Plasma cleaning chambers and plasma cleaning equipment

Abstract

This invention discloses a plasma cleaning chamber and a plasma cleaning device. The plasma cleaning chamber includes a chamber body and a support member. The chamber body has a cleaning chamber and an air inlet communicating with the cleaning chamber. The support member is rotatably disposed within the cleaning chamber, and its rotation axis intersects the air inlet direction. The support member is used to hold the workpiece to be cleaned. This invention improves the applicability of the plasma cleaning device to different types of workpieces.

Description

Technical Field

[0001] This invention relates to the field of plasma cleaning equipment technology, and in particular to a plasma cleaning box and plasma cleaning equipment using the plasma cleaning box. Background Technology

[0002] Currently, in the use of plasma cleaning equipment, the parts to be cleaned are usually placed in a fixed position within the plasma cleaning chamber. This means that only parts with the area to be cleaned facing the air inlet of the plasma cleaning chamber can be placed inside, resulting in relatively poor applicability of this type of plasma cleaning equipment to the parts to be cleaned. Summary of the Invention

[0003] The main objective of this invention is to provide a plasma cleaning chamber, which aims to improve the applicability of plasma cleaning equipment to different types of parts to be cleaned.

[0004] To achieve the above objectives, the plasma cleaning chamber proposed in this invention is applied to plasma cleaning equipment, and the plasma cleaning chamber includes:

[0005] The box body, wherein a cleaning chamber is provided inside the box body, and an air inlet communicating with the cleaning chamber is also provided in the box body; and

[0006] A carrier is rotatably disposed within the cleaning chamber, the axis of rotation of the carrier intersecting the air intake direction of the air inlet, and the carrier is used to place the item to be cleaned.

[0007] Optionally, the carrier includes:

[0008] A first plate, one end of which is rotatably connected to the box body; and

[0009] The second plate has one end rotatably connected to the other end of the first plate, and the end of the second plate away from the first plate is detachably connected to the box body.

[0010] Optionally, the wall of the cleaning chamber with the air inlet is defined as the first wall. The cleaning chamber also has a second wall, a third wall and a fourth wall. The second wall and the first wall are arranged opposite to each other, the third wall and the fourth wall are arranged opposite to each other, and are respectively connected to the same end of the first wall and the second wall.

[0011] The end of the first plate away from the second plate is rotatably connected to the second cavity wall and / or the third cavity wall. The first plate is also set at an angle to both the second cavity wall and the third cavity wall. The end of the second plate away from the first plate is detachably connected to the fourth cavity wall.

[0012] Optionally, the plasma cleaning chamber further includes a clamping member disposed on the second cavity wall and spaced apart from the third cavity wall;

[0013] The clamping member, the second cavity wall, and the third cavity wall together form a clamping gap, and the end of the first plate away from the second plate is rotatably inserted into the clamping gap.

[0014] Optionally, the fourth cavity wall is provided with a plurality of overlapping portions, and the plurality of overlapping portions are sequentially distributed along the direction from the first cavity wall to the second cavity wall;

[0015] The second plate has a hook-on portion at one end away from the first plate. The hook-on portion is hooked onto one of the overlapping portions, so that the end of the second plate away from the first plate is detachably connected to the fourth cavity wall.

[0016] Optionally, the second plate includes two sub-plates, one of which is rotatably connected to the first plate and the other is detachably connected to the fourth cavity wall.

[0017] Optionally, the plasma cleaning chamber further includes an auxiliary pad, which is movably disposed on the side of the first plate and / or the second plate facing the first cavity wall to limit the cleaning parts placed on the carrier.

[0018] And / or, the auxiliary pad is movably disposed on the side of the second plate facing the second cavity wall to support the second plate.

[0019] Optionally, the auxiliary pad includes at least one of a triangular prism, a square prism with a square cross-section, and a right trapezoidal prism with a square cross-section;

[0020] And / or, a cushioning pad is attached to the outer side of the auxiliary pad;

[0021] And / or, the auxiliary pad has a hollow structure.

[0022] Optionally, the auxiliary pad is a magnetically attracted metal part, and the plasma cleaning box also includes an electromagnet, which is located on the side of the second plate facing the second cavity wall.

[0023] The present invention also proposes a plasma cleaning device, including the plasma cleaning chamber described above.

[0024] When the plasma cleaning chamber of this invention is applied in a plasma cleaning equipment, the support member for placing the parts to be cleaned within the cleaning chamber of the chamber body is configured to rotate, and the rotation axis of the support member intersects with the air intake direction of the air inlet on the chamber body. This allows for adjustment of the placement of the parts to be cleaned within the cleaning chamber. Parts with planar, inclined, or arc-shaped cleaning portions can all be aligned with the air inlet by rotating and adjusting the support member. In other words, the structural design of the plasma cleaning chamber in this invention allows the plasma cleaning equipment to clean various types of parts, thereby improving the applicability of the plasma cleaning equipment to different types of parts. Attached Figure Description

[0025] To more clearly illustrate the technical solutions in the embodiments of the present invention or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of the present invention. For those skilled in the art, other drawings can be obtained based on the structures shown in these drawings without creative effort.

[0026] Figure 1 This is a schematic diagram of the structure of an embodiment of the plasma cleaning equipment of the present invention;

[0027] Figure 2 for Figure 1 A schematic diagram of a partial structure of a medium-ion cleaning device from a certain perspective.

[0028] Figure 3 for Figure 2 Another perspective schematic diagram of a partial structure of a medium-ion cleaning device;

[0029] Figure 4 for Figure 2 Another perspective schematic diagram of a partial structure of a medium-ion cleaning device;

[0030] Figure 5 for Figure 2 An exploded structural diagram of a portion of a medium-ion cleaning device.

[0031] Figure 6 for Figure 1 A schematic diagram showing the placement of parts to be cleaned in a medium-ion cleaning chamber;

[0032] Figure 7 for Figure 6 An exploded structural diagram of a medium-ion cleaning chamber;

[0033] Figure 8 for Figure 6 A schematic diagram showing the state of another item to be cleaned placed in the medium ion cleaning chamber.

[0034] Explanation of icon numbers:

[0035]

[0036]

[0037] The realization of the objective, functional features and advantages of the present invention will be further explained in conjunction with the embodiments and with reference to the accompanying drawings. Detailed Implementation

[0038] The technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only a part of the embodiments of this application, and not all of the embodiments. Based on the embodiments of this application, all other embodiments obtained by those of ordinary skill in the art without creative effort are within the scope of protection of this application.

[0039] It should be noted that all directional indicators (such as up, down, left, right, front, back, etc.) in the embodiments of this application are only used to explain the relative positional relationship and movement of each component in a certain specific posture (as shown in the figure). If the specific posture changes, the directional indicator will also change accordingly.

[0040] In this application, unless otherwise expressly specified and limited, the terms "connection," "fixed," etc., should be interpreted broadly. For example, "fixed" can mean a fixed connection, a detachable connection, or an integral part; it can mean a mechanical connection or an electrical connection; it can mean a direct connection or an indirect connection through an intermediate medium; it can mean the internal communication of two components or the interaction between two components, unless otherwise expressly limited. Those skilled in the art can understand the specific meaning of the above terms in this application according to the specific circumstances.

[0041] Furthermore, the use of terms such as "first" and "second" in this application is for descriptive purposes only and should not be construed as indicating or implying their relative importance or implicitly specifying the number of technical features indicated. Therefore, a feature defined as "first" or "second" may explicitly or implicitly include at least one of those features. Additionally, the word "and / or" throughout the text means including three parallel solutions; for example, "A and / or B" includes solution A, solution B, or a solution that simultaneously satisfies A and B. Furthermore, the technical solutions of the various embodiments can be combined with each other, but this must be based on the ability of a person skilled in the art to implement them. When the combination of technical solutions is contradictory or impossible to implement, it should be considered that such a combination of technical solutions does not exist and is not within the scope of protection claimed in this application.

[0042] Plasma cleaning equipment is a cleaning chamber that can form a vacuum inside. Process gas (such as oxygen or nitrogen) is introduced into the vacuum cleaning chamber, and high-energy disordered plasma is generated by the ignition of a radio frequency power supply under a certain pressure. The plasma bombards the surface of the workpiece to be cleaned, thereby achieving the purpose of cleaning.

[0043] However, in current plasma cleaning equipment, the parts to be cleaned are typically placed in a fixed position within the plasma cleaning chamber. This means that only parts with the area to be cleaned facing the air inlet of the plasma cleaning chamber can be placed inside, resulting in relatively poor applicability of this type of plasma cleaning equipment to the parts to be cleaned.

[0044] Therefore, based on the above considerations, and in order to address the relatively poor applicability of current plasma cleaning equipment to the parts to be cleaned, this application proposes a novel plasma cleaning chamber. This plasma cleaning chamber innovatively incorporates a rotatable support component within the cleaning chamber of the chamber body. By rotating this support component, the placement of the parts to be cleaned on it can be adjusted, allowing the plasma cleaning equipment to clean parts with different shapes, thereby improving the applicability of the plasma cleaning equipment to different types of parts.

[0045] The structure of the plasma cleaning box proposed in this application will be explained and described below with specific embodiments. Please refer to the references. Figure 1 and Figure 2 In one embodiment of this application, the plasma cleaning chamber 10 proposed in this application includes a chamber body 11 and a support member 13. The chamber body 11 is provided with a cleaning chamber 111, and the chamber body 11 is also provided with an air inlet 117 communicating with the cleaning chamber 111; the support member 13 is rotatably disposed in the cleaning chamber 111, and the rotation axis of the support member 13 intersects the air inlet direction of the air inlet 117. The support member 13 is used to place the workpiece 300 to be cleaned.

[0046] The box body 11 can be used to form a cleaning chamber 111, providing a cleaning space for the workpiece 300 to be cleaned. The box body 11 can be a square structure (including square and rectangular) to make its shape more regular, thus facilitating its processing and forming. Of course, the box body 11 can also be a circular structure or other shapes; this application does not limit the specific structure of the box body 11. The shape of the cleaning chamber 111 can be adapted to the shape of the box body 11. For example, when the box body 11 is a square structure, the cleaning chamber 111 can be correspondingly square, so that the thickness of the box body 11 can be set relatively uniformly, reducing the possibility of deformation due to uneven stress during forming, thus improving the forming quality of the box body 11. The air inlet 117 can be used to connect to the air supply system of the plasma cleaning equipment 100, allowing process gas to enter the cleaning chamber 111. An air inlet valve can be provided at the air inlet 117 to control the air intake. In addition, when the plasma cleaning equipment 100 is in normal use and installation state, the air inlet 117 can be located on the top wall of the cleaning chamber 111. Of course, it is also possible to locate the air inlet 117 on other walls of the cleaning chamber 111. This application does not limit the location of the air inlet 117.

[0047] The carrier 13 is used to place the part to be cleaned 300 so that it can be placed in the cleaning chamber 111 for cleaning. The carrier 13 can be a plate or a base structure. One end of the plate or base can be rotatably connected to the side wall or bottom wall of the cleaning chamber 111. Furthermore, the plate or base can be rotatably connected via a damping shaft, or a support member can be provided below the plate or base to limit and fix it after rotational adjustment. Alternatively, the carrier 13 can include a first plate 131 and a second plate 133, as described below, with the first plate 131 rotatably connected to the box body 11 and the second plate 133 detachably connected to the box body 11. Therefore, this application does not limit the structural form and shape of the carrier 13, as long as it can be rotated and adjusted. Additionally, the rotation axis of the carrier 13 can be perpendicular to the air intake direction of the air inlet 117. For example, when the air intake direction of the air inlet 117 is vertical, the rotation axis of the support member 13 can be horizontal. Alternatively, the rotation axis of the support member 13 can be at an acute angle to the air intake direction of the air inlet 117. For example, when the air intake direction of the air inlet 117 is vertical, the rotation axis of the support member 13 can be inclined at an angle to both the horizontal and vertical directions. Therefore, this application does not limit the specific angle between the rotation axis of the support member 13 and the air intake direction of the air inlet 117, as long as the cleaning part of the component 300 placed on the support member 13 is properly aligned with the air inlet 117 of the box body 11 when the support member 13 is rotated and adjusted.

[0048] When the plasma cleaning chamber 10 in the technical solution of this application is applied in the plasma cleaning equipment 100, the support member 13 for placing the part to be cleaned 300 in the cleaning chamber 111 of the chamber body 11 is set to rotate, and the rotation axis of the support member 13 and the air intake direction of the air inlet 117 on the chamber body 11 are intersected. This allows the placement state of the part to be cleaned 300 in the cleaning chamber 111 to be adjusted, so that the part to be cleaned 300 with a planar part to be cleaned, or a sloped part to be cleaned, or an arc-shaped part to be cleaned, can all be adjusted by rotating the support member 13 so that the part to be cleaned in the part to be cleaned can be better oriented towards the air inlet 117. That is, the structure of the plasma cleaning chamber 10 in this solution enables the plasma cleaning equipment 100 to clean various types of parts 300, thereby improving the applicability of the plasma cleaning equipment 100 to different types of parts 300.

[0049] Please refer to the reference. Figures 2 to 4In one embodiment of this application, the carrier 13 includes a first plate 131 and a second plate 133. One end of the first plate 131 is rotatably connected to the box body 11. One end of the second plate 133 is rotatably connected to the other end of the first plate 131. The end of the second plate 133 away from the first plate 131 is detachably connected to the box body 11.

[0050] In this embodiment, the support member 13 is configured to include a first plate 131 and a second plate 133. The first plate 131 is rotatably connected to the box body 11, and the second plate 133 is detachably connected to the box body 11. This allows the second plate 133 to be connected to the corresponding position on the box body 11 after the first plate 131 and the second plate 133 are rotated and adjusted to the desired angle position, thereby achieving rotatable adjustment of both the first plate 131 and the second plate 133. At this time, the item to be cleaned 300 can be placed on either the first plate 131 or the second plate 133, and the first plate 131 and the second plate 133 are rotatably connected, allowing the item to be cleaned 300 to be placed on the first plate 131 and the second plate 133 with different orientations. Therefore, the carrier 13 has more diverse placement states for the workpiece 300 to be cleaned, so as to accommodate more different types of workpieces 300 to be cleaned, thereby further improving the applicability of the plasma cleaning equipment 100 to various workpieces 300 to be cleaned. Moreover, at this time, since both the first plate 131 and the second plate 133 can be rotated and adjusted, the limiting of the first plate 131 and the second plate 133 after rotation is simpler, which helps to simplify the structure of the carrier 13 and the box body 11, thereby improving the ease of manufacturing the plasma cleaning box 10. The rotational connection between the first plate 131 and the box body 11 can be as described below, where one end of the first plate 131 is rotatably inserted into the clamping gap 151 formed by the box body 11 and a clamping member 15. Of course, it can also be rotatably connected to the box body 11 by rotating a rotating shaft. The rotational connection method of the first plate 131 is not limited in this application, as long as it can be rotated and adjusted. The separable connection between the second plate 133 and the box body 11 can be achieved by using a combination of the hook part 135 and the overlapping part 116 as described below for movable hooking. Of course, it can also be achieved by magnetic connection or screw connection, etc. This application does not limit this.

[0051] In one embodiment of this application, the wall of the cleaning chamber 111 with an air inlet 117 is defined as the first cavity wall 112. The cleaning chamber 111 also has a second cavity wall 113, a third cavity wall 114, and a fourth cavity wall 115. The second cavity wall 113 and the first cavity wall 112 are arranged opposite to each other, and the third cavity wall 114 and the fourth cavity wall 115 are arranged opposite to each other and are respectively connected to the same end of the first cavity wall 112 and the second cavity wall 113. The end of the first plate 131 away from the second plate 133 is rotatably connected to the second cavity wall 113 and / or the third cavity wall 114. The first plate 131 is also arranged at an angle with both the second cavity wall 113 and the third cavity wall 114. The end of the second plate 133 away from the first plate 131 is detachably connected to the fourth cavity wall 115.

[0052] In this embodiment, the air inlet 117 is disposed on the first cavity wall 112, the first plate 131 is rotatably connected to the second cavity wall 113 and / or the third cavity wall 114, and the second plate 133 is detachably connected to the fourth cavity wall 115, so that when the part to be cleaned 300 is placed on the first plate 131 and / or the second plate 133, the part to be cleaned 300 can be better oriented toward the air inlet 117, so as to ensure the cleaning effect of the part to be cleaned 300. Furthermore, by setting the first plate 131 at an angle to both the second cavity wall 113 and the third cavity wall 114, the second plate 133 can have a relatively large size between the third cavity wall 114 and the fourth cavity wall 115. This allows smaller parts to be cleaned 300 to be placed on the first plate 131, while larger parts can be placed on the second plate 133. This enables adaptive placement of parts 300 of different sizes, further improving the applicability of the plasma cleaning equipment 100 to different types of parts 300. Additionally, by detachably connecting the second plate 133 to the second cavity wall 113, the second plate 133 can be parallel to or at an angle to the first cavity wall 112, thereby increasing the diversity of subsequent placement configurations of the parts 300. When the plasma cleaning equipment 100 is in normal use, the first cavity wall 112 can be the top wall of the cleaning cavity 111, the second cavity wall 113 can be the bottom wall of the cleaning cavity 111, and the third cavity wall 114 and the fourth cavity wall 115 can be the side walls of the cleaning cavity 111.

[0053] Please refer to the reference. Figures 2 to 5 In one embodiment of this application, the plasma cleaning chamber 10 further includes a clamping member 15, which is disposed on the second cavity wall 113 and spaced apart from the third cavity wall 114; the clamping member 15, the second cavity wall 113 and the third cavity wall 114 surround to form a clamping gap 151, and one end of the first plate 131 away from the second plate 133 is rotatably inserted into the clamping gap 151.

[0054] In this embodiment, the clamping member 15, the second cavity wall 113, and the third cavity wall 114 can be used to form a clamping gap 151, and the spacing of the clamping gap 151 can be greater than the thickness of the first plate 131, thereby allowing the first plate 131 to rotate when inserted into the clamping gap 151. Since there is no need to provide a rotating connection structure on the first plate 131, and only one clamping member 15 needs to be provided on the second cavity wall 113 of the box body 11, the structures of both the first plate 131 and the box body 11 can be relatively simple, further simplifying the connection structure between the carrier 13 and the box body 11, thus improving the ease of manufacturing the plasma cleaning box 10. The clamping member 15 can be a plate structure, and its shape can be adapted to the shape of the cleaning cavity 111. Furthermore, the clamping member 15 can be directly and movably placed on the second cavity wall 113, thus omitting the connection structure of the clamping member 15 and further simplifying the structure of the box body 11 and the clamping member 15. Of course, the clamping member 15 can also be connected by any method such as screw connection, magnetic connection, snap connection, adhesive connection, or welding connection. In addition, after the first plate 131 is rotated and adjusted, it can be limited by the cooperation of the third cavity wall 114, the fourth cavity wall 115, and the second plate 133 so that the first plate 131 is kept in the rotated state.

[0055] Please refer to the reference. Figures 2 to 5 In one embodiment of this application, the fourth cavity wall 115 is provided with a plurality of overlapping portions 116, which are arranged sequentially along the direction of the first cavity wall 112 toward the second cavity wall 113; the second plate 133 is provided with a hanging portion 135 at one end away from the first plate 131, and the hanging portion 135 is hung on one of the overlapping portions 116 so that the end of the second plate 133 away from the first plate 131 is detachably connected to the fourth cavity wall 115.

[0056] In this embodiment, by providing multiple overlapping portions 116 on the fourth cavity wall 115 and a hanging portion 135 on the second plate 133, after the first plate 131 and the second plate 133 are rotated and adjusted, the second plate 133 can be hung on a corresponding overlapping portion 116 via the hanging portion 135, thereby limiting the position of the first plate 131 and the second plate 133 after rotational adjustment. Since this hanging process is relatively simple, it improves the convenience of rotating and adjusting the support member 13, thus improving the ease of use of the plasma cleaning chamber 10. Simultaneously, this arrangement also simplifies the connection structure between the second plate 133 and the chamber body 11, further simplifying the structure of the plasma cleaning chamber 10 and improving its manufacturing convenience. Both the hook-on portion 135 and the overlapping portion 116 can be arc-shaped plate structures (the concave arc surface of the hook-on portion 135 can face the second cavity wall 113, and the concave arc surface of the overlapping portion 116 can face the first cavity wall 112) so that the two can be fastened together, thereby improving the stability of the connection between the second plate 133 and the box body 11. Of course, both the hook-on portion 135 and the overlapping portion 116 can also be flat plate structures, and the overlapping portion 116 can even be a groove structure provided in the fourth cavity wall 115.

[0057] Please refer to the reference. Figures 2 to 5 In one embodiment of this application, the second plate 133 includes two sub-plates 137, one of which is rotatably connected to the first plate 131, and the other is detachably connected to the fourth cavity wall 115.

[0058] In this embodiment, the second plate 133 is further configured to include two rotatably connected sub-plates 137. This allows the two sub-plates 137 to be adjusted to a parallel position to support a large, flat-bottomed workpiece 300. When a workpiece 300 has a curved bottom, the two sub-plates 137 can be adjusted to an angle to support it. Therefore, this structure of the second plate 133 ensures stable support for both large, flat, and curved-bottomed workpieces, thereby increasing the range of workpieces 300 that the support member 13 can accommodate and improving the applicability of the plasma cleaning equipment 100 to different types of workpieces 300. The sub-plate 137 furthest from the first plate 131 may be provided with the aforementioned hanging part 135.

[0059] Please refer to the reference. Figures 6 to 8In one embodiment of this application, the plasma cleaning chamber 10 further includes an auxiliary pad 17, which is movably disposed on the side of the first plate 131 and / or the second plate 133 facing the first cavity wall 112, so as to limit the cleaning part 300 placed on the carrier 13.

[0060] In this embodiment, the auxiliary pads 17 are provided so that after the part to be cleaned 300 is placed on the support member 13, auxiliary pads 17 can be further placed on opposite sides of the part to be cleaned 300. The auxiliary pads 17 can further limit the position of the part to be cleaned 300 on the support member 13, thereby improving the stability of the part to be cleaned 300 on the support member 13 and ensuring the cleaning effect. The auxiliary pads 17 can include at least one of the following: a triangular prism, a square prism, or a right-angled trapezoidal prism. For example: Figure 6 and Figure 7 As shown, when dealing with a relatively small part 300 to be cleaned, after rotating and adjusting the first plate 131 to the required angle, a triangular prism can be placed between the first plate 131 and the third cavity wall 114. The part 300 to be cleaned is then placed on this triangular prism, and a square-section quadrangular prism is placed between the part 300 to be cleaned and the first cavity wall 112. A right-angled trapezoidal quadrangular prism (with its inclined surface abutting against the first plate 131) is placed between the part 300 to be cleaned and the first plate 131, thus achieving a relatively stable placement of the part 300. When dealing with a cylindrical part 300 to be cleaned, as... Figure 8As shown, after rotating and adjusting the two sub-plates 137 of the first plate 131 and the second plate 133 to the required angle, the part to be cleaned 300 is placed between the two sub-plates 137 of the second plate 133. Then, right-angled trapezoidal prisms are placed on opposite sides of the part to be cleaned 300 (the inclined surfaces of these two right-angled trapezoidal prisms can abut against the side circumference of the part to be cleaned 300 respectively), thus achieving a relatively stable placement of the part to be cleaned 300. When dealing with a relatively thin part to be cleaned 300, the part to be cleaned 300 can be placed on one of the two sub-plates 137 of the second plate 133. Then, a square prism and a right-angled trapezoidal prism can be placed on opposite sides of the part to be cleaned 300 respectively, thus achieving a relatively stable placement of the part to be cleaned 300. When dealing with a conical part 300 to be cleaned, it can be placed between two sub-plates 137 at an angle within the second plate 133, with triangular prisms on opposite sides of the part 300 to abut against its side surfaces, thus achieving a relatively stable placement. Therefore, depending on the shape of the part 300, appropriate auxiliary pads 17 can be flexibly selected to further limit the placement of the part 300 on the support 13, improving the stability of various types of parts 300. In this case, there is no need to manufacture corresponding contour seats for each part 300 to limit its placement, and the shapes of the auxiliary pads 17 are relatively simple, which further improves the ease of manufacturing the plasma cleaning chamber 10 and reduces manufacturing costs. It should be noted that the specific dimensions and shapes of each auxiliary pad 17 can be adapted to actual needs. In addition, the auxiliary pad 17 can also be movably disposed on the side of the second plate 133 facing the second cavity wall 113 to support the second plate 133, thereby improving the stability of the second plate 133 in supporting the workpiece 300 to be cleaned. Specifically, when the workpiece 300 to be cleaned is located on only one sub-plate 137 of the second plate 133, the auxiliary pad 17 can be disposed below the sub-plate 137 on which the workpiece 300 to be cleaned is placed; when the workpiece 300 to be cleaned is located on two sub-plates 137 of the second plate 133, the auxiliary pad 17 can be disposed below both sub-plates 137.

[0061] In one embodiment of this application, a cushioning pad is attached to the outer side of the auxiliary pad 17.

[0062] In this embodiment, the buffer pad can cushion the interaction between the auxiliary pad 17 and the part 300 to be cleaned, reducing the possibility that the surface of the part 300 to be cleaned may be damaged by the auxiliary pad 17, thereby improving the safety of the part 300 to be cleaned during the cleaning process. The buffer pad can be a silicone pad or a rubber pad, and is wrapped around the outside of the auxiliary pad 17.

[0063] In one embodiment of this application, the auxiliary pad 17 has a hollow structure.

[0064] In this embodiment, the auxiliary pad 17 is designed as a hollow structure to make it lighter and thus improve its ease of use. Furthermore, this design also reduces the amount of raw materials required to manufacture the auxiliary pad 17, thereby lowering its manufacturing cost.

[0065] Please refer to Figure 3 In one embodiment of this application, the auxiliary pad 17 is a magnetically attracted metal part, and the plasma cleaning box 10 also includes an electromagnet 19, which is disposed on the side of the second plate 133 facing the second cavity wall 113.

[0066] In this embodiment, the auxiliary pad 17 is configured to be a magnetically attracted metal part, and an electromagnet 19 is further provided on the side of the second plate 133 facing the second cavity wall 113. This allows the auxiliary pad 17 to be firmly attracted to the second plate 133 after the electromagnet 19 is energized, thereby improving the limiting effect of the auxiliary pad 17 on the part to be cleaned 300. The electromagnet 19 can be provided on both sub-plates 137 of the second plate 133. The electromagnet 19 can be an electromagnetic chuck, or it can be an electromagnet.

[0067] Please refer to the reference. Figures 1 to 8This application also proposes a plasma cleaning device 100, which includes a plasma cleaning chamber 10. The specific structure of the plasma cleaning chamber 10 is as described in the above embodiments. Since this plasma cleaning device 100 adopts all the technical solutions of all the above embodiments, it has at least all the beneficial effects brought about by the technical solutions of the above embodiments, and will not be described in detail here. The plasma cleaning device 100 may further include an organic body 30, which may be provided with a receiving cavity 31 and a loading / unloading port 33 communicating with the receiving cavity 31, as well as a movable door 35 that movably covers the loading / unloading port 33. In this case, the plasma cleaning chamber 10 can be disposed within the receiving cavity 31, and the opening of the plasma cleaning chamber faces the loading / unloading port 33. In addition, the plasma cleaning equipment 100 may also be equipped with a vacuum system 50, a gas supply system, and a microwave discharge system 90 within the accommodating cavity 31. The vacuum system 50 is used to evacuate the cleaning chamber 111 of the plasma cleaning tank 10, the gas supply system supplies process gas to the cleaning chamber 111, and the microwave discharge system 90 discharges the process gas. Since the cleaning principle of the plasma cleaning equipment 100 is existing technology, other devices used in conjunction with the plasma cleaning tank 10 will not be described in detail here.

[0068] The above description is merely a preferred embodiment of this application and does not limit the patent scope of this application. Any equivalent structural transformations made based on the inventive concept of this application and the contents of the specification and drawings of this application, or direct / indirect applications in other related technical fields, are included within the patent protection scope of this application.

Claims

1. A plasma cleaning chamber, used in plasma cleaning equipment, characterized in that, The plasma cleaning chamber includes: The box body has a cleaning chamber inside and an air inlet communicating with the cleaning chamber. The wall of the cleaning chamber with the air inlet is defined as a first wall. The cleaning chamber also has a second wall, a third wall, and a fourth wall. The second wall and the first wall are opposite to each other, and the third wall and the fourth wall are opposite to each other, respectively connected to the same end of the first wall and the second wall. A carrier is rotatably disposed within the cleaning chamber, the axis of rotation of the carrier intersects the air intake direction of the air inlet, and the carrier is used to place the item to be cleaned; The supporting member includes a first plate and a second plate. One end of the second plate is rotatably connected to the other end of the first plate. The end of the first plate away from the second plate is rotatably connected to the second cavity wall and / or the third cavity wall. The first plate is also set at an angle to both the second cavity wall and the third cavity wall. The second plate includes two sub-plates. One of the two sub-plates is rotatably connected to the first plate, and the other is detachably connected to the fourth cavity wall. The fourth cavity wall is provided with multiple overlapping parts, and the multiple overlapping parts are arranged sequentially along the direction of the first cavity wall facing the second cavity wall. The end of the second plate away from the first plate is provided with a hanging part, and the hanging part is hung on one of the overlapping parts, so that the end of the second plate away from the first plate is detachably connected to the fourth cavity wall. A clamping member is disposed on the second cavity wall and spaced apart from the third cavity wall; The clamping member, the second cavity wall, and the third cavity wall form a clamping gap, and the end of the first plate away from the second plate is rotatably inserted into the clamping gap; An auxiliary pad is movably disposed on the side of the first plate and the second plate facing the first cavity wall to limit the position of the part to be cleaned placed on the support member; the auxiliary pad is movably disposed on the side of the second plate facing the second cavity wall to support the second plate; the auxiliary pad includes at least one of a triangular prism, a square prism, and a right trapezoidal prism.

2. The plasma cleaning chamber as described in claim 1, characterized in that, A cushioning pad is attached to the outer side of the auxiliary pad block; And / or, the auxiliary pad is a hollow structure.

3. The plasma cleaning chamber as described in claim 1, characterized in that, The auxiliary pad is a magnetically attracted metal part, and the plasma cleaning box also includes an electromagnet, which is located on the side of the second plate facing the second cavity wall.

4. A plasma cleaning device, characterized in that, Includes the plasma cleaning chamber as described in any one of claims 1 to 3.

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