Silica gel production temperature control method and system

Abstract

The invention provides a silica gel production temperature control method and system. The method comprises the steps that the temperature and viscosity of semi-solid silica gel in a stirring kettle at all monitoring points are collected; the temperature out-of-limit of the semi-solid silica gel is predicted through all the viscosities and all the temperatures, and the variable temperature of each monitoring point during temperature regulation and control of the semi-solid silica gel in the stirring kettle is determined according to the temperature out-of-limit and the stirring time of the stirring kettle; carrying out transfer analysis on the heating temperature of the semi-solid silica gel based on the sudden change temperature and the stirring speed of the semi-solid silica gel in the temperature reduction process to obtain the convective heat flux on the surface of the semi-solid silica gel; and according to all the variable temperatures and the convective heat flux, determining the temperature retardation when the stirring kettle heats the semi-solid silica gel, and performing heating regulation and control on the semi-solid silica gel in the stirring kettle through the temperature retardation. According to the scheme, the influence of time delay of heating response on the stirring kettle when the silica gel is heated can be weakened, so that the production quality of the silica gel is improved.

Description

Technical Field

[0001] The present application relates to the technical field of temperature monitoring in industrial production, and more specifically, to a method and system for controlling the temperature of silica gel production. Background Art

[0002] Temperature monitoring in industrial production is the real-time monitoring and control of the temperature in each link of the industrial production process to ensure the stability of the production process and product quality. Through effective temperature monitoring, production efficiency can be improved, defective product rate can be reduced, and product quality standards can be ensured to be met.

[0003] Temperature control in silicone production refers to the process of accurately adjusting and monitoring the temperature through various technical means and equipment during the production of silicone to ensure that the quality and performance of the silicone material meet the requirements. It is crucial to the chemical reactions, physical properties and quality of the final product during the production process. In the temperature control process in existing silicone production, the temperature of the stirring kettle during the production process is monitored in real time by temperature sensors (such as thermocouples, thermistors, resistance temperature detectors, etc.), and the temperature of the silicone during the production process is monitored and adjusted by monitoring the temperature. However, the supply of heating and cooling media in the stirring kettle during the heating of silicone will be unstable, and the semi-solid silicone in the stirring kettle will experience temperature fluctuations during the heating or cooling process. These phenomena will cause a delay in the heating response of the stirring kettle when heating the silicone material, thereby affecting the performance of the final silicone. Therefore, how to weaken the impact of the delayed heating response on the stirring kettle when heating silicone, thereby improving the production quality of silicone, has become a problem faced by the industry. Summary of the invention

[0004] The present application provides a method and system for controlling the temperature of silica gel production, which can reduce the influence of the delay in heating response on the stirring kettle when heating silica gel, thereby improving the production quality of silica gel.

[0005] In a first aspect, the present application provides a method for controlling the temperature of silica gel production, comprising the following steps: Start the temperature control of silica gel production and collect the temperature and viscosity of the semi-solid silica gel at various monitoring points in the stirring kettle; Predicting the temperature limit that the semi-solid silica gel can reach through all viscosities and all temperatures, using the temperature limit and the stirring time of the stirring kettle as constraint conditions when the stirring kettle is temperature controlled, and identifying the variable temperature of each monitoring point of the semi-solid silica gel in the stirring kettle during temperature control; Monitoring the stirring speed of the stirring kettle during silica gel production, performing a transfer analysis on the heating temperature of the semi-solid silica gel based on the sudden change temperature of the semi-solid silica gel during temperature drop and the stirring speed, and obtaining the convective heat flux on the surface of the semi-solid silica gel; The temperature hysteresis when the stirring kettle heats the semi-solid silica gel is determined according to all variable temperatures and the convective heat flux, and the heating of the semi-solid silica gel in the stirring kettle is regulated by the temperature hysteresis.

[0006] In some embodiments, predicting the temperature limit that the semi-solid silica gel can reach through all viscosities and all temperatures specifically includes: Determining the viscosity dispersion coefficient of the semi-solid silica gel according to all viscosities; Predicting the limit temperature of each monitoring point according to the viscosity dispersion coefficient and all temperatures; The temperature limit that the semi-solid silica gel can reach is determined based on all the limit temperatures.

[0007] In some embodiments, taking the temperature over-limit and the stirring time of the stirring kettle as the constraint conditions when the stirring kettle is temperature controlled, identifying the variable temperature of each monitoring point of the semi-solid silica gel in the stirring kettle during temperature control specifically includes: Get the stirring time of the stirring tank; Determining the control temperature of each monitoring point in the stirred tank according to all temperatures and all viscosities; Determining a temperature constraint coefficient when the stirring kettle is temperature controlled according to the temperature exceeding the limit and the stirring time of the stirring kettle; The variable temperature of the semi-solid silica gel in the stirring kettle corresponding to the monitoring point during temperature control is determined according to the temperature constraint coefficient and the control temperature of each monitoring point.

[0008] In some embodiments, the heating temperature of the semi-solid silica gel is transferred and analyzed based on the sudden change temperature of the semi-solid silica gel during temperature drop and the stirring speed to obtain the convective heat flux on the surface of the semi-solid silica gel, which specifically includes: Obtain the temperature drop curve of semi-solid silica gel under natural conditions; Determining the sudden change temperature of the semi-solid silica gel during temperature drop according to the temperature drop curve; Determining the temperature transfer degree of the semi-solid silica gel corresponding to the heating temperature according to the sudden change temperature of the semi-solid silica gel during temperature drop and the stirring speed; Obtaining the initial heating rate of the stirred tank; The convective heat flux of the semi-solid silica gel surface is determined based on the temperature transfer degree and the initial heating rate.

[0009] In some embodiments, determining the temperature hysteresis when the stirring tank heats the semi-solid silica gel according to all variable temperatures and the convective heat flux specifically includes: Determining temperature adjustment data of the semi-solid silica gel according to all variable temperatures and all temperatures; Determining a temperature dispersion of the temperature difference data; Determine the feedback difference entropy for all variable temperatures; The temperature hysteresis when the stirring tank heats the semi-solid silica gel is determined according to the temperature dispersion, the feedback difference entropy and the convection heat flux.

[0010] In some embodiments, the heating and regulating of the semi-solid silica gel in the stirring tank by the temperature hysteresis specifically includes: Acquiring initial heating information of the temperature of the stirring kettle when heating the semi-solid silica gel; Adjusting the initial heating information according to the temperature hysteresis to obtain adjusted heating information when the stirring kettle heats the semi-solid silica gel; The initial heating information is updated by the adjusted heating information.

[0011] In some embodiments, the stirring speed refers to the speed at which a stirring paddle in a stirring tank stirs the semi-solid silica gel during silica gel production.

[0012] In a second aspect, the present application provides a silica gel production temperature control system, comprising: The collection module is used to collect the temperature and viscosity of the semi-solid silica gel at various monitoring points in the stirring kettle after starting the silica gel production temperature control; A processing module, for predicting the temperature limit that the semi-solid silica gel can reach through all viscosities and all temperatures, taking the temperature limit and the stirring time of the stirring kettle as constraint conditions when the stirring kettle is temperature controlled, and identifying the variable temperature of each monitoring point of the semi-solid silica gel in the stirring kettle during temperature control; The processing module is also used to monitor the stirring speed of the stirring kettle during silica gel production, and to perform a transfer analysis on the heating temperature of the semi-solid silica gel based on the sudden change temperature of the semi-solid silica gel during temperature drop and the stirring speed, so as to obtain the convective heat flux on the surface of the semi-solid silica gel; The execution module is used to determine the temperature hysteresis when the stirring tank heats the semi-solid silica gel according to all variable temperatures and the convective heat flux, and to regulate the heating of the semi-solid silica gel in the stirring tank by the temperature hysteresis.

[0013] In a third aspect, the present application provides a computer device, comprising a memory and a processor, wherein the memory stores codes, and the processor is configured to obtain the codes and execute the above-mentioned silica gel production temperature control method.

[0014] In a fourth aspect, the present application provides a computer-readable storage medium, wherein the computer-readable storage medium stores a computer program, and when the computer program is executed by a processor, the above-mentioned method for controlling the temperature of silica gel production is implemented.

[0015] The technical solution provided by the embodiments disclosed in this application has the following beneficial effects: In the silicone production temperature control method and system provided in the present application, first, the silicone production temperature control is started, and the temperature and viscosity of the semi-solid silicone in the stirring kettle at various monitoring points are collected; the temperature limit that the semi-solid silicone can reach is predicted through all viscosities and all temperatures, and the temperature limit and the stirring time of the stirring kettle are used as constraint conditions when the stirring kettle is temperature-controlled, and the variable temperature of each monitoring point of the semi-solid silicone in the stirring kettle during temperature control is identified; the stirring speed of the stirring kettle during silicone production is monitored, and the heating temperature of the semi-solid silicone is transferred and analyzed based on the sudden change temperature of the semi-solid silicone during temperature drop and the stirring speed, so as to obtain the convective heat flux on the surface of the semi-solid silicone; the temperature hysteresis when the stirring kettle heats the semi-solid silicone is determined according to all variable temperatures and the convective heat flux, and the heating of the semi-solid silicone in the stirring kettle is regulated by the temperature hysteresis.

[0016] It can be seen that in the temperature control process of silica gel production, the present application first analyzes the viscosity and temperature of the semi-solid silica gel at each monitoring point in the stirring kettle, predicts the allowable limit of the temperature of the semi-solid silica gel in the stirring kettle during the stirring process, and then determines the temperature exceeding the limit. The temperature exceeding the limit avoids the situation where the temperature of the semi-solid silica gel is too high during the stirring process. The temperature regulation of the stirring kettle is analyzed by combining the temperature exceeding the limit with the stirring time, and the variable degree of temperature of each monitoring point when the temperature of the semi-solid silica gel in the stirring kettle is regulated during the stirring process is identified, and then the variable temperature of each monitoring point is obtained. The variable temperature solves the influence of the temperature difference caused by time change on the heating of the semi-solid silica gel in the stirring kettle, that is, the variable temperature can weaken the stirring kettle on Semi-solid silicone has a delayed heating response phenomenon; secondly, the heating temperature of the semi-solid silicone is transferred and analyzed by the sudden change temperature and stirring speed of the semi-solid silicone during the temperature drop, and the degree of heat circulation of the silicone flowing on the surface of the semi-solid silicone is obtained, and then the convection heat flux is obtained. The convection heat flux can determine the change of the surface temperature of the semi-solid silicone during the heating process of the semi-solid silicone; then, the temperature hysteresis of the semi-solid silicone in the stirring kettle is determined by the variable temperature and the convection heat flux, and then the temperature hysteresis is obtained. The temperature hysteresis can weaken the delay phenomenon of the stirring kettle during the heating process of the semi-solid silicone; finally, the semi-solid silicone in the stirring kettle is heated and regulated by the temperature hysteresis. The above scheme can weaken the influence of the delayed heating response on the stirring kettle when heating the silicone, thereby improving the production quality of silicone. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 is an exemplary flow chart of a method for controlling the temperature of silica gel production according to some embodiments of the present application; Figure 2 is an exemplary flow chart of determining temperature crossing according to some embodiments of the present application; Figure 3 is an exemplary flow chart for determining temperature hysteresis according to some embodiments of the present application; Figure 4 is a schematic diagram of exemplary hardware and / or software of a silicone production temperature control system according to some embodiments of the present application; Figure 5 It is a structural schematic diagram of a computer device for implementing a method for controlling the temperature of silica gel production according to some embodiments of the present application. DETAILED DESCRIPTION

[0018] The core of this application is to start the temperature control of silica gel production, collect the temperature and viscosity of the semi-solid silica gel in the stirring kettle at each monitoring point; predict the temperature limit that the semi-solid silica gel can reach through all viscosities and all temperatures, and use the temperature limit and the stirring time of the stirring kettle as the constraint conditions when the stirring kettle is temperature-controlled, and identify the variable temperature of each monitoring point of the semi-solid silica gel in the stirring kettle during temperature control; monitor the stirring speed of the stirring kettle during silica gel production, and conduct a transfer analysis on the heating temperature of the semi-solid silica gel based on the sudden change temperature of the semi-solid silica gel in the temperature drop and the stirring speed, and obtain the convective heat flux on the surface of the semi-solid silica gel; determine the temperature hysteresis when the stirring kettle heats the semi-solid silica gel according to all variable temperatures and the convective heat flux, and heat and control the semi-solid silica gel in the stirring kettle through the temperature hysteresis. The above scheme can weaken the influence of the delay in heating response on the stirring kettle when heating silica gel, thereby improving the production quality of silica gel.

[0019] In order to better understand the above technical solution, the above technical solution will be described in detail below in conjunction with the accompanying drawings and specific implementation methods. Figure 1 , which is an exemplary flow chart of a method for controlling the temperature of silica gel production according to some embodiments of the present application. The method 100 for controlling the temperature of silica gel production mainly includes the following steps: In step 101, the silica gel production temperature control is started, and the temperature and viscosity of the semi-solid silica gel at various monitoring points in the stirring tank are collected.

[0020] In specific implementation, after starting the temperature control of silicone production, the temperature of the semi-solid silicone in the stirring kettle at each monitoring point is collected by a thermistor sensor, and the viscosity of the semi-solid silicone in the stirring kettle at each monitoring point is collected by a viscosity collector.

[0021] It should be noted that the silicone in the present application has three states during the production process: liquid, semi-solid and solid. Among them, the silicone is placed in a reactor for chemical reaction when it is liquid, placed in a stirring kettle for mixing or processing when it is semi-solid, and placed in a cardboard box or a wooden box for packaging when it is solid; the thermistor sensor and the viscosity collector are connected to various monitoring points inside the stirring kettle, and the temperature of the semi-solid silicone in the stirring kettle at each monitoring point is collected by the thermistor sensor, and the viscosity of the semi-solid silicone in the stirring kettle at each monitoring point is collected by the viscosity collector.

[0022] In step 102, the temperature limit that the semi-solid silicone can reach is predicted through all viscosities and all temperatures, and the temperature limit and the stirring time of the stirring kettle are used as constraints when the stirring kettle is temperature-controlled, and the variable temperature of each monitoring point of the semi-solid silicone in the stirring kettle during temperature control is identified.

[0023] In some embodiments, reference Figure 2 As shown, this figure is a schematic diagram of the process of determining the temperature limit in some embodiments of the present application. In this embodiment, the temperature limit that the semi-solid silica gel can reach can be predicted by all viscosities and all temperatures, which can be achieved by the following steps: First, in step 1021, the viscosity dispersion coefficient of the semi-solid silica gel is determined according to all viscosities; Next, in step 1022, the limit temperature of each monitoring point is predicted based on the viscosity dispersion coefficient and all temperatures; Finally, in step 1023, the temperature limit reached by the semi-solid silica gel is determined based on all the limit temperatures.

[0024] In specific implementation, the viscosity dispersion coefficient of the semi-solid silica gel can be determined based on all viscosities in the following manner, namely: dividing the standard deviation of all viscosities by the average value of all viscosities, and using the value obtained by the division as the viscosity dispersion coefficient of the semi-solid silica gel, wherein the viscosity dispersion coefficient of the semi-solid silica gel represents a parameter of the dispersion degree of the viscosity of the semi-solid silica gel during the stirring process, and is used to analyze the stirring process of the semi-solid silica gel in the stirring tank; the limit temperature of each monitoring point can be predicted based on the viscosity dispersion coefficient and all temperatures in the following manner, namely: selecting a monitoring point as the selected monitoring point, performing a natural exponential operation on the viscosity dispersion coefficient, adding 1 to the inverse of the value obtained by the natural exponential operation, and comparing the added value with the temperature corresponding to the selected monitoring point. The values ​​of the abovementioned values ​​are multiplied by the values, and the value obtained by the multiplication is used as the limit temperature of the selected monitoring point, and the limit temperatures of the remaining monitoring points are further determined, wherein the limit temperature represents the maximum temperature of the monitoring point during the stirring of the semi-solid silica gel, and is used to predict the temperature of the silica gel during the stirring process of the stirring tank; determining the temperature over-limit that the semi-solid silica gel can reach according to all the limit temperatures can be achieved in the following manner, namely: dividing the maximum limit temperature of all the limit temperatures by the minimum limit temperature, performing a logarithmic operation with a base of 2 on the value obtained by the division, multiplying the value obtained by the logarithmic operation by the average value of all the limit temperatures, and using the multiplied value as the temperature over-limit that the semi-solid silica gel can reach; in other embodiments, other methods can also be used for determination, which are not limited here.

[0025] It should be noted that the temperature over-limit in the present application indicates the allowable limit of the temperature of the semi-solid silica gel in the stirring kettle during the stirring process, which is used to judge the temperature of the semi-solid silica gel during the stirring process to avoid the situation where the temperature of the semi-solid silica gel is too high during the stirring process.

[0026] In some embodiments, the temperature exceeding the limit and the stirring time of the stirring kettle are used as the constraint conditions when the stirring kettle is temperature controlled, and the variable temperature of each monitoring point of the semi-solid silica gel in the stirring kettle during temperature control can be identified by the following steps: Get the stirring time of the stirring tank; Determining the control temperature of each monitoring point in the stirred tank according to all temperatures and all viscosities; Determining a temperature constraint coefficient when the stirring kettle is temperature controlled according to the temperature exceeding the limit and the stirring time of the stirring kettle; The variable temperature of the semi-solid silica gel in the stirring kettle corresponding to the monitoring point during temperature control is determined according to the temperature constraint coefficient and the control temperature of each monitoring point.

[0027] In specific implementation, obtaining the stirring time of the stirring kettle can be achieved in the following manner, namely: obtaining the stirring time of the stirring kettle from the database of the stirring kettle, wherein the stirring time indicates the time for the stirring kettle to stir the semi-solid silica gel; determining the control temperature of each monitoring point in the stirring kettle according to all temperatures and all viscosities can be achieved in the following manner, namely: sending all temperatures and all viscosities to the temperature control system of the stirring kettle, analyzing all temperatures and all viscosities through the temperature control system, and then obtaining the control temperature of each monitoring point in the stirring kettle through the temperature control system, wherein the control temperature indicates the temperature corresponding to the monitoring point. The temperature of the control degree is used to adjust the temperature of the semi-solid silica gel; the temperature constraint coefficient of the stirring kettle when the temperature is controlled according to the temperature limit crossing and the stirring time of the stirring kettle can be achieved in the following way, that is, a group of adjacent monitoring points are selected as selected adjacent monitoring points, the temperature corresponding to the second monitoring point in the selected adjacent monitoring points is subtracted from the temperature corresponding to the first monitoring point, the value obtained by the subtraction is used as the temperature difference amount of the selected adjacent monitoring points, and the temperature difference amount of the remaining adjacent monitoring points is continuously determined, wherein the temperature difference amount represents the parameter value of the difference degree between the corresponding temperatures of the adjacent monitoring points during the stirring process of the semi-solid silica gel, and all the temperatures are The sum of the temperature difference is divided by the stirring time of the stirring tank, and the value obtained by the division is used as the time-temperature variation of the semi-solid silica gel, wherein the time-temperature variation represents the parameter value of the degree of temperature variation over time when the semi-solid silica gel is stirred, and is used to analyze the temperature of the silica gel, the temperature limit crossing and the time-temperature variation are added, and the product of the temperature limit crossing and the time-temperature variation is divided by the added value, and the value obtained by the division is used as the temperature constraint coefficient when the stirring tank is temperature controlled, wherein the temperature constraint coefficient represents the parameter of the degree of constraint on the control temperature when the stirring tank is temperature controlled (that is, the restriction on the control temperature), and is used to control The temperature is adjusted so that the stirring kettle can reach a suitable adjustment temperature for the semi-solid silica gel; the variable temperature of the corresponding monitoring point of the semi-solid silica gel in the stirring kettle during temperature adjustment is determined according to the temperature constraint coefficient and the adjustment temperature of each monitoring point. The following method can be used to achieve this, namely: select a monitoring point as the selected monitoring point, multiply the adjustment temperature corresponding to the selected monitoring point by the temperature constraint coefficient, and use the multiplied value as the variable temperature of the selected monitoring point when the semi-solid silica gel in the stirring kettle is temperature adjusted, and continue to determine the variable temperatures of the remaining monitoring points when the semi-solid silica gel in the stirring kettle is temperature adjusted. In other embodiments, other methods can also be used to determine, which are not limited here.

[0028] It should be noted that the variable temperature in the present application is a temperature that reflects the degree of variability when the temperature of the semi-solid silicone in the stirring tank is controlled during the stirring process. It is used to predict the temperature of the semi-solid silicone in the stirring tank during the control process and to solve the impact of the temperature of the semi-solid silicone in the stirring tank due to time changes.

[0029] In step 103, the stirring speed of the stirring kettle during silica gel production is monitored, and the heating temperature of the semi-solid silica gel is transferred and analyzed based on the sudden change temperature of the semi-solid silica gel during temperature drop and the stirring speed to obtain the convective heat flux on the surface of the semi-solid silica gel.

[0030] It should be noted that the stirring speed in the present application refers to the speed at which the stirring paddle in the stirring kettle stirs the semi-solid silica gel during silica gel production. In specific implementation, a magnetoelectric speed sensor is installed on the stirring paddle of the stirring kettle, and the operating speed of the stirring paddle of the stirring kettle is monitored by the magnetoelectric speed sensor. The operating speed is used as the stirring speed of the stirring kettle in silica gel production. In other embodiments, other monitoring methods can also be used, which will not be repeated here.

[0031] In some embodiments, the following steps can be used to perform a transfer analysis on the heating temperature of the semi-solid silica gel based on the sudden change temperature of the semi-solid silica gel during temperature drop and the stirring speed to obtain the convective heat flux on the surface of the semi-solid silica gel: Obtain the temperature drop curve of semi-solid silica gel under natural conditions; Determining the sudden change temperature of the semi-solid silica gel during temperature drop according to the temperature drop curve; Determining the temperature transfer degree of the semi-solid silica gel corresponding to the heating temperature according to the sudden change temperature of the semi-solid silica gel during temperature drop and the stirring speed; Obtaining the initial heating rate of the stirred tank; The convective heat flux of the semi-solid silica gel surface is determined based on the temperature transfer degree and the initial heating rate.

[0032] In specific implementation, obtaining the temperature drop curve of semi-solid silicone under natural conditions can be achieved in the following manner, namely: obtaining the temperature drop curve of semi-solid silicone under natural conditions from a database corresponding to the semi-solid silicone, wherein the temperature drop curve represents the curve of the semi-solid silicone dropping from the highest temperature to the ambient temperature under natural conditions (only affected by the ambient temperature), the highest temperature is the highest temperature of the semi-solid silicone in the historical stirring process, and the temperature drop curve contains the corresponding relationship between time and temperature, which is used to analyze the temperature change of the semi-solid silicone; determining the mutation temperature of the semi-solid silicone in the temperature drop according to the temperature drop curve can be achieved in the following manner, namely: analyzing the temperature drop curve by a segmented regression method in the prior art to obtain all mutation points in the temperature drop curve, and taking the temperature corresponding to each mutation point as the temperature of the semi-solid silicone in the temperature drop. The mutation temperature during temperature drop, wherein the mutation temperature represents the temperature of the mutation point of the semi-solid silicone during the temperature drop process under the natural state, and is used to analyze the temperature change of the semi-solid silicone; the temperature transfer degree of the semi-solid silicone corresponding to the heating temperature is determined according to the mutation temperature of the semi-solid silicone during temperature drop and the stirring speed, which can be achieved in the following manner, namely: the stirring speed is subjected to a natural exponential operation, the inverse of the value obtained by the natural exponential operation is multiplied by the standard deviation of all mutation temperatures of the semi-solid silicone during temperature drop, and the multiplied value is used as the temperature transfer degree of the semi-solid silicone corresponding to the heating temperature, wherein the temperature transfer degree represents the parameter value of the transfer degree of the semi-solid silicone corresponding to the heating temperature, and is used to adjust the semi-solid silicone corresponding to the heating temperature; in other embodiments, other methods can also be used for determination, which are not limited here.

[0033] In specific implementation, the initial heating speed of the stirring tank can be obtained by the following method, namely: obtaining the initial heating speed of the stirring tank from the database of the stirring tank, wherein the heating speed represents the speed at which the stirring tank heats the semi-solid silica gel, namely (the speed required for the semi-solid silica gel to reach a preset state from the initial state); determining the convective heat flux on the surface of the semi-solid silica gel according to the temperature transfer degree and the initial heating speed can be achieved by the following method, namely: initializing a convective heat flux prediction model, taking the temperature transfer degree as a constraint parameter of the convective heat flux prediction model; The initial heating rate is used as the initialization parameter of the convective heat flux prediction model, and the convective heat flux on the surface of the semi-solid silicone is predicted by the convective heat flux prediction model, wherein the convective heat flux prediction model is a convective heat flux prediction model established by a machine learning algorithm (such as a regression algorithm, a neural network, etc.), and the prediction model is, for example: convective heat flux = temperature transfer degree * A + initial heating rate * B, wherein A and B are weight coefficients, A and B can be determined according to a large number of convective heat fluxes, and can also be determined in other ways in other embodiments, which are not limited here.

[0034] It should be noted that the convective heat flux in the present application is a parameter value that reflects the degree of heat flow of the semi-solid silicone on the surface of the semi-solid silicone (i.e., the heat flow rate on the surface of the semi-solid silicone). It is used to analyze the heating rate of the semi-solid silicone, so as to achieve the desired heating effect of the semi-solid silicone and solve the impact of the temperature difference during the heating process of the semi-solid silicone.

[0035] In step 104, the temperature hysteresis when the stirring tank heats the semi-solid silica gel is determined according to all variable temperatures and the convective heat flux, and the heating of the semi-solid silica gel in the stirring tank is regulated by the temperature hysteresis.

[0036] In some embodiments, reference Figure 3 As shown, this figure is a schematic diagram of the process of determining the temperature hysteresis in some embodiments of the present application. In this embodiment, the temperature hysteresis when the stirring kettle heats the semi-solid silica gel according to all variable temperatures and the convective heat flux can be determined by the following steps: First, in step 1041, temperature adjustment data of the semi-solid silica gel is determined according to all variable temperatures and all temperatures; Next, in step 1042, the temperature dispersion of the temperature difference data is determined; Then, in step 1043, feedback difference entropy of all variable temperatures is determined; Finally, in step 1044, the temperature hysteresis when the stirring tank heats the semi-solid silica gel is determined according to the temperature dispersion, the feedback difference entropy and the convective heat flux.

[0037] In specific implementation, the temperature adjustment data of the semi-solid silica gel is determined according to all variable temperatures and all temperatures in the following manner, namely, a monitoring point is selected as the selected monitoring point, the variable temperature corresponding to the selected monitoring point is subtracted from the temperature corresponding to the selected monitoring point, the value obtained by the subtraction is used as the temperature adjustment amount of the selected monitoring point, and the temperature adjustment amounts of the remaining monitoring points are continuously determined, wherein the temperature adjustment amount represents the parameter value of the adjustment degree of the temperature point corresponding to the semi-solid silica gel, which is used to analyze the temperature trend of the semi-solid silica gel, and the set of all temperature adjustment amounts is used as the temperature adjustment data of the semi-solid silica gel; the temperature dispersion of the temperature difference data is determined in the following manner, namely, the maximum temperature adjustment amount in the temperature adjustment data is divided by the minimum temperature adjustment amount, the value obtained by the division is subjected to a logarithmic operation with a base of 2, the value obtained by the logarithmic operation is multiplied by the standard deviation of all temperature adjustment amounts in the temperature adjustment data, and the value obtained by the multiplication is used as the temperature dispersion of the temperature difference data, wherein the temperature dispersion represents the parameter value of the dispersion degree of the temperature of the semi-solid silica gel during the stirring process, which is used to judge the temperature of the semi-solid silica gel during the stirring process; in other embodiments, other methods can also be used for determination, which are not limited here.

[0038] In specific implementation, the feedback difference entropy of all variable temperatures can be determined in the following manner, namely: a group of adjacent monitoring points are selected as selected adjacent monitoring points, the variable temperature corresponding to the first monitoring point in the selected adjacent monitoring points is subtracted from the variable temperature corresponding to the second monitoring point, the value obtained by the subtraction is used as the adjacent difference amount of the temperature corresponding to the selected adjacent monitoring point, and the adjacent difference amount of the temperature corresponding to the remaining adjacent monitoring points is continued to be determined, wherein the adjacent difference amount represents the parameter value of the difference degree of the temperature between the adjacent monitoring points after the temperature of the semi-solid silica gel is adjusted, and the entropy of all the adjacent difference amounts is used as the feedback difference entropy of all variable temperatures, wherein the feedback difference entropy represents the parameter value of the change in the difference degree between the variable temperatures of the semi-solid silica gel at each monitoring point, and is used to judge the temperature of the semi-solid silica gel; according to the temperature dispersion, the feedback difference entropy and the Determining the temperature hysteresis when the stirring kettle heats the semi-solid silica gel by using the convective heat flux can be achieved in the following manner, namely: initializing a temperature hysteresis model, taking the temperature dispersion as the constraint parameter of the temperature hysteresis model, taking the feedback difference entropy and the convective heat flux as the initialization parameters of the temperature hysteresis model, and obtaining the temperature hysteresis when the stirring kettle heats the semi-solid silica gel through the temperature hysteresis model, wherein the temperature hysteresis model is a temperature model of the temperature hysteresis established by using a machine learning algorithm (such as a regression algorithm, a neural network, etc.), and the temperature model is, for example: temperature hysteresis = temperature dispersion * C + feedback difference entropy * D + convective heat flux * E, wherein C, D, and E are weight coefficients, and C, D, and E can be determined based on a large number of temperature hysteresis. In other embodiments, they can also be determined in other ways, which are not limited here.

[0039] It should be noted that the temperature hysteresis in the present application is a parameter value that reflects the degree of temperature hysteresis when the semi-solid silicone in the stirring kettle is heated, and is used to adjust the temperature of the semi-solid silicone in the stirring kettle, so that the stirring kettle can accurately complete the heating of the semi-solid silicone.

[0040] In some embodiments, the heating and regulating of the semi-solid silica gel in the stirring tank by the temperature hysteresis can be achieved by the following steps: Acquiring initial heating information of the temperature of the stirring kettle when heating the semi-solid silica gel; Adjusting the initial heating information according to the temperature hysteresis to obtain adjusted heating information when the stirring kettle heats the semi-solid silica gel; The initial heating information is updated by the adjusted heating information.

[0041] In specific implementation, obtaining the initial heating information of the temperature of the stirring kettle when heating the semi-solid silica gel can be achieved in the following manner, namely: obtaining the initial heating information of the temperature of the stirring kettle when heating the semi-solid silica gel from the database of the stirring kettle, wherein the initial heating information includes the initial heating temperature, the initial circuit parameters, the initial temperature hysteresis, the temperature hysteresis adjustment model, etc., which is used to set the relevant parameters of the stirring kettle when heating the semi-solid silica gel, and the temperature hysteresis adjustment model is used to determine the relevant parameters for adjusting the temperature hysteresis of the stirring kettle when heating the semi-solid silica gel, and by using the initial temperature hysteresis as the initial parameter of the temperature hysteresis adjustment model, the relevant parameters for adjusting the hysteresis of the stirring kettle are obtained through the temperature hysteresis adjustment model; adjusting the initial heating information according to the temperature hysteresis to obtain the adjusted heating information of the stirring kettle when heating the semi-solid silica gel can be achieved in the following manner, namely: replacing the initial temperature hysteresis in the initial heating information with the temperature hysteresis, and using the replaced initial heating information as the adjusted heating information of the stirring kettle when heating the semi-solid silica gel; in other embodiments, other methods can also be used for determination, which are not limited here.

[0042] It should be noted that in the present application, the relevant parameters for adjusting the hysteresis of the stirring kettle are obtained through the temperature hysteresis adjustment model, and the parameters in the stirring kettle are replaced by the relevant parameters, thereby completing the adjustment of the temperature hysteresis of the stirring kettle when heating semi-solid silica gel.

[0043] In addition, in another aspect of the present application, in some embodiments, the present application provides a silica gel production temperature control system, referring to Figure 4 , which is a schematic diagram of exemplary hardware and / or software of a silica gel production temperature control system according to some embodiments of the present application. The silica gel production temperature control system 400 includes: a collection module 401, a processing module 402 and an execution module 403, which are described as follows: The collection module 401 in this application is mainly used to collect the temperature and viscosity of the semi-solid silica gel at various monitoring points in the stirring kettle after starting the silica gel production temperature control; Processing module 402, in the present application, is used to predict the temperature limit that the semi-solid silica gel can reach through all viscosities and all temperatures, use the temperature limit and the stirring time of the stirring kettle as constraint conditions when the stirring kettle is temperature controlled, and identify the variable temperature of each monitoring point of the semi-solid silica gel in the stirring kettle during temperature control; It should be noted that the processing module 402 in the present application is also used to monitor the stirring speed of the stirring kettle during silica gel production, and to perform a transfer analysis on the heating temperature of the semi-solid silica gel based on the sudden change temperature of the semi-solid silica gel during temperature drop and the stirring speed, so as to obtain the convective heat flux on the surface of the semi-solid silica gel; Execution module 403, in the present application, execution module 403 is mainly used to determine the temperature hysteresis when the stirring tank heats the semi-solid silica gel according to all variable temperatures and the convective heat flux, and to regulate the heating of the semi-solid silica gel in the stirring tank through the temperature hysteresis.

[0044] In addition, the present application also provides a computer device, which includes a memory and a processor, the memory stores a code, and the processor is configured to obtain the code and execute the above-mentioned silica gel production temperature control method.

[0045] In some embodiments, reference Figure 5 , which is a schematic diagram of the structure of a computer device for implementing a method for controlling the temperature of silica gel production according to some embodiments of the present application. The method for controlling the temperature of silica gel production in the above embodiment can be Figure 5 The computer device 500 shown in the figure is implemented, and the computer device 500 includes at least one processor 501, a communication bus 502, a memory 503 and at least one communication interface 504.

[0046] The processor 501 may be a general-purpose central processing unit (CPU) or an application specific integrated circuit (ASIC).

[0047] The communication bus 502 may be used to transmit information between the above-mentioned components.

[0048] The memory 503 may be a read only memory (ROM) or other types of static storage devices that can store static information and instructions, a random access memory (RAM) or other types of dynamic storage devices that can store information and instructions, or an electrically erasable programmable read only memory (EEPROM), a compact disc read only memory (CD ROM) or other optical disc storage, an optical disc storage (including a compressed optical disc, a laser disc, an optical disc, a digital versatile disc, a Blu-ray disc, etc.), a magnetic disk or other magnetic storage device, or any other medium that can be used to carry or store the desired program code in the form of an instruction or data structure and can be accessed by a computer, but is not limited thereto. The memory 503 may exist independently and be connected to the processor 501 via the communication bus 502. The memory 503 may also be integrated with the processor 501.

[0049] The memory 503 is used to store the program code for executing the solution of the present application, and the execution is controlled by the processor 501. The processor 501 is used to execute the program code stored in the memory 503. The program code may include one or more software modules. The method used in the above embodiment can be implemented by the processor 501 and one or more software modules in the program code in the memory 503.

[0050] The communication interface 504 uses any transceiver or other device for communicating with other devices or communication networks, such as Ethernet, radio access network (RAN), wireless local area networks (WLAN), etc.

[0051] In a specific implementation, as an embodiment, a computer device may include multiple processors, each of which may be a single-core (single CPU) processor or a multi-core (multi CPU) processor. The processor here may refer to one or more devices, circuits, and / or processing cores for processing data (such as computer program instructions).

[0052] The above-mentioned computer device may be a general-purpose computer device or a special-purpose computer device. In a specific implementation, the computer device may be a desktop computer, a portable computer, a network server, a personal digital assistant (PDA), a mobile phone, a tablet computer, a wireless terminal device, a communication device or an embedded device. The embodiment of the present application does not limit the type of computer device.

[0053] In addition, the present application also provides a computer-readable storage medium, which stores a computer program. When the computer program is executed by a processor, the above-mentioned silica gel production temperature control method is implemented.

[0054] Although the preferred embodiments of the present application have been described, those skilled in the art may make other changes and modifications to these embodiments once they have learned the basic creative concept. Therefore, the appended claims are intended to be interpreted as including the preferred embodiments and all changes and modifications falling within the scope of the present application.

[0055] Obviously, those skilled in the art can make various changes and modifications to the present application without departing from the spirit and scope of the present application. Thus, if these modifications and variations of the present application fall within the scope of the claims of the present application and their equivalents, the present application is also intended to include these modifications and variations.

Claims

1. A method for controlling the temperature of silica gel production, characterized in that: The steps include: Start the temperature control of silica gel production and collect the temperature and viscosity of the semi-solid silica gel at various monitoring points in the stirring kettle; Predicting the temperature limit that the semi-solid silica gel can reach through all viscosities and all temperatures, using the temperature limit and the stirring time of the stirring kettle as constraint conditions when the stirring kettle is temperature controlled, and identifying the variable temperature of each monitoring point of the semi-solid silica gel in the stirring kettle during temperature control; Monitoring the stirring speed of the stirring kettle during silica gel production, performing a transfer analysis on the heating temperature of the semi-solid silica gel based on the sudden change temperature of the semi-solid silica gel during temperature drop and the stirring speed, and obtaining the convective heat flux on the surface of the semi-solid silica gel; The temperature hysteresis when the stirring kettle heats the semi-solid silica gel is determined according to all variable temperatures and the convective heat flux, and the heating of the semi-solid silica gel in the stirring kettle is regulated by the temperature hysteresis.

2. The method according to claim 1, characterized in that The temperature limits that the semi-solid silica gel can reach are predicted by all viscosities and all temperatures, including: Determining the viscosity dispersion coefficient of the semi-solid silica gel according to all viscosities; Predicting the limit temperature of each monitoring point according to the viscosity dispersion coefficient and all temperatures; The temperature limit that the semi-solid silica gel can reach is determined based on all the limit temperatures.

3. The method according to claim 1, characterized in that Taking the temperature exceeding the limit and the stirring time of the stirring kettle as the constraint conditions when the stirring kettle is temperature controlled, identifying the variable temperature of each monitoring point of the semi-solid silica gel in the stirring kettle during temperature control specifically includes: Get the stirring time of the stirring tank; Determining the control temperature of each monitoring point in the stirred tank according to all temperatures and all viscosities; Determining a temperature constraint coefficient when the stirring kettle is temperature controlled according to the temperature exceeding the limit and the stirring time of the stirring kettle; The variable temperature of the semi-solid silica gel in the stirring kettle corresponding to the monitoring point during temperature control is determined according to the temperature constraint coefficient and the control temperature of each monitoring point.

4. The method according to claim 1, characterized in that Based on the sudden change temperature of the semi-solid silica gel during temperature drop and the stirring speed, the heating temperature of the semi-solid silica gel is transferred and analyzed to obtain the convective heat flux on the surface of the semi-solid silica gel, which specifically includes: Obtain the temperature drop curve of semi-solid silica gel under natural conditions; Determining the sudden change temperature of the semi-solid silica gel during temperature drop according to the temperature drop curve; Determining the temperature transfer degree of the semi-solid silica gel corresponding to the heating temperature according to the sudden change temperature of the semi-solid silica gel during temperature drop and the stirring speed; Obtaining the initial heating rate of the stirred tank; The convective heat flux of the semi-solid silica gel surface is determined based on the temperature transfer degree and the initial heating rate.

5. The method according to claim 1, characterized in that Determining the temperature hysteresis when the stirring kettle heats the semi-solid silica gel according to all variable temperatures and the convective heat flux specifically includes: Determining temperature adjustment data of the semi-solid silica gel according to all variable temperatures and all temperatures; Determining a temperature dispersion of the temperature difference data; Determine the feedback difference entropy for all variable temperatures; The temperature hysteresis when the stirring tank heats the semi-solid silica gel is determined according to the temperature dispersion, the feedback difference entropy and the convection heat flux.

6. The method according to claim 1, characterized in that The heating and regulating of the semi-solid silica gel in the stirring kettle by the temperature hysteresis specifically includes: Acquiring initial heating information of the temperature of the stirring kettle when heating the semi-solid silica gel; Adjusting the initial heating information according to the temperature hysteresis to obtain adjusted heating information when the stirring kettle heats the semi-solid silica gel; The initial heating information is updated by the adjusted heating information.

7. The method according to claim 1, characterized in that The stirring speed refers to the speed at which the stirring paddle in the stirring kettle stirs the semi-solid silica gel during silica gel production.

8. A silica gel production temperature control system, characterized in that: include: The collection module is used to collect the temperature and viscosity of the semi-solid silica gel at various monitoring points in the stirring kettle after starting the silica gel production temperature control; A processing module, for predicting the temperature limit that the semi-solid silica gel can reach through all viscosities and all temperatures, taking the temperature limit and the stirring time of the stirring kettle as constraint conditions when the stirring kettle is temperature controlled, and identifying the variable temperature of each monitoring point of the semi-solid silica gel in the stirring kettle during temperature control; The processing module is also used to monitor the stirring speed of the stirring kettle during silica gel production, and to perform a transfer analysis on the heating temperature of the semi-solid silica gel based on the sudden change temperature of the semi-solid silica gel during temperature drop and the stirring speed, so as to obtain the convective heat flux on the surface of the semi-solid silica gel; The execution module is used to determine the temperature hysteresis when the stirring tank heats the semi-solid silica gel according to all variable temperatures and the convective heat flux, and to regulate the heating of the semi-solid silica gel in the stirring tank by the temperature hysteresis.

9. A computer device, characterized in that: The computer device includes a memory and a processor, the memory stores codes, and the processor is configured to obtain the codes and execute the silica gel production temperature control method according to any one of claims 1 to 7.

10. A computer-readable storage medium storing a computer program, characterized in that: When the computer program is executed by a processor, the silica gel production temperature control method according to any one of claims 1 to 7 is implemented.

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