A production method for removing platinum defects from a glass substrate

Abstract

The present disclosure relates to a production method for removing platinum defects of a glass substrate, which comprises: when the defect rate of a glass product does not meet the defect rate of a good product, increasing the flow rate of a platinum channel and the temperature of a muffle to high-load glass production processing conditions, so that the defects of the platinum channel can quickly enter the muffle at a faster flow rate and volatilize at a higher temperature of the muffle, the platinum defects of the platinum channel can be quickly eliminated, and the stability of the glass production line operation can be improved.

Description

TECHNICAL FIELD

[0001] The present disclosure relates to the field of glass manufacturing, in particular, to a production method for removing platinum defects of a glass substrate. BACKGROUND

[0002] In the process of manufacturing a glass sheet by the overflow downdraw method, raw materials are melted at high temperature by a kiln, then clarified, homogenized, stirred and cooled at high temperature by a platinum channel to form a glass liquid meeting the conditions, the glass liquid enters an overflow brick through a feeding pipe, is divided into two streams after overflowing the top of the overflow brick, and is combined into one stream at the bottom of the overflow brick, and the combination of the two streams is a combination surface. Platinum volatiles generated in the heating process of the platinum channel reach the muffle furnace through the glass liquid, and defects are generated at the combination surface, which has a great impact on the rapid production of the production line.

[0003] In the patent CN202210178308.X, it is proposed to control the heating rate of the platinum channel to avoid platinum defects. In production practice, platinum defects may still occur in the new production line, and the production line needs to be put into production again after eliminating the defects by increasing the temperature of the muffle furnace area for several days, and the above steps are repeated when the defects occur again, which affects the rapid production of the production line. SUMMARY

[0004] The purpose of the present disclosure is to provide a production method for removing platinum defects of a glass substrate, and to solve the problems of easy generation of platinum defects and impact on the production line in the prior art.

[0005] To achieve the above-mentioned purpose, the present disclosure provides a production method for removing platinum defects of a glass substrate, which comprises:

[0006] S1, making the initial molten glass liquid sequentially pass through a platinum channel, a muffle furnace, a forming furnace and an annealing furnace for normal glass preparation treatment to obtain a glass product; the conditions of the normal glass preparation treatment include that the flow rate of the initial molten glass liquid in the platinum channel is a first flow rate Q1, and the temperature of the muffle furnace is a first temperature T1;

[0007] S2, testing the defect rate of the glass product to obtain a real-time defect rate K1 of the glass product;

[0008] S3, when the real-time defect rate K1 is greater than a good product defect rate K0, switching the initial molten glass liquid from the normal glass preparation treatment to a high-load glass preparation treatment; the conditions of the high-load glass preparation treatment include that the flow rate of the initial molten glass liquid in the platinum channel is a second flow rate Q2, and the temperature of the muffle furnace is a second temperature T2;

[0009] S4, until the real-time defect rate K1 decreases to below K0, switching the initial molten glass liquid from the high-load glass preparation treatment to the normal glass preparation treatment;

[0010] The good product defect rate K0 is 2-3%; the difference between the first flow rate Q1 and the second flow rate Q2 is 30-60 kg / h; and the difference between the first temperature T1 and the second temperature T2 is 30-40℃.

[0011] Optionally, the switching of the initial molten glass liquid from the normal glass preparation process to the high-load glass preparation process in step S3 comprises: S31, performing a programmed flow increasing process on the flow rate of the initial molten glass liquid in the platinum channel to increase the flow rate from the first flow rate Q1 to the second flow rate Q2; and performing a programmed temperature increasing process on the temperature of the muffle furnace to increase the temperature from the first temperature T1 to the second temperature T2.

[0012] Optionally, the programmed flow increasing process in step S31 comprises: S311, increasing the flow rate of the initial molten glass liquid in the platinum channel by a change flow rate value α and then operating for 12-24 h; S312, increasing the flow rate of the initial molten glass liquid in the platinum channel by the change flow rate value α again and then operating for 24-36 h; and S313, repeating the operation of step S312 until the flow rate of the initial molten glass liquid in the platinum channel is increased to the second flow rate Q2 and then operating for 36-48 h; and the change flow rate value α is 10-30 kg / h.

[0013] Optionally, the programmed temperature increasing process in step S31 comprises: step S311, increasing the temperature of the muffle furnace by a change temperature value β and then operating for 12-24 h; step S312, increasing the temperature of the muffle furnace by the change temperature value β again and then operating for 24-36 h; and step S313, repeating the operation of step S312 until the temperature of the muffle furnace is increased to the second temperature T2 and then operating for 36-48 h; and the change temperature value β is 10-20℃.

[0014] Optionally, the ratio of the value of the change flow rate value α to the value of the change temperature value β is (1-1.2):1.

[0015] Optionally, the flow increasing rate of the programmed flow increasing process is 6-10 kg / h; and the temperature increasing rate of the programmed temperature increasing process is 6-8℃ / h.

[0016] Optionally, the conditions of the normal glass preparation process further comprise that the power of the heating module in the shaping furnace is a first heating power W1; and the rotating speed of the traction roller in the annealing furnace is a first rotating speed O1; the first heating power W1 is 35000-40000 W; and the first rotating speed O1 is 3200-3300 mm / min.

[0017] Optionally, step S3 further comprises: S32, reducing the power of the heating module in the setting furnace from the first heating power W1 to a second heating power W2; S33, increasing the rotating speed of the traction roller in the annealing furnace from the first rotating speed O1 to a second rotating speed O2; the second heating power W2 is 32000-36000W; the second rotating speed O2 is 3300-3450mm / min.

[0018] Optionally, step S32 further comprises: S321, operating the heating module in the setting furnace for 12-24h after reducing the power of the heating module by a power variation value γ; S322, operating the heating module in the setting furnace for 24-36h after reducing the power of the heating module again by the power variation value γ; S323, repeating step S322 until the power of the heating module in the setting furnace is reduced to the second heating power W2, and operating for 36-48h; the power variation value γ is 1000-2000W.

[0019] Optionally, step S33 further comprises: S331, operating the traction roller in the annealing furnace for 12-24h after increasing the rotating speed of the traction roller by a rotating speed variation value η; S332, operating the traction roller in the annealing furnace for 24-36h after reducing the rotating speed of the traction roller again by the rotating speed variation value η; S333, repeating step S332 until the rotating speed of the traction roller in the annealing furnace is reduced to the second rotating speed O2, and operating for 36-48h; the rotating speed variation value η is 33-75mm / min.

[0020] Through the above technical solution, when the defect rate of the glass product does not meet the defect rate of a good product, the flow rate of the platinum channel and the temperature of the muffle furnace are increased to high-load glass preparation processing conditions, so that the defects of the platinum channel can quickly enter the muffle furnace at a faster flow rate and volatilize at a higher temperature in the muffle furnace, the platinum defects of the platinum channel can be quickly eliminated, and the stability of the glass production line operation can be improved.

[0021] Other features and advantages of the present disclosure will be described in detail in the following detailed description section. BRIEF DESCRIPTION OF DRAWINGS

[0022] The accompanying drawings are included to provide a further understanding of the present disclosure and constitute a part of the specification, and are used together with the following detailed description to explain the present disclosure, but do not constitute a limitation on the present disclosure. In the drawings:

[0023] Figure 1 is a schematic diagram of a system for removing platinum defects of a glass substrate.

[0024] LEGEND OF DRAWINGS

[0025] 1, kiln; 11, charging device; 2, platinum channel; 21, stirring rod; 3, muffle; 31, overflow brick; 32, heating module; 4, sizing furnace; 41, heating module; 5, annealing furnace; 51, pulling roller; 52, heating module;

[0026] a1, initial melting glass liquid; a2, homogeneous glass liquid; a3, glass substrate. DETAILED DESCRIPTION

[0027] The specific embodiments of the present disclosure are described in detail below with reference to the accompanying drawings. It should be understood that the specific embodiments described herein are merely intended to illustrate and explain the present disclosure, and are not intended to limit the present disclosure.

[0028] In the present disclosure, the orientation words such as "up, down" used without the opposite description generally refer to the up and down of the device in the normal use state, for example, referring to the figure surface direction of Figure 1 , "inner, outer" refers to relative to the device profile. In addition, the terms "first, second" are only for descriptive purposes, and cannot be understood or implied to indicate or imply relative importance or implicitly indicate the number of indicated technical features. Therefore, the features defined as "first, second" can explicitly or implicitly include one or more features. In the description of the present disclosure, the meaning of "a plurality of" is two or more, unless otherwise specifically limited.

[0029] As shown in Figure 1 , the present disclosure provides a production method for removing platinum defects of a glass substrate, the production method comprising: S1, making an initial melting glass liquid sequentially undergo normal glass preparation treatment in a platinum channel 2, a muffle 3, a sizing furnace 4 and an annealing furnace 5 to obtain a glass product; the conditions of the normal glass preparation treatment include: the flow rate of the initial melting glass liquid in the platinum channel 2 is a first flow rate Q1, and the temperature of the muffle 3 is a first temperature T1;

[0030] S2, testing the glass product for defect rate to obtain a real-time defect rate K1 of the glass product;

[0031] S3, when the real-time defect rate K1 is greater than a good product defect rate K0, switching the initial melting glass liquid from the normal glass preparation treatment to a high-load glass preparation treatment; the conditions of the high-load glass preparation treatment include: the flow rate of the initial melting glass liquid in the platinum channel 2 is a second flow rate Q2, and the temperature of the muffle 3 is a second temperature T2;

[0032] S4, until the real-time defect rate K1 decreases to below K0, switching the initial melting glass liquid from the high-load glass preparation treatment to the normal glass preparation treatment;

[0033] The defect rate K0 is 2-3%; the difference between the first flow rate Q1 and the second flow rate Q2 is 30-60 kg / h; and the difference between the first temperature T1 and the second temperature T2 is 30-40℃.

[0034] Through the above technical solution, when the defect rate of the glass product does not meet the defect rate of the good product, the flow rate of the platinum channel and the temperature of the muffle furnace are increased to high-load glass preparation conditions, so that the defects in the platinum channel can enter the muffle furnace quickly at a faster flow rate and volatilize at a higher temperature in the muffle furnace, which can quickly eliminate the platinum defects in the platinum channel, thereby improving the stability of the glass production line operation.

[0035] like Figure 1 As shown, the glass production method in step S1 includes: feeding glass raw materials into furnace 1 via feeding device 11 to melt them, obtaining initial melt glass a1; feeding the obtained initial melt glass a1 into platinum channel 2 for homogenization treatment, obtaining homogenized glass a2; feeding the homogenized glass a2 into muffle furnace 3 through the outlet of platinum channel 2, spreading it out under the action of overflow brick 31 to form glass substrate a3; feeding the glass substrate into shaping furnace 4 and annealing furnace in sequence for subsequent processing, obtaining glass products.

[0036] In this embodiment, the furnace 1 melts the glass raw materials entering it; the platinum channel 2 transforms the initially melted glass liquid a1 with uneven viscosity obtained in the furnace 1 into a homogeneous glass liquid a2 with uniform viscosity in the platinum channel 2; the muffle furnace 3 ensures that the glass liquid overflows evenly onto the overflow brick 31; the shaping furnace 4 gradually transforms the overflowed glass liquid from a liquid state into a viscoelastic solid state; and the annealing furnace 5 cools the viscoelastic solid glass plate to form a hardened solid plate. The homogeneous glass liquid a2 produced by the platinum channel 2 contains a large amount of restorative substances, resulting in platinum particles distributed across the entire surface of the glass substrate a3 produced by the muffle furnace 3. Although the density is low, these particles are visible to the naked eye, causing the glass substrate to be continuously rejected.

[0037] In order to improve the homogenization effect, the platinum channel 2 is also equipped with a stirring rod 21.

[0038] Among them, heating modules 32, 41 and 52 are respectively provided in muffle furnace 3, shaping furnace 4 and annealing furnace 5, which are used to heat the materials entering each device.

[0039] The annealing furnace 5 is also equipped with a traction roller 51, which is used to limit the thickness of the glass product.

[0040] In one embodiment, the method for performing defect rate testing in step S2 is a conventional choice in the art, and this application does not make any special requirements, as long as the real-time defect rate K1 of the glass product can be detected quickly.

[0041] In one embodiment, the acceptable defect rate K0 of the glass product refers to the maximum value of the defect rate of the glass product considered as acceptable. The specific value of the acceptable defect rate needs to be determined according to the industry standard of the produced glass, for example, the acceptable defect rate of the glass substrate prepared in the present application is 2-3%, preferably 2%.

[0042] In one embodiment, when the real-time defect rate K1 of the glass product is greater than the acceptable defect rate K0, the glass product at this time is unqualified and needs to be scrapped or remelted; when the real-time defect rate K1 of the glass product is below the acceptable defect rate K0, the glass product at this time is acceptable and can be directly sold as a product.

[0043] In one embodiment, when the real-time defect rate K1 of the glass product is greater than the acceptable defect rate K0, the initial molten glass liquid a1 needs to be subjected to high-load glass preparation processing to gradually reduce the real-time defect rate K1 of the glass product until the defect rate K1 is reduced to below the acceptable defect rate K0; when the real-time defect rate K1 of the glass product is below the acceptable defect rate K0, the initial molten glass liquid a1 can be subjected to normal glass preparation processing.

[0044] In one embodiment, the conditions of the normal glass preparation processing include that the flow rate of the platinum channel 2 is the first flow rate Q1, the first flow rate Q1 is 440-450 kg / h; the temperature of the muffle furnace 3 is the first temperature T1, the first temperature T1 is 1220-1230℃; the power of the heating module 41 in the shaping furnace 4 is the first heating power W1, the first heating power W1 is 35000-40000 W; the rotating speed of the traction roller 51 in the annealing furnace 5 is the first rotating speed O1, the first rotating speed O1 is 3200-3300 mm / min.

[0045] In one embodiment, the conditions of the high-load glass preparation processing include that the flow rate of the platinum channel 2 is the second flow rate Q2; the temperature of the muffle furnace 3 is the second temperature T2; the power of the heating module 41 in the shaping furnace 4 is the second heating power W2; the rotating speed of the traction roller 51 in the annealing furnace 5 is the second rotating speed O2.

[0046] In this embodiment, the specific value of the high-load glass preparation processing needs to be determined according to the specific change amount of the flow rate of the platinum channel 2 and the temperature of the muffle furnace 3. Preferably, the difference between the first flow rate Q1 and the second flow rate Q2 is 30-60 kg / h; the difference between the first temperature T1 and the second temperature T2 is 30-40℃.

[0047] In one embodiment, the step S3 of switching the initial molten glass liquid from the normal glass preparation processing to the high-load glass preparation processing includes:

[0048] S31, the flow of the initial melting glass liquid in the platinum channel 2 is increased to the second flow Q2 by a programmed flow increasing process; the temperature of the muffle furnace 3 is increased to the second temperature T2 by a programmed temperature increasing process.

[0049] S32, the power of the heating module 41 in the shaping furnace 4 is decreased to the second heating power W2 from the first heating power W1;

[0050] S33, the rotating speed of the traction roller 51 in the annealing furnace 5 is decreased to the second rotating speed O2 from the first rotating speed O1;

[0051] The second flow Q2 is 470-510 kg / h, the second temperature T2 is 1250-1270℃, the second heating power W2 is 32000-36000 W, and the second rotating speed O2 is 3300-3450 mm / min.

[0052] In this embodiment, step S31 is the main step, which plays a dominant role, and steps S32 and S33 are set to match step S31. On the one hand, the thickness of the glass product is maintained at 0.3-0.6 mm, preferably 0.4-0.5 mm. On the other hand, the glass production line can still operate normally after the parameters of the platinum channel 2 and the muffle furnace 3 are changed.

[0053] In a preferred embodiment, the programmed flow increasing process in step S31 comprises:

[0054] S311, the flow of the initial melting glass liquid in the platinum channel 2 is increased by a change flow value α and then runs for 12-24 h; the temperature of the muffle furnace 3 is increased by a change temperature value β and then runs for 12-24 h;

[0055] S312, the flow of the initial melting glass liquid in the platinum channel 2 is increased by the change flow value α again and then runs for 24-36 h; the temperature of the muffle furnace 3 is increased by the change temperature value β again and then runs for 24-36 h;

[0056] S313, the operation of step S312 is repeated until the flow of the initial melting glass liquid in the platinum channel 2 is increased to the second flow Q2 and then runs for 36-48 h; and until the temperature of the muffle furnace 3 is increased to the second temperature T2 and then runs for 36-48 h;

[0057] The change flow value α is 10-30 kg / h, and the change temperature value β is 10-20℃.

[0058] In this embodiment, the disclosure adopts single small amplitude to increase the flow of platinum channel 2 and the temperature of muffle, and reaches the set value of the method through multiple increases, which can further improve the stability of the glass production line. Among them, the change flow value α is realized by increasing the feeding amount of the kiln and adjusting the power of the platinum channel, and the flow value is confirmed by the plate weighing; the change temperature value β is determined by increasing the power of the heating unit in the muffle furnace, and the temperature is displayed by the platinum thermocouple in the muffle furnace.

[0059] In order to further improve the stability of the glass production line, the change of the flow of platinum channel 2 and the temperature of muffle is matched, specifically, the ratio of the value of the change flow value α to the change temperature value β is (1-1.2):1, preferably 1:1.

[0060] Among them, the flow increasing rate of the program flow increasing process is 6-10 kg / h; the temperature increasing rate of the program temperature increasing is 6-8 ℃ / h. In this embodiment, the program flow increasing process and the program temperature increasing are increased at a relatively uniform rate, which can further improve the stability of the glass production line.

[0061] Among them, step S32 further comprises: S321, the power of the heating module 41 in the shaping furnace 4 is reduced by the change power value γ from the first heating power W1 and runs for 12-24h;

[0062] S322, the power of the heating module 41 in the shaping furnace 4 is reduced by the change power value γ again and runs for 24-36h;

[0063] S323, repeat the operation of step S322 until the power of the heating module 41 in the shaping furnace 4 is reduced to the second heating power W2, and runs for 36-48h;

[0064] The change power value γ is 1000-2000W.

[0065] Among them, step S33 further comprises:

[0066] S331, the rotating speed of the traction roller 51 in the annealing furnace 5 is increased by the change rotating speed value η from the first rotating speed O1 and runs for 12-24h;

[0067] S332, the rotating speed of the traction roller 51 in the annealing furnace 5 is reduced by the change rotating speed value η again and runs for 24-36h;

[0068] S333, repeat the operation of step S332 until the rotating speed of the traction roller 51 in the annealing furnace 5 is reduced to the second rotating speed O2, and runs for 36-48h;

[0069] The change rotating speed value η is 33-75mm / min.

[0070] In the above embodiment, since the parameters of the shaping furnace 4 and the annealing furnace 5 need to be flexibly adjusted according to the flow rate of the platinum channel 2 and the temperature of the muffle furnace 3 to enable the glass production line to produce glass products meeting the standards, the stability of the glass production line can be further improved.

[0071] In one embodiment, as shown in FIG. 1, the production method for removing platinum defects of a glass substrate includes: Figure 1

[0072] S1, sequentially passing the initial molten glass liquid through the platinum channel 2, the muffle furnace 3, the shaping furnace 4, and the annealing furnace 5 for normal glass preparation treatment to obtain a glass product; the conditions of the normal glass preparation treatment include that the flow rate of the initial molten glass liquid in the platinum channel 2 is a first flow rate Q1, and the temperature of the muffle furnace 3 is a first temperature T1;

[0073] S2, testing the defect rate of the glass product to obtain a real-time defect rate K1 of the glass product;

[0074] S3, when the real-time defect rate K1 is greater than a good product defect rate K0, the following treatment is performed:

[0075] S311, running the initial molten glass liquid in the platinum channel 2 for 12-24 hours after the flow rate of the initial molten glass liquid in the platinum channel 2 is increased by a change flow rate value a; running the muffle furnace 3 for 12-24 hours after the temperature of the muffle furnace 3 is increased by a change temperature value b;

[0076] S312, running the initial molten glass liquid in the platinum channel 2 for 24-36 hours after the flow rate of the initial molten glass liquid in the platinum channel 2 is again increased by the change flow rate value a; running the muffle furnace 3 for 24-36 hours after the temperature of the muffle furnace 3 is again increased by the change temperature value b;

[0077] S313, repeating the operation of step S312 until the initial molten glass liquid in the platinum channel 2 is run for 36-48 hours after the flow rate of the initial molten glass liquid in the platinum channel 2 is increased to a second flow rate Q2; until the muffle furnace 3 is run for 36-48 hours after the temperature of the muffle furnace 3 is increased to a second temperature T2;

[0078] The change flow rate value a is 10-30 kg / h, and the change temperature value b is 10-20 °C.

[0079] S321, running the initial molten glass liquid in the platinum channel 2 for 12-24 hours after the power of the heating module 41 in the shaping furnace 4 is reduced by a change power value g;

[0080] S322, running the initial molten glass liquid in the platinum channel 2 for 24-36 hours after the power of the heating module 41 in the shaping furnace 4 is again reduced by the change power value g;

[0081] ​S323, repeat the operation of step S322 until the power of the heating module 41 in the shaping furnace 4 is reduced to the second heating power W2, and then run for 36-48h;

[0082] The change power value y is 1000-2000W;

[0083] S331, increase the rotating speed of the traction roller 51 in the annealing furnace 5 by a change rotating speed value h, and then run for 12-24h;

[0084] S332, increase the rotating speed of the traction roller 51 in the annealing furnace 5 by the change rotating speed value h again, and then run for 24-36h;

[0085] S333, repeat the operation of step S332 until the rotating speed of the traction roller 51 in the annealing furnace 5 is increased to the second rotating speed O2, and then run for 36-48h;

[0086] The change rotating speed value h is 33-75mm / min;

[0087] S4, switch the initial melting glass liquid from the high load glass preparation process to the normal glass preparation process until the real-time defect rate K1 is reduced to below K0;

[0088] The good product defect rate K0 is 2-3%; the difference between the first flow rate Q1 and the second flow rate Q2 is 10-30kg / h; and the difference between the first temperature T1 and the second temperature T2 is 10-20℃.

[0089] The present disclosure will be further described in detail by the following examples. The raw materials used in the examples can be obtained by commercial channels.

[0090] Example 1

[0091] The production method for removing platinum defects of a glass substrate comprises:

[0092] S1, the initial melting glass liquid is sequentially subjected to normal glass preparation treatment in the platinum channel 2, the muffle furnace 3, the shaping furnace 4 and the annealing furnace 5 to obtain a glass product; the conditions of the normal glass preparation treatment include that the flow rate of the initial melting glass liquid in the platinum channel 2 is the first flow rate Q1 (440kg / h), and the temperature of the muffle furnace 3 is the first temperature T1 (1220℃);

[0093] S2, the glass product is subjected to defect rate test to obtain the real-time defect rate K1 of the glass product, wherein K1 is 80%;

[0094] S3, when the real-time defect rate K1 (80%) is greater than the good product defect rate K0 (3%), the following treatment is performed:

[0095] S311, after the flow of the initial melting glass liquid in the platinum channel 2 is changed by the first flow Q1 by a flow change value of 15 kg / h, and the temperature of the muffle furnace 3 is increased by 15°C from the first temperature T1, running for 15 h;

[0096] S312, after the flow of the initial melting glass liquid in the platinum channel 2 is again increased by 15 kg / h, and the temperature of the muffle furnace 3 is again increased by 15°C, running for 30 h;

[0097] S313, repeating the operation of step S312 until the flow of the initial melting glass liquid in the platinum channel 2 is increased to the second flow Q2 (485 kg / h), and the temperature of the muffle furnace 3 is increased to the second temperature T2 (1265°C), running for 40 h;

[0098] S321, after the power of the heating module 41 in the shaping furnace 4 is reduced by 1800 W from the first heating power W1 (40000 W), running for 15 h;

[0099] S322, after the power of the heating module 41 in the shaping furnace 4 is again reduced by 1800 W, running for 30 h;

[0100] S323, repeating the operation of step S322 until the power of the heating module 41 in the shaping furnace 4 is reduced to the second heating power W2 (34600 W), running for 40 h;

[0101] S331, after the rotating speed of the traction roller 51 in the annealing furnace 5 is increased by 45 mm / min from the first rotating speed O1 (3200 mm / min), running for 15 h;

[0102] S332, after the rotating speed of the traction roller 51 in the annealing furnace 5 is again increased by 45 mm / min, running for 30 h;

[0103] S333, repeating the operation of step S332 until the rotating speed of the traction roller 51 in the annealing furnace 5 is increased to the second rotating speed O2 (3335 mm / min), running for 40 h;

[0104] S4, until the real-time defect rate K1 is reduced to below the good product defect rate K0, switching the initial melting glass liquid from the high-load glass preparation process to the normal glass preparation process.

[0105] Comparative Example 1

[0106] The production method for removing platinum defects of the glass substrate is the same as that of Example 1, except that when the real-time defect rate K1 (80%) is greater than the good product defect rate K0 (3%), the temperature of the muffle furnace 3 is directly raised to 1270°C, and the flow rate of the platinum channel 2 remains unchanged.

[0107] Comparative Example 2

[0108] The production method for removing platinum defects of the glass substrate is the same as that of Example 1, except that when the real-time defect rate K1 (80%) is greater than the good product defect rate K0 (3%), the temperature of the muffle furnace is directly raised to 1250°C, and the flow rate of the platinum channel 2 remains unchanged.

[0109] Comparative Example 3

[0110] The production method for removing platinum defects of the glass substrate is the same as that of Example 1, except that when the real-time defect rate K1 (80%) is greater than the good product defect rate K0 (3%), the flow rate of the platinum channel 2 is directly raised to 510 kg / h (the second flow rate Q2), and the temperature of the muffle furnace 3 remains unchanged.

[0111] Table 1: Running results of examples and comparative examples

[0112]

[0113] As shown in Table 1, by comparing the data of Example 1 and Comparative Examples 1-3, it can be seen that by using the method of the present disclosure, platinum defects in the platinum channel can be quickly eliminated, and the stability of the glass production line operation can be improved for at least 40 days.

[0114] The preferred embodiments of the present disclosure are described in detail above with reference to the accompanying drawings, but the present disclosure is not limited to the specific details in the above-described embodiments. Within the technical concept of the present disclosure, various simple modifications can be made to the technical solutions of the present disclosure, and these simple modifications all belong to the protection scope of the present disclosure.

[0115] In addition, it should be noted that each specific technical feature described in the above specific embodiments can be combined in any appropriate manner without contradiction. In order to avoid unnecessary repetition, various possible combinations are not described again in the present disclosure.

[0116] In addition, various different embodiments of the present disclosure can also be combined in any manner, as long as they do not deviate from the idea of the present disclosure, and they should also be considered as disclosed by the present disclosure.

Claims

1. A production method for removing platinum defects of a glass substrate, characterized by, The production method comprises: S1, making the initial melting glass liquid sequentially pass through a platinum channel (2), a muffle furnace (3), a shaping furnace (4) and an annealing furnace (5) to perform normal glass preparation processing, so as to obtain a glass product; the conditions of the normal glass preparation processing include that the flow rate of the initial melting glass liquid in the platinum channel (2) is a first flow rate Q1, and the temperature of the muffle furnace (3) is a first temperature T1; S2, performing a defect rate test on the glass product to obtain a real-time defect rate K1 of the glass product; S3, when the real-time defect rate K1 is greater than a good product defect rate K0, switching the initial melting glass liquid from the normal glass preparation processing to high-load glass preparation processing; the conditions of the high-load glass preparation processing include that the flow rate of the initial melting glass liquid in the platinum channel (2) is a second flow rate Q2, and the temperature of the muffle furnace (3) is a second temperature T2; S4, until the real-time defect rate K1 decreases to below K0, switching the initial melting glass liquid from the high-load glass preparation processing to the normal glass preparation processing; The good product defect rate K0 is 2-3%, the difference between the first flow rate Q1 and the second flow rate Q2 is 30-60 kg / h, and the difference between the first temperature T1 and the second temperature T2 is 30-40℃; The switching of the initial melting glass liquid from the normal glass preparation processing to high-load glass preparation processing in step S3 comprises: S31, performing a programmed flow rate increasing process on the flow rate of the initial melting glass liquid in the platinum channel (2) to increase the flow rate from the first flow rate Q1 to the second flow rate Q2; performing a programmed temperature increasing process on the temperature of the muffle furnace (3) to increase the temperature from the first temperature T1 to the second temperature T2; The programmed flow rate increasing process in step S31 comprises: S311, increasing the flow rate of the initial melting glass liquid in the platinum channel (2) by a change flow rate value α and then running for 12-24 h; S312, again increasing the flow rate of the initial melting glass liquid in the platinum channel (2) by the change flow rate value α and then running for 24-36 h; S313, repeating the operation of step S312 until the flow rate of the initial melting glass liquid in the platinum channel (2) is increased to the second flow rate Q2, and then running for 36-48 h; The programmed temperature increasing process in step S31 comprises: S311, increasing the temperature of the muffle furnace (3) by a change temperature value β and then running for 12-24 h; S312, again increasing the temperature of the muffle furnace (3) by the change temperature value β and then running for 24-36 h; S313, repeating the operation of step S312 until the temperature of the muffle furnace (3) is increased to the second temperature T2, and then running for 36-48 h; The change flow rate value α is 10-30 kg / h, and the change temperature value β is 10-20℃.

2. The production method according to claim 1, characterized by, The ratio of the numerical value of the change flow rate value α to the change temperature value β is (1-1.2):

1.

3. The production method according to claim 1, characterized by, The flow rate increasing rate of the programmed flow rate increasing process is 6-10 kg / h, and the temperature increasing rate of the programmed temperature increasing process is 6-8℃ / h.

4. The production method according to claim 1, characterized by, The conditions of the normal glass manufacturing process further include that the power of the heating module (41) in the shaping furnace (4) is a first heating power W1; and the rotating speed of the traction roller (51) in the annealing furnace (5) is a first rotating speed O1. The first heating power W1 is 35000-40000 W; and the first rotating speed O1 is 3200-3300 mm / min.

5. The production method according to claim 4, characterized by, The step S3 further includes: S32, reducing the power of the heating module (41) in the shaping furnace (4) from the first heating power W1 to a second heating power W2; S33, increasing the rotating speed of the traction roller (51) in the annealing furnace (5) from the first rotating speed O1 to a second rotating speed O2; The second heating power W2 is 32000-36000 W; and the second rotating speed O2 is 3300-3450 mm / min.

6. The production method according to claim 5, characterized by, The step S32 further includes: S321, reducing the power of the heating module (41) in the shaping furnace (4) by a change power value γ and then operating for 12-24 h; S322, reducing the power of the heating module (41) in the shaping furnace (4) by the change power value γ again and then operating for 24-36 h; S323, repeating the operation of the step S322 until the power of the heating module (41) in the shaping furnace (4) is reduced to the second heating power W2 and then operating for 36-48 h; The change power value γ is 1000-2000 W.

7. The production method according to claim 5, characterized by, The step S33 further includes: S331, increasing the rotating speed of the traction roller (51) in the annealing furnace (5) by a change rotating speed value η and then operating for 12-24 h; S332, increasing the rotating speed of the traction roller (51) in the annealing furnace (5) by the change rotating speed value η and then operating for 24-36 h; S333, repeating the operation of the step S332 until the rotating speed of the traction roller (51) in the annealing furnace (5) is increased to the second rotating speed O2 and then operating for 36-48 h; The change rotating speed value η is 33-75 mm / min.

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