Multi-arc ion plating device

Abstract

The present application relates to the field of vacuum coating technology, and in particular to a multi-arc ion coating device. The multi-arc ion coating device includes a coating module, which includes a vacuum chamber, a coating arc source and an etching arc source. The coating arc source and the etching arc source are both connected to the vacuum chamber, and the interior of the vacuum chamber is used to introduce reaction gas. The multi-arc ion coating device uses an etching assembly composed of an etching arc source and an anode assembly to etch the surface of a workpiece, and then deposits a coating on the workpiece through the coating arc source, which can improve the bonding force between the outer surface of the workpiece and the film layer, so that the workpiece surface obtains a dense, high-hardness, high-wear-resistant high-performance functional film layer to cope with various complex working conditions and process requirements.

Description

Technical Field

[0001] The present application relates to the field of vacuum coating technology, and in particular to a multi-arc ion coating device. Background Art

[0002] Vacuum ion plating refers to a process in which a film material is evaporated or sputtered using an evaporation source or sputtering target in a vacuum atmosphere. A portion of the evaporated or sputtered particles are ionized into metal ions in the gas discharge space. These particles are deposited on the substrate under the action of the electric field to form a thin film.

[0003] However, current vacuum ion plating machines generally have single functions and unstable coating quality, and are particularly prone to coating quality defects such as poor film adhesion and film cracking. Summary of the invention

[0004] The purpose of the present application is to provide a multi-arc ion plating device to solve, to a certain extent, the technical problems in the prior art that the vacuum coating machine has a single function and is prone to coating quality defects such as film cracking and poor film bonding.

[0005] The present application provides a multi-arc ion plating device, comprising a plating module, wherein the plating module comprises a vacuum chamber, a plating arc source and an etching component, wherein the etching component comprises an etching arc source, a baffle and an anode component;

[0006] The coating arc source and the etching arc source are both connected to the vacuum chamber, the anode assembly is arranged inside the vacuum chamber corresponding to the etching arc source, the baffle is arranged between the etching arc source and the anode assembly, and the interior of the vacuum chamber is used to pass reaction gas.

[0007] In the above technical solution, further, the multi-arc ion plating device also includes:

[0008] A vacuum pumping module, the vacuum pumping module is connected to the vacuum chamber to perform a vacuum pumping process on the vacuum chamber;

[0009] A cooling module, the cooling module being capable of supplying cooling fluid to the vacuum module and the coating module;

[0010] A power module, which can supply power to the coating module, the vacuum module and the cooling module;

[0011] The electric control module is electrically connected to the power module, the cooling module, the vacuum module and the coating module, and the electric control module can coordinately control the power module, the cooling module, the vacuum module and the coating module.

[0012] In any of the above technical solutions, further, the vacuum module includes an air pump group and a control valve group;

[0013] The control valve group, the cooling module and the coating module are integrated into a first structural part, and the power supply module, the vacuum pump group and the electric control module are integrated into a second structural part;

[0014] The control valve group is connected to the coating module, and the control valve group is detachably connected to the vacuum pump group, so that the first structure part is detachably connected to the second structure part and the vacuum pump group is connected to the vacuum chamber through the control valve group.

[0015] In any of the above technical solutions, further, the control valve group is arranged on the side of the coating module along the first direction, and the cooling module is arranged on the side of the coating module along the second direction;

[0016] The power supply module and the electric control module are respectively arranged on both sides of the air pump group along the second direction;

[0017] The second structure portion is arranged on a side of the first structure portion along the first direction.

[0018] In any of the above technical solutions, further, the etching assembly includes at least two etching arc sources, at least two etching arc sources form an etching arc source group, and at least three coating arc sources form a coating arc source group;

[0019] The number of the etching arc source groups and the number of the coating arc source groups are both at least one group;

[0020] The coating module further includes a reaction gas supply pipe, one end of which is used to connect to a gas source, and the other end of which extends into the interior of the vacuum chamber;

[0021] Each of the coating arc sources and each of the etching arc sources is provided with the reaction gas supply pipe in a one-to-one correspondence.

[0022] In any of the above technical solutions, further, the vacuum chamber includes a side body, a top cover plate and a bottom cover plate, the side body includes eight side walls connected in an octagonal shape, and the top cover plate and the bottom cover plate are respectively sealed on the top opening and the bottom opening of the side body;

[0023] The etching arc source group includes two etching arc sources, and each etching arc source group is arranged on one of the side walls of the side body;

[0024] The coating arc source group includes three coating arc sources, and the two coating arc sources and another coating arc source of each coating arc source group are respectively arranged on the two side walls of the side body;

[0025] A side wall of the side body is also provided with a vacuum exhaust port, and the control valve group is connected to the vacuum chamber via the vacuum exhaust port.

[0026] In any of the above technical solutions, further, the side body includes a door body section and a main body section that can be opened and closed, the door body section includes three sequentially connected side walls, and the main body section includes the remaining five sequentially connected side walls;

[0027] The number of the etching arc source groups is one group, the number of the coating arc source groups is three, and the three coating arc source groups are respectively a first coating arc source group, a second coating arc source group and a third coating arc source group;

[0028] The etching arc source group is arranged on the side wall located in the middle of the door body section, and the three coating arc sources of the first coating arc source group are respectively arranged on the other two side walls of the door body section;

[0029] The vacuum exhaust port is opened on the side wall of the main section directly opposite to the etching arc source, and the second coating arc source and the third coating arc source are respectively arranged on the two side walls on both sides of the vacuum exhaust port on the main section.

[0030] In any of the above technical solutions, further, the multi-arc ion plating device also includes a suspension bracket;

[0031] The suspension bracket is arranged on the bottom cover plate, the top end of the anode assembly is connected to the top cover plate, the anode assembly and the etching arc source are respectively connected to the anode and cathode of the power module, and the anode assembly is located between the suspension bracket and the etching arc source;

[0032] The multi-arc ion plating device also includes a biasing mechanism connected to the cathode of the power module;

[0033] The biasing mechanism is arranged on the bottom cover plate, and the biasing mechanism is electrically connected to the suspension bracket so that the workpiece on the suspension bracket is negatively charged.

[0034] In any of the above technical solutions, further, the suspension bracket includes a revolving plate, a primary sun gear, a primary planetary gear, a transmission plate and a plurality of suspension fixtures;

[0035] The primary sun gear is arranged on the bottom cover plate, the transmission disc is rotatably arranged at intervals on the inner side of the primary sun gear, and the revolving disc is arranged on the top of the transmission disc, so that the revolving disc and the transmission disc can rotate synchronously;

[0036] A primary annular inner tooth is provided on the bottom surface of the revolving disk, the primary sun gear is located on the inner side of the primary annular inner tooth, a plurality of primary planetary gears are meshed between the primary annular inner tooth and the outer teeth of the primary sun gear, and the bottom ends of a plurality of the suspension fixtures pass through the revolving disk one by one and are coaxially connected to the plurality of the primary planetary gears, so that the plurality of the suspension fixtures can be rotatably erected on the revolving disk.

[0037] In any of the above technical solutions, further, the hanging jig includes a jig base and a plurality of hangers, and the plurality of hangers are rotatably arranged on the jig base;

[0038] A plurality of support columns are vertically arranged on the public rotating disk, and one support column is arranged between every two adjacent suspension fixtures;

[0039] Wherein, the suspension fixture further comprises a secondary sun gear, a lever and a plurality of secondary planetary gears, the fixture base is formed with a secondary annular inner gear and is coaxially connected to the primary planetary gear, the secondary sun gear is arranged at intervals on the inner side of the secondary annular inner gear, a plurality of the secondary planetary gears are meshed between the secondary sun gear and the secondary annular inner gear, one end of the lever is connected to the secondary sun gear, and the other end of the lever can be abutted against the support column on the side of the suspension fixture;

[0040] Alternatively, the suspension jig includes a jig base, the jig base is coaxially connected to the primary planetary gear, a plurality of hangers are rotatably connected to the jig base, an outer surface of the hanger is provided with circumferential external teeth, and the suspension jig also includes a paddle, one end of the paddle is connected to the support column, and the other end of the paddle is in contact with the circumferential external teeth.

[0041] In any of the above technical solutions, further, the multi-arc ion plating device also includes a positioning assembly, and the positioning assembly includes a rotating drive member, a rotating shaft and a positioning plate;

[0042] The positioning plate is arranged on the bottom cover plate, a plurality of positioning pins are arranged on the positioning plate, and the primary sun gear is detachably connected to the positioning plate through the plurality of positioning pins;

[0043] The rotary drive member is arranged on the bottom side of the bottom cover plate, the bottom end of the rotating shaft is connected to the rotary drive member, and the top end of the rotating shaft passes through the bottom cover plate and the positioning plate and extends into the interior of the vacuum chamber;

[0044] The transmission disc is detachably connected to the top end of the rotating shaft, so that the rotating driving member can drive the suspension bracket through the rotating shaft and the transmission disc;

[0045] The bias mechanism includes insulation protection, lead-in electrodes and a terminal block;

[0046] The insulating protection passes through the bottom cover plate, the introduction electrode is arranged in the insulating protection, one end of the introduction electrode is connected to the negative pressure of the power module on the bottom side of the bottom cover plate, and the other end of the introduction electrode is connected to the positioning plate through the wiring board.

[0047] In any of the above technical solutions, further, the coating arc source and the etching arc source both include a fixed magnetic field component, a movable magnetic field component, an adjustment component and an arc target, the arc target is connected to the vacuum chamber and is located inside the vacuum chamber, and the arc target is connected to the cathode of the power module;

[0048] The fixed magnetic field component is arranged outside the vacuum chamber corresponding to the arc target, and the movable magnetic field component is movably connected to the fixed magnetic field component through the adjustment component to generate a variable magnetic field and make the variable magnetic field act on the target surface of the arc target;

[0049] The multi-arc ion plating device further comprises an insulating connection component, through which the fixed magnetic field component and the arc target are both installed in the vacuum chamber.

[0050] In any of the above technical solutions, further, the fixed magnetic field assembly includes a mounting seat arranged on the insulating connection assembly and a fixed magnetic member arranged in the mounting seat;

[0051] The movable magnetic field assembly comprises a frame and a movable magnetic component arranged on the frame, the frame is provided with a mounting hole, and the frame is movably sleeved outside the mounting seat through the mounting hole;

[0052] The coating arc source and the etching arc source both further include an outer plate;

[0053] The outer plate and the insulating connection assembly are relatively fixedly arranged, and the adjustment assembly includes a fixing sleeve and an adjustment sleeve, the adjustment sleeve is screwed to the outer plate, one end of the fixing sleeve is screwed to the adjustment sleeve, and the other end of the fixing sleeve is connected to the frame.

[0054] In any of the above technical solutions, further, the target material of the arc target of the etching arc source is a single target material, and the target material of the arc target of the coating arc source is a single target material, a binary target material, a ternary target material or a multi-element arc target;

[0055] And / or, the active magnetic component of the etching arc source includes a first active magnetic component, and the active magnetic component of the coating arc source includes a second active magnetic component and a third active magnetic component, and at least one of the second active magnetic component and the third active magnetic component is an electromagnetic coil.

[0056] In any of the above technical solutions, further, the outer wall of the vacuum chamber is provided with a first cooling channel and a second cooling channel;

[0057] The first cooling channel extends between the bottom end and the top end of the vacuum chamber, and the length of the first cooling channel is 0.1-2 times the height of the vacuum chamber;

[0058] The second cooling channel extends in a curved shape.

[0059] In any of the above technical solutions, further, the control valve group includes a valve body, the valve body is provided with an air inlet and a plurality of air extraction channels, and each of the air extraction channels is connected between the air inlet and the air outlet;

[0060] The valve body is connected to the vacuum pumping port of the vacuum chamber through the air inlet, and the rough pump assembly is connected between the air inlet and the vacuum pumping port;

[0061] The valve body is further provided with a fine extraction outlet, the fine extraction outlet is communicated with the air extraction channel, and the fine extraction outlet is located between the air inlet and the air outlet;

[0062] The control valve group also includes a plugging component and an opening and closing drive component. The plugging component can be opened and closed to cover the fine extraction outlet. The opening and closing drive component is connected to the plugging component and can drive the plugging component to open and close the fine extraction outlet.

[0063] In any of the above technical solutions, further, the opening and closing drive assembly includes a driving member and an actuator rod, the driving assembly is arranged outside the valve body, one end of the actuator rod is connected to the driving assembly, and the other end of the actuator rod extends into the air extraction channel and is connected to the blocking assembly, and the driving assembly drives the actuator rod to push or pull the blocking assembly relative to the fine extraction outlet, so that the blocking assembly closes or opens the fine extraction outlet;

[0064] The vacuum pump assembly comprises a roughing pump assembly and a finishing pump assembly;

[0065] The roughing pump assembly comprises a first direct-connected pump, a Roots pump, a first filter and a first connecting pipe group, wherein the first filter, the Roots pump and the first direct-connected pump are sequentially connected through the first connecting pipe group, and an inlet end of the first filter is connected to the air outlet through the first connecting pipe group;

[0066] The fine pump assembly comprises a second direct-connected pump, a second connecting pipe set and a molecular pump, wherein the second direct-connected pump is connected to the molecular pump through the second connecting pipe set, and the molecular pump is connected to the fine pump outlet;

[0067] The first connecting pipe group and the second connecting pipe group are both provided with leak detection holes, and the leak detection holes are used to install leak detection components.

[0068] In any of the above technical solutions, further, the cooling module includes a first liquid inlet pipeline, a first liquid outlet pipeline, a second liquid inlet pipeline, a second liquid outlet pipeline, a first liquid inlet joint, a first liquid outlet joint, a second liquid inlet structure and a second liquid outlet joint;

[0069] The first liquid inlet pipeline is provided with a plurality of first liquid inlet joints, so as to deliver the first cooling fluid to the temperature-prone component through the plurality of first liquid inlet joints, and the first liquid outlet pipeline is provided with a plurality of first liquid outlet joints, so as to allow the first cooling fluid in the temperature-prone component to flow back to the first liquid outlet pipeline through the plurality of first liquid outlet joints;

[0070] The second liquid inlet pipeline is provided with a plurality of second liquid inlet joints, so as to deliver the second cooling fluid to the temperature-prone component through the plurality of second liquid inlet joints, and the second liquid outlet pipeline is provided with a plurality of second liquid outlet joints, so as to allow the second cooling fluid in the temperature-prone component to flow back to the second liquid outlet pipeline through the plurality of second liquid outlet joints;

[0071] The temperature of the first cooling fluid is lower than the temperature of the second cooling fluid.

[0072] In any of the above technical solutions, further, the first liquid inlet pipeline, the first liquid outlet pipeline, the second liquid inlet pipeline and the second liquid outlet pipeline each include a first end and a second end;

[0073] The first end of the first liquid inlet pipeline is used to pass the first cooling fluid, the first end of the second liquid inlet pipeline is used to connect the second cooling fluid, and the second end of the first liquid inlet pipeline is connected to the second end of the second liquid inlet pipeline;

[0074] The cooling module further includes a first switching valve and a second switching valve, wherein the first switching valve is disposed at the second end of the first liquid inlet pipeline, the second switching valve is disposed in the first liquid inlet pipeline and is spaced apart from the first end of the first liquid inlet pipeline, and a plurality of the first liquid inlet joints for connecting the inlet of the molecular pump and the inlet of the Roots pump are disposed between the second switching valve and the first end of the first liquid inlet pipeline;

[0075] The first end of the first liquid outlet pipeline is used to discharge the first cooling fluid, the first end of the second liquid outlet pipeline is used to discharge the second cooling fluid, and the second end of the first liquid outlet pipeline is connected to the second end of the second liquid outlet pipeline;

[0076] The cooling module further includes a third switching valve and a fourth switching valve, wherein the third switching valve is disposed at the second end of the first liquid outlet pipeline, the fourth switching valve is disposed at the first liquid outlet pipeline and is spaced apart from the first end of the first liquid outlet pipeline, and a plurality of the first liquid outlet joints for connecting the outlet of the molecular pump and the outlet of the Roots pump are disposed between the fourth switching valve and the first end of the first liquid outlet pipeline;

[0077] And / or, the cooling module further includes a first pressure regulating pipeline, the first pressure regulating pipeline includes a first pressure regulating pipe group and a first pressure regulating member, the inlet end of the first pressure regulating member is connected to the first liquid inlet pipeline, and the outlet end of the first pressure regulating member is connected to the first liquid outlet pipeline through the first pressure regulating pipe group;

[0078] The cooling module further includes a second pressure regulating pipeline, the second pressure regulating pipeline includes a second pressure regulating pipe group and a second pressure regulating member, the inlet end of the second pressure regulating member is connected to the second liquid inlet pipeline, and the outlet end of the second pressure regulating member is connected to the second liquid outlet pipeline;

[0079] And / or, the cooling module also includes a pressure relief pipeline, which includes four pressure relief valves and a pressure relief pipe group, the inlets of the four pressure relief valves are respectively connected to the first liquid inlet pipeline, the first liquid outlet pipeline, the second liquid inlet pipeline and the second liquid outlet pipeline, and the pressure relief pipe group connects the outlets of the four pressure relief valves with the outside world.

[0080] In any of the above technical solutions, further, the power supply module includes a first power supply for supplying power to the coating arc source, a second power supply for supplying power to the etching arc source, a third power supply for supplying power to the bias mechanism, and a fourth power supply for supplying power to the electromagnetic coil;

[0081] The electric control module includes a main control console, and the main control console is arranged on the side of the vacuum chamber along the second direction.

[0082] Compared with the prior art, the beneficial effects of this application are:

[0083] The multi-arc ion plating device provided by the present application includes a plating module, and the plating module includes a vacuum chamber, a plating arc source and an etching arc source. The interior of the vacuum chamber is used to introduce a reaction gas on the basis of a vacuum environment, and the electrons are sputtered and bombarded on the surface of the workpiece by the etching arc source to achieve the purpose of surface etching treatment of the workpiece, and the plating arc source is used to deposit a coating on the surface of the workpiece. Thus, the multi-arc ion plating device uses an etching arc source to etch the surface of the workpiece, and then deposits a coating on the surface of the workpiece by the plating arc source, especially the deposition and plating of the base film layer and the functional film layer can be achieved, and the bonding force between the outer surface of the workpiece and the film layer can be improved, so as to obtain a dense, high-hardness, high-wear-resistant high-performance functional film layer on the surface of the workpiece to cope with various complex working conditions and process requirements. Among them, the hardness of the film layer is at least not less than Vickers hardness (HV) 2200, and can even reach Vickers hardness (HV) 3700 and above. BRIEF DESCRIPTION OF THE DRAWINGS

[0084] In order to more clearly illustrate the specific implementation methods of the present application or the technical solutions in the prior art, the drawings required for use in the specific implementation methods or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are some implementation methods of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0085] Figure 1 A schematic diagram of the structure of a multi-arc ion plating device provided in an embodiment of the present application;

[0086] Figure 2 A schematic diagram of the structure of a vacuum chamber provided in an embodiment of the present application;

[0087] Figure 3 A schematic diagram of the structure of the side body of the multi-arc ion plating device provided in an embodiment of the present application;

[0088] Figure 4 A schematic diagram of the structure of a coating arc source provided in an embodiment of the present application;

[0089] Figure 5 A schematic diagram of the structure of the bottom cover provided in an embodiment of the present application;

[0090] Figure 6 A schematic diagram of the structure of the suspension bracket provided in an embodiment of the present application;

[0091] Figure 7 A schematic diagram of the structure of a suspension fixture for the suspension bracket provided in an embodiment of the present application;

[0092] Figure 8 A first structural schematic diagram of another suspension fixture of the suspension bracket provided in an embodiment of the present application;

[0093] Fig. 9 A second structural schematic diagram of another suspension fixture of the suspension bracket provided in an embodiment of the present application;

[0094] Fig.10 A schematic diagram of the structure of the biasing mechanism provided in an embodiment of the present application;

[0095] Fig.11 A first structural schematic diagram of a vacuum pumping module provided in an embodiment of the present application;

[0096] Fig.12 A first structural schematic diagram of a cooling module provided in an embodiment of the present application;

[0097] Fig.13 for Fig.12 A local enlarged view at point A;

[0098] Fig.14 A second structural schematic diagram of the vacuum module provided in an embodiment of the present application.

[0099] Reference numerals:

[0100] 1- coating module; 10- vacuum chamber; 100- door section; 101- main section; 102- second cooling channel; 103- exhaust port; 104- side wall; 105- first cooling channel; 106- bottom cover; 11- anode seat; 12- coating arc source; 120- adjustment sleeve; 121- fixed sleeve; 122- target fixing flange; 123- insulating spacer; 124- insulating ring; 125- coating arc target; 126- shielding cover; 127- fixed magnetic field assembly; 1270- mounting seat; 1271- first magnetic component; 128- movable magnetic field assembly; 129-electrode; 130-outer plate; 131-water cooling seat assembly; 13-etching arc source group; 14-suspension bracket; 1410-first-stage sun gear; 1411-first-stage planetary gear; 1412-revolving disk; 1413-transmission disk; 142-suspension fixture; 1420-fixture base; 1421-hanging fixture; 1422-second-stage sun gear; 1423-shift lever; 1424-second-stage planetary gear; 1425-first shaft sleeve; 1426-circumferential outer teeth; 1427-shifting piece; 1428-second shaft sleeve; 1429-stop bolt; 143-support column; 144-cage; 145-photoelectric sensor; 1450-photoelectric transmitting unit; 1451-photoelectric receiving unit; 146-sensing plate; 15-biasing mechanism; 150-insulating seat; 151-glass tube; 152-introduction electrode; 153-terminal board; 154-fastening conductive bolt; 16-first coating arc source group; 17-second coating arc source group; 18-third coating arc source group; 19-positioning assembly; 190-motor; 191-motor synchronous wheel; 192- Synchronous belt; 193-magnetic fluid synchronous wheel; 194-magnetic fluid; 195-positioning plate; 196-positioning pin; 2-vacuum pump module; 20-control valve group; 200-valve body; 201-air extraction channel; 202-blocking assembly; 203-driving component; 204-actuator; 21-rough pump assembly; 210-first direct-connected pump; 211-Roots pump; 212-first filter; 213-first connecting pipe group; 22-fine pump assembly; 220-molecular pump; 221-second connecting pipe group; 222-second direct-connected pump; 23-leak detection hole; 24-leak detection component; 3-cooling module; 30-first liquid inlet pipeline; 300-first liquid inlet joint; 3000-first specific liquid inlet joint; 31-first liquid outlet pipeline; 310-first liquid outlet joint; 3100- First specific liquid outlet joint; 32-second liquid inlet pipeline; 320-second liquid inlet joint; 33-second liquid outlet pipeline; 330-second liquid outlet joint; 351-first switching valve; 352-second switching valve; 353-third switching valve; 354-fourth switching valve; 360-first pressure regulating pipe group; 361-first pressure regulating member; 362-second pressure regulating pipe group; 363-second pressure regulating member; 370-pressure relief valve; 371-pressure relief pipe group; 380-temperature detection member;381-flow detection component; 382-pressure detection component; 4-power module; 5-electric control module; 50-master console. ; DETAILED DESCRIPTION

[0101] The technical solution of the present invention will be described clearly and completely below in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0102] In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", etc., indicating the orientation or positional relationship, are based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present invention and simplifying the description, rather than indicating or implying that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as limiting the present invention. In addition, the terms "first", "second", and "third" are used for descriptive purposes only, and cannot be understood as indicating or implying relative importance.

[0103] In the description of the present invention, it should be noted that, unless otherwise clearly specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection, or it can be indirectly connected through an intermediate medium, or it can be the internal communication of two components. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0104] See also Figures 1 to 14 As shown, an embodiment of the present application provides a multi-arc ion plating device to implement multi-arc ion plating on a workpiece.

[0105] The multi-arc ion plating device comprises a plating module 1 , a vacuum pumping module 2 , a cooling module 3 , a power supply module 4 , an electric control module 5 and a suspension bracket 14 .

[0106] The coating module 1 includes a vacuum chamber 10, a coating arc source 12 and an etching assembly, and the etching assembly includes an etching arc source, a baffle and an anode assembly. The coating arc source 12 and the etching arc source are both connected to the vacuum chamber 10, the anode assembly is arranged inside the vacuum chamber 10 corresponding to the etching arc source, the baffle is arranged between the etching arc source and the anode assembly, the interior of the vacuum chamber 10 is used to introduce reaction gas, the etching arc source, the baffle and the anode assembly of the etching assembly cooperate to etch the surface of the workpiece, and the coating arc source 12 is used to coat the surface of the workpiece.

[0107] The suspension bracket 14 is disposed in the vacuum chamber 10 and is used to suspend the workpiece.

[0108] The vacuum pumping module 2 is connected to the vacuum chamber 10 to perform a vacuum pumping process on the vacuum chamber 10 .

[0109] The cooling module 3 can supply cooling fluid to the vacuum module 2 and the coating module 1 .

[0110] The power module 4 can supply power to the coating module 1 , the vacuum module 2 and the cooling module 3 .

[0111] The electric control module 5 is electrically connected to the power module 4, the cooling module 3, the vacuum module 2 and the coating module 1 to coordinate the electric control of the power module 4, the cooling module 3, the vacuum module 2 and the coating module 1, so as to realize the overall automatic control of the multi-arc ion plating device, and to monitor and automatically regulate the coating process and coating status in real time.

[0112] Hereinafter, the above components of the multi-arc ion plating device will be described in detail.

[0113] In the optional solution of this embodiment, the specific implementation of the coating module 1 is first described.

[0114] A coating cavity is formed inside the vacuum chamber 10, and the coating cavity is used to introduce reaction gases. Specifically, the vacuum chamber 10 is first evacuated by a vacuum pumping mechanism to form a vacuum environment in the vacuum chamber 10, and then the reaction gas is filled into the vacuum chamber 10 by a charging mechanism. The type of reaction gas can be selected according to the coating process. For example, argon, nitrogen or acetylene can be introduced into the coating cavity.

[0115] Regarding the structure of the vacuum chamber 10, in an optional scheme of the present embodiment, the vacuum chamber 10 includes a top cover plate (not shown in the figure), a bottom cover plate 106 and a side body, the side body includes eight side walls 104 connected in an octagon, the top cover plate and the bottom cover plate 106 respectively cover the top opening and the bottom opening of the side body, and the cross-sectional area of ​​the side body is set to an octagon, which is convenient for installing the coating arc target 125 and the etching arc target on the side body.

[0116] In order to control the temperature of the vacuum chamber 10 itself and the coating space inside it, a first cooling channel 105 and a second cooling channel 102 are opened on the outer wall of the vacuum chamber 10 .

[0117] The first cooling channel 105 extends between the bottom and top of the side wall 104, and the length of the first cooling channel 105 is 0.1-2 times the height of the vacuum chamber 10. Specifically, the first cooling channel 105 extends entirely along a straight line or only partially extends in a slightly curved shape. For another example, the first cooling channel 105 extends in a substantially U-shaped or substantially W-shaped shape. It is suitable for areas with higher temperatures, and can achieve fast in and out of the cooling fluid, thereby improving the cooling effect.

[0118] Furthermore, in order to reduce the probability of retention and deposition of the cooling fluid therein, the flow cross-section of the first cooling channel 105 is set to a "narrower and higher" form. Specifically, the height and width of the flow cross-section of the first cooling channel 105 are both set to 5mm-20mm, for example 5mm, 10mm, 15mm or 20mm.

[0119] The second cooling channel 102 extends in a curved shape, is suitable for areas where the temperature is easy to control, and can achieve single-time cooling of a large area.

[0120] Regarding the installation structure of the coating arc source 12 and the etching arc source relative to the vacuum chamber 10, in an optional scheme of this embodiment, the number of coating arc sources 12 and the number of etching arc sources are both multiple, and multiple coating arc sources 12 cooperate to perform coating operations, and multiple etching arc sources cooperate to perform etching operations, so as to improve the coating effect and the etching effect.

[0121] In order to ensure that there is sufficient reaction gas near the coating arc source 12 and the etching arc source, thereby improving the coating quality and the etching quality, the coating module 1 also includes a reaction gas supply pipe, one end of the reaction gas supply pipe is used to connect to the gas source, and the other end of the reaction gas supply pipe extends into the interior of the vacuum chamber 10.

[0122] Each coating arc source 12 and each etching arc source is provided with a reaction gas supply pipe in a one-to-one correspondence.

[0123] Optionally, the inlet ends of the plurality of reaction gas supply pipes are used to communicate with the charging mechanism through a gas supply distribution pipeline.

[0124] In this embodiment, the etching component includes at least two etching arc sources, and the at least two etching arc sources form an etching arc source group 13. The number of etching arc source groups 13 is at least one group, that is, the etching component includes two, three or more etching arc sources, and at least two etching arc sources in the etching component form an etching arc source group 13. Further, the number of etching arc source groups 13 in the etching component is one group, two groups, three groups or more groups.

[0125] At least three coated arc sources 12 form a coated arc source group, and the number of coated arc source groups is at least one group, that is, the coated arc source group includes two, three or more coated arc sources 12. Further, the number of coated arc source groups is one, two, three or more groups.

[0126] Wherein, when there are multiple etching arc source groups 13 and coating arc source groups, the multiple etching arc source groups 13 can be used individually or in combination, and the multiple coating arc source groups can be used individually or in combination.

[0127] In this embodiment, optionally, the etching arc source group 13 includes two etching arc sources, and each etching arc source group 13 is disposed on a side wall 104 of the side body.

[0128] The coated arc source group includes three coated arc sources 12, and the two coated arc sources 12 of each coated arc source group and another coated arc source 12 are respectively arranged on the two side walls 104 of the side body. Specifically, the two coated arc sources 12 of each coated arc source group and another coated arc source 12 are respectively arranged on two adjacent side walls 104 of the side body, or there is a side wall 104 between the two side walls 104 where the two coated arc sources 12 of each coated arc source group and another coated arc source 12 are located.

[0129] Therefore, etching uniformity and film coating uniformity can be improved.

[0130] A side wall 104 of the side body is also provided with a vacuum pumping port 103 , and the control valve group 20 is connected to the vacuum chamber 10 through the vacuum pumping port 103 , so that the vacuum pump group can evacuate the vacuum chamber 10 through the vacuum pumping port 103 .

[0131] Furthermore, the side body includes a door section 100 and a main body section 101 that are openably connected. For example, the door section 100 and the main body section 101 are hinged.

[0132] The door body section 100 includes three sequentially connected side walls 104, and the main body section 101 includes the remaining five sequentially connected side walls 104. The number of etching arc source groups 13 is one group, and the number of coating arc source groups is three. The three coating arc source groups are respectively a first coating arc source group 16, a second coating arc source group 17 and a third coating arc source group 18.

[0133] The etching arc source group 13 is disposed on the middle side wall 104 of the door body section 100 , and the three coating arc sources 12 of the first coating arc source group 16 are respectively disposed on the other two side walls 104 of the door body section 100 .

[0134] The vacuum pumping port 103 is provided on the side wall 104 of the main section 101 directly opposite to the etching arc source. The second coating arc source group 17 and the third coating arc source group 18 are respectively arranged on the two side walls 104 on both sides of the vacuum pumping port 103 on the main section 101 .

[0135] The etching arc source group 13, the first coating arc source group 16, the second coating arc source group 17 and the third coating arc source group 18 are arranged in this way, so that the first coating arc source group 16 can be used alone, and the second coating arc source group 17 and the third coating arc source group 18 can be used in combination.

[0136] In this embodiment, the coating arc source 12 and the etching arc source both include a first fixed magnetic field component 127, a first active magnetic field, a first insulating connection component and an arc target. The arc target of the coating arc source 12 is a coating arc target 125, and the arc target of the etching arc source is an etching arc target. The arc target is connected to the vacuum chamber 10 and is located in the coating cavity. The arc target is used to be connected to the cathode in a switchable manner. Specifically, when the arc source is required to work, the arc target is connected to the cathode, and when the arc source is not required to work, the arc target can be disconnected from the cathode.

[0137] The basic working principle of the coating arc source 12 is based on the cold cathode vacuum arc discharge theory. The vacuum chamber 10 and the coating arc target 125 are connected to the anode and cathode of the first power supply of the power module 4 respectively. After the coating arc target 125 ignites the vacuum arc, some discontinuous, bright spots of various sizes and shapes will appear on the surface of the coating arc target 125. These arc spots move irregularly on the surface of the coating arc target 125 rapidly. When some arc spots are extinguished, some arc spots are formed in other parts, so that the arc target can maintain arc burning, so that the arc spots of the coating arc target 125 emit target material vapor into the coating space, wherein one metal atom can be emitted for every 10 electrons emitted, and then these atoms are ionized to form high-energy positive ions. When the positive ions run in the vacuum chamber 10, they combine with other ions (inert reaction gas ions) and are deposited on the surface of the workpiece to form a coating.

[0138] Optionally, the target material of the coating arc target 125 can be, for example, a single target material such as titanium, chromium, a binary target material, a ternary target material, or a higher-level target material.

[0139] The etching arc source is used to etch the surface of the workpiece, such as cleaning impurities on the surface of the workpiece and roughening it. The basic working principle of the etching arc source is:

[0140] The etching arc source is used in conjunction with a baffle and an anode assembly. The anode assembly and the etching arc target are respectively connected to the anode and cathode of the second power supply of the power supply module 4, so that the etching arc target is ignited and then ions and electrons are emitted simultaneously. The baffle cover is arranged on the outside of the etching arc target and is located between the anode assembly and the etching arc target. The baffle blocks the ions so that only electrons are emitted toward the anode assembly, thereby the electrons sputter and bombard the surface of the workpiece to achieve the purpose of etching the surface of the workpiece.

[0141] Optionally, the target material of the etching arc target may be a single target material such as titanium or chromium.

[0142] Optionally, the anode assembly is connected to the top cover plate via the anode seat 11 and is connected to the anode of the second power supply of the power module 4 .

[0143] Specifically, the multi-arc ion plating device first etches the surface of the workpiece through the etching arc source group 13 in cooperation with the baffle and the anode assembly, and then deposits the base film layer through the first coating arc source group 16, and then deposits the functional film layer through the second coating arc source group 17 and the third coating arc source group 18, so that the multi-arc ion plating device is suitable for the coating of rollers, rod milling cutters, micro drills, knife grains and saw blades.

[0144] Furthermore, according to the different target materials of the reaction gas and the coating arc target 125 of each coating arc source group, the film layers that can be realized include but are not limited to 1-1.5 μm thick multilayer ZrN with a Vickers hardness (HV) of up to 2900-3200, 2-3 μm thick TiAlN with a Vickers hardness (HV) of up to 2900-3200, 2-2.5 μm thick TiAlN with a Vickers hardness (HV) of up to 3100-3400, and 2-3 μm thick TiAlN with a Vickers hardness (HV) of up to 3100-3400. Thick TiAlN (high aluminum), 2-3μm thick TiSiN with a Vickers hardness (HV) of up to 3200-3700, 2-3μm thick AlSi with a Vickers hardness (HV) of up to 3300-3700, 3-4μm thick AlCr-silicon tungsten substrate with a Vickers hardness (HV) of up to 3200-3500, 4-5μm thick AlCr-boron substrate with a Vickers hardness (HV) of up to 3300-3700, 4-5μm thick AlCr with a Vickers hardness (HV) of up to 3100-3300, 2-3μm thick TiN with a Vickers hardness (HV) of up to 2200-2400, etc.

[0145] Among them, taking a 3-4 μm thick AlCr-silicon tungsten substrate as an example, the target material of the coating arc target 125 of the first coating arc source group 16 can be selected as a tungsten silicide target, and the target materials of the coating arc targets 125 of the second coating arc source group 17 and the third coating arc source group 18 can be selected as AlCr. For another example, taking a 4-5 μm thick AlCr-boron substrate as an example, the target material of the coating arc target 125 of the first coating arc source group 16 can be selected as a boron target, and the target material of the coating arc target 125 of the second coating arc source group 17 and the third coating arc source group 18 can be selected as AlCr. For another example, taking a 2-3 μm thick TiN as an example, the target material of the coating arc target 125 of the first coating arc source group 16, the second coating arc source group 17 and the third coating arc source group 18 can be selected as a Zr target.

[0146] The above-mentioned film layer can be a single layer or a multi-layer. Accordingly, the multi-arc ion plating device completes the deposition and coating of the film layer at one time or completes the deposition and coating of the film layer in layers.

[0147] In order to reasonably control the motion trajectory of the electric arc on the etching arc target and the coating arc target 125, so as to improve the target metal ionization rate of the above two arc targets, a fixed magnetic field assembly 127 and a movable magnetic field assembly 128 are used in combination to obtain a variable magnetic field, and the variable magnetic field is made to act on the target surface of the arc target, so as to achieve the purpose of magnetically controlling the electric arc on the target surface of the arc target.

[0148] The etching arc target and the coating arc target 125 use the same structure to connect the fixed magnetic field assembly 127 and the movable magnetic field assembly 128. Because, hereinafter, the coating arc target 125 is taken as an example to illustrate the connection structure and working principle of the fixed magnetic field assembly 127 and the movable magnetic field assembly 128, and the connection structure and working principle of the fixed magnetic field assembly 127 and the movable magnetic field assembly 128 of the etching arc target can refer to the coating arc target 125, and will not be repeated here.

[0149] Specifically, the coating arc targets 125 are all installed in the vacuum chamber 10 through the insulating connection assembly, the fixed magnetic field assembly 127 is arranged outside the vacuum chamber 10 corresponding to the coating arc targets 125, and the movable magnetic field assembly 128 is movably connected to the fixed magnetic field assembly 127 through the adjustment assembly, so that by operating the adjustment assembly, the relative position relationship and the superposition effect of the magnetic field generated by the movable magnetic field assembly 128 and the magnetic field generated by the fixed magnetic field assembly 127 can be changed to generate a variable magnetic field acting on the coating arc target 125. In other words, the variable magnetic field is formed by the superposition of the magnetic field generated by the first fixed magnetic field assembly 127 and the magnetic field generated by the first movable magnetic field assembly.

[0150] By setting the fixed magnetic field component 127, it can be ensured that the variable magnetic field meets the basic magnetron requirements. On this basis, by setting the active magnetic field component 128 movably connected to the fixed magnetic field component 127, the variable magnetic field can be adjusted according to the demand. Specifically, it is only necessary to adjust the position of the active magnetic field component 128 relative to the fixed magnetic field component 127 to achieve the adjustment of the control magnetic field. Therefore, the variable magnetic field can be adjusted to the expected state, thereby increasing the probability of collision ionization of electrons and argon gas, improving the deposition rate, and increasing the probability of collision between electrons and metal atoms, greatly improving the metal ionization rate.

[0151] Among them, the insulating connection component is connected to the side body, and the coating arc target 125 is connected to the part of the insulating connection component located in the coating cavity, so that not only can the coating arc target 125 be installed in the vacuum chamber 10 through the insulating connection component, but also the insulating connection component can prevent the coating arc target 125 and the vacuum chamber 10 from being directly connected, ensuring that the coating arc target 125 can achieve discharge, that is, achieve target material evaporation.

[0152] Optionally, the coating arc target 125 and the etching arc target are connected to the first power supply of the power supply module 4 through the electrode 129 .

[0153] In this embodiment, the fixed magnetic field assembly 127 includes a mounting base 1270 arranged on the insulating connection assembly and a fixed magnetic component arranged in the mounting base 1270. The magnetic field of the fixed magnetic field assembly 127 is generated by the fixed magnetic component. Specifically, an installation space for accommodating the first magnetic component 1271 is formed inside the mounting base 1270, so as to achieve fixed installation of the fixed magnetic component and the magnetic field generated by it relative to the arc target.

[0154] The active magnetic field assembly 128 includes a frame and an active magnetic component arranged on the frame. The frame is provided with a mounting hole, and the frame can be movably mounted on the outside of the mounting seat 1270 through the mounting hole, so that the active magnetic component can move synchronously with the frame, thereby realizing the movement of the active magnetic component relative to the mounting seat 1270, that is, realizing the movable installation of the active magnetic component and the magnetic field generated by it relative to the arc target.

[0155] Furthermore, the structures of the active magnetic components of the etching arc source and the active magnetic components of the coating arc source 12 can be differentiated. The active magnetic components of the etching arc source include a first active magnetic component, and the active magnetic components of the coating arc source 12 include a second active magnetic component and a third active magnetic component. At least one of the second active magnetic component and the third active magnetic component is an electromagnetic coil.

[0156] Since the magnetic field of the active magnetic field assembly 128 of the etching arc source is only generated by the first active magnetic component, the magnetic field generated by the active magnetic field assembly 128 of the coating arc source 12 is formed by the superposition of the magnetic fields of the second active magnetic component and the third active magnetic component. Therefore, the arrangement pattern of the magnetic lines of force of the magnetic field generated by the coating arc source 12 can be more three-dimensional, making the coating magnetic control more precise to improve the coating quality, and the structure of the etching arc source is simpler, which is conducive to controlling costs while meeting the requirements of etching magnetic control.

[0157] Optionally, the electromagnetic wire is powered by a fourth power supply of the power supply module 4 .

[0158] As an implementation method of realizing position adjustment between the movable magnetron assembly and the fixed magnetron assembly by means of an adjustment assembly, both the etching arc source and the coating arc source 12 further include an outer plate 130 .

[0159] The outer plate 130 and the insulating connection assembly are relatively fixedly arranged, and the adjustment assembly includes a fixing sleeve 121 and an adjustment sleeve 120. The adjustment sleeve 120 is screwed to the outer plate 130, one end of the fixing sleeve 121 is screwed to the adjustment sleeve 120, and the other end of the fixing sleeve 121 is connected to the frame. When the adjustment sleeve 120 is rotated relative to the outer plate 130, the fixing sleeve 121 will rotate relative to the adjustment sleeve 120, so that the fixing sleeve 121 rotates and moves along the height direction of the mounting seat 1270.

[0160] For example, when the adjustment sleeve 120 is rotated forward, the fixed sleeve 121 rises relative to the mounting seat 1270, and drives the active magnetic field assembly 128 to rise relative to the fixed magnetic field assembly 127, so as to achieve forward superposition adjustment of the control magnetic field. On the contrary, when the adjustment sleeve 120 is rotated backward, the fixed sleeve 121 falls relative to the mounting seat 1270, and drives the active magnetic field assembly 128 to fall relative to the fixed magnetic field assembly 127, so as to achieve reverse superposition adjustment of the variable magnetic field. Thus, the variable magnetic field can be conveniently adjusted according to needs through the adjustment assembly.

[0161] In this embodiment, as an implementation of the structure of the insulating connection assembly, the insulating connection assembly includes an insulating spacer 123, a target fixing flange 122 and an insulating ring 124. Hereinafter, the insulating connection assembly of the coating arc source 12 is still used as an example for explanation, and the structure of the adjustment assembly of the etching arc source can refer to the coating arc source 12, so it is not repeated here.

[0162] The vacuum chamber 10 is provided with an arc source mounting seat 1270. Specifically, the side body of the vacuum chamber 10 is provided with the arc source mounting seat 1270, and the target fixing flange 122 is fastened to the vacuum chamber 10 through the arc source mounting seat 1270. In other words, the target fixing flange 122 is connected to the arc source mounting seat 1270 through fasteners such as bolts or screws, so that the target fixing flange 122 is installed on the vacuum chamber 10.

[0163] The inner circle of the target material fixing flange 122 forms a slide groove connection with the outer circle of the coated arc target 125, so that the target material fixing flange 122 and the coated arc target 125 can be disassembled and assembled by rotating the target material fixing flange 122. Since the coated arc target 125 is a consumable, it needs to be replaced. By setting the two to be connected by a slide groove instead of welding, it is not only convenient to replace the coated arc target 125, but also the target material fixing flange 122 can be recycled.

[0164] The insulating ring 124 is bonded to the target material fixing flange 122, and part of the insulating ring 124 is padded between the coated arc target 125 and the arc source mounting seat 1270 to insulate the coated arc target 125 from the arc source mounting seat 1270. Since the insulating ring 124 is usually made of non-metallic material, such as ceramic, it is not convenient to weld the target material fixing flange 122 and the insulating ring 124. This bonding method can properly solve the connection requirements between the insulating ring 124 and the target material fixing flange 122.

[0165] The insulating sleeve 123 is arranged between the end surface of the target fixing flange 122 and the arc source mounting seat 1270 , so that insulation isolation between the target fixing flange 122 (especially the part not covered by the insulating ring 124 ) and the arc source mounting seat 1270 is achieved through the insulating sleeve 123 .

[0166] In this embodiment, the coating arc source 12 and the etching arc source both further include a shielding cover 126 connected to the target fixing flange 122. The coating arc source 12 is taken as an example to illustrate the connection between the shielding cover 126 and the coating arc target 125. The connection structure of the shielding cover 126 of the etching arc source can refer to the coating arc source 12, and will not be described here.

[0167] The shielding cover 126 is cylindrical and is arranged on the outside of the coating arc target 125 along the circumference of the coating arc target 125, so that the movement path of the target metal evaporated and emitted from the coating arc target 125 is constrained by the shielding cover 126, so that the target metal moves toward the inside of the coating space instead of moving toward its edge position, so as to improve the metal ionization rate.

[0168] Specifically, the inner ring of the insulating ring 124 is connected to the outer ring of the shielding cover 126 by forming a sliding groove, so that the shielding cover 126 can be disassembled relative to the insulating ring 124 by rotating the shielding cover 126, thereby facilitating the disassembly and assembly of the etching arc source.

[0169] In the optional solution of this embodiment, in order to control the temperature of the arc target surface, the coating arc source 12 and the etching arc source also include a water cooling seat assembly 131 and a heat conducting plate. Taking the coating arc source 12 as an example, the connection method between the water cooling seat assembly 131, the heat conducting plate and the coating arc target 125 is described. The connection structure of the water cooling seat assembly 131 and the heat conducting plate of the etching arc source can refer to the coating arc source 12, and will not be repeated here.

[0170] The water cooling seat assembly 131 is disposed on the end surface of the target fixing flange 122 which faces away from the vacuum chamber 10 .

[0171] The coated arc target 125 passes through the hollow part of the target fixing flange 122 and fits with the water cooling seat assembly 131. A water cooling channel for passing the cooling fluid is formed inside the water cooling seat assembly 131, so that the coated arc target 125 is efficiently cooled by the cooling fluid flowing in the water cooling channel, so as to achieve the purpose of controlling the surface temperature of the coated arc target 125.

[0172] The heat conducting plate is clamped between the water cooling seat assembly 131 and the coated arc target 125. Since the water cooling seat assembly 131 is connected to the target fixing flange 122, a structural basis is provided for directly clamping the heat conducting plate between the target fixing flange 122 and the water cooling seat assembly 131. Compared with complex welding schemes, the defective rate caused by improper welding is reduced, the structural reliability is improved, and the cost is reduced.

[0173] In addition, the heat conducting plate has high thermal conductivity and can absorb the heat on the coated arc target 125 in time, so that the arc target is cooled down quickly. The water cooling seat assembly 131 cools the heat conducting plate to ensure that the heat conducting plate continuously absorbs heat from the coated arc target 125.

[0174] The heat conducting plate is made of copper, such as brass or copper, and has good thermal conductivity.

[0175] In an optional solution of this embodiment, based on the connection method of the insulating connection component and the water cooling component, the magnetron component is arranged on the end surface of the water cooling seat component 131 away from the arc target.

[0176] In an optional solution of this embodiment, in order to ensure that the surface of the workpiece is fully exposed in the coating chamber, thereby improving the coating uniformity, the workpiece to be coated is suspended by a suspension bracket 14 so that the coated workpiece is coated in a suspended state.

[0177] The suspension bracket 14 is disposed on the bottom cover plate 106 , and the suspension bracket 14 is detachably connected to the bottom cover plate 106 via a positioning assembly 19 , so as to realize the disassembly and assembly between the workpiece suspended on the suspension bracket 14 and the vacuum chamber 10 .

[0178] The positioning assembly 19 includes a rotary drive member, a rotating shaft and a positioning plate 195 .

[0179] The suspension bracket 14 includes a revolving plate 1412 , a primary sun gear 1410 , a primary planetary gear 1411 , a transmission plate 1413 and a plurality of suspension fixtures 142 .

[0180] The positioning plate 195 is arranged on the bottom cover plate 106, and a plurality of positioning pins 196 are arranged on the positioning plate 195. The first-stage sun gear 1410 is detachably connected to the positioning plate 195 through the plurality of positioning pins 196. Specifically, the first-stage sun gear 1410 is provided with pin holes matching the plurality of positioning pins 196, so that the suspension fixture 142 can be detachably installed on the bottom cover plate 106 through the pin holes of the first-stage sun gear 1410 and the positioning pins 196 of the positioning plate 195, and the suspension fixture 142 is supported by the positioning plate 195.

[0181] The rotary drive member is arranged on the bottom side of the bottom cover plate 106, the bottom end of the rotating shaft is connected to the rotary drive member, and the top end of the rotating shaft passes through the bottom cover plate 106 and the positioning plate 195 and extends into the interior of the vacuum chamber 10, so that the rotary drive member can drive the rotating shaft to rotate, while the bottom cover plate 106 and the positioning plate 195 remain stationary.

[0182] The transmission disc 1413 is detachably connected to the top of the rotating shaft so that the rotating drive member can drive the suspension bracket 14 through the rotating shaft and the transmission disc 1413. Specifically, the primary sun gear 1410 remains stationary with the positioning disc 195, and the rotating drive member can drive the transmission disc 1413 to rotate through the rotating shaft.

[0183] The primary sun gear 1410 is disposed on the bottom cover plate 106 , the transmission disc 1413 is rotatably disposed at intervals inside the primary sun gear 1410 , and the revolving disc 1412 is disposed on the top of the transmission disc 1413 so that the revolving disc 1412 and the transmission disc 1413 can rotate synchronously.

[0184] The bottom surface of the revolving disk 1412 is provided with a primary annular inner tooth, the primary sun gear 1410 is located on the inner side of the primary annular inner tooth, and a plurality of primary planetary gears 1411 are meshed between the primary annular inner tooth and the outer teeth of the primary sun gear 1410. Specifically, the primary sun gear 1410 remains stationary, and the revolving disk 1412 rotates synchronously with the transmission disk 1413 and the rotating shaft. At the same time, each primary planetary gear 1411 revolves around the axis of the revolving disk 1412 with the revolving disk 1412 while rotating around its own axis.

[0185] The bottom ends of the plurality of suspension jigs 142 are connected coaxially with the plurality of primary planetary gears 1411 through the revolution disk 1412 in a one-to-one correspondence, so that the plurality of suspension jigs 142 are rotatably erected on the revolution disk 1412, so that each suspension jig 142 rotates once while revolving with the corresponding primary planetary gear 1411. Among them, through the revolution, the coating uniformity of the workpieces on different suspension jigs 142 is improved, and the influence of the suspension position of the workpiece on the coating uniformity is reduced. Through the rotation once, the coating uniformity of the same workpiece along its own circumference is improved, and the influence of the circumferential position of the workpiece on the coating uniformity is reduced.

[0186] Optionally, the suspension bracket 14 and the positioning assembly 19 can be assembled and disassembled by a liftable forklift.

[0187] Optionally, the rotating driving component is an electric motor 190 or an electric motor with a transmission mechanism, for example, the rotating driving component includes a motor 190, a motor synchronous wheel 191, a synchronous belt 192 and a magnetic fluid synchronous wheel 193, and the rotating shaft is a magnetic fluid 194, so that the motor 190 drives the motor synchronous wheel 191 to rotate coaxially, the synchronous belt 192 connects the motor synchronous wheel 191 with the magnetic fluid synchronous wheel 193, the magnetic fluid synchronous wheel 193 rotates with the motor synchronous wheel 191 and drives the magnetic fluid 194 to rotate, and the magnetic fluid 194 is connected to the positioning plate 195 and drives the positioning plate 195 to rotate.

[0188] Optionally, a shaft fixing flange is provided on the top of the magnetic fluid 194, a shaft transmission flange is provided on the top of the shaft fixing flange, a positioning slot is provided on the bottom surface of the male rotating disk 1412, and a positioning pin corresponding to the positioning slot is provided on the top surface of the shaft transmission flange. The shaft fixing flange is tightly connected to the magnetic fluid 194, and the shaft transmission flange is tightly connected to the shaft fixing flange.

[0189] Optionally, in order to reduce the friction between the orbiting disk 1412 and the primary sun gear 1410 , the orbiting disk 1412 and the primary sun gear 1410 are arranged relatively spaced apart along the height direction of the vacuum chamber 10 .

[0190] Optionally, a plurality of suspension fixture mounting holes are provided on the revolving disk 1412, and the bottom end of the suspension fixture 142 passes through the suspension fixture mounting hole and is coaxially connected to the corresponding first-stage planetary gear 1411, and a bearing component is installed between the suspension fixture 142 and the suspension fixture mounting hole to ensure that the suspension fixture 142 rotates smoothly with the first-stage planetary gear 1411.

[0191] Optionally, the suspension bracket 14 also includes a retaining frame 144, which is supported on the top of the rotary disk 1412 by a support column 143, and the top of each suspension fixture 142 is rotatably connected to the retaining frame 144, which can effectively reduce the shaking of each suspension fixture 142, so that the suspension fixture 142 can stand stably relative to the rotary disk 1412, so as to eliminate the adverse effects of the shaking of the suspension fixture 142 on the coating quality and improve the coating quality of the workpiece.

[0192] Optionally, in order to facilitate the detection of the rotation of the revolution disk 1412, such as whether the revolution disk 1412 is rotating and whether the revolution disk 1412 is rotating to the zero position, the suspension bracket 14 also includes a speed measurement component, which is arranged on the side of the bottom end of the rotating shaft. Specifically, the speed measurement component includes a photoelectric sensor 145, and the photoelectric sensor 145 includes a photoelectric emitting part 1450 and a photoelectric receiving part 1451 arranged at intervals along the height direction of the vacuum chamber 10. The magnetic fluid synchronous wheel 193 is connected to a sensing plate 146, and the sensing plate 146 always extends between the photoelectric emitting part 1450 and the photoelectric receiving part 1451. The sensing plate 146 is provided with a sensing slit. Only when the sensing slit moves to the photoelectric emitting part 1450 and the photoelectric receiving part 1451, the photoelectric receiving part 1451 can receive the photoelectric signal emitted by the photoelectric emitting part 1450.

[0193] In this embodiment, as a first implementation of the hanging fixture 142, as Figure 7 As shown, the hanging fixture 142 is a hanging rod.

[0194] In this embodiment, as another implementation of the hanging fixture 142, Figure 8 As shown in FIG9 , the suspension jig 142 is configured to be capable of secondary rotation. In order to achieve secondary rotation of the suspension jig 142 , the suspension jig 142 includes a jig base 1420 and a plurality of hangers 1421 rotatably disposed on the jig base 1420 , and a support column 143 is disposed between every two adjacent suspension jigs 142 .

[0195] As a first implementation scheme of secondary rotation, the suspension fixture 142 also includes a secondary sun gear 1422 , a shift rod 1423 and a plurality of secondary planetary gears 1424 .

[0196] The fixture base 1420 is formed with secondary annular internal teeth and is coaxially connected to the primary planetary gear 1411 . Specifically, the fixture base 1420 is coaxially connected to the primary planetary gear 1411 through the first shaft sleeve 1425 , so that the fixture base 1420 can rotate once with the primary planetary gear 1411 .

[0197] The secondary sun gear 1422 is arranged at intervals on the inner side of the secondary annular inner teeth, and multiple secondary planetary gears 1424 are meshed between the secondary sun gear 1422 and the secondary annular inner teeth. One end of the lever 1423 is connected to the secondary sun gear 1422, and the other end of the lever 1423 can be abutted against the support column 143 on the side of the suspension fixture 142, so that when the lever 1423 abuts against the support column 143, the secondary sun gear 1422 can remain stationary relative to the support column 143, that is, it revolves synchronously with the orbiting disk 1412, and each secondary planetary gear 1424 rotates once with the fixture base 1420 and rotates twice around its own axis at the same time.

[0198] Specifically, a plurality of hangers 1421 coaxially connected to the primary planetary gear 1411 may be provided on the fixture base 1420 , such as inserts or hanging rods.

[0199] Alternatively, as a second implementation scheme of secondary rotation, the suspension jig 142 includes a jig base 1420, which is coaxially connected to the first-stage planetary gear 1411. Specifically, the jig base 1420 is provided with a second sleeve 1428, and the second sleeve 1428 is provided with a through hole for passing the shaft of the first-stage planetary gear 1411. In order to ensure that the second sleeve 1428 and the jig base 1420 can rotate synchronously with the first-stage planetary gear 1411, the shaft of the first-stage planetary gear 1411 is connected to the second sleeve 1428 by a stop bolt 1429.

[0200] A plurality of hangers 1421 are rotatably connected to the fixture base 1420, and the outer surface of the hanger 1421 is provided with a circumferential outer tooth 1426. The hanging fixture 142 also includes a paddle 1427, one end of the paddle 1427 is connected to the support column 143, and the other end of the paddle 1427 is in contact with the circumferential outer tooth 1426. The paddle 1427 has a certain elasticity, so that when the paddle 1427 is in contact with one of the circumferential outer teeth 1426 of the hanger 1421, the hanger 1421 rotates once with the fixture base 1420, so that the hanger 1421 can apply pressure to the paddle 1427, so that the paddle 1427 is deformed. During the deformation process, the paddle 1427 applies a paddle force to the hanger 1421, so that the hanger 1421 rotates twice around its own axis. After the second rotation, the paddle 1427 is disengaged from the tooth of the hanger 1421 and contacts another tooth of the hanger 1421 , thereby achieving continuous rotation of the hanger 1421 .

[0201] In order to ensure that the plurality of hangers 1421 can continue to rotate twice, a plurality of paddles 1427 may be provided along the circumference of the revolution disk 1412 to form a plurality of paddle stations.

[0202] In this embodiment, the bias mechanism 15 is used to introduce a bias voltage to the workpiece to be coated so that more electrons move toward the workpiece. The bias mechanism 15 includes an insulating protection, an introduction electrode 152 and a wiring board 153 .

[0203] The insulating protection runs through the bottom cover plate 106, and the introduction electrode 152 is arranged in the insulating protection. One end of the introduction electrode 152 is connected to the negative pressure on the bottom side of the bottom cover plate 106, and the other end of the introduction electrode 152 is connected to the positioning plate 195 through the terminal board 153, so that the positioning plate 195 introduces the negative pressure into the workpiece through the first-stage sun gear 1410, the first-stage planetary gear 1411 and the suspension fixture 142 in sequence. The workpiece with negative charge can absorb the electrons emitted by the etching arc target, thereby greatly improving the probability and efficiency of electron bombardment on the workpiece.

[0204] Optionally, the insulation protection includes an insulation seat 150 penetrating the bottom cover plate 106 and a glass tube 151 for protecting the introduction electrode 152, thereby avoiding electrical safety issues.

[0205] Optionally, the terminal plate 153 is connected to the introduction electrode 152 by tightening the conductive bolt 154, and the terminal plate 153 abuts against the positioning plate 195 by tightening the conductive bolt 154, so that the negative charge on the introduction electrode 152 is transferred to the positioning plate 195 in sequence through the terminal plate 153 and the tightening conductive bolt 154 to transfer the negative pressure.

[0206] Optionally, the introduction electrode 152 of the bias mechanism 15 is conductively connected to the cathode of the third power supply of the power supply module 4 .

[0207] In this embodiment, in order to facilitate observation of the working conditions in the vacuum chamber 10 , an observation window is provided on the side body.

[0208] In an optional solution of this embodiment, in order to realize vacuuming of the coating chamber, the vacuuming module 2 includes a control valve group 20 and an air pump group. The air pump group includes a rough pump assembly 21 and a fine pump assembly 22, and the rough pump assembly 21 and the fine pump assembly 22 are connected to the vacuum exhaust port 103 through the control valve group 20.

[0209] Among them, the rough pump assembly 21 uses a large flow rate and a large power to pump air, and the fine pump assembly 22 uses a small flow rate and a small power to pump air. Therefore, the rough pump assembly 21 can be used to perform rough pumping operations first, until the vacuum degree in the coating chamber reaches the basic requirements, and the rough pump assembly 21 is turned off to stop the operation. On the one hand, in order to avoid the vacuum degree in the coating chamber from fluctuating due to the lack of effective maintenance means, on the other hand, it is possible that the vacuum degree that can be achieved by the rough pump assembly 21 is still slightly different from the ideal vacuum degree. Therefore, in order to ensure that the vacuum degree can reach and maintain the ideal level, the fine pump assembly 22 can be continuously or intermittently turned on to perform vacuum pumping operations after the rough pump assembly 21 stops operating.

[0210] In addition, the control valve group 20 can coordinate the communication switching relationship between the roughing pump assembly 21 , the fine pump assembly 22 and the coating cavity of the vacuum chamber 10 .

[0211] In this embodiment, the control valve group 20 includes a valve body 200, which is provided with an air inlet, an air outlet and multiple air pumping channels 201. Each air pumping channel 201 is connected between the air inlet and the air outlet. The valve body 200 is connected to the vacuum air pumping port 103 of the vacuum chamber 10 through the air inlet, and the rough pump assembly 21 is connected between the air inlet and the vacuum air pumping port 103.

[0212] Therefore, when the roughing pump assembly 21 is operating, the gas in the coating chamber is directly pumped out from the vacuum exhaust port 103 by the roughing pump assembly 21 without passing through the valve body 200, thereby preventing the gas with impurities from entering the valve body 200, and the air at the air inlet of the fine pump assembly 22 connected to the valve body 200 is diverted to multiple exhaust channels 201 and then converged to the outlet, thereby achieving the effect of diverting the extracted gas inside the valve body 200, which can slow down the flow rate to a certain extent, thereby achieving a noise reduction effect.

[0213] The valve body 200 is also provided with a fine pumping outlet, which is connected to the air extraction channel 201 and is located between the air inlet and the air outlet. Therefore, when the roughing pump assembly 21 is stopped and the fine pumping pump assembly 22 is in operation, by dividing the multiple air extraction channels 201, multi-channel fine pumping can be achieved to improve the vacuum maintenance accuracy. In addition, by setting the multiple air extraction channels 201 to be disconnected from each other, the multiple fine pumping pump assemblies 22 can be prevented from affecting each other.

[0214] The control valve group 20 also includes a sealing component 202 and an opening and closing drive component. The sealing component 202 can open and close to cover the fine pumping outlet, so that when the fine pump component 22 is shut down, the fine pumping outlet is blocked by the sealing component 202, especially when the rough pump component 21 is operating, it can ensure that there is no leakage through the fine pumping outlet, and air can only be pumped from the air inlet to the air outlet.

[0215] The opening and closing driving component is connected to the blocking component 202 and can drive the blocking component 202 to open and close the fine extraction outlet, thereby realizing automatic opening and closing of the fine extraction outlet.

[0216] The opening and closing drive assembly includes a driving component 203 and an actuator rod 204. The driving component is arranged on the outside of the valve body 200. One end of the actuator rod 204 is connected to the driving component, and the other end of the actuator rod 204 extends into the exhaust channel 201 and is connected to the blocking component 202. The driving component drives the actuator rod 204 to push or pull the blocking component 202 relative to the fine extraction outlet so that the blocking component 202 closes or opens the fine extraction outlet.

[0217] That is, the opening and closing drive assembly drives the actuator rod 204 to push the blocking assembly 202 relative to the fine extraction outlet so that the blocking assembly 202 closes the fine extraction outlet; the opening and closing drive assembly drives the actuator rod 204 to pull the blocking assembly 202 relative to the fine extraction outlet so that the blocking assembly 202 opens the fine extraction outlet.

[0218] Optionally, the opening and closing drive assembly may be a component such as a cylinder that can push and pull the actuator rod 204 .

[0219] Optionally, the blocking assembly 202 includes a blocking plate and a crimping component, and one end of the actuator 204 is inserted into a slot of the blocking plate and connected to the blocking plate via the crimping component.

[0220] Specifically, the roughing pump assembly 21 includes a first direct-connected pump 210, a Roots pump 211, a first filter 212, and a first connecting pipe set 213. The first filter 212, the Roots pump 211, and the first direct-connected pump 210 are sequentially connected through the first connecting pipe set 213, and the inlet end of the first filter 212 is connected to the air outlet through the first connecting pipe set 213. The number of the first direct-connected pumps 210 can be adjusted according to the situation, for example, two, and the two first direct-connected pumps 210 are respectively connected to the Roots pump 211.

[0221] The fine pump assembly 22 includes a second direct-connected pump 222, a second connecting pipe group 221, and a molecular pump 220. The second direct-connected pump 222 is connected to the molecular pump 220 through the second connecting pipe group 221, and the molecular pump 220 is connected to the fine pumping outlet. Among them, the number of the second direct-connected pump 222 is one, the number of the molecular pumps 220 is multiple and the number is the same as the number of the air extraction channels 201 of the control valve group 20, the multiple molecular pumps 220 are connected to the multiple air extraction channels 201 in a one-to-one correspondence, and the multiple molecular pumps 220 are connected to the second direct-connected pump 222 after converging through the second connecting pipe group 221.

[0222] Optionally, the first connecting tube group 213 and the second connecting tube group 221 may both include structures such as bellows, connecting tubes, tees, elbows and bent pipes, wherein the spatial applicability of the vacuum mechanism can be greatly improved by adjusting the length and position of the bellows.

[0223] In order to facilitate the self-leakage inspection of the vacuum module 2 , a leak detection hole 23 for installing a leak detection component 24 is provided on the first connecting tube group 213 and the second connecting tube group 221 , wherein the leak detection component 24 is a leak detection probe.

[0224] In an optional scheme of this embodiment, the cooling module 3 includes a first liquid inlet pipeline 30, a first liquid outlet pipeline 31, a second liquid inlet pipeline 32, a second liquid outlet pipeline 33, a first liquid inlet joint 300, a first liquid outlet joint 310, a second liquid inlet structure and a second liquid outlet joint 330.

[0225] The first liquid inlet pipeline 30 is provided with multiple first liquid inlet joints 300 to transport the first cooling fluid to the temperature-prone components through the multiple first liquid inlet joints 300. The first liquid outlet pipeline 31 is provided with multiple first liquid outlet joints 310 to allow the first cooling fluid in the temperature-prone components to flow back to the first liquid outlet pipeline 31 through the multiple first liquid outlet joints 310. The first cooling fluid is cold water with a relatively low temperature, which can be obtained by cooling normal temperature water with a chiller.

[0226] Thus, the first liquid inlet pipeline 30 and the first liquid outlet pipeline 31 cooperate with each other, and the first cooling fluid is introduced into the easily heated component through the first liquid inlet pipeline 30. After the first cooling fluid cools the easily heated component through which it passes, it flows to the first liquid outlet pipeline 31, and the heated first cooling fluid is discharged through the first liquid outlet pipeline 31.

[0227] The second liquid inlet pipeline 32 is provided with multiple second liquid inlet joints 320 to transport the second cooling fluid to the temperature-prone components through the multiple second liquid inlet joints 320. The second liquid outlet pipeline 33 is provided with multiple second liquid outlet joints 330 to allow the second cooling fluid in the temperature-prone components to flow back to the second liquid outlet pipeline 33 through the multiple second liquid outlet joints 330. The temperature of the first cooling fluid is lower than the temperature of the second cooling fluid. The second cooling fluid is warm water at room temperature and can be directly connected to a tap water source for acquisition.

[0228] Thus, the second cooling fluid is introduced into the second cooling channel through the second liquid inlet pipeline 32 and the second liquid outlet pipeline 33 cooperate with each other. After the second cooling fluid cools the easily heated components it passes through, it flows to the second liquid outlet pipeline 33 and the heated second cooling fluid is discharged through the second liquid outlet pipeline 33.

[0229] The temperature of the first cooling fluid is 12-19° C., and the temperature of the second cooling fluid is 25-30° C. Therefore, the first liquid inlet pipeline 30 and the first liquid outlet pipeline 31 are used to correspond to the components that are easy to heat up and require higher cooling capacity, thereby improving their cooling effect, while the second liquid inlet pipeline 32 and the second liquid outlet pipeline 33 are used to correspond to other components that are easy to heat up, which is not only conducive to reducing resource waste, but also can avoid condensation in these components that are easy to heat up, thereby achieving a targeted and precise cooling effect.

[0230] Optionally, the first cooling fluid and the second cooling fluid can be supplied to the easily heated component through a channel opened inside the easily heated component, or can be supplied through a pipe external to the easily heated component and in contact with the easily heated component. The specific method of supplying the cooling fluid needs to be analyzed according to the characteristics of the easily heated component.

[0231] Specifically, the molecular pump 220, the Roots pump 211, the etching arc source, the coating arc source 12 and the anode assembly have high cooling requirements, so the molecular pump 220, the Roots pump 211, the etching arc source, the coating arc source 12 and the anode assembly need to be supplied with the first cooling fluid. In other words, the first cooling fluid is transported to the molecular pump 220, the Roots pump 211, the etching arc source, the coating arc source 12 and the anode assembly through the first liquid inlet pipeline 30 to cool them, and after cooling and heating, it is discharged through the first liquid outlet pipeline 31.

[0232] The cooling requirements of the arc source mounting seat 1270, the arc striking mechanism, the bias mechanism 15, the observation window, the door body, the arc source mounting seat 1270 and the power supply of the anode assembly can be met by the second cooling fluid, that is, the second cooling fluid is transported to the arc source mounting seat 1270, the arc striking mechanism, the bias mechanism 15, the observation window, the door body, the arc source mounting seat 1270 and the power supply of the anode assembly through the second liquid inlet pipeline 32 to cool them, and after cooling and heating are completed, they are discharged through the second liquid outlet pipeline 33.

[0233] Optionally, in order to reduce the risk of pipeline blockage, a second filter is provided at the inlet end of the second liquid inlet pipeline 32 to filter the second cooling fluid before distributing it to various components that are prone to temperature rise through the second liquid inlet pipeline 32. Since the first cooling fluid output by the chiller is usually clean water, there is no need to provide a filter at the inlet end of the first liquid inlet pipeline 30.

[0234] In this embodiment, the first liquid inlet pipeline 30 , the first liquid outlet pipeline 31 , the second liquid inlet pipeline 32 and the second liquid outlet pipeline 33 all include a first end and a second end.

[0235] The first end of the first liquid inlet pipeline 30 is used to pass the first cooling fluid, the first end of the second liquid inlet pipeline 32 is used to connect the second cooling fluid, and the second end of the first liquid inlet pipeline 30 is connected to the second end of the second liquid inlet pipeline 32.

[0236] The cooling module 3 also includes a first switching valve 351 and a second switching valve 352. The first switching valve 351 is arranged at the second end of the first liquid inlet pipeline 30. The second switching valve 352 is arranged in the first liquid inlet pipeline 30 and is spaced apart from the first end of the first liquid inlet pipeline 30. A plurality of first liquid inlet connectors 300 for connecting the inlet of the molecular pump 220 and the inlet of the Roots pump 211 are arranged between the second switching valve 352 and the first end of the first liquid inlet pipeline 30. The first liquid inlet connector 300 for connecting the inlet of the molecular pump 220 and the inlet of the Roots pump 211 is defined as a first specific liquid inlet connector 3000.

[0237] The first end of the first liquid outlet pipeline 31 is used to discharge the first cooling fluid, the first end of the second liquid outlet pipeline 33 is used to discharge the second cooling fluid, and the second end of the first liquid outlet pipeline 31 is connected to the second end of the second liquid outlet pipeline 33 .

[0238] The cooling module 3 also includes a third switching valve 353 and a fourth switching valve 354. The third switching valve 353 is arranged at the second end of the first liquid outlet pipeline 31, and the fourth switching valve 354 is arranged at the first liquid outlet pipeline 31 and is spaced apart from the first end of the first liquid outlet pipeline 31. A plurality of first liquid outlet connectors 310 for connecting the outlet of the molecular pump 220 and the outlet of the Roots pump 211 are arranged between the fourth switching valve 354 and the first end of the first liquid outlet pipeline 31. The first liquid outlet connector 310 for connecting the outlet of the molecular pump 220 and the outlet of the Roots pump 211 is defined as a first specific liquid outlet connector 3100.

[0239] Thus, the cooling module 3 can work in the following modes:

[0240] The first mode: the first switching valve 351 is closed, the second switching valve 352 is opened, the third switching valve 353 is closed, and the fourth switching valve 354 is opened. In this state, the first liquid inlet pipeline 30 is cut off from the second liquid inlet pipeline 32, and the first liquid outlet pipeline 31 is cut off from the second liquid outlet pipeline 33, so that the first liquid inlet pipeline 30 and the first liquid outlet pipeline 31 can be cooled by the first cooling fluid, and the second liquid inlet pipeline 32 and the second liquid outlet pipeline 33 can be cooled by the second cooling fluid. The first mode is suitable for the situation where the working environment can provide both the first cooling fluid supply and the second cooling fluid supply.

[0241] In the second mode, the first switching valve 351 is opened, the second switching valve 352 is closed, the third switching valve 353 is opened, and the fourth switching valve 354 is closed, so that the portion of the first liquid inlet pipeline 30 connected to the second liquid inlet pipeline 32 is used to pass the second cooling fluid, and the portion of the first water inlet pipeline separated by the second switching valve 352 is used to pass the first cooling fluid, and accordingly, the portion of the first liquid outlet pipeline 31 connected to the second liquid outlet pipeline 33 is used to discharge the second cooling fluid, and the portion of the first liquid outlet pipeline 31 separated by the fourth switching valve 354 is used to discharge the first cooling fluid, that is, the molecular pump 220 and the Roots pump 211 can still be cooled by the first cooling fluid in the first liquid inlet pipeline 30 and the first liquid outlet pipeline 31 through the first specific liquid inlet joint 3000 and the first specific liquid outlet joint 3100.

[0242] That is to say, the molecular pump 220 and the Roots pump 211 can only be cooled by the first cooling fluid, and the coating arc source 12, the etching arc source and the anode assembly can determine whether to use the first cooling fluid or the second cooling fluid for cooling according to actual conditions.

[0243] After the cooling module 3 has been running for a certain period of time, pressure fluctuations are likely to occur, resulting in a significant pressure difference between the first liquid inlet pipeline 30 and the first liquid outlet pipeline 31, which is likely to cause damage to the pipeline. Therefore, in this embodiment, the cooling module 3 also includes a first pressure regulating pipeline, which includes a first pressure regulating pipe group 360 and a first pressure regulating member 361. The inlet end of the first pressure regulating member 361 is connected to the first liquid inlet pipeline 30, and the outlet end of the first pressure regulating member 361 is connected to the first liquid outlet pipeline 31 through the first pressure regulating pipe group 360. When the first pressure regulating member 361 is turned on, the first liquid inlet pipeline 30 transports cooling fluid toward the first liquid outlet pipeline 31, so that the internal pressures of the first liquid inlet pipeline 30 and the first liquid outlet pipeline 31 are consistent, thereby ensuring the pressure stability of the cooling module 3.

[0244] Optionally, the first pressure regulating member 361 is a pressure relief valve.

[0245] After the cooling module 3 has been running for a certain period of time, pressure fluctuations are likely to occur, resulting in a significant pressure difference between the second liquid inlet pipeline 32 and the second liquid outlet pipeline 33, which is likely to cause damage to the pipeline. Therefore, in this embodiment, the cooling module 3 also includes a second pressure regulating pipeline, which includes a second pressure regulating pipe group 362 and a second pressure regulating member 363, the inlet end of the second pressure regulating member 363 is connected to the second liquid inlet pipeline 32, and the outlet end of the second pressure regulating member 363 is connected to the second liquid outlet pipeline 33. When the second pressure regulating member 363 is turned on, the second liquid inlet pipeline 32 transports cooling fluid toward the second liquid outlet pipeline 33, so that the internal pressures of the second liquid inlet pipeline 32 and the second liquid outlet pipeline 33 are consistent, thereby ensuring the pressure stability of the cooling module 3.

[0246] Optionally, the second pressure regulating member 363 is a pressure relief valve.

[0247] Optionally, in order to facilitate pressure monitoring, the first liquid inlet pipeline 30 , the second liquid inlet pipeline 32 , the first liquid outlet pipeline 31 and the second liquid outlet pipeline 33 may be provided with a pressure detection component 382 , such as a pressure gauge.

[0248] It is worth emphasizing that if Fig.11 and Fig.12 As shown, although the first pressure regulating pipeline and the second pressure regulating pipeline appear to overlap from the perspective of the figure, in fact, the two are not connected, but are two independent pipelines. It is only because the heights of the two are set to the same from the perspective of the figure that the visual error of appearing to overlap occurs.

[0249] In this embodiment, the cooling module 3 also includes a pressure relief pipeline, which includes four pressure relief valves 370 and a pressure relief pipe group 371. The inlets of the four pressure relief valves 370 are respectively connected to the first liquid inlet pipeline 30, the first liquid outlet pipeline 31, the second liquid inlet pipeline 32 and the second liquid outlet pipeline 33. The pressure relief pipe group 371 connects the outlets of the four pressure relief valves 370 to the outside world.

[0250] Therefore, when overpressure occurs in any of the first liquid inlet pipeline 30, the first liquid outlet pipeline 31, the second liquid inlet pipeline 32 and the second liquid outlet pipeline 33, the corresponding pressure relief valve 370 is triggered, and the overpressure pipeline discharges gas to the outside through the triggered pressure relief valve 370 and the outlet of the pressure relief pipe group 371, thereby achieving the purpose of pressure relief.

[0251] In this embodiment, a flow detection component 381 and a temperature detection component 380 are provided on the second liquid outlet joint 330 and the first liquid outlet joint 310 to detect the drainage flow and drainage temperature of the first cooling fluid and the second cooling fluid in real time to avoid leakage or over-temperature. Specifically, it is necessary to ensure that the drainage temperature of both channels does not exceed 35°C. When the temperature is too high, the chiller compressor is controlled to alarm.

[0252] Optionally, in order to facilitate igniting the arcs of the etching arc target and the coating arc target 125, the multi-arc ion plating device further includes an arc ignition mechanism, which is arranged on the side of the etching arc source and the side of the coating arc source 12. The arc ignition mechanism can be implemented using an existing structure and will not be described in detail here.

[0253] In this embodiment, in order to facilitate the monitoring and regulation of the status of all instruments, the coating process and the working status of each module, the electronic control module 5 includes a main control console 50, which is arranged on the side of the vacuum chamber 10 along the second direction. Specifically, the main control console 50 is arranged on the side of the door section 100 of the vacuum chamber 10.

[0254] In the optional scheme of this embodiment, regarding the implementation method of the overall layout of the multi-arc ion plating device, the control valve group 20, the cooling module 3 and the plating module 1 are integrated into the first structural part, and the power supply module 4, the vacuum pump group and the electronic control module 5 are integrated into the second structural part.

[0255] The control valve group 20 is connected to the coating module 1 , and the control valve group 20 is detachably connected to the vacuum pump group, so that the first structure part is detachably connected to the second structure part and the vacuum pump group is connected to the vacuum chamber 10 through the control valve group 20 .

[0256] By arranging the first structural part and the second structural part to be detachably connected, on the one hand, the multi-arc ion plating device can be transported in a split form, saving transportation and handling costs; on the other hand, the control valve group 20 and the vacuum pump group usually only involve pipeline connections, and the connection between the two is easy to operate, thereby enabling efficient disassembly and assembly of the first structural part and the second structural part.

[0257] Furthermore, the control valve group 20 is arranged on the side of the coating module 1 along the first direction, the cooling module 3 is arranged on the side of the coating module 1 along the second direction; the power module 4 and the electric control module 5 are respectively arranged on both sides of the vacuum pump group along the second direction; the second structure part is arranged on the side of the first structure part along the first direction. Thus, the multi-arc ion coating device improves space utilization, the overall layout is more compact, and the floor space is saved.

[0258] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit them; although the present invention is described in detail with reference to the above embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the above embodiments, or replace some or all of the technical features therein by equivalents; and these modifications or replacements do not make the essence of the corresponding technical solutions deviate from the scope of the technical solutions of the embodiments of the present invention. In addition, those skilled in the art can understand that although some embodiments described herein include certain features included in other embodiments instead of other features, the combination of features of different embodiments means that they are within the scope of the present invention and form different embodiments. For example, any one of the embodiments claimed for protection can be used in any combination. The information disclosed in this background technology section is only intended to deepen the understanding of the overall background technology of the present invention, and should not be regarded as an admission or in any form of implication that the information constitutes prior art known to those skilled in the art.

Claims

1. A multi-arc ion plating device, characterized in that: include: A coating module, the coating module comprising a vacuum chamber, a coating arc source and an etching component, the etching component comprising an etching arc source, a baffle and an anode component; The coating arc source and the etching arc source are both connected to the vacuum chamber, the anode assembly is arranged inside the vacuum chamber corresponding to the etching arc source, the baffle is arranged between the etching arc source and the anode assembly, and the interior of the vacuum chamber is used to pass reaction gas.

2. The multi-arc ion plating device according to claim 1, characterized in that: Also includes: A vacuum pumping module, the vacuum pumping module is connected to the vacuum chamber to perform a vacuum pumping process on the vacuum chamber; A cooling module, the cooling module being capable of supplying cooling fluid to the vacuum module and the coating module; A power module, which can supply power to the coating module, the vacuum module and the cooling module; An electric control module, wherein the electric control module is electrically connected to the power module, the cooling module, the vacuum module and the coating module, and the electric control module can coordinately control the power module, the cooling module, the vacuum module and the coating module.

3. The multi-arc ion plating device according to claim 2, characterized in that: The vacuum pump module includes a vacuum pump group and a control valve group; The control valve group, the cooling module and the coating module are integrated into a first structural part, and the power supply module, the vacuum pump group and the electric control module are integrated into a second structural part; The control valve group is connected to the coating module, and the control valve group is detachably connected to the vacuum pump group, so that the first structure part is detachably connected to the second structure part and the vacuum pump group is connected to the vacuum chamber through the control valve group.

4. The multi-arc ion plating device according to claim 3, characterized in that: The control valve group is arranged on the side of the coating module along the first direction, and the cooling module is arranged on the side of the coating module along the second direction; The power supply module and the electric control module are respectively arranged on both sides of the air pump group along the second direction; The second structure portion is arranged on a side of the first structure portion along the first direction.

5. The multi-arc ion plating device according to claim 4, characterized in that: The etching assembly comprises at least two etching arc sources, at least two etching arc sources form an etching arc source group, and at least three coating arc sources form a coating arc source group; The number of the etching arc source groups and the number of the coating arc source groups are both at least one group; The coating module further includes a reaction gas supply pipe, one end of which is used to connect to a gas source, and the other end of which extends into the interior of the vacuum chamber; Each of the coating arc sources and each of the etching arc sources is provided with the reaction gas supply pipe in a one-to-one correspondence.

6. The multi-arc ion plating device according to claim 5, characterized in that: The vacuum chamber comprises a side body, a top cover plate and a bottom cover plate, wherein the side body comprises eight side walls connected in an octagonal shape, and the top cover plate and the bottom cover plate are respectively sealed on the top opening and the bottom opening of the side body; The etching arc source group includes two etching arc sources, and each etching arc source group is arranged on one of the side walls of the side body; The coating arc source group includes three coating arc sources, and the two coating arc sources and another coating arc source of each coating arc source group are respectively arranged on the two side walls of the side body; A side wall of the side body is also provided with a vacuum exhaust port, and the control valve group is connected to the vacuum chamber via the vacuum exhaust port.

7. The multi-arc ion plating device according to claim 6, characterized in that: The side body comprises a door body section and a main body section which are openably connected, the door body section comprises three sequentially connected side walls, and the main body section comprises the remaining five sequentially connected side walls; The number of the etching arc source groups is one group, the number of the coating arc source groups is three, and the three coating arc source groups are respectively a first coating arc source group, a second coating arc source group and a third coating arc source group; The etching arc source group is arranged on the side wall located in the middle of the door body section, and the three coating arc sources of the first coating arc source group are respectively arranged on the other two side walls of the door body section; The vacuum exhaust port is opened on the side wall of the main section directly opposite to the etching arc source, and the second coating arc source and the third coating arc source are respectively arranged on the two side walls on both sides of the vacuum exhaust port on the main section.

8. The multi-arc ion plating device according to claim 6, characterized in that: Also includes a suspension bracket; The suspension bracket is arranged on the bottom cover plate, the top end of the anode assembly is connected to the top cover plate, the anode assembly and the etching arc source are respectively connected to the anode and cathode of the power module, and the anode assembly is located between the suspension bracket and the etching arc source; The multi-arc ion plating device also includes a biasing mechanism connected to the cathode of the power module; The biasing mechanism is arranged on the bottom cover plate, and the biasing mechanism is electrically connected to the suspension bracket so that the workpiece on the suspension bracket is negatively charged.

9. The multi-arc ion plating device according to claim 8, characterized in that: The suspension bracket includes a revolving plate, a primary sun gear, a primary planetary gear, a transmission plate and a plurality of suspension fixtures; The primary sun gear is arranged on the bottom cover plate, the transmission disc is rotatably arranged at intervals on the inner side of the primary sun gear, and the revolving disc is arranged on the top of the transmission disc, so that the revolving disc and the transmission disc can rotate synchronously; A primary annular inner tooth is provided on the bottom surface of the revolving disk, the primary sun gear is located on the inner side of the primary annular inner tooth, a plurality of primary planetary gears are meshed between the primary annular inner tooth and the outer teeth of the primary sun gear, and the bottom ends of a plurality of the suspension fixtures pass through the revolving disk one by one and are coaxially connected to the plurality of the primary planetary gears, so that the plurality of the suspension fixtures can be rotatably erected on the revolving disk.

10. The multi-arc ion plating device according to claim 9, characterized in that: The hanging fixture comprises a fixture base and a plurality of hangers, and the plurality of hangers are rotatably arranged on the fixture base; A plurality of support columns are vertically arranged on the public rotating disk, and one support column is arranged between every two adjacent suspension fixtures; Wherein, the suspension fixture further comprises a secondary sun gear, a lever and a plurality of secondary planetary gears, the fixture base is formed with a secondary annular inner gear and is coaxially connected to the primary planetary gear, the secondary sun gear is arranged at intervals on the inner side of the secondary annular inner gear, a plurality of the secondary planetary gears are meshed between the secondary sun gear and the secondary annular inner gear, one end of the lever is connected to the secondary sun gear, and the other end of the lever can be abutted against the support column on the side of the suspension fixture; Alternatively, the suspension jig includes a jig base, the jig base is coaxially connected to the primary planetary gear, a plurality of hangers are rotatably connected to the jig base, an outer surface of the hanger is provided with circumferential external teeth, and the suspension jig also includes a paddle, one end of the paddle is connected to the support column, and the other end of the paddle is in contact with the circumferential external teeth.

11. The multi-arc ion plating device according to claim 10, characterized in that: Also included is a positioning assembly, the positioning assembly comprising a rotary drive member, a rotating shaft and a positioning disk; The positioning plate is arranged on the bottom cover plate, a plurality of positioning pins are arranged on the positioning plate, and the primary sun gear is detachably connected to the positioning plate through the plurality of positioning pins; The rotary drive member is arranged on the bottom side of the bottom cover plate, the bottom end of the rotating shaft is connected to the rotary drive member, and the top end of the rotating shaft passes through the bottom cover plate and the positioning plate and extends into the interior of the vacuum chamber; The transmission disc is detachably connected to the top end of the rotating shaft, so that the rotating driving member can drive the suspension bracket through the rotating shaft and the transmission disc; and / or, the biasing mechanism includes an insulating protection, an introduction electrode and a terminal plate; The insulating protection passes through the bottom cover plate, the introduction electrode is arranged in the insulating protection, one end of the introduction electrode is connected to the negative pressure of the power module on the bottom side of the bottom cover plate, and the other end of the introduction electrode is connected to the positioning plate through the wiring board.

12. The multi-arc ion plating device according to claim 8, characterized in that: The coating arc source and the etching arc source both include a fixed magnetic field component, a movable magnetic field component, an adjustment component and an arc target, the arc target is connected to the vacuum chamber and is located inside the vacuum chamber, and the arc target is connected to the cathode of the power module; The fixed magnetic field component is arranged outside the vacuum chamber corresponding to the arc target, and the movable magnetic field component is movably connected to the fixed magnetic field component through the adjustment component to generate a variable magnetic field and make the variable magnetic field act on the target surface of the arc target; The multi-arc ion plating device further comprises an insulating connection component, through which the fixed magnetic field component and the arc target are both installed in the vacuum chamber.

13. The multi-arc ion plating device according to claim 12, characterized in that: The fixed magnetic field assembly includes a mounting seat arranged on the insulating connection assembly and a fixed magnetic member arranged in the mounting seat; The movable magnetic field assembly comprises a frame and a movable magnetic component arranged on the frame, the frame is provided with a mounting hole, and the frame is movably sleeved outside the mounting seat through the mounting hole; The coating arc source and the etching arc source both further include an outer plate; The outer plate and the insulating connection assembly are relatively fixedly arranged, and the adjustment assembly includes a fixing sleeve and an adjustment sleeve, the adjustment sleeve is screwed to the outer plate, one end of the fixing sleeve is screwed to the adjustment sleeve, and the other end of the fixing sleeve is connected to the frame.

14. The multi-arc ion plating device according to claim 12, characterized in that: The target material of the arc target of the etching arc source is a single target material, and the target material of the arc target of the coating arc source is a single target material, a binary target material, a ternary target material or a multi-element target material; And / or, the active magnetic component of the etching arc source includes a first active magnetic component, and the active magnetic component of the coating arc source includes a second active magnetic component and a third active magnetic component, and at least one of the second active magnetic component and the third active magnetic component is an electromagnetic coil.

15. The multi-arc ion plating device according to claim 1, characterized in that: The outer wall of the vacuum chamber is provided with a first cooling channel and a second cooling channel; The first cooling channel extends between the bottom end and the top end of the vacuum chamber, and the length of the first cooling channel is 0.1-2 times the height of the vacuum chamber; The second cooling channel extends in a curved shape.

16. The multi-arc ion plating device according to claim 14, characterized in that: The control valve group comprises a valve body, the valve body is provided with an air inlet, an air outlet and a plurality of air extraction channels, each of the air extraction channels is connected between the air inlet and the air outlet; The vacuum pump assembly comprises a roughing pump assembly and a finishing pump assembly; The valve body is connected to the vacuum pumping port of the vacuum chamber through the air inlet, and the rough pump assembly is connected between the air inlet and the vacuum pumping port; The valve body is further provided with a fine extraction outlet, the fine extraction outlet is communicated with the air extraction channel, and the fine extraction outlet is located between the air inlet and the air outlet; The control valve group also includes a plugging component and an opening and closing drive component. The plugging component can be opened and closed to cover the fine extraction outlet. The opening and closing drive component is connected to the plugging component and can drive the plugging component to open and close the fine extraction outlet.

17. The multi-arc ion plating device according to claim 16, characterized in that: The opening and closing drive assembly includes a drive member and an actuator rod, the drive assembly is arranged outside the valve body, one end of the actuator rod is connected to the drive assembly, and the other end of the actuator rod extends into the air extraction channel and is connected to the blocking assembly, and the drive assembly drives the actuator rod to push or pull the blocking assembly relative to the fine extraction outlet, so that the blocking assembly closes or opens the fine extraction outlet; The roughing pump assembly comprises a first direct-connected pump, a Roots pump, a first filter and a first connecting pipe group, wherein the first filter, the Roots pump and the first direct-connected pump are sequentially connected through the first connecting pipe group, and an inlet end of the first filter is connected to the air outlet through the first connecting pipe group; The fine pump assembly comprises a second direct-connected pump, a second connecting pipe set and a molecular pump, wherein the second direct-connected pump is connected to the molecular pump through the second connecting pipe set, and the molecular pump is connected to the fine pump outlet; The first connecting pipe group and the second connecting pipe group are both provided with leak detection holes, and the leak detection holes are used to install leak detection components.

18. The multi-arc ion plating device according to claim 17, characterized in that: The cooling module comprises a first liquid inlet pipeline, a first liquid outlet pipeline, a second liquid inlet pipeline, a second liquid outlet pipeline, a first liquid inlet joint, a first liquid outlet joint, a second liquid inlet structure and a second liquid outlet joint; The first liquid inlet pipeline is provided with a plurality of first liquid inlet joints, so as to deliver the first cooling fluid to the temperature-prone component through the plurality of first liquid inlet joints, and the first liquid outlet pipeline is provided with a plurality of first liquid outlet joints, so as to allow the first cooling fluid in the temperature-prone component to flow back to the first liquid outlet pipeline through the plurality of first liquid outlet joints; The second liquid inlet pipeline is provided with a plurality of second liquid inlet joints, so as to deliver the second cooling fluid to the temperature-prone component through the plurality of second liquid inlet joints, and the second liquid outlet pipeline is provided with a plurality of second liquid outlet joints, so as to allow the second cooling fluid in the temperature-prone component to flow back to the second liquid outlet pipeline through the plurality of second liquid outlet joints; The temperature of the first cooling fluid is lower than the temperature of the second cooling fluid.

19. The multi-arc ion plating device according to claim 18, characterized in that: The first liquid inlet pipeline, the first liquid outlet pipeline, the second liquid inlet pipeline and the second liquid outlet pipeline each include a first end and a second end; The first end of the first liquid inlet pipeline is used to pass the first cooling fluid, the first end of the second liquid inlet pipeline is used to connect the second cooling fluid, and the second end of the first liquid inlet pipeline is connected to the second end of the second liquid inlet pipeline; The cooling module further includes a first switching valve and a second switching valve, wherein the first switching valve is disposed at the second end of the first liquid inlet pipeline, the second switching valve is disposed in the first liquid inlet pipeline and is spaced apart from the first end of the first liquid inlet pipeline, and a plurality of the first liquid inlet joints for connecting the inlet of the molecular pump and the inlet of the Roots pump are disposed between the second switching valve and the first end of the first liquid inlet pipeline; The first end of the first liquid outlet pipeline is used to discharge the first cooling fluid, the first end of the second liquid outlet pipeline is used to discharge the second cooling fluid, and the second end of the first liquid outlet pipeline is connected to the second end of the second liquid outlet pipeline; The cooling module further includes a third switching valve and a fourth switching valve, wherein the third switching valve is disposed at the second end of the first liquid outlet pipeline, the fourth switching valve is disposed at the first liquid outlet pipeline and is spaced apart from the first end of the first liquid outlet pipeline, and a plurality of the first liquid outlet joints for connecting the outlet of the molecular pump and the outlet of the Roots pump are disposed between the fourth switching valve and the first end of the first liquid outlet pipeline; And / or, the cooling module further includes a first pressure regulating pipeline, the first pressure regulating pipeline includes a first pressure regulating pipe group and a first pressure regulating member, the inlet end of the first pressure regulating member is connected to the first liquid inlet pipeline, and the outlet end of the first pressure regulating member is connected to the first liquid outlet pipeline through the first pressure regulating pipe group; The cooling module further includes a second pressure regulating pipeline, the second pressure regulating pipeline includes a second pressure regulating pipe group and a second pressure regulating member, the inlet end of the second pressure regulating member is connected to the second liquid inlet pipeline, and the outlet end of the second pressure regulating member is connected to the second liquid outlet pipeline; And / or, the cooling module also includes a pressure relief pipeline, which includes four pressure relief valves and a pressure relief pipe group, the inlets of the four pressure relief valves are respectively connected to the first liquid inlet pipeline, the first liquid outlet pipeline, the second liquid inlet pipeline and the second liquid outlet pipeline, and the pressure relief pipe group connects the outlets of the four pressure relief valves with the outside world.

20. The multi-arc ion plating device according to claim 19, characterized in that: The power module includes a first power supply for supplying power to the coating arc source, a second power supply for supplying power to the etching arc source, a third power supply for supplying power to the bias mechanism, and a fourth power supply for supplying power to the electromagnetic coil; The electric control module includes a main control console, and the main control console is arranged on the side of the vacuum chamber along the second direction.

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