A high-performance anti-degradation intelligent coating and its preparation method and application

Abstract

The present invention belongs to the technical field of anti-degradation intelligent coatings, and specifically relates to a high-performance anti-degradation intelligent coating and its preparation method and application. The high-performance anti-degradation intelligent coating prepared by the present invention includes an anti-degradation layer, a vanadium dioxide (VO2) phase change layer, a dielectric layer, and a high-reflection layer arranged in sequence from top to bottom; a high-reflection layer is arranged on the bottom surface of the dielectric layer; a vanadium dioxide phase change layer is arranged on the upper surface of the dielectric layer; the anti-degradation layer includes: a first rectangular grating structure and a second rectangular grating structure; the first rectangular grating structure is in contact with the external environment; the groove portion of the second rectangular grating structure is connected to the vanadium dioxide phase change layer; the raised portion of the second rectangular grating structure is connected to the top of the vanadium dioxide phase change layer and the top of the dielectric layer. The high-performance anti-degradation intelligent coating prepared by the present invention achieves maximum thermal radiation in a high-temperature environment and reduces thermal radiation in a low-temperature environment, so as to reduce heat loss and maintain the temperature in the space within a certain range.

Description

Technical Field

[0001] The present invention belongs to the technical field of anti-degradation intelligent coatings, and in particular relates to a high-performance anti-degradation intelligent coating and a preparation method and application thereof. Background Art

[0002] The information disclosed in this background technology section is only intended to enhance understanding of the overall background of the invention and should not necessarily be regarded as an admission or any form of suggestion that the information constitutes the prior art already known to those skilled in the art.

[0003] Passive thermal regulation systems can effectively reduce energy consumption, and radiative cooling technology, a passive thermal regulation method that does not require additional power input, has made significant progress in recent years. Radiative cooling uses materials with high solar reflectivity and thermal emissivity to radiate heat into outer space, thereby achieving a cooling effect. This technology has broad application prospects in aerospace temperature control, building energy conservation, photovoltaic cooling, passive power generation, and other fields. For example, on spacecraft, thermal radiation is the only heat dissipation method. In buildings, radiative cooling can be integrated with roofs, walls, and windows to reduce the overall cooling demand.

[0004] The inventors have discovered that the main problems with current coating material designs are the lack of an anti-degradation structural design, only having a single heat dissipation or heat preservation function, and a lack of versatility. Traditional coatings can be subject to radiation degradation due to high-energy particles in aerospace applications. In terrestrial applications, substances in the environment can corrode the building surface, affecting the thermo-optical properties of the surface material. Existing radiation cooling material coatings face the problem of excessive heat loss at night or in winter when the temperature is low, and lack the ability to adjust to conditions with large temperature differences. Therefore, it is a technical problem that those skilled in the art urgently need to solve to propose a high-performance intelligent coating that has an anti-degradation effect, combines heat dissipation and heat preservation effects, and can be used in both terrestrial and aerospace fields. Summary of the Invention

[0005] In order to solve the above technical problems, the purpose of the present invention is to provide a high-performance anti-degradation intelligent coating and its preparation method and application, so as to maximize thermal radiation in high-temperature environments and reduce thermal radiation in low-temperature environments, thereby reducing heat loss and maintaining the temperature in the space within a certain range, that is, realizing radiation self-switching.

[0006] In order to achieve the above object, the present invention is implemented through the following technical solutions:

[0007] In a first aspect of the present invention, a high-performance anti-degradation smart coating is provided. The high-performance anti-degradation smart coating is a multi-layer composite structure, comprising an anti-degradation layer, a vanadium dioxide (VO2) phase change layer, a dielectric layer, and a high-reflection layer arranged in order from top to bottom;

[0008] A high reflective layer is provided on the bottom surface of the dielectric layer; and a vanadium dioxide phase change layer is provided on the upper surface of the dielectric layer;

[0009] The anti-degradation layer includes: a first rectangular grating structure and a second rectangular grating structure;

[0010] The first rectangular grating structure is in contact with the external environment;

[0011] The groove portion of the second rectangular grating structure is in contact with the vanadium dioxide phase change layer;

[0012] The raised portion of the second rectangular grating structure is connected to the top of the vanadium dioxide phase change layer and the top of the dielectric layer.

[0013] Preferably, the vanadium dioxide phase change layer and the dielectric layer may adopt a multi-stacked structure to realize multiple FP resonances, thereby achieving the effect of increasing the infrared emissivity control range.

[0014] Further preferably, the resonant wavelength of the FP resonant cavity is 9.6 μm. As the number of stacked layers increases, the resonant wavelength of the newly added FP resonant cavity increases, which are 15 μm and 20 μm respectively.

[0015] Preferably, the multiple stacking structure is no more than three.

[0016] Preferably, the material of the anti-degradation layer is Si; the material of the dielectric layer is BaF2; the high reflective layer is made of metal material; further preferably, the metal material is Al.

[0017] Preferably, the width of one period of the first rectangular grating structure is Λ=5.26 μm; the vertical length of the protruding structure above the first rectangular grating structure is 1.81 μm, and the horizontal length is 0.75 μm.

[0018] Preferably, the thickness of the anti-degradation layer is 1.86 μm; the thickness of the vanadium dioxide phase change layer is 0.05 μm, and the width w of the vanadium dioxide phase change layer in a unit period is 4.15 μm; the thickness of the dielectric layer is 1.44 μm; and the thickness of the high reflection layer is 0.10 μm.

[0019] A second aspect of the present invention provides a method for preparing a high-performance anti-degradation smart coating, comprising the following steps:

[0020] S1. Performing double-sided dry etching on a double-polished silicon wafer to carve a rectangular grating structure to obtain an anti-degradation layer;

[0021] S2, preparing a vanadium dioxide phase change layer on the surface of the anti-degradation layer prepared in step S1 by magnetron sputtering;

[0022] S3, preparing a dielectric layer by physical vapor deposition on the flat surface where the vanadium dioxide thin film phase change layer and the anti-degradation layer are embedded, as prepared in step S2;

[0023] S4. A high-reflection layer is prepared on the dielectric layer prepared in step S3 by using a physical vapor deposition method to obtain a high-performance anti-degradation smart coating.

[0024] Preferably, in step S1, the dry etching is high-density plasma etching.

[0025] Further preferably, the process conditions of the high-density plasma etching are: positive photoresist, spin coating thickness of 0.5 to 1.5 μm, chlorine as the main etching gas, argon as the auxiliary gas, container pressure of 1 to 10 m Torr, RF power of 50 to 200 W, and bias voltage of -50 to -200 V.

[0026] Further preferably, the process method of high-density plasma etching is: using standard photolithography technology to produce VO2 graphics, with the help of ultraviolet photolithography machine, projecting a pre-designed pattern onto the photoresist film; using developer to remove the photoresist in the exposed area, leaving the photoresist pattern in the unexposed area; after the development is completed, rinse with clean water to eliminate the residual developer; using a plasma etcher to remove the part of the VO2 film not covered by the photoresist to shape the required pattern; using acetone stripping solution to remove the remaining photoresist to complete the production of the VO2 graphics.

[0027] Preferably, in step S2, the process conditions of the magnetron sputtering are: using high-purity metal vanadium as the target material, argon as the sputtering gas, oxygen as the reaction gas, and a background vacuum degree of less than 10 -6 Torr, gas sputtering pressure 5m Torr, RF power 150W, substrate temperature 300°C, and reaction gas ratio 2%.

[0028] Preferably, in step S2, the physical vapor deposition method is electron beam evaporation.

[0029] Further preferably, in step S2, the process conditions of the electron beam evaporation are: the evaporation source is a high-purity barium fluoride target, the chamber pressure is less than 1×10 -6 Torr, the sample stage temperature is 200℃~300℃, and the evaporation rate is 0.1~0.5nm / s.

[0030] Preferably, in step S4, the physical vapor deposition method is electron beam evaporation.

[0031] Further preferably, in step S4, the process conditions of the electron beam evaporation are: the evaporation source is a high-purity aluminum target, the chamber pressure is less than 1×10 -6Torr, the sample stage temperature is 100℃~200℃, and the evaporation rate is 0.05~0.15nm / s.

[0032] The beneficial effects achieved by one or more technical solutions of the present invention are as follows:

[0033] (1) The present invention selects Si as the material for the degradation layer because Si itself is an infrared transparent material with an attenuation coefficient of 0, which has little effect on the radiation characteristics. However, Si also has a large refractive index, which will enhance the film's reflection of incident light and reduce the overall emissivity. Therefore, the relationship between the two is weighed to achieve the optimal radiation characteristics to resist erosion from the space environment and ensure the stability of the coating's thermal optical properties.

[0034] At the same time, the degradation layer adopts a grating structure to eliminate the influence of the newly added anti-degradation layer on the radiation characteristics of the coating, and to a certain extent improve the adjustable range of the overall emissivity of the coating.

[0035] (2) The grating structure involved in the structure of the present application can form a structure similar to a resonant cavity, enhancing the absorption and emission of light of a specific wavelength. The grating structure is a periodic structure similar to a photonic crystal, and has the properties of a photonic bandgap. Within the photonic bandgap, light of a specific wavelength cannot propagate in the photonic crystal and will be completely reflected. By adjusting and optimizing the size and period of the grating structure, the present invention can control the position of the photonic bandgap, thereby enhancing the absorption and emission of light of a specific wavelength.

[0036] (3) The present invention can utilize the thermal sensitivity of the vanadium dioxide phase change layer to achieve reversible regulation of infrared emissivity, adopt a grating structure, and embed it with the anti-degradation layer to reduce the solar absorptivity. In addition, the phase change properties of vanadium dioxide can be utilized to achieve switching between total reflection and ultra-wideband absorption.

[0037] (4) The phase change layer and dielectric layer of the present invention can adopt a multi-stacked structure to achieve multiple FP resonances, thereby increasing the infrared emissivity control amplitude.

[0038] (5) The high-performance anti-degradation smart coating prepared by the present invention has an anti-degradation effect and has both heat dissipation and heat preservation effects. It can be used as a high-performance smart coating in both terrestrial and aerospace fields. Its application in spacecraft can reduce the amount of spacecraft refrigeration equipment carried; in terrestrial applications, it can effectively reduce energy consumption and carbon emissions, with significant economic and environmental benefits. It has broad application prospects in the current context of energy conservation and emission reduction. BRIEF DESCRIPTION OF THE DRAWINGS

[0039] Figure 1 This is a schematic structural diagram of an anti-degradation smart coating based on FP resonance according to Example 1 of the present invention;

[0040] Figure 2Schematic diagram of the structure of the anti-degradation smart coating based on multiple FP resonances according to Example 2 of the present invention;

[0041] Among them: 1. Anti-degradation layer; 2. Vanadium dioxide phase change layer; 3. Dielectric layer; 4. High reflection layer;

[0042] Figure 3 This is a graph showing the normal spectral emissivity of the anti-degradation smart coating structure prepared in Example 1 of the present invention before and after being corroded and oxidized in the 0.3-30 μm band;

[0043] Figure 4 This is a graph showing the average emissivity of the anti-degradation smart coating based on multiple FP resonances prepared in Example 2 of the present invention;

[0044] Figure 5 The relationship between the cooling power and temperature of the smart coating in Example 1 of the present invention;

[0045] Figure 6 This is a comparison curve of the self-radiation heat flux density of the intelligent thermal control coating of Example 1 of the present invention and S781 white paint;

[0046] Figure 7 The intelligent thermal control coating and S781 white paint of Example 1 of the present invention are heat-compensated without active electric heating (q h =0): (a) applied on the surface of a spin-stabilized satellite; (b) applied on the surface of a three-axis stabilized satellite. DETAILED DESCRIPTION

[0047] It should be noted that the following detailed descriptions are exemplary and intended to provide further explanation of the present invention. Unless otherwise specified, all technical and scientific terms used in the present invention have the same meanings as those commonly understood by those skilled in the art to which the present invention belongs.

[0048] The present invention will be further described in detail below with reference to specific embodiments. It should be noted that the specific embodiments are intended to explain the present invention rather than to limit it.

[0049] Example 1 :This embodiment provides a high-performance anti-degradation intelligent coating and its preparation method

[0050] The high performance anti-degradation smart coating provided by this embodiment, such as Figure 1 As shown, it includes an anti-degradation layer 1, a vanadium dioxide (VO2) phase change layer 2, a dielectric layer 3, and a high reflective layer 4 arranged in sequence from top to bottom; the high reflective layer 4 is arranged on the bottom surface of the dielectric layer 3; and the vanadium dioxide phase change layer 2 is arranged on the upper surface of the dielectric layer 3;

[0051] Wherein, the anti-degradation layer 1 comprises: a first rectangular grating structure and a second rectangular grating structure;

[0052] The first rectangular grating structure is in contact with the external environment;

[0053] The groove portion of the second rectangular grating structure is in contact with the vanadium dioxide phase change layer;

[0054] The raised portion of the second rectangular grating structure is connected to the top of the vanadium dioxide phase change layer and the top of the dielectric layer.

[0055] The material of the anti-degradation layer is Si, the material of the dielectric layer is BaF2; and the high reflection layer is made of the metal material Al.

[0056] The thickness of the anti-degradation layer is 1.86 μm; the width of one period of the first rectangular grating structure Λ=5.26 μm; the vertical length of the raised structure above the first rectangular grating structure is 1.81 μm, and the horizontal length is 0.75 μm; the thickness of the vanadium dioxide phase change layer is 0.05 μm, and the width of the vanadium dioxide phase change layer per unit period w=4.15 μm; the thickness of the dielectric layer is 1.44 μm; and the thickness of the high-reflection layer is 0.10 μm.

[0057] The method for preparing the high-performance anti-degradation intelligent coating provided in this embodiment specifically includes the following steps:

[0058] S1. Performing double-sided dry etching on a double-polished silicon wafer to carve a rectangular grating structure to obtain an anti-degradation layer;

[0059] S2, preparing a vanadium dioxide thin film phase change layer on the surface of the anti-degradation layer prepared in step S1 by magnetron sputtering;

[0060] S3, preparing a dielectric layer by physical vapor deposition on the flat surface where the vanadium dioxide thin film phase change layer and the anti-degradation layer are embedded, as prepared in step S2;

[0061] S4. A high-reflection layer is prepared on the dielectric layer prepared in step S3 by using a physical vapor deposition method to obtain a high-performance anti-degradation smart coating.

[0062] In step S1 , high-density plasma etching is used for dry etching.

[0063] The process conditions are as follows: positive photoresist is selected, the spin coating thickness is 0.5 to 1.5 μm, chlorine is selected as the main etching gas, argon is selected as the auxiliary gas, the container pressure is 1 to 10 m Torr, the RF power is 50 to 200 W, and the bias voltage is -50 to -200 V.

[0064] The process method is as follows: use standard photolithography technology to produce VO2 graphics, and use a UV photolithography machine to project a pre-designed pattern onto the photoresist film; use a developer to remove the photoresist in the exposed area, leaving the photoresist pattern in the unexposed area; after development, rinse with clean water to eliminate residual developer; use a plasma etcher to remove the part of the VO2 film not covered by the photoresist to shape the required pattern; use acetone stripping solution to remove the remaining photoresist to complete the production of the VO2 graphics.

[0065] In step S2, the process conditions of magnetron sputtering are: using high-purity metal vanadium as the target material, argon as the sputtering gas, oxygen as the reaction gas, and a background vacuum degree of less than 10 -6 Torr, gas sputtering pressure 5m Torr, RF power 150W, substrate temperature 300°C, and reaction gas ratio 2%.

[0066] In step S2, the physical vapor deposition method is electron beam evaporation, and the process conditions are: the evaporation source is a high-purity barium fluoride target, and the chamber pressure is less than 1×10 -6 Torr, the sample stage temperature is 200℃~300℃, and the evaporation rate is 0.1~0.5nm / s.

[0067] In step S4, the physical vapor deposition method is electron beam evaporation, and the process conditions are: the evaporation source is a high-purity aluminum target, and the chamber pressure is less than 1×10 -6 Torr, the sample stage temperature is 100℃~200℃, and the evaporation rate is 0.05~0.15nm / s.

[0068] Example 2 :

[0069] The difference from Example 1 is that the vanadium dioxide phase change layer and the dielectric layer adopt a multi-stacked structure, and the rest are the same as Example 1 (eg Figure 2 The resonant wavelength of the FP resonant cavity is 9.6 μm. As the number of stacked layers increases, the resonant wavelength of the newly added FP resonant cavity increases, reaching 15 μm and 20 μm respectively.

[0070] This embodiment specifically studies the emissivity control effect of the triple stack structure. Figure 4 As shown in Figure 3, the emissivity of the triple stack structure is better than that of the single stack structure in both the metallic and insulating states.

[0071] Example 3 :This embodiment tests the emissivity of the smart coating prepared in Example 1 when applied to ground buildings

[0072] The RCWA algorithm is used to calculate the comparison curve of the normal spectral emissivity of the smart coating before and after corrosion and oxidation. The results are as follows: Figure 3As shown. Figure 3 As shown in (a), the normal spectral emissivity of the metal state in the 0.3-30μm band is improved after adding the Si layer, and the overall emissivity adjustable range increases from 0.70 to 0.72, an increase of 2.9%. When the surface of the anti-degradation layer is corroded and oxidized, as shown in Figure 3 As shown in (b), the overall spectral curve of the smart energy-saving building changes very little, and the adjustable range of emissivity is reduced from 0.72 to 0.71, a decrease of 1.4%.

[0073] Self-radiated power:

[0074]

[0075] Atmospheric absorption power:

[0076]

[0077] Convection heat transfer power:

[0078] Q parasitic (T,T amb )=Ah(T amb -T)

[0079] Absorbed solar power:

[0080]

[0081] Net cooling power of smart energy-saving roof:

[0082] Q total =Q cooler (T)-Q atm (T amb )-Q parasitic (T,T amb )-Q sun (T)

[0083] like Figure 5 As shown, when the ambient temperature is 300K, the net cooling power of the smart coating increases with the increase of temperature. The radiation power at 260K and 340K is -257W / m 2 and 643W / m 2 In addition, near the VO2 phase transition temperature of 300K, the net cooling power changes suddenly from negative to positive, and the cooling power is further improved. From 300K to 301K, the net cooling power increases by about 100W / m 2 , which is more conducive to the heat dissipation process at high temperatures. Therefore, the preparation of intelligent thermal control coatings can effectively reduce energy consumption and carbon emissions in ground applications, with significant economic and environmental benefits.

[0084] Example 4 :This example tests the radiant heat flux density of the smart coating prepared in Example 1 for use in the aerospace field

[0085] To evaluate the effectiveness of smart coatings in actual spacecraft thermal control, it is assumed that the phase transition temperature of VO2 is adjusted to around room temperature (300K) through element doping. Furthermore, the change in phase transition temperature has a small effect on the optical constants of VO2 (approximately 3% to 8%), so its effect on radiation characteristics can be ignored. Therefore, in a space environment, the thermal balance equation for the smart coating is:

[0086] Q r =Q e +Q i +Q h

[0087] Among them, Q r is the heat flux radiated outward by the smart coating when applied to a spacecraft; Q e It is the heat flux provided by external heat sources, mainly including solar radiation, solar radiation reflected by the earth and infrared radiation of the earth itself; Q i It is the heat flux generated by the internal heat sources of the spacecraft, including the heat flux generated by some avionics equipment and batteries. h is the heat flux of the spacecraft film heater, i.e., the compensation heat.

[0088] Since traditional thermal control coatings cannot dynamically adjust infrared emissivity, active electric heating is required to compensate for the dramatic changes in external and internal heat sources caused by changes in spacecraft attitude, orbit, and operating mode. At this time, the net radiated heat Q of the smart coating is the heat Q generated by the spacecraft's internal heat source. i , can be used to evaluate the spacecraft's uncompensated heat (Q h =0). Select the unit radiation area for calculation, then q r ,q e ,q i ,q h , q are the corresponding radiation heat flux densities, which can be transformed into:

[0089] q r =q e +q i +q h

[0090] Then, the radiation heat flux density q of the smart coating itself can be obtained by the Stefan-Boltzmann law r , unit is W / m 2 , the specific calculation formula is as follows:

[0091] qr =εE b ( t )=εσT t 4

[0092] Where, blackbody radiation constant σ=5.67×10 -8 W / (m 2 ·K 4 ), T t is the temperature of the smart coating, in K. The above formula can be used to calculate the self-radiative heat flux density of the spacecraft smart thermal control film and S781 white paint.

[0093] like Figure 6 As shown in Figure 2, as the temperature gradually increases from 260K to 340K, the radiation heat flux density of the smart thermal control coating and S781 white paint gradually increases. Among them, the radiation heat flux density of S781 white paint increases from 226W / m 2 Increased to 659W / m 2 , the change value is about 433W / m 2 , while the radiation heat flux density of the intelligent thermal control coating changes suddenly near the VO2 phase transition temperature, and the radiation heat flux density increases by about 28W / m from 299K to 301K. 2 It can be seen that the metal-insulator transition of VO2 has a great influence on the increase of radiation heat flux density. The radiation heat flux density at 260K and 340K is 42W / m 2 and 576W / m 2 , the change value is about 534W / m 2 Compared to S781 white paint, the intelligent thermal control coating's self-radiation heat flux density adjustment range can be widened by 23.3%. Therefore, the intelligent thermal control coating prepared in this application can enable the spacecraft to adaptively adjust the radiation heat flux density as the temperature changes during operation, maintaining a suitable operating temperature.

[0094] During the geosynchronous orbit period, due to the high orbit altitude, the spacecraft will not pass through the shadow area, so the external heat flux remains constant. Figure 7 The comparison curves of the net radiation heat flux density q (i.e., the net radiation heat corresponding to unit radiation area) of the intelligent thermal control film and S781 white paint in the temperature range of 260-340K for spin-stabilized satellites and three-axis stabilized satellites without active electric heating compensation heat are given.

[0095] The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. For those skilled in the art, the present invention may have various modifications and variations.

[0096] Any modifications, equivalent substitutions, improvements, etc. made should be included in the protection scope of the present invention.

Claims

1. A high-performance anti-degradation smart coating, characterized in that: The high-performance anti-degradation intelligent coating is a multi-layer composite structure, including an anti-degradation layer, a vanadium dioxide phase change layer, a dielectric layer, and a high-reflection layer arranged in sequence from top to bottom; A high reflective layer is provided on the bottom surface of the dielectric layer; and a vanadium dioxide phase change layer is provided on the upper surface of the dielectric layer; The anti-degradation layer includes: a first rectangular grating structure and a second rectangular grating structure; The first rectangular grating structure is in contact with the external environment; The groove portion of the second rectangular grating structure is connected to the top of the vanadium dioxide phase change layer; The raised portion of the second rectangular grating structure is in contact with the side surface of the vanadium dioxide phase change layer and the top of the dielectric layer; The material of the anti-degradation layer is Si.

2. The high-performance anti-degradation smart coating according to claim 1, characterized in that: The vanadium dioxide phase change layer and the dielectric layer can adopt a multiple stacking structure to achieve multiple FP resonances, wherein the resonance wavelength of the single FP resonant cavity is 9.6 μm, the resonance wavelength of the double FP resonant cavity is 15 μm, and the resonance wavelength of the triple FP resonant cavity is 20 μm.

3. The high-performance anti-degradation smart coating according to claim 1, wherein: The material of the dielectric layer is BaF2; the material of the high reflection layer is metal.

4. The high-performance anti-degradation smart coating according to claim 3, wherein: The metal material is Al.

5. The high-performance anti-degradation smart coating according to claim 1, wherein: The thickness of the anti-degradation layer is 1.86 μm; the width of one period of the first rectangular grating structure Λ=5.26 μm; the vertical length of the raised structure above the first rectangular grating structure is 1.81 μm, and the horizontal length is 0.75 μm; the thickness of the vanadium dioxide phase change layer is 0.05 μm, and the width w of the vanadium dioxide phase change layer per unit period is 4.15 μm; the thickness of the dielectric layer is 1.44 μm; and the thickness of the high-reflection layer is 0.10 μm.

6. A method for preparing a high-performance anti-degradation smart coating according to any one of claims 1 to 5, characterized in that: The steps include: S1. Performing double-sided dry etching on a double-polished silicon wafer to carve a rectangular grating structure to obtain an anti-degradation layer; S2, preparing a vanadium dioxide thin film phase change layer on the surface of the anti-degradation layer prepared in step S1 by magnetron sputtering; S3, preparing a dielectric layer by physical vapor deposition on the flat surface where the vanadium dioxide thin film phase change layer and the anti-degradation layer are embedded, as prepared in step S2; S4. A high-reflection layer is prepared on the dielectric layer prepared in step S3 by using a physical vapor deposition method to obtain a high-performance anti-degradation smart coating.

7. The method for preparing a high-performance anti-degradation smart coating according to claim 6, wherein: In step S1, the dry etching is performed by high-density plasma etching; The process conditions of the high-density plasma etching are: positive photoresist, spin coating thickness of 0.5-1.5 μm, chlorine as the main etching gas, argon as the auxiliary gas, container pressure of 1-10 mTorr, RF power of 50-200 W, and bias voltage of -50--200 V.

8. The method for preparing a high-performance anti-degradation smart coating according to claim 7, wherein: The high-density plasma etching process is as follows: using standard photolithography technology to produce vanadium dioxide patterns, using an ultraviolet photolithography machine to project a pre-designed pattern onto a photoresist film; using a developer to remove the photoresist in the exposed area, leaving the photoresist pattern in the unexposed area; After development, rinse with clean water to eliminate residual developer; Using a plasma etcher, the portion of the vanadium dioxide film not covered by the photoresist is removed to create the desired pattern; Acetone stripping solution is used to remove the remaining photoresist to complete the production of VO2 graphics.

9. The method for preparing a high-performance anti-degradation smart coating according to claim 6, wherein: In step S2, the process conditions of the magnetron sputtering are: using high-purity metal vanadium as the target material, argon as the sputtering gas, oxygen as the reaction gas, and a background vacuum degree of less than 10 -6 Torr, gas sputtering pressure 5 m Torr, RF power 150 W, substrate temperature 300 °C, and reaction gas ratio 2%.

10. The method for preparing a high-performance anti-degradation smart coating according to claim 6, wherein: In step S3, the physical vapor deposition method is electron beam evaporation; the process conditions of the electron beam evaporation are: the evaporation source is a high-purity barium fluoride target, the chamber pressure is less than 1×10 -6 Torr, the sample stage temperature is 200℃~300℃, and the evaporation rate is 0.1~0.5 nm / s.

11. The method for preparing a high-performance anti-degradation smart coating according to claim 6, wherein: In step S4, the physical vapor deposition method is electron beam evaporation; the process conditions of the electron beam evaporation are: the evaporation source is a high-purity aluminum target, the chamber pressure is less than 1×10 -6 Torr, the sample stage temperature is 100℃~200℃, and the evaporation rate is 0.05~0.15 nm / s.

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