Semiconductor reaction chamber equipment, tray rotating speed measuring method and measuring device

Abstract

The embodiment of the invention discloses semiconductor reaction chamber equipment, a tray rotating speed measuring method and a tray rotating speed measuring device. The semiconductor reaction chamber equipment comprises a cavity, and a first tray, a second tray and an image acquisition device which are arranged in the cavity, the second tray is arranged on the first tray, the first tray is used for rotating under the driving of a motor, the second tray is used for revolving along with the first tray, and the second tray is also used for rotating under the blowing of airflow; wherein the second tray is provided with a mark, and the image acquisition device is used for acquiring a plurality of pictures including the mark when the mark of the second tray rotates into a view-finding view field. Therefore, the mark can be used for determining the motion trail of the second tray, then the rotation angle of the second tray can be determined according to the motion trail of the mark, and then the rotation angular velocity of the second tray can be determined according to the rotation angle of the second tray and the photographing frequency of the image acquisition device.

Description

Technical Field

[0001] The embodiments of the present application relate to the technical field of semiconductor growth equipment, and in particular to a semiconductor reaction chamber equipment, a tray rotation speed measurement method and a measurement device. Background Art

[0002] The Metal Organic Chemical Vapor Deposition (MOCVD) growth system includes: gas transport subsystem, reaction chamber subsystem, in-situ monitoring subsystem, growth control subsystem and tail gas treatment subsystem. Among them, the in-situ monitoring subsystem is responsible for monitoring in-situ parameters such as temperature, reflectivity, warpage, and rotation speed, which plays a very important role in growth control. Among them, the online measurement of rotation speed plays a key role in the uniformity of flow field and temperature field during the growth process.

[0003] At present, some reaction chamber subsystems include: planetary trays, which are mainly composed of a large graphite tray and several satellite trays. The large graphite tray will form a revolution, driven by a motor, and its speed is controllable. Each rotation will generate a pulse signal for synchronization and speed measurement. The satellite tray will form a self-rotation, and a gas guide rail is designed underneath it. The satellite tray is blown by airflow to rotate. There is no absolute correspondence between airflow and speed, and real-time synchronization and speed measurement are impossible. Therefore, the MOCVD reaction chamber can be improved to achieve the measurement and control of the speed of the satellite tray. Summary of the invention

[0004] The embodiments of the present application provide a semiconductor reaction chamber device, a tray rotation speed measurement method and a measurement device, which solve the problem that the satellite dish rotation speed is difficult to measure.

[0005] To achieve the above objectives, the embodiments of the present application adopt the following technical solutions:

[0006] According to a first aspect of an embodiment of the present application, a semiconductor reaction chamber device is provided, comprising: a chamber, and a first tray, a second tray and an image acquisition device arranged in the chamber; the second tray is arranged on the first tray, the first tray is used to rotate under the drive of a motor, the second tray is used to revolve with the first tray, and the second tray is also used to rotate under the blowing of an airflow; wherein a mark is provided on the second tray, and the image acquisition device is used to collect a plurality of pictures including the mark, and the plurality of pictures are used to determine the rotation angular velocity of the second tray. Thus, the first tray is a planetary tray, and the second tray is a satellite tray. The image acquisition device can obtain the motion trajectory of the mark on the second tray by taking a plurality of pictures, and then can determine the angle of rotation of the second tray according to the motion trajectory of the mark, and then can determine the rotation angular velocity of the second tray according to the rotation angle of the second tray and the shooting frequency of the image acquisition device, thereby realizing the measurement and control of the rotation angular velocity of the second tray.

[0007] In an optional implementation, the image acquisition device acquires multiple images including the mark: including: acquiring multiple images according to a preset number; or acquiring multiple images according to a preset time interval, and selecting at least two images acquired continuously and including the mark from the multiple images. Thus, images can be acquired in multiple ways, and each acquired image includes the mark, so that the rotation angular velocity of the second tray can be measured in real time.

[0008] In an optional implementation, the image acquisition device acquires multiple images according to a preset number; or, acquires multiple images according to a preset time interval, and when selecting at least two images that are continuously acquired and include the mark from the multiple images, the preset time interval should be less than or equal to the time it takes for the second tray to rotate once. In this way, it can be avoided that the mark rotates out of the view field with the second tray when the next shot is taken due to a long shooting interval, so that the mark is not photographed, and it can also be avoided that the shooting interval is too long, resulting in the inability to determine how many times the second tray rotates within the view field when the mark is photographed again. When the preset time interval should be less than or equal to the time it takes for the second tray to rotate once, the image acquisition device starts taking pictures when it detects that the mark enters the view field. When the next shot is taken, the mark is still within the view field, and the second tray rotates no more than one circle, so the rotation angular velocity of the second tray can be accurately measured.

[0009] In an optional implementation, the image acquisition device is also used to start taking pictures when the mark enters the viewing field, and stop taking pictures when the mark leaves the viewing field. Thus, the image acquisition device does not need to work all the time, and the power consumption is lower.

[0010] In an optional implementation, the method further includes: a controller, the controller being used to determine the motion trajectory of the mark according to the plurality of collected pictures, and to determine the rotation angular velocity of the second tray according to the motion trajectory, the preset time interval, and the rotation angular velocity of the first tray. Thus, the rotation angle of the mark can be obtained through the motion trajectory, and the rotation angular velocity of the second tray can be obtained in real time according to the rotation angle of the mark and the time interval between two shots.

[0011] In an optional implementation, the controller is further used to adjust the intensity and / or angle of the airflow according to the determined rotational angular velocity of the second tray, so that the rotational angular velocity of the second tray reaches a preset rotational speed. Wherein, at the preset rotational speed, the semiconductor on the tray can better undergo chemical reactions to promote the growth of the film. Thus, the rotational angular velocity of the second tray can be controlled, which can provide better reaction conditions for the semiconductor.

[0012] In an optional implementation, the radius of the first tray is R, the radius of the second tray is r, the geometric center of the first tray is taken as the origin, and the line connecting the center of the second tray and the center of the first tray is taken as the x-axis, wherein at time t0, the center coordinates of the mark captured by the image acquisition device are (M0, N0), wherein (M0, N0) satisfies the following formula: (M0, N0) = (R + rcosφ, rsinφ); wherein the angle φ is the angle between the line connecting the geometric center of the mark and the center of the second tray at time t0 and the x-axis; the center coordinates of the mark captured by the image acquisition device at time t are (M, N), wherein (M, N) satisfies: (M, N) = (λ·cos(θ+Ωt), λ·sin(θ+Ωt)); wherein Ω is the angular velocity of the first tray, λ is the distance from the geometric center of the mark to the origin at time t, and θ is the angle between the line connecting the center of the second tray and the center of the mark and the origin at time t; λ satisfies: λ = [R 2 +r 2 -2Rr·cos(π-ωt-φ)] 1 / 2 ; θ satisfies: θ=arcsin[λsin(π-ωt-φ) / r], where ω is the rotational angular velocity of the second tray. Therefore, according to the above formula, the rotational speed of the second tray can be accurately measured in real time, online monitoring during MOCVD epitaxial growth can be achieved, and the rotational angular velocity of the second tray can be determined, providing data support for the uniformity of the temperature field and flow field of the MOCVD reaction chamber.

[0013] In an optional implementation, the chamber includes an observation window, and the image acquisition device is arranged on the observation window, so that better pictures can be taken.

[0014] According to a second aspect of an embodiment of the present application, a method for measuring a tray rotation speed is provided. The method for measuring a tray rotation speed is applied to a semiconductor reaction chamber device, wherein the semiconductor reaction chamber device comprises: a chamber, and a first tray, a second tray and an image acquisition device arranged in the chamber; the second tray is arranged on the first tray, and a mark is provided on the second tray; the method comprises: the first tray rotates under the drive of a motor and drives the second tray to rotate synchronously; the second tray rotates under the blowing of an airflow, and a mark is provided on the second tray; the image acquisition device acquires a plurality of pictures including the mark; and the rotation angular velocity of the second tray is determined based on the plurality of acquired pictures.

[0015] In an optional implementation, the image acquisition device acquires multiple pictures including the second tray: including: acquiring multiple pictures according to a preset number; or acquiring multiple pictures according to a preset time interval, and selecting at least two consecutively acquired pictures including the mark from the multiple pictures.

[0016] In an optional implementation, the preset time interval is less than or equal to the time it takes for the second tray to rotate once.

[0017] In an optional implementation, the image acquisition device acquires a plurality of pictures including the second tray, including: the image acquisition device starts taking pictures when the mark enters the field of view, and stops taking pictures when the mark leaves the field of view.

[0018] In an optional implementation, the method further includes: adjusting the intensity and / or angle of the airflow according to the determined rotational angular velocity of the second tray, so that the rotational angular velocity of the second tray reaches a preset rotational speed.

[0019] According to a third aspect of an embodiment of the present application, a tray rotation speed measuring device is provided, which is applied to a semiconductor reaction chamber device, and the semiconductor reaction chamber device comprises: a chamber, and a first tray, a second tray and an image acquisition device arranged in the chamber; the second tray is arranged on the first tray, the first tray rotates under the drive of a motor and drives the second tray to rotate synchronously, and the second tray rotates under the blowing of an airflow, and a mark is provided on the second tray; the device comprises: an image acquisition device, which is used to collect multiple pictures including the second tray; a control module, which is used to determine the motion trajectory of the mark according to the multiple pictures collected, and determine the rotation angular velocity of the second tray according to the motion trajectory, the preset time interval and the rotation angular velocity of the first tray.

[0020] In an optional implementation, the image acquisition device acquires multiple pictures including the second tray, including: acquiring multiple pictures according to a preset number; or acquiring multiple pictures according to a preset time interval, and selecting at least two consecutively acquired pictures including the mark from the multiple pictures.

[0021] In an optional implementation, the preset time interval is less than or equal to the time it takes for the second tray to rotate once.

[0022] In an optional implementation, the image acquisition device is used to start taking pictures when the mark enters the field of view, and stop taking pictures when the mark leaves the field of view.

[0023] In an optional implementation, a control module is further included, which is used to adjust the intensity and / or angle of the airflow according to the determined rotational angular velocity of the second tray, so that the rotational angular velocity of the second tray reaches a preset rotational speed.

[0024] In a fourth aspect of the embodiment of the present application, a film material is provided, and the film material is prepared in the second tray of the semiconductor reaction chamber equipment as described above. Thus, the film material is prepared by using the semiconductor reaction chamber equipment as described above, providing better reaction conditions for the film material preparation.

[0025] In a fifth aspect of the embodiment of the present application, an epitaxial wafer is provided, comprising a substrate and the above-mentioned film material, wherein the film material is arranged on the substrate, wherein the substrate grows the above-mentioned film material in the second tray of the above-mentioned semiconductor reaction chamber device, for example.

[0026] According to a sixth aspect of an embodiment of the present application, a computer-readable storage medium is provided, in which a computer program or instruction is stored. When the computer program or instruction is executed by a processing device, the above method is implemented.

[0027] According to a seventh aspect of an embodiment of the present application, a computer program product is provided, including a computer program or instructions, which implement the above method when the computer program or instructions are executed on a processing device.

[0028] The semiconductor reaction chamber equipment provided in the embodiment of the present application may be a MOCVD reaction chamber, including: a chamber, and a first tray, a second tray and an image acquisition device arranged in the chamber; the second tray is arranged on the first tray, the first tray is a planetary tray, which is used to rotate under the drive of a motor, the second tray is a satellite tray, which is used to revolve with the first tray, and the second tray is also used to rotate under the blowing of an airflow. Among them, a mark is provided on the second tray, and the image acquisition device is used to collect multiple pictures including the mark, and the multiple pictures are used to determine the motion trajectory of the mark, and then the angle of rotation of the second tray can be determined according to the motion trajectory of the mark, and then the rotation angular velocity of the second tray can be determined according to the rotation angle of the second tray and the shooting frequency of the image acquisition device, so as to achieve the measurement and control of the rotation angular velocity of the second tray. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] Figure 1 It is a structural schematic diagram of a MOCVD reaction chamber;

[0030] Figure 2 A schematic diagram of the structure of a MOCVD reaction chamber provided in an embodiment of the present application;

[0031] Figure 3 A schematic diagram of the structure of a second tray provided in an embodiment of the present application;

[0032] Figure 4 A schematic diagram of the structure of another second tray provided in an embodiment of the present application;

[0033] Figure 5 A schematic diagram of an image captured by the image capture device provided in an embodiment of the present application at time t0;

[0034] Figure 6 A schematic diagram of an image captured at time t by the image capture device provided in an embodiment of the present application;

[0035] Figure 7 A flow chart of a method for measuring a pallet rotation speed provided in an embodiment of the present application;

[0036] Figure 8 A flow chart of another method for measuring the rotation speed of a tray provided in an embodiment of the present application;

[0037] Fig. 9 A structural block diagram of a tray rotation speed measuring device provided in an embodiment of the present application;

[0038] Fig.10 A structural block diagram of a semiconductor reaction chamber device provided in an embodiment of the present application. DETAILED DESCRIPTION

[0039] In order to make the objectives, technical solutions and advantages of the present application clearer, the present application will be further described in detail below in conjunction with the accompanying drawings.

[0040] In the following, the terms "first", "second", etc. are used for descriptive purposes only and are not to be understood as indicating or implying relative importance or implicitly indicating the number of the indicated technical features. Thus, a feature defined as "first", "second", etc. may explicitly or implicitly include one or more of the features. In the description of this application, unless otherwise specified, "plurality" means two or more.

[0041] In addition, in the present application, directional terms such as "upper" and "lower" are defined relative to the orientation of the components in the drawings. It should be understood that these directional terms are relative concepts. They are used for relative description and clarification, and they can change accordingly according to the changes in the orientation of the components in the drawings.

[0042] The present application provides a semiconductor reaction chamber device, which can be used to grow semiconductors. In some embodiments, the semiconductor reaction chamber device can be a metal organic chemical vapor deposition (MOCVD) device, which can take all the reaction materials in the form of gas molecules of organic metal compounds, use a carrier gas to bring the saturated vapor of the reaction source into the reaction chamber to mix with other reaction gases, and then chemically react on the heated wafer to promote the growth of the thin film.

[0043] The semiconductor reaction chamber equipment is described below by taking the MOCVD reaction chamber as an example.

[0044] Figure 1 Schematic diagram of the structure of a MOCVD reaction chamber. Figure 1 As shown, the reaction chamber equipment includes: a first tray 10 , and a second tray 20 disposed on the first tray 10 , and a wafer 30 is placed on the second tray 20 .

[0045] In some embodiments, the first tray 10 is a planetary tray, which is driven by a motor and rotates with its center as the origin. The rotation speed of the first tray 10 can be controlled by the motor. When the first tray 10 rotates one circle, the motor generates a pulse signal for synchronization and speed measurement.

[0046] In some embodiments, the first tray 10 is circular in shape.

[0047] In some embodiments, the first tray 10 is made of graphite.

[0048] The second tray 20 is disposed on the first tray 10. In some embodiments, the second tray 20 is a satellite tray. The second tray 20 can revolve with the first tray 10, and can also rotate by airflow.

[0049] The second tray 20 is rotated by airflow, and the rotation speed of the second tray 20 can be adjusted by adjusting the airflow. One or more wafers 30 can be placed on the second tray.

[0050] During operation, the chamber heats the wafer 30 to a certain temperature, introduces organic chemical gases, generates chemical reactions, and deposits on the surface of the wafer 30 . The thin film layer required for the semiconductor device can be grown by controlling the composition and doping of the gas.

[0051] However, the second tray rotates under the airflow, and there is no definite correspondence between the airflow and the rotation speed, so it is impossible to synchronize and measure the speed in real time. Therefore, the embodiment of the present application provides a speed measurement structure to measure the rotation speed of the second tray to monitor and control the rotation speed of the second tray.

[0052] Figure 2 This is a schematic diagram of the structure of a MOCVD reaction chamber provided in an embodiment of the present application. Figure 2 As shown, in some embodiments of the present application, an image acquisition device 50 may be disposed in the cavity to obtain position information of the second tray.

[0053] In some embodiments, the image acquisition device 50 includes: a high-speed camera or a depth meter. Among them, the high-speed camera is also called a digital industrial camera, which is installed in the cavity to replace the human eye for measurement and judgment. It can capture the target through a digital image, and convert the digital image into an image signal, and transmit it to the image processing system. The image processing system performs various operations on these signals to extract the characteristics of the target, and then controls the action of the device that injects the airflow according to the judgment result.

[0054] In addition, a plurality of marks 40 may be provided on the surface of the second tray 20. When the second tray 20 rotates, the marks 40 rotate accordingly, and the rotation trajectory of the marks 40 may be captured by the image acquisition device 50. The image acquisition device 50 may obtain the position of the mark 40 in each picture by taking a plurality of pictures, and obtain the motion trajectory of the mark 40 by comparing the plurality of pictures, and then determine the rotation angle of the second tray 20 according to the motion trajectory of the mark 40, and determine the rotation angular velocity of the second tray according to the rotation angle of the second tray 20 and the photographing frequency of the image acquisition device, thereby realizing the measurement and control of the rotation angular velocity of the second tray.

[0055] The embodiment of the present application does not limit the parameters such as the pattern size, size, shape, depth, and position of the mark 40. Figure 3A schematic structural diagram of a second tray provided in an embodiment of the present application. Figure 4 A schematic diagram of the structure of another second tray provided in an embodiment of the present application.

[0056] In some embodiments, Figure 3 As shown, the mark 40 includes: a triangle pattern, a cross pattern, a pentagonal pattern, a star pattern, and a diamond pattern.

[0057] In other embodiments, Figure 4 As shown, the mark 40 includes: a moon pattern and a circular ring pattern.

[0058] In some embodiments, the wafer 30 is semicircular or has other patterns with notches. In this case, the notches of the wafer 30 can also be used as the above-mentioned mark 40 to determine the rotation speed of the second tray 20 .

[0059] During operation, the first tray 10 in the reaction chamber revolves, the second tray 20 rotates, and the mark 40 and the wafer 30 on the second tray 20 also rotate and revolve together with the second tray 20. The image acquisition device 50 can acquire multiple images including the mark 40 at a preset time interval Δt, wherein the multiple images can be used to determine the moving trajectory of the mark 40, and the moving trajectory of the mark 40 and the preset time interval Δt can be used to determine the rotation angular velocity of the second tray.

[0060] The embodiment of the present application does not limit the number of pictures collected by the image acquisition device, and the above-mentioned multiple pictures can be 2 or more pictures.

[0061] The image acquisition device 50 acquires images at a preset time interval. The embodiment of the present application does not limit the value of the preset time interval Δt. In some embodiments, in order to avoid that the shooting interval is too long and the mark 40 rotates out of the field of view with the second tray when shooting again, so that the mark 40 is not photographed, or in order to avoid that the shooting interval is too long and the mark 40 is photographed again, it is impossible to determine how many times the second tray has rotated within the field of view, the preset time interval Δt can be less than or equal to the time it takes for the second tray to rotate one circle. Therefore, when the image acquisition device 50 detects that the mark 40 enters the field of view and starts shooting, when shooting again, the mark 40 is still within the field of view, and the second tray rotates no more than one circle, so that the rotation angular velocity of the second tray can be accurately determined.

[0062] In some embodiments, the image acquisition device 50 is also used to start taking pictures when the mark 40 enters the viewing field, and stop taking pictures when the mark 40 leaves the viewing field. Thus, the image acquisition device 50 does not need to work all the time, and the power consumption is lower.

[0063] In some embodiments, the MOCVD reaction chamber further includes: a controller. The embodiment of the present application further provides a controller, which can be a growth controller of MOCVD, for example, a controller of the tray speed, which can be used to execute the above tray speed measurement method, which can accurately measure the second tray speed in real time, help online monitoring during MOCVD epitaxial growth, judge the rotation of the second tray, and improve the uniformity of the temperature field and flow field of the MOCVD reaction chamber. Among them, the temperature field of the MOCVD reaction chamber refers to the temperature distribution on the surface of the second tray 20. When the speed of the second tray 20 in the reaction chamber is too fast or too slow, it will cause different heat conduction and different surface temperatures.

[0064] The flow field of the MOCVD reaction chamber refers to the distribution of gas flow in the MOCVD reaction chamber, wherein the rotation speed change of the second tray 20 will affect the flow field of the carrier gas and affect the consumption of raw materials in the reaction chamber.

[0065] In some embodiments, the controller is used to determine a motion trajectory of the marker 40 according to the plurality of collected images, and determine the rotation angular velocity of the second tray according to the motion trajectory, the preset time interval and the rotation angular velocity of the first tray.

[0066] For example, the controller may first determine the rotation angle of the second tray 20 according to the moving trajectory of the marker 40 , and then determine the rotation speed of the second tray 20 according to the rotation angle of the second tray 20 and the photographing frequency of the image acquisition device 50 .

[0067] For example, after continuously acquiring the position information of the marker 40 at two time points t0 and t through the image acquisition device 50, the angle through which the second pallet has rotated can be calculated based on the position information at the two moments, and the rotation angular velocity of the second pallet 20 can be determined based on the angle through which the second pallet has rotated and the time interval between t0 and t.

[0068] Figure 5 A schematic diagram of an image captured at time t0 by the image capture device provided in an embodiment of the present application. Figure 6 Schematic diagram of an image captured by the image acquisition device provided in an embodiment of the present application at time t. Figure 5 , Figure 6 The calculation of the rotation angular velocity of the second tray 20 will be described by taking this as an example.

[0069] In some embodiments, a Cartesian coordinate system may be used, wherein the radius of the first tray (the distance between the center of the second tray and the center of the first tray) is R, and the radius of the second tray (the distance between the geometric center of the marker 40 and the center of the second tray) is r, wherein R and r are known.

[0070] The geometric center of the first tray 10 is taken as the origin (0, 0), and the line connecting the center of the second tray and the center of the first tray is taken as the x-axis.

[0071] The first tray has an angular velocity of revolution of Ω, wherein the first tray rotates driven by a motor. In some embodiments, each rotation of the first tray generates a pulse signal for synchronization and speed measurement, and therefore, Ω is known.

[0072] The rotation angular velocity ω of the second tray can be determined according to the coordinates of the marker 40 at time t0 and the coordinates of the marker 40 at time t.

[0073] For example, Figure 5 As shown, at time t0, the image acquisition device 50 captures the geometric center coordinates (M0, N0) of the marker 40 to satisfy the following formula:

[0074] (M0, N0) = (R + rcosφ, rsinφ) Formula 1;

[0075] In Formula 1, the angle φ is the angle between the line connecting the geometric center of the mark 40 and the center of the second tray at time t0 and the x-axis. Wherein, (M0, N0) is known, R is known, and the value of φ can be obtained according to Formula 1.

[0076] like Figure 6 As shown, at time t, according to the law of cosines, the distance λ from the geometric center of the marker 40 to the origin satisfies:

[0077] λ=[R 2 +r 2 -2Rr·cos(π-ωt-φ)] 1 / 2 Formula 2;

[0078] At time t, the angle θ between the center of the second tray and the center of the mark 40 and the origin satisfies:

[0079] θ=arcsin[rsin(π-ωt-φ) / λ] Formula 3;

[0080] At time t, the image acquisition device 50 captures the center coordinates of the marker 40 as (M, N), where (M, N) satisfies:

[0081] (M, N)=(λ·cos(θ+Ωt), λ·sin(θ+Ωt)) Equation 4;

[0082] Among them, (M, N) is known, and the φ value is substituted into the above formula 2 and formula 3 respectively. Combining the above formula 2, formula 3, and formula 4, the rotation angular velocity ω of the second tray can be obtained.

[0083] Therefore, the MOCVD reaction chamber provided in the embodiment of the present application can accurately measure the rotation speed of the second tray in real time, realize online monitoring during the MOCVD epitaxial growth process, and determine the rotation angular velocity of the second tray, providing data support for the uniformity of the temperature field and flow field of the MOCVD reaction chamber.

[0084] In some embodiments, the controller is further configured to adjust the intensity and / or angle of the airflow according to the determined rotational angular velocity of the second tray, so that the rotational angular velocity of the second tray reaches a preset rotational speed.

[0085] Therefore, the rotation angular velocity of the second tray can be controlled, which can provide better reaction conditions for the semiconductor.

[0086] The embodiment of the present application also provides a method for measuring a tray rotation speed, which can be applied to the above-mentioned semiconductor reaction chamber equipment. Figure 7 A flow chart of a tray speed measurement method provided in an embodiment of the present application. Figure 7 As shown, the method includes:

[0087] S101. The first tray 10 is driven by a motor to rotate and drives the second tray 20 to rotate synchronously.

[0088] The first tray 10 may be a planetary tray, which is driven by a motor and rotates with its center as the origin. Its rotation speed can be controlled by the motor, and one rotation will generate a pulse signal for synchronization and speed measurement.

[0089] The second tray 20 is disposed on the first tray 10 . The second tray 20 is used to carry the wafers 30 . The second tray 20 and the wafers 30 can revolve along with the first tray 10 .

[0090] S102: The second tray 20 rotates under the blowing of airflow.

[0091] The second tray 20 is provided with a mark 40. The second tray 20 is a satellite tray. While the second tray 20 revolves with the first tray 10, it can also rotate under the blowing of the airflow. At this time, the mark 40 and the wafer 30 on the second tray 20 will also rotate and revolve with the second tray 20. The mark 40 can be used to determine the motion trajectory of the second tray 20 when the second tray 20 rotates.

[0092] S103 . The image acquisition device 50 acquires a plurality of pictures including the marker 40 .

[0093] In some embodiments, the image acquisition device 50 acquires a plurality of pictures including the second tray:

[0094] A plurality of pictures are collected according to a preset number, or a plurality of pictures are collected according to a preset time interval, and at least two pictures that are collected continuously and include the mark are selected from the plurality of pictures.

[0095] Among them, when collecting multiple pictures according to a preset number, the preset number should be greater than or equal to 2.

[0096] When collecting multiple pictures according to a preset number or collecting multiple pictures according to a preset time interval, and selecting at least two consecutively collected pictures including the mark from the multiple pictures, in order to avoid the mark 40 being rotated out of the field of view with the second tray when shooting again due to a long interval between shooting, so that the mark 40 is not photographed, or in order to avoid the mark 40 being photographed again due to a long interval between shooting and being unable to determine how many times the second tray has rotated within the field of view, the time interval for collecting pictures should be less than or equal to the time it takes for the second tray to rotate one circle.

[0097] Therefore, when the image acquisition device 50 detects that the mark 40 enters the field of view, the photo is taken. When the photo is taken again, the mark 40 is still in the field of view, and the second tray rotates no more than one circle, thereby accurately determining the rotation angular velocity of the second tray.

[0098] In some embodiments, the image acquisition device 50 acquires a plurality of pictures including the second tray:

[0099] The image acquisition device 50 starts taking pictures when the mark 40 enters the viewing field, and stops taking pictures when the mark 40 leaves the viewing field.

[0100] Therefore, the image acquisition device 50 does not need to work all the time, and the power consumption is lower.

[0101] S104. Determine the rotational angular velocity of the second tray according to the plurality of collected images.

[0102] The motion trajectory of the marker 40 can be determined based on the multiple images collected, and the angle of rotation of the second tray 20 can be determined based on the motion trajectory of the marker 40. The rotation angular velocity of the second tray can be determined based on the angle of rotation of the second tray 20 and the above time interval. For the specific process, please refer to Formulas 1 to 4 in the above embodiment.

[0103] Therefore, the MOCVD reaction chamber provided in the embodiment of the present application can accurately measure the rotation speed of the second tray in real time, realize online monitoring during the MOCVD epitaxial growth process, and determine the rotation angular velocity of the second tray, providing data support for the uniformity of the temperature field and flow field of the MOCVD reaction chamber.

[0104] In some embodiments, the present application also provides a method for measuring a rotation speed of a tray. Figure 8 Another flow chart of a method for measuring the rotation speed of a tray provided in an embodiment of the present application. Figure 8 As shown, after step S104, the method further includes:

[0105] S105. Adjust the intensity and / or angle of the airflow according to the determined rotational angular velocity of the second tray, so that the rotational angular velocity of the second tray reaches a preset rotational speed.

[0106] In some embodiments, the gas valve on the gas track can be adjusted according to the rotational angular velocity of the second tray to change the intensity and / or angle of the gas flow to the second tray.

[0107] Therefore, the rotation angular velocity of the second tray can be controlled, which can provide better reaction conditions for the semiconductor.

[0108] In some embodiments, the present application further provides a film material, which is prepared in the second tray of the semiconductor reaction chamber equipment as described above, for example.

[0109] In addition, in some embodiments, the present application also provides an epitaxial wafer, which includes: a substrate, and the film material as described above, wherein the film material is arranged on the substrate, and the substrate grows the above-mentioned film material in the second tray of the semiconductor reaction chamber equipment as described above.

[0110] In order to better execute the above method, an embodiment of the present application further provides a tray rotation speed measuring device 100, which is applied to a semiconductor reaction chamber device, and the semiconductor reaction chamber device includes: a chamber, and a first tray, a second tray and an image acquisition device arranged in the chamber; the second tray is arranged on the first tray, and the first tray rotates under the drive of a motor and drives the second tray to rotate synchronously, and the second tray rotates under the blowing of an airflow, and a mark 40 is provided on the second tray.

[0111] Fig. 9 FIG. 1 is a structural block diagram of a tray speed measurement device 100 provided in an embodiment of the present application. Fig. 9 As shown, the pallet rotation speed measuring device 100 at least includes: an image acquisition device 50 and a control module 60 .

[0112] The image acquisition device 50 is used to acquire a plurality of pictures including the mark 40 .

[0113] In some embodiments, the image acquisition device 50 acquires multiple pictures including the second tray, including: acquiring multiple pictures according to a preset number, or acquiring multiple pictures according to a preset time interval, and selecting at least two consecutively acquired pictures including the mark from the multiple pictures.

[0114] The preset time interval is less than or equal to the time it takes for the second tray to rotate once.

[0115] In some embodiments, the image acquisition device 50 is used to start taking pictures when the mark 40 enters the field of view, and stop taking pictures when the mark 40 leaves the field of view.

[0116] The control module 60 is used to determine the motion trajectory of the marker 40 according to the collected multiple images, and determine the rotation angular velocity of the second tray according to the motion trajectory, the preset time interval and the rotation angular velocity of the first tray.

[0117] Fig.10 A block diagram of a semiconductor reaction chamber device 1 provided in an embodiment of the present application. In some embodiments, Fig.10 As shown, the control module 60 is connected to the gas valve 70 disposed on the gas rail, and the control module 60 is used to adjust the intensity and / or angle of the airflow from the gas valve 70 to the gas rail according to the determined rotational angular velocity of the second tray, so that the rotational angular velocity of the second tray reaches a preset rotational speed.

[0118] It is understandable that, in order to implement the functions of any of the above-mentioned embodiments, the controller includes hardware structures and / or software modules corresponding to the execution of each function. Those skilled in the art should easily realize that, in combination with the units and algorithm steps of each example described in the embodiments disclosed herein, the present application can be implemented in the form of hardware or a combination of hardware and computer software. Whether a function is executed in the form of hardware or computer software driving hardware depends on the specific application and design constraints of the technical solution. Professional and technical personnel can use different methods to implement the described functions for each specific application, but such implementation should not be considered to be beyond the scope of this application.

[0119] The embodiment of the present application can divide the in-situ monitoring system into functional modules. For example, each functional module can be divided according to each function, or two or more functions can be integrated into one control module. The above-mentioned integrated modules can be implemented in the form of hardware or in the form of software functional modules. It should be noted that the division of modules in the embodiment of the present application is schematic and is only a logical functional division. There may be other division methods in actual implementation.

[0120] It should also be understood that each module in the in-situ monitoring system can be implemented in software and / or hardware form, without specific limitation. In other words, the electronic device is presented in the form of functional modules. The "module" here can refer to a specific application integrated circuit ASIC, a circuit, a processor and memory that executes one or more software or firmware programs, an integrated logic circuit, and / or other devices that can provide the above functions.

[0121] In an optional manner, when data transmission is implemented using software, it can be implemented in whole or in part in the form of a computer program product. The computer program product includes one or more computer instructions. When the computer program instructions are loaded and executed on a computer, the process or function of the embodiment of the present application is implemented in whole or in part. The computer may be a general-purpose computer, a special-purpose computer, a computer network, or other programmable device. The computer instructions may be stored in a computer-readable storage medium, or transmitted from one computer-readable storage medium to another computer-readable storage medium. For example, the computer instructions may be transmitted from a website site, computer, server or data center by wired (e.g., coaxial cable, optical fiber, digital subscriber line (DSL)) or wireless (e.g., infrared, wireless, microwave, etc.) mode to another website site, computer, server or data center. The computer-readable storage medium may be any available medium that a computer can access or a data storage device such as a server or data center that includes one or more available media integrated. The available medium may be a magnetic medium (e.g., a floppy disk, a hard disk, a tape), an optical medium (e.g., a digital video disk (DVD)), or a semiconductor medium (e.g., a solid state disk (SSD)), etc.

[0122] The steps of the method or algorithm described in conjunction with the embodiments of the present application can be implemented in a hardware manner, or can be implemented by a processor executing software instructions. The software instructions can be composed of corresponding software modules, and the software modules can be stored in a RAM memory, a flash memory, a ROM memory, an EPROM memory, an EEPROM memory, a register, a hard disk, a mobile hard disk, a CD-ROM, or any other form of storage medium known in the art. An exemplary storage medium is coupled to a processor so that the processor can read information from the storage medium and can write information to the storage medium. Of course, the storage medium can also be a component of the processor. The processor and the storage medium can be located in an ASIC. In addition, the ASIC can be located in an electronic device. Of course, the processor and the storage medium can also be present in an in-situ monitoring system as discrete components.

[0123] Through the description of the above implementation methods, technical personnel in the relevant field can clearly understand that for the convenience and simplicity of description, only the division of the above-mentioned functional modules is used as an example. In actual applications, the above-mentioned functions can be assigned to different functional modules as needed, that is, the internal structure of the device can be divided into different functional modules to complete all or part of the functions described above.

[0124] The semiconductor reaction chamber equipment provided in the embodiment of the present application may be a MOCVD reaction chamber, comprising: a chamber, and a first tray 10, a second tray 20 and an image acquisition device 50 arranged in the chamber; the second tray 20 is arranged on the first tray 10, the first tray 10 is a planetary disk, which is used to rotate under the drive of a motor, the second tray 20 is a satellite disk, which is used to revolve with the first tray 10, and the second tray 20 is also used to rotate under the blowing of airflow. Among them, a mark 40 is provided on the second tray 20, and the image acquisition device 50 is used to collect multiple pictures including the mark 40, and the multiple pictures are used to determine the motion trajectory of the mark 40, and then the angle of rotation of the second tray 20 can be determined according to the motion trajectory of the mark 40, and then the rotation speed of the second tray 20 can be determined according to the rotation angle of the second tray 20 and the shooting frequency of the image acquisition device 50, so as to achieve the measurement and control of the rotation speed of the second tray 20.

[0125] The above is only a specific implementation of the present application, but the protection scope of the present application is not limited thereto. Any changes or substitutions within the technical scope disclosed in the present application should be included in the protection scope of the present application. Therefore, the protection scope of the present application should be based on the protection scope of the claims.

Claims

1. A semiconductor reaction chamber device, characterized in that: It comprises: a chamber, and a first tray, a second tray and an image acquisition device arranged in the chamber; The second tray is arranged on the first tray, the first tray is used to rotate under the drive of a motor, the second tray is used to revolve along with the first tray, and the second tray is also used to rotate under the blowing of airflow; Wherein, a mark is provided on the second tray, and the image acquisition device is used to acquire a plurality of pictures including the mark, and the plurality of pictures are used to determine the rotation angular velocity of the second tray.

2. The semiconductor reaction chamber equipment according to claim 1, characterized in that: The image acquisition device acquires a plurality of pictures including the mark, including: Collect multiple images according to the preset number; or, Collect multiple pictures according to preset time intervals; At least two pictures that are continuously captured and include the mark are selected from the multiple pictures.

3. The semiconductor reaction chamber equipment according to claim 2, characterized in that: The preset time interval is less than or equal to the time it takes for the second tray to rotate once.

4. The semiconductor reaction chamber equipment according to claim 2 or 3, characterized in that: Also includes: A controller is used to determine the motion trajectory of the second tray based on the multiple images including the mark collected, and determine the rotation angular velocity of the second tray based on the motion trajectory of the second tray, the preset time interval and the rotation angular velocity of the first tray.

5. The semiconductor reaction chamber equipment according to claim 4, characterized in that: The controller is further configured to adjust the intensity and / or angle of the airflow according to the determined rotational angular velocity of the second tray, so that the rotational angular velocity of the second tray reaches a preset rotational speed.

6. The semiconductor reaction chamber equipment according to any one of claims 1 to 5, characterized in that: The image acquisition device is used to start taking pictures when the mark enters the field of view, and stop taking pictures when the mark leaves the field of view.

7. The semiconductor reaction chamber device according to any one of claims 1 to 6, characterized in that: The rotation angle ω of the second tray satisfies: θ=arcsin[λsin(π-ωt-φ) / r]; λ=[R 2 +r 2 -2Rr·cos(π-ωt-φ)] 1 / 2 ; Wherein, r is the radius of the second pallet, R is the radius of the first pallet, θ is the angle between the center of the second pallet and the line connecting the center of the mark and the origin at time t, λ is the distance from the geometric center of the mark to the origin at time t, t is the time interval between time t0 and time t, φ is the angle between the line connecting the geometric center of the mark and the center of the second pallet at time t0 and the x-axis, the origin is the geometric center of the first pallet, and the x-axis is the line connecting the center of the second pallet and the center of the first pallet.

8. The semiconductor reaction chamber equipment according to any one of claims 1 to 7, characterized in that: The chamber comprises an observation window, and the image acquisition device is arranged on the observation window.

9. A method for measuring a pallet rotation speed, characterized in that: The method for measuring the rotation speed of a tray is applied to a semiconductor reaction chamber device, the semiconductor reaction chamber device comprising: a chamber, and a first tray, a second tray and an image acquisition device arranged in the chamber; the second tray is arranged on the first tray, and a mark is arranged on the second tray; the method comprises: The first tray is driven by a motor to rotate and drives the second tray to rotate synchronously; The second tray rotates under the blowing of airflow, and a mark is provided on the second tray; The image acquisition device acquires a plurality of pictures including the mark; The rotation angular velocity of the second tray is determined according to the plurality of collected images.

10. The pallet rotation speed measurement method according to claim 9, characterized in that: The image acquisition device acquires a plurality of pictures including the mark: including: Collect multiple images according to the preset number; or, Collect multiple pictures according to preset time intervals; At least two pictures that are continuously captured and include the mark are selected from the multiple pictures.

11. The method for measuring the rotation speed of a pallet according to claim 9 or 10, characterized in that: The preset time interval is less than or equal to the time it takes for the second tray to rotate once.

12. The pallet rotation speed measurement method according to any one of claims 9 to 11, characterized in that: The image acquisition device acquires a plurality of pictures including the mark, including: The image acquisition device starts taking pictures when the mark enters the viewing field, and stops taking pictures when the mark leaves the viewing field.

13. The pallet rotation speed measurement method according to any one of claims 9 to 12, characterized in that: The method further comprises: The intensity and / or angle of the airflow is adjusted according to the determined rotational angular velocity of the second tray, so that the rotational angular velocity of the second tray reaches a preset rotational speed.

14. A pallet speed measuring device, characterized in that: The device for measuring the rotation speed of a tray is applied to a semiconductor reaction chamber device, and the semiconductor reaction chamber device comprises: a chamber, and a first tray, a second tray and an image acquisition device arranged in the chamber; the second tray is arranged on the first tray, the first tray rotates under the drive of a motor and drives the second tray to rotate synchronously, and the second tray rotates under the blowing of an airflow, and a mark is arranged on the second tray; the device comprises: An image acquisition device, used for acquiring a plurality of pictures including the mark; A control module is used to determine a motion trajectory of the mark according to the plurality of collected images, and to determine the rotation angular velocity of the second tray according to the motion trajectory, the preset time interval and the rotation angular velocity of the first tray.

15. The pallet rotation speed measuring device according to claim 14, characterized in that: The image acquisition device acquires a plurality of pictures including the mark, including: Collect multiple images according to the preset number; or, Collect multiple pictures according to preset time intervals; At least two pictures that are acquired continuously and include the mark are selected from the multiple pictures.

16. The pallet rotation speed measuring device according to claim 14 or 15, characterized in that: The preset time interval is less than or equal to the time it takes for the second tray to rotate once.

17. The pallet rotation speed measuring device according to any one of claims 14 to 16, characterized in that: The image acquisition device is used to start taking pictures when the mark enters the field of view, and stop taking pictures when the mark leaves the field of view.

18. The pallet rotation speed measuring device according to any one of claims 14 to 17, characterized in that: The control module is further configured to adjust the intensity and / or angle of the airflow according to the determined rotational angular velocity of the second tray, so that the rotational angular velocity of the second tray reaches a preset rotational speed.

19. A membrane material, characterized in that: The film material is prepared in the second tray of the semiconductor reaction chamber equipment according to any one of claims 1 to 8.

20. An epitaxial wafer, characterized in that: The epitaxial wafer comprises: a substrate, and the film material as claimed in claim 19, wherein the film material is arranged on the substrate.

21. A computer-readable storage medium, characterized in that: The storage medium stores a computer program or instruction, and when the computer program or instruction is executed by a processing device, the method described in any one of claims 9 to 13 is implemented.

22. A computer program product comprising a computer program or instructions, characterized in that When the computer program or instruction is executed on a processing device, the method according to any one of claims 9 to 13 is implemented.

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