A workpiece stage system for electron beam exposure machine

Abstract

The present invention discloses a workpiece stage system for an electron beam exposure machine. The system comprises a plurality of adjustment supports uniformly distributed at the bottom of a mounting base plate. The system comprises a transmission assembly including an X-axis transmission assembly and a Y-axis rotation assembly. The X-axis transmission assembly is mounted on the mounting base plate, and its output end is connected to a connecting plate. The Y-axis rotation assembly is mounted on the connecting plate, and its output end is connected to a moving top plate for carrying a workpiece. The bottom of the connecting plate is provided with an X-axis reference groove, and the top of the connecting plate is provided with a Y-axis reference groove. The system comprises an X-axis guide rail and a Y-axis guide rail. The X-axis guide rail is mounted on the mounting base plate and slidably engages with the X-axis reference groove. The Y-axis guide rail is mounted on the moving top plate and slidably engages with the Y-axis reference groove. Driven by the X-axis transmission assembly, the connecting plate drives the moving top plate to move along the X-axis on the mounting base plate. Driven by the Y-axis rotation assembly, the moving top plate moves along the Y-axis on the connecting plate. The system has the advantages of compact structure, simple operation, and high motion precision.

Description

Technical Field

[0001] The present invention relates to the technical field of electron beam exposure, and in particular to an ultra-precision workpiece stage system inside an electron beam exposure machine. Background Art

[0002] Electron beam lithography (EBLI) systems are primarily used in the field of micro- and nano-fabrication. EB lithography can directly produce the desired pattern under computer control, is easily modifiable, and has a short production cycle. Therefore, it is widely used in the production of photomasks and X-ray masks, and has become the primary method for making reticles in the microelectronics industry. EB lithography systems also utilize mark detection technology to achieve extremely high overlay accuracy, enabling direct on-wafer tracing—that is, fabricating devices directly on the wafer without a mask. Consequently, EB lithography is used in the development of new devices and integrated circuits, as well as in the production of small batches of these devices and integrated circuits.

[0003] The biggest feature of electron beam exposure is its extremely high resolution. The accuracy of its graphic splicing mainly depends on the accuracy and stability of the beam workpiece stage. The key to accuracy and stability is positioning accuracy and the orthogonality of the cross platform.

[0004] The better the orthogonality, the higher the positioning accuracy, the smaller the splicing error of the exposed pattern, and the higher the pattern accuracy. Therefore, high orthogonality and good positioning accuracy are key to large-field exposure performance. A good workpiece stage system can ensure good splicing accuracy in large-field exposure using an electron beam exposure machine. Summary of the Invention

[0005] The technical problem to be solved by the present invention is to overcome the deficiencies of the prior art and provide a workpiece stage system for an electron beam exposure machine which has a compact structure, simple operation and high movement precision.

[0006] In order to solve the above technical problems, the present invention adopts the following technical solutions:

[0007] A workpiece stage system for an electron beam exposure machine comprises: an adjustment support, a mounting base, a guide rail, a transmission assembly, a connecting plate and a moving top plate, wherein the moving top plate is used to carry a workpiece; a plurality of the adjustment supports are evenly distributed on the bottom of the mounting base plate, the transmission assembly comprises an X-axis transmission assembly and a Y-axis rotation assembly, the X-axis transmission assembly is mounted on the mounting base plate, the output end of the X-axis transmission assembly is connected to the connecting plate, the Y-axis rotation assembly is mounted on the connecting plate, and the output end of the Y-axis rotation assembly is connected to the moving top plate; an X-axis reference groove is provided at the bottom of the connecting plate, and a Y-axis reference groove is provided at the top of the connecting plate; the guide rail comprises an X-axis guide rail and a Y-axis guide rail, the X-axis guide rail is mounted on the mounting base plate and slidably cooperates with the X-axis reference groove, the Y-axis guide rail is mounted on the moving top plate and slidably cooperates with the Y-axis reference groove; under the drive of the X-axis transmission assembly, the connecting plate drives the moving top plate to move along the X-axis direction on the mounting base plate, and under the drive of the Y-axis rotation assembly, the moving top plate moves along the Y-axis direction on the connecting plate.

[0008] As a further improvement of the present invention, a grating scale measuring assembly is provided on the mounting base plate to measure the displacement of the connecting plate and the moving top plate and to feed back the position signal to an external control system.

[0009] As a further improvement of the present invention, the installation base plate is provided with auxiliary components for supporting cables and drag chains.

[0010] As a further improvement of the present invention, the X-axis reference grooves are arranged in parallel in pairs at the bottom of the connecting plate, and the Y-axis reference grooves are arranged in parallel in pairs at the top of the connecting plate, and the X-axis reference grooves and the Y-axis reference grooves are arranged in a cross shape.

[0011] As a further improvement of the present invention, the parallelism error between two parallel reference grooves is less than 5 μm; the parallelism error of the reference grooves at the bottom and top of the connecting plate is less than 3 μm.

[0012] As a further improvement of the present invention, the adjustment support includes: a mounting base, a mounting slider, an adjusting nut and a center locking screw; the bottom of the adjusting nut is threadedly engaged with the top of the mounting base to adjust the horizontal height and flatness of the workbench system; the top of the mounting slider is connected to the mounting base plate, and the bottom of the mounting slider is engaged with the top of the adjusting nut through an arc-shaped groove to enable the mounting base plate to have a yaw angle; the mounting slider is connected and fixed to the mounting base by a center locking screw.

[0013] As a further improvement of the present invention, the adjustment support also includes: a locking nut, a base locking screw and a slider locking screw; the locking nut is located between the adjusting nut and the mounting base, and is used to lock the adjusting nut; the base locking screw is located at the bottom of the mounting base, and is used to lock the mounting base; the slider locking screw is located at the top of the mounting slider, and is used to lock and fix the mounting slider to the mounting base.

[0014] As a further improvement of the present invention, the X-axis transmission assembly and the Y-axis rotation assembly have the same structural arrangement; the X-axis transmission assembly includes a drive motor, a coupling, a grouped angular contact bearing, a ball screw assembly, a deep groove ball bearing, a bearing seat fixing assembly, a screw slider and a support bearing seat; one end of the ball screw assembly extends into the bearing seat fixing assembly and is connected to the output end of the drive motor through a coupling, and a grouped angular contact bearing is provided at the connection between the bearing seat fixing assembly and the ball screw assembly; the other end of the ball screw assembly is connected to the support bearing seat through a deep groove ball bearing, and the bearing seat fixing assembly and the support bearing seat are both fixed on the mounting base plate; the screw slider is slidably arranged on the ball screw assembly and is connected to the bottom of the connecting plate.

[0015] As a further improvement of the present invention, the X-axis transmission assembly also includes a sealed housing and a differential pumping assembly; the sealed housing is connected and fixed to the bearing seat fixing assembly, the drive motor is sealed in the sealed housing, and the sealed housing is filled with inert gas; a plurality of differential pumping assemblies are provided on the sealed housing, and the differential pumping assemblies are used to reduce the pressure difference between the inside and outside of the sealed housing.

[0016] As a further improvement of the present invention, a shielding layer is provided on the moving top plate to achieve magnetic shielding.

[0017] Compared with the prior art, the advantages of the present invention are:

[0018] 1. The workpiece stage system of the electron beam exposure machine of the present invention is composed of the main structure of the workpiece stage system through an adjustment support, a mounting base, a guide rail, a transmission assembly, a connecting plate and a moving top plate for carrying the workpiece, which has the characteristics of compact structure and convenient disassembly and assembly; specifically, a plurality of adjustment supports are evenly distributed at the bottom of the mounting base, and the horizontal height and flatness adjustment of the workpiece stage system are achieved by using the adjustment supports, thereby improving the support stability of the workpiece stage system; further, the transmission assembly includes an X-axis transmission assembly and a Y-axis rotation assembly, the X-axis transmission assembly is mounted on the mounting base, and its output end is connected to the connecting plate, the Y-axis rotation assembly is mounted on the connecting plate, and its output end is connected to the moving top plate; at the same time, the connecting plate The bottom and top of the are respectively provided with an X-axis reference groove and a Y-axis reference groove. The guide rails include an X-axis guide rail and a Y-axis guide rail. The X-axis guide rail is mounted on the mounting base and slides with the X-axis reference groove. The Y-axis guide rail is mounted on the moving top plate and slides with the Y-axis reference groove. Driven by the X-axis transmission assembly, the connecting plate drives the moving top plate to move along the X-axis direction on the mounting base. Driven by the Y-axis rotation assembly, the moving top plate moves along the Y-axis direction on the connecting plate. By cooperating with the reference groove and the guide rail, a positioning accuracy of 2μm, a repeat positioning accuracy of 1μm, an orthogonality of 1 arc second within a travel range of 200 are achieved, which well meets the splicing accuracy requirements of large-field exposure of the exposure machine.

[0019] 2. The workpiece table system of the electron beam exposure machine of the present invention has the advantages of long support length, high operating rigidity, good stability, etc. by fixing the double V-cross roller guide rails on the connecting plate of the cross-cross structure, and has good suppression of external vibration excitation; at the same time, the reference grooves of the four guide rails are concentrated on the connecting plate, and these four reference grooves are processed by one clamping, which can well guarantee the form and position tolerances, and relative positions, and ensure the orthogonality of the connecting plate and the upper and lower platforms of the moving top plate, thereby ensuring the accuracy of the displacement of the connecting plate and the moving top plate, and eliminating the errors caused by repeated clamping.

[0020] 3. The workpiece stage system of the electron beam exposure machine of the present invention uses a laser grating ruler measurement component to pre-compensate the moving platform composed of the connecting plate and the moving top plate, making it an inherent property of the system and no longer requiring compensation during subsequent operation; the workpiece stage system of the present invention has a simple structure and compact size, and can be conveniently installed in the exposure chamber, saving the size of the exposure chamber. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 It is a schematic diagram of the three-dimensional structure principle of the workpiece stage system of the electron beam exposure machine in a specific embodiment of the present invention.

[0022] Figure 2 It is a schematic side view of the structural principle of the workpiece stage system of the electron beam exposure machine in a specific embodiment of the present invention.

[0023] Figure 3 This is a schematic diagram of the side structural principle of the workpiece stage system of the electron beam exposure machine in a specific embodiment of the present invention from another angle.

[0024] Figure 4 It is a schematic diagram of the three-dimensional structural principle of the adjustment support in a specific embodiment of the present invention.

[0025] Figure 5 It is a schematic diagram of the side structural principle of the adjustment support in a specific embodiment of the present invention.

[0026] Figure 6 Schematic diagram of the structural principle of the transmission assembly in a specific embodiment of the present invention.

[0027] Legend: 1. Adjustment support; 11. Mounting base; 12. Locking nut; 13. Mounting slider; 14. Adjustment nut; 15. Base locking screw; 16. Slide locking screw; 17. Center locking screw; 2. Mounting base plate; 3. Guide rail; 31. X-axis guide rail; 32. Y-axis guide rail; 4. Transmission assembly; 401. X-axis transmission assembly; 402. Y-axis rotation assembly; 41. Drive motor; 42. Coupling; 43. Grouped angular contact bearing; 44. Ball screw assembly; 45. Deep groove ball bearing; 46. Sealed housing; 47. Differential extraction assembly; 48. Bearing seat fixing assembly; 49. Screw slider; 410. Support bearing seat; 5. Connecting plate; 51. X-axis reference groove; 52. Y-axis reference groove; 6. Moving top plate; 7. Grating scale measurement assembly; 8. Auxiliary assembly; 9. Shielding layer. DETAILED DESCRIPTION

[0028] The present invention will be further described below in conjunction with the accompanying drawings and specific preferred embodiments, but the scope of protection of the present invention is not limited thereby.

[0029] Example

[0030] like Figures 1 to 6As shown, the workpiece stage system of the electron beam exposure machine of the present invention includes: an adjustment support 1, a mounting base 2, a guide rail 3, a transmission assembly 4, a connecting plate 5 and a movable top plate 6, and the movable top plate 6 is used to carry the workpiece. Four adjustment supports 1 are evenly distributed at the four corners of the bottom of the mounting base 2 to adjust the horizontal height and flatness of the entire workpiece stage system. The transmission assembly 4 includes an X-axis transmission assembly 401 and a Y-axis rotation assembly 402; the X-axis transmission assembly 401 is installed on the mounting base 2, and the output end of the X-axis transmission assembly 401 is connected to the connecting plate 5; the Y-axis rotation assembly 402 is installed on the connecting plate 5, and the output end of the Y-axis rotation assembly 402 is connected to the movable top plate 6. The bottom of the connecting plate 5 is provided with an X-axis reference groove 51, and the top of the connecting plate 5 is provided with a Y-axis reference groove 52. The guide rail 3 includes an X-axis guide rail 31 and a Y-axis guide rail 32. The X-axis guide rail 31 is mounted on the mounting base 2 and slides with the X-axis reference groove 51. The Y-axis guide rail 32 is mounted on the moving top plate 6 and slides with the Y-axis reference groove 52. Driven by the X-axis transmission assembly 401, the connecting plate 5 drives the moving top plate 6 to move along the X-axis on the mounting base 2. Driven by the Y-axis rotation assembly 402, the moving top plate 6 moves along the Y-axis on the connecting plate 5.

[0031] In this embodiment, the main structure of the workpiece stage system is composed of an adjustment support 1, a mounting base 2, a guide rail 3, a transmission assembly 4, a connecting plate 5 and a moving top plate 6 for carrying the workpiece, which has the characteristics of compact structure and convenient assembly and disassembly. Specifically, a plurality of adjustment supports 1 are evenly distributed at the bottom of the mounting base 2. The adjustment supports 1 are used to adjust the horizontal height and flatness of the workpiece stage system, thereby improving the support stability of the workpiece stage system. Furthermore, the transmission assembly 4 includes an X-axis transmission assembly 401 and a Y-axis rotation assembly 402. The X-axis transmission assembly 401 is mounted on the mounting base 2, and its output end is connected to the connecting plate 5. The Y-axis rotation assembly 402 is mounted on the connecting plate 5, and its output end is connected to the moving top plate 6. At the same time, the bottom and top of the connecting plate 5 are respectively provided with an X-axis reference groove 51 and a Y-axis reference groove 52. The guide rail 3 includes an X-axis guide rail 31 and a Y-axis guide rail 32. The X-axis guide rail 31 is mounted on the mounting base 2 and slides with the X-axis reference groove 51. The Y-axis The guide rail 32 is installed on the moving top plate 6 and slides with the Y-axis reference groove 52; driven by the X-axis transmission component 401, the connecting plate 5 drives the moving top plate 6 to move along the X-axis direction on the mounting base 2, and driven by the Y-axis rotation component 402, the moving top plate 6 moves along the Y-axis direction on the connecting plate 5. Through the cooperation between the reference groove and the guide rail, a positioning accuracy of 2μm, a repeatability of 1μm, and an orthogonality of 1 arc second within a travel range of 200 are achieved, which well meets the splicing accuracy requirements of large-field exposure of the exposure machine.

[0032] like Figure 2As shown, in this embodiment, a grating scale measuring assembly 7 is provided on the mounting base plate 2 for measuring the displacement of the connecting plate 5 and the moving top plate 6, and feeding back the position signal to an external control system to achieve precise control of the displacement of the workpiece stage.

[0033] like Figure 1 and Figure 3 As shown, in this embodiment, an auxiliary component 8 is provided on the mounting base plate 2 for supporting cables and drag chains, thereby improving the appearance and neatness of the workpiece platform system.

[0034] like Figure 1 As shown, in this embodiment, a shielding layer 9 is provided on the moving top plate 6, and the shielding layer 9 is used to magnetically shield the driving elements located below the moving top plate 6 to improve the safety of workpiece exposure.

[0035] In this embodiment, X-axis reference grooves 51 are arranged in pairs at the bottom of the connecting plate 5, and Y-axis reference grooves 52 are arranged in pairs at the top of the connecting plate 5, forming a cross. The connecting plate 5 integrates four guide rail mounting datums. These four datums are machined and assembled simultaneously on a machine tool, resulting in high machining accuracy.

[0036] Furthermore, the parallelism error between any two parallel reference grooves is less than 5 μm, and the parallelism error between the reference grooves at the bottom and top of the connecting plate 5 is less than 3 μm. Tests have shown that after adjustment, the orthogonality is 3 arc seconds without laser interferometer compensation, and 1 arc second with laser interferometer compensation.

[0037] like Figure 4 and Figure 5 As shown, the adjustment support 1 includes: a mounting base 11, a mounting slider 13, an adjustment nut 14, and a center locking screw 17. The bottom of the adjustment nut 14 mates with the top of the mounting base 11 with an M30×0.25 fine thread, which is used to adjust the horizontal height and flatness of the workbench system; the fine thread adjustment has high precision, with a minimum adjustment height of 1μm. The top of the mounting slider 13 is connected to the mounting base 2, and the bottom of the mounting slider 13 mates with the top of the adjustment nut 14 via an arc-shaped groove to achieve a certain deflection angle of the mounting base 2. The mounting slider 13 is fixed to the mounting base 11 by a center locking screw 17 to improve the overall stability of the adjustment support 1.

[0038] Furthermore, the adjustment support 1 includes a locking nut 12, a base locking screw 15, and a slider locking screw 16. The locking nut 12 is located between the adjustment nut 14 and the mounting base 11 and is used to lock the adjustment nut 14. After the height of the workpiece stage system is adjusted, the locking nut 12 is used to lock the adjustment nut 14. The base locking screw 15 is located at the bottom of the mounting base 11 and is used to lock the mounting base 11 to ensure that the workpiece stage system is fixed in the exposure chamber. The slider locking screw 16 is located at the top of the mounting slider 13 and is used to lock the mounting slider 13 to the mounting base 2.

[0039] like Figure 6 As shown, in this embodiment, the X-axis transmission assembly 401 and the Y-axis rotation assembly 402 have the same structural configuration. The X-axis transmission assembly 401 includes a drive motor 41, a coupling 42, a set of angular contact bearings 43, a ball screw assembly 44, a deep groove ball bearing 45, a bearing seat fixing assembly 48, a screw slider 49, and a support bearing seat 410. One end of the ball screw assembly 44 extends into the bearing seat fixing assembly 48 and is connected to the output end of the drive motor 41 via the coupling 42. The set of angular contact bearings 43 is provided at the connection between the bearing seat fixing assembly 48 and the ball screw assembly 44. The other end of the ball screw assembly 44 is connected to the support bearing seat 410 via a deep groove ball bearing 45. Both the bearing seat fixing assembly 48 and the support bearing seat 410 are fixed to the mounting base 2. The straightness of the adjustment screw is parallel to the edge of the mounting base 2, with a parallelism error of less than 5μm. The screw slider 49 is slidably mounted on the ball screw assembly 44 and connected to the bottom of the connecting plate 5. Similarly, the Y-axis rotation assembly 402 is disposed on the connecting plate 5 and connected to the moving top plate 6 to drive the moving top plate 6 to move.

[0040] Furthermore, the X-axis transmission assembly 401 includes a sealed housing 46 and a differential pump assembly 47. The sealed housing 46 is connected and fixed to the bearing seat fixing assembly 48. The drive motor 41 is sealed and disposed within the sealed housing 46. The sealed housing 46 is filled with an inert gas (e.g., nitrogen). A plurality of differential pump assemblies 47 are provided on the sealed housing 46 to reduce the pressure difference between the inside and outside of the sealed housing 46.

[0041] In this embodiment, the transmission assembly uses a high-precision preloaded ball screw to eliminate the screw's return clearance and improve operational accuracy. Since this transmission assembly operates in a vacuum, the motor dissipates heat slowly in a vacuum, and the motor's temperature rise will be transmitted to the screw, thereby affecting operational accuracy. Therefore, the drive motor 41 is separately sealed, and nitrogen is introduced into the sealed housing 46 to provide convection cooling for the drive motor 41. Furthermore, since there is a large pressure difference between the interior of the sealed housing 46 and the external vacuum, a large pressure difference can easily cause large leaks. Therefore, a differential pumping assembly 47 is installed at the position of the vacuum dynamic seal of the sealed housing 46. The differential pumping can greatly reduce the pressure difference between the inside and outside of the sealed housing 46, reduce the risk of leakage, and ensure stable pressure in the exposure chamber.

[0042] Although the present invention is disclosed above with reference to preferred embodiments, it is not intended to limit the present invention. Any person skilled in the art can, without departing from the spirit and technical solutions of the present invention, use the methods and technical contents disclosed above to make many possible changes and modifications to the technical solutions of the present invention, or modify them into equivalent embodiments with equivalent changes. Therefore, any simple modification, equivalent replacement, equivalent change and modification made to the above embodiments based on the technical spirit of the present invention without departing from the content of the technical solutions of the present invention, shall still fall within the scope of protection of the technical solutions of the present invention.

Claims

1. A workpiece stage system for an electron beam exposure machine, characterized in that: include: An adjusting support (1), a mounting base (2), a guide rail (3), a transmission assembly (4), a connecting plate (5) and a moving top plate (6), wherein the moving top plate (6) is used to carry a workpiece; a plurality of the adjusting supports (1) are evenly distributed at the bottom of the mounting base (2); the transmission assembly (4) comprises an X-axis transmission assembly (401) and a Y-axis rotation assembly (402); the X-axis transmission assembly (401) is mounted on the mounting base (2); the output end of the X-axis transmission assembly (401) is connected to the connecting plate (5); the Y-axis rotation assembly (402) is mounted on the connecting plate (5); the output end of the Y-axis rotation assembly (402) is connected to the moving top plate (6); the bottom of the connecting plate (5) An X-axis reference groove (51) is provided, and a Y-axis reference groove (52) is provided on the top of the connecting plate (5); the guide rail (3) includes an X-axis guide rail (31) and a Y-axis guide rail (32); the X-axis guide rail (31) is mounted on the mounting base plate (2) and is slidably matched with the X-axis reference groove (51); the Y-axis guide rail (32) is mounted on the moving top plate (6) and is slidably matched with the Y-axis reference groove (52); under the drive of the X-axis transmission component (401), the connecting plate (5) drives the moving top plate (6) to move along the X-axis direction on the mounting base plate (2); under the drive of the Y-axis rotation component (402), the moving top plate (6) moves along the Y-axis direction on the connecting plate (5); The X-axis transmission assembly (401) and the Y-axis rotation assembly (402) have the same structural arrangement; the X-axis transmission assembly (401) comprises a drive motor (41), a coupling (42), a grouped angular contact bearing (43), a ball screw assembly (44), a deep groove ball bearing (45), a bearing seat fixing assembly (48), a screw slider (49) and a support bearing seat (410); one end of the ball screw assembly (44) extends into the bearing seat fixing assembly (48) and is connected to the Y-axis rotation assembly (402) through the coupling (42). The output end of the driving motor (41) is connected, and a group of angular contact bearings (43) are provided at the connection between the bearing seat fixing assembly (48) and the ball screw assembly (44); the other end of the ball screw assembly (44) is connected to the support bearing seat (410) through a deep groove ball bearing (45), and the bearing seat fixing assembly (48) and the support bearing seat (410) are both fixed on the mounting base (2); the screw slider (49) is slidably arranged on the ball screw assembly (44) and connected to the bottom of the connecting plate (5); The X-axis transmission assembly (401) further includes a sealing housing (46) and a differential pumping assembly (47); the sealing housing (46) is connected and fixed to the bearing seat fixing assembly (48); the drive motor (41) is sealed and arranged in the sealing housing (46); the sealing housing (46) is filled with an inert gas; a plurality of differential pumping assemblies (47) are provided on the sealing housing (46), and the differential pumping assemblies (47) are used to reduce the pressure difference between the inside and outside of the sealing housing (46).

2. The workpiece stage system of the electron beam exposure machine according to claim 1, characterized in that: A grating ruler measuring assembly (7) is provided on the mounting base plate (2) for measuring the displacement of the connecting plate (5) and the moving top plate (6), and feeding back the position signal to an external control system.

3. The workpiece stage system of the electron beam exposure machine according to claim 2, characterized in that: An auxiliary component (8) is provided on the installation base plate (2) for supporting cables and drag chains.

4. The workpiece stage system of the electron beam exposure machine according to claim 3, characterized in that: The X-axis reference grooves (51) are arranged in parallel in pairs at the bottom of the connecting plate (5), and the Y-axis reference grooves (52) are arranged in parallel in pairs at the top of the connecting plate (5), and the X-axis reference grooves (51) and the Y-axis reference grooves (52) are arranged in a cross shape.

5. The workpiece stage system of the electron beam exposure machine according to claim 4, characterized in that: The parallelism error between two parallel reference grooves is less than 5 μm; the parallelism error between the reference grooves at the bottom and top of the connecting plate (5) is less than 3 μm.

6. The workpiece stage system of the electron beam exposure machine according to claim 3, characterized in that: The adjustment support (1) comprises: a mounting base (11), a mounting slider (13), an adjustment nut (14) and a central locking screw (17); the bottom of the adjustment nut (14) is threadedly engaged with the top of the mounting base (11) to adjust the horizontal height and flatness of the workbench system; the top of the mounting slider (13) is connected to the mounting base plate (2), and the bottom of the mounting slider (13) is engaged with the top of the adjustment nut (14) through an arc groove to achieve a deflection angle of the mounting base plate (2); the mounting slider (13) and the mounting base (11) are connected and fixed by the central locking screw (17).

7. The workpiece stage system of the electron beam exposure machine according to claim 6, characterized in that: The adjusting support (1) further comprises: a locking nut (12), a base locking screw (15) and a slider locking screw (16); the locking nut (12) is located between the adjusting nut (14) and the mounting base (11) and is used to lock the adjusting nut (14); the base locking screw (15) is located at the bottom of the mounting base (11) and is used to lock the mounting base (11); the slider locking screw (16) is located at the top of the mounting slider (13) and is used to lock and fix the mounting slider (13) to the mounting base plate (2).

8. The workpiece stage system of an electron beam exposure machine according to any one of claims 1 to 7, characterized in that: A shielding layer (9) is provided on the moving top plate (6) to achieve magnetic shielding.

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