Fragmented battery, manufacturing method thereof and photovoltaic module
By setting gate lines and barrier lines on the battery substrate and controlling the cutting surface position during cutting and stacking, the damage and winding problems of the sharded batteries after laser cutting are solved, and the electrical performance and stability of the photovoltaic module are improved.
Patent Information
- Application Number
- CN202411338393.7
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2024-09-24
- Publication Date
- 2024-12-31
AI Technical Summary
In photovoltaic modules, the cutting surface of the sharded battery after laser cutting is prone to damage and interface defects, resulting in the carrier composite center, which in turn affects the electrical performance and stability. At the same time, the winding problem is prone to occur during the passivation process.
The first and second gate lines and the first and second barrier lines are formed on the battery substrate, and arranged on both sides of the cutting line. By cutting and stacking the battery substrate, the cutting surfaces of the initial sharded battery are all located in the same direction. On the other hand, the reactive gas of the passivation film is blocked by a barrier line to prevent it from penetrated into the gap, thereby preventing winding and plating, and ensuring that the gate line is not exposed to the passivation process.
It effectively reduces the electrical composite and leakage of chip batteries, improves the electrical performance and stability of photovoltaic modules, avoids winding and plating problems, and ensures the performance and reliability of chip batteries.
Smart Images
Figure CN119230625A_ABST
Abstract
Description
Technical Field
[0001] The embodiments of the present application relate to the field of photovoltaic technology, and in particular to a sliced battery and a manufacturing method thereof, and a photovoltaic module. Background Art
[0002] With the popularization of split cell modules, shingling technology, paralleling and splicing technology, the use of laser to cut whole cells has gradually become the mainstream trend in the industry. However, it is found in practice that laser cutting will cause laser damage and interface defects, which become effective recombination centers for carriers.
[0003] To solve this problem, after laser cutting the entire battery, passivation treatment can be used to repair the cut surface of the segmented battery. This can reduce electrical recombination and leakage of the segmented battery, thereby improving the electrical performance, stability and reliability of photovoltaic modules and systems.
[0004] However, in the process of passivating the cut surface of the sliced battery, a plating problem may occur on the surface of the sliced battery, that is, a passivation film is formed on the non-passivated surface of the sliced battery. Summary of the invention
[0005] The embodiments of the present application provide a slice battery and a manufacturing method thereof, as well as a photovoltaic module, which are helpful in avoiding the problem of wrap-around plating on the surface of the slice battery.
[0006] According to some embodiments of the present application, on the one hand, the embodiments of the present application provide a method for manufacturing a slice battery, including: providing a battery substrate, the battery substrate having a first surface and a second surface arranged opposite to each other, and the battery substrate having a cutting line; forming a first grid line and a first blocking line on the first surface, the first blocking line being located on two opposite sides of the cutting line and adjacent to the cutting line, and the first grid line being located on a side of the first blocking line away from the cutting line; forming a second grid line and a second blocking line on the second surface, the second blocking line being located on two opposite sides of the cutting line and adjacent to the cutting line, and the second grid line being located on a side of the second blocking line away from the cutting line; cutting the battery substrate along the cutting line to form a plurality of initial slice batteries, the initial slice batteries having a cutting surface; stacking the plurality of initial slice batteries so that the first blocking line of an adjacent initial slice battery abuts against the second blocking line of another initial slice battery, and the cutting surfaces of the plurality of initial slice batteries are all located on the same side; passivating the cutting surfaces of the stacked initial slice batteries to form a plurality of slice batteries.
[0007] In some embodiments, stacking the initially sliced cells includes: abutting a surface of a first blocking line of an adjacent initially sliced cell away from the first surface against a surface of a second blocking line of another initially sliced cell away from the second surface.
[0008] In some embodiments, a surface of the first blocking line away from the first surface is a first inclined surface, a surface of the second blocking line away from the second surface is a second inclined surface, and the first inclined surface and the second inclined surface are parallel to each other.
[0009] In some embodiments, stacking the initially sliced cells includes: abutting at least one side surface of a first blocking line of an adjacent initially sliced cell against at least one side surface of a second blocking line of another initially sliced cell.
[0010] In some embodiments, the side of the first blocking line close to the cutting line is a third inclined surface, the side of the second blocking line away from the cutting line is a fourth inclined surface, and the third inclined surface and the fourth inclined surface are parallel to each other.
[0011] In some embodiments, on the same side of the cutting line, the number of first blocking lines is two, the number of second blocking lines is one, and the orthographic projections of the two first blocking lines on the first surface are located on both sides of the orthographic projection of the second blocking line on the first surface; stacking the initial sliced batteries includes: inserting the second blocking line of an adjacent initial sliced battery between the two first blocking lines of another initial sliced battery.
[0012] In some embodiments, the cut surfaces of the initial sliced batteries are passivated, including: covering the stacked initial sliced batteries with a protective film, wherein the protective film is located on other outer surfaces of the stacked initial sliced batteries except the cut surfaces; placing the stacked initial sliced batteries in a material box so that the cut surfaces of the initial sliced batteries are exposed outside the material box; and sending the material box into a passivation device to passivate the cut surfaces of the initial sliced batteries.
[0013] According to some embodiments of the present application, on the other hand, the embodiments of the present application further provide a slice battery, the slice battery comprising: a battery body, the battery body having a first surface and a second surface opposite to each other, and a cutting surface connecting the first surface and the second surface; a first gate line and a first blocking line, the first gate line and the first blocking line are located on the first surface, the first blocking line is adjacent to the cutting surface, and the first gate line is located on a side of the first blocking line away from the cutting surface; a second gate line and a second blocking line, the second gate line and the second blocking line are located on the second surface, the second blocking line is adjacent to the cutting surface, and the second gate line is located on a side of the second blocking line away from the cutting surface; a passivation film, the passivation film is located on the surface of the cutting surface.
[0014] In some embodiments, the battery body includes a substrate and a first passivation layer and a second passivation layer covering the surfaces of both sides of the substrate, the surface of the first passivation layer away from the substrate is the first side, and the surface of the second passivation layer away from the substrate is the second side; the first gate line is electrically connected to the substrate, the first blocking line is electrically insulated from the substrate, the second gate line is electrically connected to the substrate, and the second blocking line is electrically insulated from the substrate; or, the first gate line is electrically connected to the substrate, the first blocking line is electrically connected to the substrate; the second gate line is electrically connected to the substrate, and the second blocking line is electrically connected to the substrate.
[0015] According to some embodiments of the present application, another aspect of the embodiments of the present application further provides a photovoltaic module, including: a battery string, the battery including a plurality of battery cells, wherein at least one battery cell is a slice battery as in the above embodiments, the first grid line of the slice battery is connected to an adjacent battery cell through a connecting component, and the second grid line of the slice battery is connected to another adjacent battery cell through a connecting component; an adhesive film, the adhesive film covers the surface of the battery string; and a cover plate, the cover plate covers the surface of the adhesive film away from the battery string.
[0016] The technical solution provided by the embodiments of the present application has at least the following advantages:
[0017] The manufacturing method of the slice battery provided by the embodiment of the present application forms a first grid line and a first blocking line on the first surface of the battery substrate, and forms a second grid line and a second blocking line on the second surface of the battery substrate, wherein the first grid line is used to collect the carriers generated on the first surface of the battery substrate, and the second grid line is used to collect the carriers generated on the second surface of the battery substrate. The first blocking line and the second blocking line are both arranged adjacent to the cutting line, and after the battery substrate is cut, the first blocking line and the second blocking line are adjacent to the cutting surface. In the process of stacking the initial slice batteries, the cutting surfaces of the multiple initial slice batteries are all located on the same side, and the first blocking line of an adjacent initial slice battery abuts against the second blocking line of another initial slice battery, so that in the subsequent passivation process, the reaction gas forming the passivation film is blocked by the first blocking line and the second blocking line, and the reaction gas is not easy to penetrate into the gap between the adjacent initial slice batteries, thereby avoiding the surface plating of the initial slice battery. And due to the blocking effect of the first blocking line and the second blocking line, the first grid line and the second grid line will not be exposed to the reaction gas of the passivation process, thereby avoiding the surface of the first grid line and the surface of the second grid line from being passivated. BRIEF DESCRIPTION OF THE DRAWINGS
[0018] One or more embodiments are exemplarily illustrated by the pictures in the corresponding drawings. These exemplified descriptions do not constitute a limitation on the embodiments. Unless otherwise specified, the pictures in the drawings do not constitute a scale limitation. In order to more clearly illustrate the embodiments of the present application or the technical solutions in the traditional technology, the drawings required for use in the embodiments are briefly introduced below. Obviously, the drawings described below are only some embodiments of the present application. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.
[0019] Figure 1 A flowchart corresponding to the method for manufacturing a split battery provided in an embodiment of the present application;
[0020] Figures 2 to 10 A schematic diagram of the structures corresponding to each step of the method for manufacturing a split battery provided in an embodiment of the present application;
[0021] Figures 11 to 13 A schematic diagram of the structures of various slice batteries provided in the embodiments of the present application. DETAILED DESCRIPTION
[0022] As known from the background art, in the process of passivating the cut surface of the sliced battery, the surface of the sliced battery may have a plating problem, that is, a passivation film is formed on the non-passivated surface of the sliced battery.
[0023] Since grid lines are provided on both the front and back sides of the battery cell, after the battery cell is cut to form multiple slice cells, there will be gaps between adjacent slice cells during the stacking process of the slice cells. This will cause the reaction gas to penetrate into the adjacent slice cells along the gaps between the adjacent slice cells, thereby causing wrap-around plating on the surface of the slice cells.
[0024] The present application provides a sliced cell and a method for manufacturing the same, as well as a photovoltaic module, which are helpful in avoiding the problem of circumferential plating on the surface of the sliced cell.
[0025] In the description of the embodiments of the present application, the technical terms "first", "second", etc. are only used to distinguish different objects, and cannot be understood as indicating or implying relative importance or implicitly indicating the number, specific order or primary and secondary relationship of the indicated technical features. In the description of the embodiments of the present application, the meaning of "multiple" is more than two, unless otherwise clearly and specifically defined.
[0026] Reference to "embodiments" herein means that a particular feature, structure, or characteristic described in conjunction with the embodiments may be included in at least one embodiment of the present application. The appearance of the phrase in various locations in the specification does not necessarily refer to the same embodiment, nor is it an independent or alternative embodiment that is mutually exclusive with other embodiments. It is explicitly and implicitly understood by those skilled in the art that the embodiments described herein may be combined with other embodiments.
[0027] In the description of the embodiments of the present application, the term "and / or" is only a description of the association relationship of associated objects, indicating that three relationships may exist. For example, A and / or B can represent: A exists, A and B exist at the same time, and B exists. In addition, the character " / " in this article generally indicates that the associated objects before and after are in an "or" relationship.
[0028] In the description of the embodiments of the present application, the term "multiple" refers to more than two (including two). Similarly, "multiple groups" refers to more than two groups (including two groups), and "multiple pieces" refers to more than two pieces (including two pieces).
[0029] In the description of the embodiments of the present application, technical terms such as "center", "longitudinal", "lateral", "length", "width", "thickness", "up", "down", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inside", "outside", "clockwise", "counterclockwise", "axial", "radial", "circumferential", etc., indicating orientations or positional relationships, are based on the orientations or positional relationships shown in the accompanying drawings and are only for the convenience of describing the embodiments of the present application and simplifying the description, and do not indicate or imply that the referred device or element must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the embodiments of the present application.
[0030] In the description of the embodiments of the present application, unless otherwise clearly specified and limited, technical terms such as "installed", "connected", "connected", "fixed" and the like should be understood in a broad sense. For example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium, and it can be the internal connection of two elements or the interaction relationship between two elements. For those of ordinary skill in the art, the specific meanings of the above terms in the embodiments of the present application can be understood according to the specific circumstances.
[0031] In the accompanying drawings corresponding to the embodiments of the present application, the thickness and area of the layer are magnified for better understanding and ease of description. When describing a component (such as a layer, film, region or substrate) on another component or on the surface of another component, the component may be "directly" located on the surface of the other component, or there may be a third component between the two components. On the contrary, when describing a component on the surface of another component or when another component is formed or provided on the surface of a component, it means that there is no third component between the two components. In addition, when describing a component as "substantially" formed on another component, it means that the component is not formed on the entire surface of the other component, nor is it formed on a partial edge of the entire surface.
[0032] In the description of the embodiments of the present application, when a certain component “includes” another component, unless otherwise stated, other components are not excluded and other components may be further included.
[0033] The terms used in the description of the various embodiments described herein are only used to describe specific embodiments and are not intended to be limiting. As used in the description of the various embodiments described and in the appended claims, "component" is also intended to include the plural form unless the context clearly indicates otherwise. Among them, components include components such as layers, films, regions, or plates.
[0034] The following will describe the various embodiments of the present application in detail with reference to the accompanying drawings. However, it will be appreciated by those skilled in the art that in the various embodiments of the present application, many technical details are provided in order to enable the reader to better understand the present application. However, even without these technical details and various changes and modifications based on the following embodiments, the technical solution claimed in the present application can be implemented.
[0035] Figure 1 A flowchart corresponding to the method for manufacturing a split battery provided in an embodiment of the present application; Figures 2 to 10 The schematic diagram of the structure corresponding to each step of the manufacturing method of the sliced battery provided in the embodiment of the present application. Figure 2 A top view of a battery substrate; Figure 3 for Figure 2 Schematic diagram of the cross-sectional structure along the AA1 direction; Figure 4 A schematic structural diagram corresponding to the step of forming a first gate line and a first blocking line on a first surface provided in an embodiment of the present application; Figure 5 A schematic structural diagram corresponding to the step of forming a second gate line and a second blocking line on the second surface provided in an embodiment of the present application; Figure 6 A schematic structural diagram corresponding to the step of cutting a battery substrate along a cutting line provided in an embodiment of the present application; Figures 7 to 10 Various structural schematic diagrams corresponding to the steps of stacking initial battery cells provided in the embodiments of the present application.
[0036] refer to Figure 1 The method for manufacturing a sliced battery provided in an embodiment of the present application includes:
[0037] Step 11: Reference Figure 2 and Figure 3 , providing a battery substrate 100, wherein the battery substrate 100 has a first surface 101 and a second surface 102 which are arranged opposite to each other, and the battery substrate 100 has a cutting line 103;
[0038] Step 12: Reference Figure 4 , forming a first gate line 112 and a first blocking line 111 on the first surface 101, wherein the first blocking line 111 is located at opposite sides of the cutting line 103 and is adjacent to the cutting line 103, and the first gate line 112 is located at a side of the first blocking line 111 away from the cutting line 103;
[0039] Step 13: Reference Figure 5 , forming a second gate line 122 and a second blocking line 121 on the second surface 102, wherein the second blocking line 121 is located at opposite sides of the cutting line 103 and is adjacent to the cutting line 103, and the second gate line 122 is located at a side of the second blocking line 121 away from the cutting line 103;
[0040] Step 14: Reference Figure 6, cutting the battery substrate 100 along the cutting line 103 to form a plurality of initial sliced batteries 130 , wherein the initial sliced batteries 130 have a cutting surface 131 ;
[0041] Step 15: Reference Figure 7 , stacking a plurality of initially split cells 130 so that the first blocking line 111 of an adjacent initially split cell 130 abuts against the second blocking line 121 of another initially split cell 130, and the cut surfaces 131 of the plurality of initially split cells 130 are all located on the same side;
[0042] Step 16: Passivation treatment is performed on the cut surfaces 131 of the stacked initial split cells 130 to form a plurality of split cells.
[0043] In the manufacturing method of the split battery provided in the embodiment of the present application, a first grid line 112 and a first blocking line 111 are formed on the first surface 101 of the battery substrate 100, and a second grid line 122 and a second blocking line 121 are formed on the second surface 102 of the battery substrate 100. The first grid line 112 is used to collect carriers generated on the first surface 101 of the battery substrate 100, and the second grid line 122 is used to collect carriers generated on the second surface 102 of the battery substrate 100. The first blocking line 111 and the second blocking line 121 are both arranged adjacent to the cutting line 103. After the battery substrate 100 is cut, the first blocking line 111 and the second blocking line 121 are adjacent to the cutting surface 131. In the process of stacking the initial slice cells 130, the cut surfaces 131 of the multiple initial slice cells 130 are all located on the same side, and the first blocking line 111 of an adjacent initial slice cell 130 abuts against the second blocking line 121 of another initial slice cell 130, so that in the subsequent passivation process, the reaction gas forming the passivation film is blocked by the first blocking line 111 and the second blocking line 121, and the reaction gas is not easy to penetrate into the gap between the adjacent initial slice cells 130, thereby avoiding the surface plating of the initial slice cells 130. And due to the blocking effect of the first blocking line 111 and the second blocking line 121, the first grid line 112 and the second grid line 122 will not be exposed to the reaction gas of the passivation process, thereby avoiding the surface of the first grid line 112 and the surface of the second grid line 122 from being passivated.
[0044] In some embodiments, the cell substrate 100 can be any one of a PERC cell (Passivated Emitter and Rear Cell), a PERT cell (Passivated Emitter and Rear Totally-diffused cell), a TOPCon cell (Tunnel Oxide Passivated Contact) or a HIT / HJT cell (Heterojunction Technology).
[0045] In some embodiments, the cell substrate 100 can be a monocrystalline silicon solar cell, a polycrystalline silicon solar cell, an amorphous silicon solar cell or a multi-compound solar cell. The multi-compound solar cell can specifically be a cadmium sulfide solar cell, a gallium arsenide solar cell, a copper indium selenide solar cell or a perovskite solar cell.
[0046] In step 11, refer to Figure 2 and Figure 3 , taking the case where there is only one cutting line 103 on the battery substrate 100 as an example, it does not constitute a limitation on the number of cutting lines 103. That is, the split battery can be a half-battery.
[0047] In other embodiments, the number of cutting lines on a battery substrate may be 2, 3 or 6, etc. The number of cutting lines 103 may be adjusted according to the size of the actual battery substrate 100 and the number of corresponding sliced batteries required.
[0048] In some embodiments, the first surface 101 may be one of the front side and the back side of the battery substrate 100 , and the second surface 102 may be the other of the front side and the back side of the battery substrate 100 .
[0049] In step 12, the material of the first blocking line 111 can be a conductive material, such as silver or aluminum. In this way, the first blocking line 111 can be used as a grid line of the split cell in the subsequent process.
[0050] In some embodiments, the material of the first barrier line 111 may be the same as that of the first gate line 112 . Thus, the first barrier line 111 and the first gate line 112 may be formed in the same process step.
[0051] In other embodiments, the material of the first blocking line 111 may be different from the material of the first gate line 112. For example, the material of the first blocking line 111 may be an insulating material, specifically polyimide. In this way, the first blocking line 111 may not be used as a gate line of the split cell in subsequent processes, and the first blocking line 111 is only used as a blocking structure during the passivation process.
[0052] When the material of the first blocking line 111 is different from that of the first gate line 112 , the first blocking line 111 and the first gate line 112 may be formed in different process steps. For example, the first gate line 112 is formed first and then the first blocking line 111 is formed.
[0053] It should be noted that the first blocking line 111 is a three-dimensional structure. The first blocking line 111 is smaller than the battery substrate 100 . The size and shape of the first blocking line 111 may be similar to the size and shape of the first gate line 112 .
[0054] In some embodiments, the extension direction of the first blocking line 111 is parallel to the cutting line 103 , and the first gate line 112 may be parallel to or non-parallel to the cutting line 103 .
[0055] In the extending direction perpendicular to the cutting line 103, the distance between the first blocking line 111 and the cutting line 103 is 25 μm to 75 μm, for example, 25 μm, 30 μm, 33 μm, 36 μm, 40 μm, 45 μm, 50 μm, 56 μm, 60 μm, 64 μm, 70 μm or 75 μm. In this way, the distance between the first blocking line 111 and the cutting line 103 is relatively close. In step 15, after the first blocking line 111 and the second blocking line 121 of the adjacent initial split cells 130 abut against each other, the area of the first surface 101 of the initial split cell 130 exposed on the side of the first blocking line 111 and the second blocking line 121 close to the cutting surface 131 is relatively small, and the area of the first surface 101 of the initial split cell 130 that produces the wrap-around plating is relatively small, which has little effect on the performance of the split cell.
[0056] In some embodiments, along the extending direction perpendicular to the cutting line 103, the distance between the first blocking line 111 and the cutting line 103 is smaller than the distance between the first blocking line 111 and the closest first gate line 112; and / or, the distance between the first blocking line 111 and the cutting line 103 is smaller than the distance between adjacent first gate lines 112. In this way, the first blocking line 111 is closer to the cutting line 103 and farther away from the first gate line 112. The first blocking line 111, as a blocking structure for the subsequent passivation treatment, can not only prevent the formation of an unnecessary passivation film on the first surface 101 of the initial sliced battery 130, but also prevent the surface of the first gate line 112 from being passivated.
[0057] In step 13, the material of the second blocking line 121 can be a conductive material, such as silver or aluminum. In this way, the second blocking line 121 can be used as a gate line of the split cell in the subsequent process.
[0058] In some embodiments, the material of the second blocking line 121 and the material of the second gate line 122 may be the same, and thus, the second blocking line 121 and the second gate line 122 may be formed in the same process step.
[0059] In other embodiments, the material of the second blocking line 121 may be different from the material of the second gate line 122. For example, the material of the second blocking line 121 may be an insulating material, specifically polyimide. In this way, the second blocking line 121 may not be used as a gate line of the split cell in subsequent processes, and the second blocking line 121 is only used as a blocking structure during the passivation process.
[0060] When the material of the second blocking line 121 is different from that of the second gate line 122 , the second blocking line 121 and the second gate line 122 may be formed in different process steps. For example, the second gate line 122 is formed first, and then the second blocking line 121 is formed.
[0061] It should be noted that the second blocking line 121 is a three-dimensional structure. The second blocking line 121 is smaller than the battery substrate 100 . The size and shape of the second blocking line 121 may be similar to the size and shape of the second gate line 122 .
[0062] In some embodiments, the extension direction of the second blocking line 121 is parallel to the cutting line 103 , and the second gate line 122 may be parallel to or non-parallel to the cutting line 103 .
[0063] In some embodiments, the material of the first blocking line 111 may be the same as that of the second blocking line 121. For example, the first blocking line 111 and the second blocking line 121 are both made of conductive materials, so that they can be used as gate lines of the split cells in subsequent processes.
[0064] In some embodiments, the material of the first blocking line 111 and the material of the second blocking line 121 may be different. For example, the material of the first blocking line 111 is a conductive material, and the material of the second blocking line 121 is an insulating material; or, the material of the first blocking line 111 is an insulating material, and the material of the second blocking line 121 is a conductive material. In this way, on the one hand, one of the first blocking line 111 or the second blocking line 121 can be used as a grid line of the slice battery to collect carriers on the slice battery; on the other hand, since the hardness of the insulating material is softer than that of the conductive material, during the abutment process between the first blocking line 111 and the second blocking line 121, the abutment stress between the first blocking line 111 and the second blocking line 121 is too large to cause the fragmentation problem of the slice battery.
[0065] In the extending direction perpendicular to the cutting line 103, the distance between the second blocking line 121 and the cutting line 103 is 25μm to 75μm, for example, 25μm, 30μm, 33μm, 36μm, 40μm, 45μm, 50μm, 56μm, 60μm, 64μm, 70μm or 75μm. In this way, the distance between the second blocking line 121 and the cutting line 103 is relatively close. In step 15, after the first blocking line 111 and the second blocking line 121 of the adjacent initial split cells 130 abut against each other, the area of the second surface 102 of the initial split cell 130 exposed on the side of the first blocking line 111 and the second blocking line 121 close to the cutting surface 131 is relatively small, and the area of the second surface 102 of the initial split cell 130 that produces the wrap-around plating is relatively small, which has little effect on the performance of the split cell.
[0066] In some embodiments, along the extending direction perpendicular to the cutting line 103, the distance between the second blocking line 121 and the cutting line 103 is smaller than the distance between the second blocking line 121 and the closest second gate line 122; and / or, the distance between the second blocking line 121 and the cutting line 103 is smaller than the distance between adjacent second gate lines 122. In this way, the second blocking line 121 is closer to the cutting line 103 and farther away from the second gate line 122. The second blocking line 121, as a blocking structure for the subsequent passivation treatment, can not only prevent the formation of an unnecessary passivation film layer on the second surface 102 of the initial sliced battery 130, but also prevent the surface of the second gate line 122 from being passivated.
[0067] In step 12, refer to Figure 4 , taking the case where the top surface of the first blocking line 111 is flush with the top surface of the first gate line 112 after the first blocking line 111 and the first gate line 112 are formed, that is, the height of the first blocking line 111 relative to the first surface 101 is equal to the height of the first gate line 112 relative to the first surface 101. In step 13, refer to Figure 5 Taking the case where the top surface of the second blocking line 121 is flush with the top surface of the second gate line 122 after the second blocking line 121 and the second gate line 122 are formed, that is, the height of the second blocking line 121 relative to the second surface 102 is equal to the height of the second gate line 122 relative to the second surface 102.
[0068] In other embodiments, in step 12, after forming the first blocking line and the first gate line, the top surface of the first blocking line may be farther from the first surface than the top surface of the first gate line; and / or, in step 13, after forming the second blocking line and the second gate line, the top surface of the second blocking line may be farther from the second surface than the top surface of the second gate line. In other words, the height of the first blocking line relative to the first surface may be greater than the height of the first gate line relative to the first surface, and the height of the second blocking line relative to the second surface may be less than the height of the second gate line relative to the second surface; or, the height of the first blocking line relative to the first surface may be less than the height of the first gate line relative to the first surface, and the height of the second blocking line relative to the second surface may be greater than the height of the second gate line relative to the second surface; or, the height of the first blocking line relative to the first surface may be greater than the height of the first gate line relative to the first surface, and the height of the second blocking line relative to the second surface may be greater than the height of the second gate line relative to the second surface.
[0069] It can be understood that when the sum of the height of the first blocking line 111 in the direction perpendicular to the first surface 101 and the height of the second blocking line 121 in the direction perpendicular to the second surface 102 is greater than or equal to the sum of the height of the first gate line 112 in the direction perpendicular to the first surface 101 and the height of the second gate line 122 in the direction perpendicular to the second surface 102, the height of the first gate line 112 or the height of the second gate line 122 can be avoided from affecting the mutual contact between the first blocking line 111 and the second blocking line 121.
[0070] The arrangement quantity and arrangement spacing of the first gate lines 112 and the arrangement quantity and arrangement spacing of the second gate lines 122 can be adjusted according to actual conditions. The drawings provided in this embodiment do not limit the arrangement quantity and arrangement spacing of the first gate lines 112 or the arrangement quantity and arrangement spacing of the second gate lines 122.
[0071] It should be noted that, for ease of explanation, in the drawings provided in this embodiment, the number of initial split batteries 130 stacked in step 15 is taken as 2 as an example, which does not constitute a limitation on the number of initial split batteries 130 stacked.
[0072] In step 15, stacking the initial split cells 130 includes: abutting the surface of the first blocking line 111 of an adjacent initial split cell 130 away from the first surface 101 with the surface of the second blocking line 121 of another initial split cell 130 away from the second surface 102. In other words, the top surface of the first blocking line 111 and the top surface of the second blocking line 121 abut against each other to form a contact surface.
[0073] In step 12, refer to Figure 4, when the surface of the formed first blocking line 111 away from the first surface 101 is parallel to the first surface 101; in step 13, refer to Figure 5 , when the surface of the formed second blocking line 121 away from the second surface 102 is parallel to the first surface 101. In step 15, referring to Figure 7 , the contact surface between the first blocking line 111 and the second blocking line 121 is parallel to the first surface 101 .
[0074] In other embodiments, in step 12, if the surface of the first blocking line 113 formed away from the first surface 101 is a first inclined surface; in step 13, if the surface of the second blocking line 123 formed away from the second surface 102 is a second inclined surface. Figure 8 When the surface of the first blocking line 113 of an adjacent initial slice battery 130 away from the first surface 101 is brought into contact with the surface of the second blocking line 123 of another initial slice battery 130 away from the second surface 102, the first inclined surface and the second inclined surface contact each other to form a contact surface. In this way, the contact surface between the first blocking line 113 and the second blocking line 123 may not be parallel to the first surface 101.
[0075] The first blocking line 113 is the same as or corresponds to the first blocking line 111 in the aforementioned embodiment, and reference may be made to the corresponding description of the aforementioned embodiment, which will not be described in detail below.
[0076] The second blocking line 123 is the same as or corresponds to the second blocking line 121 in the aforementioned embodiment, and reference may be made to the corresponding description of the aforementioned embodiment, which will not be described in detail below.
[0077] In steps 12 and 13, refer to Figure 4 and Figure 5 , taking the case where the orthographic projection of the first blocking line 111 on the first surface 101 and the orthographic projection of the second blocking line 121 on the first surface 101 completely overlap as an example. Thus, in step 15, referring to Figure 7 and Figure 8 When the initial split cells 130 are stacked, the surface of the first blocking line 111 of an adjacent initial split cell 130 away from the first surface 101 is brought into contact with the surface of the second blocking line 121 of another initial split cell 130 away from the second surface 102 .
[0078] In other embodiments, in step 12 to step 13, if the orthographic projection of the first blocking line 114 on the first surface 101 partially overlaps with the orthographic projection of the second blocking line 124 on the first surface 101. Fig. 9Stacking the initial split cells 130 includes: abutting a side surface of a first blocking line 114 of an adjacent initial split cell 130 against a side surface of a second blocking line 124 of another initial split cell 130 .
[0079] The first blocking line 114 is the same as or corresponds to the first blocking line 111 in the aforementioned embodiment, and the corresponding description of the aforementioned embodiment can be referred to, and will not be described in detail below.
[0080] The second blocking line 124 is the same as or corresponds to the second blocking line 121 in the aforementioned embodiment, and reference may be made to the corresponding description of the aforementioned embodiment, which will not be described in detail below.
[0081] exist Fig. 9 In the example, the side of the first blocking line 114 is perpendicular to the first surface 101 and the side of the second blocking line 124 is perpendicular to the second surface 102. In this way, the contact surface between the first blocking line 114 and the second blocking line 124 is perpendicular to the first surface 101 or the second surface 102.
[0082] In other embodiments, the side of the first blocking line close to the cutting line may be a third inclined surface, and the side of the second blocking line away from the cutting line may be a fourth inclined surface, and the third inclined surface and the fourth inclined surface are parallel to each other. In this way, the contact surface between the first blocking line and the second blocking line may not be perpendicular to the first surface or the second surface.
[0083] In some embodiments, in step 12, if two first blocking lines 115 are formed on the same side of the cutting line 103, and in step 13, if one second blocking line 125 is formed on the same side of the cutting line 103, the orthographic projections of the two first blocking lines 115 on the first surface 101 are located on both sides of the orthographic projection of the second blocking line 125 on the first surface 101. Thus, in step 15, referring to Fig.10 , stacking the initial slice cells 130 includes: inserting the second blocking line 125 of an adjacent initial slice cell 130 between two first blocking lines 115 of another initial slice cell 130. In this way, the blocking capability of the first blocking line 115 and the second blocking line 125 can be improved, and the possibility of the reaction gas in the passivation process entering the gap between the adjacent initial slice cells 130 can be reduced, thereby reducing the possibility of the surface of the initial slice cell 130 being plated, and reducing the possibility of the surface of the first grid line 112 or the surface of the second grid line 122 being passivated.
[0084] The first blocking line 115 is the same as or corresponds to the first blocking line 111 in the aforementioned embodiment, and reference may be made to the corresponding description of the aforementioned embodiment, which will not be described in detail below.
[0085] The second blocking line 125 is the same as or corresponds to the second blocking line 121 in the aforementioned embodiment, and reference may be made to the corresponding description of the aforementioned embodiment, which will not be described in detail below.
[0086] In some embodiments, in step 12, if two first blocking lines 115 are formed on the same side of the cutting line 103, and in step 13, if one second blocking line 125 is formed on the same side of the cutting line 103, the orthographic projections of the two first blocking lines 115 on the first surface 101 are located on both sides of the orthographic projection of the second blocking line 125 on the first surface 101. The distance between the first blocking line 115 closest to the cutting line 103 and the cutting line 103 is 25 μm to 75 μm, for example, 25 μm, 30 μm, 33 μm, 36 μm, 40 μm, 45 μm, 50 μm, 56 μm, 60 μm, 64 μm, 70 μm or 75 μm.
[0087] In the drawings provided in this embodiment, in step 15, when stacking the plurality of initially split batteries 130, it is taken as an example that the cut surfaces 131 of the plurality of initially split batteries 130 are flush with each other.
[0088] In other embodiments, in step 15, when multiple initial slice batteries are stacked, the cut surfaces of the multiple initial slice batteries can be staggered with each other, and adjacent initial slice batteries can be abutted against each other through the first blocking line and the second blocking line to prevent the reaction gas in the passivation process from entering the gap between the adjacent initial slice batteries.
[0089] In step 16, the cut surfaces of the initial slice batteries 130 are passivated, including: placing the stacked initial slice batteries 130 in a material box (not shown in the figure) so that the cut surfaces of the initial slice batteries 130 are exposed outside the material box; sending the material box into a passivation device to passivate the cut surfaces 131 of the initial slice batteries 130.
[0090] In some embodiments, before placing the stacked initial slice batteries in the material holding box, the stacked initial slice batteries can be covered with a protective film, and the protective film is located on other outer surfaces of the stacked initial slice batteries except the cut surface. In this way, after the stacked initial slice batteries are placed in the material holding box, there is a protective film between the top surface of the initial slice battery located at the top layer and the bottom surface of the initial slice battery located at the bottom layer and the material holding box, and there is a protective film between the side surfaces of the initial slice battery except the cut surface and the material holding box, and the protective film can fill the gap between the material holding box and the stacked initial slice batteries to prevent the top surface of the initial slice battery at the top layer, the bottom surface of the initial slice battery at the bottom layer, and the two side surfaces of the initial slice battery adjacent to the cut surface from being passivated.
[0091] In some embodiments, the material of the protective film can be polyimide, mica polybenzimidazole, or glass fiber.
[0092] In the manufacturing method of the split battery provided in the embodiment of the present application, a first grid line 112 and a first blocking line 111 are formed on the first surface 101 of the battery substrate 100, and a second grid line 122 and a second blocking line 121 are formed on the second surface 102 of the battery substrate 100. The first grid line 112 is used to collect carriers generated on the first surface 101 of the battery substrate 100, and the second grid line 122 is used to collect carriers generated on the second surface 102 of the battery substrate 100. The first blocking line 111 and the second blocking line 121 are both arranged adjacent to the cutting line 103. After the battery substrate 100 is cut, the first blocking line 111 and the second blocking line 121 are adjacent to the cutting surface 131. In the process of stacking the initial slice cells 130, the cut surfaces 131 of the multiple initial slice cells 130 are all located on the same side, and the first blocking line 111 of an adjacent initial slice cell 130 abuts against the second blocking line 121 of another initial slice cell 130, so that in the subsequent passivation process, the reaction gas forming the passivation film is blocked by the first blocking line 111 and the second blocking line 121, and the reaction gas is not easy to penetrate into the gap between the adjacent initial slice cells 130, thereby avoiding the surface plating of the initial slice cells 130. And due to the blocking effect of the first blocking line 111 and the second blocking line 121, the first grid line 112 and the second grid line 122 will not be exposed to the reaction gas of the passivation process, thereby avoiding the surface of the first grid line 112 and the surface of the second grid line 122 from being passivated.
[0093] Correspondingly, another embodiment of the present application further provides a slice battery, which can be formed by the manufacturing method of the slice battery in the above embodiment. The slice battery provided by another embodiment of the present application will be described in detail below in conjunction with the accompanying drawings. For the parts that are the same or corresponding to the previous embodiment, refer to the corresponding description of the previous embodiment, and will not be described in detail below.
[0094] Figures 11 to 13 A schematic diagram of the structures of various slice batteries provided in the embodiments of the present application.
[0095] refer to Fig.11The sliced battery includes: a battery body 200, the battery body 200 has a first surface 201 and a second surface 202 opposite to each other, and a cutting surface 203 connecting the first surface 201 and the second surface 202; a first gate line 212 and a first blocking line 211, the first gate line 212 and the first blocking line 211 are located on the first surface 201, the first blocking line 211 is adjacent to the cutting surface 203, and the first gate line 212 is located on a side of the first blocking line 211 away from the cutting surface 203; a second gate line 222 and a second blocking line 221, the second gate line 222 and the second blocking line 221 are located on the second surface 202, the second blocking line 221 is adjacent to the cutting surface 203, and the second gate line 222 is located on a side of the second blocking line 221 away from the cutting surface 203; a passivation film 213, the passivation film 213 is located on the surface of the cutting surface 203.
[0096] In some embodiments, the sliced cell can be any one of a PERC cell (Passivated Emitter and Rear Cell), a PERT cell (Passivated Emitter and Rear Totally-diffused cell), a TOPCon cell (Tunnel Oxide Passivated Contact) or a HIT / HJT cell (Heterojunction Technology).
[0097] In some embodiments, the sliced cells can be monocrystalline silicon solar cells, polycrystalline silicon solar cells, amorphous silicon solar cells or multi-compound solar cells. The multi-compound solar cells can specifically be cadmium sulfide solar cells, gallium arsenide solar cells, copper indium selenide solar cells or perovskite solar cells.
[0098] refer to Fig.12 and Fig.13 In some embodiments, the battery body 200 includes a substrate 230 and a first passivation layer 231 and a second passivation layer 232 covering both sides of the substrate 230. The surface of the first passivation layer 231 away from the substrate 230 is the first surface 201, and the surface of the second passivation layer 232 away from the substrate 230 is the second surface 202. The first gate line 212 is located on the first passivation layer 231 and is electrically connected to the substrate 230. The second gate line 222 is located on the second passivation layer 232 and is electrically connected to the substrate 230. The substrate 230 is used to receive incident light and generate photogenerated carriers. The first gate line 212 and the second gate line 222 are used to collect photogenerated carriers. The first passivation layer 231 and the second passivation layer 232 can prevent oxidation or corrosion of the surface of the substrate 230 to improve the stability and life of the sliced battery.
[0099] refer to Fig.12 In some embodiments, the first blocking line 211 may be located on the first passivation layer 231 and electrically insulated from the substrate 230, and the second blocking line 221 may be located on the second passivation layer 232 and electrically insulated from the substrate 230. In this way, the materials of the first blocking layer 211 and the second blocking layer 221 are both insulating materials, the material of the first blocking line 211 is different from the material of the first gate line 212, and the material of the second blocking line 221 is different from the material of the second gate line 222. The first blocking line 211 and the second blocking line 221 are only used to block the reaction gas from entering the gap between adjacent slice cells during the passivation process of the slice cells.
[0100] The insulating material may be polyimide.
[0101] Alternatively, refer to Fig.13 In some embodiments, the first blocking line 211 may be located on the first passivation layer 231 and electrically connected to the substrate 230, and the second blocking line 221 may be located on the second passivation layer 232 and electrically connected to the substrate 230. In other words, the materials of the first blocking line 211 and the second blocking line 221 are both conductive materials. In this way, the first blocking line 211 and the second blocking line 221 are not only used to block the reaction gas from entering the gap between adjacent split cells during the passivation process of the split cells, but can also be used as gate lines to collect photogenerated carriers respectively.
[0102] The conductive material may include silver or aluminum.
[0103] exist Fig.12 and Fig.13 In the embodiment, the first gate line 212 penetrates the first passivation layer 231 and contacts the substrate 230, and the second gate line 222 penetrates the second passivation layer 232 and contacts the substrate 230. In other embodiments, the first gate line may not penetrate the first passivation layer, the second gate line may not penetrate the passivation layer, and both the first gate line and the second gate line may be electrically connected to the substrate in a point contact manner.
[0104] In some embodiments, the material of the first passivation layer 231 may include at least one of aluminum oxide, silicon oxide, silicon nitride, or silicon oxynitride. The first passivation layer 231 may be a single-layer structure or a stacked-layer structure. For example, the single-layer structure may be a single-layer aluminum oxide film layer, a single-layer silicon oxide film layer, a single-layer silicon nitride film layer, or a single-layer silicon oxynitride film layer; the stacked-layer structure may be composed of at least two film layers stacked among an aluminum oxide film layer, a silicon oxide film layer, a silicon nitride film layer, or a silicon oxynitride film layer.
[0105] In some embodiments, the material of the second passivation layer 232 may include at least one of aluminum oxide, silicon oxide, silicon nitride, or silicon oxynitride. The second passivation layer 232 may be a single-layer structure or a stacked-layer structure. For example, the single-layer structure may be a single-layer aluminum oxide film layer, a single-layer silicon oxide film layer, a single-layer silicon nitride film layer, or a single-layer silicon oxynitride film layer; the stacked-layer structure may be composed of at least two film layers stacked among an aluminum oxide film layer, a silicon oxide film layer, a silicon nitride film layer, or a silicon oxynitride film layer.
[0106] In some embodiments, the base 230 may include a stacked substrate (not shown) and an emitter (not shown), wherein the emitter may be located on a side of the substrate close to the first passivation layer 231 and in contact with the first passivation layer 231, or the emitter may be located on a side of the substrate close to the second passivation layer 232 and in contact with the second passivation layer 232. The doping element type of the emitter is opposite to the doping element type in the substrate. For example, if the doping element in the substrate is a P-type doping element, the doping element in the emitter is an N-type doping element; if the doping element in the substrate is an N-type doping element, the doping element in the emitter is a P-type doping element, thus forming a PN junction with the substrate. The PN junction can receive incident light irradiated to the surface of the substrate and generate electron-hole pairs. For example, when the substrate is an N-type substrate, the separated electrons move into the substrate and the separated holes move into the emitter, thus forming a current.
[0107] In some embodiments, the substrate may be an N-type semiconductor substrate or a P-type semiconductor substrate. The N-type semiconductor substrate is doped with an N-type doping element, which may be any one of the V-group elements such as phosphorus (P), bismuth (Bi), antimony (Sb), or arsenic (As). The P-type semiconductor substrate is doped with a P-type element, which may be any one of the III-group elements such as boron (B), aluminum (Al), gallium (Ga), or indium (In).
[0108] In some embodiments, the material of the substrate may be at least one of single crystal silicon, polycrystalline silicon, amorphous silicon, or microcrystalline silicon.
[0109] In some embodiments, at least one side surface of the substrate may have a velvet structure, such as a pyramid-structured velvet. In this way, the velvet structure can enhance the absorption utilization rate of the substrate to the incident light, thereby facilitating the improvement of the light conversion efficiency of the cell. If the solar cell is a single-sided cell, the velvet can be formed only on one side of the substrate, and the other side surface of the substrate can be a polished surface, that is, the polished surface of the substrate is flatter than the velvet. It should be noted that for single-sided cells, the velvet can also be formed on both sides of the substrate. If the solar cell is a double-sided cell, the velvet can be formed on both sides of the substrate.
[0110] In some embodiments, the substrate 230 may further include a tunneling layer (not shown in the figure) located on the surface of the substrate and a doped conductive layer (not shown in the figure) located on the surface of the tunneling layer, wherein the tunneling layer is located on the surface of the substrate away from the emitter, and the doped conductive layer is located on the surface of the tunneling layer away from the substrate. The tunneling layer and the doped conductive layer are used to form a passivation contact structure, and the tunneling layer can play a chemical passivation effect. Due to the presence of interface state defects on the surface of the substrate, the tunneling layer can saturate the dangling bonds on the surface of the substrate, reduce the defect state density on the surface of the substrate, and reduce the recombination center on the surface of the substrate to reduce the carrier recombination rate, so that the interface state density on the surface of the substrate is relatively large. The increase in the interface state density will promote the recombination of photogenerated carriers, increase the filling factor, short-circuit current and open-circuit voltage of the solar cell, so as to improve the photoelectric conversion efficiency of the solar cell; the doped conductive layer can have a field passivation effect, and the doped conductive layer can form an electrostatic field, so that the minority carriers escape from the interface, reduce the concentration of the minority carriers, so that the carrier recombination rate at the substrate interface is relatively low, and the open-circuit voltage, short-circuit current and filling factor of the solar cell are increased, so as to improve the photoelectric conversion efficiency of the solar cell.
[0111] The material of the tunneling layer may include at least one of silicon oxide, silicon nitride, silicon oxynitride, silicon carbide, or magnesium fluoride.
[0112] The material of the doped conductive layer may include at least one of amorphous silicon, polycrystalline silicon or silicon carbide. The doped conductive layer has the same doping element as the substrate. If the doping element type of the substrate is P-type, the doping element type in the doped conductive layer is also P-type; if the doping element type of the substrate is N-type, the doping element type in the doped conductive layer is also N-type.
[0113] The slice battery provided in the embodiment of the present application adopts the manufacturing method of the slice battery in the above embodiment, and a first blocking line and a second blocking line are formed at the position adjacent to the cutting line on the battery substrate. After the battery substrate is cut, the first blocking line and the second blocking line are adjacent to the cutting surface. In the process of stacking the initial slice batteries, the cutting surfaces of multiple initial slice batteries are all located on the same side, and the first blocking line of an adjacent initial slice battery is in contact with the second blocking line of another initial slice battery. In this way, during the passivation process, the reaction gas forming the passivation film is blocked by the first blocking line and the second blocking line, and the reaction gas is not easy to penetrate into the gap between adjacent initial slice batteries, thereby avoiding the surface plating of the slice battery. And due to the blocking effect of the first blocking line and the second blocking line, the first grid line and the second grid line will not be exposed to the reaction gas of the passivation process, avoiding the surface of the first grid line and the surface of the second grid line from being passivated, which is conducive to improving the performance of the slice battery.
[0114] Correspondingly, another aspect of the embodiments of the present application further provides a photovoltaic module, including at least one sliced battery as in the above embodiment. For the parts that are the same or corresponding to the previous embodiment, please refer to the corresponding description of the above embodiment, and will not be described in detail below.
[0115] The photovoltaic module provided in the embodiment of the present application includes: a battery string, the battery includes a plurality of battery cells, wherein at least one battery cell is a slice battery as in the above embodiment, the first grid line of the slice battery is connected to an adjacent battery cell through a connecting component, and the second grid line of the slice battery is connected to another adjacent battery cell through a connecting component; an adhesive film, the adhesive film covers the surface of the battery string; and a cover plate, the cover plate covers the surface of the adhesive film away from the battery string.
[0116] In some embodiments, the material of the first blocking line is a conductive material, the material of the second blocking line is a conductive material, the first blocking line of the slice battery is connected to an adjacent battery cell through a connecting component, and the second blocking line of the slice battery is connected to another adjacent battery cell through a connecting component.
[0117] The connecting component may be a welding strip. The material of the encapsulation layer may be an organic encapsulation film such as ethylene-vinyl acetate copolymer (EVA) film, polyethylene octene co-elastomer (POE) film or polyvinyl butyral (PVB) film. The cover plate may be a glass cover plate, a plastic cover plate or the like with a light-transmitting function.
[0118] In some embodiments, the surface of the cover plate facing the encapsulation layer may be a concave-convex surface, thereby increasing the utilization rate of incident light.
[0119] In the photovoltaic module provided by the embodiment of the present application, the sliced cell adopts the manufacturing method of the sliced cell in the above embodiment, and a first blocking line and a second blocking line are formed at the position adjacent to the cutting line on the cell substrate. After the cell substrate is cut, the first blocking line and the second blocking line are adjacent to the cutting surface. In the process of stacking the initial sliced cells, the cutting surfaces of multiple initial sliced cells are all located on the same side, and the first blocking line of an adjacent initial sliced cell is in contact with the second blocking line of another initial sliced cell, so that during the passivation process, the reaction gas forming the passivation film is blocked by the first blocking line and the second blocking line, and the reaction gas is not easy to penetrate into the gap between adjacent initial sliced cells, thereby avoiding the surface plating of the sliced cells. And due to the blocking effect of the first blocking line and the second blocking line, the first grid line and the second grid line will not be exposed to the reaction gas of the passivation process, avoiding the surface of the first grid line and the surface of the second grid line from being passivated, which is conducive to improving the performance of the photovoltaic module.
[0120] Those skilled in the art will appreciate that the above-mentioned embodiments are specific examples for implementing the present application, and in practical applications, various changes may be made to the embodiments in form and detail without departing from the spirit and scope of the present application. Any person skilled in the art may make various changes and modifications without departing from the spirit and scope of the present application, and therefore the scope of protection of the present application shall be subject to the scope defined in the claims.
Claims
1. A method for manufacturing a sliced battery, characterized in that: include: Providing a battery substrate, wherein the battery substrate has a first surface and a second surface disposed opposite to each other, and the battery substrate has a cutting line; forming a first gate line and a first blocking line on the first surface, wherein the first blocking line is located at two opposite sides of the cutting line and is adjacent to the cutting line, and the first gate line is located at a side of the first blocking line away from the cutting line; forming a second gate line and a second blocking line on the second surface, wherein the second blocking line is located at two opposite sides of the cutting line and adjacent to the cutting line, and the second gate line is located at a side of the second blocking line away from the cutting line; Cutting the battery substrate along the cutting line to form a plurality of initial sliced batteries, wherein the initial sliced batteries have cutting surfaces; Stacking a plurality of the initially split cells so that the first blocking line of an adjacent initially split cell abuts against the second blocking line of another adjacent initially split cell, and the cut surfaces of the plurality of initially split cells are all located on the same side; The cut surfaces of the stacked initial split cells are passivated to form a plurality of split cells.
2. The method for manufacturing a split battery according to claim 1, characterized in that: Stacking the initial sliced batteries comprises: A surface of the first blocking line of one adjacent initial split battery away from the first surface is brought into contact with a surface of the second blocking line of another adjacent initial split battery away from the second surface.
3. The method for manufacturing a split battery according to claim 2, characterized in that: A surface of the first blocking line away from the first surface is a first inclined surface, a surface of the second blocking line away from the second surface is a second inclined surface, and the first inclined surface and the second inclined surface are parallel to each other.
4. The method for manufacturing a split battery according to claim 1, characterized in that: Stacking the initial sliced batteries comprises: At least one side surface of the first blocking line of one adjacent initial cell is abutted against at least one side surface of the second blocking line of another adjacent initial cell.
5. The method for manufacturing a split battery according to claim 4, characterized in that: The side of the first blocking line close to the cutting line is a third inclined surface, the side of the second blocking line away from the cutting line is a fourth inclined surface, and the third inclined surface is parallel to the fourth inclined surface.
6. The method for manufacturing a split battery according to claim 4, characterized in that: On the same side of the cutting line, the number of the first blocking lines is two, the number of the second blocking line is one, and the orthographic projections of the two first blocking lines on the first surface are located on both sides of the orthographic projection of the second blocking line on the first surface; Stacking the initial slice batteries includes: inserting the second blocking line of an adjacent one of the initial slice batteries between two first blocking lines of another adjacent one of the initial slice batteries.
7. The method for manufacturing a split battery according to claim 1, characterized in that: Passivation treatment is performed on the cut surface of the initial sliced battery, comprising: Covering the stacked initial sliced batteries with a protective film, wherein the protective film is located on other outer surfaces of the stacked initial sliced batteries except the cut surface; Placing the stacked initially split batteries in a material box so that the cut surfaces of the initially split batteries are exposed outside the material box; The material box is sent into a passivation device to perform a passivation treatment on the cut surface of the initial sliced battery.
8. A split battery, characterized in that: The split battery comprises: A battery body, the battery body having a first surface and a second surface opposite to each other, and a cutting surface connecting the first surface and the second surface; a first gate line and a first blocking line, wherein the first gate line and the first blocking line are located on the first surface, the first blocking line is adjacent to the cutting surface, and the first gate line is located on a side of the first blocking line away from the cutting surface; a second gate line and a second blocking line, wherein the second gate line and the second blocking line are located on the second surface, the second blocking line is adjacent to the cutting surface, and the second gate line is located on a side of the second blocking line away from the cutting surface; A passivation film is located on the surface of the cut surface.
9. The split battery according to claim 8, characterized in that: The battery body comprises a substrate and a first passivation layer and a second passivation layer covering both side surfaces of the substrate, wherein the surface of the first passivation layer away from the substrate is the first surface, and the surface of the second passivation layer away from the substrate is the second surface; The first gate line is electrically connected to the substrate, the first blocking line is electrically insulated from the substrate, the second gate line is electrically connected to the substrate, and the second blocking line is electrically insulated from the substrate; or, the first gate line is electrically connected to the substrate, the first blocking line is electrically connected to the substrate; the second gate line is electrically connected to the substrate, and the second blocking line is electrically connected to the substrate.
10. A photovoltaic module, characterized in that: include: A battery string, wherein the battery comprises a plurality of battery cells, wherein at least one battery cell is a slice battery as claimed in claim 8 or 9, wherein the first busbar of the slice battery is connected to an adjacent one of the battery cells through a connecting component, and the second busbar of the slice battery is connected to another adjacent one of the battery cells through the connecting component; An adhesive film, the adhesive film covering the surface of the battery string; A cover plate covers a surface of the adhesive film away from the battery string.