Mask layout forming method, mask plate forming method, storage medium and terminal

Through the automated mask layout formation method, the layout information is read and identified, and the graphics are drawn and placed, which solves the problem of low mask layout generation efficiency in the prior art, and achieves a more efficient production process and a lower error rate .

CN119179229APending Publication Date: 2024-12-24ZHEJIANG ICSPROUT SEMICONDUCTOR CO LTD
View PDF 0 Cites 0 Cited by

Patent Information

Application Number
CN202411294645.0
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2024-09-13
Publication Date
2024-12-24

AI Technical Summary

Technical Problem

The existing mask layout formation method is inefficient and requires manual cooperation from multiple departments. The design cycle is long and error-prone. The marking and measurement graphics in the cutting path area are placed at will, resulting in a large amount of workload for later inspection.

Method used

By reading the layout information table, identifying the graphic feature information, drawing the layout graphics based on the graphic feature information, and placing it according to preset rules to generate a mask layout. All steps are based on automated program settings to reduce manpower participation and improve production efficiency.

Benefits of technology

Effectively reduce human participation, improve the efficiency of mask layout generation, reduce design cycle, reduce error occurrence, optimize the graphic placement of cutting path areas, and simplify post-inspection work.

✦ Generated by Eureka AI based on patent content.

Smart Images

  • Figure CN119179229A_ABST
    Figure CN119179229A_ABST
Patent Text Reader

Abstract

A forming method of a mask layout, a forming method of a mask, a storage medium and a terminal wherein the forming method of the mask layout comprises: reading a layout information table, the layout information table comprising graphic feature information; identifying the graphic feature information, and drawing the corresponding layout graph based on the graphic feature information; and placing the layout graph according to a preset rule. The layout information table is read, after the graphic feature information is recognized, the corresponding layout graph is drawn on the basis of the graphic feature information, and after the layout graph is drawn, the layout graph is placed on the basis of a preset rule, so that the mask layout is generated. Each step of generating the mask layout is completed based on automatic program setting, so that manpower participation can be effectively reduced, and the production efficiency of the mask layout can be effectively improved.
Need to check novelty before this filing date? Find Prior Art