Solar energy silicon wafer ultrasonic cleaning machine

Abstract

The application discloses a solar silicon wafer ultrasonic cleaning machine, which comprises a rack, a cleaning basket, a water tank, a conveying mechanism, a lifting mechanism, a drying mechanism and a filtering mechanism. The front and rear ends of the rack are respectively an inlet and an outlet. The lifting mechanism is composed of two groups and is arranged at the front and rear ends of the rack respectively and is used for lifting movement of the cleaning basket. The water tank is composed of multiple water tanks which are arranged in the rack in a straight line at intervals. The drying mechanism is arranged at the rear end of the rack close to the outlet and is used for drying the silicon wafer in the cleaning basket. The filtering mechanism is arranged at the bottom of the water tank. The conveying mechanism is arranged in the rack and is used for transmission movement of the cleaning basket from the inlet to the outlet through each water tank in sequence. The conveying mechanism of the solar silicon wafer ultrasonic cleaning machine has high conveying efficiency, can make the cleaning and drying processes be carried out simultaneously, improves the overall cleaning efficiency, saves the use of cleaning liquid, saves resources and is beneficial to environmental protection.

Description

Technical Field

[0001] This invention relates to an ultrasonic cleaning machine for solar silicon wafers, and relates to the technical field of silicon wafer cleaning equipment. Background Technology

[0002] It is understood that silicon wafer cleaning includes brushing, high-pressure cleaning, and ultrasonic cleaning. Brushing can remove particulate contaminants and most of the thin films adhering to the silicon wafer, but it can cause significant damage. High-pressure cleaning involves spraying liquid onto the silicon wafer surface at pressures up to several hundred atmospheres. High-pressure cleaning relies on the spraying action, making it less prone to scratches and damage, but it can generate static electricity. Ultrasonic cleaning uses ultrasonic energy transmitted into a solution, relying on cavitation to remove contaminants from the silicon wafer. Currently, ultrasonic cleaning technology is the most commonly used in the market.

[0003] Currently, ultrasonic cleaning machines on the market are divided into single-tank cleaning machines and multi-tank cleaning machines. Single-tank cleaning machines are small in size, inexpensive, and have good cleaning effects, but they cannot perform multiple cleaning processes, resulting in wasted time and low cleaning efficiency. Multi-tank cleaning machines have a faster cleaning speed and can perform multiple cleaning processes, but the cleaning solution may cause secondary contamination to the silicon wafers. In addition, the conveying mechanism inside the multi-tank cleaning machine is complex, with low conveying efficiency and high manufacturing cost, and it does not have a drying function, which also reduces the overall cleaning efficiency of the silicon wafers. Summary of the Invention

[0004] The technical problem to be solved by the present invention is to provide a solar silicon wafer ultrasonic cleaning machine with a relatively simple structure, low manufacturing cost and effective improvement of silicon wafer cleaning efficiency.

[0005] To solve the above-mentioned technical problems, the present invention is achieved through the following technical solution:

[0006] An ultrasonic cleaning machine for solar silicon wafers includes a frame, a cleaning basket, a water tank, a conveying mechanism, a lifting mechanism, a drying mechanism, and a filtering mechanism. The front and rear ends of the frame are the inlet and outlet, respectively. The lifting mechanism consists of two sets, respectively located at the front and rear ends of the frame, and is used for the lifting and lowering movement of the cleaning basket. Multiple water tanks are arranged in a straight line at intervals within the frame and are used to hold cleaning fluid. The drying mechanism is located at the rear end of the frame near the outlet and is used for drying the silicon wafers in the cleaning basket. The filtering mechanism is located at the bottom of the water tank and is used for filtering the cleaning fluid in the water tank. The conveying mechanism is located within the frame and is used for the transmission movement of the cleaning basket from the front inlet through each water tank to the outlet.

[0007] Preferably, the water tank includes three tanks, with its front and rear side plates being inclined plates and its left and right side plates being vertical plates. The water tanks are connected and fixed to the frame via a fixing plate assembly. The fixing plate assembly includes a horizontal plate and a side guard plate. The horizontal plate is horizontally connected and fixed between the water tanks and the frame, and its surface is flush with the opening of the water tanks. The side guard plate is located outside the horizontal plate and fixed to the frame. Multiple ultrasonic transducers are provided on the bottom plate of the water tanks, and the power and frequency of the ultrasonic transducers corresponding to each water tank are different.

[0008] Preferably, the conveying mechanism includes a front-end conveyor chain assembly, a rear-end conveyor chain assembly, and a guide rail assembly. The front-end conveyor chain assembly comprises three sets, each corresponding to one of the three water tanks. It includes a reduction motor, a transmission roller assembly, and a conveyor chain. Two parallel transmission roller support plates are provided on a horizontal plate, arranged vertically from front to back. The width between the transmission roller support plates is the same as the width of the water tank. The transmission roller assembly includes a horizontal roller assembly and a water tank roller assembly. The horizontal roller assembly includes multiple transmission rollers arranged at intervals between the two transmission roller support plates and located above the horizontal plate. The water tank roller assembly includes multiple transmission rollers, with both ends of the transmission rollers fixed to the left and right side plates of the water tank. The distance between the transmission rollers and the front and rear plates and the bottom plate of the water tank is the same. Two coaxial... The transmission sprockets are connected by a transmission chain between adjacent sprockets. The geared motor is fixed to the bottom of the horizontal plate by a fixed base plate and is connected to the transmission sprocket at the far end by a chain drive. The rear transmission chain assembly is located between the rear of the water tank and the discharge port. It includes multiple rear transmission rollers and a rear geared motor. The rear transmission rollers are installed and fixed between transmission roller support plates at intervals and are located above the horizontal plate. Two coaxial transmission sprockets are provided at one end of the rear transmission rollers. The two adjacent transmission sprockets are connected by a transmission chain. The rear geared motor is fixed to the bottom of the horizontal plate by a fixed base plate and is connected to the transmission sprocket at the end of the farthest rear transmission roller by a chain drive. The guide rail assembly is provided on the side of the transmission roller and is used to limit the position of the cleaning basket on the transmission roller.

[0009] Preferably, the guide rail assembly includes two sets, each including a guide rail strip and a guide rail support plate. The two guide rail support plates are vertically mounted on the two transmission roller support plates. The guide rail strip includes two L-shaped support plates symmetrically arranged inside the guide rail support plates. A limiting groove is formed between the two L-shaped support plates to allow the support rollers at both ends of the cleaning basket to roll freely within it. A transmission plane or curved surface is formed between the upper surfaces of the roller shafts of the plurality of transmission rollers. The distance between the guide rail strip and the transmission plane or curved surface is consistent. When the cleaning basket is placed on the transmission rollers for transmission, the support rollers at both ends are placed in the limiting groove and keep them rolling freely.

[0010] Preferably, the lifting mechanism includes a ring conveyor belt device, a lifting platform, a hydraulic cylinder, a support plate, guide columns, a top plate, a base plate, and a lifting bracket. The base plate is fixed to the bottom of the lifting bracket, the support plate is fixed to the top of the lifting bracket and is horizontally arranged, the lifting platform is placed above the support plate and has end guide rail support plates on both sides, the width between the end guide rail support plates is the same as the width between the guide rail support plates, and the end guide rail support plates are provided with end limiting guide rails that correspond to the guide rails and have the same structure. The hydraulic cylinder is vertically arranged and its cylinder body is fixed to the base plate. Its upper piston rod end passes through the middle of the support plate and is connected to the middle position of the bottom of the lifting platform. There are two guide columns, which are located on both sides of the lifting platform respectively, and their lower ends are connected to both ends of the support plate and their upper ends are connected to both ends of the top plate. The two sides of the lifting platform are provided with sliding seats that are looped on the guide columns. The ring conveyor belt device is set on the lifting platform and is used to transport the cleaning basket placed on it. A return guide rail mechanism is provided at the top of the frame. The return guide rail mechanism includes a top fixing plate, side plates, and a return guide rail. The top fixing plate is fixed to the top of the frame and is horizontally arranged. There are two side plates, which are vertically fixed to the lower side plate of the top fixing plate. The distance between the two side plates is the same as the distance between the guide rail support plates. The structure of the return guide rail is the same as that of the guide rail strip and is inclined upward from front to back. When the lifting mechanism at the front end drives the lifting platform to the upper limit position, the front end of the return guide rail corresponds to the end limiting guide rail strip on it, and the limiting groove between the two is connected. When the lifting mechanism at the rear end drives the lifting platform to the upper limit position, the rear end of the return guide rail corresponds to the end limiting guide rail strip on it, and the limiting groove between the two is connected.

[0011] Preferably, the drying mechanism includes a drying chamber shell, a baffle door, a fan, and a fan support plate. The drying chamber shell is installed inside the rear side of the frame, near the discharge port, and above the rear drive roller of the rear conveyor chain. There are two baffle doors, which are respectively installed in the front and rear openings of the drying chamber shell to realize the opening and closing action of the front and rear openings of the drying chamber shell. A rectangular opening is opened on the horizontal plate below the rear drive roller. The fan support plate is fixed below the rectangular opening. There are multiple fans, which are fixed on the fan support plate, and their impellers are located above the fan support plate and facing the direction of the rear drive roller.

[0012] Preferably, the filtration mechanism includes a filter tank, a water tank, a water pipe, a check valve, a diversion pipe, and a control valve. One end of the filter tank is connected to the control valve, and the other end is connected to the water tank via a water pipe. The other end of the control valve is connected to the cleaning liquid drain port at the bottom of the water tank. The other end of the water tank is connected to the check valve via a water pipe. The other end of the check valve is connected to the diversion pipe, and the multiple outlets of the diversion pipe are respectively connected to the corresponding inlets at the bottom of the water tank.

[0013] Preferably, the frame is provided with a protective plate on the outside, and the protective plate is provided with a plurality of transparent acrylic plates for observation.

[0014] Compared with the prior art, the advantages of the present invention are: the structure of the solar silicon wafer ultrasonic cleaning machine is relatively simple, easy to install and manufacture and low in cost. Its transmission mechanism has high transmission efficiency, which enables the cleaning and drying processes to be carried out simultaneously, thereby improving the overall cleaning efficiency. Moreover, its filtration mechanism can effectively solve the problem of secondary pollution of the cleaning solution, and can save the use of cleaning solution, save resources and be environmentally friendly, thus making it highly practical. Attached Figure Description

[0015] To more clearly illustrate the technical solutions in the embodiments of the present invention, the drawings used in the embodiments will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0016] Figure 1 This is a partial perspective view of the invention without showing its outer protective plate and top return guide rail mechanism;

[0017] Figure 2 yes Figure 1 Enlarged view of point A in the middle;

[0018] Figure 3 This is a perspective view of the front side of the invention;

[0019] Figure 4 yes Figure 3 Enlarged view of point B in the middle;

[0020] Figure 5 This is a perspective view of the invention from the rear side;

[0021] Figure 6 This is a perspective view of the bottom of the invention;

[0022] Figure 7 yes Figure 6 Enlarged view of point C in the middle;

[0023] Figure 8 This is a partial schematic diagram of the fan installation of the drying mechanism of the present invention. Detailed Implementation

[0024] The technical solutions in the embodiments of the present invention will be clearly and completely described below. Obviously, the described embodiments are only a part of the embodiments of the present invention, and not all of them. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0025] An ultrasonic cleaning machine for solar silicon wafers includes a frame 1, a cleaning basket 2, a water tank 3, a conveying mechanism, a lifting mechanism, a drying mechanism, and a filtering mechanism. The front and rear ends of the frame are the inlet and outlet, respectively. Figure 3 , Figure 5 As shown, the frame is a frame structure made up of multiple interconnected rods. To improve safety, a protective plate 4 is provided on the outside of the frame. The protective plate is provided with multiple transparent acrylic plates for observation, which facilitates the observation of the internal conveying and cleaning process.

[0026] Multiple water tanks are arranged in a straight line at intervals within the frame and are used to hold cleaning fluid. After the cleaning basket is conveyed into the water tank, the silicon wafers are cleaned within it. In this embodiment, as shown... Figure 1 , Figure 6 , Figure 7 As shown, to facilitate the transfer and cleaning of silicon wafers, the water tank includes three sections, with its front and rear side plates being inclined plates and its left and right side plates being vertical plates. The water tank is connected and fixed to the frame via a fixing plate assembly. The fixing plate assembly includes a horizontal plate 5 and side guard plates 6. The horizontal plate is horizontally connected and fixed between the water tank and the frame, and its surface is flush with the opening of the water tank. The side guard plates are located outside the horizontal plate and fixed to the frame. Multiple ultrasonic transducers 7 are provided on the bottom plate of the water tank. The ultrasonic transducers vibrate the bottom plate of the water tank, thereby transmitting the vibration to the cleaning fluid, thus cleaning the silicon wafers in the cleaning basket within the water tank. In the ultrasonic cleaning process, to achieve better cleaning results, the power and frequency of the ultrasonic transducers installed under each water tank are different. Different power and frequency ultrasonic transducers result in different cleaning effects. In practical applications, appropriate power and frequency ultrasonic transducers can be installed under each water tank according to actual needs, thereby forming the required ultrasonic cleaning water tank combination and achieving the desired cleaning effect. In addition, in this embodiment, the water tank can be set as a modular tank assembly, which facilitates the installation and disassembly of the overall equipment, is universal and convenient for production, and saves the overall production and installation costs of the equipment.

[0027] The conveying mechanism is installed inside the frame and is used to transport the washing basket from the front inlet to the outlet, sequentially passing through each water tank. In this embodiment, as... Figure 1 , Figure 2 , Figure 6As shown, to improve the conveying efficiency of the washing basket, the conveying mechanism includes a front-end conveyor chain assembly, a rear-end conveyor chain assembly, and a guide rail assembly. The front-end conveyor chain assembly includes three sets, each corresponding to one of the three water tanks. It includes a reduction motor 8, a transmission roller assembly, and a conveyor chain 9. Two parallel transmission roller support plates 10 are provided on the horizontal plate, arranged vertically from front to back. The width between the transmission roller support plates is the same as the width of the water tank. The transmission roller assembly includes a horizontal roller assembly and a water tank roller assembly. The horizontal roller assembly includes multiple transmission rollers 11 arranged at intervals between the two transmission roller support plates and located above the horizontal plate. The water tank roller assembly includes multiple transmission rollers, with both ends of the transmission rollers fixed to the left and right side plates of the water tank. The distance between the transmission rollers and the front and rear side plates and the bottom plate of the water tank is the same. A setting is provided at one end of the transmission roller. There are two coaxial drive sprockets 12, and adjacent drive sprockets are connected by a transmission chain. The geared motor is fixed to the bottom of the horizontal plate by a fixed base plate and is connected to the drive sprocket at the far end by a chain drive. The rear transmission chain assembly is located between the rear of the water tank and the discharge port. It includes multiple rear drive rollers 13 and a rear geared motor 14. The rear drive rollers are installed and fixed between the drive roller support plates at intervals and are located above the horizontal plate. Two coaxial drive sprockets are provided at one end of the rear drive rollers. Adjacent drive sprockets are connected by a transmission chain. The rear geared motor is fixed to the bottom of the horizontal plate by a fixed base plate and is connected to the drive sprocket at the end of the frontmost rear drive roller by a chain drive. The guide rail assembly is provided on the side of the drive roller and is used to limit the position of the cleaning basket on the drive roller. Therefore, during the conveying process, because the front cleaning tank is located close to the feed inlet at the front of the frame, the cleaning basket enters through the feed inlet and begins to be conveyed on the first set of front conveyor chain assemblies. It first enters the transmission rollers of the horizontal transmission roller group and is then conveyed to the water tank transmission roller group and enters the water tank. After cleaning is completed, it is conveyed again to the second set of front conveyor chain assemblies, and the aforementioned process is repeated until the cleaning process in the second and third water tanks is completed. Then, the cleaning basket is conveyed to the rear conveyor chain assembly and is conveyed by multiple horizontal transmission rear transmission rollers to the rear drying mechanism, thus completing the conveying process.

[0028] Furthermore, to ensure the stability of the washing basket during transport and to prevent excessive shaking or tipping, such as... Figure 3 , Figure 4As shown, the guide rail assembly includes two sets, each including guide rail strips 15 and guide rail support plates 16. The two guide rail support plates are vertically mounted on the two transmission roller support plates. The guide rail strip includes two L-shaped support plates symmetrically arranged inside the guide rail support plates. A limiting groove is formed between the two L-shaped support plates to allow the support rollers 17 at both ends of the cleaning basket to roll freely within it. A transmission plane or curved surface is formed between the upper surfaces of the roller shafts of the multiple transmission rollers. The distance between the guide rail strip and the transmission plane or curved surface is consistent, that is, the surface where the center line of the roller shafts of all transmission rollers and the rear transmission roller is located is set as the reference plane. This reference plane may be a plane or a curved surface. The guide rail strip always maintains the same distance from this reference plane, which facilitates the support rollers at both ends of the cleaning basket to be placed in the limiting groove and keep them rolling freely when the cleaning basket is placed on the transmission roller. This not only maintains the free transmission process of the cleaning basket, but also effectively limits the movement of the cleaning basket, resulting in high transmission stability.

[0029] The lifting mechanism consists of two sets, respectively located at the front and rear ends of the frame, and is used for the lifting and lowering movement of the washing basket. In this embodiment, as shown... Figures 1 to 5As shown, to facilitate the return of the cleaning basket, the lifting mechanism includes a ring conveyor belt device 18, a lifting platform 19, a hydraulic cylinder 20, a support plate 21, guide columns 22, a top plate 23, a base plate 24, and a lifting bracket 25. The base plate is fixed to the bottom of the lifting bracket, the support plate is fixed to the top of the lifting bracket and is horizontally arranged, the lifting platform is placed above the support plate and has end guide rail support plates on both sides. The width between the end guide rail support plates is the same as the width between the guide rail support plates, and the end guide rail support plate 26 is provided with end limiting guide rail strips 27 that correspond to the guide rail strips and have the same structure. The hydraulic cylinder is vertically arranged and its cylinder body is fixed to the base plate. Its upper piston rod end passes through the middle of the support plate and is connected to the middle position of the bottom of the lifting platform. There are two guide columns located on both sides of the lifting platform, with their lower ends connected to both ends of the support plate and their upper ends connected to both ends of the top plate. The two sides of the lifting platform are provided with sliding seats that are looped on the guide columns. The ring conveyor belt device is set on the lifting platform and is used to transport the cleaning basket placed on it. Its transport direction is set from the front and back direction of the frame. Furthermore, a return guide rail mechanism is provided at the top of the frame. The return guide rail mechanism includes a top fixing plate 28, a side plate 29, and a return guide rail 30. The top fixing plate is fixed to the top of the frame and is horizontally arranged. The side plates are two pieces that are vertically fixed to the lower side plate surface of the top fixing plate. The distance between the two side plates is the same as the distance between the guide rail support plates. The structure of the return guide rail is the same as the structure of the guide rail strip and is inclined upward from front to back. When the lifting mechanism at the front end drives the lifting platform to the upper limit position, the front end of the return guide rail corresponds to the end limiting guide rail strip on it, and the limiting groove between the two is connected. When the lifting mechanism at the rear end drives the lifting platform to the upper limit position, the rear end of the return guide rail corresponds to the end limiting guide rail strip on it, and the limiting groove between the two is connected. Therefore, in the actual return process, the washing basket at the rear end will return to its original position after unloading. The hydraulic cylinder of the tail lifting mechanism drives the lifting platform to its upper limit position, connecting the limiting groove on the side of the lifting platform with the limiting groove at the tail of the return guide rail. Then, the circular conveyor belt mechanism is activated to transfer the support rollers at both ends of the cleaning basket to the return guide rail. Since the return guide rail is inclined, the basket slides down to the front end under the action of gravity. At the same time, the front lifting mechanism is activated to raise the front lifting platform to its upper limit position and connect the limiting groove of its side guide rail with the limiting groove at the front end of the return guide rail. As the cleaning basket slides into the return guide rail to the front end, the side support rollers slide into the limiting groove on the side of the lifting platform, and the cleaning basket falls onto the circular conveyor belt of the lifting platform. Then, the lifting platform is controlled to descend to the initial loading position for loading, thus completing the return process of the cleaning basket. The return process is simple, fast, stable, and efficient.

[0030] The drying mechanism is located at the rear end of the frame near the discharge port and is used for drying the silicon wafers in the cleaning basket. The filtration mechanism is located at the bottom of the water tank and is used for filtering the cleaning solution in the water tank. In this embodiment, as shown... Figure 6 , Figure 8 As shown, to improve drying efficiency, the drying mechanism includes a drying chamber shell 31, a baffle door 32, a fan 33, and a fan support plate 34. The drying chamber shell is installed inside the frame at the rear side, near the discharge port, and above the rear drive roller of the rear conveyor chain. Two baffle doors are installed at the front and rear openings of the drying chamber shell, respectively, to open and close the openings. A rectangular opening is provided on the horizontal plate below the rear drive roller. The fan support plate is fixed below the rectangular opening. Multiple fans are fixed on the fan support plate, with their impellers 35 positioned above the fan support plate and facing the rear drive roller. Therefore, after the cleaning basket is cleaned, the rear drive roller transports the silicon wafers into the cleaning chamber. The baffle door closes, and the fan is started to drive the impeller to dry the silicon wafers in the cleaning basket within the rear drive roller. To improve drying efficiency, heating tubes can be installed on the fan support plate to heat the drying chamber, further enhancing the drying efficiency.

[0031] In this embodiment, to further improve the filtration effect, such as Figure 7 As shown, the filtration mechanism includes a filter tank 36, a water tank 37, a water pipe 38, a check valve 39, a diversion pipe 40, and a control valve 41. One end of the filter tank is connected to the control valve, and the other end is connected to the water tank via a water pipe. The other end of the control valve is connected to the cleaning fluid drain port at the bottom of the water tank. The other end of the water tank is connected to the check valve via a water pipe, and the other end of the check valve is connected to the diversion pipe. Multiple outlets of the diversion pipe are respectively connected to corresponding inlets at the bottom of the water tank. Therefore, in practical applications, when the control valve is opened, the cleaning fluid in the water tank will flow from the bottom to the filter tank. The cleaning fluid filtered by the filter tank will further flow into the water tank for storage through a pipe. A water pump is installed in the water tank, and the outlet of the water pump is connected to the outlet of the water tank. When cleaning fluid needs to be supplied to the water tank, the water pump is started to output the filtered cleaning fluid from the water tank and enter the water tank through multiple inlets at the bottom of the water tank via the diversion pipe, thereby completing the circulation filtration process and reducing secondary contamination of the silicon wafer by the cleaning fluid.

[0032] Therefore, in the actual silicon wafer cleaning process, the silicon wafer is transported to the cleaning basket on the lifting platform of the front-end lifting mechanism. The cleaning basket is located on the circular conveyor belt on the lifting platform, with its two end support rollers placed in the limiting grooves of the side guide rails. Then, the circular conveyor belt is started, transporting the cleaning basket to the horizontal transmission rollers of the first set of front-end conveyor chain assemblies at the rear. It then continues to be transported to the transmission rollers of the water tank transmission roller group until the cleaning basket is transported to the first water tank for ultrasonic cleaning. After cleaning, the transmission rollers are started, and the cleaning basket in the first water tank is transported to the second set of front-end conveyor chain assemblies for further transmission. This transmission process is repeated until the cleaning basket is transported to the... Ultrasonic cleaning is performed in the second water tank. This process is repeated until the silicon wafers in the cleaning basket have been cleaned in all three water tanks. Then, the rear conveyor chain assembly is activated to transport the cleaning basket to the rear drying chamber for drying. After drying, the rear baffle is opened, and the rear drive rollers continue to transport the cleaning basket to the circular conveyor belt on the lifting platform of the rear lifting mechanism. The cleaned and dried silicon wafers are then unloaded. The empty cleaning basket is lifted by the lifting mechanism to the return guide rail, and then returned to the front lifting platform. It is then reloaded for the next cleaning and drying process. This cycle is repeated to achieve the cleaning and drying process of the silicon wafers.

[0033] It should be emphasized that the above are merely preferred embodiments of the present invention and are not intended to limit the present invention in any way. Any simple modifications, equivalent changes and alterations made to the above embodiments based on the technical essence of the present invention shall still fall within the scope of the technical solution of the present invention.

Claims

1. An ultrasonic cleaning machine for solar silicon wafers, characterized in that: The system includes a frame, a cleaning basket, a water tank, a conveying mechanism, a lifting mechanism, a drying mechanism, and a filtering mechanism. The front and rear ends of the frame are the inlet and outlet, respectively. The lifting mechanism consists of two sets, which are respectively located at the front and rear ends of the frame and are used for the lifting and lowering of the cleaning basket. The water tank consists of multiple water tanks, which are arranged in a straight line at intervals within the frame and are used to hold the cleaning solution. The drying mechanism is located at the rear end of the frame near the outlet and is used to dry the silicon wafers in the cleaning basket. The filtering mechanism is located at the bottom of the water tank and is used to filter the cleaning solution in the water tank. The conveying mechanism is located within the frame and is used to transport the cleaning basket from the front inlet to the outlet, passing through each water tank in sequence. The water tank and the frame are connected and fixed by a fixing plate assembly. The fixing plate assembly includes a horizontal plate and a side guard plate. The horizontal plate is horizontally connected and fixed between the water tank and the frame, and its surface is flush with the opening of the water tank. The side guard plate is located outside the horizontal plate and fixed on the frame. The conveying mechanism includes a front-end conveyor chain assembly, a rear-end conveyor chain assembly, and a guide rail assembly. The front-end conveyor chain assembly includes three sets, each corresponding to one of the three water tanks. It includes a reduction motor, a transmission roller assembly, and a conveyor chain. Two parallel transmission roller support plates are provided on the horizontal plate, arranged vertically from front to back. The width between the transmission roller support plates is the same as the width of the water tank. The transmission roller assembly includes a horizontal roller assembly and a water tank roller assembly. The horizontal roller assembly includes multiple transmission rollers arranged at intervals between the two transmission roller support plates and located above the horizontal plate. The water tank roller assembly includes multiple transmission rollers, and the two ends of the transmission rollers are fixed to the left and right side plates of the water tank. The distance between the transmission rollers and the front and rear plates and the bottom plate of the water tank is the same. The guide rail assembly includes two sets, each including a guide rail strip and a guide rail support plate. The two guide rail support plates are vertically mounted on the two transmission roller support plates. The guide rail strip includes two L-shaped support plates and is symmetrically arranged inside the guide rail support plates. A limiting groove is formed between the two L-shaped support plates to allow the support rollers at both ends of the cleaning basket to roll freely within it. A transmission plane or curved surface is formed between the upper surfaces of the roller shafts of the multiple transmission rollers. The distance between the guide rail strip and the transmission plane or curved surface is consistent. When the cleaning basket is placed on the transmission rollers for transmission, the support rollers at both ends are placed in the limiting groove and keep them rolling freely. The lifting mechanism includes a ring conveyor belt device, a lifting platform, a hydraulic cylinder, a support plate, guide columns, a top plate, a base plate, and a lifting bracket. The base plate is fixed to the bottom of the lifting bracket, and the support plate is fixed to the top of the lifting bracket and is horizontally positioned. The lifting platform is placed above the support plate, and end guide rail support plates are provided on both sides of it. The width between the end guide rail support plates is the same as the width between the guide rail support plates. The end guide rail support plates are provided with end limiting guide rails that correspond to the guide rails and have the same structure. The hydraulic cylinder is vertically positioned, and its cylinder body is fixed to the base plate at the bottom. The piston rod end of its upper end passes through the middle of the support plate and is connected to the middle position of the bottom of the lifting platform. There are two guide columns, located on both sides of the lifting platform, with their lower ends connected to both ends of the support plate and their upper ends connected to both ends of the top plate. The sides of the lifting platform are provided with sliding seats that are looped around the guide columns. The ring conveyor belt... The device is mounted on a lifting platform and used to transport a cleaning basket placed thereon. A return guide rail mechanism is provided on the top of the frame. The return guide rail mechanism includes a top fixing plate, side plates, and a return guide rail. The top fixing plate is fixed to the top of the frame and is horizontally arranged. There are two side plates, which are vertically fixed to the lower side plate of the top fixing plate. The distance between the two side plates is the same as the distance between the guide rail support plates. The structure of the return guide rail is the same as that of the guide rail strip and is inclined upward from front to back. When the lifting mechanism at the front end drives the lifting platform to the upper limit position, the front end of the return guide rail corresponds to the end limiting guide rail strip on it, and the limiting groove between the two is connected. When the lifting mechanism at the rear end drives the lifting platform to the upper limit position, the rear end of the return guide rail corresponds to the end limiting guide rail strip on it, and the limiting groove between the two is connected.

2. The ultrasonic cleaning machine for solar silicon wafers according to claim 1, characterized in that: The water tank includes three tanks, with the front and rear side plates being inclined plates and the left and right side plates being vertical plates. Multiple ultrasonic transducers are provided on the bottom plate of the water tank, and the power and frequency of the ultrasonic transducers provided under each water tank are different.

3. The ultrasonic cleaning machine for solar silicon wafers according to claim 1, characterized in that: Two coaxial drive sprockets are provided at one end of the drive roller. The two adjacent drive sprockets are connected by a transmission chain. The geared motor is fixed to the bottom of the horizontal plate by a fixed base plate and is connected to the drive sprocket at the far end by a chain drive. The rear transmission chain assembly is located between the rear of the water tank and the discharge port. It includes multiple rear drive rollers and a rear geared motor. The rear drive rollers are installed and fixed between the drive roller support plates at intervals and are located above the horizontal plate. Two coaxial drive sprockets are provided at one end of the rear drive roller. The two adjacent drive sprockets are connected by a transmission chain. The rear geared motor is fixed to the bottom of the horizontal plate by a fixed base plate and is connected to the drive sprocket at the far end of the rear drive roller by a chain drive. The guide rail assembly is provided on the side of the drive roller and is used to limit the position of the cleaning basket on the drive roller.

4. The ultrasonic cleaning machine for solar silicon wafers according to claim 1, characterized in that: The drying mechanism includes a drying chamber shell, a wind deflector, a fan, and a fan support plate. The drying chamber shell is installed inside the rear side of the frame, near the discharge port, and above the rear drive roller of the rear conveyor chain. There are two wind deflectors, which are respectively installed at the front and rear openings of the drying chamber shell and realize the opening and closing action of the front and rear openings of the drying chamber shell. A rectangular opening is opened on the horizontal plate below the rear drive roller. The fan support plate is fixed below the rectangular opening. There are multiple fans, which are fixed on the fan support plate and their impellers are located above the fan support plate and facing the direction of the rear drive roller.

5. The ultrasonic cleaning machine for solar silicon wafers according to claim 4, characterized in that: The filtration mechanism includes a filter tank, a water tank, a water pipe, a check valve, a diversion pipe, and a control valve. One end of the filter tank is connected to the control valve, and the other end is connected to the water tank via a water pipe. The other end of the control valve is connected to the cleaning liquid drain port at the bottom of the water tank. The other end of the water tank is connected to the check valve via a water pipe. The other end of the check valve is connected to the diversion pipe, and the multiple outlets of the diversion pipe are respectively connected to the corresponding inlets at the bottom of the water tank.

6. The ultrasonic cleaning machine for solar silicon wafers according to claim 1, characterized in that: The frame is equipped with a protective plate on the outside, and the protective plate has multiple transparent acrylic plates for observation.

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