An ultrasonic film removal device for ceramic substrate

Abstract

The present application discloses an ultrasonic film removal device for ceramic substrates, including an ultrasonic tank and a lifting frame, wherein a driving part is provided on the outer side of the lifting frame, and the lifting frame is provided with a rotating mounting part, wherein the rotating mounting part enables the lifting frame to be rotatably mounted and to remain horizontal in the initial state; a blocking structure is provided in the ascending path of the lifting frame, and the lifting frame is provided with a locking part at a position corresponding to the horizontal direction, wherein the locking part prevents the lifting frame from rotating counterclockwise in the horizontal state. The present application can realize automated ultrasonic treatment of ceramic substrates; when the lifting frame rises after the ultrasonic treatment is completed, it reaches the position of the blocking structure and automatically tilts and drops the material, without the need for additional discharging equipment and identification equipment for identifying the completion of the ultrasonic treatment, and without the need for subsequent manual operation, and has the advantages of cost saving and automation.

Description

Technical Field

[0001] The present application relates to the technical field of ceramic substrate processing, and in particular to an ultrasonic film removal device for ceramic substrates. Background Art

[0002] During the processing of ceramic substrates, it is usually necessary to perform film removal operations to ensure the smooth progress of subsequent processing steps. During the processing of ceramic substrates, processes such as drilling, etching, ultrasonic cleaning, and film removal are required. In the prior art, dry film covering is usually used to prevent the copper in the circuit part from being etched. After the circuit etching is completed, the dry film needs to be removed to finally form a ceramic substrate. This film removal process is currently often carried out by etching. However, due to the tight adhesion of the dry film, it is usually necessary to gradually erode from the outside to the inside during etching, so the entire film removal process takes a long time, which affects the smooth production of the entire production process.

[0003] Therefore, we propose an ultrasonic film removal device to solve the problem of long film removal process. Summary of the invention

[0004] The purpose of the present application is to provide an ultrasonic film removal device for a ceramic substrate.

[0005] To achieve the above purpose, the technical solution adopted in the present application is: an ultrasonic film removal device for ceramic substrates, comprising an ultrasonic tank and a lifting frame, a driving part is provided on the outer side of the lifting frame, and the lifting frame is provided with a rotating mounting member, the rotating mounting member enables the lifting frame to be rotatably mounted and maintain horizontal in the initial state; a blocking structure is provided in the ascending path of the lifting frame, and the lifting frame is provided with a blocking part at a corresponding position in the horizontal direction, and the blocking part prevents the lifting frame from rotating counterclockwise in a horizontal state; the lifting frame starts to rise from below the liquid surface of the ultrasonic tank until it acts on the blocking structure and causes the blocking structure to deform elastically when it is higher than the set height of the top surface of the ultrasonic tank, during which the lifting frame rotates and tilts until the lifting frame leaves the blocking structure, the lifting frame returns to a horizontal state, and the blocking structure is reset; the lifting frame descends after loading from the top, and causes the blocking structure to deform elastically when it is connected with the blocking structure, the lifting frame maintains a horizontal state and passes through the blocking structure, and finally reaches below the liquid surface of the ultrasonic tank for ultrasonic treatment.

[0006] As a preferred embodiment, the lifting frame is a square tube-shaped structure with through holes on all four sides. Sealing plates are provided at both ends of the lifting frame for sliding up and down. The sealing plates can float in the solution in the ultrasonic tank. When the lifting frame descends to below the solution in the ultrasonic tank, the sealing plates rise due to buoyancy and close the two ends of the lifting frame. When the lifting frame rises and leaves the solution, it falls due to gravity and opens the two ends of the lifting frame.

[0007] As a preferred embodiment, the inner wall of the inner cavity of the ultrasonic tank is also provided with the blocking structure at a position higher than the water level line. When the lifting frame passes through the blocking structure located below, it rotates and tilts. When leaving the blocking structure located below, the lifting frame acts on the bottommost blocking structure located above before returning to a horizontal state, so that the lifting frame stops suddenly. At this time, the corresponding sealing plate does not completely leave the liquid surface, so that the bottom parts of the two ends of the lifting frame are closed and the bottom surface of the lifting frame leaves the liquid surface. Part of the ceramic substrate moves with the inclination of the lifting frame, and is finally blocked by the sealing plate and cannot be discharged. When the lifting frame stops suddenly, the water accumulated inside it flows out or is thrown out from the through holes on the surface of the lifting frame due to inertia. As the lifting frame continues to rise, the lifting frame causes the blocking structure located above to elastically deform, and the lifting frame rotates and tilts for the second time. The sealing plate no longer closes the bottom of the lifting frame, and the ceramic substrate located in the lifting frame tilts and falls. As the lifting frame continues to rise, it finally leaves the blocking structure located above and returns to a horizontal state.

[0008] Preferably, the blocking structure comprises a pair of acting parts interacting with the lifting frame, and the pair of acting parts respectively correspond to two ends of the same side of the lifting frame; the projection of the sealing plate in the horizontal direction is located between the projections of the pair of acting parts in the horizontal direction, the distance between the pair of acting parts is smaller than the width of the lifting frame, and the width of the sealing plate is smaller than the width of the lifting frame.

[0009] Preferably, the action portion is provided with an elastic member in a horizontal direction and toward the outside of the ultrasonic tank, and the lifting frame acts on the action portion when rising or falling, so that the action portion is translated or flipped toward the outside of the ultrasonic tank, and the elastic member is compressed at the same time, until the lifting frame leaves the action portion, and the elastic member is reset and the action portion is reset.

[0010] As a preference, the rotating mounting component includes a rotating shaft for rotating the lifting frame and an elastic structure for keeping it horizontal in an initial state, and the rotating shaft is arranged at the middle part or the left end part of the lifting frame; when the lifting frame rises and acts on the blocking structure, the lifting frame rotates around the rotating shaft, and at the same time the elastic structure is compressed to store energy, and when leaving the blocking structure, the elastic structure releases energy to reset the lifting frame, and the locking portion corresponds to the rotating shaft, and when the rotating shaft reaches a horizontal position, the rotating shaft and the locking portion abut against each other to prevent the rotating shaft from rotating counterclockwise.

[0011] As a preferred embodiment, the rotating shaft is arranged in the middle part of the lifting frame, the driving part includes a mounting part for cooperating with the lifting frame, the rotating shaft is installed on the mounting part, and stabilizing bars are fixedly arranged on both sides of the rotating shaft, and an arc track for limiting the rotation of the two stabilizing bars is arranged on the mounting part on a circle with the position of the rotating shaft as the center and the distance between the rotating shaft and the stabilizing bar as the radius, the stabilizing bar and the stabilizing frame are fixedly connected, and the bottom of the arc track on the left and the top of the arc track on the right form the locking part, and in an initial state, the stabilizing bar on the left is located at the bottom of the arc track on the left, and the stabilizing bar on the right is located at the top of the arc track on the right to form a locking position.

[0012] As a preferred embodiment, the rotating shaft is arranged at the left end portion of the lifting frame, the driving portion includes a mounting portion for cooperating with the lifting frame, the rotating shaft is mounted on the mounting portion, a stabilizing bar is arranged on the right side of the rotating shaft, and an arc track for limiting the rotation of the stabilizing bar is arranged on the mounting portion on a circle with the position of the rotating shaft as the center and the distance between the rotating shaft and the stabilizing bar as the radius, the top of the arc track forms the locking portion, and in an initial state, the right end of the stabilizing bar is located at the bottom of the arc track to form a locking position.

[0013] As a preferred embodiment, the elastic structure is configured as two groups of retaining springs, and the two groups of retaining springs are respectively arranged between the first stabilizing rod and the rotating shaft and between the second stabilizing rod and the rotating shaft, and the positions where the two groups of retaining springs are connected on the rotating shaft are staggered in sequence and the deformation directions of the two groups of retaining springs are opposite; when the lifting frame and the blocking structure act, the two stabilizing rods rotate clockwise at the same time, so that the two groups of retaining springs are deformed at the same time and to the same extent, and when the lifting frame leaves the blocking structure, the two groups of retaining springs are reset to restore the lifting frame to a horizontal state.

[0014] As a preference, the elastic structure is configured as a tension spring, and the tension spring is horizontally placed below the rotating shaft and the lifting frame. In an initial state, the tension spring remains horizontal so that the lifting frame and the rotating shaft remain in a horizontal state. When the rotating shaft and the lifting frame rotate clockwise, the tension spring elastically deforms. When the lifting frame leaves the blocking structure, the tension spring resets to restore the lifting frame to a horizontal state.

[0015] Compared with the prior art, the beneficial effects of this application are:

[0016] The present application can realize automated ultrasonic processing of ceramic substrates; when the lifting frame rises after the ultrasonic processing is completed, it reaches the position of the blocking structure and automatically tilts to drop the material. There is no need for additional discharging equipment and identification equipment for identifying the completion of ultrasonic processing, and there is no need for subsequent manual operation, which has the advantages of cost saving and automation. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 It is a schematic diagram of the overall structure of an embodiment of the present application.

[0018] Figure 2 yes Figure 1 Top view of the .

[0019] Figure 3 yes Figure 1 Front view of .

[0020] Figure 4 yes Figure 3 sectional view of .

[0021] Figure 5 It is a schematic diagram of the lifting frame and the blocking structure when they are close to each other.

[0022] Figure 6 yes Figure 5 The view as you get closer.

[0023] Figure 7 It is a structural schematic diagram of a preferred embodiment of a rotating mounting member.

[0024] Figure 8 It is a schematic diagram of the lifting frame at the bottom being partially immersed in the ultrasonic tank solution.

[0025] Fig. 9 yes Figure 8 Schematic diagram of the middle lift frame as it rises further.

[0026] Fig.10 yes Fig. 9 Schematic diagram of the middle lift frame as it rises further.

[0027] Fig.11 This is a schematic diagram of the lifting platform 10 when it rises further.

[0028] Fig.12 yes Fig.11 Schematic diagram of the middle lift frame as it rises further.

[0029] Fig.13 It is a schematic diagram of the two states of the sealing plate.

[0030] Fig.14 It is a schematic diagram of the sealing plate and the working part.

[0031] Fig.15This is a schematic diagram of the drive unit.

[0032] In the figure: 1. connecting frame; 2. mounting part; 3. lifting frame; 4. blocking structure; 5. ultrasonic tank; 6. sealing plate; 7. rotating mounting part; 8. retaining spring; 9. unloading area; 10. action part; 11. through hole; 12. arc track; 13. stabilizing rod; 14. guide plate; 15. driving part. DETAILED DESCRIPTION

[0033] Below, the present application is further described in conjunction with specific implementation methods. It should be noted that, under the premise of no conflict, the various embodiments or technical features described below can be arbitrarily combined to form new embodiments.

[0034] In the description of the present application, it should be noted that directional words, such as the terms "center", "lateral", "longitudinal", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", etc., indicating directions and positional relationships are based on the directions or positional relationships shown in the accompanying drawings, and are only for the convenience of narrating the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific direction, be constructed and operated in a specific direction, and cannot be understood as limiting the specific scope of protection of the present application.

[0035] It should be noted that the terms "first", "second", etc. in the description and claims of the present application are used to distinguish similar objects, and are not necessarily used to describe a specific order or sequence.

[0036] The terms "including" and "having" and any variations thereof in the specification and claims of this application are intended to cover non-exclusive inclusions. For example, a process, method, system, product or apparatus comprising a series of steps or units is not necessarily limited to those steps or units explicitly listed, but may include other steps or units not explicitly listed or inherent to these processes, methods, products or apparatuses.

[0037] Example:

[0038] Reference Figures 1 to 15As shown, this embodiment proposes an ultrasonic film removal device for ceramic substrates, including an ultrasonic tank 5, a lifting frame 3 and a driving part 15. The lifting frame 3 is provided with a rotating mounting member 7, and the rotating mounting member 7 enables the lifting frame 3 to be rotatably installed and maintain a horizontal state in an initial state; a blocking structure 4 is provided in the rising path of the lifting frame 3, and a locking part is provided at a corresponding position of the lifting frame 3 in the horizontal direction, and the locking part prevents the lifting frame 3 from rotating counterclockwise in a horizontal state. In the initial state, the rotating mounting member 7 can not only keep the lifting frame 3 horizontal, but also further appropriately improve the elasticity of the rotating mounting member 7, so that the lifting frame 3 and the locking part are offset in the initial state, thereby ensuring stability in the horizontal state; the lifting frame 3 starts to rise from below the liquid surface of the ultrasonic tank 5, until it is higher than the set height of the top surface of the ultrasonic tank 5, acts on the blocking structure 4 and causes the blocking structure 4 to deform elastically, during which the lifting frame 3 rotates and tilts until the lifting frame 3 leaves the blocking structure 4, the lifting frame 3 returns to the horizontal state, and the blocking structure 4 is reset; the lifting frame 3 descends from the top after loading, until it connects with the blocking structure 4, causing the blocking structure 4 to deform elastically, the lifting frame 3 remains horizontal and passes through the blocking structure 4, and finally reaches below the liquid surface of the ultrasonic tank 5 for ultrasonic treatment. After ultrasonic treatment, the dry film on the ceramic substrate softens, which is helpful for subsequent film removal.

[0039] The rotating mounting member 7 in this embodiment needs to enable the lifting frame 3 to rotate and tilt when subjected to an external force in a specific direction and large enough after installation, and the lifting frame 3 can return to a horizontal state after the external force disappears. Generally, a rotating shaft for supporting the rotation and an elastic reset member are required to achieve the above functions.

[0040] In this embodiment, the driving unit 15 can be a cylinder or other device that is convenient for lifting and lowering operations, and can be equipped with an existing electric control system for electric control operations. Fig.15 As shown, the driving part 15 is configured as a cylinder, the piston rod at the top of the cylinder is connected to the connecting frame 1, the bottom of the connecting frame 1 is provided with a mounting part 2, the lifting frame 3 is mounted on the mounting part 2, and is lifted and lowered along with the mounting part 2. The driving part 15 can drive the lifting frame 3 to lift as a whole, and the lifting frame 3 can have different states at different positions during the lifting process, such as an initial horizontal state and an inclined state formed by rotating clockwise when interacting with the blocking structure 4.

[0041] The arrangement of the blocking part in this embodiment can prevent the lifting frame 3 from rotating counterclockwise. When the lifting frame 3 starts to descend and connects with the blocking structure 4 in the initial state, the corresponding blocking structure 4 is elastically deformed, and the lifting frame 3 does not change its angle due to the blocking of the blocking part; on the contrary, when the lifting frame 3 acts from below the blocking structure 4, the lifting frame 3 is not restricted by the blocking part, so it can rotate and tilt. As for how the lifting frame 3 in this embodiment returns to the horizontal state, it can be driven by, for example, an electrically controlled cylinder, or an elastic structure can be arranged at the bottom of the lifting frame 3. When the lifting frame 3 and the blocking structure 4 act and rotate clockwise, the elastic structure is compressed. When the interaction is cancelled, the elastic structure is reset to reset the lifting frame 3.

[0042] When in use, the lifting frame 3 is initially located at a higher position above the liquid level and is in a horizontal state. At this time, materials can be loaded into the lifting frame 3. Figure 2 As shown, a rectangular feeding trough is provided on the top of the lifting frame 3. When feeding, it is best to spread the material relatively evenly inside the lifting frame 3, which is conducive to the effect of subsequent ultrasonic treatment. After the ceramic substrate with the dry film is added, the lifting frame 3 begins to descend and enters below the liquid surface in the ultrasonic tank 5. During the process, it will act on the blocking structure 4 and cause the blocking structure 4 to deform and reset once; after entering below the liquid surface, ultrasonic immersion and vibration are started to soften the dry film and possibly remove part of the dry film. After the softening process is completed, the lifting frame 3 rises and acts on the blocking structure 4 at a certain height after leaving the liquid surface. At this time, the lifting frame 3 is tilted, so that the ceramic substrate will slide out of the lifting frame 3 due to the tilting effect and unload. In order to ensure smooth unloading, the height of the blocking structure 4 needs to be higher than the height of the top of the ultrasonic tank 5, and after tilting, the bottom end of the lifting frame 3 needs to be at least flush with the height of the top of the ultrasonic tank 5, or preferably higher by a certain distance. In this state, the height of the bottom end of the lifting frame 3 is equal to or higher than the top of the ultrasonic tank 5 by a certain distance, which is collectively referred to as the set distance above the top surface of the ultrasonic tank 5. Obviously, the specific value of this "set distance" is greater than or equal to 0. In this way, when the lifting frame 3 rises after the ultrasonic treatment is completed, it reaches the position of the blocking structure 4 and automatically tilts to drop the material. There is no need to set up additional discharging equipment and identification equipment for identifying the completion of the ultrasonic treatment, and there is no need for subsequent manual operation, which has the advantages of cost saving and automation.

[0043] The ultrasonic tank 5 used in this embodiment can be understood as the ultrasonic tank 5 in the ultrasonic cleaning machine, which is mainly used to soften the dry film on the surface of the ceramic substrate. Etching after the dry film is softened will greatly improve the etching speed and effect, thereby achieving the purpose of reducing the process time. As for the liquid used in the ultrasonic tank 5, it can generally be water or a solution that can have a corrosive reaction with the dry film on the ceramic substrate. With the action of ultrasound, the dry film can be effectively softened, or even partially dissolved or dropped, so that the subsequent etching process can have a faster and better film removal effect.

[0044] Obviously, under the premise that the ultrasonic environment does not produce side effects such as affecting the solute composition of the etching solution and non-volatile toxic gases, the two process flows of ultrasound and etching can be further directly integrated on the basis of this embodiment, thereby further reducing the process time.

[0045] Embodiment 2:

[0046] Based on Example 1, refer to Figure 1 and Fig.13 As shown, in this embodiment, the lifting frame 3 is a square tube with through holes 11 on all four sides. Sealing plates 6 are provided at both ends of the lifting frame 3 to slide up and down. The sealing plates 6 can float in the solution in the ultrasonic tank 5. When the lifting frame 3 descends to the bottom of the solution in the ultrasonic tank 5, the sealing plates 6 rise under the influence of buoyancy and close the two ends of the lifting frame 3. When the lifting frame 3 rises and leaves the solution, it falls under the influence of gravity and opens the two ends of the lifting frame 3. Fig.13 (a) is an open state, and (b) is a closed state. In state (b), the bottom of the sealing plate 6 is located in the solution of the ultrasonic tank, and the buoyancy causes the sealing plate 6 to seal the left and right sides of the lifting frame 3.

[0047] The floating setting of the sealing plate 6 allows the lifting frame 3 to be automatically closed after it enters below the liquid level of the ultrasonic tank 5. Since the essence of ultrasonic waves is waves formed by vibration, the ceramic substrate located at the edge may fall into the ultrasonic tank 5 due to vibration during operation. The ceramic substrate after leaving the lifting frame 3 is easy to remain in the ultrasonic tank 5, and it is easy to be scrapped after multiple ultrasonic treatments, and the residue in the ultrasonic tank 5 may affect the subsequent ultrasonic treatment. The sealing plate 6 set for this purpose can effectively automatically close the inner cavity of the lifting frame 3 during ultrasonic treatment, and automatically open when the lifting frame 3 rises and leaves the liquid surface after the ultrasonic treatment. When the lifting frame 3 and the blocking structure 4 interact with each other, the lifting frame 3 tilts. At this time, the sealing plate 6 will not close the two ends of the lifting frame 3 due to the action of gravity, so that the ceramic substrate can fall out after the lifting frame 3 tilts. Obviously, the ceramic substrate has a high strength, and this discharge method will not cause damage to the ceramic substrate.

[0048] If it is applied to some products with lower strength, the inclination amplitude of the lifting frame 3 can be set to be smaller, so that the products can leave at a smaller initial velocity when discharging, thereby reducing the defective rate. Of course, too small an inclination angle may lead to incomplete discharging, because the products are generally relatively scattered when placed in the lifting frame 3, and some products far away or located at the edge have a certain friction with the inner cavity of the lifting frame 3. Therefore, the angle should not be too small. In order to ensure better discharging, the inner cavity of the lifting frame 3, especially the bottom surface, can be smoother.

[0049] Embodiment 3:

[0050] Based on Example 2, refer to Figures 4 to 12As shown, in this embodiment, a blocking structure 4 is also provided on the inner wall of the inner cavity of the ultrasonic tank 5 at a position above the water level. When the lifting frame 3 passes through the blocking structure 4 located below, it rotates and tilts. When leaving the blocking structure 4 located below, the lifting frame 3 acts on the bottom of the blocking structure 4 located above before returning to a horizontal state, so that the lifting frame 3 stops suddenly. At this time, the corresponding sealing plate 6 has not completely left the liquid surface, so that the bottom parts of the two ends of the lifting frame 3 are closed and the bottom surface of the lifting frame 3 leaves the liquid surface. Part of the ceramic substrate moves with the inclination of the lifting frame 3, and is finally blocked by the sealing plate 6 and cannot be discharged. When the lifting frame 3 stops suddenly, the water accumulated inside it flows out or is thrown out from the through hole 11 on the surface of the lifting frame 3 due to inertia; as the lifting frame 3 continues to rise, the lifting frame 3 causes the blocking structure 4 located above to elastically deform, and the lifting frame 3 rotates and tilts for the second time. The sealing plate 6 no longer closes the bottom of the lifting frame 3, and the ceramic substrate located in the lifting frame 3 tilts and falls. As the lifting frame 3 continues to rise, it finally leaves the blocking structure 4 located above and returns to a horizontal state.

[0051] There are two blocking structures 4, wherein the purpose of the upper blocking structure 4 is to discharge the material, and the function of the lower blocking structure 4 is to remove water and impurities on the ceramic substrate to prevent the subsequent processes from being affected.

[0052] Since the ceramic substrate is relatively strong, generally, during such an emergency stop, the vibration of the ceramic substrate in the inner cavity of the lifting frame 3 will not cause damage to the ceramic substrate itself.

[0053] Since the ultrasonic softening process will inevitably reduce the solution in the ultrasonic tank 5, in order to achieve a better softening effect, a loading and unloading device for automatically adding solution can be set in the ultrasonic tank 5 to ensure that the solution in the ultrasonic tank 5 is always within the set range.

[0054] A preferred embodiment of the blocking structure 4 is proposed below:

[0055] The blocking structure 4 includes a pair of action parts 10 that interact with the lifting frame 3, and the pair of action parts 10 correspond to the two ends of the same side of the lifting frame 3; the projection of the sealing plate 6 in the horizontal direction is located between the projections of the pair of action parts 10 in the horizontal direction, referring to Fig.14 , the distance between the pair of action parts 10 is smaller than the width of the lifting frame 3, and the width of the sealing plate 6 is smaller than the width of the lifting frame 3. The sealing plate 6 can only slide up and down at the end of the lifting frame 3. When moving up, it seals the left and right ends of the lifting frame 3 to prevent the ceramic substrate from falling, and when moving down, it opens the left and right ends of the lifting frame 3. At this time, when the lifting frame 3 is tilted, the ceramic substrate can fall. The above-mentioned upward and downward movement not only represents the movement state of the sealing plate 6, but also represents the state when it moves up or down to the extreme position.

[0056] The blocking structure 4 may be as follows Figure 1As shown, a plate is suspended to install the blocking structure 4, and a gap is formed between the lifting frame 3 and the plate in the horizontal direction. Below the plate is a material unloading area 9, and a material guide plate 14 is arranged in this area. The material guide plate 14 corresponds to the lowest end of the lifting frame 3 when it is tilted, which can ensure the stable unloading of the ceramic substrate during unloading. Of course, this is an implementable solution, which is not the focus of this embodiment and will not be further elaborated.

[0057] The action part 10 is provided with an elastic member in a horizontal direction and facing the outside of the ultrasonic tank 5. When the lifting frame 3 rises or falls, it acts on the action part 10, so that the action part 10 moves horizontally or flips toward the outside of the ultrasonic tank 5, and the elastic member is compressed until the lifting frame 3 leaves the action part 10, and the elastic member is reset and the action part 10 is reset. Since the side opening of the lifting plate needs to be blanked, when considering the action of the lifting frame 3 and the blocking structure 4, it is necessary to consider whether the blocking structure 4 will block the side opening of the lifting frame 3. The actual side opening of the lifting frame 3 is affected by the sealing plate 6. Therefore, after comprehensive consideration, the action part 10 is set at both ends of the same side of the lifting frame 3. At the same time, it is obvious that the action part 10 should act on the side of the bottom end of the lifting frame 3 that is tilted downward. The distance between the action parts 10 is less than the width of the lifting frame 3. The distance between the action parts 10 refers to the distance between the two surfaces of the two action parts 10 that are close to each other. If this distance is equal to or greater than the width of the lifting frame 3, the lifting frame 3 will not interact with the action part 10 when it rises or falls. The projection of the sealing plate 6 in the horizontal direction is located between the projections of a pair of acting parts 10 in the horizontal direction. When the lifting frame 3 descends and ascends, the sealing plate 6 will not interact with the acting parts 10, thereby preventing the acting parts 10 and the sealing plate 6 from influencing each other.

[0058] Regarding the cooperation between the action portion 10 and the elastic member, this embodiment proposes the following two specific solutions that can be adopted.

[0059] (1) The top of the action part 10 is provided with an inclined surface, the bottom surface of the action part 10 is a plane, and the elastic member is a spring horizontally arranged outside the action part 10. When the lifting frame 3 acts on the inclined surface of the top surface of the action part 10 from above, the action part 10 directly moves outward to avoid it, and the lifting frame 3 continues to move downward until it passes the action part 10; when the lifting frame 3 acts on the plane at the bottom of the action part 10 from below, the action part 10 is initially subjected to a force vertically upward and does not move, and the lifting frame 3 begins to rotate and tilt. During the tilting process, the force acting on the action part 10 is perpendicular to the lifting frame 3 toward the outside. At this time, the action part 10 will move slightly toward the outside. Compared with when the lifting frame 3 acts on the action part 10 from above, the action part 10 moves less from below. When the action part 10 moves, the corresponding spring will be compressed. After the lifting frame 3 passes, the spring will reset and the action part 10 will reset.

[0060] (2) A spring is provided at the bottom of the action part 10, and the action part 10 is fixedly mounted on the top of the spring. When the lifting frame 3 acts on the action part 10 from above, the action part 10 moves downward under the pressure, and because the force acting on the action part 10 is not completely vertically downward, the action part 10 also turns over to a certain extent when moving downward. This turning over and downward movement both cause the spring to deform in the corresponding direction, and it can be reset after the lifting frame 3 passes. The corresponding lifting frame 3 acts on the bottom of the action part 10 from below, and the action part 10 moves upward with a certain degree of turning over, and it can also be restored after the lifting frame 3 passes.

[0061] You can refer to Figure 4 , Figure 4 There are two lifting racks 3 shown in the figure. In fact, the two lifting racks 3 will not affect each other. It is only necessary to ensure a sufficient distance between them. Therefore, the lifting rack located at the top is ignored in the description of this embodiment. The lifting rack 3 located at the bottom is now below the liquid level of the ultrasonic tank. At this time, assuming that the ultrasonic treatment of the ceramic substrate inside is completed, the lifting rack 3 can start to rise. The rise will first reach Figure 8 In the state shown in the figure, the top right side of the lifting frame 3 will be against the action part 10. At this time, it is obvious that the action part 10 cannot move, and the mounting part 2 will actually continue to rise. Therefore, the lifting frame 3 needs to start to rotate clockwise and continue to rise while rotating. In this process, the action part 10 begins to receive a supporting force perpendicular to the top surface of the lifting frame 3. The horizontal component of this supporting force will cause the action part 10 to move to the right. At the same time, the lifting frame 3 will continue to rise and rotate until the lifting frame 3 rises to the position shown in the figure. Fig. 9 Then Fig.10 state, at this time Fig.10 The lifting frame 3 in this state can pass through the action part 10. However, it can be seen that the sealing plate 6 on the right side has not left the liquid surface. Therefore, the sealing plate 6 on the right side will still seal or partially seal the end of the right side of the lifting frame 3. Therefore, even if the lifting frame 3 is tilted now, the ceramic substrate inside will not be unloaded (because the sealing plate 6 has not completely left the liquid surface at this time, it is obvious that the length of the sealing plate 6 is much greater than the height of the lifting frame 3). Then the lifting frame 3 rises and passes through the action part 10 at the bottom. At this time, Fig.11As shown, it starts to return to the center, but in the process of returning to the center, it will hit the blocking structure above and cause an emergency stop, so that the liquid on the ceramic substrate can be thrown out due to inertia (of course, it is impossible to ensure complete throwing out). At this time, the sealing plate 6 is acted upon by gravity to open the right end of the lifting frame 3, but at this time, due to the partial return of the lifting frame 3, the inclination angle is small, so the ceramic substrate will not fall out; as the lifting frame 3 continues to rise in this state, the lifting frame 3 will begin to act on the blocking structure 4 located above, and the inclination angle of the lifting frame 3 will increase at this time, so that the internal ceramic substrate can fall out, and when falling out, it starts to move along the inclination direction of the lifting frame 3. At this time, you can refer to Fig.12 , you can cut in the blanking area 9 (see blanking area 9 Figure 2 A guide plate 14 is provided at the top right side of the ultrasonic tank in the figure, and the ceramic substrate will fall onto the guide plate 14 and be finally collected.

[0062] Of course, the tilting direction of the lifting frame 3 described in this embodiment is downward to the right side, and it is actually possible to mirror it so that the tilting direction is downward to the left side.

[0063] Embodiment 4:

[0064] Reference Figure 2 , Figure 3 and Figure 4 The rotating mounting member 7 includes a rotating shaft for rotating the lifting frame 3 and an elastic structure for keeping it horizontal in the initial state. The rotating shaft is arranged in the middle or end of the lifting frame 3. When the lifting frame 3 rises and acts on the blocking structure 4, the lifting frame 3 rotates around the rotating shaft, and the elastic structure is compressed to store energy. When leaving the blocking structure 4, the elastic structure releases energy to reset the lifting frame 3. The locking part corresponds to the rotating shaft. When the rotating shaft reaches the horizontal position, the rotating shaft and the locking part abut against each other to prevent the rotating shaft from rotating counterclockwise. The function of the elastic structure is to keep the lifting frame 3 in a horizontal state and reset it. The function of the locking part is to ensure that the lifting frame 3 and the rotating shaft can only rotate and tilt in the clockwise direction.

[0065] This embodiment provides two preferred installation solutions for the lifting frame 3 .

[0066] The first one, refer to Figures 3 to 12The rotating shaft is arranged in the middle of the lifting frame 3, and the driving part 15 includes a mounting part 2 for being installed in cooperation with the lifting frame 3. The rotating shaft is installed on the mounting part 2, and stabilizing bars 13 are fixedly arranged on both sides of the rotating shaft. On the mounting part 2, an arc track 12 for limiting the rotation of the two stabilizing bars 13 is arranged on a circumference with the position of the rotating shaft as the center and the distance between the rotating shaft and the stabilizing bar 13 as the radius. The stabilizing bar 13 and the stabilizing frame are fixedly connected, and the bottom of the arc track 12 on the left and the top of the arc track 12 on the right form a clamping part. In the initial state, the stabilizing bar 13 on the left is located at the bottom of the arc track 12 on the left, and the stabilizing bar 13 on the right is located at the top of the arc track 12 on the right to form a clamping position.

[0067] Corresponding to this installation scheme, the elastic structure is configured as two groups of retaining springs 8, and the two groups of retaining springs 8 are respectively arranged between the first stabilizer bar 13 and the rotating shaft and between the second stabilizer bar 13 and the rotating shaft. The positions where the two groups of retaining springs 8 are connected on the rotating shaft are staggered in sequence and the deformation directions of the two groups of retaining springs 8 are opposite; when the lifting frame 3 and the blocking structure 4 act, the two stabilizer bars 13 rotate clockwise at the same time, so that the two groups of retaining springs 8 are deformed at the same time and to the same extent. When the lifting frame 3 leaves the blocking structure 4, the two groups of retaining springs 8 are reset to restore the lifting frame 3 to a horizontal state. The retaining springs 8 can also be replaced by other suitable elastic parts. In this scheme, the function of the two stabilizer bars 13 is to ensure, together with the rotating shaft, that the lifting frame 3 has sufficient support in both the horizontal state and the inclined state, thereby ensuring stability. For details, please refer to Figure 7 as well as Figures 8 to 10 The specific movement of the middle stabilizer bar 13 in the circular arc track 12 is that when the lifting frame 3 rises and contacts the action part 10, the left stabilizer bar 13 rotates upward and the right stabilizer bar 13 moves downward, thereby generating a state of tilting to the right. The arc length of the circular arc track 12 can also be set at a specific value. When the stabilizer bar 13 moves to the limit distance of this value, the lifting frame 3 can just pass the action part 10 after tilting, so this value can be specifically measured in actual use.

[0068] Circlip 8 Figure 7 As shown, it is a special-shaped retaining spring, and its working principle is the same as that of an ordinary retaining spring, but it needs to be suitable for the specific installation between the rotating shaft and the stabilizer bar 13 in this embodiment. The direction in which the reset is required in this embodiment is obvious, so it can be fully realized by using a retaining spring or a torsion spring, or even by simply using a corresponding tension spring. This embodiment is just a schematic illustration, not an additional restriction.

[0069] The rotating shaft is Figure 7 As shown, two rectangular plates can be arranged outside thereof for clamping the lifting frame 3, and bolts can be arranged to fix the lifting frame 3 on the rotating shaft.

[0070] The second type is that the rotating shaft is arranged at the left end of the lifting frame 3, the driving part 15 includes a mounting part 2 for cooperating with the lifting frame 3, the rotating shaft is installed on the mounting part 2, a stabilizing bar 13 is arranged on the right side of the rotating shaft, and an arc track 12 for limiting the rotation of the stabilizing bar 13 is arranged on the mounting part 2 on a circle with the position of the rotating shaft as the center and the distance between the rotating shaft and the stabilizing bar 13 as the radius, and the top of the arc track 12 forms a locking part, and in the initial state, the right end of the stabilizing bar 13 is located at the bottom of the arc track 12 to form a locking position.

[0071] Corresponding to this installation scheme, the elastic structure is set as a tension spring, which is horizontally placed below the rotating shaft and the lifting frame 3. In the initial state, the tension spring remains horizontal so that the lifting frame 3 and the rotating shaft remain horizontal. When the rotating shaft and the lifting frame 3 rotate clockwise, the tension spring elastically deforms. When the lifting frame 3 leaves the blocking structure 4, the tension spring resets to restore the lifting frame 3 to a horizontal state. In fact, the principles of the first and second specific setting schemes of the rotating shaft are similar, but the specific setting methods are different. However, there are certain differences between the two in actual use. In the first solution, the actual rotation radius of the lifting frame 3 is almost half of the length of the lifting frame 3, while in the second solution, the actual rotation radius of the lifting frame 3 is almost the length of the entire lifting frame 3. Therefore, when the two act and tilt with the action part 10, under the condition of controlling variables, the inclination angles of the two are not the same, but they should both be acute angles. Obviously, within this range, the final inclination angle of the first one is larger under the same circumstances, and the final inclination angle of the second one is relatively small. The specific values ​​of the two can be obtained according to the arccosine function. In actual use, it is sufficient to know which of the two inclination angles is larger. The specific value is not a necessary parameter, so this embodiment does not give a specific calculation formula in detail. When the product strength is good, the first solution with a larger inclination angle can be used, which is helpful for subsequent automatic unloading; when the product strength is average, it is preferred to use the first solution with a smaller inclination angle, which can reduce the initial velocity of the product when unloading, thereby reducing the velocity after unloading.

[0072] The accompanying drawings only show a schematic diagram of the rotating shaft being arranged in the middle of the lifting frame 3. In fact, when the rotating shaft is arranged at the left end of the lifting frame 3, the principle is the same, so the corresponding drawings are no longer provided.

[0073] The above describes the basic principles, main features and advantages of the present application. Those skilled in the art should understand that the present application is not limited by the above embodiments, and the above embodiments and the specification only describe the principles of the present application. The present application may have various changes and improvements without departing from the spirit and scope of the present application, and these changes and improvements fall within the scope of the present application for which protection is sought. The scope of protection claimed by the present application is defined by the attached claims and their equivalents.

Claims

1. An ultrasonic film removal device for ceramic substrates, characterized in that: The invention comprises an ultrasonic tank and a lifting frame, wherein a driving part is arranged on the outer side of the lifting frame, and a rotating mounting part is arranged on the lifting frame, wherein the rotating mounting part enables the lifting frame to be rotatably mounted and to be kept horizontal in an initial state; a blocking structure is arranged in the ascending path of the lifting frame, and a blocking part is arranged on the lifting frame at a position corresponding to the horizontal direction, wherein the blocking part prevents the lifting frame from rotating counterclockwise in a horizontal state; The lifting frame starts to rise from below the liquid surface of the ultrasonic tank, and acts on the blocking structure to elastically deform the blocking structure when it is above the set height of the top surface of the ultrasonic tank. During this period, the lifting frame rotates and tilts until the lifting frame leaves the blocking structure, and then the lifting frame returns to a horizontal state and the blocking structure is reset. The lifting frame descends after loading from the top, and elastically deforms the blocking structure when it contacts the blocking structure. The lifting frame maintains a horizontal state and passes through the blocking structure, and finally reaches below the liquid surface of the ultrasonic tank for ultrasonic treatment. The lifting frame is a square tube with through holes on four sides, and sealing plates are provided at both ends of the lifting frame for sliding up and down; The inner wall of the ultrasonic tank cavity is also provided with the blocking structure at a position above the water level; The blocking structure includes a pair of acting parts interacting with the lifting frame, and the pair of acting parts respectively correspond to two ends of the same side of the lifting frame; the projection of the sealing plate in the horizontal direction is located between the projections of the pair of acting parts in the horizontal direction, the distance between the pair of acting parts is smaller than the width of the lifting frame, and the width of the sealing plate is smaller than the width of the lifting frame; The action portion is provided with an elastic member in a horizontal direction and facing the outside of the ultrasonic tank. When the lifting frame rises or descends, it acts on the action portion, causing the action portion to translate or flip toward the outside of the ultrasonic tank, and compressing the elastic member at the same time, until the lifting frame leaves the action portion, and the elastic member is restored and the action portion is restored.

2. The ultrasonic film removal device for ceramic substrates according to claim 1, characterized in that: The sealing plate can float in the solution in the ultrasonic tank. When the lifting frame descends to below the solution in the ultrasonic tank, the sealing plate rises due to the buoyancy and closes the two ends of the lifting frame. When the lifting frame rises and leaves the solution, it falls due to the gravity and opens the two ends of the lifting frame.

3. The ultrasonic film removal device for ceramic substrates according to claim 2, characterized in that: When the lifting frame passes through the blocking structure located below, it rotates and tilts. When leaving the blocking structure located below, the lifting frame acts on the bottom of the blocking structure located above before returning to a horizontal state, so that the lifting frame stops suddenly. At this time, the corresponding sealing plate has not completely left the liquid surface, so that the bottom parts of the two ends of the lifting frame are closed and the bottom surface of the lifting frame leaves the liquid surface. Part of the ceramic substrate moves with the inclination of the lifting frame and is finally blocked by the sealing plate and cannot be discharged. When the lifting frame stops suddenly, the water accumulated inside it flows out or is thrown out from the through holes on the surface of the lifting frame due to inertia. As the lifting frame continues to rise, the lifting frame elastically deforms the blocking structure located above, and the lifting frame rotates and tilts for the second time. The sealing plate no longer closes the bottom of the lifting frame, and the ceramic substrate in the lifting frame tilts and falls. As the lifting frame continues to rise, it finally leaves the blocking structure located above and returns to a horizontal state.

4. The ultrasonic film removal device for ceramic substrates according to claim 3, characterized in that: The rotating mounting member comprises a rotating shaft for rotating the lifting frame and an elastic structure for keeping the lifting frame horizontal in an initial state, wherein the rotating shaft is arranged at the middle part or the left end part of the lifting frame; when the lifting frame rises to act on the blocking structure, the lifting frame rotates around the rotating shaft, and at the same time, the elastic structure is compressed to store energy, and when leaving the blocking structure, the elastic structure releases energy to reset the lifting frame, and the locking portion corresponds to the rotating shaft, and when the rotating shaft reaches a horizontal position, the rotating shaft and the locking portion abut against each other to prevent the rotating shaft from rotating counterclockwise.

5. The ultrasonic film removal device for ceramic substrates according to claim 4, characterized in that: The rotating shaft is arranged in the middle part of the lifting frame, the driving part includes a mounting part for cooperating with the lifting frame, the rotating shaft is installed on the mounting part, and stabilizing bars are fixedly arranged on both sides of the rotating shaft. On the mounting part, an arc track for limiting the rotation of the two stabilizing bars is arranged on a circumference with the position of the rotating shaft as the center and the distance between the rotating shaft and the stabilizing bar as the radius. The stabilizing bar and the stabilizing frame are fixedly connected, and the bottom of the arc track on the left and the top of the arc track on the right form the locking part. In an initial state, the stabilizing bar on the left is located at the bottom of the arc track on the left, and the stabilizing bar on the right is located at the top of the arc track on the right to form a locking position.

6. The ultrasonic film removal device for ceramic substrates according to claim 4, characterized in that: The rotating shaft is arranged at the left end portion of the lifting frame, the driving portion includes a mounting portion for cooperating with the lifting frame for mounting, the rotating shaft is mounted on the mounting portion, a stabilizing bar is arranged on the right side of the rotating shaft, and an arc track for limiting the rotation of the stabilizing bar is arranged on the mounting portion on a circle with the position of the rotating shaft as the center and the distance between the rotating shaft and the stabilizing bar as the radius, the top of the arc track forms the locking portion, and in an initial state, the right end of the stabilizing bar is located at the bottom of the arc track to form a locking position.

7. The ultrasonic film removal device for ceramic substrates according to claim 5, characterized in that: The elastic structure is configured as two groups of retaining springs, which are respectively arranged between the first stabilizing rod and the rotating shaft and between the second stabilizing rod and the rotating shaft. The positions where the two groups of retaining springs are connected on the rotating shaft are staggered in sequence and the deformation directions of the two groups of retaining springs are opposite. When the lifting frame and the blocking structure act, the two stabilizing rods rotate clockwise at the same time to make the two groups of retaining springs deform at the same time and to the same extent. When the lifting frame leaves the blocking structure, the two groups of retaining springs are reset to restore the lifting frame to a horizontal state.

8. The ultrasonic film removal device for ceramic substrates according to claim 6, characterized in that: The elastic structure is configured as a tension spring, and the tension spring is horizontally placed below the rotating shaft and the lifting frame. In an initial state, the tension spring remains horizontal so that the lifting frame and the rotating shaft remain in a horizontal state. When the rotating shaft and the lifting frame rotate clockwise, the tension spring elastically deforms. When the lifting frame leaves the blocking structure, the tension spring resets so that the lifting frame returns to a horizontal state.

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