Micro-nano pattern structure, its preparation method, decorative part, vehicle, mobile phone

Abstract

The present application relates to a micro-nano pattern structure, a preparation method thereof, a decorative part, a vehicle, and a mobile phone. The micro-nano pattern structure includes a base layer, a shielding layer, and a coloring layer. The shielding layer and the base layer are stacked along a first direction, and the shielding layer includes a plurality of protruding structures arranged at intervals, and a hollow structure is formed between adjacent protruding structures; the coloring layer is stacked on the base layer along the first direction and is embedded in at least part of the hollow structure. In the micro-nano pattern structure according to the embodiment of the present application, in the shielding layer, a hollow structure is formed between adjacent protruding structures, and different combinations of hollow structures form a micro-nano pattern. Furthermore, by stacking the coloring layer on the base layer and embedding it in at least part of the hollow structure, at least part of the micro-nano pattern can be colored, so that the micro-nano pattern has rich and colorful colors and the display effect of the micro-nano pattern structure is improved.

Description

Technical Field

[0001] This application relates to the technical field of housings, and particularly to a micro-nano pattern structure, a preparation method thereof, a decorative part, and a vehicle. Background Art

[0002] Micro-nano pattern structures usually use methods such as laser direct writing or mask exposure to prepare micro-nano structure templates, and then obtain micro-nano patterns through micro-nano transfer printing technology. However, in related technologies, micro-nano patterns are directly prepared on the substrate. Since micro-nano patterns are usually prepared by transferring transparent UV glue, the micro-nano patterns themselves are colorless and can only form a background color through processes such as coating and screen printing, presenting only a light and shadow effect on the background color. Moreover, due to the relatively fine structure of the micro-nano patterns themselves, it is difficult to perform fixed-point coloring on them, resulting in poor display effects of the micro-nano patterns. Summary of the Invention

[0003] Embodiments of this application provide a micro-nano pattern structure, a preparation method thereof, and a vehicle. The micro-nano pattern structure can color the micro-nano pattern and improve the display effect of the micro-nano pattern.

[0004] To achieve the above object, according to the first aspect of this application, there is provided a micro-nano pattern structure, including:

[0005] A base layer;

[0006] A shielding layer, the shielding layer and the base layer are stacked along a first direction, and the shielding layer includes a plurality of protruding structures arranged at intervals, and a hollow structure is formed between adjacent protruding structures;

[0007] A coloring layer, the coloring layer is stacked along the first direction on the base layer and is embedded in at least part of the hollow structure.

[0008] Optionally, the material of the base layer includes one of polycarbonate, polyethylene terephthalate, and glass.

[0009] Optionally, the coloring layer includes a directional dye; wherein, the directional dye is configured to only dye the base layer.

[0010] Optionally, the width of any one of the protruding structures along a second direction is 1 - 1000 μm;

[0011] And / or, the width of any one of the hollow structures along the second direction is 1 - 1000 μm.

[0012] Optionally, the thickness of the coloring layer along the first direction is greater than 0 μm and less than or equal to 15 μm.

[0013] Optionally, the micro-nano pattern structure further includes a microlens array layer;

[0014] The microlens array layer is adhesively disposed on the side of the base layer facing away from the shielding layer.

[0015] Optionally, the microlens array layer includes a plurality of microlenses arranged in sequence, and the microlenses are arranged in one-to-one correspondence with the hollow structures.

[0016] According to the second aspect of the present application, there is also provided a method for preparing a micro-nano pattern structure for preparing the micro-nano pattern structure as above, including:

[0017] Providing a base layer;

[0018] Forming a photoresist layer on the base layer;

[0019] Covering a mask plate on the side of the photoresist layer facing away from the base layer to form a mask structure;

[0020] Exposing and developing the mask structure to form a shielding layer on the photoresist layer; wherein, the shielding layer includes a plurality of convex structures arranged at intervals in the second direction, and a hollow structure is formed between adjacent convex structures;

[0021] Embedding a coloring layer in at least part of the hollow structures to obtain a micro-nano pattern structure.

[0022] Optionally, embedding a coloring layer in at least part of the hollow structures includes:

[0023] Immersing the base layer and the shielding layer in a directional dye solution formed by a directional dye so that the base layer located in the hollow structures forms a coloring layer.

[0024] Optionally, forming a photoresist layer on the base layer includes:

[0025] Fixing the base layer on a substrate layer;

[0026] Coating a photoresist on the side of the base layer facing away from the substrate layer to form a photoresist layer.

[0027] Optionally, before fixing the base layer on the substrate layer, it further includes:

[0028] Providing a microlens array layer;

[0029] Disposing the microlens array layer on one side of the base layer;

[0030] Fixing the base on the substrate layer includes:

[0031] Fixing the side of the microlens array layer facing away from the base layer on the substrate layer.

[0032] According to the third aspect of the present application, there is also provided a decorative part, including the micro-nano pattern structure as above, or, the micro-nano pattern structure obtained by the method for preparing the micro-nano pattern structure as above.

[0033] According to the fourth aspect of the present application, a vehicle is further provided, including the decorative member as above.

[0034] According to the fifth aspect of the present application, a mobile phone is further provided, including the decorative member as above.

[0035] The micro-nano pattern structure of the embodiment of the present application includes a base layer, a shielding layer, and a coloring layer. Among them, the shielding layer and the base layer are stacked along a first direction, and the shielding layer includes a plurality of protruding structures arranged at intervals, and a hollow structure can be formed between adjacent protruding structures. The coloring layer is also stacked on the base layer along the first direction and is embedded in at least part of the hollow structure. That is to say, in the shielding layer, a hollow structure is formed between adjacent protruding structures, and different combinations of hollow structures form a micro-nano pattern. Furthermore, by arranging the coloring layer on the base layer and embedding it in at least part of the hollow structure, at least part of the micro-nano pattern can be colored, so that the micro-nano pattern has rich and colorful colors and improves the display effect of the micro-nano pattern structure.

[0036] Other features and advantages of the present application will be described in detail in the subsequent specific implementation part. BRIEF DESCRIPTION OF THE DRAWINGS

[0037] In order to more clearly illustrate the technical solutions in the embodiments of the present application, the following will briefly introduce the drawings required for the description of the embodiments. Obviously, the following drawings are only some embodiments of the present application. For those skilled in the art, without creative efforts, other drawings can also be obtained based on these drawings.

[0038] In order to more fully understand the present application and its beneficial effects, the following will be described in conjunction with the drawings, where the same reference numerals represent the same parts in the following description.

[0039] Figure 1 is the structural schematic diagram of the micro-nano pattern structure provided in the embodiment of the present application Figure 1 ;

[0040] Figure 2 is the structural schematic diagram of the micro-nano pattern structure provided in the embodiment of the present application Figure 1 ;

[0041] Figure 3 is the preparation process flow of the micro-nano pattern structure provided in the embodiment of the present application Figure 1 ;

[0042] Figure 4 is the preparation process flow of the micro-nano pattern structure provided in the embodiment of the present application Figure 2 ;

[0043] Figure 5 is the preparation process flow of the micro-nano pattern structure provided in the embodiments of the present application Figure 3 ;

[0044] Figure 6 is the preparation process flow of the micro-nano pattern structure provided in the embodiments of the present application Figure 4 。

[0045] Explanation of reference numerals:

[0046] 1, base layer; 2, shielding layer; 21, convex structure; 22, hollow structure; 3, coloring layer; 4, microlens array layer; 41, microlens; 5, substrate layer; 6, photoresist layer; 7, mask substrate; 71, light-transmitting layer; 72, light-shielding layer; 8, mask plate. Detailed implementation manners

[0047] Next, the technical solutions in the embodiments of the present application will be clearly and completely described with reference to the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative efforts belong to the protection scope of the present application.

[0048] The present application provides a micro-nano pattern structure. Please refer to Figure 1 , which includes a base layer 1, a shielding layer 2, and a coloring layer 3. Among them, the shielding layer 2 and the base layer 1 are stacked along the first direction X, and the shielding layer 2 includes a plurality of spaced-apart convex structures 21, and a hollow structure 22 is formed between adjacent convex structures 21. That is to say, the shielding layer 2 includes a plurality of convex structures 21, a hollow structure 22 is formed between adjacent convex structures 21, and the hollow structures 22 are combined with each other to form the micro-nano pattern to be constructed. The coloring layer 3 is stacked along the first direction X on the base layer 1 and is embedded in at least part of the hollow structures 22. The coloring layer 3 is also provided in the base layer 1 and is embedded in the hollow structures 22. According to actual needs, it can be selected to embed the coloring layer 3 in some of the hollow structures 22, or embed the coloring layer 3 in all of the hollow structures 22. By embedding the coloring layer 3 in at least part of the hollow structures 22, the micro-nano pattern formed by the hollow structures 22 can be colored, so that the micro-nano pattern has rich and colorful colors and improves the display effect of the micro-nano pattern structure.

[0049] In contrast, in the related art, the micro-nano patterns in the micro-nano pattern structure are usually directly fabricated on the base layer 1. These micro-nano patterns are generally composed of transparent substances such as photoresist or UV glue. Therefore, it is very difficult for the micro-nano patterns themselves to have rich and colorful colors. Moreover, due to the relatively fine structure of the micro-nano patterns, it is also difficult to perform directional coloring on the micro-nano patterns themselves, which affects the display effect of the micro-nano patterns.

[0050] Exemplarily, please refer to Figure 1 , the micro-nano pattern structure includes a base layer 1, a shielding layer 2, and a coloring layer 3. The shielding layer 2 is stacked with the base layer 1 along the first direction X, that is, the shielding layer 2 covers one side of the base layer 1. The shielding layer 2 includes a plurality of protruding structures 21 arranged at intervals, and the protruding structures 21 are all disposed on the shielding layer 2. A hollow structure 22 is formed between adjacent protruding structures 21, exposing the base layer 1. The coloring layer 3 is embedded in the hollow structure 22 and is in direct contact with the base layer 1. Among them, the area of the base layer 1 where the protruding structure 21 is provided corresponds to the area where no micro-nano patterns are distributed, while the area of the base layer 1 where the hollow structure 22 is provided corresponds to the area where micro-nano patterns are distributed. The coloring layer 3 is embedded in at least part of the hollow structure 22, which can make at least part of the micro-nano patterns colored, improving its display effect.

[0051] In some embodiments, the material of the base layer 1 includes one of polycarbonate, polyethylene terephthalate, and glass. That is, the base layer 1 can adopt a PC (polycarbonate) layer, a PET (polyethylene terephthalate) layer, or a glass layer. PC, PET, and glass all have good light transmission effects and good chemical stability and structural strength. Using them as the base layer 1 can ensure the display effect of the micro-nano patterns and has good stability.

[0052] It can be understood that in order to improve the display effect of the micro-nano patterns, the material of the base layer 1 is preferably a transparent material.

[0053] In some embodiments, the coloring layer 3 includes a directional dye; wherein, the directional dye is configured to only dye the base layer 1. That is, the directional dye in the coloring layer 3 can only color the base layer 1 and cannot color the protruding structures 21 in the shielding layer 2. By including the directional dye in the coloring layer 3, the area of the base layer 1 corresponding to the hollow structure 22 (i.e., the micro-nano pattern area) can be directionally colored, further improving the display effect of the micro-nano patterns and significantly reducing the difficulty of coloring the micro-nano patterns.

[0054] Specifically, the molecular structure of the directional dye contains specific functional groups, resulting in different affinities for different materials. The materials of the base layer 1 and the raised structure 21 in the shielding layer 2 are different. The directional dye has a higher affinity for the base layer 1 and a lower affinity for the raised structure 21. Therefore, during the overall dyeing process of the base layer 1 and the shielding layer 2, the directional dye can only be adsorbed on the base layer 1 with a higher affinity for it, and cannot be adsorbed on the raised structure 21 with a lower expected affinity, thereby achieving the purpose of directional coloring of the base layer 1. Due to the selectivity of the directional dye, the coloring process of the micro-nano pattern is significantly simplified, and the coloring effect of the micro-nano pattern with a fine structure is improved.

[0055] Exemplarily, a special dye for acrylic (PMMA) can dye materials containing carbon-oxygen double bonds (such as PC, PET), but cannot dye epoxy-based photoresists.

[0056] In some embodiments, the width of any one of the raised structures 21 in the second direction Y is 1 - 1000 μm. The wider the width of the raised structure 21, the worse the fineness of the formed micro-nano pattern. At the same time, the narrower the width of the raised structure 21, the greater the process difficulty. To balance the fineness and process difficulty, in the embodiments of the present application, the width of the raised structure 21 in the second direction Y is set to 1 - 1000 μm, which can form a micro-nano pattern with a fine structure and improve the display effect.

[0057] To better balance the fineness and process difficulty of the micro-nano pattern, in the embodiments of the present application, the width of any one of the raised structures 21 in the second direction Y is preferably set to 50 - 800 μm.

[0058] Exemplarily, the width of any one of the raised structures 21 in the second direction Y can be 50 μm, 100 μm, 200 μm, 400 μm, or 800 μm.

[0059] In some embodiments, the width of any one of the hollow structures 22 in the second direction Y is 1 - 1000 μm. Similar to the raised structure 21, the width of the hollow structure 22 in the second direction Y is also set to 1 - 1000 μm.

[0060] To better balance the fineness and process difficulty of the micro-nano pattern, in the embodiments of the present application, the width of any one of the hollow structures 22 in the second direction Y is preferably set to 50 - 800 μm.

[0061] Exemplarily, the width of any one of the hollow structures 22 in the second direction Y can be 50 μm, 100 μm, 200 μm, 400 μm, or 800 μm.

[0062] It should be noted that the second direction Y is perpendicular to the first direction X. Please refer toFigure 1 , the first direction X is the vertical direction, and the second direction Y is the horizontal direction.

[0063] In some embodiments, the thickness of the coloring layer 3 in the first direction X is greater than 0 μm and less than or equal to 15 μm. The greater the thickness of the coloring layer 3, it means that more dyes are bound to the surface of the base layer 1, making the bonding effect between the coloring layer 3 and the base layer 1 better, improving the color fastness, and the thicker coloring layer 3 can also have better mechanical properties and optical properties itself. However, when the coloring layer 3 is too thick, it is more likely to generate cracks or fractures, and cause light to scatter or refract on its surface, affecting color uniformity and clarity. To ensure good display effects and structural strength, in the embodiments of the present application, the thickness of the coloring layer 3 in the first direction X is set to 0 - 15 μm.

[0064] In some embodiments, please refer to Figure 2 , the micro-nano pattern structure further includes a microlens array layer 4. Among them, the microlens array layer 4 is disposed in a fitting manner on the side of the base layer 1 facing away from the shielding layer 2. By providing the microlens array layer 4 on the side of the base layer 1 facing away from the shielding layer 2, light can pass through the microlens array layer 4 to magnify the micro-nano pattern formed by the coloring layer 3 in the hollow structure 22 formed on the other side of the base layer 1, realizing the effect of suspending and magnifying the micro-nano pattern, thereby enhancing the display effect of the micro-nano pattern structure.

[0065] In some embodiments, please refer to Figure 2 , the microlens array layer 4 includes a plurality of microlenses 41 arranged in sequence, and the microlenses 41 are arranged in one-to-one correspondence with the hollow structures 22. By arranging the microlenses 41 in the microlens array layer 4 in one-to-one correspondence with the hollow structures 22, each microlens 41 can magnify the coloring layer 3 in the corresponding hollow structure 22, thereby realizing the suspension effect, and further ensuring the suspension and magnification effect of the overall micro-nano pattern.

[0066] Exemplarily, please refer to Figure 2 , the microlens array layer 4 is composed of a plurality of microlenses with micron-level light-transmitting apertures and relief depths. The microlens array layer 4 and the coloring layer 3 are respectively disposed on opposite sides of the base layer 1 in the first direction X, and the microlenses 41 in the microlens array 4 are arranged in one-to-one correspondence with the hollow structures 22. After light passes through each microlens 41 in the microlens array layer 4, the micro-nano pattern colored by the coloring layer 3 can be magnified, thereby forming a suspension and magnification effect, and enhancing the display effect of the micro-nano pattern.

[0067] It can be understood that the size and parameters of the microlens array layer 4 can be reasonably set according to actual needs as long as the suspension and magnification effect can be achieved, and the embodiments of the present application do not limit it.

[0068] Among them, the thickness of the base layer 1 can be set according to the size of the microlenses 41 in the microlens array layer 4. When the microlens array layer 4 is required to achieve a floating magnification effect, the thickness of the base layer 1 is the object distance of the microlenses 41. In order to present a magnification effect, its thickness is between 1 focal length and 2 focal lengths. Considering the processing characteristics of the microlens array layer 4 and the conventional substrate thickness, the thickness of the base layer 1 is usually 50 μm or 100 μm.

[0069] The blocking layer 2 is formed by coating a photoresist on the base layer 1. Its thickness is related to the coating process. If the spin coating process is used, the thickness is about 1 μm, while if the spray coating process is used, the thickness is 6 - 7 μm. Since the main function of the blocking layer 2 is to define the coloring range of the coloring layer 3, its thickness has little impact on the overall effect.

[0070] According to the second aspect of the present application, there is also provided a method for preparing a micro-nano pattern structure for preparing the micro-nano pattern structure as above. Please refer to Figure 3 , including:

[0071] Providing a base layer 1;

[0072] Forming a photoresist layer 6 on the base layer 1;

[0073] Covering a mask plate 8 on the side of the photoresist layer 6 facing away from the base layer 1 to form a mask structure;

[0074] Exposing and developing the mask structure to form a blocking layer 2 on the photoresist layer 6; wherein, the blocking layer 2 includes a plurality of protruding structures 21 arranged at intervals along the second direction Y, and a hollow structure 22 is formed between adjacent protruding structures 21;

[0075] Embedding a coloring layer 3 in at least part of the hollow structure 22 to obtain a micro-nano pattern structure.

[0076] That is, first form a photoresist layer 6 on one side of the base layer 1, cover the photoresist layer 6 with a mask plate 8 to form a mask structure. And perform exposure and development processing on the mask structure to remove the photoresist layer 6 in a specific area, so that the photoresist layer 6 forms a blocking layer 2 with a micro-nano pattern. The blocking layer 2 includes a plurality of protruding structures 21 arranged at intervals along the second direction Y, and a hollow structure 22 is formed between adjacent protruding structures 21. The hollow structures 22 are connected to each other to further form a micro-nano pattern. By embedding a coloring layer 3 in at least part of the hollow structure 22, at least part of the micro-nano pattern can be dyed, having a better display effect.

[0077] Among them, providing the base layer 1 includes: fixing the base layer 1 on the substrate layer 5. By fixing the base layer 1 on the substrate layer 5, the substrate layer 5 can be fixed and the side of the base layer 1 facing away from the blocking layer 2 can be protected.

[0078] Exemplarily, the substrate layer 5 can be selected as a glass layer.

[0079] Correspondingly, a photoresist layer 6 is formed on the base layer 1, including:

[0080] Coat photoresist on the side of the base layer 1 facing away from the substrate layer 5 to form the photoresist layer 6. During the process of coating the photoresist, a spin coater or a spray coater can be used to form a uniform photoresist layer 6 on the side of the base layer 1 facing away from the substrate layer 5.

[0081] In another embodiment, before fixing the base layer 1 to the substrate layer 5, it further includes:

[0082] Provide a microlens array layer 4;

[0083] Set the microlens array layer 4 on one side of the base layer 1.

[0084] That is, before fixing the base layer 1 to the substrate layer 5, first set the microlens array layer 4 on one side of the base layer 1. Through the microlens array layer 4, the suspended magnification effect of the micro-nano pattern can be achieved.

[0085] Correspondingly, fixing the base layer 1 to the substrate layer 5 includes:

[0086] Fix the side of the microlens array layer 4 facing away from the base layer 1 to the substrate layer 5.

[0087] Fixing the side of the microlens array layer 4 facing away from the base layer 1 to the substrate layer 5 facilitates coating the photoresist layer 6 on the side of the base layer 1 facing away from the microlens array layer 4.

[0088] Exemplarily, the preparation method of the microlens array layer 4 includes: obtaining a lithographic plate master mold of the microlens array layer 4 by means of gray-scale exposure and development, and then performing an anti-adhesion treatment on it; replicating the microlens array layer 4 on the lithographic plate master mold onto a PET film by UV transfer, and performing an anti-adhesion treatment again; then transferring the microlens array layer 4 to a PC board by UV transfer technology to obtain a PC mold; using the PC mold, multiple PC films with the microlens array layer 4 printed on one side can be obtained by UV transfer technology. Using UV glass glue, stick the side with the microlens array layer 4 on a glass sheet.

[0089] In some embodiments, before covering the mask plate 8 on the side of the photoresist layer 6 facing away from the base layer 1, it further includes:

[0090] Determine the design structure of the mask plate 8 according to the required micro-nano pattern;

[0091] A mask substrate 7 is provided. According to the design structure, the mask substrate 7 is exposed, developed, and etched to obtain a mask 8.

[0092] The photoresist used in the photoresist layer 6 can be a positive photoresist or a negative photoresist. A positive photoresist, also known as a positive resist, is a photosensitive material. Its characteristic is that after being exposed to ultraviolet light, the exposed part becomes more soluble, thus forming a pattern. A negative photoresist, also known as a photoresist, is a material that undergoes a crosslinking reaction and becomes insoluble after being exposed to ultraviolet light.

[0093] Among them, according to whether a positive photoresist or a negative photoresist is used, the design form of the mask 8 can be divided into two types:

[0094] When a positive photoresist is used as the material of the photoresist layer 6, during the subsequent exposure and development processes, the exposed areas will be removed, leaving the unexposed areas. Therefore, the mask 8 also correspondingly uses a positive mask. In the positive mask, the area corresponding to the micro-nano pattern is the light-transmitting area, and the rest of the area is the light-blocking area. By covering the positive mask on the photoresist layer 6 and then through exposure and development, the photoresist layer 6 corresponding to the light-transmitting area in the positive mask is removed, forming a hollow structure 22, while the photoresist layer 6 in the light-blocking area of the positive mask is retained, forming a plurality of convex structures 21.

[0095] When a negative photoresist is used as the material of the photoresist layer 6, during the subsequent exposure and development processes, the exposed areas will be retained, and the unexposed areas will be removed. Therefore, the mask 8 also correspondingly uses a negative mask. In the negative mask, the area corresponding to the micro-nano pattern is the light-blocking area, and the rest of the area is the light-transmitting area. By covering the negative mask on the photoresist layer 6 and then through exposure and development, the photoresist layer 6 corresponding to the light-blocking area in the negative mask is removed, forming a hollow structure 22, while the photoresist layer 6 in the light-transmitting area of the negative mask is retained, forming a plurality of convex structures 21.

[0096] It can be understood that during the preparation process, a positive photoresist or a negative photoresist can be selected according to the actual situation and process requirements, and the corresponding mask 8 is designed according to the selected photoresist.

[0097] Exemplarily, please refer to Figure 4 in (A), the mask substrate 7 includes two parts, a light-transmitting layer 71 and a light-blocking layer 72. After development, exposure, and etching, the light-transmitting layer 71 remains unchanged, but the light-blocking layer 72 changes according to the design structure of the mask 8. Please refer to Figure 4 in (B), this mask 8 is a positive mask, and the area in the light-blocking layer 72 corresponding to the micro-nano pattern is removed, forming the mask 8.

[0098] In some embodiments, embedding a coloring layer 3 in at least a partially hollowed-out structure 22 includes:

[0099] At least partially immersing the base layer 1 and the shielding layer 2 in a directional dye solution formed by a directional dye, so that the base layer 1 located within the hollowed-out structure 22 forms the coloring layer 3.

[0100] In the embodiments of the present application, a directional dye solution is formed using a directional dye, and then the base and the shielding layer 2 are at least partially immersed in the directional dye solution. Since the directional dye can only color the base layer 1 and cannot color the shielding layer 2, the coloring layer 3 is formed on the base layer 1 located within the hollowed-out structure 22. And the hollowed-out structure 22 corresponds to the micro-nano pattern, so that the micro-nano pattern can present corresponding colors.

[0101] It can be understood that, according to actual needs, partial coloring or full coloring can be achieved. When partial coloring is required, the part of the base layer 1 and the shielding layer 2 that needs to be colored can be immersed in the directional dyeing solution. When full coloring is required, the base layer 1 and the shielding layer 2 can be immersed in the directional dyeing solution as a whole for dipping. In addition, according to actual needs, the coloring layer 3 can also present different colors, such as red, black, yellow, blue, etc.

[0102] Taking the example of using a positive photoresist to prepare a micro-nano pattern structure without the micro-lens array layer 4, the preparation process flow of the embodiments of the present application is introduced. Please refer to Figures 3 - 6 :

[0103] As Figure 3 shown in (A) of, first, the base layer 1 is disposed on the substrate layer 5 to fix and protect the base layer 1. Then, as Figure 3 shown in (B) of, a photoresist layer 6 is coated on the side of the base layer 1 facing away from the substrate layer 5.

[0104] According to the required photoresist pattern, the structure of the mask template 8 is designed. The designed structure of the mask template 8 is imported into a computer, and photolithographic exposure is performed on the mask substrate 7 as shown in (A) of Figure 4 . After development and etching, the mask substrate 7 includes a stacked light-transmitting layer 71 and a light-shielding layer 72. The light-transmitting layer 71 remains unchanged, and the light-shielding layer 72 is partially removed to obtain the mask template 8 as shown in (B) of Figure 4 . Since a positive photoresist is used in the photoresist layer 6, the area of the light-shielding layer 72 corresponding to the micro-nano pattern in the mask template 8 is hollowed out, and the light-shielding layer 72 in the remaining areas is retained.

[0105] As Figure 5 shown in (A) of, the mask template 8 is attached to the side of the photoresist layer 6 facing away from the base layer 1 and placed in a mask exposure machine for exposure and development, thereby obtaining the shielding layer 2. As Figure 5As shown in (B) thereof, the shielding layer 2 includes a plurality of convex structures 21 and hollow structures 22 between adjacent convex structures 21, wherein the hollow structures 22 correspond to the distribution regions of the micro-nano patterns.

[0106] The overall structure including the base layer 1, the substrate layer 5 and the shielding layer 2 is immersed in a directional dye solution prepared with a directional dye, so that a colored layer 3 is formed on the base layer 1, as Figure 6 shown in (A) thereof. Since the directional dye cannot dye the convex structures 21, the micro-nano patterns are colored and the rest are not colored, improving the display effect. After removing the substrate layer 5, the micro-nano pattern structure shown in (B) thereof is obtained. Figure 6 shown in (B) thereof.

[0107] It can be understood that when preparing a micro-nano pattern structure with a microlens array layer 4, first bond the microlens array layer 4 to one side of the base layer 1, and then fix the side of the microlens array layer 4 facing away from the base layer 1 on the substrate layer 5. The remaining steps are the same as those of the micro-nano pattern structure without the microlens array layer 4 and will not be elaborated here.

[0108] According to the third aspect of the present application, a decorative part is further provided, including the above micro-nano pattern structure, or a micro-nano pattern structure prepared by the preparation method of the above micro-nano pattern structure. The vehicle has all the beneficial effects of the above micro-nano pattern structure and will not be elaborated here in the present application.

[0109] According to the fourth aspect of the present application, a vehicle is further provided, including the above decorative part. The vehicle has all the beneficial effects of the above micro-nano pattern structure and will not be elaborated here in the present application.

[0110] According to the fifth aspect of the present application, a mobile phone is further provided, including the above decorative part. The mobile phone has all the beneficial effects of the above micro-nano pattern structure and will not be elaborated here in the present application.

[0111] In the description of the present application, the terms "first" and "second" are only used for descriptive purposes and cannot be understood as indicating or implying relative importance or implicitly specifying the quantity of the indicated technical features. Thus, the features defined with "first" and "second" may explicitly or implicitly include one or more features. In the description of the present application, "a plurality of" means two or more unless otherwise specifically defined.

[0112] In the above embodiments, the descriptions of the respective embodiments have their own emphases. For parts not detailed in a certain embodiment, reference may be made to the relevant descriptions of other embodiments.

[0113] Among the embodiments, implementation manners and related technical features of the present application, they can be combined and replaced with each other without conflict.

[0114] The above are only the preferred embodiments of the present application and do not impose any formal restrictions on the present application. However, any simple modifications, equivalent changes, and decorations made to the above embodiments based on the technical essence of the present application without departing from the content of the technical solution of the present application still fall within the scope of the technical solution of the present application.

Claims

1. A micro-nano pattern structure, characterized in that: include: basal layer; A shielding layer, wherein the shielding layer and the base layer are stacked along a first direction, and the shielding layer comprises a plurality of convex structures arranged at intervals, and a hollow structure is formed between adjacent convex structures; a coloring layer, the coloring layer being stacked on the base layer along the first direction and embedded in at least a portion of the hollow structure; The coloring layer includes a directional dye; wherein the directional dye is configured to dye only the base layer; The materials of the protruding structures in the base layer and the shielding layer are different, and the directional dye has a higher affinity for the base layer and a lower affinity for the protruding structures. Therefore, in the process of dyeing the base layer and the shielding layer as a whole, the directional dye can only be adsorbed on the base layer but cannot be adsorbed on the protruding structures, thereby directionally coloring the base layer.

2. The micro-nano pattern structure according to claim 1, characterized in that: The material of the base layer includes one of polycarbonate, polyethylene terephthalate and glass.

3. The micro-nano pattern structure according to claim 2, characterized in that: The width of any one of the protrusion structures along the second direction is 1-1000 μm; And / or, the width of any one of the hollow structures along the second direction is 1-1000 μm; The second direction and the first direction are perpendicular to each other.

4. The micro-nano pattern structure according to claim 1, characterized in that: The thickness of the coloring layer along the first direction is greater than 0 μm and less than or equal to 15 μm.

5. The micro-nano pattern structure according to any one of claims 1 to 4, characterized in that: Also included is a microlens array layer; The microlens array layer is laminated on a side of the base layer away from the shielding layer.

6. The micro-nano pattern structure according to claim 5, characterized in that: The microlens array layer includes a plurality of microlenses arranged in sequence, and the microlenses are arranged in one-to-one correspondence with the hollow structures.

7. A method for preparing a micro-nano pattern structure, used for preparing the micro-nano pattern structure according to any one of claims 1 to 6, characterized in that: include: Provides a base layer; forming a photoresist layer on the base layer; Covering a mask plate on a side of the photoresist layer away from the base layer to form a mask structure; Exposing and developing the mask structure, so that the photoresist layer forms a shielding layer; wherein the shielding layer includes a plurality of convex structures arranged at intervals, and a hollow structure is formed between adjacent convex structures; Embedding a colored layer in at least a portion of the hollow structure to obtain the micro-nano pattern structure; The coloring layer includes a directional dye; wherein the directional dye is configured to dye only the base layer.

8. The method for preparing a micro-nano pattern structure according to claim 7, characterized in that: The step of embedding the colored layer in at least a portion of the hollow structure comprises: The base layer and the shielding layer are immersed in a directional dye solution formed by directional dyes, so that the coloring layer is formed on the base layer located in the hollow structure.

9. The method for preparing a micro-nano pattern structure according to claim 7, characterized in that: The step of forming a photoresist layer on the base layer comprises: fixing the base layer to the substrate layer; A photoresist is coated on the side of the base layer facing away from the substrate layer to form the photoresist layer.

10. The method for preparing a micro-nano pattern structure according to claim 9, characterized in that: Before fixing the base layer on the substrate layer, the method further comprises: providing a microlens array layer; Disposing the microlens array layer on one side of the base layer; The step of fixing the base layer on the substrate layer comprises: The side of the microlens array layer facing away from the base layer is fixed on the substrate layer.

11. A decorative part, characterized in that: The invention comprises the micro-nano pattern structure as described in any one of claims 1 to 6, or the micro-nano pattern structure prepared by the preparation method of the micro-nano pattern structure as described in any one of claims 7 to 10.

12. A vehicle, characterized in that: Comprising the decorative element as claimed in claim 11.

13. A mobile phone, characterized in that: Comprising the decorative element as claimed in claim 11.

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