A Recycling System for Alloy Etching Solution with Cyclic Etching and Its Usage Method

Abstract

The present invention relates to a recycling system for alloy etching solution with cyclic etching and its usage method, belonging to the technical field of etching processing. It includes an etching machine case and a workpiece holding box. The etching machine case is fixedly installed with a conveyor, and the workpiece holding box is fed through the conveyor. The workpiece holding box is evenly and fixedly installed with object placing support columns. The etching machine case is fixedly installed with a hydraulic cylinder, and the hydraulic cylinder is fixedly installed with a sealing cover. In the present invention, a more refined etching processing structure is provided. With a small amount of etching solution, the workpiece can be fully etched. The waste liquid from the etching processing is directly discharged into the circulation pool for recycling treatment, enabling the more refined use of the etching solution, effectively improving the utilization rate of the etching solution, reducing the processing cost and material consumption. The etching waste liquid after the etching processing can be uniformly recycled and cycled for treatment, and will not be discharged to the etching solution to be used, affecting its etching effect, thereby ensuring the quality of the etching processing.

Description

Technical Field

[0001] The present invention relates to the technical field of etching processing, and particularly to a recycling system for alloy etching solution with cyclic etching and a using method thereof. Background Art

[0002] Acidic copper chloride etching solution is widely used in the etching process of current printed circuit boards due to its fast etching rate, stability, easy control and regeneration. During the process of etching copper foil with acidic etching solution, the reaction of Cu+ Cu 2+ →2CuCl will occur. As the reaction proceeds, the concentration of Cu 2+ ions in the etching solution decreases, while the concentration of Cu+ ions continuously increases, and the etching ability decreases accordingly. When the concentration of Cu2+ ions is consumed to a certain extent, the etching ability of the etching solution will no longer meet the production requirements and needs to be regenerated.

[0003] Etching solution regeneration is actually a process in which the etching mother liquor discharged from the etching line of the printed circuit board adopts a closed-loop system, and the copper ions in it are extracted by the etching solution regeneration and recycling equipment and then returned to the production line. For every 1 mole of copper etched, 2 moles of ammonia and 2 moles of ammonium chloride are consumed. Therefore, during the etching process, as copper dissolves, ammonia water and ammonium chloride need to be continuously added. As a result, the etching tank mother liquor will continuously increase. Since the generated [Cu(NH3)2]1+ is a complex ion of Cu1+ and does not have etching ability, part of the mother liquor must be removed, and new sub-solution (the sub-solution does not contain copper ions) is added to meet the etching requirements.

[0004] The existing etching solution usually contacts the workpiece by spraying or directly placing it in the etching tank. In actual use, a considerable part of the etching solution does not participate in the etching process. To further save the etching solution, reduce the etching processing cost and resources, a recycling system for alloy etching solution with cyclic etching and a using method thereof are proposed. A more detailed etching processing structure is provided, and the workpiece can be etched with a small amount of etching solution. The etching processing waste liquid is directly discharged to the recycling tank for recycling treatment. After the treatment is completed, it can be uniformly recycled and treated cyclically, and will not be discharged to the etching solution to be used to affect its etching effect. Moreover, two sets of recyclable recycling bins are provided. When one set is being processed, the other set can collect the etching waste liquid to prevent the etching waste liquid from affecting the etching solution being reused, thereby effectively improving the utilization rate of the etching solution and reducing the processing cost and material consumption. Summary of the Invention

[0005] The present invention provides a recycling system for alloy etching solution with cyclic etching and its usage method, which solves the problems raised in the above-mentioned background art. With a small amount of etching solution, the workpiece can be etched. The waste liquid from the etching process is directly discharged into the recycling tank for recovery treatment. After the treatment, it can be uniformly recovered and recycled, and will not be discharged to the etching solution to be used, affecting its etching effect. When one group is being treated, the other group can collect the etching waste liquid, preventing the etching waste liquid from affecting the etching solution being reused, thereby effectively improving the utilization rate of the etching solution and reducing the processing cost and material consumption.

[0006] The solution of the present invention to the above technical problems is as follows: A recycling system for alloy etching solution with cyclic etching and its usage method, including an etching machine case and a workpiece tray. The etching machine case is fixedly installed with a conveyor, and the workpiece tray is fed through the conveyor. The workpiece tray is evenly and fixedly installed with placing support columns. The etching machine case is fixedly installed with a hydraulic cylinder, the hydraulic cylinder is fixedly installed with a sealing cover, the sealing cover is fixedly installed with a spray pipe, the bottom of the spray pipe is evenly and fixedly communicated with micro nozzles, the spray pipe is fixedly communicated with an infusion pump, the sealing cover is fixedly installed with an extraction pump, and the extraction pump is fixedly communicated with a liquid extraction pipe. The etching machine case is fixedly installed with an etching solution main tank, a liquid storage tank, and a cyclic treatment tank. The etching solution main tank is fixedly communicated with a supplement pipe and an output valve, the output valve is communicated with the infusion pump, the etching solution main tank is fixedly communicated with a first water pump, the first water pump is fixedly communicated with the liquid storage tank, the liquid storage tank is fixedly communicated with a second water pump, the second water pump is fixedly communicated with a first three-way valve, there are two cyclic treatment tanks, and the two cyclic treatment tanks are communicated with the first three-way valve. The cyclic treatment tank is fixedly communicated with a treatment liquid input pipe, an overflow pipe, and a liquid level gauge. The two sides of the cyclic treatment tank are fixedly communicated with a second three-way valve, and the second three-way valve is fixedly communicated with the extraction pump. The etching machine case is provided with a maintenance door;

[0007] The usage method includes the following steps:

[0008] S1: Place the circuit board in the workpiece tray. The placing support columns can support the circuit board, and the bottom gap can be used to collect the etching solution. The workpiece trays are evenly placed at the conveyor and fed into the etching machine case through the conveyor. When the workpiece tray is placed at the bottom of the sealing cover, the conveyor stops. Start the hydraulic cylinder to drive the sealing cover to descend, and the sealing cover can cover the workpiece tray to complete the feeding for subsequent etching processing;

[0009] S2: Start the infusion pump and open the output valve. The etching solution in the main etching solution tank can extract a standard amount and be placed in the workpiece tray. A small amount of etching solution in the confined and narrow workpiece tray can fully contact the circuit board, and then etching processing can be carried out. After the processing is completed, start the extraction pump to extract the etching waste liquid in the workpiece tray through the liquid extraction pipe. The etching waste liquid can be transmitted to the circulation treatment tank through the second three-way valve and wait for circulation treatment. After the extraction is completed, start the hydraulic cylinder to raise the sealing cover. The conveyor can drive the next group of workpiece trays to the processing position and discharge the processed workpiece trays;

[0010] S3: When a group of circulation treatment tanks collect enough for treatment, adjust the second three-way valve to communicate with another circulation treatment tank for collecting etching waste liquid, and adjust the first three-way valve to communicate with the circulation treatment tank for treatment. Input ammonia water, ammonium chloride and the sub-liquid into the circulation treatment tank through the treatment liquid input pipe for restoration treatment. The excess mother liquid can be discharged through the overflow pipe. After the treatment is completed, start the second water pump to extract the treated etching solution in the circulation treatment tank to the storage tank for standby through the second water pump. The empty circulation treatment tank can be reused when another circulation treatment tank is full of waste liquid;

[0011] S4: When the etching solution in the main etching solution tank is almost used up, the etching solution can be directly supplemented through the supplement pipe, and the first water pump can also be started to pump the recycled etching solution in the storage tank into the main etching solution tank for subsequent etching processing.

[0012] On the basis of the above technical solutions, the present invention can also be improved as follows.

[0013] Further, the conveyor is provided with a conveyor belt, and a limiting strip is fixedly installed on the conveyor belt corresponding to the workpiece tray, so that the workpiece trays can be evenly laid on the conveyor for feeding.

[0014] Further, the inner wall bottom of the workpiece tray is set as a slope structure, so that the etching solution can slide down from the workpiece tray for subsequent extraction and discharge.

[0015] Further, the workpiece tray is provided with a liquid extraction groove, and the liquid extraction pipe is placed in the liquid extraction groove. The liquid extraction pipe can uniformly extract the etching waste liquid in the workpiece tray.

[0016] Further, the first water pump is fixedly connected with a water pipe, and one end of the water pipe is placed at the inner wall bottom of the storage tank.

[0017] Further, both ends of the first three-way valve are fixedly connected with a liquid extraction pipe, and one end of the smoking pipe is placed at the inner wall bottom of the circulation treatment tank.

[0018] Further, the second three-way valve is connected to the top of the circulation treatment tank.

[0019] The beneficial effects of the present invention are as follows: The present invention provides a recycling system for alloy etching solution with cyclic etching and its usage method, having the following advantages:

[0020] A more refined etching processing structure is provided. With a small amount of etching solution, the workpiece can be fully etched. The waste liquid from the etching process is directly discharged into the recycling tank for recovery treatment, enabling more refined use of the etching solution, effectively improving the utilization rate of the etching solution, and reducing processing costs and material consumption;

[0021] The etching waste liquid after the etching processing can be uniformly recovered and recycled, and will not be discharged to the etching solution to be used, affecting its etching effect, thereby ensuring the quality of the etching process;

[0022] Two recyclable recovery boxes are provided. When one group is being processed, the other group can collect the etching waste liquid, preventing the etching waste liquid from affecting the etching solution being recycled, thereby ensuring the recovery treatment effect of the etching solution without stopping the etching process and guaranteeing the working efficiency of the etching process.

[0023] The above description is only an overview of the technical solution of the present invention. In order to better understand the technical means of the present invention and implement it according to the content of the specification, the following provides a detailed description with reference to the preferred embodiments of the present invention and the accompanying drawings. The specific implementation manners of the present invention are given in detail by the following embodiments and their accompanying drawings. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] The drawings described herein are used to provide a further understanding of the present invention, and constitute a part of this application. The schematic embodiments of the present invention and their descriptions are used to explain the present invention, and do not constitute an improper limitation to the present invention. In the drawings:

[0025] Figure 1 is a schematic structural diagram of a recycling system for alloy etching solution with cyclic etching and its usage method provided by an embodiment of the present invention;

[0026] Figure 2 is a front view of a recycling system for alloy etching solution with cyclic etching and its usage method provided by an embodiment of the present invention;

[0027] Figure 3 is a schematic structural diagram of the assembled state of the workpiece tray and the sealing cover in a recycling system for alloy etching solution with cyclic etching and its usage method provided by an embodiment of the present invention;

[0028] Figure 4 is a schematic structural diagram of the etching machine case from a top view angle in a recycling system for alloy etching solution with cyclic etching and its usage method provided by an embodiment of the present invention;

[0029] Figure 5Schematic diagram of the structure of the workpiece tray in a recycling system for alloy etching solution with cyclic etching and its usage method provided by an embodiment of the present invention;

[0030] Figure 6 Schematic diagram of the structure of the sealing cover in a recycling system for alloy etching solution with cyclic etching and its usage method provided by an embodiment of the present invention.

[0031] In the attached drawings, the list of components represented by each reference numeral is as follows:

[0032] 1. Etching machine case; 2. Conveyor; 3. Workpiece tray; 4. Limit strip; 5. Object placing support column; 6. Liquid pumping tank; 7. Hydraulic cylinder; 8. Sealing cover; 9. Spray pipe; 10. Micro nozzle; 11. Infusion pump; 12. Extraction pump; 13. Liquid pumping pipe; 14. Main etching solution tank; 15. Liquid storage tank; 16. Recycling treatment tank; 17. Supplementary pipe; 18. Output valve; 19. First water pump; 20. Second water pump; 21. First three-way valve; 22. Processing liquid input pipe; 23. Overflow pipe; 24. Liquid level gauge; 25. Second three-way valve; 26. Maintenance door. Detailed implementation manners

[0033] The following Figure 1-6 describes the principles and features of the present invention. The examples given are only for explaining the present invention and are not intended to limit the scope of the present invention. The present invention will be described more specifically by way of example in the following paragraphs with reference to the attached drawings. The advantages and features of the present invention will be clearer according to the following description and the claims. It should be noted that the attached drawings are all in a very simplified form and use non-precise scales, only for conveniently and clearly assisting in explaining the purpose of the embodiments of the present invention.

[0034] It should be noted that when a component is referred to as being "fixed to" another component, it can be directly on the other component or there may also be an intermediate component. When a component is considered to be "connected to" another component, it can be directly connected to the other component or there may be an intermediate component at the same time. When a component is considered to be "disposed on" another component, it can be directly disposed on the other component or there may be an intermediate component at the same time. The terms "vertical", "horizontal", "left", "right" and similar expressions used herein are only for the purpose of illustration.

[0035] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as commonly understood by those skilled in the technical field to which the present invention belongs. The terms used in the description of the present invention herein are only for the purpose of describing specific embodiments and are not intended to limit the present invention. The term "and / or" used herein includes any and all combinations of one or more of the related listed items.

[0036] AsFigure 1-6 As shown in the figure, the present invention provides a recycling system for alloy etching solution with cyclic etching and its usage method, including an etching machine case 1 and a workpiece holding box 3. The etching machine case 1 is fixedly installed with a conveyor 2, and the workpiece holding box 3 is fed through the conveyor 2. The workpiece holding box 3 is evenly and fixedly installed with placing support columns 5. The etching machine case 1 is fixedly installed with a hydraulic cylinder 7, the hydraulic cylinder 7 is fixedly installed with a sealing cover 8, the sealing cover 8 is fixedly installed with a spray pipe 9, the bottom of the spray pipe 9 is evenly and fixedly communicated with micro spray heads 10, the spray pipe 9 is fixedly communicated with an infusion pump 11, the sealing cover 8 is fixedly installed with an extraction pump 12, the extraction pump 12 is fixedly communicated with a liquid extraction pipe 13. The etching machine case 1 is fixedly installed with an etching solution main tank 14, a liquid storage tank 15, and a cyclic treatment tank 16. The etching solution main tank 14 is fixedly communicated with a supplement pipe 17 and an output valve 18, the output valve 18 is communicated with the infusion pump 11, the etching solution main tank 14 is fixedly communicated with a first water pump 19, the first water pump 19 is fixedly communicated with the liquid storage tank 15, the liquid storage tank 15 is fixedly communicated with a second water pump 20, the second water pump 20 is fixedly communicated with a first three-way valve 21. There are two cyclic treatment tanks 16, and the two cyclic treatment tanks 16 are communicated with the first three-way valve 21. The cyclic treatment tank 16 is fixedly communicated with a treatment liquid input pipe 22, an overflow pipe 23, and a liquid level gauge 24. The two sides of the cyclic treatment tank 16 are fixedly communicated with a second three-way valve 25, the second three-way valve 25 is fixedly communicated with the extraction pump 12, and the etching machine case 1 is provided with a maintenance door 26.

[0037] Preferably, the conveyor 2 is provided with a conveyor belt, and the conveyor belt is fixedly installed with limiting strips 4 corresponding to the workpiece holding box 3, so that the workpiece holding box 3 can be evenly laid at the conveyor 2 for feeding.

[0038] Preferably, the inner wall bottom of the workpiece holding box 3 is set as a slope structure, so that the etching solution can slide down from the workpiece holding box 3 for subsequent extraction and discharge.

[0039] Preferably, the workpiece holding box 3 is provided with a liquid extraction groove 6, the liquid extraction pipe 13 is placed in the liquid extraction groove 6, and the liquid extraction pipe 13 can uniformly extract the etching waste liquid in the workpiece holding box 3.

[0040] Preferably, the first water pump 19 is fixedly communicated with a water pipe, and one end of the water pipe is placed at the inner wall bottom of the liquid storage tank 15.

[0041] Preferably, both ends of the first three-way valve 21 are fixedly communicated with liquid extraction pipes, and one end of the smoking pipe is placed at the inner wall bottom of the cyclic treatment tank 16.

[0042] Preferably, the second three-way valve 25 is communicated with the top of the cyclic treatment tank 16.

[0043] The specific working principle and usage method of the present invention are as follows: S1: The circuit board is placed in the workpiece tray 3. The placement support column 5 can support the circuit board, and the bottom gap can be used to collect the etching solution. The workpiece tray 3 is evenly placed at the conveyor 2 and fed into the etching machine case 1 by the conveyor 2. When the workpiece tray 3 is placed at the bottom of the sealing cover 8, the conveyor 2 stops. Starting the hydraulic cylinder 7 can drive the sealing cover 8 to descend, and the sealing cover 8 can cover the workpiece tray 3 to complete the feeding, waiting for subsequent etching processing;

[0044] S2: Start the infusion pump 11 and open the output valve 18. The etching solution in the main etching solution tank 14 can be pumped out in a standard amount and placed in the workpiece tray 3. In the small and enclosed workpiece tray 3, a small amount of etching solution can fully contact the circuit board, so as to carry out etching processing. After the processing is completed, start the extraction pump 12 to pump out the etching waste liquid in the workpiece tray 3 through the liquid extraction pipe 13. The etching waste liquid can be transmitted to the circulation treatment tank 16 through the second three-way valve 25 and wait for circulation treatment. After the extraction is completed, start the hydraulic cylinder 7 to raise the sealing cover 8. The conveyor 2 can drive the next group of workpiece trays 3 to the processing position and discharge the processed workpiece trays 3;

[0045] S3: When a group of circulation treatment tanks 16 collect enough waste liquid to be processed, adjust the second three-way valve 25 to communicate with another circulation treatment tank 16 to collect the etching waste liquid. Adjust the first three-way valve 21 to communicate with the circulation treatment tank 16 being processed, and input ammonia water, ammonium chloride and the mother liquor into the circulation treatment tank 16 through the treatment liquid input pipe 22 for restoration treatment. The excess mother liquor can be discharged through the overflow pipe 23. After the treatment is completed, start the second water pump 20 to pump the processed etching solution in the circulation treatment tank 16 into the storage tank 15 through the second water pump 20 for standby. The empty circulation treatment tank 16 can be reused when another circulation treatment tank 16 is full of waste liquid;

[0046] S4: When the etching solution in the main etching solution tank 14 is almost used up, the etching solution can be directly supplemented through the supplement pipe 17. It is also possible to start the first water pump 19 to pump the recycled etching solution in the storage tank 15 into the main etching solution tank 14 for subsequent etching processing.

[0047] It should be noted that in this article, relational terms such as first and second are only used to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any such actual relationship or order between these entities or operations. The content not detailed in this specification belongs to the prior art well-known to those skilled in the art.

[0048] The above are only the preferred embodiments of the present invention, and do not impose any form of limitation on the present invention; any ordinary technician in the industry can smoothly implement the present invention according to what is shown in the accompanying drawings of the specification and the above; however, any slight changes, modifications and equivalent changes made by those skilled in the art within the scope of the technical solution of the present invention by using the technical content disclosed above are all equivalent embodiments of the present invention; at the same time, any changes, modifications and evolutions made to the above embodiments according to the essential technology of the present invention are still within the scope of protection of the technical solution of the present invention.

Claims

1. A recycling etching alloy etching liquid recovery system, comprising an etching machine box (1) and a workpiece support box (3), characterized in that: The etching machine box (1) is fixedly installed with a conveyor (2), the workpiece support box (3) is loaded through the conveyor (2), the workpiece support box (3) is evenly fixedly installed with a storage support column (5), the etching machine box (1) is fixedly installed with a hydraulic cylinder (7), the hydraulic cylinder (7) is fixedly installed with a sealing cover (8), the sealing cover (8) is fixedly installed with a spray pipe (9), the bottom of the spray pipe (9) is evenly fixedly connected with a micro-spray head (10), the spray pipe (9) is fixedly connected with an infusion pump (11), the sealing cover (8) is fixedly installed with an extraction pump (12), the extraction pump (12) is fixedly connected with a liquid extraction pipe (13), the etching machine box (1) is fixedly installed with an etching liquid main box (14), a liquid storage box (15), and a circulation treatment box (16), the etching liquid main box (14) is fixedly connected with a replenishing pipe (17 ) and an output valve (18), the output valve (18) being connected to an infusion pump (11), the etching liquid main tank (14) being fixedly connected to a No. 1 water pump (19), the No. 1 water pump (19) being fixedly connected to a liquid storage tank (15), the No. 2 water pump (20) being fixedly connected to the liquid storage tank (15), the No. 2 water pump (20) being fixedly connected to a No. 1 three-way valve (21), two circulating treatment tanks (16) being provided, the two circulating treatment tanks (16) being connected to the No. 1 three-way valve (21), the circulating treatment tanks (16) being fixedly connected to a treatment liquid input pipe (22), an overflow pipe (23) and a liquid level gauge (24), the circulating treatment tanks (16) on both sides being fixedly connected to a No. 2 three-way valve (25), the No. 2 three-way valve (25) being fixedly connected to an extraction pump (12), and the etching machine box (1) being provided with an inspection door (26); The method of use includes the following steps: S1: The circuit board is placed in the workpiece support box (3), the support column (5) can support the circuit board, and the bottom gap can be used to collect etching liquid. The workpiece support box (3) is evenly placed on the conveyor (2) and loaded into the etching machine box (1) through the conveyor (2). When the workpiece support box (3) is placed at the bottom of the sealing cover (8), the conveyor (2) stops, and the hydraulic cylinder (7) is started to drive the sealing cover (8) to descend. The sealing cover (8) can be sealed on the workpiece support box (3) to complete the loading, and wait for subsequent etching processing; S2: Start the infusion pump (11) and open the output valve (18). The etching liquid in the etching liquid main box (14) can be extracted in a standard amount and placed in the workpiece tray (3). A small amount of etching liquid in the closed and narrow workpiece tray (3) can fully contact the circuit board, thereby performing etching processing. After the processing is completed, the extraction pump (12) can be started to extract the etching waste liquid in the workpiece tray (3) through the extraction pipe (13). The etching waste liquid can be transferred to the circulation treatment box (16) through the No. 2 three-way valve (25) to wait for circulation treatment. After the extraction is completed, the hydraulic cylinder (7) is started to raise the sealing cover (8). The conveyor (2) can drive the next group of workpiece trays (3) to the processing position and discharge the processed workpiece trays (3); S3: When a group of circulating treatment boxes (16) has collected a large amount of waste liquid that can be processed, the No. 2 three-way valve (25) is adjusted to connect with another circulating treatment box (16) for collecting the waste etching liquid, and the No. 1 three-way valve (21) is adjusted to connect with the treated circulating treatment box (16), and ammonia water, ammonium chloride and sub-liquid are input into the circulating treatment box (16) through the treated liquid input pipe (22) for recovery treatment. The excess mother liquid can be discharged through the overflow pipe (23). After the treatment is completed, the No. 2 water pump (20) can be started to pump the processed etching liquid in the circulating treatment box (16) into the liquid storage box (15) through the No. 2 water pump (20) for standby use. The empty circulating treatment box (16) can be used again when the other circulating treatment box (16) is full of waste liquid; S4: When the etching liquid in the etching liquid main tank (14) is almost used up, the etching liquid can be directly replenished through the replenishing pipe (17), and the first water pump (19) can be started to pump the recycled etching liquid in the liquid storage tank (15) into the etching liquid main tank (14) for subsequent etching processing.

2. According to the alloy etching liquid recovery system of the cyclic etching according to claim 1, it is characterized in that: The conveyor (2) is provided with a conveyor belt, and a limit strip (4) is fixedly installed on the conveyor belt corresponding to the workpiece support box (3).

3. According to the alloy etching liquid recovery system of the cyclic etching according to claim 1, it is characterized in that: The bottom of the inner wall of the workpiece support box (3) is arranged as a slope structure.

4. The alloy etching liquid recovery system for cyclic etching according to claim 1, characterized in that: The workpiece support box (3) is provided with a liquid extraction groove (6), and the liquid extraction tube (13) is placed in the liquid extraction groove (6).

5. The alloy etching liquid recovery system for cyclic etching according to claim 1, characterized in that: The first water pump (19) is fixedly connected to a water pipe, one end of which is placed at the bottom of the inner wall of the liquid storage tank (15).

6. The alloy etching liquid recovery system for cyclic etching according to claim 1, characterized in that: Both ends of the No. 1 three-way valve (21) are fixedly connected to the liquid extraction pipe, and one end of the smoke extraction pipe is placed at the bottom of the inner wall of the circulation treatment box (16).

7. The alloy etching liquid recovery system for cyclic etching according to claim 1, characterized in that: The No. 2 three-way valve (25) is connected to the top end of the circulation treatment box (16).

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