Vacuum coating apparatus and coating method

Abstract

The application discloses a vacuum coating device and a coating method, and relates to the technical field of material deposition and growth, which comprises a vacuum cavity, a vacuum chamber in the vacuum cavity, a beam source obliquely fixed outside the vacuum cavity and used for emitting source material for coating to the vacuum chamber, and a sample table arranged at the top end of the vacuum chamber and used for mounting a workpiece, wherein the bottom surface of the sample table is oblique to the direction of the beam source, and the central outgoing line of the beam source is perpendicular to the bottom surface of the sample table. The vacuum coating device disclosed by the application is oblique to the direction of the beam source, and the central outgoing line of the beam source is perpendicular to the bottom surface of the sample table, so that the projection of the source material emitted by the beam source on the workpiece is circular instead of elliptical, the material emitted by the beam source to the surface of the workpiece is distributed symmetrically around the center of the circle, the deposited film on the surface of the workpiece is circularly distributed, the morphology is uniform, and the compactness is consistent, so that the uniformity of the film can be greatly improved.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of material deposition growth, in particular to a vacuum coating device and a coating method. BACKGROUND

[0002] Material preparation is always in a very important position in modern science and technology, among which material deposition growth technology as a preferred technology in high-end material preparation method is widely used in high-tech research and industrialization.

[0003] Material deposition coating technology can be divided into two categories, physical deposition method (PVD) and chemical deposition method (CVD), among which physical deposition method includes molecular beam epitaxy (MBE), magnetron sputtering (magnetron-sputtering), electron beam evaporation (EBE) and the like, and chemical deposition method includes metal organic chemical vapor deposition (MOCVD), plasma enhanced chemical vapor deposition (PECVD), liquid phase epitaxy technology (LPE) and the like, each of the various deposition methods has its own characteristics, but the core goal of all methods is to prepare materials meeting the design expected quality and form, including thin film growth, nanostructure growth and the like, at present, thin film deposition is the mainstream application in industrialization application, how to grow dense, high-quality and uniform thin film has always been the key core problem concerned in research and industrialization process, especially for the demand of cost reduction and efficiency increase in various industries, it is required to deposit materials on larger and larger sample / substrate materials (4 inches, 6 inches, 8 inches and the like), thus bringing greater challenge to deposition coating uniformity.

[0004] At present, for the coating technology in ordinary deposition growth environment (such as normal temperature, normal pressure or low vacuum environment), the uniformity can be improved by increasing the target material area, increasing the chamber volume and increasing the number of coating sources, which can achieve good results. However, for deposition coating in extreme environment such as ultra-high vacuum, high temperature and high pressure, due to high cost of cavity manufacturing and high price of coating source, an ideal solution has not been found to solve the uniformity problem.

[0005] In the prior art, for example, a molecular beam epitaxy device, the processing chamber for film deposition generally has a vacuum degree of 10-10 Torr, and the substrate (sample) needs to be heated to a temperature of 200-1500 DEG C, and a beam source is usually arranged outside the vacuum chamber, the source material is loaded in the beam source, and the source material in the beam source enters the chamber in the form of a molecular beam to deposit on the surface of the sample to form a thin film. Since the bottom of the processing chamber of the molecular beam epitaxy device is generally provided with optical testing components, and the sample may fall off during the manufacturing process, the beam source is generally arranged in a slanted target manner. For example, the patent with the publication number CN117026187A discloses a boat-shaped process chamber and a vacuum film deposition device with the chamber, the beam source (ion source system) is arranged obliquely outside the vacuum chamber, the sample table (workpiece disc) is arranged horizontally at the top end inside the vacuum chamber, and the normal line of the beam source forms a certain angle with the surface of the sample table. Since the projection of the molecular beam emitted by the beam source on the sample table plane is in an elliptical distribution, the morphology, compactness and uniformity of the thin film deposited on both sides of the center outgoing line of the beam source cannot be controlled to be uniform, so that the uniformity of the sample surface after film deposition is greatly reduced. Therefore, the MBE process cannot be applied to large-size area deposition and film deposition, especially in high-end industrial applications, high-uniformity thin film deposition is required to meet the high-uniformity performance. SUMMARY

[0006] Therefore, the present application provides a vacuum film deposition device and a film deposition method to solve the problem of inaccurate control of film deposition uniformity in the vacuum film deposition process.

[0007] The technical scheme of the present application is as follows:

[0008] In one aspect, the present application provides a vacuum film deposition device, comprising:

[0009] a vacuum chamber, the vacuum chamber having a vacuum chamber inside;

[0010] a beam source, obliquely fixed outside the vacuum chamber, for emitting source material used for film deposition into the vacuum chamber;

[0011] a sample table, arranged at the top end inside the vacuum chamber, the bottom surface of the sample table being used for mounting a workpiece, and the bottom surface of the sample table being inclined towards the direction of the beam source, and the center outgoing line of the beam source being perpendicular to the bottom surface of the sample table.

[0012] On the basis of the above technical scheme, preferably, the included angle a between the beam source and the horizontal plane is 50-70 DEG.

[0013] On the basis of the above technical scheme, preferably, the monitoring unit further comprises an optical emission module, an optical receiving module and an analysis module, the optical emission module is fixedly arranged at the bottom of the vacuum cavity and is used for emitting test light in the vertical direction into the vacuum cavity so that the test light irradiates the surface of the workpiece on which the thin film is deposited, the optical receiving module is fixedly arranged at the outer wall of the vacuum cavity and is used for receiving the light reflected by the surface of the workpiece, and the analysis module is used for analyzing the light received by the optical receiving module.

[0014] Further, preferably, the monitoring unit further comprises an angle adjusting device, the angle adjusting device is electrically connected with the analysis module, a hinged seat is arranged at the top surface in the vacuum cavity, one end of the sample table is hingedly connected with the hinged seat, and the angle adjusting device is arranged in the vacuum cavity and is used for driving the end of the sample table away from the hinged seat to make pitching movement so as to adjust the angle between the bottom surface of the sample table and the central emission line of the beam source.

[0015] Preferably, the angle adjusting device is an electric cylinder, the fixed end of the electric cylinder is hingedly connected with the top surface in the vacuum cavity, and the other end of the electric cylinder is hingedly connected with the top surface of the end of the sample table away from the hinged seat.

[0016] On the basis of the above technical scheme, preferably, the sample table comprises a fixed plate, a clamp and a rotary motor, one end of the fixed plate is hingedly connected with the hinged seat, the other end of the fixed plate is hingedly connected with the angle adjusting device, the clamp is arranged below the fixed plate, and the rotary motor is fixedly arranged at the top surface of the fixed plate and is used for driving the clamp to rotate, and the clamp is used for horizontally clamping the workpiece.

[0017] Further, preferably, the clamp comprises a rotating disc, a first clamping block, a second clamping block, a first connecting rod, a second connecting rod and an elastic member.

[0018] The rotating disc is horizontally arranged at the bottom surface of the fixed plate, and the output shaft of the rotary motor penetrates through the fixed plate and is fixedly connected with the rotating disc.

[0019] The first clamping block and the second clamping block are symmetrically arranged on the bottom surface of the rotating disc relative to the center of the rotating disc, the first clamping block and the second clamping block can be relatively separated or close to each other, the first clamping block and the second clamping block are used for horizontally clamping the workpiece in cooperation with each other, the side of the first clamping block close to the second clamping block is provided with a first slot at both ends in the vertical direction of the first clamping block, and the side of the second clamping block close to the first clamping block is provided with a second slot corresponding to the position of the first slot.

[0020] The first connecting rod and the second connecting rod are cross-rotatingly arranged at the center of the rotating disc, and the first connecting rod and the second connecting rod are between the first clamping block, the second clamping block and the rotating disc, both ends of the first connecting rod are rotationally provided with first rotating shafts, both ends of the second connecting rod are rotationally provided with second rotating shafts, the two first rotating shafts are connected with one of the first slotted holes and the second slotted hole corresponding thereto respectively, and the two second rotating shafts are connected with the other first slotted hole and the second slotted hole corresponding thereto respectively.

[0021] The surface of the rotating disc corresponding to the first clamping block and the second clamping block is provided with a mounting groove, the length direction of the mounting groove is parallel to the moving direction of the first clamping block, the opposite end bottom surface of the first clamping block and the second clamping block is provided with a push plate inserted into the mounting groove, and an elastic member is arranged in the mounting groove and abuts against the side of the push plate away from the center of the rotating disc.

[0022] Further, preferably, the first clamping block is fixedly provided with a first clamping part on the side away from the first slotted hole, the second clamping block is fixedly provided with a second clamping part on the side away from the second slotted hole, the opposite side of the first clamping part and the second clamping part is in V-shaped structure, the side edge of the first clamping part towards the second clamping part is fixedly provided with a first anti-falling part, and the side edge of the second clamping part towards the first clamping part is fixedly provided with a second anti-falling part.

[0023] Preferably, the bottom surface of the fixed plate is provided with an annular sliding groove, and the top surface of the rotating disc is provided with a sliding block in sliding connection with the annular sliding groove.

[0024] On the other hand, the application discloses a vacuum coating method, which utilizes the vacuum coating device of the first aspect, and comprises the following steps:

[0025] S1, installing the workpiece to be coated on the clamp on the bottom surface of the sample table, and performing vacuumizing operation on the vacuum chamber;

[0026] S2, driving the sample table to pitch by the angle adjusting device, so that the central exit line of the beam source is perpendicular to the surface of the workpiece;

[0027] S3, driving the clamp to rotate by the rotary motor to drive the workpiece to rotate horizontally;

[0028] S4, emitting the film source material from the beam source to the surface of the workpiece, and making the projection of the source material on the surface of the workpiece circular;

[0029] S5, during the coating process of the workpiece, emitting test light to the film on the surface of the workpiece by the optical emission module, receiving the light reflected by the film by the optical receiving module, analyzing the optical properties of the film by the analysis module, and adjusting the inclination angle of the workpiece in real time by the angle adjusting device and / or adjusting the rotation speed of the clamp workpiece by the rotary motor.

[0030] The present application has the following beneficial effects relative to the prior art:

[0031] (1) By tilting the sample table bottom surface towards the beam source direction, the center exit line of the beam source is perpendicular to the sample table bottom surface, thereby the projection of the source material emitted by the beam source on the workpiece is a circular distribution rather than an elliptical shape, the material distribution emitted by the beam source to the workpiece surface is symmetrical around the center of the circle, the deposited film on the workpiece surface is a circular distribution, the morphology is uniform, and the density is consistent, thereby the uniformity of the film can be greatly improved;

[0032] (2) By setting the included angle a between the beam source and the horizontal plane to 50°-70°, on the one hand, it ensures that the optical detection device can be installed after the beam source is installed obliquely on the vacuum chamber, and on the other hand, it also ensures that the optical detection device can detect the film state of the workpiece surface on the obliquely arranged sample table bottom surface;

[0033] (3) By setting a monitoring unit, and making the optical emission module emit test light on the film on the workpiece surface, using the optical receiving module to receive the light, and analyzing by the analysis module, the angle at which the sample table needs to be tilted is determined by analyzing the intensity, phase, polarization and other optical shapes of the film, and the sample table is adjusted in angle relative to the direction of the center exit line of the beam source by the angle adjusting device, so as to ensure that the sample table bottom surface and the center exit line of the beam source are completely perpendicular. Only when the center exit line of the beam source and the sample table bottom surface are completely perpendicular, the film on the workpiece surface will be uniform, and the intensity, phase, polarization of the film at each position can be consistent;

[0034] (4) By setting a cross-link structure between the first clamping block and the second clamping block, and setting an elastic member between the first clamping block, the second clamping block and the rotating disc, the first clamping block and the second clamping block can be easily and quickly separated or approached synchronously, so as to quickly realize the clamping and fixing of the workpiece;

[0035] (5) The first anti-drop part is fixedly arranged at the side edge of the first clamping part facing the second clamping part, and the second anti-drop part is fixedly arranged at the side edge of the second clamping part facing the first clamping part. By the cooperation of the first anti-drop part and the second anti-drop part, the bottom surface of the workpiece can be covered, so as to limit the movement of the workpiece in the vertical direction, ensure the position of the workpiece on the clamp is fixed and firm, and further ensure the uniformity of the film of the workpiece. BRIEF DESCRIPTION OF DRAWINGS

[0036] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the following will briefly introduce the drawings needed to be used in the embodiments or prior art description. Obviously, the drawings in the following description only constitute some embodiments of the present application, and for those skilled in the art, other drawings can also be obtained from these drawings without creative labor.

[0037] Figure 1 A schematic view of a planar structure of the vacuum coating device disclosed in the present application;

[0038] Figure 2 A schematic view of a three-dimensional structure of the vacuum coating device disclosed in the present application;

[0039] Figure 3 A schematic view of a three-dimensional structure of the sample table disclosed in the present application;

[0040] Figure 4 A schematic view of an open state of the clamp disclosed in the present application;

[0041] Figure 5 A schematic view of a first perspective view of the clamp disclosed in the present application;

[0042] Figure 6 A schematic view of a second perspective view of the clamp disclosed in the present application;

[0043] Figure 7 A top view of the sample table disclosed in the present application;

[0044] Figure 8 A Figure 7 A planar sectional view at A-A in the above figure;

[0045] Reference signs:

[0046] 1, vacuum cavity; 10, vacuum chamber; 2, beam source; 3, sample table; 4, monitoring unit; 41, optical emission module; 42, optical receiving module; 43, analysis module; 44, angle adjusting device; 101, hinged seat; 31, fixed plate; 32, clamp; 33, rotary motor; 321, rotating disc; 322, first clamping block; 323, second clamping block; 324, first connecting rod; 325, second connecting rod; 326, elastic member; 3221, first slot-shaped hole; 3231, second slot-shaped hole; 3241, first rotating shaft; 3251, second rotating shaft; 3211, mounting groove; T, push plate; 3222, first clamping part; 3232, second clamping part; 3222a, first anti-falling part; 3232a, second anti-falling part; 310, annular sliding groove; 3212, sliding block. DETAILED DESCRIPTION

[0047] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments of the present application. Based on the embodiments of the present application, all other embodiments obtained by those skilled in the art without creative work fall within the scope of the present application.

[0048] As shown in Figure 1 combination Figure 2 , the embodiment of the present application discloses a vacuum coating device, comprising a vacuum cavity 1, a beam source 2 and a sample table 3.

[0049] Among them, the vacuum cavity 1 is installed on the coating equipment, the vacuum cavity 1 has a vacuum chamber 10 inside, which is used to provide a vacuum coating environment, and a vacuum pumping device is installed on the vacuum cavity 1, which can realize that the vacuum chamber 10 is in a vacuum environment during operation.

[0050] The beam source 2 is obliquely fixed outside the vacuum cavity 1, which is used to emit source material for coating to the vacuum chamber 10, and the source material loaded in the beam source 2 is selected according to the type of workpiece coating material, such as metal materials Ga, Al, In and the like, which can be in solid or liquid state.

[0051] In the prior art, the sample table 3 is usually horizontally arranged in the vacuum chamber 10, and the area of the source material projected on the plane of the sample table 3 by the beam source 2 is distributed in an elliptical shape, and the morphology, density and uniformity of the film deposited on both sides of the central exit line of the beam source 2 cannot be controlled to be uniform, so that the uniformity of the sample surface after deposition and coating is greatly reduced.

[0052] Therefore, the present application improves the setting state of the sample table 3 in the vacuum chamber 10, specifically, the sample table 3 is arranged at the top end of the vacuum chamber 10, and the bottom surface of the sample table 3 is used to install the workpiece, which can be a silicon substrate. The bottom surface of the sample table 3 is inclined to the direction of the beam source 2, and the central exit line of the beam source 2 is perpendicular to the bottom surface of the sample table 3.

[0053] By using the above technical scheme, the projection of the source material emitted by the beam source 2 on the workpiece is circular rather than elliptical, so that the material distribution emitted by the beam source 2 to the surface of the workpiece is symmetrical around the center of the circle, the deposited film on the surface of the workpiece is circularly distributed, the morphology is uniform, and the density is consistent, thereby the uniformity of the film can be greatly improved.

[0054] As some preferable embodiments, the angle a between the beam source 2 and the horizontal plane is 50-70°, when the angle of the beam source 2 is greater than 70°, the position of the beam source 2 in the vacuum cavity 1 tends to the bottom surface of the vacuum chamber 10, so that the installation position of the beam source 2 on the vacuum cavity 1 affects the installation of the optical detection device on the bottom of the vacuum chamber 10, when the angle of the beam source 2 is less than 50°, the angle between the sample table 3 and the horizontal plane will increase, so that the optical detection device on the bottom surface of the vacuum chamber 10 cannot detect the film state of the workpiece surface due to the too large inclination angle of the sample table 3. By setting the angle a between the beam source 2 and the horizontal plane to 50-70°, on the one hand, the inclined installation of the beam source 2 on the vacuum cavity 1 does not affect the installation of the optical detection device, and on the other hand, the optical detection device can detect the film state of the workpiece surface on the bottom surface of the sample table 3 which is arranged obliquely.

[0055] In order to monitor the optical properties of the film deposited on the surface of the workpiece, the monitoring unit 4 is also disclosed, which further comprises an optical emission module 41, an optical receiving module 42 and an analysis module 43. Specifically, the optical emission module 41 is fixedly arranged on the bottom of the vacuum cavity 1, and is used for emitting test light in the vertical direction into the vacuum chamber 10, so that the test light irradiates the surface of the workpiece on which the film is deposited. The optical receiving module 42 is fixedly arranged on the outer wall of the vacuum cavity 1, and is used for receiving the light reflected by the surface of the workpiece. The analysis module 43 is used for analyzing the light received by the optical receiving module 42.

[0056] Through the above structure, during the film plating process of the workpiece, the test light emitted by the optical emission module 41 irradiates the surface of the film to form a certain area of light spot, and the light is reflected to the light receiving module through the film. The analysis module 43 can evaluate the intensity, phase, polarization and other optical properties of the film in real time and online, so as to more intuitively obtain the quality of the film prepared on the surface of the workpiece.

[0057] In the above embodiment, one beam source 2 is arranged. Since the beam source 2 is affected by the environmental temperature inside the beam source 2 and the change of the state of the source material inside the beam source 2 during the emission of the film material, the state of the source material molecular beam emitted by the beam source 2 is unstable, and the source material molecular beam emitted by the beam source 2 into the vacuum chamber is not completely perpendicular to the surface of the workpiece, but has a certain angle, which makes the projection of the molecular beam emitted by the beam source onto the surface of the workpiece present a slightly elliptical distribution, thereby causing the inconsistency of the film uniformity.

[0058] To this end, the embodiment is based on the above disclosed monitoring unit 4 and further provided with an angle adjusting device 44, which is electrically connected with the analysis module 43, the top surface of the vacuum chamber 10 is provided with a hinged seat 101, one end of the sample table 3 is hingedly connected with the hinged seat 101, and the angle adjusting device 44 is arranged in the vacuum chamber 10 and used to drive the end of the sample table 3 away from the hinged seat 101 to make a pitching motion, so as to adjust the angle between the bottom surface of the sample table 3 and the central outgoing line of the beam source 2.

[0059] With the above technical scheme, in the process of continuously performing the film coating operation on the workpiece surface by the beam source 2, the optical outgoing module 41 emits test light to the film on the workpiece surface, the optical receiving module 42 receives the light, and the analysis module 43 analyzes the intensity, phase, polarization and other optical shapes of the film, so as to determine the angle at which the sample table 3 needs to be tilted, and the angle adjusting device 44 drives the sample table 3 to adjust the angle relative to the outgoing line direction of the beam source 2, so as to ensure that the bottom surface of the sample table 3 and the central outgoing line of the beam source 2 are completely perpendicular. Only when the central outgoing line of the beam source 2 and the bottom surface of the sample table 3 are completely perpendicular, the film coating on the workpiece surface will be uniform, and the intensity, phase and polarization of the film at each position can be consistent.

[0060] The monitoring unit 4 can be arranged to monitor the optical properties of the film on the workpiece surface in real time during the whole process of the film coating by the beam source 2, so as to dynamically adjust the angle of the workpiece, so that the workpiece surface and the central outgoing line of the beam source 2 are completely perpendicular, so as to ensure that the material emitted by the beam source 2 to the workpiece surface is distributed symmetrically around the center, the film deposited on the workpiece surface is circularly distributed, and the morphology is uniform and the density is consistent, thereby greatly improving the uniformity of the film.

[0061] Of course, the beam source of the present application can also be provided with a plurality of beam sources, and different source materials can be used to coat the workpiece by arranging different beam sources 2. In general, the inclination angles of different beam sources 2 arranged outside the vacuum chamber 1 are affected by the position and have some deviations. When different beam sources 2 are switched, the angle of the sample table 3 needs to be adjusted. Therefore, the monitoring unit 4 can adjust the angle of the sample table relative to the beam source 2 after the beam source 2 is switched, so that the central outgoing line of the beam source 2 and the workpiece surface are perpendicular during the film coating process.

[0062] As some preferable embodiments, the angle adjusting device 44 is an electric cylinder, a fixed end of the electric cylinder is hingedly connected to the top surface in the vacuum chamber 10, and the other end of the electric cylinder is hingedly connected to the top surface of the one end of the sample table 3 away from the hinged seat 101. With the above structure, the electric cylinder has high precision, and can ensure that the bottom surface of the sample table 3 is perpendicular to the central outgoing line of the beam source 2 of the material to be emitted during the angle adjustment of the sample table 3. Through the electric cylinder, the sample table 3 can be precisely adjusted.

[0063] In order to realize clamping of the workpiece on the sample table 3, the application shows a preferable embodiment of the sample table 3, and specifically, referring to the accompanying drawings, Figure 2 and 3 It is shown that the sample table 3 comprises a fixed plate 31, a clamp 32, and a rotary motor 33. One end of the fixed plate 31 is hingedly connected to the hinged seat 101, and the other end is hingedly connected to the angle adjusting device 44. The clamp 32 is arranged below the fixed plate 31, and the rotary motor 33 is fixedly arranged on the top surface of the fixed plate 31 and used to drive the clamp 32 to rotate, and the clamp 32 is used to horizontally clamp the workpiece.

[0064] With the above technical solution, the fixed plate 31 keeps a relative position unchanged with the vacuum chamber 10 under the constraint of the angle adjusting device and the hinged seat 101, and can only make a pitching motion relative to the vacuum chamber 10. The workpiece to be plated is installed on the clamp 32, the rotary motor 33 drives the clamp 32 to make a rotary motion on the bottom surface of the fixed plate 31, and the clamp 32 drives the workpiece to rotate at a high speed in the process of rotation. The source material emitted by the beam source 2 hits the surface of the workpiece, and the thin film material is uniformly deposited on the surface of the workpiece in the process of high-speed rotation of the workpiece. It is worth noting that the heating device for heating the inside of the vacuum chamber 10 is further arranged outside the vacuum cavity 1, so as to ensure the temperature required in the process of plating the workpiece.

[0065] It is worth noting that in order to facilitate the installation of the workpiece on the clamp 32 in the vacuum chamber 10, an openable cavity door can be arranged on the front side of the vacuum cavity 1.

[0066] In order to facilitate the installation of the workpiece on the clamp 32, the embodiment shows a hinged embodiment of the clamp 32, and specifically, referring to the accompanying drawings, Figures 4-8 It is shown that the clamp 32 of the embodiment comprises a rotating disc 321, a first clamping block 322, a second clamping block 323, a first connecting rod 324, a second connecting rod 325, and an elastic member 326.

[0067] The rotating disc 321 is horizontally arranged on the bottom surface of the fixed plate 31, and the rotating disc 321 is in a disc type or square structure. The output shaft of the rotary motor 33 penetrates through the fixed plate 31 and is fixedly connected to the rotating disc 321. Under the driving of the rotary motor 33, the rotating disc 321 rotates on the bottom surface of the fixed plate 31.

[0068] The first clamping block 322 and the second clamping block 323 are symmetrically arranged on the bottom surface of the rotating disc 321, and in some embodiments, the bottom surface of the rotating disc 321 is provided with sliding rails, and the first clamping block 322 and the second clamping block 323 are respectively connected with the rotating disc 321 through the sliding rails, so that the first clamping block 322 and the second clamping block 323 can be separated or close to each other, and the first clamping block 322 and the second clamping block 323 are matched to clamp the workpiece horizontally.

[0069] In order to realize the separation of the first clamping block 322 and the second clamping block 323, the workpiece is clamped. The scheme adopted in the embodiment is that the side of the first clamping block 322 close to the second clamping block 323 is provided with a first slot hole 3221 at both ends perpendicular to the moving direction of the first clamping block 322, and the side of the second clamping block 323 close to the first clamping block 322 is provided with a second slot hole 3231 corresponding to the position of the first slot hole 3221. The length direction of the first slot hole 3221 and the second slot hole 3231 is perpendicular to the moving direction of the first clamping block 322.

[0070] Meanwhile, the first connecting rod 324 and the second connecting rod 325 are arranged between the first clamping block 322 and the second clamping block 323. Specifically, the first connecting rod 324 and the second connecting rod 325 are cross-rotatingly arranged at the center of the rotating disc 321, and the first connecting rod 324 and the second connecting rod 325 are between the first clamping block 322, the second clamping block 323 and the rotating disc 321, two ends of the first connecting rod 324 are respectively provided with a first rotating shaft 3241, two ends of the second connecting rod 325 are respectively provided with a second rotating shaft 3251, the two first rotating shafts 3241 are respectively connected with one of the first slot hole 3221 and the second slot hole 3231 corresponding thereto, and the two second rotating shafts 3251 are respectively connected with the other first slot hole 3221 and the second slot hole 3231 corresponding thereto.

[0071] The first clamping block 322 and the second clamping block 323 are connected by the first connecting rod 324 and the second connecting rod 325 arranged in a cross manner, when the first clamping block 322 is horizontally slid and moves away from the second clamping block 323, under the action of the first connecting rod 324 and the second connecting rod 325, the first connecting rod 324 and the second connecting rod 325 are spread around the intersection point, and the second clamping block 323 is driven to separate from the first clamping block 322 synchronously, correspondingly, when the first clamping block 322 moves towards the second clamping block 323, the first connecting rod 324 and the second connecting rod 325 are folded around the intersection point, and the second clamping block 323 is driven to move towards the first clamping block 322 synchronously, through the arrangement of the first slot 3221 and the second slot 3231, the first rotating shaft 3241 can have a certain moving space in the first slot 3221, and the second rotating shaft 3251 can have a certain moving space in the second slot 3231 during the folding or spreading process of the first connecting rod 324 and the second connecting rod 325, so that the first clamping block 322 and the second clamping block 323 can realize relative separation and folding through the two connecting rods arranged in a cross manner.

[0072] In order to enable the first clamping block 322 and the second clamping block 323 to clamp the workpiece by mutual cooperation, the first clamping block 322 and the second clamping block 323 are provided with installation grooves 3211 on the surface of the rotating disc 321 corresponding to the first clamping block 322 and the second clamping block 323, the length direction of the installation grooves 3211 is parallel to the moving direction of the first clamping block 322, the opposite end surfaces of the first clamping block 322 and the second clamping block 323 are provided with push plates T inserted into the installation grooves 3211, and the elastic members 326 are arranged in the installation grooves 3211 and abut against the side of the push plates T away from the center of the rotating disc 321.

[0073] Through the above technical scheme, when the first clamping block 322 is horizontally slid and moves away from the second clamping block 323, the push plate T on the bottom surface of the first clamping block 322 translates in the installation groove 3211 to compress the elastic member 326, correspondingly, the second clamping block 323 translates away from the first clamping block 322 under the action of the cross connecting rod structure, similarly, the push plate T on the bottom surface of the second clamping block 323 also compresses the corresponding elastic member 326, thereby, the first clamping block 322 and the second clamping block 323 open a certain installation space, after the workpiece is horizontally placed between the first clamping block 322 and the second clamping block 323, the first clamping block 322 is loosened, the elastic member 326 will push the push plate T to translate due to the self-pre-tightening force, so that the first clamping block 322 and the second clamping block 323 are folded, thereby horizontally clamping the workpiece.

[0074] The workpiece in the embodiment is preferably a silicon substrate, since the silicon substrate is mostly circular structure, in order to adapt to clamping of workpieces of different diameters, the first clamping block 322 is fixedly provided with a first clamping portion 3222 on the side away from the first strip-shaped hole 3221, and the second clamping block 323 is fixedly provided with a second clamping portion 3232 on the side away from the second strip-shaped hole 3231. Thus, when the first clamping block 322 and the second clamping block 323 are separated from each other, the workpiece is horizontally placed between the two, and the circular workpiece is clamped by the opposite sides of the first clamping portion 3222 and the second clamping portion 3232. By making the opposite sides of the first clamping portion 3222 and the second clamping portion 3232 be V-shaped structures, clamping of workpieces of different diameters can be adapted, and the adaptability is stronger.

[0075] Since the clamp 32 rotates at high speed below the fixed plate 31, in order to avoid the workpiece on the clamp 32 from being thrown out during rotation, the first clamping portion 3222 is fixedly provided with a first anti-falling portion 3222a on the side edge facing the second clamping portion 3232, and the second clamping portion 3232 is fixedly provided with a second anti-falling portion 3232a on the side edge facing the first clamping portion 3222. Thus, by the cooperation of the first anti-falling portion 3222a and the second anti-falling portion 3232a, the bottom surface of the workpiece can be covered, so as to limit the movement of the workpiece in the vertical direction, ensure that the position of the workpiece on the clamp 32 is fixed and firm, and further ensure the uniformity of film plating of the workpiece.

[0076] It is worth noting that the above-mentioned clamp is a pure mechanical structure, which is simple in structure and convenient to operate, and can stably and firmly clamp the circular workpiece.

[0077] In order to make the clamp 32 rotate stably on the bottom surface of the fixed plate 31, the bottom surface of the fixed plate 31 is provided with an annular sliding groove 310, and the top surface of the rotating disc 321 is provided with a sliding block 3212 in sliding connection with the annular sliding groove 310. Thus, by making the rotating disc 321 slide in the annular sliding groove 310 through the sliding block 3212, the posture of the rotating disc 321 during rotation can be ensured to be stable and not to shake.

[0078] The application also discloses a vacuum film plating method, which utilizes the vacuum film plating device in the above-mentioned embodiment, and comprises the following steps:

[0079] S1, installing the workpiece to be plated on the clamp 32 on the bottom surface of the sample table 3, and performing vacuumizing operation on the vacuum chamber 10;

[0080] S2, driving the sample table 3 to pitch by the angle adjusting device 44, so that the central exit line of the beam source 2 is perpendicular to the surface of the workpiece;

[0081] S3, driving the clamp 32 to rotate by the rotating motor 33 to drive the workpiece to rotate horizontally;

[0082] S4, emitting the thin film source material from the beam source 2 to the workpiece surface, and making the projection of the source material on the workpiece surface circular;

[0083] S5, during the film plating process of the workpiece, emitting test light to the thin film on the workpiece surface through the optical emission module 41, receiving the light reflected by the thin film through the optical receiving module 42, analyzing the optical properties of the thin film through the analysis module 43, and adjusting the tilt angle of the workpiece in real time through the angle adjusting device 44 and / or adjusting the rotation speed of the workpiece of the clamp 32 through the rotary motor 33.

[0084] The above only describes the preferred embodiments of the present application and is not intended to limit the present application. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the protection scope of the present application.

Claims

1. A vacuum film deposition apparatus, characterized by comprising: The utility model relates to a kind of thin film deposition monitoring device, including: Vacuum cavity (1), vacuum chamber (10) is inside with vacuum cavity (1); Beam source (2), obliquely fixedly arranged outside vacuum cavity (1), for emitting source material used for coating in vacuum chamber (10); Sample stage (3) is arranged at top in vacuum chamber (10), the bottom surface of the sample stage (3) is used to install workpiece, the bottom surface of the sample stage (3) is inclined to the direction of beam source (2), and the center exit line of beam source (2) is perpendicular to the bottom surface of sample stage (3); It further includes monitoring unit (4), and the monitoring unit (4) includes optical emission module (41), optical receiving module (42) and analysis module (43), the optical emission module (41) is fixedly arranged at the bottom of vacuum cavity (1), for emitting test light in vertical direction to vacuum chamber (10), so that test light irradiates to the surface of workpiece deposited with thin film, the optical receiving module (42) is fixedly arranged on the outer wall of vacuum cavity (1), for receiving light reflected by workpiece surface, and the analysis module (43) is used to analyze the light received by optical receiving module (42); The monitoring unit (4) further includes angle adjusting device (44), and the angle adjusting device (44) is electrically connected with analysis module (43), the top surface of vacuum chamber (10) is provided with hinged seat (101), one end of sample stage (3) is hingedly connected with hinged seat (101), and angle adjusting device (44) is arranged in vacuum chamber (10), for driving the end of sample stage (3) away from hinged seat (101) to do pitching motion, to adjust the angle between the bottom surface of sample stage (3) and the center exit line of beam source (2); The sample stage (3) includes fixed plate (31), clamp (32) and rotary motor (33), one end of the fixed plate (31) is hingedly connected with hinged seat (101), the other end is hingedly connected with angle adjusting device (44), clamp (32) is arranged below fixed plate (31), rotary motor (33) is fixedly arranged on the top surface of fixed plate (31), for driving clamp (32) to rotate, and the clamp (32) is used to horizontally clamp workpiece; The clamp (32) includes rotating disc (321), first clamping block (322), second clamping block (323), first connecting rod (324), second connecting rod (325) and elastic member (326); Rotating disc (321) is horizontally arranged on the bottom surface of fixed plate (31), and the output shaft of rotary motor (33) passes through fixed plate (31) and is fixedly connected with rotating disc (321); The first clamping block (322) and the second clamping block (323) are symmetrically arranged on the bottom surface of the rotating disc (321) relative to the center of the rotating disc (321), and the first clamping block (322) and the second clamping block (323) can be relatively separated or close to each other, and the first clamping block (322) and the second clamping block (323) are matched with each other to horizontally clamp the workpiece, and the side of the first clamping block (322) close to the second clamping block (323) is provided with a first strip hole (3221) at both ends perpendicular to the moving direction of the first clamping block (322), and the side of the second clamping block (323) close to the first clamping block (322) is provided with a second strip hole (3231) corresponding to the position of the first strip hole (3221); The first connecting rod (324) and the second connecting rod (325) are cross-rotatably arranged at the center of the rotating disc (321), and the first connecting rod (324) and the second connecting rod (325) are located between the first clamping block (322), the second clamping block (323) and the rotating disc (321), both ends of the first connecting rod (324) are rotatably provided with a first rotating shaft (3241), both ends of the second connecting rod (325) are rotatably provided with a second rotating shaft (3251), and the two first rotating shafts (3241) are connected with one of the first strip holes (3221) and the second strip hole (3231) corresponding to the first strip hole (3221), and the two second rotating shafts (3251) are connected with the other first strip hole (3221) and the second strip hole (3231) corresponding to the first strip hole (3221). The surface of the rotating disc (321) corresponding to the first clamping block (322) and the second clamping block (323) is provided with a mounting groove (3211), the length direction of the mounting groove (3211) is parallel to the moving direction of the first clamping block (322), and the bottom surface of the opposite end of the first clamping block (322) and the second clamping block (323) is provided with a push plate (T) inserted into the mounting groove (3211), and the elastic member (326) is arranged in the mounting groove (3211) and abuts against the side of the push plate (T) away from the center of the rotating disc (321).

2. The vacuum coating apparatus of claim 1, wherein: The included angle α between the beam source (2) and the horizontal plane is 50°-70°.

3. The vacuum coating apparatus of claim 1, wherein: The angle adjusting device (44) is an electric cylinder, the fixed end of the electric cylinder is hingedly connected with the top surface in the vacuum chamber (10), and the other end of the electric cylinder is hingedly connected with the top surface of the end of the sample table (3) away from the hinged seat (101).

4. The vacuum coating apparatus of claim 1, wherein: The side of the first clamping block (322) away from the first strip hole (3221) is fixedly provided with a first clamping part (3222), the side of the second clamping block (323) away from the second strip hole (3231) is fixedly provided with a second clamping part (3232), the opposite sides of the first clamping part (3222) and the second clamping part (3232) are V-shaped structures, the side edge of the first clamping part (3222) facing the second clamping part (3232) is fixedly provided with a first anti-falling part (3222a), and the side edge of the second clamping part (3232) facing the first clamping part (3222) is fixedly provided with a second anti-falling part (3232a).

5. The vacuum coating apparatus of claim 1, wherein: The bottom surface of the fixed plate (31) is provided with an annular sliding groove (310), and the top surface of the rotating disc (321) is provided with a sliding block (3212) in sliding connection with the annular sliding groove (310).

6. A vacuum coating method using the vacuum coating apparatus according to any one of claims 1 to 5, characterized by, The method comprises the following steps: S1, installing the workpiece to be plated on the clamps (32) on the bottom surface of the sample table (3), and performing vacuumizing operation on the vacuum chamber (10); S2, driving the sample table (3) to pitch by the angle adjusting device (44), so that the central outgoing line of the beam source (2) is perpendicular to the surface of the workpiece; S3, driving the clamps (32) to rotate by the rotary motor (33) to drive the workpiece to rotate horizontally; S4, emitting the film source material to the surface of the workpiece by the beam source (2), and making the projection of the source material on the surface of the workpiece be circular; S5, during the plating process of the workpiece, emitting test light to the film on the surface of the workpiece by the optical emission module (41), receiving the light reflected by the film by the optical receiving module (42), analyzing the optical properties of the film by the analysis module (43), and adjusting the inclination angle of the workpiece in real time by the angle adjusting device (44) and / or adjusting the rotation speed of the workpiece of the clamps (32) by the rotary motor (33).

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