A liquid crystal glass substrate cleaning system

Abstract

The application discloses a liquid crystal glass substrate cleaning system, which comprises a cleaning table, support plates are welded and fixed on both sides of the surface of the cleaning table, one end of the support plate away from the cleaning table is screw-connected and fixed with a support frame, lifting plates are movably installed between the two groups of support plates, end portions of the lifting plates are welded and fixed with limiting plates, the outer side of the limiting plate is welded with a driving seat, a cylinder is installed at the bottom of the driving seat, a piston rod of the cylinder is screw-connected and fixed with the bottom of the driving seat, the cylinder is screw-connected and fixed on a fixed seat, and the fixed seat is screw-connected and fixed on the side wall of the cleaning table. Compared with the traditional flow line type cleaning system, the liquid crystal glass substrate cleaning system has smaller occupied volume, simple structure, and lower cost, and is suitable for small and medium-sized enterprises to purchase and use.

Description

Technical Field

[0001] This invention relates to the field of glass substrate processing, specifically to a liquid crystal glass substrate cleaning system. Background Technology

[0002] After being scribing, broken, and chamfered, the glass substrates enter the cleaning machine section. Physical and chemical methods are used to clean the surface of the glass substrates, removing grinding debris and other foreign matter. After drying with an air knife, the glass substrates are aligned, positioned, and conveyed to the inspection section. Glass substrates are mainly used in display terminals such as mobile phones and computers, and are a key raw material for LCD panels. Coating is a critical step in the panel manufacturing process; excessive particle counts can cause defects such as film breakage and bright spots during coating, resulting in a large number of scrap products. Two-fluid cleaning is one of the cleaning methods used in the cleaning process. It utilizes the physical force of two fluids (water and air) to remove foreign matter from the upper and lower surfaces of the glass. Different air-to-water ratios are set according to the size of the cleaning particles. Currently, existing technologies generally use horizontal cleaning, which has drawbacks such as difficulty in draining cleaning water and poor cleaning effect.

[0003] To address the aforementioned issues, a search revealed a prior art disclosure (application number: CN201911160013.4) of a liquid crystal glass substrate cleaning system. The document states that "it includes a glass substrate conveying unit that runs through the entire production line, and two-fluid cleaning units located on the upper and lower sides of the glass substrate conveying unit. The glass conveying unit, also known as the glass substrate transfer device, employs transfer rollers. The two-fluid cleaning unit includes an upper two-fluid cleaning nozzle and a lower two-fluid cleaning nozzle located above and below the conveying device and corresponding to each other." However, this equipment has the following problems in actual use:

[0004] First: When glass substrates are cleaned using this equipment, the equipment is set up horizontally, which occupies a lot of workshop space and is inconvenient to move and adjust the position.

[0005] Second: When cleaning glass substrates, the use of pre-wetting units, roller brush units, disc brush units, spray units, air knife units, etc., directly increases the manufacturing cost and selling price of the equipment, making it unaffordable for small and medium-sized enterprises, and also preventing them from performing sufficient cleaning work on the glass substrates.

[0006] Third: Using roller brushes or disc brushes to clean glass can cause scratches or abrasions to the surface of the glass substrate. Summary of the Invention

[0007] The purpose of this invention is to provide a liquid crystal glass substrate cleaning system to solve the defects mentioned in the background art.

[0008] To achieve the above objectives, a liquid crystal glass substrate cleaning system is provided, including a cleaning table. Support plates are welded and fixed on both sides of the surface of the cleaning table, and the end of the support plate away from the cleaning table is screwed and fixed to a support frame. At the same time, a lifting plate is movably installed between the two sets of support plates, and a limiting plate is welded and fixed to the end of the lifting plate. The outer side of the limiting plate is welded to a drive seat, and a cylinder is installed at the bottom of the drive seat. The piston rod of the cylinder is screwed and fixed to the bottom of the drive seat, and the cylinder is screwed and fixed to a fixed seat. The fixed seat is screwed and fixed to the side wall of the cleaning table.

[0009] The bottom of the lifting plate is screwed to a mounting bracket, and the bottom sides of the mounting bracket are welded to the front and back of the positioning bracket, respectively. Two sets of glass substrate bodies are covered on the positioning bracket. The mounting bracket is a "U"-shaped structure made of metal. The positioning bracket includes a frame, and a vertical frame is welded to the center of the frame. The bottom of the glass substrate body is supported by the frame, and the top of the glass substrate body is supported by the vertical frame. The vertical frame and the frame are vertically connected. Pressurization spaces are opened on both sides of the frame. Multiple sets of air jet holes are evenly opened on the surface of the pressurization spaces. Branch hoses are sealed on the outside of the pressurization spaces. The ends of the branch hoses are connected to high-temperature gas hoses, and the inlet pipes of the high-temperature gas hoses are connected to high-temperature steam tanks.

[0010] Preferably, the cylinders are configured as two sets, which are fixed on both sides of the cleaning table respectively, and the lifting plate is driven by the two sets of synchronously working cylinders. At the same time, the lifting plate and the support frame are arranged in parallel.

[0011] Preferably, two sets of guide rods are fixedly installed between the support frame and the cleaning table, with the top of the guide rods fixed to the bottom of the support frame and the bottom of the guide rods fixed to the top of the isolation wall of the cleaning table.

[0012] Preferably, four sets of isolation walls are evenly fixed inside the cleaning platform, and the inside of the cleaning platform is divided into five sets of cleaning tanks by the four sets of isolation walls. At the same time, a positioning frame is set inside each of the five sets of cleaning tanks, and an ultrasonic generator is installed on the lower inside of each of the five sets of cleaning tanks.

[0013] Preferably, a limiting groove is provided on the inner side wall of the support plate, and an adjustment port is provided on the outer side wall of the support plate. The adjustment port is connected to the limiting groove, and the size of the limiting groove is adapted to that of the limiting plate. The limiting plate is slidably disposed inside the limiting groove, and the cross-sections of the limiting groove and the limiting plate are both dovetail-shaped. The right end of the drive seat is slidably disposed inside the adjustment port.

[0014] Preferably, the guide rod is inserted into the guide hole opened on the lifting plate, and both the guide rod and the guide hole are set in two sets. At the same time, the setting of the guide rod and the guide hole limits and guides the lifting plate during lifting.

[0015] Preferably, drain outlets are provided on the bottom of the outer side of each of the five sets of cleaning tanks, and a sewage pipe is fixedly installed inside the drain outlet. At the same time, the end of the sewage pipe is connected to the collection pipe, and the collection pipe is inclined downward. The end of the collection pipe is connected to the external sewage pipe with a valve.

[0016] Preferably, the frame and the vertical frame are combined to form a "T" shape, and support openings are provided on both sides of the frame, and the support openings are strip-shaped. At the same time, support surfaces are provided on both sides of the top of the vertical frame.

[0017] Preferably, the top right side of the glass substrate body covers the support surface, and the bottom of the glass substrate body is inserted into the support opening, while the included angle between the glass substrate body and the frame is 60°.

[0018] Preferably, the glass substrate body, the frame, and the vertical frame are combined to form a right triangle, and high-temperature gas is ejected upward from the jet hole to heat and dry the glass substrate body. The diameter of the jet hole is less than 0.275 nm.

[0019] Compared with the prior art, the beneficial effects of the present invention are:

[0020] The shock waves generated by the bursting of tiny bubbles in a liquid by ultrasonic waves can effectively remove dirt, grease, and particles adhering to the glass surface. This cleaning method can quickly and thoroughly clean the glass substrate, greatly improving cleaning efficiency. It can replace the traditional method of cleaning the glass substrate body using brush rollers, without scratching or abrading the outer wall of the glass substrate body. Ultrasonic cleaning can introduce tiny bubbles and eddies in the cleaning fluid into the tiny pores and crevices on the glass surface, achieving deep cleaning of dirt.

[0021] Compared to traditional assembly line cleaning systems, this cleaning system occupies less space and has a simpler structure. The lifting platform is driven by two sets of cylinders, making it more affordable and suitable for small and medium-sized enterprises. Attached Figure Description

[0022] Figure 1 This is a front view schematic diagram of the structure of the present invention.

[0023] Figure 2 The structure of this invention Figure 1 Top view.

[0024] Figure 3 The structure of this invention Figure 1 A partial structural diagram on the left.

[0025] Figure 4 The structure of this invention Figure 2 A partial structural diagram on the left.

[0026] Figure 5 This is a schematic diagram of the positioning frame of the present invention detaching from the inside of the cleaning tank.

[0027] Figure 6 This is a schematic diagram of the structural positioning frame of the present invention.

[0028] Figure 7 This is a top view of the structural frame of the present invention.

[0029] The following are the labeling elements in the diagram: 1. Support frame; 2. Support plate; 3. Limiting groove; 4. Adjustment port; 5. Drive seat; 6. Cylinder; 7. Fixed seat; 8. Cleaning table; 81. Isolation wall; 9. Ultrasonic generator; 10. Cleaning tank; 11. Limiting plate; 12. Lifting plate; 13. Mounting frame; 14. Glass substrate body; 15. Positioning frame; 151. Carrier frame; 152. Vertical frame; 153. Support surface; 154. Support port; 155. Pressurization space; 156. Jet nozzle; 16. Guide rod; 17. High-temperature gas hose; 18. Branch hose; 19. Drain pipe; 20. Collection pipe. Detailed Implementation

[0030] Detailed implementation method one: Please refer to Figure 1-7 The present invention provides a technical solution: a liquid crystal glass substrate cleaning system, including a cleaning table 8, with support plates 2 welded and fixed on both sides of the surface of the cleaning table 8, and the end of the support plate 2 away from the cleaning table 8 screwed and fixed to the support frame 1. At the same time, a lifting plate 12 is movably installed between the two sets of support plates 2, and a limiting plate 11 is welded and fixed to the end of the lifting plate 12. The outer side of the limiting plate 11 is welded to the drive seat 5, and a cylinder 6 is installed at the bottom of the drive seat 5. At the same time, the piston rod of the cylinder 6 is screwed and fixed to the bottom of the drive seat 5, and the cylinder 6 is screwed and fixed to the fixed seat 7. The fixed seat 7 is screwed and fixed to the side wall of the cleaning table 8.

[0031] The bottom of the lifting plate 12 is screwed to the mounting bracket 13, and the bottom sides of the mounting bracket 13 are welded to the front and back surfaces of the positioning bracket 15 respectively. At the same time, the positioning bracket 15 covers two sets of glass substrate bodies 14, and the mounting bracket 13 is a "U" shaped structure made of metal. The positioning bracket 15 includes a frame 151, and a vertical frame 152 is welded to the middle of the surface of the frame 151. The bottom of the glass substrate body 14 is supported by the frame 151, and the top of the glass substrate body 14 is supported by the vertical frame 152. The vertical frame 152 and the frame 151 are vertically arranged. The inner sides of the frame 151 are opened with pressurization spaces 155. The surface of the pressurization spaces 155 is evenly opened with multiple sets of air jet holes 156. The outer side of the pressurization spaces 155 is sealed with a branch hose 18. The end of the branch hose 18 is connected to the high temperature gas hose 17, and the inlet pipe of the end of the high temperature gas hose 17 is connected to the high temperature steam tank.

[0032] Working principle: When in use, the lifting plate 12 moves downward through the setting of two sets of cylinders 6, and the positioning frame 15 moves downward through the mounting frame 13, so that the five glass substrate bodies 14 are submerged in the cleaning liquid inside the cleaning tank 10. An ultrasonic generator 9 is installed on the lower side inside the cleaning tank 10, and the ultrasonic generator 9 vibrates the liquid inside the cleaning tank 10.

[0033] The shock waves generated by the bursting of tiny bubbles in a liquid by ultrasound can effectively remove dirt, grease, and particles adhering to the glass surface; this cleaning method can quickly and thoroughly clean glass substrates, greatly improving cleaning efficiency.

[0034] Specific Implementation Method 2: This implementation method is a further limitation of Specific Implementation Method 1. The cylinders 6 are set in two groups and fixed on both sides of the cleaning table 8 respectively. The lifting plate 12 is driven by the two groups of cylinders 6 working synchronously. At the same time, the lifting plate 12 and the support frame 1 are arranged in parallel.

[0035] like Figure 1 As shown: The lifting plate 12 is driven to lift by two sets of synchronously working cylinders 6, so that the lifting plate 12 will not tilt when lifting. The synchronous operation of the two sets of cylinders 6 is the prior art.

[0036] Specific Implementation Method 3: This implementation method is a further limitation of Specific Implementation Method 1. Two sets of guide rods 16 are fixedly installed between the support frame 1 and the cleaning table 8, and the top of the guide rods 16 is fixedly connected to the bottom of the support frame 1, while the bottom of the guide rods 16 is fixed to the top of the isolation wall 81 of the cleaning table 8.

[0037] like Figure 1 As shown: The bottom of the guide rod 16 is fixed to the top of the isolation wall 81 of the cleaning table 8. The guide rod 16 can limit and guide the lifting plate 12 during lifting and lowering, so as to prevent the lifting plate 12 from tilting during lifting and lowering. At the same time, it can enable the positioning frame 15 to drive the glass substrate body 14 to perform vertical lifting and lowering work inside the cleaning tank 10.

[0038] Specific Implementation Method 4: This implementation method is a further limitation of Specific Implementation Method 1. Four sets of isolation walls 81 are evenly fixed inside the cleaning table 8, and the inside of the cleaning table 8 is separated by the four sets of isolation walls 81 to form five sets of cleaning tanks 10. At the same time, a positioning frame 15 is provided inside each of the five sets of cleaning tanks 10, and an ultrasonic generator 9 is installed on the lower side of the inside of each of the five sets of cleaning tanks 10.

[0039] like Figure 1 As shown: Ultrasonic generators 9 are installed on the lower side of the interior of each of the five sets of cleaning tanks 10; the ultrasonic generators 9 generate ultrasonic waves to clean the glass substrate body 14 through the liquid.

[0040] It can replace the traditional method of cleaning the glass substrate body 14 with a brush roller, and will not cause wear to the outer surface of the glass substrate body 14.

[0041] Ultrasonic cleaning does not scratch or abrade the glass substrate surface; compared to traditional brushing methods, ultrasonic cleaning can treat the glass surface more gently and avoid physical contact that may cause damage.

[0042] Specific Implementation Method 5: This implementation method is a further limitation of Specific Implementation Method 1. A limiting groove 3 is provided on the inner side wall of the support plate 2, and an adjustment port 4 is provided on the outer side wall of the support plate 2. The adjustment port 4 is connected to the limiting groove 3, and the size of the limiting groove 3 is adapted to that of the limiting plate 11. The limiting plate 11 is slidably disposed inside the limiting groove 3, and the cross-sections of the limiting groove 3 and the limiting plate 11 are both dovetail-shaped. The right end of the drive seat 5 is slidably disposed inside the adjustment port 4.

[0043] Compared to traditional assembly line cleaning systems, this cleaning system occupies less space and has a simpler structure. The lifting plate 12 is driven to lift by two sets of cylinders 6, making it more affordable and suitable for small and medium-sized enterprises.

[0044] Specific Implementation Method Six: This implementation method is a further limitation of Specific Implementation Method Three. The guide rod 16 is inserted into the guide hole opened on the lifting plate 12, and both the guide rod 16 and the guide hole are set in two sets. At the same time, the setting of the guide rod 16 and the guide hole limits and guides the lifting plate 12 during lifting.

[0045] The ultrasonic generator 9 generates ultrasonic waves to clean the glass substrate body 14 through the liquid. Ultrasonic cleaning can introduce tiny bubbles and eddies in the cleaning liquid into the tiny pores and gaps on the glass surface to clean deep dirt. This ability allows ultrasonic cleaning to effectively remove fine particles, oxides and other difficult-to-remove dirt from the glass substrate.

[0046] Specific Implementation Method Seven: This implementation method is a further limitation of Specific Implementation Method Four. Drainage outlets are opened on the bottom of the outer side of each of the five sets of cleaning tanks 10, and a sewage pipe 19 is fixedly installed inside the drain outlet. At the same time, the end of the sewage pipe 19 is connected to the collection pipe 20, and the collection pipe 20 is inclined downward. The end of the collection pipe 20 is connected to the external sewage pipe with a valve.

[0047] like Figure 1-2 As shown: When the cleaning tank 10 is finished, the valve on the sewage pipe is opened, and the sewage inside the five sets of cleaning tanks 10 can be discharged through the collection pipe 20. The cleaning tank 10 can simultaneously clean the two sets of glass substrate bodies 14.

[0048] The five cleaning tanks 10 can clean ten glass substrate bodies 14 at a time, improving the cleaning efficiency of the system for glass substrates.

[0049] Specific Implementation Method Eight: This implementation method is a further limitation of Specific Implementation Method One. The frame 151 and the vertical frame 152 are combined to form a "T" shape. Support openings 154 are provided on both sides of the frame 151. The support openings 154 are strip-shaped. At the same time, support surfaces 153 are provided on both sides of the top of the vertical frame 152.

[0050] like Figure 1-6 As shown: The frame 151 and the vertical frame 152 are provided to support the two sets of glass substrate bodies 14. The glass substrate bodies 14 are tilted and submerged in water. The outer wall of the tilted glass substrate bodies 14 is cleaned by the ultrasonically vibrating water.

[0051] Specific Embodiment Nine: This embodiment is a further limitation of Specific Embodiment Eight. The top right side of the glass substrate body 14 covers the support surface 153, and the bottom of the glass substrate body 14 is inserted into the support opening 154. At the same time, the included angle between the glass substrate body 14 and the frame 151 is 60°.

[0052] like Figure 1-6 As shown: When the glass substrate body 14 is cleaned, the glass substrate body 14 and the positioning frame 15 are separated from the inside of the cleaning tank 10 by two sets of cylinders 6.

[0053] At this time, high-temperature steam enters the interior of the five pressurized spaces 155 through the high-temperature gas hose 17 and the five branch hoses 18 respectively, and is ejected from the jet hole 156. The high-temperature steam is sprayed onto the bottom surface of the glass substrate body 14 to heat and dry the glass substrate body 14.

[0054] Specific Implementation Method 10: This implementation method is a further limitation of Specific Implementation Method 9. The glass substrate body 14, the frame 151 and the vertical frame 152 are combined to form a right triangle, and high-temperature gas is sprayed upward from the jet hole 156 to heat and dry the glass substrate body 14. The diameter of the jet hole 156 is less than 0.275nm.

[0055] like Figure 1-6 As shown: the molecular size of water molecules is about 0.275 nanometers, and the diameter of the jet hole 156 is less than 0.275 nanometers, so water cannot pass through. Therefore, when the positioning frame 15 is submerged inside the cleaning tank 10, the water will not enter the interior of the pressurization space 155 through the jet hole 156.

Claims

1. A liquid crystal glass substrate cleaning system comprising a cleaning station (8), characterized in that: The surface of the cleaning table (8) is welded with support plates (2), and the end of the support plates (2) away from the cleaning table (8) is screwed with the support frame (1), while the two groups of support plates (2) are movably installed with lifting plates (12), and the end of the lifting plate (12) is welded with limiting plates (11), the outer side of the limiting plate (11) is welded with the driving seat (5), and the bottom of the driving seat (5) is installed with a cylinder (6), while the piston rod of the cylinder (6) is screwed with the bottom of the driving seat (5), and the cylinder (6) is screwed with the fixed seat (7), and the fixed seat (7) is screwed with the side wall of the cleaning table (8); The bottom of the lifting plate (12) is screwed with mounting frames (13), and the bottom of the mounting frame (13) is welded on the front and back of the positioning frame (15), while the positioning frame (15) covers two groups of glass substrate bodies (14), and the mounting frame (13) is made of metal material and has a "U" shape structure, the positioning frame (15) includes a carrier frame (151), and a vertical frame (152) is welded on the surface of the carrier frame (151), while the glass substrate body (14) is supported by the carrier frame (151), and the glass substrate body (14) is supported by the vertical frame (152), the vertical frame (152) and the carrier frame (151) are perpendicular, and the inside of the carrier frame (151) is provided with a booster space (155), while the surface of the booster space (155) is uniformly provided with a plurality of jet holes (156), and the outside of the booster space (155) is sealed with branch hoses (18), the end of the branch hose (18) is communicated with the high-temperature gas hose (17), and the end of the high-temperature gas hose (17) is communicated with the high-temperature steam tank.

2. The system for cleaning liquid crystal glass substrates according to claim 1, wherein: The cylinder (6) is provided as two groups fixed on the two sides of the cleaning table (8), and the lifting plate (12) is driven by the two groups of synchronously working cylinders (6), while the lifting plate (12) and the support frame (1) are arranged in parallel.

3. The system of claim 1, wherein: The support frame (1) and the cleaning table (8) are fixedly installed with two groups of guide rods (16), and the top of the guide rod (16) is fixedly connected with the bottom of the support frame (1), while the bottom of the guide rod (16) is fixed with the top of the partition wall (81) of the cleaning table (8).

4. The system for cleaning liquid crystal glass substrates of claim 1, wherein: The inside of the cleaning table (8) is uniformly fixed with four groups of partition walls (81), and the inside of the cleaning table (8) is isolated by the four groups of partition walls (81) to form five groups of cleaning tanks (10), while the inside of the five groups of cleaning tanks (10) is provided with positioning frames (15), and the inside of the five groups of cleaning tanks (10) is installed with ultrasonic generators (9).

5. The system for cleaning liquid crystal glass substrates of claim 1, wherein: The inner side wall of the support plate (2) is provided with a limiting groove (3), and the outer side wall of the support plate (2) is provided with an adjusting opening (4), which is in communication with the limiting groove (3), and the limiting groove (3) is matched with the size of the limiting plate (11), the limiting plate (11) is slidingly arranged in the limiting groove (3), and the limiting groove (3) and the limiting plate (11) are both provided in dovetail shape, and the right end of the driving seat (5) is slidingly arranged in the adjusting opening (4).

6. The system of claim 3, wherein: The guide rod (16) is inserted into the guide hole of the lifting plate (12), and the guide rod (16) and the guide hole are provided in two groups, and the guide rod (16) and the guide hole are provided for limiting and guiding the lifting plate (12) during lifting.

7. The system of claim 4, wherein: The outer bottom of the five groups of cleaning tanks (10) is provided with a drain opening, and the drain opening is fixedly installed with a drain pipe (19), and the drain pipe (19) is in communication with the collecting pipe (20), and the collecting pipe (20) is inclined downward, and the collecting pipe (20) is in communication with the outside valve-equipped sewage pipe.

8. The system of claim 1, wherein: The carrier frame (151) and the vertical frame (152) are combined to form a "T" shape, and the two side surfaces of the carrier frame (151) are provided with support openings (154), and the support openings (154) are strip-shaped, and the top of the vertical frame (152) is provided with support surfaces (153) on both sides.

9. The system of claim 8, wherein: The top right side of the glass substrate body (14) is covered on the support surface (153), and the bottom of the glass substrate body (14) is inserted into the support opening (154), and the angle between the glass substrate body (14) and the carrier frame (151) is 60°.

10. The system for cleaning a liquid crystal glass substrate according to claim 9, wherein: The glass substrate body (14), the carrier frame (151) and the vertical frame (152) are combined to form a right triangle, and the high-temperature gas is sprayed upward from the air jet hole (156) to heat and dry the glass substrate body (14), and the diameter of the air jet hole (156) is less than 0.275nm.

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