A substrate disc locking device for electron beam exposure machine and control method thereof

Abstract

The present invention discloses a substrate disc locking device for an electron beam exposure machine and a control method thereof, wherein a rotating shaft is fixed on a base, one end of the rotating shaft is connected to a drive assembly, and the other end is connected to a limit identification assembly, wherein the limit identification assembly is used to assist in determining the limit position of the rotating shaft rotation; a clamping assembly and a spring preload assembly are nested on the rotating shaft, the clamping assembly is used to lock the substrate disc, and the spring preload assembly is used to provide a spring torque; when the substrate disc is locked, the driving force provided by the drive assembly overcomes the spring torque provided by the spring preload assembly, realizes the rotation of the rotating shaft, and then drives the clamping assembly to rotate to a preset position, after the substrate disc is passed into the carrier position, the drive assembly rotates back to the locking position and no longer provides driving force, and the clamping assembly provides a continuous locking force under the action of the spring torque to lock the substrate disc. The present invention has the characteristics of convenient operation, flexible adjustment and low magnetic interference, and meets the special working condition use requirements of the electron beam exposure machine.

Description

Technical Field

[0001] The present invention belongs to the technical field of substrate disc locking, and in particular relates to a substrate disc locking device for an electron beam exposure machine or similar working conditions and a control method thereof. Background Art

[0002] Electron beam lithography (EBLI) systems use an electron beam to perform direct write exposure on photoresist-coated wafers or substrates (which may or may not be circular wafers). They play a crucial role in the semiconductor process equipment industry. The substrate clamping device, a functional component within the EBLI system's worktable, clamps the substrate tray holding the wafer or exposure substrate, providing a continuous preload to maintain it in a reference position, ensuring high-precision positioning during the process.

[0003] However, compared with other semiconductor process equipment, electron beam exposure machines have certain peculiarities, the most typical of which are the ultra-high vacuum and weak magnetic (≤10nT) environment during the process. At the same time, the space in the exposure area is extremely limited. Therefore, there are many constraints on the design of the locking device. Implementing this function and ensuring the smooth operation of the device is a major challenge.

[0004] Currently, conventional locking devices mainly adopt two approaches. One is a normally open design, that is, no locking function is provided in the non-working state, and locking is performed by a power drive device in the working state; the other is a normally closed design, that is, the locking function is maintained in the non-working state, and the locking state is temporarily contacted by a power drive device in the working state. The difference between the two different modes mainly lies in whether the source of the preload force is a controllable drive element of the device, such as a motor, cylinder or other power source. Among them, the normally open design is a more common locking device design scheme, but it requires a power source to continuously provide preload force. In electron beam exposure equipment, the use of cylinders will affect the high vacuum environment, and the use of motors will generate thermal and magnetic interference, which is not the best choice. Summary of the Invention

[0005] The technical problem to be solved by the present invention mainly faces the special working conditions of the electron beam exposure machine. In view of its ultra-high vacuum, weak magnetic (≤10nT) environment and extremely limited space, a substrate locking device and a control method for the electron beam exposure machine are provided, which are compact, highly reliable, have flexible adjustment capabilities, and low magnetic interference. The present invention is also applicable to equipment with similar working conditions as the electron beam exposure machine. Compared with the currently more conventional locking devices, the device of the present invention hardly generates magnetic interference and thermal interference, has a compact structure and occupies little space. The device can be set to a better working condition according to the actual working condition requirements through an adjustable structure, which greatly reduces the processing accuracy requirements for parts and improves practicality.

[0006] To achieve the above object, the present invention can adopt the following technical solutions:

[0007] The cam is fixed to the base via the rotary shaft seat, one end of the rotary shaft is connected to the driving assembly, and the other end of the rotary shaft is connected to the limit identification assembly, and the limit identification assembly is used to assist in judging the limit position of the rotary shaft rotation range; the clamping assembly and the spring pre-tightening assembly are nested on the rotary shaft, the clamping assembly is used to lock the substrate disc, and the spring pre-tightening assembly is used to provide a spring torque as a clamping force; when the substrate disc is locked, the driving force provided by the driving assembly overcomes the spring torque provided by the spring pre-tightening assembly to realize the rotation of the rotary shaft, and then drives the clamping assembly to rotate to a preset position. After the substrate disc is transferred to the carrier position, the driving assembly rotates back to the locking position and no longer provides driving force. The clamping assembly provides continuous locking force under the action of the spring torque to lock the substrate disc.

[0008] As a further improvement of the present invention, the clamping assembly includes a shaft clamp and a locking buckle, the shaft clamp is tilted and nested on the shaft, the locking buckle is fixed on the shaft clamp, and the locking buckle is in contact with the substrate disk.

[0009] As a further improvement of the present invention, the interior of the locking buckle is a hollow structure, and the locking buckle adopts a trumpet shape.

[0010] As a further improvement of the present invention, the spring pre-tensioning assembly includes a spring sleeve, a pre-tensioning spring and a spring base, the spring sleeve is nested and fixed on the rotating shaft, the spring base is fixed on the base, the pre-tensioning spring is nested on the rotating shaft, one end of the pre-tensioning spring is detachably connected to the spring sleeve, and the other end of the pre-tensioning spring is fixedly connected to the spring base; by adjusting the installation position of the pre-tensioning spring on the spring sleeve, a preset spring torque is provided for the rotating shaft.

[0011] As a further improvement of the present invention, the end surface of the spring sleeve is provided with a plurality of mounting holes, the preloaded spring is connected to the mounting holes, and the plurality of mounting holes surround and form a semicircle of 180°.

[0012] As a further improvement of the present invention, the limit identification component includes a rotating light blocker, a mounting seat and a micro photoelectric switch; the rotating light blocker is installed on the mounting seat, the mounting seat is connected and fixed to the end of the rotating shaft, and the micro photoelectric switch is installed on the base; when the mounting seat rotates with the rotating shaft, the rotating light blocker triggers the micro photoelectric switch, indicating that the rotating shaft has rotated to the extreme position.

[0013] As a further improvement of the present invention, the rotating light blocking plate includes a first rotating light blocking plate and a second rotating light blocking plate, and the micro photoelectric switch includes a first micro photoelectric switch and a second micro photoelectric switch, the first micro photoelectric switch and the second micro photoelectric switch are respectively installed on the left and right sides of the mounting base, the first rotating light blocking plate matches the first micro photoelectric switch, and the second rotating light blocking plate matches the second micro photoelectric switch, so as to identify the extreme positions of the left and right rotation of the rotating shaft.

[0014] As a further improvement of the present invention, the drive assembly includes a motor, a motor seat and a coupling; the motor is fixed to the base through the motor seat, and the output shaft of the motor is connected and fixed to the rotating shaft through the coupling.

[0015] As a general technical concept, the present invention also provides a control method for the substrate disc locking device for the electron beam exposure machine, comprising the following steps:

[0016] Step S1, standby state: the preload spring is in a natural state, and the motor is not powered; at this time, the locking buckle is located below the substrate tray and does not affect the movement trajectory of the substrate tray, and the substrate tray moves in and out along the guide rail;

[0017] Step S2, opening action: the motor is powered on and rotates in the forward direction, the preload spring is twisted, and the shaft rotates to a preset angle; during this process, the substrate disk is not above the locking buckle;

[0018] Step S3, clamping action: the motor rotates in the reverse direction, the shaft drives the locking buckle to rotate in the reverse direction, the locking buckle clamps the substrate disk, the motor loses power, and the spring torque provides pre-tightening;

[0019] Step S4, return action: the motor returns to the initial position and returns to the standby state after power failure.

[0020] As a further improvement of the present invention, in step S3, when the preload spring is twisted to the open position, the locking buckle is again located below the substrate tray. At this time, the substrate tray can freely move in and out along the track. When the substrate tray is pushed above the locking buckle, the motor reverses, driving the locking buckle on the rotating shaft to perform a clamping action. While resisting the torsional force of the preload spring, the rotating shaft follows the motor to return and rotate until the locking buckle just reaches the position of contacting the substrate tray, and the motor is completely de-energized.

[0021] In step S4, if the substrate disk locking device is in the open state and there is no substrate disk above the locking buckle, the motor can perform a return action to the initial position, the pre-tightening spring is in a natural state or a slightly pre-tightened state, the motor is completely powered off, and the substrate disk locking device becomes a standby state again.

[0022] Compared with the prior art, the advantages of the present invention are:

[0023] 1. The substrate disc locking device for an electron beam exposure machine of the present invention comprises a driving assembly, a rotating shaft seat, a rotating shaft, a clamping assembly, a spring pre-tightening assembly and a limit identification assembly installed on a base, which form the main structure of the substrate disc locking device. The device has the characteristics of being compact and has low requirements for installation space. Specifically, the rotating shaft seat is used to fix the rotating shaft on the base, one end of the rotating shaft is connected to the driving assembly, and the other end is connected to the limit identification assembly. The limit identification assembly is used to assist in judging the limit position of the rotating range of the rotating shaft, thereby improving the control accuracy. The clamping assembly and the spring pre-tightening assembly are nested on the rotating shaft. When the substrate disc is locked, the driving force provided by the driving assembly overcomes the force provided by the spring pre-tightening assembly. The spring torque realizes the rotation of the shaft, and then drives the clamping assembly to rotate to the preset position to lock the substrate disk. By adopting spring locking as the execution method, the locking action and the contact with the substrate disk have a certain "flexibility", and will not produce collisions between rigid components like the motor-driven clamping method to affect the accuracy and reliability. In addition, the device is directly connected to the shaft by the drive assembly to realize the rotation and return of the device. When the power is off, it is continuously clamped by the spring. The principle is simple and the reliability is high. At the same time, due to the use of spring pre-tightening, the motor of this device will not work during the equipment process, so no additional heat, magnetic and other effects will be generated, and the impact on the process environment is extremely small. It is suitable for equipment such as electron beam exposure machine that has extremely harsh process environment.

[0024] 2. The substrate disk locking device for an electron beam exposure machine of the present invention adopts a multi-hole design on the mounting end face of the spring sleeve connected to the pre-tightening spring to adjust and realize the optimal pre-tightening force when the device is working, and at the same time realizes the in-position monitoring of the rotation angle through an adjustable light-blocking sheet. It is very flexible in application, greatly reduces the precision requirements for the design and processing of parts, and can meet the use of equipment with accurate clamping force requirements.

[0025] 3. The control method of the substrate disk locking device for an electron beam exposure machine of the present invention realizes the clamping of the substrate disk by performing a clamping action in a rotational manner. Specifically, a pre-tightened spring is used as the source of the clamping force, and the motor only provides the power for the contact locking state and the locking action. This solution can ensure that the motor does not need to work during the equipment process, so there will be no interference from adverse factors such as thermal effects and magnetic effects. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1 Schematic diagram of the three-dimensional structure principle of a substrate disc locking device for an electron beam exposure machine in a specific embodiment of the present invention;

[0027] Figure 2 Schematic diagram of the exploded structure principle of a substrate disc locking device for an electron beam exposure machine in a specific embodiment of the present invention;

[0028] Figure 3 This is a schematic diagram of the structural principle of a spring preload assembly in a specific embodiment of the present invention;

[0029] Figure 4 A schematic diagram of the structural principle of a limit identification component in a specific embodiment of the present invention;

[0030] Figure 5 Schematic diagram of the process of locking the substrate tray in a specific embodiment of the present invention; wherein, Figure (a) shows the standby state, Figure (b) shows the locked substrate tray in the open state, Figure (c) shows the clamping action being executed, and Figure (d) shows the substrate tray being fully clamped;

[0031] Figure 6 Schematic diagram of the process of locking the substrate disc in a specific embodiment of the present invention.

[0032] Legend: 1. Base; 2. Motor; 3. Motor seat; 4. Coupling; 5. Rotating shaft seat; 51. First rotating shaft seat; 52. Second rotating shaft seat; 6. Rotating shaft; 7. Rotating shaft clamp; 8. Locking buckle; 9. Spring sleeve; 91. Mounting hole; 10. Preload spring; 11. Spring base; 12. Rotating light shield; 121. First rotating light shield; 122. Second rotating light shield; 123. Waist-shaped hole; 13. Mounting seat; 14. Micro photoelectric switch; 141. First micro photoelectric switch; 142. Second micro photoelectric switch. DETAILED DESCRIPTION

[0033] The present invention will be further described below in conjunction with the accompanying drawings and specific preferred embodiments, but the scope of protection of the present invention is not limited thereby.

[0034] In the description of the present invention, it should be understood that the terms "side", "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential" and the like to indicate orientations or positional relationships based on the orientations or positional relationships shown in the accompanying drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore should not be understood as limiting the present invention.

[0035] In addition, the terms "first" and "second" are used for descriptive purposes only and cannot be understood as indicating or suggesting relative importance or implicitly indicating the number of the indicated technical features. Therefore, the features defined as "first" and "second" may explicitly or implicitly include one or more of the features. In the description of the present invention, "multiple" means two or more, unless otherwise clearly and specifically defined.

[0036] Example 1

[0037] like Figures 1 to 4 As shown, the substrate disc locking device for an electron beam exposure machine of the present invention includes an H-shaped base 1, a drive assembly, a rotating shaft seat 5, a rotating shaft 6, a clamping assembly, a spring preload assembly, and a limit identification assembly mounted on the base 1. The rotating shaft 6 is a key component that runs through the substrate disc locking device and is fixed to the base 1 via a first rotating shaft seat 51 and a second rotating shaft seat 52. One end of the rotating shaft 6 is connected to the drive assembly, and the other end of the rotating shaft 6 is connected to the limit identification assembly, which assists in determining the extreme position of the rotation range of the rotating shaft 6. The clamping assembly and the spring preload assembly are nested on the rotating shaft 6. The clamping assembly is used to lock the substrate disc, and the spring preload assembly is used to provide spring torque as a clamping force. When locking the substrate disc, the driving force provided by the driving assembly overcomes the spring torque provided by the spring pre-tightening assembly, thereby realizing the rotation of the rotating shaft 6, and then driving the clamping assembly to rotate to the preset position. After the substrate disc is transferred to the carrier position, the driving assembly rotates back to the locking position and no longer provides driving force. The clamping assembly provides continuous locking force under the action of the spring torque to lock the substrate disc.

[0038] In this embodiment, the main structure of the substrate disc locking device is composed of a drive assembly, a shaft seat 5, a shaft 6, a clamping assembly, a spring preload assembly, and a limit detection assembly mounted on the base 1. This compact structure requires minimal installation space. Specifically, the shaft seat 5 secures the shaft 6 to the base 1. One end of the shaft 6 is connected to the drive assembly, and the other end is connected to the limit detection assembly. The limit detection assembly assists in determining the extreme positions of the shaft 6's rotation range, improving control accuracy. The clamping assembly and the spring pre-tightening assembly are nested on the rotating shaft 6. When the substrate disc is locked, the driving force provided by the driving assembly overcomes the spring torque provided by the spring pre-tightening assembly to realize the rotation of the rotating shaft, and then drives the clamping assembly to rotate to a preset position to lock the substrate disc. By adopting spring locking as the execution method, the contact between the locking action and the substrate disc has a certain "flexibility", and will not produce collisions between rigid components like the motor-driven clamping method to affect accuracy and reliability. In addition, the device is directly connected to the rotating shaft by the driving assembly to realize the rotation and return of the device. When the power is off, the spring is used to continue clamping. The principle is simple and the reliability is high. At the same time, due to the use of spring pre-tightening, the device does not have a motor working during the equipment process, so no additional thermal, magnetic and other effects are generated, and the impact on the process environment is extremely small. It is suitable for equipment such as electron beam exposure machines that are extremely demanding on the process environment.

[0039] like Figure 1 and Figure 2As shown, the clamping assembly includes a shaft clamp 7 and a locking buckle 8. The shaft clamp 7 is tilted and nested on the shaft 6. The locking buckle 8 is fixed on the shaft clamp 7. The locking buckle 8 is in contact with the substrate disk.

[0040] Specifically, the shaft clamp 7 is fixed to the shaft 6 by a set screw. The locking buckle 8 is an internal hollow structure and is fixed to the shaft clamp 7 by a screw. It serves as a direct contact part when clamping the substrate disk. In order to ensure that the force direction of the device on the substrate disk is mainly horizontal during contact, the setting direction of the locking buckle 8 is slightly downward, and the locking buckle 8 adopts a trumpet shape.

[0041] like Figure 1 and Figure 2 As shown, the spring preload assembly includes a spring sleeve 9, a preload spring 10, and a spring base 11. The spring sleeve 9 is nested and fixed on the rotating shaft 6, while the spring base 11 is fixed to the base 1. The preload spring 10 is nested on the rotating shaft 6. One end of the preload spring 10 is detachably connected to the spring sleeve 9, while the other end is fixedly connected to the spring base 11. By adjusting the installation position of the preload spring 10 on the spring sleeve 9, a preset spring torque is provided to the rotating shaft 6, serving as the actual source of the clamping force for the substrate disk.

[0042] like Figure 3 As shown, the end surface of the spring sleeve 9 is provided with a plurality of mounting holes 91 , and the preload spring 10 is connected to the mounting holes 91 . The mounting holes 91 are used to adjust the initial torque when the preload spring 10 is installed.

[0043] In this embodiment, a multi-hole design is employed for the use of the preload spring 10. Mounting holes 91 are formed around the end surface of the spring sleeve 9, extending 180° around the mounting position. This allows for more appropriate installation based on the required rotation angle and the torque required during preload. To increase torque, the initial installation rotation angle is increased by one level, allowing the component to rotate further in the preload position, providing greater preload force (torque), and vice versa. In the substrate disk preload device of this embodiment, a total of seven mounting holes are provided on the spring sleeve 9, with the angle between adjacent holes being 180° / (7-1) = 30°. If more precise torque adjustment is required, the number of holes can be further increased. For example, if 19 mounting holes are used, the initial torque adjustment amount is: spring constant × 10°.

[0044] like Figure 1 and Figure 2 As shown, the limit identification assembly includes a rotating light shield 12, a mounting base 13, and a micro-photoelectric switch 14. The rotating light shield 12 is mounted on the mounting base 13, which is fixedly connected to the end of the rotating shaft 6. The micro-photoelectric switch 14 is mounted on the base 1. When the mounting base 13 rotates with the rotating shaft 6, the rotating light shield 12 triggers the micro-photoelectric switch 14, indicating that the rotating shaft 6 has reached its limit position.

[0045] like Figure 4 As shown, the rotating light blocking plate 12 includes a first rotating light blocking plate 121 and a second rotating light blocking plate 122, and the micro photoelectric switch 14 includes a first micro photoelectric switch 141 and a second micro photoelectric switch 142. The first micro photoelectric switch 141 and the second micro photoelectric switch 142 are respectively installed on the left and right sides of the mounting base 13. The first rotating light blocking plate 121 matches the first micro photoelectric switch 141, and the second rotating light blocking plate 122 matches the second micro photoelectric switch 142 to identify the extreme positions of the left and right rotation of the rotating shaft 6.

[0046] In this embodiment, the first rotating light blocking plate 121 and the second rotating light blocking plate 122 are both provided with a transverse waist-shaped hole 123. By providing the transverse waist-shaped hole 123, the position of the light blocking plate can be adjusted more flexibly, so that when the light blocking plate blocks the micro photoelectric switch to generate an in-position signal, the rotation angle of the rotating shaft 6 can be set more accurately. The light blocking plate provides position detection for the device, and can detect the initial position and the open position. Compared with the method of recording the rotation amount in the motor rotation control, the use of a photoelectric switch to detect whether the rotation state is in place has higher reliability. Because detecting the rotation angle from the drive end may result in risks such as lost steps and data loopholes, the use of a micro photoelectric switch in the device is a real detection of the structural position.

[0047] like Figure 1 and Figure 2 As shown, the drive assembly includes a motor 2, a motor base 3 and a coupling 4. The motor 2 is fixed to the base 1 through the motor base 3, and the output shaft of the motor 2 is connected and fixed to the rotating shaft 6 through the coupling 4.

[0048] Specifically, one side of the motor base 3 is connected and fixed to the motor 2 via a small-diameter screw, and the middle through-hole accommodates the output shaft of the motor 2, which is then connected and fixed to the rotating shaft 6 via the coupling 4. In this embodiment, the coupling 4 adopts a diaphragm coupling, which can appropriately reduce the coaxiality requirement.

[0049] There are two key forces in the substrate disk pre-tightening device of this embodiment. One is the driving force of the motor 2 , and the other is the torsional force of the pre-tightening spring 10 .

[0050] Motor 2 is a part on the side of the device. It is very convenient to replace and install. According to the actual operating range, that is, the angle at which the device needs to rotate, motors 2 with different rated torques can be selected to form the device. It is only necessary to maintain the corresponding motor mounting holes and the coupling that matches the motor shaft diameter.

[0051] The preload spring 10 is a component that provides preload force (locking function) for a long time in this device. There are requirements for the maximum torque that needs to be generated during its operation and the torque during locking. The maximum torque is required to not exceed the rotational torque that the motor 2 can provide. The torque during locking is determined according to the design requirements of the equipment, and the value is generally determined during the design. The requirement of "maximum torque not exceeding the maximum torque of the motor" can be achieved by selecting a motor of the appropriate model, and the torque during preload is related to the characteristics of the spring itself and the torsion angle. In theory, the torque provided by the preload spring is a constant at a certain rotation angle. Therefore, the locking torque requirement can be achieved in the spring selection. However, in actual applications, there are often deviations from theoretical calculations, which is mainly reflected in the fact that the working state of the spring is often not an ideal stress state, and considering factors such as the friction, stress deformation, processing and assembly accuracy of the device, the actual working torque of the torsion spring often deviates from the design value. In equipment with high precision requirements such as electron beam exposure machines, there are often more stringent requirements for this type of functional devices, and the torque needs to be calibrated during the debugging process. If the calibration test finds that the parts do not meet the requirements, it is necessary to disassemble and replace the parts or debug and test the functional devices, which not only causes waste of parts, but also extends the debugging cycle.

[0052] In this embodiment, the spring, through its surrounding mounting holes, can achieve varying initial torques, providing a more tailored torque when rotated to the locked position, meeting the device's operational requirements and making it particularly suitable for devices requiring high locking force. Furthermore, the substrate disk preload device of this embodiment incorporates a travel-adjustable photoelectric detection element at the end of the device, taking into account the need for control over the rotational range during actual use. This allows for more accurate matching of the required angular range.

[0053] Example 2

[0054] like Figure 5 and Figure 6 As shown, the substrate disc locking device control method for an electron beam exposure machine of the present invention is implemented based on the substrate disc locking device in Example 1, and includes the following steps:

[0055] Step S1, standby state: the preload spring 10 is in a natural state, and the motor 2 is not powered; at this time, the locking buckle 8 is located below the substrate disc and does not affect the moving trajectory of the substrate disc, and the substrate disc moves in and out along the guide rail; Figure 5 As shown in (a).

[0056] Step S2, opening action: the motor 2 is powered on and rotates forward, the preload spring 10 is twisted, and the shaft 6 rotates to a preset angle; during this process, the substrate disc is not above the locking buckle 8, as shown in FIG. Figure 5The opening action must ensure that the substrate disc is not above the substrate disc pre-tightening device, because the locking buckle will pass through the spatial position of the substrate disc during rotation. If the substrate is above the locking buckle 8 at this time, it will cause contact between components, which may cause damage. Therefore, interlocking must be done in the control logic of the action.

[0057] Step S3, clamping action: the motor 2 rotates in the opposite direction, the shaft 6 drives the locking buckle 8 to rotate in the opposite direction, the locking buckle 8 clamps the substrate disc, the motor 2 loses power, and the spring torque provides pre-tightening. When the pre-tightening spring 10 is twisted to the open position, the locking buckle 8 is again located below the substrate disc. At this time, the substrate disc can move in and out freely along the track. When the substrate disc is pushed above the locking buckle 8, the motor 2 reverses and drives the locking buckle 8 on the shaft 6 to perform the clamping action. While the shaft 6 resists the torque of the pre-tightening spring 10, it slowly returns to its original position following the motor 2 until the locking buckle 8 just reaches the position of contacting the substrate disc, and the motor 2 completely loses power. At this time, under the action of the torque of the pre-tightening spring 10, the shaft 6 has a tendency to continue rotating, but because it has reached the pre-tightening position, it will only lock the substrate disc firmly above the locking buckle 8. Figure 5 As shown in (c) and (d).

[0058] Step S4, return action: Motor 2 returns to the initial position and returns to the standby state after power failure. If the substrate disc locking device is in the open state and there is no substrate disc above the locking buckle 8, the motor 2 can perform the return action to the initial position, the preload spring 10 is in the natural state or slightly preloaded state, the motor 2 is completely powered off, and the substrate disc locking device returns to the standby state again, such as Figure 5 As shown in (a).

[0059] In this embodiment, the substrate disk is clamped by performing a clamping action through rotation. Specifically, a preload spring 10 is used as the source of the clamping force, and the motor 2 only provides the power for the contact locking state and the locking action. This solution can ensure that the motor 2 does not need to work during the equipment process, so there will be no interference from adverse factors such as thermal effects and magnetic effects.

[0060] Although the present invention is disclosed above with reference to preferred embodiments, it is not intended to limit the present invention. Any person skilled in the art can, without departing from the spirit and technical solutions of the present invention, use the methods and technical contents disclosed above to make many possible changes and modifications to the technical solutions of the present invention, or modify them into equivalent embodiments with equivalent changes. Therefore, any simple modification, equivalent replacement, equivalent change and modification made to the above embodiments based on the technical spirit of the present invention without departing from the content of the technical solutions of the present invention, shall still fall within the scope of protection of the technical solutions of the present invention.

Claims

1. A substrate disc locking device for an electron beam exposure machine, characterized in that: The invention comprises a base (1), a driving assembly, a rotating shaft seat (5), a rotating shaft (6), a clamping assembly, a spring pre-tightening assembly and a position limit identification assembly installed on the base (1); the rotating shaft (6) is fixed to the base (1) through the rotating shaft seat (5), one end of the rotating shaft (6) is connected to the driving assembly, and the other end of the rotating shaft (6) is connected to the position limit identification assembly, and the position limit identification assembly is used to assist in judging the limit position of the rotation range of the rotating shaft (6); the clamping assembly and the spring pre-tightening assembly are nested on the rotating shaft (6), the clamping assembly is used to lock the substrate disc, and the spring pre-tightening assembly is used to provide a spring torque as a clamping force; when the substrate disc is locked, the driving force provided by the driving assembly overcomes the spring torque provided by the spring pre-tightening assembly, so that the rotating shaft (6) is rotated, and then the clamping assembly is driven to rotate to a preset position, and after the substrate disc is transferred to the carrier position, the driving assembly rotates back to the locking position and no longer provides driving force, and the clamping assembly provides a continuous locking force under the action of the spring torque to lock the substrate disc.

2. The substrate disc locking device for an electron beam exposure machine according to claim 1, characterized in that: The clamping assembly comprises a rotating shaft clamp (7) and a locking buckle (8), wherein the rotating shaft clamp (7) is tiltedly nested on the rotating shaft (6), the locking buckle (8) is fixed on the rotating shaft clamp (7), and the locking buckle (8) contacts the substrate disk.

3. The substrate disc locking device for an electron beam exposure machine according to claim 2, wherein: The interior of the locking buckle (8) is a hollow structure, and the locking buckle (8) is in a trumpet shape.

4. The substrate disc locking device for an electron beam exposure machine according to claim 2, wherein: The spring preload assembly comprises a spring sleeve (9), a preload spring (10) and a spring base (11); the spring sleeve (9) is nested and fixed on the rotating shaft (6); the spring base (11) is fixed on the base (1); the preload spring (10) is nested on the rotating shaft (6); one end of the preload spring (10) is detachably connected to the spring sleeve (9); the other end of the preload spring (10) is fixedly connected to the spring base (11); and a preset spring torque is provided for the rotating shaft (6) by adjusting the installation position of the preload spring (10) on the spring sleeve (9).

5. The substrate disc locking device for an electron beam exposure machine according to claim 4, characterized in that: The end surface of the spring sleeve (9) is provided with a plurality of mounting holes (91), the preload spring (10) is connected to the mounting holes (91), and the plurality of mounting holes (91) surround and form a semicircle of 180 degrees.

6. The substrate disk locking device for an electron beam exposure machine according to claim 4, characterized in that: The position limit identification component comprises a rotating light blocking plate (12), a mounting seat (13) and a micro photoelectric switch (14); the rotating light blocking plate (12) is mounted on the mounting seat (13), the mounting seat (13) is connected and fixed to the end of the rotating shaft (6), and the micro photoelectric switch (14) is mounted on the base (1); when the mounting seat (13) rotates along with the rotating shaft (6), so that the rotating light blocking plate (12) triggers the micro photoelectric switch (14), it indicates that the rotating shaft (6) has rotated to the limit position.

7. The substrate disk locking device for an electron beam exposure machine according to claim 6, characterized in that: The rotating light blocking plate (12) comprises a first rotating light blocking plate (121) and a second rotating light blocking plate (122); the micro photoelectric switch (14) comprises a first micro photoelectric switch (141) and a second micro photoelectric switch (142); the first micro photoelectric switch (141) and the second micro photoelectric switch (142) are respectively mounted on the left and right sides of the mounting seat (13); the first rotating light blocking plate (121) matches the first micro photoelectric switch (141); and the second rotating light blocking plate (122) matches the second micro photoelectric switch (142) to identify the extreme positions of the left and right rotation of the rotating shaft (6).

8. The substrate disk locking device for an electron beam exposure machine according to any one of claims 1 to 7, characterized in that: The drive assembly comprises a motor (2), a motor seat (3) and a coupling (4); the motor (2) is fixed to the base (1) via the motor seat (3), and the output shaft of the motor (2) is connected and fixed to the rotating shaft (6) via the coupling (4).

9. A control method for a substrate disk locking device for an electron beam exposure machine according to any one of claims 1 to 8, characterized in that: The following steps are included: Step S1, standby state: the preload spring (10) is in a natural state, and the motor (2) is not powered; at this time, the locking buckle (8) is located below the substrate disc, and does not affect the moving trajectory of the substrate disc, and the substrate disc moves in and out along the guide rail; Step S2, opening action: the motor (2) is powered on and rotates in the forward direction, the preload spring (10) is twisted, and the shaft (6) rotates to a preset angle; during this process, the substrate disc is not above the locking buckle (8), Step S3, clamping action: the motor (2) rotates in the reverse direction, the rotating shaft (6) drives the locking buckle (8) to rotate in the reverse direction, the locking buckle (8) clamps the substrate disc, the motor (2) loses power, and the spring torque provides pre-tightening; Step S4, return action: the motor (2) returns to the initial position and returns to the standby state after power failure.

10. The control method according to claim 9, characterized in that: In step S3, when the preload spring (10) is twisted to the open position, the locking buckle (8) is again located below the substrate disc, and the substrate disc can now freely move in and out along the track. When the substrate disc is pushed above the locking buckle (8), the motor (2) is reversed, driving the locking buckle (8) on the rotating shaft (6) to perform a clamping action. The rotating shaft (6) resists the torsion of the preload spring (10) and follows the motor (2) to return and rotate until the locking buckle (8) just reaches the position of contacting the substrate disc, and the motor (2) is completely de-energized. In step S4, if the substrate disc locking device is in the open state and there is no substrate disc above the locking buckle (8), the motor (2) can be used to perform a return action to the initial position, the preload spring (10) is in a natural state or a slightly preloaded state, the motor (2) is completely powered off, and the substrate disc locking device is put into a standby state again.

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