A high-frequency radiation source based on photoinduced ultrafast and ultrashort electron pulses

Abstract

The invention discloses a high-frequency radiation source based on photoinduced ultrafast and ultrashort electron pulses. The radiation source comprises a cathode structure (11), a first insulating ceramic sheet (32), a grid structure (12), a second insulating ceramic sheet (33), a focusing electrode structure (13), a third insulating ceramic sheet (34), an anode structure (14), a fourth insulating ceramic sheet (35), an output section component (20), a fifth insulating ceramic sheet (36), and a collector structure (15), which are arranged in sequence and all have through holes at their centers. A small ultrafast laser (50) is arranged on the other side of the collector structure (15); the small ultrafast laser (50) generates laser light that irradiates the surface of a nano cold cathode (111) through the through hole, and the surface of the nano cold cathode (111) generates ultrafast and ultrashort electron pulses that are transmitted to the output section component (20) to generate electromagnetic waves. The radiation source disclosed by the invention has a simple structure, a small size, good stability, and low cost.

Description

Technical Field

[0001] The present invention relates to the field of radiation sources, and more particularly to a high-frequency radiation source based on photoinduced ultrafast and ultrashort electron pulses. Background Art

[0002] With the development of technology, high-frequency electromagnetic waves are attracting more and more attention due to the development of the communications industry. The development and utilization of high-frequency electromagnetic waves require a high-frequency radiation source. High-frequency radiation sources generate high-power narrowband continuous electromagnetic waves, which can be better applied to the research field of high-frequency electromagnetic waves.

[0003] While existing high-frequency radiation sources can generate high-frequency electromagnetic waves to a certain extent, because the initially generated electron beam does not contain a high-frequency electrical signal, the radiation source requires complex modulation steps. Furthermore, because the entire radiation source must operate in a high-frequency environment, the structure of the radiation source is complex, unstable, and difficult to manufacture. Furthermore, some radiation sources are often used in environments with limited space, while existing radiation sources are bulky and costly.

[0004] The prior art discloses a cold cathode radiation source based on spiral ribbon electron injection. This radiation source consists of an electron gun, a metal shell, and a guiding magnetic field generator. The electron gun comprises a cathode block, a cathode emitting surface, an anode block, and an insulator. This radiation source is bulky and complex in structure. Summary of the Invention

[0005] In view of the defects of the radiation source in the prior art, such as complex structure, bulky volume, poor stability and high cost, the present invention proposes a high-frequency radiation source based on photoinduced ultrafast and ultrashort electron pulses.

[0006] The primary purpose of the present invention is to solve the above technical problems, and the technical solutions of the present invention are as follows:

[0007] A high-frequency radiation source based on photoinduced ultrafast and ultrashort electron pulses, comprising: a cathode structure, a grid structure, a focusing electrode structure, an anode structure, an output section assembly, a first insulating ceramic sheet, a second insulating ceramic sheet, a third insulating ceramic sheet, a fourth insulating ceramic sheet, a fifth insulating ceramic sheet, electrode wires, a small ultrafast laser, a collecting electrode structure, and an insulating ceramic housing;

[0008] The cathode structure, the grid structure, the focusing electrode structure, the anode structure, the output section assembly, the first insulating ceramic sheet, the second insulating ceramic sheet, the third insulating ceramic sheet, the fourth insulating ceramic sheet, the fifth insulating ceramic sheet, the electrode wires, and the collector structure are all located inside the insulating ceramic housing;

[0009] The cathode structure, the first insulating ceramic sheet, the gate structure, the second insulating ceramic sheet, the focusing electrode structure, the third insulating ceramic sheet, the anode structure, the fourth insulating ceramic sheet, the output section assembly, the fifth insulating ceramic sheet, and the collector structure are arranged in sequence, and the small ultrafast laser is arranged on the other side of the collector structure;

[0010] The first insulating ceramic sheet, the gate structure, the second insulating ceramic sheet, the focusing electrode structure, the third insulating ceramic sheet, the anode structure, the fourth insulating ceramic sheet, the output section assembly, and the fifth insulating ceramic sheet are all provided with through holes at their centers, and the through holes are located on the same horizontal line;

[0011] A nano cold cathode is provided at the center of the surface of the cathode structure in contact with the first insulating ceramic sheet; the nano cold cathode and the through hole are located on the same horizontal line;

[0012] The cathode structure, the gate structure, the focusing electrode structure, and the anode structure are all provided with electrode rings, which are connected to an external driving circuit via electrode wires;

[0013] The collector structure is grounded;

[0014] The small ultrafast laser generates laser light which is irradiated on the surface of the nano cold cathode through the through hole. The surface of the nano cold cathode generates ultrafast and ultrashort electron pulses which are transmitted to the output section component to generate electromagnetic waves.

[0015] Furthermore, a through hole is provided in the center of the insulating ceramic shell, which consists of an upper and a lower part.

[0016] Furthermore, the cathode structure, the gate structure, the focusing electrode structure, the anode structure, the output section assembly, the first insulating ceramic sheet, the second insulating ceramic sheet, the third insulating ceramic sheet, the fourth insulating ceramic sheet, the fifth insulating ceramic sheet, and the collector structure are all provided with threaded holes and are connected by screws.

[0017] Furthermore, the diameter of the through hole of the gate structure ranges from 2 to 15 mm; the diameter of the through hole of the focusing electrode structure ranges from 3 to 20 mm; and the diameter of the through hole of the anode structure ranges from 3 to 20 mm.

[0018] Furthermore, the material of the nano cold cathode is an ordered carbon nanotube film, a disordered carbon nanotube film, an upright few-layer graphene, tungsten and its oxide nanomaterials, molybdenum and its oxide nanomaterials or zinc oxide nanowires.

[0019] Furthermore, the output section component includes a resonant cavity and a waveguide; the waveguide is located on one side of the resonant cavity.

[0020] Furthermore, the waveguide is a rectangular waveguide with a length of 0.02 to 240 mm and a width of 0.01 to 121 mm.

[0021] Furthermore, the resonant cavity is a double-entry resonant cavity; the inner diameter of the double-entry resonant cavity is 0.01-100 mm, the height is 0.01-100 mm, the resonant cavity gap length is 0.01-50 mm, and the through-hole diameter range of the resonant cavity is 0.01-100 mm.

[0022] Furthermore, the collector structure is made of ITO quartz glass, wherein the surface of the collector structure facing the resonant cavity is conductive, and the other surfaces are insulated.

[0023] Furthermore, the output wavelength range of the small ultrafast laser is 300nm-3mm, the pulse width range is 5fs-1ns, and the average power range is 1mW-10W.

[0024] Compared with the prior art, the present invention has the following beneficial effects:

[0025] The present invention, through the arrangement of a cathode structure, a grid structure, a focusing electrode structure, an anode structure, a first insulating ceramic sheet, a second insulating ceramic sheet, a third insulating ceramic sheet, and a nano cold cathode, enables the generated electron gun beam to directly carry high-frequency information, reduces the high requirements on the intensity of the laser light source, the volume of the equipment, etc., eliminates the steps and devices for speed and density modulation and focusing of the electron beam, reduces the complexity of the device, and improves the integration of the device. The collecting electrode structure avoids the accumulation of charges inside the device by recycling electrons, and at the same time, the current data can be tested more conveniently. The insulating ceramic sheet and the insulating ceramic shell have an insulating effect, so that the various components in the radiation source are not interfered with by each other's electric fields. In summary, the radiation source of the present invention has a simple structure, a small volume, good stability, and low cost. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1 This is a structural diagram of a high-frequency radiation source based on photoinduced ultrafast and ultrashort electron pulses provided in Example 1.

[0027] Figure 2 A diagram of a high-frequency radiation source component based on photoinduced ultrafast and ultrashort electron pulses provided in Example 1.

[0028] Figure 3 This is an assembly diagram of a high-frequency radiation source component based on photoinduced ultrafast and ultrashort electron pulses provided in Example 1.

[0029] Figure 4 This is a time domain waveform diagram of the electromagnetic wave output by a high-frequency radiation source based on photoinduced ultrafast and ultrashort pulses provided in Example 1.

[0030] Figure 5This is a frequency domain waveform diagram of the electromagnetic wave output by a high-frequency radiation source based on photoinduced ultrafast and ultrashort pulses provided in Example 1.

[0031] Figure 6 This is a time domain waveform diagram of the electromagnetic wave output by a high-frequency radiation source based on photoinduced ultrafast and ultrashort pulses provided in Example 2.

[0032] Figure 7 This is a frequency domain waveform diagram of the electromagnetic wave output by a high-frequency radiation source based on photoinduced ultrafast and ultrashort pulses provided in Example 2.

[0033] Figure 8 This is a time domain waveform diagram of the electromagnetic wave output by a high-frequency radiation source based on photoinduced ultrafast and ultrashort pulses provided in Example 3.

[0034] Figure 9 This is a frequency domain waveform diagram of the electromagnetic wave output by a high-frequency radiation source based on photoinduced ultrafast and ultrashort pulses provided in Example 3. DETAILED DESCRIPTION

[0035] The accompanying drawings are for illustrative purposes only and are not to be construed as limiting this patent;

[0036] In order to better illustrate this embodiment, some parts in the drawings may be omitted, enlarged, or reduced, and do not represent the actual product size;

[0037] It is understandable to those skilled in the art that some well-known structures and descriptions thereof may be omitted in the drawings.

[0038] The technical solution of the present invention is further described below with reference to the accompanying drawings and embodiments.

[0039] Example 1

[0040] like Figure 1 、 Figure 2 、 Figure 3 As shown, a high-frequency radiation source based on photoinduced ultrafast and ultrashort electron pulses includes: a cathode structure 11, a gate structure 12, a focusing electrode structure 13, an anode structure 14, an output section assembly 20, a first insulating ceramic sheet 32, a second insulating ceramic sheet 33, a third insulating ceramic sheet 34, a fourth insulating ceramic sheet 35, a fifth insulating ceramic sheet 36, an electrode line 40, a small ultrafast laser 50, a collector structure 15, and an insulating ceramic housing 31;

[0041] The cathode structure 11, the gate structure 12, the focusing electrode structure 13, the anode structure 14, the output section assembly 20, the first insulating ceramic sheet 32, the second insulating ceramic sheet 33, the third insulating ceramic sheet 34, the fourth insulating ceramic sheet 35, the fifth insulating ceramic sheet 36, the electrode wire 40, and the collector structure 15 are all located inside the insulating ceramic housing 31;

[0042] The cathode structure 11, the first insulating ceramic sheet 32, the gate structure 12, the second insulating ceramic sheet 33, the focusing electrode structure 13, the third insulating ceramic sheet 34, the anode structure 14, the fourth insulating ceramic sheet 35, the output section assembly 20, the fifth insulating ceramic sheet 36, and the collector structure 15 are arranged in sequence, and the small ultrafast laser 50 is arranged on the other side of the collector structure 15;

[0043] Through holes are provided at the centers of the first insulating ceramic sheet 32, the gate structure 12, the second insulating ceramic sheet 33, the focusing electrode structure 13, the third insulating ceramic sheet 34, the anode structure 14, the fourth insulating ceramic sheet 35, the output section assembly 20, and the fifth insulating ceramic sheet 36, and the through holes are located on the same horizontal line;

[0044] A nano cold cathode 111 is provided at the center of the surface where the cathode structure 11 contacts the first insulating ceramic sheet 32; the nano cold cathode 111 and the through hole are located on the same horizontal line;

[0045] The cathode structure 11, the gate structure 12, the focusing electrode structure 13, and the anode structure 14 are all provided with electrode rings, which are connected to an external driving circuit via electrode wires 40;

[0046] The collector structure 15 is grounded;

[0047] The small ultrafast laser 50 generates laser light that irradiates the surface of the nano cold cathode 111 through the through hole. The surface of the nano cold cathode 111 generates ultrafast and ultrashort electron pulses, which are transmitted to the output section component 20 to generate electromagnetic waves.

[0048] In one specific embodiment, the cathode structure 11, the gate structure 12, the focusing electrode structure 13, the anode structure 14, the first insulating ceramic sheet 32, the second insulating ceramic sheet 33, the third insulating ceramic sheet 34, and the nano cold cathode 111 constitute an electron gun structure. A bias electric field is generated between the cathode structure 11 and the gate structure 12. Under the excitation of the laser and the regulation of the bias electric field, the nano cold cathode 111 generates ultrafast and ultrashort electron pulses, which are then extracted by the gate, focused by the focusing electrode, and accelerated by the anode to form an electron gun beam.

[0049] It should be noted that the electron gun structure can obtain an electron gun beam with ultra-short pulse width and ultra-fast response under lower excitation light intensity; the electron gun beam directly carries high-frequency information and has the characteristics of high quantum efficiency, large current, low energy dispersion and high brightness; the electron gun structure also reduces the high requirements for laser light source intensity, equipment volume, etc., eliminates the steps and devices for speed, density modulation and focusing of the electron beam, and does not require a microwave signal feed source.

[0050] It should be noted that the electron gun structure eliminates the need for a high-frequency modulation system to modulate the electron gun beam. Instead, the high-frequency component carried by the pulsed electron beam can be directly extracted through frequency selection and amplification in a simple resonant cavity 22, ultimately outputting the electromagnetic wave through a waveguide 21. This reduces system complexity, makes the radiation source device structure simpler and more compact, reduces the size of the source device, and significantly improves the device's integration.

[0051] It should be noted that the insulating ceramic shell 31, the first insulating ceramic sheet 32, the second insulating ceramic sheet 33, the third insulating ceramic sheet 34, the fourth insulating ceramic sheet 35, and the fifth insulating ceramic sheet 36 have an insulating effect, so that the various components in the radiation source are not interfered with by each other's electric fields.

[0052] In a specific embodiment, the electron gun beam is a pulsed electron beam.

[0053] In a specific embodiment, the output wavelength of the small ultrafast laser is in the range of 300 nm to 3 mm, the pulse width is in the range of 5 fs to 1 ns, and the average power is in the range of 1 mW to 10 W.

[0054] In a specific embodiment, the frequency range of the high-frequency electromagnetic waves output by the output section component 20 is 10 GHz to 10 THz.

[0055] Furthermore, a through hole is provided at the center of the insulating ceramic shell 31, which consists of an upper and a lower part.

[0056] In a specific embodiment, the overall structure of the insulating ceramic shell 31 is square, and the central through hole is cylindrical; two through holes are provided on the side of the upper insulating ceramic shell, and one through hole is provided on the top. The through holes on both sides are used to connect the electron gun structure to the external power supply through electrode wires, and the through hole on the top is used for assembling the waveguide; the upper and lower insulating ceramic shells are both provided with four pins, and the pins are provided with M2 threaded holes, and the upper and lower insulating ceramic shells can be fixed by M2 screws.

[0057] Furthermore, the cathode structure 11, the gate structure 12, the focusing electrode structure 13, the anode structure 14, the output section assembly 20, the first insulating ceramic sheet 32, the second insulating ceramic sheet 33, the third insulating ceramic sheet 34, the fourth insulating ceramic sheet 35, the fifth insulating ceramic sheet 36, and the collecting electrode structure 15 are all provided with threaded holes and are connected by screws.

[0058] In a specific embodiment, the cathode structure 11, the gate structure 12, the focusing electrode structure 13, the anode structure 14, the output section assembly 20, the first insulating ceramic sheet 32, the second insulating ceramic sheet 33, the third insulating ceramic sheet 34, the fourth insulating ceramic sheet 35, the fifth insulating ceramic sheet 36, and the collecting electrode structure 15 are all provided with three M2 threaded holes, and the positions of the threaded holes of each component are the same.

[0059] Furthermore, the diameter of the through hole of the gate structure 12 is in the range of 2 to 15 mm; the diameter of the through hole of the focusing electrode structure 13 is in the range of 3 to 20 mm; and the diameter of the through hole of the anode structure 14 is in the range of 3 to 20 mm.

[0060] In a specific embodiment, the spacing range between the cathode structure 11 and the gate structure 12 is 0.01 to 10 mm; the spacing range between the gate structure 12 and the focusing electrode 13 structure is 0.01 to 10 mm; the spacing range between the focusing electrode 13 structure and the anode structure 14 is 0.01 to 10 mm; the spacing range between the anode structure 14 and the resonant cavity 22 is 0.01 to 10 mm; the spacing range between the resonant cavity 22 and the collector structure 15 is 0.01 to 10 mm.

[0061] Furthermore, the material of the nano cold cathode 111 is an ordered carbon nanotube film, a disordered carbon nanotube film, upright few-layer graphene, tungsten and its oxide nanomaterials, molybdenum and its oxide nanomaterials, or zinc oxide nanowires.

[0062] Furthermore, the output section component 20 includes a resonant cavity 22 and a waveguide 21 ; the waveguide 21 is located on one side of the resonant cavity 22 .

[0063] Furthermore, the waveguide 21 is a rectangular waveguide with a length of 0.02 to 240 mm and a width of 0.01 to 121 mm.

[0064] Furthermore, the resonant cavity 22 is a double-entry resonant cavity; the inner diameter of the double-entry resonant cavity is 0.01-100 mm, the height is 0.01-100 mm, the gap length of the resonant cavity 22 is 0.01-50 mm, and the through-hole diameter range of the resonant cavity 22 is 0.01-100 mm.

[0065] In a specific embodiment, the through hole of the resonant cavity 22 is located in the center, serving as an electron channel, and has a cylindrical shape.

[0066] In one embodiment, ultrafast and ultrashort electron pulses are extracted through gate structure 12, focused by focusing electrode structure 13, and accelerated by anode structure 14 before entering resonant cavity 22. The electron gun beam excites an induced current and generates a high-frequency field in resonant cavity 22. Electromagnetic waves are then output through waveguide 21.

[0067] Furthermore, the collector structure 15 is made of ITO quartz glass, wherein the surface of the collector structure 15 facing the resonant cavity 22 is conductive, and the other surfaces are insulated.

[0068] It should be noted that the collector structure 15 made of the ITO quartz glass material can transmit laser light.

[0069] It should be noted that the collector structure 15 collects the electron gun beam and guides it into the ground through the electrode line, thereby recycling the electrons and avoiding the accumulation of charge inside the device. At the same time, it can more conveniently test the current data.

[0070] Furthermore, the output wavelength range of the small ultrafast laser 50 is 300 nm to 3 mm, the pulse width range is 5 fs to 1 ns, and the average power range is 1 mW to 10 W.

[0071] In a specific embodiment, the wavelength range is 430-2400 nm, the laser pulse width is 100 ps, ​​the average power is 0.24 W, and the peak intensity is 7.68 MW cm -2 The picosecond laser is used as a small ultrafast laser 50, and the laser light generated is incident along the center line of the high-frequency radiation source at a direction of 15° and emitted through the through hole to the nano cold cathode 111; the voltage of the cathode structure 11 is -550V, the voltage of the gate structure 12 is 0V, the voltage of the focusing electrode structure 13 is -1kV, and the voltage of the anode structure 14 is 500V; the radius of the electron gun beam generated by the nano cold cathode 111 is 1.2mm, and it carries 12.2GHz high-frequency electronic information; the inner diameter of the resonant cavity 22 is 13.8mm, the height is 7mm, and the diameter of the electron channel is 6mm; the waveguide 21 is 15.8mm long and 7.9mm wide; Figure 4 、 Figure 5 As shown, a high-frequency electromagnetic wave output of 12.2 GHz can be obtained. This embodiment demonstrates the feasibility of the integrated and miniaturized high-frequency radiation source proposed by the present invention in practical applications.

[0072] Example 2

[0073] Based on the high-frequency radiation source based on photoinduced ultrafast and ultrashort pulses described in Example 1, that is, this embodiment adopts a high-frequency radiation source with the same structure as that in Example 1;

[0074] The laser has a monochromatic wavelength of 800 nm, a pulse width of 28 ps, an average power of 1 mW, and a peak intensity of 1 GW cm -2 The picosecond laser is used as a small ultrafast laser 50. The laser generated is incident along the center line of the high-frequency radiation source at a direction of 15° and is emitted through the through hole to the nano cold cathode 111. The voltage of the cathode structure 11 is 0V, and the electric field of the gate structure 12 is 2MV m -1 The voltage of the focusing electrode structure 13 is 0.5 kV, and the electric field of the anode structure 14 is 50 MV m -1 The pulse width of the electron gun beam is 28ps, the peak current is 25mA, the radius is 0.025mm, and it carries electronic information in the terahertz frequency band; the inner diameter of the resonant cavity 22 is 0.71mm, the height is 0.43mm, and the diameter of the electron channel is 0.16mm; the waveguide 21 is 0.9mm long and 0.45mm wide; Figure 6 、 Figure 7 As shown, the axial guidance magnetic induction intensity is 0.2 T, and a terahertz wave output of 220 GHz can be obtained. This embodiment demonstrates the technical effect and application value of the compact and portable high-frequency radiation source proposed by the present invention.

[0075] Example 3

[0076] Based on the high-frequency radiation source based on photoinduced ultrafast and ultrashort pulses described in Example 1, that is, this embodiment uses a high-frequency radiation source with the same structure as that of Example 1;

[0077] The laser has a monochromatic wavelength of 800 nm, a pulse width of 100 fs, an average power of 10 mW, and a peak intensity of 10 GW cm -2 The picosecond laser is used as a small ultrafast laser 50. The laser generated is incident along the center line of the high-frequency radiation source at a direction of 15° and is emitted through the through hole to the nano cold cathode 111. The voltage of the cathode structure 11 is 0V, and the electric field of the gate structure 12 is 1MV m -1 The voltage of the focusing electrode structure 13 is 2 kV, and the electric field of the anode structure 14 is 50 MV m -1 The pulse width of the electron gun beam is 100fs, the peak current is 0.8A, the radius is 0.01mm, and it carries electronic information in the terahertz frequency band; the inner diameter of the resonant cavity 22 is 0.16mm, the height is 0.1mm, and the diameter of the electron channel is 0.036mm; the waveguide 21 is 0.2mm long and 0.1mm wide; Figure 8 、 Figure 9 As shown, the axial guide magnetic induction intensity is 0.2 T, and a terahertz wave output of 1 THz can be obtained. This embodiment shows that the present invention has broad application prospects.

[0078] The same or similar reference numerals correspond to the same or similar components;

[0079] The terms used in the drawings to describe positional relationships are for illustrative purposes only and should not be construed as limiting this patent;

[0080] Obviously, the above embodiments of the present invention are merely examples for the purpose of clearly illustrating the present invention, and are not intended to limit the embodiments of the present invention. Those skilled in the art will appreciate that other variations or modifications can be made based on the above description. It is not necessary and impossible to enumerate all embodiments here. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of the present invention shall be included within the scope of protection of the claims of the present invention.

Claims

1. A high-frequency radiation source based on photoinduced ultrafast and ultrashort electron pulses, characterized in that: include: Cathode structure (11), grid structure (12), focusing electrode structure (13), anode structure (14), output section assembly (20), first insulating ceramic sheet (32), second insulating ceramic sheet (33), third insulating ceramic sheet (34), fourth insulating ceramic sheet (35), fifth insulating ceramic sheet (36), electrode wire (40), small ultrafast laser (50), collector structure (15), insulating ceramic housing (31); The cathode structure (11), the grid structure (12), the focusing electrode structure (13), the anode structure (14), the output section assembly (20), the first insulating ceramic sheet (32), the second insulating ceramic sheet (33), the third insulating ceramic sheet (34), the fourth insulating ceramic sheet (35), the fifth insulating ceramic sheet (36), the electrode wire (40), and the collector structure (15) are all located inside the insulating ceramic housing (31); The cathode structure (11), the first insulating ceramic sheet (32), the gate structure (12), the second insulating ceramic sheet (33), the focusing electrode structure (13), the third insulating ceramic sheet (34), the anode structure (14), the fourth insulating ceramic sheet (35), the output section assembly (20), the fifth insulating ceramic sheet (36), and the collector structure (15) are arranged in sequence, and the small ultrafast laser (50) is arranged on the other side of the collector structure (15); Through holes are provided at the centers of the first insulating ceramic sheet (32), the gate structure (12), the second insulating ceramic sheet (33), the focusing electrode structure (13), the third insulating ceramic sheet (34), the anode structure (14), the fourth insulating ceramic sheet (35), the output section assembly (20), and the fifth insulating ceramic sheet (36), and the through holes are located on the same horizontal line; A nano cold cathode (111) is provided at the center of the surface where the cathode structure (11) contacts the first insulating ceramic sheet (32); the nano cold cathode (111) and the through hole are located on the same horizontal line; The cathode structure (11), the grid structure (12), the focusing electrode structure (13), and the anode structure (14) are all provided with electrode rings, and are connected to an external driving circuit via electrode wires (40); The collector structure (15) is grounded; The small ultrafast laser (50) generates laser light that irradiates the surface of the nano cold cathode (111) through the through hole, and the surface of the nano cold cathode (111) generates ultrafast and ultrashort electron pulses that are transmitted to the output section component (20) to generate electromagnetic waves.

2. A high-frequency radiation source based on photoinduced ultrafast and ultrashort electron pulses according to claim 1, characterized in that: The insulating ceramic shell (31) is provided with a through hole at its center and consists of an upper and a lower part.

3. The high-frequency radiation source based on photoinduced ultrafast and ultrashort electron pulses according to claim 1, characterized in that: The cathode structure (11), the grid structure (12), the focusing electrode structure (13), the anode structure (14), the output section assembly (20), the first insulating ceramic sheet (32), the second insulating ceramic sheet (33), the third insulating ceramic sheet (34), the fourth insulating ceramic sheet (35), the fifth insulating ceramic sheet (36), and the collector structure (15) are all provided with threaded holes and are connected by screws.

4. The high-frequency radiation source based on photoinduced ultrafast and ultrashort electron pulses according to claim 1, characterized in that: The through hole diameter of the gate structure (12) ranges from 2 to 15 mm; the through hole diameter of the focusing electrode structure (13) ranges from 3 to 20 mm; and the through hole diameter of the anode structure (14) ranges from 3 to 20 mm.

5. The high-frequency radiation source based on photoinduced ultrafast and ultrashort electron pulses according to claim 1, characterized in that: The material of the nano cold cathode (111) is an ordered carbon nanotube film, a disordered carbon nanotube film, upright few-layer graphene, tungsten and its oxide nanomaterials, molybdenum and its oxide nanomaterials, or zinc oxide nanowires.

6. The high-frequency radiation source based on photoinduced ultrafast and ultrashort electron pulses according to claim 1, characterized in that: The output section component (20) comprises a resonant cavity (22) and a waveguide (21); the waveguide (21) is located on one side of the resonant cavity (22).

7. A high-frequency radiation source based on photoinduced ultrafast and ultrashort electron pulses according to claim 6, characterized in that: The waveguide (21) is a rectangular waveguide with a length of 0.02 to 240 mm and a width of 0.01 to 121 mm.

8. The high-frequency radiation source based on photoinduced ultrafast and ultrashort electron pulses according to claim 6, characterized in that: The resonant cavity (22) is a double-entry resonant cavity; the inner diameter of the double-entry resonant cavity is 0.01-100 mm, the height is 0.01-100 mm, the gap length of the resonant cavity (22) is 0.01-50 mm, and the through-hole diameter range of the resonant cavity (22) is 0.01-100 mm.

9. The high-frequency radiation source based on photoinduced ultrafast and ultrashort electron pulses according to claim 1, characterized in that: The collector structure (15) is made of ITO quartz glass, wherein the surface of the collector structure (15) facing the resonant cavity (22) is conductive, and the remaining surfaces are insulating.

10. The high-frequency radiation source based on photoinduced ultrafast and ultrashort electron pulses according to claim 1, characterized in that: The output wavelength range of the small ultrafast laser (50) is 300nm-3mm, the pulse width range is 5fs-1ns, and the average power range is 1mW-10W.

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