Polishing pad cleaning device in full aperture polishing

Abstract

The present application relates to the polishing disc cleaning device in full caliber polishing, is carried on full caliber polishing polishing machine, it includes: brush mechanism, brush mechanism is connected to polishing machine crossbeam, its output end below is connected with the brush disc of compound structure, the brush disc has brush hair towards the polishing disc surface side, the brush hair center to the outer edge gradually from sparse to dense arrangement forms multiple rings, the washing range of brush disc covers the entire polishing disc surface, the liquid supply faucet provides the cleaning agent for the brush hair in real time;Liquid supply mechanism, liquid supply mechanism provides the cleaning agent suitable for temperature, and according to the required flow is supplied to the polishing disc surface through liquid supply faucet;Control cabinet, at least part of the components of liquid supply mechanism and brush mechanism is electrically connected with control cabinet.The present application realizes the efficient, uniform, stable cleaning of polishing disc by integrating liquid supply mechanism, brush mechanism and control cabinet and other components, improves the cleaning quality and efficiency.At the same time, through the accurate control and monitoring system, the reliability and safety of the cleaning process are ensured.

Description

TECHNICAL FIELD

[0001] The present application relates to the field of optical processing technology, more particularly to a polishing disc cleaning device in full aperture polishing. BACKGROUND

[0002] Full aperture polishing is one of the main processing technologies for optical elements. The full aperture polishing machine usually adopts a large size, high thermal stability natural granite to make a polishing disc base, and a viscoelastic material polyurethane is pasted on the surface of the base as a polishing pad. Full aperture polishing is to process a small size optical element with a large size polishing disc, and the large size polishing pad covers the entire surface of the element during processing. The cleanliness of the polishing pad has a very important influence on the surface quality of the element. In addition, the polyurethane polishing pad has a certain hardness, and there are a large number of open pores and micro-bubbles on its surface. In addition, the surface of the polyurethane usually needs to be grooved in order to facilitate the delivery of the polishing liquid and improve the uniform distribution of the polishing liquid on the disc surface. These pores and grooves have a size of sub-mm to mm. After polishing, the residues, polishing liquid deposition and aggregation and other stains generated on the surface of the polishing pad remain in these positions, which is an important reason for causing scratches on the surface of the element. At present, there is still a lack of ultra-clean cleaning device for large size polyurethane polishing pad.

[0003] Therefore, how to provide a polishing disc cleaning device in full aperture polishing is a problem that those skilled in the art need to solve. SUMMARY

[0004] Therefore, the purpose of the present application is to provide a polyurethane polishing disc cleaning device to solve the problem of cleaning the polyurethane polishing tool in full aperture single-sided polishing and double-sided polishing.

[0005] The technical scheme of the present application is a polishing disc cleaning device in full aperture polishing, which is mounted on a full aperture polishing machine, and comprises:

[0006] A liquid supply mechanism provides a cleaning agent at a suitable temperature and supplies it to the surface of the polishing disc through a liquid supply faucet according to the required flow rate;

[0007] A brush mechanism is connected to the crossbeam of the polishing machine, and a brush disc is connected below the output end of the brush mechanism. The brush disc has a composite structure and has bristles on the side facing the surface of the polishing disc. The bristles are arranged from sparse to dense to form multiple rings from the center to the outer edge, so as to avoid excessive brushing of the center of the polishing disc. The washing range of the brush disc covers the entire surface of the polishing disc, and the liquid supply faucet provides the cleaning agent for the bristles in real time;

[0008] A control cabinet, at least part of the components of the liquid supply mechanism and the brush mechanism are electrically connected to the control cabinet.

[0009] According to the technical scheme of the present application, the brush disc is designed with light material, and the weight per unit area is not more than 5 g / mm 2 The bristles include high bristles and low bristles, and the high bristles and the low bristles are uniformly and spacedly arranged.

[0010] According to the technical scheme of the present application, the difference between the length of the high bristles and the length of the low bristles is 2-3 mm, and the hardness ratio of the high bristles to the low bristles is 1 / 2-3 / 4.

[0011] According to the technical scheme of the present application, the liquid supply mechanism includes:

[0012] A plurality of cleaning liquid barrels are arranged around the polishing machine;

[0013] A delivery pump is connected to the top of each cleaning liquid barrel, and each delivery pump is connected to a delivery pipe, and each delivery pipe is provided with a one-way valve.

[0014] A shunt is arranged to connect the delivery pipes to form a liquid delivery channel, and the liquid delivery channel is connected to the beam of the polishing machine, and the cleaning agent is delivered to the liquid supply faucet through the liquid delivery channel.

[0015] The delivery pump is electrically connected to the control cabinet.

[0016] According to the technical scheme of the present application, a filter is arranged between the liquid supply faucet and the liquid delivery channel, the filter is connected to the beam of the polishing machine, and the liquid supply faucet is provided with a flow regulating switch electrically connected to the control cabinet.

[0017] According to the technical scheme of the present application, a water pressure gauge is arranged above the filter to monitor the service state of the filter element.

[0018] According to the technical scheme of the present application, the brush mechanism includes:

[0019] A main shaft box is connected to the beam of the polishing machine.

[0020] A pressurized air cylinder is connected to the top of the main shaft box.

[0021] A pneumatic rotary head is connected below the pressurized air cylinder, the pneumatic rotary head penetrates the bottom of the main shaft box, and a thimble is connected below the pneumatic rotary head, a clamping groove is formed in the top of the brush disc, and the thimble is clamped with the clamping groove.

[0022] The pressurized air cylinder is electrically connected to the control cabinet.

[0023] According to the technical scheme of the present application, the polishing machine beam is provided with a horizontal driving assembly composed of a guide rail, a lead screw and a control motor, the spindle box and the filter are installed on the lead screw, follow the lead screw and slide along the guide rail to make reciprocating linear motion, and the control motor is electrically connected with the control cabinet.

[0024] According to the technical scheme of the present application, the polishing machine beam is provided with a horizontal driving assembly composed of a guide rail, a lead screw and a control motor, the spindle box and the filter are installed on the lead screw, follow the lead screw and slide along the guide rail to make reciprocating linear motion, and the control motor is electrically connected with the control cabinet.

[0025] According to the technical scheme of the present application, the polishing machine beam is provided with a horizontal driving assembly composed of a guide rail, a lead screw and a control motor, the spindle box and the filter are installed on the lead screw, follow the lead screw and slide along the guide rail to make reciprocating linear motion, and the control motor is electrically connected with the control cabinet.

[0026] According to the technical scheme of the present application, the polishing machine beam is provided with a horizontal driving assembly composed of a guide rail, a lead screw and a control motor, the spindle box and the filter are installed on the lead screw, follow the lead screw and slide along the guide rail to make reciprocating linear motion, and the control motor is electrically connected with the control cabinet.

[0027] The present application improves the cleaning degree of the polishing pad, prolongs the service life of the polishing pad, improves the surface quality of the optical element in the processing process, and shortens the production cycle of the optical element.

[0028] The present application provides a suitable temperature of cleaning agent through the liquid supply mechanism, and the bristle design of the composite structure brush, so that the device can efficiently clean the residues on the surface of the polishing disc, and ensure the cleanliness of the polishing disc.

[0029] The bristles are gradually arranged from sparse to dense from the center to the outer edge to form multiple rings, so that the washing range of the brush disc can cover the entire surface of the polishing disc, and uniform cleaning is realized. The liquid supply faucet provides cleaning agent for the bristles in real time, ensuring the continuity and stability of the cleaning process. The electrical connection of the control cabinet with the liquid supply mechanism and the brush mechanism enables the entire cleaning process to be accurately controlled through the control cabinet, including the flow, temperature and pressure of the cleaning agent.

[0030] The installation of the filter can filter out impurities in the cleaning agent, and the installation of the water pressure gauge can monitor the pressure of the cleaning agent. According to the pressure, the filter can be replaced in time, which helps to improve the cleaning quality. The connection of the pressure cylinder with the air pressure probe and the pressure regulating valve can realize real-time monitoring and adjustment of the pressure of the brush mechanism, and the unit area pressure of the brush disc during cleaning is not greater than 5g / mm 2 , avoiding excessive wear of the polishing pad caused by mechanical scratching. The design of the horizontal driving assembly enables the brush mechanism to make reciprocating linear motion on the surface of the polishing disc, further improving the cleaning efficiency.

[0031] The connection of the stirrer in the cleaning solution barrel and the heat exchange pipeline with the temperature controller can ensure the temperature stability of the cleaning solution and improve the cleaning effect.

[0032] The present application integrates the liquid supply mechanism, brush mechanism and control cabinet and other components to achieve efficient, uniform and stable cleaning of the polishing disc, improve the cleaning quality and efficiency. At the same time, through the precise control and monitoring system, the reliability and safety of the cleaning process are ensured. BRIEF DESCRIPTION OF DRAWINGS

[0033] In order to more clearly illustrate the technical solutions in the embodiments of the present application or the prior art, the following will briefly introduce the drawings needed to be used in the embodiments or the prior art description. Obviously, the drawings in the following description are only embodiments of the present application, and other drawings can be obtained by those skilled in the art without creative labor on the basis of the provided drawings.

[0034] Figure 1 The structure schematic diagram of the polishing disc cleaning device in the full caliber polishing provided by the present application is shown.

[0035] Figure 2 The structure schematic diagram of the brush disc and the brush is shown.

[0036] Figure 3 The height of the brush is shown.

[0037] Fig. 1: 1-polishing machine 2-polishing disc 3-crossbeam 4-filter 5-pressure gauge 6-air pressure probe 7-cleaning partition 8-temperature controller 9-slot 10-top pin 11-pneumatic rotary head 12-regulating valve 13-pressurized cylinder 14-conveying pipe 15-control motor 16-diversion channel 17-regulating switch 18-backflow tank 19-control cabinet 20-first heat exchange pipeline 21-first conveying pump 22-first conveying pump power line 23-first agitator 24-first cleaning liquid barrel 25-brush disc 26-first conveying pipe 27-first liquid level sensor 28-first agitator power line 29-second heat exchange pipeline 30-second cleaning liquid barrel 31-second conveying pump 32-second liquid level sensor 33-second conveying pipe 34-second agitator 35-second agitator power line 36-second conveying pump power line 37-third heat exchange pipeline 38-third cleaning liquid barrel 39-third conveying pipe 40-third conveying pump 41-third agitator 42-third agitator power line 43-third liquid level sensor 44-third conveying pump power line 45-third control motor power line 46-third temperature controller power line 47-first check valve 48-second check valve 49-third check valve 50-liquid supply faucet 51-guide rail 52-filter element 53-spindle box 54-brush hair 55-screw 56-regulating valve 57-second air pressure probe. DETAILED DESCRIPTION

[0038] Embodiments of the present application are described in detail below with reference to examples illustrated in the accompanying drawings, in which the same or like reference numerals represent the same or like elements or elements having the same or similar functions throughout. The embodiments described below by reference to the drawings are exemplary and are intended to explain the present application, and should not be understood as limiting the present application.

[0039] Since the disc surface of the polyurethane polishing disc is made of super-elastic material and has a certain hardness, there are a large number of open pores on the surface. The polyurethane surface usually needs to be grooved in order to facilitate the delivery of polishing liquid and improve the uniform distribution of polishing liquid on the disc surface. These pores and grooves are small in size, and the residues generated on the surface of the polishing pad before and after polishing, polishing liquid deposition and aggregation, and other stains remain in these positions, which are important reasons for causing scratches on the surface of the element. However, there is still a lack of cleaning device for polyurethane polishing pad.

[0040] In view of this, the present application adopts the following technical scheme: a polishing disc cleaning device for full-bore polishing is mounted on a full-bore polishing polishing machine 1, as shown in the accompanying drawings Figure 1, including: liquid supply mechanism, the liquid supply mechanism provides suitable temperature cleaning agent, and according to the required flow through the liquid supply tap 50 supply to the polishing disc 2 surface;Brush mechanism, the brush mechanism is connected to the polishing machine beam 3, and the output end is connected with brush disc 25, the brush disc 25 is a composite structure, and the brush disc 25 is provided with bristles 54 towards the polishing disc 2 surface side, the bristles 54 center to the outer edge gradually from sparse to dense arrangement forms multiple rings, avoids excessive brushing of the polishing disc 2 center, and the brushing range of the brush disc 25 covers the entire polishing disc 2 surface, and the liquid supply tap 50 provides cleaning agent for the bristles 54 in real time;Control cabinet 19, and at least part of components of the liquid supply mechanism and the brush mechanism are electrically connected with the control cabinet 19.

[0041] In the embodiment of the application, the liquid supply mechanism comprises:

[0042] A plurality of cleaning liquid barrels are arranged around the polishing machine 1;

[0043] A conveying pump is connected to the top of each cleaning liquid barrel, and each conveying pump is connected with a conveying pipe, and each conveying pipe is provided with a one-way valve.

[0044] A shunt 16 is connected to the conveying pipes, and the conveying pipes are connected into a liquid delivery channel 14, and the liquid delivery channel 14 is connected to the polishing machine beam 3;The cleaning agent is sent to the liquid supply tap 50 through the liquid delivery channel 14

[0045] The conveying pump is electrically connected with the control cabinet 19.

[0046] In the specific embodiment of the application, referring to the accompanying drawings Figure 1 The cleaning liquid barrels include three: the first cleaning liquid barrel 24 contains organic cleaning agent, which is mainly used for removing organic pollutants in the polishing environment, the second cleaning liquid barrel 30 contains alkaline cleaning agent, which is mainly used for removing particulate impurities in the polishing environment, and the third cleaning liquid barrel 38 contains ultrapure water, which is mainly used for final cleaning of the polishing tool.

[0047] The first cleaning liquid barrel 24 has a capacity of 100L, a first conveying pump 21 is connected to the top of the first cleaning liquid barrel 24, a first conveying pipe 26 is connected to the first conveying pump 21, a first one-way valve 47 is connected to the first conveying pipe 26, the first one-way valve 47 can only flow in one direction, so that each liquid supply pipe can supply liquid independently, and a shunt 16 is connected to the first one-way valve 47, and the shunt 16 can converge multiple liquid supply pipes into a single pipe for liquid supply.

[0048] The second cleaning liquid barrel 30 has a capacity of 100L, and a second delivery pump 31 is connected to the top of the second cleaning liquid barrel 30. A second delivery pipe 33 is connected to the second delivery pump 31, and a second one-way valve 48 is connected to the second delivery pipe 33. The second one-way valve 48 can only flow in one direction, so that each liquid supply pipe can supply liquid independently. A shunt 16 is connected to the second one-way valve 48, and the shunt 16 can converge multiple liquid supply pipes into a single pipe for liquid supply.

[0049] The third cleaning liquid barrel 38 has a capacity of 100L, and a third delivery pump 40 is connected to the top of the third cleaning liquid barrel 38. A third delivery pipe 39 is connected to the third delivery pump 40, and a third one-way valve 49 is connected to the third delivery pipe 39. The shunt 16 is connected to the third one-way valve 49, and the shunt 16 can converge multiple liquid supply pipes into a single pipe for liquid supply.

[0050] The shunt 16 is connected to the delivery pipe 14, and the filter 4 is connected to the delivery pipe 14. The liquid supply faucet 50 is connected to the filter 4, and the liquid supply faucet 50 is provided with a flow adjusting switch 17 to adjust the flow of the cleaning liquid flowing onto the surface of the polishing disc.

[0051] The terms "first", "second", "third" are only used for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first", "second", "third" can explicitly or implicitly include one or more of the features. In the description of the present application, the meaning of "multiple" is two or more, unless otherwise specifically limited.

[0052] Advantageously, the filter 4 is provided with a filter element 52, which can precisely filter the liquid supply. The filter element 52 filters particles with a particle size greater than 1μm in the liquid supply. A water pressure gauge 5 is installed above the filter 4, which can monitor the water pressure in the filter 4. When the water pressure is greater than 1bar, the filter element 52 needs to be replaced.

[0053] In the embodiment of the present application, the brush mechanism comprises: a spindle box 53 connected with the polishing machine beam 3; a pressurized air cylinder 13 connected to the top of the spindle box 53; a dynamic rotary head 11 connected below the pressurized air cylinder 13, the dynamic rotary head 11 penetrating through the bottom of the spindle box 53, and a thimble 10 connected below the dynamic rotary head 11; a clamping groove 9 formed on the top of the brush disc 25, and the thimble 10 is clamped with the clamping groove 9; and the pressurized air cylinder 13 is electrically connected with the control cabinet 19.

[0054] In the embodiment of the present application, the diameter of the polishing disc 2 can be 1100 mm, the upper part of the polishing disc 2 is provided with a beam 3, the beam 3 is provided with a guide rail 51, a lead screw 55, a spindle box 53 and a filter 4. The horizontal driving assembly is composed of the guide rail 51, the lead screw 55 and a control motor 15, the spindle box 53 and the filter 4 are installed on the lead screw 55, follow the lead screw 55 and slide along the guide rail 51, and make reciprocating linear motion, the control motor 15 is electrically connected with the control cabinet 19.

[0055] In the description of the present application, it should be understood that the terms "upper", "lower", "horizontal", "top", "bottom", "inner", "outer" and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and therefore cannot be understood as indicating or implying that the devices or elements referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as limiting the present application.

[0056] In one embodiment of the present application, each of the cleaning liquid barrels is provided with a stirrer and a heat exchange pipeline, the heat exchange pipelines are connected with a temperature controller 8, and the temperature controller 8, the stirrers and the control cabinet 19 are electrically connected.

[0057] Specifically, the first cleaning liquid barrel 24, the second cleaning liquid barrel 30 and the third cleaning liquid barrel 38 are respectively provided with a first stirrer 23, a second stirrer 34 and a third stirrer 41, the first stirrer 23, the second stirrer 34 and the third stirrer 41 can stir the liquid to prevent it from depositing and gathering, and the first stirrer power line 28, the second stirrer power line 36 and the third stirrer power line 42 are connected to the control cabinet 19.

[0058] The first cleaning liquid barrel 24, the second cleaning liquid barrel 30 and the third cleaning liquid barrel 38 are respectively provided with a first heat exchange pipeline 20, a second heat exchange pipeline 29 and a third heat exchange pipeline 37, the first heat exchange pipeline 20, the second heat exchange pipeline 29 and the third heat exchange pipeline 37 are connected to the temperature controller 8, the temperature control accuracy of the temperature controller 8 is better than 1℃, the temperature of the temperature controller 8 can be set to 28℃, a heating water tank is installed in the temperature controller 8, the water in the water tank can be heated and cooled, and then the water in the water tank is respectively delivered to one end of the three heat exchange pipelines, the other end of the three heat exchange pipelines stores water, and the water can flow back to the water tank of the temperature controller 8 under the action of water pressure, the whole loop passes through the inside of the cleaning barrel, and the liquid in the barrel can be heated and cooled, and the power line of the temperature controller 8 is connected to the control cabinet.

[0059] Advantageously, the first cleaning liquid tank 24, the second cleaning liquid tank 30 and the third cleaning liquid tank 38 are respectively provided with a first liquid level sensor 27, a second liquid level sensor 32 and a third liquid level sensor 43, and the signal lines of the first liquid level sensor 27, the second liquid level sensor 32 and the third liquid level sensor 43 are connected to the control cabinet 19, and the control cabinet 19 controls the opening and closing of the first delivery pump 21, the second delivery pump 31 and the third delivery pump 40 according to the liquid levels measured by the three liquid level sensors.

[0060] In the above embodiments, the pressurized air cylinder 13 is connected with an air pressure probe 6, the air pressure probe 6 is connected with a pressure regulating valve 56, and the air pressure probe 6 and the pressure regulating valve 56 are both electrically connected with the control cabinet 19. The control cabinet 19 controls the opening and closing of the pressure regulating valve 56 according to the compressed air pressure value measured by the air pressure probe 6, and controls the compressed air pressure value to be 0.8 Mpa.

[0061] The pressurized air cylinder 13 is connected below with a pneumatic rotary head 11, the pneumatic rotary head 11 is connected with an air pressure probe two 57, the air pressure probe two 57 is connected with a pressure regulating valve two 12, and the signal lines of the air pressure probe two 57 and the pressure regulating valve two 12 are connected to the control cabinet 19. The control cabinet 19 controls the opening and closing of the pressure regulating valve two 12 according to the compressed air pressure value measured by the air pressure probe two 57, and controls the compressed air pressure value to be 0.4 Mpa.

[0062] Referring to the accompanying drawings, Figure 2 and 3 The bristles 54 at least include high bristles and low bristles, and the high bristles and the low bristles are uniformly and evenly arranged, specifically on the same radius, and the single high bristles and the low bristles are arranged in sequence and evenly spaced. The difference between the length of the high bristles and the length of the low bristles is 2-3 mm, and the hardness ratio of the high bristles and the low bristles is 1 / 2-3 / 4. Through this composite structure, the upper surface, the surface layer bubbles and the grooves of the flexible polishing pad can be brushed and polished synchronously. Specifically, the diameter of the brush disc 25 can be 300 mm, and below the brush disc 25 is connected with the bristles 54 arranged in a ring shape from sparse to dense from the center of the disc surface to the edge. The material of the bristles 54 is DuPont nylon, the bristles 54 are arranged in high and low uniformity, the length of the high bristles can be 10 mm, the length of the low bristles can be 8 mm, the arrangement spacing of the high bristles and the low bristles can be 5 mm, the hardness of the high bristles can be 0.2, and the hardness of the low bristles can be 0.4.

[0063] Advantageously, the polishing liquid recovery tank 18 is arranged below the outside of the polishing disc 2, and is used to receive the cleaning liquid flowing down from the outside of the polishing disc 2. The cleaning liquid cleaning partition plate 7 is arranged below the circumferential side edge of the polishing disc 2, and moves with the polishing disc 2 during cleaning to discharge the cleaning liquid in the cleaning liquid recovery tank 18.

[0064] In the present application, unless otherwise explicitly specified and limited, the terms "mounting", "connecting", "connecting", "fixing" and other terms should be understood broadly, for example, it can be fixed connection, or detachable connection, or integrated; it can be mechanical connection, or electrical connection; it can be directly connected, or indirectly connected through an intermediate medium, or it can be the internal communication of two elements or the interaction relationship between two elements. For those skilled in the art, the specific meaning of the above terms in the present application can be understood according to the specific circumstances.

[0065] The cleaning steps of the present application are as follows:

[0066] The above device is installed on the polishing machine 1, 90L of prepared cleaning agent (ethylenediamine tetraacetic acid, 6% mass concentration, sodium dodecyl sulfate, 10% mass concentration) is poured into the first cleaning liquid barrel 24, 90L of prepared cleaning agent (ammonia, 0.5% mass concentration) is poured into the second cleaning liquid barrel 30, and 90L of deionized water is poured into the third cleaning liquid barrel 38.

[0067] The temperature controller 8 is set to 28℃, and the water temperature of the first heat exchange pipeline 20, the second heat exchange pipeline 29 and the third heat exchange pipeline 37 reaches the water temperature set by the temperature controller 8.

[0068] The above needle 10 is slowly pressed into the brush disc clamping groove 9, the pressurizing cylinder 13 is started, the control cabinet 19 controls the opening and closing of the pressure regulating valve 56 according to the pressure value measured by the pressure probe 6, and the pressure value of the pressure regulating valve 56 is set to 0.8Mpa, at this time the brush height is 5mm.

[0069] The pneumatic rotating head 11 is started, the control cabinet 19 controls the opening and closing of the pressure regulating valve two 12 according to the pressure value measured by the pressure probe two 57, and the pressure of the pressure regulating valve two 12 is set to 0.4Mpa, the pneumatic rotating head 11 drives the brush disc 25 to make circular motion, at this time the rotating speed of the brush disc 25 is 80r / min.

[0070] The control cabinet 19 sets the rotating speed of the motor 15, the motor 15 drives the lead screw 55 to rotate, the lead screw 55 drives the brush disc 25 to make radial reciprocating motion, the control cabinet 19 sets the single reciprocating motion distance to be 600mm, the feeding speed to be 300mm / min, the one-way motion distance to be 300mm, the diameter of the brush disc 25 to be 300mm, and the one-way motion brush disc 25 can cover the polishing disc 2 with a radius of 550mm, and the motion track of the brush disc 25 relative to the polishing disc 2 is a helix with a pitch of 1mm.

[0071] The control cabinet 19 sets the rotating speed of the polishing disc 2 to be 120r / min, the polishing disc 2 is started to rotate, the polishing disc 2 forms a complex motion track relative to the brush disc 25, and the high and low hairs of the brush 54 can uniformly brush and wash the large plane and the groove of the polishing pad.

[0072] When the first cleaning liquid tank 24 is opened, the first delivery pump 21 switch is opened, and the cleaning liquid in the first cleaning liquid tank 24 is delivered by the first delivery pump 21 through the first delivery pipe 26 into the first one-way valve 47, and then into the distribution channel 16 through the first one-way valve 47, and forms a liquid flow in the distribution channel 16, and then enters the filter 4 through the delivery pipe 14, and then enters the filter core 52 through the filter 4, and finally is supplied to the surface of the polishing disc 2 through the liquid supply faucet 50. The flow rate of the liquid supply faucet 50 is controlled by the flow rate adjusting switch 17. When the liquid level in the first cleaning liquid tank 24 is lower than the first liquid level sensor 22, the control cabinet 19 closes the first delivery pump 21 switch of the first cleaning liquid tank 24.

[0073] The control cabinet 19 then opens the second cleaning liquid tank 30 delivery pump 31 switch, and the cleaning liquid in the second cleaning liquid tank 30 is delivered by the second delivery pump 31 through the second delivery pipe 33 into the second one-way valve 48, and then into the distribution channel 16 through the second one-way valve 48, and forms a liquid flow in the distribution channel 16, and then enters the filter 4 through the delivery pipe 14, and then enters the filter core 52 through the filter 4, and finally is supplied to the surface of the polishing disc 2 through the liquid supply faucet 50. The flow rate of the liquid supply faucet 50 is controlled by the flow rate adjusting switch 17. When the liquid level in the second cleaning liquid tank 30 is lower than the liquid level sensor 32, the control cabinet 19 closes the second delivery pump 31 switch of the second cleaning liquid tank 30.

[0074] The control cabinet 19 then opens the third control cleaning liquid tank 38 third delivery pump 40 switch, and the cleaning liquid in the third control cleaning liquid tank 38 is delivered by the third delivery pump 40 through the third delivery pipe 39 into the third one-way valve 49, and then into the distribution channel 16 through the third one-way valve 49, and forms a liquid flow in the distribution channel 16, and then enters the filter 4 through the delivery pipe 14, and then enters the filter core 52 through the filter 4, and finally is supplied to the surface of the polishing disc 2 through the liquid supply faucet 50. The flow rate of the liquid supply faucet 50 is controlled by the flow rate adjusting switch 17. The cleaning liquid on the surface of the polishing disc 2 flows into the recovery tank 18 from the side of the polishing disc, and the cleaning liquid in the recovery tank 18 is removed by the cleaning partition 7 moving with the polishing disc 2, thereby forming the cleaning of the polishing disc.

[0075] In the description of the present specification, the description of the terms "one embodiment", "some embodiments", "an example", "a specific example", or "some examples" and the like means that the specific features, structures, materials or characteristics described in connection with the embodiment or example are included in at least one embodiment or example of the present application. In the present specification, the illustrative description of the above terms does not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described can be combined in any one or more embodiments or examples in a suitable manner. In addition, those skilled in the art can combine and integrate different embodiments or examples described in the present specification.

[0076] Although the embodiments of the present application have been shown and described above, it is understood that the above-described embodiments are exemplary and are not to be construed as limiting the present application, and that variations, modifications, substitutions and changes can be made by those skilled in the art without departing from the scope of the present application.

Claims

1. A polishing pad cleaning device in full-diameter polishing, which is mounted on a full-diameter polishing polisher (1), characterized in that, The application relates to a polishing machine, which comprises the following parts: a liquid supply mechanism, which provides cleaning agent at a suitable temperature and supplies the cleaning agent to the surface of a polishing disc (2) through a liquid supply faucet (50) according to required flow; The brush mechanism is connected to the polishing machine beam (3), and the output end is connected with a brush disc (25). The brush disc (25) is a composite structure, has brush hairs (54) towards the surface side of the polishing disc (2), and gradually arranges the brush hairs (54) from sparse to dense to form multiple rings from the center to the outer edge, so as to avoid excessive brushing of the center of the polishing disc (2). The brushing range of the brush disc (25) covers the entire surface of the polishing disc (2), and the liquid supply faucet (50) provides cleaning agent for the brush hairs (54) in real time. The brush disc (25) is designed by using light weight material, and the weight per unit area is not greater than 5g / mm 2 The brush hairs (54) at least include high hairs and low hairs, and the high hairs and the low hairs are uniformly and spacedly arranged. a control cabinet (19), at least part of the liquid supply mechanism and the brush mechanism being electrically connected to the control cabinet (19); the liquid supply mechanism comprises: a plurality of cleaning liquid barrels, which are arranged around the polishing machine (1); a delivery pump, each of the cleaning liquid barrels being connected to a delivery pump, each of the delivery pumps being connected to a corresponding delivery pipe, and each of the delivery pipes being provided with a one-way valve; a shunt (16), a plurality of the delivery pipes being connected to a liquid delivery channel (14) through the shunt (16), and the liquid delivery channel (14) being connected to a polishing machine beam (3); the cleaning agent is delivered to the liquid supply faucet (50) through the liquid delivery channel (14); wherein the delivery pump is electrically connected to the control cabinet (19); a filter (4) is arranged between the liquid supply faucet (50) and the liquid delivery channel (14), the filter (4) is connected to the polishing machine beam (3), and the liquid supply faucet (50) is provided with a flow adjusting switch (17) which is electrically connected to the control cabinet (19); the brush mechanism comprises: a spindle box (53), which is connected to the polishing machine beam (3); a pressurized air cylinder (13), which is connected to the top of the spindle box (53); a pneumatic rotating head (11), which is connected below the pressurized air cylinder (13) and penetrates through the bottom of the spindle box (53), and is connected to a thimble (10) below, the brush disc (25) is provided with a clamping groove (9) at the top, and the thimble (10) is clamped with the clamping groove (9); the pressurized air cylinder (13) is electrically connected to the control cabinet (19); each of the cleaning liquid barrels is provided with a stirrer and a heat exchange pipeline, the heat exchange pipeline is connected to a temperature controller (8), and the temperature controller (8), the stirrer and the control cabinet (19) are electrically connected; the pressurized air cylinder (13) is connected to an air pressure probe (6), the air pressure probe (6) is connected to a pressure regulating valve (56), the pneumatic rotating head (11) is connected to a pneumatic probe two (57), the pneumatic probe two (57) is connected to a pressure regulating valve two (12), and the air pressure probe (6), the pressure regulating valve (56), the pneumatic probe two (57) and the pressure regulating valve two (12) are electrically connected to the control cabinet (19).

2. The all-aperture polishing mid-polish pad cleaning apparatus of claim 1, wherein, The difference between the length of the high hair and the length of the low hair is 2-3 mm, and the hardness ratio of the high hair to the low hair is 1 / 2-3 / 4.

3. The full bore polishing mid-polish pad cleaning apparatus of claim 1, wherein, A water pressure gauge (5) is arranged above the filter (4) to monitor the service state of the filter element.

4. The all-aperture polishing mid-polish pad cleaning apparatus of claim 1, wherein, The polishing machine crossbeam (3) is provided with a horizontal drive assembly composed of a guide rail (51), a lead screw (55) and a control motor (15), the spindle box (53) and the filter (4) are installed on the lead screw (55), follow the lead screw (55) and slide along the guide rail (51), do reciprocating linear motion, and the control motor (15) is electrically connected with the control cabinet (19).

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