A target support

Abstract

The application provides a target material support and relates to the technical field of coating equipment. The target material on the target material base is aligned with the ion source by rotating the steering part connected with the steering shaft part and driving the steering support by the steering shaft part. During the process of bombarding the target material on the target material base by the ion source, the lifting assembly on the target material base performs lifting with a lifting distance less than 1 cm, drives the target material base to lift with a lifting distance less than 1 cm, and makes the ion beam always keep at 90 degrees in the beam path between the ion source, the target material on the target material base and the workpiece disc above the target material. The ion density in the middle of the high-energy ion beam is large, the ion density in the outer periphery is small, the target material is not in the form of annular depression after continuous sputtering under the kinetic energy bombardment, the target material surface is no longer a flat structure, and the phenomenon of uneven deposition of target material atoms in the sputtering process is avoided, so that the coating of the workpiece and the substrate surface is uniform.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of coating equipment, in particular to a target material support. BACKGROUND

[0002] The ion sputtering coating machine is a process that high-energy ion beams generated by an ion source bombard a target material placed in a high vacuum, so that target atoms are sputtered out and recombined on the surface of a substrate to form a thin film. In the existing ion sputtering coating equipment, the position of the target material surface bombarded by the high-energy ion beams is in a fixed state during the process of depositing optical thin films by ion sputtering.

[0003] In the prior art, on the one hand, due to the fixed direction of the high-energy ion beams and the face contact form of the high-energy ion beams and the target material, the ion density in the middle of the high-energy ion beams is large, and the ion density at the outer periphery is small. Under the strong kinetic energy bombardment, after continuous sputtering of the target material, the surface of the target material is no longer a flat structure, but forms a ring-shaped depression, which easily causes the phenomenon of non-uniform deposition of target atoms in the sputtering process, resulting in non-uniform coating of the workpiece and the substrate surface.

[0004] Therefore, the above technical problems need to be further solved. SUMMARY

[0005] The purpose of the embodiment of the present application is to provide a target material support to avoid the situation that the surface of the target material is no longer a flat structure but forms a ring-shaped depression after continuous sputtering of the target material under the kinetic energy bombardment due to the large ion density in the middle of the high-energy ion beams and the small ion density at the outer periphery, thereby avoiding the phenomenon of non-uniform deposition of target atoms in the sputtering process and achieving uniform coating of the workpiece and the substrate surface.

[0006] To solve the above technical problems, the embodiment of the present application provides the following technical scheme:

[0007] The first aspect of the present application provides a target material support, comprising:

[0008] A turning shaft piece is connected to a turning piece and rotates in a coating chamber;

[0009] A turning support is arranged on the surface of the turning shaft piece and connected to the turning shaft piece;

[0010] A target material base frame is connected to the end of the turning support away from the turning shaft piece;

[0011] A lifting assembly is connected to the target material base frame and lifts on the target material base frame;

[0012] A target material base is in contact with the end of the lifting assembly away from the target material base frame;

[0013] a first recess assembly respectively arranged on the target base located at the lifting assembly;

[0014] a first protrusion assembly respectively arranged at the end of the lifting assembly away from the side of the target base and in contact with the first recess assembly;

[0015] wherein the lifting distance of the lifting assembly on the target base is less than 1 cm.

[0016] Further, the lifting assembly comprises:

[0017] a first column connected with the first protrusion assembly;

[0018] a second column in contact with the end of the first column away from the side of the target base;

[0019] a first space located inside the end of the first column close to the side of the second column;

[0020] a first stepper motor arranged at the end of the second column close to the side of the first column and located in the first space;

[0021] a lead screw having one end connected with the output shaft of the first stepper motor and the other end connected with the first column, the lead screw driving the first column to lift in the first space along with the operation of the first stepper motor.

[0022] Further, the first recess assembly comprises:

[0023] a groove respectively arranged on the target base close to the first column;

[0024] a first connecting ring arranged on the outer periphery of the groove edge;

[0025] a first connecting hole arranged on the first connecting ring;

[0026] Further, the first protrusion assembly comprises:

[0027] a connecting ball located at the end of the first column close to the side of the groove and in contact with the groove;

[0028] a second connecting ring arranged on the outer periphery of the connecting ball and connected with the end of the first column close to the side of the connecting ball;

[0029] a second connecting hole arranged on the second connecting ring and connected with the first connecting hole through a connecting member;

[0030] wherein the diameter of the annular face of the second connecting ring close to the side of the connecting ball is less than the diameter of the connecting ball.

[0031] Further, the connecting ball rotates simultaneously inside the second connecting ring and the end of the first column when the first column and the second column are lifted.

[0032] Further, the surface of the target base near the target base side is rectangular, and the surface of the target base near the target base side is rectangular.

[0033] The target base is three, the target base is three, and the long edge of each target base is extended to form a triangle on the steering support.

[0034] Further, the long edge length of the target base is the same as the radius of the workpiece disc.

[0035] The angle between the short edge of the target base where the target material is located and the workpiece during the coating process is 45°.

[0036] Further, when the target base swings through the steering support with the steering shaft piece, the connecting ball rotates simultaneously inside the second connecting ring and the end of the first column.

[0037] Further, the end of each target base away from the steering support side is simultaneously connected with a fixing piece.

[0038] Further, the movement method of the target support comprises:

[0039] The target installation step places the first target material on one target base and the second target material on the adjacent target base.

[0040] The deposition step uses the ion source to bombard the target material on the first target material to make the target material atoms on the first target material deposit on the workpiece disc.

[0041] The lifting assembly displacement step connects the second connecting ring and the first connecting ring through the connecting piece, makes the connecting ball contact the groove, drives the target lead screw to lift according to the target condition, and the lead screw drives the first column to lift less than 1 cm on the second column in the first space, so that the connecting ball rotates in the groove, thereby changing the angle of the target base connected with the connecting ball.

[0042] The rotation step rotates the steering shaft piece, drives the target base through the steering support on the steering shaft piece, makes the ion source bombard the target material on the second target material, and makes the target material atoms on the second target material deposit on the workpiece disc, and simultaneously repeats the lifting assembly displacement step for the lifting assembly connected with the target base where the second target material is located.

[0043] Compared with the prior art, the target support provided by the first aspect of the present application, by / through rotating the steering part connected with the steering shaft piece, the steering shaft piece drives the target material on the target material base to be aligned with the ion source, and in the process of the ion source bombarding the target material on the target material base, the lifting assembly on the target material base where the target material base is located is lifted by a lifting distance less than 1 cm, and the target material base is lifted by a lifting distance less than 1 cm, so that the beam path between the ion source and the target material on the target material base and the workpiece disc directly above the target material is always kept at 90 degrees. Therefore, the phenomenon that the target material surface is no longer a flat structure but forms a ring-shaped depression after the target material is continuously sputtered under the bombardment of high-energy ions is avoided, so that uniform deposition of target material atoms in the sputtering process is achieved, and uniform film plating of the workpiece and the substrate surface is achieved. BRIEF DESCRIPTION OF DRAWINGS

[0044] The above and other objects, features and advantages of the exemplary embodiments of the present application will be more apparent from the following detailed description read in conjunction with the accompanying drawings, in which several embodiments of the present application are shown by way of example, and wherein the same reference numerals refer to the same or similar components throughout several instances. In the drawings:

[0045] Figure 1 A schematic diagram of a film plating process structure of a target support is schematically shown;

[0046] Figure 2 A schematic diagram of a target material base and a lifting assembly and a target base before assembly is schematically shown;

[0047] Figure 3 A schematic diagram of a target material base and a lifting assembly and a target base after assembly is schematically shown;

[0048] Figure 4 A schematic diagram of a lifting assembly and a first protrusion assembly is schematically shown;

[0049] Figure 5 A schematic diagram of a first recess assembly is schematically shown;

[0050] Figure 6 A schematic diagram of a target support is schematically shown;

[0051] Figure 7 A schematic diagram of a target support is schematically shown;

[0052] BRIEF DESCRIPTION OF DRAWINGS

[0053] 1. Steering shaft piece;

[0054] 2. Target base

[0055] 3. Ion source

[0056] 4. Workpiece disk

[0057] 5. Target base

[0058] 6. Lifting assembly; 61, first column; 62, second column; 63, first space; 64, screw rod; 65, first stepper motor

[0059] 7. First protrusion assembly; 71, connecting ball; 72, second connecting ring; 73, second connecting hole

[0060] 8. First recess assembly; 81, recess; 82, first connecting ring; 83, first connecting hole

[0061] 9. Steering support DETAILED DESCRIPTION

[0062] Exemplary embodiments of the present disclosure will be described in greater detail below with reference to the accompanying drawings. While exemplary embodiments of the present disclosure are shown in the drawings, it is to be understood that the present disclosure can be variously implemented without being limited to the embodiments set forth herein. Rather, the embodiments are provided so that this disclosure will be thorough and complete, and will fully convey the scope of the present disclosure to those skilled in the art. Technical means used in the examples are conventional means well known to those skilled in the art, unless otherwise specified.

[0063] It is to be noted that technical terms or scientific terms used in the present disclosure should be understood as the general meaning understood by those skilled in the art to which the present disclosure pertains, unless otherwise specified. In this context, relational terms such as "first" and "second" and the like are used only to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply that there is any such actual relationship or order between the entities or operations. The terms "connected", "coupled", and the like should be interpreted broadly, for example, as fixedly connected, as detachably connected, or as integrated; as mechanically connected, as electrically connected; as directly connected, or as indirectly connected through an intermediate medium. The terms "include", "comprise" or any other variant thereof are intended to cover non-exclusive inclusion, so that a process, method, article, or apparatus including a series of elements includes not only those elements, but also other elements not explicitly listed, or other elements inherent to such a process, method, article, or apparatus. Without further limitation, the elements defined by the phrase "comprising" do not exclude the presence of additional identical elements in the process, method, article, or apparatus including the elements.

[0064] The embodiment of the present application provides a target support Figure 1 、 Figure 2 、 Figure 5 and Figure 6 , the target support comprises a turning shaft piece 1, a turning support 9, a target base 2, a lifting assembly 6, a target seat 5, a first recess assembly 8 and a first protrusion assembly 7. The turning shaft piece 1 is connected with a turning piece and rotates in a coating chamber. The turning support 9 is arranged on the surface of the turning shaft piece 1 respectively and is connected with the turning shaft piece 1. The target base 2 is connected with the end of the turning support 9 away from the turning shaft piece 1 respectively. The lifting assembly 6 is connected with the target base 2 respectively and lifts on the target base 2. The target seat 5 is in contact with the end of the lifting assembly 6 away from the target base 2. The first recess assembly 8 is arranged on the target seat 5 at the lifting assembly 6 respectively. The first protrusion assembly 7 is arranged at the end of the lifting assembly 6 away from the target base 2 respectively and is in contact with the first recess assembly 8. Wherein, the lifting distance of the lifting assembly 6 on the target base 2 is less than 1cm.

[0065] In the embodiment, by rotating the turning piece connected with the turning shaft piece 1, the turning shaft piece 1 drives the turning support 9 to aim the target on the target base 2 at the ion source 3, and the lifting assembly 6 lifts on the target base 2 where the target base 2 is less than 1cm during the process that the ion source 3 bombards the target on the target seat 5, drives the target base 2 to lift less than 1cm, and makes the beam path between the ion source 3 and the target on the target base 2 and the workpiece disc 4 above the target always keep 90 degrees. Therefore, the phenomenon that the target surface is no longer a flat structure and forms a ring-shaped depression after the target is continuously sputtered under the kinetic energy bombardment because the ion density in the middle of the high-energy ion beam is large and the ion density in the outer periphery is small is avoided, the phenomenon that the target atoms are not uniformly deposited in the sputtering process is avoided, and the coating of the workpiece and the substrate surface is uniform.

[0066] In specific embodiments, as shown in Figure 4 , the lifting assembly 6 comprises a first column piece 61, a second column piece 62, a first space 63, a first stepping motor 65 and a lead screw 64. The first column piece 61 is connected with the first protrusion assembly 7. The second column piece 62 is in contact with the end of the first column piece 61 away from the target base 2. The first space 63 is located inside the end of the first column piece 61 close to the second column piece 62. The first stepping motor 65 is arranged at the end of the second column piece 62 close to the first column piece 61 and is located in the first space 63. One end of the lead screw 64 is connected with the output shaft of the first stepping motor 65, the other end is connected with the first column piece 61, and the lead screw 64 drives the first column piece 61 to lift in the first space 63 with the operation of the first stepping motor 65.

[0067] In the embodiment, the first column 61 and the second column 62 are connected by the first stepper motor 65 and the screw rod 64 located in the first space 63. One end of the screw rod 64 is connected with the output shaft of the first stepper motor 65, and the other end is connected with the first column 61. Thus, when the first stepper motor 65 operates in the first space 63, the screw rod 64 drives the first column 61 to lift and lower by a distance less than 1 cm.

[0068] According to different application requirements, the number of the second column 62 can be three or four.

[0069] In the embodiment, as shown in Figure 5 The first recess assembly 8 includes a groove 81, a first connecting ring 82, and a first connecting hole 83. The groove 81 is arranged on the target base 5 near the first column 61. The first connecting ring 82 is arranged on the outer periphery of the edge of the groove 81. The first connecting hole 83 is arranged on the first connecting ring 82.

[0070] In the embodiment, the groove 81 is arranged on the target base 5. The first connecting ring 82 is arranged on the outer periphery of the edge of the groove 81. The plurality of first connecting holes 83 arranged on the first connecting ring 82 are used for connecting the connecting member. Thus, the target base 5 is connected with the first protrusion assembly 7 on the first column 61.

[0071] In the embodiment, as shown in Figure 4 The first protrusion assembly 7 includes a connecting ball 71, a second connecting ring 72, and a second connecting hole 73. The connecting ball 71 is arranged at the end of the first column 61 near the groove 81 and in contact with the groove 81. The second connecting ring 72 is arranged on the outer periphery of the connecting ball 71 and connected with the end of the first column 61 near the connecting ball 71. The second connecting hole 73 is uniformly arranged on the second connecting ring 72 and connected with the first connecting hole 83 through the connecting member. The diameter of the ring surface of the second connecting ring 72 near the connecting ball 71 is smaller than the diameter of the connecting ball 71.

[0072] In the embodiment, when the first column 61 lifts and lowers, the connecting ball 71 rotates in the groove 81, the inside of the second connecting ring 72, and the end of the first column 61 near the groove 81.

[0073] In order to make the connecting ball 71 rotate stably in the inside of the second connecting ring 72 and the end of the first column 61 near the groove 81, the diameter of the ring surface of the second connecting ring 72 near the connecting ball 71 is smaller than the diameter of the connecting ball 71. That is, the second connecting ring 72 prevents the connecting ball 71 from being separated from the end of the first column 61 during rotation.

[0074] According to different application cases, the first connecting ring 82 and the second connecting ring 72 are fastened or not fastened.

[0075] Exemplarily, when any first column 61 does not need to be lifted, a bolt is used as a connecting piece to fasten the first connecting hole 83 and the second connecting hole 73, so as to avoid loosening between the first connecting ring 82 and the second connecting ring 72. At this time, the first column 61 and the second column 62 are in a contact state, which is equivalent to one column.

[0076] Exemplarily, when the target first column 61 needs to be lifted, a connecting ring or a connecting chain is used as a connecting piece to connect the first connecting hole 83 and the second connecting hole 73, so as to connect the first connecting ring 82 and the second connecting ring 72 and give the connecting ball 71 sufficient rotation time in the groove 81 and the end of the first connecting column and the connecting ring during lifting of the first column 61. Thus, it is beneficial for the target first column 61 to complete lifting with a lifting distance less than 1 cm.

[0077] In order to make the target first column 61 further complete lifting with a lifting distance less than 1 cm, in specific embodiments, in combination with Figure 4 and Figure 5 When the first column 61 and the second column 62 are lifted, the connecting ball 71 rotates in the interior of the second connecting ring 72 and the end of the first column 61 at the same time.

[0078] In order to make the ion beam always keep 90 degrees in the beam path between the ion source 3 and the target on the target base 2 and the workpiece disc 4 directly above the target, in specific embodiments, as shown in Figure 4 The surface of the target base 5 close to the target base 2 side is rectangular, and the surface of the target base 2 close to the target base 5 side is rectangular.

[0079] The target base 5 is three, the target base 2 is three, and the long edge extension line of each target base 2 forms a triangle on the turning bracket 9.

[0080] In order to further make the ion beam always keep 90 degrees in the beam path between the ion source 3 and the target on the target base 2 and the workpiece disc 4 directly above the target, in specific embodiments, in combination with Figure 1 and Figure 6 The long edge length of the target base 2 is the same as the radius of the workpiece disc 4.

[0081] The angle between the short edge of the target base 2 where the target material is located and the workpiece is 45°, so that the ion beam path between the ion source 3, the target material on the target base 2 and the workpiece disc 4 above the target material is always kept at 90°, thereby achieving more uniform deposition of target material atoms to the workpiece disc 4 side.

[0082] In order to keep the ion beam path between the ion source 3, the target material on the target base 2 and the workpiece disc 4 above the target material at 90° during the process of the ion source 3 bombarding the target material, in the specific embodiment, when the target base 2 is swung with the turning shaft piece 1 through the turning support 9, the connecting ball 71 is also rotated inside the second connecting ring 72 and the end of the first column 61.

[0083] In order to further stabilize the three target bases 2 during the process of the ion source 3 bombarding the target material, in the specific embodiment, the end of each target base 2 away from the turning support 9 is simultaneously connected with a fixing piece.

[0084] In the present embodiment, the fixing piece and the three target bases 2 are detachably connected.

[0085] In the specific embodiment, as shown in Figure 7 The movement method of the target support includes:

[0086] The target material installation step is to place a first target material on one target base and a second target material on the adjacent target base.

[0087] The deposition step is to use the ion source to bombard the target material on the first target material, so that the target material atoms on the first target material are deposited on the workpiece disc.

[0088] The lifting assembly displacement step is to connect the second connecting ring with the first connecting ring through the connecting piece, so that the connecting ball is in contact with the groove, the first stepper motor drives the target lead screw to lift according to the target condition, the lead screw drives the first column to lift on the second column by less than 1 cm in the first space, the connecting ball rotates in the groove, so that the target base in contact with the connecting ball changes the angle.

[0089] The rotation step is to rotate the turning shaft piece, drive the target base through the turning support on the turning shaft piece, so that the ion source bombards the target material on the second target material, the target material atoms on the second target material are deposited on the workpiece disc, and the lifting assembly displacement step is repeated for the lifting assembly connected with the target base where the second target material is located.

[0090] In the embodiment, the movement method of the target material support can avoid the situation that the surface of the target material is no longer a flat structure but forms a ring-shaped depression after continuous sputtering under kinetic bombardment because the ion density in the middle of the high-energy ion beam is large and the ion density in the periphery is small, thereby avoiding the phenomenon of non-uniform deposition of target atoms in the sputtering process, and achieving uniform coating of the workpiece and the substrate surface.

[0091] The above is only a specific embodiment of the present application, but the protection scope of the present application is not limited thereto, any person skilled in the art can easily think of changes or replacements within the technical range disclosed by the present application, which should be covered within the protection scope of the present application. Therefore, the protection scope of the present application should be subject to the protection scope of the claims.

Claims

1. A target support, characterized in that, The target material support comprises: a rotating shaft piece connected with the rotating member and rotating in the coating chamber; a rotating support arranged on the surface of the rotating shaft piece and connected with the rotating shaft piece; a target material base frame connected with the end of the rotating support away from the rotating shaft piece; a lifting assembly connected with the target material base frame and lifting on the target material base frame; a target material base connected with the end of the lifting assembly away from the target material base frame; a first recess assembly arranged on the target material base at the lifting assembly; a first protrusion assembly arranged at the end of the lifting assembly away from the target material base frame and in contact with the first recess assembly; wherein the lifting distance of the lifting assembly on the target material base frame is less than 1 cm; the lifting assembly comprises: a first column piece connected with the first protrusion assembly; a second column piece in contact with the end of the first column piece away from the target material base frame; a first space inside the end of the first column piece close to the second column piece; a first stepping motor arranged at the end of the second column piece close to the first column piece and in the first space; a lead screw having one end connected with the output shaft of the first stepping motor and the other end connected with the first column piece, the lead screw driving the first column piece to lift in the first space along with the operation of the first stepping motor; the first recess assembly comprises: a groove arranged on the target material base close to the first column piece; a first connecting ring arranged on the outer periphery of the edge of the groove; first connecting holes arranged on the first connecting ring; the first protrusion assembly comprises: a connecting ball arranged at the end of the first column piece close to the groove and in contact with the groove; a second connecting ring arranged on the outer periphery of the connecting ball and connected with the end of the first column piece close to the connecting ball; second connecting holes arranged on the second connecting ring and connected with the first connecting holes through connecting pieces; wherein the diameter of the ring surface of the second connecting ring close to the connecting ball is less than the diameter of the connecting ball; when the first column piece and the second column piece lift, the connecting ball rotates in the interior of the second connecting ring and the end of the first column piece at the same time; the long edge length of the target material base frame is the same as the radius of the workpiece disc; the included angle between the short edge of the target material base frame where the target material is located and the workpiece is 45° during the coating process; when the target material base frame swings through the rotating support along with the rotating shaft piece, the connecting ball rotates in the interior of the second connecting ring and the end of the first column piece at the same time.

2. The target material support according to claim 1, wherein the surface of the target material base close to the target material base frame is rectangular, and the surface of the target material base frame close to the target material base is rectangular; the target material base is three, the target material base frame is three, and the long edges of the target material base frames extend to form a triangle on the rotating support.

3. The target support of claim 1, wherein, The end of each target base away from the turning support is connected with a fixing sheet.

4. The target support of claims 1-3, wherein, The movement method of the target support comprises: a target installation step of placing a first target on a target base and a second target on a neighboring target base; a deposition step of bombarding the target on the first target with an ion source to make the target atoms on the first target deposit on a workpiece disk; a lifting assembly displacement step of connecting the second connecting ring with the first connecting ring through a connecting piece, making the connecting ball contact the groove, driving the target lead screw according to the target condition by the first stepping motor, making the first column member lift and descend on the second column member by less than 1 cm in the first space, and making the connecting ball rotate in the groove, so that the target base in contact with the connecting ball changes the angle; a turning step of turning the turning shaft sheet, driving the target base to turn through the turning support on the turning shaft sheet, making the ion source bombard the target on the second target to make the target atoms on the second target deposit on the workpiece disk, and repeating the lifting assembly displacement step for the lifting assembly connected with the target base of the second target.

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