Automatic maintenance method and system for vacuum pump of distillation system

Abstract

The present application relates to the technical field of distillation equipment, and more specifically to a method and system for automatically maintaining a vacuum pump in a distillation system. This method solves the problem of damage caused by overheating of the vacuum pump after liquid enters the vacuum piping system during the operation of existing distillation systems. Temperature sensors can be used for timely detection, early warning, and response, activating standby vacuum pump components to ensure normal and stable production operation and product quality. Furthermore, automated control is implemented in conjunction with a modern DSC central control system to achieve automatic identification and early warning, enabling the activation of standby pumps while simultaneously switching and automatically maintaining the vacuum pump, effectively avoiding equipment damage and shutdown accidents caused by the entry of materials into the system.

Description

Technical Field

[0001] The present application relates to the technical field of distillation equipment, and more specifically to an automatic maintenance method and system for a vacuum pump of a distillation system. Background Art

[0002] Distillation is a widely used process for achieving high-purity separations of liquid mixtures in industries such as chemical, pharmaceutical, food, petroleum, light industry, environmental protection, and electronic chemicals. Distillation is typically performed in a distillation tower, where countercurrent contact between the gas and liquid phases facilitates interphase heat and mass transfer. Volatile components in the liquid phase enter the vapor phase, while less volatile components in the vapor phase enter the liquid phase. A distillation system primarily includes a feed system, evaporator, condenser, heater, cooler, packed tower, thermometer, and vacuum pump.

[0003] Fluid leakage into the distillation system can occur due to loose pipe connections, poor seals, operational errors, incomplete gas-liquid separation during the distillation process, and untimely replacement of vacuum pump seals. This can damage the vacuum pump, causing it to malfunction or even degrade performance. More seriously, it can contaminate the entire distillation system, impacting product quality and yield. Furthermore, fluid leakage can lead to personal injury, equipment damage, and other safety incidents.

[0004] Currently, measures to prevent fluids from entering the vacuum pumps of distillation systems generally involve improving management systems, strengthening equipment maintenance, and regularly inspecting and maintaining the vacuum pumps and other distillation system components to ensure proper sealing and integrity. This reduces the risk of fluids entering the vacuum pumps to a certain extent, but it cannot completely eliminate the possibility of fluids leaking into the vacuum pumps due to seal damage or operator errors. Therefore, it is crucial to develop a method to effectively prevent and automatically identify, warn, and address anomalies in distillation vacuum systems. Summary of the Invention

[0005] In view of the above problems, the present application provides an automatic maintenance method and system for the vacuum pump of a distillation system, so as to achieve rapid detection, early warning, discovery and timely response for maintenance after an abnormality occurs in the distillation vacuum system, thereby ensuring normal and stable production operation and effectively avoiding equipment damage and shutdown accidents caused by the entry of materials into the distillation vacuum system, which affect production and product quality.

[0006] To achieve the above objectives, in a first aspect of the present invention, the inventor provides a distillation system vacuum pump maintenance system, comprising a first vacuum pump assembly and a second vacuum pump assembly respectively connected to a distillation system pipeline, wherein:

[0007] The first vacuum pump assembly includes a first purge gas storage tank, a first purge valve, a first cleaning liquid storage tank, a first cleaning valve, a first air inlet valve, a first vacuum pump, a first temperature sensor, and a first exhaust valve. The first purge valve is used to control the first purge gas storage tank to purge gas into the first vacuum pump cavity. The first cleaning valve is used to control the first cleaning liquid storage tank to spray cleaning liquid into the first vacuum pump cavity. The first air inlet valve is used to control the semi-finished product raw material to enter the distillation system vacuum pump maintenance system. The first exhaust valve is used to control the first vacuum pump to exhaust gas. The first temperature sensor is connected to the pipeline of the distillation system vacuum pump maintenance system.

[0008] The second vacuum pump assembly includes a second purge gas storage tank, a second purge valve, a second cleaning liquid storage tank, a second cleaning valve, a second air inlet valve, a second vacuum pump, a second temperature sensor, and a second exhaust valve, wherein the second purge valve is used to control the second purge gas storage tank to purge gas into the second vacuum pump cavity, the second cleaning valve is used to control the second cleaning liquid storage tank to spray cleaning liquid into the second vacuum pump cavity, the second air inlet valve is used to control the semi-finished product raw material to enter the distillation system vacuum pump maintenance system, the second exhaust valve is used to control the second vacuum pump to exhaust gas, and the second temperature sensor is connected to the pipeline of the distillation system vacuum pump maintenance system; and

[0009] A semi-finished raw gas storage tank is connected to the distillation system pipeline through the first air inlet valve or the second air inlet valve.

[0010] As a preferred embodiment of the present invention, the distillation system vacuum pump maintenance system further includes a DCS central control system electrically connected to the first temperature sensor and / or the second temperature sensor.

[0011] As a preferred embodiment of the present invention, the first purge valve, the first cleaning valve, the first intake valve, the first exhaust valve, the second purge valve, the second cleaning valve, the second intake valve and the second exhaust valve are electrically connected to the DCS central control system.

[0012] In a second aspect of the present invention, the inventor provides a method for using the distillation system vacuum pump maintenance system provided in the first aspect of the present invention, comprising the following steps:

[0013] Collecting a first exhaust temperature detected by a first temperature sensor, if the first exhaust temperature is higher than a first preset temperature, opening a second exhaust valve, starting a second vacuum pump to evacuate the vacuum pipe, then opening a second air inlet valve, ventilating for 10-12 minutes, and then closing the first air inlet valve;

[0014] After the first air inlet valve is closed for 10-15 seconds, the first cleaning valve and the first purge valve are opened to connect the first cleaning liquid storage tank and the first purge gas storage tank to clean and purge the first vacuum pump cavity for 10-15 minutes;

[0015] After the cleaning and purging are completed, the first cleaning valve is closed, and the first purge gas continues to purge the first vacuum pump cavity for 10-15 minutes. At the same time, the temperature displayed by the first temperature sensor is collected again. If the temperature value is lower than the second preset temperature, the purging of the first purge gas is completed. After closing the first exhaust valve, the first purge gas valve is closed again 10-15 seconds later, and the automatic maintenance of the first vacuum pump is completed. The first vacuum pump assembly enters the normal standby state.

[0016] Preferably, the first purge gas is nitrogen.

[0017] Preferably, the first cleaning liquid is pure water.

[0018] Preferably, the first preset temperature is 85°C, and the second preset temperature is 50°C.

[0019] Preferably, when the second vacuum pump becomes abnormal due to the semi-finished product raw material entering the second vacuum pump cavity, the vacuum pump maintenance system of the distillation system is switched to reverse operation.

[0020] Preferably, the reverse operation switching operation includes the following steps:

[0021] collecting a second exhaust temperature detected by a second temperature sensor; if the second exhaust temperature is higher than a third preset temperature, opening the first exhaust valve, starting the first vacuum pump to evacuate the vacuum pipe, then opening the first air inlet valve, ventilating for 10-12 minutes, and closing the second air inlet valve;

[0022] After the second air inlet valve is closed for 10-15 seconds, the second cleaning valve and the second purge valve are opened to connect the second cleaning liquid storage tank and the second purge gas storage tank to clean and purge the second vacuum pump cavity for 10-15 minutes;

[0023] After the cleaning and purging are completed, the second cleaning valve is closed to allow the second purge gas to continue to purge the second vacuum pump cavity for 10-15 minutes. At the same time, the temperature displayed by the second temperature sensor is collected again. If the temperature value is lower than the fourth preset temperature, the purging of the second purge gas is completed. After closing the second exhaust valve, the second purge gas valve is closed again 10-15 seconds later, thus completing the automatic maintenance of the second vacuum pump and the second vacuum pump assembly enters the normal standby state.

[0024] Preferably, when the adopted distillation system vacuum pump maintenance system is an external DSC central control system, the operation steps of the distillation system vacuum pump maintenance system can be automatically completed by the DSC central control system.

[0025] Unlike existing technologies, the above-mentioned technical solution provides a method and system for automatically maintaining vacuum pumps in distillation systems. This method addresses the problem of overheating and damage to vacuum pumps caused by liquid entering the vacuum piping system during operation of existing distillation systems. Temperature sensors provide timely detection, early warning, and response, activating backup vacuum pump components to ensure normal and stable production and product quality. Furthermore, the system integrates a modern DSC central control system for automated control, enabling automatic identification and early warning, activating backup pumps, and simultaneously switching and automatically maintaining the vacuum pumps, effectively preventing equipment damage and downtime caused by material entering the system.

[0026] The above-mentioned records related to the content of the invention are only an overview of the technical solution of this application. In order to enable ordinary technicians in this field to understand the technical solution of this application more clearly, and then implement it according to the text of the specification and the contents recorded in the drawings, and to make the above-mentioned purposes and other purposes, features and advantages of this application easier to understand, the following is an explanation in combination with the specific implementation methods and drawings of this application. BRIEF DESCRIPTION OF THE DRAWINGS

[0027] The accompanying drawings are only used to illustrate the principles, implementation methods, applications, characteristics and effects of the specific embodiments of this application and other related contents, and are not to be considered as limiting this application.

[0028] In the drawings of the specification:

[0029] Figure 1 The present invention relates to a vacuum pump maintenance system for a distillation system as described in a specific embodiment. DETAILED DESCRIPTION

[0030] In order to explain in detail the possible application scenarios, technical principles, specific solutions that can be implemented, and the purpose and effects of this application, the following is a detailed description of the specific embodiments listed in conjunction with the accompanying drawings. The embodiments described herein are only used to more clearly illustrate the technical solutions of this application and are therefore only examples and are not intended to limit the scope of protection of this application.

[0031] References to "embodiments" herein mean that the specific features, structures, or characteristics described in conjunction with the embodiments may be included in at least one embodiment of the present application. The appearance of the word "embodiment" in various places in the specification does not necessarily refer to the same embodiment, nor does it particularly limit its independence or relevance to other embodiments. In principle, in this application, as long as there are no technical contradictions or conflicts, the various technical features mentioned in the embodiments can be combined in any manner to form a corresponding implementable technical solution.

[0032] Unless otherwise defined, the technical terms used herein have the same meanings as those generally understood by those skilled in the art to which this application belongs; the use of relevant terms herein is only for describing specific embodiments and is not intended to limit this application.

[0033] In the description of this application, the term "and / or" is used to describe a logical relationship between objects, indicating that three relationships can exist. For example, A and / or B means: A exists, B exists, and both A and B exist. In addition, the character " / " in this document generally indicates that the objects before and after are in a logical "or" relationship.

[0034] In this application, terms such as "first" and "second" are merely used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any actual quantity, priority or sequence relationship between these entities or operations.

[0035] Without further limitations, in this application, the words "include", "comprise", "have" or other similar expressions used in the sentences are intended to cover non-exclusive inclusion. These expressions do not exclude the presence of additional elements in the process, method or product including the elements, so that the process, method or product including a series of elements may include not only those defined elements, but also other elements not explicitly listed, or elements inherent to such process, method or product.

[0036] Consistent with the understanding in the Examination Guidelines, in this application, expressions such as "greater than," "less than," and "exceed" are understood to exclude the number itself; expressions such as "above," "below," and "within" are understood to include the number itself. Furthermore, in the description of the embodiments of this application, "multiple" means more than two (including two), and similar expressions related to "multiple" are also understood in this manner, such as "multiple groups," "multiple times," etc., unless otherwise specifically defined.

[0037] In the description of the embodiments of the present application, the space-related expressions used, such as "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "vertical", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc., indicate the orientation or position relationship based on the orientation or position relationship shown in the specific embodiments or drawings, and are only for the convenience of describing the specific embodiments of the present application or facilitating the reader's understanding, and do not indicate or imply that the device or component referred to must have a specific position, a specific orientation, or be constructed or operated in a specific orientation. Therefore, it should not be understood as a limitation on the embodiments of the present application.

[0038] Unless otherwise expressly specified or limited, in the description of the embodiments of the present application, the terms "installed", "connected", "connected", "fixed", "set", etc. used should be understood in a broad sense. For example, the "connection" can be a fixed connection, a detachable connection, or an integrated setting; it can be a mechanical connection, an electrical connection, or a communication connection; it can be a direct connection or an indirect connection through an intermediate medium; it can be the internal connection of two elements or the interaction relationship between two elements. For those skilled in the art of the present application, the specific meanings of the above terms in the embodiments of the present application can be understood according to the specific circumstances.

[0039] The vacuum equipment in existing distillation systems is unable to effectively detect and maintain abnormalities on its own. It is often not discovered until the equipment has a serious abnormality that makes it unable to continue normal use or causes safety accidents such as personal injury and equipment damage.

[0040] Example 1

[0041] A maintenance system for a vacuum pump in a distillation system

[0042] See also Figure 1 The distillation system vacuum pump maintenance system provided by the present invention includes a first vacuum pump assembly and a second vacuum pump assembly respectively connected to the distillation system pipeline, wherein the first vacuum pump assembly includes a first purge gas storage tank, a first purge valve, a first cleaning liquid storage tank, a first cleaning valve, a first air inlet valve, a first vacuum pump, a first temperature sensor, and a first exhaust valve. The first purge valve is used to control the first purge gas storage tank to purge gas into the first vacuum pump cavity, the first cleaning valve is used to control the first cleaning liquid storage tank to spray cleaning liquid into the first vacuum pump cavity, the first air inlet valve is used to control the semi-finished product raw material to enter the distillation system vacuum pump maintenance system, the first exhaust valve is used to control the first vacuum pump to exhaust gas, and the first temperature sensor is connected to the distillation system vacuum pump maintenance system pipeline;

[0043] The second vacuum pump assembly includes a second purge gas storage tank, a second purge valve, a second cleaning liquid storage tank, a second cleaning valve, a second air inlet valve, a second vacuum pump, a second temperature sensor, and a second exhaust valve. The second purge valve is used to control the second purge gas storage tank to purge gas into the second vacuum pump cavity. The second cleaning valve is used to control the second cleaning liquid storage tank to spray cleaning liquid into the second vacuum pump cavity. The second air inlet valve is used to control the semi-finished raw materials to enter the distillation system vacuum pump maintenance system. The second exhaust valve is used to control the second vacuum pump to discharge gas. The second temperature sensor is connected to the distillation system vacuum pump maintenance system pipeline; and a semi-finished raw material gas storage tank. The semi-finished raw material gas storage tank is connected to the distillation system pipeline through the first air inlet valve or the second air inlet valve.

[0044] Of course, if necessary, a third vacuum pump assembly can also be provided.

[0045] Example 2

[0046] A method for using a vacuum pump maintenance system for a distillation system

[0047] Please refer again Figure 1 The semi-finished raw materials enter the vacuum pump chamber of P101 or P201 through the solenoid valve (PBV103 or DCV203) through the vacuum pipe.

[0048] 1. Taking P101 as an example, the exhaust temperature continues to rise due to high-speed friction of raw materials entering the vacuum pump and the temperature increase in the compression pump chamber. When the temperature sensor TC101 detects that the exhaust temperature is above 85 degrees (the triggering temperature of the automatic maintenance system is adjusted according to different production systems and raw materials), the automatic maintenance system is triggered (the alarm can be linked to the DCS central control, which will activate the maintenance system).

[0049] 2. After the maintenance system is started, open the PBV204 exhaust valve pneumatic valve, start the P201 standby vacuum pump, and evacuate the vacuum pipe to -0.1kpa (after the air is exhausted by PBV204), open the DCV203 starting ball valve, and close the PBV103 pneumatic ball valve after 10 minutes.

[0050] 3. After the PBV103 pneumatic ball valve is closed for 10 seconds, open the PBV102 and PBV101 starter ball valves to clean and purge the pump chamber with pure water and nitrogen for 10 minutes. After cleaning, close the PBV101 pure water pneumatic ball valve and purge the pump chamber with nitrogen through P102 for 10 minutes. At the same time, the exhaust temperature TC101 should be below 50 degrees Celsius (both the 10-minute purge and the TC101 temperature below 50 degrees Celsius are mandatory requirements and must be met simultaneously).

[0051] 4. After the purge is completed, close the PBV104 pneumatic ball valve and then close the PBV102 pneumatic ball valve 10S later to achieve nitrogen sealing protection for the pump cavity after maintenance to prevent oxidation and rust in the pump cavity.

[0052] 5. After completing automatic maintenance, P101 enters normal standby state.

[0053] Example 3

[0054] A method for using a vacuum pump maintenance system for a distillation system

[0055] If P201 is abnormal due to the entry of raw materials into the pump chamber, the system switches to reverse operation and operates according to the method of Example 2.

[0056] The method provided by the present invention can ensure the stable operation of vacuum equipment in the distillation system. At the same time, it can automatically detect and issue early warnings and automatically start equipment maintenance control when an abnormality occurs in the equipment, and switch to a backup system for continued operation.

[0057] In the present invention, when the vacuum pump continues to be high temperature after feeding, pure water and nitrogen are used to clean and purge the pump cavity. Finally, nitrogen sealing protection effectively prevents damage to the vacuum pump and effectively ensures the stable operation of the distillation system.

[0058] Finally, it should be noted that although the above embodiments have been described in the specification and drawings of this application, this does not limit the scope of patent protection of this application. All technical solutions generated by replacing or modifying equivalent structures or equivalent processes based on the essential concepts of this application using the contents recorded in the specification and drawings of this application, as well as directly or indirectly implementing the technical solutions of the above embodiments in other related technical fields, are included in the scope of patent protection of this application.

Claims

1. A distillation system vacuum pump maintenance system, characterized in that: It comprises a first vacuum pump assembly and a second vacuum pump assembly respectively connected to the distillation system pipeline, wherein: The first vacuum pump assembly includes a first purge gas storage tank, a first purge valve, a first cleaning liquid storage tank, a first cleaning valve, a first air inlet valve, a first vacuum pump, a first temperature sensor, and a first exhaust valve. The first purge valve is used to control the first purge gas storage tank to purge gas into the first vacuum pump cavity. The first cleaning valve is used to control the first cleaning liquid storage tank to spray cleaning liquid into the first vacuum pump cavity. The first air inlet valve is used to control the semi-finished product raw material to enter the distillation system vacuum pump maintenance system. The first exhaust valve is used to control the first vacuum pump to exhaust gas. The first temperature sensor is connected to the pipeline of the distillation system vacuum pump maintenance system. The second vacuum pump assembly includes a second purge gas storage tank, a second purge valve, a second cleaning liquid storage tank, a second cleaning valve, a second air inlet valve, a second vacuum pump, a second temperature sensor, and a second exhaust valve, wherein the second purge valve is used to control the second purge gas storage tank to purge gas into the second vacuum pump cavity, the second cleaning valve is used to control the second cleaning liquid storage tank to spray cleaning liquid into the second vacuum pump cavity, the second air inlet valve is used to control the semi-finished product raw material to enter the distillation system vacuum pump maintenance system, the second exhaust valve is used to control the second vacuum pump to exhaust gas, and the second temperature sensor is connected to the pipeline of the distillation system vacuum pump maintenance system; and A semi-finished raw gas storage tank is connected to the distillation system pipeline through the first air inlet valve or the second air inlet valve.

2. The distillation system vacuum pump maintenance system according to claim 1, characterized in that: The distillation system vacuum pump maintenance system further includes a DCS central control system electrically connected to the first temperature sensor and / or the second temperature sensor.

3. The distillation system vacuum pump maintenance system according to claim 2, characterized in that: The first purge valve, the first cleaning valve, the first intake valve, the first exhaust valve, the second purge valve, the second cleaning valve, the second intake valve and the second exhaust valve are electrically connected to the DCS central control system.

4. The method for using the distillation system vacuum pump maintenance system according to any one of claims 1 to 3, characterized in that: The steps include: Collecting a first exhaust temperature detected by a first temperature sensor, if the first exhaust temperature is higher than a first preset temperature, opening a second exhaust valve, starting a second vacuum pump to evacuate the vacuum pipe, then opening a second air inlet valve, ventilating for 10-12 minutes, and then closing the first air inlet valve; After the first air inlet valve is closed for 10-15 seconds, the first cleaning valve and the first purge valve are opened to connect the first cleaning liquid storage tank and the first purge gas storage tank to clean and purge the first vacuum pump cavity for 10-15 minutes; After the cleaning and purging are completed, the first cleaning valve is closed, and the first purge gas continues to purge the first vacuum pump cavity for 10-15 minutes. At the same time, the temperature displayed by the first temperature sensor is collected again. If the temperature value is lower than the second preset temperature, the purging of the first purge gas is completed. After closing the first exhaust valve, the first purge gas valve is closed again 10-15 seconds later, and the automatic maintenance of the first vacuum pump is completed. The first vacuum pump assembly enters the normal standby state.

5. The method of use according to claim 4, characterized in that: The first purge gas is nitrogen.

6. The method of use according to claim 4, characterized in that: The first cleaning liquid is pure water.

7. The method of use according to claim 4, characterized in that: The first preset temperature is 85°C, and the second preset temperature is 50°C.

8. The method of use according to claim 4, characterized in that: When the second vacuum pump becomes abnormal due to the semi-finished raw materials entering the second vacuum pump cavity, the distillation system vacuum pump maintenance system is switched to reverse operation.

9. The method of use according to claim 8, characterized in that: The steps include: collecting a second exhaust temperature detected by a second temperature sensor; if the second exhaust temperature is higher than a third preset temperature, opening the first exhaust valve, starting the first vacuum pump to evacuate the vacuum pipe, then opening the first air inlet valve, ventilating for 10-12 minutes, and closing the second air inlet valve; After the second air inlet valve is closed for 10-15 seconds, the second cleaning valve and the second purge valve are opened to connect the second cleaning liquid storage tank and the second purge gas storage tank to clean and purge the second vacuum pump cavity for 10-15 minutes; After the cleaning and purging are completed, the second cleaning valve is closed to allow the second purge gas to continue to purge the second vacuum pump cavity for 10-15 minutes. At the same time, the temperature displayed by the second temperature sensor is collected again. If the temperature value is lower than the fourth preset temperature, the purging of the second purge gas is completed. After closing the second exhaust valve, the second purge gas valve is closed again 10-15 seconds later, thus completing the automatic maintenance of the second vacuum pump and the second vacuum pump assembly enters the normal standby state.

10. The method of use according to claim 4 or 9, characterized in that: The DSC hollow system automatically completes the operating steps of the distillation system vacuum pump maintenance system.

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