Air inlet flange, exhaust gas treatment device

Abstract

The application provides an air inlet flange and a tail gas treatment device, and belongs to the technical field of tail gas treatment, to solve the technical problems of uneven air mixing and easy dust accumulation in the waste gas reaction chamber. The air inlet flange comprises a cavity with an annular shape in the inside, and along the outer circumferential surface of the flange, the flange has at least one through hole; the cavity is communicated with the air supply device through the at least one through hole, and the cavity is communicated to the reaction chamber through an air flow channel; the air flow channel is an annular channel, and along the direction of the tail gas flow in the reaction chamber, the air flow channel is inclined to the direction close to the central axis of the flange. The air inlet flange is used for introducing air into the reaction chamber for tail gas treatment. Through the design of the air inlet channel, the air and the tail gas can be fully mixed and uniform in the middle region of the reaction chamber, and at the same time, the air is not easy to flow back to the top region of the reaction chamber to form dust accumulation, so as to prevent the reaction chamber from being blocked and improve the tail gas treatment efficiency.

Description

Technical Field

[0001] This invention relates to the field of exhaust gas treatment technology, and in particular to an intake flange and an exhaust gas treatment device. Background Technology

[0002] Due to rapid socio-economic development, the semiconductor industry, including semiconductors, solar photovoltaics, flat panel displays, and LEDs, generates a large amount of exhaust gas during production. These exhaust gases are generally flammable, toxic, and have a high greenhouse effect. Improper handling can lead to serious safety accidents, significant economic losses, and serious threats to people and the environment. Therefore, these harmful gases must be rendered harmless before being released into the environment.

[0003] The harmless treatment method usually involves reacting the waste gas with oxygen in a reaction chamber. Some of the solid particles generated are captured by the spray tower, some of the water-soluble gases are absorbed by the spray tower, and the rest are discharged as harmless products.

[0004] In related technologies, the exhaust gas does not mix evenly with air during oxidation in the reaction chamber, and dust easily accumulates on the inner wall of the reaction chamber. Summary of the Invention

[0005] The purpose of this invention is to provide an inlet flange and an exhaust gas treatment device to solve the technical problems of uneven gas mixing and easy dust accumulation in the exhaust gas reaction chamber.

[0006] To achieve the above objectives, the present invention provides the following technical solution:

[0007] In a first aspect, embodiments of the present invention provide an air inlet flange for introducing air into a reaction chamber for exhaust gas treatment. The flange has an annular cavity inside, and along the outer circumferential surface of the flange, the flange has at least one through hole.

[0008] The cavity is connected to the gas supply device through the at least one through hole, and the cavity is connected to the reaction chamber through the airflow channel of the flange;

[0009] The airflow channel is an annular channel, and along the direction of the exhaust gas flow in the reaction chamber, the airflow channel is inclined towards the central axis of the flange.

[0010] According to at least one embodiment of the present invention, the cavity has a first wall surface opposite to the at least one through hole, and the first wall surface is inclined towards the central axis of the flange along the direction of the exhaust gas flow in the reaction chamber;

[0011] The airflow channel is formed in the cavity near the first wall surface.

[0012] According to at least one embodiment of the present invention, the flange has a first flange at a portion near the inner circumferential surface of the flange, and the airflow passage is formed within the first flange.

[0013] According to at least one embodiment of the present invention, the angle between the central axis of the airflow channel and the central axis of the flange is 10° to 60°; and / or,

[0014] The width of the airflow channel is 3mm to 10mm.

[0015] According to at least one embodiment of the present invention, the cavity has a second wall adjacent to the first wall, the second wall of the cavity having an annular boss, and the boss being located near the middle of the cavity along the direction from the at least one through hole to the first wall.

[0016] The cavity also has a third wall opposite to the second wall, and a slit is formed between the end face of the boss away from the second wall and the third wall to allow air to pass through.

[0017] According to at least one embodiment of the present invention, the height of the slit is less than half the height of the cavity, the ratio of the height of the slit to the height of the cavity is (1-2):5, and the height direction of the slit and the height direction of the cavity are both the direction of the central axis of the flange.

[0018] According to at least one embodiment of the present invention, each of the through holes is opposite to the outer circumferential surface of the boss.

[0019] According to at least one embodiment of the present invention, each of the through holes has a countersunk hole near the outer circumferential surface of the flange, the countersunk hole being used for connection with the gas supply equipment.

[0020] According to at least one embodiment of the present invention, the number of through holes is four, and each of the through holes is evenly distributed along the outer circumferential surface of the flange.

[0021] In one or more technical solutions provided in the exemplary embodiments of the present invention, at least one of the following beneficial effects can be achieved.

[0022] (1) The air inlet flange is used to introduce air into the reaction chamber, so that the exhaust gas in the reaction chamber is fully and uniformly mixed with the air to undergo an oxidation reaction for harmless treatment. The flange has an annular cavity inside, which is connected to the outer circumferential surface of the flange through one or more through holes, so that air from an external air supply device can be introduced into the cavity. The flange also has an annular airflow channel connected to the reaction chamber, with one end of the airflow channel connected to the cavity. Based on this, air from an external air supply device is introduced into the reaction chamber in sequence through the through holes, the cavity, and the airflow channel. Since the airflow channel is inclined towards the central axis of the flange along the flow direction of the exhaust gas in the reaction chamber, the air and exhaust gas can be fully and uniformly mixed in the middle region of the reaction chamber. At the same time, since the air flows towards the middle region of the reaction chamber, it is less likely to accumulate dust on the inner wall of the reaction chamber compared to swirling flow.

[0023] (2) In an exemplary embodiment of the present invention, the airflow channel of the rod body is inclined to the flange center axis along the flow direction of the exhaust gas in the reaction chamber. That is, the air flow direction is roughly the same as the exhaust gas flow direction, which makes it less likely to generate backflow in the previous chamber, such as the pyrolysis chamber, to react with the exhaust gas and form dust.

[0024] Secondly, embodiments of the present invention also provide an exhaust gas treatment device, including a reaction chamber, a guide ring, and the flange described in the first aspect. The guide ring includes a cylinder and a second flange located at one end of the cylinder. The second flange is connected to the air inlet end of the reaction chamber. The other end of the cylinder extends into the interior of the reaction chamber. The cylinder is used to prevent air from flowing back into the air inlet end of the airflow channel.

[0025] The advantages of the exhaust gas treatment device over the prior art are the same as the advantages of the flange provided in the first aspect over the prior art, and will not be repeated here. Attached Figure Description

[0026] The accompanying drawings illustrate exemplary embodiments of the invention and, together with the description thereof, serve to explain the principles of the invention. These drawings are included to provide a further understanding of the invention and are incorporated in and constitute a part of this specification.

[0027] Figure 1 This is a three-dimensional structural diagram of the air intake flange according to an embodiment of the present invention.

[0028] Figure 2 This is a side view of the intake flange and guide ring according to an embodiment of the present invention.

[0029] Figure 3 yes Figure 2 A schematic diagram of the AA cross-sectional structure.

[0030] Figure 4 yes Figure 3Enlarged structural diagram of part B.

[0031] Figure 5 yes Figure 3 A magnified view of part B.

[0032] Figure 6 This is a three-dimensional schematic diagram of a guide ring according to an embodiment of the present invention.

[0033] Figure 7 This is a schematic diagram of the exhaust gas treatment device according to an embodiment of the present invention.

[0034] Figure 8 yes Figure 7 Longitudinal cross-sectional view.

[0035] Reference numerals: 10, flange; 11, cavity; 111, first wall surface; 112, second wall surface; 113, third wall surface; 11a, first cavity section; 11b, slit; 11c, second cavity section; 12, through hole; 121, countersunk hole; 13, airflow channel; 14, boss; 15, first flange; 20, guide ring; 21, cylinder; 22, second flange; 50, reaction chamber. Detailed Implementation

[0036] The present invention will now be described in further detail with reference to the accompanying drawings and embodiments.

[0037] The semiconductor industry generates a large amount of exhaust gas during production. This exhaust gas is generally flammable, toxic, and has a high greenhouse effect. These harmful gases must be rendered harmless before being released into the environment. The harmless treatment method involves passing the gas into a high-temperature reaction chamber. The harmful gases react with oxygen at high temperatures. Some of the solid particles generated are captured by a spray tower, some of the water-soluble gases are absorbed by the spray tower, and the remainder are released as harmless byproducts.

[0038] For high-flow-rate gases containing silicon, such as silane, dichlorodihydrosilane, and TEOS, solid silica particles are formed upon reaction with oxygen at high temperatures. When process waste gas enters the inlet chamber, it causes a localized pressure increase, forcing some of the generated silica particles to flow back to the top of the inlet chamber. The gas velocity at the top of the inlet chamber is very low, making it easy for silica particles to adhere to the walls and accumulate, eventually causing blockage. This blockage significantly shortens the equipment's maintenance cycle, requiring frequent opening of the chamber to clean dust particles. Furthermore, the blocked dust particles react further within the high-temperature inlet chamber, gradually forming glassy crystalline substances containing silicon. These substances adhere to the heating unit and the inner walls of the chamber, reducing heat dissipation performance and posing a safety hazard when the temperature inside the chamber is high.

[0039] To address the aforementioned issues, the air inlet flange provided in the exemplary embodiment of the present invention introduces air into the central region of the reaction chamber via direct current air intake, achieving thorough mixing with the exhaust gas to be treated within the reaction chamber. Simultaneously, using direct current air intake instead of swirling airflow prevents dust from being blown onto the inner wall of the reaction chamber and accumulating.

[0040] Figure 1 A three-dimensional structural diagram of the intake flange of an exemplary embodiment of the present invention is shown. Figure 2 This is a side view of the intake flange and guide ring according to an embodiment of the present invention. Figure 3 yes Figure 2 A schematic diagram of the AA cross-sectional structure. Figure 4 yes Figure 3 Enlarged structural diagram of part B. Combined with... Figures 1-4 As shown, the flange 10 has an annular cavity 11, and along the outer circumference of the flange 10, the flange 10 has at least one through hole 12. The cavity 11 is connected to the gas supply device through the at least one through hole 12, and the cavity 11 is connected to the reaction chamber 50 through the airflow channel 13. The airflow channel 13 is an annular channel, and along the direction of the exhaust gas flow in the reaction chamber 50, the airflow channel 13 is inclined towards the central axis of the flange 10. Exemplarily, the direction of the exhaust gas flow in the reaction chamber 50 is vertically downward.

[0041] In practical applications, a cavity 11 is formed inside the flange 10. The cavity 11 has an annular structure, and the outer circumferential surface of the flange 10 has one or more through holes 12. Each through hole 12 communicates with the cavity 11 and is used to connect an air supply device, which can provide compressed dry air (CDA) to the flange 10. Exemplarily, the axial direction of the through hole 12 is radial to the flange 10. An annular airflow channel 13 is also formed on the flange 10. The annular opening of the airflow channel 13 faces into the reaction chamber 50, and the airflow channel 13 communicates with the cavity 11. The airflow channel 13 follows the direction of the exhaust gas flow in the reaction chamber 50, and the airflow channel 13 is inclined towards the central axis of the flange 10. Figure 3 As shown, the direction of the exhaust gas flow is from top to bottom, and the inclination direction of the airflow channel 13 is along the central axis of the flange 10 from top to bottom. For example, the annular opening of the airflow channel 13 faces the middle region of the reaction chamber 50.

[0042] When the gas supply equipment provides CDA gas, the CDA gas first enters the cavity 11 through the through hole 12. Since the volume of the cavity 11 is much larger than the volume of the through hole 12, the CDA gas can be dispersed and homogenized in the entire circumference of the cavity 11. Then, it enters the reaction chamber 50 evenly through the annular airflow channel 13. Most of the CDA gas reacts with the main airflow of the tail gas in the reaction chamber 50 in the middle region of the reaction chamber 50, thereby achieving a homogenized gas mixing effect and making the harmless tail gas treatment more efficient. For example, the oxygen in the CDA gas reacts with the SiF4 in the tail gas to generate SiO2 powder for harmless treatment. Since the airflow channel 13 is inclined from top to bottom, the flow direction of the CDA gas is also inclined downward, which is coordinated with the direction of the main airflow of the tail gas in the reaction chamber 50. The CDA gas is not easy to flow back to the top of the reaction chamber 50, thereby minimizing the accumulation of dust on the components above the reaction chamber 50 (such as the pyrolysis chamber) or at the air inlet of the reaction chamber 50, thus preventing blockage of the corresponding parts.

[0043] Figure 5 yes Figure 3 A magnified view of part B. (See diagram below.) Figure 5 As shown, in order to ensure that the CDA gas flows out of the airflow channel 13 at a predetermined angle, and thus mixes thoroughly with the exhaust gas in the reaction chamber 50, the chamber 11 has a first wall 111 opposite to at least one through hole 12. Along the direction of the exhaust gas flow in the reaction chamber 50, the first wall 111 is inclined towards the central axis of the flange 10; the airflow channel 13 is formed in the part of the chamber 11 near the first wall 111.

[0044] In practical applications, the inclination direction of the first wall surface 111 is consistent with the inclination direction of the airflow channel 13, and the corresponding walls of the first wall surface 111 and the airflow channel 13 are on the same plane. When the CDA airflow in the cavity 11 enters the cavity 11 through the through hole 12 and meets the first wall surface 111, the inclination surface of the first wall surface 111 will guide the CDA airflow to the airflow channel 13. The turbulence entering the reaction chamber 50 from the airflow channel 13 will be reduced, so that the CDA and the exhaust gas in the reaction chamber 50 can be fully mixed, which is beneficial to uniform reaction. The inclination direction of the first wall surface 111 is consistent with that of the airflow channel 13, which can prevent the CDA airflow from blowing onto the inner wall of the reaction chamber 50 as much as possible, thereby avoiding dust accumulation on the inner wall of the reaction chamber 50.

[0045] In some embodiments, the flange 10 has a first flange 15 near the inner circumferential surface, and an airflow passage 13 is formed within the first flange 15.

[0046] like Figure 3As shown, a first flange 15 is formed below the flange 10, that is, it is located within the reaction chamber 50. Exemplarily, the inner circumferential surface of the first flange 15 is coplanar with the inner circumferential surface of the flange 10. An airflow channel 13 is formed within the first flange 15. Exemplarily, one wall of the airflow channel 13 is on the same wall as the first wall surface 111. Compared to a flange 10 without a flange, the first flange 15 increases the axial length of the airflow channel 13. That is, the airflow channel 13 and the first wall surface 111 work together to make the CDA gas more directional, that is, to guide the CDA gas as far as possible to the middle region of the reaction chamber 50, and the CDA gas distribution is more uniform so as to fully react with the exhaust gas.

[0047] like Figure 3 As shown, the angle α between the central axis of the airflow channel 13 and the central axis of the flange 10 is 10° to 60°, optionally 20° to 40°, and optionally 30°. When α is in the range of 10° to 60°, the CDA gas can be guided to the middle region of the reaction chamber 50. When α is greater than 60°, the CDA gas flowing out of the airflow channel 13 is prone to backflow to the cavity above the reaction chamber 50 or the air inlet end of the reaction chamber 50. When α is less than 10°, the CDA gas flowing out of the airflow channel 13 is prone to flow to the bottom of the reaction chamber 50 rather than the middle region of the reaction chamber 50, which will cause uneven mixing of the CDA gas and the exhaust gas, resulting in incomplete reaction.

[0048] It should be noted that the central axis of airflow channel 13 refers to: (e.g., ...) Figure 3 As shown in the diagram, when the airflow channel 13 is cross-sectioned, the central axis between the two opposing walls forming the airflow channel 13 is parallel to the two walls. In essence, since the airflow channel 13 is an annular channel, the central axis of the airflow channel 13 is the generatrix of a cone, where α is half the cone angle of this cone.

[0049] like Figure 4As shown, the width W1 of the airflow channel 13 is 3mm to 10mm. The width of the airflow channel 13 refers to the distance between the two opposing inner walls forming the annular airflow channel 13. When W1 is 3mm to 10mm, the width of the airflow channel 13 is less than the height of the cavity 11. For example, the height H2 of the cavity 11 is 5mm to 20mm. That is, when the CDA airflow flows from the cavity 11 through the airflow channel 13 into the reaction chamber 50, it will be accelerated. That is, the CDA airflow accelerates downward, making it less likely for the CDA airflow to flow upward back to the inlet end of the reaction chamber 50 or to components such as the thermal decomposition chamber above the reaction chamber 50, thus preventing dust blockage. Optionally, the ratio between the width W1 of the airflow channel 13 and the width H2 of the cavity 11 is (2 to 4):5, and also optionally 3:5. Specifically, the width W1 of the airflow channel 13 is 3mm to 10mm, and also optionally 5mm to 8mm, or also optionally 6mm to 7mm.

[0050] Figure 4 Combination Figure 5 As shown, the flange of the exemplary embodiment of the present invention has a second wall surface 112 of cavity 11 with an annular boss 14, and the boss 14 is located near the middle of the second wall surface 112 along the direction from at least one through hole 12 to the first wall surface 111; the cavity 11 also has a third wall surface 113 opposite to the second wall surface 112, and a slit 11b for air to pass through is formed between the end face of the boss 14 away from the second wall surface 112 and the third wall surface 113.

[0051] In practical applications, the cavity 11 is surrounded by four walls, which sequentially include the wall containing the through hole 12, the second wall 112, the first wall 111, and the third wall 113, wherein the second wall 112 and the third wall 113 are opposite each other; the first wall 111 is opposite to the wall containing the through hole 12. An annular boss 14 is provided on the second wall 112, and along the direction from the through hole 12 to the first wall 111, the boss 14 is approximately positioned in the middle of the cavity 11. A slit 11b is formed between the boss 14 and the third wall 113, as shown... Figure 4 As shown, a boss 14 is provided in the cavity 11, which essentially divides the cavity 11 into three parts, which sequentially include a first cavity section 11a, a slit 11b, and a second cavity section 11c along the direction from the first wall surface 111 to the through hole 12. CDA gas enters the second cavity section 11c of the cavity 11 through the through hole 12, then enters the first cavity section 11a through the slit 11b, and then flows out from the gas flow channel 13 to the middle region of the reaction chamber 50.

[0052] In an alternative embodiment, the boss 14 may be provided on the third wall surface 113, and a slit 11b is formed between the boss 14 and the second wall surface 112, depending on the actual situation.

[0053] For example, the width H1 of the slit 11b is less than half the width H2 of the cavity 11, and the ratio of the width H1 of the slit 11b to the width H2 of the cavity 11 is (1-2):5, optionally H1:H2 = 1:5. Specifically, H2 is 5mm-20mm, H1 is 1mm-5mm, optionally H1 is 1.5mm-4.5mm, also optionally H1 is 2mm-4mm, and also optionally H1 is 2.5mm-3.5mm. It should be noted that the height direction of the slit 11b and the height direction of the cavity 11 are both the axial direction of the flange 10.

[0054] In practical applications, CDA gas enters the second chamber 11c through the through hole 12. Since the boss 14 blocks the CDA gas flow, it can change the direction of the gas flow, so that the CDA gas undergoes pre-diffusion in the annular second chamber 11c. After gas buffering, the gas becomes more uniform, allowing the gas to diffuse throughout the entire annular second chamber 11c. Then, the CDA gas enters the first chamber 11a through the slit 11b. Since the width W1 of the slit 11b is small, it will create an acceleration effect. When the CDA gas enters the first chamber 11a, due to the increase in volume, the CDA gas diffuses again in the first chamber 11a, so that the CDA gas flowing out from the annular gas flow channel 13 is more uniform, which facilitates thorough mixing with the tail gas in the reaction chamber 50 to undergo an oxidation reaction.

[0055] As can be seen from the above, by coordinating the dimensions of the second cavity 11c, the slit 11b, the first cavity 11a, and the airflow channel 13, as well as the inclination angle of the airflow channel 13, the CDA gas entering the reaction chamber 50 can be homogenized. For example, the ratio H2:H1:W1 between the width H2 of the first cavity 11a, the width H1 of the slit 11b, and the width W1 of the airflow channel 13 is H2:H1:W1 = 5:(1~2):3, or optionally H2:H1:W1 = 5:1:3. When H2:H1:W1 = 5:(1~2):3 and the inclination angle α of the airflow channel 13 is 10°~60°, the exhaust gas and CDA gas flow in the reaction chamber 50 can be fully mixed and reacted, while the backflow of CDA gas flow to the inlet end of the reaction chamber 50 can be minimized, and the CDA gas flow is less likely to blow onto the inner wall of the reaction chamber 50 to react with the exhaust gas and form dust.

[0056] To achieve the pre-diffusive effect of the boss 14 blocking the CDA airflow, each through-hole 12 is, by way of example, opposite to the outer circumferential surface of the boss 14. Figure 5As shown, the annular boss 14 has an inner circumferential surface facing the first wall surface 111 and an outer circumferential surface facing the wall surface where the through hole 12 is located. The axial direction of the through hole 12 is radial to the flange 10, thus the through hole 12 can be opposite to the outer circumferential surface of the boss 14, or the through hole 12 can be opposite to a portion of the outer circumferential surface of the boss 14. For example, when the boss 14 is located on the second wall surface 112, the upper wall surface of the through hole 12 is located below the top of the outer circumferential surface of the boss 14, so that the CDA airflow of the through hole 12 directly impacts the outer circumferential surface of the boss 14; alternatively, the upper wall surface and the lower wall surface of the through hole 12 are located above and below the top of the outer circumferential surface of the boss 14, respectively, so that a portion of the CDA airflow of the through hole 12 impacts the outer circumferential surface of the boss 14. The relative positional relationship between the through hole 12 and the outer circumferential surface of the boss 14 allows the CDA airflow to be pre-homogenized in the second cavity section 11c, thereby ensuring that it is homogenized when it enters the reaction chamber 50 through the airflow channel 13, so as to better mix with the exhaust gas in the reaction chamber 50.

[0057] Considering the ease of connection between the gas supply equipment and flange 10, such as Figure 3 As shown, each through-hole 12 near the outer circumferential surface of the flange 10 also has a countersunk hole 121, each countersunk hole 121 for connection with an air supply device. The countersunk hole 121 may have internal threads, and the countersunk hole 121 is used for threaded connection with the pipeline of the air supply device. Exemplarily, the inner diameter of the air supply device pipeline may be equal to or slightly larger than the inner diameter of the through-hole 12. Exemplarily, the connection between the countersunk hole 121 and the pipeline of the air supply device may also be a snap-fit ​​connection. Based on this, a detachable connection is formed between the air inlet through-hole 12 of the flange 10 and the pipeline of the air supply device.

[0058] like Figure 1 As shown, the number of through holes 12 can be one. When an annular boss 14 is provided in the cavity 11, one through hole 12 can meet the requirements of air intake uniformity. Exemplarily, the number of through holes 12 can be multiple, such as 2, 3, 4, 6, etc., depending on actual needs. Exemplarily, when the number of through holes 12 is multiple, in order to further improve the air intake volume entering the second cavity section 11c and the uniformity of CDA gas entering the reaction chamber 50 through the flange 10, each through hole 12 is evenly distributed along the outer circumferential surface of the flange 10.

[0059] As can be seen from the above, the air intake flange provided in the exemplary embodiment of the present invention, through the relative positional relationship of the second cavity section, the slit, the first cavity section, the first wall surface, and the airflow channel, as well as the corresponding dimensions and the angle of inclination of the airflow channel towards the flange central axis, can achieve the purpose of uniform air distribution. This ensures that the air entering the reaction chamber 50 is fully mixed with the exhaust gas, preventing backflow and blockage above the reaction chamber. It also prevents air from being blown towards the inner wall of the reaction chamber and reacting with the exhaust gas to form dust accumulation. Based on this, the air intake flange provided in the exemplary embodiment of the present invention can keep the reaction chamber and the cavity above the reaction chamber in a clear state, reducing blockage and thus extending the cleaning and maintenance cycle.

[0060] An exemplary embodiment of the present invention also provides an air intake assembly, which includes a guide ring 20 and the aforementioned flange 10. The guide ring 20 includes a cylinder 21 and a second flange 22 located at one end of the cylinder 21. The second flange 22 is connected to the air intake end of the reaction chamber 50. The other end of the cylinder 21 extends into the interior of the reaction chamber 50. The cylinder 21 is used to prevent air from the airflow channel 13 from flowing back to the air intake end of the reaction chamber 50.

[0061] In practical applications, flange 10 is located outside the cylinder 21 of guide ring 20, meaning that flange 10, the second flange 22 of guide ring 20, and the air inlet of reaction chamber 50 are connected, and the annular airflow channel of flange 10 is located outside the cylinder 21. For example... Figure 3 The cylinder 21 guides the exhaust gas entering the reaction chamber 50 to the middle region of the reaction chamber 50, extending from the inlet end of the reaction chamber 50 into the interior. Correspondingly, the CDA airflow from the airflow channel 13 will not flow back to the top of the reaction chamber 50 or become clogged with dust at the flanged end of the cylinder 21, due to the obstruction of the guide ring 20. Under the guidance of the cylinder 21, the CDA airflow from the airflow channel 13 flows along the direction of the exhaust gas airflow in the reaction chamber 50, and the exhaust gas and CDA gas mix evenly for reaction, thus ensuring reaction uniformity. It should be noted that, as... Figure 6 As shown, the cylinder 21 can be a circular cylinder, that is, the axis of the cylinder 21 is perpendicular to the second flange 22, and the guide ring 20, the reaction chamber 50 and the flange 10 are all coaxial.

[0062] In one optional embodiment, the cylinder 21 is a frustum-shaped cylinder, and its cross-section gradually decreases along the direction of the exhaust gas flow from the reaction chamber 50. That is, the cylinder 21 is a funnel-shaped cylinder. Exemplarily, the cone angle of the frustum-shaped cylinder is less than or equal to 120°. When the cone angle of the frustum-shaped cylinder 21 is greater than 120°, the CDA gas flow from the gas flow channel 13 will diffuse to the upper end of the cylinder, making it impossible to prevent the CDA gas flow from flowing back to the inlet end of the reaction chamber 50 or the pyrolysis chamber located above the reaction chamber 50. When the cone angle of the frustum-shaped cylinder 21 is greater than 120°, it is also impossible to achieve the purpose of adjusting the reaction area. Alternatively, the cone angle of the frustum-shaped cylinder may be less than or equal to 100°.

[0063] When the cone angle of the cylinder 21 is less than or equal to 120°, and the airflow channel 13 is inclined towards the cylinder 21 along the direction of the exhaust gas flow, the wall of the cylinder 21 can not only prevent the air in the airflow channel 13 from forming a backflow, but also ensure that the air flows along the inclined direction of the airflow channel 13 after entering the reaction chamber 50. Therefore, the air and exhaust gas can be effectively guided to the middle area of ​​the reaction chamber 50 to form a uniform mixture and reaction.

[0064] To ensure that the guide ring 20 effectively regulates the exhaust gas reaction zone within the reaction chamber 50, its axial length should not be too small or too large. For example, the axial length of the guide ring is set to 30mm to 200mm. Within this range, the exhaust gas to be treated can be guided as far as possible to the central region of the reaction chamber 50. In this region, in conjunction with the inclination angle of the airflow channel 13 (i.e., the incoming flow direction of the CDA), the exhaust gas can fully mix and react with the CDA, thereby preventing dust accumulation on the inner wall or above the reaction chamber 50 and maintaining unobstructed exhaust gas flow.

[0065] For example, the central axis of the airflow channel 13 does not intersect with the end of the cylinder 21 away from the second flange 22. This embodiment prevents the CDA from directly impacting the outer wall of the cylinder 21, thus reducing turbulence caused by direct impact. Turbulence can easily lead to dust accumulation near the flange, reacting with the exhaust gas. The fact that the central axis of the airflow channel 13 does not intersect with the end of the cylinder 21 away from the second flange 22 allows the CDA airflow to directly and uniformly mix with the exhaust gas airflow in the reaction chamber 50, promoting mixing and reaction of the exhaust gas and CDA in the central region of the reaction chamber 50, thereby achieving optimal harmless treatment.

[0066] As can be seen from the above, through the cooperation between the flange and the guide ring, the CDA gas entering the reaction chamber 50 from the flange can be guided to the middle area of ​​the reaction chamber to the greatest extent, avoiding the backflow of CDA gas to the inlet end of the reaction chamber 50 or the pyrolysis chamber located above the reaction chamber 50, thereby avoiding the formation of dust that blocks the inlet end of the reaction chamber 50 or the pyrolysis chamber at the above two locations due to the reaction with the tail gas.

[0067] Figure 7 This is a schematic diagram of the exhaust gas treatment device according to an embodiment of the present invention. Figure 8 yes Figure 7 A cross-sectional view. Combined with... Figures 7-8 As shown, an exemplary embodiment of the present invention also provides an exhaust gas treatment device including a reaction chamber 50, a guide ring 20 and the aforementioned air inlet flange 10. The guide ring 20 includes a cylinder 21 and a second flange 22 located at one end of the cylinder 21. The second flange 22 is connected to the air inlet end of the reaction chamber 50. The other end of the cylinder 21 extends into the interior of the reaction chamber 50. The cylinder 21 is used to block the air from flowing back into the air inlet end of the airflow channel 13.

[0068] The advantages of the exhaust gas treatment device over existing technologies are the same as those of the intake flange over existing technologies, and will not be repeated here.

[0069] Those skilled in the art should understand that the above embodiments are merely for illustrating the present invention and are not intended to limit the scope of the invention. Those skilled in the art can make other changes or modifications based on the above disclosure, and these changes or modifications still fall within the scope of the present invention.

Claims

1. An air intake flange, characterized in that, The flange is used to introduce air into the reaction chamber for exhaust gas treatment. The flange has an annular cavity inside and at least one through hole along the outer circumferential surface of the flange. The cavity is connected to the gas supply device through the at least one through hole, and the cavity is connected to the reaction chamber through the airflow channel of the flange; The airflow channel is an annular channel, and along the direction of the exhaust gas flow in the reaction chamber, the airflow channel is inclined towards the central axis of the flange; the inclination angle of the airflow channel is 10° to 60°. The cavity has a first wall surface opposite to the at least one through hole, and along the direction of the exhaust gas flow in the reaction chamber, the first wall surface is inclined towards the central axis of the flange. The airflow channel is formed in the cavity near the first wall surface; The cavity has a second wall adjacent to the first wall, the second wall having an annular boss located near the middle of the second wall along the direction from the at least one through hole to the first wall. The cavity also has a third wall surface opposite to the second wall surface, and a slit for air to pass through is formed between the end face of the boss away from the second wall surface and the third wall surface; The height of the slit is less than half the height of the cavity, and the height direction of both the slit and the cavity is the direction of the central axis of the flange.

2. The flange according to claim 1, characterized in that, The flange has a first flange at a portion near the inner circumferential surface of the flange, and the airflow channel is formed within the first flange.

3. The flange according to claim 1, characterized in that, Each of the through holes is opposite to the outer circumferential surface of the boss.

4. The flange according to claim 1, characterized in that, Each of the through holes also has a countersunk hole near the outer circumferential surface of the flange, and each countersunk hole is used to connect to the gas supply equipment.

5. The flange according to claim 1, characterized in that, The number of through holes is multiple, and each through hole is evenly distributed along the outer circumference of the flange.

6. The flange according to claim 5, characterized in that, The number of through holes is four.

7. A tail gas treatment device, characterized in that, The device includes a reaction chamber, a guide ring, and a flange as described in any one of claims 1-6. The guide ring includes a cylindrical body and a second flange located at one end of the cylindrical body. The second flange is connected to the air inlet end of the reaction chamber. The other end of the cylindrical body extends into the interior of the reaction chamber. The cylindrical body is used to prevent air from flowing back into the air inlet end of the airflow channel.

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