Raw material gas supply system, powder raw material replenishing mechanism, and powder raw material replenishing method

Abstract

A powder material replenishing mechanism for replenishing a powder material supply device that supplies a powder material to a gasification device that generates a raw material gas by gasifying a powder material, in a raw material gas supply system that supplies the raw material gas generated by gasifying the powder material by the gasification device to a processing device, includes: a pipe having one end connected to the powder material supply device; a powder material box filled with the powder material; a connection portion provided on the other end side of the pipe, to which the powder material box is detachably connected; an opening / closing portion provided on the other end side of the pipe, which opens and closes between the pipe and the powder material box; and a vacuum exhaust portion that performs vacuum exhaust on the pipe to maintain the pipe in a vacuum, wherein the powder material box is connected to the connection portion in a state where the pipe is maintained in the vacuum by the vacuum exhaust portion, and the powder material in the powder material box is carried to the powder material supply device by opening the opening / closing portion in this state.

Description

TECHNICAL FIELD

[0001] The present disclosure relates to a raw material gas supply system, a powder raw material replenishing mechanism, and a powder raw material replenishing method. BACKGROUND

[0002] A raw material gas supply system is proposed in Patent Literature 1, which has a gasification device that houses a powder raw material and gasifies the powder raw material, a raw material gas supply pipe for supplying a raw material gas generated by the gasification device to a processing device, and a powder raw material supply device (replenishing device) that supplies the powder raw material to the gasification device. In Patent Literature 1, the powder raw material supply device (replenishing device) is configured to be attached and detached with respect to a raw material box filled with the powder raw material.

[0003] PRIOR ART DOCUMENTS

[0004] PATENT LITERATURE

[0005] Patent Literature 1: Japanese Patent Application Publication No. 2020-180354 SUMMARY

[0006] PROBLEMS TO BE SOLVED BY THE INVENTION

[0007] The present disclosure provides a technology capable of replenishing a powder raw material supply device that supplies a powder raw material to a gasification device without contacting the atmosphere.

[0008] SOLUTION TO PROBLEM

[0009] A powder raw material replenishing mechanism according to one embodiment of the present disclosure is used in a raw material gas supply system that supplies a raw material gas generated by gasifying a powder raw material by a gasification device to a processing device, and replenishes a powder raw material supply device that supplies the powder raw material to the gasification device with the powder raw material, the powder raw material replenishing mechanism having: a pipe having one end connected to the powder raw material supply device; a powder raw material box filled with the powder raw material; a connection portion provided on the other end side of the pipe, the powder raw material box being attached and detached with respect to the connection portion; an opening and closing portion provided on the other end side of the pipe, the opening and closing portion opening and closing between the pipe and the powder raw material box; and a vacuum exhaust portion that performs vacuum exhaust on the pipe to maintain the pipe in a vacuum, wherein the powder raw material box is connected to the connection portion in a state where the pipe is maintained in a vacuum by the vacuum exhaust portion, and the powder raw material in the powder raw material box is carried to the powder raw material supply device by opening the opening and closing portion in this state.

[0010] EFFECT OF THE INVENTION

[0011] According to the present disclosure, there is provided a technique capable of replenishing a powder raw material to a powder raw material supply device capable of supplying a powder raw material to a gasification device without contact with the atmosphere. BRIEF DESCRIPTION OF DRAWINGS

[0012] Figure 1 is a schematic configuration diagram illustrating an example of a raw material gas supply system provided with a powder raw material replenishing mechanism according to one embodiment.

[0013] Figure 2 is a diagram for explaining a schematic configuration of a powder raw material supply device in a raw material gas supply system. Figure 1

[0014] Figure 3 is a cross-sectional view illustrating a specific example of a powder raw material replenishing mechanism.

[0015] Figure 4 is a cross-sectional view illustrating a state in which the opening and closing portion is opened to carry the powder raw material from the powder raw material cartridge in the powder raw material replenishing mechanism.

[0016] Figure 5 is a diagram for explaining an example of an implementation state of a raw material gas supply system. Figure 1

[0017] Figure 6 is a cross-sectional view illustrating another embodiment of a powder raw material replenishing mechanism.

[0018] Figure 7 is a cross-sectional view illustrating another embodiment of a powder raw material replenishing mechanism.

[0019] Figure 8 is a cross-sectional view illustrating another example of an opening and closing portion of a powder raw material replenishing mechanism. DETAILED DESCRIPTION

[0020] Hereinafter, the embodiments will be described with reference to the drawings.

[0021] Figure 1 is a schematic configuration diagram illustrating an example of a raw material gas supply system provided with a powder raw material replenishing mechanism according to one embodiment. The raw material gas supply system 100 gasifies a powder raw material and supplies the generated raw material gas to a processing device 200.

[0022] As Figure 1 ​​As shown, the processing apparatus 200 has a processing container 201 capable of maintaining a vacuum, a stage 202 provided in the processing container 201 for placing the substrate W, and a gas introduction portion 203 for introducing a source gas into the processing container 201. In the processing apparatus 200, the source gas supplied from the source gas supply system 100 is introduced into the processing container 201 to perform a specific process, such as a film formation process, on the substrate W. As the film formation process, CVD, ALD can be cited. In addition, the processing apparatus 200 is configured to be capable of introducing, from the gas introduction portion 203 into the processing container, a reaction gas, an inactive gas, in addition to the source gas. The processing apparatus 200 is supplied with, for example, WCl6gas as the source gas to form a tungsten film on the substrate W. As the substrate W, a semiconductor wafer is cited.

[0023] The source gas supply system 100 has two vaporization apparatuses 10a and 10b, a powder source supply apparatus 20, a powder source supply piping portion 30, a source gas supply piping portion 40, a carrier gas supply portion 50, a powder source replenishment mechanism 60, and a control portion 70.

[0024] The vaporization apparatuses 10a and 10b are supplied with a powder source, such as WCl6, and store the powder source, and vaporize (sublimate) the stored powder source to generate a source gas. The vaporization apparatuses 10a and 10b have a container for storing a powder source. Vaporization of the powder source can be performed, for example, by heating the container using a heater in a state in which the container stores the powder source. The vaporization apparatuses 10a and 10b are provided in parallel with respect to the processing apparatus 200. As will be described later, the vaporization apparatuses 10a and 10b can be configured to supply the powder source to the other vaporization apparatus during vaporization of the powder source using one of the vaporization apparatuses by operation of an on-off valve.

[0025] The powder source supply apparatus 20 stores a powder source and supplies the powder source to the vaporization apparatus 10a or 10b. For example, as shown in Figure 2 The powder source supply apparatus 20 has a storage container 21 for storing a powder source and a feeder 22 for feeding out the powder source from the storage container 21. As the storage container 21, for example, a hopper-shaped container can be used, and as the feeder 22, for example, a vibration feeder can be used.

[0026] The powder raw material supply pipe section 30 has a common pipe 31, one end of which is connected to the powder raw material supply device 20, and branch pipes 32a and 32b, which branch from the other end of the common pipe 31 and reach the gasification devices 10a and 10b, respectively. Open-close valves 33a and 33b are provided in the branch pipes 32a and 32b, respectively. By opening and closing the open-close valves 33a and 33b, the supply and cutoff of the powder raw material from the powder raw material supply device 20 to the gasification devices 10a and 10b can be performed.

[0027] The raw material gas supply pipe section 40 supplies the raw material gas generated by gasifying the powder raw material in the gasification devices 10a and 10b to the processing device 200, and has independent pipes 41a and 41b and a common pipe 42. The independent pipes 41a and 41b extend from the gasification devices 10a and 10b, respectively, and join together, and the common pipe 42 reaches the processing device 200 from the joint. Open-close valves 43a and 43b are provided in the independent pipes 41a and 41b, respectively. By opening and closing the open-close valves 43a and 43b, the supply and cutoff of the raw material gas from the gasification devices 10a and 10b to the processing device 200 can be performed. A flow meter 44 such as a mass flow meter (MFM) and an open-close valve 45 are installed in the common pipe 42.

[0028] The carrier gas supply section 50 supplies a carrier gas for carrying the raw material gas generated in the gasification devices 10a and 10b to the processing device 200, and has a carrier gas supply source 51 and a carrier gas supply pipe section 52. The carrier gas supply pipe section 52 has a common pipe 53, one end of which is connected to the carrier gas supply source 51, and branch pipes 54a and 54b, which branch from the other end of the common pipe 53. The branch pipes 54a and 54b are connected to the downstream side of the open-close valves 33a and 33b in the branch pipes 32a and 32b of the powder raw material supply pipe section 30, respectively. Open-close valves 55a and 55b are provided in the branch pipes 54a and 54b, respectively. The open-close valve 55a is opened when the raw material gas is supplied from the gasification device 10a to the processing device 200, and the open-close valve 55b is opened when the raw material gas is supplied from the gasification device 10b to the processing device 200.

[0029] The powder raw material replenishing mechanism 60 is for replenishing the powder raw material to the powder raw material supply device 20, and has a pipe 61, a connection section 62, an open-close section 63, a vacuum exhaust section 64, and a powder raw material box 65.

[0030] One end of the piping 61 is connected to the powder raw material supply device 20. A connecting part 62 is provided at the other end of the piping 61 and is detachably connected to the powder raw material box 65. The connection port of the connecting part 62 faces downwards. An opening / closing part 63 is provided at the other end of the piping 61, which opens and closes the connection between the piping 61 and the powder raw material box 65 to supply and cut off the powder raw material from the powder raw material box 65 to the powder raw material supply device 20. The connecting part 62 is located on the bottom surface of the opening / closing part 63.

[0031] The vacuum exhaust unit 64 functions to maintain a vacuum inside the piping 61 by performing vacuum exhaust from the powder material supply device 20 side. The vacuum exhaust unit 64 is configured to include an exhaust pipe 66 connected to the common piping 31, an exhaust device 67 such as a vacuum pump connected to the exhaust pipe 66, and a valve 68 installed on the exhaust pipe 66, and performs vacuum exhaust on the piping 61 via the powder material supply device 20. While the piping 61 is under vacuum exhaust by the vacuum exhaust unit 64, powder material is drawn from the powder material box 65 and conveyed to the powder material supply device 20 by opening the opening / closing part 63. A bypass pipe (not shown) is provided in the vacuum exhaust unit 64; when air is present in the piping 61, this bypass pipe exhausts the powder material from the powder material supply device 20 by bypassing the piping 61. Furthermore, an opening / closing valve 69 is provided at one end of the piping 61.

[0032] The powder material box 65 contains powder material and an inert gas that functions as a carrier gas. The powder material box 65 has an on / off valve at one end. Figure 1 (Not shown in the figure) and the connecting surface connected to the connecting part 62. The connecting part 62 has a sealing structure, and the connecting surface of the powder material box 65 is in close contact with the connecting part 62. Moreover, by opening the on / off valve, the powder material in the powder material box 65 is carried out by an inactive gas carrier.

[0033] In addition, Figure 1 The illustration shows an example where the opening and closing part 63 is provided at the other end of the pipe 61 and the connecting part 62 of the powder raw material box 65 is provided at the opening and closing part 63. However, it is also possible to provide the opening and closing part 63 at the middle of the pipe 61 and the connecting part 62 at the other end of the pipe 61.

[0034] Figure 3 This is a cross-sectional view showing a specific example of the powder material replenishment mechanism 60. Figure 3 The detailed structure of the opening / closing part 63 and the powder material box 65 in this example is shown.

[0035] like Figure 3As shown, in this example, the opening / closing portion 63 is configured as a gate valve, and has a housing 631, a valve body 632, a piston 633, and an actuator 634.

[0036] A pipe 61 is connected to an upper portion of the housing 631. An opening 635 that communicates with the powder material cartridge 65 is formed in a bottom wall of the housing 631, and a connection portion 62 configured as a packing ring is provided around the opening 635 on the lower surface of the bottom wall. That is, the opening 635, which is a connection port of the connection portion 62, faces downward.

[0037] The valve body 632 is provided so as to be slidable in the horizontal direction inside the housing 631. The piston 633 is attached to the valve body 632, and the piston 633 is advanced and retracted by the actuator 634, whereby the valve body 632 slides to open and close the opening 635. As the actuator 634, for example, a cylinder mechanism can be used. A packing ring 636 is provided on the upper surface of the bottom wall of the housing 631 and around the opening 635, and the valve body 632 and the bottom wall of the housing 631 are sealed when the valve body 632 blocks the opening 635.

[0038] In addition, the powder material cartridge 65 has an elongated container 650, and the container 650 has an opening / closing valve 651 at the upper end. Moreover, the upper surface of the opening / closing valve 651 becomes a connection surface with the connection portion 62. A filter 653 is provided inside the container 650 of the powder material cartridge 65, and the filter 653 divides the inside of the container 650 into an inner portion and an outer portion along the inner wall surface of the container 650. The outer portion is a carrier gas filling space 654 in which N2 gas (inert gas) as a carrier gas is filled. The inner portion is filled with a powder material 652. The powder material and the inert gas can be filled without the filter 653. The opening / closing valve 651 is configured to be closed except when the powder material is replenished from the powder material cartridge 65 to the powder material supply device 20, to prevent the atmosphere from contacting the filled powder material during transportation or the like. The opening / closing valve 651 is not particularly limited, but a gate valve can be preferably used.

[0039] In this example, the powder material cartridge 65 is connected to the connection portion 62 in a state in which the pipe 61 is vacuumed, and then the opening / closing valve 651 is opened, and further, the powder material 652 in the powder material cartridge 65 is carried to the powder material supply device 20 by moving the valve body 632 to open the opening / closing portion 63 as shown. Figure 4 The powder material 652 in the powder material cartridge 65 is carried to the powder material supply device 20 by moving the valve body 632 to open the opening / closing portion 63 as shown.

[0040] The control section 70 is constituted by a computer, and has a main control section provided with a CPU, an input device, an output device, a display device, and a storage device (storage medium). The main control section controls the operation of each structural section of the raw material gas supply system 100, such as valves, the vaporization devices 10a and 10b, the exhaust device 67, and the like. The control performed by the main control section on each structural section is performed on the basis of a control program stored in a storage medium (hard disk, optical disk, semiconductor memory, or the like) built into the storage device. The processing recipe as the control program is stored in the storage medium, and the processing of the raw material gas supply system 100 is performed on the basis of the processing recipe.

[0041] Next, the operation of the raw material gas supply system 100 constituted as described above will be described.

[0042] In the raw material gas supply system 100, the powder raw material in the powder raw material supply device 20 is supplied to the vaporization device 10a or 10b through the powder raw material supply piping section 30, and is stored in the container. Further, the supplied powder raw material is vaporized in the vaporization device 10a or 10b, and the generated raw material gas is supplied to the processing device 200 through the raw material gas supply piping section 40. At this time, the raw material gas is carried to the processing device 200 by the carrier gas supplied from the carrier gas supply section 50. In the processing device 200, the substrate W is subjected to a film formation process, for example.

[0043] At this time, two vaporization devices 10a and 10b are provided, and thus it is possible to supply the powder raw material to the other vaporization device and store it in the container during the vaporization process of the powder raw material by one of the vaporization devices. This example will be described with reference to Figure 5 In Figure 5 , an example in which the powder raw material is supplied to the vaporization device 10a and stored in the container, and the powder raw material stored in the container is vaporized in the vaporization device 10b and the raw material gas is supplied to the processing device 200 is shown. Further, in Figure 5 , the open / close valve is shown in a hollow state indicating the open state, and in a blacked-out state indicating the closed state.

[0044] Specifically, the on-off valve 33a of the powder raw material supply piping portion 30 is opened to supply the powder raw material from the powder raw material supply device 20 to the vaporization device 10a and store it in the container. At this time, the on-off valves 43a of the raw material gas supply piping portion 40 and 55a of the carrier gas supply portion 50 are closed. On the other hand, in a state where the on-off valve 43b of the raw material gas supply piping portion 40 is opened, the powder raw material in the container of the vaporization device 10b is vaporized and the generated raw material gas is supplied to the processing device 200. At this time, the on-off valve 33b of the raw material powder supply piping portion 30 is closed to stop the supply of the raw material powder to the vaporization device 10b, and the on-off valve 55b of the carrier gas supply portion 50 is opened to supply the carrier gas to the vaporization device 10b to transport the raw material gas of the vaporization device 10b.

[0045] At the point in time when the powder raw material stored in the container of the vaporization device 10b becomes below a fixed amount, the on-off valves are switched to supply the powder raw material to the vaporization device 10b and supply the raw material gas from the vaporization device 10a to the processing device 200.

[0046] These operations are repeated, and at the point in time when the powder raw material of the powder raw material supply device 20 becomes below a fixed amount, the powder raw material is replenished from the powder raw material replenishing mechanism 60 to the powder raw material supply device 20.

[0047] The powder raw material is easily oxidized, and in particular, the powder raw material used in a process of manufacturing a fine semiconductor device is adversely affected by oxidation to the process result, and thus the oxygen content and the like of the powder raw material are strictly managed. Therefore, when the powder raw material is replenished to the powder raw material supply device 20, it is necessary to prevent the contact of the atmosphere with the powder raw material. In the past, countermeasures such as a purge piping have been adopted when the powder raw material is replenished, but recently, the quality requirements for the powder raw material have become more stringent, and a technique for more strictly preventing contact with the atmosphere is sought. In Patent Document 1, it is described that a raw material cartridge filled with the powder raw material is installed when the powder raw material is replenished, but a countermeasure for strictly preventing the contact of the atmosphere when the powder is replenished is not shown.

[0048] In contrast, in this embodiment, the powder material replenishment mechanism 60 is configured with the following structure: a pipe 61, one end of which is connected to the powder material supply device 20; a connecting portion 62 and an opening / closing portion 63, which are provided at the other end of the pipe 61; a vacuum exhaust portion 64, which performs vacuum exhaust on the pipe 61; and a powder material box 65, which is connected to the connecting portion 62. Furthermore, while maintaining a vacuum inside the pipe 61 through vacuum exhaust by the vacuum exhaust portion 64, the powder material box 65 is connected to the connecting portion 62, and the opening / closing portion 63 is opened to connect the pipe 61 and the powder material box 65. Thus, with the powder material box 65 tightly fitted to the connecting portion 62, the powder material inside the powder material box 65 is supplied to the powder material supply device 20 by being carried by the inactive gas inside the powder material box 65. Therefore, when transferring powder materials from the powder material box 65 to the powder material supply device 20, it is possible to strictly prevent the atmosphere from coming into contact with the powder materials.

[0049] Furthermore, since the connecting part 62 is located at the opening / closing part 63, air contact with the powder material in the powder material box 65 can be more reliably prevented when the opening / closing part 63 is open. Additionally, the connecting part 62 is located at the bottom of the opening / closing part 63 with its connection port facing downwards. Therefore, by connecting the powder material box 65 to the connecting part 62 with its conveying port facing upwards, the powder material in the powder material box 65 can be conveyed upwards to the piping 61. This prevents powder material from adhering to the sealing surface of the opening / closing part 63, thereby reducing the risk of external leakage. Moreover, since a gate valve is used as the opening / closing part 63, the opening area when the opening / closing part 63 is open can be increased, which is beneficial for the conveying of powder material. Furthermore, since an on / off valve 651 is provided at one end of the powder material box 65, the inside is kept airtight by closing the on / off valve 651 when the powder material box 65 is being transported, thereby preventing atmospheric air from contacting the powder material inside.

[0050] like Figure 6 As shown, a carrier gas line 655 can also be provided in the powder material box 65. During the transport of powder materials, an inactive gas, such as N2 gas, can be supplied from the carrier gas line 655 into the powder material box 65 as a carrier gas. This allows for more reliable transport of the powder materials in the powder material box 65.

[0051] In addition, such as Figure 7 As shown, a brush portion 637 may also be provided in the moving area of ​​the valve body 632 on the upper surface of the bottom wall of the gate valve housing 631 that constitutes the opening and closing part 63. This allows the sealing surface of the valve body 632 to be cleaned during the opening and closing of the valve body 632, thereby more reliably preventing external leakage.

[0052] <Other applications>

[0053] The above describes the embodiments, but it should be considered that the embodiments disclosed this time are illustrative in all respects and are not restrictive. The above-described embodiments can also be omitted, replaced, changed in various ways without departing from the scope of the appended claims and the gist thereof.

[0054] For example, in the above-described embodiments, an example in which a gate valve that takes a large opening area in an open state is used as the opening / closing section 63 is shown, but it is not limited thereto as long as the powder raw material can be carried in the open state. For example, it can also be an opening / closing section 83 constituted by a diaphragm valve as shown in Figure 8 Figure 8 The opening / closing section 83 has a carrying path 831, a housing 832, an air introduction / discharge port 833, a diaphragm 834, and a valve piece 835. One end of the carrying path 831 is connected to the pipe 61, and a connection section 62 is formed at the other end of the carrying path 831, and the valve piece 835 is provided in the middle of the carrying path 831. The housing 832 is provided adjacent to the carrying path 831, and the carrying path 831 and the housing 832 are divided by the diaphragm 834. The air introduction / discharge port 833 is provided to the housing 832, and by introducing / discharging air to / from the housing 832 from the air introduction / discharge port 833, the diaphragm 834 is brought into contact with and separation from the valve piece 835 to open / close the carrying path 831. However, in the diaphragm valve, it is not possible to take a large opening area in the open state as in the gate valve, and therefore, it is preferable to supply a carrier gas to the carrying path 831 to promote the carrying of the powder raw material.

[0055] In addition, in the above-described embodiments, an example in which two vaporization devices are provided as the raw material gas supply system is shown, but the vaporization section can also be one. However, by providing two vaporization sections, it is possible to supply the powder raw material to the other vaporization device during the vaporization treatment of the powder raw material by one vaporization device, and therefore, the productivity is improved, and thus it is advantageous.

[0056] Also, in the above-described embodiments, a case in which the treatment device is a film forming device is shown, but it is not limited thereto as long as it is a device that performs treatment by the raw material gas.

[0057] Explanation of reference numerals

[0058] ​10a, 10b: vaporization device; 20: powder raw material supply device; 30: powder raw material supply pipe portion; 40: raw material gas supply pipe portion; 50: carrier gas supply portion; 60: powder raw material replenishing device; 61: pipe; 62: connection portion; 63: opening and closing portion; 64: vacuum exhaust portion; 65: powder raw material cartridge; 100: raw material gas supply system; 200: processing device; 651: opening and closing valve; 652: powder raw material; 653: filter; 654: carrier gas filling space; W: substrate.

Claims

1. A powder raw material replenishing mechanism that replenishes a powder raw material to a powder raw material supply device that supplies the powder raw material to a gasification device in a raw material gas supply system that supplies a raw material gas generated by gasifying a powder raw material by the gasification device to a processing device, the powder raw material replenishing mechanism having: a pipe that has one end connected to the powder raw material supply device; a powder raw material cartridge that is filled with the powder raw material; a connection portion that is provided on the other end side of the pipe, and to which the powder raw material cartridge is detachably connected; an opening and closing portion that is provided on the other end side of the pipe, and that opens and closes between the pipe and the powder raw material cartridge; and a vacuum exhaust portion that performs vacuum exhaust on the pipe to maintain the pipe in a vacuum, wherein the powder raw material cartridge is connected to the connection portion in a state in which the pipe is maintained in a vacuum by the vacuum exhaust portion, and the powder raw material in the powder raw material cartridge is carried to the powder raw material supply device by opening the opening and closing portion in this state, wherein a carrier gas composed of a non-reactive gas is enclosed in the powder raw material cartridge, and the powder raw material is carried from the powder raw material cartridge in a manner of being carried by the carrier gas.

2. The powder raw material replenishing mechanism according to claim 1, wherein the connection portion is provided on the opening and closing portion.

3. The powder raw material replenishing mechanism according to claim 2, wherein the opening and closing portion is composed of a gate valve that has: a housing connected to the pipe, and in which an opening that is a connection port of the connection portion is formed; a valve body that is provided so as to be slidable in the housing, and that opens and closes the opening; and an actuator that slides the valve body.

4. The powder raw material replenishing mechanism according to claim 3, wherein the opening and closing portion has a brush portion in the housing, and the brush portion cleans a sealing surface of the valve body when the valve body is slid.

5. The powder raw material replenishing mechanism according to claim 3, wherein the connection port of the connection portion faces downward.

6. The powder raw material replenishing mechanism according to any one of claims 1 to 5, wherein the powder raw material cartridge has an opening and closing valve at an end portion on a connection surface side that connects to the connection portion, and in a state in which the opening and closing valve is open, the powder raw material is replenished, and in a state in which the opening and closing valve is closed, the powder raw material cartridge is maintained to be airtight. wherein 7. The powder raw material replenishing mechanism according to claim 1, wherein the powder raw material cartridge has a filter that divides an inside thereof into an inside portion and an outside portion, the outside portion becomes a carrier gas filling space that is filled with the carrier gas, and the powder raw material is filled in the inside portion.

8. The powder raw material replenishing mechanism according to claim 7, wherein a carrier gas supply line that supplies the carrier gas composed of a non-reactive gas is connected to the powder raw material cartridge.

9. The powder raw material replenishing mechanism according to any one of claims 1 to 5, wherein ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ ​ The vacuum exhaust portion performs vacuum exhaust on the inside of the pipe from the powder raw material supply device side to maintain the inside of the pipe in a vacuum.

10. A raw material gas supply system that supplies a raw material gas to a processing device that processes a substrate, the raw material gas supply system comprising: a gasification device that generates a raw material gas by gasifying a powder raw material; a powder raw material supply device that supplies the powder raw material to the gasification device; a powder raw material supply pipe portion that supplies the powder raw material from the powder raw material supply device to the gasification device; a raw material gas supply pipe portion that supplies the raw material gas from the gasification device to the processing device; and a powder raw material replenishing mechanism that replenishes the powder raw material to the powder raw material supply device, wherein, the powder raw material replenishing mechanism comprising: a pipe that has one end connected to the powder raw material supply device; a powder raw material cartridge that is filled with the powder raw material; a connection portion that is provided on the other end side of the pipe, and to which the powder raw material cartridge is detachably connected; an opening / closing portion that is provided on the other end side of the pipe, and that opens and closes between the pipe and the powder raw material cartridge; and a vacuum exhaust portion that performs vacuum exhaust on the inside of the pipe to maintain the inside of the pipe in a vacuum, wherein the powder raw material cartridge is connected to the connection portion in a state in which the inside of the pipe is maintained in a vacuum by the vacuum exhaust portion, and the powder raw material in the powder raw material cartridge is carried to the powder raw material supply device by opening the opening / closing portion in this state, wherein the powder raw material is carried from the powder raw material cartridge in a manner of being carried by a carrier gas composed of a non-reactive gas, which is enclosed in the powder raw material cartridge.

11. A powder raw material replenishing method for replenishing a powder raw material supply device that supplies a powder raw material to a gasification device that generates a raw material gas by gasifying the powder raw material, to a raw material gas supply system that supplies the raw material gas to a processing device that processes a substrate, the powder raw material replenishing method comprising: providing a powder raw material replenishing mechanism that has a pipe, a powder raw material cartridge, a connection portion, an opening / closing portion, and a vacuum exhaust portion, wherein one end of the pipe is connected to the powder raw material supply device, the powder raw material cartridge is filled with the powder raw material, the connection portion is provided on the other end side of the pipe, and the powder raw material cartridge is detachably connected to the connection portion, the opening / closing portion is provided on the other end side of the pipe, and opens and closes between the pipe and the powder raw material cartridge, and the vacuum exhaust portion performs vacuum exhaust on the inside of the pipe to maintain the inside of the pipe in a vacuum; maintaining the inside of the pipe in a vacuum by the vacuum exhaust portion; connecting the powder raw material cartridge to the connection portion; and opening the opening / closing portion to carry the powder raw material in the powder raw material cartridge to the powder raw material supply device, wherein the powder raw material is carried from the powder raw material cartridge in a manner of being carried by a carrier gas composed of a non-reactive gas, which is enclosed in the powder raw material cartridge.

Images