Anti-counterfeiting element and method for manufacturing the same

Abstract

The application provides a kind of anti-fake element and its manufacturing method, wherein, anti-fake element, including: base layer, be located in the relief effect layer of base layer printing surface, relief effect layer is used to form the first pattern with shallow relief effect;It further includes the pattern layer of the side of relief effect layer away from base layer, pattern layer is used to form second pattern and third pattern, second pattern and third pattern are positioned with first pattern register, and overlap up and down, and the second pattern area of pattern layer presents first color under first visual angle;The third pattern area of pattern layer presents second color under first visual angle;And, the second pattern area of pattern layer presents second color under second visual angle, the third pattern area of pattern layer presents first color under second visual angle. To make the linkage between different parts of anti-fake pattern, effectively enrich the visual effect of anti-fake pattern, increase its aesthetic degree, and add interesting and nimble, effectively improve its identification, improve the anti-fake ability of the anti-fake element.

Description

Technical Field

[0001] This application relates to the field of security marking technology, and more particularly to an anti-counterfeiting element and its manufacturing method. Background Technology

[0002] For items requiring anti-counterfeiting measures, such as securities, certificates, and high-end brand goods, components with optical effects that are difficult to imitate are usually embedded or glued in order to enhance the level of anti-counterfeiting.

[0003] In related technologies, components with optical effects that are difficult to imitate typically include optical elements with holograms, diffraction gratings, and multilayer interference films. These optical elements usually have intricate structures or complex layered structures, making their manufacturing process difficult to crack through simple analysis alone, thus preventing unauthorized replication. Currently, anti-counterfeiting components made using such optical elements in the industry are usually a simple superposition of several anti-counterfeiting methods. The resulting anti-counterfeiting patterns typically only have simple planar optical effects, lacking aesthetic appeal. Furthermore, because the various anti-counterfeiting methods are almost unrelated, the overall anti-counterfeiting approach is simple and easily cracked, indicating room for improvement. Summary of the Invention

[0004] The purpose of this application is to provide an anti-counterfeiting element and its manufacturing method, which enables different parts of the anti-counterfeiting pattern to interact, enrich its visual effect, enhance the dynamism and interest of the anti-counterfeiting pattern, and thereby improve the recognizability and anti-counterfeiting capability of the anti-counterfeiting element.

[0005] The technical solution provided in this application is as follows:

[0006] On the one hand, this application provides an anti-counterfeiting element, including:

[0007] grassroots level;

[0008] An embossed effect layer is printed on the printing surface of the base layer, and the embossed effect layer is used to form a first pattern with a shallow relief effect.

[0009] A pattern layer is disposed on the side of the relief effect layer away from the base layer. The pattern layer is used to form a second pattern and a third pattern. After the second pattern and the third pattern are combined, they are aligned with the first pattern and overlap vertically. The second pattern of the pattern layer presents a first color from a first viewing angle, and the third pattern of the pattern layer presents a second color from a first viewing angle.

[0010] The second pattern of the pattern layer presents a second color under a second viewing angle, and the third pattern of the pattern layer presents a first color under a second viewing angle.

[0011] Through an anti-counterfeiting element provided by the present application, an embossed effect layer and a pattern layer are sequentially stacked on the printing surface of the base layer to form a complete anti-counterfeiting pattern, and the first pattern area presents an embossed effect under reflected light; at the same time, the second pattern area of the pattern layer presents a first color and the third pattern area presents a second color in the first viewing angle; and after changing the reflection direction, the colors of the second pattern area and the third pattern area are interchanged, that is, in the second viewing angle, the second pattern area presents the second color and the third pattern area presents the first color; thereby, the first pattern area always shows an embossed pattern effect with two colors.

[0012] In this way, the colors of the second pattern area and the third pattern area are interchanged after changing the viewing angle, so that the second pattern and the third pattern produce a linkage effect in different viewing angles. At the same time, the embossed effect of the first pattern is superimposed, making the different film layers and different areas of the same film layer related. On the one hand, it effectively enriches the visual effect of the anti-counterfeiting pattern, enhances its flexibility and interestingness, and increases its beauty; at the same time, it effectively improves the anti-counterfeiting recognition of the anti-counterfeiting element, and further enhances its anti-counterfeiting ability.

[0013] In some embodiments, the embossed effect layer includes a first photo-crosslinkable resin layer. A microlens blazed grating is formed on the first photo-crosslinkable resin layer corresponding to the first pattern by molding, and the microlens blazed grating is disposed on the side of the first photo-crosslinkable resin layer away from the base layer.

[0014] In some embodiments, the pattern layer includes a second photo-crosslinkable resin layer. A high-frequency diffraction grating is formed on the second photo-crosslinkable resin layer corresponding to the second pattern area by molding, and the high-frequency diffraction grating is disposed on the side of the second photo-crosslinkable resin layer away from the first photo-crosslinkable resin layer.

[0015] In some embodiments, it further includes a metal oxide film layer, and the metal oxide film layer is disposed at a position corresponding to the high-frequency diffraction grating on the second photo-crosslinkable resin layer;

[0016] The spatial frequency of the high-frequency diffraction grating is set to 2500 L / mm to 3400 L / mm, and the grating angle is set to +90 degrees to -90 degrees; the high-frequency diffraction gratings corresponding to the second pattern area and the third pattern area on the second photo-crosslinkable resin layer are respectively provided with different spatial frequencies and / or grating angles.

[0017] The anti-counterfeiting element provided in this application utilizes a micromirror stroboscopic grating structure on a first photocrosslinked resin layer to form a first pattern, achieving a shallow relief effect. Simultaneously, by employing a high-frequency diffraction grating with a spatial frequency of 2500L / mm-3400L / mm and a grating angle of +90 degrees to -90 degrees on a second photocrosslinked resin layer, and a metal oxide film disposed in the high-frequency diffraction grating region, a visual effect is achieved where the colors of the second and third pattern regions are interchangeable when the observation angle is changed after the first pattern is superimposed on the second and third patterns. The manufacturing process is simple and easy to implement, effectively improving the production convenience of the anti-counterfeiting element and helping to save production costs for enterprises.

[0018] In some embodiments, a first dielectric material layer is further included, which is disposed at the position of the first photocrosslinked resin layer corresponding to the micromirror blazed grating structure; the refractive index of the first dielectric material layer is greater than the refractive index of the first photocrosslinked resin layer.

[0019] The anti-counterfeiting element provided in this application has a first dielectric material layer that acts as a light confinement layer. This light confinement layer supports and enhances the electric field extending from the surface of the element to the surrounding medium. The first dielectric material layer separates the first photocrosslinked resin layer and the second photocrosslinked resin layer on both sides of the micromirror blazed grating structure, which helps to maintain the grating structure and makes the boundaries of different image areas clear. At the same time, it helps to control the thickness of the optical element.

[0020] In some embodiments, a second dielectric material layer is further included, which is disposed on the metal oxide film layer away from the high-frequency diffraction grating, and the refractive index of the second dielectric material layer is greater than the refractive index of the second photocrosslinked resin layer.

[0021] The anti-counterfeiting element provided in this application has a second dielectric material layer attached to the corresponding high-frequency diffraction grating, which together with the corresponding diffraction grating structure constitutes a resonant grating coupler, serving as an optical waveguide and brightness enhancement function.

[0022] In some embodiments, an encapsulation layer is further included, which is disposed on the side of the second photocrosslinked resin layer opposite to the first photocrosslinked resin layer, and the encapsulation layer covers the second dielectric material layer; or, the encapsulation layer covers the second dielectric material layer and the positions on the second photocrosslinked resin layer where the second dielectric material layer is not disposed.

[0023] The anti-counterfeiting element provided in this application has an encapsulation layer used to protect the second dielectric material layer in order to maintain the optical effect of the second and third pattern areas.

[0024] On the other hand, a method for manufacturing an anti-counterfeiting element is also provided, which includes the following steps:

[0025] The printed surface of the substrate is subjected to corona treatment;

[0026] An embossed effect layer is printed on the printing surface of the base layer;

[0027] A pattern layer is printed on the side of the embossed effect layer that is opposite to the base layer.

[0028] In some embodiments, printing an embossed effect layer on the printing surface of the substrate further includes:

[0029] A first photocrosslinked resin layer is printed on the printing surface of the substrate;

[0030] A micromirror blazed grating structure is molded on the side of the first photocrosslinked resin layer away from the base layer to form a first pattern;

[0031] The method further includes printing a pattern layer on the side of the embossed effect layer opposite to the base layer, as described above:

[0032] A second photocrosslinked resin layer is printed on the side of the first photocrosslinked resin layer that is opposite to the base layer;

[0033] A high-frequency diffraction grating is molded on the side of the second photocrosslinked resin layer opposite to the first photocrosslinked resin layer to form a second pattern and a third pattern.

[0034] In some embodiments, the first pattern is formed by molding a micromirror blazed grating structure on the side of the first photocrosslinked resin layer opposite to the substrate, and then the method further includes:

[0035] A first dielectric material layer with a refractive index greater than that of the first photocrosslinked resin layer is deposited on the first photocrosslinked resin layer at the position corresponding to the micromirror blazed grating structure.

[0036] The process of molding a high-frequency diffraction grating on the side of the second photocrosslinked resin layer opposite to the first photocrosslinked resin layer to form a second pattern and a third pattern, further includes:

[0037] A second dielectric material layer with a refractive index greater than that of the second photocrosslinked resin layer is deposited on the second photocrosslinked resin layer at the position corresponding to the high-frequency diffraction grating.

[0038] An encapsulation layer is printed on the side of the second photocrosslinked resin layer opposite to the first photocrosslinked resin layer, and the encapsulation layer covers the second dielectric material layer; or, the encapsulation layer covers the second dielectric material layer and the positions on the second photocrosslinked resin layer where the second dielectric material layer is not disposed.

[0039] The method for manufacturing an anti-counterfeiting element provided in this application involves setting a micromirror blazed grating structure on a first photocrosslinked resin layer and a high-frequency diffraction grating on a second photocrosslinked resin layer. The spatial frequency of the high-frequency diffraction grating is set to 2500L / mm-3400L / mm, and the grating angle is +90 degrees to -90 degrees. When the first and second photocrosslinked resin layers are superimposed, the first pattern of the anti-counterfeiting design exhibits a shallow relief effect. Furthermore, after rotating the viewing angle by 90 degrees, the colors of the second and third pattern areas interchange, effectively enhancing the dynamism and appeal of the anti-counterfeiting design, improving its anti-counterfeiting identification, and thus enhancing the anti-counterfeiting capability of the element. Simultaneously, the manufacturing process of this anti-counterfeiting element is simple, resulting in low production costs for enterprises. It is suitable for large-scale industrial production, highly practical, and helps ensure enterprise productivity efficiency.

[0040] Compared with the prior art, the anti-counterfeiting element and its manufacturing method provided in this application have at least one of the following advantages:

[0041] 1. By setting a micromirror blazed grating structure in the first pattern area of ​​the first photocrosslinked resin layer, and setting high-frequency diffraction gratings in the second and third pattern areas of the second photocrosslinked resin layer, and aligning the first pattern with the second and third patterns, a complete anti-counterfeiting pattern is formed. This results in the first pattern of the anti-counterfeiting element exhibiting a bas-relief effect. Combined with a metal oxide film layer, the colors of the second and third pattern areas are interchanged after changing the viewing angle, thereby highlighting the bas-relief effect of the first pattern. This method creates a linkage between different parts of the anti-counterfeiting pattern, effectively enriching the visual effect of the anti-counterfeiting pattern, increasing its aesthetics, and adding interest and dynamism, thereby effectively improving its recognizability and enhancing the anti-counterfeiting capability of the anti-counterfeiting element. At the same time, the production process of this anti-counterfeiting element is simple, convenient to implement, and low in cost, making it suitable for large-scale industrial production, thus effectively improving the practicality of the anti-counterfeiting element.

[0042] 2. By setting an encapsulation layer, the stability of the second dielectric material layer on the second photocrosslinking resin layer is improved, thereby effectively maintaining the optical effect of the second pattern area and the third pattern area and extending the service life of the anti-counterfeiting element.

[0043] 3. By applying corona treatment to the printed surface of the base layer, the surface energy of the printed surface of the base layer is enhanced, which effectively improves the adhesion of the first photocrosslinked resin layer to the base layer and helps to further extend the service life of the anti-counterfeiting element. Attached Figure Description

[0044] The preferred embodiments will now be described in a clear and easy-to-understand manner, with reference to the accompanying drawings, to further explain the above-mentioned characteristics, technical features, advantages, and implementation methods of this solution.

[0045] Figure 1 This is a cross-sectional view of the specific layer structure of the anti-counterfeiting element, which is the main feature of the embodiments of this application.

[0046] Figure 2 This is a plan view of the color display state of the second and third pattern areas from a first perspective, which is the main embodiment of this application.

[0047] Figure 3 This is a plan view that mainly illustrates the color display state of the second and third pattern areas from a second perspective in the embodiments of this application.

[0048] Explanation of reference numerals in the attached figures:

[0049] 1. Base layer; 2. Embossed effect layer; 21. First pattern; 3. Pattern layer; 31. Second pattern; 32. Third pattern; 4. First dielectric material layer; 5. Second dielectric material layer; 6. Encapsulation layer; 7. Crosshair; 8. Cursor. Detailed Implementation

[0050] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the specific implementation methods of this application will be described below with reference to the accompanying drawings. Obviously, the accompanying drawings described below are only some embodiments of this application. For those skilled in the art, other drawings and other implementation methods can be obtained based on these drawings without creative effort.

[0051] To keep the drawings concise, each drawing only schematically shows the parts relevant to this application, and they do not represent the actual structure of the product. Furthermore, for ease of understanding, in some drawings, only one of the components with the same structure or function is schematically shown, or only one is labeled. In this document, "one" not only means "only one," but can also mean "more than one."

[0052] In one embodiment, refer to the accompanying drawings of the specification. Figures 1 to 3 An anti-counterfeiting element includes a base layer 1, an embossed effect layer 2 and a pattern layer 3 sequentially printed on the printing surface of the base layer 1. The embossed effect layer 2 is used to form a first pattern 21 with a shallow embossed effect. The pattern layer 3 is located on the side of the embossed effect layer 2 away from the base layer 1. The pattern layer 3 is used to form a second pattern 31 and a third pattern 32. After the second pattern 31 and the third pattern 32 are combined, they are aligned with the first pattern 21 and overlapped vertically to form a complete anti-counterfeiting pattern. Furthermore, the second pattern 31 of the pattern layer 3 presents a first color under a first viewing angle, and the third pattern 32 of the pattern layer 3 presents a second color under a first viewing angle. At the same time, the second pattern 31 of the pattern layer 3 presents a second color under a second viewing angle, and the third pattern 32 of the pattern layer 3 presents a first color under a second viewing angle.

[0053] In practical use, when the anti-counterfeiting element is observed from one side of pattern layer 3, the first pattern 21 area of ​​its anti-counterfeiting pattern has a shallow relief visual effect. At the same time, the color of the second pattern 31 area is different from that of the third pattern 32 area. That is, after changing the viewing angle, the colors of the second pattern 31 area and the third pattern 32 area are interchanged, thereby highlighting the shallow relief effect of the first pattern 21, effectively improving the aesthetics and anti-counterfeiting identification of the anti-counterfeiting pattern and enhancing its anti-counterfeiting capability. At the same time, because the different parts of the anti-counterfeiting pattern are linked under different viewing angles, the anti-counterfeiting pattern is more dynamic and lively, effectively enhancing the fun of the anti-counterfeiting element and enriching its visual effect.

[0054] In one embodiment, based on the base layer 1, relief effect layer 2, first pattern 21, pattern layer 3, second pattern 31, and third pattern 32 described in the above embodiments, specifically, referring to... Figures 1 to 3 In this embodiment of the application, the base layer 1 is configured as a thin film structure. In the industry, materials such as PET, PC, PETG, PVC, and BOPP are generally used; of course, metal materials can also be used, as long as they can achieve the printing function. In this embodiment, specific materials are selected as the base layer 1 material according to different application scenarios of the optical components; the thickness of the base layer 1 is set to 15-150 μm. In this embodiment of the application, there are no specific limitations on the material, shape, thickness, etc. of the base layer 1, and PC film is used as an example for illustration. During use, the base layer 1 material is adhered to or pressed onto the product.

[0055] The relief effect layer 2 and the pattern layer 3 are sequentially set on the printing surface of the base layer 1 along the thickness direction of the base layer 1; wherein, the relief effect layer 2 is set close to the base layer 1.

[0056] Specifically, the relief effect layer 2 includes a first photocrosslinked resin layer, such as a UV resin layer. In the embodiments of this application, the thickness of the first photocrosslinked resin layer is usually set to 1-5 μm. A first pattern 21 is provided on the first photocrosslinked resin layer. In this embodiment of the application, the first pattern 21 is composed of a micromirror blazed grating structure molded on the side of the first photocrosslinked resin layer away from the base layer 1, and the shallow relief effect is presented by the diffraction of the micromirror blazed grating structure.

[0057] Furthermore, the pattern layer 3 includes a second photocrosslinked resin layer printed on the side of the first photocrosslinked resin layer facing away from the base layer 1. The thickness of the second photocrosslinked resin layer is typically set to 80-150 nm. A second pattern 31 and a third pattern 32 are disposed on the second photocrosslinked resin layer. In this embodiment of the application, the second pattern 31 and the third pattern 32 are composed of high-frequency diffraction gratings molded on the side of the second photocrosslinked resin layer facing away from the first photocrosslinked resin layer and are integrally disposed. To achieve different color effects for the second pattern 31 and the third pattern 32 under the same viewing angle, the high-frequency diffraction gratings corresponding to the area of ​​the second pattern 31 and the high-frequency diffraction gratings corresponding to the area of ​​the third pattern 32 on the second photocrosslinked resin layer are respectively set with different spatial frequencies and / or grating angles. In addition, the second pattern 31 and the third pattern 32 are aligned with the first pattern 21 along the thickness direction of the base layer 1 and overlap vertically. In this embodiment of the application, the second pattern 31 and the third pattern 32 can be aligned with the first pattern 21 by using a crosshair 7 and / or a cursor 8. In this embodiment of the application, the spatial frequency of the high-frequency diffraction grating can be set to 2500L / mm-3400L / mm, and the grating angle can be set to +90 degrees to -90 degrees. After being coated with a high-refractive-index metal oxide film, it exhibits a red and green light conversion effect under the angle of reflected light, thereby realizing the color change of the first pattern 21 and the second pattern 31 regions under different viewing angles.

[0058] In the embodiments of this application, the second pattern 31 and the third pattern 32 can also be configured as other multi-block patterns composed of high-frequency diffraction gratings. Similarly, different block patterns are distinguished by their different spatial frequencies and / or grating angles. The different block patterns are aligned and overlapped with the micromirror blazed grating structure constituting the first pattern 21 along the thickness direction of the base layer 1.

[0059] Meanwhile, in order to maintain the micromirror blazed grating structure and make the boundary of the first pattern 21 clear, a first dielectric material layer 4 with a high refractive index is deposited at the position of the first photocrosslinked resin layer corresponding to the micromirror blazed grating structure. Typically, the refractive index of the photocrosslinked resin layer is about 1.5. The material of the first dielectric material layer 4 is usually a transparent material with a higher refractive index, such as titanium dioxide or zinc sulfide with a refractive index of about 2.3. The thickness of the first dielectric material layer 4 is usually set to 80-150 nm.

[0060] Similarly, a second dielectric material layer 5 is deposited on the second photocrosslinked resin layer at the position corresponding to the high-frequency diffraction grating. The refractive index of the second dielectric material layer 5 is greater than that of the second photocrosslinked resin layer, and the arrangement of the second dielectric material layer 5 on the second photocrosslinked resin layer is the same as that of the first dielectric material layer 4 on the first photocrosslinked resin layer. Furthermore, to reduce the wear rate of the second dielectric material layer 5, an encapsulation layer 6 is coated on the side of the second photocrosslinked resin layer facing away from the first photocrosslinked resin layer, and the encapsulation layer 6 covers the second dielectric material layer 5; or, the encapsulation layer 6 covers the second dielectric material layer 5 and the positions on the second photocrosslinked resin layer where the second dielectric material layer 5 is not disposed. In this embodiment of the present application, the encapsulation layer 6 is set as a third photocrosslinked resin layer, and the thickness of the third photocrosslinked resin layer is set to 1-5 μm.

[0061] In this embodiment of the application, other layer structures can be superimposed on the side of the encapsulation layer 6 away from the base layer 1. For example, a colored ink layer can be added to provide a specific color for the anti-counterfeiting pattern, further enriching the visual effect of the anti-counterfeiting pattern and enhancing its aesthetics. Of course, in the embodiments of the application, the refractive index of the added other layer structures is required to be similar to that of the photocrosslinked resin layer, and at least lower than that of the first dielectric material layer 4 and the second dielectric material layer 5, in order to ensure that the preset optical effect is achieved.

[0062] In one embodiment, a method for manufacturing an anti-counterfeiting element is also included, comprising the following steps:

[0063] S1. Perform corona treatment on the printing surface of base layer 1;

[0064] S2, Print an embossed effect layer 2 on the printing surface of the base layer 1;

[0065] S2-1. Print the first photocrosslinked resin layer on the printing surface of the base layer 1;

[0066] S2-2, A micromirror blazed grating structure is molded on the side of the first photocrosslinked resin layer away from the base layer 1 to form a first pattern 21;

[0067] S2-3. A first dielectric material layer 4 with a refractive index greater than that of the first photocrosslinked resin layer is deposited on the first photocrosslinked resin layer at the position corresponding to the micromirror blazed grating structure.

[0068] S3. Print pattern layer 3 on the side of relief effect layer 2 that is away from base layer 1;

[0069] S3-1. Print a second photocrosslinking resin layer on the side of the first photocrosslinking resin layer that is away from the base layer 1;

[0070] S3-2. A high-frequency diffraction grating is molded on the side of the second photocrosslinked resin layer away from the first photocrosslinked resin layer to form a second pattern 31 and a third pattern 32.

[0071] S3-3. Deposit a metal oxide film on the second photocrosslinking resin layer at the position corresponding to the high-frequency diffraction grating;

[0072] S3-4. A second dielectric material layer 5 with a refractive index greater than that of the second photocrosslinked resin layer is deposited on the second photocrosslinked resin layer at the position corresponding to the high-frequency diffraction grating.

[0073] S3-5. An encapsulation layer 6 is printed on the side of the second photocrosslinked resin layer away from the first photocrosslinked resin layer, and the encapsulation layer 6 covers the second dielectric material layer 5; or, the encapsulation layer 6 covers the second dielectric material layer 5 and the position of the second photocrosslinked resin layer where the second dielectric material layer 5 is not provided.

[0074] It should be noted that the above embodiments can be freely combined as needed. The above are merely preferred embodiments of this application. It should be pointed out that for those skilled in the art, several improvements and modifications can be made without departing from the principles of this application, and these improvements and modifications should also be considered within the scope of protection of this application.

Claims

1. An anti-counterfeiting element, characterized in that, include: grassroots level; An embossed effect layer is printed on the printing surface of the base layer, and the embossed effect layer is used to form a first pattern with a shallow relief effect. A pattern layer is disposed on the side of the relief effect layer away from the base layer. The pattern layer is used to form a second pattern and a third pattern. After the second pattern and the third pattern are combined, they are aligned with the first pattern and overlap vertically. The second pattern of the pattern layer presents a first color from a first viewing angle, and the third pattern of the pattern layer presents a second color from a first viewing angle. The second pattern of the pattern layer presents a second color under a second viewing angle, and the third pattern of the pattern layer presents a first color under a second viewing angle; The relief effect layer includes a first photocrosslinked resin layer, on which a micromirror blazed grating is formed by molding corresponding to the first pattern, and the micromirror blazed grating is disposed on the side of the first photocrosslinked resin layer away from the base layer. The pattern layer includes a second photocrosslinked resin layer, on which a high-frequency diffraction grating is formed by molding in the area corresponding to the second pattern and the third pattern. The high-frequency diffraction grating is disposed on the side of the second photocrosslinked resin layer away from the first photocrosslinked resin layer. It also includes a metal oxide film layer, which is disposed on the second photocrosslinking resin layer at the position corresponding to the high-frequency diffraction grating; The spatial frequency of the high-frequency diffraction grating is set to 2500L / mm~3400L / mm, and the grating angle is set to +90 degrees~-90 degrees; the high-frequency diffraction grating on the second photocrosslinked resin layer corresponding to the second pattern area and the high-frequency diffraction grating corresponding to the third pattern area are respectively set with different spatial frequencies and / or grating angles. It also includes a first dielectric material layer, which is disposed at the position of the first photocrosslinked resin layer corresponding to the micromirror blazed grating; the refractive index of the first dielectric material layer is greater than the refractive index of the first photocrosslinked resin layer. It also includes a second dielectric material layer, which is disposed on the metal oxide film layer away from the high-frequency diffraction grating, and the refractive index of the second dielectric material layer is greater than the refractive index of the second photocrosslinked resin layer.

2. The anti-counterfeiting element according to claim 1, characterized in that, It also includes an encapsulation layer, which is disposed on the side of the second photocrosslinked resin layer away from the first photocrosslinked resin layer, and the encapsulation layer covers the second dielectric material layer; or, the encapsulation layer covers the second dielectric material layer and the positions on the second photocrosslinked resin layer where the second dielectric material layer is not disposed.

3. A method for manufacturing an anti-counterfeiting element, used to manufacture the anti-counterfeiting element as described in claim 1 or 2, characterized in that, Includes the following steps: Corona treatment is applied to the printed surface of the substrate; An embossed effect layer is printed on the printing surface of the base layer; A pattern layer is printed on the side of the embossed effect layer that is opposite to the base layer.

4. The method for manufacturing an anti-counterfeiting element according to claim 3, characterized in that, The process of printing an embossed effect layer on the printing surface of the base layer further includes: A first photocrosslinked resin layer is printed on the printing surface of the substrate; A micromirror blazed grating structure is molded on the side of the first photocrosslinked resin layer away from the base layer to form a first pattern; The method further includes printing a pattern layer on the side of the embossed effect layer opposite to the base layer, as described above: A second photocrosslinked resin layer is printed on the side of the first photocrosslinked resin layer that is opposite to the base layer; A high-frequency diffraction grating is molded on the side of the second photocrosslinked resin layer opposite to the first photocrosslinked resin layer to form a second pattern and a third pattern.

5. The method for manufacturing an anti-counterfeiting element according to claim 4, characterized in that, The first pattern is formed by molding a micromirror blazed grating structure on the side of the first photocrosslinked resin layer opposite to the substrate, and then the process further includes: A first dielectric material layer with a refractive index greater than that of the first photocrosslinked resin layer is deposited on the first photocrosslinked resin layer at the position corresponding to the micromirror blazed grating structure. The process of molding a high-frequency diffraction grating on the side of the second photocrosslinked resin layer opposite to the first photocrosslinked resin layer to form a second pattern and a third pattern, further includes: A second dielectric material layer with a refractive index greater than that of the second photocrosslinked resin layer is deposited on the second photocrosslinked resin layer at the position corresponding to the high-frequency diffraction grating. An encapsulation layer is printed on the side of the second photocrosslinked resin layer opposite to the first photocrosslinked resin layer, and the encapsulation layer covers the second dielectric material layer; or, the encapsulation layer covers the second dielectric material layer and the positions on the second photocrosslinked resin layer where the second dielectric material layer is not disposed.

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