A nozzle for a cleaning machine with a thorough cleaning function

Abstract

A nozzle for use on a cleaning machine and having the function of thorough cleaning, comprising a wastewater recovery pipe in the middle and a wastewater collecting surface annularly surrounding the inlet at the top of the wastewater recovery pipe, the wastewater collecting surface being inclined from the periphery to the center and from top to bottom, a plurality of cleaning channels for directional conveying of cleaning materials being arranged at intervals on the wastewater collecting surface, the outlet directions of the cleaning channels being inclined toward the center of the wastewater recovery pipe, a shielding portion protruding from the wastewater collecting surface for shielding the outlet of the cleaning channel being arranged at the outlet of the cleaning channel; a plurality of cleaning channels arranged on the wastewater collecting surface are arranged, and the wastewater collecting surface is arranged in an inclined manner, so that the cleaning materials dropped on the wastewater collecting surface can quickly flow to the wastewater recovery pipe under the guidance of the wastewater collecting surface, and at the same time, the outlet direction of the cleaning channel is arranged in an inclined manner toward the center of the wastewater recovery pipe, so that the cleaning materials in the cleaning channel can be sprayed toward the wafer in a directional manner.

Description

Technical Field

[0001] The invention relates to wafer cleaning equipment, in particular to a nozzle used in a cleaning machine and having the function of thorough cleaning. Background Art

[0002] In order to reduce cross contamination during the cleaning process and improve the yield rate, the existing wafer wet cleaning has gradually transitioned from traditional tank cleaning to single-wafer cleaning; the existing single-wafer cleaning process usually requires the use of multiple cleaning materials to clean the wafer, which makes the wafer cleaning process relatively complicated; the existing wafer cleaning device, such as the patent application number CN2012102204451, is a wafer backside cleaning device with a simple structure, high cleaning efficiency and reliability, comprising: a wafer chuck, carrying a wafer; a nozzle, having a through hole, a plurality of nozzles and a gas channel, the nozzle spraying gas to the back side of the wafer clamped on the wafer chuck The nozzle is provided with a support rod, the support rod is received in the through hole of the nozzle, a plurality of support arms are arranged on the support rod for loading and unloading the wafer; and a driving device is provided for driving the support rod to move up and down; the through hole for introducing gas in the above device is arranged at the center of the nozzle, which may cause the cleaning material to drip into the through hole and then spray the cleaning material to the wafer again at the next jet, so that the cleaning is not thorough; at the same time, other different types of cleaning materials may easily enter the nozzle, so as to cause the mixing of the cleaning materials and fail to ensure thorough cleaning. Summary of the invention

[0003] The present invention aims to solve the problems existing in the above-mentioned prior art and provides a nozzle for use in a cleaning machine with a thorough cleaning function, which can avoid the mixing of cleaning materials in different cleaning channels during cleaning and the formation of drug residues on the wafer surface, thereby ensuring that the nozzle is thoroughly cleaned during use and improving the yield rate of the cleaning process.

[0004] The present invention solves the technical problem by adopting a technical solution: the nozzle used in a cleaning machine and having the function of thorough cleaning comprises a wastewater recovery pipe in the middle and a wastewater collection surface which is annularly surrounding the inlet at the top of the wastewater recovery pipe. The wastewater collection surface is inclined from the outer periphery to the center and from top to bottom. A plurality of cleaning channels for directional transportation of cleaning materials are arranged at intervals on the wastewater collection surface. The outlet directions of the cleaning channels are all inclined toward the center of the wastewater recovery pipe. A shielding portion which protrudes from the wastewater collection surface and is used to shield the outlet of the cleaning channel is provided on the outlet of the cleaning channel. A plurality of cleaning channels arranged on the wastewater collection surface are provided. The cleaning channel has a wastewater collecting surface which is inclined, so that the cleaning materials dropped on the wastewater collecting surface can quickly flow to the wastewater recovery pipe under the guidance of the wastewater collecting surface. At the same time, the outlet direction of the cleaning channel is inclined toward the center of the wastewater recovery pipe, so that the cleaning materials in the cleaning channel can be sprayed toward the wafer in a direction. At the same time, the outlet position of the cleaning channel on the wastewater collecting surface has a smaller opening, thereby reducing the possibility of the cleaning materials entering the cleaning channel in the relative direction. At the same time, a shielding portion is provided on the outlet of the cleaning channel to prevent the cleaning materials flowing along the wastewater collecting surface from flowing into the cleaning channel.

[0005] Preferably, the cleaning channel includes a vertical channel opened in the nozzle, a directional bending channel arranged on the side of the vertical channel close to the wastewater collecting surface and connected with the vertical channel, and an outlet channel vertically opened on the wastewater collecting surface and connected with the directional bending channel. The outlet position of the cleaning channel is the outlet channel vertically opened on the wastewater collecting surface, thereby ensuring that the position of the cleaning channel opened on the wastewater collecting surface is minimized. At the same time, a directional bending channel is provided to ensure that the outlet position of the cleaning channel is inclined toward the center of the wastewater recovery pipe, thereby ensuring the directional spraying of the cleaning material.

[0006] Preferably, the plurality of cleaning channels include a nitrogen channel for conveying nitrogen and a pickling channel for conveying hydrofluoric acid. The nitrogen channel and the pickling channel are not on the same vertical plane passing through the center of the wastewater recovery pipe, and the nitrogen channel and the pickling channel are arranged at 0-90° relative to the center of the wastewater recovery pipe on the horizontal projection plane; so that the nitrogen channel and the pickling channel are not on the same vertical plane, and thus when the hydrofluoric acid in the pickling channel is sprayed out, the hydrofluoric acid is prevented from entering the nitrogen channel, and thus when the final nitrogen purge is performed through the nitrogen channel, the hydrofluoric acid in the nitrogen channel is prevented from being blown back onto the wafer to form drug residues.

[0007] Preferably, a conveying pipe is inserted into the vertical channel from bottom to top, and a bending deformation tube located in the directional bending channel is provided on the side of the conveying pipe close to the directional bending channel. The conveying pipe and the bending deformation tube are provided, and the cleaning material can be conveyed through the conveying pipe and the bending deformation tube.

[0008] Preferably, the shielding portion includes an arc-shaped baffle plate vertically arranged on the wastewater collecting surface and surrounding the upper half of the cleaning channel outlet, and the arc-shaped baffle plate is used to block the cleaning material flowing downward on the wastewater collecting surface, thereby preventing the cleaning material from flowing into the outlet of the cleaning channel.

[0009] Preferably, the shielding portion includes a protruding tube head connected to the bending and deforming tube and protruding from the outlet of the cleaning pipe, and the protruding tube head is arranged in a ring shape on the inner side of the outlet channel. The shielding portion can also be a pipeline connected to the bending and deforming tube and arranged as an integral whole. The corresponding pipeline protrudes outward from the wastewater collecting surface to form a protruding tube head, so that the cleaning material is directionally sprayed through the conveying pipe, the bending and deforming tube and the protruding tube head in sequence; at the same time, since the protruding tube head protrudes from the wastewater collecting surface, the cleaning material left on the wastewater collecting surface cannot enter the protruding tube head, thereby ensuring that the corresponding cleaning material will not be affected by the cleaning material sprayed in other relative directions during spray cleaning.

[0010] Preferably, there are 5 cleaning channels and they are evenly distributed on concentric circles with the center of the wastewater recovery pipe as the center. The cleaning channels also include a particle cleaning channel for conveying a mixed solution of ammonia water and hydrogen peroxide, a water delivery channel for conveying pure water, and an oxidation channel for conveying ozone water. There are 5 cleaning channels in the present application and they are evenly distributed on the same concentric circle, so that the cleaning channels are not on the same vertical plane passing through the center of the wastewater recovery pipe, thereby further avoiding the cleaning materials in the cleaning channels from entering the cleaning channels in the opposite direction after being sprayed out.

[0011] Preferably, a flexible nozzle is installed on the outside of the protruding tube head, and the flexible nozzle includes a connecting pipe fixedly connected to the outside of the protruding tube head, a deformation portion arranged on the outside of the connecting pipe and gradually bending and deforming from the inside to the outside toward the center of the pipe, and a scraping portion arranged on the outside of the connecting pipe and with a diameter larger than the diameter of the cleaning channel; in the present application, a flexible nozzle is provided, and the flexible nozzle opens under the action of the cleaning material when the cleaning material is sprayed. On the contrary, when the cleaning material does not need to be sprayed, the deformation portion on the flexible nozzle returns to a position close to the center of the connecting pipe to narrow the outlet channel of the flexible nozzle, thereby preventing other cleaning materials from entering the flexible nozzle.

[0012] Preferably, the cleaning channel is a nitrogen channel, a pickling channel, a water supply channel, an oxidation channel and a particle cleaning channel in a counterclockwise direction from top to bottom; the nitrogen channel and the pickling channel are arranged adjacent to each other, so that the nitrogen channel is away from the relative direction of the pickling channel, further preventing the hydrofluoric acid in the pickling channel from flowing into the nitrogen channel after being sprayed out.

[0013] Preferably, an outer ring cleaning channel is also provided on the wastewater collection surface, which is arranged opposite to the nitrogen channel and located outside the concentric circle of the cleaning channel. An outer ring cleaning pipe for conveying pure water is inserted into the inner side of the outer ring cleaning channel. An outer ring cleaning pipe is provided to further clean the outer ring of the wafer to ensure that the wafer is thoroughly cleaned.

[0014] The beneficial effects of the present invention are as follows: the cleaning channel in the present invention is arranged on an inclined wastewater collecting surface, and the cleaning materials dropped on the wastewater collecting surface are quickly guided and collected through the inclined wastewater collecting surface, so that the cleaning materials dropped on the wastewater collecting surface flow to the wastewater recovery pipe for unified collection; the outlet direction of the cleaning channel is inclined toward the center of the wastewater recovery pipe so that the cleaning materials in the cleaning channel can be sprayed toward the wafer in a direction, and at the same time, the outlet position opening of the cleaning channel on the wastewater collecting surface is smaller, thereby reducing the possibility of the cleaning materials entering the cleaning channel in the relative direction; and in the present application, a shielding portion is provided on the outlet of the cleaning channel, which can prevent the cleaning materials flowing along the wastewater collecting surface from flowing into the cleaning channel and causing mixing of the cleaning materials. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 It is a structural schematic diagram when the shielding portion in the present invention is a protruding tube head;

[0016] Figure 2 for Figure 1 A top view of

[0017] Figure 3 for Figure 2 The view in the CC direction;

[0018] Figure 4 for Figure 3 A magnified view of part A;

[0019] Figure 5 It is a structural schematic diagram when the shielding part in the present invention is a curved baffle;

[0020] Figure 6 for Figure 1 A schematic diagram of the structure when a flexible nozzle is installed;

[0021] Figure 7 for Figure 6 A magnified view of part B;

[0022] Figure 8 It is a schematic diagram of the position of the present invention and the wafer during cleaning.

[0023] Explanation of the accompanying drawings: 1. Wastewater recovery pipeline, 2. Wastewater collection surface, 3. Cleaning channel, 3-1-1. Vertical channel, 3-1-2. Directional bending channel, 3-1-3. Outlet channel, 3-1. Nitrogen channel, 3-2. Pickling channel, 4. Conveying pipeline, 5. Bending and deformation tube 6. Arc baffle, 7. Protruding pipe head, 3-3. Water supply channel, 3-4. Oxidation channel, 3-5. Particle cleaning channel, 8. Outer ring cleaning channel, 9. Outer ring cleaning tube, 10. Flexible nozzle, 10-1. Connecting pipeline, 10-2. Deformation part, 10-3. Scraping part, 11. Wafer. DETAILED DESCRIPTION

[0024] The present invention will be further described below in conjunction with the accompanying drawings:

[0025] Embodiment 1

[0026] Referring to the accompanying drawings: This embodiment discloses a nozzle for use on a cleaning machine with a thorough cleaning function, including a wastewater recovery pipe 1 in the middle and a wastewater collecting surface 2 that is annularly surrounding the top inlet of the wastewater recovery pipe 1. Specifically, in order to facilitate the drainage and recovery of dripping waste water, the wastewater collecting surface 2 in this embodiment is inclined from the periphery to the center and from top to bottom to form an inverted cone-shaped arc surface. In this embodiment, a plurality of cleaning channels 3 for directional transportation of cleaning materials are distributed at intervals on the wastewater collecting surface 2.

[0027] The cleaning material in this embodiment includes gas and liquid, specifically, Figure 5 As shown, the several cleaning channels 3 in this embodiment include a nitrogen channel 3-1 for conveying nitrogen and a pickling channel 3-2 for conveying hydrofluoric acid. During cleaning, in order to prevent the hydrofluoric acid cleaning material in the pickling channel 3-2 from entering the nitrogen channel 3-1, in this embodiment, the nitrogen channel 3-1 and the pickling channel 3-2 are not on the same vertical plane passing through the center of the wastewater recovery pipe 1, thereby preventing the hydrofluoric acid in the pickling channel 3-2 from being injected into the nitrogen channel 3-1 in the corresponding direction when spraying to clean the wafer 11; further, the nitrogen channel 3-1 and the pickling channel 3-2 in this embodiment are arranged at 0-90° relative to the center of the wastewater recovery pipe 1 on the horizontal projection plane, thereby making the nitrogen channel 3-1 away from the injection direction of the cleaning material on the pickling channel 3-2, ensuring that the nitrogen channel 3-1 is not contaminated by the hydrofluoric acid cleaning material.

[0028] like Figure 8As shown, the wafer 11 is arranged above the nozzle in this embodiment and keeps rotating during the cleaning process; when in use, the cleaning material is transported from bottom to top through the cleaning channel 3, and in this embodiment, the outlet direction of the cleaning channel 3 is inclined toward the center of the wastewater recovery pipe 1, so that the liquid cleaning material can be more easily dripped into the wastewater recovery pipe 1 for effective recovery after being transported through the cleaning channel 3 and contacting the wafer 11.

[0029] Specifically, there are five cleaning channels 3 in this embodiment, and the five cleaning channels 3 are evenly spaced and distributed on concentric circles with the center of the wastewater recovery pipeline 1 as the center; the corresponding five cleaning channels 3 include, in addition to the pickling channel 3-2 and the nitrogen channel 3-1, a particle cleaning channel 3-5 for conveying a mixed solution of ammonia water and hydrogen peroxide, a water delivery channel 3-3 for conveying pure water, and an oxidation channel 3-4 for conveying ozone water.

[0030] Furthermore, the wastewater collection surface 2 is also provided with an outer ring cleaning channel 8 which is arranged opposite to the nitrogen channel 3-1 and located outside the concentric circle of the cleaning channel 3. An outer ring cleaning pipe 9 for conveying pure water is inserted into the inner side of the outer ring cleaning channel 8. In order to ensure that all parts of the surface of the wafer 11 are completely cleaned, the wafer 11 keeps rotating during the cleaning process, so that the liquid adsorbed on the surface of the wafer 11 will be driven to the outer ring of the wafer 11 under the action of centrifugal force, and thus the outer ring of the wafer 11 needs to be cleaned in particular.

[0031] When cleaning the wafer, first, introduce hydrofluoric acid cleaning material into the pickling channel 3-2 on the nozzle, so that the hydrofluoric acid liquid is sprayed onto the outer surface of the rotating wafer 11, and then clean the silicon oxide layer on the surface of the wafer 11, and then introduce a mixed solution of ammonia and hydrogen peroxide into the particle cleaning channel 3-5 on the nozzle to clean the particles on the surface of the wafer 11, and then introduce pure water into the water supply channel 3-3 on the nozzle to rinse the surface of the wafer 11, and then introduce ozone water into the oxidation channel 3-4 on the nozzle to form an oxide film on the surface of the wafer 11, repeat the above steps 2-3 times, and then introduce pure water into the water supply channel 3-3 on the nozzle to rinse the wafer 11, and then introduce nitrogen into the nitrogen channel 3-1 on the nozzle to purge the surface of the wafer 11 with nitrogen, and finally introduce pure water into the outer ring cleaning pipe 9 to rinse the outer ring of the wafer 11 to ensure that the wafer is thoroughly cleaned.

[0032] Furthermore, if Figure 8As shown, when the wafer 11 is rotating counterclockwise when viewed from top to bottom, the cleaning channel 3 is sequentially a nitrogen channel 3-1, a pickling channel 3-2, a water supply channel 3-3, an oxidation channel 3-4 and a particle cleaning channel 3-5 in the counterclockwise direction from top to bottom, so that when the hydrofluoric acid cleaning material is sprayed from the pickling channel 3-2 to the outer surface of the wafer 11, the counterclockwise rotation of the wafer 11 can first rotate the hydrofluoric acid cleaning material adhered to the surface of the wafer 11 to a position away from the nitrogen channel 3-1, and at the same time, during the rotation process, the hydrofluoric acid cleaning material adhered to the surface of the wafer 11 moves outward under the action of centrifugal force and is thrown out, so that the hydrofluoric acid cleaning material on the surface of the wafer 11 is less when it rotates to a position opposite to the nitrogen channel 3-1, thereby preventing the hydrofluoric acid cleaning material from being thrown toward the nitrogen channel 3-1.

[0033] Furthermore, if Figures 1 to 5 As shown, in order to prevent the cleaning material from flowing into different cleaning channels 3 while sliding downward along the wastewater collection surface 2 and thus affecting the cleaning effect, in this embodiment, a shielding portion protruding from the wastewater collection surface 2 is provided at the outlet of the cleaning channel 3 for shielding the outlet of the cleaning channel 3; specifically, as Figure 5 As shown, the shielding portion in this embodiment includes an arc-shaped baffle 6 vertically arranged on the wastewater collecting surface 2 and surrounding the upper half of the outlet of the cleaning channel 3, so that the cleaning material sliding down from the wastewater collecting surface 2 flows to both sides of the outlet of the cleaning channel 3 under the action of the arc-shaped baffle 6, thereby preventing the cleaning material from entering other cleaning channels 3 to contaminate other cleaning materials, and also preventing the arc-shaped baffle 6 from limiting the directional spraying of the cleaning material in the cleaning channel 3.

[0034] Embodiment 2

[0035] like Figures 1 to 4 As shown, the nozzle in this embodiment is different from that in the first embodiment in that the specific structure of the plurality of cleaning channels 3 in this embodiment includes a vertical channel 3-1-1 opened in the nozzle, a directional bending channel 3-1-2 arranged on the side of the vertical channel 3-1-1 close to the wastewater collection surface 2 and connected to the vertical channel 3-1-1, and an outlet channel 3-1-3 vertically opened on the wastewater collection surface 2 and connected to the directional bending channel 3-1-2, and the outlet direction of the cleaning channel 3 is inclined toward the center of the wastewater recovery pipe 1 through the directional bending channel 3-1-2; correspondingly, as shown in FIG. Figure 3 and Figure 4As shown, a conveying pipe 4 is inserted into the vertical channel 3-1-1 from bottom to top in this embodiment, and a bending deformation tube 5 located in the directional bending channel 3-1-2 is provided on the side of the conveying pipe 4 close to the directional bending channel 3-1-2, and the shielding portion includes a protruding pipe head 7 connected to the bending deformation tube 5 and protruding from the outlet of the cleaning pipe 3, and the protruding pipe head 7 is arranged in a ring shape on the inner side of the outlet channel 3-1-3; the conveying pipe 4, the bending deformation tube 5 and the protruding pipe head 7 in this embodiment are arranged as an integrated whole, and then when in use, the integrated conveying pipe 4, the bending deformation tube 5 and the protruding pipe head 7 need to be inserted into the cleaning channel 3, and before being installed into the cleaning channel 3, the integrated conveying pipe The channel 4, the bent deformed tube 5 and the protruding tube head 7 are all vertical circular rubber pipes. After installation, the original vertical circular rubber pipe is deformed into an arc-shaped bent deformed tube 5 under the action of the bent channel 3-1-2. The bent channel 3-1-2 ensures that the bent deformed tube 5 drives the protruding tube head 7 to tilt toward the center of the wastewater recovery pipe 1, and also makes the deformed bent deformed tube 5 and the bent channel 3-1-2 squeeze each other to achieve close contact, thereby increasing the friction between the bent deformed tube 5 and the bent channel 3-1-2, preventing the circular rubber pipe from escaping from the cleaning channel 3, and also ensuring that the protruding tube head 7 is in a state of protruding from the outlet of the cleaning pipe 3 and the wastewater collection surface 2.

[0036] Furthermore, if Figure 6 and Figure 7As shown, in order to further prevent other cleaning materials from entering the protruding tube head 7 in the relative direction, a flexible nozzle 10 is installed on the outside of the protruding tube head 7 in this embodiment; wherein, the flexible nozzle 10 includes a connecting pipe 10-1 fixedly connected to the outside of the protruding tube head 7, a deformation portion 10-2 arranged on the outside of the connecting pipe 10-1 and gradually bent and deformed from the inside to the outside toward the center of the connecting pipe 10-1, and a scraping portion 10-3 arranged on the outside of the connecting pipe 10-1 and having a diameter greater than the diameter of the cleaning channel 3, and the scraping portion 10-3 is also made of elastic deformable material; when the protruding tube body 7 is spraying liquid or air, the liquid or gas enters the connecting pipe 10-1 and squeezes the deformation portion 10-2 outward, thereby causing the deformation portion 10-2 to expand and deform outward to ensure the normal outflow of liquid or gas, and when the protruding tube body 7 is not spraying liquid Or when spraying, the deformed portion 10-2 returns to its normal position close to the center of the connecting pipe 10-1, thereby reducing the outlet position of the flexible nozzle 10 to a normal small hole state, thereby further preventing the cleaning material of the cleaning channel 3 in the relative position from entering the flexible nozzle 10 after spraying and flushing; at the same time, when the cleaning channel 3 needs to be cleaned or the integrated conveying pipe 4, the bent deformed tube 5 and the protruding tube head 7 in the cleaning channel 3 need to be replaced, it is only necessary to pull the conveying pipe 4 downward so that the bent deformed tube 5 and the protruding tube head 7 can be disengaged outward along the cleaning channel 3. During the disengaging process, the flexible nozzle 10 fixed on the protruding tube head 7 also enters the cleaning channel 3 with the protruding tube head 7, and then during the movement, the scraping portion 10-3 is closely fitted with the inner wall of the cleaning channel 3 to scrape the inner wall of the cleaning pipe 3.

[0037] Certain words are used in the specification and claims of the present invention to refer to specific products. It should be understood by those skilled in the art that manufacturers may refer to the same component by different names. It is not intended to distinguish between components that have the same function but different names. In the following specification and patent scope, the words "comprise", "have" and "include" are open-ended words and should be interpreted as "including but not limited to...".

[0038] The above is a preferred embodiment of the present invention. It should be pointed out that a person skilled in the art can make several improvements and modifications without departing from the principle of the present invention. These improvements and modifications are also considered to be within the scope of protection of the present invention.

Claims

1. A nozzle for a cleaning machine with a thorough cleaning function, characterized by: The invention comprises a wastewater recovery pipe (1) in the middle and a wastewater collection surface (2) annularly surrounding the top inlet of the wastewater recovery pipe (1), the wastewater collection surface (2) being inclined from the outer periphery to the center and from top to bottom, a plurality of cleaning channels (3) for directional transportation of cleaning materials are arranged at intervals on the wastewater collection surface (2), the outlet directions of the cleaning channels (3) are all inclined toward the center of the wastewater recovery pipe (1), and a shielding portion protruding from the wastewater collection surface (2) for shielding the outlet of the cleaning channel (3) is provided on the outlet of the cleaning channel (3); The cleaning channel (3) comprises a vertical channel (3-1-1) opened in the nozzle, a directional bending channel (3-1-2) arranged on a side of the vertical channel (3-1-1) close to the wastewater collection surface (2) and connected to the vertical channel (3-1-1), and an outlet channel (3-1-3) opened vertically on the wastewater collection surface (2) and connected to the directional bending channel (3-1-2); The plurality of cleaning channels (3) include a nitrogen channel (3-1) for conveying nitrogen and a pickling channel (3-2) for conveying hydrofluoric acid, wherein the nitrogen channel (3-1) and the pickling channel (3-2) are not located on the same vertical plane passing through the center of the wastewater recovery pipe (1), and the nitrogen channel (3-1) and the pickling channel (3-2) are arranged at an angle of 0-90° relative to the center of the wastewater recovery pipe (1) on a horizontal projection plane; A conveying pipe (4) is inserted into the vertical channel (3-1-1) from bottom to top, and a bending deformation pipe (5) located in the directional bending channel (3-1-2) is provided on one side of the conveying pipe (4) close to the directional bending channel (3-1-2); the shielding portion comprises a protruding pipe head (7) connected to the bending deformation pipe (5) and protruding from the outlet of the cleaning pipe (3), and the protruding pipe head (7) is arranged in a ring shape on the inner side of the outlet channel (3-1-3); A flexible nozzle (10) is installed on the outside of the protruding pipe head (7), and the flexible nozzle (10) comprises a connecting pipe (10-1) fixedly connected to the outside of the protruding pipe head (7), a deformation portion (10-2) arranged on the outside of the connecting pipe (10-1) and gradually bent and deformed from the inside to the outside toward the center of the pipe, and a scraping portion (10-3) arranged on the outside of the connecting pipe (10-1) and having a diameter greater than the diameter of the cleaning channel (3).

2. A nozzle for a cleaning machine with a thorough cleaning function according to claim 1, characterized in that: The shielding portion comprises an arc-shaped baffle (6) which is vertically arranged on the wastewater collection surface (2) and surrounds the upper half of the outlet of the cleaning channel (3).

3. A nozzle for a cleaning machine with a thorough cleaning function according to claim 1, characterized in that: The cleaning channels (3) are provided with five and are evenly distributed on concentric circles with the center of the wastewater recovery pipeline (1) as the center. The cleaning channels (3) also include a particle cleaning channel (3-5) for conveying a mixed solution of ammonia water and hydrogen peroxide, a water delivery channel (3-3) for conveying pure water, and an oxidation channel (3-4) for conveying ozone water.

4. A nozzle for a cleaning machine with a thorough cleaning function according to claim 3, characterized in that: The cleaning channel (3) comprises, from top to bottom in a counterclockwise direction, a nitrogen channel (3-1), an acid cleaning channel (3-2), a water supply channel (3-3), an oxidation channel (3-4) and a particle cleaning channel (3-5).

5. A nozzle for a cleaning machine with a thorough cleaning function according to claim 3, characterized in that: The wastewater collection surface (2) is also provided with an outer ring cleaning channel (8) arranged opposite to the nitrogen channel (3-1) and located outside the concentric circle of the cleaning channel (3), and an outer ring cleaning pipe (9) for conveying pure water is inserted inside the outer ring cleaning channel (8).

Images