Semiconductor baffle film stripping and cleaning device and cleaning method thereof

Abstract

The present invention discloses a semiconductor baffle film stripping cleaning device and a cleaning method thereof, belonging to the technical field of semiconductor device processing, the cleaning device comprises a cleaning pool, the cleaning pool comprises a decontamination pool and a clean water pool, a support member is fixed in the decontamination pool, a first connecting plate is fixed at one end of the decontamination pool, a vertical first electric telescopic rod is fixed above the first connecting plate, a horizontal second electric telescopic rod is vertically fixed on the output shaft of the first electric telescopic rod, a vertical first connecting strip is fixed on the output shaft of the second electric telescopic rod, a pressing plate is fixed at the lower end of the first connecting strip, and a rubber layer is provided below the pressing plate. The cleaning device of the present invention can rub the upper side of the baffle in the support member by providing an elastic support member and a pressing plate that can be lifted and moved left and right, so as to control the baffle to rotate in the decontamination pool, and during the rotation, the bristles can scrub the outer wall and end of the baffle, and the brush head can scrub the inner wall of the baffle.

Description

Technical Field

[0001] The invention belongs to the technical field of semiconductor device processing, and in particular relates to a semiconductor baffle film stripping and cleaning device and a cleaning method thereof. Background Art

[0002] The semiconductor baffle is an annular etching baffle used in the high-end process of chip semiconductor etching. Semiconductor baffle stripping refers to a process in the semiconductor production process. After the semiconductor has undergone the etching process, the required pattern has been obtained, but this layer of pattern is etched under the protection of a dry film or a wet film. Because the etching solution will corrode the conductive metal on the baffle, a dry film or a wet film is used to protect the required pattern. However, after obtaining the required pattern, the dry film or wet film covering the baffle must be removed. Most factories use NaOH solution as the solution used to remove the film on the baffle.

[0003] Since the semiconductor baffle is annular and the diameters of semiconductor baffles of different specifications are usually different, it is difficult to brush semiconductor baffles of different sizes in batches, and brushing the semiconductor baffles one by one is inefficient, and after the film stripping and cleaning are completed, they are usually left to drain. However, the draining time is often greatly affected by the environment. For a low temperature and windless environment, the drying time is long, resulting in low cleaning efficiency. In order to solve the above problems, a semiconductor baffle film stripping and cleaning device and a cleaning method thereof are provided.

[0004] It should be noted that the above contents belong to the technical knowledge of the inventor and do not necessarily constitute prior art. Summary of the invention

[0005] In order to solve the above problems, the object of the present invention is to provide a

[0006] To achieve the above objectives, the present invention proposes a semiconductor baffle stripping and cleaning device for cleaning the baffle, the baffle is annular, the cleaning device comprises a cleaning pool, the cleaning pool comprises a decontamination pool and a clean water pool, and a support is fixed in the decontamination pool.

[0007] A first connecting plate is fixed at one end of the decontamination tank, a vertical first electric telescopic rod is fixed above the first connecting plate, a horizontal second electric telescopic rod is vertically fixed on the output shaft of the first electric telescopic rod, a vertical first connecting strip is fixed on the output shaft of the second electric telescopic rod, a pressing plate is fixed at the lower end of the first connecting strip, and a rubber layer is provided below the pressing plate.

[0008] The support member includes a plurality of first sleeves, which are fixed on the bottom plate of the decontamination tank, a first sliding shaft is sleeved on the upper end of the first sleeve, a rectangular box is fixed on the upper end of the first sliding shaft, a first spring is fixedly connected between the rectangular box and the first sleeve, bristles are provided on the inner wall of the rectangular box, and the second electric telescopic rod is parallel to the side wall of the rectangular box.

[0009] Furthermore, the cleaning device also includes symmetrically distributed connecting tables, two connecting tables are respectively located on both sides of the cleaning pool, a storage table is provided on one side of the connecting table, a plurality of storage boxes for storing baffles are placed on the storage table, and a transfer component is slidably provided on the connecting table;

[0010] Furthermore, a first guide rail parallel to the cleaning pool is provided above the connecting platform.

[0011] The transfer assembly includes an electric first slider, which slides in a first guide rail. A vertical third electric telescopic rod is fixed above the first slider, a first drive box is fixed on the output shaft of the third electric telescopic rod, a first motor is fixed in the first drive box, and the output shaft of the first motor passes through the top plate of the first drive box and is fixed with a first connecting block.

[0012] A first cylinder is fixed to one side of the first connecting block, the output shaft of the first cylinder passes through the first connecting block and is fixed with a second drive box, a second motor is fixed in the second drive box, the output shaft of the second motor passes through the second drive box and is vertically fixed to a side plate on a side away from the first cylinder, and the second connecting block is fixed on the output shaft of the fourth electric telescopic rod.

[0013] A third motor is fixed to the side of the second connecting block close to the second motor, and the output shaft of the third motor passes through the second connecting block and is fixed with a horizontal second connecting strip, a plurality of second sliding shafts are slidably provided on the second connecting strip, the second sliding shafts are perpendicular to the second connecting strip, a U-shaped support plate is fixed to one end of the second sliding shaft, and a second connecting plate is fixed to the other end, a second spring is fixedly connected between the U-shaped support plate and the second connecting strip, and a brush head is fixed to the side of the second connecting plate away from the second connecting strip.

[0014] Furthermore, a loading assembly for loading the storage box is slidably provided on the storage table.

[0015] Furthermore, the storage table is provided with a second guide rail parallel to the first guide rail;

[0016] The loading assembly includes an electric second slider, the second slider is located in the second guide rail and slides, a vertical fifth electric telescopic rod is fixed above the second slider, a third connecting block is fixed on the output shaft of the fifth electric telescopic rod, a second cylinder is fixed on the side of the third connecting block away from the cleaning tank, and the output shaft of the second cylinder passes through the third connecting block and is fixed with a third drive box.

[0017] A fourth motor is fixed in the third driving box, and an output shaft of the fourth motor passes through a side plate of the third driving box away from the second cylinder, and a horizontal storage barrel is fixed thereon, the barrel mouth of the storage barrel is located at the end away from the fourth motor, and a first arc-shaped support plate is slidingly provided in the storage barrel, one end of the first support plate is located outside, and a barrel cover is fixed to the end of the first support plate located outside.

[0018] A vertical push plate is slidably provided in the storage barrel, and a third spring is fixedly connected between the push plate and the storage barrel. In the natural state of the third spring, the push plate is located at the barrel mouth of the storage barrel.

[0019] Furthermore, a depression is provided at one end of the first support plate close to the barrel cover, a third cylinder is fixed to the bottom of the first support plate, and an output shaft of the third cylinder passes through the first support plate and is fixed with an arc-shaped support bar.

[0020] The loading assembly also includes a locking piece for connecting the barrel cover and the storage barrel. When the barrel cover is connected to the storage barrel, a gap is left between the barrel cover and the storage barrel.

[0021] Furthermore, the locking member includes a connecting sleeve fixed on one side of the barrel cover, a vertical third sliding shaft is slidably provided on the connecting sleeve, a driving block is fixed on the upper end of the third sliding shaft, a connecting rod is vertically fixed below, an insert block is fixed on the connecting rod, and the locking member also includes a limiting sleeve fixed on one side of the storage barrel.

[0022] Furthermore, a first distance sensor is fixed at the center of the bottom plate in the storage box, and a second distance sensor is fixed on the second connecting strip. The first distance sensor and the second distance sensor are electrically connected to a preset control system. The first distance sensor is used to detect the distance between the maximum baffle stored in the storage box and the bottom plate of the storage box.

[0023] Furthermore, NaOH solution is added into the decontamination tank, and cleaning water is contained in the clean water tank.

[0024] A semiconductor baffle film stripping and cleaning method is applied to the above-mentioned cleaning device, and the cleaning method comprises the following steps:

[0025] S1: Loading the baffle;

[0026] The locking part is controlled to open through the transfer component, the first support plate is pulled out of the storage barrel to a preset length, and then a plurality of baffles are placed upright on the first support plate. When the placement is completed, the insert block is controlled by the transfer component to be inserted into the limit sleeve.

[0027] The baffle to be loaded is controlled to move to the top of the corresponding storage box, the gap is controlled to rotate downward by starting the fourth motor, and the corresponding baffle is pushed out of the gap into the storage box by starting the third cylinder to control the movement of the support bar, thereby realizing the loading of the baffle.

[0028] S2: transport the baffle to the decontamination tank;

[0029] The baffles are placed one by one in the rectangular box by using the transfer assembly. The specific operations are as follows:

[0030] By controlling the second connecting strip to be inserted into the corresponding baffle, and ensuring that the axis of the third motor passes through the center of the largest baffle in the rectangular box, the third motor is started to control the second connecting strip to rotate. If the distance detected by the second distance sensor when facing upward is the same as the distance detected when facing downward, the corresponding U-shaped support plate is directly controlled to move to correspond to the baffle, and the corresponding baffle is taken out of the rectangular box by contracting the fourth electric telescopic rod and hung on the corresponding U-shaped support plate. If the distance detected by the second distance sensor when facing upward is different from the distance detected when facing downward, the corresponding U-shaped support plate is controlled to move to correspond to the baffle, and the smallest baffle in the rectangular box is lifted by contracting the fourth electric telescopic rod, and the corresponding baffle is taken out by starting the first cylinder and hung on the corresponding U-shaped support plate. When all the U-shaped support plates are hung in the baffle, the baffle on the U-shaped support plate is controlled to be placed in the corresponding rectangular box.

[0031] S3: Soak;

[0032] The second electric telescopic rod is started to control the pressure plate to move above the baffle in the decontamination tank, and the first electric telescopic rod is started to control the pressure plate to descend to press the baffle so that it is completely immersed in the decontamination tank for a preset soaking time.

[0033] S4; scrubbing;

[0034] By starting the corresponding fourth electric telescopic rod to control the corresponding second connecting strip to descend, the brush head is against the inner wall of the corresponding baffle, and by starting the second electric telescopic rod to rub the upper side of the baffle, it is rotated in the decontamination tank. During the rotation, the bristles in the rectangular box brush the outer wall and end of the baffle, and the brush head brushes the inner wall of the baffle.

[0035] S5: cleaning;

[0036] The U-shaped support plate is controlled to lift the corresponding baffle, and the baffle is immersed in the clean water tank through the cooperation of the first slider and the fourth electric telescopic rod. The baffle is controlled to swing left and right in the clean water tank by starting the first slider.

[0037] S6: spin dry;

[0038] By controlling the corresponding U-shaped support plates on the two transfer components to be stuck on the inner walls on both sides of the corresponding baffles, and then adjusting the two second motors to be coaxial, the second motor is started to control the rotation of the baffle to throw out the moisture on it. After drying is completed, the baffle is stored in the corresponding storage box again and waits for use.

[0039] S7: scrub the clean water pool;

[0040] The brush head is controlled to contact the corresponding inner wall of the clean water tank, and the brush head is controlled to move up and down on the inner wall of the transfer assembly by starting the second motor and the fourth electric telescopic rod to achieve brushing of the side wall of the clean water tank.

[0041] The brush head is controlled to contact with the bottom plate in the clean water tank, and the brush head is controlled to move left and right by starting the first slider to clean the bottom plate of the clean water tank.

[0042] The semiconductor baffle stripping and cleaning device and cleaning method proposed by the present invention can bring the following beneficial effects:

[0043] 1. The cleaning device of the present invention can rub the upper side of the baffle in the support member by providing an elastic support member and a pressure plate that can be lifted and lowered and can move left and right, so as to control the baffle to rotate in the decontamination tank. During the rotation, the bristles can scrub the outer wall and end of the baffle, and the brush head can scrub the inner wall of the baffle, so as to achieve all-round scrubbing of the baffle. The cleaning device can scrub baffles with different diameters at the same time, and has strong applicability.

[0044] 2. The cleaning device of the present invention can control the opening and closing of the locking member and complete the transfer of the baffle by setting the transfer group, and can also assist the decontamination tank to realize the scrubbing of the inner wall of the baffle. At the same time, the two transfer components can be used together during drying to control the high-speed rotation of the baffle to dry the baffle, thereby improving its drying efficiency, realizing multiple uses of one machine and reducing equipment costs;

[0045] 3. The cleaning device of the present invention controls the brush head to contact with the corresponding inner wall of the clean water tank, and controls the brush head to move up and down on the inner wall of the transfer assembly by starting the second motor and the fourth electric telescopic rod to achieve brushing of the side wall of the clean water tank. The brush head is controlled to contact with the bottom plate in the clean water tank, and the first slider is started to control the brush head to move left and right to clean the bottom plate of the clean water tank. Therefore, the cleaning device can realize automatic brushing of the clean water tank, saving labor;

[0046] 4. The cleaning device of the present invention stores a number of baffles of different sizes by nesting them together, and can place the nested baffles one by one into corresponding rectangular boxes through a transfer component, thereby increasing the storage quantity of baffles, reducing the loading frequency, and reducing the size of the equipment. BRIEF DESCRIPTION OF THE DRAWINGS

[0047] The drawings described herein are used to provide a further understanding of the present invention and constitute a part of the present invention. The exemplary embodiments of the present invention and their descriptions are used to explain the present invention and do not constitute an improper limitation of the present invention. In the drawings:

[0048] Figure 1 The present invention is a schematic structural diagram of a semiconductor baffle film stripping and cleaning device.

[0049] Figure 2 It is a schematic diagram of the structure of the cleaning pool of the present invention.

[0050] Figure 3 It is a schematic diagram of the internal structure of the decontamination tank of the present invention.

[0051] Figure 4 It is a partial structural schematic diagram of the connecting platform and the transfer assembly of the present invention.

[0052] Figure 5 for Figure 4 Enlarged structural diagram at A in the middle.

[0053] Figure 6 for Figure 1 Enlarged structural diagram at B in the middle.

[0054] Figure 7 It is a partial structural cross-sectional schematic diagram of the feeding assembly of the present invention.

[0055] Figure 8 It is a partial structural schematic diagram of the feeding assembly of the present invention.

[0056] Fig. 9 It is a schematic diagram of the principle of the baffle of the present invention when it is stored in the storage box.

[0057] In the figure: 1, decontamination tank; 2, clean water tank; 3, support; 4, connecting platform; 5, storage platform; 6, storage box; 7, transfer assembly; 8, feeding assembly; 10, baffle; 11, first connecting plate; 12, first electric telescopic rod; 13, second electric telescopic rod; 14, first connecting strip; 15, pressing plate; 31, first sleeve; 32, first sliding shaft; 33, rectangular box; 34, first spring; 35, bristles; 41, first guide rail; 51, second guide rail; 61, first distance sensor; 71, first slider; 72, third electric telescopic rod; 73, first drive box; 74, first motor; 75, first connecting block; 76, first cylinder; 77, second drive box; 78, second motor; 79, fourth electric telescopic rod; 711, second connecting block; 713, third motor; 714, second connecting strip; 715, second sliding shaft; 716, U-shaped support plate; 717, second connecting plate; 718, second spring; 719, brush head; 720, second distance sensor; 81, second slider; 82, fifth electric telescopic rod; 83, third connecting block; 84, second cylinder; 85, third drive box; 86, fourth motor; 87, storage bucket; 88, first support plate; 89, bucket cover; 810, third spring; 811, push plate; 812, depression; 813, third cylinder; 814, support strip; 815, connecting sleeve; 816, third sliding shaft; 817, drive block; 818, connecting rod; 819, plug block; 820, limit sleeve. DETAILED DESCRIPTION

[0058] In order to more clearly illustrate the overall concept of the present invention, a detailed description is given below in an exemplary manner in conjunction with the accompanying drawings.

[0059] In the description of the present invention, it is necessary to understand that the terms "center", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "axial", "radial", "circumferential" and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as a limitation on the present invention.

[0060] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" and "second" may explicitly or implicitly include one or more of the features. In the description of the present invention, the meaning of "plurality" is two or more, unless otherwise clearly and specifically defined.

[0061] In the present invention, unless otherwise clearly specified and limited, the terms "installed", "connected", "connected", "fixed" and the like should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection, an electrical connection, or a communication; it can be a direct connection, or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0062] In the present invention, unless otherwise clearly specified and limited, the first feature "on" or "under" the second feature may be that the first and second features are in direct contact, or the first and second features are in indirect contact through an intermediate medium. In the description of this specification, the description with reference to the terms "one scheme", "some schemes", "examples", "specific examples", or "some examples" means that the specific features, structures, materials or characteristics described in conjunction with the scheme or example are included in at least one scheme or example of the present invention. In this specification, the schematic representation of the above terms does not necessarily refer to the same scheme or example. Moreover, the specific features, structures, materials or characteristics described may be combined in any one or more schemes or examples in a suitable manner.

[0063] The embodiment of the present invention provides a semiconductor baffle stripping and cleaning device for cleaning the baffle 10. Figure 1 As shown, the baffle 10 is annular, the cleaning device includes a cleaning pool, the cleaning pool includes a decontamination pool 1 and a clean water pool 2, the decontamination pool 1 is added with NaOH solution, the clean water pool 2 is filled with cleaning water, the decontamination pool 1 is fixed with a support member 3, the cleaning device also includes symmetrically distributed connecting tables 4, the two connecting tables 4 are respectively located on both sides of the cleaning pool, a storage table 5 is provided on one side of the connecting table 4, a plurality of storage boxes 6 for storing the baffle 10 are placed on the storage table 5, a transfer component 7 is slidably provided on the connecting table 4, and a loading component 8 for loading the storage box 6 is slidably provided on the storage table 5.

[0064] A first connecting plate 11 is fixed to one end of the decontamination tank 1. Figure 2 As shown, a vertical first electric telescopic rod 12 is fixed above the first connecting plate 11, a horizontal second electric telescopic rod 13 is vertically fixed on the output shaft of the first electric telescopic rod 12, a vertical first connecting bar 14 is fixed on the output shaft of the second electric telescopic rod 13, a pressing plate 15 is fixed to the lower end of the first connecting bar 14, and a rubber layer is provided below the pressing plate 15.

[0065] The support member 3 includes a plurality of first sleeves 31, such as Figure 3As shown, the first sleeve 31 is fixed on the bottom plate of the decontamination tank 1, the upper end of the first sleeve 31 is sleeved with a first sliding shaft 32, the upper end of the first sliding shaft 32 is fixed with a rectangular box 33, a first spring 34 is fixedly connected between the rectangular box 33 and the first sleeve 31, the inner wall of the rectangular box 33 is provided with bristles 35, and the second electric telescopic rod 13 is parallel to the side wall of the rectangular box 33.

[0066] A first guide rail 41 parallel to the cleaning tank is provided above the connecting platform 4. Figure 4 shown.

[0067] The transfer assembly 7 includes an electric first slider 71, which slides in the first guide rail 41. A vertical third electric telescopic rod 72 is fixed above the first slider 71. A first drive box 73 is fixed on the output shaft of the third electric telescopic rod 72. A first motor 74 is fixed in the first drive box 73. The output shaft of the first motor 74 passes through the top plate of the first drive box 73 and is fixed with a first connecting block 75.

[0068] A first cylinder 76 is fixed to one side of the first connecting block 75, and an output shaft of the first cylinder 76 passes through the first connecting block 75 to fix a second drive box 77, a second motor 78 is fixed in the second drive box 77, and an output shaft of the second motor 78 passes through the second drive box 77, and a fourth electric telescopic rod 79 is vertically fixed to a side plate of the side away from the first cylinder 76. Figure 5 As shown, a second connecting block 711 is fixed on the output shaft of the fourth electric telescopic rod 79 .

[0069] A third motor 713 is fixed to the side of the second connecting block 711 close to the second motor 78, and the output shaft of the third motor 713 passes through the second connecting block 711 and is fixed with a horizontal second connecting bar 714. A plurality of second sliding shafts 715 are slidably provided on the second connecting bar 714, and the second sliding shafts 715 are perpendicular to the second connecting bar 714. A U-shaped support plate 716 is fixed to one end of the second sliding shaft 715, and a second connecting plate 717 is fixed to the other end. A second spring 718 is fixedly connected between the U-shaped support plate 716 and the second connecting bar 714, and a brush head 719 is fixed to the side of the second connecting plate 717 away from the second connecting bar 714. Both the fourth electric telescopic rod 79 and the third motor 713 are wireless devices.

[0070] The storage platform 5 is provided with a second guide rail 51 parallel to the first guide rail 41. Figure 6 shown.

[0071] The loading assembly 8 includes an electric second slider 81, which slides in the second guide rail 51. A vertical fifth electric telescopic rod 82 is fixed above the second slider 81, and a third connecting block 83 is fixed on the output shaft of the fifth electric telescopic rod 82. A second cylinder 84 is fixed on the side of the third connecting block 83 away from the cleaning tank, and the output shaft of the second cylinder 84 passes through the third connecting block 83 and is fixed with a third drive box 85.

[0072] A fourth motor 86 is fixed in the third drive box 85. The output shaft of the fourth motor 86 passes through a side plate of the third drive box 85 away from the second cylinder 84. A horizontal storage barrel 87 is fixed thereto. The barrel opening of the storage barrel 87 is located at the end away from the fourth motor 86. Figure 7 As shown, a first arc-shaped support plate 88 is slidably provided in the storage barrel 87, one end of the first support plate 88 is located outside, and a barrel cover 89 is fixed to the end of the first support plate 88 located outside.

[0073] A vertical push plate 811 is slidably provided in the storage barrel 87 , and a third spring 810 is fixedly connected between the push plate 811 and the storage barrel 87 . In the natural state of the third spring 810 , the push plate 811 is located at the barrel mouth of the storage barrel 87 .

[0074] A recess 812 is provided at one end of the first support plate 88 close to the barrel cover 89, and a third cylinder 813 is fixed to the bottom of the first support plate 88. The output shaft of the third cylinder 813 passes through the first support plate 88 and is fixed with an arc-shaped support bar 814. The support bar 814 can be placed in the recess 812 by contracting the third cylinder 813.

[0075] The loading assembly 8 also includes a locking member for connecting the bucket cover 89 and the storage bucket 87, such as Figure 8 As shown, when the barrel cover 89 is connected to the storage barrel 87 , a gap is left between the barrel cover 89 and the storage barrel 87 , allowing the baffle 10 to be moved out of the storage barrel 87 .

[0076] The locking member includes a connecting sleeve 815 fixed on one side of the barrel cover 89, a vertical third sliding shaft 816 is slidably provided on the connecting sleeve 815, a driving block 817 is fixed on the upper end of the third sliding shaft 816, a connecting rod 818 is vertically fixed at the bottom, an insert block 819 is fixed on the connecting rod 818, and the locking member also includes a limiting sleeve 820 fixed on one side of the storage barrel 87. When the insert block 819 is inserted into the limiting sleeve 820, the connection between the barrel cover 89 and the storage barrel 87 is realized.

[0077] A first distance sensor 61 is fixed at the center of the bottom plate of the storage box 6. Fig. 9As shown, a second distance sensor 720 is fixed on the second connecting strip 714, and the first distance sensor 61 and the second distance sensor 720 are both electrically connected to a preset control system. The first distance sensor 61 is used to detect the distance between the maximum baffle 10 stored in the storage box 6 and the bottom plate of the storage box 6, which is recorded as H (measured value).

[0078] Assuming that the inner length of the storage box 6 is 2X0 (a constant value), the height is H0 (a constant value), and the radius of the largest baffle 10 stored in the storage box 6 is r, then according to the Pythagorean theorem, it can be concluded that X0 2 +(H+r-H0) 2 =r 2 , from which the r value can be calculated, and then the center position of the maximum baffle 10 can be obtained. Taking the first distance sensor 61 as the origin coordinate, the center coordinate of the maximum baffle 10 is (0, H+r).

[0079] A semiconductor baffle film stripping and cleaning method is applied to the above-mentioned cleaning device, and the cleaning method comprises the following steps:

[0080] S1: Loading the baffle 10;

[0081] The locking piece is controlled to open through the transfer assembly 7. The specific operation is: one of the U-shaped support plates 716 is controlled to be stuck on the driving block 817 through the cooperation of the first slider 71, the fourth electric telescopic rod 79 and the first cylinder 76, and the driving block 817 is lifted by contracting the fourth electric telescopic rod 79 or extending the third electric telescopic rod 72, so that the insertion block 819 is moved out of the limit sleeve 820.

[0082] The first support plate 88 is pulled out of the storage barrel 87 to a preset length by starting the first cylinder 76, and then a plurality of baffles 10 are placed upright on the first support plate 88. Baffles 10 of different sizes can be nested together and placed upright on the first support plate 88. After placement is completed, the insert block 819 is controlled by the transfer component 7 to be inserted into the limiting sleeve 820. Under the action of the third spring 810, the baffle 10 to be loaded corresponds to the gap between the barrel cover 89 and the storage barrel 87.

[0083] The second slider 81, the fifth electric telescopic rod 82 and the second cylinder 84 cooperate to control the baffle 10 to be loaded to move to the top of the corresponding storage box 6, and the fourth motor 86 is started to control the gap to rotate downward. The third cylinder 813 is started to control the movement of the support bar 814 to push the corresponding baffle 10 out of the gap into the storage box 6, thereby realizing the loading of the baffle 10.

[0084] S2: transporting the baffle 10 to the decontamination tank 1;

[0085] The baffles 10 are placed one by one in the rectangular box 33 by the transfer assembly 7. The specific operation is as follows:

[0086] The second connecting strip 714 is inserted into the corresponding baffle 10 through the cooperation of the first slider 71, the fourth electric telescopic rod 79 and the first cylinder 76, and the axis of the third motor 713 must pass through the center of the largest baffle 10 in the rectangular box 33. The third motor 713 is started to control the second connecting strip 714 to rotate. If the distance detected by the second distance sensor 720 when facing upward is the same as the distance detected when facing downward, it means that there is only one baffle 10 in the rectangular box 33, and the corresponding U-shaped support plate 716 can be directly controlled to move to correspond to the baffle 10. The corresponding baffle 10 is taken out of the rectangular box 33 by contracting the fourth electric telescopic rod 79 and hung on the corresponding U-shaped support plate 716. On the plate 716, if the distance detected by the second distance sensor 720 when facing upward is different from the distance detected when facing downward, it means that a smaller baffle 10 is nested in the baffle 10, and the corresponding U-shaped support plate 716 is controlled to move to correspond to the baffle 10, and the smallest baffle 10 in the rectangular box 33 is lifted by contracting the fourth electric telescopic rod 79, and the corresponding baffle 10 is taken out by starting the first cylinder 76 and hung on the corresponding U-shaped support plate 716. When all the U-shaped support plates 716 are hung on the baffle 10, the baffle 10 on the U-shaped support plate 716 is controlled to be placed in the corresponding rectangular box 33 through the cooperation of the first slider 71, the first motor 74 and the first cylinder 76.

[0087] S3: Soak;

[0088] The second electric telescopic rod 13 is activated to control the pressing plate 15 to move above the baffle 10 in the decontamination tank 1, and the first electric telescopic rod 12 is activated to control the pressing plate 15 to descend and press the baffle 10 so that the baffle 10 is completely immersed in the decontamination tank 1 for a preset soaking time;

[0089] S4; scrubbing;

[0090] By starting the corresponding fourth electric telescopic rod 79 to control the corresponding second connecting strip 714 to descend, the brush head 719 is pressed against the inner wall of the corresponding baffle 10, and by starting the second electric telescopic rod 13 to rub the upper side of the baffle 10, the baffle 10 is rotated in the decontamination tank 1. During the rotation, the bristles 35 in the rectangular box 33 can brush the outer wall and end of the baffle 10, and the brush head 719 can brush the inner wall of the baffle 10, thereby achieving all-round brushing of the baffle 10.

[0091] S5: cleaning;

[0092] By starting the corresponding fourth electric telescopic rod 79 to control the U-shaped support plate 716 to lift the corresponding baffle 10, the baffle 10 is immersed in the clean water pool 2 through the cooperation of the first slider 71 and the fourth electric telescopic rod 79, and by starting the first slider 71 to control the baffle 10 to swing left and right in the clean water pool 2 to clean it.

[0093] S6: spin dry;

[0094] By controlling the corresponding U-shaped support plates 716 on the two transfer components 7 to be respectively stuck on the inner walls on both sides of the corresponding baffle 10, and then adjusting the two second motors 78 to be coaxial, by starting the second motor 78, the baffle 10 can be controlled to rotate to throw out the moisture on it, thereby increasing its drying speed. After drying is completed, the baffle 10 is stored in the corresponding storage box 6 again, waiting for use.

[0095] S7: scrubbing the clean water pool 2;

[0096] The first slider 71, the first motor 74, the second motor 78, the fourth electric telescopic rod 79 and the third motor 713 cooperate to control the brush head 719 to contact the corresponding inner wall of the clean water tank 2, and the second motor 78 and the fourth electric telescopic rod 79 are started to cooperate to control the brush head 719 to move up and down on the inner wall of the transfer assembly 7, so as to achieve the cleaning of the side wall of the clean water tank 2;

[0097] The brush head 719 is controlled to contact the bottom plate in the clean water tank 2 by the first slider 71, the first cylinder 76 and the fourth electric telescopic rod 79. The bottom plate of the clean water tank 2 can be cleaned by starting the first slider 71 to control the brush head 719 to move left and right. Therefore, the cleaning device can realize automatic brushing of the clean water tank 2, saving manpower.

[0098] Each embodiment in this specification is described in a progressive manner, and the same or similar parts between the embodiments can be referred to each other, and each embodiment focuses on the differences from other embodiments. In particular, for the system embodiment, since it is basically similar to the method embodiment, the description is relatively simple, and the relevant parts can be referred to the partial description of the method embodiment.

[0099] The above description is only an embodiment of the present invention and is not intended to limit the present invention. For those skilled in the art, the present invention may have various modifications and variations. Any modification, equivalent substitution, improvement, etc. made within the spirit and principle of the present invention should be included in the scope of the claims of the present invention.

Claims

1. A semiconductor baffle film stripping and cleaning device, used for cleaning a baffle (10), the baffle (10) is annular, the cleaning device comprises a cleaning pool, characterized in that: The cleaning tank comprises a decontamination tank (1) and a clean water tank (2), and a support member (3) is fixed in the decontamination tank (1); A first connecting plate (11) is fixed to one end of the decontamination tank (1), a vertical first electric telescopic rod (12) is fixed above the first connecting plate (11), a horizontal second electric telescopic rod (13) is vertically fixed to the output shaft of the first electric telescopic rod (12), a vertical first connecting strip (14) is fixed to the output shaft of the second electric telescopic rod (13), a pressing plate (15) is fixed to the lower end of the first connecting strip (14), and a rubber layer is provided below the pressing plate (15); The support member (3) comprises a plurality of first sleeves (31), the first sleeves (31) being fixed on the bottom plate of the decontamination tank (1), the upper end of the first sleeve (31) being sleeved with a first sliding shaft (32), the upper end of the first sliding shaft (32) being fixed with a rectangular box (33), a first spring (34) being fixedly connected between the rectangular box (33) and the first sleeve (31), the inner wall of the rectangular box (33) being provided with bristles (35), and the second electric telescopic rod (13) being parallel to the side wall of the rectangular box (33); The cleaning device further comprises symmetrically distributed connecting platforms (4), wherein the two connecting platforms (4) are respectively located on both sides of the cleaning pool, a storage platform (5) is provided on one side of the connecting platform (4), a plurality of storage boxes (6) for storing baffles (10) are placed on the storage platform (5), and a transfer assembly (7) is slidably provided on the connecting platform (4); A first guide rail (41) parallel to the cleaning tank is provided above the connecting platform (4); The transfer assembly (7) comprises an electric first slider (71), the first slider (71) is located in the first guide rail (41) and slides, a vertical third electric telescopic rod (72) is fixed above the first slider (71), a first drive box (73) is fixed on the output shaft of the third electric telescopic rod (72), a first motor (74) is fixed in the first drive box (73), and the output shaft of the first motor (74) passes through the top plate of the first drive box (73) and is fixed with a first connecting block (75); A first cylinder (76) is fixed to one side of the first connecting block (75); an output shaft of the first cylinder (76) passes through the first connecting block (75) and is fixed to a second drive box (77); a second motor (78) is fixed inside the second drive box (77); an output shaft of the second motor (78) passes through the second drive box (77); a fourth electric telescopic rod (79) is vertically fixed to a side plate of the side away from the first cylinder (76); a second connecting block (711) is fixed to the output shaft of the fourth electric telescopic rod (79); A third motor (713) is fixed to a side of the second connecting block (711) close to the second motor (78); an output shaft of the third motor (713) passes through the second connecting block (711) and is fixed with a horizontal second connecting bar (714); a plurality of second sliding shafts (715) are slidably provided on the second connecting bar (714); the second sliding shafts (715) are perpendicular to the second connecting bar (714); a U-shaped support plate (716) is fixed to one end of the second sliding shaft (715); a second connecting plate (717) is fixed to the other end; a second spring (718) is fixedly connected between the U-shaped support plate (716) and the second connecting bar (714); a brush head (719) is fixed to a side of the second connecting plate (717) away from the second connecting bar (714); A first distance sensor (61) is fixed at the center of the bottom plate in the storage box (6), and a second distance sensor (720) is fixed on the second connecting strip (714). The first distance sensor (61) and the second distance sensor (720) are both electrically connected to a preset control system. The first distance sensor (61) is used to detect the distance between the largest baffle (10) stored in the storage box (6) and the bottom plate of the storage box (6); A loading assembly (8) for loading the storage box (6) is slidably provided on the storage table (5); The storage platform (5) is provided with a second guide rail (51) parallel to the first guide rail (41); The loading assembly (8) comprises an electric second slider (81), the second slider (81) is located in the second guide rail (51) and slides, a vertical fifth electric telescopic rod (82) is fixed above the second slider (81), a third connecting block (83) is fixed on the output shaft of the fifth electric telescopic rod (82), a second cylinder (84) is fixed on the side of the third connecting block (83) away from the cleaning tank, and the output shaft of the second cylinder (84) passes through the third connecting block (83) and is fixed with a third driving box (85); A fourth motor (86) is fixed in the third driving box (85), an output shaft of the fourth motor (86) passes through a side plate of the third driving box (85) away from the second cylinder (84), and a horizontal storage barrel (87) is fixed thereon, the barrel mouth of the storage barrel (87) is located at the end away from the fourth motor (86), a first arc-shaped support plate (88) is slidably provided in the storage barrel (87), one end of the first support plate (88) is located outside, and a barrel cover (89) is fixed to the end of the first support plate (88) located outside; A vertical push plate (811) is slidably disposed in the storage barrel (87), a third spring (810) is fixedly connected between the push plate (811) and the storage barrel (87), and in the natural state of the third spring (810), the push plate (811) is located at the barrel opening of the storage barrel (87); A recess (812) is provided at one end of the first support plate (88) close to the barrel cover (89); a third cylinder (813) is fixed to the bottom of the first support plate (88); an output shaft of the third cylinder (813) passes through the first support plate (88) and is fixed with an arc-shaped support bar (814); The loading assembly (8) further comprises a locking member for connecting the barrel cover (89) and the storage barrel (87); when the barrel cover (89) and the storage barrel (87) are connected, a gap is left between the barrel cover (89) and the storage barrel (87).

2. A semiconductor baffle film stripping and cleaning device according to claim 1, characterized in that: The decontamination tank (1) is filled with NaOH solution, and the clean water tank (2) is filled with cleaning water.

3. A semiconductor baffle stripping and cleaning device according to claim 2, characterized in that: The locking member comprises a connecting sleeve (815) fixed to one side of the barrel cover (89), a vertical third sliding shaft (816) is slidably provided on the connecting sleeve (815), a driving block (817) is fixed to the upper end of the third sliding shaft (816), a connecting rod (818) is vertically fixed to the lower end, an insert block (819) is fixed to the connecting rod (818), and the locking member further comprises a limiting sleeve (820) fixed to one side of the storage barrel (87).

4. A semiconductor baffle stripping and cleaning method, applied to the cleaning device according to claim 3, characterized in that: The cleaning method comprises the following steps: S1: Loading the baffle (10); The locking member is controlled to open by the transfer component (7), and the first support plate (88) is pulled out of the storage barrel (87) to a preset length, and then a plurality of baffles (10) are placed upright on the first support plate (88). When the placement is completed, the insert block (819) is controlled to be inserted into the limiting sleeve (820) by the transfer component (7); Control the baffle plate (10) to be loaded to move to the top of the corresponding storage box (6), start the fourth motor (86) to control the gap to rotate downward, start the third cylinder (813) to control the support bar (814) to move and push the corresponding baffle plate (10) out of the gap into the storage box (6), so as to realize the loading of the baffle plate (10); S2: transporting the baffle (10) into the decontamination tank (1); The baffles (10) are placed one by one in the rectangular box (33) by using the transfer assembly (7). The specific operation is as follows: By controlling the second connecting strip (714) to be inserted into the corresponding baffle (10), and ensuring that the axis of the third motor (713) passes through the center of the largest baffle (10) in the rectangular box (33), the third motor (713) is started to control the second connecting strip (714) to rotate. If the distance detected by the second distance sensor (720) when facing upward is the same as the distance detected when facing downward, the corresponding U-shaped support plate (716) is directly controlled to move to correspond to the baffle (10), and the corresponding baffle (10) is taken out of the rectangular box (33) by contracting the fourth electric telescopic rod (79) and hung on the corresponding U-shaped support plate ( 716), if the distance detected by the second distance sensor (720) when facing upward is different from the distance detected when facing downward, the corresponding U-shaped support plate (716) is controlled to move to correspond to the baffle (10), the smallest baffle (10) in the rectangular box (33) is lifted up by contracting the fourth electric telescopic rod (79), the corresponding baffle (10) is taken out by starting the first cylinder (76), and hung on the corresponding U-shaped support plate (716), and when all the U-shaped support plates (716) are hung on the baffle (10), the baffle (10) on the U-shaped support plate (716) is controlled to be placed in the corresponding rectangular box (33); S3: Soak; The second electric telescopic rod (13) is activated to control the pressing plate (15) to move to above the baffle (10) in the decontamination tank (1), and the first electric telescopic rod (12) is activated to control the pressing plate (15) to descend to press the baffle (10) so that the baffle (10) is completely immersed in the decontamination tank (1) for a preset soaking time; S4; scrubbing; By starting the corresponding fourth electric telescopic rod (79) to control the corresponding second connecting strip (714) to descend, the brush head (719) is pressed against the inner wall of the corresponding baffle (10), and by starting the second electric telescopic rod (13) to rub the upper side of the baffle (10), the baffle (10) is rotated in the decontamination tank (1), and during the rotation, the bristles (35) in the rectangular box (33) scrub the outer wall and end of the baffle (10), and the brush head (719) scrubs the inner wall of the baffle (10); S5: cleaning; The U-shaped support plate (716) is controlled to lift the corresponding baffle plate (10), and the baffle plate (10) is immersed in the clean water tank (2) by the cooperation of the first slider (71) and the fourth electric telescopic rod (79), and the baffle plate (10) is controlled to swing left and right in the clean water tank (2) by starting the first slider (71); S6: spin dry; By controlling the corresponding U-shaped support plates (716) on the two transfer assemblies (7) to be respectively stuck on the inner walls of the two sides of the corresponding baffle (10), and then adjusting the two second motors (78) to be coaxial, the second motors (78) are started to control the baffle (10) to rotate to throw out the moisture on it, and after drying is completed, the baffle (10) is stored in the corresponding storage box (6) again to wait for use; S7: scrubbing the clean water pool (2); The brush head (719) is controlled to contact the corresponding inner wall of the clean water tank (2), and the second motor (78) and the fourth electric telescopic rod (79) are started to cooperate with each other to control the brush head (719) to move up and down on the inner wall of the transfer assembly (7), so as to achieve the cleaning of the side wall of the clean water tank (2); The brush head (719) is controlled to contact the bottom plate in the clean water tank (2), and the brush head (719) is controlled to move left and right by starting the first slider (71) to clean the bottom plate of the clean water tank (2).

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