Method and device for displaying associated information of micro-nano machining platform

Abstract

The invention provides an associated information display method and device of a micro-nano machining platform. The method comprises the steps that personnel label information in a first equipment target area is acquired; according to the personnel label information, displaying equipment operation information in a target area or sending the equipment operation information to equipment carried by the personnel; the equipment operation information comprises operation information of the first equipment and associated equipment operation information of the first equipment. Through the associated information display method, the operation information of the first equipment directly observed by personnel and the operation information of the associated equipment which cannot be directly observed are cooperatively displayed, the limitation of the platform equipment space is broken through, and the global operation condition of the equipment in the micro-nano machining platform and the effect of the specific equipment on the micro-nano machining platform can be quickly and intuitively known.

Description

Technical Field

[0001] The present invention relates to the field of semiconductor processing, and in particular to a method and device for displaying correlation information of a micro-nano processing platform. Background Art

[0002] The semiconductor micro-nano processing platform includes a large number of precision process equipment (including photolithography equipment, etching equipment, deposition equipment, etc.) and auxiliary equipment that provides a processing environment for the precision process equipment (including air conditioning exhaust system, pure water system, cold water system, power system, etc.). Usually, the precision process equipment and auxiliary equipment in the micro-nano processing platform are set in different spatial areas. During equipment maintenance or use, only the current operating status of the equipment can be understood, and during equipment failure or inspection, the equipment data is usually displayed in the form of a list. The staff or equipment users cannot understand the overall real-time information of the micro-nano processing platform, which is not conducive to the staff's maintenance of the whole plant equipment of the micro-nano processing platform or the users' understanding of the overall process flow of micro-nano processing.

[0003] In addition, the micro-nano processing platform is open to multiple types of personnel, including maintenance personnel, equipment users, teaching personnel, etc. Each type of personnel has different usage of each device in the micro-nano processing platform. The existing micro-nano processing platform will push the same equipment information to each type of personnel, and the information push is not targeted. Summary of the invention

[0004] Based on this, the present invention provides a method and device for displaying related information of a micro-nano processing platform, which pushes specific equipment operation information based on the tag information of personnel in the target area where the micro-nano processing platform equipment is located. The equipment operation information includes the equipment information within the range where the personnel are located and the operation information of related equipment, so that the micro-nano processing platform can accurately and comprehensively push equipment operation information to personnel.

[0005] In a first aspect, the present invention provides a method for displaying associated information of a micro-nano processing platform, comprising:

[0006] Acquire tag information of people in the target area of ​​the first device;

[0007] Displaying or sending device operation information to devices carried by personnel in a target area according to the personnel tag information;

[0008] The device operation information includes operation information of a first device and operation information of devices associated with the first device.

[0009] In a second aspect, the present invention further provides a device for displaying associated information of a micro-nano processing platform, comprising:

[0010] An information acquisition module, used to acquire tag information of people in a target area where the first device is located;

[0011] The information display module is used to display or send device operation information to the device carried by the personnel in the target area according to the personnel tag information; the device operation information includes the operation information of the first device and the operation information of the associated devices of the first device.

[0012] In a third aspect, the present invention further provides a method for predicting the yield rate of process equipment of a micro-nano processing platform, comprising:

[0013] Obtain the real-time operation information, historical operation information, and historical yield of samples corresponding to the historical operation information of the process equipment, the historical operation information of the preceding process equipment, and the real-time operation information and historical operation information of the associated auxiliary equipment;

[0014] Combining the historical operation information of the process equipment and the historical yield of the sample corresponding to the historical operation information, the first historical operation information of the preceding process equipment related to the historical operation information of the process equipment, and the historical operation information of the associated auxiliary equipment into a process equipment historical data set;

[0015] Dividing the process equipment historical data set into a first training set and a second validation set, respectively inputting the first deep learning network into a preset first deep learning network to obtain a trained first deep learning network;

[0016] The real-time operation information of the process equipment, the second historical operation information of the previous process equipment and the real-time operation information of the associated auxiliary equipment are input into the trained first deep learning network to obtain the sample predicted yield of the current process equipment.

[0017] In a fourth aspect, the present invention further provides a sample error backtracking method for a micro-nano processing platform, comprising:

[0018] Obtaining real-time operation information of process equipment, second historical operation information of related preceding process equipment, and real-time operation information of related auxiliary equipment;

[0019] Compare whether the real-time operation information of the process equipment exceeds the second threshold range, whether the second historical operation information of the preceding process equipment exceeds the third threshold range, and whether the real-time operation information of the associated auxiliary equipment exceeds the fourth threshold range;

[0020] If the real-time operation information of the process equipment exceeds a second threshold range, the sample error may be related to process equipment parameters;

[0021] If the second historical operation information of the preceding process equipment exceeds the third threshold range, the sample error may be related to the preceding process parameters;

[0022] If the real-time operation information of the associated auxiliary device exceeds a fourth threshold range, the sample error may be related to a parameter of the associated auxiliary device.

[0023] In a fifth aspect, the present invention further provides a computer-readable storage medium having a computer program stored thereon, wherein when the computer program is executed by a processor, the steps of the method for displaying associated information of any one of the micro-nano processing platforms in the first aspect are implemented.

[0024] In a sixth aspect, the present invention further provides a computer device, comprising a memory and a processor, wherein the memory stores a computer program, and when the processor executes the computer program, it executes the method for displaying associated information of any micro-nano processing platform in the first aspect.

[0025] The beneficial effects of adopting the above technical scheme are as follows: the present invention pushes the operation information of the current equipment and the operation information of the associated equipment related to the current equipment to the personnel through label recognition of the personnel in the target area, which can not only break the dilemma that the equipment in the micro-nano processing platform is widely distributed and is unable to timely and comprehensively understand the global operation status of the equipment in the platform due to space limitations, but also enable the personnel to quickly and intuitively understand the operation information of all associated equipment of the current equipment in the entire micro-nano processing platform, which is conducive to the personnel to fully understand the micro-nano processing process during the equipment learning process, or to quickly locate the cause of equipment failure or experimental error during equipment maintenance and error analysis, which is conducive to the personnel to understand the operation status of the equipment in the overall environment of the micro-nano processing platform; and the equipment operation information is accurately pushed in combination with the label information of the personnel, reducing the push of unnecessary information, so that the pushed equipment operation information is more targeted.

[0026] Furthermore, the present invention can also push historical operation information of previous process equipment, so that platform users can quickly locate the process equipment that causes errors when errors occur in processing samples, and can adjust the sample process or maintain the equipment in time.

[0027] In addition, the present invention can also push the processing yield of each process equipment to the platform users according to the yield feedback of the samples, so as to remind the users so that they can adjust the process plan or maintain the equipment in time. BRIEF DESCRIPTION OF THE DRAWINGS

[0028] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the drawings required for use in the embodiments or the description of the prior art are briefly introduced below.

[0029] Figure 1 This is a schematic diagram of a method for displaying associated information of a micro-nano processing platform in one embodiment of the present application;

[0030] Figure 2This is a schematic diagram of the process equipment area and auxiliary equipment area of ​​the micro-nano processing platform in one embodiment of the present application;

[0031] Figure 3 A schematic diagram briefly showing the equipment information and associated equipment information of the second target area of ​​the micro-nano processing platform in one embodiment of the present application;

[0032] Figure 4 A schematic diagram showing in detail the equipment information and associated equipment information of the first target area of ​​the micro-nano processing platform in one embodiment of the present application;

[0033] Figure 5 A schematic diagram of the connection between process equipment and between process equipment and auxiliary equipment in a micro-nano processing platform in one embodiment of the present application;

[0034] Figure 6 A schematic diagram showing that process equipment information in one embodiment of the present application includes associated auxiliary equipment information and preceding process equipment information;

[0035] Figure 7 A schematic diagram showing the warning information of the associated device and the current operating status of the associated device in the event of a device failure in one embodiment of the present application;

[0036] Figure 8 It is a schematic diagram of a related information display device of a micro-nano processing platform in one embodiment of the present application. DETAILED DESCRIPTION

[0037] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments in the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention. In order to explain the present invention in more detail, the associated information display method and device of the micro-nano processing platform provided by the present invention are specifically described below in combination with the drawings.

[0038] Unless otherwise defined, the technical terms or scientific terms used in the disclosure of this application should be understood by people with ordinary skills in the field to which the present invention belongs. The "first", "second" and similar words used in the present invention do not indicate any order, quantity or importance, but are only used to distinguish different components. Similarly, similar words such as "one", "one" or "the" do not indicate a quantitative limit, but indicate that there is at least one. Similar words such as "include" or "include" mean that the elements or objects appearing in front of the word cover the elements or objects listed after the word and their equivalents, without excluding other elements or objects. Similar words such as "connect" or "connected" are not limited to physical or mechanical connections, but can include electrical connections, whether direct or indirect. "Up", "down", "left", "right" and the like are only used to indicate relative positional relationships. When the absolute position of the described object changes, the relative positional relationship can also change accordingly.

[0039] As attached Figure 2 As shown, the micro-nano processing platform includes semiconductor process equipment and auxiliary equipment, wherein the semiconductor process equipment includes plate-making equipment, photolithography equipment, etching equipment, deposition equipment, bonding equipment and measurement equipment; auxiliary equipment is generally not set in the environment where the semiconductor process equipment is located because there is no requirement for environmental cleanliness. It is usually displayed in the lower layer of the process equipment, the building layer, the ash layer and other areas in the form of indoor equipment or pipelines, including cold water system, power system, air conditioning exhaust system, wastewater system, gas supply system, process exhaust system, pure water system and chemical supply system. In the micro-nano processing platform, the processing sample generally has a set process processing plan, and the processing sample is sent to different semiconductor process equipment in the designed order to obtain the processed sample.

[0040] In this regard, the present invention provides a method for displaying associated information of a micro-nano processing platform, which pushes specific equipment operation information based on the tag information of the display equipment or personnel in the area. The equipment operation information includes equipment information and operation information of associated equipment, so that the micro-nano processing platform can accurately and comprehensively push equipment operation information to personnel. This method is applied to a terminal device as an example for explanation. Figure 1 A schematic diagram of a method for displaying associated information of a micro-nano processing platform is shown.

[0041] The embodiment of the present application provides an application scenario of the method for displaying the associated information of a micro-nano processing platform, and the application scenario includes the terminal device provided in the embodiment, and the terminal device includes but is not limited to a smart phone and a computer device, wherein the computer device can be at least one of a desktop computer, a portable computer, a laptop computer, a large computer, a tablet computer, etc. The user operates the terminal device to push the operation information of the device and the associated devices to the user of the micro-nano processing platform. For the specific process, please refer to the embodiment of the method for displaying the associated information of the micro-nano processing platform.

[0042] [First embodiment]

[0043] In view of the above-mentioned defects of the prior art, the present invention provides a method for displaying associated information of a micro-nano processing platform, comprising:

[0044] Step S101, obtaining the tag information of people in the target area of ​​the first device.

[0045] Specifically, the first equipment includes process equipment and auxiliary equipment of the micro-nano processing platform, wherein the process equipment includes platemaking equipment, lithography equipment, etching equipment, deposition equipment, bonding equipment or measurement equipment, and the auxiliary equipment includes cold water system, power system, air conditioning exhaust system, wastewater system, gas supply system, process exhaust system, pure water system and chemical supply system.

[0046] The target area of ​​the first device is an area whose distance from the first device is less than a first threshold, and can be set in an electronic fence. When a person is in the target area, it can be regarded as the person needing to obtain the device operation information of the first device for operation, maintenance or teaching.

[0047] There are three types of personnel who enter the micro-nano processing platform, namely, equipment users, equipment maintenance personnel, and equipment teaching personnel. Personnel who enter the micro-nano processing platform wear tags to identify the specific type of personnel and the personnel's ID information. The form of the tag includes but is not limited to QR code tags, Bluetooth tags, UWB tags, and RFID tags. The personnel's ID information includes but is not limited to personnel identity ID, personnel level, and personnel operation authority.

[0048] Step S102: displaying or sending device operation information to the device carried by the person in the target area according to the person tag information; the device operation information includes the operation information of the first device and the operation information of the associated devices of the first device.

[0049] Specifically, the equipment operation information can be displayed to the personnel entering the target area in a targeted manner according to the personnel type and ID information in the personnel tag information. Unlike the prior art in which only the operation information of the first device seen by the personnel is displayed, the equipment operation information displayed in this embodiment also includes the operation information of the associated devices with the first device. The display of the operation information of the associated devices can help the personnel understand the operation status of the first device more comprehensively, and more clearly understand the role of the first device in the micro-nano processing platform and the correlation with other devices, and can more accurately operate or maintain the first device in combination with the operation information of the associated devices.

[0050] In this embodiment, the devices displayed in the area include display devices, including but not limited to displays and VR display devices connected to the first device signal, and the devices carried by the personnel include mobile communication devices and wearable devices, wherein the mobile communication devices include but are not limited to mobile phones and tablets, and the wearable devices include but are not limited to AR glasses, AR helmets and smart watches. In specific implementation, a plurality of information anchor points are set in the first device. When the device carried by the personnel adopts a mobile communication device and a wearable device, the information anchor point is used to exchange information with the device carried by the personnel, so as to send the operation information of the device to the device carried by the personnel for display.

[0051] In this embodiment, when a person enters the target area of ​​the first device, the tag information corresponding to the person is obtained, and then the device operation information of the first device is displayed to the person based on the category and ID information corresponding to the person's tag information. The device operation information provides the person with device operation information or related information for performing operations, maintenance or teaching on the first device, and is displayed according to the configuration of the laboratory. In some laboratories, information is displayed through communication equipment and wearable devices, and in some laboratories, information is displayed or projected through display devices in specific areas.

[0052] In this embodiment, by identifying the tag information of personnel in the target area of ​​the first device, the equipment operation information of the first device can be displayed to the personnel in a targeted manner, and the equipment operation information includes not only the equipment operation information of the first device, but also the operation information of associated equipment related to the first device. The combination of the two is displayed to the personnel entering the target area, which is more conducive to the personnel understanding the specific functions of the first device in the micro-nano processing platform, and the impact of the normal operation of the first device on the normal operation of other devices in the micro-nano processing platform, so that the personnel have a more global consideration of the equipment operation information of the first device.

[0053] [Second embodiment]

[0054] On the basis of the first embodiment, further improvements are made in combination with the distance between the person and the first device. Different specific information is displayed depending on the distance between the person and the first device. When the person is far away from the first device, it can be regarded that the person only needs to understand simple device information. When the person is close to the first device, it can be regarded that the person needs to operate or learn the device, and more detailed device information is displayed.

[0055] Specifically, in this embodiment, the target area of ​​the first device includes a first target area and a second target area, wherein the distance between the first target area and the first device is smaller than the distance between the second target area and the first device; that is, the first target area is closer to the area of ​​the first device. Figure 4 As shown in FIG. 1 , when a person enters the first target area, it can be regarded as a task for the person to operate, maintain or teach the first device. At this time, it is necessary to obtain detailed device operation information of the first device, such as whether the first device is operating normally, specific parameter values ​​during operation, or specific teaching steps for operating the first device and various precautions; as shown in FIG. Figure 3 As shown, when a person enters the second target area, it can be considered that the person only needs to understand the operations that can be performed by the first device or whether the device is currently in normal operation or faulty state. At this time, only simple equipment operation information of the first device needs to be obtained, such as displaying the name of the first device, the executable processes, or whether the current operating status of the first device is normal or faulty.

[0056] It should be noted that one of the contributions of this embodiment over the prior art is that the equipment operation information displayed in the first target area or the second target area based on the personnel tag information, or sent to the equipment carried by the personnel entering the area, is not only the operation information of the current equipment, but also not only the operation information of the equipment in this laboratory; here, this embodiment will display the operation information of the current equipment and the operation information of the associated equipment of the current equipment based on the personnel tag information, so that the user can understand the operation information of the associated equipment across regions or laboratories, or the operation information of the equipment related to the experiment executed by the current device in real time based on the current device.

[0057] [Third embodiment]

[0058] Based on the first embodiment, the displayed associated device operation information is further limited. Figure 5The schematic diagram of the relationship between the process equipment of the micro-nano processing platform and between the process equipment and auxiliary equipment shown in the figure shows that in a large-scale equipment cluster with complex equipment operation and advanced technology, such as the micro-nano processing platform equipment established by the applicant, when conducting equipment management or experimental management, the diversity of process equipment and the complexity of process design must be taken into account. During the specific operation of the equipment or the execution of the experiment, it is necessary to adjust the specific process equipment operating parameters in the experimental process design and the operating steps of different experimental processes according to the different patterns, materials, sizes, structures, and precisions of the experimental process design.

[0059] During the experiment of the micro-nano processing platform, each process step is closely linked. For example, in an experimental process design, multiple steps such as abcd need to be executed on the same device or different devices of the platform. During the execution process, the execution result of step a will affect the subsequent steps b, c, and d, and may also affect the associated equipment. Similarly, the execution result of step b will affect the subsequent step c or step d or the associated equipment, and the execution result of step c will affect the subsequent step d or the associated equipment. At the same time, during the execution of the process steps, the call to the equipment or the execution order of the experimental steps may be embodied in the form of bcdabcd, abcabd, abab cycle or abac cycle. During the cycle, the parameters of a certain execution step or process step may change. Even if the change in the parameters of the equipment or process step is very slight, it will affect the final experimental results, and even cause the final experimental results to exceed the preset range.

[0060] Based on the above situation, in an experimental process, a sample needs to be transferred between multiple process devices. These process devices have mutual influence on the final experimental results. In the above embodiment, the first device is a process device, and the device associated with the first device is a preceding process step device or a subsequent process step device associated with the process step performed by the first device. Figure 6As shown, the personnel using the platform equipment can obtain the real-time operation information of the first equipment, and follow up the historical operation information of the previous process equipment associated with the process step executed by the first equipment to trace the deviation results of the operation sample, or make predictions based on the current operation information or historical operation information of the subsequent process equipment associated with the process step executed by the first equipment, and make predictions based on the predicted operation status of the subsequent process equipment to determine whether the subsequent process step can operate normally and adjust the experimental plan or process step parameters. Specifically, when a certain experimental parameter of process equipment A in the micro-nano processing platform is set high, it may affect the deviation of the experimental results of subsequent process equipment BCD; or in a process flow that needs to go through process equipment ABCDEF in sequence, the parameters of process equipment B are abnormal, resulting in deviations in the experimental results of process equipment F.

[0061] In view of the fact that the parameters of the preceding process equipment or subsequent process equipment affect the experimental results or experimental plans, real-time tracking or prediction of experimental related equipment becomes very important. After the platform staff enters the target area, the relevant information of the preceding process equipment or subsequent process equipment related to the current process equipment can be provided according to their label information, so that the equipment management and experimental process management of the large-scale equipment experimental platform can be completed more purposefully or more efficiently. The specific implementation steps are as follows:

[0062] When the first device is a process device of a micro-nano processing platform, the device operation information includes the first real-time operation information of the process device and the historical operation information of the preceding process device during the preceding processing of the sample in the process device, or the first real-time operation information of the process device and the predicted operation information of the subsequent process device during the subsequent processing of the sample processed in the process device. When it is necessary to track the samples operated in the device in real time, the displayed device operation information includes the first real-time operation information of the process device and the historical operation information of the preceding process device during the preceding processing of the sample in the process device; for example, the sample needs to be processed by process devices ABCDEF, and when the sample is in process device C, and the information of the sample needs to be tracked in real time, the real-time operation information of process device C and the historical operation information of the preceding process device AB during the preceding processing of the sample are displayed. Similarly, when it is necessary to make a prediction on the sample operating in the equipment, the displayed equipment operation information includes the first real-time operation information of the process equipment and the predicted operation information of the subsequent process equipment in the subsequent processing of the sample processed in the process equipment; for example, the sample needs to be processed by process equipment ABCDEF. When the sample is in process equipment C and the information of the sample needs to be predicted, the real-time operation information of process equipment C and the predicted operation information of the subsequent process equipment DEF of the sample in the subsequent processing are displayed.

[0063] It should be noted that since the sample may undergo different process steps on the same process equipment during the sample processing, the preceding process equipment or subsequent process equipment discussed here includes, in addition to the first equipment that is performing sample processing, the first equipment that performs the preceding process step and the first equipment that performs the subsequent process step.

[0064] Regarding the historical operation information of the preceding process equipment, it should be noted that, based on the label information on the operating sample in the first device, the preceding process equipment information of the sample during the preceding processing is obtained, wherein the preceding process equipment information includes the name or number of the preceding process equipment, the first moment when the sample enters the preceding process equipment and the second moment when the sample leaves the preceding process equipment, and the equipment parameter information of the preceding equipment during the preceding processing of the sample is obtained in combination with the above preceding process equipment information, and the preceding process equipment information and the equipment parameter information together constitute the historical operation information of the preceding process equipment.

[0065] On the basis of displaying the historical operation information of the preceding process equipment, the historical operation information can also be judged before the equipment operation information is displayed. If the historical operation information exceeds the rated range of the preceding process step, a prompt information can be added during the display of the relevant equipment operation information to remind the staff that the experimental result deviation is related to the preceding process step exceeding the rated range, providing accurate error analysis direction for the staff in the experimental result analysis process, and improving the efficiency of experimental result analysis. For example, the staff enters the target area of ​​equipment C. At this time, equipment C processes sample I, but equipment B processes sample I in the previous period. At this time, the historical operation information of equipment B during the processing of sample I during equipment B is obtained. For example, during the processing of equipment I, the operating temperature of equipment B exceeds the rated range of the equipment. At this time, during the display of the equipment operation information of equipment C, in addition to displaying the real-time operation information of equipment C, the historical operation information of equipment B during the processing of sample I during equipment B is also displayed, and a prompt information "the operating temperature of equipment B during the processing of sample I is abnormal" is added to remind the staff that if the experimental result deviation of sample I occurs, the error analysis can be performed based on the historical operation information of equipment B.

[0066] Regarding the predicted operation information of subsequent process equipment, it should be noted that, based on the label information on the operating sample in the first device, the subsequent process equipment information of the sample during the subsequent processing is obtained, wherein the subsequent process equipment information includes the name or number of the subsequent process equipment, the third moment when the sample enters the subsequent process equipment, and the sample, and combined with the above-mentioned subsequent process equipment information to obtain the real-time parameter information of the subsequent process equipment during the subsequent processing of the sample, and based on the real-time parameter information of the subsequent process equipment and the historical parameter data set, the predicted operation parameters of the subsequent process equipment at the third moment are obtained, and combined with the predicted operation parameters at the third moment, it is judged whether the sample can be processed normally in the subsequent process equipment, and the parameters of the subsequent process equipment or the experimental plan are adjusted in time.

[0067] For example, a staff member enters the target area of ​​device c. At this time, device c processes sample I, and at a later moment, device d processes sample I. At this time, the real-time parameter information of device d is obtained, and the parameter information of device d at the later moment is predicted in combination with the historical parameter information of device d stored in the cloud or server to obtain the predicted operating parameters of device d at the later moment. If the gas flow rate in the predicted operating parameters of device d at this time is much greater than the rated flow rate of normal operation of device d, the gas flow rate may affect the final experimental results of sample I. Then, in the display process of the device operation information of device c, in addition to displaying the real-time operating information of device c, the predicted operating parameters of device d are also displayed, and a prompt message "Device d predicts that the gas flow rate at the next moment is abnormal" is added to remind the staff to adjust the gas parameters of device d or adjust the subsequent experimental plan of sample I.

[0068] On the basis of the display of the predicted operation information of the subsequent process equipment, during the display of the predicted operation information of the subsequent process equipment information, the operation difficulty of the subsequent process equipment or the predicted yield of the sample can be prompted in combination with the final yield of the subsequent process equipment in the historical samples, providing a reference for the design of the experimental plan for the sample. Specifically:

[0069] The final yield rate set of multiple historical samples of the subsequent process equipment and the experimental level of the operator of the historical samples are obtained. If the average value or median of the final yield rate set is lower than the second threshold value, the yield rate prompt information of the subsequent process equipment is generated, and the yield rate prompt information includes the historical yield rate of the subsequent process and the experimental level of the operator. For example, if the average value of the final yield rate of multiple historical samples of the subsequent process equipment E is lower than 30%, and the experimental level of the operator of the historical samples is a senior experimenter, the yield rate prompt information of the subsequent process equipment is generated, "The final yield rate of the historical samples of equipment E is less than 30%, and the experimental level of the operator is a senior experimenter", so that the experimenters with high yield rate requirements or the middle and low-level experimenters can try to avoid using equipment E in the experimental plan design process, or increase the senior experimenters to guide the operation process of the sample in the equipment E, or adjust the specific parameters of the equipment E in the experimental plan, so as to improve the yield rate of the sample in the operation process of the equipment E.

[0070] In addition, in this embodiment, the tracking of samples circulating in different devices can be achieved in combination with the coded information on the sample, and the coded information includes a QR code or a barcode. Before and after each experimental step, it is necessary to scan the code to record the information of the sample. The information includes two categories, one is the equipment information of the current experiment (including equipment parameters, equipment health status, equipment operation and maintenance status, etc.), and the other is the log log of the current equipment used for the experiment, where the log log of each device is different. For example, for a coating and developing machine, the log log will record the type of photoresist, rotation speed, thickness, development time, development temperature, etc. In this way, the entire life cycle of the sample and the equipment information involved can be recorded and used for result analysis. Furthermore, if there are abnormalities in the current equipment parameters, equipment health status, and equipment operation and maintenance status, the highlight mark in the coded content can prompt the experimenter of possible situations.

[0071] On the other hand, in addition to the above-mentioned embodiment for the case where the associated equipment operation information displayed is the associated process equipment, the applicant also found in the process of managing the micro-nano processing platform that in the micro-nano processing platform, the auxiliary equipment is the basis and guarantee for supporting the semiconductor manufacturing process equipment, and the operating status of the auxiliary equipment is highly relevant to the smooth execution of the process equipment and the experimental tasks: for example, if the auxiliary equipment fails or is suspended, the process equipment may not work normally; if there is a problem with the auxiliary equipment, and the corresponding process equipment is not handled in time or there is a delay, it is likely to affect the stability of the equipment, and there will be safety hazards; when there is a potential risk or suspension plan of the auxiliary equipment, if it cannot be predicted or discovered in advance, and then the staff is reminded to adjust the process equipment or experimental tasks, it is likely to affect the stable operation of the process equipment or cause deviations in the experimental results; it is particularly important to note that in this embodiment, the association between the process equipment and the auxiliary equipment may be fixed, or it may be based on a specific experimental process, that is, the association between the process equipment and the auxiliary equipment may be dynamically generated or released.

[0072] It should be noted that auxiliary equipment is centrally supplied to process equipment, and there is a widespread situation of many-to-one, that is, multiple auxiliary equipment supplies one process equipment at the same time, such as the pure water system and the gas supply system supplying wet process equipment at the same time; there is also a large-scale one-to-many situation, that is, one auxiliary equipment supplies multiple process equipment at the same time, such as the power system supplies lithography equipment, platemaking equipment, measurement equipment, etc.; the above important auxiliary equipment is one-in-one and one-in-one. For example, the equipment that needs to exhaust gas is provided by the gas supply system, and the exhaust of toxic and harmful gases is very critical, so one-in-one and one-in-one are adopted. The exhaust equipment in this gas supply system usually adopts one-in-one and one-in-one. This requires that the operation and maintenance personnel of the auxiliary equipment need to have a lot of professional knowledge. They not only need to master the management experience of auxiliary equipment, but also need to have the knowledge reserve of process equipment, so that they can judge problems more accurately and quickly during operation and maintenance, analyze various possible causes of accidents, and propose corresponding solutions; correspondingly, for the users of process equipment, teaching participants, etc., on the one hand, they need to be familiar with the operation, control, and operation of process equipment, and on the other hand, they also need to immediately understand the operating information of auxiliary equipment related to the process equipment, so as to timely control the process equipment during use and adjust the process equipment or experimental progress when necessary.

[0073] In today's semiconductor industry, the operation and maintenance of each process equipment, even each process equipment and each auxiliary equipment, requires the accumulation of a large amount of theoretical knowledge and field experience. These combined experiences are difficult to record in real time and to impart quickly. As a result, it is difficult for such a complex and cutting-edge micro-nano processing platform to quickly obtain a large number of mature and sufficient laboratory maintenance personnel. In addition, a considerable number of professionals need to devote their energy to innovative process research and development, teaching, and testing, and their energy should not be wasted on the management and real-time monitoring of various equipment.

[0074] In view of this, based on the embodiment of the micro-nano processing platform equipment display method proposed in the first embodiment, this embodiment further limits the displayed associated equipment operation information, which can effectively improve the above situation and reduce the energy investment of professionals in following up the process, research and development, and testing, thereby effectively improving the management level of the laboratory and assisting in improving research and development and teaching efficiency.

[0075] In the preceding steps of this embodiment, when a laboratory staff member enters the target area of ​​the first device, his / her identity tag is obtained, and then the operation information of the first device and the operation information of its associated devices are displayed to him / her;

[0076] For example, the current person is a research and development personnel in the laboratory, who is performing a specific experiment in the laboratory. The process equipment involved in the experiment include A, B, C, and D. When the research and development personnel enters the laboratory, they may pass through multiple process equipment. At this time, even if they enter the target area of ​​multiple process equipment, since their personnel tags are not associated with these process equipment, the display of equipment operation information will not be triggered, that is, only brief information about the equipment, such as the equipment name, may be displayed; as an example, when the research and development personnel's experimental process is performed on equipment A, when the research and development personnel reaches the target area of ​​equipment A, two types of related information can be displayed: the real-time operation information of equipment A and the related information of process auxiliary equipment related to equipment A; for example, when the current equipment is a wet bench, the first type of related information can be obtained first. This type of related information The first type of related information is static related information. For example, the process auxiliary equipment that the wet bench routinely needs to supply includes nitrogen production equipment or system. At this time, it is necessary to show the R&D personnel the real-time operating status of the nitrogen production equipment or system and the predicted risks of the nitrogen production equipment or system during the experiment; the second type of related information is dynamic related information. For example, the current equipment is a wet bench, and the related equipment information includes the robot system in the laboratory. The robot system includes power supply, warehousing, scheduling and other modules. Based on the equipment related to the robot system that needs to schedule the module in the current experiment, the operating status of this part is displayed, such as the power supply, maintenance status, warehouse status, etc. of the handling robot that cooperates with the current experiment.

[0077] Based on the above embodiment, combined with the equipment classification of the micro-nano processing platform, the first equipment is the process equipment or auxiliary equipment of the micro-nano processing platform, and further limitations are made on this, specifically:

[0078] (1) When the first device is a process device, and the associated device of the first device is an auxiliary device associated with the process device, the displayed device information includes the first real-time operation information of the process device and the first real-time auxiliary information of the auxiliary device associated with the process device.

[0079] Specifically, when the first device is a process device of a micro-nano processing platform, the displayed information is the first real-time operation information of the process device and the first real-time auxiliary information of the auxiliary device associated with the process device. For the display of the first real-time auxiliary information of the auxiliary device associated with the process device, the first real-time auxiliary information of the auxiliary device can be sorted and displayed according to the correlation coefficient between the process device and the auxiliary device, which is more conducive to personnel observing the strongly related auxiliary device information. The specific steps are:

[0080] Step S301: when the first device is a process device of a micro-nano processing platform, first real-time auxiliary information of a plurality of auxiliary devices associated with the process device is obtained.

[0081] Step S302 , obtaining a first correlation coefficient between each auxiliary device and the process equipment according to a supply quantity factor, an influence factor and an auxiliary device failure frequency factor of each auxiliary device and the process equipment.

[0082] The specific expression of the first correlation coefficient is:

[0083] ,

[0084] is the first correlation coefficient between auxiliary equipment and process equipment, is the first supply weight, is the supply factor of auxiliary equipment and process equipment, is the first influence weight, is the influence factor of auxiliary equipment and process equipment, is the fault frequency weight, is the failure frequency factor of the auxiliary equipment.

[0085] Step S303 , displaying first real-time auxiliary information of each auxiliary device in sequence according to the first correlation coefficient between each auxiliary device and the process equipment.

[0086] (2) When the first device is an auxiliary device, and the associated device of the first device is a process device associated with the auxiliary device, the displayed device information includes the second real-time auxiliary information of the auxiliary device and the second real-time operation information of the process device associated with the auxiliary device.

[0087] Specifically, when the first device is an auxiliary device of the micro-nano processing platform, the displayed information is the second real-time auxiliary information of the auxiliary device and the second real-time operation information of the process equipment associated with the auxiliary device. For the display of the second real-time operation information of the process equipment associated with the auxiliary device, the second real-time operation information of the process equipment can be sorted and displayed according to the correlation coefficient of the auxiliary device to the operation of the process equipment, which is more conducive to personnel observing the process equipment information most affected by the operation status of the auxiliary device. The specific steps are:

[0088] Step S401: when the first device is an auxiliary device of a micro-nano processing platform, second real-time operation information of at least one process device associated with the auxiliary device is obtained.

[0089] Step S402 , obtaining a second correlation coefficient between the auxiliary equipment and each process equipment according to the supply quantity factor, influence factor, price of the process equipment and use frequency factor of the process equipment of the auxiliary equipment and the process equipment.

[0090] The specific expression of the second correlation coefficient is:

[0091] ,

[0092] is the second correlation coefficient between auxiliary equipment and process equipment, is the second supply weight, is the supply factor of auxiliary equipment and process equipment, is the second influence weight, is the influence factor of auxiliary equipment and process equipment, is the price weight, is the price of process equipment, is the frequency weight used, Use frequency factors for process equipment.

[0093] Step S403 , displaying the second real-time operation information of each process equipment in sequence according to the second correlation coefficient between the auxiliary equipment and each process equipment.

[0094] [Fourth embodiment]

[0095] Based on the display method of any micro-nano processing platform in the first to third embodiments above, considering that personnel cannot fully grasp which operating state of a specific device in the micro-nano processing platform is normal operation and which operating state is abnormal operation, in order to be more conducive to the operation and maintenance personnel or trainees to grasp the operation information of the equipment, fault alarms or early warning information can be set on the basis of the above embodiments. After analysis, it is directly displayed in the real scene, not only the warnings of auxiliary equipment or process equipment are displayed, but also the correlation between process equipment and auxiliary equipment. On the one hand, it allows the operation and maintenance personnel to intuitively correspond to the relationship between the equipment and reduce the judgment cost; on the other hand, it allows the trainees to learn more intuitively on site and quickly master the operation and maintenance knowledge of auxiliary equipment and process equipment.

[0096] On this basis, in order to enable the personnel of the micro-nano processing platform to better understand the changes in the specific operation of the first device in the time dimension, whether it is process equipment or auxiliary equipment, the above-mentioned equipment operation information includes the real-time health status and historical health status of the equipment. However, in order to be more concise during the display process, the historical health status of the first device and / or the historical health status of the associated equipment can be selectively displayed according to the personnel category or specific experimental tasks. Specifically, the display strategy of the equipment operation information can be adjusted, for example, only the real-time health status of the first device and the associated equipment is directly displayed, and the historical health status of the first device and the associated equipment is displayed as needed; or the real-time health status of the first device, the historical health status of the first device and the real-time health status of the associated equipment are directly displayed, and the historical health status of the associated equipment is displayed as needed. It should be noted that if the historical health status of the associated equipment has great reference value for the operation of the first equipment, or the R&D personnel's test process needs to consider the historical health status, the relevant historical health status will be directly displayed; if the historical health status of the first equipment or related equipment has little impact on the current operation or experimental process of the equipment, it will be selectively displayed (for example, only displaying the value) or briefly displayed (for example, only displaying by color, or with notes such as "shutdown, maintenance plan, does not affect the experiment", "under maintenance, does not affect the experiment", etc.). In this regard, the calculation method of the real-time health status and historical health status of the equipment (including process equipment and auxiliary equipment) in the micro-nano processing platform is further explained, specifically:

[0097] (1) Calculation of real-time health status of equipment:

[0098] Each real-time parameter of the preset device has a reference value range , is the lower limit of the reference value range, is the upper limit of the reference value range; the average value of each parameter in each preset time period every day is , ,in is a natural number, which is the serial number of each preset time period arranged from zero, set according to the management needs of the micro-nano processing platform, and is used for information display and historical backtracking; When the health status is "real-time health", it is displayed in green; when When, or When the health status is "real-time sub-health", it is displayed in yellow; when ,or , the health status is "Real-time Unhealthy" and is displayed in red.

[0099] (2) Calculation of historical health status of equipment:

[0100] According to the teaching, experiment, maintenance, etc. performed by the equipment, each historical parameter data of the preset equipment has a reference value range , is the lower limit of the historical reference value range, is the upper limit of the historical reference value range; the daily average value of each parameter is (in, ,in For the device historical parameter mean); when When the health status is "healthy", the number of consecutive healthy days per month is ;when When, or When the health status is "sub-healthy", the number of sub-healthy days per month is ;when ,or When the health status is "unhealthy", the number of unhealthy days per month is , = Unhealthy hours per day / 24. , , The weights are , , , then the monthly isolated health of the device is, ; The correlation coefficient between this device or system and other devices is , the isolated health status of other devices in the current month is ; The correlation coefficient between the auxiliary equipment or system and the process equipment is The isolated health status of other auxiliary equipment for the month is The actual health score can be calculated as follows, and the health status of the device can be judged based on the score. )”, “Historical sub-health ( )”, “History is unhealthy ( )”; among them, monthly health status .

[0101] On this basis, in order to more intuitively show the changes in the health status of the equipment in the time dimension, the current time period before The health status of each time period is displayed in sequence in the form of wide lines or grid graphs. For example, The different health states of each time period are marked with different colors as mentioned above; in this way, the tester can judge the stability of the current equipment in the previous period of operation and its ability to cope with various processes. It can be set by the micro-nano processing platform according to the current situation of the process equipment.

[0102] Based on the above embodiment, the number of time periods for displaying the historical health status The applicant can adjust the maintenance process of various equipment on the micro-nano processing platform, including the number of historical time periods displayed above. The method for determining the display history time (i.e., the display history time length) includes: obtaining the operation information of the current device, and after the current device has been operating normally for a first preset time, is the first preset value; within the second preset time after the current equipment undergoes maintenance (routine inspection), is the second preset value; within the third preset time after the current device fails the test, is the third preset value; within the fourth preset time after the current device fails or a component is replaced normally, is the fourth preset value; it should be noted that, for different test equipment, the preset time durations are usually different, and the preset values ​​are also different; in this way, laboratory R&D personnel can understand the operating status of the equipment in real time during the test process in order to estimate the test conditions, or know in advance whether the various test conditions of the equipment in the previous stage are stable, for example, whether the equipment was unstable due to overload operation in the previous stage; at the same time, it is also convenient for maintenance personnel to judge the operating stability of the equipment in combination with the equipment maintenance records and operating status.

[0103] In a more specific embodiment, the micro-nano processing platform of this embodiment is further provided with a data analysis module, which is implemented based on big data analysis technology or an artificial intelligence model. The present embodiment is used to comprehensively analyze the operation data, generate analysis result data, and display the analysis result in the target area or send the analysis result data to the device carried by the personnel in the target area. For example, for the real data collected, it can be first analyzed by the background, compared with the normal theoretical data, and judged whether the real data is normal based on the comparison result. If it exceeds a preset threshold range, a warning message can be issued through the alarm module so that the person in charge of the equipment can take remedial measures in time to avoid accidents. The current important operation data of a certain device can be analyzed through the data analysis module, and the important operation data can be displayed to the user through the terminal device.

[0104] Further, as attached Figure 7 As shown, based on the above calculation of the real-time health status and historical health status of the equipment, early warning information can be further sent to the staff. The early warning information varies according to the health status of specific parameters. The following is an explanation of the sending of specific types of early warning information:

[0105] (1) Take regular maintenance as an example.

[0106] The micro-nano processing platform can combine the current information, historical information, maintenance records, fault records, delivery period and other information of the first device to infer the maintenance needs of the first device. For example, through the data inference of the data analysis module, it is concluded that a consumable is about to be used up. At this time, the intelligent push module can generate a purchase demand reminder information, which is then automatically pushed to the terminal device of the person in charge of the equipment, and the person in charge confirms whether to purchase. When the person in charge confirms the need to purchase, the order information can be sent directly to the supplier in the supply system through voice, text or other forms for ordering. For example, the coolant of machine 1 needs to be added every 6 months. The system will analyze and calculate the next addition time based on the historical addition frequency, and promptly remind the person in charge of the etching machine in the above manner. If the person in charge confirms that the coolant needs to be purchased, the intelligent push module will notify the purchase in advance based on the delivery period of the supply system.

[0107] (2) Take the regular replacement class as an example.

[0108] The micro-nano processing platform can combine the current information, historical information, maintenance records, fault records, delivery period of spare parts and other information of the first device to infer the maintenance needs of the first device. For example, through the data of the data analysis module, it is inferred that a certain accessory is about to reach the end of its service life. Similarly, at this time, the purchase demand reminder information of the accessory can be generated through the intelligent push module, and then automatically pushed to the terminal device of the person in charge of the device, and the person in charge confirms whether to purchase. When the person in charge confirms the need to purchase, the order information can be directly sent to the supplier in the supply system through voice, text or other forms for ordering. For example, the life of the halogen lamp of the lithography machine is 3000 hours, then the system will analyze and calculate the next maintenance and replacement of the halogen lamp based on the equipment startup time, historical replacement time, etc., and timely remind the person in charge of the lithography machine in the above way. If the person in charge confirms that the halogen lamp needs to be purchased, the intelligent push module will notify the purchase in advance in combination with the delivery period of the supply system. For example, if you need to place an order 60 days in advance to purchase a halogen lamp, you will notify the purchase in advance 60 days before the estimated life time.

[0109] (3) Take the accident emergency response as an example to illustrate.

[0110] The micro-nano processing platform can analyze and determine possible emergencies based on all parameter information of the first device through the data analysis module, and then generate warning information in advance through the alarm module and push the warning information to the relevant person in charge. For example, suppose the temperature of the high-temperature tank of the original oxide wet bench is 180°C The temperature fluctuates around 5℃, and the reasonable temperature range is within 200℃. However, if the temperature of the equipment is around 190℃ for a long time, there may be equipment failure and it needs to be checked in time. At this time, the alarm module can generate temperature warning information in advance and push the temperature warning information to the person in charge of the equipment. It is well known that the high-temperature tank of the wet bench is a strong acid chemical and is very dangerous, so this kind of advance predictive intelligent reminder is very important. For example, the original replacement frequency of a certain accessory was once every 2 months, but the system found through analysis that the recent frequency has changed from once every 2 months to once every month, indicating that the replacement frequency is abnormal at this time and needs special reminder. At this time, the alarm module can generate frequency abnormality warning information in advance and push the frequency abnormality warning information to the person in charge of the equipment to attract the attention of the person in charge of the equipment.

[0111] In addition, the equipment operation information displayed in this embodiment can be divided into early warning information, real-time health status, historical health status and teaching information according to the display content. The priority of the display content can be adjusted in combination with the classification of personnel entering the target area. For example, when maintenance personnel enter the target area, the display level of the equipment operation information content is: early warning information>real-time health status>historical health status>teaching information; when experimental personnel enter the target area, the display level of the equipment operation information content is: early warning information>real-time health status>teaching information>historical health status; when trainees enter the target area, the display level of the equipment operation information is: early warning information>teaching information>real-time health status>historical health status.

[0112] Furthermore, for the display of warning information, specific warning information display priorities can be set according to different scenarios of auxiliary equipment and process equipment:

[0113] For the warning information of the auxiliary equipment itself, the priority is divided according to the severity of the consequences of the auxiliary equipment failure, including first-level warning, second-level warning and third-level warning, specifically:

[0114] Level 1 warning refers to auxiliary equipment failures that involve personal safety, including but not limited to power system, process exhaust system and special gas supply system failures. For example, power outages may cause all auxiliary equipment to shut down; process exhaust and gas supply system failures may cause the risk that hazardous gases cannot be handled or discharged in a timely manner.

[0115] Level 2 warning refers to auxiliary equipment failures involving environmental safety and personal safety, including but not limited to chemical supply systems and wastewater systems. For example, acidic, alkaline and organic chemicals cannot be discharged through the wastewater and waste liquid system.

[0116] Level 3 warning means that the failure of auxiliary equipment involves the safety of process equipment, including but not limited to the cold water system, air conditioning exhaust system, and some gas supply systems (including nitrogen, compressed air, vacuum, and bulk gas). For example, the cold water and air conditioning exhaust systems will affect the cleanliness, temperature and humidity, and thus affect the accuracy of the equipment; the failure of some gases (nitrogen, compressed air, vacuum, bulk gas, etc.) will cause the process equipment to alarm and fail to work normally, but will not involve personal or environmental safety.

[0117] For example, in conjunction with Figure 7As shown, taking the auxiliary equipment of the chiller as an example, when the real-time status of the chiller is a fault, for the associated process equipment, the current status of each process equipment and the operation that needs to be performed are displayed according to the degree of association between the chiller and the process equipment. For example, the operation that process equipment 1 needs to perform is "need to shut down immediately", and at this time, process equipment 1 is in "shutdown state", which means that process equipment 1 has performed the corresponding operation according to the three-level warning information of the chiller; and the operation that process equipment 3 needs to perform is "need to shut down within 12 hours", and at this time, process equipment 3 is in "standby state", which means that at this time, process equipment 3 has not performed the corresponding operation according to the three-level warning information of the chiller. Then, the operation and maintenance personnel in the micro-nano processing platform can quickly determine that the associated process equipment has not performed the corresponding operation according to the warning information based on the displayed information, and can contact the person in charge of the above-mentioned machine to urge process equipment 3 to shut down.

[0118] The early warning information of process equipment is prioritized according to the severity of the process equipment failure, including A-level warning, B-level warning and C-level warning, specifically:

[0119] A-level warning means that there is irreversible damage to process equipment, including but not limited to failures in the power system and cold water system. These two systems will affect the temperature and humidity of the clean room. If the temperature changes by more than ±2°C, it will cause irreversible deformation of the lithography machine lens, thereby affecting the exposure accuracy of the lithography machine.

[0120] A Class B warning means that the process equipment is currently unusable due to damage, including but not limited to the process equipment generating a warning and being unable to continue to be used. The process equipment needs to be shut down within 6 hours and reset after the warning is lifted.

[0121] A Class C warning refers to damage that requires a restart of the process equipment, including but not limited to the process equipment generating a warning and being unable to continue to be used, and the process equipment needs to be shut down immediately and restarted after the warning is lifted.

[0122] Combine the above fault alarm nodes with the correlation coefficient of the current equipment type , comprehensively consider the above warning displays, and the specific priorities of the above warning displays for: , where the associated parameters corresponding to the first-level warning, second-level warning, third-level warning, A-level warning, B-level warning, and C-level warning are , , , , , , displayed according to the highest score as the highest priority; however, it should be noted that in this embodiment, the power system has the highest priority and does not need to be calculated.

[0123] For example, nitrogen supply is used in both photolithography equipment and etching equipment, and can be displayed layer by layer to show the proportion of use. "-Photolithography equipment 10%-Equipment 1, Equipment 2; Wet bench 40%-Wet bench A, Wet bench B; Exhaust gas treatment device 50%-Device 1, Device 2", showing the status of the corresponding machine, such as standby, shutdown, in use, and alarm. When an "unhealthy" warning of auxiliary equipment appears, the system will prioritize the display according to the proportion of process equipment used, and can issue corresponding warnings according to the characteristics of the process equipment. This warning needs to be displayed synchronously on the auxiliary equipment side and the process equipment side. For example, when the nitrogen system fails, "Photolithography equipment 10%-Equipment 1, Equipment 2; Wet bench 40%-Wet bench A, Wet bench B; Exhaust gas treatment device 50%-Device 1, Device 2" will be displayed on the auxiliary equipment, showing the actions that the corresponding machine needs to do and the completion status. For example, if the shutdown is required, it has been shut down; if the operation is required to be suspended, it has not been suspended; if the equipment is required to be restarted, it has been restarted." On the process equipment, a picture will be displayed saying "Nitrogen system failure, operation needs to be suspended, the failure is expected to last 2 hours, please contact XXX".

[0124] [Fifth embodiment]

[0125] Due to the particularity of the process equipment of the micro-nano processing platform, some of the process equipment has high professional and technical requirements for the experimenters due to the harsh operating conditions, and the experimental results are generally at a low yield rate. In this case, in the process of displaying the yield rate information of the process equipment of the micro-nano processing platform, the yield rate of the subsequent experimental tasks performed by the process equipment can be predicted in combination with the historical yield rate; it should be noted that the yield rate information display method in this embodiment is not limited to the above-mentioned information display method of the micro-nano processing platform, and can also be applied to other existing information display methods. In this regard, the yield rate prediction method of the process equipment of the micro-nano processing platform includes:

[0126] Obtain the real-time operation information, historical operation information, and historical yield of samples corresponding to the historical operation information of process equipment, historical operation information of preceding process equipment, real-time operation information and historical operation information of related auxiliary equipment, and historical information of operators;

[0127] The historical operation information of the process equipment and the historical yield of the sample corresponding to the historical operation information, the first historical operation information of the preceding process equipment related to the historical operation information of the process equipment, the historical operation information of the associated auxiliary equipment and the operator level are combined into a process equipment historical data set W, where: , is a natural number, indicating the Historical data for a period of time, ,in For process equipment Historical operation information of each period, For process equipment The historical yield rate of samples in each period, For process equipment The first historical operation information of the preceding process equipment related to the process executed in each time period, For the The historical operation information of auxiliary equipment is associated with each period. For the The level of operators in each time period.

[0128] Dividing the process equipment historical data set into a first training set and a second validation set, respectively inputting the first deep learning network into a preset first deep learning network to obtain a trained first deep learning network;

[0129] The real-time operation information of the process equipment, the second historical operation information of the previous process equipment, the real-time operation information of the related auxiliary equipment and the level of the operator are input into the trained first deep learning network to obtain the sample predicted yield of the current process equipment.

[0130] [Sixth embodiment]

[0131] For error backtracking during sample analysis in a micro-nano processing platform, the present invention also provides a specific sample error backtracking method; it should be noted that the sample error backtracking method is not limited to the information display method of the above-mentioned micro-nano processing platform, and can also be applied to other existing information display methods. The sample error backtracking method for this micro-nano processing platform includes:

[0132] Obtaining real-time operation information of process equipment, second historical operation information of related preceding process equipment, and real-time operation information of related auxiliary equipment;

[0133] Compare whether the real-time operation information of the process equipment exceeds the second threshold range, whether the second historical operation information of the preceding process equipment exceeds the third threshold range, and whether the real-time operation information of the associated auxiliary equipment exceeds the fourth threshold range;

[0134] If the real-time operation information of the process equipment exceeds a second threshold range, the sample error may be related to process equipment parameters;

[0135] If the second historical operation information of the preceding process equipment exceeds the third threshold range, the sample error may be related to the preceding process equipment parameter;

[0136] If the real-time operation information of the associated auxiliary device exceeds a fourth threshold range, the sample error may be related to a parameter of the associated auxiliary device.

[0137] The second threshold range is determined based on the rated range of the process equipment parameters and the historical operation information of the process equipment processing samples with a yield rate exceeding 80%. The third threshold range is determined based on the rated range of the previous process equipment parameters and the first historical operation information of the previous process equipment processing samples with a yield rate exceeding 80%. The fourth threshold range is determined based on the rated range of the associated auxiliary equipment parameters.

[0138] Furthermore, in order to save personnel's analysis time for sample error backtracking and quickly locate the most relevant specific cause of sample error, priorities are set for process equipment and related auxiliary equipment in the sample error backtracking method in the above embodiment, the dominant cause of sample error backtracking is obtained, and the personnel's error backtracking analysis time is reduced, specifically:

[0139] Set the real-time operation information of the process equipment as the first priority for backtracking, the second historical operation information of the preceding process equipment as the second priority for backtracking, and the real-time operation information of the associated auxiliary equipment as the third priority for backtracking;

[0140] If the real-time operation information of the process equipment exceeds the second threshold range, the main cause of the sample error is related to the process equipment parameters, and the historical operation information of the previous process equipment or the real-time operation information of the associated auxiliary equipment is no longer traced back;

[0141] If the real-time operation information of the process equipment does not exceed the second threshold range, it is determined whether the historical operation information of the preceding process equipment exceeds the third threshold range. If the historical operation information of the preceding process equipment exceeds the third threshold range, the main cause of the sample error is related to the parameters of the preceding process equipment, and the real-time operation information of the associated auxiliary equipment is no longer traced back.

[0142] If the historical operation information of the preceding process equipment does not exceed the third threshold range, it is determined whether the real-time operation information of the associated auxiliary equipment exceeds the fourth threshold range; if the real-time operation information of the associated auxiliary equipment exceeds the fourth threshold range, the main cause of the sample error is related to the parameters of the associated auxiliary equipment.

[0143] Furthermore, for the troubleshooting of process equipment in the sample error backtracking method, the backtracking priority level can be set according to the number of times the sample is executed in the process equipment, so as to quickly locate the process equipment that produces the sample error, specifically:

[0144] If the sample is processed in a photolithography process equipment or an etching process equipment;

[0145] Obtaining the number of executions of the sample in a photolithography or etching process device, and setting a backtracking weight coefficient for each process device according to the number of executions;

[0146] According to the size of the backtracking weight coefficient of each process equipment, the parameter information of each process equipment during the processing of the sample in the process equipment is compared with the preset threshold in turn to obtain the process equipment that causes the sample error.

[0147] For example, sample II is processed in the photolithography process equipment CDF, where process equipment C processes sample II twice, process equipment D processes sample II three times, and process equipment F processes sample II five times. The backtracking weight coefficient of process equipment C is set according to the above execution times: , the backtracking weight coefficient of process equipment D is , the backtracking weight coefficient of process equipment F is ,in At this time, during the error backtracking of the sample, it is possible to prioritize whether the parameter information of process equipment F during the processing of sample II exceeds the set threshold based on the above-mentioned backtracking weight coefficient. If the equipment parameter information of process equipment F during the processing of sample II exceeds the set threshold, it can be directly obtained that the sample error is related to process equipment F; if the equipment parameter information of process equipment F during the processing of sample II does not exceed the set threshold, then process equipment D and process equipment C are analyzed in turn to determine the specific process equipment that caused the sample error.

[0148] It should be understood that although the Figure 1 The steps in the flowchart are shown in sequence as indicated by the arrows, but these steps are not necessarily executed in the order indicated by the arrows. Unless otherwise specified in this document, there is no strict order restriction for the execution of these steps, and these steps can be executed in other orders. Figure 1 At least part of the steps may include multiple sub-steps or sub-stages. These sub-steps or stages are not necessarily executed at the same time, but can be executed at different times. The execution order of these sub-steps or stages is not necessarily sequential, but can be executed in turn or alternately with other steps or at least part of the sub-steps or stages of other steps.

[0149] The above embodiments of the present invention describe in detail the method for displaying the associated information of the micro-nano processing platform. The above method disclosed in the present invention can be implemented by various devices. Therefore, the present invention also discloses a device for displaying the associated information of the micro-nano processing platform. Figure 8 , specific embodiments are given below to explain in detail.

[0150] The information acquisition module 501 is used to acquire the tag information of people in the target area of ​​the first device;

[0151] The information display module 502 is used to display or send device operation information to devices carried by people in the target area according to the personnel tag information; the device operation information includes the operation information of the first device and the operation information of the associated devices of the first device.

[0152] For the associated information display device considering the micro-nano processing platform, all of them can refer to the above definition of the method, which will not be repeated here. Each module in the above device can be implemented in whole or in part by software, hardware and a combination thereof. The above modules can be embedded in or independent of the processor of the terminal device in the form of hardware, or stored in the memory of the terminal device in the form of software, so that the processor calls and executes the operations corresponding to the above modules.

[0153] In one embodiment, the present invention further provides a computer-readable storage medium having a computer program stored thereon, and when the computer program is executed by a processor, the steps of the above-mentioned method for displaying associated information considering a micro-nano processing platform are implemented.

[0154] The computer-readable storage medium may be an electronic memory such as a flash memory, an EEPROM (electrically erasable programmable read-only memory), an EPROM (erasable programmable read-only memory), a hard disk or a ROM. Optionally, the computer-readable storage medium includes a non-transitory computer-readable storage medium. The computer-readable storage medium has a storage space for program codes for executing any method step of the above method. These program codes may be read from or written into one or more computer program products, and the program codes may be compressed in an appropriate form.

[0155] In one embodiment, the present invention provides a computer device, including a memory and a processor, wherein the memory stores a computer program, and the processor executes the above-mentioned method for displaying associated information of the micro-nano processing platform when executing the computer program.

[0156] The computer device includes a memory, a processor and one or more computer programs, wherein the one or more computer programs can be stored in the memory and configured to be executed by one or more processors, and the one or more application programs are configured to execute the above-mentioned associated information display method of the micro-nano processing platform.

[0157] The processor may include one or more processing cores. The processor uses various interfaces and lines to connect the various parts of the entire computer device, and executes various functions of the computer device and processes data by running or executing instructions, programs, code sets or instruction sets stored in the memory, and calling data stored in the memory. Optionally, the processor can be implemented in at least one hardware form of digital signal processing (Digital Signal Processing, DSP), field programmable gate array (Field-Programmable Gate Array, FPGA), and programmable logic array (Programmable Logic Array, PLA). The processor can integrate one or more combinations of a central processing unit (Central Processing Unit, CPU), a reporting verifier (Graphics Processing Unit, GPU) for buried data, and a modem. Among them, the CPU mainly processes the operating system, user interface, and application programs; the GPU is responsible for rendering and drawing display content; and the modem is used to process wireless communications. It can be understood that the above-mentioned modem may not be integrated into the processor, but may be implemented separately through a communication chip.

[0158] The memory may include a random access memory (RAM) or a read-only memory (ROM). The memory may be used to store instructions, programs, codes, code sets or instruction sets. The memory may include a program storage area and a data storage area, wherein the program storage area may store instructions for implementing an operating system, instructions for implementing at least one function (such as a touch function, a sound playback function, an image playback function, etc.), instructions for implementing the above-mentioned various method embodiments, etc. The data storage area may also store data created by the terminal device during use, etc.

[0159] The above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit the same. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that the technical solutions described in the aforementioned embodiments may still be modified, or some of the technical features may be replaced by equivalents. However, these modifications or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the embodiments of the present invention.

Claims

1. A method for displaying associated information of a micro-nano processing platform, characterized in that: include: Acquire tag information of people in the target area of ​​the first device; Displaying or sending device operation information to devices carried by personnel in a target area according to the personnel tag information; The device operation information includes operation information of a first device and operation information of devices associated with the first device.

2. The method for displaying associated information of a micro-nano processing platform according to claim 1, characterized in that: The device operation information includes the operation information of the first device and the operation information of the associated devices of the first device, specifically: When the first device is a process device of a micro-nano processing platform, the device information includes first real-time operation information of the process device and first real-time auxiliary information of an auxiliary device associated with the process device; When the first device is an auxiliary device of a micro-nano processing platform, the device information includes second real-time auxiliary information of the auxiliary device and second real-time operation information of a process device associated with the auxiliary device.

3. The method for displaying associated information of a micro-nano processing platform according to claim 1, characterized in that: The device operation information includes the operation information of the first device and the operation information of the associated devices of the first device, specifically: When the first device is a process equipment of a micro-nano processing platform, the equipment operation information includes first real-time operation information of the process equipment and historical operation information of a preceding device during a preceding processing of a sample processed in the process equipment, or first real-time operation information of the process equipment and predicted operation information of a subsequent process equipment during a subsequent processing of a sample processed in the process equipment.

4. The method for displaying associated information of a micro-nano processing platform according to claim 3, characterized in that: Also includes: According to the label information on the operating sample in the first device, the preceding process equipment information of the sample in the preceding processing process is obtained, wherein the preceding process equipment information includes the name or number of the preceding process equipment, the first moment when the sample enters the preceding process equipment and the second moment when the sample leaves the preceding process equipment, and the equipment parameter information of the preceding equipment in the preceding processing process of the sample is obtained in combination with the above preceding process equipment information, and the preceding process equipment information and the equipment parameter information together constitute the historical operation information of the preceding process equipment.

5. The method for displaying associated information of a micro-nano processing platform according to claim 3, characterized in that: Also includes: According to the label information on the operating sample in the first device, the subsequent process equipment information of the sample in the subsequent processing process is obtained, wherein the subsequent process equipment information includes the name or number of the subsequent process equipment, the third time when the sample enters the subsequent process equipment, and the sample; Combining the subsequent process equipment information with the subsequent process equipment information, obtaining real-time parameter information of the subsequent process equipment during the subsequent processing of the sample; The predicted operating parameters of the subsequent process equipment at the third moment are obtained according to the real-time parameter information and the historical parameter data set of the subsequent process equipment.

6. The method for displaying associated information of a micro-nano processing platform according to claim 3, characterized in that: When the first device is a process device of a micro-nano processing platform, the first real-time operation information of the process device and the historical operation information of the preceding device during the preceding processing of the processed sample in the process device are sent to the device carried by the personnel in the target area, including: Acquire historical operation information of the preceding equipment when the processing sample in the process equipment is placed in each preceding equipment during the preceding processing process; The historical operation information of each preceding device is displayed in sequence according to the processing flow of the processing sample.

7. The method for displaying associated information of a micro-nano processing platform according to claim 3, characterized in that: The historical operation information of the preceding device also includes preceding error prompt information, and the associated information display method further includes: Acquire historical operation information of the preceding equipment when the processing sample in the process equipment is placed in each preceding equipment during the preceding processing process; If the historical operation information exceeds the rated operation range of the preceding device, a preceding error prompt message is generated.

8. The method for displaying associated information of a micro-nano processing platform according to claim 1, characterized in that: The target area includes a first target area and a second target area, wherein a distance between the first target area and the first device is smaller than a distance between the second target area and the first device.

9. The method for displaying associated information of a micro-nano processing platform according to claim 2, characterized in that: When the first device is a process device of a micro-nano processing platform, sending first real-time operation information and first real-time auxiliary information of an auxiliary device associated with the process device to a device carried by a person in the first electronic fence area includes: When the first device is a process device of a micro-nano processing platform, obtaining first real-time auxiliary information of a plurality of auxiliary devices associated with the process device; Obtaining a first correlation coefficient between each auxiliary device and the process equipment according to a supply factor, an influence factor and a failure frequency factor of each auxiliary device and the process equipment; The first real-time auxiliary information of each auxiliary device is displayed in sequence according to the first correlation coefficient between each auxiliary device and the process equipment.

10. The method for displaying associated information of a micro-nano processing platform according to claim 9, characterized in that: The first correlation coefficient between each auxiliary device and the process equipment is obtained according to the supply factor, influence factor and auxiliary device failure frequency factor of each auxiliary device and the process equipment. The specific expression is: ， in, is the first correlation coefficient between auxiliary equipment and process equipment, is the first supply weight, is the supply factor of auxiliary equipment and process equipment, is the first influence weight, is the influence factor of auxiliary equipment and process equipment, is the fault frequency weight, is the failure frequency factor of the auxiliary equipment.

11. The method for displaying associated information of a micro-nano processing platform according to claim 2, characterized in that: When the first device is an auxiliary device of the micro-nano processing platform, sending second real-time auxiliary information of the auxiliary device and second real-time operation information of the process equipment associated with the auxiliary device to a device carried by a person within the first electronic fence includes: When the first device is an auxiliary device of a micro-nano processing platform, obtaining second real-time operation information of at least one process device associated with the auxiliary device; Obtaining a second correlation coefficient between the auxiliary equipment and each process equipment according to the supply quantity factor, the influence factor, the price of the process equipment and the use frequency factor of the process equipment of the auxiliary equipment and the process equipment; The second real-time operation information of each process equipment is displayed in sequence according to the second correlation coefficient between the auxiliary equipment and each process equipment.

12. The method for displaying associated information of a micro-nano processing platform according to claim 11, characterized in that: The second correlation coefficient between the auxiliary equipment and each process equipment is obtained according to the supply factor of the auxiliary equipment and the process equipment, the influence factor, the price of the process equipment and the use frequency factor of the process equipment. The specific expression is: ， in, is the second correlation coefficient between auxiliary equipment and process equipment, is the second supply weight, is the supply factor of auxiliary equipment and process equipment, is the second influence weight, is the influence factor of auxiliary equipment and process equipment, is the price weight, is the price of process equipment, is the frequency weight used, Use frequency factors for process equipment.

13. A device for displaying related information of a micro-nano processing platform, characterized in that: include: An information acquisition module, used to acquire tag information of people in a target area where the first device is located; The information display module is used to display or send device operation information to the device carried by the personnel in the target area according to the personnel tag information; the device operation information includes the operation information of the first device and the operation information of the associated devices of the first device.

14. A method for predicting the yield rate of process equipment of a micro-nano processing platform, characterized in that: include: Obtaining real-time operation information, historical operation information, and historical yield of samples corresponding to the historical operation information of process equipment, historical operation information of preceding process equipment, real-time operation information and historical operation information of related auxiliary equipment, and operator level information; Combining the historical operation information of the process equipment and the historical yield of the sample corresponding to the historical operation information, the first historical operation information of the preceding process equipment related to the historical operation information of the process equipment, the historical operation information of the associated auxiliary equipment, and the operator level information into a process equipment historical data set; Dividing the process equipment historical data set into a first training set and a second validation set, respectively inputting the first deep learning network into a preset first deep learning network to obtain a trained first deep learning network; The real-time operation information of the process equipment, the second historical operation information of the previous process equipment, the real-time operation information of the related auxiliary equipment and the operator level information are input into the trained first deep learning network to obtain the sample predicted yield of the current process equipment.

15. A sample error backtracking method for a micro-nano processing platform, characterized in that: include: Obtaining real-time operation information of process equipment, second historical operation information of related preceding process equipment, and real-time operation information of related auxiliary equipment; Compare whether the real-time operation information of the process equipment exceeds the second threshold range, whether the second historical operation information of the preceding process equipment exceeds the third threshold range, and whether the real-time operation information of the associated auxiliary equipment exceeds the fourth threshold range; If the real-time operation information of the process equipment exceeds a second threshold range, the sample error may be related to process equipment parameters; If the second historical operation information of the preceding process equipment exceeds the third threshold range, the sample error may be related to the preceding process parameters; If the real-time operation information of the associated auxiliary device exceeds a fourth threshold range, the sample error may be related to a parameter of the associated auxiliary device.

16. The sample error backtracking method of the micro-nano processing platform according to claim 15, characterized in that: Also includes: Set the real-time operation information of the process equipment as the first priority for backtracking, the second historical operation information of the preceding process equipment as the second priority for backtracking, and the real-time operation information of the associated auxiliary equipment as the third priority for backtracking; If the real-time operation information of the process equipment exceeds the second threshold range, the main cause of the sample error is related to the process equipment parameters, and the historical operation information of the previous process equipment or the real-time operation information of the associated auxiliary equipment is no longer traced back; If the real-time operation information of the process equipment does not exceed the second threshold range, it is determined whether the historical operation information of the preceding process equipment exceeds the third threshold range. If the historical operation information of the preceding process equipment exceeds the third threshold range, the main cause of the sample error is related to the parameters of the preceding process equipment, and the real-time operation information of the associated auxiliary equipment is no longer traced back. If the historical operation information of the preceding process equipment does not exceed the third threshold range, it is determined whether the real-time operation information of the associated auxiliary equipment exceeds the fourth threshold range; if the real-time operation information of the associated auxiliary equipment exceeds the fourth threshold range, the main cause of the sample error is related to the parameters of the associated auxiliary equipment.

17. A computer-readable storage medium having a computer program stored thereon, characterized in that: When the computer program is executed by a processor, the steps of the method for displaying associated information of a micro-nano processing platform according to any one of claims 1 to 12 are implemented.

18. A computer device comprising a memory and a processor, wherein the memory stores a computer program, wherein: When the processor executes the computer program, it performs the method for displaying associated information of a micro-nano processing platform according to any one of claims 1 to 12.

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