Real-time monitoring system and method for inhibiting arsenic hydrogen precipitation in copper electrowinning dearsenicization process
By monitoring the concentration of copper arsenic ions in real time and controlling the treatment methods of mother liquor and desorption of arsenic liquid, the problems of hydrogen arsenic precipitation and copper co-deposition caused by the inability to dynamically regulate during copper electrolytic refining are solved, and the optimal regulation of copper arsenic ions concentration and improvement of production safety are achieved.
Patent Information
- Application Number
- CN202411638567.1
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2024-11-18
- Publication Date
- 2025-03-18
- Estimated Expiration
- 2044-11-18
AI Technical Summary
The existing copper electrolytic refining technology cannot dynamically regulate the electrolysis process, resulting in hydrogen arsenide precipitation when the copper concentration is too low, and copper co-deposition occurs when the copper concentration is too high, increasing arsenic hazardous waste and copper resource losses, affecting production safety and cost.
A real-time monitoring system and method for the copper electrostatic de-arsenic process to inhibit hydrogen arsenic precipitation is designed. By monitoring the concentration of copper arsenic ions in the primary mother liquor, arsenic de-arsenic circulating liquid and arsenic de-arsenic liquid in real time, the PLC control module and the precise regulation module are used to regulate the inlet volume of the primary mother liquor and the diversion direction of the arsenic de-arsenic liquid to ensure that the copper arsenic ion concentration is within the optimal arsenic de-arsenic range.
Real-time dynamic regulation of the electrolysis process is achieved, the precipitation of hydrogen arsenide is inhibited, the deposition efficiency of arsenic desorption slag is improved, and the residual copper concentration in the arsenic desorption liquid is reduced, and the safety and production needs of the enterprise are met.
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Figure CN119148599B_ABST
Abstract
Description
Technical Field
[0001] The invention belongs to the technical field of clean production of electrolyte purification systems in copper smelting industry, and specifically relates to a real-time monitoring system and method for inhibiting the precipitation of arsenic hydrogen in a copper electrowinning dearsenication process. Background Art
[0002] Copper electrolytic refining and electrolytic dearsenication is a commonly used electrolyte purification method in the industry. Since the copper and arsenic electrodes have similar potentials, co-deposition is very likely to occur. When the copper ion concentration is too low, arsenic discharge and precipitation are very likely to produce highly toxic gas arsenic hydrogen, which cannot be safely produced. When the copper ion concentration is too high, copper co-deposition is very likely to occur when arsenic discharges and precipitates, resulting in resource loss. In order to ensure that copper arsenic ions maintain a certain concentration in the system during the production process of the enterprise, it is necessary to detect and analyze the three links of the primary mother liquor, the dearsenication circulating liquid, and the dearsenication liquid. By adjusting the dosage of the high-concentration liquid of the primary mother liquor, it is ensured that the copper arsenic ion concentration in the electrolytic dearsenication process is within the optimal dearsenication range (the arsenic ion concentration must always be greater than the copper ion concentration, the copper ion can fluctuate in the range of 2-5g / L, and the arsenic ion can fluctuate in the range of 3-10g / L), the copper ion in the dearsenication liquid is controlled at about ≤0.5g / L, and the arsenic ion is controlled at about ≤2.0g / L. However, the current detection and analysis time of the primary mother liquor, arsenic removal circulating liquid and post-arsenic removal liquid in the enterprise laboratory is as long as 2-4 hours, and the concentration of copper arsenic ions in the solution during the electrolysis process is constantly changing. The existing detection and analysis frequency cannot meet the requirements of dynamic regulation of the electrolysis process. As a result, when the copper concentration is too low during the electrolysis process, arsenic hydrogen is precipitated, and when the copper concentration is too high, copper is co-deposited. Arsenic hazardous waste increases the loss of copper resources, which not only increases the production cost of the enterprise, but also creates a series of safety and environmental risks.
[0003] The copper smelting industry urgently needs to invent a real-time monitoring system and method for inhibiting the precipitation of arsenic hydrogen in the copper electrolytic dearsenication process. By real-time monitoring the target ion concentration in the primary mother liquor, dearsenication circulating liquid and dearsenication liquid, the dosage of the primary mother liquor high-concentration liquid can be accurately controlled to ensure that the copper and arsenic ion concentrations in the electrolytic dearsenication process are within the optimal dearsenication range. The precipitation of arsenic hydrogen in the deposition process can be inhibited, the deposition efficiency of dearsenication slag can be improved, and the residual copper concentration in the dearsenication liquid can be reduced to meet the safety and production needs of the enterprise. Summary of the invention
[0004] Aiming at the problems that the electrolytic process of the current copper electrolytic refining and electrolytic arsenic removal cannot be dynamically regulated, arsenic hydrogen is precipitated when the copper concentration is too low, copper is co-deposited when the copper concentration is too high, and arsenic hazardous waste increases the loss of copper resources, the present invention proposes a real-time monitoring system and method for inhibiting the precipitation of arsenic hydrogen in the copper electrolytic arsenic removal process, which can achieve rapid regulation of the optimal copper-arsenic concentration, ensure that the concentrations of copper and arsenic ions in the electrolytic arsenic removal process are within the optimal arsenic removal range, inhibit the precipitation of arsenic hydrogen in the deposition process, improve the deposition efficiency of the arsenic removal slag, and reduce the residual copper concentration in the liquid after arsenic removal.
[0005] To achieve the above object, the present invention adopts the following technical solution:
[0006] In the first aspect, the present invention provides a real-time monitoring method for inhibiting the precipitation of arsenic hydrogen during copper electrowinning dearsenication:
[0007] The method is based on a copper electrolytic dearsenication reaction process consisting of a primary mother liquor pool, a dearsenication circulating liquid pool, an electrolytic dearsenication reaction tank and a post-dearsenication liquid pool;
[0008] 1. Real-time monitoring of the copper ion concentration C in the primary liquid pool t1 and arsenic ion concentration C s1 , copper ion concentration C in the arsenic removal circulating liquid pool t2 and arsenic ion concentration C s2 , copper ion concentration in the liquid pool after arsenic removal and C t3 Arsenic ion concentration C s3 ;
[0009] 2. Obtaining the concentration of copper arsenic ions C in the dearsenic circulating liquid t2 and C s2 Allowable variation range: 2g / L≤C t2 ≤5g / L、3g / L≤C s2 ≤10g / L, and the effluent restriction index of the dearsenication circulating liquid entering the electrolytic dearsenication reaction tank: C s2 >C t2 ≥2 g / L;
[0010] 3. According to the monitored copper-arsenic ion concentration data and the actual volume of the dearsenic circulating liquid pool, the copper concentration equation group and the arsenic concentration equation group are established:
[0011] 2g / L≤ ≤5g / L
[0012] 3g / L≤ ≤10g / L
[0013] In the formula, V1 represents the amount of mother liquor inlet once, and V2 represents the actual volume of the arsenic removal circulating liquid pool;
[0014] 4. Solve the above-mentioned simultaneous equations to obtain the primary mother liquor inlet volume V1 that satisfies the copper arsenic ion concentration in the dearsenicating circulating liquid; ensure that after the primary mother liquor is added to the dearsenicating circulating liquid and the dearsenicating liquid is returned to the dearsenicating circulating liquid periodically, the copper arsenic ion concentration in the dearsenicating circulating liquid is always within the optimal electrolytic dearsenicating range;
[0015] 5. Adjust the separation direction of the effluent after arsenic removal to meet the process index requirements C s3 ≤2 g / L, C t3 ≤0.5 g / L enters the next process electrolytic refining system and does not meet the process index requirements C s3>2 g / L, C t3 >0.5 g / L is returned to the mother liquor pool for reuse.
[0016] In a second aspect, the present invention provides a real-time monitoring system for inhibiting the precipitation of arsenic hydrogen during copper electrowinning dearsenication:
[0017] The system consists of a primary mother liquor pool, a dearsenication circulating liquid pool, an electrolytic dearsenication reaction tank, a post-dearsenication liquid pool, a PLC control module, a primary mother liquor real-time monitoring module, a dearsenication circulating liquid real-time monitoring module, a post-dearsenication liquid real-time monitoring module and a precise control module;
[0018] The input pipeline of the primary mother liquor pool is connected to the concentrated crystallized copper liquid; the output pipeline of the primary mother liquor pool is connected to the arsenic removal circulating liquid pool, the output pipeline of the arsenic removal circulating liquid pool is connected to the post-arsenic removal liquid pool via the electrolytic arsenic removal reaction tank, and the output pipeline of the post-arsenic removal liquid pool is connected to the electrolytic refining system of the next process; a return pipeline is connected between the post-arsenic removal liquid pool and the arsenic removal circulating liquid pool, and a return pipeline is connected between the post-arsenic removal liquid pool and the primary mother liquor pool;
[0019] The PLC control module communicates and is electrically connected with the primary mother liquor real-time monitoring module, the arsenic removal circulating liquid real-time monitoring module, the arsenic removal post-liquid real-time monitoring module and the precise control module respectively; the PLC control module is used to issue operation instructions to the primary mother liquor real-time monitoring module, the arsenic removal circulating liquid real-time monitoring module and the arsenic removal post-liquid real-time monitoring module and receive feedback real-time monitoring data; the PLC control module issues instructions to the precise control module based on the feedback real-time monitoring data, adjusts the valve opening, obtains a suitable amount of liquid inlet from the primary mother liquor pool to the arsenic removal circulating liquid pool, and adjusts the separation direction of the effluent from the arsenic removal post-liquid pool;
[0020] The primary mother liquor real-time monitoring module is installed in the primary mother liquor pool, communicates with and is electrically connected to the PLC control module, and is used to monitor the copper ion concentration and the arsenic ion concentration in the primary mother liquor pool in real time according to the instructions of the PLC control module, and transmit the copper ion concentration and the arsenic ion concentration in the primary mother liquor pool to the PLC control module in real time through feedback;
[0021] The dearsenicating circulating liquid real-time monitoring module is installed in the dearsenicating circulating liquid pool, communicates with and is electrically connected to the PLC control module, and is used to monitor the copper ion concentration and arsenic ion concentration in the dearsenicating circulating liquid pool in real time according to the instructions of the PLC control module, and transmit the copper ion concentration and arsenic ion concentration in the dearsenicating circulating liquid pool to the PLC control module in real time through feedback;
[0022] The post-arsenic removal liquid real-time monitoring module is installed in the post-arsenic removal liquid pool, communicates with and is electrically connected to the PLC control module, and is used to monitor the copper ion concentration and arsenic ion concentration in the post-arsenic removal liquid pool in real time according to the instructions of the PLC control module, and transmit the copper ion concentration and arsenic ion concentration in the post-arsenic removal liquid pool to the PLC control module in real time through feedback;
[0023] The precise control module includes a first precise control module and a second precise control module; the first precise control module is installed on the pipeline between the primary mother liquor pool and the arsenic removal circulating liquid pool, communicates and is electrically connected to the PLC control module, includes an electromagnetic control valve and a volume flow meter, and is used to measure parameters and adjust the opening of the electromagnetic control valve using the volume flow meter according to the instructions of the PLC control module; the second precise control module is installed at the output end of the arsenic removal liquid pool, communicates and is electrically connected to the PLC control module, includes a plurality of electromagnetic control valve groups and a shunt pipeline, and is used to open or close the electromagnetic control valve group and transport the arsenic removal liquid effluent to the next process electrolytic refining system or return to the primary mother liquor pool through the shunt pipeline according to the instructions of the PLC control module.
[0024] The remarkable effects of the present invention are:
[0025] The present invention provides a real-time monitoring system and method for inhibiting the precipitation of arsenic hydrogen during copper electrolytic dearsenication, including a PLC control module, a primary mother liquor real-time monitoring module, a dearsenication circulating liquid real-time monitoring module, a dearsenication post-liquid real-time monitoring module, and a precise control module. The present invention utilizes the difference in copper arsenic electrodeposition and concentration competition, takes the copper arsenic concentration difference and limit of the dearsenication circulating liquid as constraint indicators, controls the monitoring module through the PLC control module to obtain the copper arsenic concentration in the primary mother liquor, the dearsenication circulating liquid and the dearsenication post-liquid in real time, calculates and analyzes the copper arsenic ion concentration demand in the dearsenication circulating liquid, and precisely controls the addition amount of the primary mother liquor high-concentration copper arsenic liquid to ensure that the copper arsenic ion concentration of the dearsenication circulating liquid after the dearsenication post-liquid cycle is always in the optimal electrolytic dearsenication range, improves arsenic deposition and reduces copper deposition, inhibits the precipitation of highly toxic gas dearsenic hydrogen, and precisely controls the dearsenication post-liquid diversion, achieves efficient dearsenication, and meets the enterprise's safety production needs. BRIEF DESCRIPTION OF THE DRAWINGS
[0026] Figure 1 It is the system block diagram and control route diagram of the present invention.
[0027] Figure 2 This is a graph showing changes in copper and arsenic ion concentration in the primary mother liquor of actual working condition samples from the enterprise.
[0028] Figure 3 This is a graph showing changes in copper arsenic ion concentration in the dearsenic circulating fluid in actual enterprise operating samples.
[0029] Figure 4This is a graph showing changes in arsenic ion concentration in liquid copper after arsenic removal in actual working condition samples of the enterprise. DETAILED DESCRIPTION
[0030] In order to make the purpose, technical solutions and advantages of the embodiments of the present invention clearer, the technical solutions in the embodiments will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. The following embodiments are used to illustrate the present invention.
[0031] See also Figure 1 The system structure of the present invention includes: a primary mother liquor pool, a arsenic removal circulating liquid pool, an electrolytic arsenic removal reaction tank, a post-arsenic removal liquid pool, a PLC control module 1, a primary mother liquor real-time monitoring module 2, a arsenic removal circulating liquid real-time monitoring module 3, a post-arsenic removal liquid real-time monitoring module 4, and a precise control module 5.
[0032] See also Figure 1 The connection method of the primary mother liquor tank, the dearsenication circulating liquid tank, the electrolytic dearsenication reaction tank and the post-dearsenication liquid tank is as follows: the input pipeline of the primary mother liquor tank is connected to the concentrated crystallized copper liquid; the output pipeline of the primary mother liquor tank is connected to the dearsenication circulating liquid tank, the output pipeline of the dearsenication circulating liquid tank is connected to the post-arsenication liquid tank via the electrolytic dearsenication reaction tank, and the output pipeline of the post-arsenication liquid tank is connected to the electrolytic refining system of the next process; a return pipeline is connected between the post-arsenication liquid tank and the dearsenication circulating liquid tank, and a return pipeline is connected between the post-arsenication liquid tank and the primary mother liquor tank.
[0033] See also Figure 1 The PLC control module 1 is respectively communicated and electrically connected with the primary mother liquor real-time monitoring module 2, the dearsenicating circulating liquid real-time monitoring module 3, the dearsenicating post-liquid real-time monitoring module 4 and the precise control module 5, and can realize the following functions:
[0034] Control and monitoring: PLC control module 1 can send A-1 instruction, A-2 instruction and A-3 instruction to primary mother liquor real-time monitoring module 2, dearsenicating circulating liquid real-time monitoring module 3 and dearsenicating liquid real-time monitoring module 4 at the same time, and is responsible for receiving A-1 feedback, A-2 feedback and A-3 feedback information, and obtains the copper ion concentration C in the primary mother liquor from A-1 feedback. t1 and arsenic ion concentration C s1 The copper ion concentration C in the arsenic removal circulating liquid is obtained by feedback from A-2 t2 and arsenic ion concentration C s2 The copper ion concentration and C in the dearsenicized solution are obtained by feedback from A-3. t3 Arsenic ion concentration C s3 .
[0035] See also Figure 2 , Figure 3 , Figure 4 , which respectively show the copper ion concentration and arsenic ion concentration in the primary mother liquor, arsenic removal circulating liquid, and arsenic removal liquid in the actual operating condition samples of the enterprise.
[0036] Analysis data: Effect of arsenic removal cycle process on copper arsenic ion concentration C t2 and C s2 The allowable range of variation is: 2g / L≤C t2 ≤5g / L、3g / L≤C s2 ≤10g / L, the restriction index of the effluent of the dearsenication circulating liquid entering the electrolytic dearsenication is C s2 >C t2 ≥2g / L, that is, the concentration of arsenic and copper ions can be high or low, but the concentration of arsenic ions must be greater than the concentration of copper ions (to inhibit copper discharge precipitation), and the concentration of copper ions must be ≥2g / L (to inhibit the precipitation of arsenic hydrogen). First, the copper concentration equation group (1) and the arsenic concentration equation group (2) are listed.
[0037] 2g / L≤ ≤5g / L (1)
[0038] 3g / L≤ ≤10g / L (2)
[0039] Wherein, V1 represents the amount of mother liquor inlet, and V2 represents the volume of the arsenic removal circulating liquid pool.
[0040] According to the copper-arsenic concentration data fed back in real time by the monitoring module and the actual volume of the dearsenicating circulating liquid pool, the simultaneous equations (1) and (2) are solved to obtain the high-concentration primary mother liquor inlet volume V1 that simultaneously satisfies the copper-arsenic ion concentration in the dearsenicating circulating liquid.
[0041] Precision control: According to the analysis data results, the PLC control module 1 can send a B instruction to the first precision control module 5-1 to adjust the valve opening to obtain the adapted primary mother liquor inlet volume V1; according to the real-time monitoring data, the PLC control module 1 can send a C instruction to the second precision control module 5-2 to adjust the liquid separation direction after arsenic removal to meet the process index requirements (C s3 ≤2g / L, C t3 ≤0.5 g / L) enters the next process electrolytic refining system and does not meet the index requirements (C s3 >2 g / L, C t3 >0.5g / L) is returned to the mother liquor pool for reuse.
[0042] See also Figure 1 The primary mother liquor real-time monitoring module 2 is installed in the primary mother liquor pool, communicates with and is electrically connected to the PLC control module 1, and monitors the copper ion concentration C in the primary mother liquor pool in real time according to the A-1 instruction of the PLC control module 1. t1 and arsenic ion concentration C s1 , and the copper ion concentration C is fed back through A-1 t1 and arsenic ion concentration C s1Transmit to PLC control module 1 in real time.
[0043] See also Figure 1 The dearsenication circulating liquid real-time monitoring module 3 is installed in the dearsenication circulating liquid pool, communicates with and is electrically connected to the PLC control module 1, and monitors the copper ion concentration C in the dearsenication circulating liquid pool in real time according to the A-2 instruction of the PLC control module 1. t2 and arsenic ion concentration C s2 , and the copper ion concentration C is fed back through A-2 t2 and arsenic ion concentration C s2 Transmit to PLC control module 1 in real time.
[0044] See also Figure 1 The real-time monitoring module 4 for the dearsenicated liquid is installed in the dearsenicated liquid pool, communicates with and is electrically connected to the PLC control module 1, and monitors the copper ion concentration C in the dearsenicated liquid pool in real time according to the A-3 instruction of the PLC control module 1. t3 and arsenic ion concentration C s3 , and the copper ion concentration C is fed back through A-3 t3 and arsenic ion concentration C s3 Transmit to PLC control module 1 in real time.
[0045] See also Figure 1 The precision control module 5 includes a first precision control module 5-1 installed on the pipeline between the primary mother liquor pool and the arsenic removal circulating liquid pool and a second precision control module 5-2 installed at the output end of the liquid pool after arsenic removal, both of which are in communication and electrical connection with the PLC control module 1; wherein the first precision control module 5-1 contains an electromagnetic control valve and a volume flow meter, which can dynamically adjust the opening of the electromagnetic control valve according to the B instruction of the PLC control module 1 and the parameters measured by the volume flow meter, so as to accurately control the liquid inlet volume V1 of the primary mother liquor, and ensure that the total amount of copper T entering the arsenic removal circulating liquid pool is 总铜 =C t1 *V1, meets the data analysis requirements of the PLC control module 1; the second precise control module 5-2 contains multiple electromagnetic regulating valve groups and diversion pipes, which can open or close the electromagnetic regulating valve groups according to the C instruction of the PLC control module 1. Qualified liquid proceeds to the next process, and unqualified liquid returns to the primary mother liquid pool.
[0046] See also Figure 1 The "periodic circulation" arrow in the post-arsenic removal liquid pool points to the de-arsenic removal circulating liquid pool, that is, the low-concentration solution in the post-arsenic removal liquid pool will circulate periodically into the de-arsenic removal circulating liquid pool. This is because the liquid in the de-arsenic removal circulating liquid pool needs to be replenished in real time after consumption. The large amount of replenishment is the post-arsenic removal liquid, and the small amount is the primary mother liquor.
[0047] Note: The concentration of copper arsenic ions in the arsenic removal circulating liquid must be adjusted to a certain range before it can enter the electrolytic arsenic removal process. The low-copper and low-arsenic arsenic removal liquid is preferentially returned to the arsenic removal circulating liquid pool for mixing to ensure a certain water balance. When the water volume of the arsenic removal circulating liquid is too large due to the continuous addition of the primary mother liquor, the excess arsenic removal liquid will enter the subsequent electrolytic refining system. The arsenic removal liquid is continuously returned to the arsenic removal circulating liquid for mixing, resulting in a continuous decrease in the copper arsenic ion concentration. Therefore, it is necessary to accurately control the amount of high-concentration copper arsenic liquid added to the primary mother liquor according to the copper arsenic ion concentration demand in the arsenic removal circulating liquid to ensure that the copper arsenic ion concentration of the arsenic removal circulating liquid is always in the optimal electrolytic arsenic removal range after the arsenic removal liquid returns periodically.
[0048] [Example]
[0049] Table 1 Basic information
[0050]
[0051] 1) Monitoring module data: The copper arsenic in the primary mother liquor, dearsenicating circulating liquid, and dearsenicating liquid is always in dynamic change. The actual measured value before regulation is C t1 =25g / L, C s1 =22 g / L; Dearsenication circulating liquid C t2 =3 g / L, C s2 =8 g / L; after arsenic removal, liquid C t1 =0.3 g / L, C s1 =3 g / L;
[0052] 2) Known enterprise structure data: Dearsenic circulation pool volume, assuming: V2 = 200m 3 ;
[0053] 3) Because the copper C is always kept in the dearsenic circulating liquid pool t2 ≥2 g / L, Arsenic C s2 ≥3 g / L (the dearsenicated liquid is periodically returned to the dearsenicating circulating liquid tank), so only the solution that satisfies the copper C t2 ≤5g / L, Arsenic C s2 The amount of mother liquor added at one time V1 is ≤10 g / L;
[0054] Solve the system of simultaneous equations (1) ≤5g / L and (2) ≤10g / L
[0055] That is: (1) V1≤ and (2) V1≤
[0056] Substituting the measured data in 1), we get: (1) V1≤ = =20m 3 / h
[0057] (2) V1≤ = =33m 3 / h
[0058] It can be seen that when both (1) and (2) are required to be met, the value is V1≤20m 3 / h
[0059] Assume that V1=18m 3 / h, and then substitute the data into the formula, the copper arsenic concentration of the arsenic removal circulating liquid after adding the primary mother liquor is obtained:
[0060] Copper concentration: (1) = = 4.8g / L, satisfying 2g / L≤C t2 ≤5g / L requirement;
[0061] Arsenic concentration: (2) = = 9.2g / L, satisfying 3g / L≤C s2 Requirement of ≤10g / L.
[0062] The above description of the embodiments is to facilitate the understanding and application of the present invention by those skilled in the art. It is obvious that those skilled in the art can easily make various modifications to these embodiments and apply the general principles described herein to other embodiments without creative work. Therefore, the present invention is not limited to the embodiments herein, and improvements and modifications made by those skilled in the art based on the disclosure of the present invention without departing from the scope of the present invention should be within the protection scope of the present invention.
Claims
1. A real-time monitoring method for inhibiting the precipitation of arsenic hydrogen in a copper electrodeposition dearsenicization process, characterized in that: Based on the copper electrolytic dearsenication reaction process composed of a primary mother liquor pool, a dearsenication circulating liquid pool, an electrolytic dearsenication reaction tank and a post-dearsenication liquid pool; 1. Real-time monitoring of the copper ion concentration C in the primary liquid pool t1 and arsenic ion concentration C s1 , copper ion concentration C in the arsenic removal circulating liquid pool t2 and arsenic ion concentration C s2 , copper ion concentration in the liquid pool after arsenic removal and C t3 Arsenic ion concentration C s3 ; 2. Obtaining the concentration of copper arsenic ions C in the dearsenic circulating liquid t2 and C s2 Allowable variation range: 2g / L≤C t2 ≤5g / L、3g / L≤C s2 ≤10g / L, and the effluent restriction index of the dearsenication circulating liquid entering the electrolytic dearsenication reaction tank: C s2 >C t2 ≥2 g / L; 3. According to the monitored copper-arsenic ion concentration data and the actual volume of the dearsenic circulating liquid pool, the copper concentration equation group and the arsenic concentration equation group are established: In the formula, V1 represents the amount of mother liquor inlet once, and V2 represents the actual volume of the arsenic removal circulating liquid pool; 4. Solve the above-mentioned simultaneous equations to obtain the primary mother liquor inlet volume V1 that satisfies the copper arsenic ion concentration in the dearsenicating circulating liquid; ensure that after the primary mother liquor is added to the dearsenicating circulating liquid and the dearsenicating liquid is returned to the dearsenicating circulating liquid periodically, the copper arsenic ion concentration in the dearsenicating circulating liquid is always within the optimal electrolytic dearsenicating range; 5. Adjust the separation direction of the effluent after arsenic removal to meet the process index requirements, that is, C s3 ≤2g / L, C t3 ≤0.5g / L enters the next process electrolytic refining system; does not meet the process index requirements, that is, C s3 >2g / L, C t3 >0.5g / L is returned to the mother liquor pool for reuse.
2. A real-time monitoring system for inhibiting the precipitation of arsenic hydrogen in a copper electrowinning dearsenicization process, characterized in that: The system comprises a primary mother liquor pool, a dearsenicating circulating liquid pool, an electrolytic dearsenicating reaction tank, a post-dearsenicating liquid pool, a PLC control module (1), a primary mother liquor real-time monitoring module (2), a dearsenicating circulating liquid real-time monitoring module (3), a post-dearsenicating liquid real-time monitoring module (4) and a precise control module (5); The input pipeline of the primary mother liquor pool is connected to the concentrated crystallized copper liquid; the output pipeline of the primary mother liquor pool is connected to the arsenic removal circulating liquid pool, the output pipeline of the arsenic removal circulating liquid pool is connected to the post-arsenic removal liquid pool via the electrolytic arsenic removal reaction tank, and the output pipeline of the post-arsenic removal liquid pool is connected to the electrolytic refining system of the next process; a return pipeline is connected between the post-arsenic removal liquid pool and the arsenic removal circulating liquid pool, and a return pipeline is connected between the post-arsenic removal liquid pool and the primary mother liquor pool; The PLC control module (1) is respectively in communication and electrically connected with the primary mother liquor real-time monitoring module (2), the arsenic removal circulating liquid real-time monitoring module (3), the arsenic removal liquid real-time monitoring module (4) and the precise control module (5); the PLC control module (1) is used to issue operation instructions to the primary mother liquor real-time monitoring module (2), the arsenic removal circulating liquid real-time monitoring module (3) and the arsenic removal liquid real-time monitoring module (4) and receive feedback real-time monitoring data; the PLC control module (1) issues instructions to the precise control module (5) based on the feedback real-time monitoring data, adjusts the valve opening, obtains a suitable liquid inlet amount from the primary mother liquor pool to the arsenic removal circulating liquid pool, and adjusts the separation direction of the effluent from the arsenic removal liquid pool; The primary mother liquor real-time monitoring module (2) is installed in the primary mother liquor pool, communicates with and is electrically connected to the PLC control module (1), and is used to monitor the copper ion concentration and the arsenic ion concentration in the primary mother liquor pool in real time according to the instructions of the PLC control module (1), and transmit the copper ion concentration and the arsenic ion concentration in the primary mother liquor pool to the PLC control module (1) in real time through feedback; The arsenic removal circulating liquid real-time monitoring module (3) is installed in the arsenic removal circulating liquid pool, communicates with and is electrically connected to the PLC control module (1), and is used to monitor the copper ion concentration and the arsenic ion concentration in the arsenic removal circulating liquid pool in real time according to the instructions of the PLC control module (1), and transmit the copper ion concentration and the arsenic ion concentration in the arsenic removal circulating liquid pool to the PLC control module (1) in real time through feedback; The post-arsenic removal liquid real-time monitoring module (4) is installed in the post-arsenic removal liquid pool, communicates with and is electrically connected to the PLC control module (1), and is used to monitor the copper ion concentration and the arsenic ion concentration in the post-arsenic removal liquid pool in real time according to the instructions of the PLC control module (1), and transmit the copper ion concentration and the arsenic ion concentration in the post-arsenic removal liquid pool to the PLC control module (1) in real time through feedback; The precise control module (5) comprises a first precise control module (5-1) and a second precise control module (5-2); The first precision control module (5-1) is installed on the pipeline between the primary mother liquor pool and the arsenic removal circulating liquid pool, communicates with and is electrically connected to the PLC control module (1), and includes an electromagnetic control valve and a volume flow meter, which is used to measure parameters and adjust the opening of the electromagnetic control valve using the volume flow meter according to the instructions of the PLC control module (1); the second precision control module (5-2) is installed at the output end of the arsenic removal liquid pool, communicates with and is electrically connected to the PLC control module (1), and includes a plurality of electromagnetic control valve groups and a shunt pipeline, which is used to open or close the electromagnetic control valve group and transport the arsenic removal liquid effluent to the next process electrolytic refining system or return it to the primary mother liquor pool through the shunt pipeline according to the instructions of the PLC control module (1).
Citation Information
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