A multi-wavelength intelligent excimer laser processing system

Abstract

The application discloses a kind of multi-wavelength intelligent excimer laser processing systems, including workbench, workbench is equipped with the first laser excitation generator of different wavelength laser that can emit outward, second laser excitation generator and third laser excitation generator, workbench is equipped with first reflector, second reflector and third reflector, workbench is further equipped with the optical system that can make the laser that first reflector, second reflector or third reflector reflects pass through.The application aims at overcoming the shortcomings of prior art, according to the structure and technical characteristics of excimer laser, a kind of multi-wavelength intelligent excimer laser processing system capable of emitting multiple wavelength excimer laser on a single system is provided, and a kind of intelligent real-time control system is designed, to realize online monitoring of processing condition and real-time control and adjustment of excimer laser output parameters during excimer laser precision machining, to achieve efficient, accurate and automatic control processing.

Description

TECHNICAL FIELD

[0001] The present application relates to a multi-wavelength intelligent excimer laser processing system. BACKGROUND

[0002] The laser wavelength outputted by an excimer laser is different according to the different working gas medium, for example, the excimer lasers corresponding to ArF, KrF and XeCl working gas respectively generate excimer laser with wavelength of 193nm, 248nm and 308nm. In laser processing, different wavelengths of laser are needed for different materials. The existing excimer laser processing system is based on a kind of working gas to generate a kind of wavelength laser, so in the material processing, especially in the material processing process development stage, a kind of multi-wavelength intelligent excimer laser processing system is needed, and often a plurality of single-wavelength output excimer lasers are used for process exploration and verification. Therefore, an integrated processing system capable of outputting multi-wavelength excimer laser is needed. On the other hand, the control software of the general excimer laser is only for the operation and control of the excimer laser itself, and in the process of excimer laser precision machining, the power, repetition frequency, wavelength and other parameters of the excimer laser output need to be adjusted in real time according to the processing condition. Therefore, an intelligent real-time control system needs to be designed to realize online monitoring of the processing condition and real-time control of the excimer laser output parameters in the process of excimer laser precision machining to achieve efficient, accurate and automatic control processing.

[0003] The present application is based on the above-mentioned needs. SUMMARY

[0004] The present application aims to overcome the shortcomings of the prior art, and provides a multi-wavelength intelligent excimer laser processing system capable of emitting multiple wavelengths of excimer laser on a single system according to the structure and technical characteristics of the excimer laser, and designs an intelligent real-time control system to realize online monitoring of the processing condition and real-time control of the excimer laser output parameters in the process of excimer laser precision machining to achieve efficient, accurate and automatic control processing.

[0005] The present application is achieved by the following technical solutions:

[0006] A multi-wavelength intelligent excimer laser processing system, comprising a worktable 1, wherein the worktable 1 is provided with a first laser excitation generator 21, a second laser excitation generator 22 and a third laser excitation generator 23 capable of emitting laser beams of different wavelengths, the worktable 1 is provided with a first reflector 31 capable of corresponding to the position of the first laser excitation generator 21 and changing the laser emission direction of the first laser excitation generator 21, the worktable 1 is further movably connected with a second reflector 32 corresponding to the position of the second laser excitation generator 22 and changing the laser emission direction of the second laser excitation generator 22, the worktable 1 is further movably connected with a third reflector 33 corresponding to the position of the third laser excitation generator 23 and changing the laser emission direction of the third laser excitation generator 23, and when the first reflector 31 reflects the laser, the second reflector 32 and the third reflector 33 can move relative to the worktable 1 to give way to the laser reflected by the first reflector 31, and when the second reflector 32 reflects the laser, the third reflector 33 can move relative to the worktable 1 to give way to the laser reflected by the second reflector 32, the worktable 1 is further provided with an optical system 4 capable of allowing the laser reflected by the first reflector 31, the second reflector 32 or the third reflector 33 to pass through, and the multi-wavelength intelligent excimer laser processing system further comprises a control system 5 capable of controlling the work of the first laser excitation generator 21, the second laser excitation generator 22 and the third laser excitation generator 23, a high-voltage charging power supply 93 capable of supplying power to the first laser excitation generator 21, the second laser excitation generator 22 and the third laser excitation generator 23, and a processing table 7 for clamping a workpiece 6.

[0007] The first laser excitation generator 21, the second laser excitation generator 22 and the third laser excitation generator 23 are arranged in a vertical direction, the first reflector 31, the second reflector 32 and the third reflector 33 are arranged in an up-down interval and correspond to the positions of the first laser excitation generator 21, the second laser excitation generator 22 and the third laser excitation generator 23 respectively, and the second reflector 32 and the third reflector 33 can move relative to the worktable 1.

[0008] The optical system 4 comprises a mirror frame 41 slidably connected to the worktable 1, the mirror frame 41 is provided with a first optical laser lens group 42 corresponding to the first reflector 31, a second optical laser lens group 43 corresponding to the second reflector 32 and a third optical laser lens group 44 corresponding to the third reflector 33.

[0009] The first optical laser mirror group 42, the second optical laser mirror group 43 and the third optical laser mirror group 44 are arranged at intervals left and right, and the frame 41 moves left and right relative to the workbench 1 so that the first optical laser mirror group 42, the second optical laser mirror group 43 and the third optical laser mirror group 44 can correspond to the first mirror 31, the second mirror 32 and the third mirror 33 respectively.

[0010] The first optical laser mirror group 42 comprises a first beam expander 421 and a first focusing lens 422; the second optical laser mirror group 43 comprises a second beam expander 431 and a second focusing lens 432; and the third optical laser mirror group 44 comprises a third beam expander 441 and a third focusing lens 442.

[0011] The first mirror 31, the second mirror 32 and the third mirror 33 are coated with a full reflection film 91, and the first optical laser mirror group 42, the second optical laser mirror group 43 and the third optical laser mirror group 44 are coated with an anti-reflection film 92 corresponding to different laser wavelengths.

[0012] The workbench 1 is further connected with a CCD probe 100 capable of detecting the workpiece 6 completed on the machining table 7, the CCD probe 100 is connected with a CCD processing system 101, and the CCD probe 100 and the CCD processing system 101 are electrically connected with the control system 5.

[0013] The workbench 1 is provided with a sliding rail 451, the sliding rail 451 is provided with a sliding block 452 capable of sliding relative to the sliding rail 451, the frame 41 is connected to the sliding block 452 and can make the first optical laser mirror group 42, the second optical laser mirror group 43 and the third optical laser mirror group 44 correspond to the first mirror 31, the second mirror 32 and the third mirror 33 respectively when the sliding block 452 moves relative to the sliding rail 451, and the sliding rail 451 is provided with a driving member 453 capable of driving the sliding block 452 to slide.

[0014] The first laser excitation generator 21, the second laser excitation generator 22 and the third laser excitation generator 23 each comprise a frame 82 arranged on the workbench 1, the frame 82 is connected with a gas storage tank 81 for storing gas, the gas storage tank 81 is connected with a gas circulation cavity 84 through a valve 83, laser gas in the gas circulation cavity 84 is sent into a laser resonant cavity 88 through internal circulation driving, the frame 82 is further connected with an excitation circuit 85 and a high-voltage switch 86, the high-voltage switch 86 controls the excitation circuit 85 to excite the gas in the laser resonant cavity 88 to generate laser, a high-voltage charging power supply 93 is electrically connected with the excitation circuit 85 and the high-voltage switch 86, and the outlet end of the laser resonant cavity 88 is further provided with a laser resonant lens 87.

[0015] The first laser excitation generator 21, the second laser excitation generator 22 and the third laser excitation generator 23 can respectively emit 193nm, 248nm and 308nm laser light. ArF gas, KrF gas and XeCl gas are respectively stored in the gas storage tanks 81 of the first laser excitation generator 21, the second laser excitation generator 22 and the third laser excitation generator 23.

[0016] Compared with the prior art, the present application has the following advantages:

[0017] 1. The multi-wavelength intelligent excimer laser processing system has the first laser excitation generator, the second laser excitation generator and the third laser excitation generator capable of emitting different wavelength excimer laser light. Different laser excitation generators correspond to different excimer laser working gas. Therefore, different wavelength excimer laser light can be freely selected for material processing according to the selection of the laser excitation generator on the same system. The laser light emitted by the first laser excitation generator, the second laser excitation generator and the third laser excitation generator can be turned to the same direction through the 45° reflector. When the first laser excitation generator emits laser light, the laser light is emitted to the optical laser system after being reflected by the first reflector. At this time, the second reflector and the third reflector move relative to the workbench to make way for the laser light reflected by the first reflector, so that the laser light reflected by the first reflector can pass through the optical laser system and reach the workpiece clamping workbench, thereby processing the workpiece on the workbench. At the same time, if the second laser excitation generator emits laser light which is reflected by the second reflector, the third reflector also moves relative to the workbench to make way for the laser light reflected by the second reflector. Only the operation control system is needed to select different wavelength laser light according to actual needs, thereby completing material processing process exploration and verification. Of course, the system can generate more than three different wavelengths of laser light, and more laser excitation generators capable of generating different wavelengths of laser light can be set according to actual needs.

[0018] 2. At the same time, an intelligent real-time control system is designed. The control system can receive and analyze data from the processing detection system CCD through algorithm, control and adjust the excimer laser output parameters, switch the mirrors corresponding to different wavelengths and the optical system lenses, and control the precise movement of the workpiece table. BRIEF DESCRIPTION OF DRAWINGS

[0019] Figure 1 is a schematic diagram of the multi-wavelength intelligent excimer laser processing system of the present application;

[0020] Figure 2 is a schematic diagram of the first laser excitation generator, the second laser excitation generator and the third laser excitation generator in the multi-wavelength intelligent excimer laser processing system of the present application;

[0021] Figure 3 It is a schematic diagram of a sliding device designed for selecting an optical system corresponding to lasers of different wavelengths in the multi-wavelength intelligent excimer laser processing system of the present invention;

[0022] Figure 4 is a cross-sectional view of the optical system of the multi-wavelength intelligent excimer laser processing system of the present invention;

[0023] Figure 5 It is a schematic diagram of the principle of the multi-wavelength intelligent excimer laser processing system of the present invention. [Specific implementation method]

[0024] The present invention will be further described below in conjunction with the accompanying drawings:

[0025] like Figures 1 to 5 As shown, a multi-wavelength intelligent excimer laser processing system includes a workbench 1, on which a first laser excitation generator 21, a second laser excitation generator 22 and a third laser excitation generator 23 capable of emitting lasers of different wavelengths are provided, and a first reflector 31 capable of corresponding to the position of the first laser excitation generator 21 and changing the laser emission direction of the first laser excitation generator 21 is provided on the workbench 1, and a second reflector 32 capable of corresponding to the position of the second laser excitation generator 22 and changing the laser emission direction of the second laser excitation generator 22 is movably connected to the workbench 1, and a third reflector 33 capable of corresponding to the position of the third laser excitation generator 23 and changing the laser emission direction of the third laser excitation generator 23 is movably connected to the workbench 1, and when the first reflector 31 reflects the laser, the second reflector 32 and the third reflector 33 can move relative to the workbench 1 to make way for the laser reflected by the first reflector 31, and when the second reflector 32 reflects the laser When emitting laser, the third reflector 33 can move relative to the workbench 1 to make way for the laser reflected by the second reflector 32. The workbench 1 is also provided with an optical system 4 that can allow the laser reflected by the first reflector 31, the second reflector 32 or the third reflector 33 to pass through. The multi-wavelength intelligent excimer laser processing system also includes a control system 5 that can control the operation of the first laser excitation generator 21, the second laser excitation generator 22 and the third laser excitation generator 23. The control system 5 includes a control circuit 51 and a controller 52. The controller 52 controls the working status of the first laser excitation generator 21, the second laser excitation generator 22 and the third laser excitation generator 23 through the control circuit 51. The multi-wavelength intelligent excimer laser processing system also includes a high-voltage charging power supply 93 that can power the first laser excitation generator 21, the second laser excitation generator 22 and the third laser excitation generator 23, and a processing table 7 for clamping the workpiece 6 and capable of precise movement.

[0026] The multi-wavelength intelligent excimer laser processing system has the first laser excitation generator 21, the second laser excitation generator 22 and the third laser excitation generator 33 capable of emitting excimer lasers of different wavelengths, and different laser excitation generators correspond to different excimer laser working gases. Therefore, the excimer laser of different wavelengths can be freely selected for material processing on the same system according to the selection of the laser excitation generator. The laser emitted by the first laser excitation generator 21, the second laser excitation generator 22 and the third laser excitation generator 23 can be turned to the same direction through the 45° reflector, and when the first laser excitation generator 21 emits laser, the laser is emitted to the optical laser system 4 through the first reflector 31, at this time, the second reflector 32 and the third reflector 33 move relative to the workbench 1 to make way for the laser reflected by the first reflector 31, so that the laser reflected by the first reflector 31 can pass through the optical laser system 4 to reach the processing table 7 clamping the workpiece 6, thereby processing the workpiece on the processing table 7. At the same time, if the second laser excitation generator 22 emits laser through the second reflector 32, the third reflector 33 also moves relative to the workbench 1 to make way for the laser reflected by the second reflector 32, and only the operation control system 5 can select laser of different wavelengths according to actual needs, thereby completing material processing process exploration and verification. Of course, the system can generate more than three different wavelengths of laser, and more laser excitation generators capable of generating different wavelengths can be set according to actual needs.

[0027] As shown in Figure 1 The first laser excitation generator 21, the second laser excitation generator 22 and the third laser excitation generator 23 are vertically stacked, the first reflector 31, the second reflector 32 and the third reflector 33 are vertically spaced and correspond to the positions of the first laser excitation generator 21, the second laser excitation generator 22 and the third laser excitation generator 23, and the second reflector 32 and the third reflector 33 can move relative to the workbench 1. The first laser excitation generator 21, the second laser excitation generator 22 and the third laser excitation generator 23 in the application are also vertically spaced, and the second laser excitation generator 22 and the third laser excitation generator 23 can move laterally relative to the workbench 1 by the motor; when the first reflector 31 reflects the laser, the second reflector 32 and the third reflector 33 can move laterally relative to the workbench 1 to make way for the laser reflected by the first reflector 31, and when the second reflector 32 reflects the laser, the third reflector 33 can move relative to the workbench 1 to make way for the laser reflected by the second reflector 32, so that the laser emitted by the first laser excitation generator 21, the second laser excitation generator 22 and the third laser excitation generator 23 is reflected to the optical laser system 4 through the same optical path, and transmitted to the processing workpiece 6 through the optical laser system 4.

[0028] As Figure 1 shown, the optical laser system 4 includes a mirror frame 41 connected to the workbench 1, the mirror frame 41 is provided with a first optical laser mirror group 42 corresponding to the first mirror 31, a second optical laser mirror group 43 corresponding to the second mirror 32 and a third optical laser mirror group 44 corresponding to the third mirror 33.

[0029] As Figure 1 shown, the first optical laser mirror group 42, the second optical laser mirror group 43 and the third optical laser mirror group 44 are arranged left and right, and the mirror frame 41 moves left and right relative to the workbench 1 so that the first optical laser mirror group 42, the second optical laser mirror group 43 and the third optical laser mirror group 44 can correspond to the first mirror 31, the second mirror 32 and the third mirror 33 respectively.

[0030] As Figure 3 and 4 shown, the first optical laser mirror group 42 includes a first beam expander 421 and a first focusing lens 422; the second optical laser mirror group 43 includes a second beam expander 431 and a second focusing lens 432; the third optical laser mirror group 44 includes a third beam expander 441 and a third focusing lens 442.

[0031] As Figure 3 shown, the first mirror 31, the second mirror 32 and the third mirror 33 are coated with a full reflection film 91, and the first optical laser mirror group 42, the second optical laser mirror group 43 and the third optical laser mirror group 44 are coated with an anti-reflection film 92 corresponding to different laser wavelengths. In order to increase the reflectivity of the first mirror 31, the second mirror 32 and the third mirror 33, the first mirror 31, the second mirror 32 and the third mirror 33 are respectively coated with a high reflection film corresponding to different laser wavelengths. The first beam expander 421 and the first focusing lens 422, the second beam expander 431 and the second focusing lens 432, and the third beam expander 441 and the third focusing lens 442 are coated with an anti-reflection film corresponding to different laser wavelengths. Corresponding to 193nm wavelength, 248nm wavelength and 308nm wavelength respectively.

[0032] As Figure 1 shown, the workbench 1 is also connected with a CCD probe 100 capable of checking the machined workpiece 6 on the clamping fixture 7, and the CCD probe 100 is electrically connected with the control system 5. The control software in the controller 52 has a control panel and a display screen capable of operation, and the CCD probe 100 detects the laser processing process on the workpiece 6 in real time, and the staff can observe on the display screen.

[0033] AsFigure 3 As shown in the figure, the workbench 1 is provided with a sliding rail 451, the sliding rail 451 is provided with a sliding block 452 capable of sliding relative to the sliding rail 451, the mirror frame 41 is connected to the sliding block 452 and can make the first optical laser mirror group 42, the second optical laser mirror group 43 and the third optical laser mirror group 44 correspond to the first mirror 31, the second mirror 32 and the third mirror 33 respectively when the sliding block 452 moves relative to the sliding rail 451, and the sliding rail 451 is provided with a driving member 453 capable of driving the sliding block 452 to slide. The driving member 453 is a motor. When it is necessary to change and move the first optical laser mirror group 42, the second optical laser mirror group 43 and the third optical laser mirror group 44 to correspond to the first mirror 31, the second mirror 32 and the third mirror 33 respectively, the driving member 453 moves to drive the sliding block 452 to slide left and right relative to the sliding rail 451, so that the first optical laser mirror group 42, the second optical laser mirror group 43 and the third optical laser mirror group 44 correspond to the first mirror 31, the second mirror 32 and the third mirror 33 respectively.

[0034] As shown in the figure, Figure 2 The first laser excitation generator 21, the second laser excitation generator 22 and the third laser excitation generator 23 each include a frame 82 provided on the workbench 1, the frame 82 is connected with a gas storage tank 81 for storing gas, the gas storage tank 81 is connected with a gas circulation cavity 84 through a valve 83, the laser gas in the gas circulation cavity 84 is sent into a laser resonant cavity 88 through internal circulation driving, the frame 82 is also connected with an excitation circuit 85 and a high-voltage switch 86, the high-voltage switch 86 controls the excitation circuit 85 to excite the gas in the laser resonant cavity 88 to generate laser, the high-voltage charging power supply 93 is electrically connected with the excitation circuit 85 and the high-voltage switch 86, and the outlet end of the laser resonant cavity 88 is also provided with a laser resonant lens 87. The valve 83 is used to communicate the gas circulation cavity 84 and the gas storage tank 81, when the high-voltage charging power supply 93 delivers power to the excitation circuit 85 and the high-voltage switch 86 changes from the closed state to the open state, the gas in the laser resonant cavity 88 reacts to generate laser through the action of the excitation circuit 85 and is emitted outward through the laser resonant lens 87. Therefore, when the stored gas in the gas storage tank 81 is different, the wavelength of the emitted laser is different.

[0035] As shown in the figure, Figure 2 The gas storage tank 81 of the first laser excitation generator 21, the second laser excitation generator 22 and the third laser excitation generator 23 respectively stores ArF gas, KrF gas and XeCl gas, so that the first laser excitation generator 21, the second laser excitation generator 22 and the third laser excitation generator 23 can respectively emit 193nm, 248nm and 308nm laser.

[0036] The CCD probe 100 and the CCD processing system 101 are electrically connected with the control system 5. The CCD probe 100 monitors the machining condition of the workpiece on the workpiece table. The signal collected by the CCD is converted, processed by the CCD processing system 101 and transmitted to the control system 5. The control system 5 analyzes the machining condition through algorithm software and can control and adjust the output parameters of the excimer laser according to the analysis result, switches the corresponding mirrors and optical system lenses of different wavelengths through the electric drive on the mirrors and optical system lenses, and controls the precise movement of the workpiece table through the drive motor on the workbench.

Claims

1. A multi-wavelength intelligent excimer laser processing system, characterized by: The invention comprises a workbench (1), wherein the workbench (1) is provided with a first laser excitation generator (21), a second laser excitation generator (22) and a third laser excitation generator (23) capable of emitting lasers of different wavelengths outward, the workbench (1) is provided with a first reflector (31) capable of corresponding to the position of the first laser excitation generator (21) and changing the laser emission direction of the first laser excitation generator (21), the workbench (1) is also movably connected to a second reflector (32) capable of corresponding to the position of the second laser excitation generator (22) and changing the laser emission direction of the second laser excitation generator (22), the workbench (1) is also movably connected to a third laser excitation generator (23) capable of corresponding to the position of the third laser excitation generator (23) and changing the laser emission direction of the first laser excitation generator (21), and the workbench (1) is also movably connected to a second reflector (32) capable of corresponding to the position of the second laser excitation generator (22) and changing the laser emission direction of the second laser excitation generator (22). A third reflector (33) is provided for changing the direction of laser emission of the third laser excitation generator (23), and when the first reflector (31) reflects the laser, the second reflector (32) and the third reflector (33) can move relative to the workbench (1) to make way for the laser reflected by the first reflector (31), and when the second reflector (32) reflects the laser, the third reflector (33) can move relative to the workbench (1) to make way for the laser reflected by the second reflector (32), and the workbench (1) is also provided with an optical system (4) capable of allowing the laser reflected by the first reflector (31), the second reflector (32) or the third reflector (33) to pass through. The multi-wavelength intelligent excimer laser processing system also includes an optical system capable of A control system (5) for controlling the operation of a first laser excitation generator (21), a second laser excitation generator (22) and a third laser excitation generator (23), a high-voltage charging power supply (93) capable of supplying power to the first laser excitation generator (21), the second laser excitation generator (22) and the third laser excitation generator (23), and a processing table (7) for clamping a workpiece (6), wherein the first laser excitation generator (21), the second laser excitation generator (22) and the third laser excitation generator (23) are stacked in a vertical direction, and the first reflector (31), the second reflector (32) and the third reflector (33) are spaced apart from each other and are respectively connected to the first laser excitation generator (21), the second laser excitation generator (22) and the third laser excitation generator (23). The positions of the first laser excitation generator (22) and the third laser excitation generator (23) correspond to each other, and the second reflector (32) and the third reflector (33) can move relative to the workbench (1). The workbench (1) is also connected to a CCD probe (100) that can detect the workpiece (6) processed on the processing table (7). The CCD probe (100) is connected to a CCD processing system (101). The CCD probe (100) and the CCD processing system (101) are electrically connected to the control system (5). The first laser excitation generator (21), the second laser excitation generator (22) and the third laser excitation generator (23) all include a frame (82) provided on the workbench (1).The frame (82) is connected with a gas storage tank (81) for storing gas, the gas storage tank (81) is connected with a gas circulation cavity (84) through a valve (83), the laser gas in the gas circulation cavity (84) is sent into a laser resonant cavity (88) through internal circulation driving, the frame (82) is also connected with an excitation circuit (85) and a high-voltage switch (86), the high-voltage switch (86) controls the excitation circuit (85) to excite the gas in the laser resonant cavity (88) to generate laser, the high-voltage charging power supply (93) is electrically connected with the excitation circuit (85) and the high-voltage switch (86), the outlet end of the laser resonant cavity (88) is also provided with a laser resonant lens (87), the first laser excitation generator (21), the second laser excitation generator (22) and the third laser excitation generator (23) can respectively emit 193nm, 248nm and 308nm laser, the gas storage tank (81) of the first laser excitation generator (21), the second laser excitation generator (22) and the third laser excitation generator (23) respectively stores ArF gas, KrF gas and XeCl gas.

2. The multi-wavelength intelligent excimer laser processing system according to claim 1, characterized in that: The optical system (4) comprises a mirror frame (41) slidably connected to the workbench (1), and the mirror frame (41) is provided with a first optical laser lens group (42) corresponding to the first mirror (31), a second optical laser lens group (43) corresponding to the second mirror (32) and a third optical laser lens group (44) corresponding to the third mirror (33).

3. The multi-wavelength intelligent excimer laser processing system according to claim 2, wherein: The first optical laser lens group (42), the second optical laser lens group (43) and the third optical laser lens group (44) are arranged at intervals left and right, and the mirror frame (41) moves left and right relative to the workbench (1) so that the first optical laser lens group (42), the second optical laser lens group (43) and the third optical laser lens group (44) can correspond to the first mirror (31), the second mirror (32) and the third mirror (33) respectively.

4. The multi-wavelength intelligent excimer laser processing system according to claim 3, wherein: The first optical laser lens group (42) comprises a first beam expander (421) and a first focusing lens (422); the second optical laser lens group (43) comprises a second beam expander (431) and a second focusing lens (432); and the third optical laser lens group (44) comprises a third beam expander (441) and a third focusing lens (442).

5. The multi-wavelength intelligent excimer laser processing system according to claim 3, wherein: The first mirror (31), the second mirror (32) and the third mirror (33) are coated with a full reflection film (91), and the first optical laser lens group (42), the second optical laser lens group (43) and the third optical laser lens group (44) are coated with an anti-reflection film (92) corresponding to different laser wavelengths.

6. The multi-wavelength intelligent excimer laser processing system according to claim 3, wherein: The workbench (1) is provided with a sliding rail (451), the sliding rail (451) is provided with a sliding block (452) capable of sliding relative thereto, the mirror frame (41) is connected to the sliding block (452) and can make the first optical laser lens group (42), the second optical laser lens group (43) and the third optical laser lens group (44) correspond to the first mirror (31), the second mirror (32) and the third mirror (33) respectively when the sliding block (452) moves relative to the sliding rail (451), and the sliding rail (451) is provided with a driving member (453) capable of driving the sliding block (452) to slide.

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