Display panel, preparation method thereof and display device

Abstract

The invention discloses a display panel, a preparation method thereof and a display device. The display panel comprises a hole opening area and a partition area surrounding the hole opening area. The display panel further comprises a substrate; the plurality of isolation columns are arranged on one side of the substrate and are arranged in the partition area, and each isolation column surrounds the opening area; a preset distance is formed between every two adjacent isolation columns, and at least two preset distances are not equal. According to the technical scheme, effective packaging can be achieved, and the problem that the screen loses efficacy due to water and oxygen invasion is solved.

Description

Technical Field

[0001] Embodiments of the present invention relate to the technical field of display panels, and in particular to a display panel and a manufacturing method thereof, and a display device. Background Art

[0002] With the development of display technology, active-matrix organic light-emitting diode (AMOLED) display screens are increasingly being used.

[0003] At present, mobile phones need cameras, and the camera is mostly set up by using hole-punch screen technology. However, punching holes in the display screen will affect the packaging effect. Summary of the invention

[0004] The present invention provides a display panel and a method for preparing the same, and a display device, so as to achieve effective packaging and improve the problem of screen failure due to water and oxygen intrusion.

[0005] According to one aspect of the present invention, there is provided a display panel, comprising an opening area and a partition area surrounding the opening area; the display panel further comprises:

[0006] substrate;

[0007] A plurality of isolation columns are arranged on one side of the substrate and in the partition area, each of the isolation columns surrounds the opening area; there is a preset distance between adjacent isolation columns, and at least two of the preset distances are not equal.

[0008] Optionally, the preset intervals are not equal;

[0009] Preferably, the size of each of the preset intervals gradually increases or decreases along the direction from the opening area to the partition area;

[0010] Preferably, the differences between two adjacent preset intervals are equal.

[0011] Optionally, the plurality of isolation columns include at least two isolation column groups, and the isolation column groups include at least three isolation columns;

[0012] The preset distances corresponding to the same isolation column group are all equal, and the preset distances corresponding to different isolation column groups are unequal;

[0013] Alternatively, along the direction from the opening area to the partition area, the corresponding preset spacings in the same isolation column group gradually increase or decrease, and the preset spacings corresponding to adjacent isolation column groups have opposite changing trends.

[0014] Optionally, the display panel further comprises: a first packaging column arranged around the opening area;

[0015] The first packaging column is arranged on a side of each isolation column close to the opening area;

[0016] Preferably, the height of the first encapsulation column is greater than the height of the isolation column;

[0017] Preferably, the display panel further comprises a display area, which is located on a side of the partition area away from the opening area; the display panel further comprises a second encapsulation column, which is located on a side of each of the isolation columns close to the display area;

[0018] Preferably, the height of the second encapsulation column is greater than the height of the isolation column;

[0019] Preferably, the spacing between the second encapsulation column and the adjacent isolation column is not completely equal to each of the preset spacings.

[0020] Optionally, along the thickness direction of the substrate, the isolation column includes an isolation portion and an eaves portion which are stacked; the orthographic projection of the eaves portion on the substrate covers the orthographic projection of the isolation portion on the substrate;

[0021] Preferably, at the position where the isolation portion and the eave portion meet, in the direction of the line from the opening area to the partition area, the size of the isolation portion is smaller than the size of the eave portion, so that there is a size difference between the isolation portion and the eave portion.

[0022] Optionally, the thickness of the isolation portion is greater than the thickness of the eaves portion;

[0023] Preferably, the isolation portion comprises a first surface and a second surface arranged opposite to each other in the thickness direction of the substrate, and in the direction of a line from the opening area to the partition area, a size of the second surface is smaller than a size of the first surface;

[0024] Preferably, the cross-sectional shape of the isolation portion is a regular trapezoid.

[0025] Optionally, in at least two different isolation columns, the size difference at the position where the isolation portion meets the eaves portion is not equal;

[0026] Preferably, the size difference of the isolation columns close to the opening area is greater than or equal to the size difference of the isolation columns far from the opening area.

[0027] Optionally, the display panel further comprises: an anode layer and an organic light-emitting layer stacked on one side of the substrate, the anode layer and the organic light-emitting layer being located in the partition area and the opening area;

[0028] The anode layer is used to adjust the size difference between the isolation portion and the eaves portion during the etching process;

[0029] The organic light emitting layer is disconnected at the edge of the eaves of each of the isolation columns;

[0030] Preferably, the display panel further comprises a display area, and the anode layer and the organic light-emitting layer are also located in the display area;

[0031] Preferably, the display panel further comprises a plurality of metal layers between the substrate and the anode layer, and the isolation column is located in the same layer as at least one of the metal layers.

[0032] According to another aspect of the present invention, there is provided a method for preparing a display panel, comprising:

[0033] providing a substrate;

[0034] A plurality of isolation columns are formed on a surface of one side of the substrate; wherein the display panel comprises an opening area and a partition area surrounding the opening area; the plurality of isolation columns are arranged in the partition area and surround the opening area; there is a preset spacing between adjacent isolation columns, and at least two of the preset spacings are not equal;

[0035] Preferably, the isolation column comprises an isolation portion and an eaves portion which are stacked; after forming a plurality of isolation columns on one side surface of the substrate, the method further comprises:

[0036] forming an anode layer on a surface of the substrate close to the isolation column;

[0037] Etching the anode layer of the partition area by a wet etching process to adjust the size difference between the isolation part and the eaves part;

[0038] An organic light-emitting layer is formed on a surface of the anode layer away from the substrate; wherein the organic light-emitting layer is disconnected at the edge of the eaves of each isolation column.

[0039] According to another aspect of the present invention, there is further provided a display device, comprising the display panel as described in any embodiment of the first aspect.

[0040] The display panel provided by the embodiment of the present invention is provided with an opening area and a partition area surrounding the opening area, and a plurality of isolation columns are provided in the partition area. The isolation column is used to disconnect the continuous evaporation material film layer deposited between the opening area and the pixel unit to prevent the formation of a water-oxygen transmission path, and effectively block the water and oxygen from the outside from entering the opening area and being transmitted to the pixel unit along the continuous film layer. Each isolation column is arranged in a concentric circle around the opening area, and there is an incompletely equal preset spacing between each adjacent isolation column. Such an arrangement can extend or shorten the buffer distance before the film layer covers the side of the isolation column at the corresponding isolation column position, so that the film layer has a certain coverage area and thickness on the side of the isolation column, so that when the film layer covering the side of the isolation column is etched before the subsequent deposition of the organic light-emitting material, the side of the isolation column at different positions forms a corresponding etching size, meets the design requirements of the side etching size determined according to actual needs, and ensures the etching morphology of the isolation column, which is conducive to effective packaging and improves the problem of display panel failure caused by external water and oxygen intrusion.

[0041] It should be understood that the contents described in this section are not intended to identify the key or important features of the embodiments of the present invention, nor are they intended to limit the scope of the present invention. Other features of the present invention will become easily understood through the following description. BRIEF DESCRIPTION OF THE DRAWINGS

[0042] In order to more clearly illustrate the technical solutions in the embodiments of the present invention, the following briefly introduces the drawings required for use in the description of the embodiments. Obviously, the drawings described below are only some embodiments of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without creative work.

[0043] Figure 1 is a schematic diagram of a top view structure of a display panel provided according to an embodiment of the present invention;

[0044] Figure 2 is a schematic diagram of a cross-sectional structure of a display panel along the AA' direction provided according to the relevant technology;

[0045] Figure 3 is a schematic diagram of a cross-sectional structure of a display panel along the AA' direction provided according to an embodiment of the present invention;

[0046] Figure 4 yes Figure 3 A schematic diagram of the enlarged cross-sectional structure of the dotted ellipse frame;

[0047] Figure 5 yes Figure 3 Another enlarged cross-sectional structural schematic diagram of the middle dotted ellipse frame;

[0048] Figure 6 yes Figure 3 Another enlarged cross-sectional structural schematic diagram of the middle dotted ellipse frame;

[0049] Figure 7 is a schematic cross-sectional structure diagram of another display panel provided according to an embodiment of the present invention;

[0050] Figure 8 is a schematic diagram of a cross-sectional structure of an isolation column provided according to an embodiment of the present invention;

[0051] Fig. 9 is a schematic cross-sectional structure diagram of another isolation column provided according to an embodiment of the present invention;

[0052] Fig.10 is a schematic diagram of an enlarged cross-sectional structure of a dotted frame in another display panel provided in an embodiment of the present invention;

[0053] Fig.11 is a schematic flow chart of a method for manufacturing a display panel according to an embodiment of the present invention;

[0054] Fig.12 is a schematic diagram of specific structures corresponding to each step in a method for preparing a display panel provided by an embodiment of the present invention;

[0055] Fig.13 is a schematic flow chart of another method for manufacturing a display panel provided according to an embodiment of the present invention;

[0056] Fig.14 is a schematic diagram of specific structures corresponding to each step in another method for preparing a display panel provided by an embodiment of the present invention;

[0057] Fig.15 is a schematic structural diagram of a display device provided according to an embodiment of the present invention. DETAILED DESCRIPTION

[0058] In order to enable those skilled in the art to better understand the scheme of the present invention, the technical scheme in the embodiments of the present invention will be clearly and completely described below in conjunction with the drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work should fall within the scope of protection of the present invention.

[0059] It should be noted that the terms "first", "second", etc. in the specification and claims of the present invention and the above-mentioned drawings are used to distinguish similar objects, and are not necessarily used to describe a specific order or sequence. It should be understood that the data used in this way can be interchanged where appropriate, so that the embodiments of the present invention described herein can be implemented in an order other than those illustrated or described herein. In addition, the terms "including" and "having" and any variations thereof are intended to cover non-exclusive inclusions, for example, a process, method, system, product or device that includes a series of steps or units is not necessarily limited to those steps or units that are clearly listed, but may include other steps or units that are not clearly listed or inherent to these processes, methods, products or devices.

[0060] An embodiment of the present invention provides a display panel. Figure 1 A schematic diagram of a top view of a display panel provided by an embodiment of the present invention is shown. Figure 2 is a schematic diagram of a cross-sectional structure of a display panel along the A-A' direction provided by the related art, Figure 3 FIG. 1 is a schematic diagram of a cross-sectional structure of a display panel along the AA' direction provided by an embodiment of the present invention. Figures 1 to 3 The display panel 00 includes: an opening area 01 and a partition area 02 surrounding the opening area 01; the display panel 00 also includes: a substrate 10 and a plurality of isolation columns 20; the plurality of isolation columns 20 are arranged on one side of the substrate 10 and arranged in the partition area 02, and each isolation column 20 surrounds the opening area 01; there is a preset spacing d between adjacent isolation columns 20, and at least two preset spacings d are not equal.

[0061] For example, for a display panel 00 that uses a hole-punch screen technology to set a camera, the opening area 01 is used to set a camera, and the camera can be a front camera. A partition area 02 is arranged around the opening area 01, and the partition area 02 is used to set an isolation column 20. The film layer deposited by evaporation will break at the edge of the isolation column 20, and the film layer deposition path between the opening area 01 and the pixel unit used for light emission on the display panel 00 can be disconnected, so that the display panel 00 does not have a continuous evaporation material film layer between the opening area 01 and the pixel unit, and cannot form a water and oxygen invasion path, thereby effectively blocking water and oxygen from entering the display panel 00 from the side of the opening area 01 and being transmitted to the pixel unit along the continuous film layer, effectively preventing the organic light-emitting material in the pixel unit from contacting water and oxygen and failing, and ensuring the reliability of the display panel 00.

[0062] A plurality of isolation columns 20 may be disposed in the partition area 02, and each isolation column 20 is disposed in a concentric circle from the periphery of the opening area 01 to a direction away from the opening area 01. Figure 2In the related art, multiple isolation columns 03 are arranged at equal intervals at a preset interval D. When the film layer covering the side of the isolation column 03 is etched before the organic light-emitting material is deposited, the etching size formed on the side of the isolation column 03 at different positions is quite different, which may cause some isolation columns 03 to collapse or have too small an etching size after etching, making it impossible to achieve effective packaging, and thus water and oxygen can still invade the pixel unit of the display panel and cause it to fail. See Figure 3 In the embodiment of the present invention, each isolation column 20 is arranged at intervals around the opening area 01, and the preset spacing d between two adjacent isolation columns 20 is set differently, that is, the preset spacing d between at least two adjacent isolation columns 20 is not equal. By increasing or decreasing the preset spacing d between the isolation columns 20 at a specific position, the buffer distance before the film layer covers the side of the isolation column 20 can be extended or shortened, so that the film layer has a certain coverage area and thickness on the side of the isolation column 20. In the embodiment of the present invention, by arranging a plurality of isolation columns 20 at a differentiated preset spacing d, when etching the film layer covering the side of the isolation column 20 before depositing the organic light-emitting material, the side of the isolation column 20 at different positions can have a corresponding etching size to meet the side etching size design requirements determined according to actual needs, thereby ensuring the morphology of each isolation column 20 after etching, so that the organic light-emitting material deposited by vapor deposition is disconnected at the edge of the isolation column 20, and it is conducive to achieving effective packaging, and improving the problem of external water and oxygen invading along the continuous film layer and causing the pixel unit and even the display panel 00 to fail.

[0063] The display panel provided by the embodiment of the present invention is provided with an opening area and a partition area surrounding the opening area, and a plurality of isolation columns are provided in the partition area. The isolation column is used to disconnect the continuous evaporation material film layer deposited between the opening area and the pixel unit to prevent the formation of a water-oxygen transmission path, and effectively block the water and oxygen from the outside from entering the opening area and being transmitted to the pixel unit along the continuous film layer. Each isolation column is arranged in a concentric circle around the opening area, and there is an incompletely equal preset spacing between each adjacent isolation column. Such an arrangement can extend or shorten the buffer distance before the film layer covers the side of the isolation column at the corresponding isolation column position, so that the film layer has a certain coverage area and thickness on the side of the isolation column, so that when the film layer covering the side of the isolation column is etched before the subsequent deposition of the organic light-emitting material, the side of the isolation column at different positions forms a corresponding etching size, meets the design requirements of the side etching size determined according to actual needs, and ensures the etching morphology of the isolation column, which is conducive to effective packaging and improves the problem of display panel failure caused by external water and oxygen intrusion.

[0064] Along the direction from the opening area 01 to the partition area 02 , the variation trends of the differentially designed preset spacing d between adjacent isolation columns 20 may include various ones, and the following embodiments will illustrate the possible variation trends.

[0065] Based on the above embodiments, optionally, each preset spacing is not equal.

[0066] Exemplarily, according to the actual product requirements of the display panel, the preset spacing between every two adjacent isolation pillars 20 can be set to be unequal, so as to adjust the corresponding side etching amount formed by each isolation pillar 20 to meet the packaging requirements of the product and achieve the effect of uniform side etching amount of each isolation pillar 20.

[0067] Based on the above embodiments, Figure 4 Yes Figure 3 is an enlarged cross-sectional structural schematic diagram of the dashed ellipse frame in Figure 4 As shown, preferably, the size of each preset spacing d gradually increases or gradually decreases along the direction from the opening area 01 to the partition area 02.

[0068] Exemplarily, for the case where each preset spacing d is not equal, a stepped design with a certain trend can be set for each preset spacing d in the direction from the opening area 01 to the partition area 02, that is, the size of each preset spacing d can increase or decrease in turn from the opening area 01 to the partition area 02, so as to adjust the film-forming distance between the isolation pillars 20 of the film layer deposited on the surface of the isolation pillar 20 away from the substrate 10, thereby forming a corresponding film thickness distribution between the isolation pillars 20. Among them, for the film layer thickness deposited on the side of the isolation pillar 20, the deposited film layer thickness shows a gradually decreasing trend in the direction from the bottom to the top of the side of the isolation pillar 20. In the subsequent process of simultaneously etching the film layer and the isolation pillar 20, the side etching amount formed by each isolation pillar 20 can be adjusted to meet the requirements of product packaging, and the side etching amount of each isolation pillar 20 can be made uniform within a certain range, which is beneficial to realizing effective packaging.

[0069] Exemplarily, referring to Figure 4 , Figure 4 shows that the partition area 02 includes 4 isolation pillars 20. In the direction from the opening area 01 to the partition area 02, the spacings formed between every two adjacent isolation pillars 20 are d1, d2, d3, and d4 respectively. Among them, the size of each spacing is set to show an increasing trend in the direction from the opening area 01 to the partition area 02, that is, d1 < d2 < d3 < d4. For a larger spacing, the film layer thickness deposited on the side of the isolation pillar 20 closer to the opening area 01 in this spacing is larger; for a smaller spacing, the film layer thickness deposited on the side of the isolation pillar 20 closer to the opening area 01 in this spacing is smaller. Thus, by adjusting the preset spacing between adjacent isolation pillars 20, the film layer thickness deposited on the side of each isolation pillar 20 can be regulated, and further the side etching amount formed after etching the film layer and the isolation pillar 20 can be ensured to form a stable isolation pillar 20, thereby realizing effective packaging and protecting the display panel 00 from failure due to water and oxygen intrusion.

[0070] Based on the above embodiments, preferably, the differences between two adjacent preset intervals d are equal.

[0071] For example, in the case where each preset spacing d in the direction from the opening area 01 to the partition area 02 is designed to be gradually increased or gradually decreased, the difference between two adjacent preset spacings d can be preferably set to be equal, that is, the size of each preset spacing d forms an arithmetic progression along a certain direction. In this way, the thickness of the film layer deposited on the side of the isolation column 20 can be uniformly changed, so that the thickness of the film layer on the side of the isolation column 20 is uniformly thinned or thickened along the direction from the opening area 01 to the partition area 02, so that a uniform side etching amount that meets product requirements can be formed after etching, achieving effective packaging and improving the failure of the display panel 00 due to water and oxygen intrusion.

[0072] Based on the above embodiments, Figure 5 yes Figure 3 Another enlarged cross-sectional structural diagram of the dotted ellipse frame, Figure 6 yes Figure 3 Another enlarged cross-sectional structural diagram of the dotted ellipse frame. Figure 5 and Figure 6 Optionally, the plurality of isolation columns 20 include at least two isolation column groups 200 , and the isolation column group 200 includes at least three isolation columns 20 .

[0073] The corresponding preset spacings d in the same isolation column group 200 are all equal, and the preset spacings d corresponding to different isolation column groups 200 are not equal; or, along the direction from the opening area 01 to the partition area 02, the corresponding preset spacings d in the same isolation column group 200 gradually increase or decrease, and the corresponding preset spacings d of adjacent isolation column groups 200 have opposite change trends.

[0074] In particular, for the differentiated design of each preset distance d formed by two adjacent isolation columns 20 , the plurality of isolation columns 20 may be divided into different isolation column groups 200 , and the preset distance d in each isolation column group 200 may be designed accordingly.

[0075] By way of example, the plurality of isolation columns 20 may be divided into at least two isolation column groups 200, each isolation column group 200 including at least three isolation columns 20. In the same isolation column group 200, the preset spacings d formed by adjacent isolation columns 20 may be set to be equal; and for different isolation column groups 200, the sizes of the preset spacings d corresponding to the corresponding isolation column groups 200 may be set to increase or decrease along the direction from the opening area 01 to the partition area 02. By way of example, Figure 5It shows a case where the partition area 02 includes 6 isolation posts 20. The 6 isolation posts 20 can be divided into an isolation post group 200 close to the opening area 01 and an isolation post group 200 far from the opening area 01. Among them, each isolation post group 200 includes 3 isolation posts 20. The isolation posts 20 in the two isolation post groups 200 together form 6 preset intervals, and the preset intervals are sequentially denoted as d1, d2, d3, d4, d5, and d6 in the direction from the opening area 01 to the partition area 02. The preset interval between adjacent isolation posts 20 in the isolation post group 200 close to the opening area 01 is set to d1 = d2 = d3, and the preset interval between adjacent isolation posts 20 in the isolation post group 200 far from the opening area 01 is set to d4 = d5 = d6. And it is set that the preset interval in the isolation post group 200 close to the opening area 01 is greater than or less than the preset interval in the isolation post group 200 far from the opening area 01, that is, d1 = d2 = d3 < d4 = d5 = d6, or d1 = d2 = d3 > d4 = d5 = d6. Exemplarily, Figure 5 It shows a case where the differential design is carried out according to the changing trend of each preset interval with d1 = d2 = d3 < d4 = d5 = d6.

[0076] Exemplarily, see Figure 6 , similarly, the 6 isolation posts 20 are divided into an isolation post group 200 close to the opening area 01 and an isolation post group 200 far from the opening area 01. The preset intervals are sequentially denoted as d1, d2, d3, d4, d5, and d6 in the direction from the opening area 01 to the partition area 02. For the same isolation post group 200, the preset intervals can be set with the same changing trend; for different isolation post groups 200, the preset intervals in different isolation post groups 200 can be set with opposite changing trends. For example: the preset interval between adjacent isolation posts 20 in the isolation post group 200 close to the opening area 01 can be set to d1 < d2 < d3, and the preset interval between adjacent isolation posts 20 in the isolation post group 200 far from the opening area 01 can be set to d4 > d5 > d6, that is, along the direction from the opening area 01 to the partition area 02, the size of the preset interval is set to increase first and then decrease; or the preset interval between adjacent isolation posts 20 in the isolation post group 200 close to the opening area 01 can be set to d1 > d2 > d3, and the preset interval between adjacent isolation posts 20 in the isolation post group 200 far from the opening area 01 can be set to d4 < d5 < d6, that is, along the direction from the opening area 01 to the partition area 02, the size of the preset interval decreases first and then increases. Among them, the preset interval d3 can be greater than the preset interval d4 or less than the preset interval d4, and no limit is made here. Exemplarily, Figure 6 shows that each preset interval is d1 < d2 <d3>The changing trend of d4>d5>d6 leads to differentiated design.

[0077] Such a configuration can realize a differentiated design of the preset spacing between adjacent isolation columns 20 in the partition area 02 , so as to adjust the side etching amount to meet the actual needs of the product, realize effective packaging, and thus ensure the reliability of the display panel 00 .

[0078] Based on the above embodiments, Figure 7 FIG. 1 is a schematic cross-sectional view of another display panel provided by an embodiment of the present invention. Figure 7 As shown, optionally, the display panel 00 further includes: a first packaging column 30 arranged around the opening area 01 .

[0079] The first packaging column 30 is disposed on one side of each isolation column 20 close to the opening area 01 .

[0080] Exemplarily, the first encapsulation column 30 is disposed between the partition area 02 and the opening area 01, and is disposed around the opening area 01. The first encapsulation column 30 is the encapsulation edge of the encapsulation film layer in the opening area 01, and the opening area 01 is exposed to the outside during encapsulation. The first encapsulation column 30 can be used to encapsulate the edge of the punching position of the display panel 00 to avoid exposing the film layer after the opening is made on the display panel 00, thereby effectively blocking the invasion path of external water and oxygen.

[0081] Based on the above embodiments, continue to refer to Figure 7 Preferably, the height of the first encapsulation column 30 is greater than the height of the isolation column 20 .

[0082] For example, in order to improve the barrier effect of the first encapsulation column 30 against external water and oxygen, the first encapsulation column 30 with a height greater than the height of the isolation column 20 is set at the position surrounding the opening area 01, which effectively increases the path length of water and oxygen transmission and increases the difficulty of water and oxygen transmission. In addition, the cross-sectional shape of the first encapsulation column 30 can be set to a regular trapezoid, and the deposited encapsulation film layer can evenly cover the surface of the first encapsulation column 30, thereby achieving effective and tight encapsulation of the display panel 00 to block the invasion of external water and oxygen, and improve the problem of failure of the display panel 00 due to water and oxygen invasion.

[0083] Based on the above embodiments, continue to refer to Figure 7 Preferably, the display panel 00 further includes a display area 04 , which is located on a side of the partition area 02 away from the hole area 01 ; the display panel 00 further includes a second encapsulation column 31 , which is located on a side of each isolation column 20 close to the display area 04 .

[0084] Exemplarily, the side of the partition area 02 away from the aperture area 01 is the display area 04, and the display area 04 includes a plurality of film layers stacked, for example, a flat layer, a pixel definition layer, and an encapsulation layer, etc., which are not limited here. The display area 04 is provided with a plurality of pixel units, and the organic light-emitting material in the pixel unit can be self-luminous to achieve corresponding display. A second encapsulation column 31 is provided on the side of the partition area 02 close to the display area 04, that is, the second encapsulation column 31 is arranged around the partition area 02. The second encapsulation column 31 is used to separate the display area 04 from the partition area 02. The second encapsulation column 31 serves as the last barrier to block water and oxygen. For the position of the second encapsulation column 31 that is transmitted through the first encapsulation column 30 and the plurality of isolation columns 20, the second encapsulation column 31 blocks the invading water and oxygen again to protect the display panel 00 from the intrusion of water and oxygen.

[0085] Based on the above embodiments, continue to refer to Figure 7 Preferably, the height of the second encapsulation column 31 is greater than the height of the isolation column 20 .

[0086] Exemplarily, in order to improve the barrier effect of the second encapsulation column 31 on water and oxygen, the height of the second encapsulation column 31 is set to be greater than the height of the isolation column 20, so as to improve the failure problem of the display panel 00 due to the intrusion of water and oxygen. The height of the second encapsulation column 31 can be greater than the height of the first encapsulation column 30, or can be equal to the height of the first encapsulation column 30, or can be less than the height of the first encapsulation column 30, which is not limited here.

[0087] Based on the above embodiments, continue to refer to Figure 7 Preferably, the distance between the second encapsulation column 31 and the adjacent isolation column 20 is not completely equal to the preset distance d.

[0088] Exemplarily, the spacing between the second encapsulation column 31 and the adjacent isolation column 20 is also used as one of the preset spacings for differential design, which has a certain influence on the side etching amount of the isolation column 20 farthest from the opening area 01. Therefore, the size of the preset spacing between the second encapsulation column 31 and the adjacent isolation column 20 is set to be not completely equal to the size of other preset spacings with a certain change trend, that is, in the same isolation column group 200, the preset spacing between the second encapsulation column 31 and the adjacent isolation column 20 can be equal to other preset spacings; or, it can also be unequal to other preset spacings, so that the side etching amount of each isolation column 20 can be adjusted in the subsequent etching process to meet the actual needs of the product and realize effective packaging. As for the spacing between the first encapsulation column 30 and the adjacent isolation column 20, since it has little influence on the side etching amount of the isolation column 20, the size of the spacing between the first encapsulation column 30 and the adjacent isolation column 20 is not limited.

[0089] Based on the above embodiments, Figure 8 FIG. 1 is a schematic diagram of a cross-sectional structure of an isolation column provided by an embodiment of the present invention. Figure 8 As shown, optionally, along the thickness direction of the substrate 10 , the isolation column 20 includes an isolation portion 21 and an eaves portion 22 which are stacked; the orthographic projection of the eaves portion 22 on the substrate 10 covers the orthographic projection of the isolation portion 21 on the substrate 10 .

[0090] Exemplarily, the isolation column 20 is cut along the thickness direction of the substrate 10, and the isolation column 20 includes an isolation portion 21 and an eaves portion 22 stacked on the surface of the substrate 10. Among them, the area of ​​the eaves portion 22 is larger than the area of ​​the isolation portion 21. When deposited, the film layer deposited by evaporation transitions from the side of the isolation portion 21 with a smaller area to the surface of the eaves portion 22 with a larger area. It is easy to break at the connection position between the isolation portion 21 and the eaves portion 22, and a continuous film layer cannot be formed, thereby forming a continuous path for water and oxygen invasion, which can effectively prevent water and oxygen from being transmitted to the pixel unit of the display panel 00.

[0091] It should be noted that, in the isolation column 20, a bottom layer 23 may also be provided on the side of the isolation portion 21 away from the eaves portion 22, and the thickness of the bottom layer 23 and the orthographic projection on the substrate 10 are the same as the thickness of the eaves portion 22 and the orthographic projection on the substrate 10. Figure 8 That is, it shows that the isolation column 20 includes a three-layer structure. For example, the material of the eaves 22 and the bottom layer 23 can be titanium metal, and the material of the isolation part 21 can be aluminum metal, which is not limited here.

[0092] Based on the above embodiments, continue to refer to Figure 8 Preferably, at the position where the isolation portion 21 and the eaves portion 22 meet, in the direction of the line from the opening area 01 to the partition area 02, the size of the isolation portion 21 is smaller than the size of the eaves portion 22, so that there is a size difference between the isolation portion 21 and the eaves portion 22.

[0093] Exemplarily, at the junction of the eaves 22 and the isolation part 21, in the direction of the line from the opening area 01 to the partition area 02, the edge of the eaves 22 exceeds the edge of the isolation part 21 by a certain dimension on at least one side of the isolation part 21, that is, the eaves 22 will form an eaves-like structure on at least one side of the isolation part 21, thereby forming a suspended area between the exceeding part of the eaves 22 and the isolation part 21. By setting the isolation column 20 to such a structure, the film layer deposited by vapor deposition on the surface of the isolation column 20 can be broken at the edge of the eaves 22, disconnecting the transmission path of the invading water and oxygen, and protecting the display panel 00 from being affected by water and oxygen and failing.

[0094] Based on the above embodiments, continue to refer to Figure 8 Optionally, the thickness of the isolation portion 21 is greater than the thickness of the eaves portion 22 .

[0095] The isolation portion 21 includes a first surface 211 and a second surface 212 that are oppositely disposed in the thickness direction of the substrate 10 . In the connection direction from the opening area 01 to the partition area 02 , the size of the second surface 212 is smaller than that of the first surface 211 .

[0096] Exemplarily, the thickness of the isolation part 21 is set to be greater than the thickness of the eaves 22, so that the height of the eaves 22 from the surface of the substrate 10 can be greater, and the first surface 211 and the second surface 212 arranged opposite to each other in the isolation part 21 are smaller in size than the first surface 211 in the direction of the line from the opening area 01 to the partition area 02, so that the two sides of the isolation part 21 form oblique upward side surfaces. In this way, when the thickness of the isolation part 21 is greater than the thickness of the eaves 22, the part of the eaves 22 that exceeds the isolation part 21 and the isolation part 21 form a larger suspended area at the connection position, so that the film layer deposited by vapor deposition on the surface of the isolation column 20 is easy to break at the connection position between the eaves 22 and the isolation part 21, thereby achieving no light emission at the partition area 02 and effectively blocking the transmission path of water and oxygen.

[0097] Based on the above embodiments, continue to refer to Figure 8 Preferably, the cross-sectional shape of the isolation portion 21 is a regular trapezoid.

[0098] Exemplarily, the cross-sectional shape of the isolation portion 21 may include any trapezoid having two obliquely upward sides. In order to simplify the difficulty of the manufacturing process of the isolation column 20, the cross-sectional shape of the isolation portion 21 is set to a regular trapezoid, while also ensuring the uniformity of the side etching amount formed by the isolation column 20, forming a stable isolation column 20, thereby achieving effective packaging.

[0099] Based on the above embodiments, Fig. 9 FIG. 1 is a schematic cross-sectional structure diagram of another isolation column provided by an embodiment of the present invention. Fig. 9 As shown, optionally, in at least two different isolation columns 20 , the size difference at the position where the isolation portion 21 and the eaves portion 22 meet is not equal.

[0100] Exemplarily, in order to meet the actual needs of the product, the isolation columns 20 at different positions need to be adjusted to have different side etching amounts. The side etching amount is the size difference at the junction of the isolation portion 21 and the eaves 22. In the process of preparing a plurality of isolation columns 20, the size difference at the junction of the isolation portion 21 and the eaves 22 in the isolation columns 20 initially prepared is the same. However, for the actual needs of different products, it is often required that the size difference at the junction of the isolation portion 21 and the eaves 22 in at least two isolation columns 20 at different positions is different. Therefore, by depositing a film layer on the surface of the isolation column 20 and performing acid etching, the size difference at the junction of the isolation portion 21 and the eaves 22 in the isolation column 20 can be adjusted to be not completely the same, so as to meet the actual needs of the product and form a strong isolation column 20, which is conducive to effective packaging.

[0101] Based on the above embodiments, continue to refer to Fig. 9 Preferably, the size difference of the isolation column 20 close to the opening area 01 is greater than or equal to the size difference of the isolation column 20 far from the opening area 01.

[0102] For example, Fig. 9 The side etching amount of the isolation column 20 located on the left side is smaller than the side etching amount of the isolation column 20 located on the right side.

[0103] Based on the above embodiments, Fig.10 FIG. 1 is a schematic diagram of an enlarged cross-sectional structure of a dotted frame in another display panel provided by an embodiment of the present invention. Fig.10 As shown, optionally, the display panel 00 further includes: an anode layer 40 and an organic light-emitting layer 50 stacked on one side of the substrate 10 , and the anode layer 40 and the organic light-emitting layer 50 are located in the partition area 02 .

[0104] The anode layer 40 is used to adjust the size difference between the isolation portion 21 and the eaves portion 22 during the etching process; the organic light-emitting layer 50 is disconnected at the edge of the eaves portion 22 of each isolation column 20 .

[0105] Exemplarily, the anode layer 40 is deposited on the surface of one side of the substrate 10 by evaporation, and the anode layer 40 covers the surface of each isolation column 20 in the isolation area 02. The material of the anode layer 40 may include indium tin oxide, silver and indium tin oxide deposited in layers, which is not limited here. After the anode layer 40 is deposited, wet etching is performed to etch the anode layer 40 and the isolation portion 21 on the side of the isolation column 20 at the same time. Due to the differentiated design of the preset spacing between adjacent isolation columns 20, the side etching amount of each isolation column 20 can be controlled during the etching process, so that each isolation column 20 forms a side etching amount that meets actual needs.

[0106] After etching is completed to form a corresponding side etching amount, no anode layer 40 remains on the side of the isolation column 20, while the anode layer 40 still exists on other surfaces. An organic light-emitting material is evaporated and deposited on the surface of the anode layer 40 to form an organic light-emitting layer 50. The organic light-emitting layer 50 covers the partition area 02, but the organic light-emitting layer 50 is broken at the edge of the eaves 22 of each isolation column 20 to form a discontinuous film layer, thereby effectively blocking the transmission of external water and oxygen, and ensuring the reliability of the display panel 00.

[0107] Based on the above embodiments, continue to refer to Fig.10 Preferably, the display panel 00 further includes a display area 04 , and the anode layer 40 and the organic light-emitting layer 50 are also located in the display area 04 .

[0108] Exemplarily, the anode layer 40 and the organic light-emitting layer 50 extend to the display area 04 , and the voltage signal difference between the anode layer 40 and the cathode is used to control the organic light-emitting layer 50 at the corresponding position to emit light or turn off, thereby realizing the corresponding pixel unit to emit light or turn off.

[0109] On the basis of the above embodiments, preferably, the display panel 00 further includes a plurality of metal layers between the substrate 10 and the anode layer 40 , and the isolation column 20 is located in the same layer as at least one metal layer.

[0110] Exemplarily, a plurality of metal layers are provided between the substrate 10 and the anode layer 40, such as a gate metal layer, a source and drain metal layer, etc. In the process of preparing the isolation column 20, the isolation column 20 is prepared at the same layer as the source and drain metal layers to simplify the preparation process and improve the preparation efficiency.

[0111] The embodiment of the present invention also provides a method for preparing a display panel. Fig.11 is a schematic flow chart of a method for manufacturing a display panel provided by an embodiment of the present invention, Fig.12 1 is a schematic diagram of specific structures corresponding to each step in a method for manufacturing a display panel provided by an embodiment of the present invention. Fig.11 and Fig.12 , the display panel preparation method includes:

[0112] S110 , providing a substrate 10 .

[0113] S120, forming a plurality of isolation columns 20 on one side surface of the substrate 10; wherein the display panel 00 includes an opening area 01 and a partition area 02 surrounding the opening area 01; the plurality of isolation columns 20 are arranged in the partition area 02 and surround the opening area 01; there is a preset spacing d between adjacent isolation columns 20, and at least two preset spacings are not equal.

[0114] For example, in the partition area surrounding the opening area, multiple isolation columns are arranged at intervals, and adjacent isolation columns are arranged with preset spacings that are not completely equal, and the buffer distance before the deposited film layer covers the side of the isolation column is extended or shortened, so that the side of different isolation columns has a corresponding film layer coverage area. In the process of etching after the film layer is deposited on the surface of the isolation column, the etching size of the side of the isolation column can be adjusted to meet the actual requirements of the product for the etching size of the side, forming a stable isolation column structure, which is conducive to achieving effective packaging and protecting the display panel from being affected by external water and oxygen and failing.

[0115] The display panel preparation method provided by the embodiment of the present invention sets a plurality of isolation columns in the partition area surrounding the opening area on one side of the substrate, and adjacent isolation columns have a preset spacing that is not completely equal, and adjusts the buffer distance before the film layer covers the side of the isolation column, so as to form a corresponding film layer coverage area and thickness on the side of each isolation column, so as to form a corresponding etching size on the side of different isolation columns, meet the actual requirements of the product for the etching size of the side, form a stable isolation column structure, thereby facilitating effective packaging and improving the problem of display panel failure caused by external water and oxygen intrusion.

[0116] Based on the above embodiments, Fig.13 is a schematic flow chart of another method for manufacturing a display panel provided by an embodiment of the present invention. Fig.14 1 is a schematic diagram of specific structures corresponding to each step in another method for manufacturing a display panel provided by an embodiment of the present invention. Fig.13 and Fig.14 Preferably, the isolation column 20 includes an isolation portion 21 and an eaves portion 22 which are stacked; after a plurality of isolation columns are formed on one side surface of the substrate, the method further includes:

[0117] S130 , forming an anode layer 40 on a surface of the substrate 10 close to the isolation column 20 .

[0118] For example, indium tin oxide, silver and indium tin oxide are respectively used to sequentially evaporate on the substrate surface to obtain corresponding film layers, thereby forming an anode layer including a stacked arrangement of indium tin oxide / silver / indium tin oxide. And due to the differentiated design of the preset spacing between adjacent isolation columns, the anode layer has different deposition thickness and area on the side of the isolation column.

[0119] S140 , etching the anode layer 40 of the partition area 02 by a wet etching process to adjust the size difference between the isolation portion 21 and the eaves portion 22 .

[0120] Illustratively, through a wet etching process, the anode layer deposited on the surface of the isolation column and the side of the isolation column are acidically etched simultaneously to form unequal size differences between the isolation portion and the eaves portion on the side of each isolation portion, thereby ensuring that each isolation column forms a stable structure, which is conducive to effective packaging.

[0121] S150 , forming an organic light-emitting layer 50 on a surface of the anode layer 40 away from the substrate 10 ; wherein the organic light-emitting layer 50 is disconnected at the edge of the eaves 22 of each isolation column 20 .

[0122] For example, an organic light-emitting material is deposited on the surface of the anode layer by evaporation to form an organic light-emitting layer. The organic light-emitting layer will be broken at the edge of the eaves of each isolation column, thereby forming a discontinuous film layer, which is conducive to blocking the transmission of external water and oxygen to the display area of ​​the display panel, protecting the display panel from being affected by water and oxygen and causing failure.

[0123] An embodiment of the present invention further provides a display device. Fig.15 Schematic diagram of a display device provided by an embodiment of the present invention. Fig.15 As shown, the display device includes the display panel described in any of the above embodiments, and the display panel can be a mobile phone panel, a tablet panel, etc. Exemplarily, the display panel is an organic light-emitting semiconductor (OLED) display panel. The display device has the same beneficial effects as the display panel described in any of the above embodiments. Specifically, by setting a plurality of isolation columns in the partition area surrounding the opening area on one side of the substrate, and having an incompletely equal preset spacing between adjacent isolation columns, the preset spacing between adjacent isolation columns is differentiated, and the coverage area and thickness of the film layer formed on the side of each isolation column are adjusted. In the subsequent etching process, different side etching sizes can be formed to meet the actual needs of the product, thereby facilitating effective packaging and improving the problem of display panel failure caused by external water and oxygen intrusion.

[0124] The above specific implementations do not constitute a limitation on the protection scope of the present invention. It should be understood by those skilled in the art that various modifications, combinations, sub-combinations and substitutions can be made according to design requirements and other factors. Any modification, equivalent substitution and improvement made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

Claims

1. A display panel, characterized in that: The display panel comprises an opening area and a partition area surrounding the opening area; the display panel further comprises: substrate; A plurality of isolation columns are arranged on one side of the substrate and in the partition area, each of the isolation columns surrounds the opening area; there is a preset distance between adjacent isolation columns, and at least two of the preset distances are not equal.

2. The display panel according to claim 1, characterized in that: The preset spacings are not equal; Preferably, the size of each of the preset intervals gradually increases or decreases along the direction from the opening area to the partition area; Preferably, the differences between two adjacent preset intervals are equal.

3. The display panel according to claim 1, characterized in that: The plurality of isolation columns include at least two isolation column groups, and the isolation column groups include at least three isolation columns; The preset distances corresponding to the same isolation column group are all equal, and the preset distances corresponding to different isolation column groups are unequal; Alternatively, along the direction from the opening area to the partition area, the corresponding preset spacings in the same isolation column group gradually increase or decrease, and the preset spacings corresponding to adjacent isolation column groups have opposite changing trends.

4. The display panel according to claim 1, characterized in that: Also includes: A first packaging column arranged around the opening area; The first packaging column is arranged on a side of each isolation column close to the opening area; Preferably, the height of the first encapsulation column is greater than the height of the isolation column; Preferably, the display panel further comprises a display area, which is located on a side of the partition area away from the opening area; the display panel further comprises a second encapsulation column, which is located on a side of each of the isolation columns close to the display area; Preferably, the height of the second encapsulation column is greater than the height of the isolation column; Preferably, the spacing between the second encapsulation column and the adjacent isolation column is not completely equal to each of the preset spacings.

5. The display panel according to claim 1, characterized in that: Along the thickness direction of the substrate, the isolation column includes an isolation portion and an eaves portion which are stacked; the orthographic projection of the eaves portion on the substrate covers the orthographic projection of the isolation portion on the substrate; Preferably, at the position where the isolation portion and the eave portion meet, in the direction of the line from the opening area to the partition area, the size of the isolation portion is smaller than the size of the eave portion, so that there is a size difference between the isolation portion and the eave portion.

6. The display panel according to claim 5, characterized in that: The thickness of the isolation portion is greater than the thickness of the eaves portion; Preferably, the isolation portion comprises a first surface and a second surface arranged opposite to each other in the thickness direction of the substrate, and in the direction of a line from the opening area to the partition area, a size of the second surface is smaller than a size of the first surface; Preferably, the cross-sectional shape of the isolation portion is a regular trapezoid.

7. The display panel according to claim 5, characterized in that: In at least two different isolation columns, the size difference at the position where the isolation portion meets the eaves portion is not equal; Preferably, the size difference of the isolation columns close to the opening area is greater than or equal to the size difference of the isolation columns far from the opening area.

8. The display panel according to claim 5, characterized in that: Also includes: An anode layer and an organic light-emitting layer are stacked on one side of the substrate, and the anode layer and the organic light-emitting layer are located in the partition area; The anode layer is used to adjust the size difference between the isolation portion and the eaves portion during the etching process; The organic light emitting layer is disconnected at the edge of the eaves of each of the isolation columns; Preferably, the display panel further comprises a display area, and the anode layer and the organic light-emitting layer are also located in the display area; Preferably, the display panel further comprises a plurality of metal layers between the substrate and the anode layer, and the isolation column is located in the same layer as at least one of the metal layers.

9. A method for preparing a display panel, characterized in that: include: providing a substrate; A plurality of isolation columns are formed on a surface of one side of the substrate; wherein the display panel comprises an opening area and a partition area surrounding the opening area; the plurality of isolation columns are arranged in the partition area and surround the opening area; there is a preset spacing between adjacent isolation columns, and at least two of the preset spacings are not equal; Preferably, the isolation column comprises an isolation portion and an eaves portion which are stacked; after forming a plurality of isolation columns on one side surface of the substrate, the method further comprises: forming an anode layer on a surface of the substrate close to the isolation column; Etching the anode layer of the partition area by a wet etching process to adjust the size difference between the isolation part and the eaves part; An organic light-emitting layer is formed on a surface of the anode layer away from the substrate; wherein the organic light-emitting layer is disconnected at the edge of the eaves of each isolation column.

10. A display device, characterized in that: Comprising the display panel as described in any one of claims 1-8.

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