Heatable windshield

Abstract

The invention relates to a heatable windshield. A coated article includes a substrate, a first dielectric layer, a first metal layer, a first primer layer, a second dielectric layer, a second metal layer, a second primer layer, a third dielectric layer, a third primer layer, a third metal layer, and a fourth dielectric layer. The total combined thickness of the metal layers is at least 30 nanometers and no more than 60 nanometers. The article may have a sheet resistance of less than 0.85 Omega / sq, a visible reflectance of not greater than 10%, and a visible transmission of at least 70%.

Description

CROSS-REFERENCE TO RELATED APPLICATIONS

[0001] This application is a divisional application of Chinese invention patent application No. 202080031405.5 (international application No. PCT / US2020 / 024957), with a priority date of March 28, 2019 and an invention name of “heatable windshield”. This application enjoys and claims the priority of U.S. Provisional Application No. 62 / 976,645 filed on February 14, 2020 and U.S. Provisional Application No. 62 / 825,326 filed on March 28, 2019, and the disclosures of which are incorporated herein by reference. Technical Field

[0002] The present invention relates generally to vehicle transparencies, such as vehicle windshields, and in one particular embodiment, to a heatable vehicle windshield. Background Art

[0003] Passing an electric current through a conductor on a laminated vehicle windshield will raise the temperature of the windshield. This is particularly useful in colder climates for defogging and melting ice and / or snow on the windshield. In a wire-heated windshield, thin electrical wires are placed between the plies of the windshield. The wires are connected to a power source, such as a conventional 14 volt vehicle alternator. The wires have a sufficiently low resistance to provide a power source having a power level of 5 to 7 watts per square decimeter (W / dm 2 ) power density of the windshield.

[0004] A problem with wire-heated windshields is that the wires can be seen by vehicle occupants, which is aesthetically undesirable and can interfere with visibility through the windshield. If the diameter of the wires is reduced in an attempt to reduce the visibility of the wires, the number of wires must be increased to maintain the desired power density, which disadvantageously reduces the total solar energy transmitted by the windshield (TSET). If the height of the windshield is increased, the wires must be longer to maintain the desired power density. Longer wires are also undesirable for aesthetics and / or transmittance.

[0005] Some heated windshields use transparent conductive coatings instead of wires. However, these coatings have their own disadvantages. For example, conventional heated windshield coatings typically have a sheet resistance of 2 ohms / square (Ω / □) or more. Conventional 14V (80 amps, 1120 watts) alternators cannot provide enough voltage to provide a temperature sufficient for deicing for conventional heated windshield coatings. Therefore, for vehicles with these coatings, the vehicle must be modified to increase the available voltage. For example, a 42V alternator can be used to replace the alternator, or a DC to DC converter can be added to increase the voltage from the 14V alternator. However, these solutions increase the cost and complexity of the vehicle's electrical system.

[0006] It would therefore be desirable to provide a transparency that reduces or eliminates at least some of the problems associated with conventional heatable transparencies. Summary of the invention

[0007] The present invention relates to reducing the sheet resistance of coated transparent parts by adding a metallic silver layer in the coating stack. Specifically, the total amount of silver in the coating stack is between 30nm and 60nm; between 35 and 47nm; between 35 and 43nm, or between 40 and 47nm. As the silver thickness increases, the sheet resistance decreases. However, if the total thickness of the silver layer in the coating is too thick, the transmittance decreases to below 70%, which is unacceptable. In addition, if the total silver thickness is too thick, the color of the glass will appear red, which is undesirable. Therefore, the present invention is a coating stack having a total silver thick enough to provide a sheet resistance to allow de-icing with a 14V alternator, and having a transmittance above 70%, preferably above 70.5%, and more preferably above 71%.

[0008] The present invention relates to a coated article comprising a substrate. The coated article is coated with at least one dielectric layer and at least one metal layer located above the substrate. The at least one metal layer has a combined thickness of at least 30 nm and not more than 60 nm; at least 35 nm and not more than 47 nm; at least 35 nm and not more than 43 nm, or at least 40 and not more than 47 nm.

[0009] The present invention relates to a coated article. The coated article comprises a substrate. A first dielectric layer is located above at least a portion of the substrate. A first metal layer is located above at least a portion of the first dielectric layer. A second dielectric layer is located above at least a portion of the first primer layer. The second metal layer is located above at least a portion of the second dielectric layer. A third dielectric layer is located above at least a portion of the second primer layer. The third metal layer is located above at least a portion of the third dielectric layer. A fourth dielectric layer is located above at least a portion of the third primer layer. The total combined thickness of the metal layers is at least 30 nm and not greater than 60 nm. The present invention may optionally further comprise a fourth metal layer located above the fourth dielectric layer, and a fifth dielectric layer located above at least a portion of the fourth metal layer.

[0010] In another embodiment, the present invention relates to a coated article. The coated article comprises a substrate. A first dielectric layer is located above at least a portion of the substrate. A first metal layer is located above at least a portion of the first dielectric layer. A first primer layer is located above at least a portion of the first metal layer. A second dielectric layer is located above at least a portion of the first primer layer. A second metal layer is located above at least a portion of the second dielectric layer. A second primer layer is located above at least a portion of the second metal layer. A third dielectric layer is located above at least a portion of the second primer layer. A third metal layer is located above at least a portion of the third dielectric layer. A third primer layer is located above at least a portion of the third metal layer. A fourth dielectric layer is located above at least a portion of the third primer layer. The total combined thickness of the metal layers is at least 30 nm and not greater than 60 nm. The present invention may optionally further comprise a fourth metal layer located above the fourth dielectric layer, a fourth primer layer located above the fourth metal layer, and a fifth dielectric layer located above at least a portion of the fourth primer layer.

[0011] In another embodiment, the present invention is directed to a coated article. The coated article comprises a substrate. A first dielectric layer is located over at least a portion of the substrate. A first metal layer is located over at least a portion of the first dielectric layer. A second dielectric layer is located over at least a portion of the first primer layer. A second metal layer is located over at least a portion of the second dielectric layer. A third dielectric layer is located over at least a portion of the second primer layer. A third metal layer is located over at least a portion of the third dielectric layer. A fourth dielectric layer is located over at least a portion of the third primer layer. The article has a sheet resistance of no greater than 0.850 ohms per square. The present invention may optionally further comprise a fourth metal layer located over the fourth dielectric layer, and a fifth dielectric layer located over at least a portion of the fourth metal layer.

[0012] In another embodiment, the present invention relates to a coated article. The coated article comprises a substrate. A first dielectric layer is located over at least a portion of the substrate. A first metal layer is located over at least a portion of the first dielectric layer. A first primer layer is located over at least a portion of the first metal layer. A second dielectric layer is located over at least a portion of the first primer layer. A second metal layer is located over at least a portion of the second dielectric layer. A second primer layer is located over at least a portion of the second metal layer. A third dielectric layer is located over at least a portion of the second primer layer. A third metal layer is located over at least a portion of the third dielectric layer. A third primer layer is located over at least a portion of the third metal layer. A fourth dielectric layer is located over at least a portion of the third primer layer. The article has a sheet resistance of no more than 0.850 ohms per square. The present invention may optionally further comprise a fourth metal layer located over the fourth dielectric layer, a fourth primer layer located over the fourth metal layer, and a fifth dielectric layer located over at least a portion of the fourth primer layer.

[0013] In another embodiment, the present invention relates to a coated article. The coated article comprises a first substrate having a first surface and a second surface. The second substrate is located above at least a portion of the first substrate and comprises a third surface and a fourth surface. A coating is disposed above the second surface or the third surface. The coating has a first dielectric layer located above at least a portion of the second surface or the third surface. A first metal layer is located above at least a portion of the first dielectric layer. A second dielectric layer is located above at least a portion of the first metal layer. A second metal layer is located above at least a portion of the second dielectric layer. A third dielectric layer is located above at least a portion of the second metal layer. A third metal layer is located above at least a portion of the third dielectric layer. The coated substrate has a visible light reflectance of no more than 10%. The present invention may optionally further comprise a fourth metal layer located above the fourth dielectric layer, and a fifth dielectric layer located above at least a portion of the fourth metal layer.

[0014] In another embodiment, the present invention relates to a coated article. The coated article comprises a first substrate having a first surface and a second surface. The second substrate is located above at least a portion of the first substrate and comprises a third surface and a fourth surface. The coating is disposed above the second surface or the third surface. The coating has a first dielectric layer located above at least a portion of the second surface or the third surface. The first metal layer is located above at least a portion of the first dielectric layer. The first primer layer is located above at least a portion of the first metal layer. The second dielectric layer is located above at least a portion of the first primer layer. The second metal layer is located above at least a portion of the second dielectric layer. The second primer layer is located above at least a portion of the second metal layer. The third dielectric layer is located above at least a portion of the second primer layer. The third metal layer is located above at least a portion of the third dielectric layer. The third primer layer is located above at least a portion of the third metal layer. The fourth dielectric layer is located above at least a portion of the third primer layer. The coated substrate has a visible light reflectance of not more than 10%. The present invention may optionally further comprise a fourth metal layer located above the fourth dielectric layer, a fourth primer layer located above the fourth metal layer, and a fifth dielectric layer located above at least a portion of the fourth primer layer.

[0015] In another embodiment, the present invention is directed to a coated article. The coated article comprises a substrate. A first dielectric layer is located over at least a portion of the substrate. A first metal layer is located over at least a portion of the first dielectric layer. A second dielectric layer is located over at least a portion of the first metal layer. The second metal layer is located over at least a portion of the second dielectric layer. The total combined thickness of the metal layers is at least 38 nanometers and no greater than 60 nanometers.

[0016] In another embodiment, the present invention is directed to a coated article. The coated article comprises a substrate. A first dielectric layer is located over at least a portion of the substrate. A first metal layer is located over at least a portion of the first dielectric layer. A first primer layer is located over at least a portion of the first metal layer. A second dielectric layer is located over at least a portion of the first primer layer. A second metal layer is located over at least a portion of the second dielectric layer. The second primer layer is located over at least a portion of the second metal layer. The total combined thickness of the metal layers is at least 30 nm and no greater than 60 nm. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] The present invention will be described with reference to the following drawings, wherein like reference numerals refer to like parts throughout.

[0018] Figure 1a is a cross-sectional view (not to scale) of a non-limiting coating according to the present invention.

[0019] Figure 1b is a cross-sectional view (not to scale) of a non-limiting coating according to the present invention.

[0020] Figure 2a is a cross-sectional view (not to scale) of a non-limiting coating according to the present invention.

[0021] Figure 2b is a cross-sectional view (not to scale) of a non-limiting coating according to the present invention.

[0022] Figure 3a is a cross-sectional view (not to scale) of a non-limiting coating according to the present invention.

[0023] Figure 3b is a cross-sectional view (not to scale) of a non-limiting coating according to the present invention.

[0024] Figure 4a is a cross-sectional view (not to scale) of a non-limiting coating according to the present invention.

[0025] Figure 4b is a cross-sectional view (not to scale) of a non-limiting coating according to the present invention.

[0026] Figure 5a -b is a cross-sectional view (not to scale) of a non-limiting first dielectric layer embodiment according to the present invention.

[0027] Figure 6a -d is a cross-sectional view (not to scale) of a non-limiting second dielectric layer embodiment according to the present invention.

[0028] Figure 7a -d is a cross-sectional view (not to scale) of a non-limiting third dielectric layer embodiment according to the present invention.

[0029] Figure 8a -d is a cross-sectional view (not to scale) of a non-limiting fourth dielectric layer embodiment according to the present invention.

[0030] Figure 9a -b is a cross-sectional view (not to scale) of a non-limiting fifth dielectric layer embodiment according to the present invention.

[0031] Fig.10 is a schematic diagram (not to scale) of a windshield incorporating features of the present invention.

[0032] Fig.11 is along Fig.11 An expanded view of the windshield taken along line III I I (not to scale).

[0033] Fig.12 is a schematic diagram (not to scale) of another windshield incorporating features of the present invention.

[0034] Fig.13 is a diagram showing the initial nucleation of film growth on a surface.

[0035] Fig.14A and 14B is an illustration of a windshield showing the ghosting effect that occurs when a heads-up display is used.

[0036] Fig.15 is an illustration of a windshield having a coating positioned to reduce ghosting in a heads-up display.

[0037] Fig.16 An example of a coating according to the invention which can be used in a head-up display is shown.

[0038] Fig.17 is a cross-sectional view (not to scale) of a non-restricted coating according to the present invention.

[0039] Fig.18 An example of a coating according to the invention which can be used in a head-up display is shown.

[0040] Fig.19 An example of a coating according to the invention which can be used in a head-up display is shown.

[0041] Fig. 20 An example of a coating according to the invention which can be used in a head-up display is shown.

[0042] Fig.21 An example of a coating according to the invention which can be used in a head-up display is shown.

[0043] Fig. 22 An example of a coating according to the invention which can be used in a head-up display is shown.

[0044] Fig.23 An example of a coating according to the invention which can be used in a head-up display is shown.

[0045] Fig.24 Examples of coatings according to the invention having certain color and transmittance qualities are shown.

[0046] Fig.25 Is from Fig.24 Color chart of exemplary coatings. DETAILED DESCRIPTION

[0047] As used herein, spatial or directional terms, such as "left", "right", "inside", "outside", "above", "below", etc., are related to the present invention, as shown in the accompanying drawings. However, it should be understood that the present invention can take various alternative orientations, and therefore, these terms should not be considered limiting. In addition, as used herein, all numbers used in the specification and claims to represent dimensions, physical properties, processing parameters, ingredient amounts, reaction conditions, etc. should be understood as modified by the term "about" in any case. Therefore, unless otherwise indicated, the numerical values ​​listed in the following specification and claims can vary depending on the desired characteristics attempted to be obtained by the present invention. At least, and without intending to limit the application of the doctrine of equivalents to the scope of the claims, each numerical value should at least be interpreted in accordance with the numerical value of the reported significant figures and by applying ordinary rounding techniques. In addition, it should be understood that all ranges disclosed herein cover range starting values ​​and range ending values ​​and any and all sub-ranges contained therein. For example, the range of "1 to 10" should be considered to include any and all subranges between a minimum of 1 and a maximum of 10 (including the minimum and maximum values); that is, all subranges starting with a minimum of 1 or greater and ending with a maximum of 10 or less, such as 1 to 3.3, 4.7 to 7.5, 5.5 to 10, etc. In addition, as used herein, the terms "formed above", "deposited above" or "provided above" refer to forming, depositing or providing on a surface, but not necessarily in contact with the surface. For example, a coating "formed above a substrate" does not exclude the presence of one or more other coatings or films of the same or different composition, which are located between the formed coating and the substrate. As used herein, the terms "polymer" or "polymerized" include oligomers, homopolymers, copolymers and terpolymers, such as polymers formed from two or more types of monomers or polymers. The terms "visible region" or "visible light" refer to electromagnetic radiation with a wavelength in the range of 380nm to 800nm. The term "infrared region" or "infrared radiation" refers to electromagnetic radiation with a wavelength in the range of greater than 800nm ​​to 100,000nm. The term "ultraviolet region" or "ultraviolet radiation" refers to electromagnetic energy with a wavelength in the range of 300nm to less than 380nm. In addition, all documents (such as but not limited to granted patents and patent applications) mentioned herein should be deemed to be "incorporated by reference" as a whole. As used herein, the term "film" refers to a coating region of a desired or selected coating composition. A "layer" may include one or more "films", and a "coating" or "coating stack" may include one or more "layers". The terms "metal" and "metal oxide" include silicon and silicon oxide, respectively, as well as traditionally recognized metals and metal oxides, even though silicon is not generally considered a metal. Thickness values ​​are geometric thickness values ​​unless otherwise indicated.

[0048] The discussion of the present invention may describe certain features as "particularly" or "preferably" within certain limits (e.g., "preferred", "more preferred", "even more preferred" or "most preferred" within certain limits). It should be understood that the present invention is not limited to these particular or preferred limits but covers the entire scope of the disclosure.

[0049] exist Fig.10 and Fig.11 A non-limiting heatable transparent member 100 (e.g., an automobile windshield) incorporating features of the present invention is shown in FIG. The transparent member 10 can have any desired visible light, infrared radiation, or ultraviolet radiation transmission and reflection. For example, the transparent member 100 can have any desired amount of visible light transmittance, for example, greater than 0% to 100%, for example, greater than 70%. For the windshield and front sidelight areas in the United States, the visible light transmittance is typically greater than or equal to 70%. For privacy areas, such as rear seat sidelights and rear windows, the visible light transmittance can be less than the visible light transmittance of the windshield, such as less than 70%.

[0050] like Fig.11 As shown, the transparent member 100 includes a first ply or first substrate 12 having a first major surface facing the exterior of the vehicle, i.e., an exterior major surface 14 (1st surface) and an opposite second or interior major surface 16 (2nd surface). The transparent member 100 also includes a second ply or second substrate 110 having an exterior (first) major surface 112 (4th surface) and an interior (second) major surface 114 (3rd surface). This numbering of the ply surfaces is consistent with conventional practice in the automotive field. The first ply 12 and the second ply 110 can be bonded together in any suitable manner (such as by a conventional interlayer 108). Although not required, conventional edge sealants can be applied to the perimeter of the laminated transparent member 10 during and / or after lamination in any desired manner. Decorative tape, for example, an opaque, translucent or colored light blocking tape 102 ( Fig.11 ), such as a ceramic tape, may be disposed on a surface of at least one of the plies 12, 110, for example around the periphery of the inner major surface 16 of the first ply 12. The conductive coating 10 is formed over at least a portion of one of the plies 12, 110, such as over the second surface 16 or the third surface 114. The bus bar assembly 120 ( Fig.10 ) is in electrical contact with the conductive coating 10. The busbar assembly 120 is also connected to a power source 122 ( Fig.10) and will be discussed in more detail below. In one non-limiting aspect of the present invention, the power source 122 can be a conventional vehicle alternator, for example, configured to supply about 14 volts. Therefore, in the implementation of one non-limiting embodiment of the present invention, there is no DC to DC power converter. In a non-limiting embodiment, the power source 38 can be a 42 volt DC alternator, or a DC-DC converter can be added to increase the voltage from the 14 volt alternator to a sufficient level, such as 42 volts DC.

[0051] In a broad implementation of the present invention, the plies 12, 110 of the transparent member 100 may be the same or different materials. The plies 12, 110 may include any desired material having any desired properties. For example, one or more of the plies 12, 110 may be transparent or translucent to visible light. "Transparent" means having a visible light transmittance greater than 0% to 100%. Alternatively, one or more of the plies 12, 110 may be translucent. "Translucent" means allowing electromagnetic energy (e.g., visible light) to pass through but diffusing the energy so that objects on the side opposite to the viewer are not clearly visible. Examples of suitable materials include, but are not limited to, plastic substrates (e.g., acrylic polymers, such as polyacrylates; polyalkyl methacrylates, such as polymethyl methacrylate, polyethyl methacrylate, polypropyl methacrylate, etc.; polyurethanes; polycarbonates; polyalkyl terephthalates, such as polyethylene terephthalate (PET), polypropylene terephthalate, polybutylene terephthalate, etc.; polymers containing polysiloxanes; or copolymers of any monomers used to prepare these, or any mixtures thereof); ceramic substrates; glass substrates; or mixtures or combinations of any of the above materials. For example, one or more of the plies 12, 110 may include conventional soda-lime silicate glass, borosilicate glass, or lead glass. The glass may be clear glass. "Clear glass" refers to untinted or colorless glass. Alternatively, the glass may be tinted glass or otherwise colored glass. The glass may be annealed or heat-treated glass. As used herein, the term "heat-treated" refers to tempering or at least partial tempering. The glass can be of any type, such as conventional float glass, and can have any composition with any optical properties, such as any value of visible light transmission, ultraviolet light transmission, infrared transmission and / or total solar energy transmission. "Float glass" refers to glass formed by a conventional float process, in which molten glass is deposited onto a molten metal bath and controlled to cool to form a float glass ribbon. The ribbon is then cut and / or shaped and / or heat treated as required. Examples of float glass processes are disclosed in U.S. Patents US 4,466,562 and US 4,671,155. The first and second plies 12, 110 can each be, for example, transparent float glass or can be tinted or colored glass, or one ply 12, 110 can be transparent glass and the other ply 12, 110 can be colored glass. Although not limiting of the present invention, examples of suitable glasses for the first ply 12 and / or the second ply 110 are described in U.S. Patents 4,746,347, 4,792,536, 5,030,593, 5,030,594, 5,240,886, 5,385,872, and 5,393,593. The first and second plies 12, 18 may have any desired dimensions, such as length, width, shape, or thickness.In an exemplary automotive transparent part, the thickness of the first ply and the second ply can each be 1 mm to 10 mm, such as 1 mm to 5 mm thick, or 1.5 mm to 2.5 mm, or 1.8 mm to 2.3 mm. In a non-limiting embodiment, the first ply 12 and / or the second ply 110 can have a visible light transmittance greater than 90%, such as greater than 91%, at a reference wavelength of 550 nm. The glass composition used for the first ply 12 and / or the second ply 110 can have a total iron content in the range of greater than 0 wt % to 0.2 wt % and / or a redox ratio in the range of 0.3 to 0.6.

[0052] In one non-limiting embodiment, one or both of the plies 12, 110 may have a high visible light transmittance at a reference wavelength of 550 nanometers (nm). "High visible light transmittance" means a visible light transmittance at 550 nm of greater than or equal to 85%, such as greater than or equal to 87%, such as greater than or equal to 90%, such as greater than or equal to 91%, such as greater than or equal to 92%, for glass from 2 mm to 25 mm sheet thickness at 5.5 mm equivalent thickness. Particularly useful glasses for practicing the present invention are disclosed in U.S. Pat. Nos. 5,030,593 and 5,030,594.

[0053] Interlayer 108 can have any desired material and can include one or more layers or plies. Interlayer 108 can be a polymeric material or a plastic material, such as polyvinyl butyral, plasticized polyvinyl chloride or a multilayer thermoplastic material including polyethylene terephthalate, etc. For example, but not considered to be limiting, suitable interlayer materials are disclosed in U.S. Patents US 4,287,107 and US 3,762,988. Interlayer 108 keeps the first ply 12 and the second ply 1101 together, providing energy absorption, reducing noise, and increasing the strength of the laminated structure. Interlayer 108 can also be a sound absorbing material or an attenuating material such as described in U.S. Patent US 5,796,055. Interlayer 108 can have a daylight control coating disposed thereon or incorporated therein, or can include a tinting material to reduce solar energy transmission.

[0054] The coating 10 is a conductive coating deposited over at least a portion of a major surface of one of the glass plies 12, 110, such as on the outer glass ply 12 ( Fig.11) or on the outer surface 112 of the inner glass ply 110. The conductive coating 10 may include three or four metal films located between dielectric layers applied successively over at least a portion of one of the glass plies 12, 110. The conductive coating 10 may be a heat and / or radiation reflective coating and may have one or more coating layers or films having the same or different compositions and / or functions. As used herein, the term "film" refers to a coating area of ​​a desired or selected coating composition. A "layer" may include one or more "films", and a "coating" or "coating stack" may include one or more "layers". The conductive coating 30 may be a multilayer coating including three or four metal layers.

[0055] Non-limiting examples of suitable conductive coatings typically include one or more anti-reflective coating films, which include dielectric materials or anti-reflective materials, such as oxides of metal oxides or metal alloys, which are transparent to visible light. The conductive coating 10 may also include three or four metal layers, the metal layers including reflective metals, for example, precious metals such as gold, copper or silver, or combinations or alloys thereof, and may also include a primer layer or barrier film, such as titanium or titanium aluminum alloys, as known in the art, located above the metal reflective layer and / or optionally below the metal reflective layer. The conductive coating 10 may have three or four metal layers; or may have at least three metal layers; or may have no more than four metal layers. For example, the conductive coating 10 consists of four metal layers; or may consist of three metal layers. In a non-limiting embodiment, one or more metal layers may include silver.

[0056] Conductive coating 10 can be deposited by any conventional method, such as, but not limited to, conventional chemical vapor deposition (CVD) and / or physical vapor deposition (PVD) methods. Examples of CVD processes include spray pyrolysis. Examples of PVD processes include electron beam evaporation and vacuum sputtering (e.g., magnetron sputtering vapor deposition (MSVD)). Other coating methods can also be used, such as, but not limited to, sol-gel deposition. In a non-limiting embodiment, conductive coating 10 is deposited by MSVD. Examples of MSVD coating apparatus and methods will be well understood by those of ordinary skill in the art, and are described in, for example, the following U.S. Patents: US4,379,040, US4,861,669, US4,898,789, US4,898,790, US4,900,633, US4,920,006, US4,938,857, US5,328,768, and US5,492,750.

[0057] Figure 1a and Figure 1bA non-limiting coating suitable for the present invention is shown in FIG. The coating includes a metal layer and a primer layer located between two dielectric layers. It includes a base layer or first dielectric layer 20 located above or in direct contact with at least a portion of the substrate major surface (e.g., the second surface 16 of the first board layer 12 or the third surface 114 of the second board layer 110). The first metal layer 28 is located above or in direct contact with at least a portion of the first dielectric layer 20. The first primer layer 30 may be located above or in direct contact with at least a portion of the first metal layer 28. The second dielectric layer 32 is located above or in direct contact with the first primer layer 30. The protective layer 84 may be located above or in direct contact with the second dielectric layer 32. The optional stress layer 82 may be located between the second dielectric layer 32 and the protective layer 84.

[0058] Another non-limiting coating suitable for use in the present invention is shown in Figure 2a and 2b The coating includes two metal layers and two primer layers located between the dielectric layers. It includes a base layer or a first dielectric layer 20 located above or in direct contact with at least a portion of a major surface of the substrate (e.g., the second surface 16 of the first board layer 12 or the third surface 114 of the second board layer 110). The first metal layer 28 is located above or in direct contact with at least a portion of the first dielectric layer 20. The first primer layer 30 may be located above or in direct contact with at least a portion of the first metal layer 28. The second dielectric layer 32 is located above or in direct contact with the first primer layer 30. The second metal layer 42 is located above or in direct contact with at least a portion of the second dielectric layer 32. The second primer layer 44 may be located above or in direct contact with the second metal layer 42. The third dielectric layer 46 is located above or in direct contact with the second primer layer 44. The protective layer 84 may be located above or in direct contact with the third dielectric layer 46. An optional stressor layer 82 may be located between the third dielectric layer 46 and the protective layer 84 .

[0059] Exemplary non-limiting coatings suitable for use in the present invention are Figure 3a and Figure 3b. This example coating includes three metal layers located between dielectric layers. It includes a base layer or first dielectric layer 20 located above or in direct contact with at least a portion of the major surface of the substrate (e.g., the second surface 16 of the first board layer 12 or the third surface 114 of the second board layer 110). The first metal layer 28 is located above or in direct contact with at least a portion of the first dielectric layer 20. The optional first primer layer 30 can be located above or in indirect contact with at least a portion of the first metal layer 28. The second dielectric layer 32 is located above or in direct contact with the first primer layer 44 or the first metal layer 28. The second metal layer 42 is located above or in direct contact with at least a portion of the second dielectric layer 32. The optional second primer layer 44 can be located above or in direct contact with the second metal layer 42. The third dielectric layer 46 is located above or in direct contact with the second primer layer 44 or the second metal layer 42. A third metal layer 56 is located above the third dielectric layer 46. An optional third primer layer 58 may be located above or in direct contact with the third metal layer 56. A fourth dielectric layer 60 is located above or in direct contact with the third primer layer or the third metal layer. A protective layer 84 may be located above or in direct contact with the fourth dielectric layer 60. An optional stress layer 82 may be located between the fourth dielectric layer 60 and the protective layer 84.

[0060] The first dielectric layer 20 may include one or more films of anti-reflective materials and / or dielectric materials, such as, but not limited to, metal oxides, oxides of metal alloys, nitrides, oxynitrides, or mixtures thereof. The first dielectric layer 20 may be transparent to visible light. Examples of suitable metal oxides for the first dielectric layer 20 include oxides of titanium, hafnium, zirconium, niobium, zinc, bismuth, lead, indium, tin, silicon, gallium, vanadium, and mixtures thereof. These metal oxides may have small amounts of other materials, such as manganese in bismuth oxide, tin in indium oxide, and the like. Alternatively, oxides of metal alloys or metal mixtures may be used, such as oxides containing zinc and tin (e.g., zinc stannate); oxides of indium tin alloys; silicon nitrides; silicon aluminum nitrides; or aluminum nitrides. In addition, doped metal oxides may be used, such as antimony or indium doped tin oxides, or nickel or boron doped silicon oxides. In a non-limiting embodiment, the first film 22 may be a zinc / tin alloy oxide. The zinc / tin alloy oxide may be obtained by magnetron sputtering vacuum deposition from a cathode of zinc and tin, which may contain zinc and tin in the following proportions: 10 wt % to 90 wt % zinc and 90 wt % to 10 wt % tin. One suitable metal alloy oxide that may be present in the first film 42 is zinc stannate. "Zinc stannate" refers to Zn x Sn 1-x O 2-x(Formula 1), wherein "x" varies in the range of greater than 0 to less than 1. For example, "x" may be greater than 0 and may be any fraction or decimal between greater than 0 and less than 1. For example, when x=2 / 3, Formula 1 is Zn 2 / 3 Sn 1 / 3 O 4 / 3 , which is more commonly described as Zn2SnO4. The zinc stannate-containing film has a significant amount of one or more forms of Formula 1 in the film.

[0061] The second film 24 can be a zinc-containing film, such as zinc oxide. The zinc oxide film can be deposited from a zinc cathode that includes other materials to improve the sputtering characteristics of the cathode. For example, the zinc cathode can include a small amount (e.g., less than 10 weight percent, such as greater than 0 to 5 weight percent) of tin to improve sputtering. In this case, the resulting zinc oxide film will include a small percentage of tin oxide, such as 0 to less than 10 weight percent tin oxide, such as 0 to 5 weight percent tin oxide. An oxide layer sputtered from a zinc / tin cathode having ninety-five percent zinc and five percent tin is referred to herein as Zn 0.95 Sn 0.5 O 1.05 The small amount of tin in the cathode (e.g., less than 10% by weight) is believed to form a small amount of tin oxide in the second film 44, which mainly contains zinc oxide. In one non-limiting embodiment, the first film 42 is zinc stannate and the second film 44 is zinc oxide (Zn 0.95 Sn 0.5 O 1.05 ). In an exemplary non-limiting embodiment, the second film 24 is a film composed of at least one of the following: aluminum zinc oxide, gallium zinc oxide, indium zinc oxide, indium tin oxide, or vanadium zinc oxide. The film of aluminum zinc oxide, gallium zinc oxide, indium zinc oxide, indium tin oxide, or vanadium zinc oxide is deposited from a zinc cathode that includes other materials to improve the sputtering characteristics of the cathode. For example, the film of aluminum zinc oxide, gallium zinc oxide, indium zinc oxide, indium tin oxide, or vanadium zinc oxide may include an additional small amount (e.g., less than 10 weight percent, such as greater than 0 to 5 weight percent) of tin to improve sputtering. It is believed that the small amount of tin in the cathode (e.g., less than 10 weight percent) forms a small amount of tin oxide in the second film 24. In a non-limiting embodiment, the first film 22 includes zinc stannate, and the second film 24 includes aluminum zinc oxide, gallium zinc oxide, indium zinc oxide, indium tin oxide, or vanadium zinc oxide. In a non-limiting embodiment, the first dielectric layer or the second dielectric layer includes a silicon nitride film. In some embodiments, such as Figure 5b , the first dielectric layer 20 has only the first film 22 and the second film 24 .

[0062] The total thickness of the first dielectric layer 20 may be less than or equal to For example, less than or equal to For example to to Such as to Such as to or such as to Such as and

[0063] like Figure 5a As shown, the first seed film 26 may be located above or in direct contact with at least a portion of the second film of the first dielectric layer 20. The first seed film 26 may be adjacent to or in direct contact with the first metal layer 28, and between the first dielectric layer 20 and the first metal layer 28. The first seed film 26 is a film composed of at least one of aluminum, aluminum silver, aluminum zinc, zinc, zinc tin, germanium, nickel, magnesium, silicon carbide, aluminum nitride, indium zinc, vanadium zinc, gallium zinc, indium tin, niobium, zirconium, tantalum, molybdenum, aluminum-doped silver, silver, silver zinc, titanium aluminum, mixtures thereof, alloys thereof, oxides thereof, suboxides thereof, nitrides thereof, and suboxides thereof. In one embodiment, the first seed film 26 comprises aluminum zinc, vanadium zinc, zinc, silver zinc, metals thereof, alloys thereof, oxides thereof, or suboxides thereof. In another embodiment, the first seed film 26 comprises gallium zinc, indium zinc, indium tin, metals thereof, alloys thereof, oxides thereof, nitrides thereof, suboxides thereof, or suboxides thereof.

[0064] The composition of a non-limiting example of a seed layer can be found in Table 1. In certain embodiments, a portion of the seed layer is formed in an O2 atmosphere having a specific flow rate to form an atmosphere of 1% to 70% O2 with the balance being argon. The flow rate is an approximation of the amount of O2 in the atmosphere, but one of ordinary skill in the art will recognize that when the coating chamber is not hermetically sealed from the outside environment, additional O2 may leak into the coating chamber. In one embodiment, the seed layer comprises vanadium zinc (VZN). x Zn 1-x ) oxide. In another embodiment, the seed layer comprises silver oxide. In another embodiment, the seed layer comprises aluminum silver (Al x Ag 1-x In one non-limiting embodiment, the second film of the first dielectric layer 44 is a seed layer. In some embodiments, the first dielectric layer 40 comprises a first film 42, a second film 44, and a seed layer. The seed layer may have a total thickness in the range of 0.5 nm to 10 nm, preferably 0.75 nm to 8 nm, and more preferably 0.9 nm to 6 nm. Table 1. Metal compositions of metal alloys used as seed layers

[0065] A first metal layer 28 may be deposited over the first dielectric layer 20. The first metal layer 28 may include a reflective metal such as, but not limited to, metal gold, copper, silver, aluminum, or mixtures, alloys, or combinations thereof. In one embodiment, the first metal layer 28 includes a layer of metal silver. The thickness of the first metal layer 28 may be about 1000 Å. to within the range of to in the range of to In the range of to within the range.

[0066] The optional first primer layer 30 can be deposited above the first metal layer 28. The first primer layer 30 can be an oxygen-capturing material, such as titanium, which can be sacrificial during the deposition process to prevent the degradation or oxidation of the first metal layer 28 during the sputtering process or subsequent heating process. The oxygen-capturing material can be selected to oxidize before the material of the first metal layer 28. The non-limiting examples of suitable materials for the primer layer include: titanium, cobalt, copper, silicon, zinc, aluminum, vanadium, tungsten, tantalum, niobium, zirconium, manganese, chromium, tin, nickel, germanium, magnesium, molybdenum, silver, silicon carbide, aluminum-doped silver, aluminum zinc, vanadium zinc, tungsten tantalum, titanium niobium, zirconium niobium, tungsten niobium, aluminum niobium, aluminum titanium, tungsten titanium, tantalum titanium, zinc titanium, aluminum silver, zinc tin, indium zinc, silver zinc, their mixture, their combination, and their alloy. The primer layer material can also take the following form: metal, oxide, suboxide, nitride and / or subnitride that can be used as any material of the primer layer, as listed above. At least a portion of the primer layer can be an oxide or nitride. In certain embodiments, a portion of the primer layer is a nitride.

[0067] For some material compositions, the lower limit of one of the materials may be "greater than 0". When the lower limit is "greater than 0", this means that the weight percentage (wt%) of the material is not equal to zero, but can be any wt% greater than 0 up to the upper limit wt%. For some material compositions, the composition may change before and after heating the layer. This is due to the reaction of the material with the substance in the atmosphere, which changes the wt% distributed between the existing substances. Therefore, some material compositions may have a weight percentage measurement before heating ("BH") and after heating ("AH") to take into account this change. The composition of the non-limiting example of the primer layer can be found in Table 2. Some materials may have only a measurement before heating or may have only a measurement after heating, because this measurement is more important. Table 2. Metal compositions of metal alloys used as primer layers

[0068] If titanium is used as the first primer layer 28, the titanium will be preferentially oxidized to titanium dioxide before the underlying silver layer is oxidized. In one embodiment, the thickness of the first primer layer 28 is between 100 and 200 mm. to within the range, for example, from to For example, from to For example, from to For example, from to For example, from to For example, from to

[0069] A second dielectric layer 32 may be deposited over the first metal layer 28 or, if present, the first primer layer 30. Figure 6a In the non-limiting embodiment shown in Figure 1-d, the second dielectric layer 32 includes a first film 34 deposited over the first metal layer 28 or the first primer layer 30. The first film 34 may include an oxide, nitride, oxynitride, or mixture thereof of a metal selected from the group consisting of titanium, hafnium, zirconium, niobium, zinc, bismuth, lead, indium, tin, silicon, aluminum, gallium, vanadium, and mixtures thereof. In one embodiment, the first film 34 includes zinc oxide. In another embodiment, the first film 34 includes aluminum zinc oxide. In another embodiment, the first film 34 includes indium zinc oxide. In another embodiment, the first film 34 includes gallium zinc oxide. In another embodiment, the first film 34 includes indium tin oxide. In another embodiment, the first film 34 includes vanadium zinc oxide.

[0070] A second film 36 may be deposited over the first film 34. The second film 36 comprises an oxide, nitride, oxynitride, or mixture thereof of a metal selected from the group consisting of titanium, hafnium, zirconium, niobium, zinc, bismuth, lead, indium, tin, silicon, aluminum, gallium, vanadium, and mixtures thereof. In one embodiment, the second film 36 comprises zinc stannate. In some embodiments, the second film 36 comprises zinc stannate. Figure 6b Similarly, the first film 34 and the second film 36 are the only films of the second dielectric layer 32 .

[0071] An optional third film 38 may be deposited over the second film 36 to form a multi-film second dielectric layer 32. The third film 38 comprises an oxide, nitride, oxynitride, or mixture thereof of a metal selected from the group consisting of titanium, hafnium, zirconium, niobium, zinc, bismuth, lead, indium, tin, silicon, aluminum, gallium, vanadium, and mixtures thereof. In one embodiment, the third film 38 comprises zinc oxide. In another embodiment, the third film 38 comprises indium zinc oxide. In another embodiment, the third film 38 comprises gallium zinc oxide. In another embodiment, the third film 38 comprises indium tin oxide. In another embodiment, the third film 38 comprises vanadium zinc oxide. In one non-limiting embodiment, the first dielectric layer 20 or the second dielectric layer 32 comprises a silicon nitride film. In some embodiments, such as Figure 6a and Figure 6c In the embodiment shown in FIG. 1 , the second dielectric layer 32 includes a first film 34, a second film 36, and a third film 38. In some embodiments, such as Figure 6a , the second dielectric layer 32 has only the first film 34 , the second film 36 , and the third film 38 .

[0072] The second dielectric layer 32 may have a thickness less than or equal to The thickness is within the range, such as less than or equal to Such as in to Between, such as to Such as to Such as to or such as to

[0073] The second seed film 40 may be adjacent to or in direct contact with the second metal layer 42, and between the second dielectric layer 32 and the second metal layer 42. The second seed film 40 is a film comprising at least one of aluminum, aluminum silver, aluminum zinc, zinc, zinc tin, germanium, nickel, magnesium, silicon carbide, aluminum nitride, indium zinc, vanadium zinc, gallium zinc, indium tin, niobium, zirconium, tantalum, molybdenum, aluminum-doped silver, silver, silver zinc, titanium aluminum, mixtures thereof, alloys thereof, oxides thereof, suboxides thereof, nitrides thereof, and subnitrides thereof. In one embodiment, the second seed film 40 comprises aluminum zinc, vanadium zinc, zinc, silver zinc, metals thereof, alloys thereof, oxides thereof, or suboxides thereof. The composition of the seed film may refer to Table 1 given previously.

[0074] In one embodiment, the second seed film 40 comprises V x Zn 1-x In another embodiment, the second seed film 40 comprises Al x Zn1-x In another embodiment, the second seed film 40 comprises Ga x Zn 1-x In another embodiment, the second seed film 40 includes In x Zn 1-x In another embodiment, the second seed film 40 comprises Sn x In 1-x In another embodiment, the second seed film 40 comprises Ag deposited in an oxygen / argon environment. In another embodiment, the second seed film 40 comprises Al x Ag 1-x In some embodiments, such as Figure 6c and 6d , the second dielectric layer 32 includes a first film 34, a second film 36, and a second seed film 40. In some embodiments, such as Figure 6d , the second dielectric layer 32 has only the first film 34, the second film 36, and the second seed film 40. In some embodiments, such as Figure 6c , the second dielectric layer 32 includes a first film 34 , a second film 36 , a third film 38 and a second seed film 40 .

[0075] The second metal layer 42 may be deposited over the second dielectric layer 32. The second metal layer 42 may include any one or more of the reflective materials described above with respect to the first metal layer 28. In one non-limiting embodiment, the second metal layer 42 includes silver and / or copper. The thickness of the second metal layer 42 may be to Preferably to More preferably to Most preferably to In another non-limiting embodiment, the second metal layer 42 may be thicker than the first and / or third metal layers.

[0076] The second primer layer 44 can be deposited above the second metal layer 42. The second primer layer 44 can be any material described above about the first primer layer 30 and as previously described in Table 2. The example of the material suitable for primer layer includes: titanium, silicon, cobalt, zinc, aluminum, vanadium, tungsten, tantalum, niobium, zirconium, manganese, chromium, tin, nickel, gallium, indium, germanium, magnesium, molybdenum, silver, silicon carbide, aluminum-doped silver, aluminum zinc, vanadium zinc, tungsten tantalum, titanium niobium, zirconium niobium, tungsten niobium, aluminum niobium, aluminum titanium, tungsten titanium, tantalum titanium, zinc titanium, aluminum silver, zinc tin, indium zinc, silver zinc, their mixture and their alloy, wherein the primer is deposited as metal and can be oxidized subsequently. At least a portion of the primer layer is nitride or oxide. If silver zinc, zinc, silver zinc oxide, aluminum zinc oxide, indium zinc oxide, gallium zinc oxide or vanadium zinc oxide are used as the first primer layer 30, then it will be preferentially oxidized before the silver layer below is oxidized.

[0077] In one embodiment, the second primer layer 44 comprises zinc. In another embodiment, the second primer layer 44 comprises Ag. x Zn 1-x In another embodiment, the second primer layer 44 comprises Ag. x Zn 1-x In another embodiment, the second primer layer 44 is Al x Zn 1-x In another embodiment, the second primer layer 44 comprises In x Zn 1-x In another embodiment, the second primer layer 44 comprises Ga x Zn 1-x In another embodiment, the second primer layer 44 comprises V x Zn 1-x In another embodiment, the second primer layer 44 comprises Al x Ti 1-x In another embodiment, the second primer layer 44 comprises Al x Nb 1-x In another embodiment, the second primer layer 44 comprises Al x Nb 1-x In another embodiment, the second primer layer 44 comprises W x Nb 1-x In another embodiment, the second primer layer 44 comprises W x Ti 1-x In another embodiment, the second primer layer 44 comprises Ti x Ta 1-x In another embodiment, the second primer layer 44 comprises Ti x Nb 1-xIn another embodiment, the second primer layer 44 comprises Ti x Nb 1-x In another embodiment, the second primer layer 44 comprises Nb x Zr 1-x In another embodiment, the second primer layer 44 comprises Ta x W 1-x In another embodiment, the second primer layer 44 comprises W x Nb 1-x In another embodiment, the second primer layer 44 comprises Zn x Ti 1-x In another embodiment, the second primer layer comprises titanium. The thickness of the second primer layer 44 can be about to within the range, for example, from to For example, from to For example, from to For example, from to For example, from to For example, from to

[0078] The third dielectric layer 46 may be deposited over the second metal layer 42 or the second primer layer 44, if present. The third dielectric layer 46 may also include one or more materials discussed above with respect to the first dielectric layer 20 and the second dielectric layer 32. In a non-limiting embodiment, the third dielectric layer 46 may include a first film 48. The first film 48 comprises an oxide, nitride, oxynitride, or mixture thereof of a metal selected from titanium, hafnium, zirconium, niobium, zinc, bismuth, lead, indium, tin, silicon, aluminum, gallium, vanadium, and mixtures thereof. In one embodiment, the first film 48 comprises zinc oxide. In another embodiment, the first film 48 comprises aluminum zinc oxide. In another embodiment, the first film 48 comprises indium zinc oxide. In another embodiment, the first film 48 comprises gallium zinc oxide. In another embodiment, the first film 48 comprises indium tin oxide. In another embodiment, the first film 48 comprises vanadium zinc oxide.

[0079] The third dielectric layer 46 may include a second film 50 deposited over the first film 48. In one embodiment, the second film 50 includes an oxide, nitride, oxynitride, or mixture thereof of a metal selected from the group consisting of titanium, hafnium, zirconium, niobium, zinc, bismuth, lead, indium, tin, silicon, aluminum, gallium, vanadium, and mixtures thereof. In one embodiment, the second film 50 includes zinc stannate. In some embodiments, the second film 50 includes a plurality of oxides, nitrides, oxynitrides, and mixtures thereof. Figure 7b Similarly, the first film 48 and the second film 50 are the only films of the third dielectric layer 46 .

[0080] The third dielectric layer 46 may include an optional third film 52. The third film 52 includes an oxide, nitride, oxynitride, or mixture thereof of a metal selected from the group consisting of titanium, hafnium, zirconium, niobium, zinc, bismuth, lead, indium, tin, silicon, aluminum, gallium, vanadium, and mixtures thereof. In one embodiment, the third film 52 includes zinc oxide. In another embodiment, the third film 52 includes aluminum zinc oxide. In another embodiment, the third film 52 includes indium zinc oxide. In another embodiment, the third film 52 includes gallium zinc oxide. In another embodiment, the third film 52 includes indium tin oxide. In another embodiment, the third film 52 includes vanadium zinc oxide. In some embodiments, such as Figure 7a and 7c In the embodiment shown, the third dielectric layer 46 includes a first film 48, a second film 50, and a third film 52. In some embodiments, such as Figure 7a , the third dielectric layer 46 has only the first film 48 , the second film 50 , and the third film 52 .

[0081] In one non-limiting aspect of the invention, the thicknesses of the second dielectric layer 32 and the third dielectric layer 46 are within 15%, such as within 10%, such as within 5% of each other. The third dielectric layer 46 may have a thickness of less than or equal to The thickness is within the range, such as less than or equal to Such as in to between, to Such as to Such as to Such as to or such as 730 to

[0082] The third seed film 54 may be adjacent to and / or directly contact the third metal layer 56, and between the third dielectric layer 46 and the third metal layer 56. The third seed film 54 is a film composed of at least one of aluminum, aluminum silver, aluminum zinc, zinc, zinc tin, germanium, nickel, magnesium, silicon carbide, aluminum nitride, indium zinc, vanadium zinc, gallium zinc, indium tin, niobium, zirconium, tantalum, molybdenum, aluminum-doped silver, silver, silver zinc, titanium aluminum, mixtures thereof, alloys thereof, oxides thereof, suboxides thereof, nitrides thereof, and suboxides thereof. The composition of the seed film may refer to Table 1 given previously. In one embodiment, the third seed film 54 comprises aluminum zinc, vanadium zinc, zinc, silver zinc, metals thereof, alloys thereof, oxides thereof, or suboxides thereof. In another embodiment, the third seed film 54 is gallium zinc, indium zinc, indium tin, metals thereof, alloys thereof, oxides thereof, nitrides thereof, suboxides thereof, or suboxides thereof.

[0083] In another embodiment, the third seed film 54 comprises V x Zn 1-x In another embodiment, the third seed film 54 comprises Al x Zn 1-x In another embodiment, the third seed film 54 comprises Ga x Zn 1-x In another embodiment, the third seed film 54 includes In x Zn 1-x In another embodiment, the third seed film 54 includes Sn x In 1-x In another embodiment, the third seed film 54 comprises Ag deposited in an oxygen / argon environment. In another embodiment, the third seed film 54 comprises Al x Ag 1-x In some embodiments, such as Figure 7c and Figure 7d , the third dielectric layer 46 has a first film 48, a second film 50, and a third seed film 54. In some embodiments, the second dielectric layer 46 has a first film 48, a second film 50, a third film 52, and a third seed film 54. The third seed film 54 may have a total thickness in the range of 0.5 nm to 10 nm, preferably 0.75 nm to 8 nm, and more preferably 0.9 nm to 6 nm. The coating 10 may further include a third metal layer 56 deposited over the third dielectric layer 46. The third metal layer 56 may be any material discussed above with respect to the first metal layer and the second metal layer. In another non-limiting embodiment, the third metal layer 56 comprises aluminum-doped silver. In a non-limiting embodiment, the third metal layer 56 comprises silver and / or copper. The thickness of the third metal layer 56 may range from to Preferably to More preferably to Most preferably to In one non-limiting aspect of the invention, the first metal layer 28 is thinner than the third metal layer 56. In another non-limiting aspect of the invention, the second metal layer 42 is thinner than the third metal layer 56.

[0084] In one non-limiting embodiment, the coated article comprises only the first metal layer 28, the second metal layer 42, and the third metal layer 56. No additional metal layers are present in the coated article. The metal layer may comprise only silver, or only silver and copper; or greater than 80% by weight silver or silver and copper.

[0085] The third primer layer 58 can be deposited above the third metal layer 56. The third primer layer 58 can have any primer material described above about the first primer layer 30 or the second primer layer 44, and as previously described in Table 2. The example of the material suitable for the primer layer includes titanium, silicon, cobalt, zinc, aluminum, vanadium, tungsten, tantalum, niobium, zirconium, manganese, chromium, tin, nickel, gallium, indium, germanium, magnesium, molybdenum, silver, silicon carbide, the silver doped with aluminum, aluminum zinc, vanadium zinc, tungsten tantalum, titanium niobium, zirconium niobium, tungsten niobium, aluminum niobium, aluminum titanium, tungsten titanium, tantalum titanium, zinc titanium, aluminum silver, zinc tin, indium zinc, silver zinc, their mixture and their alloy, wherein the primer is deposited as metal and can be oxidized subsequently. At least a portion of the primer layer is nitride or oxide. If silver zinc, zinc, silver zinc oxide, aluminum zinc oxide, indium zinc oxide, gallium zinc oxide or vanadium zinc oxide are used as the first primer layer 30, then it will be preferentially oxidized before the silver layer below is oxidized.

[0086] In one embodiment, the third primer layer 58 comprises zinc. In another embodiment, the third primer layer 58 comprises Ag. x Zn 1-x In another embodiment, the third primer layer 58 comprises Ag. x Zn 1-x In another embodiment, the third primer layer 58 comprises Al x Zn 1-x In another embodiment, the third primer layer 58 comprises In x Zn 1-x In another embodiment, the third primer layer 58 comprises Ga x Zn 1-x In another embodiment, the third primer layer 58 comprises V x Zn 1-x In another embodiment, the third primer layer 58 comprises Alx Ti 1-x In another embodiment, the third primer layer 58 comprises Al x Nb 1-x In another embodiment, the third primer layer 58 comprises Al x Nb 1-x In another embodiment, the third primer layer 58 comprises W x Nb 1-x In another embodiment, the third primer layer 58 comprises W x Ti 1-x In another embodiment, the third primer layer 58 comprises Ti x Ta 1-x In another embodiment, the third primer layer 58 comprises Ti x Nb 1-x In another embodiment, the third primer layer 58 comprises Ti x Nb 1-x In another embodiment, the third primer layer 58 comprises Nb x Zr 1-x In another embodiment, the third primer layer 58 comprises Ta x W 1-x In another embodiment, the third primer layer 58 comprises W x Nb 1-x In another embodiment, the third primer layer 58 comprises Zn x Ti 1-x Oxide.

[0087] In one non-limiting embodiment, the thickness of the third primer layer 58 is to within the range, for example, from to For example, from to For example, from to For example, from to For example, from to For example, from to

[0088] The fourth dielectric layer 60 can be deposited above the third metal layer 56 (e.g., above the third primer layer 58). The fourth dielectric layer 60 can be composed of one or more layers containing metal oxides or metal alloy oxides, such as those discussed above about the first dielectric layer 20, the second dielectric layer 32, or the third dielectric layer 46. Alternatively, the fourth dielectric layer can include silicon nitride or silicon oxynitride. In a non-limiting embodiment, the fourth dielectric layer 60 includes a first film 62 deposited above the third metal layer 56 or (if present) the third primer layer 58, a second film 64 deposited above the first film 62, and an optional third film 66 above the second film 64. The first film 62 includes an oxide, nitride, oxynitride, or a mixture thereof selected from the following metals: titanium, hafnium, zirconium, niobium, zinc, bismuth, lead, indium, tin, silicon, gallium, vanadium, and mixtures thereof. In one embodiment, the first film 62 includes zinc oxide or zinc stannate. The first film 62 may be composed of an oxide, nitride, oxynitride, or mixture of one or more metals selected from the group consisting of titanium, hafnium, zirconium, niobium, zinc, bismuth, lead, indium, tin, silicon, gallium, vanadium, and mixtures thereof. In one embodiment, the first film 62 comprises zinc oxide or zinc stannate. In another embodiment, the first film 62 comprises aluminum zinc oxide. In another embodiment, the first film 62 comprises indium zinc oxide. In another embodiment, the first film 62 comprises gallium zinc oxide. In another embodiment, the first film 62 comprises indium tin oxide. In another embodiment, the first film 62 comprises vanadium zinc oxide.

[0089] The fourth dielectric layer 60 may include a second film 64 deposited over the first film 62. In one embodiment, the second film 64 includes an oxide, nitride, oxynitride, or mixture thereof of a metal selected from the group consisting of titanium, hafnium, zirconium, niobium, zinc, bismuth, lead, indium, tin, silicon, gallium, vanadium, and mixtures thereof. In one embodiment, the second film 64 includes zinc stannate, silicon nitride, or silicon oxynitride. In some embodiments, the second film 64 may include a plurality of oxides, nitrides, oxynitrides, and mixtures thereof. Figure 8b Similarly, the first film 62 and the second film 64 are the only films of the fourth dielectric layer 60. The fourth dielectric layer 60 may include an optional third film 66 deposited over the second film 64. The third film includes an oxide, nitride, oxynitride, or mixture thereof of a metal selected from the group consisting of titanium, hafnium, zirconium, niobium, zinc, bismuth, lead, indium, tin, silicon, gallium, vanadium, and mixtures thereof. In one embodiment, the third film 66 includes zinc oxide, silicon oxynitride, or silicon nitride. In another embodiment, the third film 66 includes zinc oxide. In another embodiment, the third film 66 includes aluminum zinc oxide. In another embodiment, the third film 66 includes indium zinc oxide. In another embodiment, the third film 66 includes gallium zinc oxide. In another embodiment, the third film 66 includes indium tin oxide. In another embodiment, the third film 66 includes vanadium zinc oxide. In some embodiments, such as in Figure 8a and Figure 8c In the embodiment shown in FIG. 1 , the fourth dielectric layer 60 includes a first film 62, a second film 64, and a third film 66. In some embodiments, such as Figure 8a , the fourth dielectric layer 60 has only the first film 62 , the second film 64 , and the third film 66 .

[0090] In one non-limiting embodiment, the first film 62 and the third film 66 of the fourth dielectric layer 60 may each have a thickness of about to Thickness in the range, for example, to For example The second film 78 may have to Thickness in the range, e.g. to For example to For example to

[0091] In embodiments where the fourth dielectric layer 60 is the topmost or uppermost dielectric layer, the thickness of the fourth dielectric layer may be less than or equal to within the range, such as less than or equal to Such as in to Between, such as to Such as to Such as to or such as to In embodiments where fourth dielectric layer 60 is the topmost dielectric layer, both first dielectric layer 20 and fourth dielectric layer 60 may be thinner than second dielectric layer 32 and third dielectric layer 46 .

[0092] The fourth seed film 68 may be adjacent to or directly contact the fourth metal layer 70, and between the fourth dielectric layer 60 and the fourth metal layer 70. The fourth seed film 68 is a film composed of at least one of the following: aluminum, aluminum silver, aluminum zinc, zinc, zinc tin, germanium, nickel, magnesium, silicon carbide, aluminum nitride, indium zinc, vanadium zinc, gallium zinc, indium tin, niobium, zirconium, tantalum, molybdenum, aluminum-doped silver, silver, silver zinc, titanium aluminum, mixtures thereof, alloys thereof, oxides thereof, suboxides thereof, nitrides thereof, and suboxides thereof. In one embodiment, the fourth seed film 68 comprises aluminum zinc, vanadium zinc, zinc, silver zinc, metals thereof, alloys thereof, oxides thereof, or suboxides thereof. In another embodiment, the fourth seed film 68 comprises gallium zinc, indium zinc, indium tin, metals thereof, alloys thereof, oxides thereof, nitrides thereof, suboxides thereof, or suboxides thereof. The composition of the seed film may refer to Table 1 given previously. In another embodiment, the fourth seed film 68 comprises V x Zn 1-x In another embodiment, the fourth seed film 68 comprises Al x Zn 1-x In another embodiment, the fourth seed film 68 comprises Ga x Zn 1-x In another embodiment, the fourth seed film 68 includes In x Zn 1-x In another embodiment, the fourth seed film 68 comprises Sn x In 1-x In another embodiment, the fourth seed film 68 comprises Ag deposited in an oxygen / argon environment. In another embodiment, the fourth seed film 68 comprises Al x Ag 1-x In some embodiments, such as Figure 8c and 8d , the fourth dielectric layer 60 includes a first film 62, a second film 64, and a fourth seed film 68. In some embodiments, such as Figure 8d , the fourth dielectric layer 60 has only the first film 62, the second film 64 and the fourth seed film 68. In some embodiments, such as Figure 8c , the fourth dielectric layer 60 includes a first film 62, a second film 64, a third film 66, and a fourth seed film 68. The fourth seed film may have a total thickness in the range of 0.5 nm to 10 nm, preferably 0.75 nm to 8 nm, and more preferably 0.9 nm to 6 nm.

[0093] Another exemplary non-limiting coating 10 suitable for use with the present invention is Figure 4a and 4b. The coating 10 may further include a fourth metal layer 70 deposited over or in direct contact with at least a portion of the fourth dielectric layer 60. The fourth metal layer 70 may have any of the materials discussed above with respect to the first, second, or third metal layers. In another non-limiting embodiment, the fourth metal layer 70 includes aluminum-doped silver. In a non-limiting embodiment, the third metal layer 70 includes silver and / or copper. The fourth metal layer 70 may have to Thickness within the range, preferably to More preferred to Best choice to In one non-limiting aspect of the invention, first metal layer 28 and fourth metal layer 70 have thicknesses that are within 20% of each other, such as within 15%, such as within 5% to 10% of each other.

[0094] In one non-limiting embodiment, the coated article comprises only the first, second, third and fourth metal layers 28, 42, 56, 70. No additional metal layers are present in the coated article. The metal layer may comprise only silver or only silver and copper; or greater than 80% by weight of silver or silver and copper. Each metal layer has a thickness. The sum of the thicknesses of all metal layers is at least 30nm and at most 60nm, for example at least 35nm and at most 47nm. In one non-limiting embodiment, the total combined thickness of the metal layers is not greater than 50 nanometers, such as not greater than 47nm, such as not greater than 43 nanometers. In another non-limiting embodiment, the total combined thickness of the metal layers is at least 30nm, at least 32nm, at least 34nm, at least 35nm, at least 38nm or at least 40nm.

[0095] The 4th primer layer 72 can be deposited on at least a portion of the 4th metal layer 70 or directly contact with at least a portion of the 4th metal layer 70. The 4th primer layer 72 can be any primer material described in the table 2 above about the first, second or third primer layer 30,44,58 and previously given. The example of the material that is applicable to primer layer comprises titanium, cobalt, silicon, zinc, aluminum, vanadium, tungsten, tantalum, niobium, zirconium, manganese, chromium, tin, nickel, gallium, indium, germanium, magnesium, molybdenum, silver, silicon carbide, aluminum-doped silver, aluminum zinc, vanadium zinc, tungsten tantalum, titanium niobium, zirconium niobium, tungsten niobium, aluminum niobium, aluminum titanium, tungsten titanium, tantalum titanium, zinc titanium, aluminum silver, zinc tin, indium zinc, silver zinc, their mixture and their alloy, wherein the primer is deposited as metal and can be oxidized subsequently. At least a portion of primer layer is nitride or oxide. If silver zinc, zinc, silver zinc oxide, aluminum zinc oxide, indium zinc oxide, gallium zinc oxide, or vanadium zinc oxide is used as the first primer layer 30, it will be preferentially oxidized before the underlying silver layer is oxidized.

[0096] In one embodiment, the fourth primer layer 72 comprises zinc. In another embodiment, the fourth primer layer 72 comprises Ag. x Zn 1-x In another embodiment, the fourth primer layer 72 comprises Ag. x Zn 1-x In another embodiment, the fourth primer layer 72 is Al x Zn 1-x In another embodiment, the fourth primer layer 72 comprises In x Zn 1-x In another embodiment, the fourth primer layer 72 comprises Ga x Zn 1-x In another embodiment, the fourth primer layer 72 comprises V x Zn 1-x In another embodiment, the fourth primer layer 72 comprises Al x Ti 1-x In another embodiment, the fourth primer layer 72 comprises Al x Nb 1-x In another embodiment, the fourth primer layer 72 comprises Al x Nb 1-x In another embodiment, the fourth primer layer 72 comprises W x Nb 1-x In another embodiment, the fourth primer layer 72 comprises W x Ti 1-x In another embodiment, the fourth primer layer 72 comprises Ti x Ta 1-x In another embodiment, the fourth primer layer 72 comprises Ti x Nb 1-x In another embodiment, the fourth primer layer 72 comprises Ti x Nb 1-x In another embodiment, the fourth primer layer 72 comprises Nb x Zr 1-x In another embodiment, the fourth primer layer 72 comprises Ta x W 1-x In another embodiment, the fourth primer layer 72 comprises W x Nb 1-x In another embodiment, the fourth primer layer 72 comprises Zn x Ti 1-x The thickness of the fourth primer layer 72 is to within the range, for example, from to For example, from to For example, from to For example, from to For example, from to For example, from to The fifth dielectric layer 74 can be deposited on or in direct contact with the fourth metal layer 70 or the fourth primer layer 72 (if present). The fifth dielectric layer 74 can be composed of one or more layers containing metal oxides or metal alloy oxides, such as those discussed above about the first, second, third or fourth dielectric layers 20, 32, 46, 60. In a non-limiting embodiment, the fifth dielectric layer 74 includes a first film 76 deposited on or in direct contact with the fourth metal layer 70 or the fourth primer layer 72. The first film 76 includes an oxide, nitride, oxynitride or a mixture thereof of a metal selected from titanium, hafnium, zirconium, niobium, zinc, bismuth, lead, indium, tin, silicon, aluminum, gallium, vanadium and a mixture thereof. In one embodiment, the first film 76 includes zinc oxide or zinc stannate. In another embodiment, the first film 76 includes aluminum zinc oxide. In another embodiment, the first film 76 includes indium zinc oxide. In another embodiment, the first film 76 includes gallium zinc oxide. In another embodiment, the first film 76 includes indium tin oxide. In another embodiment, the first film 76 comprises vanadium zinc oxide.

[0097] The fifth dielectric layer 74 may include a second film 78 deposited over or in direct contact with at least a portion of the first film 76. In one embodiment, the second film 78 includes an oxide, nitride, oxynitride, or mixture thereof of a metal selected from the group consisting of titanium, hafnium, zirconium, niobium, zinc, bismuth, lead, indium, tin, silicon, aluminum, gallium, vanadium, and mixtures thereof. In one embodiment, the second film 76 includes zinc stannate, silicon nitride, or silicon oxynitride. In some embodiments, such as Figure 9b , the first film 76 and the second film 78 are the only films of the fifth dielectric layer 74 .

[0098] The fifth dielectric layer 86 may include an optional third film 80 deposited over the second film 76. The third film 80 includes an oxide, nitride, oxynitride, or mixture thereof of a metal selected from the group consisting of titanium, hafnium, zirconium, niobium, zinc, bismuth, lead, indium, tin, silicon, aluminum, gallium, vanadium, and mixtures thereof. In one embodiment, the third film 80 includes zinc oxide, silicon oxynitride, or silicon nitride. In another embodiment, the third film 80 includes silicon nitride. In another embodiment, the third film 80 includes zinc oxide. In another embodiment, the third film 80 includes aluminum zinc oxide. In another embodiment, the third film 80 includes indium zinc oxide. In another embodiment, the third film 80 includes gallium zinc oxide. In another embodiment, the third film 80 includes indium tin oxide. In another embodiment, the third film 80 includes vanadium zinc oxide. In some embodiments, such as Figure 9a , the fifth dielectric layer 74 includes a first film 76 , a second film 78 and a third film 80 .

[0099] The fifth dielectric layer 74 may have a thickness within the following range: less than or equal to Such as less than or equal to Such as to to Such as to Such as to or such as to

[0100] In embodiments where the article includes a fifth dielectric layer 74, the fourth dielectric layer 60 may have a thickness within the following ranges: less than or equal to Such as less than or equal to Such as to to Such as to Such as to or such as to In embodiments where fifth dielectric layer 74 is the topmost dielectric layer, first dielectric layer 20 and fifth dielectric layer 74 may both be thinner than second dielectric layer 32 , third dielectric layer 46 , and fourth dielectric layer 60 .

[0101] The coating 10 may include an outermost protective layer 84, such as Figure 1a-4bIn the non-limiting embodiment shown, the protective layer 84 is deposited above the outermost dielectric layer to help protect the underlying layers, such as the metal layer, from mechanical and chemical attack during processing. In a non-limiting embodiment, the protective layer 84 can be deposited above the second dielectric layer 32, the third dielectric layer 46, the fourth dielectric layer 60, or the fifth dielectric layer 74. In another non-limiting embodiment, the protective layer 84 can be disposed above or optionally in direct contact with the following layers: the metal layer 32, 56, or 70; or the primer layer 44, 58, or 72. The protective layer 84 can be an oxygen barrier coating to prevent or reduce ambient oxygen from entering the underlying layer of the coating 10, such as during heating or bending. The protective layer 84 can have any desired material or material mixture. In an exemplary embodiment, the protective layer 84 may include a layer having one or more metal oxides or nitride materials, such as, but not limited to, oxides and / or nitrides of aluminum, silicon, or a mixture thereof. For example, the protective coating 84 can be a single coating layer comprising 0 wt % to 100 wt % aluminum oxide and / or 100 wt % to 0 wt % silicon oxide, such as 5 wt % to 95 wt % aluminum oxide 45 and 95 wt % to 5 wt % silicon oxide, such as 10 wt % to 90 wt % aluminum oxide and 90 wt % to 10 wt % silicon oxide, such as 15 wt % to 90 wt % aluminum oxide and 85 wt % to 10 wt % silicon oxide, such as 50 wt % to 75 wt % aluminum oxide and 50 wt % to 25 wt % silicon oxide, such as 50 wt % to 70 wt % aluminum oxide and 50 wt % to 30 wt % silicon oxide. Silicon oxide, such as 35 wt % to 100 wt % aluminum oxide and 65 wt % to 0 wt % silicon oxide, for example 70 wt % to 90 wt % aluminum oxide and 30 wt % to 10 wt % silicon oxide, for example 75 wt % to 85 wt % aluminum oxide and 25 wt % to 15 wt % silicon oxide, for example 88 wt % aluminum oxide and 12 wt % silicon oxide, for example 65 wt % to 75 wt % aluminum oxide and 35 wt % to 25 wt % silicon oxide, for example 70 wt % aluminum oxide and 30 wt % silicon oxide, for example 60 wt % to less than 75 wt % aluminum oxide and greater than 25 wt % to 40 wt % silicon oxide. Other materials such as aluminum, chromium, hafnium, yttrium, nickel, boron, phosphorus, titanium, zirconium and / or their oxides may also be present, for example to adjust the refractive index of the protective layer 84. In one limited embodiment, the refractive index of the protective layer 84 may be in the range of 1 to 3, such as 1 to 2, such as 1.4 to 2, such as 1.4 to 1.8.

[0102] In one non-limiting embodiment, the protective layer 84 is a combination of silicon oxide and aluminum oxide coatings. The protective coating 84 can be sputtered from two cathodes (e.g., one silicon and one aluminum) or from a single cathode containing both silicon and aluminum. The silicon / aluminum oxide protective layer 84 can be written as Si x Al 1-x O(1.5+x) / 2 , where x can vary from greater than 0 to less than 1.

[0103] In another non-limiting embodiment, the protective layers 80, 92 include a combination of titanium oxide and aluminum oxide.

[0104] In one non-limiting embodiment, the protective layer 84 can be composed of silicon nitride (Si3N4), silicon oxynitride (SiON), aluminum silicon nitride (SiAlN), aluminum silicon oxynitride (SiAlON), mixtures thereof, and / or alloys thereof, and it can provide increased durability to the metal functional layer 28, 42, 56, or 70. The protective layer 84 can be formed of silicon nitride deposited with other materials that have excellent electrical conductivity to improve the sputtering of silicon. For example, during deposition, the silicon cathode can include a small amount (e.g., up to 20 weight percent, up to 15 weight percent, up to 10 weight percent, or up to 5 weight percent) of aluminum to improve sputtering. In this case, the resulting silicon nitride protective layer will include a small percentage of aluminum, such as up to 15 weight percent aluminum, such as up to 10 weight percent aluminum, such as up to 5 weight percent aluminum. The coating deposited from a silicon cathode having up to 10 weight percent aluminum (added to enhance the conductivity of the cathode) is referred to herein as a "silicon nitride" layer, although a small amount of aluminum may be present. It is believed that a small amount of aluminum in the cathode (e.g., less than or equal to 15 wt %, such as less than or equal to 10 wt %, such as less than or equal to 5 wt %) forms aluminum nitride in the predominantly silicon nitride protective layer 84. The protective layer 84 may be formed in a nitrogen atmosphere; however, it should be understood that other gases (such as oxygen) may be present in the atmosphere during deposition of the protective layer 84.

[0105] The protective layer 84 may have any desired thickness. arrive within the scope of arrive Such as arrive Such as arrive In one non-limiting embodiment, the protective coating 84 is a silicon / aluminum oxide coating (Si x Al 1-x O (1.5+x) / 2 ), whose thickness is to within the scope of to Such as arrive Such as arrive Such as arrive Such as arrive Such as The protective layer 84 is the outermost layer of the coated article. In addition, the protective layer 84 can have a non-uniform thickness. "Non-uniform thickness" means that the thickness of the protective layer 84 can vary over a given unit area, for example, the protective layer 84 can have high and low points or areas.

[0106] In another non-limiting embodiment, the protective coating 84 can be a multilayer coating comprising a first film and a second film formed over the first film. The first film can comprise aluminum oxide, silicon oxide, titanium oxide, zirconium oxide, tin oxide, or a mixture thereof. In a specific non-limiting embodiment, the first film can comprise aluminum oxide or a mixture or alloy comprising aluminum oxide and silicon oxide. For example, the first film can comprise a silicon oxide / aluminum oxide mixture having greater than 5 weight percent aluminum oxide, such as greater than 10 weight percent aluminum oxide, such as greater than 15 weight percent aluminum oxide, such as greater than 30 weight percent aluminum oxide, such as greater than 40 weight percent aluminum oxide, such as 50 weight percent to 70 weight percent aluminum oxide, such as 60 weight percent to 100 weight percent aluminum oxide, and having 40 weight percent to 0 weight percent silicon oxide, for example 60 weight percent aluminum oxide and 40 weight percent silicon oxide. In another example, the first layer can comprise zinc stannate. In another example, the first film can comprise zirconium oxide. In a non-limiting embodiment, the thickness of the first film can be greater than to 1 micron range, such as to Such as to Such as to Such as

[0107] The second film of the protective layer 84 may include, for example, a metal oxide or a metal nitride. The second film may be titanium oxide, aluminum oxide, silicon oxide, zirconium oxide, tin oxide, a mixture thereof, or an alloy thereof. For example, the second film may include a mixture of titanium oxide and aluminum oxide; a mixture of titanium oxide and silicon oxide; or zirconium oxide. An example of the second film may include a titanium oxide / aluminum oxide mixture having 40-60 wt% aluminum oxide, and 60-40 wt% titanium oxide; 45-55 wt% aluminum oxide, and 55-45 wt% titanium oxide; 48-52 wt% aluminum oxide, and 52-48 wt% titanium oxide; 49-51 wt% aluminum oxide, and 51-49 wt% titanium oxide; or 50 wt% aluminum oxide, and 50 wt% titanium oxide. An example of the second film may include titanium aluminum oxide (TiAlO). Another example of a second film is a silicon oxide / aluminum oxide mixture having greater than 40 wt % silicon oxide, such as greater than 50 wt % silicon oxide, such as greater than 60 wt % silicon oxide, such as greater than 70 wt % silicon oxide, such as greater than 80 wt % silicon oxide, such as 45 wt % silicon oxide in the range of 80 wt % to 90 wt % and 10 wt % to 20 wt % aluminum oxide, for example 85 wt % silicon oxide and 15 wt % aluminum oxide. In a non-limiting embodiment, the thickness of the second film can be greater than to 2 micron range, such as to Such as to Such as to Such as to Such as to Such as Non-limiting examples of suitable protective layers are described, for example, in the following U.S. Patent Applications: 10 / 007,382; 10 / 133,805; 10 / 397,001; 10 / 422,094; 10 / 422,095; and 10 / 422,096.

[0108] In a non-limiting example, the protective layer 84 may include an additional third film formed over the second film. The third film may be any material used to form the first film or the second film. For example, the third film may include aluminum oxide, silicon oxide, titanium oxide, zirconium oxide, tin oxide, or a mixture thereof. For example, the third film may include a mixture of silicon oxide and aluminum oxide. In another example, the third film includes zirconium oxide. Between the top dielectric layer and the protective layer 84, and above at least a portion of the top dielectric layer or in direct contact with the top dielectric layer, may be a stress layer 82. The stress layer 82 is added below the protective layer 84 to reduce the sheet resistance of the coating. The thickness of the stress layer 82 may be 0.5-30 nm, preferably 1-25 nm, more preferably 1-20 nm, or most preferably 1-18 nm. In certain embodiments, the stress layer 82 may include silicon, cobalt, titanium, niobium, zirconium, tantalum, oxygen, and / or titanium. In one embodiment, the stress layer 82 includes silicon cobalt. In one embodiment, the stress layer 82 includes Ti x Nb 1-x Suboxide or oxide, wherein x is in the range of 1-100 wt % (BH and AH). In another embodiment, the stress layer 82 comprises Nb x Zr 1-x Suboxide or oxide, wherein x is in the following range: 1-12 wt% AH, preferably 1-11 wt% AH, more preferably 1-11 wt% AH, and most preferably 1-10 wt% AH. In another embodiment, the stress layer 82 comprises Ti x Ta 1-x Suboxide or oxide, wherein x is in the following range: 1-100 wt% AH, preferably 1-20 wt% AH or 30-100 wt% AH, more preferably 1-10 wt% AH or 500 wt% AH, and most preferably 1-4 wt% AH or 60-100 wt% AH. In another embodiment, the stress layer 82 comprises Si x Co 1-x Suboxides or oxides, wherein x is in the range of 10-90 wt% AH, preferably 15-90 wt% AH, more preferably 18-90 wt% AH, and most preferably 20-90 wt% AH.

[0109] exist Fig.10 and 11In the non-limiting embodiment shown, the bus bar assembly 120 includes a first or bottom bus bar 104 and a second or top bus bar 106 formed on the inner surface 16 of the outer ply 12 and separated by a bus bar to bus bar distance D. The bus bars 104, 106 are in electrical contact with the coating 10. The bus bar assembly 120 also includes a first conductive lead or strip 116 connected to the first bus bar 104 and a second conductive lead or strip 118 connected to the second bus bar 106. Each lead 116, 118 is connected to a power source 122. The bus bars 104, 106 and / or the conductive strips 116, 118 may be formed of a conductive metal foil or strip, such as, but not limited to, copper foil or tinned copper foil, or may be formed of a conductive coating, such as a ceramic coating, or a combination thereof. In one non-limiting embodiment of the present invention, the bus bars 104 and 106 may be at least partially located on the trim strip 102 or completely located on the trim strip 102 (eg, Fig.11 shown).

[0110] The power source 122 can be any conventional power source. However, in one non-limiting embodiment, the power source 122 is a conventional vehicle alternator configured to provide power in the range of 13 volts to 15 volts (eg, approximately 14 volts).

[0111] Another transparent member 130 including the features of the present invention is Fig.12 100. The construction of the transparent member 130 is similar to that of the transparent member 100, but the coating 10 includes one or more "cutout" areas, such as cutouts 132 and 134. The cutouts 132 and 134 divide the coating 10 into a first main portion 136, a second main portion 138, and a center portion 140. In this non-limiting embodiment, the bus bar assembly 142 is a four-feed assembly, that is, it has four connectors 144, 146, 148, and 150 connected to four bus bars 152, 154, 156, and 158, respectively. Bus bars 152 and 154 mainly provide power to the first main portion 136, while bus bars 156 and 158 mainly provide power to the second main area 138.

[0112] In one non-limiting embodiment of the present invention, the coating 30 is formulated or dimensioned to provide a substantially uniform voltage across the busbar to busbar distance D (see FIG. 1 ) when the coating is in electrical contact with a conventional automotive alternator, such as a conventional alternator producing 80 amps and 14 volts. Fig.10 ) provides 2 to 10 W / dm 2 ) with a busbar distance D in the range of 24 inches to 30 inches (60 cm to 75 cm), such as 4 to 8 W / dm 2 , such as 5 to 6 W / dm 2. Such power density is believed to be sufficient to melt ice found in contact with the outer surface 14 of the substrate 12. For viewing panels in the United States (e.g., windshields), the transparent member should also have a visible light transmittance greater than or equal to 70%, for example greater than or equal to 71%. As will be appreciated by those skilled in the art, several different competing factors need to be balanced to provide a coating with sufficient conductivity as well as sufficient transmittance. For example, as the distance D between the bus bars increases (i.e., the transparent member becomes wider from top to bottom), the bus bar to bus bar resistance increases. As the bus bar to bus bar resistance increases, the power density decreases. In order to maintain the power density as the bus bar to bus bar distance increases, the resistivity of the coating must be reduced. One way to reduce the resistivity is by increasing the thickness of one or more silver layers and / or by increasing the number of silver layers. In one non-limiting practice of the invention, the thickness and / or number of the silver layers are configured to produce a total resistivity of the coating of 0.6 to 1.5 ohms per square (Ω / □), such as 0.6 to 1.0 ohms per square (Ω / □), such as 0.6 to 0.9 ohms per square (Ω / □). In one non-limiting practice of the invention, the thickness and / or number of the silver layers are configured to produce a total resistivity of the coating of no greater than 0.850 ohms per square (Ω / □), such as no greater than 0.800 ohms per square (Ω / □), such as no greater than 0.695 ohms per square (Ω / □). However, as will also be appreciated by those skilled in the art, as the number or thickness of the silver layers increases, the visible light transmittance decreases. For a forward viewing area of ​​a vehicle, such as a windshield, the thickness and / or number of the silver layers should not be increased to the extent that the visible light transmittance of the viewing area drops below about 70%.

[0113] In one non-limiting practice of the invention, the coating provides a visible light reflectance of no greater than 25%, for example, no greater than 20%, such as no greater than 10%, such as no greater than 8%.

[0114] In one non-limiting practice of the present invention, coating 30 provides external reflectance a at an angle of 8 degrees in the range of 0 to -10 * (Rg8a * ). For example, in the range of -1 to -8, preferably -1.2 to -7.0, more preferably -1.5 to -6.8, most preferably -1.7 to -6.5.

[0115] In one non-limiting practice of the present invention, coating 30 provides an external reflectance b at an angle of 8 degrees in the range of 2 to -8 * (Rg8b * ). For example, in the range of 2.5 to -8.0, preferably 2.0 to -7.5, more preferably 1.8 to -7.3, most preferably 1.5 to -7.0.

[0116] One embodiment of the present invention is a vehicle transparent having only three metal layers sandwiched between dielectric layers. Each metal layer has a thickness. The combined thickness of all three metal layers is between 30nm and 60nm; preferably between 32nm and 47nm; more preferably between 34nm and 45nm; most preferably between 35nm and 43nm. The vehicle transparent may have a coating as shown in Table 3. Table 3

[0117] One embodiment of the present invention is a vehicle transparent having only four metal layers sandwiched between dielectric layers. Each metal layer has a thickness. The combined thickness of all four metal layers is between 30nm and 60nm; preferably between 35nm and 50nm; more preferably between 39nm and 48nm; most preferably between 40nm and 47nm. The vehicle transparent may have a coating as shown in Table 4. Table 4

[0118] Fig.13 A diagram of the initial nucleation of film growth on the surface is shown. The formation of the nucleus causes a change in the Gibbs free energy of the system, including volume and surface Gibbs free energy. In order to grow a 2D layer, the growth surface needs to have a high surface energy (i.e., high surface tension) for two-dimensional growth, and the change in Gibbs free energy needs to be large enough to produce a denser film. Therefore, the material on which silver is grown (i.e., the seed film) and the material covering the silver (i.e., the primer layer) need to have a high Gibbs free energy, so as to facilitate dense two-dimensional silver growth and avoid silver agglomeration. Table 5 below shows some elements with high cohesive energy and high Gibbs free energy compared to silver. These elements are some materials that are likely to reduce silver agglomeration when used as a seed film or primer layer. Table 5

[0119] The object of the present invention is to attempt to reduce the sheet resistance of the coated article while still maintaining a light transmittance of at least 70%. In order to do this, various materials believed to result in the aforementioned properties were tested as alternatives to standard materials known in the art for primer layers, metal layers, seed films and stress layers.

[0120] In another embodiment, the present invention is a coating that can be used for a head-up display (HUD) in a windshield. Fig.10 ,11 , 12, 14A, 14B and 15, the windshield includes a first ply and a second ply. The first ply is the outer or exterior ply of the windshield. The second ply is the interior ply of the windshield. Between the two plies is a sandwich. The sandwich can be any standard sandwich used in the industry. An example of such a sandwich is a polyvinyl butyral (PVB) sandwich. Preferably, the sandwich has a wedge shape, wherein one side of the sandwich is thicker than the other side. The first ply has a first surface and a second surface. The first surface is the surface that faces the outside of the vehicle when installed. The second surface faces the second ply. The second ply has a third surface and a fourth surface. When the windshield is installed in a vehicle, the third surface faces the first ply and the fourth surface faces the inside of the vehicle. The coating may be located on the second surface or the third surface, preferably on the second surface. Figure 16-23 Non-limiting examples of coatings that may be used for a HUD in a windshield are provided in .

[0121] For HUD, the coating can be a triple metal coating or a quadruple metal coating. In an embodiment where the coating is a triple metal coating, the coating has a first dielectric layer located above at least a portion of the substrate. The first metal layer is located above at least a portion of the first dielectric layer. Optionally, a primer is located above at least a portion of the first metal layer. The second dielectric layer is located above at least a portion of the first metal layer or the optional first primer. The second metal layer is located above at least a portion of the second dielectric layer. The optional second primer is located above at least a portion of the second metal layer. The third dielectric layer is located above at least a portion of the second metal layer of the optional second primer. The third metal layer is located above the third dielectric layer. The optional third primer layer is located above the third metal layer. The fourth dielectric layer is above the third metal layer or the optional third primer layer. The outer coating is above the fourth dielectric layer. The thickness of each layer is shown in Table 6 below. In the case where the primer layer comprises aluminum and zinc, the total thickness of the metal layer for the triple metal coating is in the range of 10nm to 65nm, preferably 15nm to 55nm, more preferably 20nm to 45nm, and most preferably 25nm to 36nm. Figure 16-21 Non-limiting examples of triple metal coatings are provided in and 23. Table 6

[0122] In an embodiment where the coating for the HUD comprises a quadruple metal coating, the coating has an additional layer above the fourth dielectric layer. That is, the fourth metal layer is located above the dielectric layer. The optional fourth primer layer is located above the fourth metal layer. The fifth dielectric layer is located above the fourth metal layer or the optional fourth primer layer. The optional topcoat layer is located above the fifth dielectric layer. The thickness of each layer is shown in Table 7 below. In the case where the primer layer comprises aluminum and zinc, the total thickness of the metal layers of the quadruple metal coating 34 is in the range of 10nm to 65nm, preferably 20nm to 60nm, most preferably 40nm to 55nm, and most preferably 35nm to 45nm.

[0123] Fig. 22 A non-limiting example of a coating having four metal layers is provided in . Table 7

[0124] In some non-limiting embodiments of the coating for HUD, the coating further comprises a light absorber. The light absorber is selected from colored glass, PVB, an absorber layer, or a combination thereof. In the above embodiments, the additional absorber layer may be located above the fourth dielectric layer or the fifth dielectric layer, so that the absorber layer will be located between the fourth dielectric layer or the fifth dielectric layer and the optional outer coating layer, or will be the outermost layer in the coating. Fig. 20 and 21 Non-limiting examples of such embodiments are provided. The absorber layer is selected from the group consisting of: Ge, GeO x 、NbN x 、NbN x O y 、Si a Al b 、Si a Al b O x 、Si a Co b 、Si a Co b O x 、Si a Co b Cu c 、Si a Co b Cu c O x 、Si a Cr b 、Si a Cr b O x 、Si a Ni b 、SiNiOx 、SiO x 、SnN x SnO x SnO x N y 、TiN x 、Ti a Nb b N x 、Ti a Nb b O x 、Ti a Nb b O x N y 、TiO x N y , WO x , WO2, ZnO:Co, ZnO:Fe, ZnO:Mn, ZnO:Ni, ZnO:V, ZnO:Cr, Zn a Sn b 、Zn a Sn b O x , or any combination thereof. In a non-limiting embodiment, the light absorbing compound can be silicon cobalt oxide. The thickness of the absorbing layer can be 1nm to 40nm, preferably 5nm to 30nm, more preferably 10nm to 25nm, and most preferably 15nm to 20nm. As an alternative, the absorbing layer can include a subcritical metal film. The metal in the subcritical metal layer can be silver, gold, their alloys, their mixtures, or their combinations. In a non-limiting embodiment, the subcritical film includes silver. The thickness of the subcritical metal film can be 0.5nm to 20nm, preferably 1nm to 10nm, or more preferably 1.5nm to 3.5nm. The term "subcritical thickness" refers to a thickness below the critical thickness, so that the coating material forms an isolated, non-connected area of ​​the coating material. The term "island-like" means that the coating material is not a continuous layer, but the material is deposited to form an isolated area or island. An additional dielectric layer can be formed above at least a portion of the subcritical metal film. The total thickness of the additional dielectric layer formed on at least a portion of the subcritical metal film is in the range of 25 nm to 33 nm, preferably 26 nm to 32 nm, more preferably 27 nm to 31 nm, and most preferably 28 nm to 30 nm, and may include any of the materials discussed above with respect to the first, second, third, fourth and fifth dielectric layers.

[0125] In one non-limiting embodiment for a HUD coating, the coating provides a visible light reflectance of no more than 25%. For example, no more than 20%, such as no more than 10%, such as no more than 8%. In one non-limiting implementation of the invention, the coating provides an external (ext) reflectance a at an angle of 8 degrees (°) in the range of 1 to -2 * (Rg8a * ). For example, in the range of 1 to -1, preferably -0.5 to 0.5, more preferably -0.5 to 0, most preferably 0. In a non-limiting embodiment, the coating provides an external reflection b at an angle of 8 degrees (°) in the range of 1 to -2 * (Rg8b * ). For example, in the range of 1 to -1, preferably -0.5 to 0.5, more preferably -0.5 to 0, most preferably 0.

[0126] In another embodiment, the present invention is directed to a coated substrate having an RgL of at least 42. * , preferably at least 45, more preferably at least 46, most preferably at least 50. In another embodiment, RgL * The value is at least 35 and no greater than 55. In another embodiment, RgL * is at least 42. In another embodiment, RgL * No more than 52. In this embodiment, there are two metal layers. This embodiment has a substrate and a coating over the substrate. The coating has a first dielectric layer over at least a portion of the substrate. The first metal layer is over at least a portion of the first dielectric layer. Optionally, a primer is over at least a portion of the first metal layer. The second dielectric layer is over at least a portion of the first metal layer or the optional first primer. The second metal layer is over at least a portion of the second dielectric layer. The optional second primer is over at least a portion of the second metal layer. The third dielectric layer is over at least a portion of the second metal layer of the optional second primer. An outer coating over the fourth dielectric layer. The thickness of each layer is shown in Table 8 below, and the results can be seen in Fig.21 . Table 8

[0127] The present invention also includes methods of forming these various embodiments of coated articles. The method includes providing a substrate; applying a coating over the substrate; wherein the coating comprises a first dielectric layer applied over at least a portion of the substrate, an optional first seed film applied over at least a portion of the first dielectric layer, a first metal layer applied over at least a portion of the first dielectric layer or the optional first seed film, a first primer layer applied over at least a portion of the first metal layer, and a second dielectric layer applied over at least a portion of the first primer layer. The coating provided in the above method may also include: a second seed film applied over at least a portion of the second dielectric layer, a second metal layer applied over at least a portion of the second dielectric layer or the second seed film, a second primer layer applied over at least a portion of the second metal layer, a third dielectric layer applied over at least a portion of the second primer layer, a third seed film applied over at least a portion of the third dielectric layer, a third metal layer applied over at least a portion of the third dielectric layer or the third seed film, a third primer layer applied over at least a portion of the third metal layer, a fourth dielectric layer applied over at least a portion of the third primer layer, a fourth seed film applied over at least a portion of the fourth dielectric layer, a fourth metal layer applied over at least a portion of the fourth dielectric layer or the fourth seed film, a fourth primer layer applied over at least a portion of the fourth metal layer, and / or a fifth dielectric layer applied over at least a portion of the fourth primer layer. The coating of the above method may optionally further comprise a protective layer over at least a portion of the topmost dielectric layer and / or a stress layer applied over at least a portion of the topmost dielectric layer and between the topmost dielectric layer and the protective layer.

[0128] The present invention also includes methods of producing these various embodiments of coated articles. The methods include providing a substrate; applying a coating over the substrate; heating the substrate containing the coating; and bending the substrate containing the coating into a desired shape; wherein the coating includes a first dielectric layer applied over at least a portion of the substrate, an optional first seed film applied over at least a portion of the first dielectric layer, a first metal layer applied over at least a portion of the first dielectric layer or the optional first seed film, a first primer layer applied over at least a portion of the first metal layer, and a second dielectric layer applied over at least a portion of the first primer layer. The coating provided in the above method may also optionally include: a second seed film applied over at least a portion of the second dielectric layer, a second metal layer applied over at least a portion of the second dielectric layer or the second seed film, a second primer layer applied over at least a portion of the second metal layer, a third dielectric layer applied over at least a portion of the second primer layer, a third seed film applied over at least a portion of the third dielectric layer, a third metal layer applied over at least a portion of the third dielectric layer or the third seed film, a third primer layer applied over at least a portion of the third metal layer, a fourth dielectric layer applied over at least a portion of the third primer layer, a fourth seed film applied over at least a portion of the fourth dielectric layer, a fourth metal layer applied over at least a portion of the fourth dielectric layer or the fourth seed film, a fourth primer layer applied over at least a portion of the fourth metal layer, and / or a fifth dielectric layer applied over at least a portion of the fourth primer layer. The coating of the above method may optionally further comprise a protective layer over at least a portion of the topmost dielectric layer and / or a stress layer applied over at least a portion of the topmost dielectric layer and between the topmost dielectric layer and the protective layer.

[0129] The invention is further described in the following numbered clauses.

[0130] Item 1. A coated article comprising: a substrate; a first dielectric layer over at least a portion of the substrate; a first metal layer over at least a portion of the first dielectric layer; a first primer layer over at least a portion of the first metal layer; a second dielectric layer over at least a portion of the first primer layer; a second metal layer over at least a portion of the second dielectric layer; a second primer layer over at least a portion of the second metal layer; a third dielectric layer over at least a portion of the second primer layer; a third metal layer over at least a portion of the third dielectric layer; a third primer layer over at least a portion of the third metal layer; and a fourth dielectric layer over at least a portion of the third primer layer; wherein the total combined thickness of the metal layers is at least 30 nanometers and no greater than 60 nanometers.

[0131] Item 2. A coated article according to Item 1, wherein the first metal layer is selected from silver, copper, gold, aluminum, mixtures thereof and alloys thereof; the second metal layer is selected from silver, copper, gold, aluminum, mixtures thereof and alloys thereof; and / or the third metal layer is selected from silver, copper, gold, aluminum, mixtures thereof and alloys thereof.

[0132] Clause 3. The coated article of Clause 1, wherein the first metal layer comprises silver, the second metal layer comprises silver, and the third metal layer comprises silver.

[0133] Clause 4. A coated article according to any one of the preceding clauses, wherein the thickness of the first metal layer is at least and at most The thickness of the second metal layer is at least and at most and / or the thickness of the third metal layer is at least and at most

[0134] Clause 5. The coated article of any of the preceding clauses, wherein the first metal layer has a first metal layer thickness and the third metal layer has a third metal layer thickness, and wherein the first metal layer thickness is at least 10% thicker or thinner than the third metal layer thickness.

[0135] Clause 6. The coated article of any preceding clause, wherein the first metal layer has a first metal layer thickness and the second metal layer has a second metal layer thickness, and wherein the first metal layer thickness is thinner than the second metal layer thickness.

[0136] Clause 7. The coated article of any preceding clause, wherein the third metal layer has a third metal layer thickness and the second metal layer has a second metal layer thickness, and wherein the third metal layer thickness is thinner than the second metal layer thickness.

[0137] Clause 8. The coated article of any of the preceding clauses, further comprising: a fourth metal layer over at least a portion of the fourth dielectric layer; a fourth primer layer over at least a portion of the fourth metal layer; and a fifth dielectric layer over at least a portion of the fourth primer layer.

[0138] Item 9. A coated article according to Item 8, wherein the first metal layer is selected from silver, copper, gold, palladium, aluminum, mixtures thereof or alloys thereof; the second metal layer is selected from silver, copper, gold, palladium, aluminum, mixtures thereof or alloys thereof; the third metal layer is selected from silver, copper, gold, palladium, aluminum, mixtures thereof or alloys thereof; and / or the fourth metal layer is selected from silver, copper, gold, palladium, aluminum, mixtures thereof or alloys thereof.

[0139] Clause 10. The coated article of Clause 8 or 9, wherein the first metal layer comprises silver, the second metal layer comprises silver, the third metal layer comprises silver, and the fourth metal layer comprises silver.

[0140] Clause 11. The coated article according to any one of clauses 8-10, wherein the thickness of the first metal layer is at least and at most The thickness of the second metal layer is at least and at most The thickness of the third metal layer is at least and at most and the thickness of the fourth metal layer is at least and at most

[0141] Clause 12. The coated article of any of Clauses 8-11, wherein the first metal layer has a first metal layer thickness and the fourth metal layer has a fourth metal layer thickness, and wherein the first metal layer thickness is 10% thicker or thinner than the fourth metal layer thickness.

[0142] Clause 13. The coated article of any of Clauses 8-12, wherein the second metal layer has a second metal layer thickness, and the third metal layer has a third metal layer thickness, and wherein the second metal layer thickness is 10% thicker or thinner than the third metal layer thickness.

[0143] Clause 14. The coated article of any of Clauses 8-13, wherein the first metal layer has a first metal layer thickness and the second metal layer has a second metal layer thickness, and wherein the first metal layer thickness is thinner than the second metal layer thickness.

[0144] Clause 15. The coated article of any of Clauses 8-14, wherein the fourth metal layer has a fourth metal layer thickness, and the third metal layer has a third metal layer thickness, and wherein the fourth metal layer thickness is thinner than the third metal layer thickness.

[0145] Clause 16. The coated article of any preceding clause, wherein the total combined thickness of all metal layers is no greater than 47 nm; and / or at least 35 nm.

[0146] Clause 17. The coated article of Clause 16, wherein the total combined thickness of all metal layers is no greater than 43 nanometers and / or at least 35 nanometers.

[0147] Clause 18. The coated article of Clause 1, wherein at least one of the metal layers comprises at least one of the following: silver, copper, gold, palladium, aluminum, mixtures thereof, or alloys thereof.

[0148] Clause 19. The coated article of any preceding clause, wherein the first dielectric layer comprises a zinc stannate film, and a zinc oxide film over at least a portion of the zinc stannate film.

[0149] Clause 20. A coated article according to any of the preceding clauses, wherein the second dielectric layer and / or the third dielectric layer comprises a first zinc oxide film, an optional zinc stannate film over at least a portion of the first zinc oxide film, and a second film over at least a portion of the zinc stannate film, wherein the second film comprises zinc oxide, silicon nitride, silicon oxynitride, or a combination thereof.

[0150] Clause 21. The coated article of any preceding clause, wherein the fourth dielectric layer comprises a zinc oxide film, and a zinc stannate layer film over at least a portion of the zinc oxide film.

[0151] Clause 22. The coated article of any preceding clause, wherein at least one dielectric layer comprises a silicon nitride film.

[0152] Item 23. The coated article according to any of the preceding items, further comprising an outermost protective coating comprising a protective layer, wherein the protective layer comprises at least one of the following: Si3N4, SiAlN, SiAlON, SiAlO, titanium oxide, aluminum oxide, silicon oxide, zirconium oxide, alloys thereof, or mixtures thereof.

[0153] Item 24. The coated article according to Item 23, wherein the outermost protective layer comprises Si3N4, SiAlO, SiAlN, SiAlON, or a mixture thereof.

[0154] Clause 25. The coated article of Clause 23, wherein the outermost protective layer comprises titanium oxide.

[0155] Clause 26. A coated article according to any of the preceding clauses, wherein at least one of the first primer layer, the second primer layer and / or the third primer layer is selected from titanium, cobalt, silicon, zinc, aluminum, vanadium, tungsten, tantalum, niobium, zirconium, manganese, chromium, tin, nickel, gallium, indium, germanium, magnesium, molybdenum, silver, silicon carbide, aluminum-doped silver, aluminum zinc, vanadium zinc, tungsten tantalum, titanium niobium, zirconium niobium, tungsten niobium, aluminum niobium, aluminum titanium, tungsten titanium, tantalum titanium, zinc titanium, aluminum silver, zinc tin, indium zinc, silver zinc, mixtures thereof, and alloys thereof, wherein the primer is deposited as a metal and can subsequently be oxidized.

[0156] Clause 27. The coated article of Clause 26, wherein at least one of the first primer layer, the second primer layer, and / or the third primer layer comprises titanium or a nickel-chromium alloy, and wherein the primer is deposited as a metal and subsequently oxidized.

[0157] Clause 28. A coated article according to Clause 26, wherein at least one of the first primer layer, the second primer layer and / or the third primer layer is a metal oxide, the metal oxide comprising a metal selected from the group consisting of titanium, cobalt, silicon, zinc, aluminum, vanadium, tungsten, tantalum, niobium, zirconium, manganese, chromium, tin, nickel, gallium, indium, germanium, magnesium, molybdenum, silver, silicon carbide, aluminum-doped silver, aluminum zinc, vanadium zinc, tungsten tantalum, titanium niobium, zirconium niobium, tungsten niobium, aluminum niobium, aluminum titanium, tungsten titanium, tantalum titanium, zinc titanium, aluminum silver, zinc tin, indium zinc, silver zinc, mixtures thereof, and alloys thereof, wherein the primer is deposited as a metal and can subsequently be oxidized.

[0158] Clause 29. The article of clause 28, wherein at least one of the first primer layer, the second primer layer, and / or the third primer layer is a metal oxide comprising a metal including titanium, titanium aluminum alloy, nickel, or a nickel-chromium alloy.

[0159] Clause 30. The coated article of any preceding clause, wherein the coated article has a visible light transmittance of at least 70%.

[0160] Item 31. A coated article comprising: a substrate; a first dielectric layer over at least a portion of the substrate; a first metal layer over at least a portion of the first dielectric layer; a first primer layer over at least a portion of the first metal layer; a second dielectric layer over at least a portion of the first primer layer; a second metal layer over at least a portion of the second dielectric layer; a second primer layer over at least a portion of the second metal layer; a third dielectric layer over at least a portion of the second primer layer; a third metal layer over at least a portion of the third dielectric layer; a third primer layer over at least a portion of the third metal layer; and a fourth dielectric layer over at least a portion of the third primer layer; wherein the article has a sheet resistance of no greater than 0.85Ω / □.

[0161] Clause 32. The coated article of Clause 31, wherein the sheet resistance is no greater than 0.8 Ω / □.

[0162] Clause 33. The coated article of Clause 31 or 32, wherein the sheet resistance is no greater than 0.7 Ω / □.

[0163] Clause 34. The coated article of any of Clauses 31-33, wherein the coated article has a visible light transmittance of at least 70%.

[0164] Clause 35. The coated article of any of Clauses 31-34, wherein at least one of the metal layers comprises at least one of the following: silver, copper, gold, palladium, aluminum, mixtures thereof, or alloys thereof.

[0165] Clause 36. The coated article of any of Clauses 31-35, wherein at least one of the dielectric layers comprises at least one of the following: a zinc stannate film, a zinc oxide film, a silicon nitride film, or a mixture thereof.

[0166] Clause 37. A coated article according to any of Clauses 31-36, wherein at least one of the primer layers is selected from the group consisting of: titanium, cobalt, silicon, zinc, aluminum, vanadium, tungsten, tantalum, niobium, zirconium, manganese, chromium, tin, nickel, gallium, indium, germanium, magnesium, molybdenum, silver, silicon carbide, aluminum-doped silver, aluminum zinc, vanadium zinc, tungsten tantalum, titanium niobium, zirconium niobium, tungsten niobium, aluminum niobium, aluminum titanium, tungsten titanium, tantalum titanium, zinc titanium, aluminum silver, zinc tin, indium zinc, silver zinc, mixtures thereof, and alloys thereof, wherein the primer is deposited as a metal and can subsequently be oxidized.

[0167] Clause 38. The coated article of any preceding clause, wherein the first primer layer comprises titanium, aluminum, nickel, or chromium, and wherein the primer is deposited as a metal and subsequently oxidized.

[0168] Clause 39. The article of any preceding clause, wherein the second primer layer comprises titanium, aluminum, nickel, or chromium, and wherein the primer is deposited as a metal and subsequently oxidized.

[0169] Clause 40. The article of any preceding clause, wherein the third primer layer comprises titanium, aluminum, nickel, or chromium, and wherein the primer is deposited as a metal and subsequently oxidized.

[0170] Item 41. A coated article comprising: a substrate; a first dielectric layer over at least a portion of the substrate; a first metal layer over at least a portion of the first dielectric layer; a first primer layer over at least a portion of the first metal layer; a second dielectric layer over at least a portion of the first primer layer; a second metal layer over at least a portion of the second dielectric layer; and a second primer layer over at least a portion of the second metal layer, wherein the total combined thickness of the metal layers is at least 30 nanometers and no greater than 60 nanometers.

[0171] Clause 42. The coated article of Clause 41, wherein the first metal layer is selected from silver, copper, gold, aluminum, mixtures thereof, or alloys thereof; and the second metal layer is selected from silver, copper, gold, aluminum, mixtures thereof, or alloys thereof.

[0172] Clause 43. The coated article of Clause 41 or 42, wherein the first metal layer comprises silver and the second metal layer comprises silver.

[0173] Clause 44. The coated article of any of Clauses 41-43, wherein the first metal layer has a thickness of at least 90 nm and at most 140 nm, and the second metal layer has a thickness of at least 110 nm and at most 140 nm.

[0174] Clause 45. The coated article of any of Clauses 41-44, wherein the first metal layer has a first metal layer thickness and the second metal layer has a second metal layer thickness, and wherein the first metal layer thickness is 10% thicker or thinner than the second metal layer thickness.

[0175] Clause 46. The coated article of any of Clauses 41-45, wherein the first metal layer has a first metal layer thickness and the second metal layer has a second metal layer thickness, and wherein the first metal layer thickness is thinner than the second metal layer thickness.

[0176] Clause 47. The coated article of any of Clauses 41-46, further comprising: a third metal layer over at least a portion of the third dielectric layer; a third primer layer over at least a portion of the third metal layer; and a fourth dielectric layer over at least a portion of the third primer layer.

[0177] Item 48. A coated article according to Item 47, wherein the first metal layer is selected from silver, copper, gold, palladium, aluminum, mixtures thereof, or alloys thereof; the second metal layer is selected from silver, copper, gold, palladium, aluminum, mixtures thereof, or alloys thereof; and the third metal layer is selected from silver, copper, gold, palladium, aluminum, mixtures thereof, or alloys thereof.

[0178] Clause 49. The coated article of Clause 47 or 48, wherein the first metal layer comprises silver, the second metal layer comprises silver, and the third metal layer comprises silver.

[0179] Clause 50. The coated article according to any one of Clauses 47-49, wherein the first metal layer has at least and at most The second metal layer has a thickness of at least and at most The thickness of the third metal layer is at least and at most Thickness.

[0180] Clause 51. The coated article of any of Clauses 47-50, wherein the first metal layer has a first metal layer thickness and the third metal layer has a third metal layer thickness, and wherein the first metal layer thickness is 10% thicker or thinner than the third metal layer thickness.

[0181] Clause 52. The coated article of any of Clauses 47-51, wherein the first metal layer has a first metal layer thickness and the second metal layer has a second metal layer thickness, and wherein the first metal layer thickness is thinner than the second metal layer thickness.

[0182] Clause 53. The coated article of any of Clauses 47-52, wherein the third metal layer has a third metal layer thickness and the second metal layer has a second metal layer thickness, and wherein the third metal layer thickness is thinner than the second metal layer thickness.

[0183] Clause 54. The coated article of any of Clauses 47-53, further comprising: a fourth metal layer over at least a portion of the fourth dielectric layer; a fourth primer layer over at least a portion of the fourth metal layer; and a fifth dielectric layer over at least a portion of the fourth primer layer.

[0184] Item 55. A coated article according to Item 54, wherein the first metal layer is selected from silver, copper, gold, palladium, aluminum, mixtures thereof, or alloys thereof; the second metal layer is selected from silver, copper, gold, palladium, aluminum, mixtures thereof, or alloys thereof; the third metal layer is selected from silver, copper, gold, aluminum, mixtures thereof, or alloys thereof; and the fourth metal layer is selected from silver, copper, gold, palladium, aluminum, mixtures thereof, or alloys thereof.

[0185] Clause 56. The coated article of Clause 54 or 55, wherein the first metal layer comprises silver, the second metal layer comprises silver, the third metal layer comprises silver, and the fourth metal layer comprises silver.

[0186] Clause 57. A coated article according to any one of Clauses 54-56, wherein the thickness of the first metal layer is at least and at most The thickness of the second metal layer is at least and at most The thickness of the third metal layer is at least and at most And the thickness of the fourth metal layer is at least and at most

[0187] Clause 58. The coated article of any of Clauses 54-57, wherein the first metal layer has a first metal layer thickness and the fourth metal layer has a fourth metal layer thickness, and wherein the first metal layer thickness is 10% thicker or thinner than the fourth metal layer thickness.

[0188] Clause 59. The coated article of any of Clauses 54-58, wherein the fourth metal layer has a fourth metal layer thickness and the third metal layer has a third metal layer thickness, and wherein the fourth metal layer thickness is thinner than the third metal layer thickness.

[0189] Clause 60. The coated article of any of Clauses 41-59, wherein the coated article has a visible light transmittance of at least 70%.

[0190] Clause 61. The coated article of Clause 41, wherein at least one of the metal layers comprises at least one of the following: silver, copper, gold, palladium, aluminum, mixtures thereof, or alloys thereof.

[0191] Clause 62. The coated article of any of Clauses 41-61, wherein at least one of the dielectric layers comprises at least one of the following: a zinc stannate layer, a zinc oxide layer, a silicon nitride layer, or a mixture thereof.

[0192] Clause 63. The coated article according to any one of Clauses 41-62, further comprising an outermost protective coating comprising a protective layer, wherein the protective layer comprises at least one of the following: Si3N4, SiAlN, SiAlON, titanium oxide, aluminum oxide, silicon oxide, zirconium oxide, alloys thereof, or mixtures thereof.

[0193] Clause 64. A coated article according to any of clauses 41-63, wherein at least one primer layer is selected from: titanium, cobalt, silicon, zinc, aluminum, vanadium, tungsten, tantalum, niobium, zirconium, manganese, chromium, tin, nickel, gallium, indium, germanium, magnesium, molybdenum, silver, silicon carbide, aluminum-doped silver, aluminum zinc, vanadium zinc, tungsten tantalum, titanium niobium, zirconium niobium, tungsten niobium, aluminum niobium, aluminum titanium, tungsten titanium, tantalum titanium, zinc titanium, aluminum silver, zinc tin, indium zinc, silver zinc, mixtures thereof, and alloys thereof, wherein the primer is deposited as a metal and can be subsequently oxidized.

[0194] Item 65. A coated article comprising: a first substrate, the first substrate comprising a first surface and a second surface; a second substrate above at least a portion of the first substrate, the second substrate comprising a third surface and a fourth surface, wherein the second surface is configured to face the third surface, and wherein the second surface and the third surface are separated by an interlayer; a functional coating disposed above the second surface or the third surface, the functional coating comprising: a first dielectric layer above at least a portion of the surface; a first metal layer above at least a portion of the first dielectric layer; a first primer layer above at least a portion of the first metal layer; a second dielectric layer above at least a portion of the first primer layer; a second metal layer above at least a portion of the second dielectric layer; a second primer layer above at least a portion of the second metal layer; a third dielectric layer above at least a portion of the second primer layer; a third metal layer above at least a portion of the third dielectric layer; a third primer layer above at least a portion of the third metal layer; and a fourth dielectric layer above at least a portion of the third primer layer; wherein the coated substrate has a visible light reflectance of not greater than 10%.

[0195] Clause 66. The coated article of Clause 65, wherein the coating further comprises: a fourth metal layer over at least a portion of the fourth dielectric layer; a fourth primer layer over at least a portion of the fourth metal layer; and a fifth dielectric layer over at least a portion of the fourth primer layer.

[0196] Clause 67. The coated article of Clause 65 or 66, wherein the coated substrate has a visible light reflectance of no greater than 8%.

[0197] Clause 68. The coated article of any of Clauses 65-67, wherein the coated article has a visible light transmittance of at least 70%.

[0198] Clause 69. The coated article of any of Clauses 65-68, wherein at least one of the metal layers comprises at least one of the following: silver, copper, gold, aluminum, mixtures thereof, or alloys thereof.

[0199] Clause 70. The coated article of any of Clauses 65-69, wherein at least one of the dielectric layers comprises at least one of: a zinc stannate layer, a zinc oxide layer, a silicon nitride layer, or a mixture thereof.

[0200] Clause 71. The coated article according to any one of Clauses 65-70, further comprising an outermost protective coating comprising a protective layer, wherein the protective layer comprises at least one of the following: Si3N4, SiAlN, SiAlON, titanium oxide, aluminum oxide, silicon oxide, zirconium oxide, alloys thereof, or mixtures thereof.

[0201] Clause 72. A coated article according to any of clauses 65-71, wherein at least one of the primer layers is selected from the group consisting of titanium, cobalt, silicon, zinc, aluminum, vanadium, tungsten, tantalum, niobium, zirconium, manganese, chromium, tin, nickel, gallium, indium, germanium, magnesium, molybdenum, silver, silicon carbide, aluminum-doped silver, aluminum zinc, vanadium zinc, tungsten tantalum, titanium niobium, zirconium niobium, tungsten niobium, aluminum niobium, aluminum titanium, tungsten titanium, tantalum titanium, zinc titanium, aluminum silver, zinc tin, indium zinc, silver zinc, mixtures thereof, and alloys thereof, wherein the primer is deposited as a metal and can subsequently be oxidized.

[0202] The following examples illustrate various embodiments of the present invention. However, it should be understood that the present invention is not limited to these specific embodiments. Example

[0203] Example 1

[0204] As mentioned previously, the sheet resistance of the coating can be reduced by using new materials for each layer. It is expected that the sheet resistance will also decrease as new layers are added. In Table 9, Ti 78 Nb 22 As an alternative to the Ti primer layer, it is incorporated into the stack. Ag deposited with oxygen is also included as a seed film under the silver metal layer. The substrate is a transparent glass substrate. ZT stands for zinc tin, also known as zinc stannate. Zn90 is tin-doped zinc oxide (i.e., ZnO 90 / 10) deposited from a cathode with 10 wt% tin and 90 wt% zinc in the presence of oxygen. Ag means silver. PPO is the protective layer or coating discussed above. Before integrating these layers, each layer has been optimized to obtain the lowest sheet resistance. The best samples under different combinations are listed in the table below. Table 9

[0205] Additional coating stacks were also tested, with Ti 78 Nb 22 O x As the stress layer discussed previously, a total of three layers were changed from the baseline to the final coating stack. The values ​​of their sheet resistance can be found in Table 10. Table 10

[0206] Table 11 Ti3Nb 97 Nx or titanium niobium nitride replaces the Ti primer layer or Ti 78 Nb 22 Primer layer. Table 11

[0207] Table 12 shows the coating stack experiments with aluminum zinc primer and aluminum zinc oxide as part of the dielectric layer above and below the silver layer. For the single silver stack, the sheet resistance was reduced from 3.75 Ω / □ to 3.21 Ω / □. Table 12 Primer(nm) Bottom-AZO(nm) Ag(nm) Top-AZO(nm) B H AHr Benchmarks - 11.20 7.24 3.75 4.1 - 11.20 7.08 3.32 6.1 5 11.20 5 7.87 3.21

[0208] Table 13 shows the coating stack experiments with an aluminum zinc primer and aluminum zinc oxide above and below the silver layer. 90 Sn 10 The sheet resistance is reduced from 1Ω / □ to 0.73Ω / □ by using a triple silver stack of Ag oxygen-deposited seed films between O. Table 13

[0209] Adding a stress layer below the protective layer can lead to a further reduction in the sheet resistance of the coating stack. Various additional materials were tested for use as stress layers. Some of these materials are shown in Table 14, and the reduction in sheet resistance of including these materials as stress layers is shown. Table 14 Stress layer Thickness(nm) <![CDATA[%O2]]> ΔRs / Rs AH(Max%) TiNbOx(suboxide) ~14, on the Ti side 20 -27％ ZrNbOx (suboxide) ~5, on the Nb side 10 -23％ TaTiOx(suboxide) ~5, on the Nb side 10 -21％

[0210] Experiments were conducted in which the film of the dielectric layer surrounding the metal layer was replaced with VZnO (vanadium zinc oxide). The top film of the dielectric layer directly below the metal layer was replaced, and the bottom film of the dielectric layer directly above the metal layer was replaced. These layers were paired with a Ti primer layer and a zinc metal primer layer. The results of these experiments are shown in Table 15 below. Table 15 Primer wt%[V] Bottom dielectric layer Top dielectric layer Rs(Ω / □) LTA(%) Benchmarks Ti 0 Zn90 Zn90 5.67 83.4 ZnO Ti 0 ZnO ZnO 4.58 82.7 VxD Ti 0.45 VxD VxD 4.52 83 Zn90 Zn 0 Zn90 Zn90 3.62 86.5 ZnO Zn 0 ZnO ZnO 3.12 82.4 VxD Zn 0.45 VxD VxD 3.14 89.1

[0211] Example 2

[0212] Tables 16 and 17 show exemplary coatings of the present invention. The thicknesses reported are in angstroms. The geometric thickness is in units of . The substrate is a transparent glass substrate with a thickness of 2.1 mm. ZS means zinc stannate deposited from a cathode having 52 wt % zinc and 48 wt % tin in the presence of oxygen. TZO means tin-doped zinc oxide (i.e., ZnO 90 / 10) deposited from a cathode having 10 wt % tin and 90 wt % zinc in the presence of oxygen. Ag means silver. TiO x It refers to a titanium primer layer that is deposited as metal and oxidized during processing. Table 16 sample 1 2 3 4 Glass ZS / TZO 472 471 480 472 Ag 121 137 139 113 Ti 20-40 20-40 20-40 20-40 TZO / ZS / TZO 725 777 795 724 Ag 133 139 131 132 Ti 20-40 20-40 20-40 20-40 TZO / ZS / TZO 789 761 717 815 Ag 142 129 117 141 Ti 20-40 20-40 20-40 20-40 TZO / ZS 366 379 364 389 <![CDATA[Si 60 Al 40 Ox]]> 200 160 200 200 <![CDATA[Si 85 Al 15 Ox]]> 350 220 350 300 Table 17 sample 5 6 7 8 9 Glass ZS / TZO 463 458 459 436 423 Ag 97 98 98 98 96 Ti 20-40 20-40 20-40 20-40 20-40 TZO / ZS / TZO 846 825 820 807 795 Ag 128 128 129 123 1199 Ti 20-40 20-40 20-40 20-40 20-40 TZO / ZS / TZO 758 755 752 733 736 Ag 119 123 124 122 127 Ti 20-40 20-40 20-40 20-40 20-40 TZO / ZS / TZO 701 699 695 702 698 Ag 105 105 105 107 93 Ti 20-40 20-40 20-40 20-40 20-40 TZO / ZS 448 454 353 451 435 <![CDATA[Si 40 Al 60 Ox]]> 160 160 160 160 160 <![CDATA[Si 85 Al 15 Ox]]> 220 220 220 220 220

[0213] Tables 18-22 show the spectral characteristics of the samples of Tables 5 and 6. Table 18 Table 19 sample 8L Rg8a* Rg8b* Rg45L* Rg45a* Rg45b* Rg60L* Rg60a* Rg60b* 1 41.02 -6.35 0.51 42.03 -4.24 3.35 49.28 -0.88 4.03 2 40.60 -2.20 -4.20 41.89 -1.99 1.49 49.30 0.59 3.01 3 42.49 -8.07 -3.17 42.91 -4.90 -1.99 49.79 -1.17 -0.21 4 41.09 -4.04 -4.92 41.78 -3.77 -0.82 48.98 -1.19 1.34 Table 20 sample Rf8L Rf8a* Rf8b* Rf45L* Rf45a* Rf45b* Rf60L* Rf60a* Rf60b* 1 42.71 -8.55 1.50 43.46 -5.88 2.82 50.32 -1.72 3.13 2 40.56 -2.46 -1.86 41.96 -3.36 4.18 49.37 -0.89 5.08 3 41.68 -7.14 0.20 42.42 -5.61 2.40 49.49 -2.47 3.52 4 42.87 -6.86 -3.53 43.24 -5.66 -1.30 50.00 -2.07 0.29 Table 21 Table 22 sample 8L Rg8a* Rg8b* Rf8L Rf8a* Rf8b* 5 36.64 -4.54 -6.97 36.13 -4.17 -3.62 6 35.34 -2.88 -6.30 35.06 -2.77 -3.49 7 35.04 -2.58 -6.39 34.75 -2.51 -3.38 8 35.67 -6.43 -2.03 35.46 -6.08 -0.45 9 35.01 -1.74 -1.37 34.78 -3.00 -1.05

[0214] Those skilled in the art will readily appreciate that the present invention may be modified without departing from the disclosed concepts in the foregoing description. Therefore, the specific embodiments described in detail herein are merely illustrative and do not limit the scope of the present invention, which is given by the full scope of the appended claims and any and all equivalents thereof.

Claims

1. A coated article comprising: substrate; a first dielectric layer over at least a portion of a substrate, wherein the first dielectric layer comprises a total thickness of 42 nm to 47 nm, wherein the first dielectric layer consists of a first film over at least a portion of the substrate and a second film over at least a portion of the first film, and wherein the first film comprises zinc stannate or tin oxide; A first metal layer over at least a portion of the first dielectric layer, wherein the first metal layer has at least and at most Thickness; A first primer layer comprising titanium over at least a portion of the first metal layer, wherein the first primer layer has to Thickness; a second dielectric layer over at least a portion of the first primer layer, wherein the second dielectric layer comprises a total thickness of 78 nm to 85 nm, wherein the second dielectric layer consists of a first film over at least a portion of the first primer layer, a second film over at least a portion of the first film, and a third film over at least a portion of the second film, and wherein the second film comprises zinc stannate; a second metal layer over at least a portion of the second dielectric layer, wherein the second metal layer has at least and at most Thickness; A second primer layer comprising titanium over at least a portion of the second metal layer, wherein the second primer layer has to Thickness; a third dielectric layer over at least a portion of the second primer layer, wherein the third dielectric layer comprises a total thickness of 70 nm to 82.5 nm, wherein the third dielectric layer consists of a first film over at least a portion of the second primer layer, a second film over at least a portion of the first film, and a third film over at least a portion of the second film, and wherein the second film comprises zinc stannate; A third metal layer over at least a portion of the third dielectric layer, wherein the third metal layer has at least and at most Thickness; A third primer layer comprising titanium over at least a portion of the third metal layer, wherein the third primer layer has to thickness; and a fourth dielectric layer over at least a portion of the third primer layer, wherein the fourth dielectric layer comprises a total thickness of 55 nm to 70 nm, wherein the fourth dielectric layer consists of a first film over at least a portion of the third primer layer, a second film over at least a portion of the first film, and a third film over at least a portion of the second film, and wherein the second film comprises zinc stannate; A fourth metal layer over at least a portion of the fourth dielectric layer, wherein the fourth metal layer has at least and at most Thickness; A fourth primer layer comprising titanium over at least a portion of the fourth metal layer, wherein the fourth primer layer has to thickness; and a fifth dielectric layer over at least a portion of the fourth primer layer, wherein the fifth dielectric layer comprises a total thickness of 42.5 nm to 47.5 nm, wherein the fifth dielectric layer consists of a first film over at least a portion of the fourth primer layer and a second film over at least a portion of the first film, and wherein the second film comprises zinc stannate or tin oxide; wherein the coated article comprises four metal layers; wherein the total combined thickness of the four metal layers is at least 40 nanometers and no more than 47 nanometers, and wherein the coated article has a sheet resistance of not more than 0.85Ω / □.

2. The coated article of claim 1, wherein at least one of the metal layers comprises at least one of: silver, copper, gold, aluminum, mixtures thereof, or alloys thereof.

3. The coated article according to claim 1, further comprising an outermost protective coating, Wherein the outermost protective coating comprises a total thickness of 20 nm to 120 nm.

4. The coated article of claim 1, wherein the first primer layer, the second primer layer, the third primer layer, and the fourth primer layer are deposited as metal and subsequently oxidized.

5. The coated article of claim 1, wherein the coated article has a visible light transmittance of at least 70%.

6. A coated article comprising: substrate; a first dielectric layer over at least a portion of a substrate, wherein the first dielectric layer comprises a total thickness of 42 nm to 47 nm, wherein the first dielectric layer consists of a first film over at least a portion of the substrate and a second film over at least a portion of the first film, and wherein the first film comprises zinc stannate or tin oxide; A first metal layer over at least a portion of the first dielectric layer, wherein the first metal layer has at least and at most Thickness; A first primer layer comprising titanium over at least a portion of the first metal layer, wherein the first primer layer has to Thickness; a second dielectric layer over at least a portion of the first primer layer, wherein the second dielectric layer comprises a total thickness of 78 nm to 85 nm, wherein the second dielectric layer consists of a first film over at least a portion of the first primer layer, a second film over at least a portion of the first film, and a third film over at least a portion of the second film, and wherein the second film comprises zinc stannate; a second metal layer over at least a portion of the second dielectric layer, wherein the second metal layer has at least and at most Thickness; A second primer layer comprising titanium over at least a portion of the second metal layer, wherein the second primer layer has to Thickness; a third dielectric layer over at least a portion of the second primer layer, wherein the third dielectric layer comprises a total thickness of 70 nm to 82.5 nm, wherein the third dielectric layer consists of a first film over at least a portion of the second primer layer, a second film over at least a portion of the first film, and a third film over at least a portion of the second film, and wherein the second film comprises zinc stannate; A third metal layer over at least a portion of the third dielectric layer, wherein the third metal layer has at least and at most Thickness; A third primer layer comprising titanium over at least a portion of the third metal layer, wherein the third primer layer has to Thickness; a fourth dielectric layer over at least a portion of the third primer layer, wherein the fourth dielectric layer comprises a total thickness of 55 nm to 70 nm, wherein the fourth dielectric layer consists of a first film over at least a portion of the third primer layer, a second film over at least a portion of the first film, and a third film over at least a portion of the second film, and wherein the second film comprises zinc stannate; A fourth metal layer over at least a portion of the fourth dielectric layer, wherein the fourth metal layer has at least and at most Thickness; A fourth primer layer comprising titanium over at least a portion of the fourth metal layer, wherein the fourth primer layer has to thickness; and a fifth dielectric layer over at least a portion of the fourth primer layer, wherein the fifth dielectric layer comprises a total thickness of 42.5 nm to 47.5 nm, wherein the fifth dielectric layer consists of a first film over at least a portion of the fourth primer layer and a second film over at least a portion of the first film, and wherein the second film comprises zinc stannate or tin oxide; wherein the coated article comprises four metal layers; wherein the total combined thickness of the four metal layers is at least 40 nanometers and no more than 47 nanometers, wherein the coated article has a sheet resistance of no greater than 0.85 Ω / □, and wherein the coated article has a visible light transmittance of at least 70%.

7. The coated article according to claim 6, wherein the sheet resistance is not greater than 0.7Ω / □.

8. The coated article of claim 6, wherein the at least one metal layer comprises at least one of: silver, copper, gold, aluminum, mixtures thereof, or alloys thereof.

9. The coated article of claim 6, further comprising an outermost protective coating, Wherein the outermost protective coating comprises a total thickness of 20 nm to 120 nm.

10. The coated article of claim 6, wherein the first primer layer, the second primer layer, the third primer layer, and the fourth primer layer are deposited as metal and subsequently oxidized.

11. A vehicle transparent part, comprising: a first substrate comprising a first surface and a second surface; a second substrate over at least a portion of the first substrate, the second substrate comprising a third surface and a fourth surface, wherein the second surface is arranged to face the third surface, and The second surface and the third surface are separated by an interlayer ； and A functional coating deposited over the second surface or the third surface, the functional coating comprising: a first dielectric layer over at least a portion of the second surface or the third surface, wherein the first dielectric layer comprises a total thickness of 42 nm to 47 nm, wherein the first dielectric layer is composed of a first film over at least a portion of the second surface or the third surface and a second film over at least a portion of the first film, and wherein the first film comprises zinc stannate or tin oxide; a first metal layer over at least a portion of the first dielectric layer, wherein the first metal layer has at least and at most Thickness; A first primer layer comprising titanium over at least a portion of the first metal layer, wherein the first primer layer has to Thickness; a second dielectric layer over at least a portion of the first primer layer, wherein the second dielectric layer comprises a total thickness of 78 nm to 85 nm, wherein the second dielectric layer consists of a first film over at least a portion of the first primer layer, a second film over at least a portion of the first film, and a third film over at least a portion of the second film, and wherein the second film comprises zinc stannate; a second metal layer over at least a portion of the second dielectric layer, wherein the second metal layer has at least and at most Thickness; A second primer layer comprising titanium over at least a portion of the second metal layer, wherein the second primer layer has to Thickness; a third dielectric layer over at least a portion of the second primer layer, wherein the third dielectric layer comprises a total thickness of 70 nm to 82.5 nm, wherein the third dielectric layer consists of a first film over at least a portion of the second primer layer, a second film over at least a portion of the first film, and a third film over at least a portion of the second film, and wherein the second film comprises zinc stannate; A third metal layer over at least a portion of the third dielectric layer, wherein the third metal layer has at least and at most Thickness; A third primer layer comprising titanium over at least a portion of the third metal layer, wherein the third primer layer has to Thickness; a fourth dielectric layer over at least a portion of the third primer layer, wherein the fourth dielectric layer comprises a total thickness of 55 nm to 70 nm, wherein the fourth dielectric layer consists of a first film over at least a portion of the third primer layer, a second film over at least a portion of the first film, and a third film over at least a portion of the second film, and wherein the second film comprises zinc stannate; A fourth metal layer over at least a portion of the fourth dielectric layer, wherein the fourth metal layer has at least and at most Thickness; A fourth primer layer comprising titanium over at least a portion of the fourth metal layer, wherein the fourth primer layer has to thickness; and a fifth dielectric layer over at least a portion of the fourth primer layer, wherein the fifth dielectric layer comprises a total thickness of 42.5 nm to 47.5 nm, wherein the fifth dielectric layer consists of a first film over at least a portion of the fourth primer layer and a second film over at least a portion of the first film, and wherein the second film comprises zinc stannate or tin oxide; wherein the functional coating comprises four metal layers; wherein the total combined thickness of the four metal layers is at least 40 nanometers and no more than 47 nanometers, and The vehicle transparent member has a sheet resistance of not more than 0.85Ω / □. 12 . The vehicle transparency according to claim 11 , wherein the vehicle transparency has a visible light reflectivity of not more than 20%.

13. The vehicle transparency of claim 11, wherein the at least one metal layer comprises at least one of: silver, copper, gold, aluminum, mixtures thereof, or alloys thereof.

14. The vehicle transparency according to claim 11, further comprising an outermost protective coating, Wherein the outermost protective coating comprises a total thickness of 20 nm to 120 nm.

15. The coated article of claim 11, wherein the first primer layer, the second primer layer, the third primer layer, and the fourth primer layer are deposited as metal and subsequently oxidized.

16. The coated article according to claim 3, 9 or 14, wherein the outermost protective coating comprises a first film and a second film formed over the first film, wherein the first film comprises aluminum oxide, silicon oxide, titanium oxide, zirconium oxide, tin oxide or a mixture thereof, and The second film includes titanium oxide, aluminum oxide, silicon oxide, zirconium oxide, tin oxide, a mixture thereof or an alloy thereof.

17. The coated article according to claim 1 or 6 or 11, wherein the third metal layer is thinner than the second metal layer.

Images