Vapor deposition device and deposition method for solar cell processing

Abstract

The invention discloses a vapor deposition device and method for solar cell machining, the vapor deposition device for solar cell machining comprises a cabinet body, a plurality of connecting boxes, a feeding structure and a sliding rail, the upper end of the cabinet body is sequentially provided with a feeding box, a first reaction box, a second reaction box and a discharging box, the feeding box, the first reaction box, the second reaction box and the discharging box are arranged at intervals, the connecting box is installed on the cabinet body, matched with the intervals and used for communicating with the feeding box, the first reaction box, the second reaction box and the discharging box, the feeding structure is slidably connected with the bottom wall of the connecting box, and the sliding rails are matched with the two ends of the connecting box. A sealing door is slidably connected to the sliding rail. Compared with the prior art, the vapor deposition device and the deposition method for solar cell processing can reduce the energy consumption of solar cell production, reduce the production cost of solar cell production, and are not easy to influence the conversion efficiency of solar cells.

Description

Technical Field

[0001] The present invention belongs to the technical field of solar cell processing, and in particular relates to a vapor deposition device and a deposition method for solar cell processing. Background Art

[0002] The ALD (atomic layer deposition) process is a vapor deposition technology based on chemical adsorption and is generally divided into the following four steps and two "half reactions":

[0003] 1) Precursor (atom) A is carried by an inert gas and enters the reaction chamber in a pulsed form. The substrate in the reaction chamber is exposed to the atmosphere of precursor A. Precursor A adheres to the surface of the substrate in the form of chemical adsorption until saturation occurs, and new functional groups are formed on the surface.

[0004] 2) Inert gas enters the chamber to purge the reaction chamber and remove the remaining unreacted precursor A and by-products from the chamber, cleaning the reaction chamber. The first "half-reaction" is completed.

[0005] 3) Precursor (atom) B is carried by the inert gas into the reaction chamber through a pulse, and reacts chemically with the functional groups on the surface of the cell until the surface functional groups are completely saturated;

[0006] 4) Inert gas enters the chamber again to purge the reaction chamber and take the remaining unreacted precursor B and by-products out of the chamber, cleaning the reaction chamber. The second "half reaction" is completed.

[0007] In short, the above steps involve water vapor first neutralizing dangling bonds on the silicon wafer surface, forming hydroxyl groups. Trimethylaluminum then reacts with the hydroxyl groups to form an Al2O3 film and silane gas. This purge process is repeated until a well-performing passivation layer is formed. Ideally, the molecules in the aluminum oxide layer are neatly and regularly arranged on the silicon substrate. However, in practice, excessively high process temperatures or insufficient processing time can cause trimethylaluminum to react with hydroxyl groups instead of hydrogen atoms, or incomplete alignment can lead to CVD parasitic reactions. This not only reduces the passivation effect but also results in higher energy consumption, increasing the production cost of the solar cell and affecting its conversion efficiency.

[0008] The information disclosed in this background section is only intended to enhance understanding of the overall background of the invention and should not be considered as an admission or any form of suggestion that the information constitutes the prior art already known to a person skilled in the art. Summary of the Invention

[0009] The object of the present invention is to provide a vapor deposition device and a deposition method for solar cell processing, which can solve the technical problems raised in the above background technology.

[0010] In order to achieve the above object, a specific embodiment of the present invention provides the following technical solutions:

[0011] A vapor deposition device for processing solar cells includes a cabinet, multiple connecting boxes, a feeding structure and a slide rail. The upper end of the cabinet is sequentially installed with a loading box, a first reaction box, a second reaction box and a discharge box. The loading box, the first reaction box, the second reaction box and the discharge box all have intervals. The connecting box is installed on the cabinet and matches the intervals, and is respectively used to connect the loading box, the first reaction box, the second reaction box and the discharge box. The feeding structure is slidably connected to the bottom wall of the connecting box for grabbing the battery cells. The slide rail is matched with both ends of the connecting box. A sealing door is slidably connected to the slide rail. The slide rail and the sealing door are used to control whether the loading box, the first reaction box, the second reaction box and the discharge box are connected. The first reaction box is used for the battery cells to complete the first reaction of vapor deposition, and the second reaction box is used for the battery cells to complete the second reaction of vapor deposition.

[0012] The slide rails and sealed doors work together to separate the spaces within the loading chamber, the first reaction chamber, the second reaction chamber, and the discharge chamber, allowing the three chambers to function independently. The first reaction can proceed in the first reaction chamber, while the second reaction can proceed in the second reaction chamber without interfering with each other, significantly improving the efficiency of vapor deposition in solar cell processing. The temperature, reaction medium, and purge time within the first and second reaction chambers can be set independently, allowing for customized configurations based on the needs of the cells, facilitating cell production.

[0013] In one or more embodiments of the present invention, the loading box, the first reaction box, the second reaction box and the discharge box are all equipped with a base for placing battery cells, a groove is provided at the upper end of the base, and a plurality of lifting rods are installed on the bottom wall of the groove, and the lifting rods are used to lift the battery cells.

[0014] By setting the lifting rod, the position of the battery cell can be matched with the feeding mechanism. In the initial state, the upper end surface of the lifting rod is lower than the bottom wall of the groove, and the battery cell is placed in the groove to achieve the positioning and placement of the battery cell.

[0015] In one or more embodiments of the present invention, a second slide groove is provided on the inner bottom wall of the connecting box, and the feeding structure includes a support seat matching the second slide groove, the support seat is slidably connected in the second slide groove, the upper end of the second slide groove is fixedly connected to the first motor, the output end of the first motor is fixedly connected to the first connecting arm, a first slide groove is provided on the first connecting arm, a second motor matching the first slide groove is slidably connected to the first connecting arm, the output end of the second motor is fixedly connected to the second connecting arm, and a plurality of negative pressure suction nozzles are installed on the second connecting arm.

[0016] By setting up a feeding structure, the battery cells can be transported. By setting up a negative pressure suction nozzle, the damage to the silicon wafers during the grabbing process can be reduced, and the stability of the battery cells during the transportation process can be ensured.

[0017] In one or more embodiments of the present invention, each of the connection boxes is connected to a vacuum pump.

[0018] The vacuum state of the loading box, the first reaction box, the second reaction box and the discharging box can be achieved by setting a vacuum pump.

[0019] In one or more embodiments of the present invention, an atom recovery assembly is included. The atom recovery assembly is divided into two groups, one group is used to process the reaction medium in the first reaction box, and the other group is used to process the reaction medium in the second reaction box.

[0020] In one or more embodiments of the present invention, the atom recovery assembly includes a recovery tank, an air pump is installed on the recovery tank, a recovery pipe is installed on the air pump, and the other end of the recovery pipe is used to connect to the first reaction box or the second reaction box.

[0021] By setting up the atom recovery component, the reaction medium in the first reaction box and the second reaction box can enter the corresponding atom recovery component respectively, so that the atoms and the atmosphere can be separated to achieve the secondary utilization of the reaction medium.

[0022] In one or more embodiments of the present invention, a first cavity is provided on the first reaction box, a second cavity is provided on the second reaction box, an exhaust pipe is installed on the recovery tank, an atomic filter is installed in the recovery tank, one end of the exhaust pipe is connected to the atomic filter, and the other end is used to connect to the first cavity or the second cavity.

[0023] By setting up the first cavity and the second cavity, the separated atmosphere enters the first cavity and the second cavity to achieve heat exchange between the first cavity and the second cavity, thereby preheating the reaction medium newly added to the first reaction box and the second reaction box, reducing the use cost of the vapor deposition device.

[0024] In one or more embodiments of the present invention, a pulse generator is installed in the cabinet, and a gas pipe and a first raw gas input pipe matching the pulse generator are installed on the cabinet. A first raw gas output pipe and a second raw gas output pipe are also installed on the pulse generator. The other end of the first raw gas output pipe is connected to the first reaction box, and the other end of the second raw gas output pipe is connected to the second reaction box. A gas pipe is installed on the recovery tank, and the other end of the gas pipe is connected to the second raw gas input pipe or the first raw gas input pipe.

[0025] In one or more embodiments of the present invention, an atom detection device for detecting the number of atoms in the recovery tank is installed in the recovery tank.

[0026] In order to achieve the above object, a specific embodiment of the present invention provides the following technical solutions:

[0027] A vapor deposition method for solar cell processing, comprising the following steps:

[0028] S1. Cell pretreatment:

[0029] Clean impurities on the surface of the battery cell and form a velvet structure on the surface of the battery cell;

[0030] S2. First reaction:

[0031] The first reaction medium enters the first reaction box in a pulsed manner, and the solar cell in the first reaction box is exposed to the first reaction medium. The first reaction medium adheres to the surface of the solar cell in the form of chemical adsorption and forms new functional groups on the surface.

[0032] The inert gas enters the first reaction box to purge the first reaction box, and the remaining unreacted first reaction medium is taken out of the first reaction box through the atom recovery component. In this process, the first reaction box is cleaned;

[0033] S3, second reaction:

[0034] The second reaction medium enters the second reaction box through a pulse and chemically reacts with the functional groups on the surface of the solar cell until the surface functional groups react to a fully saturated state;

[0035] The inert gas enters the second reaction box to purge the second reaction box, and takes the remaining unreacted second reaction medium out of the second reaction box through the atom recovery component. In this process, the second reaction box is cleaned.

[0036] Compared with the prior art, the vapor deposition device and deposition method for solar cell processing of the present invention can avoid the situation where trimethylaluminum reacts with hydroxyl groups instead of hydrogen atoms due to excessively high process temperature or insufficient time, or CVD parasitic conditions occur due to incomplete arrangement, thereby avoiding the situation where the passivation effect deteriorates, reducing the energy consumption of solar cell production, reducing the production cost of solar cell production, and not easily affecting the conversion efficiency of solar cell. BRIEF DESCRIPTION OF THE DRAWINGS

[0037] In order to more clearly illustrate the embodiments of the present invention or the technical solutions in the prior art, the following briefly introduces the drawings required for use in the embodiments or the description of the prior art. Obviously, the drawings described below are only some embodiments recorded in the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying any creative work.

[0038] Figure 1 Schematic diagram of the structure of a vapor deposition device for processing solar cells in one embodiment of the present invention Figure 1 ;

[0039] Figure 2 Schematic diagram of the structure of a vapor deposition device for processing solar cells in one embodiment of the present invention Figure 2 ;

[0040] Figure 3 Schematic diagram of the structure of a vapor deposition device for processing solar cells in one embodiment of the present invention Figure 3 ;

[0041] Figure 4 is a cross-sectional view of a vapor deposition apparatus for processing solar cells according to one embodiment of the present invention;

[0042] Figure 5 for Figure 4 Schematic diagram of the structure at A in the middle;

[0043] Figure 6 This is a structural diagram of a connecting box and a feeding structure in one embodiment of the present invention;

[0044] Figure 7 A schematic structural diagram of a base and a lifting rod in one embodiment of the present invention;

[0045] Figure 8 A cross-sectional view of a recovery tank according to an embodiment of the present invention;

[0046] Figure 9 is a flow chart of a vapor deposition method for processing solar cells according to one embodiment of the present invention;

[0047] Figure 10 Schematic diagram of the structure without CVD parasitic conditions;

[0048] Figure 11 1 is a data comparison chart of the vapor deposition method according to an embodiment of the present invention and the vapor deposition method according to the prior art.

[0049] Description of main reference numerals:

[0050] 1. Cabinet; 2. Loading box; 201. First cover; 3. First reaction box; 301. First cavity; 4. Second reaction box; 401. Second cavity; 5. Discharge box; 501. Second cover; 6. Base; 601. Groove; 7. Lifting rod; 8. Connecting box; 801. Second chute; 9. Feeding structure; 901. Support base; 902. First motor; 903. First connecting arm; 9031. First chute; 904. Second motor; 90 5. Second connecting arm; 906. Negative pressure nozzle; 10. Slide rail; 11. Sealed door; 12. Atom recovery assembly; 13. Recovery tank; 14. Air pump; 15. Recovery pipe; 16. Exhaust pipe; 17. Gas pipe; 18. Exchange pipe; 19. First raw gas input pipe; 20. Pulse generator; 21. First raw gas output pipe; 22. Atom filter; 23. Atom detection device; 24. Second raw gas input pipe; 25. Second raw gas output pipe. DETAILED DESCRIPTION

[0051] In order to enable those skilled in the art to better understand the technical solutions of the present invention, the technical solutions in the embodiments of the present invention will be clearly and completely described below in conjunction with the accompanying drawings of the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts should fall within the scope of protection of the present invention.

[0052] like Figures 1 to 5 As shown, a vapor deposition device for processing solar cells in one embodiment of the present invention includes a cabinet 1. A loading box 2, a first reaction box 3, a second reaction box 4, and a discharge box 5 are installed on the upper end of the cabinet 1 from left to right. The loading box 2 is used to place solar cells, and the discharge box 5 is used to remove solar cells. The first reaction box 3 is used for the first processing of solar cells, and the second reaction box 4 is used for the second processing of solar cells. There are gaps between the loading box 2, the first reaction box 3, the second reaction box 4, and the discharge box 5. A connection box 8 matching the gaps is fixedly connected to the cabinet 1. A feeding structure 9 is slidably connected to the bottom wall of the connection box 8. The feeding structure 9 is used to grab the solar cells and move the position of the solar cells.

[0053] Specifically, such as Figures 1 to 4As shown, a pulse generator 20 is installed in the cabinet 1. A first raw gas inlet pipe 19 and a second raw gas inlet pipe 24 are installed on the cabinet 1 to match the pulse generator 20. A first raw gas outlet pipe 21 and a second raw gas outlet pipe 25 are also installed to match the pulse generator 20. The first raw gas inlet pipe 19 is used to transport the first reaction medium, and the second raw gas inlet pipe 24 is used to transport the second reaction medium. After passing through the first raw gas outlet pipe 21, the first reaction medium enters the first reaction box 3 in a pulsed manner through the first raw gas outlet pipe 21, and the second reaction medium enters the second reaction box 4 in a pulsed manner through the second raw gas outlet pipe 25. The reaction medium enters the first reaction box 3 or the second reaction box 4 and reacts with the battery cells, forming a film layer on the surface of the battery cells.

[0054] like Figures 1 to 7 As shown, the inner bottom wall of the connection box 8 is provided with a second chute 801, and a feeding structure 9 that matches the second chute 801 is slidably connected to the connection box 8. The feeding structure 9 grabs and transfers the battery cells. Specifically, the feeding structure 9 includes a support base 901 that is slidably connected to the second chute 801. The support base 901 is fixedly connected to a first motor 902. The output shaft of the first motor 902 is fixedly connected to a first connecting arm 903. The first connecting arm 903 is provided with a first chute 9031. The first connecting arm 903 is slidably connected to a second motor 904 that matches the first chute 9031. The output shaft of the second motor 904 is rotatably connected to a second connecting arm 905. The cooperation of the support base 901, the first motor 902, the first connecting arm 903, the second motor 904, and the second connecting arm 905 enables the battery cells to be grabbed and transferred.

[0055] To further improve the stability of the process of grabbing the battery cell, such as Figure 6 As shown, a plurality of negative pressure nozzles 906 are installed on the second connecting arm 905. One end of the negative pressure nozzle 906 is connected to a negative pressure, and the battery cell is fixed by means of negative pressure. The negative pressure nozzle 906 is made of an elastic material, which can prevent the battery cell from being damaged during the process of grabbing the battery cell. Of course, due to the existence of Bernoulli's principle, the negative pressure nozzle 906 can also grab the battery cell by blowing air, so that there is a certain gap between the battery cell and the negative pressure nozzle 906. The second connecting arm 905 does not contact the surface of the second connecting arm 905. The battery cell is supported by the gas, making it less likely to be damaged during the grabbing process.

[0056] like Figures 1 to 5As shown, to align the position of the battery cells with the gripping position of the feeding structure 9, a base 6 is installed inside the loading box 2, the first reaction box 3, the second reaction box 4, and the discharge box 5. The upper end surface of the base 6 is provided with a groove 601. The battery cells are placed in the groove 601 to achieve the positioning of the battery cells. The bottom of the groove 601 is installed with a lifting rod 7, which can lift the battery cells to align their position with the position of the feeding structure 9. The lifting rod 7 and the feeding structure 9 cooperate to facilitate the gripping of the battery cells.

[0057] Specifically, such as Figures 1 to 5 As shown, the loading box 2 is rotatably connected to the first cover 201, and the discharge box 5 is rotatably connected to the second cover 501. The first cover 201 and the second cover 501 are in a closed state, and the loading box 2, the first reaction box 3, the second reaction box 4, and the discharge box 5 are in a sealed state. To place a battery cell, first open the first cover 201, then place the battery cell on the base 6 in the upper loading box 2, so that the battery cell matches the position of the groove 601. Then close the first cover 201, and the lifting rod 7 will lift the battery cell so that the height of the battery cell is higher than the grasping position of the feeding structure 9, making it easier for the feeding structure 9 to grasp the battery cell.

[0058] like Figures 1 to 5 As shown, since the connecting box 8 is connected to the loading box 2, the first reaction box 3, the second reaction box 4 and the discharge box 5, if the first reaction box 3 releases the reaction medium, the reaction medium will diffuse into the loading box 2, the second reaction box 4 and the discharge box 5. In order to avoid the above situation, a plurality of sealing devices are installed at the position where the loading box 2, the first reaction box 3, the second reaction box 4 and the discharge box 5 are connected to the connecting box 8. The sealing device can seal the loading box 2, the first reaction box 3, the second reaction box 4 and the discharge box 5 separately. When the first reaction box 3 releases the reaction medium, the reaction medium will not cross the sealing device and enter the loading box 2, the second reaction box 4 or the discharge box 5. This prevents the reaction medium from entering other boxes and affecting the production of battery cells.

[0059] Specifically, the sealing device includes a slide rail 10 and a sealing door 11 slidably connected to the slide rail 10. The slide rail 10 is fixed to the side of the connection box 8 near the connection between the loading box 2, the first reaction box 3, the second reaction box 4, and the discharge box 5. The slide rail 10 and the sealing door 11 are equivalent to a double-opening sliding door structure, which can completely seal the connection between the connection box 8 and the box body.

[0060] When using, such as Figures 1 to 4As shown, when placing the battery cells, the connection box 8 near the first reaction box 3 in the loading box 2 is closed to prevent leakage of the reaction medium in the first reaction box 3 during the placement of the battery cells. After the first cover 201 is closed, the connection box 8 near the first reaction box 3 in the loading box 2 is opened, and the feeding structure 9 grabs the battery cells and places them into the connection box 8. The connection box 8 near the first reaction box 3 in the loading box 2 is closed. The connection box 8 near the loading box 2 in the first reaction box 3 is opened, and the battery cells are placed on the base 6 in the first reaction box 3 via the feeding structure 9. At this time, the connection box 8 between the loading box 2 and the first reaction box 3 will be filled with reaction medium. This influx of reaction medium will preheat the battery cells. When the battery cells are placed on the base 6 in the first reaction box 3 for processing, the process effect will be better. After the battery cells are on the base 6 in the first reaction box 3 and the feeding structure 9 is stored in the connection box 8, the connection box 8 on the side of the first reaction box 3 near the loading box 2 is closed.

[0061] After the battery cell process is completed in the first reaction box 3, the connecting box 8 of the first reaction box 3 near the second reaction box 4 will be opened, and the battery cell will be grabbed into the connecting box 8 through the feeding structure 9 in this connecting box 8, and then the connecting box 8 of the first reaction box 3 near the second reaction box 4 will be closed. At this time, the reaction medium in the connecting box 8 is a gas having the first reaction medium. If the connecting box 8 of the second reaction box 4 near the first reaction box 3 is opened, the two media will be mixed together, which is not conducive to the production of battery cells. In order to solve the above problem, one end of each connecting box 8 is connected to a vacuum pump (not shown in the figure), and the vacuum pump will extract the excess gas in the connecting box 8 to make the connecting box 8 a vacuum state. At this time, the connecting box 8 is opened, and the battery cell is transferred to the base 6 in the second reaction box 4 through the feeding structure 9, and the connecting box 8 of the second reaction box 4 near the first reaction box 3 is closed. While the connecting box 8 is vacuumed, the second reaction box 4 performs the second process.

[0062] After the process of the battery cells is completed in the second reaction box 4, the connecting box 8 on the side of the second reaction box 4 close to the discharge box 5 is opened, the battery cells are grabbed into the connecting box 8 through the feeding structure 9, and the connecting box 8 on the side of the second reaction box 4 close to the discharge box 5 is closed, the connecting box 8 is evacuated to a vacuum, and then the connecting box 8 in the discharge box 5 is opened, and the battery cells are sent to the base 6 in the discharge box 5 through the feeding structure 9 to complete the vapor deposition of the battery cells. The second cover 501 can be opened to take out the battery cells that have completed the vapor deposition.

[0063] The reaction medium in the first reaction box 3 and the second reaction box 4 is not easily exposed to the air, thereby preventing the reaction medium from causing harm to the human body. The first reaction medium and the second reaction medium will not mix, thereby improving the yield of the battery cell film forming.

[0064] like Figure 7 As shown, the depth of the groove 601 is equal to the thickness of the battery cell. After the battery cell is located in the groove 601, only one end surface of the battery cell that requires processing is exposed, and the other surfaces are wrapped by the groove 601, that is, the reaction medium does not contact other surfaces and will not affect the side of the battery that does not require processing.

[0065] In this embodiment, by providing a loading box 2, a first reaction box 3, a second reaction box 4, a discharge box 5, and multiple connection boxes 8 and a sealing device, the sealing device can seal each box body so that the gases in the box body do not mix. The first reaction box 3 and the second reaction box 4 can respectively complete different processes, greatly improving the efficiency of the vapor deposition of solar cells. There is no need to wait for the first process to be completed and then replace the gas before preparing the solar cells, thereby improving the production efficiency of solar cells. The second reaction box 4 and the first reaction box 3 can achieve different temperature process environments. Different process temperatures can be controlled in the second reaction box 4 and the first reaction box 3 according to process requirements, and the two do not affect each other, thereby improving the conversion efficiency of the cell.

[0066] In this embodiment, the process temperature and process time in the first reaction box 3 and the second reaction box 4 can be set separately, and the purge time in the first reaction box 3 and the second reaction box 4 can be set separately so that the purge meets the process requirements. Even if the purge time is increased, the production efficiency of the battery cell can be accelerated by setting the first reaction box 3 and the second reaction box 4. The first reaction box 3 and the second reaction box 4 save the time wasted in ventilation, thereby offsetting the increase in the purge time used, and will not cause a decrease in the production efficiency of the battery cell. By increasing the purge time, it is possible to avoid encountering the situation where the process temperature is too high or the time is insufficient, so that trimethylaluminum reacts with hydroxyl groups instead of hydrogen atoms, or is not fully arranged to cause CVD parasitic conditions, thereby avoiding affecting the passivation effect of the battery cell, avoiding the situation where the use of a vapor deposition device to process the battery cell leads to high energy consumption, reducing the production cost of the solar cell, and to a certain extent, improving the conversion efficiency of the solar cell.

[0067] It is worth noting that in the process of processing battery cells using the ALD process, using a purge mechanism for purge is common knowledge among those skilled in the art. In this embodiment, only the purge time of the ALD process is increased, and no improvement is made to the purge structure. Therefore, the purge mechanism is not described in detail in this embodiment.

[0068] In this embodiment, the reaction medium is a combination of an inert gas and atoms A or atoms B, wherein atoms A and atoms B are generally arranged differently according to the film requirements of the solar cell.

[0069] In another embodiment, if the reaction medium is continuously added to the first reaction box 3 or the second reaction box 4 in pulses, the inert gas in the reaction medium in the first reaction box 3 or the second reaction box 4 will increase, reducing the amount of atoms retained. Therefore, after the process is carried out for a period of time, the reaction medium in the first reaction box 3 or the second reaction box 4 needs to be discharged. During the process of discharging the reaction medium, some atoms will still remain in the reaction medium, and adding new reaction medium will also reduce the problem in the first reaction box 3 or the second reaction box 4. The newly added reaction medium needs to be heated before the process can be continued, which will increase the production cost of the solar cell and reduce the production efficiency of the solar cell to a certain extent.

[0070] To solve the above problems, an atom recovery assembly 12 is installed on the first reaction box 3 and the second reaction box 4, respectively. The atom recovery assembly 12 can recover the reaction medium that needs to be recovered in the first reaction box 3 and the second reaction box 4, and filter the atoms in the reaction medium. When the number of atoms stored in the atom recovery assembly 12 reaches the process requirements, the atom recovery assembly 12 transports the atoms and the inert gas to the first raw gas input pipe 19 or the second raw gas input pipe 24, realizing the secondary utilization of the atoms, which is beneficial to energy conservation and environmental protection. At the same time, the heat-containing inert gas in the reaction medium is used to heat the first reaction box 3 or the second reaction box 4, thereby reducing the energy consumed by the deposition device to heat the new reaction medium, which is beneficial to energy conservation and environmental protection, and to a certain extent improves the production efficiency of solar cells.

[0071] Specifically, such as Figures 1 to 8 As shown, the atom recovery assembly 12 includes a recovery tank 13, an air pump 14 is installed on the recovery tank 13, and a recovery pipe 15 is installed on the air pump 14. The recovery pipe 15 is connected to the air pump 14, and the other end of the recovery pipe 15 is connected to the first reaction box 3 or the second reaction box 4, and the reaction medium in the first reaction box 3 or the second reaction box 4 is transported to the recovery tank 13 for temporary storage. An atom filter 22 is installed inside the recovery tank 13. The atom filter 22 can filter atoms in the reaction medium, and the atoms remain inside the recovery tank 13. An exhaust pipe 16 is installed on the atom filter 22. The reaction gas filtered by the atom filter 22 is transported to the first reaction box 3 or the second reaction box 4 by the exhaust pipe 16. It is used to achieve heating of the first reaction box 3 or the second reaction box 4, increase the problem of new reaction medium entering the first reaction box 3 or the second reaction box 4, and reduce the energy consumption consumed by the first reaction box 3 or the second reaction box 4 to heat the new reaction medium.

[0072] like Figures 3 to 5As shown, a first cavity 301 is provided on the first reaction box 3, and a second cavity 401 is provided on the second reaction box 4. The other end of the exhaust pipe 16 is communicated with the first cavity 301 or the second cavity 401, that is, the reaction gas is transported to the first cavity 301 or the second cavity 401 by the exhaust pipe 16. The reaction gas filtered by the atomic filter 22 has heat, which meets the process requirements. After being input into the first cavity 301 or the second cavity 401, the hot reaction gas exchanges heat with the first reaction box 3 or the second reaction box 4, which can increase the temperature inside the first reaction box 3 and the second reaction box 4, realize heat recovery and utilization, reduce the use cost of the vapor deposition device, and is beneficial to energy saving and environmental protection.

[0073] like Figures 1 to 3 As shown, first and second reaction boxes 3 and 4 are each provided with a first raw gas output pipe 21, through which the gas within first and second chambers 301 and 401 can be discharged. After heat exchange is completed, the reaction gas is discharged through the first raw gas output pipe 21. The recovery tank 13 cooperates with the exhaust pipe 16 to continuously input hot gas into the first and second chambers 301 and 401, thereby maintaining the temperature of the first and second reaction boxes 3 and 4 and minimizing the risk of low temperatures that could affect the quality of the solar cells.

[0074] like Figures 1 and 2 As shown, a gas pipe 17 is installed between the recovery tank 13 and the second raw gas input pipe 24, and between the recovery tank 13 and the first raw gas input pipe 19. An atom detection device 23 is also installed inside the recovery tank 13. The atom detection device 23 can detect the atomic content in the recovery tank 13. If the atomic content in the atom recovery tank 13 meets the requirements, the reaction medium is transported to the second raw gas input pipe 24 or the first raw gas input pipe 19 through the gas pipe 17. The reaction medium that meets the requirements is then transported back to the first reaction box 3 or the second reaction box 4 for secondary use, which is beneficial to energy conservation and environmental protection, and facilitates reducing the cost of solar cell production. In addition, the input heat exchange medium has a high calorific value, and the heat is close to the process requirements, or even meets the process requirements. After being input into the first reaction box 3 or the second reaction box 4, the energy consumption of heating the reaction medium is lower, reducing the cost of using the vapor deposition device.

[0075] like Figure 2As shown, since the first reaction box 3 and the second reaction box 4 are respectively connected to the atom recovery assembly 12, when the temperature of the reaction medium in one of the recovery tanks 13 is insufficient to heat the first reaction box 3 or the second reaction box 4, the cost of heating the reaction medium in the vapor deposition apparatus will increase. To solve the above problem, an exchange tube 18 is installed between the two exhaust pipes 16. The exchange tube 18 is used to transport hot reaction gas between the two exhaust pipes 16. That is, when the temperature of the hot reaction gas in the recovery tank 13 connected to the first reaction box 3 is lower than the process temperature, the gas in the recovery tank 13 connected to the second reaction box 4 can be transported to the first chamber 301 through the exchange tube 18 to achieve compensation of the hot reaction gas.

[0076] In this embodiment, the atom recovery assembly 12 is provided to recycle the reaction medium and utilize the reaction gas in the reaction medium to heat the first and second reaction boxes 3 and 4, thereby reducing the energy consumption of heating the new reaction gas in the first and second reaction boxes 3 and 4, thereby promoting energy conservation and environmental protection. Furthermore, the atom recovery assembly 12 can recycle atoms, and the recovered atoms can be returned to the first and second reaction boxes 3 and 4 to continue the preparation of the solar cell, thereby promoting energy conservation and environmental protection.

[0077] A vapor deposition method for processing solar cells according to an embodiment of the present invention comprises the following steps:

[0078] S1. Cell pretreatment: clean the impurities on the cell surface and form a suede structure on the cell surface;

[0079] S2, first reaction: The first reaction medium enters the first reaction box 3 in a pulsed manner, and the solar cells in the first reaction box 3 are exposed to the first reaction medium. The first reaction medium adheres to the surface of the solar cells in the form of chemical adsorption and forms new functional groups on the surface. Inert gas enters the first reaction box 3 to purge the first reaction box 3, and the remaining unreacted first reaction medium is removed from the first reaction box 3 through the atom recovery component 12. In this process, the first reaction box 3 is cleaned.

[0080] S3, second reaction: the second reaction medium enters the second reaction box 4 through pulses, and chemically reacts with the functional groups on the surface of the solar cell until the surface functional groups react to a completely saturated state; the inert gas enters the second reaction box 4, purges the second reaction box 4, and takes the remaining unreacted second reaction medium out of the second reaction box 4 through the atom recovery component 12. In this process, the second reaction box 4 is cleaned.

[0081] In short, water vapor first neutralizes the dangling bonds on the surface of the silicon wafer to form hydroxyl groups, and then trimethylaluminum reacts with the hydroxyl groups to form a layer of Al2O3 film and silane gas. The purge is repeated until a good passivation layer is formed.

[0082] like Figure 11 As shown, the original process employed a water vapor pulse duration of 6 seconds, a purge duration of 12 seconds, and a process flow rate of 20 sccm. The TMA pulse duration was 5.5 seconds, a purge duration of 12 seconds, and a process flow rate of 20 sccm. The purge duration for both gases was now changed from 12 seconds to 16 seconds. This process extends the reaction by 4 seconds, ensuring that the water vapor fully forms hydroxyl groups on the silicon wafer surface. During the TMA purge, the purge is stopped after trimethylaluminum has fully reacted with the hydrogen bonds in the hydroxyl groups, thus avoiding the generation of parasitic CAD. The pulse primarily fills the furnace with the gas (TMA stands for trimethylaluminum). The resulting aluminum oxide film thickness increases from 6.97 to 7.51, significantly improving solar cell quality and facilitating solar cell production.

[0083] The passivation layer prepared by the vapor deposition method in this embodiment is as follows Figure 10 As shown, the molecules in the aluminum oxide layer are regularly and neatly arranged on the silicon substrate.

[0084] It will be apparent to those skilled in the art that the present invention is not limited to the details of the exemplary embodiments described above and that the invention can be embodied in other specific forms without departing from the spirit or essential characteristics of the invention. Therefore, the embodiments should be considered in all respects as illustrative and non-restrictive, and the scope of the invention is defined by the appended claims, not the foregoing description, and all variations within the meaning and range of equivalents of the claims are intended to be included therein. Any reference sign in a claim should not be construed as limiting the claim to which it relates.

[0085] In addition, it should be understood that although this specification is described in terms of implementation methods, not every implementation method contains only one independent technical solution. This narrative method of the specification is only for the sake of clarity. Those skilled in the art should regard the specification as a whole. The technical solutions in each embodiment can also be appropriately combined to form other implementation methods that can be understood by those skilled in the art.

Claims

1. A vapor deposition device for solar cell processing, characterized in that: include: A cabinet, wherein a loading box, a first reaction box, a second reaction box and a discharging box are sequentially installed at the upper end of the cabinet, and the loading box, the first reaction box, the second reaction box and the discharging box are all separated; A plurality of connection boxes, which are installed on the cabinet and matched with the intervals, and are respectively used to connect the loading box, the first reaction box, the second reaction box and the discharging box; A feeding structure, the feeding structure is slidably connected to the bottom wall of the connection box and is used to grab the battery sheet; A slide rail, the slide rail is matched with both ends of the connection box, a sealing door is slidably connected to the slide rail, and the slide rail and the sealing door cooperate to control whether the loading box, the first reaction box, the second reaction box and the discharge box are connected; The first reaction box is used for the battery cell to complete the first reaction of vapor deposition, and the second reaction box is used for the battery cell to complete the second reaction of vapor deposition.

2. The vapor deposition device for solar cell processing according to claim 1, characterized in that: The loading box, the first reaction box, the second reaction box and the discharging box are all equipped with a base for placing battery cells, the upper end of the base is provided with a groove, the bottom wall of the groove is equipped with a plurality of lifting rods, and the lifting rods are used to lift the battery cells.

3. The vapor deposition device for solar cell processing according to claim 1, characterized in that: The inner bottom wall of the connection box is provided with a second sliding groove; The feeding structure comprises a support seat matched with the second slide slot, the support seat is slidably connected in the second slide slot, the upper end of the second slide slot is fixedly connected to the first motor, and the output end of the first motor is fixedly connected to the first connecting arm; The first connecting arm is provided with a first sliding groove, the first connecting arm is slidably connected with a second motor matching the first sliding groove, and the output end of the second motor is fixedly connected with the second connecting arm; A plurality of negative pressure nozzles are installed on the second connecting arm.

4. The vapor deposition device for solar cell processing according to claim 1, characterized in that: Each of the connection boxes is connected to a vacuum pump.

5. The vapor deposition device for solar cell processing according to claim 1, characterized in that: It comprises an atom recovery component, which is divided into two groups, one group is used for processing the reaction medium in the first reaction box, and the other group is used for processing the reaction medium in the second reaction box.

6. The vapor deposition device for solar cell processing according to claim 5, characterized in that: The atom recovery component comprises a recovery tank, an air pump is installed on the recovery tank, a recovery pipe is installed on the air pump, and the other end of the recovery pipe is used to connect the first reaction box or the second reaction box.

7. The vapor deposition device for solar cell processing according to claim 6, characterized in that: The first reaction box is provided with a first cavity, and the second reaction box is provided with a second cavity; An exhaust pipe is installed on the recovery tank, an atomic filter is installed in the recovery tank, one end of the exhaust pipe is connected to the atomic filter, and the other end is used to connect to the first cavity or the second cavity.

8. The vapor deposition device for solar cell processing according to claim 7, characterized in that: A pulse generator is installed in the cabinet, and a gas transmission pipe and a first raw gas input pipe matching the pulse generator are installed on the cabinet; The pulse generator is also provided with a first raw gas output pipe and a second raw gas output pipe, the other end of the first raw gas output pipe is connected to the first reaction box, and the other end of the second raw gas output pipe is connected to the second reaction box; The recovery tank is provided with an air supply pipe, and the other end of the air supply pipe is connected to the second raw gas input pipe or the first raw gas input pipe.

9. The vapor deposition device for solar cell processing according to claim 8, characterized in that: An atom detection device for detecting the number of atoms in the recovery tank is installed in the recovery tank.

10. A vapor deposition method for solar cell processing, characterized in that: The following steps are involved: S1. Cell pretreatment: Clean the impurities on the surface of the battery cell and form a suede structure on the surface of the battery cell; S2. First reaction: The first reaction medium enters the first reaction box in a pulsed form, and the solar cell in the first reaction box is exposed to the first reaction medium. The first reaction medium is attached to the surface of the solar cell in the form of chemical adsorption and forms new functional groups on the surface. The inert gas enters the first reaction box to purge the first reaction box, and the remaining unreacted first reaction medium is taken out of the first reaction box through the atom recovery component. In this process, the first reaction box is cleaned; S3, Second reaction: The second reaction medium enters the second reaction box through pulses and chemically reacts with the functional groups on the surface of the solar cell until the surface functional groups react to a fully saturated state; The inert gas enters the second reaction box to purge the second reaction box, and the remaining unreacted second reaction medium is taken out of the second reaction box through the atom recovery component. In this process, the second reaction box is cleaned.

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