Liquid nitrogen type cooling sample table for vacuum coating

Abstract

The utility model discloses a liquid nitrogen type cooling sample table for vacuum coating, which comprises a rotating table, a first lifting table mounted on the rotating table, a hollow interlayer pipe mounted on the first lifting table, a hollow shaft arranged on the rotating table and driven by the rotating table to rotate, and a second lifting table arranged on the outer side of the hollow shaft and connected with the rotating table. A wafer bracket is arranged at the end, away from the rotating table, of the hollow shaft. According to the utility model, the structure is simple, through the arrangement of the liquid nitrogen chamber, after a sample is subjected to high-temperature treatment, the liquid nitrogen chamber can be utilized to quickly cool the sample to a liquid nitrogen low temperature, and then under the action of the first lifting platform, the first lifting platform drives the liquid nitrogen chamber and the heating disc to perform synchronous height lifting adjustment, so that the distance between the heating disc and the wafer holder is adjusted; when the liquid nitrogen chamber and the heating disc are spaced from the wafer support by a certain distance, a worker can more conveniently put a sample into the wafer support for treatment, and then the sample on the wafer support can be subjected to high-temperature treatment or cooling treatment by adjusting the height of the liquid nitrogen chamber and the height of the heating disc respectively.

Description

TECHNICAL FIELD

[0001] The utility model relates to vacuum coating technology field, specifically a kind of liquid nitrogen formula cooling sample stage for vacuum coating. BACKGROUND

[0002] As a kind of widely used in material science, microelectronics and optical coating field such as thin film deposition technology, its core is to use the plasma of magnetic field control to bombard target material, so that target atom or molecule is deposited on substrate to form thin film under high vacuum environment. In order to meet the needs of different applications, the sample stage used in magnetron sputtering equipment must have multifunctionality and flexibility to adapt to the change of various process parameters.

[0003] In the same type of magnetron sputtering sample stage currently used, mainly composed of the following modules: coupling rotation module is used to realize the uniformity of sample in sputtering process; Heating disc and sample holder movement module is responsible for providing necessary temperature conditions and adjusting the position of sample; Bias module is used to apply voltage to sample to enhance film quality; Installation module ensures that all components can be integrated together stably, and it is convenient for user to operate.

[0004] However, in the actual application process, it is found that after high temperature treatment of sample, it is usually cooled to chamber temperature naturally, this process not only takes a long time, but also due to lack of effective active cooling mechanism, it can not meet the requirements of some special process for rapid cooling or low temperature cooling sample. This limitation limits the application range of magnetron sputtering technology in some high-end manufacturing fields (such as semiconductor industry), especially in those occasions that require strict control of temperature change rate and final temperature. Therefore, a liquid nitrogen cooling sample stage for vacuum coating is proposed. UTILITY MODEL CONTENT

[0005] The utility model aims at providing a kind of liquid nitrogen formula cooling sample stage for vacuum coating to solve the problems raised in the above background technology.

[0006] To achieve the above object, the utility model provides the following technical scheme: a kind of liquid nitrogen formula cooling sample stage for vacuum coating, including rotating table, first lifting platform is installed on the rotating table, hollow sandwich pipe is installed on the first lifting platform, hollow shaft is driven to rotate and is equipped on the rotating table, the second lifting platform is equipped with the hollow shaft outside and is connected with rotating table, wafer cradle is equipped at the end of the hollow shaft away from rotating table, liquid nitrogen chamber and heating disc for treating sample are equipped at the end of the hollow sandwich pipe.

[0007] As a further scheme of the utility model: still include install on the first elevating platform vacuum four way, the vacuum four way has four flange interfaces, and four flange interfaces are equipped with bias voltage feedthrough, heating disc power feedthrough, liquid nitrogen injection feedthrough and hollow sandwich pipe respectively, still install temperature feedthrough at the flange interface of heating disc power feedthrough connection, the flange interface of being equipped with hollow sandwich pipe is connected with the first elevating platform.

[0008] As a further scheme of the utility model: the liquid nitrogen injection feedthrough includes two VCR straight pipes and the mounting flange of fixing two VCR straight pipes, the mounting flange is connected with the flange interface on the vacuum four way, and the end of two VCR straight pipes is equipped with the hose, and the end of each hose is equipped with VCR welding head away from VCR straight pipe.

[0009] As a further scheme of the utility model: the end of hollow sandwich pipe is equipped with fixed plate, and the fixed plate is detachable with liquid nitrogen chamber and heating disc.

[0010] As a further scheme of the utility model: the liquid nitrogen chamber includes liquid nitrogen bottom plate, and the liquid nitrogen bottom plate has the cavity of storing liquid nitrogen, and the liquid nitrogen bottom plate is also equipped with liquid nitrogen sealing plate blocking the cavity, and the liquid nitrogen sealing plate is equipped with multiple threaded guide columns connected with fixed plate, and the liquid nitrogen sealing plate is also equipped with liquid nitrogen inlet and liquid nitrogen outlet.

[0011] As a further scheme of the utility model: the heating disc is also equipped with multiple threaded guide columns connected with fixed plate, and the outside of heating disc is equipped with multiple layers of heat insulation disc, and multiple layers of heat insulation disc are located between heating disc and liquid nitrogen chamber, for realizing cold and hot isolation.

[0012] As a further scheme of the utility model: the outer diameter of hollow sandwich pipe is less than the inner diameter of hollow shaft, and the end of hollow sandwich pipe passes through hollow shaft radially.

[0013] As a further scheme of the utility model: the inside of hollow sandwich pipe is equipped with vacuum cable, thermocouple wire and VCR straight pipe.

[0014] As a further scheme of the utility model: the wafer bracket includes wafer support being arranged below heating disc, and the both sides of wafer support are fixed with vertical plate through screw, and the end of two vertical plates away from wafer support is connected with rotary disc, and the rotary disc is sleeved on the outside of hollow shaft.

[0015] As a further scheme of the utility model: the first elevating platform includes first linear module being fixed on rotary table and first driving motor driving first linear module first elevating block vertical movement, and the first elevating block is fixedly connected with hollow sandwich pipe, for driving hollow sandwich pipe vertical movement.

[0016] Compared with the prior art, the utility model discloses the beneficial effect is:

[0017] The present application sets up the liquid nitrogen chamber, can utilize the liquid nitrogen chamber to cool the sample to the liquid nitrogen low temperature after the sample carries out the high temperature processing, secondly under the action of the first lifting platform, the synchronous height of the first lifting platform drive liquid nitrogen chamber and heating disc is adjusted, and then the adjustment of wafer support spacing is realized, when liquid nitrogen chamber and heating disc have certain spacing, the staff is more convenient to put the sample into the wafer support and handle, and then the height of liquid nitrogen chamber and heating disc can be adjusted respectively to carry out the high temperature processing or cooling treatment to the sample on the wafer support. BRIEF DESCRIPTION OF DRAWINGS

[0018] Figure 1 It is whole structure schematic diagram of the liquid nitrogen type cooling sample table of the utility model;

[0019] Figure 2 It is vacuum four-way schematic diagram of the utility model;

[0020] Figure 3 It is local enlarged schematic diagram of the cooling sample table of the utility model;

[0021] Figure 4 It is whole structure schematic diagram of the liquid nitrogen chamber of the utility model;

[0022] Figure 5 It is whole structure schematic diagram of the liquid nitrogen injection feedthrough of the utility model;

[0023] Figure 6 It is the schematic diagram of the liquid nitrogen chamber and wafer support of the utility model;

[0024] Figure 7 It is the schematic diagram of the liquid nitrogen chamber and wafer support of the utility model;

[0025] In the drawing: 1, rotary table;2, first lifting platform;2-1, first linear module;2-2, first lifting block;2-3, first drive motor;3, hollow sandwich pipe;4, hollow shaft;5, second lifting platform;5-1, second linear module;5-2, second lifting block;5-3, second drive motor;6, wafer carrier;6-1, wafer support;6-2, stand plate;6-3, rotary disc;7, liquid nitrogen chamber;7-1, liquid nitrogen bottom plate;7-2, liquid nitrogen sealing plate;7-3, threaded guide column;7-4, liquid nitrogen inlet;7-5, liquid nitrogen outlet;8, heating disc;9, vacuum four-way;10, bias feedthrough;11, heating disc power feedthrough;12, liquid nitrogen injection feedthrough;12-1, VCR straight pipe;12-2, mounting flange;12-3, hose;12-4, VCR welding head;13, temperature feedthrough;14, fixed plate;15, heat insulation disc. DETAILED DESCRIPTION

[0026] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all the other embodiments obtained by those skilled in the art without creative labor fall within the protection scope of the present application.

[0027] Please refer to Figures 1-7The utility model discloses an embodiment of a kind of liquid nitrogen type cooling sample table for vacuum coating, including rotating table 1, first lifting platform 2 is installed on rotating table 1, hollow sandwich pipe 3 is installed on first lifting platform 2, first lifting platform 2 includes the first linear module 2-1 of being fixed on rotating table 1 and the first driving motor 2-3 of driving first linear module 2-1 first lifting block 2-2 vertical movement, first driving motor 2-3 is installed on first linear module 2-1, first lifting block 2-2 is fixedly connected with hollow sandwich pipe 3, for driving hollow sandwich pipe 3 vertical movement, when first lifting block 2-2 moves, it will drive fixed plate 14 that is connected with the end of hollow sandwich pipe 3 synchronous movement, rotating table 1 is equipped with hollow shaft 4 that is driven to rotate by it, the outer diameter of hollow sandwich pipe 3 is less than the inner diameter of hollow shaft 4, the end of hollow sandwich pipe 3 passes through hollow shaft 4 radially, hollow magnetic coupling structure is used between rotating table 1 and hollow shaft 4, hollow shaft 4 is rotated by rotating table 1 drive, this rotation principle is prior art, not too much repetition here, hollow shaft 4 outside is equipped with the second lifting platform 5 that is connected with rotating table 1, there is no direct contact between hollow shaft 4 and second lifting platform 5, second lifting platform 5 includes the second linear module 5-1 of fixed height, second linear module 5-1 is sleeved on the outside of hollow shaft 4, second linear module 5-1 is installed on second lifting block 5-2 with rotating table 1 fixed connection, second linear module 5-1 is also installed on the second driving motor 5-3 of driving second lifting block 5-2 vertical movement on second linear module 5-1, second lifting block 5-2 is lifted on second linear module 5-1 by second driving motor 5-3 drive simultaneously drive rotating table 1 synchronous lifting when this, rotating table 1 drives hollow shaft 4 to move, and hollow shaft 4 moves also will drive wafer carrier 6, liquid nitrogen chamber 7 and heating disc 8 synchronous movement, the end of hollow shaft 4 away from rotating table 1 is equipped with wafer carrier 6, wafer carrier 6 includes wafer 6-1 that is located below heating disc 8, both sides of wafer 6-1 are fixed with vertical plate 6-2 by screw, the end of two vertical plates 6-2 away from wafer 6-1 is connected with rotary disc 6-3, rotary disc 6-3 is fixedly sleeved on the outside of hollow shaft 4, when hollow shaft 4 rotates, also drive rotary disc 6-3 synchronous rotation, finally drive wafer 6-1 synchronous rotation, the end of hollow sandwich pipe 3 is equipped with liquid nitrogen chamber 7 and heating disc 8 for treating sample, when device is in use, by first lifting platform 2 work, adjust the distance between heating disc 8 and wafer carrier 6, it is convenient to send sample to wafer carrier 6, when second lifting platform 5 works, adjust the target base distance between wafer carrier 6 and cathode, when target base distance is adjusted in place, realize sample cleaning by bias device, after sample cleaning is completed, first lifting platform 2 works, complete distance adjustment between heating disc 8 and wafer carrier 6, after this, heating disc 8 opens, complete predetermined magnetron sputtering process.

[0028] Please refer to Figure 2In one embodiment, the preferred embodiment, a vacuum cross 9 is mounted on the first lifting platform 2, the vacuum cross 9 has four flange interfaces, and the four flange interfaces are respectively provided with a bias feedthrough 10, a heating disc power feedthrough 11, a liquid nitrogen injection feedthrough 12, and a hollow sandwich pipe 3. A temperature feedthrough 13 is also mounted at the flange interface connected with the heating disc power feedthrough 11. The flange interface provided with the hollow sandwich pipe 3 is adjacent to the first lifting platform 2. The bias feedthrough 10, the heating disc power feedthrough 11, the liquid nitrogen injection feedthrough 12, and the temperature feedthrough 13 are all fixed on the respective flange interfaces of the vacuum cross 9 through knife-edge flanges, and the fixation of the respective feedthroughs is completed by screwing the bolts. The bias feedthrough 10, the heating disc power feedthrough 11, and the temperature feedthrough 13 can be directly purchased according to the parameters, which are prior art.

[0029] Please refer to Figure 5 In one embodiment, the preferred embodiment, the liquid nitrogen injection feedthrough 12 includes two VCR straight pipes 12-1 and a mounting flange 12-2 for fixing the two VCR straight pipes 12-1. The mounting flange 12-2 is connected with the flange interface on the vacuum cross 9. The end of each VCR straight pipe 12-1 is provided with a hose 12-3. The end of each hose 12-3 away from the VCR straight pipe 12-1 is provided with a VCR welding head 12-4. The VCR welding heads 12-4 on the same VCR straight pipe 12-1 have the same function. Further, the number of VCR welding heads is four. The two VCR welding heads 12-4 at the same end are respectively connected with the liquid nitrogen inlet 7-4 and the liquid nitrogen outlet 7-5 on the liquid nitrogen sealing plate 7-2. The other two VCR welding heads 12-4 at the other end are connected with the external liquid nitrogen inlet and the external liquid nitrogen outlet. In this way, the external liquid nitrogen can flow into the cavity of the liquid nitrogen bottom plate 7-1 in the order of the external liquid nitrogen inlet, the VCR welding head 12-4, the hose 12-3, the VCR straight pipe 12-1, the hose 12-3, the VCR welding head 12-4, and the liquid nitrogen inlet 7-4, and then be discharged through the liquid nitrogen outlet 7-5 on the liquid nitrogen sealing plate 7-2. In this way, the circulation of the liquid nitrogen can be ensured when the liquid nitrogen is applied.

[0030] Please refer to Figures 3-4In an embodiment, the end of the hollow sandwich pipe 3 is provided with a fixing plate 14, which is detachably connected with the liquid nitrogen chamber 7 and the heating disc 8. The fixing plate 14 can provide stable balance support for the liquid nitrogen chamber 7 and the heating disc 8. The liquid nitrogen chamber 7 comprises a liquid nitrogen bottom plate 7-1, which has a cavity for storing liquid nitrogen. A liquid nitrogen sealing plate 7-2 is welded on the liquid nitrogen bottom plate 7-1 to seal the cavity. A plurality of threaded guide columns 7-3 are welded on the liquid nitrogen sealing plate 7-2 and connected with the fixing plate 14. The number of the threaded guide columns 7-3 is not limited. In an embodiment, the number of the threaded guide columns 7-3 is four. The end of the threaded guide column 7-3 connected with the fixing plate 14 is detachably connected. Specifically, the end of the threaded guide column 7-3 is provided with a thread, which penetrates through the fixing plate 14 and is sleeved with a threaded sleeve. On one hand, the threaded sleeve can ensure the balance of the liquid nitrogen chamber 7 after being combined with the fixing plate 14. On the other hand, the position of the threaded sleeve on the threaded guide column 7-3 can be adjusted to adjust the distance between the liquid nitrogen sealing plate 7-2 and the fixing plate 14. The liquid nitrogen sealing plate 7-2 is further provided with a liquid nitrogen inlet 7-4 and a liquid nitrogen outlet 7-5. The heating disc 8 is also provided with a plurality of threaded guide columns connected with the fixing plate 14. The threaded guide columns on the heating disc 8 have the same function and principle as the threaded guide columns 7-3. However, the number of the threaded guide columns on the heating disc 8 is three. The heating disc 8 is further provided with a plurality of heat insulation discs 15. In an embodiment, the number of the heat insulation discs 15 is three. The three heat insulation discs 15 are located between the heating disc 8 and the liquid nitrogen chamber 7 to realize cold and heat isolation.

[0031] Please refer to Figures 1-5 In an embodiment, the inside of the hollow sandwich pipe 3 is provided with a vacuum cable, a thermocouple wire and a VCR straight pipe 12-1. The outer surface of the vacuum cable and the thermocouple wire is wrapped with an insulating ceramic.

[0032] The working principle and use process of the utility model: when the sample table is used, the first driving motor 2-3 drives the first lifting block 2-2 on the first linear module 2-1 to do lifting movement, at this time, the hollow sandwich pipe 3 fixedly connected with the first lifting block 2-2 is driven by the fixed plate 14 to adjust the height of the heating disc 8, so that the effect of adjusting the distance between the heating disc 8 and the wafer support 6-1 is achieved, when there is a gap between the two, the sample is transported to the wafer support 6-1, then the second driving motor 5-3 drives the second lifting block 5-2 on the second linear module 5-1 to do lifting movement, at this time, the rotary table 1 fixedly connected with the second lifting block 5-2 drives the wafer support frame 6, the liquid nitrogen chamber 7 and the heating disc 8 to move synchronously, so that the target base distance between the wafer support frame 6 and the cathode is adjusted, after the target base distance is adjusted in place, the sample is cleaned through the bias device, after the sample cleaning is completed, the first lifting platform 2 works, the distance adjustment between the heating disc 8 and the wafer support 6-1 is completed, then the heating disc 8 is opened, the predetermined magnetron sputtering process is completed, finally, after the process is completed, the first lifting platform 2 continues to work, the liquid nitrogen chamber 7 is attached to the wafer support 6-1, and the sample is rapidly cooled to liquid nitrogen low temperature.

[0033] Although the present specification is described in terms of embodiments, not every embodiment contains only one independent technical solution, and the description of the specification is only for the sake of clarity, and those skilled in the art should consider the specification as a whole, and the technical solutions in each embodiment can be combined appropriately to form other embodiments that those skilled in the art can understand.

[0034] Therefore, the above only describes the preferred embodiments of the present application, and is not intended to limit the scope of the present application; that is, various equivalent transformations made within the scope of the claims of the present application are within the protection scope of the claims of the present application.

Claims

1. A liquid nitrogen cooled sample stage for vacuum coating comprising a rotary stage (1), characterized in that, A first lifting platform (2) is installed on the rotating table (1), and a hollow sandwich pipe (3) is installed on the first lifting platform (2); a hollow shaft (4) driven to rotate by the rotating table (1) is arranged on the rotating table (1); a second lifting platform (5) connected with the rotating table (1) is arranged outside the hollow shaft (4); and a wafer bracket (6) is arranged at the end of the hollow shaft (4) away from the rotating table (1); and a liquid nitrogen chamber (7) and a heating disc (8) for processing samples are arranged at the end of the hollow sandwich pipe (3). The liquid nitrogen chamber (7) comprises a liquid nitrogen bottom plate (7-1) provided with a cavity for storing liquid nitrogen; a liquid nitrogen sealing plate (7-2) for sealing the cavity is installed on the liquid nitrogen bottom plate (7-1); a plurality of threaded guide columns (7-3) connected with a fixing plate (14) are arranged on the liquid nitrogen sealing plate (7-2); and a liquid nitrogen inlet (7-4) and a liquid nitrogen outlet (7-5) are arranged on the liquid nitrogen sealing plate (7-2).

2. The liquid nitrogen cooled sample stage for vacuum coating according to claim 1, characterized in that, A vacuum four-way valve (9) is installed on the first lifting platform (2); the vacuum four-way valve (9) has four flange interfaces; a bias feedthrough (10), a heating disc power feedthrough (11), a liquid nitrogen injection feedthrough (12) and the hollow sandwich pipe (3) are arranged in the four flange interfaces, respectively; a temperature feedthrough (13) is installed on the flange interface connected with the heating disc power feedthrough (11); and the flange interface provided with the hollow sandwich pipe (3) is connected with the first lifting platform (2).

3. The liquid nitrogen cooled sample stage for vacuum coating according to claim 2, wherein, The liquid nitrogen injection feedthrough (12) comprises two VCR straight pipes (12-1) and a mounting flange (12-2) for fixing the two VCR straight pipes (12-1); the mounting flange (12-2) is connected with the flange interface on the vacuum four-way valve (9); a hose (12-3) is installed at the end of each VCR straight pipe (12-1); and a VCR welding head (12-4) is installed at the end of each hose (12-3) away from the VCR straight pipe (12-1).

4. The liquid nitrogen cooled sample stage for vacuum coating according to claim 1, wherein, A fixing plate (14) is arranged at the end of the hollow sandwich pipe (3); and the fixing plate (14) is detachably connected with the liquid nitrogen chamber (7) and the heating disc (8).

5. The liquid nitrogen cooled sample stage for vacuum coating according to claim 4, characterized in that, A plurality of threaded guide columns connected with the fixing plate (14) are also installed on the heating disc (8); a plurality of layers of heat insulation discs (15) are arranged outside the heating disc (8); and the plurality of layers of heat insulation discs (15) are arranged between the heating disc (8) and the liquid nitrogen chamber (7) to realize cold and heat insulation.

6. The liquid nitrogen cooled sample stage for vacuum coating according to claim 3, wherein The outer diameter of the hollow sandwich pipe (3) is smaller than the inner diameter of the hollow shaft (4); and the end of the hollow sandwich pipe (3) penetrates the hollow shaft (4) in the radial direction.

7. The liquid nitrogen cooled sample stage for vacuum coating according to claim 6, characterized in that, A vacuum cable, a thermocouple wire and a VCR straight pipe (12-1) are arranged in the hollow sandwich pipe (3).

8. The liquid nitrogen cooled sample stage for vacuum coating according to claim 1, wherein, The wafer bracket (6) comprises a wafer support (6-1) arranged below the heating disc (8); vertical plates (6-2) are fixed on both sides of the wafer support (6-1) by screws; a rotating disc (6-3) is connected with the ends of the two vertical plates (6-2) away from the wafer support (6-1); and the rotating disc (6-3) is arranged outside the hollow shaft (4).

9. The liquid nitrogen cooled sample stage for vacuum coating according to claim 1, wherein, The first lifting platform (2) comprises a first linear module (2-1) fixed on the rotating table (1) and a first driving motor (2-3) for driving a first lifting block (2-2) on the first linear module (2-1) to move vertically, wherein the first lifting block (2-2) is fixedly connected with the hollow sandwich pipe (3) and used for driving the hollow sandwich pipe (3) to move vertically.

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