Preparation method of high-quality atomic beam emission structure based on graphene coating

Abstract

The present invention relates to a method for preparing a high-quality atomic beam emission structure based on graphene coating, comprising: 1. bending a metal foil to form a corrugated plate, and cutting the corrugated plate and the metal foil into rectangular strips of equal size; 2. cleaning the surface of the metal foil and the corrugated metal plate cut and formed in step 1; 3. placing the cleaned metal foil and the corrugated metal plate in a reaction area of ​​a low-pressure chemical vapor deposition system, and controllably coating the metal foil and the corrugated metal plate with graphene; 4. removing the coated metal foil and the corrugated metal plate and performing measurement and characterization; 5. treating the graphene-coated surface using oxygen plasma; 6. stacking the metal foil and the corrugated metal plate in sequence, and inserting them into a square hole of a cylindrical shell, forming an emission micropore structure therein, thereby completing the preparation of the atomic beam emission structure. The present invention reduces the difficulty of coating graphene in the micropores and improves the uniformity of the coating.

Description

Technical Field

[0001] The present invention belongs to the technical field of atomic physics, and in particular relates to a method for preparing a high-quality atomic beam emission structure based on graphene coating. Background Art

[0002] Atomic beams have broad application prospects in atomic physics, chemical physics, and surface physics. The technology of using an atomic furnace to generate high-atom flux, high-collimation, high-quality atomic beams through an emission structure composed of a microtube array has been applied to precision sensors such as atomic clocks and atomic beam gyroscopes. As one of the main factors restricting sensor measurement accuracy, as the requirements for sensor accuracy increase, people's requirements for beam quality are also getting higher and higher. High-flux atomic beams are subject to uneven scattering from the inner wall of the emission structure and the reaction between active atoms and the inner wall of the emission structure, which not only causes a decrease in the collimation of the atomic beam, but also causes severe blockage of the emission structure, affecting the service life of the emission structure. Therefore, it is urgent to design a method for preparing an emission structure to solve the above problems and achieve the preparation of high-quality atomic beams. Summary of the Invention

[0003] In view of the deficiencies of the prior art, the present invention proposes a method for preparing a high-quality atomic beam emitting structure based on graphene coating.

[0004] The above-mentioned purpose of the present invention is achieved through the following technical solutions:

[0005] A method for preparing a high-quality atomic beam emission structure based on graphene coating, wherein the emission structure is assembled in steps to achieve uniform graphene coating, and the preparation method comprises the following steps:

[0006] Step 1: Bend the metal foil to form a corrugated plate, and cut the corrugated plate and the metal foil into rectangular strips of equal size according to experimental requirements;

[0007] Step 2: Clean the surface of the metal foil and corrugated metal plate cut and formed in step 1 to remove surface particles and impurities caused by the material itself and machining;

[0008] Step 3: placing the cleaned metal foil and the corrugated metal plate in a reaction area of ​​a low-pressure chemical vapor deposition system, and performing controllable graphene coating on the surfaces of the metal foil and the corrugated metal plate;

[0009] Step 4: Take out the coated metal foil and the corrugated metal plate and perform measurement and characterization;

[0010] Step 5: Using oxygen plasma to treat the surface of the graphene coating;

[0011] Step 6: stack the metal foil and the metal corrugated plate in sequence, and insert them into the square hole of a cylindrical shell to form an emission micropore structure inside, thus completing the preparation of the atomic beam emission structure.

[0012] Furthermore, in step 1, the metal foil is bent into a corrugated plate and then pressed into shape by a set of relatively rotating sawtooth rollers.

[0013] Furthermore, in step 2, cleaning is performed sequentially with acetone, isopropyl alcohol, and deionized water, with each medium being cleaned for 15 minutes.

[0014] Furthermore, step 3 specifically includes:

[0015] After placing the cut and cleaned metal foil and metal corrugated plate into the reaction zone of the low-pressure chemical vapor deposition system, the pressure in the reaction zone is first pumped down to less than 1 Pa using a mechanical pump; then 20 sccm of argon is introduced and the temperature is raised to 1000°C; then the introduced gas is replaced with a mixed gas of 5ccm methane and 2sccm of hydrogen, and the reaction is carried out for about 10 minutes; finally, the introduced gas is replaced with 20 sccm of argon, and the system is quickly cooled to room temperature.

[0016] Furthermore, step 4 includes:

[0017] The Raman spectrum of graphene was measured using a confocal Raman microscope to characterize the quality and thickness of the graphene coating, and the uniformity of graphene was characterized by Raman spectrum scanning at multiple locations; the surface roughness of graphene was measured using an atomic force microscope.

[0018] Moreover, in step 5, the metal foil coated with the graphene film and the metal corrugated plate are placed in an oxygen plasma treatment system, and the oxygen pressure is controlled to be 0.1 Pa, the power is 100 W, and the treatment time is 3 minutes.

[0019] The advantages and positive effects of the present invention are:

[0020] This preparation method involves first coating the metal surface with graphene before fabricating the microporous emission structure. This reduces the difficulty of coating the graphene in the micropores and improves the uniformity of the coating. The introduction of graphene as a coating material effectively reduces the roughness of the inner surface of the atomic emission structure. The high chemical stability of graphene also prevents atoms from reacting with the metal in the emission structure. Furthermore, oxygen plasma treatment of the graphene increases the number of active sites, allowing it to adsorb atoms with large divergence angles and improve the collimation of the atomic beam, thereby effectively enhancing the quality of the atomic beam passing through the atomic beam emission structure. BRIEF DESCRIPTION OF THE DRAWINGS

[0021] Figure 1 It is a cross-sectional schematic diagram of the atomic beam emission structure made by the present invention;

[0022] Figure 2 It is a schematic diagram of the pressing of the metal wave plate in the atomic beam emission structure of the present invention;

[0023] Figure 3 is the Raman spectrum data of graphene synthesized on the surface of the stainless steel corrugated plate according to an embodiment of the present invention;

[0024] Figure 4 It is a schematic diagram of the use of the atomic emission structure of the present invention.

[0025] Figure 5 Fluorescence images of the atomic beam formed by the emission structure before (a) and after (b) graphene coating. DETAILED DESCRIPTION

[0026] The structure of the present invention will be further described below with reference to the accompanying drawings and through examples. It should be noted that the present examples are descriptive rather than restrictive.

[0027] A method for preparing a high-quality atomic beam emission structure based on graphene coating, see Figures 1-4 The invention is that the emission structure is assembled in steps to achieve uniform graphene coating. The preparation method of the present invention comprises the following steps:

[0028] Step 1: Bend the metal foil to form a corrugated plate, and then cut the corrugated plate and metal foil into long rectangular strips according to experimental requirements. The metal foil can be made of metals such as stainless steel, copper, nickel, and tungsten, and can be 0.05mm-0.2mm thick.

[0029] In this embodiment, a stainless steel foil with a thickness of 0.05 mm was cut into strips of 2 cm × 10 cm and placed in a Figure 2 The pressing is performed in a set of relatively rotating sawtooth rollers 4, the width of the sawtooth is 0.4 mm, and the pressed stainless steel corrugated plate is cut along the indentation direction to form 2 mm × 2 cm strips, and stainless steel foils of the same size (referring to the plane projection size) are cut at the same time.

[0030] Step 2: Clean the surface of the metal foil 2 and the metal corrugated plate 1 cut and formed in step 1 to remove the surface particles and impurities caused by the material body and machining.

[0031] In this embodiment, acetone, isopropyl alcohol, and deionized water are used for cleaning for 15 minutes in sequence. Acetone and isopropyl alcohol can effectively remove oil stains on the metal surface, while deionized water cleaning can prevent the influence of residual organic solvents on the subsequent graphene coating.

[0032] Step 3: Place the cleaned metal foil and the corrugated metal plate in the reaction area of ​​a low-pressure chemical vapor deposition system, and perform controllable graphene coating on the surfaces of the metal foil and the corrugated metal plate.

[0033] In this embodiment, after the cut and cleaned metal foil and metal corrugated plate are placed in the reaction zone of the low-pressure chemical vapor deposition system, the pressure in the reaction zone is first pumped down to less than 1 Pa using a mechanical pump. Low-pressure chemical vapor deposition, coating in a low-pressure environment, can increase the uniformity and controllability of the coating. Then, 20 sccm of argon is introduced and the temperature is raised to 1000°C. The introduced gas is then replaced with a mixed gas of 5ccm methane and 2sccm hydrogen, and the reaction is carried out for about 10 minutes. Finally, the introduced gas is replaced with 20 sccm of argon, and the system is quickly cooled to room temperature. The argon acts as a protective gas during the temperature increase and decrease, the hydrogen is a reducing gas during the reaction process to prevent metal oxidation, and the methane serves as the carbon raw material in the graphene synthesis process.

[0034] Step 4: Take out the coated metal foil and metal corrugated plate and perform measurement and characterization

[0035] In this embodiment, the Raman spectrum of graphene was measured using a confocal Raman microscope to characterize the quality and thickness of the graphene coating, and the uniformity of the graphene was characterized by Raman spectrum scanning at multiple locations; and the surface roughness of the graphene was measured using an atomic force microscope. The Raman spectrum of the graphene coating in this embodiment is shown in the figure. Figure 3 It can be seen from the 2p peak position in that graphene was successfully synthesized on the metal foil surface through the above steps.

[0036] Step 5: Use oxygen plasma to treat the surface of the graphene coating.

[0037] In this example, a graphene-coated metal foil and a corrugated metal plate were placed in an oxygen plasma treatment system (existing system). The oxygen pressure was controlled at 0.1 Pa, the power was 100 W, and the treatment time was 3 minutes. The oxygen plasma power was set to 50-150 W. Increasing the oxygen plasma power can increase the active adsorption sites on the graphene surface. However, when the power exceeds 150 W, the integrity of the graphene is damaged, reducing its surface coverage and its contribution to improving the atomic beam quality. Therefore, it is necessary to maintain the oxygen plasma within a reasonable range.

[0038] Step 6: stack the metal foil and the metal corrugated plate in sequence and insert them into the square hole of a cylindrical shell 3, as shown in FIG. Figure 1 As shown, an emission microporous structure 5.1 is formed inside, completing the preparation of the atomic beam emission structure 5.

[0039] When using the atomic beam emission structure, the emission structure is connected to the rubidium atomic furnace 6, and the heated rubidium atoms are ejected from the emission structure mouth to achieve the emission of high-quality rubidium atomic beam. Compared with the emission structure without graphene coating, the fluorescence image of the atomic beam emitted by the emission structure after graphene coating is significantly narrower, and the brightness at the center is close, indicating that the atomic beam has better quality, see Figure 5 .

[0040] Although the embodiments and drawings of the present invention are disclosed for illustrative purposes, those skilled in the art will understand that various replacements, changes and modifications are possible without departing from the spirit of the present invention and the appended claims. Therefore, the scope of the present invention is not limited to the contents disclosed in the embodiments and drawings.

Claims

1. A method for preparing a high-quality atomic beam emitting structure based on graphene coating, characterized by: The emission structure is manufactured by step-by-step assembly to achieve uniform graphene coating. The preparation method includes the following steps: Step 1: Bend the metal foil to form a corrugated plate, and cut the corrugated plate and the metal foil into rectangular strips of equal size according to experimental requirements; Step 2: Clean the surface of the metal foil and corrugated metal plate cut and formed in step 1 to remove surface particles and impurities caused by the material itself and machining; Step 3: placing the cleaned metal foil and the corrugated metal plate in a reaction area of ​​a low-pressure chemical vapor deposition system, and performing controllable graphene coating on the surfaces of the metal foil and the corrugated metal plate; Step 4: Take out the coated metal foil and the corrugated metal plate and perform measurement and characterization; Step 5: Using oxygen plasma to treat the surface of the graphene coating; Step 6: stack the metal foil and the metal corrugated plate in sequence and insert them into the square hole of a cylindrical shell to form an emission microporous structure inside, thus completing the preparation of the atomic beam emission structure; In step 1, the metal foil is bent into a corrugated plate and then pressed into shape by a set of relatively rotating sawtooth rollers; In step 5, the metal foil coated with the graphene film and the metal corrugated plate are placed in an oxygen plasma treatment system, the oxygen pressure is controlled to be 0.1 Pa, the power is 100 W, and the treatment time is 3 minutes.

2. The method for preparing a high-quality atomic beam emitting structure based on graphene coating according to claim 1, characterized in that: In step 2, the substrate is cleaned with acetone, isopropyl alcohol, and deionized water in sequence, with each medium being cleaned for 15 minutes.

3. The method for preparing a high-quality atomic beam emission structure based on graphene coating according to claim 1, characterized in that: Step 3 specifically includes: After placing the cut and cleaned metal foil and metal corrugated plate into the reaction zone of the low-pressure chemical vapor deposition system, the pressure in the reaction zone is first pumped down to less than 1 Pa using a mechanical pump; then 20 sccm of argon is introduced and the temperature is raised to 1000°C; then the introduced gas is replaced with a mixed gas of 5ccm methane and 2sccm of hydrogen, and the reaction is carried out for 10 minutes; finally, the introduced gas is replaced with 20 sccm of argon, and the system is quickly cooled to room temperature.

4. The method for preparing a high-quality atomic beam emitting structure based on graphene coating according to claim 1, characterized in that: Step 4 includes: The Raman spectrum of graphene was measured using a confocal Raman microscope to characterize the quality and thickness of the graphene coating, and the uniformity of graphene was characterized by Raman spectrum scanning at multiple locations; the surface roughness of graphene was measured using an atomic force microscope.

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