An intelligent loading tool for photomask substrate processing
By designing the loading module, lifting module and cleaning module of the intelligent loading tool, the problem of incomplete cleaning and scratches during the loading process of photomask substrate is solved, and efficient substrate cleaning and loading is achieved, and processing quality is improved.
Patent Information
- Application Number
- CN202411162851.6
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2024-08-23
- Publication Date
- 2025-05-13
- Estimated Expiration
- 2044-08-23
AI Technical Summary
The existing photomask substrate loading device fails to effectively clean the impurities on the substrate surface during the loading process, which affects the subsequent processing process and may cause scratches on the substrate surface.
An intelligent loading tool including a loading module, a lifting module and a cleaning module is designed. The loading module realizes loading of the photomask substrate through a paper frame and a telescopic rod; the lifting module uses the suction frame and telescopic cylinder to adsorb and load the photomask substrate; the cleaning module cleans the surface of the photomask substrate through the application, scraping and blowing cleaning functions.
Effective cleaning and loading of the surface of the photomask substrate is achieved, impurity residues and substrate scratches are avoided, and the quality and efficiency of subsequent processing are improved.
Smart Images

Figure CN119024638B_ABST
Abstract
Description
Technical Field
[0001] The present application relates to the field of photomask substrate loading, and in particular to an intelligent loading tool for photomask substrate processing. Background Art
[0002] During the use of photomask substrates, dirt often occurs, resulting in poor quality. Especially during the proximity exposure process, the dirt on the photomask substrate will cause common exposure defects, which has a great impact on the product yield. Therefore, cleaning the photomask substrate with an organic solvent is an essential operation. Therefore, it is necessary to design a cleaning device for the photomask substrate.
[0003] In the existing substrate loading device, such as the Chinese patent with the announcement number CN 218478180 U, a substrate loading device is disclosed. Specifically, when the substrate needs to be taken out, the storage box is first placed on the surface of the bottom plate, and then the second driving member drives the pressing plate to slide in the direction close to the bottom plate, so that the storage box is clamped between the bottom plate and the pressing plate; then the third driving member drives the pushing block to slide in the direction close to the bottom plate, and the pushing block pushes the substrate in the storage box onto the conveying rack; after the pushing block pushes each substrate, the clamping seat slides downward in the vertical direction under the driving action of the first driving member, so that the pushing block can push out the remaining other substrates in sequence, so as to facilitate the continuous removal of the substrates in the storage box.
[0004] The above-mentioned prior art can also realize the function of loading substrates, but on the one hand, the above-mentioned prior art does not take into account the cleaning of the substrate surface during the loading process, and more impurities usually remain on the substrate surface, affecting the subsequent processing of the substrate. On the other hand, during the process of loading the substrate, the above-mentioned prior art directly uses a push block to push the substrate, which may cause scratches on the substrate surface. Based on this, there is still room for improvement on the basis of the existing substrate loading device. Summary of the invention
[0005] In order to realize the function of loading photomask substrates, the present application provides an intelligent loading tool for photomask substrate processing.
[0006] The present application provides an intelligent loading tool for photomask substrate processing, which adopts the following technical solution:
[0007] An intelligent loading tool for photomask substrate processing comprises a fixing frame, a loading module, a lifting module and a cleaning module. The fixing frame is a U-shaped structure. The loading module is installed at the lower end of the fixing frame. The lifting modules are symmetrically installed in the fixing frame. The lifting modules are arranged diagonally. The cleaning modules are symmetrically installed in the middle of the fixing frame. The cleaning modules are arranged diagonally.
[0008] The feeding module includes a circular frame, a cover, a material baffle plate, a spring 1, a telescopic groove, a spring 2 and a telescopic rod. The circular frame is installed on a fixed frame, a cover is installed on the left end of the circular frame by screws, a material baffle plate is arranged in the circular frame, a spring 1 is symmetrically connected between the cover and the material baffle plate, telescopic grooves are evenly arranged on the inner wall of the right end of the circular frame, a telescopic rod is arranged in the telescopic groove, the end of the telescopic rod is an arc-shaped smooth surface, a spring 2 is connected between the telescopic rod and the inner wall of the telescopic groove, and a sponge pad is symmetrically arranged on the right end of the circular frame.
[0009] By adopting the above technical solution, the photomask substrates are evenly placed in the circular frame, the cover is fixed to the left end of the circular frame by screws, the baffle plate presses the photomask substrate to the right, and at the same time, the telescopic rod can limit the outermost photomask substrate inside the circular frame. When the lifting module absorbs the photomask substrate and moves outward, the outermost photomask substrate can be smoothly moved out of the circular frame, thereby realizing the function of loading the photomask substrates one by one.
[0010] The lifting module includes a slide rail, a sliding frame, a telescopic cylinder, a suction frame and a connecting rod. The slide rail is symmetrically installed on the side wall of the fixed frame, the sliding frame is installed on the slide rail, the telescopic cylinder is installed on the inner side of the sliding frame, the suction frame is installed on the top of the telescopic cylinder, and the connecting rod is symmetrically connected between the two sliding frames.
[0011] By adopting the above technical solution, when the telescopic cylinder drives the suction frame to move to the left, the suction frame adsorbs the surface of the photomask substrate, and then the sliding frame drives the photomask substrate to move upward along the slide rail. After the surface of the photomask substrate is cleaned, the sliding frame drives the photomask substrate to continue to move upward, thereby realizing the loading function of the photomask substrate.
[0012] The cleaning module includes a U-shaped frame, a smearing unit, a scraping unit and a cleaning unit. The U-shaped frame is installed on the side wall of the fixed frame. The smearing unit, the scraping unit and the cleaning unit are installed in the U-shaped frame from bottom to top. The inner sides of the smearing unit, the scraping unit and the cleaning unit are flush.
[0013] By adopting the above technical solution, when the sliding frame drives the photomask substrate to move slowly upward, the coating unit first coats the organic solvent on the surface of the photomask substrate, the scraping unit then scrapes off the organic solvent coated on the surface of the photomask substrate, and then the cleaning unit blows and cleans the organic solvent remaining on the surface of the photomask substrate, thereby realizing the cleaning function of the surface of the photomask substrate.
[0014] Preferably, the suction frame includes an inclined slot frame, a triangular protrusion, a spring three, a suction plate, an iron sheet and an electromagnet, the end of the telescopic cylinder is connected to the inclined slot frame, the lower end of the inclined slot frame is evenly provided with triangular protrusions, the upper end of the inclined slot frame is provided with an inclined slot, the inclined slot frame is provided with a suction plate, the upper end of the suction plate is slidably matched with the inclined slot, the lower end of the suction plate is provided with a guide groove slidably matched with the triangular protrusion, negative pressure suction holes are evenly provided on the suction plate, spring three is symmetrically connected between the suction plate and the inner wall of the inclined slot frame, an iron sheet is provided on the inner wall of the suction plate, an electromagnet is provided on the inner wall of the inclined slot frame, and the iron sheet cooperates with the electromagnet.
[0015] By adopting the above technical solution, the telescopic cylinder drives the suction plate to move to the left, and the negative pressure suction holes evenly arranged on the suction plate tightly adsorb and fix the photomask substrate. Then the telescopic cylinder drives the inclined slot frame to continue to move to the left, and the suction plate contracts inward relative to the inclined slot frame. The triangular protrusion inside the inclined slot frame can drive the suction plate to shift upward, thereby ensuring that the photomask substrate adsorbed on the suction plate can be staggered with the photomask substrate at the rear end. At the same time, the electromagnet contacts the iron sheet, and the electromagnet is energized to fit the iron sheet to prevent the spring three from resetting and popping the suction plate outward. When the photomask substrate is cleaned and transferred, the electromagnet is de-energized, and the suction plate is reset under the action of spring three.
[0016] Preferably, the smearing unit includes a material storage rack, a material storage trough, a feed pipe, a piston accessory, a feed rack, a feed trough and a smearing roller, the material storage rack is installed at the lower end inside the U-shaped rack, a material storage trough is arranged in the material storage rack, a piston accessory is symmetrically installed in the material trough, a feed pipe is installed on the outer wall of the material storage rack, the feed pipe is connected with the material storage trough, a material feeding rack is symmetrically installed at the right end of the material storage rack, the material feeding racks are slidably connected with each other, smearing rollers are installed on the two material feeding racks through bearings, a material feeding trough is arranged in the material feeding rack, and the smearing roller is connected with the material storage trough through the material feeding trough.
[0017] By adopting the above technical solution, when the photomask substrate moves upward to squeeze the coating roller, the coating roller drives the feed frame to move into the storage trough, and at the same time the piston accessory in the feed trough opens, and the organic solvent in the storage trough moves into the coating roller through the feed trough, thereby realizing the coating function on the surface of the photomask substrate.
[0018] Preferably, the piston accessories include spring four, a piston, a sealing plug and a push rod. The push rod is installed on the side wall of the storage trough, spring four is arranged on the push rod, a piston is arranged at the end of the push rod, the piston cross-section is a trapezoidal structure, the piston is located in the feed trough, a sealing plug is installed in the feed trough, and the sealing plug and the piston are sealed.
[0019] By adopting the above technical solution, when the photomask substrate squeezes the coating roller, the feed frame moves into the storage trough, causing the spring four to contract and deform, and the piston at the end of the push rod is separated from the sealing plug, so that the organic solvent flows from the feed trough into the coating roller. After the surface of the photomask substrate is coated, the photomask substrate continues to move upward with the sliding frame, and the photomask substrate is separated from the coating roller. At this time, the spring four is reset, and a sealed connection is formed between the piston and the sealing plug to prevent the organic solvent from continuously flowing out, thereby preventing the organic solvent from being wasted.
[0020] Preferably, the sleeve is installed between two feed racks, a notch is provided in the middle of the sleeve, the interior of the sleeve is connected with the feed trough, a coating tube is installed on the outer end of the sleeve through a bearing, through holes are evenly provided on the coating tube, and an annular sponge pad is provided on the outer end of the coating tube.
[0021] By adopting the above technical solution, the organic solvent flows out through the gap in the middle of the sleeve. When the through hole on the coating tube rotates to the gap on the outside of the sleeve, the organic solvent flows out through the through hole into the inside of the annular sponge pad. When the photomask substrate squeezes the annular sponge pad, the organic solvent can be accurately coated on the surface of the photomask substrate.
[0022] Preferably, the scraping unit includes a rectangular frame, a scraping frame, an arc groove, a scraper and a discharge pipe. The rectangular frame is installed in the middle of the U-shaped frame, and the scraping frame is evenly installed on the rectangular frame by screws. The scraping frame is arranged to be inclined downward, and the cross-section of the scraping frame is a C-shaped structure. An arc groove is arranged inside the scraping frame, and a scraper is installed at the upper end of the inner side of the scraping frame. A collecting groove is arranged at the lower end of the rectangular frame, and the arc groove is connected to the collecting groove through a vertical groove. The vertical groove is opened on the inner wall of the rectangular frame, and a discharge pipe is installed on the outer wall of the rectangular frame, and the discharge pipe is connected to the collecting groove.
[0023] By adopting the above technical solution, when the photomask substrate moves to the inner side of the rectangular frame with the sliding frame, the scraper scrapes the organic solvent on the surface of the photomask substrate, and the scraped organic solvent falls into the arc groove. The inclined arc groove can play a role in guiding the organic solvent, so that the organic solvent flows into the collection groove through the vertical groove, and the organic solvent in the collection groove is collected and processed through the discharge pipe.
[0024] Preferably, the scraper has a conical cross-section, is made of rubber, and has baffles evenly arranged on the inner side of the scraper, with the length of the baffles gradually increasing from the outside to the inside.
[0025] By adopting the above technical solution, the scraper with a conical cross-section can more effectively scrape off the organic solvent on the surface of the photomask substrate, the rubber scraper can prevent the photomask substrate from being scratched during the scraping process, and the baffle rods evenly arranged on the inner side of the scraper can guide the organic solvent to prevent the organic solvent from accumulating on the side of the scraper, so that the organic solvent can fall into the arc groove along the baffle rod.
[0026] Preferably, the cleaning unit includes a cleaning frame, an empty slot, a cleaning roller and an air intake duct. The cleaning frame is installed at the upper end of the U-shaped frame. The cleaning frame is provided with an empty slot. An air intake duct is installed on the outer wall of the cleaning frame. The air intake duct is connected to the empty slot. Cleaning rollers are evenly installed on the inner side of the cleaning frame. A wiping cloth is provided at the outer end of the cleaning roller. Air jets are evenly provided between the cleaning rollers, and the air jets are connected to the empty slot.
[0027] By adopting the above technical solution, when the photomask substrate moves to the inner side of the cleaning frame with the sliding frame, the wiping cloth arranged at the outer end of the cleaning roller cleans the surface of the photomask substrate, so that the organic solvent that has not been completely scraped off can be accurately removed. At the same time, the air jets evenly arranged between the cleaning rollers blow air evenly on the surface of the photomask substrate, so that the surface of the photomask substrate remains dry, which is beneficial to the subsequent loading of the photomask substrate.
[0028] In summary, the present application includes at least one of the following beneficial technical effects:
[0029] 1. The present invention is provided with a loading module, and the negative pressure suction holes evenly arranged on the suction plate can absorb and fix the photomask substrate. When the telescopic cylinder drives the inclined slot frame to continue to move to the left, the suction plate contracts inward relative to the inclined slot frame, and the triangular protrusion inside the inclined slot frame can drive the suction plate to deflect upward, so that the photomask substrate adsorbed on the suction plate and the photomask substrate at the rear end are staggered with each other. At the same time, the electromagnet contacts the iron sheet, and the electromagnet is energized to be tightly attached to the iron sheet to prevent the spring from resetting three times and popping the suction plate outward.
[0030] 2. The present invention is provided with a coating unit. When the photomask substrate squeezes the coating roller to make the feed frame move into the storage tank, the spring four contracts and deforms, and the piston at the end of the push rod is separated from the sealing plug, so that the organic solvent flows from the feed tank into the coating roller. When the surface of the photomask substrate is coated, the photomask substrate continues to move upward with the sliding frame, and the photomask substrate is separated from the coating roller. At this time, the spring four is reset, and a sealed connection is formed between the piston and the sealing plug to prevent the organic solvent from continuously flowing out, thereby preventing the organic solvent from being wasted.
[0031] 3. The present invention is provided with a scraping unit, and the scraper can scrape the organic solvent on the surface of the photomask substrate. The scraped organic solvent falls into the arc groove. The inclined arc groove can guide the organic solvent, so that the organic solvent can accurately flow into the collection groove through the vertical groove. BRIEF DESCRIPTION OF THE DRAWINGS
[0032] The present invention is further described below in conjunction with the accompanying drawings and embodiments.
[0033] Figure 1 It is a three-dimensional structural schematic diagram of this application.
[0034] Figure 2 It is a schematic diagram of the cross-sectional structure of this application.
[0035] Figure 3 It is a schematic diagram of the cross-sectional structure of the lifting module of the present application.
[0036] Figure 4 It is a schematic diagram of the cross-sectional structure of the cleaning module of this application.
[0037] Figure 5 It is a schematic diagram of the cross-sectional structure of the smearing unit of the present application.
[0038] Figure 6 It is a schematic diagram of the cross-sectional structure of the coating roller of the present application.
[0039] Figure 7 It is a schematic diagram of the cross-sectional structure of the cleaning unit of the present application.
[0040] Figure 8 It is a schematic diagram of the cross-sectional structure of the scraping unit of the present application.
[0041] Fig. 9 It is a schematic diagram of the cross-sectional structure of the scraper frame and scraper of the present application.
[0042] Fig.10 It is a schematic diagram of the cross-sectional structure of the feeding module of this application.
[0043] Fig.11 It is a schematic diagram of the cross-sectional structure of this application.
[0044] Fig.12 It is a schematic diagram of the cross-sectional structure of the feeding module of this application.
[0045] Explanation of the reference numerals: 1. fixed frame; 2. feeding module; 21. circular frame; 22. sealing cover; 23. material blocking plate; 24. spring one; 25. telescopic slot; 26. spring two; 27. telescopic rod; 3. lifting module; 31. slide rail; 32. sliding frame; 33. telescopic cylinder; 34. suction frame; 341. inclined slot frame; 342. triangular protrusion; 343. spring three; 344. suction plate; 345. iron sheet; 346. electromagnet; 35. connecting rod; 4. cleaning module; 41. U-shaped frame; 42. smearing unit; 421. storage frame; 422. storage slot ; 423, feed pipe one; 424, piston accessories; 4241, spring four; 4242, piston; 4243, sealing plug; 4244, push rod; 425, feed rack 426, feed trough; 427, smear roller; 4271, smear tube; 4272, annular sponge pad; 4273, sleeve; 43, scraping unit; 431, rectangular frame; 432, scraping rack; 433, arc groove; 434, scraper; 435, discharge pipe; 44, cleaning unit; 441, cleaning rack; 442, empty groove; 443, cleaning roller; 444, intake pipe. DETAILED DESCRIPTION
[0046] The following is combined with Figure 1-Figure 12 This application is described in further detail.
[0047] The embodiment of the present application discloses an intelligent loading tool for photomask substrate processing, which can realize the functions of cleaning and loading the photomask substrate.
[0048] Reference Figure 1 An intelligent loading tool for photomask substrate processing includes a fixing frame 1, a loading module 2, a lifting module 3 and a cleaning module 4. The fixing frame 1 is a U-shaped structure. The loading module 2 is installed at the lower end of the fixing frame 1. The lifting module 3 is symmetrically installed in the fixing frame 1, and the lifting module 3 is diagonally arranged. The cleaning module 4 is symmetrically installed in the middle of the fixing frame 1, and the cleaning module 4 is diagonally arranged.
[0049] Reference Figure 2 , Figure 10-12In order to realize the loading function of the photomask substrate, a loading module 2 is provided in the present embodiment, and the loading module 2 comprises a circular frame 21, a cover 22, a material blocking plate 23, a spring 1 24, a telescopic slot 25, a spring 26 and a telescopic rod 26. The circular frame 21 is installed on the fixed frame 1, and the cover 22 is installed on the left end of the circular frame 21 by screws. A material blocking plate 23 is arranged in the circular frame 21, and a spring 1 24 is symmetrically connected between the cover 22 and the material blocking plate 23. Telescopic slots 25 are evenly arranged on the inner wall of the right end of the circular frame 21, and a telescopic rod 26 is arranged in the telescopic slot 25. The end of the telescopic rod 26 is an arc-shaped smooth surface, and a spring 26 is connected between the telescopic rod 26 and the inner wall of the telescopic slot 25. A sponge pad is symmetrically arranged on the right end of the circular frame 21.
[0050] During actual use, the photomask substrate is evenly placed in the circular frame 21, the cover 22 is fixed to the left end of the circular frame 21 by screws, the baffle plate 23 presses the photomask substrate to the right, and the telescopic rod 26 can limit the outermost photomask substrate inside the circular frame 21. When the lifting module 3 absorbs the photomask substrate and moves outward, the outermost photomask substrate can be smoothly moved out of the circular frame 21, thereby realizing the function of loading the photomask substrates one by one.
[0051] It should be noted that when the photomask substrate is placed in the circular frame 21, the baffle plate 23 can block the photomask substrate. When the number of photomask substrates in the circular frame 21 continues to decrease, the baffle plate 23 can continue to push the photomask substrate to the right, so that the photomask substrate can always be at the right end of the circular frame 21, ensuring that the lifting module 3 can smoothly absorb the photomask substrate to realize the loading function.
[0052] Reference Figure 2 , Figure 3 and Fig.11 In order to realize the function of continuous loading of the photomask substrate, a lifting module 3 is provided in the present embodiment, and the lifting module 3 includes a slide rail 31, a sliding frame 32, a telescopic cylinder 33, a suction frame 34 and a connecting rod 35. The slide rail 31 is symmetrically installed on the side wall of the fixed frame 1, the sliding frame 32 is installed on the slide rail 31, the telescopic cylinder 33 is installed on the inner side of the sliding frame 32, the suction frame 34 is installed on the top of the telescopic cylinder 33, and the connecting rod 35 is symmetrically connected between the two sliding frames 32.
[0053] During actual use, when the telescopic cylinder 33 drives the suction frame 34 to move to the left, the suction frame 34 adsorbs the surface of the photomask substrate, and then the sliding frame 32 drives the photomask substrate to move upward along the slide rail 31. After the surface of the photomask substrate is cleaned, the sliding frame 32 drives the photomask substrate to continue to move upward, thereby realizing the loading function of the photomask substrate.
[0054] It should be noted that after the cleaning module 4 completes the cleaning of the left side surface of the photomask substrate, the lifting module 3 located at the lower end of the fixed frame 1 transfers the photomask substrate to the lifting module 3 located at the upper end of the fixed frame 1, which is conducive to cleaning the right side surface of the photomask substrate. At the same time, the lifting module 3 located at the lower end of the fixed frame 1 continues to move downward to realize the subsequent loading of the photomask substrate.
[0055] It should also be noted that, during the upward movement of the lifting module 3 , the connecting rod 35 can drive the two sliding frames 32 to move synchronously, thereby preventing the photomask substrate from being damaged when the surface of the photomask substrate is subsequently cleaned.
[0056] Reference Figure 2 , Figure 4-Figure 9 In order to realize the cleaning function of the surface of the photomask substrate, a cleaning module 4 is provided in the present embodiment, and the cleaning module 4 includes a U-shaped frame 41, a smearing unit 42, a scraping unit 43 and a cleaning unit 44. The U-shaped frame 41 is installed on the side wall of the fixing frame 1, and the smearing unit 42, the scraping unit 43 and the cleaning unit 44 are installed in the U-shaped frame 41 from bottom to top, and the inner sides of the smearing unit 42, the scraping unit 43 and the cleaning unit 44 are flush.
[0057] During actual use, when the sliding frame 32 drives the photomask substrate to move slowly upward, the coating unit 42 first coats the organic solvent on the surface of the photomask substrate, and the scraping unit 43 then scrapes off the organic solvent coated on the surface of the photomask substrate. Subsequently, the cleaning unit 44 blows and cleans the organic solvent remaining on the surface of the photomask substrate, thereby realizing the cleaning function of the surface of the photomask substrate.
[0058] Reference Figure 2 , Figure 3 and Fig.11 In order to realize the absorption and loading function of the photomask substrate, a suction rack 34 is provided in the present embodiment, and the suction rack 34 includes an inclined slot rack 341, a triangular protrusion 342, a spring 343, a suction plate 344, an iron sheet 345 and an electromagnet 346. The end of the telescopic cylinder 33 is connected to the inclined slot rack 341, the lower end of the inclined slot rack 341 is evenly provided with triangular protrusions 342, the upper end of the inclined slot rack 341 is provided with an inclined slot, and the inclined slot rack 341 has an inner surface. A suction plate 344 is provided, the upper end of which is slidably matched with the inclined groove, the lower end of the suction plate 344 is provided with a guide groove slidably matched with the triangular protrusion 342, negative pressure suction holes are evenly provided on the suction plate 344, spring three 343 is symmetrically connected between the suction plate 344 and the inner wall of the inclined groove frame 341, an iron sheet 345 is provided on the inner wall of the suction plate 344, and an electromagnet 346 is provided on the inner wall of the inclined groove frame 341, and the iron sheet 345 cooperates with the electromagnet 346.
[0059] During actual use, the telescopic cylinder 33 drives the suction plate 344 to move to the left, and the negative pressure suction holes evenly arranged on the suction plate 344 tightly absorb and fix the photomask substrate. Then, the telescopic cylinder 33 drives the inclined slot frame 341 to continue to move to the left, and the suction plate 344 shrinks inward relative to the inclined slot frame 341. The triangular protrusion 342 inside the inclined slot frame 341 can drive the suction plate 344 to shift upward, thereby ensuring that the photomask substrate adsorbed on the suction plate 344 can be staggered with the photomask substrate at the rear end. At the same time, the electromagnet 346 contacts the iron sheet 345, and the electromagnet 346 is energized to fit the iron sheet 345 to prevent the spring three 343 from resetting and popping the suction plate 344 outward. When the photomask substrate is cleaned and the transfer is completed, the electromagnet 346 is de-energized, and the suction plate 344 is reset under the action of the spring three 343.
[0060] It should be noted that a groove is provided above the outermost photomask substrate located inside the circular frame 21, and a sponge pad is installed in the groove. After the suction plate 344 adsorbs and fixes the photomask substrate, the inclined groove frame 341 continues to push inward. At this time, the suction plate 344 contracts inward relative to the inclined groove frame 341, and the triangular protrusion 342 inside the inclined groove frame 341 can drive the suction plate 344 to shift upward, so that the suction plate 344 can drive the photomask substrate to push upward and contact with the sponge pad. The sponge pad is deformed by the force, so that adjacent photomask substrates can be staggered, which is beneficial to the accurate separation of the photomask substrates.
[0061] It should be noted that when the photomask substrate is adsorbed and loaded, the negative pressure suction holes evenly arranged on the suction plate 344 suck air inward to adsorb the surface of the photomask substrate. After the left side of the photomask substrate is cleaned, the photomask substrate continues to move upward with the sliding frame 32. When the photomask substrate moves to the middle of the fixed frame 1, the negative pressure suction holes on the suction plate 344 at the lower end of the fixed frame 1 stop sucking air, and at the same time, the negative pressure suction holes on the suction plate 344 at the upper end of the fixed frame 1 start to suck air, thereby transferring the photomask substrate from the suction plate 344 at the lower end of the fixed frame 1 to the suction plate 344 at the upper end of the fixed frame 1, thereby cleaning the right side of the photomask substrate.
[0062] Reference Figure 2 , Figure 4-Figure 6In order to realize the function of applying organic solvent to the surface of the photomask substrate, a coating unit 42 is provided in the present embodiment, and the coating unit 42 includes a material storage rack 421, a material storage tank 422, a feeding pipe 423, a piston accessory 424, a material feeding rack 425, a material feeding tank 426 and a coating roller 427. The material storage rack 421 is installed at the lower end of the U-shaped rack 41, and a material storage tank 422 is provided in the material storage rack 421, and pistons are symmetrically installed in the material storage tank 422. 4242 accessory 424, a feed pipe 423 is installed on the outer wall of the storage rack 421, the feed pipe 423 is connected to the storage trough 422, a conveying rack 425 is symmetrically installed on the right end of the storage rack 421, the conveying rack 425 is slidingly connected to the storage rack 421, and a smearing roller 427 is installed on the two conveying racks 425 through bearings, a conveying trough 426 is arranged in the conveying rack 425, and the smearing roller 427 is connected to the storage trough 422 through the conveying trough 426.
[0063] During actual use, when the photomask substrate moves upward to squeeze the coating roller 427, the coating roller 427 drives the feed frame 425 to move into the storage tank 422. At the same time, the piston accessory 424 in the feed tank 426 opens, and the organic solvent in the storage tank 422 moves into the coating roller 427 through the feed tank 426, thereby realizing the coating function on the surface of the photomask substrate.
[0064] It should be noted that the feed pipe 423 is always connected to the inside of the storage tank 422, so that the organic solvent in the storage tank 422 always maintains a certain pressure state, which is conducive to the organic solvent being applied to the photomask substrate.
[0065] Reference Figure 4 and Figure 5 In order to ensure that the organic solvent will flow out from the coating roller 427 only when the photomask substrate is in contact and squeezed with the coating roller 427, a piston accessory 424 is provided in the present embodiment, and the piston accessory 424 includes a spring four 4241, a piston 4242, a sealing plug 4243 and a push rod 4244. A push rod 4244 is installed on the side wall of the storage tank 422, and a spring four 4241 is provided on the push rod 4244. A piston 4242 is provided at the end of the push rod 4244. The cross-section of the piston 4242 is a trapezoidal structure. The piston 4242 is located in the feed trough 426, and a sealing plug 4243 is installed in the feed trough 426. The sealing plug 4243 and the piston 4242 are sealed and connected.
[0066] During actual use, when the photomask substrate squeezes the coating roller 427, the feed frame 425 moves into the storage tank 422, causing the spring four 4241 to shrink and deform, and the piston 4242 at the end of the push rod 4244 is separated from the sealing plug 4243, so that the organic solvent flows from the feed trough 426 into the coating roller 427. When the surface of the photomask substrate is coated, the photomask substrate continues to move upward with the sliding frame 32, and the photomask substrate is separated from the coating roller 427. At this time, the spring four 4241 is reset, and a sealed connection is formed between the piston 4242 and the sealing plug 4243 to prevent the organic solvent from continuously flowing out, thereby preventing the organic solvent from being wasted.
[0067] Reference Figure 4-Figure 6 The smear roller 427 includes a smear barrel 4271, an annular sponge pad 4272 and a sleeve 4273. The sleeve 4273 is installed between the two feed racks 425. A notch is provided in the middle of the sleeve 4273. The interior of the sleeve 4273 is connected with the feed trough 426. The outer end of the sleeve 4273 is installed with a smear barrel 4271 through a bearing. Through holes are evenly provided on the smear barrel 4271. An annular sponge pad 4272 is provided at the outer end of the smear barrel 4271.
[0068] During actual use, the organic solvent flows out through the gap in the middle of the sleeve 4273. When the through hole on the smear tube 4271 rotates to the gap on the outside of the sleeve 4273, the organic solvent flows out through the through hole into the inside of the annular sponge pad 4272. When the photomask substrate squeezes the annular sponge pad 4272, the organic solvent can be accurately smeared on the surface of the photomask substrate.
[0069] It should be noted that, in the process of applying the organic solvent to the surface of the photomask substrate, the annular sponge pad 4272 can store and collect the organic solvent to prevent excess organic solvent from dripping and also avoid scratching the surface of the photomask substrate.
[0070] Reference Figure 2 , Figure 4 , Figure 8 and Fig. 9In order to remove the organic solvent coated on the surface of the photomask substrate, a scraping unit 43 is provided in the present embodiment, and the scraping unit 43 includes a rectangular frame 431, a scraping frame 432, an arc groove 433, a scraper 434 and a discharge pipe 435. The rectangular frame 431 is installed in the middle of the U-shaped frame 41, and the scraping frame 432 is evenly installed on the rectangular frame 431 by screws. The scraping frame 432 is arranged to be tilted downward, and the cross-section of the scraping frame 432 is a C-shaped structure. The scraping frame 432 is provided with an arc groove 433 inside, and a scraper 434 is installed at the upper end of the inner side of the scraping frame 432. A collecting groove is provided at the lower end of the rectangular frame 431. The arc groove 433 is connected to the collecting groove through a vertical groove. The vertical groove is opened on the inner wall of the rectangular frame 431, and a discharge pipe 435 is installed on the outer wall of the rectangular frame 431, and the discharge pipe 435 is connected to the collecting groove.
[0071] During actual use, when the photomask substrate moves to the inner side of the rectangular frame 431 with the sliding frame 32, the scraper 434 scrapes the organic solvent on the surface of the photomask substrate, and the scraped organic solvent falls into the arc groove 433. The inclined arc groove 433 can guide the organic solvent, so that the organic solvent flows into the collection groove through the vertical groove, and the organic solvent in the collection groove is collected and processed through the discharge pipe 435.
[0072] It should be noted that when scraping off the organic solvent on the surface of the photomask substrate, the scraping frame 432 with a C-shaped cross-section can ensure that the scraped off organic solvent successfully enters the arc groove 433, which is beneficial to the subsequent collection and treatment of the organic solvent.
[0073] Reference Figure 8 and Fig. 9 In order to accurately scrape off the organic solvent on the surface of the photomask substrate, a scraper 434 is provided in this embodiment. The scraper 434 has a conical cross-section and is made of rubber. Baffle rods are evenly arranged on the inner side of the scraper 434, and the length of the baffle rods gradually increases from the outside to the inside.
[0074] During actual use, the scraper 434 with a conical cross-section can more effectively scrape off the organic solvent on the surface of the photomask substrate. The scraper 434 made of rubber can prevent the photomask substrate from being scratched during the scraping process. The baffle rods evenly arranged on the inner side of the scraper 434 can guide the organic solvent and prevent the organic solvent from accumulating on the side of the scraper 434, so that the organic solvent can fall into the arc groove 433 along the baffle rod.
[0075] Reference Figure 2 , Figure 4 and Figure 7In order to clean the surface of the photomask substrate after the organic solvent is scraped, a cleaning unit 44 is provided in the present embodiment, and the cleaning unit 44 includes a cleaning frame 441, an empty slot 442, a cleaning roller 443 and an air inlet duct 444. The cleaning frame 441 is installed at the upper end of the U-shaped frame 41, and the cleaning frame 441 is provided with an empty slot 442. An air inlet duct 444 is installed on the outer wall of the cleaning frame 441, and the air inlet duct 444 is connected to the empty slot 442. Cleaning rollers 443 are evenly installed on the inner side of the cleaning frame 441, and a wiping cloth is provided at the outer end of the cleaning roller 443. Air jets are evenly provided between the cleaning rollers 443, and the air jets are connected to the empty slot 442.
[0076] During actual use, when the photomask substrate moves to the inner side of the cleaning frame 441 with the sliding frame 32, the wiping cloth arranged at the outer end of the cleaning roller 443 cleans the surface of the photomask substrate, so that the organic solvent that has not been completely scraped off can be accurately removed. At the same time, the air jets evenly arranged between the cleaning rollers 443 blow air evenly on the surface of the photomask substrate, so that the surface of the photomask substrate remains dry, which is beneficial to the subsequent loading of the photomask substrate.
[0077] It should be noted that the empty slot 442 is connected to high-pressure gas through the air inlet pipe 444. When the photomask substrate moves to the inner side of the cleaning frame 441 along with the sliding frame 32, the high-pressure gas in the empty slot 442 is ejected through the jet nozzle. When the photomask substrate continues to move upward along with the sliding frame 32 and the cleaning frame 441, the jet nozzle is closed.
[0078] The implementation principle of this embodiment is:
[0079] 1: Loading of the photomask substrate, the telescopic cylinder 33 drives the suction frame 34 to move to the left, the suction frame 34 adsorbs the surface of the photomask substrate, and then the sliding frame 32 drives the photomask substrate to move upward along the slide rail 31. After the surface of the photomask substrate is cleaned, the sliding frame 32 drives the photomask substrate to continue to move upward, thereby realizing the loading function of the photomask substrate.
[0080] 2: Cleaning the surface of the photomask substrate. The sliding frame 32 drives the photomask substrate to move slowly upward. The coating unit 42 first coats the organic solvent on the surface of the photomask substrate. The scraping unit 43 then scrapes off the organic solvent coated on the surface of the photomask substrate. Then, the cleaning unit 44 blows and cleans the organic solvent remaining on the surface of the photomask substrate.
[0081] The embodiments of this specific implementation method are all preferred embodiments of the present invention, and are not intended to limit the protection scope of the present invention. Therefore, any equivalent changes made based on the structure, shape, and principle of the present invention should be included in the protection scope of the present invention.
Claims
1. An intelligent loading tool for photomask substrate processing, comprising a fixing frame (1), a loading module (2), a lifting module (3) and a cleaning module (4), characterized in that: The fixed frame (1) is a U-shaped structure, a loading module (2) is installed at the lower end of the fixed frame (1), a lifting module (3) is symmetrically installed inside the fixed frame (1), and the lifting module (3) is arranged diagonally, and a cleaning module (4) is symmetrically installed in the middle of the fixed frame (1), and the cleaning module (4) is arranged diagonally; The feeding module (2) comprises a circular frame (21), a cover (22), a material baffle plate (23), a spring 1 (24), a telescopic slot (25), a spring 2 (26) and a telescopic rod (27). The circular frame (21) is mounted on a fixed frame (1). The left end of the circular frame (21) is mounted with a cover (22) by screws. A material baffle plate (23) is arranged inside the circular frame (21). A spring 1 (24) is symmetrically connected between the cover (22) and the material baffle plate (23). Telescopic slots (25) are evenly arranged on the inner wall of the right end of the circular frame (21). A telescopic rod (27) is arranged inside the telescopic slot (25). The end of the telescopic rod (27) is an arc-shaped smooth surface. A spring 2 (26) is connected between the telescopic rod (27) and the inner wall of the telescopic slot (25). A sponge pad is symmetrically arranged at the right end of the circular frame (21). The lifting module (3) comprises a slide rail (31), a sliding frame (32), a telescopic cylinder (33), a material suction frame (34) and a connecting rod (35); the slide rail (31) is symmetrically mounted on the side wall of the fixed frame (1); the sliding frame (32) is mounted on the slide rail (31); the telescopic cylinder (33) is mounted on the inner side of the sliding frame (32); the material suction frame (34) is mounted on the top of the telescopic cylinder (33); and the connecting rod (35) is symmetrically connected between the two sliding frames (32); The cleaning module (4) comprises a U-shaped frame (41), a coating unit (42), a scraping unit (43) and a cleaning unit (44); the U-shaped frame (41) is mounted on a side wall of the fixed frame (1); the coating unit (42), the scraping unit (43) and the cleaning unit (44) are sequentially mounted in the U-shaped frame (41) from bottom to top; the inner side surfaces of the coating unit (42), the scraping unit (43) and the cleaning unit (44) are flush; The scraping unit (43) comprises a rectangular frame (431), a scraping frame (432), an arc-shaped groove (433), a scraper (434) and a discharge pipe (435), wherein the rectangular frame (431) is mounted in the middle of the U-shaped frame (41), the scraping frame (432) is evenly mounted on the rectangular frame (431) by means of screws, the scraping frame (432) is arranged to be tilted downward, the cross section of the scraping frame (432) is a C-shaped structure, the scraping frame (432) is provided with an arc-shaped groove (433) inside, the scraping frame (432) is provided with a scraper (434) at the upper end of the inner side, the rectangular frame (431) is provided with a collecting groove at the lower end, the arc-shaped groove (433) is connected to the collecting groove via a vertical groove, the vertical groove is provided on the inner wall of the rectangular frame (431), the discharge pipe (435) is mounted on the outer wall of the rectangular frame (431), and the discharge pipe (435) is connected to the collecting groove; The scraper (434) has a conical cross-section. The scraper (434) is made of rubber. Baffle bars are evenly arranged on the inner side of the scraper (434). The length of the baffle bars gradually increases from the outside to the inside. The scraper (434) having a conical cross-section effectively scrapes off the organic solvent on the surface of the photomask substrate. The scraper (434) made of rubber prevents the photomask substrate from being scratched during the process of scraping the surface of the photomask substrate. The baffle rods evenly arranged on the inner side of the scraper (434) play a role in guiding the organic solvent, preventing the organic solvent from accumulating on the side of the scraper (434), so that the organic solvent falls into the arc groove (433) along the baffle rods.
2. The intelligent loading tool for photomask substrate processing according to claim 1, characterized in that: The suction frame (34) comprises an inclined slot frame (341), a triangular protrusion (342), a spring (343), a suction plate (344), an iron sheet (345) and an electromagnet (346); the end of the telescopic cylinder (33) is connected to the inclined slot frame (341); the lower end of the inclined slot frame (341) is evenly provided with triangular protrusions (342); the upper end of the inclined slot frame (341) is provided with an inclined slot; the inclined slot frame (341) is provided with a suction plate (344); the suction plate (344) is provided in the inclined slot frame (341); ) has an upper end that is slidably matched with the inclined groove, a guide groove that is slidably matched with the triangular protrusion (342) is provided at the lower end of the suction plate (344), negative pressure suction holes are evenly arranged on the suction plate (344), spring three (343) is symmetrically connected between the suction plate (344) and the inner wall of the inclined groove frame (341), an iron sheet (345) is provided on the inner wall of the suction plate (344), an electromagnet (346) is provided on the inner wall of the inclined groove frame (341), and the iron sheet (345) cooperates with the electromagnet (346).
3. The intelligent loading tool for photomask substrate processing according to claim 1, characterized in that: The smearing unit (42) comprises a material storage rack (421), a material storage trough (422), a feed pipe (423), a piston accessory (424), a material delivery rack (425), a material delivery trough (426) and a smearing roller (427). The material storage rack (421) is installed at the lower end of the interior of the U-shaped rack (41). The material storage trough (422) is arranged in the material storage rack (421). The piston (4242) and the accessory (424) are symmetrically installed in the material storage trough (422). The outer wall of the material storage rack (421) is A feed pipe (423) is installed on the upper side, and the feed pipe (423) is connected to the material storage trough (422). A feed rack (425) is symmetrically installed on the right end of the material storage rack (421). The feed rack (425) and the material storage rack (421) are slidably connected. Coating rollers (427) are installed on the two material feeding racks (425) through bearings. A feed trough (426) is arranged in the material feeding rack (425), and the coating roller (427) is connected to the material storage trough (422) through the feed trough (426).
4. The intelligent loading tool for photomask substrate processing according to claim 3, characterized in that: The piston accessory (424) comprises a spring four (4241), a piston (4242), a sealing plug (4243) and a push rod (4244); a push rod (4244) is installed on the side wall of the material storage trough (422); a spring four (4241) is arranged on the push rod (4244); a piston (4242) is arranged at the end of the push rod (4244); the cross section of the piston (4242) is a trapezoidal structure; the piston (4242) is located in the material delivery trough (426); a sealing plug (4243) is installed in the material delivery trough (426); and the sealing plug (4243) and the piston (4242) are sealedly connected.
5. The intelligent loading tool for photomask substrate processing according to claim 3, characterized in that: The smear roller (427) comprises a smear tube (4271), an annular sponge pad (4272) and a sleeve (4273); the sleeve (4273) is installed between two material conveying racks (425); a notch is provided in the middle of the sleeve (4273); the interior of the sleeve (4273) is connected to the material conveying trough (426); the smear tube (4271) is installed on the outer end of the sleeve (4273) via a bearing; through holes are evenly provided on the smear tube (4271); and an annular sponge pad (4272) is provided on the outer end of the smear tube (4271).
6. The intelligent loading tool for photomask substrate processing according to claim 1, characterized in that: The cleaning unit (44) comprises a cleaning frame (441), an empty slot (442), a cleaning roller (443) and an air intake duct (444); the cleaning frame (441) is mounted on the upper end of the U-shaped frame (41); the cleaning frame (441) is provided with an empty slot (442); an air intake duct (444) is mounted on the outer wall of the cleaning frame (441); the air intake duct (444) is connected to the empty slot (442); cleaning rollers (443) are evenly mounted on the inner side surface of the cleaning frame (441); a wiping cloth is provided at the outer end of the cleaning roller (443); air jets are evenly arranged between the cleaning rollers (443); the air jets are connected to the empty slot (442).
Citation Information
Patent Citations
Feeding device of base plate
CN218478180U
Blue film chip film pouring equipment
CN116344422A