Vacuum coating device, control device and method for influencing the rate in which coating material is ejected

Abstract

According to various embodiments, a method may include determining a data variable representative of an actual state of a rate at which a coating material is ejected based on: a first response of a sensor (112) prior to exposure of the sensor to the coating material and preferably thereby heating, and a second response of the sensor (112) after the sensor (112) has been exposed to the coating material and preferably cooled; and controlling a control element configured to influence the rate based on the data variable.

Description

Technical Field

[0001] Various embodiments relate to a vacuum coating arrangement, a control device and a method for influencing the rate at which coating material is ejected. Background Art

[0002] Typically, one or more substrates can be coated using a vacuum coating arrangement. Coating can be performed, for example, in a vacuum chamber, for example, by chemical vapor deposition or by physical vapor deposition. Coating rate, i.e., the rate at which one or more substrates are coated with a coating material, depends on the rate (also referred to as ejection rate) of the coating material ejected (from a coating device). Therefore, the coating rate can be a function of the ejection rate. The ejection rate can depend on various disturbance variables in the vacuum chamber so that the ejection rate can vary over time. Therefore, it may be necessary to offset the system state changes caused by this disturbance. In order to achieve this, it may be necessary to determine or capture the current actual state (in-situ) of the rate.

[0003] To determine the actual state of the rate (in situ), a sensor such as an oscillating quartz (e.g., in combination with an associated oscillator) can be used, which is exposed to the ejected coating material. For example, the resonant frequency of the quartz oscillator varies depending on the mass of coating material applied to the sensor. In this way, the magnitude of the frequency change per unit time can be used to infer the mass change per unit time, and this mass change per unit time is a measure of the rate at which the coating material is ejected.

[0004] According to various embodiments, it has been recognized that sensors (e.g., vibrating quartz exposed to a coating material) generally have a limited lifespan due to the coating of the coating material. If the mass of the coating material coating the sensor (e.g., vibrating quartz) reaches a sensor-specific threshold, the functionality of the sensor may be impaired or even no longer function.

[0005] However, depending on the service life of the sensor, costs are not only incurred for the new sensor. The service life of the sensor also limits the efficiency of the vacuum coating system, since replacing the sensor at the end of its service life requires interrupting the coating process and / or opening the vacuum chamber. For example, this limits the service life (duration of uninterrupted production, also called campaign) of the vacuum coating system.

[0006] This loss or limitation of service life is explained in this article by using an easily understood oscillating quartz crystal as an example of an exemplary rate sensor, whereby what is described here can be applied to any other sensor exposed to a coating material (e.g., during a measurement process), such as a sensor coated by the coating material. For example, if a specific (e.g., average) rate at which the sensor is coated (e.g., average mass change per unit time) is assumed for the coating process, the life of the sensor can be represented by a cumulative measurement time (or operating time). The cumulative measurement duration can indicate the cumulative (maximum) total operating time during which the sensor is able to capture measurement data before its destruction causes it to no longer meet the requirements (thus reaching the end of its service life). Given a predefined time period for each individual measurement, this (maximum) total operating time will result in a (maximum) number of individual measurements. Depending on the time intervals at which the individual measurements are performed, this may result in a (maximum) service life of the vacuum coating system.

[0007] Typically a single measurement is performed when the sensor is coated with the coating material. However, the response from the sensor can be a function not only of the mass change, but also of the temperature of the sensor. Therefore, in a single measurement, it may be necessary to wait for a predefined amount of time for the sensor to reach thermal equilibrium (e.g., constant temperature) before using the response from the sensor to determine the rate. For example, in a vacuum coating arrangement using a relatively high coating rate (e.g., for coating an organic substrate), this may have a significant impact. Taking an oscillating quartz crystal as an example, the predefined time period may be about 2 minutes. Therefore, the predefined duration results in a minimum measurement duration for each individual measurement. Summary of the invention

[0008] Various embodiments relate to a vacuum coating arrangement, a control device and a method, which enable the actual state of the coating process (e.g., the rate at which the coating material is ejected, also referred to as the ejection rate) to be determined by a sensor (in situ), thereby significantly increasing the service life of the vacuum coating arrangement. This is achieved by reducing the time required for a single measurement and / or the time required for the sensor to be exposed to the coating material. Illustratively, the measurement process no longer (necessarily) occurs when the sensor is coated with the coating material, but rather before and after the coating, thereby evaluating a first response from the sensor before the sensor is coated (and thus heated), and evaluating a second response from the sensor after the sensor has been coated. This means that it is no longer (necessarily) necessary to wait for a predefined time period until thermal equilibrium is reached to minimize the effect of temperature on the measurement process. Therefore, the duration of each individual measurement can be reduced by at least the predefined duration. Therefore, this results in a significant extension of the service life of the vacuum coating arrangement.

[0009] To illustrate this, a quartz oscillator can be considered as a sensor in a vacuum coating arrangement, in which the coating material is ejected at a relatively high rate. For example, if it is assumed that the (maximum) total measurement duration of the oscillating quartz is about 1 hour, a predefined duration of only about 2 minutes leads to a maximum number of 30 individual measurements. If each individual measurement is performed at intervals of 10 minutes, this leads to a (maximum) service life of the vacuum coating arrangement of 5 hours. According to the invention, since there is no need to wait for a predefined time period, the duration of coating of the oscillating quartz can be 1 second (or shorter). With the same total measurement duration of 1 hour, this leads to a maximum number of 3600 individual measurements and a (maximum) service life of the vacuum coating arrangement of 25 days (instead of 5 hours) at time intervals of 10 minutes. Taking into account phases at which the oscillating quartz is coated at a lower rate (e.g. phases in which the shutter is open and / or phases in which the shutter is closed), this service life is even longer (e.g. see Figure 3 ).

[0010] As noted above, the description herein of a quartz oscillator as an exemplary rate sensor may similarly apply to any other type of sensor (eg, rate sensor) that is exposed to a coating material (eg, during measurement), such as by being coated therewith.

[0011] Various examples related to what is described herein and illustrated in the accompanying drawings are described below.

[0012] Example 1 is a method comprising: determining a data variable representing the actual state of the rate at which a coating material is ejected (also referred to as the injection rate), or (more generally) the coating process performed by the coating material (e.g., its operating parameters), based on: a first response of the sensor before the sensor is exposed to the coating material and preferably is heated thereby (e.g., by the coating material and / or by thermal radiation), and a second response of the sensor after the sensor has been exposed to the coating material and preferably is cooled thereby (e.g.,); and controlling a control element configured to influence the rate, or at least the coating process (e.g., the actual state, e.g., operating parameters), based on the data variable.

[0013] Example 1a is a method comprising: determining a data variable that represents (e.g., as information) an actual state of a process (e.g., a coating process) performed, for example, by a coating material based on: a first response of a sensor before the sensor is exposed to the process (e.g., the process of coating the material) and preferably is heated thereby, and a second response of the sensor after the sensor has been exposed to the process (e.g., the process of coating the material) and preferably is cooled; and controlling a control element that is configured to influence the process (e.g., the coating process) based on the data variable.

[0014] Example 2 is a method comprising: determining an indication representing an actual state of a rate at which coating material is ejected during a coating process based on: a first response of a sensor before the sensor is exposed to the coating material and preferably heated thereby, and a second response of the sensor after the sensor has been exposed to the coating material and preferably cooled; and controlling a control element configured to affect the coating process (e.g., rate) based on the indication.

[0015] According to one configuration example 3 of examples 1 to 2, the determination of the data variable is further based on a duration (eg, consecutive time intervals) of exposure of the sensor (eg, between the first response and the second response) to the coating material.

[0016] Configuration Example 4 according to any one of Examples 1 to 3, wherein the first response of the sensor occurs before the sensor is heated (eg, by a coating material).

[0017] Configuration Example 5 according to any one of Examples 1 to 4, wherein the second response of the sensor occurs when the sensor is cooled or after the sensor has cooled.

[0018] Example 6 is a configuration according to any one of Examples 1 to 5, wherein the sensor is not exposed to the coating material during the first response and / or the second response.

[0019] Example 7 is configured according to any one of Examples 1 to 6, wherein the first response and / or the second response of the sensor is a function of the temperature of the sensor; and / or wherein, when the sensor is exposed to the coating material, the time period (e.g., the continuous time interval) during which the sensor is exposed to the coating material ends before the sensor reaches thermal equilibrium. For example, the time period may end when the temperature of the sensor (e.g., its quartz crystal) changes (e.g., increases) (e.g., due to thermal energy provided to the sensor by the coating material).

[0020] Configuration Example 8 according to any one of Examples 1 to 7, wherein the duration of exposure of the sensor to the coating material (eg, the) is less than or equal to 60 seconds, preferably less than or equal to 10 seconds, further preferably less than or equal to 500 milliseconds.

[0021] Configuration Example 9 according to any one of Examples 1 to 8, wherein the sensor includes a quartz crystal exposed to (preferably coated by) a coating material.

[0022] Configuration Example 10 according to any one of Examples 1 to 9, wherein when the sensor is exposed to the coating material, the sensor is coated by the coating material.

[0023] Example 11 is configured according to any one of Examples 1 to 10, wherein the first response and the second response are a function of a parameter (e.g., a resonant frequency) of a sensor (e.g., a quartz crystal) that changes when the sensor is exposed to a coating material, wherein the parameter is optionally further dependent on a temperature of the sensor.

[0024] Configuration Example 12 according to any one of Examples 1 to 11 further includes: preferably capturing a first response of the sensor at a time before a duration (e.g., a continuous time interval) begins; and / or preferably capturing a second response of the sensor at a time after the duration (e.g., a continuous time interval) ends.

[0025] Configuration Example 13 according to any one of Examples 1 to 12 also includes: controlling a control element, which is configured to affect the (e.g., described) duration of exposure of the sensor to the coating material (between the first response and the second response) and / or the amount of coating material (also referred to as the amount of material) to which the sensor is exposed between the first response and the second response, for example, based on a data variable representing a target state of duration and / or amount, such as a mass flow rate of the coating material.

[0026] Example 14 is configured according to Example 13, wherein the indication is further determined based on one or more additional data variables (for example, including the time dependence of the mass flow rate, the average value of the mass flow rate and / or the switching time, etc.) over at least a portion of the duration, and during at least a portion of the duration, the mass flow rate (the amount of material per time period) of the coating material to which the sensor is exposed is related to time.

[0027] Example 15 is configured according to Example 14, wherein the at least a portion includes or is at least a function of a switching time of the baffle; and / or, wherein the mass flow rate is a function of a position of the baffle relative to the sensor.

[0028] Example 16 is configured according to Example 15, wherein at least a portion includes a first portion and a second portion, the first portion includes a switching time for opening the baffle or is at least a function thereof, and the second portion includes a switching time for closing the baffle or is at least a function thereof; and / or, wherein at least a portion (e.g., the first portion and / or the second portion) is a function of a speed at which the baffle moves (e.g., rotates).

[0029] Example 17 is configured according to Example 15 or Example 16, wherein a switching time of the baffle is less than or equal to one third of a time interval from a first response to a second response and / or one third of a duration.

[0030] According to one configuration example 18 of examples 13 to 17, the control of the control element is performed according to a (eg stored) target duration (eg target switching time).

[0031] According to a configuration example 19 among examples 1 to 18, if combined with example 3 and / or example 13, it also includes: capturing the duration of exposure of the sensor to the coating material, preferably the switching duration of the baffle (i.e., the switching time) and / or preferably through one or more additional sensors.

[0032] Configuration Example 20 according to any one of Examples 1 to 19, wherein, when further determining the data variable, the time dependence of the mass flow rate of the coating material to which the sensor is exposed is taken into account; preferably, the time dependence is considered as an average value (e.g., mean) of the time dependence of the mass flow rate.

[0033] Configuration Example 21 according to any one of Examples 1 to 20, if combined with Example 3 and / or Example 13, wherein the time period includes: a first stage and a second stage, in which the sensor moves into the ejected coating material (for example, linearly, by rotation, etc.), or in the first stage, (for example, the) baffle moves from a first state in which the sensor is not exposed to the coating material to a second state in which the sensor is exposed to the coating material; in the second stage, the sensor moves out of the ejected coating material, or in the second stage, the baffle is moved from the second state to the first state.

[0034] Example 22 is configured according to Example 21, wherein the data variable is further determined based on a duration of the first phase and / or a duration of the second phase.

[0035] Configuration Example 23 according to any one of Examples 1 to 22, wherein the sensor is not exposed to the coating material for a time interval before the second response (eg, after the time interval).

[0036] Example 25 is a computer program which, when executed by a processor, is configured to cause the processor to perform a method according to any one of Examples 1 to 23.

[0037] Example 25 is a computer-readable medium having stored instructions, which are configured to, when executed by a processor, cause the processor to perform a method according to any one of Examples 1 to 23.

[0038] Example 26 is a control device comprising one or more processors configured to perform the method according to any one of Examples 1 to 23.

[0039] Example 27 is a vacuum coating arrangement comprising: a control device according to Example 26; a coating arrangement for ejecting a coating material; a control element for controlling the coating device; and a sensor.

[0040] Example 28 is configured according to Example 27, wherein the coating device is configured to perform a chemical vapor deposition process and / or a physical vapor deposition process.

[0041] In Example 29, the vacuum coating arrangement according to Example 27 or Example 28 optionally further includes: a baffle configured to expose or not expose the sensor to the coating material, depending on the state of the baffle when the coating material is ejected by the coating device; and a drive device for adjusting the state of the baffle.

[0042] In Example 30, the vacuum coating arrangement according to any one of Examples 27 to 29 optionally further comprises: a vacuum chamber, in which the coating device and the sensor are arranged.

[0043] In Example 31, the vacuum coating arrangement according to any one of Examples 27 to 30 optionally further includes: a control element configured to affect the amount of time the sensor is exposed to the coating material between the first response and the second response and / or the amount of coating material the sensor is exposed to between the first response and the second response. BRIEF DESCRIPTION OF THE DRAWINGS

[0044] Figure 1 , a vacuum coating arrangement with a sensor for determining (and optionally influencing) the rate at which coating material is ejected, according to various embodiments in schematic top or side view;

[0045] Figure 2 , an illustrative comparison of measurement methods according to the prior art and measurement methods according to various embodiments; and

[0046] Figure 3 , schematic diagrams showing different stages of a time period during which a sensor is coated with a coating material according to different embodiments. DETAILED DESCRIPTION

[0047] In the following detailed description, reference is made to the accompanying drawings forming a part thereof, in which specific embodiments of the present invention are shown for ease of explanation. In this regard, directional terms, such as "top", "bottom", "front", "rear", "forward", "backward", etc., are used with reference to the direction of the figures. Because the components of the embodiments can be positioned in a plurality of different directions, the directional terms are for the purpose of illustration and are not limited in any way. It should be understood that other embodiments may be used and structural or logical changes may be made without departing from the scope of protection of the present invention. It should be understood that, unless otherwise specifically indicated, the features of the various exemplary embodiments described herein may be combined with each other. Therefore, the following detailed description should not be interpreted as restrictive, and the scope of protection of the present invention is defined by the appended claims.

[0048] In the context of this specification, the terms "connect", "attach" and "couple" are used to describe direct and indirect connections (e.g. ohmic and / or electrical conduction, e.g. electrical conduction connections), direct or indirect connections and direct or indirect couplings. In the drawings, identical or similar elements are provided with the same reference numerals where appropriate.

[0049] According to various embodiments, the term "coupled" or "coupling" may be understood in the sense of a connection and / or interaction (e.g., mechanical, hydrostatic, thermal and / or electrical), for example, direct or indirect. For example, several elements may be coupled together along an interaction chain, along which interactions, such as fluids, may be exchanged (also referred to as fluid-conducting coupling). For example, two coupled elements may exchange interactions, such as mechanical, hydrostatic, thermal and / or electrical interactions, with each other. The coupling of several vacuum components (e.g., valves, pumps, chambers, etc.) to each other may include their coupling to each other in a fluid-conducting manner. According to various embodiments, "coupled" may be understood in the sense of a mechanical (e.g., physical or physical) coupling, for example, by direct physical contact. The coupling may be configured to transmit mechanical interactions (e.g., forces, torques, etc.).

[0050] With respect to vacuum components (such as pumps, chambers, lines, valves, etc.), the term "coupled" or "coupled" may be understood in the sense of a connection to a common vacuum system. The components of the vacuum system may be configured to exchange gases with each other via the coupling, whereby the coupling may be separated from the external gases of the vacuum system.

[0051] The actual state of an entity (e.g., a device, a system, or an operation or a process) can be understood as the state of an entity that actually exists or the state of an entity that can be detected by a sensor. The target state of an entity can be understood as the desired state, i.e., a preset. Control can be understood as the expected influence on the current state of an entity (also referred to as the actual state). The current state can be changed according to a preset (also referred to as the target state), for example, by changing one or more operating parameters (also referred to as manipulated variables) of the entity, for example, by a control element. Regulation can be understood as control, whereby the change of state is also offset by disturbances. To this end, the actual state is compared with the target state, and the entity is influenced, for example, by a control element, so that the deviation of the actual state relative to the target state is minimized. In contrast to pure forward sequence control, closed-loop control therefore realizes the continuous influence of the output variable on the input variable, which is brought about by the so-called control loop (also referred to as feedback). In other words, this can be understood to mean that closed-loop control can be used as a substitute or supplement to open-loop control (or control), or closed-loop control can be used as a substitute or supplement to closed-loop control.

[0052] The state of a controllable device (e.g., a structured device) or a controllable process (e.g., a structured device) can be specified as a point (also called an operating point or operating point) in a chamber (also called a state space) that is covered by variable parameters (also called operating parameters) of the device or process. Thus, the state of the device or process is a function of the corresponding values ​​of one or more operating parameters, which thus represent the state of the device or process. The actual state can be determined based on measurements (e.g., by measuring elements) of one or more operating parameters (also called controlled variables).

[0053] The term "control device" may be understood as any type of logically implemented entity, which may include, for example, circuits and / or processors that may execute software stored in a storage medium, firmware or a combination thereof and issue instructions based thereon. The control device may, for example, be configured by a code segment (e.g., software) to control the operation (e.g., its operating points) of a system (e.g., a machine or plant, e.g., at least its kinematic chain).

[0054] Control can be understood as an intentional influence on a system. The current state of a system (also referred to as the actual state) can be changed according to a preset (also referred to as a target state). The parameters of the target state explained herein (also referred to as target parameters) can be implemented, for example, using a code segment, or can be stored on a storage medium in some other way. Regulation can be understood as control, whereby the change in the state of the system is also offset by interference. Exemplarily, a control system can include a forward control path, and thus exemplary implementations are made to convert an input variable (e.g., a preset) into a sequence control of an output variable. However, a control path can also be part of a control loop, thereby realizing closed-loop control. For the purpose of control, the corresponding control element of the system can be activated, which affects the actual state of the system. Examples of control elements include: a drive device (e.g., providing torque), a valve (e.g., controlling pressure), a switch (e.g., closing a discharge path). A drive device can, for example, include a linear drive (e.g., a reciprocating piston) or an electric motor.

[0055] If reference is made to a target parameter (e.g., a target rate at which the coating material is to be ejected), this can be achieved by a code segment, which can be stored, for example, in a data storage device associated with the control device. The code segment can be stored in the data storage device in an appropriate manner, for example as a list (e.g., a table), a series of values, an algorithm, etc. For example, the data storage device (more generally, also referred to as a storage medium) can be a non-transitory data storage device. For example, the data storage device can include a hard disk and / or at least one semiconductor memory (e.g., a read-only memory, a random access memory, and / or a flash memory), or be formed by a hard disk and / or at least one semiconductor memory. For example, the read-only memory can be an erasable programmable read-only memory (also referred to as an EPROM). The random access memory can be a non-volatile random access memory (also referred to as NVRAM, i.e., "non-volatile random access memory").

[0056] The term "control element" (e.g., including an actuator or formed by an actuator) can be understood as a converter that is configured to affect a state, process (e.g., a coating process) or device in response to controlling the control element. The control element can convert a control signal provided to it (by which it is controlled) into a mechanical motion or a change in a physical variable (e.g., pressure or temperature). For example, an electromechanical (also called electric) control element can be configured to convert electrical energy into mechanical energy (e.g., through motion) in response to control. For example, an electrothermal control element can be configured to convert electrical energy into thermal energy in response to control. For example, an electrothermal control element can be configured to convert electrical energy into thermal energy in response to control. For example, an electrical control element can be configured to convert electrical energy into electrical energy (e.g., a specific voltage, current and / or power) in response to control.

[0057] A control element can be configured to influence the actual state (also referred to as the operating point) of a process provided by the control element (e.g., its manipulated variable). This influence can be direct or indirect. For example, the manipulated variable and the controlled variable can be different from each other. A controlled variable (e.g., pressure) can be a function of one or more manipulated variables (e.g., voltage).

[0058] For example, the control element can change the voltage as a manipulated variable, by which a coating device for ejecting a coating material is provided, so that the rate at which the coating material is ejected and the coating rate (i.e., the rate at which the substrate is coated) or the layer thickness are changed as controlled variables. For example, the control element can change the inflow rate of a gas as a manipulated variable, so that the pressure as a controlled variable is changed as a result.

[0059] Examples of components of the control element include: coating equipment, valves (e.g., of a pump arrangement and / or a gas supply device), motors (e.g., of a valve or a pump), circuits (e.g., for controlling the coating equipment), drive devices (e.g., for controlling the state of a baffle), etc. For example, the coating equipment can be configured to perform a coating process according to the control. The pump arrangement can be configured, for example, to pump out one or more gases according to the control, thereby removing them from the coating process. For example, the gas supply device can be configured to supply one or more gases (also referred to as gas supply) to the coating process according to the control. The supplied gas can have a gas inflow rate (i.e., each time the gas flows in). For example, the gas inflow can be a standard volume flow rate supplied to the coating process.

[0060] About the control of control element, among other things, reference is made to a more understandable control variable or its control value, which is affected by the control element. The content described for this purpose can be applied by analogy to the control variable or its control value, which is fed to the control element for control, and vice versa. Exemplarily, the control element acts as a converter that converts a control signal into a control variable or its control value, so that the control value is a function of the control value. For example, modern control elements are provided as complex components including actuators and separate control devices (also referred to as actuator control devices). The control element control device can be configured to receive the control value as input by a control signal and control the actuator according to the control value. The control variable is then generated and transmitted in the control element, thereby providing the control variable to the control element. Less complex control elements can only process the control variable as a control signal, thereby feeding the control variable to them for control.

[0061] More generally, the control of the control element can be achieved by a control signal, whereby the control signal can represent a manipulated variable or its manipulated value and / or a control variable or its controlled value. Alternatively or additionally, the control signal can include instructions specifying how to change the manipulated variable or its manipulated value (e.g., its relative change).

[0062] The control of the control device can be performed according to an operation sequence. The operation sequence can be stored in a data storage device in an appropriate manner (e.g., as an algorithm or in another manner including a code segment). As used herein, an operation sequence is understood to be a preset according to which one or more control elements are configured to affect the rate at which the coating material is ejected. The operation sequence can specify one or more target parameters according to which the coating material is ejected at this rate.

[0063] A sensor (also referred to as a detector) may be understood as a transducer configured to capture (e.g., qualitative or quantitative) environmental characteristics corresponding to its sensor type as measurement variables such as physical, chemical and / or material properties. The measurement variable is a physical variable (also referred to as a controlled variable) applied by the sensor for measurement. Each sensor may be part of a measurement chain including a corresponding infrastructure (e.g., a processor, a storage medium and / or a bus system, etc.). The measurement chain may be configured to control the corresponding sensor, process the measurement variable captured by it as an input variable, and based on this, provide an electrical signal as an output variable representing the captured input variable. For example, the output variable may indicate a measured value. The measurement chain may be implemented, for example, by a so-called control device. Various embodiments relate to sensors coated with a coating material, wherein the measurement variable of the sensor may be a function of the mass of the coating material to which the sensor is or will be coated.

[0064] Reference will be made herein to the control and / or regulation of a coating process, which can be achieved by controlling one or more control elements (also referred to as positioning). In this article, reference is also made to a control device or code segment. A control device (also referred to as a control unit) can be configured to implement one or more methods described herein (or at least one operation thereof). To this end, the control device may include a processor configured to implement the corresponding method. For example, the processor may be configured to output corresponding instructions for control. Alternatively or additionally, the processor may be configured to receive and process corresponding instructions and signals. The instructions received by the processor may be implemented, for example, using a code segment stored in a non-transitory data memory. For example, a code segment may include at least instructions and / or one or more presets, which, when executed by a processor, cause the processor to execute one of the methods.

[0065] The term "processor" can be understood as any type of entity that allows processing of data or signals. For example, data or signals can be processed according to at least one (i.e., one or more) specific functions performed by the processor. The processor may include or be formed by: an analog circuit, a digital circuit, a mixed signal circuit, a logic circuit, a microprocessor, a central processing unit (CPU), a graphics processing unit (GPU), a digital signal processor (DSP), a programmable gate array (FPGA), an integrated circuit or any combination thereof. Any other type of implementation of each function described in more detail below can also be understood as a processor or a logic circuit, such as a virtual processor (or virtual machine) or a plurality of dispersed processors, which are interconnected, for example, by a network, distributed in any spatial manner and / or have any sharing (e.g., computing load sharing between processors) in the implementation of each function. This is generally applicable to logic for implementing different implementations of each function. It should be understood that one or more of the method steps described in detail herein can be performed (e.g., implemented) by a processor through one or more specific functions performed by the processor.

[0066] In relation to a motion process, for example a sensor, a reference to the direction of motion is made. The direction of motion is the direction of the motion, for example the direction of translation (also called translational direction) or the direction of rotation (also called rotational direction). For example, the translation can be performed along a linear motion path, for example in segments, which is parallel to the direction of translation (translational direction). If the motion is performed along a closed motion path following the rotational direction, it is also called a circular motion.

[0067] A drive device may be understood herein as a converter that is configured to convert (e.g., electrical) energy into mechanical energy. For example, a drive device may include an electric motor (e.g., with an electric coil). For example, a drive device may include a compressor and a reciprocating piston coupled thereto. For example, a drive device may include one or more piezoelectric elements. For example, a drive device may be configured to output mechanical energy through torque or rotational motion.

[0068] The statement that an element, a parameter, etc. "represents" another element, another parameter, etc. may be understood to mean that the element or parameter is a (eg, one-to-one) function of the other element or another parameter.

[0069] Figure 1 A vacuum coating arrangement 100 according to various embodiments is shown in a schematic top view or side view.

[0070] The vacuum coating arrangement 100 may include a vacuum chamber 102. For example, the vacuum chamber 102 may be or may be provided by a chamber housing, wherein the chamber housing may provide one or more vacuum chambers. For example, the chamber housing may be coupled to a pump arrangement, such as a vacuum pump arrangement, to provide a negative pressure or vacuum (vacuum chamber housing), and may be configured in a stable manner so that it can withstand the effects of air pressure in a downwardly pumped state. The pump arrangement (including at least one vacuum pump, such as a high vacuum pump, such as a turbomolecular pump) may enable a portion of the gas to be pumped from the interior of the vacuum chamber 102. The vacuum chamber 102 or each vacuum chamber 102 may optionally include a chamber cover that seals the interior of the vacuum chamber 102 in a vacuum-tight manner. Thus, the plasma of the arc discharge may have a negative pressure (e.g., a vacuum).

[0071] The chamber housing (e.g., the vacuum chamber 102 provided therein) may be configured such that a negative pressure (i.e., a pressure less than atmospheric pressure) may be provided therein, such as a vacuum (i.e., a pressure less than 0.3 bar), such as a pressure in the range of about 10 mbar to about 1 mbar (in other words, a rough vacuum), or a lower pressure, such as a pressure in the range of about 1 mbar to about 10 mbar (in other words, a fine vacuum), such as a pressure in the range of about 1 mbar to about 10 mbar (in other words, a fine vacuum), such as a pressure in the range of about 1 mbar to about 10 mbar. - 3 mbar (in other words, a fine vacuum), or even lower pressures, for example, in the range of about 10 -3 mbar to about 10 - 7 mbar (in other words, high vacuum), or a pressure less than that of a high vacuum, for example, less than about 10 -7 Atmospheric pressure (eg 1 bar) may be the pressure acting on the chamber housing from the outside.

[0072] The vacuum coating arrangement 100 may include a coating device 104. The coating device 104 may be configured to eject coating materials. To this end, the coating device 104 may be any suitable type of coating device capable of ejecting coating materials. According to various embodiments, the coating device 104 may be configured to perform a chemical vapor deposition process and / or a physical vapor deposition process. For example, the coating device 104 may include a magnetron (planar magnetron or tubular magnetron). For example, the coating device 104 may include an electron beam evaporator. For example, the coating device 104 may be configured to perform a spraying or spraying process. For example, the coating device 104 may include a nozzle tube evaporator for providing an evaporation source or multiple evaporation sources. It should be understood that these are exemplary embodiments of the coating device 104, and it may have or be any other type of device for performing a chemical vapor deposition process and / or a physical vapor deposition process.

[0073] The corresponding gas pressure (also referred to as operating pressure) used to operate the coating apparatus 104 and / or the corresponding gas or gas mixture (also referred to as operating gas) supplied to the coating apparatus 104 may be highly application dependent. For example, the operating pressure may be between about 10 -4 mbar (millibar) to about 5.10 -4 mbar. For example, the operating gas may include one or more of the following gases: oxygen (e.g., molecular oxygen, i.e., O2), nitrogen (e.g., molecular nitrogen, i.e., N2), hydrogen (e.g., molecular hydrogen, i.e., H2), one or more hydrocarbons or gas mixtures thereof. The operating gas may include a working gas (e.g., an inert gas) and / or an active gas. The active gas may, for example, include hydrogen.

[0074] The coating device 104 may include a target. The target may generally include or consist of a coating material. The coating material ejected by the coating device 104 (eg, released from the target) may form a material flow 106 (eg, away from the target).

[0075] During the operation of the vacuum coating arrangement 100, one (or more than one) substrate 110 can be coated by the material flow 106. To this end, the vacuum coating arrangement 100 may include a substrate holder 108, which is configured to hold one or more substrates 110. The substrate holder 108 may be arranged in the vacuum chamber 102. In some embodiments, the substrate holder 108 may be configured to be stationary. In other embodiments, the substrate holder 108 may be configured to be movable. For example, the vacuum coating arrangement 100 may be a continuous flow system including a conveying system for conveying the substrate 110. Typically, the continuous flow system may have two substrate transfer openings, through which at least one substrate may be fed into the continuous flow system and sent out from the continuous flow system. Multiple processing areas may be configured between the two substrate transfer openings. For example, one or more processing areas may each include one or more coating devices.

[0076] The substrate or each substrate may typically comprise a workpiece, such as a semi-finished product (e.g. a rod, sleeve or plate) or a component of a more complex device. Examples of substrates include: piston rings, bearing components, tools, chains, transmission chains, obtuse geometric structures; knives or components sensitive to sliding friction. For example, the substrate or each substrate may be cylindrical, plate-shaped or have another shape.

[0077] The substrate or each substrate may comprise or be formed from at least one of a ceramic, glass, a semiconductor (such as an amorphous semiconductor, a polycrystalline semiconductor or a single crystal semiconductor (e.g. silicon)), a metal and / or a polymer (e.g. plastic). For example, a ceramic may comprise an oxide, nitride and / or carbide of a metal.

[0078] For the purposes of this specification, a metal (also referred to as a metallic material) may include (or be formed of) at least one metallic element (i.e., one or more metallic elements), such as at least one element from the following element group: copper (Cu), iron (Fe), titanium (Ti), nickel (Ni), silver (Ag), chromium (Cr), platinum (Pt), gold (Au), magnesium (Mg), aluminum (Al), zirconium (Zr), tantalum (Ta), molybdenum (Mo), tungsten (W), vanadium (V), barium (Ba), hafnium (Hf), samarium (Sm), silver (Ag) and / or lithium (Li). For example, a metal may include a metal compound (e.g., an intermetallic compound or alloy) or a compound of at least one metallic element (e.g., from an element group) and at least one non-metallic element (e.g., carbon) (e.g., steel), or a metal may be formed of a metal compound or a compound of at least one metallic element and at least one non-metallic element.

[0079] The vacuum coating arrangement 100 may include a control device 118. The control device 118 may be configured to control the coating device 104. For example, the control device 118 may control the coating device 104 according to one or more manipulated variables (e.g., voltage) to set a target rate at which the coating material is to be ejected as a controlled variable. The material flow 106 generated in this manner may include an actual rate at which the coating material is ejected (i.e., the actual rate of the material flow 106). The actual rate of the material flow 106 may be the amount of material per time (e.g., per time unit).

[0080] In operation, a portion of the material flow 106 may impinge on the substrate 110. Therefore, this portion of the material flow 106 may indicate the actual rate at which the substrate 110 is coated. The actual rate at which the substrate 110 is coated may also be referred to as the coating rate. Therefore, the coating rate may be understood as the amount of coating material that impinges on the substrate 110 per unit time, or the amount of coating material that is deposited (deposited) on the substrate 110 per unit time. The coating rate may also be considered as the growth rate of the coating on the substrate 110 (the change in coating thickness per unit time). The amount of material per time or per time unit of the material flow 116 may also be referred to as mass flow and / or mass flow.

[0081] However, the actual rate of material flow 106 may depend on various disturbance variables within the vacuum chamber 102, such as the temperature of the target, the pressure within the chamber, the flow of the supplied gas or gas mixture, etc.

[0082] Therefore, it may be necessary to control the rate at which the coating material is ejected. To this end, the control device 118 may be configured to control the rate based on the actual rate of the material flow 106 by manipulating a variable (eg, voltage) to set a target rate as the controlled variable.

[0083] To this end, the vacuum coating arrangement 100 may include a sensor 112 (e.g., disposed in the vacuum chamber 102). The sensor 112 may be configured to provide a response that is a function of the mass of the coating material coating the sensor. Therefore, the sensor may be configured so that its response changes when the sensor is exposed to or becomes exposed to the coating material. Oscillating quartz is an example. In some embodiments, the sensor 112 may include a quartz crystal and an associated oscillator. In other embodiments, the control device 118 may include an associated oscillator. In the case of an oscillating crystal, the resonant frequency of the oscillating crystal changes as a function of the mass of the coating material coating the oscillating crystal. This change in resonant frequency may be captured directly or indirectly. For example, the change in resonant frequency may be captured indirectly by capturing the (frequency-dependent) impedance of the quartz crystal. When the resonant frequency of a quartz crystal is mentioned here, it should be understood that the resonant frequency is formed only in the resonant circuit (in operation) (i.e., after applying the corresponding signal).

[0084] According to various aspects, the response of sensor 112 may also be a function of the temperature of sensor 112. Thus, the response of sensor 112 may change as a function of the temperature of sensor 112.

[0085] In various illustrative examples, reference is made herein to an oscillating crystal as the sensor 112. It should be understood that this is for illustrative purposes, and that the sensor 112 may also include any other type of sensor where the response of the sensor is a function of the mass of the coating material coating the sensor, and optionally also a function of the temperature of the sensor.

[0086] According to various aspects, in operation, the sensor 112 can be exposed to the coating material (i.e., the material flow 106) for a period of time to determine the actual rate at which the coating material is ejected (or at least a data variable representing the actual rate). In some embodiments, the sensor 112 can be fixed within the vacuum chamber 102, and a baffle can be used to expose the sensor 112 to the material flow 106 or block the material flow 106. In other embodiments, the sensor 112 can be moved into (and out of) the material flow 106 to be exposed thereto. For the purpose of illustration, reference is made below to an embodiment with a baffle. It should be understood that the principles described herein can be correspondingly applied to embodiments in which the sensor 112 is moved into the material flow 106.

[0087] The vacuum coating arrangement 100 may include a baffle 114 (also referred to as a baffle). The baffle 114 may be configured such that the sensor 112 is exposed or not exposed to the coating material of the material flow 106, depending on the state of the baffle 114. For example, the baffle 114 may include at least a first state in which the sensor 112 is not exposed to the coating material (i.e., the material flow 106 is blocked) and at least a second state in which the sensor 112 is exposed to the coating material. The vacuum coating arrangement 100 may include a drive device 116 configured to adjust the state of the baffle 114.

[0088] Here, the baffle 114 may include any type of baffle through which the sensor 112 is exposed or not exposed to the material flow 106, depending on the state of the baffle. Therefore, the drive device 116 may be any type of device through which the state of the baffle 114 can be changed. The control device 118 can be configured to control the drive device 116. Therefore, the control device 118 can be configured to control the state of the baffle 114 (via the drive device 116). Therefore, the control device 118 can be configured to control the duration of exposure of the sensor 112 to the coating material (e.g., according to a target duration).

[0089] In one example, the baffle 114 and the drive device 116 are of pneumatic type, and a pneumatic baffle system can be provided, in which the state of the baffle 114 depends on whether compressed air is applied. In an advantageous embodiment, the baffle 114 can be a baffle that can be rotated by the drive device 116 from one of the at least one first state in which the sensor 112 is not exposed to the coating material (i.e., the state in which the material flow 106 is blocked) to one of the at least one second state in which the sensor 112 is exposed to the coating material, and vice versa. For example, the blocking orifice 114 can be an orifice including two first states and two second states. In this case, for example, a quarter turn of the baffle 114 driven by the drive device 116 can be rotated from one first state to the second state, and the subsequent quarter turn of the baffle 114 can be used to rotate the baffle 114 from the second state to another first state, and then another subsequent quarter turn of the baffle 114 can be used to rotate the baffle 114 from another first state to another second state. Therefore, the baffle 114 can be rotatably attached. For example, the baffle 114 can have a diameter in the range of about 50 mm to about 300 mm (e.g., about 100 mm). According to various embodiments, the drive device 116 can be or include a stepper motor. It should be understood that this is an exemplary embodiment of the baffle 114 and is provided by way of illustration. Where the baffle 114 is rotatably attached in at least one first state and at least one second state, and where the drive device 116 includes a stepper motor, it may be advantageous compared to a pneumatic baffle system due to reduced switching time, as this allows the duration of a single measurement to be significantly reduced. For example, in one embodiment, the rotatably attached baffle 114 can be a rotatably mounted disk. In another embodiment, the rotatably attached baffle 114 can include or be a rotating element (e.g., a belt and / or wheel). The circumferential member can include one or more openings, such that the opening can provide a corresponding second condition, under which the sensor 112 can be exposed to the coating material.

[0090] As an alternative to a rotatably attached mounting, for example, the baffle panel may be attached so that it is movable in translation.

[0091] It is to be understood that the examples of shutter operation described herein may be similarly applied to any other type of implementation (repeated multiple times) of a measurement sequence comprising a first phase, in which the sensor is exposed to the coating process for a time period 220, and a second phase, in which the sensor is shielded from the coating process for an additional time period (also referred to as a measurement pause). For example, a measurement sequence may be implemented using a shutter that moves (translationally or rotationally) relative to a coating material source relative to the sensor, which is fixed relative to the coating material source. For example, a measurement sequence may be implemented by a support, on which the sensor is mounted, and which is fixed (translationally or rotationally) relative to the coating material source. For example, in order to achieve the shortest possible time 220, the movement of several shutters may be superimposed. For example, instead of one shutter aperture, several shutter apertures of different geometries may be used to vary the duration 220.

[0092] Figure 2 An exemplary comparison of a measurement method according to the prior art and a measurement method according to various embodiments is shown. The exemplary illustration relates to a sensor 112 comprising a resonant crystal, so that the diagram 200 shows the (resonant) frequency F of the resonant crystal as a function of time t. It should be understood that the oscillating crystal is an example of a sensor 112, and in the case of another sensor, parameters other than this frequency may be captured. Furthermore, the frequency F of the oscillating crystal is only an exemplary parameter of the oscillating crystal. In other embodiments, the (frequency-dependent) impedance of the oscillating quartz may be captured as a parameter.

[0093] Graph 200 shows a first frequency response 202 according to the prior art. Here, initially (i.e., before time t0), the baffle 114 may be in a first state (i.e., a state in which the material flow 106 is blocked) in which the sensor 112 is not exposed to the coating material, and the response from the sensor 112 may have an output frequency 206. At time t0, the baffle 114 may be opened, and the sensor 112 may thus be exposed to the coating material. The resulting change in the mass of the coating material deposited on the sensor 112 may result in a decrease in the frequency F. The energy input from the coating material may heat the sensor 112. As described herein, the response of the sensor 112, i.e., the frequency F in this example, may be a function of the temperature of the sensor 112. An increase in temperature may result in an increase in the frequency F. This may result in a decrease in the frequency F due to a change in mass not being captured. This increased frequency is exemplarily shown in graph 200. For this reason, it may be necessary to wait for a predefined time period 212 (from time t0 to time t2) until the sensor 112 has reached thermal equilibrium (see the light gray area). This predefined time period can also be considered as a dead time, because the response of the sensor cannot be used to determine the rate during this time. Then, in the subsequent measurement interval 214 (from time t2 to time t3), the frequency change over time can be captured as a measure of the change in mass over time (see the dark gray area). At time t3, the baffle 114 can then be closed so that the sensor 112 is no longer exposed to the coating material, thereby cooling it. After the sensor 112 has cooled, it may have a reduced final frequency 208 due to the change in mass (compared to the output frequency 206), although this is no longer captured conventionally. As described herein, the predefined duration 212 can be several minutes. Therefore, the measurement duration 210 of a single measurement may require at least these several minutes.

[0094] The diagram 200 also shows a second frequency response 204 according to various embodiments. Here, at time t before time t0, A1 The first response of the sensor 112 is captured at time t. For example, the control device 118 may be configured to A1 The sensor 112 is triggered at 100° to capture the first response. Thus, the first response may be captured while the shutter 114 is closed and thus the sensor 112 is not exposed to the coating material. Thus, the first response may be captured before the sensor 112 is heated (e.g., by the coating material).

[0095] The control device 118 may be configured to control the drive device 116 to open the shutter 114 at time t0, thereby exposing the sensor 112 to the coating material. This may cause the sensor 112 to heat up. According to various embodiments, the control device 118 may be configured to control the drive device 116 to close the shutter 114 at time t1 (or the closing may be completed at time t1, see Figure 3 ), so that the sensor 112 is no longer exposed to the coating material. The sensor 112 can then cool.

[0096] According to various embodiments, the control device 118 may be configured to A2 The sensor 112 is triggered at time t to capture a second response from the sensor 112. A2 The second response may be captured after the time t2. Thus, the second response may also be captured while the shutter 114 is closed and the sensor 112 is therefore not exposed to the coating material. Here, the second response may be captured after the sensor 112 has been exposed to the coating material. Thus, the sensor 112 may be exposed to the coating material for a period of time 220. In principle, as long as the shutter 114 remains closed, the time between the time t2 and the time t2 at which the second response is captured may be captured. A2 Any time period may elapse between the locations.

[0097] The control device 118 can be configured to capture the change in mass based on the first response and the second response (e.g., based on the difference between the frequency 206 associated with the first response and the frequency associated with the second response). The control device 118 can be configured to determine each change in mass based on the change in mass and the duration 220 of exposure of the sensor 112 to the coating material. The control device 118 can be configured to determine a data variable representing an actual state of the rate at which the coating material is ejected based on each change in mass.

[0098] The control device 118 can be configured to control the drive device 116 according to the target duration of exposure of the sensor 112 to the coating material (e.g., stored). In some embodiments, the control device 118 can be configured to determine a data variable about the actual state of the rate based on the target duration. In other embodiments, the vacuum coating arrangement 100 can include one or more additional sensors to capture the time t0 and / or the time t1. In this case, the control device 118 can be configured to determine the duration 220 as the time difference between these captured time points.

[0099] The control device 118 may be configured to control the coating device 104 to adjust the coating process, for example, to reduce a deviation between an actual state of the rate and a target state of the rate.

[0100] Since the first response and the second response are captured when the shutter 114 is closed, the sensor 112 is not coated, and compared to the measurement method of the prior art, it is no longer necessary to wait for the predefined duration 212. Therefore, the time period during which the sensor 112 is exposed to the coating material (also referred to as the coating duration) can end before the sensor 112 reaches thermal equilibrium. In this way, the coating duration can be significantly shortened. For example, the time period 220 during which the sensor 112 is exposed to the coating material can be less than or equal to 60 seconds (e.g., less than or equal to 30 seconds, for example, less than or equal to 10 seconds, etc.).

[0101] The reduced exposure time 220 of the sensor 112 to the coating material also results in a lower temperature rise of the sensor 112 due to the energy introduced by the coating material, thereby improving the adhesion of the coating material to the sensor 112 (thereby reducing particle formation and re-evaporation of material deposited on the sensor 112) and further increasing the service life of the vacuum coating arrangement 100.

[0102] According to various aspects, the duration 220 that the sensor 112 is exposed to the coating material can be less than or equal to 1 second (e.g., less than or equal to 500 milliseconds, e.g., less than or equal to 100 milliseconds). However, in this case, the duration that the shutter 114 switches from one state to another state (i.e., the switching time) may have a relevant impact on determining the rate.

[0103] The switching time refers to the time taken to change the shutter 114 from a closed state (sensor shielded from the coating material) to an open state (sensor exposed to the coating material), or vice versa. Exemplarily, the opening or closing of the shutter 114 may require a certain amount of time (the so-called switching time), and the rate may be time-dependent during this time. Therefore, for the duration of the opening of the shutter 114 (also referred to as the opening duration) and / or the duration of the closing of the shutter 114 (also referred to as the closing duration), the rate of coating the sensor 112 may be time-dependent (and reduced). According to various embodiments, the control device 118 may be configured to take into account this time dependence of the rate at which the sensor 112 is coated when determining the data variable. It should be understood that the opening and closing of the shutter 114 is exemplary. For example, if the sensor 112 moves into and then out of the material flow 106, the rate at which the sensor 112 is coated may be time-dependent during a period of time when moving into the material flow 106 and a period of time when moving out of the material flow 106.

[0104] Figure 3A diagram 300 is shown with different stages of duration 220 according to various embodiments. Herein, reference is made to the duration 220 in terms of easily understood symbols, i.e., in the form of a time difference (Δt) between time t1 and time t0, it being understood that what is described herein can be applied by analogy to any other symbols in duration 220. Diagram 300 shows the rate R at which the sensor 112 is coated. B .

[0105] In some embodiments, time t0 may be substantially the time when the control device 118 controls the drive device 116 to open the shutter 114. In other embodiments, the vacuum coating arrangement 100 may include at least a first additional sensor configured to capture the start of opening of the shutter 114 as time t0.

[0106] According to various embodiments, the vacuum coating arrangement 100 may include at least one second additional sensor. The at least one second additional sensor may be configured to capture the time t0+Δt at which the shutter 114 is fully opened. S0 The time difference between the start and end of the opening process is the opening duration Δt S0 .

[0107] According to various embodiments, the closing process starts at time t1-Δt S1 The time t1 at which the closing process ends (ie is completed) can be acquired by at least one first additional sensor and / or at least one second additional sensor. The time difference between the start of the closing process and the end of the closing process is the closing duration Δt S1 .

[0108] In the period between the opening operation and the closing operation (from time t0+Δt S0 At time t1-Δt S1 ), the rate R B The maximum rate R B,max According to various aspects, the duration 220 can be selected so that the period between the opening operation and the closing operation (from time t0+Δt S0 At time t1-Δt S1 ) is at least one third of the duration 220. It should be understood that the opening duration Δt S0 and the closing duration Δt S1 The smaller the on-time 220 is, the smaller the on-time 220 may be (and the longer the service life of the vacuum coating arrangement 100 will be). According to various aspects, the timing may be measured with a timing accuracy of at least 0.1%. According to various embodiments, the on-time 220 (i.e., the time difference Δt between the instant t1 and the instant t0) may include the on-time Δt S0and the closing duration Δt S1 (i.e. Δt=Δt S0 +Δt S1 Therefore, in this case, the duration 220 cannot have a time interval (ie, Δt-Δt) between the opening process and the closing process. S0 -Δt S1 =0). If Δt = Δt S0 +Δt S1 , the measurement sequence can be configured as a continuous process (turning on and off).

[0109] The control device 118 may be configured to use the time dependency of the switching on and off and the switching on duration Δt S0 and the closing duration Δt S1 A data variable to determine the actual state of the rate at which the coating material is ejected.

[0110] According to various embodiments, the shutter 114 and the drive device 116 can be configured so that the speed at which the shutter 114 moves from one state (e.g., the closed state or the open state) to another state (e.g., the open state or the closed state) is substantially constant. For example, as described above, the shutter 114 can be rotatably attached and the drive device 116 can include a stepper motor. The substantially constant switching speed (i.e., the speed at which the sensor 112 is switched from one state to another) means that the rate R at which the sensor 112 is coated is substantially constant. B In this case, the rate R at which the sensor 112 is coated is B Approximately corresponds to the on-time Δt S0 and the closing duration Δt S1 The maximum rate R B,max half.

[0111] According to various embodiments, the control device 118 may be configured to use the (eg, captured) on-duration Δt S0 and the (eg captured) off duration Δt S1 A data variable to determine the actual state of the rate at which the coating material is ejected.

[0112] In some embodiments, the control device 118 may be configured to use a predefined (e.g., stored) (open and / or close) switching time to determine a data variable of the actual state of the rate at which the coating material is ejected. In this case, at least one second additional sensor is optional. In this case, the time t0 may be substantially the time at which the control device 118 activates the drive device 116 to open the shutter 114, and the time t0+Δt S0 A (eg stored) predefined on time may be used to determine Δt S0, time t1-Δt S1 Basically, it can be the time at which the control device 118 controls the drive device 116 to close the damper 114, and the time t1 can use a (eg stored) predefined closing time Δt S1 As an alternative to a predefined (eg stored) (opening and / or closing) switching time, the control device 118 may be configured to determine the switching time based on a predefined (eg stored) switching speed.

[0113] By way of example, this comparison of the measurement method described herein with the measurement method according to the prior art shows that the coating time (i.e. the time for coating the sensor (e.g. oscillating quartz)) can be significantly reduced compared to the prior art (since there is no need to wait for thermal equilibrium). This results in the service life of the vacuum coating arrangement being increased by several dimensions.

[0114] Examples of data variables explained herein, representing the actual state of the rate at which the coating material is ejected (also referred to as the ejection rate), include:

[0115] - the mass flow rate of the coating material (e.g., time-averaged),

[0116] - the rate at which the sensor is coated with the coating material,

[0117] - the amount of coating material applied to the sensor during the time period;

[0118] - the frequency of the sensor, for example the frequency of its oscillating quartz crystal;

[0119] - The time until the sensor is coated with the target amount of coating material.

[0120] It will be appreciated that what is described herein with respect to the injection rate captured by a sensor may be applied by analogy to any other operating parameter captured by the sensor (e.g., an operating parameter of a process (e.g., a coating process)), where the output and / or operating mode of the sensor depends on, for example, an interference variable that is, for example, a function of time and / or temperature of the sensor.

Claims

1. A method comprising: Determining a data variable representing the actual state of the rate at which the coating material is ejected based on: o a first response of the sensor (112) before the sensor (112) is exposed to the coating material, and o a second response of the sensor (112) after the sensor (112) has been exposed to the coating material; and - Controlling a control element configured to influence the rate based on the data variable.

2. The method according to claim 1, wherein: The first response of the sensor (112) is: A first response of the sensor (112) before the sensor (112) is exposed to the coating material and heated thereby.

3. The method according to claim 2, wherein: The second response of the sensor (112) is: A second response of the sensor (112) after the sensor (112) has been exposed to the coating material and cooled.

4. The method according to claim 3, wherein: The determination of the data variable is also based on a duration (220) of exposure of the sensor (112) to the coating material.

5. The method according to any one of claims 1 to 4, in, The first response of the sensor (112) occurs before the sensor (112) is heated; and / or The second response of the sensor (112) occurs when the sensor (112) cools or after the sensor (112) has cooled.

6. The method according to any one of claims 1 to 4, wherein: The sensor (112) is not exposed to the coating material during the first response and / or the second response.

7. The method according to any one of claims 1 to 4, in, The first response and / or the second response of the sensor (112) is a function of a temperature of the sensor (112).

8. The method according to any one of claims 1 to 4, wherein: The sensor (112) is exposed to the coating material for a period of time (220): Less than or equal to 60 seconds; • Ending before the sensor (112) exposed to the coating material reaches thermal equilibrium.

9. The method according to any one of claims 1 to 4, in, The sensor (112) includes a quartz crystal exposed to the coating material.

10. The method according to any one of claims 1 to 4, further comprising: Controlling a control element configured to influence the duration (220) that the sensor (112) is exposed to the coating material and / or the amount of coating material to which the sensor (112) is exposed between the first response and the second response.

11. The method according to claim 10, in, The data variable is further based on at least a portion (Δt) of the duration (220) S0 , Δt S1 ), the mass flow rate of the coating material to which the sensor (112) is exposed is time-dependent for at least a portion of the duration (220).

12. The method according to claim 11, in, The at least one portion (Δt S0 , Δt S1 ) includes or is at least a function of the switching time of the baffle (114); and / or Wherein the mass flow rate is a function of a position of the baffle (114) relative to the sensor (112).

13. The method according to any one of claims 1 to 4, 11, 12, in, In determining the data variable, a time dependency of the mass flow rate of coating material to which the sensor (112) is exposed is further taken into account.

14. A method comprising: Determine the data variables that represent the actual state of the process based on: o a first response of the sensor (112) before the sensor (112) is exposed to the process, and o a second response of the sensor (112) after the sensor (112) has been exposed to the process; as well as - Controlling a control element configured to influence the process based on the data variable.

15. The method according to claim 14, wherein: The first response of the sensor (112) is: A first response of the sensor (112) before the sensor (112) is exposed to the process and heated thereby.

16. The method according to claim 15, wherein: The second response of the sensor (112) is: A second response of the sensor (112) after the sensor (112) has been exposed to the process and cooled.

17. A computer program, which, when executed by a processor, is configured to cause the processor to perform the method according to any one of claims 1 to 16.

18. A computer-readable medium storing instructions, the instructions being configured to, when executed by a processor, cause the processor to perform the method according to any one of claims 1 to 16.

19. A control device (118), comprising one or more processors, the one or more processors being configured to execute the method according to any one of claims 1 to 16.

20. A vacuum coating assembly (100), comprising: · A control device (118) according to claim 15; A coating device (104) for ejecting a coating material; a control element for controlling the coating device (104); and Sensor (112).

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