A multifunctional sample transfer and support system in a linear plasma device

Abstract

A multi-functional sample transfer and support system in a linear plasma device, which belongs to the technical field of the auxiliary system for the interaction between plasma and wall materials in large-scale vacuum plasma equipment. It includes the implementation technologies of a support device, a telescopic device, a swing angle device, a cooling device, and a DC negative bias device in a high-vacuum environment. Based on the plasma conditions of high heat flux density and high ion flux, this system integrates a water-cooling device, a sample telescopic and rotation angle device, and a DC bias device in a high-vacuum environment. At the same time, insulating materials such as high-temperature ceramics are used to insulate the short-circuit phenomenon caused by high-density plasma. The present invention can not only achieve the high flexibility of the sample stage but also achieve the shielding of the complex mechanical devices behind the sample stage by the plasma. It can be used not only to study physical processes such as material surface erosion and sputtering phenomena caused by plasma irradiation of the target plate but also to develop related diagnostic technologies such as spectrometers and Thomson scattering.

Description

Technical Field

[0001] The present invention belongs to the technical field of the interaction assistance system between plasma and wall materials in large vacuum plasma equipment. Specifically, it relates to a sample transfer system and its implementation method in a linear plasma device, and particularly to the application of a multifunctional sample transfer support system with adjustable axial position of the transferred sample, controllable temperature of the sample target stage, allowing the sample to deflect within a certain range, applying negative bias voltage to the target plate, and being remotely controllable in the plasma and related technical fields. Background Art

[0002] Magnetic confinement fusion energy is considered to be one of the main ways to solve the future energy problem of mankind. Since the 1960s, a series of remarkable achievements have been made in the research of tokamaks, which have become the most important devices for studying nuclear fusion. However, due to the harsh discharge experimental conditions, difficult diagnosis, and high operating costs of tokamak devices, it is difficult to conduct in-depth research on many physical problems at the present stage, such as the interaction between plasma and materials, boundary plasma physics, etc. In response to these scientific problems, linear plasma devices have emerged with the advantages of low cost, simple geometric structure, steady operation, easy diagnosis, etc. It can generate and maintain a stable plasma for dozens of hours, and equivalently simulate and verify the boundary environment in tokamaks under relatively simple laboratory conditions. In addition, linear plasma devices are also widely used in electromagnetic propulsion in aerospace, ground simulation of space environment and other fields.

[0003] A linear plasma device usually consists of a magnet coil, a plasma source, a vacuum system, and a cooling system. The vacuum system includes a vacuum chamber, a pumping unit, a gas supply system, a support frame, a linkage control system for the whole machine, etc. Among them, the vacuum chamber can be divided into a plasma source chamber, an auxiliary heating chamber, a target chamber, and a material exchange chamber. In order to facilitate the analysis and replacement of irradiated samples, it is necessary to transfer the samples from the material exchange chamber to the target chamber under the condition of maintaining a vacuum in the main chamber. Therefore, a telescopic sample delivery device is required. One end of the material exchange chamber is separated from the target chamber by a gate valve, and the other end is connected to the sample delivery device.

[0004] The telescopic transfer support system should have good axial position control ability in a vacuum environment, and be compatible with the target stage swing angle, active cooling and negative bias voltage functions. However, traditional vacuum sample delivery systems generally use a fixed sample stage without large-scale telescoping, and can only conduct research on complex experimental conditions at fixed positions. Summary of the Invention

[0005] The present invention provides a multi-functional sample transfer and support system in a linear plasma device for a linear plasma device. The sample transfer system should have the following functions: 1. To achieve large-scale telescoping of the sample stage in a vacuum environment to obtain operating parameters such as plasma heat flux density, electron temperature, and electron density at various axial positions; 2. To achieve angular swing of the sample stage to simulate the erosion effect of the sample irradiated by plasma at different angles; 3. To achieve the active cooling function of the sample stage and effectively control the temperature of the target plate under plasma irradiation; 4. The sample stage has a variable DC negative bias function to adjust the ion energy incident on the sample and conduct research on material sputtering erosion, irradiation damage, etc.

[0006] To achieve the above object, the technical solution adopted by the present invention is:

[0007] A multi-functional sample transfer and support system in a linear plasma device, wherein the sample transfer and support system includes a sample support device, a telescoping device, a swing angle device, a cooling device, and a DC negative bias device.

[0008] The telescoping device uses a telescoping motor to drive the rotation of a lead screw, and a lead screw connection block is arranged on the lead screw; the lower part of the lead screw connection block is fixedly connected to a slider, and the upper part of the lead screw connection block is fixedly connected to one end of an intermediate support tube; the other end of the intermediate support tube passes through a bellows and a fine-tuning bellows and is fixedly connected to a fixed frame, and a sample stage is arranged on the fixed frame; the slider moves linearly back and forth along a slide rail, driving the sample stage to extend or retract;

[0009] The swing angle device uses a deflection motor to drive the rotation of a deflection angle transmission shaft. An bevel gear is arranged at the end of the deflection angle transmission shaft passing through the intermediate support tube. The bevel gear meshes with a support frame bevel gear fixed on the first support frame of the deflection angle, driving the rotation of the first support frame of the deflection angle; and then driving the rotation of the second support frame of the deflection angle through a sprocket to achieve the deflection of the sample stage;

[0010] The cooling device uses a water-cooled table arranged at the bottom of the sample stage. The water-cooled table is respectively connected to a cooling system inlet pipe and a cooling system outlet pipe; the cooling system inlet pipe and the cooling system outlet pipe pass through the end of the intermediate support tube and are respectively provided with an inlet and an outlet for connecting to an external water circuit;

[0011] The DC bias device includes a bias motor and a bias power supply to apply a DC negative bias of less than 400 V to the sample stage.

[0012] An origin limit and an end limit are provided on the lead screw, and the lead screw connection block moves between the origin limit and the end limit.

[0013] The telescoping distance range adjusted by the telescoping device is 0 to 1650 mm, and the accuracy is 1 mm.

[0014] In the swing angle device, there are also the original position of the deflection angle, the forward rotation angle limit, and the reverse rotation angle limit, which are used to limit the swing angle adjustment range.

[0015] The swing angle adjustment range is ±30°, and the accuracy is 1°.

[0016] One end of the deflection angle rotating shaft in the swing angle device close to the deflection motor is connected to the magneto - fluid seal to ensure the vacuum degree of the system.

[0017] The support device includes an intermediate support tube, a roller support assembly, and an auxiliary support assembly.

[0018] The voltage range of the negative bias power supply is 0 to - 450V, and the conduction current is limited within 2A.

[0019] A working method of a multi - functional sample transfer and support system in a linear plasma device:

[0020] (1) Extension or retraction of the sample stage

[0021] The telescopic motor drives the lead screw to rotate. The lead screw connecting block drives the bellows, and through the slider, it makes a linear reciprocating motion along the slide rail; the front end of the bellows is connected to the sample stage, thereby driving the extension or retraction of the sample stage; the telescopic range of the sample stage is 0 - 1650mm, and the accuracy is 1mm;

[0022] (2) Deflection of the sample stage

[0023] The deflection motor drives the deflection angle transmission shaft to rotate. The deflection angle transmission shaft is provided with bevel gears through the end of the bellows; the bevel gears mesh with the support bevel gears fixed on the first support frame of the deflection angle, driving the first support frame of the deflection angle to rotate; and then through the sprocket, it drives the second support frame of the deflection angle to rotate, realizing the deflection of the sample stage; the forward rotation angle limit and the reverse rotation angle limit limit the swing angle adjustment range to ±30°, and the accuracy is 1°;

[0024] (3) Cooling of the sample stage

[0025] Cooling water flows into the water - cooled table through the cooling system inlet pipe and then flows out from the cooling system outlet pipe; both the cooling system inlet pipe and the cooling system outlet pipe are connected by bellows soft connections to ensure that the sample stage meets the requirements of the deflection angle; the cooling water is connected to the external water circuit through a flange, and the maximum water flow rate is 80ml / s. By controlling the size of the water flow rate, the temperature of the sample stage can be controlled accordingly;

[0026] (4)DC negative bias

[0027] A DC negative bias within 400V is applied to the sample stage by using a bias electrode and a bias power supply.

[0028] The specific working principle and innovation points of the present invention are as follows: In order to simulate the irradiation requirements of samples at different axial positions in a linear plasma device, it is necessary to invent a transmission device with adjustable distance. However, in a vacuum environment, it is very difficult to integrate the corner device, cooling device, and DC bias in the limited space on the back of the sample and make them unaffected by the conduction of high-density plasma generated by the discharge. The innovation point of the present invention lies in integrating a water-cooling device, a sample telescopic and corner device, and a DC bias device in a high-vacuum environment based on the plasma working conditions of high heat flux density and high ion flux, and using insulating materials such as high-temperature ceramics to insulate the short-circuit phenomenon caused by high-density plasma. The present invention can not only achieve high flexibility of the sample stage but also achieve shielding of the complex mechanical device behind the sample stage by the plasma.

[0029] The beneficial effects of the present invention are as follows:

[0030] (1) The present invention realizes precise position control for the sample transmission in the linear plasma device. The position range is 0 - 1650 mm, and the accuracy is 1 mm. The telescopic push rod is adjustable, and the axial position can be set according to requirements, solving the problem that the traditional sample support stand is fixed and cannot perform linear telescoping, ensuring the diversity of experimental axial sampling points.

[0031] (2) The angle of the sample stage facing the plasma involved in the present invention can be adjusted within ±30°, and the adjustment accuracy is 1°. The negative bias voltage of the sample stage is adjustable from 0 to 400 V, and the adjustment accuracy is 1 V. The equipped water-cooling device can control the sample temperature, meeting the requirements of plasma irradiation of samples under different working conditions and more realistically simulating various complex working conditions in the tokamak fusion device.

[0032] (3) The sample transmission support system involved in the present invention can not only be used for linear plasma devices with a long axis but also be extended to other large-scale experimental or industrial vacuum devices, meeting the multi-functional sample delivery requirements of vacuum chambers in different fields. Description of the Drawings

[0033] Figure 1 It is a structural diagram of a multi-functional sample transmission support system in a linear plasma device.

[0034] Figure 2 It is a schematic diagram of the telescopic device of the sample transmission system of the present invention.

[0035] Figure 3 It is a schematic diagram of the end of the sample transmission system of the present invention.

[0036] Figure 4 It is a schematic diagram of the front end of the sample transmission system of the present invention.

[0037] Figure 5This is the structural diagram of the sample transfer system of the present invention.

[0038] In the figure: 1. Intermediate support tube; 2. Slide gate valve; 3. Roller support assembly; 4. Auxiliary support assembly; 5. Telescopic motor; 6. Slide rail, 6a. Slide block; 7. Lead screw, 7a. Lead screw connecting block; 8. Origin limit; 9. End limit; 10. Bellows; 11. Deflection motor; 12. Original position of deflection angle; 13. Forward rotation angle limit; 14. Reverse rotation angle limit; 15. Bias electrode; 16. Magnetic fluid seal; 17. Deflection angle transmission shaft; 18. Bevel gear; 19. Sprocket; 20. First support frame for deflection angle, 20a. Support frame bevel gear; 21. Second support frame for deflection angle; 22. Sample stage; 23. Cooling system inlet pipe, 23a. Inlet; 24. Cooling system outlet pipe, 24a. Outlet; 25. Water-cooled table, 25a. Fixed frame; 26. Sample exchange chamber. Embodiment

[0039] The above content of the present invention will be further described in detail below in conjunction with the drawings and specific embodiments, but the scope of the present invention is not limited to the following examples.

[0040] A multi-functional sample transfer and support system in a linear plasma device includes a sample support device, a telescopic device, a swing angle device, a cooling device, and a DC negative bias device. The high-vacuum environment is pumped by a two-stage differential superposition of a dry pump and a molecular pump. The support device includes an intermediate support tube, a roller support assembly, and an auxiliary support assembly. The telescopic device includes a telescopic deflection motor, a lead screw, a slide rail, and origin and end limits are set. The swing angle device includes a deflection motor, a magnetic fluid seal, a deflection angle transmission shaft, and a deflection angle limit. The cooling device includes an inlet bellows and an outlet bellows, and a water-cooled table. The DC negative bias includes a bias power supply, a vacuum electrode, and a power cord with polytetrafluoroethylene as the outer insulating material.

[0041] The telescopic device uses a telescopic motor 5 to drive the lead screw 7 to rotate, and a lead screw connecting block 7a is arranged on the lead screw 7; the lower part of the lead screw connecting block 7a is fixedly connected with the slide block 6a, and the upper part of the lead screw connecting block 7a is fixedly connected with one end of the intermediate support tube 1; the other end of the intermediate support tube 1 passes through the bellows 10 and the fine-tuning bellows 10a and is fixedly connected with the fixed frame 25a, and a sample stage 22 is arranged on the fixed frame 25a; the slide block 6a makes a linear reciprocating motion along the slide rail 6, driving the sample stage 22 to extend or retract;

[0042] The swing angle device uses a deflection motor 11 to drive the rotation of a deflection angle transmission shaft 17. The deflection angle transmission shaft 17 passes through the end of an intermediate support tube 1 and is provided with a bevel gear 18. The bevel gear 18 meshes with a support frame bevel gear 20a fixed on a first deflection angle support frame 20, driving the rotation of the first deflection angle support frame 20; and then drives the rotation of a second deflection angle support frame 21 through a sprocket 19, realizing the deflection of a sample stage 22.

[0043] The cooling device uses a water-cooled table 25 arranged at the bottom of the sample stage 22. The water-cooled table 25 is respectively connected to a cooling system inlet pipe 23 and a cooling system outlet pipe 24; the cooling system inlet pipe 23 and the cooling system outlet pipe 24 pass through the end of the intermediate support tube 1 and are respectively provided with an inlet 23a and an outlet 24a for connecting to an external water circuit; the cooling medium can flow along the circulation pipeline and there is no leakage situation, ensuring that the system vacuum degree meets the experimental requirements. The cooling medium uses deionized water for cooling, and the cooling water flow is controllable, and the surface temperature of the sample can be adjusted.

[0044] The DC bias voltage device includes a bias voltage motor 15 and a bias voltage power supply, loading a DC negative bias voltage within 400 V on the sample stage. The sample increases the negative bias voltage in a high-density high-throughput plasma environment. The voltage range of the negative bias voltage power supply is from 0 to -450 V, and the conduction current is limited within 2 A.

[0045] An origin limit 8 and an end limit 9 are provided on a lead screw 7, and a lead screw connecting block 7a moves between the origin limit 8 and the end limit 9. The telescopic distance range adjusted by the telescopic device is from 0 to 1650 mm, the precision is 1 mm, the telescopic speed is controllable, and it has the functions of origin limit and end limit.

[0046] In the swing angle device, there are also a deflection angle origin position 12, a forward rotation angle limit 13, and a reverse rotation angle limit 14, used to limit the swing angle adjustment range. The swing angle adjustment range is ±30°, the precision is 1°, the swing angular speed is controllable, and it has the functions of origin, forward deflection angle, and reverse deflection angle limit.

[0047] One end of the deflection angle rotating shaft 17 in the swing angle device close to the deflection motor 11 is connected to a magneto-fluid seal 16 to ensure the vacuum degree of the system.

[0048] The support device includes an intermediate support tube 1, a roller support assembly 3, and an auxiliary support assembly 4. The roller support assembly is made of polytetrafluoroethylene material, and the auxiliary support assembly is in the same plane as the intermediate support tube.

[0049] It is necessary to ensure the insulation between the sample transfer system and the vacuum system housing. The vacuum electrode and the vacuum chamber use ceramic insulation. The deflection angle transmission shaft uses a component made of polytetrafluoroethylene material for insulation. The roller support assembly is made of polytetrafluoroethylene material to ensure the insulation between the sample stage and the vacuum chamber housing.

[0050] A gate valve is provided between the sample support transfer system and the large vacuum experimental chamber, and a gate valve and a stop valve are provided between the sample exchange chamber and the molecular pump.

[0051] Specifically, in this example, a tungsten metal plate with a diameter of 100 mm and a thickness of 3 mm is used as the target. Before discharging, the background vacuum of the sample analysis and exchange chamber is 1×10 -4 Pa. The plasma source uses helicon wave discharge, the discharge power is 1.5 KW, the working gas is argon, the mass flow rate is 40 sccm, and the magnetic field strength is 1000 Gs.

[0052] A multi-functional sample transfer system in a linear plasma device includes a sample transfer system in a high vacuum environment of 1×10 -4 Pa, a target size that can be flexibly designed according to actual needs, a support system that can bear 12 kg, a system that ensures the sample can stretch within the range of 0 to 1650 mm, a system in which the sample stage can have a deflection angle within the range of ±30°, a cooling system that can control the temperature of the target plate, and a negative bias voltage system within the range of 0 to 400 V. Among them, the stretching system, the deflection angle system, and the negative bias voltage system are all remotely controlled by an industrial control computer.

[0053] Reference Figure 1 、 Figure 2 、 Figure 5 In order to construct a high vacuum environment for the multi-functional sample transfer system, vacuum equipment such as a gate valve 2, a sample exchange chamber 26, a sealed knife-edge flange, and a bellows 10 are used, so that the sample exchange chamber 26, the fine-tuning bellows 10a, and the bellows 10 are all in a vacuum state. At the same time, in order to control the deflection angle with a motor, a magneto-fluid seal 16 is introduced, which can not only transmit torque to the deflection angle drive shaft 17, but also ensure the high vacuum environment of the sample delivery system. The system adopts a two-stage pumping method of a dry pump + a molecular pump. First, the dry pump pumps the sample exchange chamber 26 to below 10 Pa, and then the molecular pump is turned on for further pumping. Within three hours, the background vacuum degree of the environment can be ensured to reach 1×10 -4 Pa or below.

[0054] Reference Figure 4 The sample stage 22 is fixed by a gland method and connected to the threaded holes on the outer ring, which is easy to install. Different sizes of targets can be designed and installed according to needs, and the maximum size range is Φ100mm×50mm. A shielding plate is installed at the front end of the sample stage 22 to prevent the ion beam from damaging the cooling system inlet pipe 23, the cooling system outlet pipe 24 at the rear end of the sample stage, and the corresponding insulating parts.

[0055] Reference Figure 1, as shown in the schematic diagram of the support device, the maximum weight that the sample stage can bear is 12 Kg, and it maintains stability. The support system includes two components: the roller support component 3 and the auxiliary support component 4. The roller support component 3 is fixed inside the fine-tuning bellows 10a, and the auxiliary support component 4 is installed at the CF150 interface below the target chamber, and its lifting height is adjustable to prevent the sample stage from sinking after moving into the target chamber. When the telescopic system is in the initial position, the middle support tube 1 is placed above the roller support component 3. As the telescopic system sends the sample to the target chamber, the auxiliary support component 4 is raised to act on the lower part of the middle support tube 1 to ensure that the sample is always at the center position of the cavity.

[0056] Reference Figure 4 , the cooling water flows into the water-cooled stage 25 through the cooling system inlet pipe 23, and then flows out from the cooling system outlet pipe 24. The cooling system inlet pipe 23 and the cooling system outlet pipe 24 pass through the end part of the middle support tube 1 and are respectively provided with an inlet 23a and an outlet 24a; here, a bellows soft connection is adopted, and the bellows soft connection method can ensure that the sample stage can perform a swing angle to meet the requirement of the deflection angle. The cooling water is connected to the external water circuit through a flange, and the maximum water flow rate is 80 ml / s. By controlling the size of the water flow rate, the requirement of controlling the temperature of the sample stage is achieved. In this experiment, deionized water with a high resistivity is used as the cooling medium.

[0057] The sample transfer system is provided with an anti-misoperation logic protection and an alarm system. When the gate valve 2 is in the closed state, or the auxiliary support component 4 is not at the original position, or the telescopic device is not in the original position state, the telescopic system cannot be opened.

[0058] The telescopic system, the deflection angle system, the negative bias voltage system, and the industrial control computer control system need to be operated in a specific experiment, and the specific implementation steps are as follows:

[0059] 1. Close the gas injection valve, close the observation window of the sample exchange chamber, successively turn on the dry pump and the molecular pump, and pump the vacuum degree of the sample analysis and exchange chamber to below 1×10 -4 Pa. The vacuum degree is measured using a resistance gauge and an ionization gauge. Ensure that the large cavity of the vacuum chamber is under the same vacuum condition. As Figure 1 shown, open the gate valve 2, and control the sample stage to extend into the large cavity through the industrial control computer.

[0060] 2. The operation interface of the industrial control computer for controlling the sample stage includes: sample stage telescopic control, return to original position operation button, telescopic speed control, and real-time displacement display. The telescopic motor 5 electrically controls the moving speed and displacement. The lead screw connection block 7a is arranged on the lead screw, fixed to the middle support tube 1 above and fixed to the slider 6a below; the middle support tube 1 passes through the bellows 10 and the other end of the fine-tuning bellows 10a and is fixed to the fixed frame 25a, and the sample stage 22 is arranged on the fixed frame 25a;

[0061] When the slider 6a moves on the slide rail 6, the sample stage 22 provided at the front end of the intermediate support tube 1 also moves, thus meeting the usage requirements of the extension or retraction of the sample stage. The origin limit 8 and the end limit 9 ensure that the telescopic range of the sample stage is 0 - 1650 mm. A bellows 10 with a diameter of 100 mm and a length of 1600 mm is used for moving seal to ensure the vacuum degree of the system. The displacement of the sample stage extending into the large cavity is controlled to be 1650 mm.

[0062] 3. Controlling the sample deflection angle by the industrial control computer mainly includes the following aspects: controlling the forward or reverse deflection of the sample stage, setting the deflection speed of the deflection angle, and real-time displaying the deflection angle. The deflection motor 11 electrically controls the swing angle of the sample stage. The original position point 12 of the deflection angle, the forward rotation angle limit 13, and the reverse rotation angle limit 14 ensure that the swing angle adjustment range is ±30°. A magnetic fluid seal 16 is used to ensure the vacuum degree of the system. The tail end of the deflection angle rotating shaft 17 is connected to the magnetic fluid seal 16, and the front end is connected to the bevel gear 18. The bevel gear 18 is tightly connected to the first support frame 20 of the deflection angle. Through gear transmission to the sprocket 19, and then through the second support frame 21 of the deflection angle, the sample stage 22 is controlled to deflect within the deflection range of -30° to +30°.

[0063] 4. The described DC bias device includes a C35 bias electrode 15 and a bias power supply, which can apply a DC negative bias within 400 V to the sample stage. The target negative bias system needs to be given in a plasma environment to accelerate ions to bombard the target plate and study the erosion and damage of the target plate and the generation of wall impurities. The industrial control computer controls the argon gas flow rate to be 40 sccm (variable range 0 to 200 sccm), turns on the magnetic field coil, and sets the magnetic field strength to 1000 Gs (variable range 0 to 4000 Gs) to confine the generated plasma, and uses a helicon wave source to generate high-density plasma. The plasma is transported along the magnetic field under magnetic field confinement and bombards the target plate. The industrial control computer mainly controls the sample negative bias from the following aspects: setting the bias value within the range of 0 - 400 V, and real-time displaying the actual bias value and the current value of the bias circuit.

Claims

1. A multi-functional sample transfer and support system in a linear plasma device, characterized in that: It includes a support device, a telescopic device, a swing angle device, a cooling device, and a DC negative bias device; The telescopic device uses a telescopic motor (5) to drive the rotation of a lead screw (7), and a lead screw connection block (7a) is arranged on the lead screw (7); the lower part of the lead screw connection block (7a) is fixedly connected to a slider (6a), and the upper part of the lead screw connection block (7a) is fixedly connected to one end of an intermediate support tube (1); the intermediate support tube (1) passes through the bellows (10) and the fine-tuning bellows (10a) and is fixedly connected to a fixed frame (25a) at the other end, and a sample stage (22) is arranged on the fixed frame (25a); the slider (6a) makes a linear reciprocating motion along the slide rail (6), driving the sample stage (22) to extend or retract; The swing angle device uses a deflection motor (11) to drive the rotation of a deflection angle transmission shaft (17), and a bevel gear (18) is arranged at the end of the deflection angle transmission shaft (17) passing through the intermediate support tube (1), and the bevel gear (18) meshes with a support frame bevel gear (20a) fixed on the first deflection angle support frame (20), driving the first deflection angle support frame (20) to rotate; and then driving the second deflection angle support frame (21) to rotate through a sprocket (19), realizing the deflection of the sample stage (22); The cooling device uses a water-cooling table (25) arranged at the bottom of the sample stage (22), and the water-cooling table (25) is respectively connected to a cooling system water inlet pipe (23) and a cooling system water outlet pipe (24); the cooling system water inlet pipe (23) and the cooling system water outlet pipe (24) pass through the end of the intermediate support tube (1) and are respectively provided with a water inlet (23a) and a water outlet (24a) for connecting to an external water circuit; The DC negative bias device includes a bias electrode (15) and a bias power supply, and applies a DC negative bias within 400 V to the sample stage; An origin limit (8) and an end limit (9) are arranged on the lead screw (7), and the lead screw connection block (7a) moves between the origin limit (8) and the end limit (9); The telescopic distance range adjusted by the telescopic device is 0 to 1650 mm, and the accuracy is 1 mm; In the swing angle device, there are also a deflection angle origin position (12), a forward rotation angle limit (13), and a reverse rotation angle limit (14) for limiting the swing angle adjustment range; The swing angle adjustment range is ±30°, and the accuracy is 1°.

2. The multifunctional sample transfer and support system in a linear plasma device according to claim 1, wherein: One end of the deflection angle transmission shaft (17) close to the deflection motor (11) in the swing angle device is connected to a magnetic fluid seal (16) to ensure the vacuum degree of the system.

3. The multifunctional sample transfer and support system in a linear plasma device according to claim 1, characterized in that: The support device includes an intermediate support tube (1), a roller support assembly (3), and an auxiliary support assembly (4).

4. The multifunctional sample transfer and support system in a linear plasma device according to claim 1, wherein: The voltage range of the negative bias power supply is 0 to -450 V, and the conduction current is limited within 2 A.

5. The working method of a multi-functional sample transfer support system in a linear plasma device according to any one of claims 1-4, characterized in that: (1) Extension or retraction of the sample stage The telescopic motor (5) drives the lead screw (7) to rotate. The lead screw connecting block (7a) drives the bellows (10) to perform linear reciprocating motion along the slide rail (6) through the slider (6a). The front end of the bellows (10) is connected to the sample stage (22), thereby driving the extension or retraction of the sample stage. The telescopic range of the sample stage (22) is 0 - 1650 mm, and the accuracy is 1 mm. (2) Deflection of the sample stage The deflection motor (11) drives the deflection angle transmission shaft (17) to rotate. The deflection angle transmission shaft (17) is provided with a bevel gear (18) through the end of the bellows (10). The bevel gear (18) meshes with the support bevel gear (20a) fixed on the first deflection angle support frame (20), driving the first deflection angle support frame (20) to rotate. Furthermore, the second deflection angle support frame (21) is driven to rotate through the sprocket (19), realizing the deflection of the sample stage (22). The forward rotation angle limit (13) and the reverse rotation angle limit (14) limit the swing angle adjustment range to ±30°, and the accuracy is 1°. (3) Cooling of the sample stage Cooling water flows into the water-cooled table (25) through the cooling system inlet pipe (23), and then flows out from the cooling system outlet pipe (24). Both the cooling system inlet pipe (23) and the cooling system outlet pipe (24) are connected by bellows soft connections to ensure that the sample stage meets the requirements of the deflection angle. The cooling water is connected to the external water circuit through a flange, and the maximum water flow rate is 80 ml / s. By controlling the size of the water flow rate, the requirement of controlling the temperature of the sample stage is achieved. (4) DC negative bias voltage A bias electrode (15) and a bias power supply are used to apply a DC negative bias voltage of less than 400 V to the sample stage.

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