A method and apparatus for automatic real-time control of electron beam current

Abstract

The application provides an electron beam current automatic real-time control method and device. The method provided by the application comprises the following steps: determining a first relationship between a speed-dose product of a controlled device and a beam current; determining a grid voltage segmentation value based on historical grid voltage and beam current data of the controlled device; determining a grid voltage interval and a corresponding beam current interval based on the grid voltage segmentation value, and determining a second relationship of each grid voltage interval, wherein the second relationship is a relationship between the beam current and the grid voltage; determining a real-time control target, wherein the real-time control target at least comprises the speed-dose product; determining a target beam current interval corresponding to a target beam current based on the real-time control target and the first relationship; calculating a target grid voltage based on the second relationship corresponding to the target beam current interval; and adjusting the grid voltage of the controlled device based on real-time beam current feedback, with the target grid voltage as a preset value. The electron beam current automatic real-time control method and device provided by the application realize automatic real-time control of the electron beam current and accurate control of the electron beam dose.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of electronics, in particular to an electron beam current automatic real-time control method and device. BACKGROUND

[0002] One of the most widely used applications of electron curtain accelerators is paint curing, and the running speed of the paint curing production line can reach up to 200 m / min. In order to meet the requirements of production quality and efficiency, how to accurately control the electron beam dose irradiated on the production line in high-speed operation is a problem that needs to be solved.

[0003] Due to the influence of various factors during the long-time operation of the electron curtain accelerator under the condition that various settings remain unchanged, the beam current will fluctuate, resulting in fluctuations in the electron beam dose. Therefore, controlling the electron beam dose to remain unchanged is converted into the problem of controlling the electron beam current to remain unchanged. At present, the measurement of the electron beam dose mainly relies on dose films. This method is a non-real-time measurement, and the film needs to be detected after the work is completed, so it cannot be adjusted and controlled in real time. In addition, the required irradiated electron beam dose is different for different paint schemes, which is related to the energy of the electron beam and the speed of the production line. How to quickly correspond the three is a technical difficulty. Therefore, a method is urgently needed to automatically and real-time control the electron beam current and accurately control the electron beam dose. SUMMARY

[0004] Therefore, the present application provides an electron beam current automatic real-time control method and device to automatically and real-time control the electron beam current and accurately control the electron beam dose.

[0005] Specifically, the present application is realized by the following technical solutions:

[0006] The first aspect of the present application provides an electron beam current automatic real-time control method, which comprises:

[0007] determining a first relationship between the speed-dose product of the controlled device and the beam current;

[0008] determining the grid voltage segmentation value based on the historical grid voltage and beam current data of the controlled device;

[0009] determining the grid voltage interval and the corresponding beam current interval based on the grid voltage segmentation value, and determining the second relationship of each grid voltage interval, wherein the second relationship is the relationship between the beam current and the grid voltage;

[0010] determining a real-time control target, wherein the real-time control target at least includes the speed-dose product;

[0011] determining the target beam current interval corresponding to the target beam current based on the real-time control target and the first relationship;

[0012] determine a target beam current corresponding to the target speed dose product based on the first relationship and the target speed dose product;

[0013] adjust the grid voltage of the controlled device based on the measured beam current feedback and the target grid voltage as a preset value.

[0014] The second aspect of the present application provides an electron beam automatic real-time control device, the device comprising: a determination module, a calculation module and an adjustment module; wherein,

[0015] The determination module is configured to determine a first relationship between the speed dose product and the beam current of the controlled device.

[0016] The determination module is further configured to determine a grid voltage segment value based on the historical grid voltage and the beam current data of the controlled device.

[0017] The determination module is further configured to determine a grid voltage interval and a corresponding beam current interval based on the grid voltage segment value, and determine a second relationship of each grid voltage interval, the second relationship being a relationship between the beam current and the grid voltage.

[0018] The determination module is further configured to determine a real-time control target, the real-time control target comprising at least the speed dose product.

[0019] The determination module is further configured to determine a target beam current interval corresponding to the target beam current based on the real-time control target and the first relationship.

[0020] The calculation module is configured to calculate a target grid voltage based on the second relationship corresponding to the target beam current interval.

[0021] The adjustment module is configured to adjust the grid voltage of the controlled device based on the measured beam current feedback and the target grid voltage as a preset value.

[0022] The electronic beam current automatic real-time control method and device provided by the application, by determining the first relationship between velocity dose product and beam current and the second relationship between grid voltage interval and beam current interval, after determining the velocity dose product, first determining the target beam current and the target beam current interval according to the first relationship between velocity dose product and the first relationship, further determining the target grid voltage according to the target beam current interval and the second relationship, finally controlling the controlled device to emit beam at the target grid voltage, and adjusting the grid voltage of the controlled device based on the measured beam current feedback. In the first aspect, the first relationship and the second relationship between the beam current, the velocity and the grid voltage are obtained by fitting the historical data, and then the relevant relationship used for calculation is matched according to the real-time control target, and the relevant relationship meeting the actual production line and control requirements is obtained by fitting, and the control grid voltage corresponding to the target demand is automatically calculated according to the actual velocity of the production line and the electronic beam property required by the target, so that quantitative and accurate control is realized, and automatic real-time control of the electronic beam current is realized. In the second aspect, the method provided by the application uses the grid voltage control value meeting the target as the preset initial value, and adjusts the grid voltage value according to the actual production situation, so that the grid voltage output by the system is always near the target grid voltage, the stability of the system is improved, and it is very important for the stable operation and high-quality production of the coating curing production line, which ensures that the coating curing production line can maintain stable electronic beam current in the case of high-speed operation, and accurately controls the electronic beam dose, so as to ensure the quality and efficiency of the coating curing process. In the third aspect, the method provided by the application does not need to rely on human experience, and automatically calculates the grid voltage initial value according to the correlation between the data, so as to generate a corresponding amount of electronic beam, improve the automation level of the coating curing production line, and provide higher reliability and stability for production. This will help to reduce human errors and waste in the production process, improve production efficiency, and meet more stringent quality standards. BRIEF DESCRIPTION OF DRAWINGS

[0023] Figure 1 The flowchart of the electronic beam current automatic real-time control method provided by the application is shown in the first embodiment.

[0024] Figure 2 The schematic diagram of the first relationship shown in the example embodiment of the application is shown in the first relationship.

[0025] Figure 3 The structural schematic diagram of the electronic beam current automatic real-time control device provided by the application is shown in the first embodiment. DETAILED DESCRIPTION

[0026] The example embodiments will be described in detail here, and the examples are shown in the drawings. When the following description refers to the drawings, the same numbers in different drawings represent the same or similar elements unless otherwise indicated. The embodiments described in the following example embodiments do not represent all embodiments consistent with the application.

[0027] The terminology used in this application is for the purpose of describing particular embodiments only and is not intended to be limiting thereof. As used in this application, the singular forms "a," "an," and "the" are intended to include the plural forms as well, unless the context clearly indicates otherwise. It will be further understood that the terms "and / or," as used herein, refers to and encompasses any and all possible combinations of one or more of the associated listed items.

[0028] It is to be understood that, although the terms first, second, third, etc. can be used herein to describe various information, the information should not be limited to these terms. These terms are only used to differentiate one piece of information from another. For example, a first information can also be termed a second information, similarly, a second information can also be termed a first information without departing from the scope of the present application. Depending on the context, the word "if' as used herein can be interpreted as meaning "when" or "in response to determining".

[0029] Specific embodiments are given below to introduce the technical solutions of the present application in detail.

[0030] Figure 1 The flow chart of the electron beam current automatic real-time control method embodiment provided by the present application is shown in FIG. 1. Please refer to Figure 1 The method provided by the present embodiment can include:

[0031] S101, determining a first relationship between a speed-dose product of a controlled device and a beam current.

[0032] Specifically, the controlled device is an electron curtain accelerator. The electron curtain accelerator is mainly applied to paint curing, and in the present embodiment, the electron beam dose of a high-speed paint curing production line needs to be controlled. The speed-dose product is the product of the production line speed and the electron beam dose, and the beam current refers to the number of particle flows through a certain section per unit time, which is used to describe the particle flow intensity.

[0033] Optionally, the determination process of the speed-dose product includes:

[0034] (1) determining the irradiation time based on the production line speed of the controlled device; wherein the production line speed is controlled by a paint curing production line control system.

[0035] Specifically, the production line speed is set according to actual needs, which is not limited in the present embodiment. It is to be noted that the production line speed is a dynamic value controlled and fed back by the paint curing production line control system, which determines the speed of the paint passing through the electron beam irradiation area. Further, the beam-out high voltage of the controlled device is determined by the electron beam energy (the beam-out high voltage is equal to the electron beam energy), wherein the electron beam energy affects the penetration depth and energy deposition characteristics of the electron beam, which is usually determined according to the properties of the paint and the curing requirements.

[0036] For example, in an embodiment, when the electron beam energy is 100 keV, the beam-out high voltage is 100 kV.

[0037] In a specific implementation, the irradiation time can be determined according to the length of the irradiated coating and the production line speed, that is, the irradiation time is determined according to the following formula:

[0038] t = L / v

[0039] Wherein, the t is the irradiation time; the L is the length of the irradiated coating, that is, the length of the part that needs to be irradiated by the electron beam; and the v is the production line speed.

[0040] For example, in an embodiment, when the production line speed is 0.5 m / s and the length of the irradiated coating is 10 m, the determined irradiation time is 20 s.

[0041] (2) Determine the electron beam dose based on the irradiation time.

[0042] Specifically, the electron beam dose represents the energy absorbed by the irradiated coating.

[0043] In a specific implementation, the electron beam dose can be determined according to the electron beam power, the irradiation time, and the mass of the irradiated coating, that is, the electron beam dose is determined according to the following formula:

[0044] D = P*t / m

[0045] Wherein, the D is the electron beam dose; the P is the electron beam power; the t is the irradiation time; and the m is the mass of the irradiated coating.

[0046] For example, in an embodiment, when the electron beam power is 10 kw, the irradiation time is 20 s, and the mass of the irradiated coating is 5 kg, the determined electron beam dose is 40 kGy (kilogram Gray).

[0047] (3) Determine the speed dose product based on the production line speed and the electron beam dose; wherein the speed dose product is the product of the production line speed and the electron beam dose.

[0048] Specifically, the speed dose product is the product of the production line speed and the electron beam dose.

[0049] In a specific implementation, the speed dose product can be determined according to the production line speed and the electron beam dose, that is, the speed dose product is determined according to the following formula:

[0050] ∑ = v*D

[0051] Wherein, the ∑ is the speed dose product; the v is the production line speed; and the D is the electron beam dose.

[0052] For example, in one embodiment, in combination with the above example, when the production line speed is 0.5 m / s and the electron beam dose is 40 kGy, the determined speed dose product is 20 kGy·m / s.

[0053] In a specific implementation, the determining the first relationship between the speed dose product of the controlled device and the beam current includes:

[0054] (1) Controlling the controlled device to emit a beam at different speed dose products to obtain a plurality of sets of experimental data about the speed dose product and the beam current.

[0055] Specifically, the controlled device is controlled to emit a beam at different production line speeds and electron beam doses (i.e., at different speed dose products), and a dedicated measuring instrument (for example, a Faraday cup, a current transformer, a Hall probe, etc.) is used to measure the beam current and record the experimental data about the speed dose product and the beam current. Table 1 shows the experimental data about the speed dose product and the beam current according to an example embodiment of the present application:

[0056] Table 1

[0057] Beam current (mA) Velocity dose product (kGy-m / s) Line speed (m / min) Electron beam dose (kGy) 30 1333 38.1 35 47 2583 41.8 61.8 58 3787 58 65.3 75.3 4700 62 75.8 90.5 5594 77.8 71.9

[0058] (2) Linearly fitting the experimental data to obtain the first relationship between the speed dose product and the beam current.

[0059] Specifically, as can be seen from Table 1, the speed dose product is proportional to the beam current, that is, as the beam current increases, the speed dose product also increases accordingly.

[0060] In a specific implementation, it is assumed that the relationship between the speed dose product and the beam current is linear, and it is expressed as I = aΣ + b. Wherein a is the slope, b is the intercept, I is the speed dose product, and Σ is the beam current. By linearly fitting the experimental data using Python, a and b can be determined, and thus the first relationship between the speed dose product and the beam current can be obtained. Figure 2 FIG. 1 shows a schematic diagram of the first relationship according to an example embodiment of the present application. As can be seen from FIG. 1, the first relationship can be expressed as: Figure 2

[0061] y = 70.835x - 661.95

[0062] Wherein, the y is the speed dose product; and the x is the beam current.

[0063] S102, determining a grid voltage segmentation value based on historical grid voltage and beam current data of the controlled device.

[0064] ​Specifically, the historical grid voltage and beam current data of the controlled device are automatically recorded and stored during the operation of the controlled device, and the historical grid voltage and beam current data can be obtained through a data acquisition system, an operation log or an automatic control system.

[0065] In a specific implementation, the determining of the grid voltage segmentation values based on the historical grid voltage and beam current data of the controlled device comprises:

[0066] (1) determining a target range and a historical distribution characteristic of the historical grid voltage of the controlled device based on the historical grid voltage of the controlled device, wherein the historical distribution characteristic is a grid voltage value block aggregated based on the frequency of different grid voltage values.

[0067] In a specific implementation, the frequency distribution of the historical grid voltage is analyzed to determine the frequency of different grid voltage values. According to the frequency of different grid voltage values, the grid voltage values are aggregated into grid voltage value blocks (for example, a certain grid voltage interval, such as 5V per interval). The target range of the historical grid voltage is determined based on the maximum value and the minimum value in the historical grid voltage, and the grid voltage value blocks are aggregated according to the frequency of each grid voltage in the target range, for example, the grid voltages with a frequency greater than a preset value are taken as the center, and each grid voltage value in the target range is clustered, the target range is segmented based on the clustering result, and a plurality of grid voltage value blocks are obtained. The target range is segmented by using the grid voltage segmentation values, thereby obtaining a plurality of grid voltage intervals.

[0068] (2) segmenting the grid voltage in the target range according to the historical distribution characteristic, segmenting the target range into a plurality of grid voltage intervals, and obtaining a plurality of grid voltage segmentation values.

[0069] Specifically, a suitable segmentation method (such as equal-width segmentation, equal-frequency segmentation, etc.) is selected to segment the grid voltage in the target range, and a plurality of grid voltage segmentation values are obtained. When equal-width segmentation is selected, the target range is divided into several equal intervals. When equal-frequency segmentation is selected, the target range is segmented according to the historical distribution characteristic, so that the number of grid voltage values in each interval is approximately the same.

[0070] (3) selecting a target grid voltage segmentation value from the plurality of grid voltage segmentation values according to the beam current values corresponding to the plurality of grid voltage segmentation values and the beam current data.

[0071] Specifically, the grid voltage value and the beam current value have a corresponding relationship. On the basis of obtaining a plurality of grid voltage segmentation values, each grid voltage value corresponds to a beam current value, and therefore there are beam current segmentation values and corresponding beam current intervals. As an optional embodiment, according to the beam current value corresponding to each grid voltage segmentation value, the average beam current value of each grid voltage interval is calculated. According to a predefined screening standard (for example, the highest average beam current value or the smallest beam current fluctuation), the target grid voltage interval is determined, and the target grid voltage segmentation value is screened.

[0072] (4) Adjusting the target grid voltage segmentation value according to the range of the grid voltage data corresponding to the beam current data.

[0073] Specifically, the target range is adjusted according to the range of the grid voltage data corresponding to the beam current data, so that the coincidence degree of the target range and the range of the grid voltage data is greater than a preset threshold value. For example, the part of the target range that is outside the range of the grid voltage data corresponding to the beam current data is deleted, that is, the redundant target grid voltage segmentation values are deleted.

[0074] For example, in an embodiment, the target range is 0-300, the range of the grid voltage data corresponding to the beam current data is 0-100, and in this step, the target grid voltage segmentation value is adjusted, and the target range is adjusted to 0-100.

[0075] Further, the target grid voltage segmentation value in the target range is adjusted according to the range of the grid voltage data corresponding to the beam current data. The adjustment at least includes increasing or decreasing the number of target grid voltage segmentation values. The direction of the target grid voltage segmentation value adjustment is opposite to the direction of the target range adjustment. If the target range is reduced, the target grid voltage segmentation value can be further increased to finely determine the correlation between parameters in a smaller range, so as to realize fine control of the grid voltage. If the target range is expanded, the target grid voltage segmentation value in the original target range is further reduced, that is, the target grid voltage segmentation value in a larger range is segmented while the number of the target grid voltage segmentation values remains unchanged. The correlation between parameters in the larger range is determined without increasing the calculation amount, so as to adapt to a wider range of grid voltage control targets and improve the adaptability of the grid voltage control.

[0076] S103, determining a grid voltage interval and a corresponding beam current interval based on the grid voltage segmentation value, and determining a second relationship of each grid voltage interval, the second relationship being a relationship between the beam current and the grid voltage.

[0077] Specifically, the second relationship of each grid voltage interval represents the relationship between the grid voltage in the grid voltage interval and the beam current in the corresponding beam current interval.

[0078] In a specific implementation, the determining the second relationship between the beam current and the gate voltage based on the gate voltage segment value, the determined gate voltage interval and the corresponding beam current interval, and the second relationship of each of the gate voltage intervals comprises:

[0079] (1) controlling the controlled device to emit a beam under the gate voltage segment value, to obtain the beam current corresponding to the gate voltage segment value.

[0080] Specifically, the controlled device is controlled to emit a beam under different gate voltage segment values, and the beam current is measured by a special measuring instrument (for example, a Faraday cup, a current transformer, a Hall probe, etc.), to obtain the beam current corresponding to each gate voltage segment value.

[0081] (2) determining the corresponding relationship between the gate voltage interval and the beam current interval based on the gate voltage segment value and the beam current corresponding to the gate voltage segment value.

[0082] Specifically, the gate voltage interval is determined according to the gate voltage segment value, and for a certain gate voltage interval and the beam current corresponding to the gate voltage interval, the corresponding relationship is recorded as a group. Similarly, the corresponding relationship between all gate voltage intervals and beam currents is recorded, to obtain the corresponding relationship between the gate voltage interval and the beam current interval. Table 2 shows the corresponding relationship between the gate voltage interval and the beam current interval according to an exemplary embodiment of the present application:

[0083] Table 2

[0084] Serial number (i) Gate voltage (V) Beam current (A) 1 5 0.9 2 10 1 3 15 1.3 4 20 1.6 5 25 2.6 6 30 3.9 7 35 5.9 8 40 8.3 9 45 11.4 10 50 14.2 11 55 17.0 12 60 19.8 13 65 21.9 14 70 24.0 15 75 29.1 16 80 34.6 17 85 38.0 18 90 41.4 19 95 46.3 20 100 51.8 21 105 57.8 22 110 64.0 23 115 68.4 24 120 73.2 25 125 79.8 26 130 86.7 27 135 94.1 28 140 100.5 29 145 107.2

[0085] (3) performing piecewise linear fitting on the corresponding relationship, to obtain the second relationship between the beam current and the gate voltage.

[0086] Specifically, for each gate voltage interval and the corresponding beam current interval, a curve fitting method (such as polynomial fitting, curve fitting, etc.) is used to establish a mathematical relationship between the beam current and the gate voltage, the corresponding parameters are calculated based on the corresponding relationship between the gate voltage interval and the beam current interval, and thus the second relationship between the beam current and the gate voltage is obtained. The second relationship can be expressed as:

[0087] U = ki + b

[0088] Wherein, the U is the gate voltage; and the i is the beam current.

[0089]

[0090] S104, determining a real-time control target, the real-time control target at least comprising a speed-dose product.

[0091] Specifically, in combination with the foregoing description, the speed-dose product is equal to the product of the production line speed and the electron beam dose. Therefore, in this step, determining the speed-dose product is equivalent to determining the production line speed and the electron beam dose. When determining the production line speed, it is necessary to compare the feedback value of the coating curing production line control system with the set target speed, and adjust the production line speed according to the speed difference. When determining the electron beam dose, the dose of the electron beam irradiated to the coating surface is measured in real time, the electron beam dose is calculated, and the energy of the electron beam is adjusted according to the set electron beam dose target.

[0092] S105, determining a target beam current interval corresponding to the target beam current based on the real-time control target and the first relationship.

[0093] Specifically, the real-time control target is substituted into the first relationship to determine the target beam current corresponding to the real-time control target, and the target beam current interval in which the target beam current is located is determined according to the divided beam current intervals.

[0094] Preferably, after determining the target beam current interval corresponding to the target beam current based on the real-time control target and the first relationship, the method further comprises: determining a target second relationship from a plurality of second relationships determined by segmentation based on the target beam current interval; intercepting a target interval corresponding to the first relationship based on the interval in which the target second relationship is located; correcting the first relationship based on the target interval; determining a target beam current interval and a target grid voltage corresponding to the target beam current based on the corrected first relationship.

[0095] Wherein, the overall first relationship and the segmented plurality of second relationships obtained in the previous steps are used to first perform a first round of trial calculation, so as to screen out the interval associated with the real-time control target, and the target grid voltage achieving the real-time control target is calculated by using the first relationship and the second relationship of the interval. That is, first, the target beam current interval is obtained according to the first relationship, it is determined which second relationship the target beam current interval corresponds to according to the second relationship, the second relationship of this segment is selected, the interval corresponding to the first relationship is back calculated, that is, the most relevant target interval of grid voltage control, the interval in the first relationship is back calculated according to the extreme point of the interval in which the second relationship is located, the first relationship is re-fitted according to the experimental data in the interval back calculated, the correction of the first relationship is realized, and finally the corrected first relationship and the second relationship are used to calculate the grid voltage. Preferably, the correction can be to keep the equation of the first relationship unchanged and re-fit each parameter of the equation; the correction can also be re-fitting.

[0096] The method provided by the application takes the first relationship and the second relationship as an organic whole, independently uses experimental data to fit the first relationship and the second relationship when the contents of the first relationship and the second relationship are preliminarily determined, so as to avoid excessive introduction of interference of other parameters; on this basis, the most accurate use range is selected according to the input and output of the two before real-time control, and the relationship in the range is corrected, at this time, the input and output correlation between the first relationship and the second relationship is also used, which greatly improves the accuracy of the grid voltage control, and the relationship is corrected only when the real-time control target is generated, without using too high fitting accuracy at the initial moment, thereby improving the efficiency of the grid voltage control and providing guarantee for real-time online control.

[0097] S106, calculating a target grid voltage based on the second relationship corresponding to the target beam current interval.

[0098] Specifically, for the determined target beam current interval, a target grid voltage interval corresponding to the target beam current interval is determined based on the correspondence between the grid voltage interval and the beam current interval. Further, based on the target grid voltage interval and the target beam current interval, the correlation coefficient in the second relationship is obtained, and then the target grid voltage is calculated.

[0099] S107, adjusting the grid voltage of the controlled device based on the measured beam current feedback with the target grid voltage as a preset value.

[0100] In specific implementation, the adjusting the grid voltage of the controlled device based on the measured beam current feedback with the target grid voltage as a preset value includes:

[0101] (1) controlling the controlled device to emit beam at the target grid voltage to obtain a measured beam current.

[0102] Specifically, the controlled device is controlled to emit beam at the target grid voltage, and a special measuring instrument (such as a Faraday cup, a current transformer, a Hall probe, etc.) is used to measure the measured beam current.

[0103] (2) determining whether the quotient of the measured beam current and the target beam current is greater than a first preset threshold or less than a second preset threshold; wherein the first preset threshold is greater than the second preset threshold, and the absolute value of the difference between the first preset threshold and the second preset threshold does not exceed a third preset threshold.

[0104] Specifically, the first preset threshold and the second preset threshold are set according to actual needs, which are not limited in this embodiment. It should be noted that the first preset threshold is greater than the second preset threshold, and the absolute value of the difference between the first preset threshold and the second preset threshold does not exceed the third preset threshold.

[0105] For example, in an embodiment, the first preset threshold is 105%, the second preset threshold is 95%, and the third preset threshold is 10%.

[0106] (3) when the quotient is greater than the first preset threshold, subtracting a specified value from the target grid voltage.

[0107] Specifically, the specified value is set according to actual needs, and in the embodiment, the specific value of the specified value is not limited. For example, in an embodiment, the specified value is 1.

[0108] In the specific implementation, when the quotient of the measured beam current and the target beam current is greater than the first preset threshold, the target grid voltage is subtracted by the specified value.

[0109] For example, in an embodiment, in combination with the above example, when the quotient of the measured beam current and the target beam current is greater than 105%, the target grid voltage is subtracted by 1 in this step.

[0110] (4) when the quotient is less than the second preset threshold, adding a specified value to the target grid voltage.

[0111] Specifically, the specified value is set according to actual needs, and in the embodiment, the specific value of the specified value is not limited. For example, in an embodiment, the specified value is 2.

[0112] In the specific implementation, when the quotient of the measured beam current and the target beam current is less than the second preset threshold, the target grid voltage is added by the specified value.

[0113] For example, in an embodiment, in combination with the above example, when the quotient of the measured beam current and the target beam current is less than 95%, the target grid voltage is added by 2 in this step.

[0114] (5) controlling the controlled device to emit beam based on the adjusted target grid voltage until the quotient of the measured beam current and the target beam current is greater than the second preset threshold and less than the first preset threshold.

[0115] Specifically, the controlled device is controlled to emit beam under the adjusted target grid voltage, and the measured beam current is measured by a special measuring instrument (such as a Faraday cup, a current transformer, a Hall probe, etc.). The relationship between the quotient of the measured beam current and the target beam current and the first preset threshold and the second preset threshold is recalculated until the quotient of the measured beam current and the target beam current is greater than the second preset threshold and less than the first preset threshold, without adjustment, normal emission.

[0116] Preferably, after the beam current is adjusted based on the measured beam current feedback, the method further comprises: calculating the difference between the real-time control grid voltage and the target grid voltage when the measured beam current reaches the real-time control target; and correcting the first relationship and a second relationship corresponding to the real-time control target based on the difference. Since the first relationship and the second relationship fitted by segmentation are fitted only once at the initial time, and only through the interval selection and correction method to continuously approach the actual situation of the grid voltage control in normal use, in order to improve the accuracy of the real-time control, the first relationship and the second relationship corresponding to the real-time control target need to be corrected according to the results of the real-time control. The correction can be to add a constant term, adjust the coefficients of the first relationship and the second relationship. The method provided by the application firstly obtains the global relationship according to the experimental data, and then determines the relevant local relationship according to the real-time control target during use, and corrects it, so that only the existing relationship needs to be corrected in the online stage, greatly reducing the online calculation amount, improving the efficiency of the grid voltage control, and greatly improving the accuracy of the grid voltage control through continuous optimization.

[0117] The electronic beam current automatic real-time control method provided by the embodiment determines the first relationship between the velocity dose product and the beam current and the second relationship between the grid voltage interval and the beam current interval, determines the target beam current and the target beam current interval according to the first relationship between the velocity dose product and the target beam current interval after the velocity dose product is determined, determines the target grid voltage according to the target beam current interval and the second relationship, controls the controlled device to emit a beam at the target grid voltage, and adjusts the grid voltage of the controlled device based on the measured beam current feedback. First, the first relationship and the second relationship between the beam current, the velocity and the grid voltage are obtained by fitting the historical data, and then the relevant relationship used for calculation is matched according to the real-time control target, so that the relevant relationship meeting the actual production line and control requirements is obtained. According to the actual velocity of the production line and the target required electronic beam properties, the control grid voltage corresponding to the target requirement is automatically calculated by using the relevant relationship, so that quantitative and accurate control is realized, and the automatic real-time control of the electronic beam current is realized. Second, the method provided by the present application uses the target grid voltage control value as the preset initial value, and adjusts the grid voltage value according to the actual production situation, so that the grid voltage output by the system is always near the target grid voltage, thereby improving the stability of the system. It is very important for the stable operation and high-quality production of the coating curing production line to ensure that the coating curing production line can maintain a stable electronic beam current at high speed and accurately control the electronic beam dose, thereby ensuring the quality and efficiency of the coating curing process. Third, the method provided by the present application does not need to rely on human experience, and automatically calculates the grid voltage initial value according to the correlation between the data, thereby generating a corresponding amount of electronic beam, improving the automation level of the coating curing production line, and providing higher reliability and stability for production. This will help to reduce human errors and waste in the production process, improve production efficiency, and meet more stringent quality standards.

[0118] Corresponding to the foregoing embodiment of the electronic beam current automatic real-time control method, the present application also provides an embodiment of an electronic beam current automatic real-time control device.

[0119] Figure 3 The structural schematic diagram of the electronic beam current automatic real-time control device provided by the present application is shown in Figure 1. Figure 3 The device provided by the present embodiment comprises a determination module 310, a calculation module 320 and an adjustment module 330.

[0120] The determination module 310 is configured to determine the first relationship between the velocity dose product and the beam current of the controlled device.

[0121] The determination module 310 is further configured to determine the grid voltage segmentation value based on the historical grid voltage and the beam current data of the controlled device.

[0122] The determination module 310 is further configured to determine a grid voltage interval and a corresponding beam current interval based on the grid voltage segmentation value, and determine a second relationship of each grid voltage interval, the second relationship being a relationship between the beam current and the grid voltage.

[0123] The determination module 310 is further configured to determine a real-time control target, the real-time control target at least including a speed-dose product.

[0124] The determination module 310 is further configured to determine a target beam current interval corresponding to a target beam current based on the real-time control target and the first relationship.

[0125] The calculation module 320 is configured to calculate a target grid voltage based on the second relationship corresponding to the target beam current interval.

[0126] The adjustment module 330 is configured to adjust the grid voltage of the controlled device based on a measured beam current feedback, with the target grid voltage as a preset value.

[0127] The electronic beam current automatic real-time control device provided by the embodiment determines the first relationship between the speed-dose product and the beam current and the second relationship between the grid voltage interval and the beam current interval, and then determines the target beam current and the target beam current interval according to the speed-dose product and the first relationship after determining the speed-dose product, further determines the target grid voltage according to the target beam current interval and the second relationship, and finally controls the controlled device to emit a beam at the target grid voltage and adjusts the grid voltage of the controlled device based on the measured beam current feedback. First, the first relationship and the second relationship between the beam current, the speed, and the grid voltage are obtained by fitting historical data, and then the relevant relationship used for calculation is matched according to the real-time control target, and the relevant relationship that meets the actual production line and control requirements is obtained by fitting, and the relevant relationship is used to automatically calculate the control grid voltage corresponding to the target demand according to the actual speed of the production line and the target required electronic beam properties, realizing quantitative and accurate control and automatic real-time control of the electronic beam current. Second, the method provided by the present application uses the grid voltage control value meeting the target as a preset initial value, and adjusts the grid voltage value according to the actual production situation, so that the grid voltage output by the system is always near the target grid voltage, improving the stability of the system, which is crucial for the stable operation and high-quality production of the coating curing production line, ensuring that the coating curing production line can maintain a stable electronic beam current at high speed, and accurately controlling the electronic beam dose, thereby ensuring the quality and efficiency of the coating curing process. Third, the method provided by the present application does not need to rely on human experience, but automatically calculates the grid voltage initial value according to the correlation between the data, thereby generating a corresponding amount of electronic beam, improving the automation level of the coating curing production line, and providing higher reliability and stability for production. This will help to reduce human errors and waste in the production process, improve production efficiency, and meet more stringent quality standards.

[0128] The device of the embodiment can be used to execute Figure 1 The steps of the method embodiment are similar to the implementation principle and process, and will not be described here.

[0129] The implementation process of the functions and roles of each unit in the device is described in detail in the implementation process of the corresponding steps in the above method, and will not be described here.

[0130] For the device embodiment, since it basically corresponds to the method embodiment, the relevant part can be seen in the part of the method embodiment. The device embodiment described above is only schematic, and the units shown as separate components can or can not be physically separate, and the components shown as units can or can not be physical units, that is, they can be located in one place, or distributed on multiple network units. According to the actual needs, part or all of the modules can be selected to achieve the purpose of the scheme of the present application. Those skilled in the art can understand and implement without creative labor.

[0131] The above is only the preferred embodiment of the present application, and is not used to limit the present application. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present application shall be included in the scope of protection of the present application.

Claims

1. A method for automatic real-time control of an electron beam, characterized in that, The method includes: Determine the primary relationship between the velocity-dose product of the controlled device and the beam current; Determine the grid voltage segment values ​​based on the historical grid voltage and beam current data of the controlled device; Based on the gate voltage segmentation value, the gate voltage interval and the corresponding beam current interval are determined, and a second relationship is determined for each of the gate voltage intervals, wherein the second relationship is the relationship between the beam current and the gate voltage. The real-time control target is determined, which includes at least the velocity-dose product, which is the product of the production line speed and the electron beam dose; The target beam interval corresponding to the target beam is determined based on the real-time control target and the first relationship; The target gate voltage is calculated based on the second relationship corresponding to the target beam interval; The grid voltage of the controlled device is adjusted based on the measured beam current feedback, with the target grid voltage as a preset value.

2. The method according to claim 1, characterized in that, Determining the first relationship between the velocity-dose product of the controlled device and the beam current includes: By controlling the beam output of the controlled device under different velocity-dose products, multiple sets of experimental data on the velocity-dose product and beam current were obtained; Linear fitting was performed on the experimental data to obtain the first relationship between the velocity-dose product and the beam current.

3. The method according to claim 1, characterized in that, The determination of grid voltage segment values ​​based on historical grid voltage and beam current data of the controlled device includes: Based on the historical gate voltage of the controlled device, the target range and historical distribution characteristics of the historical gate voltage of the controlled device are determined. The historical distribution characteristics are gate voltage value blocks aggregated based on the frequency of occurrence of different gate voltage values. Based on the historical distribution characteristics, the gate voltage is segmented within the target range, and the target range is divided into multiple gate voltage intervals to obtain multiple gate voltage segment values. Based on the beam values ​​corresponding to the plurality of gate voltage segment values ​​and the beam data, a target gate voltage segment value is selected from the plurality of gate voltage segment values; The target gate voltage segment value is adjusted according to the range of gate voltage data corresponding to the beam data.

4. The method according to claim 1, characterized in that, The step of determining the gate voltage interval and the corresponding beam interval based on the gate voltage segmentation value, and determining the second relationship of each of the gate voltage intervals, includes: The controlled device is controlled to emit a beam at the grid voltage segment value to obtain the beam current corresponding to the grid voltage segment value; Based on the gate voltage segment values ​​and the corresponding beam currents, the correspondence between the gate voltage intervals and the beam current intervals is determined; Piecewise linear fitting is performed on the correspondence to obtain a second relationship between the beam current and the gate voltage.

5. The method according to claim 1, characterized in that, The process of determining the velocity-dose product includes: The irradiation time is determined based on the production line speed of the controlled equipment; wherein, the production line speed is controlled by the coating curing production line control system. The electron beam dose is determined based on the irradiation time; Based on the production line speed and the electron beam dose, a velocity-dose product is determined; wherein the velocity-dose product is the product of the production line speed and the electron beam dose.

6. The method according to claim 1, characterized in that, The step of adjusting the gate voltage of the controlled device based on the measured beam current feedback, using the target gate voltage as a preset value, includes: The controlled device is controlled to emit a beam under the target grid voltage to obtain a measured beam current; Determine whether the quotient of the measured beam and the target beam is greater than a first preset threshold or less than a second preset threshold; wherein, the first preset threshold is greater than the second preset threshold, and the absolute value of the difference between the first preset threshold and the second preset threshold does not exceed a third preset threshold; When the quotient is greater than a first preset threshold, the target gate voltage is subtracted by a specified value; When the quotient is less than the second preset threshold, the target gate voltage is increased by a specified value; The controlled device emits a beam based on the adjusted target grid voltage until the quotient of the measured beam current and the target beam current is greater than a second preset threshold and less than a first preset threshold.

7. The method according to claim 3, characterized in that, The step of adjusting the target gate voltage segment value according to the range of gate voltage data corresponding to the beam data includes: Adjust the target range according to the range of the gate voltage data corresponding to the beam data, so that the overlap between the target range and the range of the gate voltage data is greater than a preset threshold. Adjust the target gate voltage segment value within the target range according to the range of gate voltage data corresponding to the beam data. The direction of adjustment of the target gate voltage segment value is opposite to the direction of adjustment of the target range.

8. The method according to claim 1, characterized in that, After adjusting the grid voltage of the controlled device based on measured beam current feedback, the method further includes: When the measured beam current reaches the real-time control target, the difference between the real-time control gate voltage and the target gate voltage is calculated; The first relationship and the second relationship corresponding to the real-time control target are corrected based on the difference.

9. An automatic real-time control device for an electron beam, characterized in that, The device includes: a determining module, a calculating module, and an adjusting module; wherein... The determining module is used to determine a first relationship between the velocity-dose product of the controlled device and the beam current; The determining module is also used to determine the grid voltage segment value based on the historical grid voltage and beam current data of the controlled device; The determining module is further configured to determine the gate voltage interval and the corresponding beam current interval based on the gate voltage segment value, and to determine a second relationship for each of the gate voltage intervals, wherein the second relationship is the relationship between the beam current and the gate voltage. The determining module is also used to determine a real-time control target, which includes at least the velocity-dose product, which is the product of the production line speed and the electron beam dose. The determining module is further configured to determine the target beam interval corresponding to the target beam based on the real-time control target and the first relationship; The calculation module is used to calculate the target gate voltage based on the second relationship corresponding to the target beam interval; The adjustment module is used to adjust the gate voltage of the controlled device based on the measured beam current feedback, with the target gate voltage as a preset value.

Images