A cleaning device and a cleaning method for a single crystal square rod

Abstract

This application provides a cleaning apparatus and method for single-crystal square rods. The apparatus includes a conveying device and a first square rod cleaning zone, a first square rod wiping zone, a second square rod cleaning zone, a second square rod wiping zone, a third square rod cleaning zone, and a drying zone arranged in sequence. The conveying device is used to sequentially convey the single-crystal square rods to the corresponding zones. Each zone has a rotatable gripping device. The first square rod cleaning zone is used to clean impurities from the surface of the single-crystal square rod. The first wiping device is used to wipe the surface of the single-crystal square rod while releasing water. The second square rod cleaning zone is used to further clean the single-crystal square rod. The second square rod wiping zone is used to wipe the single-crystal square rod while releasing anhydrous ethanol solution. The third square rod cleaning zone is used to clean the surface of the single-crystal square rod of the anhydrous ethanol solution. The drying zone is used to air dry the single-crystal square rod. The apparatus provided by this application can automatically clean square rods and has a low cost.

Description

Technical Field

[0001] This application relates to the field of photovoltaic technology, and in particular to a cleaning device and method for cleaning monocrystalline square rods. Background Technology

[0002] With the continuous development of technology, photovoltaic power generation has rapidly developed due to its environmental friendliness and sustainability, which perfectly meet the needs of today's society. As one of the raw materials for photovoltaic power generation, monocrystalline silicon is facing increasingly stringent quality requirements for its products.

[0003] Monocrystalline silicon rods, as a type of monocrystalline silicon product, have significant applications in the photovoltaic power generation field. In the actual processing of monocrystalline silicon rods, in addition to ensuring the geometric accuracy, dimensional tolerances, and form and position tolerances during grinding, another crucial indicator is the cleanliness requirement. Cleaning is a vital step in ensuring that the cleanliness of the monocrystalline silicon rods meets the requirements. However, current cleaning methods for monocrystalline silicon rods mainly rely on manual wiping of the surface, which is costly.

[0004] Therefore, how to reduce the cost of cleaning single-crystal square rods has become a technical problem that urgently needs to be solved by those skilled in the art. Summary of the Invention

[0005] To address the aforementioned issues, this application provides a cleaning apparatus and method for single-crystal square rods to solve the problem of high cost in cleaning single-crystal square rods in the prior art.

[0006] This application provides a cleaning device for single-crystal square rods, the cleaning device for single-crystal square rods comprising:

[0007] The system includes a conveying device and a first square bar cleaning zone, a first square bar wiping zone, a second square bar cleaning zone, a second square bar wiping zone, a third square bar cleaning zone, and a drying zone arranged in sequence. The conveying device is used to convey the single crystal square bars to the corresponding zones in sequence.

[0008] Each section has at least one rotatable gripping device for gripping a single-crystal square rod, thereby suspending the single-crystal square rod in the air.

[0009] The first square bar cleaning zone includes a first cleaning device, which is used to clean impurities on the surface of the single crystal square bar;

[0010] The first square bar wiping area includes a first wiping device, which is used to wipe the surface of the single crystal square bar while releasing water;

[0011] The second square bar cleaning zone includes a second cleaning device, which is used to further clean impurities on the surface of the single crystal square bar;

[0012] The second square rod wiping area includes a second wiping device, which is used to wipe the surface of the single crystal square rod while releasing anhydrous ethanol solution;

[0013] The third-party rod cleaning zone includes a third cleaning device, which is used to clean the surface of the single crystal square rod with an anhydrous ethanol solution.

[0014] The drying zone includes a drying device used to dry the water on the surface of the single crystal square rod.

[0015] In one possible implementation, the first cleaning device includes a first valve:

[0016] The first cleaning device uses water released from the first valve to clean impurities on the surface of the single crystal square rod. The water released through the first valve has a preset first flow rate and a first cleaning pressure.

[0017] The second cleaning device includes a third valve:

[0018] The second cleaning device uses the water released by the third valve to clean the impurities on the surface of the single crystal square rod. The water released through the third valve has a preset third flow rate and a third cleaning pressure.

[0019] The third cleaning device includes a fifth valve:

[0020] The third cleaning device uses the water released by the fifth valve to clean the impurities on the surface of the single crystal square rod. The water released through the fifth valve has a preset fourth flow rate and a fourth cleaning pressure.

[0021] In one possible implementation, the first wiping device includes a second valve and a wiping material:

[0022] The first wiping device cleans the surface of the single crystal square rod with water released through the second valve. While cleaning the surface of the single crystal square rod, the first wiping device wipes the surface of the single crystal square rod with the wiping material. The water released through the second valve has a preset second flow rate and a second cleaning pressure.

[0023] In one possible implementation, the second wiping device includes a fourth valve and a wiping material:

[0024] The second wiping device cleans the surface of the single crystal square rod through the anhydrous ethanol solution released by the fourth valve. While cleaning the surface of the single crystal square rod, the second wiping device wipes the surface of the single crystal square rod with the wiping material.

[0025] In one possible implementation, the conveying device is a roller conveyor:

[0026] The roller conveyor is used to place the single crystal square rod, and the roller conveyor sequentially conveys the single crystal square rod to different sections of the cleaning device for the single crystal square rod.

[0027] This application also provides a method for cleaning a single-crystal square rod, the method comprising the following steps:

[0028] The single-crystal square rods are sequentially conveyed to the first square rod cleaning area, the first square rod wiping area, the second square rod cleaning area, the second square rod wiping area, the third square rod cleaning area, and the drying area via a conveying device.

[0029] When the single crystal square rod is conveyed to the first square rod cleaning zone, the first square rod cleaning zone uses a first cleaning device to clean the impurities on the surface of the single crystal square rod.

[0030] When the single-crystal square rod is conveyed to the first square rod wiping area, the first square rod wiping area uses the first wiping device to wipe the surface of the single-crystal square rod while releasing water.

[0031] When the single crystal square rod is conveyed to the second square rod cleaning zone, the second square rod cleaning zone uses a second cleaning device to further clean the impurities on the surface of the single crystal square rod.

[0032] When the single-crystal square rod is conveyed to the second square rod wiping area, the second square rod wiping area uses the second wiping device to wipe the surface of the single-crystal square rod while releasing anhydrous ethanol solution;

[0033] When the single crystal square rod is conveyed to the third third rod cleaning zone, the third third rod cleaning zone uses a third cleaning device to clean the surface of the single crystal square rod with an anhydrous ethanol solution.

[0034] When the single-crystal square rod is conveyed to the drying zone, the drying zone uses a drying device to dry the water on the surface of the single-crystal square rod.

[0035] In one possible implementation, the cleaning method for the single-crystal square rod further includes:

[0036] When the single crystal rod is conveyed to different sections, the single crystal rod is held at a position at a preset height from the conveying device by using the rotatable gripping device corresponding to the section.

[0037] After a preset time interval, the rotatable gripping device corresponding to the interval places the single crystal rod onto the conveying device.

[0038] In one possible implementation, the first square rod cleaning zone cleans impurities on the surface of the single-crystal square rod using a first cleaning device, including:

[0039] Open the first valve, and water with a preset first flow rate and first cleaning pressure is released through the first valve;

[0040] The single-crystal square rod is rotated using the rotatable gripping device;

[0041] The water released through the first valve and the rotatable gripping device clean the impurities on the surface of the single-crystal square rod.

[0042] In one possible implementation, the first square rod wiping area utilizes a first wiping device to wipe the surface of the single-crystal square rod while releasing water, including:

[0043] Open the second valve to release water with a preset second flow rate and second cleaning pressure.

[0044] The single-crystal square rod is rotated multiple times by a preset angle using the rotatable gripping device, with the time interval between two adjacent rotations of the single-crystal square rod being the same.

[0045] The surface of the single-crystal square rod is wiped with a wiping agent during the time intervals of rotating the single-crystal square rod.

[0046] In one possible implementation, the third-party rod cleaning zone utilizes a third cleaning device to clean the surface of the single-crystal square rod with an anhydrous ethanol solution, comprising:

[0047] Open the fourth valve to release the anhydrous ethanol solution.

[0048] The single-crystal square rod is rotated multiple times by a preset angle using the rotatable gripping device, with the time interval between two adjacent rotations of the single-crystal square rod being the same.

[0049] The surface of the single-crystal square rod is wiped with a wiping agent during the time intervals of rotating the single-crystal square rod.

[0050] Compared with the prior art, this application has the following beneficial effects:

[0051] The single-crystal square rod cleaning apparatus provided in this application implements different cleaning steps for the single-crystal square rod through different zones. The single-crystal square rod undergoes a rough wash in the first cleaning zone to initially remove impurities from its surface. After the rough wash, the single-crystal square rod is wiped in the first wiping zone to remove impurities adhering to its surface. After wiping, the single-crystal square rod undergoes a fine wash in the second cleaning zone to further remove impurities from its surface. After the fine wash, the single-crystal square rod enters the second wiping zone, where anhydrous ethanol solution is released while wiping the surface to remove impurities. The single-crystal square rod undergoes a final water wash in the third cleaning zone and is then air-dried in the air-drying zone. After air-drying, the surface of the single-crystal square rod is almost free of any kind of impurities. The apparatus provided in this application can automatically clean single-crystal square rods; simply placing the single-crystal square rod on a conveyor device automatically completes the cleaning process, resulting in low cleaning costs. In addition, the cleaning results of each single-crystal square rod obtained by the apparatus provided in this application are almost consistent, resulting in better product quality control. In contrast, the cleaning results of single-crystal square rods obtained by manual cleaning in related technologies require further evaluation, and the product quality control is poor. Attached Figure Description

[0052] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0053] Figure 1 A schematic diagram of a cleaning device for a single-crystal square rod provided in an embodiment of this application;

[0054] Figure 2 This is a flowchart illustrating a cleaning method for a single-crystal square rod provided in an embodiment of this application. Detailed Implementation

[0055] As described above, monocrystalline square rods, as one of the monocrystalline silicon products, have a great demand in the field of photovoltaic power generation.

[0056] Research has revealed that silica sludge is generated during the processing of single-crystal square rods, adhering to the surface of the rods. During transportation, the surface of the single-crystal square rods becomes contaminated with grease, dust, and other impurities. If these impurities are not cleaned, they will affect the electrical and optical properties of the silicon wafers after slicing, reducing wafer quality. To improve the final wafer quality, the cleanliness of the single-crystal square rods upstream in the process must be guaranteed. Existing technology involves manually wiping the surface of the single-crystal square rods, which is costly and cannot guarantee the cleanliness of the surface. This application provides a single-crystal square rod cleaning device and method to solve the problem of high cost associated with manual wiping in existing technologies.

[0057] To enable those skilled in the art to better understand the present application, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present application, and not all embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present application.

[0058] Figure 1 This is a schematic diagram of a cleaning device for single-crystal square rods provided in this application. The cleaning device includes a first square rod cleaning zone 100, a first square rod wiping zone 200, a second square rod cleaning zone 300, a second square rod wiping zone 400, a third square rod cleaning zone 500, and a drying zone 600, arranged in sequence. The cleaning device also includes a conveying device 700. The conveying device 700 is used to sequentially convey the single-crystal square rods to the corresponding zones.

[0059] The two rectangles on the far left of the conveying device 700 represent uncleaned single-crystal square rods, and the two rectangles on the far right represent single-crystal square rods that have been cleaned using a cleaning device for single-crystal square rods.

[0060] Each section has at least one rotatable gripping device. Figure 1 Each section of the cleaning device for the single crystal square rod shown includes two rotatable gripping devices for gripping the single crystal square rod during cleaning, so that the single crystal square rod is suspended in the air.

[0061] The first cleaning zone for the single-crystal square rod includes a first cleaning device 110 and a rotatable gripping device 120. A first valve 111 is located on the first cleaning device 110. The first cleaning device 110 uses water released from the first valve 111 to clean impurities on the surface of the single-crystal square rod. The water released through the first valve has a preset first flow rate and a first cleaning pressure. In one possible implementation, the first valve 111 can be a solenoid valve, the first flow rate can be 35 L / min, and the first cleaning pressure can be 1 MPa.

[0062] The first square rod wiping area 200 includes a first wiping device 210 and a rotatable gripping device 220. The first wiping device 210 is used to wipe the surface of the single-crystal square rod while releasing water. The first wiping device 210 has a second valve 211 and a wiping material 212. The first wiping device 210 cleans the surface of the single-crystal square rod with water released through the second valve 211, and simultaneously wipes the surface of the single-crystal square rod with the wiping material 212. The water released through the second valve 211 has a preset second flow rate and a second cleaning pressure. In one possible implementation, the second valve 211 can be a solenoid valve, the preset second flow rate can be 20 L / min, the second cleaning pressure can be 0.5 MPa, and the wiping material 212 can be made of sponge material. The water released through the second valve 211 in the first square rod wiping area 200 is mainly used to rinse away the impurities wiped away by the wiping material 212, and the water released through the second valve 211 can also clean the wiping material 212.

[0063] The second square bar cleaning zone 300 includes a second cleaning device 310 and a rotatable gripping device 320. A third valve 311 is located on the second cleaning device 310. The water released by the second cleaning device 310 via the third valve 311 has a preset third flow rate and a third cleaning pressure. In one possible implementation, the third valve 311 can be a solenoid valve, the third flow rate can be 35 L / min, and the third cleaning pressure can be 1 MPa. The second cleaning device 310 is used to further clean impurities from the surface of the single-crystal square bar.

[0064] The second square rod wiping area 400 includes a second wiping device 410 and a rotatable gripping device 420. The second wiping device 410 has a fourth valve 411 and a wiping material 412. The second wiping device 410 releases anhydrous ethanol solution through the fourth valve 411 to clean the surface of the single crystal square rod. While cleaning the surface of the single crystal square rod with anhydrous ethanol solution, the second wiping device 410 wipes the surface of the single crystal square rod with the wiping material 412. In one possible implementation, the fourth valve 411 can be a solenoid valve, the flow rate of the anhydrous ethanol solution can be 20 mL / min, and the wiping material 412 can be made of sponge material.

[0065] The third-party rod cleaning zone 500 includes a third cleaning device 510 and a rotatable gripping device 520. A fifth valve 511 is located on the third cleaning device 510. The water released by the third cleaning device 510 using the fifth valve 511 has a preset fourth flow rate and a fourth cleaning pressure. In one possible implementation, the fifth valve 511 can be a solenoid valve, the fourth flow rate can be 35 L / min, and the fourth cleaning pressure can be 1 MPa. The third cleaning device 510 is mainly used to clean the surface of the single-crystal square rod with anhydrous ethanol solution.

[0066] The drying zone 600 includes a drying device 610 and a rotatable gripping device 620. The drying device 610 can blow air to dry the single-crystal square rod. In one possible implementation, the air pressure of the air blown by the drying device 610 is between 0.3 and 0.5 MPa, and the flow rate is 20 m³ / h.

[0067] The single-crystal square rod cleaning apparatus provided in this application implements different cleaning steps for the single-crystal square rod through different zones. After cleaning by the apparatus provided in this application, the surface of the single-crystal square rod is almost free of any kind of impurities. The apparatus provided in this application can automatically clean the single-crystal square rod; simply placing the single-crystal square rod on the conveyor device will automatically complete the cleaning process, resulting in low cleaning costs. In addition, the cleaning results of each single-crystal square rod using the apparatus provided in this application are almost consistent, leading to better product quality control. Besides rinsing the surface of the single-crystal square rod with water and wiping it with a wiping agent, the apparatus also uses anhydrous ethanol solution to clean the single-crystal square rod. The anhydrous ethanol solution effectively cleans the grease on the surface of the single-crystal square rod, resulting in a better cleaning effect.

[0068] It is understood that the method provided in this application can be applied to the device provided in this application, which includes a conveying device and a first square bar cleaning zone, a first square bar wiping zone, a second square bar cleaning zone, a second square bar wiping zone, a third square bar cleaning zone, and a drying zone arranged in sequence.

[0069] Figure 2 A flowchart of a cleaning method for a single-crystal square rod provided in this application is included, the method comprising the following steps:

[0070] S201: The single crystal rods are sequentially conveyed to the first rod cleaning zone, the first rod wiping zone, the second rod cleaning zone, the second rod wiping zone, the third rod cleaning zone, and the drying zone via a conveying device.

[0071] After the cleaning device for the single crystal square rod is turned on, the conveying device will sequentially convey the single crystal square rod to the first square rod cleaning area, the first square rod wiping area, the second square rod cleaning area, the second square rod wiping area, the third square rod cleaning area, and the drying area.

[0072] S202: When the single crystal square rod is conveyed to the first square rod cleaning zone, the first square rod cleaning zone uses the first cleaning device to clean the impurities on the surface of the single crystal square rod.

[0073] After the cleaning device for the single-crystal square rod is activated, the conveying device will first transport the single-crystal square rod to the first square rod cleaning zone. When the single-crystal square rod is transported to the first square rod cleaning zone, the rotatable gripping device in the first square rod cleaning zone can grip the single-crystal square rod and hold it at a preset height above the conveying device. In one possible implementation, the preset height can be 350mm.

[0074] After the rotatable gripping device in the first square bar cleaning section grips the single-crystal square bar, the cleaning device opens a first valve, releasing water with a preset first flow rate and first cleaning pressure. In one possible implementation, the first flow rate can be 35 L / min, and the first cleaning pressure can be 1 MPa. The cleaning device controls the rotatable gripping device to rotate while releasing water. The water released through the first valve and the rotatable gripping device clean impurities from the surface of the single-crystal square bar. After a preset time, the rotatable gripping device in the first square bar cleaning section places the single-crystal square bar onto the conveying device.

[0075] S203: When the single crystal square rod is conveyed to the first square rod wiping area, the first square rod wiping area uses the first wiping device to wipe the surface of the single crystal square rod while releasing water.

[0076] The conveying device transports the single-crystal square rod from the first square rod cleaning area to the first square rod wiping area. When the single-crystal square rod is transported to the first square rod wiping area, a rotatable gripping device in the first square rod wiping area can grip the single-crystal square rod and hold it at a preset height above the conveying device. In one possible implementation, the preset height can be 350mm.

[0077] After the rotatable gripping device in the first square rod wiping area grips the single-crystal square rod, the cleaning device for the single-crystal square rod opens the second valve, releasing water with a preset second flow rate and second cleaning pressure. In one possible implementation, the second flow rate can be 20 L / min, and the second cleaning pressure can be 0.5 MPa. While releasing water, the cleaning device for the single-crystal square rod controls the rotatable gripping device to rotate multiple times, with each rotation spaced at a preset interval. In one possible implementation, the rotatable gripping device rotates 90° each time. During the rotation intervals, the single-crystal square rod is wiped with a wiping material, and the cleaning device for the single-crystal square rod opens the second valve during these intervals, releasing water with a preset second flow rate and second cleaning pressure. The water released from the second valve washes away the impurities wiped off by the wiping material, while simultaneously keeping the wiping material clean.

[0078] After a preset time, the rotatable gripping device corresponding to the first square bar wiping area places the single crystal square bar onto the conveying device.

[0079] S204: When the single crystal square rod is conveyed to the second square rod cleaning zone, the second square rod cleaning zone uses a second cleaning device to further clean the impurities on the surface of the single crystal square rod.

[0080] The conveying device transfers the single-crystal square rod from the first square rod wiping area to the second square rod cleaning area. When the single-crystal square rod is transferred to the second square rod cleaning area, a rotatable gripping device in the second square rod cleaning area can grip the single-crystal square rod and hold it at a preset height above the conveying device. In one possible implementation, the preset height can be 350mm.

[0081] After the rotatable gripping device in the second square rod cleaning zone grips the single-crystal square rod, the cleaning device opens a third valve, releasing water with a preset third flow rate and third cleaning pressure. In one possible implementation, the third flow rate can be 35 L / min, and the third cleaning pressure can be 1 MPa. The cleaning device controls the rotatable gripping device to rotate while releasing water. The water released through the third valve and the rotatable gripping device further clean impurities from the surface of the single-crystal square rod. After a preset time, the rotatable gripping device in the second square rod cleaning zone places the single-crystal square rod onto the conveying device.

[0082] In the method provided in this application, the single crystal square rod is cleaned through the above steps. After cleaning is completed using the second square rod cleaning zone, about 98% of the impurities on the surface of the single crystal square rod are removed.

[0083] S205: When the single crystal square rod is conveyed to the second square rod wiping area, the second square rod wiping area uses the second wiping device to wipe the surface of the single crystal square rod while releasing anhydrous ethanol solution.

[0084] The conveying device transports the single-crystal square rod from the second square rod cleaning area to the second square rod wiping area. When the single-crystal square rod is transported to the second square rod wiping area, a rotatable gripping device in the second square rod wiping area can grip the single-crystal square rod and hold it at a preset height above the conveying device. In one possible implementation, the preset height can be 350mm.

[0085] The rotatable gripping device in the second square rod wiping area can grip the single-crystal square rod, after which the cleaning device for the single-crystal square rod opens the fourth valve, releasing anhydrous ethanol solution through the fourth valve. Simultaneously with releasing the anhydrous ethanol solution, the cleaning device for the single-crystal square rod controls the rotatable gripping device to rotate multiple times, with each rotation spaced at a preset interval. In one possible implementation, the rotatable gripping device rotates 90° each time, wiping the single-crystal square rod with a wiping agent during the rotation interval. During the interval, the cleaning device for the single-crystal square rod opens the fourth valve, releasing anhydrous ethanol solution through the fourth valve. The surface of the single-crystal square rod is cleaned using the anhydrous ethanol solution released from the fourth valve and the wiping agent. In one possible implementation, the flow rate of the anhydrous ethanol solution is 20 mL / min.

[0086] After a preset time, the rotatable gripping device corresponding to the second bar cleaning zone places the single crystal bar onto the conveying device.

[0087] In the method provided in this application, the anhydrous ethanol solution used in the second square rod wiping area is mainly for cleaning the grease on the surface of the single crystal square rod. The grease on the surface of the single crystal square rod can be removed by the combination of the anhydrous ethanol solution and the wiping material.

[0088] S206: When the single crystal square rod is conveyed to the third-party rod cleaning zone, the third-party rod cleaning zone uses a third cleaning device to clean the surface of the single crystal square rod with anhydrous ethanol solution.

[0089] The conveying device transfers the single-crystal square rod from the second rod wiping area to the third rod cleaning area. When the single-crystal square rod is transferred to the third rod cleaning area, a rotatable gripping device in the third rod cleaning area grips the single-crystal square rod and holds it at a preset height from the conveying device. In one possible implementation, the preset height can be 350mm.

[0090] The rotatable gripping device in the third-party rod cleaning zone grips the single-crystal square rod. The cleaning device then opens a fifth valve, releasing water with a preset fourth flow rate and fourth cleaning pressure. In one possible implementation, the fourth flow rate could be 35 L / min, and the fourth cleaning pressure could be 1 MPa. Simultaneously, the cleaning device controls the rotatable gripping device to rotate. The water released through the fifth valve and the rotatable gripping device clean the anhydrous ethanol solution from the surface of the single-crystal square rod. After a preset time, the rotatable gripping device in the third-party rod cleaning zone places the single-crystal square rod onto the conveyor.

[0091] S207: When the single crystal square rod is conveyed to the drying zone, the drying zone uses a drying device to dry the water on the surface of the single crystal square rod.

[0092] The conveying device transports the single-crystal square rod from the third-party rod cleaning zone to the drying zone. When the single-crystal square rod is transported to the drying zone, a rotatable gripping device in the drying zone can grip the single-crystal square rod and hold it at a preset height above the conveying device. In one possible implementation, the preset height can be 350mm.

[0093] The air pressure of the air blown out by the drying device in the drying zone can be between 0.3-0.5 MPa, and the flow rate is 20 m³ / h. A rotatable gripping device rotates simultaneously with the air blowing from the drying device. After a preset time, the rotatable gripping device in the corresponding drying zone places the single-crystal square rod onto the conveying device.

[0094] The method provided in this application uses a conveying device to sequentially transport single-crystal square rods to corresponding sections, where different cleaning steps are performed. The single-crystal square rods undergo coarse cleaning in the first cleaning section, followed by wiping impurities from the surface in the first wiping section. The second cleaning section further cleans the surface of the single-crystal square rods, removing approximately 98% of impurities after the second cleaning section. Anhydrous ethanol solution is released in the second wiping section to clean grease from the surface of the single-crystal square rods. The third cleaning section removes the remaining anhydrous ethanol solution from the surface of the single-crystal square rods. Finally, the rods are dried in a drying section, completing the cleaning process. The method provided in this application only requires placing the single-crystal square rods on the conveying device to complete the cleaning, resulting in low cleaning costs and good cleaning effects.

[0095] It should be noted that the various embodiments in this specification are described in a progressive manner, and the same or similar parts between the various embodiments can be referred to mutually. Each embodiment focuses on describing the differences from other embodiments. In particular, for the device embodiments, since they are basically similar to the method embodiments, the description is relatively simple, and the relevant parts can be referred to the description of the method embodiments. The device embodiments described above are merely illustrative, and the units described as separate components may or may not be physically separate. The components indicated as units may or may not be physical units, that is, they may be located in one place or distributed across multiple network units. Some or all of the modules can be selected to achieve the purpose of this embodiment solution according to actual needs. Those skilled in the art can understand and implement this without creative effort.

[0096] The above description is merely one specific embodiment of this application, but the scope of protection of this application is not limited thereto. Any variations or substitutions that can be easily conceived by those skilled in the art within the technical scope disclosed in this application should be included within the scope of protection of this application. Therefore, the scope of protection of this application should be determined by the scope of the claims.

Claims

1. A cleaning device for single-crystal square rods, characterized in that, include: The system includes a conveying device and a first square bar cleaning zone, a first square bar wiping zone, a second square bar cleaning zone, a second square bar wiping zone, a third square bar cleaning zone, and a drying zone arranged in sequence. The conveying device is used to convey the single crystal square bars to the corresponding zones in sequence. Each section has at least one rotatable gripping device for gripping a single-crystal square rod, thereby suspending the single-crystal square rod in the air. The first square bar cleaning zone includes a first cleaning device, which is used to clean impurities on the surface of the single crystal square bar; The first square bar wiping area includes a first wiping device, which is used to wipe the surface of the single crystal square bar while releasing water; The second square bar cleaning zone includes a second cleaning device, which is used to further clean impurities on the surface of the single crystal square bar; The second square rod wiping area includes a second wiping device, which is used to wipe the surface of the single crystal square rod while releasing anhydrous ethanol solution; The third-party rod cleaning zone includes a third cleaning device, which is used to clean the surface of the single crystal square rod with an anhydrous ethanol solution. The air-drying area includes an air-drying device, which is used to dry the water on the surface of the single crystal square rod. The first wiping device includes a second valve and a wiping material: The first wiping device cleans the surface of the single crystal square rod with water released through the second valve. While cleaning the surface of the single crystal square rod, the first wiping device wipes the surface of the single crystal square rod with the wiping material. The water released through the second valve has a preset second flow rate and a second cleaning pressure.

2. The apparatus according to claim 1, characterized in that, The first cleaning device includes a first valve: The first cleaning device uses water released from the first valve to clean impurities on the surface of the single crystal square rod. The water released through the first valve has a preset first flow rate and a first cleaning pressure. The second cleaning device includes a third valve: The second cleaning device uses the water released by the third valve to clean the impurities on the surface of the single crystal square rod. The water released through the third valve has a preset third flow rate and a third cleaning pressure. The third cleaning device includes a fifth valve: The third cleaning device uses the water released by the fifth valve to clean the impurities on the surface of the single crystal square rod. The water released through the fifth valve has a preset fourth flow rate and a fourth cleaning pressure.

3. The apparatus according to claim 1, characterized in that, The second wiping device includes a fourth valve and a wiping material: The second wiping device cleans the surface of the single crystal square rod through the anhydrous ethanol solution released by the fourth valve. While cleaning the surface of the single crystal square rod, the second wiping device wipes the surface of the single crystal square rod with the wiping material.

4. The apparatus according to claim 1, characterized in that, The conveying device is a roller conveyor. The roller conveyor is used to place the single crystal square rod, and the roller conveyor sequentially conveys the single crystal square rod to different sections of the cleaning device for the single crystal square rod.

5. A cleaning method for a single-crystal square rod, characterized in that, include: The single-crystal square rods are sequentially conveyed to the first square rod cleaning area, the first square rod wiping area, the second square rod cleaning area, the second square rod wiping area, the third square rod cleaning area, and the drying area via a conveying device. When the single crystal square rod is conveyed to the first square rod cleaning zone, the first square rod cleaning zone uses a first cleaning device to clean the impurities on the surface of the single crystal square rod. When the single-crystal square rod is conveyed to the first square rod wiping area, the first square rod wiping area uses the first wiping device to wipe the surface of the single-crystal square rod while releasing water. When the single crystal square rod is conveyed to the second square rod cleaning zone, the second square rod cleaning zone uses a second cleaning device to further clean the impurities on the surface of the single crystal square rod. When the single-crystal square rod is conveyed to the second square rod wiping area, the second square rod wiping area uses the second wiping device to wipe the surface of the single-crystal square rod while releasing anhydrous ethanol solution; When the single crystal square rod is conveyed to the third third rod cleaning zone, the third third rod cleaning zone uses a third cleaning device to clean the surface of the single crystal square rod with an anhydrous ethanol solution. When the single crystal square rod is conveyed to the drying zone, the drying zone uses a drying device to dry the water on the surface of the single crystal square rod. The first square rod wiping area utilizes a first wiping device to wipe the surface of the single-crystal square rod while releasing water, including: Open the second valve to release water with a preset second flow rate and second cleaning pressure. The single-crystal square rod is rotated multiple times by a preset angle using a rotatable gripping device, with the time interval between two adjacent rotations of the single-crystal square rod being the same. The surface of the single-crystal square rod is wiped with a wiping agent during the time intervals of rotating the single-crystal square rod.

6. The method according to claim 5, characterized in that, The method further includes: When the single crystal rod is conveyed to different sections, the single crystal rod is held at a position at a preset height from the conveying device by using the rotatable gripping device corresponding to the section. After a preset time interval, the rotatable gripping device corresponding to the interval places the single crystal rod onto the conveying device.

7. The method according to claim 5, characterized in that, The first square bar cleaning zone uses a first cleaning device to clean impurities on the surface of the single crystal square bar, including: Open the first valve, and water with a preset first flow rate and first cleaning pressure is released through the first valve; The single-crystal square rod is rotated using the rotatable gripping device; The water released through the first valve and the rotatable gripping device clean the impurities on the surface of the single-crystal square rod.

8. The method according to claim 5, characterized in that, The second square rod wiping area utilizes a second wiping device to wipe the surface of the single crystal square rod while releasing anhydrous ethanol solution, including: Open the fourth valve to release the anhydrous ethanol solution. The single-crystal square rod is rotated multiple times by a preset angle using the rotatable gripping device, with the time interval between two adjacent rotations of the single-crystal square rod being the same. The surface of the single-crystal square rod is wiped with a wiping agent during the time intervals of rotating the single-crystal square rod.

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