intake pipe.

[0005] The objective of this invention is mainly achieved through the following technical solutions.

[0006] The present invention provides an air intake chamber, including a chamber body, an air intake pipe, a continuous purge pipe and a pulse purge unit. The air intake pipe is connected to the internal space of the chamber body, and the air outlets of the continuous purge pipe and the pulse purge unit are located on the side wall of the air intake pipe.

[0007] Furthermore, the intake pipe includes a vertical pipe section, a curved pipe section, and a horizontal pipe section connected sequentially along the exhaust gas flow direction. The intake port of the vertical pipe section is connected to the exhaust gas discharge port of the exhaust gas treatment device, and the outlet of the horizontal pipe section is connected to the internal space of the cavity.

[0008] Furthermore, the outlets of both the continuous purging pipe and the pulse purging unit are located on the bend section and face the direction of the horizontal pipe section.

[0009] Furthermore, the inner diameter of the continuous purge tube and the pulse purge unit is 5–8 mm.

[0010] Furthermore, the outlet of the continuous purge tube is located above the pulse purge unit.

[0011] Furthermore, the continuous purging tube is coaxially arranged with the transverse section; the pulse purging unit is parallel to the axis of the transverse section and close to the bottom wall of the curved section.

[0012] Furthermore, the pulse purging unit includes a tube body and a pulse solenoid valve for controlling the opening and closing of the air passage of the tube body. The pulse solenoid valve is located inside the tube body and intermittently controls the opening of the air passage.

[0013] Furthermore, the aforementioned air intake chamber also includes a pressure sensor and a controller for detecting the gas pressure inside the air intake pipe;

[0014] The controller is connected to both the pulse solenoid valve and the pressure sensor.

[0015] The pressure sensor detects the gas pressure data in the intake pipe in real time and transmits it to the controller. The controller determines whether the gas pressure data exceeds the pressure threshold. If it does, the controller sends a pulse opening signal to the pulse solenoid valve. The pulse solenoid valve controls the air circuit to open and blow away the dust particles accumulated in the intake pipe.

[0016] Furthermore, the aforementioned air intake chamber also includes a nitrogen swirl flange located at the top of the chamber; an airflow annular channel is formed on the nitrogen swirl flange, an air intake hole is formed on the outer wall of the airflow annular channel, an air outlet hole is formed on the inner wall of the airflow annular channel, and the air outlet hole is inclined relative to the radial direction of the nitrogen swirl flange.

[0017] The present invention also provides an exhaust gas treatment device, including a reaction chamber and the above-mentioned air inlet chamber, wherein the air outlet of the chamber is connected to the reaction chamber.

[0018] Compared with the prior art, the present invention can achieve at least one of the following beneficial effects.

[0019] A) The air intake chamber provided by this invention simultaneously provides a continuous purging pipe and a pulse purging unit in the air intake pipe. On the one hand, the continuous purging pipe can continuously supply nitrogen gas into the air intake pipe, driving the exhaust gas flow in the air intake pipe, preventing the formation of flow dead zones, and reducing the accumulation of dust particles. On the other hand, the pulse purging unit can be intermittently opened according to the deposition of dust particles in the air intake pipe. When dust particles accumulate in the air intake pipe, high-pressure nitrogen can be supplied into the air intake pipe, thereby solving the problem that dust particles in the return airflow are easily adhered to the air intake pipe, causing blockage of the air intake pipe, extending the cleaning and maintenance cycle of the exhaust gas treatment equipment, reducing the cleaning, maintenance and upkeep costs of the exhaust gas treatment equipment, and helping to improve production efficiency and reduce production costs.

[0020] B) The air inlet chamber provided by the present invention has a nitrogen swirl flange at the top of the chamber. On the one hand, nitrogen is supplied to the top of the chamber through the nitrogen swirl flange, which increases the gas pressure in the top space of the chamber. Basically, no flow dead zone is generated in the top space of the chamber, thereby reducing the backflow of dust particles generated in the reaction chamber. On the other hand, since the nitrogen swirl flange can generate a spiral flow of nitrogen, it can properly flush the inner wall of the chamber, accelerate the flow of dust particles, and thus reduce the deposition of dust particles on the inner wall of the chamber.

[0021] In this invention, the above-described technical solutions can be combined with each other to achieve more preferred combinations. Other features and advantages of this invention will be set forth in the following description, and some advantages may become apparent from the description or be learned by practicing the invention. The objects and other advantages of this invention can be realized and obtained through the embodiments described and the accompanying drawings, which are particularly pointed out. Attached Figure Description

[0022] The accompanying drawings are for illustrative purposes only and are not intended to limit the invention. Throughout the drawings, the same reference numerals denote the same parts.

[0023] Figure 1 This is a schematic diagram of the air intake chamber provided in Embodiment 1 of the present invention;

[0024] Figure 2 for Figure 1 AA section view;

[0025] Figure 3 This is a top view of the air intake chamber provided in Embodiment 1 of the present invention;

[0026] Figure 4 This is a three-dimensional schematic diagram of the nitrogen swirl flange in the air intake chamber provided in Embodiment 1 of the present invention;

[0027] Figure 5 This is a radial cross-sectional view of the nitrogen swirl flange in the air intake chamber provided in Embodiment 1 of the present invention;

[0028] Figure 6 This is a schematic diagram of the exhaust gas treatment device provided in Embodiment 2 of the present invention;

[0029] Figure 7 This is a schematic diagram of the DC flange in the exhaust gas treatment device provided in Embodiment 2 of the present invention;

[0030] Figure 8 for Figure 7 Enlarged view of part A;

[0031] Figure 9 This is a schematic diagram of the cyclone dehumidifier in the exhaust gas treatment device provided in Embodiment 2 of the present invention;

[0032] Figure 10 This is a schematic diagram of the first type of cooperation between the adjusting protrusion, the second arc-shaped through hole, and the blade in the exhaust gas treatment device provided in Embodiment 2 of the present invention, wherein the blade is in a horizontal state;

[0033] Figure 11 This is a schematic diagram of a second type of cooperation between the adjusting protrusion, the second arc-shaped through hole, and the blade in the exhaust gas treatment device provided in Embodiment 2 of the present invention, wherein the blade is in an inclined state.

[0034] Figure label:

[0035] 10-DC flange; 11-Gas storage ring cavity; 11a-First cavity section; 11b-Slit; 11c-Second cavity section; 12-Inlet port; 121-Counterhead; 13-DC loop; 14-Boss; 15-First flange; 20-Reaction chamber; 30-Pressure sensor; 40-Swirl vane; 41-Outer ring; 42-Center column; 43-Blade; 50-Adjusting protrusion; 60-Second arc-shaped through hole; 70-Second ball joint structure; 80-Nitrogen swirl flange; 90-Airflow loop; 100-Connecting pipe; 110-Cavity; 120-Inlet pipe; 121-Vertical pipe section; 122-Bend pipe section; 123-Horizontal pipe section; 130-Continuous purging pipe; 140-Pulse purging unit. Detailed Implementation

[0036] The preferred embodiments of the present invention will now be described in detail with reference to the accompanying drawings, which constitute a part of the present invention and are used together with the embodiments of the present invention to illustrate the principles of the present invention, but are not intended to limit the scope of the present invention.

[0037] Example 1

[0038] This embodiment provides an air intake chamber, see [link / reference] Figures 1 to 3 It includes a cavity 110, an air inlet pipe 120, a continuous purge pipe 130, and a pulse purge unit 140. The air inlet pipe 120 is connected to the internal space of the cavity 110, and the air outlets of the continuous purge pipe 130 and the pulse purge unit 140 are located on the side wall of the air inlet pipe 120.

[0039] Compared with the prior art, the air intake chamber provided in this embodiment is equipped with both a continuous purging pipe 130 and a pulse purging unit 140 in the air intake pipe 120. On the one hand, the continuous purging pipe 130 can continuously supply nitrogen gas into the air intake pipe 120, driving the exhaust gas flow in the air intake pipe 120, preventing the formation of flow dead zones, and reducing the accumulation of dust particles. On the other hand, the pulse purging unit 140 can be intermittently opened according to the dust particle deposition in the air intake pipe 120. When dust particles accumulate in the air intake pipe 120, high-pressure nitrogen gas can be supplied into the air intake pipe 120, thereby solving the problem that dust particles in the return airflow are easily adhered to the air intake pipe 120, causing blockage of the air intake pipe 120, extending the cleaning and maintenance cycle of the exhaust gas treatment equipment, reducing the cleaning, maintenance and upkeep costs of the exhaust gas treatment equipment, and helping to improve production efficiency and reduce production costs.

[0040] To facilitate pipeline layout and exhaust gas flow, the structure of the intake pipe 120 specifically includes a vertical pipe section 121, a curved pipe section 122, and a horizontal pipe section 123 connected sequentially along the exhaust gas flow direction. The air inlet of the vertical pipe section 121 is connected to the exhaust gas discharge port of the exhaust gas treatment device, and the air outlet of the horizontal pipe section 123 is connected to the internal space of the cavity 110.

[0041] Considering that dust particles typically accumulate at the bend in the pipe section 122, the outlets of both the continuous purging pipe 130 and the pulse purging unit 140 are located on the bend in the pipe section 122, facing the horizontal pipe section 123. This allows the dust particles accumulated at the bend in the pipe section 122 to be blown back into the intake chamber and then fall into the reaction chamber below, thereby reducing the likelihood of blockage in the intake pipe 120.

[0042] In order to provide a sufficient amount of nitrogen purging and nitrogen pulse, the inner diameter of the continuous purging tube 130 and the pulse purging unit 140 is 5 to 8 mm.

[0043] It is worth noting that the continuous purge pipe 130 is mainly used to drive the flow of exhaust gas in the intake pipe 120, and the pulse purge unit 140 is used to blow the accumulated dust particles back into the reaction chamber. Therefore, the outlet of the continuous purge pipe 130 is located above the pulse purge unit 140, and the continuous purge pipe 130 is coaxially arranged with the transverse section. The pulse purge unit 140 is parallel to the axis of the transverse section and close to the bottom wall of the curved section. In this way, on the one hand, the continuous purge pipe 130 can uniformly and continuously supply nitrogen gas into the intake pipe 120, reducing the generation of eddy dead zones; on the other hand, the pulse purge unit 140 can concentrate the air pressure to blow the dust particles accumulated on the bottom wall of the intake pipe 120. In addition, setting the pulse purge unit 140 close to the bottom wall of the curved section can also minimize the disturbance of exhaust gas in the intake pipe 120 and reduce the flow resistance of exhaust gas.

[0044] In order to achieve pulse purging, the structure of the pulse purging unit specifically includes a tube body and a pulse solenoid valve for controlling the opening and closing of the air passage of the tube body. The pulse solenoid valve is located in the tube body and controls the opening of the air passage intermittently (e.g., every 2 to 3 minutes). Each time it is opened, the gas in the tube body will quickly enter the air inlet pipe 120, thereby forming a high-pressure nitrogen pulse airflow.

[0045] In order to automatically determine the opening timing of the pulse purging unit 140, the above-mentioned air intake chamber also includes a pressure sensor 30 and a controller for detecting the gas pressure in the air intake pipe 120. The controller is connected to the pulse solenoid valve and the pressure sensor 30 respectively. For example, the pressure sensor 30 is located on the side wall of the vertical pipe section 121. During the operation of the exhaust gas treatment equipment, the pressure sensor 30 detects the gas pressure data in the air intake pipe 120 in real time and transmits it to the controller. The controller determines whether the gas pressure data exceeds the pressure threshold. If it exceeds the pressure threshold, the controller sends a pulse opening signal to the pulse solenoid valve. The pulse solenoid valve controls the air path to open and blow the dust particles accumulated in the air intake pipe 120.

[0046] It is worth noting that when the flow rate of silicon-containing gas in the process is large, a large amount of dust particles will be generated in a short period of time. When the process exhaust gas enters the inlet chamber, since the top of the inlet chamber is usually a closed structure, the airflow will flow directly to the opening at the bottom of the inlet chamber and enter the reaction chamber, resulting in a flow dead zone at the top of the inlet chamber. Once the dust particles generated in the reaction chamber flow back, they are very likely to adhere to the wall surface at the top of the inlet chamber and gradually accumulate, eventually causing blockage of the inlet chamber. Therefore, the aforementioned inlet chamber includes a nitrogen swirl flange 80 located at the top of the chamber, see [reference]. Figures 4 to 5 An airflow annular channel 90 is formed on the nitrogen cyclone flange 80. An inlet is formed on the outer wall of the airflow annular channel 90, and an outlet is formed on the inner wall of the airflow annular channel 90. The outlet direction is inclined relative to the radial direction of the nitrogen cyclone flange 80, while the inlet direction is radially aligned with the nitrogen cyclone flange 80. Thus, by placing the nitrogen cyclone flange 80 at the top of the cavity, nitrogen is supplied to the top of the cavity, increasing the gas pressure in the top space and virtually eliminating dead zones in the top space. This reduces the backflow of dust particles generated within the reaction chamber. Furthermore, the nitrogen cyclone flange 80 generates a spiral flow of nitrogen gas, which effectively flushes the inner wall of the cavity, accelerating the flow of dust particles and reducing their deposition on the inner wall.

[0047] From the perspective of uniform gas supply, the number of air inlets and outlets is multiple. Multiple air inlets are evenly arranged circumferentially along the nitrogen swirl flange 80, and multiple air outlets are also evenly arranged circumferentially along the nitrogen swirl flange 80. For example, the number of air inlets and outlets is 2 to 8. Figure 4 and Figure 5 The diagram shows that there are four air inlets and four air outlets.

[0048] In order to supply high-pressure nitrogen gas to the central area at the top of the cavity as much as possible, the angle between the outlet direction of the gas outlet and the radial direction of the nitrogen flange is 60-120°.

[0049] Similarly, in order to supply high-pressure nitrogen gas to the central area at the top of the cavity as much as possible, the cavity, nitrogen swirl flange 80 and gas flow ring 90 are coaxially arranged.

[0050] It is understandable that, in order to facilitate the connection between the air outlet and the nitrogen supply unit, the air inlet chamber also includes a connecting pipe 100. The air outlet is connected to the nitrogen supply unit through the connecting pipe 100, and the connecting pipe 100 corresponds to the air outlet one by one.

[0051] Considering that the diameter of the vent is different from the diameter of the vent end of the nitrogen supply unit, the structure of the connecting pipe 100 specifically includes a first straight pipe section, a transition section and a second straight pipe section arranged sequentially along the nitrogen flow direction, wherein the diameter of the first straight pipe section is larger than the diameter of the second straight pipe section.

[0052] Example 2

[0053] This embodiment provides an exhaust gas treatment device, see [link / reference] Figure 6 It includes a reaction chamber 20 and an air inlet chamber provided in Embodiment 1, with the air outlet of the chamber connected to the reaction chamber.

[0054] Compared with the prior art, the beneficial effects of the exhaust gas treatment device provided in this embodiment are basically the same as those of the air intake chamber provided in Embodiment 1, and will not be described in detail here.

[0055] In order to supply reaction gas into the reaction chamber 20, the above-mentioned exhaust gas treatment device also includes a DC flange 10 disposed between the chamber body and the reaction chamber 20. The chamber body is connected to the reaction chamber 20 through the DC flange. The DC flange 10 has an annular gas storage ring cavity 11, and an air inlet 12 communicating with the gas storage ring cavity 11 is opened on the outer circumferential surface of the DC flange 10. See [reference needed] Figures 7 to 8 The gas storage ring cavity 11 is connected to the gas supply device through the air inlet 12, which can provide compressed dry air to the DC flange 10. The gas storage ring cavity 11 is connected to the reaction chamber 20 through the DC loop 13. Along the direction of the exhaust gas flow in the reaction chamber 20, the DC loop 13 is inclined towards the central axis of the DC flange 10. For example, the direction of the exhaust gas flow in the reaction chamber 20 is vertically downward. The outlet direction of the air inlet 12 is along the radial direction of the DC flange 10, and the projection of the outlet direction of the DC loop 13 in the radial plane of the DC flange 10 is along the radial direction of the DC flange 10, so that the reaction gas entering the reaction chamber 20 does not swirl.

[0056] When the gas supply equipment provides the reaction gas, the reaction gas first enters the gas storage ring cavity 11 through the air inlet 12. Since the volume of the gas storage ring cavity 11 is much larger than the volume of the air inlet 12, the reaction gas can be dispersed and homogenized in the entire circumference of the gas storage ring cavity 11. Then, it enters the reaction cavity 20 evenly through the DC loop 13. Most of the reaction gas reacts with the main flow of tail gas in the reaction cavity 20 in the middle area of ​​the reaction cavity 20, thereby achieving the effect of homogenized gas mixing and making the efficiency of harmless tail gas treatment higher.

[0057] With the DC flange having the above-mentioned structure, the projections of the outlet direction of the inlet 12 and the outlet direction of the DC loop 13 onto the radial plane of the DC flange 10 are both set along the radial direction of the DC flange 10. This allows the reaction gas to be directly supplied into the middle region of the reaction chamber 20 without generating swirling flow, and to be fully mixed and reacted with the tail gas to be treated in the middle region. This solves the problem that the oxidation reaction between the reaction gas and the tail gas mainly occurs on the inner wall of the reaction chamber, resulting in the accumulation of dust particles on the inner wall of the reaction chamber.

[0058] In order to avoid dust accumulation on components above the reaction chamber 20 (e.g., the air inlet chamber) or at the air inlet end of the reaction chamber 20, the aforementioned DC loop 13 is inclined downward along the direction of the reaction gas flow. Correspondingly, the flow direction of the reaction gas is also inclined downward, which is in sync with the direction of the main airflow of the exhaust gas of the reaction chamber 20. The reaction gas is less likely to flow back to the top of the reaction chamber 20, thereby minimizing the accumulation of dust on components above the reaction chamber 20 (e.g., the air inlet chamber) or at the air inlet end of the reaction chamber 20, which could block the corresponding parts.

[0059] In practical applications, the gas storage ring cavity 11 is formed by four walls, which include, in sequence, the wall where the air inlet 12 is located, the second wall, the first wall, and the third wall. See [reference needed]. Figure 8 The second wall surface is opposite to the third wall surface; the first wall surface is opposite to the wall surface where the air inlet 12 is located. An annular boss 14 is provided on the second wall surface, and along the direction from the air inlet 12 to the first wall surface, the boss 14 is approximately located in the middle of the air storage annular cavity 11. A slit 11b is formed between the boss 14 and the third wall surface. The presence of the boss 14 in the air storage annular cavity 11 essentially divides the air storage annular cavity 11 into three parts, sequentially including a first cavity section 11a, a slit 11b, and a second cavity section 11c along the direction from the first wall surface to the air inlet 12. (See [reference]). Figure 8 The reaction gas enters the second section 11c of the gas storage ring cavity 11 through the air inlet 12, then enters the first section 11a through the slit 11b, and then flows out from the direct current loop 13 to the middle region of the reaction cavity 20.

[0060] In practical applications, the reactant gas enters the second chamber 11c through the inlet 12. Since the boss 14 blocks the reactant gas, it can change the direction of the airflow, so the reactant gas undergoes pre-diffusion in the annular second chamber 11c. After buffering, the gas becomes more uniform, allowing it to diffuse throughout the entire annular second chamber 11c. Then, the reactant gas enters the first chamber 11a through the slit 11b. Since the height H1 of the slit 11b is small, it creates an acceleration effect. When the reactant gas enters the first chamber 11a, due to the increased volume, the reactant gas diffuses again in the first chamber 11a, making the reactant gas flowing out of the annular direct current channel 13 more uniform, which facilitates thorough mixing with the tail gas in the reaction chamber 20 to undergo an oxidation reaction.

[0061] For example, the height H1 of the slit 11b is less than half the height H2 of the gas storage ring cavity 11, and the ratio of the height H1 of the slit 11b to the height H2 of the gas storage ring cavity 11 is (1~2):5, optionally H1:H2 = 1:5. Specifically, H2 is 5mm~20mm, and H1 is 1mm~5mm. It should be noted that the height direction of the slit 11b and the height direction of the gas storage ring cavity 11 are both the axial direction of the DC flange 10.

[0062] To minimize disturbance when the reactant gas enters the DC loop 13, the reactant gas flows out of the DC loop 13 at a predetermined inclination angle to ensure thorough mixing with the tail gas in the reaction chamber 20. Along the direction of the tail gas flow in the reaction chamber 20, the first wall is inclined towards the central axis of the DC flange 10. The sidewall of the DC loop 13 is connected to the first wall, and the inclination angle of the DC loop 13 is the same as that of the first wall. When the reactant gas in the gas storage ring cavity 11 enters the gas storage ring cavity 11 through the inlet 12 and encounters the first wall, the inclined surface of the first wall guides the reactant gas to the DC loop 13. This reduces disturbance as the reactant gas enters the reaction chamber 20 from the DC loop 13, allowing for thorough mixing with the tail gas in the reaction chamber 20, which is beneficial for a uniform reaction.

[0063] To facilitate the formation of the DC loop 13, the lower end of the aforementioned DC flange 10 has a first flange 15 near its inner circumferential surface. The inner circumferential surface of the first flange 15 is coplanar with the inner circumferential surface of the DC flange 10. In other words, the first flange 15 is located within the reaction chamber 20, and the DC loop 13 is formed within the first flange 15. Thus, compared to a DC flange 10 without a flange, the first flange 15 increases the axial length of the DC loop 13, making the directionality of the reactant gas stronger and guiding it as far as possible to the central region of the reaction chamber 20. This results in a more uniform distribution of the reactant gas, allowing for a more complete reaction with the exhaust gas.

[0064] For example, the angle α between the outlet direction of the DC loop 13 and the central axis of the DC flange 10 is 10° to 60°. When α is in the range of 10° to 60°, the reaction gas can be guided to the middle region of the reaction chamber 20. When α is less than 10°, the reaction gas flowing out of the DC loop 13 tends to flow to the bottom of the reaction chamber 20 rather than the middle region of the reaction chamber 20, which will cause uneven mixing of the reaction gas and the tail gas, resulting in incomplete reaction. When α is greater than 60°, the reaction gas flowing out of the DC loop 13 tends to flow back to the cavity above the reaction chamber 20 or the inlet end of the reaction chamber 20.

[0065] Accordingly, the width W1 of the DC loop 13 is 3mm to 10mm, and the width of the DC loop 13 refers to the distance between the two opposing inner walls forming the annular DC loop 13. When W1 is 3mm to 10mm, on the one hand, the width of the DC loop 13 is less than the height of the gas storage ring cavity 11. For example, the height H2 of the gas storage ring cavity 11 is 5mm to 50mm. That is to say, when the reaction gas flows from the gas storage ring cavity 11 into the reaction chamber 20 through the DC loop 13, it will be accelerated, making it less likely for the reaction gas to flow back upward to the inlet end of the reaction chamber 20 or the air inlet cavity above the reaction chamber 20, thereby preventing dust blockage at the air inlet or the upper end of the reaction chamber 20.

[0066] Considering the ease of connection between the gas supply equipment and the DC flange 10, each air inlet 12 is provided with a countersunk hole 121 at the air inlet end, and the gas supply equipment pipeline is connected to the countersunk hole 121.

[0067] For example, the air inlet 12 of the DC flange 10 forms a detachable connection with the pipeline of the air supply equipment. Specifically, the connection between the countersunk hole 121 and the pipeline of the air supply equipment can be made in the following ways: the countersunk hole 121 has an internal thread, the pipeline of the air supply equipment is threaded to the countersunk hole 121, and the inner diameter of the pipeline of the air supply equipment is equal to or slightly larger than the inner diameter of the air inlet 12; or, the countersunk hole 121 and the pipeline of the air supply equipment are connected by a snap-fit.

[0068] Considering that the exhaust gas treated in the reaction chamber 20 contains dust particles and water vapor, these particles mix to form slurry when passing through the exhaust pipe of the exhaust gas treatment device, causing the exhaust pipe to easily become clogged. This necessitates frequent shutdowns for maintenance, affecting production efficiency. Therefore, the aforementioned exhaust gas treatment device also includes a cyclone dehumidifier, see [link to relevant documentation]. Figure 9The device includes a swirl vane 40, which is located at the exhaust pipe inlet of the exhaust gas treatment device. The swirl vane 40 includes an outer ring 41, a central column 42 located in the inner region of the outer ring 41, and a plurality of blades 43 located between the outer ring 41 and the central column 42. The first end of the blades 43 is connected to the outer ring 41, the second end of the blades 43 is connected to the central column 42, and the outer ring 41 is connected to the inner wall of the exhaust pipe. Because the cyclone dehumidifier is equipped with cyclone vanes 40, when the treated exhaust gas containing dust and droplets passes through the cyclone vanes 40, the movement direction of the droplets and dust particles will change, causing them to move in a spiral upward form. Under the action of centrifugal force, the droplets and dust particles, especially the larger droplets and dust particles, will gradually concentrate in the inner wall area of ​​the exhaust pipe. The concentrated droplets and dust gradually merge into larger droplets and dust particles, thereby achieving gas-liquid separation. This can reduce the dust and water vapor content in the exhaust gas, and reduce the occurrence of dust particles mixing with water vapor to form mud, which can easily clog the exhaust pipe.

[0069] To ensure the dehumidification swirl effect, the size of the swirl vane 40, the number and tilt angle of the blades 43, and the gas flow rate need to be comprehensively considered. For example, the outer diameter of the swirl vane 40 is 100-300 mm, the height of the swirl vane 40 is 30-100 mm, the number of blades 43 is 8-20, the tilt angle of the blades 43 relative to the radial plane is 45-75°, and the gas flow rate is 2-8 m / s.

[0070] Considering that the tilt angle of blade 43 relative to the radial plane affects the degree of swirl, in order to adjust the degree of swirl according to the actual exhaust gas conditions, the aforementioned swirl dehumidifier also includes an adjusting ring (not shown in the figure) and a cylindrical adjusting protrusion 50, see [reference]. Figures 10 to 11An adjusting ring is rotatably fitted onto the outer wall of the exhaust pipe. A first arc-shaped through hole (not shown in the figure) with the ball joint structure at the second end as the center is opened on the outer ring 41. A second arc-shaped through hole 60 with the ball joint structure at the second end as the center is opened on the side wall of the exhaust pipe or the side wall of the device connected to the exhaust pipe inlet. Both the first arc-shaped through hole and the second arc-shaped through hole 60 are arranged along the axial direction of the outer ring 41, and the first arc-shaped through hole and the second arc-shaped through hole coincide. The first end of the blade 43 is rotatably and fixedly connected to the outer ring 41 through the first ball joint structure. The second end of the blade 43 is rotatably and fixedly connected to the central column 42 through the second ball joint structure 70. One end of the adjusting protrusion 50 is fixedly connected to the second end of the blade 43. The other end of the adjusting protrusion 50 passes through the first arc-shaped through hole and the second arc-shaped through hole in sequence and is fixedly connected to the adjusting ring. This is because the swirl vane 40 is located on the inner wall of the exhaust pipe, making it impossible to directly adjust the angle of the blade 43. By using the adjustment ring, the adjustment protrusion 50, and the arc-shaped through hole, rotating the adjustment ring causes the adjustment protrusion 50 to move upward or downward along the first and second arc-shaped through holes. This changes the distance between the projection of the adjustment protrusion 50 and the ball joint structure at the second end in the radial plane, causing the blade 43 to rotate at a certain angle. Thus, the tilt angle of the blade 43 can be adjusted according to the actual exhaust gas conditions.

[0071] It should be noted that, due to the design of the adjustment ring, it can cover the second arc-shaped through hole 60, so there will basically be no exhaust gas leakage.

[0072] The above description is only a preferred embodiment of the present invention, but the scope of protection of the present invention is not limited thereto. Any changes or substitutions that can be easily conceived by those skilled in the art within the scope of the technology disclosed in the present invention should be included within the scope of protection of the present invention.

Claims

1. A tail gas treatment device, characterized in that, It includes a reaction chamber and an air inlet chamber; the air inlet chamber includes a cavity, an air inlet pipe, a continuous purge pipe and a pulse purge unit, the air outlet of the cavity is connected to the reaction chamber, the air inlet pipe is connected to the internal space of the cavity, and the air outlets of the continuous purge pipe and the pulse purge unit are located on the side wall of the air inlet pipe. The air inlet chamber also includes a nitrogen swirl flange located at the top of the chamber; an airflow channel is formed on the nitrogen swirl flange, an air inlet is formed on the outer wall of the airflow channel, an air outlet is formed on the inner wall of the airflow channel, and the air outlet direction is inclined relative to the radial direction of the nitrogen swirl flange. The exhaust gas treatment device also includes a DC flange disposed between the cavity and the reaction chamber. The cavity is connected to the reaction chamber through the DC flange. The DC flange has an annular gas storage ring cavity. An air inlet is formed on the outer circumferential surface of the DC flange, which communicates with the gas storage ring cavity. The gas storage ring cavity is connected to the reaction chamber through a DC loop. Along the direction of exhaust gas flow in the reaction chamber, the DC loop is inclined towards the central axis of the DC flange. The outlet direction of the air inlet is along the radial direction of the DC flange. The projection of the outlet direction of the DC loop in the radial plane of the DC flange is along the radial direction of the DC flange, so that the reaction gas entering the reaction chamber does not swirl.

2. The exhaust gas treatment device according to claim 1, characterized in that, The intake pipe includes a vertical pipe section, a curved pipe section, and a horizontal pipe section connected sequentially along the exhaust gas flow direction. The intake port of the vertical pipe section is connected to the exhaust gas discharge port of the exhaust gas treatment device, and the outlet of the horizontal pipe section is connected to the internal space of the cavity.

3. The exhaust gas treatment device according to claim 2, characterized in that, The air outlets of both the continuous purging tube and the pulse purging unit are located on the bend section and face the direction of the horizontal section.

4. The exhaust gas treatment device according to claim 2, characterized in that, The inner diameter of the continuous purge tube and the pulse purge unit is 5~8mm.

5. The exhaust gas treatment device according to claim 2, characterized in that, The outlet of the continuous purging tube is located above the pulse purging unit.

6. The exhaust gas treatment device according to claim 5, characterized in that, The continuous purge tube is coaxially arranged with the transverse section; And / or, the pulse purging unit is parallel to the axis of the transverse section and close to the bottom wall of the curved section.

7. The exhaust gas treatment device according to any one of claims 1 to 6, characterized in that, The pulse purging unit includes a tube body and a pulse solenoid valve for controlling the opening and closing of the air passage of the tube body. The pulse solenoid valve is located inside the tube body and intermittently controls the opening of the air passage.

8. The exhaust gas treatment device according to claim 7, characterized in that, It also includes a pressure sensor and controller for detecting the gas pressure inside the intake manifold; The controller is connected to the pulse solenoid valve and the pressure sensor respectively; The pressure sensor detects the gas pressure data in the intake pipe in real time and transmits it to the controller. The controller determines whether the gas pressure data exceeds the pressure threshold. If it exceeds the pressure threshold, the controller sends a pulse opening signal to the pulse solenoid valve. The pulse solenoid valve controls the air path to open and blow away the dust particles accumulated in the intake pipe.

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