An anti-glare glass and its etching AG process

By performing chemical etching and polishing on the tin and non-tin sides of float glass respectively, the warping and shadow stripe problems in the AG etching process of float glass were solved, improving production yield and reducing costs.

CN118108416BActive Publication Date: 2025-12-02SICHUAN HONGKE INNOVATION TECH CO LTD
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Patent Information

Application Number
CN202410261014.2
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2024-03-07
Publication Date
2025-12-02
Estimated Expiration
2044-03-07

AI Technical Summary

Technical Problem

In existing technologies, float glass suffers from warping and shadow stripe problems during the etching process to prevent glare, resulting in low yield and making it difficult to reduce costs while improving product quality.

Method used

A process of chemical etching and polishing is adopted for the tin and non-tin sides of float glass respectively. First, the tin side is frosted and chemically polished, and then the non-tin side is chemically etched. The polishing solution is composed of hydrofluoric acid, sulfuric acid, hydrochloric acid, etc. to treat the surface. The etching thickness is controlled between 0 and 50 μm to solve the problems of warping and dark stripes.

Benefits of technology

It effectively solves the warping and shadow stripe problems in the AG etching process of float glass, improves production yield, and reduces costs without affecting glass performance and quality.

✦ Generated by Eureka AI based on patent content.

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Abstract

This invention relates to the field of anti-glare glass technology, specifically to an anti-glare glass and its etching AG process. The process includes the following steps: 1) Cleaning the tin and non-tin surfaces of the glass raw material and applying a protective layer; 2) Removing the tin protective layer from the glass and feeding it into an automated AG glass etching production line, where the tin surface of the glass undergoes frosting and chemical polishing; 3) Removing the acid-resistant protective layer from the non-tin surface of the glass, and then applying an acid-resistant protective layer to the tin surface; 4) Feeding the glass into a chemical polishing production equipment to chemically etch the non-tin surface of the glass; 5) Removing the acid-resistant protective layer from the tin surface of the glass and cleaning it to obtain the anti-glare glass. This invention uses the tin surface of float glass as the anti-glare AG surface, and chemically etching and polishing both the tin and non-tin surfaces of the glass separately. Without affecting the performance and quality of the AG glass, it effectively solves the warping and dark stripe problems when using float glass to make AG glass, greatly improving the production yield.
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Description

Technical Field

[0001] This invention relates to the field of anti-glare glass technology, specifically to an anti-glare glass and its etching AG process; this glass can be used as cover glass for a range of flat panel displays, such as automotive, computer, mobile phone, and outdoor commercial displays. Background Technology

[0002] Anti-glare (AG) glass undergoes a special surface treatment, resulting in a textured, matte, non-reflective surface. Compared to ordinary glass, AG glass has less specular reflection. In bright light environments, it reduces the amount of reflected light entering the eyes, thus achieving anti-glare. Therefore, AG glass reduces ambient light interference while improving screen contrast and viewing angles, and also protects the eyes.

[0003] Currently, AG glass is mainly surface-treated using physical or chemical methods. Physical methods include sandblasting and coating. Coating has poor durability and the coating is prone to peeling off, while sandblasting can create deep microcracks on the glass surface, affecting its strength. Chemical methods, specifically chemical etching, use fluorine-containing substances to etch dense bumps and depressions onto the glass surface. Products made using this method exhibit excellent durability and strength, and it will be the mainstream process for anti-glare glass production in the future.

[0004] Currently, the mainstream flat glass on the market is mainly produced through float glass and overflow processes. Overflow glass produces flat glass with fewer appearance defects, but has lower output and higher cost. Float glass, on the other hand, has higher output and lower production cost, but its appearance quality is slightly inferior, with differences between the tin and non-tin sides. Overflow glass has a high yield rate for etched anti-glare glass, but the cost is also high. Float glass has lower cost, but its yield rate is relatively lower. The main problems affecting yield are shadow stripes and warping after tempering. Specifically, if the tin side is used as the AG side, due to the tin infiltration layer on the tin side, the glass warps towards the tin side after chemical strengthening, further increasing the warping towards the AG side (tin side), seriously affecting subsequent processing. If the non-tin side is used as the AG side, although the warping is smaller, the anti-glare glass surface exhibits varying numbers of parallel, penetrating shadow stripes on the surface, severely affecting product appearance quality and yield. With the increasing application areas and market demand for anti-glare glass, how to improve product quality while reducing costs is a major challenge facing the industry. Summary of the Invention

[0005] The purpose of this invention is to overcome at least one defect (deficiency) of the prior art and provide an anti-glare glass etching AG process that can solve the problem of low yield caused by shadow stripes and warping issues in current float glass etching AG.

[0006] To achieve the above-mentioned objectives, the specific technical solution of the present invention is as follows:

[0007] An anti-glare glass etching AG process includes the following steps:

[0008] 1) Clean the tin and non-tin sides of the glass material and apply a protective layer;

[0009] 2) Remove the tin protective layer from the glass after step 1) and put it into the AG glass etching automatic production line to complete the frosting and chemical polishing of the tin surface of the glass.

[0010] 3) Remove the acid-resistant protective layer from the non-tin side of the glass after step 2), and then cover the tin side with the acid-resistant protective layer;

[0011] 4) The glass treated in step 3) is put into a chemical polishing production equipment to chemically etch the non-tin side of the glass;

[0012] 5) Remove the tin anti-acid protective layer from the glass treated in step 4), and clean it to obtain anti-glare glass.

[0013] In a preferred embodiment of this application, the glass material in step 1) is high-alumina-silicon float glass or lithium-alumina-silicon float glass with a thickness of 0.4 to 5.0 mm.

[0014] As a preferred embodiment of this application, the protective layer applied in step 1) is one of the following: the tin side is covered with a common, easily peelable PE electrostatic film, and the non-tin side is covered with an acid-resistant film or an acid-resistant ink.

[0015] As a preferred embodiment of this application, the AG glass etching automatic production line described in step 2) mainly consists of several parts: pre-cleaning, frosting, chemical polishing, and post-cleaning. The AG glass parameters that can be produced are: haze (H): 2-80%, gloss (G): 10-130%, roughness (Ra): 0.02-1.0μm.

[0016] In a preferred embodiment of this application, the acid-resistant protective layer on the tin surface in step 3) can be either an acid-resistant film or an acid-resistant ink. More preferably, the acid-resistant protective layer on the tin surface is an acid-resistant film.

[0017] As a preferred embodiment of this application, the chemical polishing production equipment in step 4) is filled with polishing liquid. The polishing liquid mainly consists of an aqueous solution of at least one of hydrofluoric acid, sulfuric acid, hydrochloric acid, nitric acid, ammonium bifluoride, and ammonium fluoride, with a concentration of 0.5 to 15 wt%.

[0018] More preferably, the polishing slurry used in the chemical polishing production equipment is mainly composed of an aqueous solution of at least one of hydrofluoric acid, sulfuric acid, and hydrochloric acid; the concentration of the polishing slurry is 1 to 10 wt%.

[0019] In a preferred embodiment of this application, the chemical etching in step 4) reduces the thickness of the glass-tin surface by 0 to 50 μm; more preferably, the chemical etching reduces the thickness of the glass-tin surface by 2 to 30 μm.

[0020] Another objective of this application is to protect anti-glare glass obtained by employing any of the above methods or combinations of method steps.

[0021] Compared with existing technologies, the beneficial effects of this invention are:

[0022] This invention uses the tin side of float glass as the anti-glare AG surface, and performs chemical etching and polishing on the tin and non-tin sides of the glass respectively. Without affecting the performance and quality of AG glass, it effectively solves the warping and shadow stripe problems when float glass is made into AG glass, and greatly improves the production yield. Detailed Implementation

[0023] The present invention and its technical effects will be clearly and completely described below with reference to embodiments, so as to fully understand the purpose, features and effects of the present invention. The present invention will be further described in detail below with reference to embodiments, but the implementation of the present invention is not limited thereto.

[0024] Unless otherwise specified, the experimental methods used in the following examples are conventional methods.

[0025] Unless otherwise specified, all materials and reagents used in the following examples are commercially available.

[0026] Example 1:

[0027] An anti-glare glass etching AG process, the specific steps of which are as follows:

[0028] 1) Select a domestic high-alumina-silicon flat glass as the raw material, with specifications of 1300*1100*0.55mm. Clean the tin side and non-tin side of the glass raw material, and cover the tin side with ordinary PE electrostatic film and the non-tin side with acid-resistant film.

[0029] 2) Peel off the PE protective film on the tin surface of the glass treated in step 1) and put it into the AG glass etching automatic production line (existing technology, not described in detail) to complete the frosting and chemical polishing of the tin surface of the glass.

[0030] 3) Remove the anti-acid film from the non-tin side of the glass treated in step 2), and then cover the tin side with an anti-acid film;

[0031] 4) The glass from step 3 is fed into a chemical polishing production equipment to chemically etch the non-tin side of the glass (existing technology, not described in detail) to reduce the thickness by about 30μm;

[0032] 5) Remove the anti-acid film from the tin side of the glass after step 4), and clean it to obtain anti-glare glass.

[0033] 6) Cut the anti-glare glass obtained in step 5) into small pieces with dimensions of 542*361mm and chemically strengthen them. The strengthening conditions are: 100% KNO3, 420℃ / 280min.

[0034] Example 2

[0035] An anti-glare glass etching AG process, the specific steps of which are as follows:

[0036] 1) Select a domestic high-alumina-silicon flat glass as the raw material, with specifications of 1300*1100*0.55mm. Clean the tin and non-tin sides of the glass raw material, and cover the tin side with ordinary PE electrostatic film and the non-tin side with acid-resistant film.

[0037] 2) Peel off the PE protective film on the tin surface of the glass after step 1) and put it into the automatic AG glass etching production line (existing technology, not described in detail) to make the tin surface of the glass complete the frosting and chemical polishing.

[0038] 3) Remove the anti-acid film from the non-tin side of the glass after step 2), and then cover the tin side with the anti-acid film;

[0039] 4) The glass treated in step 3) is put into a chemical polishing production equipment to chemically etch the non-tin side of the glass (existing technology, not described in detail) to reduce the thickness by about 10μm;

[0040] 5) Remove the anti-acid film from the tin surface of the glass after step 4), and clean it to obtain anti-glare glass.

[0041] 6) Cut the anti-glare glass obtained in step 5) into small pieces with dimensions of 542*361mm, and perform chemical strengthening under the following conditions: 100% KNO3, 420℃ / 280min.

[0042] Comparative Example 1:

[0043] The preparation process of an anti-glare glass is as follows:

[0044] 1) Select a domestic high-alumina-silicon flat glass as the raw material, with specifications of 1300*1100*0.55mm. Clean the tin and non-tin sides of the glass raw material, and cover the tin side with ordinary PE electrostatic film and the non-tin side with acid-resistant film.

[0045] 2) Peel off the PE protective film on the tin surface of the glass after step 1) and put it into the AG glass etching automatic production line to complete the frosting and chemical polishing of the tin surface of the glass.

[0046] 3) Remove the anti-acid film from the non-tin side of the glass after step 2), and clean it to obtain anti-glare glass.

[0047] 4) Cut the anti-glare glass obtained in step 3) into small pieces with dimensions of 542*361mm, and perform chemical strengthening under the following conditions: 100% KNO3, 420℃ / 280min.

[0048] Comparative Example 2

[0049] The preparation process of an anti-glare glass is as follows:

[0050] 1) Select a domestic high-alumina-silicon flat glass as the raw material, with specifications of 1300*1100*0.55mm. Clean the tin side and the non-tin side of the glass raw material, and cover the non-tin side with ordinary PE electrostatic film and the tin side with acid-resistant film.

[0051] 2) After step 1), the PE protective film on the non-tin side of the glass is peeled off and put into the AG glass etching automatic production line to complete the frosting and chemical polishing of the non-tin side of the glass.

[0052] 3) Remove the anti-acid film from the tin side of the glass after step 2), and then cover the non-tin side with an anti-acid film;

[0053] 4) The glass treated in step 3) is put into a chemical polishing production equipment to chemically etch the tin surface of the glass;

[0054] 5) Remove the non-tin anti-acid film from the glass treated in step 4), and clean it to obtain anti-glare glass.

[0055] 6) Cut the anti-glare glass obtained in step 5) into small pieces with dimensions of 542*361mm, and perform chemical strengthening under the following conditions: 100% KNO3, 420℃ / 280min.

[0056] Comparative Example 3:

[0057] This embodiment prepares an anti-glare glass, the specific process of which is as follows:

[0058] 1) Select a domestic high-alumina-silicon flat glass as the raw material, with specifications of 1300*1100*0.55mm. Clean the tin side and 2 of the glass raw material, and cover the non-tin side with ordinary PE electrostatic film and the tin side with acid-resistant film.

[0059] 2) Peel off the PE protective film from the non-tin side of the glass after step 1) and put it into the AG glass etching automatic production line to complete the frosting and chemical polishing of the non-tin side of the glass.

[0060] 3) Remove the anti-acid film from the tin surface of the glass after step 2), and clean it to obtain anti-glare glass.

[0061] 4) Cut the anti-glare glass obtained in step 3) into small pieces with dimensions of 542*361mm, and perform chemical strengthening under the following conditions: 100% KNO3, 420℃ / 280min.

[0062] The performance of the anti-glare glass obtained in Examples 1-2 and Comparative Examples 1-3 was compared, and the specific results are as follows:

[0063] Table 1. Performance Comparison of Anti-Glare Glass

[0064]

[0065] As can be seen from Table 1, the AG parameters and stress parameters of the embodiments and comparative examples in this invention are basically the same, but the warpage and shadow stripe of the embodiments are better than those of the comparative examples.

[0066] The embodiments described above merely illustrate specific implementation methods of this application, and while the descriptions are detailed and specific, they should not be construed as limiting the scope of protection of this application. It should be noted that those skilled in the art can make various modifications and improvements without departing from the concept of the technical solution of this application, and these modifications and improvements all fall within the scope of protection of this application.

[0067] This background section is provided to generally present the context of the invention. The work of the currently named inventors, the work to the extent described in this background section, and aspects of this section that did not constitute prior art at the time of application are neither expressly nor impliedly acknowledged as prior art to the invention.

Claims

1. An anti-glare glass etching AG process, characterized in that... Includes the following steps: 1) Clean the tin and non-tin sides of the glass material and apply a protective layer; 2) Remove the tin protective layer from the glass after step 1) and put it into the AG glass etching automatic production line to complete the frosting and chemical polishing of the tin surface of the glass. 3) Remove the acid-resistant protective layer from the non-tin side of the glass after step 2), and then cover the tin side with the acid-resistant protective layer; 4) The glass treated in step 3) is put into a chemical polishing production equipment to chemically etch the non-tin side of the glass; 5) Remove the tin anti-acid protective layer from the glass treated in step 4), and clean it to obtain anti-glare glass.

2. The anti-glare glass etching AG process according to claim 1, characterized in that: The glass material mentioned in step 1) is high-alumina-silicon float glass or lithium-alumina-silicon float glass with a thickness of 0.4~5.0mm.

3. The anti-glare glass etching AG process according to claim 1, characterized in that: In step 1), the tin surface is covered with a common, easily peelable PE electrostatic film; Any one of the following: non-tin surface coated with an acid-resistant film or acid-resistant ink.

4. The anti-glare glass etching AG process according to claim 1, characterized in that, The automated AG glass etching production line described in step 2) mainly includes pre-cleaning, frosting, chemical polishing and post-cleaning sections; after processing, the AG glass parameters are: haze H is 2~80%, gloss G is 10~130%, and roughness Ra is 0.02~1.0μm.

5. The anti-glare glass etching AG process according to claim 1, characterized in that, The acid-resistant protective layer mentioned in step 3) is either an acid-resistant film or an acid-resistant ink.

6. The anti-glare glass etching AG process according to claim 1, characterized in that, Step 4) The chemical polishing production equipment is filled with polishing liquid; the main components of the polishing liquid are an aqueous solution of at least one of hydrofluoric acid, sulfuric acid, hydrochloric acid, nitric acid, ammonium hydrogen fluoride, and ammonium fluoride, with a concentration of 0.5~15wt%.

7. The anti-glare glass etching AG process according to claim 1, characterized in that: The non-tin side of the glass is thinned by 2~50μm through chemical etching in step 4).

8. The anti-glare glass etching AG process according to claim 6, characterized in that: The polishing solution is mainly composed of an aqueous solution of at least one of hydrofluoric acid, sulfuric acid, and hydrochloric acid; the concentration of the polishing solution is 1~10 wt%.

9. The anti-glare glass etching AG process according to claim 7, characterized in that: Chemical etching reduces the thickness of the non-tin side of the glass by 2~30μm.

10. An anti-glare glass, manufactured using the anti-glare glass etching AG process as described in any one of claims 1-9.

Citation Information

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