Green photochemical self-adaptive gathering rheological polishing method and device

Abstract

A green photochemical self-adaptive compact rheological polishing method comprises the following steps that (1) a workpiece is fixed to a workpiece clamp driving device through a workpiece clamp; (2) preparing a green actinic gathering rheological grinding and polishing solution, wherein a base solution of the green actinic gathering rheological grinding and polishing solution is a photo-rheological system based on a reversible photo-crosslinking polymerization reaction; (3) adding the prepared polishing solution into a photochemical aggregation rheology grinding and polishing solution circulating system, carrying out photocrosslinking reaction on the polishing solution in a polishing solution photochemical aggregation rheology generation regulation and control device, and then supplying the polishing solution into a photochemical aggregation self-adaptive grinding and polishing tool; the viscosity detection device is used for monitoring the viscosity of the polishing solution, and self-adaptive regulation and control of the viscosity of the polishing solution in the machining process are achieved. The invention further provides a green photochemical self-adaptive compact rheological polishing device. The controllability of the rheological property of a liquid flow medium in the grinding and polishing process, the high adaptability of a machined surface, the high grinding and polishing efficiency and deterministic grinding and polishing removal are achieved.

Description

Technical Field

[0001] The invention belongs to the technical field of ultra-precision machining, and in particular relates to a green photochemical focusing rheological grinding and polishing method and device. Background Art

[0002] Ultra-precision machining technology is an important support for modern high technology, the foundation for the development of modern high-tech industries and science and technology, and the development direction of modern manufacturing science. At present, the miniaturization trend in high-tech fields such as information, biology, advanced manufacturing, and aerospace has greatly promoted the development of ultra-precision machining technology. Ultra-precision machining can achieve ultra-high shape accuracy, surface integrity, and ultra-low surface roughness.

[0003] Polishing generally refers to a processing method that uses the mechanical and chemical effects of fine abrasive particles, with the assistance of soft polishing tools or chemical processing fluids, electric / magnetic fields, etc., to obtain a smooth or ultra-smooth surface, reduce or completely eliminate the processing metamorphic layer, and thus obtain a high surface quality. Fluid polishing is to add abrasives to the fluid, and generate friction through the movement of the fluid on the surface of the workpiece being processed, thereby achieving the purpose of polishing. Because the fluid itself can reduce the direct contact of abrasive particles, thereby reducing wear and scratches on the workpiece surface, fluid polishing is often used to process high-precision workpiece surfaces.

[0004] Photoresponsive biomaterials are a type of smart biomaterials. Under the action of light, the photosensitive groups on the photoresponsive biomaterials receive light signals, and then convert them into chemical signals through the photochemical reaction process, causing changes in the physical and chemical properties of the material. According to the photochemical reaction mechanism of the photosensitive group, photoresponsive biomaterials can be divided into the following three categories: photoisomerism, photocleavage and photopolymerization. Photoisomerism biomaterials contain photoisomerism groups, which cause changes in molecular configuration through the isomerization of photosensitive molecules; photocleavage groups are introduced into the molecular chain of photocleavage biomaterials. Under the irradiation of light of a specific wavelength, the photocleavage groups break chemical bonds, which can cause polymer degradation; photocrosslinking biomaterials undergo intramolecular or intermolecular crosslinking under ultraviolet or visible light to form a stable polymer structure. The light source is safe, clean, easy to use and control. Photocrosslinking polymers can respond to light of a specific wavelength, quickly aggregate or depolymerize, and then affect the rheological properties of the fluid. The formed polymer network structure is stable and biodegradable, which is in line with the concept of green environmental protection processing and is very suitable for the field of ultra-precision polishing.

[0005] The Chinese invention patent (ZL201810188063.2) has been authorized, and the patent name is: A polishing method and device based on photorheological materials. This patent embeds photosensitive groups such as azobenzene groups and diphenylethylene groups in ordinary fluids to make photorheological polishing bodies, and loads the polishing bodies into the annular grooves of the loading plate and is limited by the gauze; the wavelength of light irradiated on the photorheological polishing bodies is adjusted by the light control device, so that the photosensitive groups produce changes in molecular structure and aggregation state, thereby causing changes in the properties of the colloid, and then adjusting the stiffness of the photorheological polishing body, so that the photorheological polishing body and the surface of the workpiece to be polished move relative to each other and rub against each other, so as to achieve the photorheological polishing body polishing the surface of the workpiece. Obviously, the principle on which this patent is based is the isomerization of photoisomerizable photosensitive groups, and the aggregation state of the molecules formed thereby is mainly maintained by van der Waals forces. Compared with the chemical bonds formed by the photocrosslinking reaction, its stability needs to be improved, and it has obvious shear-thinning characteristics; the illumination time required for the isomerization of the introduced photosensitive groups is relatively long, which is not convenient for adjusting the stiffness of the polishing body and affects the polishing efficiency; the stiffness detection device described in the patent is located outside the polishing working area, and it is difficult to realize real-time detection of the stiffness of the polishing body in the polishing working area.

[0006] The Chinese invention patent (ZL202110250346.7) has been authorized, and the patent name is: A variable-rigidity abrasive tool based on the photorheological effect. This patent uses the photorheological effect of the photorheological fluid to change the stiffness of the abrasive tool, that is, the photorheological fluid is filled into the abrasive tool. The viscoelasticity of the photorheological fluid will change under light of different wavelengths, thereby changing the deformation ability of the deformation layer, and then changing the stiffness of the abrasive tool, so that the abrasive tool can accurately fit the hard and brittle material workpiece with a free-form surface to achieve compliant grinding. This patent bonds an orderly arranged group of superhard abrasives to the outer surface of the deformation layer to form an abrasive layer, and uses the cutting action of the abrasive layer to achieve material removal. It belongs to fixed abrasive processing, which is easier to cause scratches on the workpiece surface than free abrasive processing.

[0007] The Chinese invention patent (ZL201810187956.5) has been authorized, and the patent name is: A polishing method and device based on thermorheological materials. This patent uses thermosensitive polymers as the base of thermorheological elastomer grinding heads, adjusts the temperature of the heat carrier to make the thermosensitive polymers produce microscopic changes in physical or chemical properties, thereby controlling the stiffness of the thermorheological elastomer grinding heads to meet the process requirements, so that the thermorheological elastomer grinding heads and the workpieces are ground against each other, and the micro-cutting effect of the abrasive particles is used to achieve deterministic removal of the workpiece surface material. The processing method described in this patent needs to maintain a constant temperature during the processing process, which is easy to cause energy loss; the stiffness of the thermorheological elastomer grinding head is determined by the temperature of the heat carrier, and heat conduction takes time, which is not conducive to the rapid adjustment and precise control of the stiffness of the thermorheological elastomer grinding head; and this patent is essentially a consolidated abrasive processing. Summary of the invention

[0008] In order to overcome the shortcomings of the existing technology, the present invention proposes a green photochemical adaptive aggregation rheological polishing method and device. The method of the present invention utilizes the light-induced processing medium liquid flow grinding and polishing particle (particle) aggregation rheological effect. Under the illumination of a specific wavelength (300-380nm), the raw material components in the liquid flow undergo a photocross-linking reaction, and the generated structurally stable spatial grid-type polymer can enhance the ability to aggregate and hold the abrasive particles in the liquid flow; the network abrasive functional structure group induced by this photochemical aggregation rheological effect has excellent adaptability to the microscopic surface interface of complex workpiece surfaces and controllable dynamic behavior of the network abrasive functional structure group, thereby ensuring efficient material removal and deterministic polishing removal characteristics of the target workpiece; in addition, the biodegradable photosensitive group used has the reversibility of the photocross-linking reaction, can realize the recycling of the polishing liquid flow, and the waste liquid after processing is easy to be treated in an environmentally friendly manner. The present invention has developed a special photochemical aggregation rheological regulation and photochemical aggregation adaptive polishing tool system, which can timely perform photochemical stress on the polishing liquid, actively control the dynamic rheological behavior, effectively control the adaptive aggregation rheological properties within the optimal viscosity threshold and generate a special "photosensitive self-assembly micro-cutting tool"; the deformation layer of the polishing tool can be deformed to match the shape of the workpiece, and has micropores to achieve directional slow release of the polishing liquid; the motion parameters of the flexible tool are intelligently controlled, and the flexible tool can adaptively regulate the gap between the tool-polishing liquid fluid-processing surface to improve the material removal rate. This patent realizes the controllability of the rheological properties of the liquid flow medium during grinding and polishing, high adaptability to the processing surface, high polishing efficiency, and deterministic polishing removal.

[0009] The technical solution adopted by the present invention to solve the technical problem is:

[0010] A green photochemical adaptive rheological polishing method comprises the following steps:

[0011] (1) Fixing the workpiece on the workpiece fixture driving device using a workpiece fixture;

[0012] (2) preparing a green photochemical agglomeration rheological grinding and polishing liquid, wherein the base liquid of the green photochemical agglomeration rheological grinding and polishing liquid is a photorheological system based on a reversible photocrosslinking polymerization reaction, which produces an agglomeration rheological effect under the irradiation of light with a wavelength of 300 to 380 nm, and undergoes an opposite transformation under the condition of stopping the irradiation or irradiating light with a wavelength of 250 to 280 nm, thereby enabling the fluid to achieve specific rheological properties through irradiation with light of different wavelengths; by using this reversible green photochemical reaction to regulate the aggregation effect of particles and guide the directional movement of abrasive particles, a special "photosensitive self-assembled micro-cutting tool" is formed in the polishing liquid;

[0013] The polishing liquid comprises the following components in percentage by weight: 10wt%-20wt% of polishing abrasive grains, 20wt%-35wt% of high molecular weight monomers, 10wt%-15wt% of photocrosslinking agent, 5wt%-10wt% of additives, and 30wt%-40wt% of deionized water; firstly, the high molecular weight monomer and the photocrosslinking agent are respectively dissolved in a set amount of deionized water to prepare a high molecular weight monomer solution and a photocrosslinking solution, then the two solutions are mixed and fully reacted to obtain a high molecular weight monomer solution with photosensitive groups, and the additives and a set amount of deionized water are added to prepare a photochemical aggregation rheological grinding and polishing base liquid with a set concentration; the polishing abrasive grains and the photochemical aggregation rheological grinding and polishing base liquid are fully mixed and the additives are added and stirred evenly to prepare a photochemical aggregation rheological grinding and polishing liquid;

[0014] (3) Add the prepared polishing liquid to the photochemical aggregation rheological grinding polishing liquid circulation system, and start the polishing liquid circulation system and the polishing liquid photochemical aggregation rheological generation control device. The polishing liquid undergoes a photocross-linking reaction in the polishing liquid photochemical aggregation rheological generation control device, and a stable spatial grid-type polymer is generated in the polishing liquid to hold the abrasive particles, forming a micron-scale "photosensitive self-assembled micro-cutting tool", which is then supplied to the photochemical aggregation adaptive grinding and polishing tool; the viscosity detection device located in the grinding and polishing tool is used to monitor the viscosity of the polishing liquid, and the polishing liquid photochemical aggregation rheological generation control device is controlled by a sensor to adjust the degree of the photochemical reaction in real time, so that the viscosity of the polishing liquid is always within the optimal viscosity threshold, thereby realizing the adaptive regulation of the viscosity of the polishing liquid during the processing process.

[0015] Furthermore, the method further comprises the following steps:

[0016] (4) For a specific surface to be processed, the motion trajectory to be processed is set in the computer control module, and the driving device of the grinding and polishing tool is turned on. The workpiece on the workpiece fixture and the polishing liquid on the grinding and polishing tool undergo relative movement with the photochemical aggregation rheological effect. On a flat surface, the abrasive grains are wrapped by photochemically active particles to reduce damage to the surface. When encountering a roughness peak, the photochemically active particle clusters that wrap the abrasive grains are deformed due to resistance, and the cutting edges of the abrasive grains are exposed, producing a cutting effect on the roughness peak. The "photosensitive self-assembled micro-cutting tool" generates shear force on the workpiece surface and uses the micro-cutting effect of the abrasive grains to achieve material removal. The grinding and polishing tool adaptively controls the gap between the tool, the polishing liquid, and the processing area according to the real-time pressure, and performs deterministic grinding and polishing with high efficiency, high precision, and low damage.

[0017] Furthermore, the method further comprises the following steps:

[0018] (5) The waste liquid generated by polishing is collected in a polishing liquid depolymerization pool. The reversibility of photo-crosslinking is utilized. Under the irradiation condition of light with a wavelength of 250 to 280 nm, the photochemically active particles are de-crosslinked, and the polishing liquid regains its fluidity. Subsequently, the chips are separated and the polishing liquid is recycled for the next round of polishing processing.

[0019] Furthermore, in step (2), the high molecular monomer is a green photochemically active particle, which is a polymer monomer molecule modified by a photosensitive group, wherein the photosensitive group is a vinyl functional group, eosin, an azide group, and a group such as cinnamic acid, coumarin, anthracene, etc. that can undergo a photocrosslinking reaction.

[0020] In the step (2), the additives include chemical additives such as surfactants and pH regulators; the surfactants are mild and non-toxic zwitterionic surfactants such as asymmetric Gemini zwitterionic surfactants, chitosan-modified zwitterionic surfactants, and zwitterionic polyurethane surfactants; and the pH regulators are green and environmentally friendly pH regulators such as citric acid, malic acid, and organic bases.

[0021] The polishing abrasive particles are one of metal oxide, SiO2, diamond, calcium carbonate particles or a mixture of at least two of them.

[0022] A green photochemical adaptive rheological polishing device comprises a polishing liquid photochemical agglomeration rheological generation control device, a photochemical agglomeration adaptive polishing tool system, a polishing work platform system and a polishing liquid circulation system. The polishing tool system is installed on the polishing liquid photochemical agglomeration rheological generation control device, and the polishing liquid photochemical agglomeration rheological generation control device and the polishing liquid circulation system are installed on the polishing work platform system.

[0023] Furthermore, the interior of the polishing liquid photochemical aggregation rheology generation and regulation device is divided into an ultraviolet irradiation area and a non-irradiation area by a shading baffle, the ultraviolet emitting device is installed in the irradiation area, the motor is installed in the non-irradiation area, the left end of the lead screw is connected to the motor, and the right end of the lead screw is axially positioned on the outer shell by a bearing, and a thread is provided in the middle of the movable baffle to cooperate with the lead screw. When the motor drives the lead screw to rotate, the movable baffle can move left and right. One end of the spring is fixed on the outer shell, and the other end of the spring is fixed on the movable baffle. When the movable baffle moves left and right, the spring shortens and lengthens accordingly. The polishing liquid delivery conduit is made of light-transmitting material and is solidified on the spring according to the number of turns. As the spring expands and contracts, the length of time the polishing liquid is exposed to light is adjusted, and the degree of aggregation reaction of the polishing liquid is controlled, thereby achieving the purpose of adjusting the viscosity of the polishing liquid.

[0024] Realization of aggregation: When the polishing liquid flows through the device, it is irradiated by ultraviolet rays of a specific wavelength (300-380nm) in the ultraviolet irradiation zone I, causing the photochemically active particles in the polishing liquid to undergo a photo-cross-linking reaction to generate spatial network polymers, while also encapsulating the abrasive particles to form a "photosensitive self-assembled micro-cutting tool". The degree of reaction is affected by the duration of light exposure.

[0025] Viscosity adjustment: When the viscosity of the polishing liquid is insufficient, the motor drives the screw to rotate, causing the movable baffle to move to the left, the spring to contract, the number of turns of the polishing liquid delivery conduit in the irradiation area to increase, the light exposure time of the polishing liquid to increase, the degree of cross-linking of the internal photochemically active particles to increase, and the viscosity to increase.

[0026] Furthermore, the photochemical focusing adaptive polishing tool system includes a polishing tool body, a driving shaft, a light source layer, a liquid flow layer, a deformation layer, a polishing liquid viscosity detection device, a pressure sensor, a polishing tool installation device and a polishing liquid delivery pipe. The deformation layer is connected to the driving shaft, the light source layer is embedded in the polishing tool, the polishing liquid viscosity detection device is located in the liquid flow layer, and is connected to the motor in the polishing liquid photochemical focusing rheology generation and control device, the pressure sensor is located at the micropores of the deformation layer, the polishing tool installation device is located on the polishing tool body, and the polishing liquid delivery pipe is installed on the polishing tool body and is connected to the liquid flow layer.

[0027] Preferably, the deformation layer has good deformation ability and can adapt to the shape of the workpiece. The deformation layer is provided with micropores, and the polishing liquid is supplied to the outer surface of the deformation layer through the micropores to realize directional slow release of the polishing liquid. The driving shaft is connected to the deformation layer, so that the deformation layer drives the polishing liquid and the workpiece surface to move relative to each other. The light source layer is embedded in the polishing tool, and emits ultraviolet light to cause the green photochemical active particles in the polishing liquid to continuously undergo photocross-linking reaction, actively control the dynamic rheological behavior, and effectively control the aggregation rheological properties within the optimal viscosity threshold, so as to further "reinforce" the "photosensitive self-assembled micro-cutting tool" in the polishing liquid. The polishing liquid viscosity detection device monitors the viscosity of the polishing liquid in real time, and feeds back to the polishing liquid. The liquid photochemical aggregation rheology generation control device controls the motor to rotate forward, reverse or maintain, thereby achieving real-time dynamic adjustment of the viscosity of the polishing liquid; the pressure sensor is used to measure the pressure of the polishing tool on the workpiece surface, and the polishing tool adaptively controls the gap between the tool-polishing liquid fluid-processing area according to the real-time pressure; the polishing tool system is installed at the end of the polishing liquid photochemical aggregation rheology generation control device where the polishing liquid outlet is located through the polishing tool installation device; the polishing liquid in the polishing liquid photochemical aggregation rheology generation control device is supplied to the liquid flow layer through the polishing liquid delivery pipe; the motion parameters of the polishing tool are intelligently controlled by the computer control module to perform efficient and high-precision deterministic grinding and polishing.

[0028] The polishing work platform system includes a polishing work disk, a splash shield, a workpiece fixture and a workpiece fixture driving device. The workpiece fixture is installed at the center of the polishing work disk. The polishing work disk is controlled to move up and down by the pressure sensor in the polishing tool system to ensure that the polishing tool always fits the workpiece surface with a certain pressure. The splash shield is installed on the outer edge of the polishing work disk. The height of the shield is 2 to 3 cm higher than the workpiece fixture. There is an opening at the bottom of the polishing work disk to facilitate the outflow of polishing liquid after processing.

[0029] The polishing liquid circulation system comprises a polishing liquid deagglomeration tank, a chip separation device, a polishing liquid storage device, and a polishing liquid delivery pump. The polishing liquid inlet of the polishing liquid deagglomeration tank is connected to the opening below the polishing work disk, the polishing liquid deagglomeration tank outlet is connected to the chip separation device inlet, the chip separation device outlet is connected to the polishing liquid storage device inlet, and the polishing liquid storage device outlet is connected to the polishing liquid inlet of the polishing liquid photochemical aggregation rheology generation control device through the polishing liquid delivery pump;

[0030] The polishing liquid depolymerization pool is provided with a light emitting device, which emits visible light, prompting the polymer in the polishing liquid to undergo a depolymerization reaction, thereby facilitating the separation of chips, restoring the fluidity of the polishing liquid, and facilitating the transmission and circulation of the polishing liquid; the chip separation device can separate the chips in the polishing liquid, and transmit the purified polishing liquid to the polishing liquid storage device, which has an opening for replenishing the polishing liquid.

[0031] The device also includes a computer control module. The polishing tool system is installed on the polishing liquid photochemical aggregation rheology generation control device and can move in four directions: front, back, left, and right. The specific movement trajectory and speed are set in the computer control module according to the characteristics of the surface to be processed.

[0032] The technical concept of the present invention is: utilizing the reversibility of the photocross-linking reaction, the polishing liquid has good fluidity when circulating in the non-polishing area, and in the polishing working area, it can complete the self-assembly of the "micro-cutting tool" in real time to perform polishing processing; the polishing liquid agglomeration effect occurs in real time in the polishing area, and the polishing liquid is recycled to achieve pollution-free, low-loss, low-cost green polishing.

[0033] The photochemical aggregation rheological grinding and polishing liquid is a reversible photorheological system containing green photochemically active particles. The green photochemically active particles are polymer monomer molecules modified by photosensitive groups. Under the irradiation of ultraviolet light, intramolecular or intermolecular cross-linking aggregation occurs to form a three-dimensional network structure. A new polishing medium with green adaptive aggregation rheological effect and polishing abrasive particles are prepared into a processing suspension. The green photochemical interface reaction is used to control the particle aggregation effect of the suspension and guide the directional movement of the abrasive particles, so as to achieve a flexible adaptive particle aggregation rheological mechanism of the suspension, form a "photosensitive self-assembled micro-cutting tool", and achieve micro-removal efficiency; the photocrosslinking reaction is reversible and cyclic, and the photochemical aggregation and depolymerization of the green photochemically active particles are used to dynamically adjust the viscosity of the polishing liquid in real time. After polishing, the impurities in the polishing waste liquid are removed, and the green photochemically active particles can be recycled, which is very consistent with the green environmental protection concept and can effectively reduce the processing cost; the photosensitive groups are vinyl functional groups, eosin, azide groups, and groups that can undergo photocrosslinking reactions such as cinnamic acid, coumarin, and anthracene.

[0034] The present invention realizes the controllability of the rheological properties of the liquid flow medium during the grinding and polishing process, the high adaptability of the processed surface, the high grinding and polishing efficiency, and the deterministic grinding and polishing removal.

[0035] The beneficial effects of the present invention are mainly manifested in:

[0036] 1. The present invention adopts a polishing liquid with a green photochemical reaction to guide the aggregation rheological effect. The light source is safe, clean, easy to use and control. The green photochemically active particles contained in the polishing liquid undergo a reversible photocross-linking reaction under light of a specific wavelength (300-380nm), causing the molecules to undergo an aggregation effect. The generated stable spatial grid-like polymer can not only provide a good holding effect on the abrasive particles, guide the directional movement of the abrasive particles, form a "photosensitive self-assembled micro-cutting tool", produce a micro-cutting effect on the workpiece surface, but also has an excellent adaptive deformation ability to well match the surface shape of the workpiece to be processed.

[0037] 2. The photocrosslinking reaction in the polishing liquid is reversible. When irradiated with ultraviolet light of a specific wavelength (300-380nm), the photocrosslinking reaction in the polishing liquid proceeds in the forward direction, inducing the aggregation effect of molecules; when irradiated with light of other wavelengths (250-280nm), the photocrosslinking reaction in the polishing liquid proceeds in the reverse direction, inducing the depolymerization effect of molecules. The photocrosslinking reaction takes a short time, which is convenient for timely adjustment of the viscosity of the polishing liquid. In addition, no other substances are produced during the reaction process. The polishing liquid can be recycled without replacement. The green photochemically active particles are biodegradable and non-polluting. The waste liquid after processing is easy to be treated in an environmentally friendly manner.

[0038] 3. The present invention has developed a special photochemical aggregation rheological regulation and photochemical aggregation adaptive polishing tool system, which can timely perform photochemical stress on the polishing liquid, actively control the dynamic rheological behavior, effectively control the adaptive aggregation rheological properties within the optimal viscosity threshold and generate a special "photosensitive self-assembled micro-cutting tool"; the polishing tool has a deformation layer, which can be deformed according to the shape of the workpiece, and has micropores to achieve directional slow release of the polishing liquid; the motion parameters of the flexible tool can be intelligently controlled, and the flexible tool can adaptively control the gap between the tool in the processing area-the polishing liquid fluid-the processing area to improve the material removal rate. BRIEF DESCRIPTION OF THE DRAWINGS

[0039] Figure 1 It is a schematic diagram of a green photochemical adaptive rheological polishing device (01 is a microscopic schematic diagram of the polishing liquid before the photochemical aggregation rheological effect occurs, 02 is a microscopic schematic diagram of the polishing liquid after the photochemical aggregation rheological effect occurs, and 03 is an enlarged view of the polishing position details).

[0040] Figure 2 Schematic diagram of the device for regulating the photochemical aggregation rheology of the polishing liquid.

[0041] Figure 3 Schematic diagram of the photochemical focusing adaptive polishing tool system.

[0042] Figure 4 Schematic diagram of the polishing liquid circulation system.

[0043] Figure 5 Figure 2 is a schematic diagram of the photocrosslinking reaction principle (taking a four-arm photocrosslinked coumarin monomer as an example).

[0044] Figure 6 Microscopic schematic diagram of green photochemical rheological grinding and polishing fluid (a) before working without rheological effect and (b) after producing rheological effect and cutting the surface roughness peak of the workpiece.

[0045] Figure 7 Schematic diagram of the photochemical focusing adaptive polishing tool when polishing (a) a complex curved surface and (b) a microarray surface.

[0046] In the accompanying drawings, 1 is a polishing liquid photochemical aggregation rheology generation and control device, 2 is a photochemical aggregation adaptive polishing tool system, 3 is a polishing liquid circulation system, 4 is a polishing work platform system, 5 is a workpiece, 6 is a splash guard, 7 is a workpiece fixture, 8 is a polishing work disk, 9 is a workpiece fixture drive device, 10 is a photosensitive group that can undergo photocrosslinking reaction, 11 is a group formed after the photocrosslinking reaction, 12 is a photocrosslinking polymerization monomer, 13 is a spatial network polymer generated by the photocrosslinking reaction, 14 is a green photochemically active particle, 15 is an abrasive particle, 16 is a surfactant, 17 is a pH regulator, 18 is the movement direction of the polishing liquid, 19 is the pressure applied by the polishing tool to the workpiece surface, and 20 is chips. DETAILED DESCRIPTION

[0047] The present invention will be further described below in conjunction with the accompanying drawings.

[0048] Reference Figure 1 to Figure 7 , a green photochemical adaptive aggregation rheological polishing method, comprising the following steps:

[0049] (1) Fixing the workpiece on the workpiece fixture driving device using a workpiece fixture;

[0050] (2) preparing a green photochemical agglomeration rheological grinding and polishing liquid, wherein the base liquid of the green photochemical agglomeration rheological grinding and polishing liquid is a photorheological system based on a reversible photocrosslinking polymerization reaction, which produces an agglomeration rheological effect under the irradiation of light with a wavelength of 300 to 380 nm, and undergoes an opposite transformation under the condition of stopping the irradiation or irradiating light with a wavelength of 250 to 280 nm, thereby enabling the fluid to achieve specific rheological properties through irradiation with light of different wavelengths; by using this reversible green photochemical reaction to regulate the aggregation effect of particles and guide the directional movement of abrasive particles, a special "photosensitive self-assembled micro-cutting tool" is formed in the polishing liquid;

[0051] The polishing liquid comprises the following components in percentage by weight: 10wt%-20wt% of polishing abrasive grains, 20wt%-35wt% of high molecular weight monomers, 10wt%-15wt% of photocrosslinking agent, 5wt%-10wt% of additives, and 30wt%-40wt% of deionized water; firstly, the high molecular weight monomer and the photocrosslinking agent are respectively dissolved in a set amount of deionized water to prepare a high molecular weight monomer solution and a photocrosslinking solution, then the two solutions are mixed and fully reacted to obtain a high molecular weight monomer solution with photosensitive groups, and the additives and a set amount of deionized water are added to prepare a photochemical aggregation rheological grinding and polishing base liquid with a set concentration; the polishing abrasive grains and the photochemical aggregation rheological grinding and polishing base liquid are fully mixed and the additives are added and stirred evenly to prepare a photochemical aggregation rheological grinding and polishing liquid;

[0052] In the step (2), the high molecular monomer is a green photochemically active particle, which is a polymer monomer molecule modified by a photosensitive group. The photosensitive group is a vinyl functional group, eosin, an azide group, and a group that can undergo a photocrosslinking reaction, such as cinnamic acid, coumarin, anthracene, etc.

[0053] In the step (2), the additives include chemical additives such as surfactants and pH regulators; the surfactants are mild and non-toxic zwitterionic surfactants such as asymmetric Gemini zwitterionic surfactants, chitosan-modified zwitterionic surfactants, and zwitterionic polyurethane surfactants; and the pH regulators are green and environmentally friendly pH regulators such as citric acid, malic acid, and organic bases.

[0054] The polishing abrasive particles are one or a mixture of at least two of metal oxide, SiO2, diamond, and calcium carbonate particles;

[0055] (3) Add the prepared polishing liquid to the photochemical aggregation rheological grinding polishing liquid circulation system, and start the polishing liquid circulation system and the polishing liquid photochemical aggregation rheological generation control device. The polishing liquid undergoes a photocross-linking reaction in the polishing liquid photochemical aggregation rheological generation control device, and a stable spatial grid-type polymer is generated in the polishing liquid to hold the abrasive particles, forming a micron-scale "photosensitive self-assembled micro-cutting tool", which is then supplied to the photochemical aggregation adaptive grinding and polishing tool; the viscosity detection device located in the grinding and polishing tool is used to monitor the viscosity of the polishing liquid, and the polishing liquid photochemical aggregation rheological generation control device is controlled by a sensor to adjust the degree of the photochemical reaction in real time, so that the viscosity of the polishing liquid is always within the optimal viscosity threshold, thereby realizing the adaptive regulation of the viscosity of the polishing liquid during the processing process.

[0056] (4) For a specific surface to be processed, the motion trajectory to be processed is set in the computer control module, and the driving device of the grinding and polishing tool is turned on. The workpiece on the workpiece fixture and the polishing liquid on the grinding and polishing tool undergo relative movement with the photochemical aggregation rheological effect. On a flat surface, the abrasive grains are wrapped by photochemically active particles to reduce damage to the surface. When encountering a roughness peak, the photochemically active particle clusters that wrap the abrasive grains are deformed due to resistance, and the cutting edges of the abrasive grains are exposed, producing a cutting effect on the roughness peak. The "photosensitive self-assembled micro-cutting tool" generates shear force on the workpiece surface and uses the micro-cutting effect of the abrasive grains to achieve material removal. The grinding and polishing tool adaptively controls the gap between the tool, the polishing liquid, and the processing area according to the real-time pressure, and performs deterministic grinding and polishing with high efficiency, high precision, and low damage.

[0057] (5) The waste liquid generated by polishing is collected in a polishing liquid depolymerization pool. The reversibility of photo-crosslinking is utilized. Under the irradiation condition of light with a wavelength of 250 to 280 nm, the photochemically active particles are de-crosslinked, and the polishing liquid regains its fluidity. Subsequently, the chips are separated and the polishing liquid is recycled for the next round of polishing processing.

[0058] Reference Figure 1 A green photochemical aggregation rheological grinding and polishing device comprises a polishing liquid photochemical aggregation rheological generation and control device 1, a photochemical aggregation adaptive grinding and polishing tool system 2, a polishing liquid circulation system 3, a polishing work platform system 4 and a computer control module.

[0059] The photochemical focusing adaptive polishing tool system 2 is installed on the polishing liquid photochemical focusing rheology generation control device 1, and can move in four directions, front, back, left, and right. The specific movement trajectory and speed are set in the computer control module according to the characteristics of the surface to be processed.

[0060] Reference Figure 2 The polishing liquid photochemical aggregation rheology generation control device 1 is divided into an ultraviolet irradiation area I and a non-irradiation area II by a light shielding baffle 103. The ultraviolet emitting device 101 is installed in the irradiation area, and the motor 104 is installed in the non-irradiation area. The left end of the lead screw 106 is connected to the motor 104, and the right end is axially positioned on the housing 108 by a bearing 107. The middle of the movable baffle 105 has a thread that cooperates with the lead screw 106. When the motor 104 drives the lead screw 106 to rotate, the movable baffle 105 can move left and right. One end of the spring 102 is fixed on the housing 108, and the other end is fixed on the movable baffle 105. When the movable baffle 105 moves left and right, the spring 102 shortens and lengthens accordingly. The polishing liquid delivery conduit 109 is a light-transmitting material and is fixed to the spring 102 according to the number of turns. As the spring 102 expands and contracts, the length of time the polishing liquid is exposed to light is adjusted, and the degree of aggregation reaction of the polishing liquid is controlled, thereby achieving the purpose of adjusting the viscosity of the polishing liquid.

[0061] Realization of aggregation: When the polishing liquid flows through the device, it is irradiated by ultraviolet rays of a specific wavelength (300-380nm) in the ultraviolet irradiation zone I, causing the photochemically active particles in the polishing liquid to undergo a photo-cross-linking reaction to generate spatial network polymers, while also encapsulating the abrasive particles to form a "photosensitive self-assembled micro-cutting tool". The degree of reaction is affected by the duration of light exposure.

[0062] Viscosity adjustment: When the viscosity of the polishing liquid is insufficient, the motor 104 drives the screw 106 to rotate, causing the movable baffle 105 to move leftward, the spring 102 to contract, and the number of turns of the polishing liquid delivery conduit 109 in the irradiation area I to increase. The light exposure time of the polishing liquid increases, the cross-linking degree of the internal photochemically active particles increases, and the viscosity increases.

[0063] Reference Figure 3The photochemical focusing adaptive polishing tool system 2 includes a polishing tool body 201, a driving shaft 202, a light source layer 203, a liquid flow layer 204, a deformation layer 205, a polishing liquid viscosity detection device 206, a pressure sensor 207, a polishing tool installation device 208, and a polishing liquid delivery pipe 209. The deformation layer 205 is connected to the driving shaft 202, the light source layer 203 is embedded in the polishing tool, the polishing liquid viscosity detection device 206 is located in the liquid flow layer 204, and is connected to the motor 104 in the polishing liquid photochemical focusing rheology generation control device 1, the pressure sensor 207 is located at the micropore 210 of the deformation layer, the polishing tool installation device 208 is located on the polishing tool body 201, and the polishing liquid delivery pipe 209 is installed on the polishing tool body 201 and is connected to the liquid flow layer 204;

[0064] The deformation layer 205 has good deformation ability and can adapt to the shape of the workpiece. The deformation layer is provided with micropores 210, and the polishing liquid is supplied to the outer surface of the deformation layer 205 through the micropores 210 to achieve directional slow release of the polishing liquid. The driving shaft 202 is connected to the deformation layer 205, so that the deformation layer 205 drives the polishing liquid and the workpiece surface to move relative to each other. The light source layer 203 is embedded in the polishing tool, and emits ultraviolet light to cause the green photochemical active particles in the polishing liquid to continuously undergo photocross-linking reaction, actively control the dynamic rheological behavior, and effectively control the aggregation rheological properties within the optimal viscosity threshold, so as to further "reinforce" the "photosensitive self-assembled micro-cutting tool" in the polishing liquid. The polishing liquid viscosity detection device 206 monitors the viscosity of the polishing liquid in real time and feeds back to the polishing tool. The liquid photochemical aggregation rheology generation regulating device 1 controls the motor 104 to rotate forward, reverse or maintain, thereby achieving real-time dynamic adjustment of the viscosity of the polishing liquid; the pressure sensor 207 is used to measure the pressure of the polishing tool 2 on the workpiece surface 5, and the polishing tool 2 adaptively regulates the gap between the tool-polishing liquid fluid-processing area according to the real-time pressure; the polishing tool system 2 is installed at the end of the polishing liquid outlet of the polishing liquid photochemical aggregation rheology generation regulating device 1 through the polishing tool installation device 208; the polishing liquid in the polishing liquid photochemical aggregation rheology generation regulating device 1 is supplied to the liquid flow layer 204 through the polishing liquid delivery pipe 209; the motion parameters of the polishing tool 2 are intelligently controlled by the computer control module to perform efficient and high-precision deterministic grinding and polishing.

[0065] Reference Figure 4The polishing liquid circulation system 3 includes a polishing liquid deagglomeration tank 301, a chip separation device 302, a polishing liquid storage device 303, and a polishing liquid delivery pump 304. The polishing liquid inlet of the polishing liquid deagglomeration tank 301 is connected to the opening below the polishing working disk 8, the polishing liquid deagglomeration tank 301 outlet is connected to the inlet of the chip separation device 302, the chip separation device 302 outlet is connected to the inlet of the polishing liquid storage device 303, and the polishing liquid storage device 303 outlet is connected to the polishing liquid inlet of the polishing liquid photochemical aggregation rheology generation control device 1 through the polishing liquid delivery pump 304;

[0066] The polishing liquid depolymerization pool 301 is provided with a light emitting device which emits visible light, thereby promoting a depolymerization reaction of the polymer in the polishing liquid, facilitating the separation of chips, restoring the fluidity of the polishing liquid, and facilitating the transmission and circulation of the polishing liquid; the chip separation device 302 can separate the chips in the polishing liquid, and transmit the purified polishing liquid to the polishing liquid storage device 303, which has an opening 305 for replenishing the polishing liquid.

[0067] Reference Figure 1 The polishing work platform system 4 includes a polishing work disk 8, a splash shield 6, a workpiece fixture 7 and a workpiece fixture driving device 9. The workpiece fixture 7 is installed at the center of the polishing work disk 8. The polishing work disk 8 is controlled to move up and down by the pressure sensor 207 in the photochemical focusing adaptive polishing tool system 2 to ensure that the polishing tool 2 is always in contact with the workpiece surface 5 with a certain pressure. The splash shield 6 is installed on the outer edge of the polishing work disk 8. The height of the shield is 2 to 3 cm higher than the workpiece fixture. There is an opening at the bottom of the polishing work disk 8 to facilitate the outflow of polishing liquid after processing.

[0068] Reference Figure 5 to Figure 7 , Principle of photocrosslinking reaction: There are four coumarin groups 10 on a four-arm photocurable coumarin monomer 12. When irradiated with 365nm light, the coumarin groups 10 undergo photocrosslinking reaction to generate new groups 11. The new groups make the coumarin monomers 12 crosslink with each other to form a stable three-dimensional spatial network structure 13.

[0069] Material removal mechanism: Before irradiation, the green photochemically active particles 14 and abrasive particles 15 in the polishing liquid are both in a free state. Under the irradiation of light of a specific wavelength (300-380nm), a photo-crosslinking reaction occurs between the green photochemically active particles 14 to form a spatial network structure. This structure wraps the abrasive particles 15 therein, exerts a gripping effect on the abrasive particles 15, and forms a "photosensitive self-assembled micro-cutting tool". The polishing tool 2 with polishing liquid attached applies pressure 19 to the workpiece surface 5 and rotates. The micro-tool exerts pressure on the workpiece surface and moves relative to it 18, thereby removing the material. The deformation layer 205 of the photochemically focused adaptive polishing tool 2 has excellent deformation ability and can adaptively conform to complex surfaces such as complex curved surfaces 501 and micro-array surfaces 502.

[0070] Example 1

[0071] The present invention is used for processing hard and brittle materials, semiconductor materials, optical materials, and other flat and curved surfaces. For example, when it is used for processing a SiC semiconductor material workpiece with a size of: length × width × height 25mm × 25mm × 5mm, the processing steps are as follows:

[0072] (1) Using a workpiece fixture 7 to fix a SiC semiconductor material workpiece 5 on a workpiece fixture driving device 9;

[0073] (2) preparing a green photochemical agglomeration rheological grinding and polishing liquid, wherein the base liquid of the photochemical agglomeration rheological grinding and polishing liquid is a photorheological system based on a reversible photocrosslinking polymerization reaction, which produces an agglomeration rheological effect under the irradiation of light of a certain wavelength (365nm), and can undergo an opposite transformation under the irradiation conditions of light of other wavelengths (250-280nm), and can further enable the fluid to achieve specific rheological properties through the irradiation of light of different wavelengths; by using this reversible green photochemical reaction to regulate the aggregation effect of particles and guide the directional movement of abrasive particles, a special "photosensitive self-assembled micro-cutting tool" is formed in the polishing liquid;

[0074] The polishing liquid comprises the following components in percentage by weight: 15 wt% of polishing abrasive diamond, 25 wt% of polymer monomer allyl formate, 15 wt% of photocrosslinking agent anthracene, 5 wt% of Gemini zwitterionic surfactant additive, 5 wt% of pH regulator citric acid, and 35 wt% of deionized water; firstly, the polymer monomer and the photocrosslinking agent are respectively dissolved in a certain amount of deionized water to prepare a polymer monomer solution and a photocrosslinking solution, then the two solutions are mixed, and fully reacted under certain conditions to obtain a 9-anthracenecarboxylic acid allyl ester solution, and the additive and a certain amount of deionized water are added to prepare a photochemical aggregation rheological grinding and polishing base liquid of a specific concentration; the polishing abrasive and the photochemical aggregation rheological grinding and polishing base liquid are fully mixed, and the additive is added and stirred evenly to prepare a photochemical aggregation rheological grinding and polishing liquid;

[0075] (3) Add the prepared polishing liquid to the photochemical aggregation rheological grinding polishing liquid circulation system 3, and start the polishing liquid circulation system 3 and the polishing liquid photochemical aggregation rheological generation control device 1, the polishing liquid undergoes a photocrosslinking reaction in the polishing liquid photochemical aggregation rheological generation control device 1, and a stable spatial grid-type polymer is generated in the polishing liquid to have a gripping effect on the abrasive particles, forming a micron-level "photosensitive self-assembled micro-cutting tool", which is then supplied to the photochemical aggregation adaptive grinding and polishing tool 2; the viscosity detection device 206 located in the grinding and polishing tool 2 can monitor the viscosity of the polishing liquid, and control the polishing liquid photochemical aggregation rheological generation control device 1 through a sensor to adjust the degree of photochemical reaction in real time, so that the viscosity of the polishing liquid is always within the optimal viscosity threshold, thereby realizing adaptive control of the viscosity of the polishing liquid during the processing; when processing different types of workpieces, the optimal viscosity for a specific workpiece is set according to the material properties, appearance characteristics, processing requirements, etc. of the workpiece, so as to realize adaptive control of the viscosity of the polishing liquid for different types of workpieces, thereby achieving low energy consumption, high efficiency, strong targeting, and wide adaptability of polishing.

[0076] (4) For the surface 5 to be processed, the motion trajectory to be processed is set in the computer control module, and the polishing tool driving device 202 is turned on. The workpiece 5 on the workpiece fixture 7 and the polishing liquid on the polishing tool 2 that produces the photochemical aggregation rheological effect move relative to each other; on the flat surface, the abrasive particles are wrapped by the photochemically active particles to reduce the damage to the surface. When encountering a roughness peak, the photochemically active particle clusters that wrap the abrasive particles are deformed due to resistance, and the cutting edges of the abrasive particles are exposed, producing a cutting effect on the roughness peak. The "photosensitive self-assembled micro-cutting tool" generates shear force on the workpiece surface and uses the micro-cutting effect of the abrasive particles to achieve material removal; the polishing tool adaptively controls the gap between the tool 2-polishing liquid fluid-processing area 5 according to the real-time pressure, and performs efficient, high-precision, and low-damage deterministic grinding and polishing.

[0077] (5) The waste liquid generated by polishing is collected in the polishing liquid deagglomeration tank 301. By utilizing the reversibility of photo-crosslinking, the photochemically active particles are de-crosslinked under the irradiation conditions of other wavelengths of light (250-280nm), and the polishing liquid regains its fluidity. Then the chips are separated and the polishing liquid is recycled for the next round of polishing. By utilizing the reversibility of the photo-crosslinking reaction, the polishing liquid has good fluidity when circulating in the non-polishing area, and in the polishing working area, it can complete the self-assembly of the "micro-cutting tool" in real time and perform polishing. The polishing liquid aggregation effect occurs in real time in the polishing area, and the polishing liquid is recycled to achieve pollution-free, low-loss, low-cost green polishing.

[0078] Example 2

[0079] The present invention is used for processing planes and curved surfaces of hard and brittle materials, semiconductor materials, optical materials, etc. For example, when it is used for processing convex curved optical glass with a diameter of 30 mm and a focal length of 60 mm, the processing steps are as follows:

[0080] (1) Fixing the convex curved optical glass 5 on the workpiece fixture driving device 9 by using the workpiece fixture 7;

[0081] (2) preparing a green photochemical adaptive agglomerative rheological grinding and polishing liquid, wherein the base liquid of the photochemical adaptive agglomerative rheological grinding and polishing liquid is a photorheological system based on a reversible photocrosslinking polymerization reaction, which produces an agglomerative rheological effect under the irradiation of light of a certain wavelength (365nm), and can undergo an opposite transformation under the irradiation conditions of light of other wavelengths (254nm), thereby enabling the fluid to achieve specific rheological properties through irradiation of light of different wavelengths; by using this reversible green photochemical reaction to regulate the aggregation effect of particles and guide the directional movement of abrasive particles, a special "photosensitive self-assembled micro-cutting tool" is formed in the polishing liquid;

[0082] The polishing liquid comprises the following components in percentage by mass: polishing abrasive Al2O3, 12wt% diamond mixed abrasive, 30wt% polymer monomer acrylamide, 15wt% photocrosslinking agent coumarin, 4wt% chitosan modified zwitterionic surfactant additive, 4wt% methyl propanol pH regulator, and 35wt% deionized water; firstly, the polymer monomer and the photocrosslinking agent are dissolved in a certain amount of deionized water to prepare a polymer monomer solution and a photocrosslinking solution, then the two solutions are mixed, and the two solutions are fully reacted under certain conditions to obtain a polymer monomer solution of coumarin functionalized acrylamide monomer, and the additives and a certain amount of deionized water are added to prepare a photochemical aggregation rheological grinding and polishing base liquid of a specific concentration; the polishing abrasive and the photochemical aggregation rheological grinding and polishing base liquid are fully mixed and stirred to prepare a photochemical aggregation rheological grinding and polishing liquid;

[0083] (3) Add the prepared polishing liquid to the photochemical aggregation rheological grinding polishing liquid circulation system 3, and start the polishing liquid circulation system 3 and the polishing liquid photochemical aggregation rheological generation control device 1, the polishing liquid undergoes a photocrosslinking reaction in the polishing liquid photochemical aggregation rheological generation control device 1, and a stable spatial grid-type polymer is generated in the polishing liquid to have a gripping effect on the abrasive particles, forming a micron-level "photosensitive self-assembled micro-cutting tool", which is then supplied to the photochemical aggregation adaptive grinding and polishing tool 2; the viscosity detection device 206 located in the grinding and polishing tool 2 can monitor the viscosity of the polishing liquid, and control the polishing liquid photochemical aggregation rheological generation control device 1 through a sensor to adjust the degree of photochemical reaction in real time, so that the viscosity of the polishing liquid is always within the optimal viscosity threshold, thereby realizing adaptive control of the viscosity of the polishing liquid during the processing; when processing different types of workpieces, the optimal viscosity for a specific workpiece is set according to the material properties, appearance characteristics, processing requirements, etc. of the workpiece, so as to realize adaptive control of the viscosity of the polishing liquid for different types of workpieces, thereby achieving low energy consumption, high efficiency, strong targeting, and wide adaptability of polishing.

[0084] (4) For the surface 5 to be processed, the motion trajectory to be processed is set in the computer control module, and the polishing tool driving device 202 is turned on. The workpiece 5 on the workpiece fixture 7 and the polishing liquid on the polishing tool 2 that produces the photochemical aggregation rheological effect move relative to each other; on the flat surface, the abrasive particles are wrapped by the photochemically active particles to reduce the damage to the surface. When encountering a roughness peak, the photochemically active particle clusters that wrap the abrasive particles are deformed due to resistance, and the cutting edges of the abrasive particles are exposed, producing a cutting effect on the roughness peak. The "photosensitive self-assembled micro-cutting tool" generates shear force on the workpiece surface and uses the micro-cutting effect of the abrasive particles to achieve material removal; the polishing tool adaptively controls the gap between the tool 2-polishing liquid fluid-processing area 5 according to the real-time pressure, and performs efficient, high-precision, and low-damage deterministic grinding and polishing.

[0085] (5) The waste liquid generated by polishing is collected in the polishing liquid deagglomeration tank 301. By utilizing the reversibility of photo-crosslinking, the photochemically active particles are de-crosslinked under the irradiation conditions of other wavelengths of light (250-280nm), and the polishing liquid regains its fluidity. Then the chips are separated and the polishing liquid is recycled for the next round of polishing. By utilizing the reversibility of the photo-crosslinking reaction, the polishing liquid has good fluidity when circulating in the non-polishing area, and in the polishing working area, it can complete the self-assembly of the "micro-cutting tool" in real time and perform polishing. The polishing liquid aggregation effect occurs in real time in the polishing area, and the polishing liquid is recycled to achieve pollution-free, low-loss, low-cost green polishing.

[0086] The contents described in the embodiments of this specification are merely an enumeration of the implementation forms of the inventive concept and are for illustrative purposes only. The protection scope of the present invention should not be considered to be limited to the specific forms described in this embodiment, and the protection scope of the present invention also extends to equivalent technical means that can be thought of by ordinary technicians in this field based on the inventive concept.

Claims

1. A green photochemical adaptive rheological polishing method, characterized in that: The method comprises the following steps: (1) Fixing the workpiece on the workpiece fixture driving device using a workpiece fixture; (2) preparing a green photochemical agglomeration rheological grinding and polishing liquid, wherein the base liquid of the green photochemical agglomeration rheological grinding and polishing liquid is a photorheological system based on a reversible photocrosslinking polymerization reaction, which produces an agglomeration rheological effect under the irradiation of light with a wavelength of 300 to 380 nm, and undergoes an opposite transformation under the condition of no irradiation or irradiation of light with a wavelength of 250 to 280 nm, thereby enabling the fluid to achieve specific rheological properties through irradiation of light with different wavelengths; by using this reversible green photochemical reaction to regulate the aggregation effect of particles and guide the directional movement of abrasive particles, a special "photosensitive self-assembled micro-cutting tool" is formed in the polishing liquid; The polishing liquid comprises the following components in percentage by weight: 10wt%-20wt% of polishing abrasive grains, 20wt%-35wt% of high molecular weight monomers, 10wt%-15wt% of photocrosslinking agent, 5wt%-10wt% of additives, and 30wt%-40wt% of deionized water; firstly, the high molecular weight monomer and the photocrosslinking agent are respectively dissolved in a set amount of deionized water to prepare a high molecular weight monomer solution and a photocrosslinking solution, then the two solutions are mixed and fully reacted to obtain a high molecular weight monomer solution with photosensitive groups, and the additives and a set amount of deionized water are added to prepare a photochemical aggregation rheological grinding and polishing base liquid with a set concentration; the polishing abrasive grains and the photochemical aggregation rheological grinding and polishing base liquid are fully mixed and the additives are added and stirred evenly to prepare a photochemical aggregation rheological grinding and polishing liquid; (3) Add the prepared polishing liquid to the photochemical aggregation rheological grinding polishing liquid circulation system, and start the polishing liquid circulation system and the polishing liquid photochemical aggregation rheological generation control device. The polishing liquid undergoes a photocrosslinking reaction in the polishing liquid photochemical aggregation rheological generation control device, and a stable spatial grid-type polymer is generated in the polishing liquid to hold the abrasive particles, forming a micron-scale "photosensitive self-assembled micro-cutting tool", which is then supplied to the photochemical aggregation adaptive grinding and polishing tool; the viscosity detection device located in the grinding and polishing tool is used to monitor the viscosity of the polishing liquid, and the polishing liquid photochemical aggregation rheological generation control device is controlled by a sensor to adjust the degree of the photochemical reaction in real time, so that the viscosity of the polishing liquid is always within the optimal viscosity threshold, thereby realizing the adaptive regulation of the viscosity of the polishing liquid during the processing process.

2. The green photochemical adaptive rheological polishing method according to claim 1, characterized in that: The method further comprises the following steps: (4) For a specific surface to be processed, the motion trajectory to be processed is set in the computer control module, and the driving device of the grinding and polishing tool is turned on. The workpiece on the workpiece fixture and the polishing liquid on the grinding and polishing tool undergo relative movement with the photochemical aggregation rheological effect. On a flat surface, the abrasive grains are wrapped by photochemically active particles to reduce damage to the surface. When encountering a roughness peak, the photochemically active particle clusters that wrap the abrasive grains are deformed due to resistance, and the cutting edges of the abrasive grains are exposed, producing a cutting effect on the roughness peak. The "photosensitive self-assembled micro-cutting tool" generates shear force on the workpiece surface and uses the micro-cutting effect of the abrasive grains to achieve material removal. The grinding and polishing tool adaptively controls the gap between the tool, the polishing liquid, and the processing area according to the real-time pressure, and performs deterministic grinding and polishing with high efficiency, high precision, and low damage.

3. The green photochemical adaptive rheological polishing method according to claim 2, characterized in that: The method further comprises the following steps: (5) The waste liquid generated by polishing is collected in a polishing liquid depolymerization pool. The reversibility of photo-crosslinking is utilized. Under the irradiation condition of light with a wavelength of 250 to 280 nm, the photochemically active particles are de-crosslinked, and the polishing liquid regains its fluidity. Subsequently, the chips are separated and the polishing liquid is recycled for the next round of polishing processing.

4. The green photochemical adaptive rheological polishing method according to any one of claims 1 to 3, characterized in that: In the step (2), the high molecular monomer is a green photochemically active particle, which is a polymer monomer molecule modified by a photosensitive group, wherein the photosensitive group is a vinyl functional group, eosin, an azide group, and a group capable of undergoing a photocrosslinking reaction such as cinnamic acid, coumarin, anthracene, etc.; In the step (2), the additives include chemical additives such as surfactants and pH regulators; the surfactants are mild and non-toxic zwitterionic surfactants such as asymmetric Gemini zwitterionic surfactants, chitosan-modified zwitterionic surfactants, and zwitterionic polyurethane surfactants; the pH regulators are green and environmentally friendly pH regulators such as citric acid, malic acid, and organic bases; The polishing abrasive particles are one of metal oxide, SiO2, diamond, calcium carbonate particles or a mixture of at least two of them.

5. A device for implementing the green photochemical adaptive focusing rheological polishing method as claimed in claim 1, characterized in that: The device includes a polishing liquid photochemical agglomeration rheology generation control device, a photochemical agglomeration adaptive polishing tool system, a polishing work platform system and a polishing liquid circulation system. The polishing tool system is installed on the polishing liquid photochemical agglomeration rheology generation control device, and the polishing liquid photochemical agglomeration rheology generation control device and the polishing liquid circulation system are installed on the polishing work platform system.

6. The device according to claim 5, characterized in that The interior of the polishing liquid photochemical aggregation rheology generation and control device is divided into an ultraviolet irradiation area and a non-irradiation area by a shading baffle. The ultraviolet emitting device is installed in the irradiation area, and the motor is installed in the non-irradiation area. The left end of the screw is connected to the motor, and the right end of the screw is axially positioned on the outer shell by a bearing. There is a thread in the middle of the movable baffle to cooperate with the screw. When the motor drives the screw to rotate, the movable baffle can move left and right. One end of the spring is fixed on the outer shell, and the other end of the spring is fixed on the movable baffle. When the movable baffle moves left and right, the spring shortens and lengthens accordingly. The polishing liquid delivery conduit is a light-transmitting material and is solidified on the spring according to the number of turns. As the spring expands and contracts, the length of time the polishing liquid is exposed to light is adjusted, and the degree of aggregation reaction of the polishing liquid is controlled, thereby achieving the purpose of adjusting the viscosity of the polishing liquid.

7. The device according to claim 5 or 6, characterized in that The photochemical focusing adaptive polishing tool system includes a polishing tool body, a driving shaft, a light source layer, a liquid flow layer, a deformation layer, a polishing liquid viscosity detection device, a pressure sensor, a polishing tool installation device and a polishing liquid delivery pipe. The deformation layer is connected to the driving shaft, the light source layer is embedded in the polishing tool, the polishing liquid viscosity detection device is located in the liquid flow layer, and is connected to the motor in the polishing liquid photochemical focusing rheology generation and control device, the pressure sensor is located at the micropores of the deformation layer, the polishing tool installation device is located on the polishing tool body, and the polishing liquid delivery pipe is installed on the polishing tool body and is connected to the liquid flow layer.

8. The device according to claim 5 or 6, characterized in that The polishing work platform system includes a polishing work disk, a splash shield, a workpiece fixture and a workpiece fixture driving device. The workpiece fixture is installed at the center of the polishing work disk. The polishing work disk is controlled to move up and down by the pressure sensor in the polishing tool system to ensure that the polishing tool always fits the workpiece surface with a certain pressure. The splash shield is installed on the outer edge of the polishing work disk. The height of the shield is 2 to 3 cm higher than the workpiece fixture. There is an opening at the bottom of the polishing work disk to facilitate the outflow of polishing liquid after processing.

9. The device according to claim 5 or 6, characterized in that The polishing liquid circulation system comprises a polishing liquid deagglomeration tank, a chip separation device, a polishing liquid storage device, and a polishing liquid delivery pump. The polishing liquid inlet of the polishing liquid deagglomeration tank is connected to the opening below the polishing work disk, the polishing liquid deagglomeration tank outlet is connected to the chip separation device inlet, the chip separation device outlet is connected to the polishing liquid storage device inlet, and the polishing liquid storage device outlet is connected to the polishing liquid inlet of the polishing liquid photochemical aggregation rheology generation control device through the polishing liquid delivery pump; The polishing liquid depolymerization pool is provided with a light emitting device, which emits visible light, prompting the polymer in the polishing liquid to undergo a depolymerization reaction, thereby facilitating the separation of chips, restoring the fluidity of the polishing liquid, and facilitating the transmission and circulation of the polishing liquid; the chip separation device can separate the chips in the polishing liquid, and transmit the purified polishing liquid to the polishing liquid storage device, which has an opening for replenishing the polishing liquid.

10. The device according to claim 5 or 6, characterized in that The device also includes a computer control module. The polishing tool system is installed on the polishing liquid photochemical aggregation rheology generation control device and can move in four directions: front, back, left, and right. The specific movement trajectory and speed are set in the computer control module according to the characteristics of the surface to be processed.

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