Substrate processing device and control method of substrate processing device

Abstract

The present invention provides a substrate processing device and a control method for the substrate processing device, and its purpose is to provide a technology that can reduce the possibility of judging a substrate holding mechanism as a defective part even if the substrate holding mechanism is photographed when photographing the inside of a processing tank. The substrate processing method comprises: a first step, in which a camera photographs the substrate holding mechanism and the inside of the substrate holding mechanism when the substrate holding mechanism does not hold a plurality of substrates to generate first image data; a second step, in which a second area is determined in a first area represented by the first image data, in which at least the substrate holding mechanism is photographed; and a third step, in which the grayscale of the first image data distributed in a third area other than the first area and the second area is compared with a grayscale threshold.

Description

Technical Field

[0001] The present disclosure relates to a substrate processing apparatus and a control method of the substrate processing apparatus. Background Art

[0002] The following patent documents 1 and 2 propose a batch type substrate processing device that performs processing on a plurality of substrates in a unified manner. In the patent documents 1 and 2, the substrate processing device includes a processing tank storing a processing liquid. The plurality of substrates are processed in a unified manner by immersing the plurality of substrates in the processing liquid stored in the processing tank.

[0003] In Patent Documents 1 and 2, an imaging unit (camera) is provided to monitor the interior of a substrate processing apparatus. In Patent Document 1, the imaging unit images the processing liquid stored in a processing tank, and the control unit determines the boiling state of the processing liquid based on the captured image. In Patent Document 2, the camera images the interior of the processing tank from vertically above, and determines whether there is a substrate piece in the processing tank based on the captured image.

[0004] Prior art literature

[0005] Patent Literature

[0006] Patent Document 1: Japanese Patent Application Publication No. 2019-50349

[0007] Patent Document 2: U.S. Patent Application Publication No. 2007 / 0177788 Summary of the invention

[0008] Problems to be solved by the invention

[0009] When immersing a plurality of substrates in a processing liquid, a mechanism having the function of uniformly holding a plurality of substrates (hereinafter referred to as a "substrate holding mechanism") is used. The substrate holding mechanism immerses a plurality of substrates in the processing liquid and takes them out of the processing liquid. The plurality of substrates uniformly treated by the processing liquid are moved from the substrate holding mechanism to other parts by other mechanisms. At this time, the camera takes a picture of the inside of the processing tank. The image data obtained by the shooting is used to confirm whether there are fragments of the substrate or the substrate itself (hereinafter referred to as a "defective portion") inside.

[0010] This confirmation is preferable from the viewpoint of judging whether the plurality of substrates moved from the substrate holding mechanism are damaged or missing, because the confirmation of the presence of the defective portion inside can be used as a basis for inferring that the plurality of substrates moved from the substrate holding mechanism are damaged or missing.

[0011] For example, when a first group and a second group of a plurality of substrates are alternately immersed in the same processing liquid, the substrate holding mechanism repeatedly performs a lifting (which can also be understood as "up and down movement") action relative to a processing tank storing the processing liquid. From the perspective of not hindering the lifting of the substrate holding mechanism and reducing a blind spot to photograph the interior of the processing tank, the camera is arranged above the substrate holding mechanism.

[0012] During the period from the first group moving from the substrate holding mechanism to the second group being placed on the substrate holding mechanism, there is a situation where the substrate holding mechanism is continuously located above the processing tank. In such a situation, whether the substrate holding mechanism is immersed in the processing liquid or taken out of the processing liquid to the top of the processing tank, the substrate holding mechanism is between the camera and the processing tank. In such a situation, the camera photographs the interior of the processing tank through the substrate holding mechanism.

[0013] The judgment of whether there is a defective part in the photographed interior can be performed based on the size of the area judged to be dark in the image data. However, when the camera photographs the interior of the processing tank through the substrate holding mechanism as described above, the substrate holding mechanism is also photographed. Therefore, the photographed substrate holding mechanism may be mistakenly judged as a defective part in this judgment.

[0014] Therefore, an object of the present disclosure is to provide a technology that reduces the possibility of determining a substrate holding mechanism as a defective portion even if the substrate holding mechanism is imaged when the inside of a processing tank is imaged.

[0015] Means for solving problems

[0016] A first embodiment of a control method for a substrate processing device is a method for controlling a substrate processing device, wherein the substrate processing device includes: a processing tank storing a processing liquid for immersing a plurality of substrates and uniformly processing the plurality of substrates; a substrate holding mechanism having a function of uniformly holding the plurality of substrates; a lifter having a function of immersing the substrate holding mechanism in the processing liquid and a function of removing the substrate holding mechanism from the processing liquid; and a camera for photographing the interior of the processing tank and the substrate holding mechanism from a side opposite to the processing tank relative to the substrate holding mechanism to generate image data.

[0017] The method comprises the following steps: a first step, in which the camera photographs the substrate holding mechanism and the interior to generate the first image data when the substrate holding mechanism is not holding the multiple substrates; a second step, in which, within the first area represented by the first image data, a second area is determined in which at least the substrate holding mechanism is photographed; and a third step, in which the grayscale of the first image data distributed in a third area outside the first area and the second area is compared with a threshold value of the grayscale.

[0018] The control method of the substrate processing device of the second mode is based on the control method of the substrate processing device of the first mode, wherein, in the second process, a fourth area in which the shadow of the substrate holding mechanism is captured is determined in the first area, and in the third process, the second area and the fourth area are excluded from the first area to obtain the third area.

[0019] A control method of a substrate processing apparatus according to a third aspect is a control method of a substrate processing apparatus according to the first aspect, wherein the second area includes an area where at least a portion of the lifter is imaged in the first area.

[0020] The fourth method for controlling a substrate processing device is based on the third method for controlling a substrate processing device, wherein, in the second process, a fourth area in which the shadow of at least a portion of the lifter is captured is determined in the first area, and in the third process, the second area and the fourth area are excluded from the first area to obtain the third area.

[0021] A control method of a substrate processing apparatus according to a fifth aspect is the control method of a substrate processing apparatus according to any one of the first to fourth aspects, wherein the first step is performed in a state where the processing liquid is discharged from the processing tank.

[0022] The sixth method for controlling a substrate processing device is a method for controlling a substrate processing device based on any one of the first to fourth methods, wherein the first process is performed in a state where the processing liquid is stored in the processing tank, and the first image data is obtained by temporally smoothing a plurality of second image data generated by photographing the interior at different times.

[0023] The substrate processing device of the seventh aspect comprises: a processing tank storing a processing liquid for immersing a plurality of substrates and processing the plurality of substrates in a unified manner; a substrate holding mechanism having a function of holding the plurality of substrates in a unified manner; a lifter having a function of immersing the substrate holding mechanism in the processing liquid and a function of taking the substrate holding mechanism out of the processing liquid; a camera photographing the interior of the processing tank and the substrate holding mechanism from the side opposite to the processing tank relative to the substrate holding mechanism to generate image data; and a control unit. The control unit performs the following processing: in a state where the substrate holding mechanism does not hold the plurality of substrates, the camera photographs the substrate holding mechanism and the interior to generate the first image data; in a first area represented by the first image data, determining a second area that is an area where at least the substrate holding mechanism is photographed; and comparing the grayscale of the first image data in a third area obtained by excluding the second area from the first area with the grayscale threshold.

[0024] Effects of the Invention

[0025] The control method of the substrate processing apparatus of the first aspect, the control method of the substrate processing apparatus of the third aspect, and the substrate processing apparatus of the seventh aspect reduce the possibility of judging the substrate holding mechanism as a defective portion even if the substrate holding mechanism is photographed when photographing the inside of the processing tank.

[0026] The control method of the substrate processing apparatus of the second aspect reduces the possibility of erroneous judgment caused by the shadow of the substrate holding mechanism. The control method of the substrate processing apparatus of the fourth aspect reduces the possibility of erroneous judgment caused by the shadow of at least a part of the lifting device.

[0027] The control method of the substrate processing apparatus of the fifth aspect and the control method of the substrate processing apparatus of the sixth aspect reduce the possibility that the reflected light of the liquid surface of the processing liquid stored in the processing tank affects the determination of foreign matter. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] Figure 1 It is a plan view schematically showing an example of the structure of a substrate processing apparatus according to an embodiment.

[0029] Figure 2 It is a side view showing immersing a substrate into a processing liquid stored in a processing tank and taking the substrate out of the processing liquid.

[0030] Figure 3 It is a side view showing immersing a substrate into a processing liquid stored in a processing tank and taking the substrate out of the processing liquid.

[0031] Figure 4It is a top view showing a part of a processing tank, a lifting device, and a supporting piece.

[0032] Figure 5 The figure schematically shows image data obtained by photographing with a camera.

[0033] Figure 6 The figure schematically shows image data obtained by photographing with a camera.

[0034] Figure 7 This is a flowchart showing a process group for determining whether or not a foreign object is present.

[0035] Figure 8 This is a flow chart showing a group of steps for processing a substrate.

[0036] Fig. 9 This is a flowchart showing a process group for generating first image data.

[0037] Description of Reference Numerals

[0038] 1Substrate processing device

[0039] 9. Control Unit

[0040] 20a, 20b lifting device (substrate holding mechanism)

[0041] 30 Cameras

[0042] Area 30A, 30B, 30C, 300

[0043] 40a, 40b lifter

[0044] 102a, 104a treatment tank

[0045] Q flushing fluid (treatment fluid)

[0046] W substrate. DETAILED DESCRIPTION

[0047] The embodiments are described below with reference to the drawings. The drawings are schematically shown, and for the sake of convenience, the structures are appropriately omitted or simplified, and the mutual relationship between the size and position of the structures shown in the drawings is not necessarily accurately described and can be appropriately changed.

[0048] In the following description, the same components are denoted by the same reference numerals and are illustrated in the drawings, and the names and functions of these components are the same. Therefore, detailed descriptions of these components may be omitted in order to avoid duplication.

[0049] In the following description, even if ordinal numbers such as “first” or “second” are used, these terms are used to facilitate understanding of the contents of the embodiments, and are not limited to the order generated by these ordinal numbers.

[0050] When using expressions indicating a relative or absolute positional relationship (e.g., "in one direction," "along one direction," "parallel," "orthogonal," "center," "concentric," "coaxial," etc.), unless otherwise specified, the expression not only strictly indicates the positional relationship, but also indicates a state in which the angle or distance is relatively displaced within a range in which a tolerance or the same degree of function can be obtained. When using expressions indicating an equal state (e.g., "same," "equal," "homogeneous," etc.), unless otherwise specified, the expression not only indicates a state in which the two are strictly equal in quantity, but also indicates a state in which a tolerance or a difference exists in which the same degree of function can be obtained.

[0051] When using expressions indicating shapes (for example, "quadrilateral" or "cylindrical shape", etc.), unless otherwise specified, the expression not only indicates the shape strictly geometrically, but also indicates a shape having projections and depressions, chamfers, etc., within the range that can achieve the same degree of effect.

[0052] When an expression such as “having”, “having”, “equipped with”, “including” or “equipped with” a component is used, the expression is not an exclusive expression excluding the presence of other components.

[0053] The term “connected” includes not only a state in which two elements are in contact with each other but also a state in which two elements are separated with another element in between, unless otherwise specified.

[0054] When an expression such as "at least any one of A, B, and C" is used, the expression includes only A, only B, only C, any two of A, B, and C, and all of A, B, and C.

[0055] <Overview of the Configuration of the Substrate Processing Apparatus>

[0056] Figure 1 FIG. 1 is a top view schematically showing an example of the structure of the substrate processing apparatus 1 according to the embodiment. Figure 1 The right-handed XYZ orthogonal coordinate axes are set as shown. Here, the XY plane represents the horizontal plane. In addition, the Z axis represents the vertical axis. More specifically, the Z direction is the vertical upward direction. The -X direction is the direction opposite to the X direction, the -Y direction is the direction opposite to the Y direction, and the -Z direction is the direction opposite to the Z direction.

[0057] The substrate processing apparatus 1 is a batch processing apparatus that processes a plurality of substrates W at once. The substrate processing apparatus 1 includes a mounting portion 2 , a robot 4 , a posture changing mechanism 5 , a pusher 6 , a transport mechanism 8 , a processing unit 10 , and a control portion 9 .

[0058] The control unit 9, for example, can comprehensively control the operation of the substrate processing device 1. The control unit 9, for example, has a computing unit, a memory, and a storage unit. The computing unit is composed of, for example, one or more central processing units (CPUs). The memory is composed of, for example, volatile storage media such as RAM (Random Access Memory). The storage unit is composed of, for example, non-volatile storage media such as a hard disk drive (HDD) or a solid state drive (SSD). The storage unit is capable of storing programs and various information, for example. The computing unit can realize various functions by, for example, reading and executing programs stored in the storage unit. At this time, the RAM is used, for example, as a workspace to temporarily store generated or acquired information. At least a part of the functional structure realized by the control unit 9 can also be realized by hardware such as a dedicated electronic circuit.

[0059] The loading section 2 has a function of loading the storage unit F. The storage unit F has a function of storing a plurality of substrates W. The storage unit F is placed on the loading section 2 in a state where an unprocessed substrate W is stored, or is placed on the loading section 2 in an empty state in order to store a processed substrate W. As an example of the storage unit F, there can be cited a FOUP (Front Opening Unified Pod) configured to store a plurality of (e.g., 25) substrates W in a horizontal position in a stacked state in the Z direction.

[0060] The process space 3 is adjacent to the placement unit 2 on the Y direction side. In the process space 3, a robot 4, a posture changing mechanism 5, a push rod 6, a conveying mechanism 8, and a processing unit 10 are arranged.

[0061] The loading section 2 and the process space 3 are divided by a partition wall (not shown) equipped with a gate that can be opened and closed freely. The gate is opened and closed by the control of the control unit 9, so that the loading section 2 and the process space 3 are separated in space or connected to each other. In the state where the loading section 2 and the process space 3 are connected, unprocessed substrates W are carried into the process space 3 from the storage F, or processed substrates W are carried out of the storage F.

[0062] The substrates W are carried in and out between the process space 3 and the storage container F by the robot 4. The robot 4 is configured to rotate freely in a horizontal plane. When the gate is open, the robot 4 transfers a plurality of substrates W between the posture change mechanism 5 and the storage container F. The transfer is schematically indicated by a hollow arrow.

[0063] The posture changing mechanism 5 changes the posture of the plurality of substrates W from the horizontal posture to the upright posture after receiving the substrates W from the storage F via the robot 4. The posture changing mechanism 5 changes the posture of the plurality of substrates W from the upright posture to the horizontal posture before delivering the substrates W to the storage F via the robot 4.

[0064] The processing unit 10 is arranged on the side opposite to the robot 4 (-X direction side in the figure) with respect to the posture changing mechanism 5. The conveying mechanism 8 is arranged on the side opposite to the posture changing mechanism 5 (-X direction side in the figure) with respect to the processing unit 10.

[0065] The processing unit 10 includes processing sections 101, 102, 103, 104, and 105 arranged in sequence in one direction (-Y direction in the figure). The conveying mechanism 8 can move in the horizontal direction from a position opposite to the push rod 6 (hereinafter referred to as the "standby position") along the direction in which the processing sections 101, 102, 103, 104, and 105 are arranged and in the opposite direction.

[0066] The push rod 6 is disposed between the posture changing mechanism 5 and the conveying mechanism 8. The push rod 6 delivers a plurality of substrates W in the standing posture between the posture changing mechanism 5 and the conveying mechanism 8.

[0067] The transport mechanism 8 includes a pair of arms 81. The positions of the pair of arms 81 can switch between unified holding and release of the plurality of substrates W. Each arm 81 swings around a horizontal axis in a direction in which the lower edges thereof approach each other, and uniformly clamps and holds the plurality of substrates W. Each arm 81 swings around a horizontal axis in a direction in which the lower edges thereof separate from each other, and releases the holding of the plurality of substrates W.

[0068] The conveying mechanism 8 can move in either the Y direction or the -Y direction, so the pair of arms 81 are positioned at positions (hereinafter also referred to as "processing positions") and standby positions respectively facing the processing units 101, 102, 103, 104, and 105.

[0069] In the standby position, the substrate W can be transferred between the posture changing mechanism 5 and the arm 81 via the push rod 6 .

[0070] The processing unit 10 includes lifters 40a, 40b, and 40c. The lifter 40a is provided with a lifter 20a. The lifter 40b is provided with a lifter 20b. The lifter 40c is provided with a lifter 20c. The lifters 20a, 20b, and 20c all function as substrate holding mechanisms for holding a plurality of substrates W.

[0071] The lifter 40a and the lift device 20a are movable in either the Y direction or the -Y direction between the processing units 103 and 104 and are positioned at processing positions corresponding to the processing units 103 and 104. The lifter 40a and the lift device 20a are used to process the substrates W in the processing units 103 and 104.

[0072] The lifter 40b and the lift device 20b are movable in either the Y direction or the −Y direction between the processing units 101 and 102 and are positioned at processing positions corresponding to the processing units 101 and 102. The lifter 40b and the lift device 20b are used for processing the substrates W in the processing units 101 and 102.

[0073] The lifter 40 c and the lift device 20 c are used for processing the substrate W in the processing unit 105 .

[0074] The processing unit 101 includes a processing tank 101b. The processing unit 103 includes a processing tank 103b. The processing tanks 101b and 103b are open in the Z direction. A predetermined chemical solution for collectively processing a plurality of substrates W is stored in the processing tanks 101b and 103b.

[0075] The substrate W immersed in the chemical solution stored in the processing tank 101b is processed by the chemical solution. The substrate W immersed in the chemical solution stored in the processing tank 103b is processed by the chemical solution. It is not necessary to investigate whether the chemical solutions in the processing tanks 101b and 103b are different from each other.

[0076] The processing section 102 includes a processing tank 102a. The processing section 104 includes a processing tank 104a. The processing tanks 102a and 104a are open in the Z direction. A rinse liquid (for example, pure water) is stored in the processing tank 102a as a processing liquid for washing the chemical solution stored in the processing tank 101b from the substrate W. A rinse liquid (for example, pure water) is stored in the processing tank 104a as a processing liquid for washing the chemical solution stored in the processing tank 103b from the substrate W. The substrate W immersed in the rinse liquid stored in the processing tank 102a is washed by the rinse liquid. The substrate W immersed in the rinse liquid stored in the processing tank 104a is washed by the rinse liquid.

[0077] The processing unit 105 supplies an organic solvent such as isopropyl alcohol to the substrate W in a reduced pressure atmosphere, thereby drying the substrate W.

[0078] The immersion and removal of the substrate W from the processing tanks 103b and 104a are realized by the lifter 40a and the lifter 20a. The lifter 40a has the functions of immersing the lifter 20a in the chemical solution stored in the processing tank 103b, removing the lifter 20a from the chemical solution, immersing the lifter 20a in the rinse solution stored in the processing tank 104a, and removing the lifter 20a from the rinse solution.

[0079] The immersion and removal of the substrate W from the processing tanks 101b and 102a are realized by the lifter 40b and the lifter 20b. The lifter 40b has the functions of immersing the lifter 20b in the chemical solution stored in the processing tank 101b, removing the lifter 20b from the chemical solution, immersing the lifter 20b in the rinse solution stored in the processing tank 102a, and removing the lifter 20b from the rinse solution.

[0080] The substrate W is loaded into and taken out of the processing unit 105 by the lifter 40c and the lift device 20c.

[0081] The lifting device 20a receives and delivers a plurality of substrates W to and from the transport mechanism 8 when the lifting device 20a is lifted in the Z direction by the lifter 40a and is located above the processing tanks 103b and 104a. The lifting device 20b receives and delivers a plurality of substrates W to and from the transport mechanism 8 when the lifting device 20b is lifted in the Z direction by the lifter 40b and is located above the processing tanks 101b and 102a. The lifting device 20c receives and delivers a plurality of substrates W to and from the transport mechanism 8 when the lifting device 20c is lifted in the Z direction by the lifter 40c and is located above the processing unit 105.

[0082] Specifically, for example, in this state, the conveying mechanism 8 moves to the processing position and is aligned with any one of the lifting devices 20a, 20b, and 20c in the X direction, and the transfer is performed by the above-mentioned holding and releasing.

[0083] In the processing units 101 and 103, for example, a chemical liquid is used as a processing liquid to process the substrate W. In the processing units 102 and 104, for example, the chemical liquid on the substrate W is rinsed (hereinafter referred to as "washed"), and in the processing unit 105, for example, a drying process is performed.

[0084] Figure 2 It is a side view showing immersion of the substrate W in the processing liquid stored in the processing tank 104a and removal of the substrate W from the processing liquid, as viewed along the -X direction. Figure 3 It is a side view showing immersion of the substrate W in the processing liquid stored in the processing tank 104 a and removal of the substrate W from the processing liquid, as viewed along the Y direction.

[0085] In order to avoid cumbersome diagrams, Figure 2 The lifter 40a is omitted. Figure 2 and Figure 3 , the case where the rinse liquid Q is stored in the processing tank 104a is illustrated.

[0086] exist Figure 2 and Figure 3 In FIG. 1 , the state in which the substrate W is immersed in the rinse liquid Q together with the lifting device 20 a is indicated by a single-dot chain line. Figure 2 and Figure 3 In FIG. 1 , the state in which the substrate W is taken out from the rinse liquid Q together with the lifting device 20a is represented by a solid line, regardless of whether it is before or after the immersion. Figure 2 In FIG. 1 , a two-dot chain line schematically shows a transition between a state where the substrate W is taken out of the rinse liquid Q together with the lifting device 20 a and a state where the substrate W is immersed in the rinse liquid Q. FIG.

[0087] The lifting device 20a includes a plurality of rods 21 and a plate 22. For example, the lifting device 20a includes three rods 21. Each rod 21 supports a plurality of substrates W at intervals. For example, each rod 21 has 25 grooves separated from each other in the X direction, although not explicitly shown in the figure.

[0088] The plate 22 extends perpendicularly to, for example, the X direction. The end of any rod 21 (for example, the end in the -X direction) is connected to the plate 22. By including a plurality of rods 21 and plates 22, the lifting device 20a has the function of holding a plurality of substrates W. The lifting devices 20b and 20c are also configured similarly to the lifting device 20a and have the function of holding a plurality of substrates W.

[0089] exist Figure 2 The camera 30 included in the processing unit 104 is also shown. Figure 1 In order to avoid complexity of the illustration, the camera 30 is omitted. The camera 30 is arranged at a position closer to the Z direction side than the lifting device 20a with respect to the processing tank 104a. The camera 30 photographs the inside of the processing tank 104a from the side opposite to the processing tank 104a with respect to the lifting device 20a.

[0090] The camera 30 captures the interior of the processing tank 104a and generates image data under the control of the control unit 9. The image data is transmitted to the control unit 9 and used for the determination process described later.

[0091] The processing unit 102 may also include a camera 30 disposed at a position closer to the Z direction side than the lifting device 20b with respect to the processing tank 102a. In this case, the camera 30 disposed at a position closer to the Z direction side than the lifting device 20a with respect to the processing tank 104a may be omitted. Alternatively, a camera 30 disposed at a position closer to the Z direction side than the lifting device 20c with respect to the processing unit 105 may be provided. The substrate processing apparatus 1 includes the above-mentioned control unit 9 and one or more cameras 30.

[0092] Reference Figure 3 The lifter 40 a includes a support plate 41 , a lift guide 42 , a motor 43 , and a servo amplifier 44 .

[0093] The support piece 41 supports the plate 22 of the lifting device 20a from the -X direction side. The lifting guide 42 guides the lifting and lowering of the support piece 41, specifically, guides the movement of the support piece 41 in the Z direction and the movement of the support piece 41 in the -Z direction. For example, the lifting guide 42 has: a ball screw connected to the rotating shaft of the motor 43; and a rod (neither of which is shown in the figure) that digs a tap that engages with the ball screw and is connected to the plate 22. The motor 43 is driven by the servo amplifier 44 under the control of the control unit 9 to lift and lower the support piece 41. The control unit 9 controls the motor 43 via the servo amplifier 44 to move the lifting device 20a to a specified position.

[0094] The servo amplifier 44 receives a rotation instruction from the control unit 9 to drive the motor 43 and transmits information on the vertical position of the support piece 41 and the vertical position of the lifting device 20 a from the motor 43 to the control unit 9 .

[0095] The lifters 40b and 40c are also configured similarly to the lifter 40a, and lift and lower the lift devices 20b and 20c, respectively, to move them to predetermined positions.

[0096] <Transfer of substrates between the lifting device and the transport mechanism>

[0097] The process flow of the substrate W receiving processing units 101, 102, 103, 104, and 105 is exemplified by the following divided steps:

[0098] (i) The push rod 6 delivers the substrate W to the transport mechanism 8;

[0099] (ii) the transport mechanism 8 moves in the Y direction to a processing position relative to the processing unit 101;

[0100] (iii) delivering the substrate W from the transport mechanism 8 to the lifting device 20b located above the processing tank 101b through the lifter 40b;

[0101] (iv) the lifter 40b lowers the lift device 20b, and immerses the lift device 20b and the substrate W held by the lift device in the chemical solution stored in the processing tank 101b;

[0102] (v) The lifter 40b raises the lift device 20b, and takes the lift device 20b and the substrate W held by the lift device out of the chemical solution stored in the processing tank 101b;

[0103] (vi) the lifter 40b moves in the -Y direction to a processing position relative to the processing unit 102;

[0104] (vii) the lifter 40b lowers the lift device 20b, and immerses the lift device 20b and the substrate W held by the lift device in the rinse liquid stored in the processing tank 102a;

[0105] (viii) the lifter 40b raises the lift device 20b, and takes the lift device 20b and the substrate W held by the lift device out of the rinse liquid stored in the processing tank 102a;

[0106] (ix) the transport mechanism 8 moves to a processing position relative to the processing section 102;

[0107] (x) The substrate W is delivered from the lifting device 20b located above the processing tank 102a to the conveying mechanism 8 by the lifter 40b;

[0108] (xi) the conveying mechanism 8 moves in the -Y direction to a processing position relative to the processing section 103;

[0109] (xii) The substrate W is delivered from the transport mechanism 8 to the lifting device 20a located above the processing tank 103b by the lifter 40a;

[0110] (xiii) the lifter 40a lowers the lift device 20a, and immerses the lift device 20a and the substrate W held by the lift device in the chemical solution stored in the processing tank 103b;

[0111] (xiv) The lifter 40a raises the lift device 20a, and takes the lift device 20a and the substrate W held by the lift device out of the chemical solution stored in the processing tank 103b;

[0112] (xv) the lifter 40a moves in the -Y direction to a processing position relative to the processing unit 104;

[0113] (xvi) the lifter 40a lowers the lift device 20a, and immerses the lift device 20a and the substrate W held by the lift device in the rinse liquid Q stored in the processing tank 104a;

[0114] (xvii) the lifter 40a lifts the lift device 20a, and removes the lift device 20a and the substrate W held by the lift device from the rinse liquid Q;

[0115] (xviii) the transport mechanism 8 moves to a processing position relative to the processing section 104;

[0116] (xix) delivering the substrate W from the lifting device 20a located above the processing tank 104a to the conveying mechanism 8 through the lift 40a;

[0117] (xx) The conveying mechanism 8 moves in the -Y direction to a processing position relative to the processing section 105;

[0118] (xxi) delivering the substrate W from the transport mechanism 8 to the lifting device 20c located above the processing unit 105 via the lift 40c;

[0119] (xxii) The lifting device 20 c loads the substrate W into the processing unit 105 and dries the substrate W.

[0120] The camera 30 photographs the interior of the processing tank 104a after the step (xix), for example, after the step (xix) and before the step (xxi). When the processing unit 102 has the camera 30, the camera 30 photographs the interior of the processing tank 102a after the step (x), for example, after the step (x) and before the step (xii).

[0121] <Processing based on image data>

[0122] Figure 4 FIG. 2 is a top view showing a portion of the processing tank 104a, the lifting device 20a, and the supporting piece 41 viewed along the -Z direction. Figure 4 , a case where a defective portion D exists in the processing tank 104a is illustrated. Regions 300, 30A, 30B, and 30C in image data described later are collectively described by a dashed line.

[0123] The camera 30 captures at least the inner side of the processing tank 104a and objects existing along the Z direction between the inner side and the camera 30, and the defective portion D if any. During this capturing, the lifting device 20a does not hold the substrate W. Specifically, the object is at least a portion of the lifting device 20a and the lifter 40a (for example, a portion of the support piece 41 on the X direction side).

[0124] The region 30A is a region where the object is captured in the image data. The region 30A extends when viewed in a plan view, specifically, along the -Z direction.

[0125] The area 30A is an area where at least the lifting device 20 a is captured, and can be said to be an area where the lifting device 20 a is captured and at least a part of the lifter 40 a is captured.

[0126] The region 300 is a region where the inside of the processing tank 104a is captured, but for ease of understanding, the outline of the region 300 is drawn slightly inside the inside of the processing tank 104a.

[0127] Region 30C is (I) region 300 and a region other than region 30A, or (II) region 300 and a region other than regions 30A and 30B. In case (I), region 30C is a region remaining after excluding region 30A from region 300, and in case (II), region 30C is a region remaining after excluding regions 30A and 30B from region 300. From this viewpoint, regions 30A and 30B are also referred to as excluded regions 30A and 30B, and regions 30C are also referred to as remaining regions 30C.

[0128] (I)

[0129] Figure 5 The image data G1 obtained by imaging by the camera 30 is schematically shown when the region 30C is a region excluding the region 30A from the region 300. Figure 5 , an area D1 occupied by the defect portion D in the area 30C is drawn.

[0130] The grayscale of the image data G1 distributed in the region 30C can be compared with the grayscale threshold to determine whether the region D1 exists. The technique of comparing the distributed grayscale with the threshold to determine the region is well known, so its detailed description is omitted here. For example, the defective portion D is a part of the substrate W or the whole thereof, and is darker than the inside of the processing tank 104a where the defective portion D does not exist. In the following description, the higher the brightness, the higher the grayscale. The region D1 is determined as a region representing a grayscale lower than the first threshold.

[0131] When the region D1 exists, it is determined that the defective portion D exists in the processing tank 104a. More generally, determining whether the region D1 exists contributes to determining whether a foreign substance exists in the processing tank 104a.

[0132] Furthermore, since the presence of region D1 is determined in the remaining region 30C remaining after excluding the exclusion region 30A from the region 300, even if the lifting device 20a and the support piece 41 functioning as a substrate holding mechanism are photographed, the possibility of determining them as the defective portion D can be reduced.

[0133] (II) Situation.

[0134] Figure 6 The image data G2 obtained by imaging with the camera 30 is schematically shown when the remaining region 30C is a region excluding the exclusion regions 30A and 30B from the region 300. Figure 6 , an area D2 occupied by the defective portion D in the residual area 30C is drawn.

[0135] The exclusion area 30B is the area occupied by the shadow of the lifting device 20a in the area 300. Here, the exclusion area 30B also includes the area occupied by the shadow of the support sheet 41 in the area 300. These shadows come from external light (not shown) for the processing tank 104a, the lifting device 20a, and the lifter 40a. For example, although the external light makes the interior of the processing tank 104a brighter as a whole, it partially darkens the part of the interior that is blocked by the lifting device 20a and the lifter 40a.

[0136] Since the shadow is dark, there is a possibility that the shadow may be erroneously determined as the defective portion D in the determination using grayscale. The fact that the remaining region 30C does not include the exclusion region 30B contributes to reducing this possibility.

[0137] In this case, similarly to the region D1, the grayscale of the image data G2 distributed in the region 30C is compared with the threshold value to determine the presence of the region D2. Determining the presence of the region D2 helps to determine the presence of foreign matter in the processing tank 104a.

[0138] Moreover, since the presence or absence of area D2 is judged in the residual area 30C remaining after excluding the exclusion areas 30A and 30B from the area 300, even if the lifting device 20a and the support plate 41 that function as the substrate holding mechanism are photographed, the possibility of judging them or their shadows as the defective portion D can be reduced.

[0139] <Determination of Exclusion Area>

[0140] The exclusion areas 30A and 30B are determined as follows, for example, using a second threshold value greater than the first threshold value. The lifting device 20a and the supporting sheet 41 are photographed by the camera 30, for example, to be darker than the processing tank 104a. An area having a lower grayscale (lower brightness) than the second threshold value and a higher grayscale (higher brightness) than the first threshold value can be determined as the exclusion area 30A.

[0141] The shadows of the lifting device 20a and the supporting piece 41 are, for example, photographed darker than the lifting device 20a and the supporting piece 41. Therefore, by reducing the second threshold, the areas with a grayscale lower than the second threshold (low brightness) and a grayscale higher than the first threshold (high brightness) can be determined as the exclusion areas 30A and 30B. The first threshold and the second threshold are, for example, predetermined or determined based on the distribution of grayscale values ​​in the image data.

[0142] Alternatively, the exclusion areas 30A and 30B may be predetermined, for example. The shapes of the lifting device 20a and the support piece 41 are known as design specifications, so the exclusion area 30A can be predetermined. The exclusion area 30B can be predetermined as an area in the area 300 that is expanded by taking a margin relative to the exclusion area 30A.

[0143] <Determination of the presence of foreign matter>

[0144] In either case (I) or (II), for example, when the area of ​​regions D1 and D2 is greater than the third threshold, it is determined that a foreign object exists. This helps reduce the possibility of erroneously detecting the presence of a defective portion D even though there is no foreign object such as a defective portion D. The comparison of the area of ​​a region where grayscales within a specified range are distributed with a threshold is well known, so its detailed description is omitted here.

[0145] It is assumed that a plurality of smaller regions D1 and D2 are determined to be larger than the third threshold value based on the error in determining the excluded regions 30A and 30B or the error in comparing the grayscale values ​​distributed in the residual region 30C with the third threshold value. In the case where a plurality of regions D1 or a plurality of regions D2 are obtained, the area compared with the third threshold value is not, for example, the total area of ​​the plurality of regions D1 or the total area of ​​the plurality of regions D2. Comparing the areas of the individual regions D1 and D2 that are concentrated in each region with the third threshold value helps reduce the possibility of mistaking the plurality of regions D1 (or region D2) for the presence of a larger region D1 (or region D2) by aggregating them.

[0146] Figure 7 This is a flowchart showing a process group for determining whether or not foreign matter is present in the processing tank 104a. In this flowchart, a title "foreign matter determination processing" is added to reflect its meaning. This process group includes steps S11, S12, and S13 that are performed in sequence.

[0147] Step S11 is a process of generating first image data by photographing with the camera 30 under the control of the control unit 9. The first image data is illustrated as image data G1 and G2 in the above example. The first image data is generated, for example, by the camera 30 itself, and the first image data is provided to the control unit 9 for use in processing by the control unit 9.

[0148] Step S12 is a step of determining the exclusion area 30A, or a step of determining the exclusion areas 30A and 30B. The determination of these areas is performed by the control unit 9 by the above-mentioned method. Figure 7 In order to simplify the illustration, the case where both the exclusion areas 30A and 30B are determined is shown as an example.

[0149] Step S13 is a process of discriminating foreign matter in the residual area 30C. When only the exclusion area 30A is determined in step S12, the discrimination is performed by comparing the area D1 with the second threshold value by the control unit 9. When both the exclusion areas 30A and 30B are determined in step S12, the discrimination is performed by comparing the area D2 with the second threshold value by the control unit 9.

[0150] For example, when the area of ​​the region D1 or the area of ​​the region D2 is larger than the third threshold value, it is determined that a foreign object, specifically, for example, a defective portion D, is present.

[0151] By executing such steps S11, S12, and S13, even if the lifting device 20a, the supporting piece 41, or their shadows that function as the substrate holding mechanism are captured, the possibility of judging them as the defective portion D can be reduced, and whether the defective portion D exists can be determined.

[0152] <Position of the substrate holding mechanism during photography>

[0153] Figure 8 104a is a flowchart showing a process group for processing the substrate W in the processing tank 104a. In this flowchart, a title "substrate processing in the processing tank" is added to reflect its meaning. Figure 8 The indicated process group is executed before Figure 7 Execution of the process group shown.

[0154] Figure 8 The process group shown includes steps S21, S22, S23, S24, and S25 which are performed in sequence.

[0155] Step S21 is a step of placing the substrate W on the lifting device 20 a , and corresponds to the above-mentioned step (xii). This placement is performed by the transport mechanism 8 .

[0156] Step S22 is a step of immersing the substrate W in the processing tank 104a, more specifically, in the rinse liquid Q stored in the processing tank 104a. Step S22 corresponds to the above-mentioned step (xvi). This immersion is performed by the lifter 40a.

[0157] Step S23 is a process for ensuring the time required for processing the substrate W in the processing tank 104a. In step S23, it is determined whether a predetermined time has passed since step S22 was executed. If the determination is negative, that is, if the predetermined time has not passed since step S22 was executed, step S23 is repeatedly executed. If the determination is positive, that is, if the predetermined time has passed since step S22 was executed, step S24 is executed.

[0158] Step S24 is a step of lifting the substrate W from the processing tank 104a. By lifting, the substrate W is taken out from the rinse liquid Q. Step S24 corresponds to the above-mentioned step (xvii). The lifting (or taking out) is performed by the lifter 40a.

[0159] Step S25 is a process of moving the substrate W from the lifting device 20a. More specifically, step S25 is a process of delivering the substrate W from the lifting device 20a to the conveying mechanism 8. Step S25 is equivalent to the above-mentioned step (xix). The movement (or delivery) is performed by the conveying mechanism 8.

[0160] Figure 8 The process group shown may further include step S26. The processing of the substrate W in the processing tank 104a is realized regardless of the presence or absence of step S26. That step S26 can be omitted is indicated by the frame representing step S26 being a dotted line.

[0161] After step S25, step S26 is executed. Step S26 is a process of immersing the lifting device 20a that no longer holds the substrate W due to the execution of step S25 in the processing tank 104a, more specifically, in the rinse liquid Q. Advantages of executing step S26 will be described below.

[0162] The process ends by executing step S25. Figure 8 In the case of the flowchart of FIG. 1 , when the camera 30 takes an image in step S11, no substrate W is arranged on the lifting device 20a, and the lifting device 20a and the supporting piece 41 are located away from the processing tank 104a in the Z direction (see FIG. 1 ). Figure 3 The positions of the lifting device 20a and the supporting piece 41 are shown by the solid line in the figure).

[0163] By executing step S26, the Figure 8 In the case of the flowchart of FIG. 1 , when the camera 30 takes an image in step S11, no substrate W is arranged on the lifting device 20a, and the lifting device 20a and the supporting piece 41 are located at substantially the same position as the processing tank 104a in the Z direction (see FIG. 1 ). Figure 3 The position of the lifting device 20a and the supporting piece 41 are shown by the dotted line in the figure).

[0164] The closer the lifting device 20a and the supporting piece 41 are to the camera 30, the larger the image will be. Figure 8 Compared with the case of the flowchart, after the execution of step S26 ends Figure 8 In the case of the flowchart, the exclusion area 30A or the exclusion areas 30A and 30B account for a small proportion of the area 300. This is advantageous from the viewpoint of expanding the residual area 30C to be determined in the detection of the defective portion D in the processing tank 104a.

[0165] <Influence of liquid in treatment tank>

[0166] When the processing tank 104a stores the rinse liquid Q, the reflected light generated by the liquid surface of the rinse liquid Q affects the image data. The reflected light varies in time and space due to the swaying of the liquid surface. This variation may affect the discrimination of the above-mentioned foreign matter.

[0167] In step S11, the camera 30 may perform multiple shots to obtain multiple second image data. Obtaining the first image data by temporally smoothing the multiple second image data helps reduce the possibility that the reflected light of the liquid surface of the rinse liquid Q affects the discrimination of foreign matter.

[0168] Fig. 9 1 is a flowchart showing a process group for generating first image data using second image data. The process group includes steps S111 and S112 which are executed in sequence. Steps S111 and S112 are included in step S11.

[0169] Step S111 is a step of generating a plurality of second image data. The plurality of second image data are generated by capturing images of the interior of the processing tank 104a at a plurality of different times.

[0170] Step S112 is a process of generating first image data based on a plurality of second image data. Specifically, the first image data is generated by performing temporal smoothing of the plurality of second image data. The smoothing is obtained, for example, by calculating the average value of mutually corresponding pixels in the plurality of second image data. The average value is calculated, for example, by arithmetic mean or geometric mean.

[0171] The camera 30 may capture the interior of the processing tank 104a while the rinse liquid Q is being discharged from the processing tank 104a. In this case, the process of discharging the rinse liquid Q is performed after the step (xix) and before the camera 30 captures the image.

[0172] In this case, the generated image data is not affected by the reflected light from the surface of the rinse liquid Q. The imaging performed while the rinse liquid Q is being discharged from the processing tank 104a also helps reduce the possibility that the reflected light from the surface of the rinse liquid Q affects the discrimination of foreign matter.

[0173] The above description about the processing unit 104 is also applicable to the processing units 102 and 105. Specifically, when the camera 30 is provided in the processing unit 102, the lifting device 20a is replaced by the lifting device 20b, the processing tank 104a is replaced by the processing tank 102a, and the lifter 40a is replaced by the lifter 40b in the above description.

[0174] <Transformation>

[0175] In the above embodiment, for example, it is also possible to determine whether or not a foreign object exists without determining any one of the exclusion regions 30A, 30B, and the residual region 30C. For example, it is also possible to use a value corresponding to the area of ​​the exclusion region 30A in the image data G1 as the third threshold, and compare the area of ​​a region representing a grayscale greater than the first threshold among the grayscales distributed in the region 300 with the third threshold. Alternatively, for example, it is also possible to use a value corresponding to the area of ​​the exclusion regions 30A, 30B in the image data G2 as the third threshold, and compare the area of ​​a region representing a grayscale greater than the first threshold among the grayscales distributed in the region 300 with the third threshold. In these cases, the third threshold can be preset, for example, based on the design values ​​of the lifting device 20a and the support sheet 41.

[0176] Furthermore, it is of course possible to appropriately combine all or part of the above-described embodiments and various modifications within a range that does not conflict.

Claims

1. A method for controlling a substrate processing device, wherein the substrate processing device include: a processing tank storing a processing liquid for immersing a plurality of substrates and uniformly processing the plurality of substrates; a substrate holding mechanism having a function of collectively holding the plurality of substrates; a lifter having a function of immersing the substrate holding mechanism in the processing liquid and a function of taking the substrate holding mechanism out of the processing liquid; as well as a camera that captures the interior of the processing tank and the substrate holding mechanism from a side opposite to the processing tank relative to the substrate holding mechanism to generate image data, It is characterized in that The control method comprises the following steps: In a first step, in a state where the substrate holding mechanism does not hold the plurality of substrates, the camera captures the substrate holding mechanism and the interior thereof to generate first image data; A second step is to determine a second area, which is an area where at least the substrate holding mechanism is captured, in the first area represented by the first image data; and In a third step, a grayscale of the first image data distributed in a third area other than the first area and the second area is compared with a grayscale threshold.

2. The control method of the substrate processing apparatus according to claim 1, It is characterized in that In the second step, a fourth area in which the shadow of the substrate holding mechanism is captured is determined in the first area. In the third step, the third region is obtained by excluding the second region and the fourth region from the first region.

3. The control method of the substrate processing apparatus according to claim 1, It is characterized in that The second area includes an area where at least a portion of the lifter is photographed in the first area.

4. The control method of the substrate processing apparatus according to claim 3, It is characterized in that In the second step, a fourth area in which the shadow of at least a portion of the lifter is captured is determined in the first area. In the third step, the third region is obtained by excluding the second region and the fourth region from the first region.

5. The control method of a substrate processing apparatus according to any one of claims 1 to 4, It is characterized in that The first step is performed in a state where the processing liquid is discharged from the processing tank.

6. The control method of a substrate processing apparatus according to any one of claims 1 to 4, It is characterized in that The first step is performed in a state where the treatment liquid is stored in the treatment tank, The first image data is obtained by temporal smoothing using a plurality of second image data generated by imaging the interior at different times.

7. A substrate processing device, It is characterized in that have: a processing tank storing a processing liquid for immersing a plurality of substrates and uniformly processing the plurality of substrates; a substrate holding mechanism having a function of collectively holding the plurality of substrates; a lifter having a function of immersing the substrate holding mechanism in the processing liquid and a function of taking the substrate holding mechanism out of the processing liquid; a camera that captures the interior of the processing tank and the substrate holding mechanism from a side opposite to the processing tank with respect to the substrate holding mechanism to generate image data; and Control Department, The control unit performs the following processing: In a state where the substrate holding mechanism does not hold the plurality of substrates, the camera captures the substrate holding mechanism and the interior thereof to generate the first image data; In the first area represented by the first image data, determining a second area where at least the substrate holding mechanism is captured; as well as The grayscale of the first image data in a third area obtained by excluding the second area from the first area is compared with a threshold value of the grayscale.

Images