Cleaning and disinfecting method for ultrasonic probe and related equipment

Abstract

The invention provides a cleaning and disinfecting method for an ultrasonic probe and related equipment. The cleaning and disinfecting method comprises the following steps: firstly, monitoring a radio frequency excitation state when disinfecting equipment disinfects the ultrasonic probe; the scattering characteristics of the plasma in the disinfection equipment in the ionization process are extracted; further determining the generation feedback of the plasma at different ionization positions in the disinfection equipment, and further inhibiting the generation feedback of the plasma at different ionization positions to obtain the excitation constraint of the plasma in the disinfection process of the ultrasonic probe; then pressure fluctuation around the ultrasonic probe is determined according to the gas pressure, and then the distribution degree of plasma at each ionization position is determined; and further determining the penetration flux of the plasma at each ionization position, and carrying out self-adaptive adjustment on a radio frequency power generator in the disinfection equipment based on all the penetration fluxes. By adopting the scheme of the invention, the penetrating power of the active species in the plasma to the biological membrane can be enhanced, so that the disinfection and sterilization effects are improved.

Description

Technical Field

[0001] The present application relates to the technical field of cleaning and disinfection, and more specifically, to a cleaning and disinfection method for an ultrasound probe and related equipment. Background Art

[0002] Cleaning and disinfection are important means to ensure environmental hygiene and prevent the spread of pathogens. Cleaning removes surface dirt and organic matter through physical methods, such as wiping and rinsing, laying the foundation for disinfection. Disinfection uses chemical or physical methods, such as disinfectants, ultraviolet rays, plasma, steam, etc. to kill or inhibit microorganisms. In addition, plasma disinfection is an advanced disinfection technology that generates active particles through high-energy electric fields, which can effectively destroy the cell walls and genetic material of bacteria and viruses. It is especially suitable for the disinfection of medical equipment and confined spaces.

[0003] Using a low-temperature plasma sterilizer to clean and disinfect ultrasound probes is an efficient, low-temperature, and residue-free sterilization method. Low-temperature plasma sterilization uses active species in plasma, such as free radicals, ions, electrons, and UV radiation, to oxidize microorganisms and destroy cell walls and DNA, thereby achieving ultrasound probe sterilization. However, under certain conditions, a biofilm will form on the surface of the ultrasound probe. The biofilm is a complex structure composed of a microbial community and its secreted polymer matrix (such as polysaccharides, proteins, and DNA). It has extremely high resistance and can effectively shield active species in plasma (such as free radicals and ions), limiting the penetration and killing effect of plasma on microorganisms inside the biofilm, resulting in reduced disinfection effect. Therefore, how to enhance the penetration ability of active species in plasma into the biofilm, thereby improving the disinfection and sterilization effect, has become a difficult problem faced by the industry. Summary of the invention

[0004] The present application provides a cleaning and disinfection method and related equipment for an ultrasonic probe, which can enhance the penetration ability of active species in plasma into biofilms, thereby improving the disinfection and sterilization effect.

[0005] In a first aspect, the present application provides a method for cleaning and disinfecting an ultrasound probe, comprising the following steps: Start the disinfection equipment and monitor the radio frequency excitation state when the disinfection equipment disinfects the ultrasound probe; Extract the scattering characteristics of the plasma in the disinfection equipment during the ionization process from the monitored RF excitation state; Determining the generation feedback of plasma at different ionization positions in the disinfection device according to the scattering characteristics and the power constraint of the radio frequency current in the disinfection device, suppressing the generation feedback of plasma at different ionization positions by the diffusion amount of the plasma in the disinfection device when it reaches a stable state, and obtaining the excitation constraint of the plasma of the ultrasonic probe during the disinfection process; Collecting the gas pressure in the sterilization chamber when the disinfection equipment disinfects the ultrasonic probe, determining the pressure fluctuation around the ultrasonic probe according to the gas pressure, and determining the distribution degree of the plasma at each ionization position in the disinfection equipment according to the pressure fluctuation and the concentration gradient of the plasma at each ionization position; The penetration flux of the plasma at each ionization position is determined according to the excitation constraint of the plasma of the ultrasonic probe during the disinfection process and the distribution degree of the plasma at each ionization position. The radio frequency power generator in the disinfection equipment is adaptively adjusted based on all the penetration fluxes to complete the disinfection and sterilization of the ultrasonic probe.

[0006] In some embodiments, extracting the scattering characteristics of the plasma in the disinfection equipment during the ionization process from the monitored radio frequency excitation state specifically includes: Preprocessing the radio frequency current data, radio frequency frequency data and radio frequency power data in the radio frequency excitation state respectively to obtain a radio frequency preprocessing data set; The scattering characteristics of the plasma in the disinfection equipment during the ionization process are determined based on the preset model and the radio frequency preprocessing data set.

[0007] In some embodiments, determining the generation feedback of plasma at different ionization positions in the disinfection device according to the scattering characteristics and the power constraint of the radio frequency current in the disinfection device specifically includes: Selecting a scattering state vector from the scattering feature as a selected scattering state vector, wherein the selected scattering state vector corresponds to an ionization position; Determining scattering feedback of plasma at an ionization position corresponding to the selected scattering state vector in the disinfection device according to the selected scattering state vector and the remaining scattering state vectors; Determining the generation feedback of the plasma at the ionization position corresponding to the selected scattering state vector in the disinfection device through the scattering feedback and the power constraint of the radio frequency current in the disinfection device; Continue to determine the generation feedback of plasma at the ionization position corresponding to the remaining scattering state vector in the disinfection device.

[0008] In some embodiments, the generation feedback of plasma at different ionization positions is suppressed by the diffusion amount of plasma when the plasma in the disinfection equipment reaches a stable state, and the excitation constraint of the plasma of the ultrasonic probe during the disinfection process is obtained, which specifically includes: Determine the diffusion volume when the plasma reaches a steady state in the disinfection equipment; Determining the generation suppression amount when the plasma in the disinfection device reaches a steady state based on all generation feedbacks; The excitation confinement of the plasma during the sterilization process of the ultrasonic probe is determined by the generation inhibition amount and the diffusion amount.

[0009] In some embodiments, determining the distribution of the plasma at each ionization position in the sterilization device by the pressure fluctuation and the concentration gradient of the plasma at each ionization position specifically includes: Performing linear fitting on the concentration gradient of plasma at all ionization positions to obtain a concentration gradient curve; The distribution degree of plasma at each ionization position is determined according to the concentration gradient curve and the pressure fluctuation.

[0010] In some embodiments, determining the penetration flux of the plasma at each ionization position according to the excitation confinement of the plasma during the disinfection process of the ultrasonic probe and the distribution degree of the plasma at each ionization position specifically includes: Converting the distribution degrees of the plasma at all ionization positions into a distribution degree series; Determining the maximum distribution amount of plasma at each ionization position according to a preset sliding window and the distribution degree sequence; The penetration flux of the plasma at each ionization position is determined by the maximum distribution amount of the plasma at each ionization position and the excitation confinement of the plasma of the ultrasonic probe during the sterilization process.

[0011] In some embodiments, the sterilization equipment is a hydrogen peroxide low-temperature plasma sterilizer.

[0012] In a second aspect, the present application provides a cleaning and disinfection system for an ultrasound probe, comprising: A monitoring module, used to monitor the radio frequency excitation state of the disinfection device when the disinfection device disinfects the ultrasonic probe after the disinfection device is started; A processing module, used to extract the scattering characteristics of the plasma in the disinfection equipment during the ionization process from the monitored radio frequency excitation state; The processing module is further used to determine the generation feedback of plasma at different ionization positions in the disinfection device according to the scattering characteristics and the power constraint of the radio frequency current in the disinfection device, suppress the generation feedback of plasma at different ionization positions by the diffusion amount of the plasma in the disinfection device when it reaches a stable state, and obtain the excitation constraint of the plasma of the ultrasonic probe during the disinfection process; The processing module is further used to collect the gas pressure in the sterilization chamber when the disinfection equipment disinfects the ultrasonic probe, determine the pressure fluctuation around the ultrasonic probe according to the gas pressure, and determine the distribution degree of the plasma at each ionization position in the disinfection equipment through the pressure fluctuation and the concentration gradient of the plasma at each ionization position; The execution module is used to determine the penetration flux of the plasma at each ionization position according to the excitation constraint of the plasma of the ultrasonic probe during the disinfection process and the distribution degree of the plasma at each ionization position, and adaptively adjust the radio frequency power generator in the disinfection equipment based on all the penetration fluxes to complete the disinfection and sterilization of the ultrasonic probe.

[0013] In a third aspect, the present application provides a computer device, comprising a memory and a processor, wherein the memory stores codes, and the processor is configured to obtain the codes and execute the above-mentioned cleaning and disinfection method for an ultrasound probe.

[0014] In a fourth aspect, the present application provides a computer-readable storage medium, wherein the computer-readable storage medium stores a computer program, and when the computer program is executed by a processor, the above-mentioned cleaning and disinfection method for an ultrasound probe is implemented.

[0015] The technical solution provided by the embodiments disclosed in this application has the following beneficial effects: In the cleaning and disinfection method and related equipment for ultrasonic probes provided in the present application, the disinfection device is first started to monitor the radio frequency excitation state when the disinfection device disinfects the ultrasonic probe; the scattering characteristics of the plasma in the disinfection device during the ionization process are extracted from the monitored radio frequency excitation state; the generation feedback of the plasma at different ionization positions in the disinfection device is determined according to the scattering characteristics and the power constraint of the radio frequency current in the disinfection device, and the generation feedback of the plasma at different ionization positions is suppressed by the diffusion amount of the plasma in the disinfection device when the plasma reaches a stable state, so as to obtain the excitation constraint of the plasma of the ultrasonic probe during the disinfection process; the gas pressure in the sterilization chamber when the disinfection device disinfects the ultrasonic probe is collected, the pressure fluctuation around the ultrasonic probe is determined according to the gas pressure, and the distribution degree of the plasma at each ionization position in the disinfection device is determined according to the pressure fluctuation and the concentration gradient of the plasma at each ionization position; the penetration flux of the plasma at each ionization position is determined according to the excitation constraint of the plasma of the ultrasonic probe during the disinfection process and the distribution degree of the plasma at each ionization position, and the radio frequency power generator in the disinfection device is adaptively adjusted based on all the penetration fluxes to complete the disinfection and sterilization of the ultrasonic probe.

[0016] It can be seen that in the present application, the penetration flux of the plasma at each ionization position can be determined according to the excitation constraint of the plasma of the ultrasonic probe during the disinfection process and the distribution degree of the plasma at each ionization position; wherein, first, a scattering feature describing the spatial scattering distribution state of the plasma at the ionizer during the ionization process is extracted from the RF excitation state, wherein the spatial scattering distribution state reflects the dynamic changes in the plasma ionization process, and then the generation feedback of the active species concentration of the plasma at different ionization positions in the disinfection equipment on its own generation efficiency is obtained through the scattering feature and the power constraint of the RF current in the disinfection equipment. By analyzing the generation feedback, the disinfection ability of the plasma at different ionization positions can be judged to ensure that the active species can effectively penetrate the biofilm and improve the sterilization effect. The generation feedback of the plasma at different ionization positions is further suppressed by the diffusion amount of the plasma in the disinfection equipment when it reaches a stable state, and the excitation constraint set in the excited state of the plasma of the ultrasonic probe during the disinfection process to ensure the effective generation and maintenance of the active species is obtained. The generation of active species can be ensured to be strong enough through the excitation constraint. The invention can effectively penetrate the biofilm and penetrate into the cell, thereby improving the effectiveness of disinfection. Secondly, the concentration gradient of the plasma at each ionization position in the disinfection equipment is quantified by the pressure fluctuation around the ultrasonic probe to obtain the distribution degree of the plasma at each ionization position. The distribution degree indicates the distribution degree of the active species of the plasma at the ionization position in the sterilization chamber. The higher the distribution degree, the higher the concentration of the active species at the ionization position, which enhances the ability to penetrate the biofilm, thereby improving the sterilization effect. Then, according to the excitation constraint of the plasma of the ultrasonic probe during the disinfection process and the distribution degree of the plasma at each ionization position, the penetration flux of the plasma at each ionization position is obtained, wherein the penetration flux represents a quantitative index of the ability of the active species in the plasma to pass through the biofilm. The larger the penetration flux, the more active species can effectively contact and destroy microorganisms, thereby enhancing the sterilization effect. Finally, the radio frequency power generator in the disinfection equipment is adaptively adjusted based on all the penetration fluxes to complete the disinfection and sterilization of the ultrasonic probe. In summary, the scheme of the present application can enhance the penetration ability of the active species in the plasma to the biofilm, thereby improving the disinfection and sterilization effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 is an exemplary flow chart of a cleaning and disinfection method for an ultrasound probe according to some embodiments of the present application; Figure 2 is a schematic diagram of a process for determining and generating feedback in some embodiments of the present application; Figure 3 is a schematic diagram of a process for determining penetration flux in some embodiments of the present application; Figure 4is a schematic diagram of the structure of a cleaning and disinfection system for an ultrasound probe in some embodiments of the present application; Figure 5 It is a structural schematic diagram of a computer device for implementing a cleaning and disinfection method for an ultrasound probe according to some embodiments of the present application. DETAILED DESCRIPTION

[0018] In order to better understand the technical solution of the present application, the technical solution of the present application will be described in detail below in conjunction with the accompanying drawings and specific implementation methods.

[0019] refer to Figure 1 , which is an exemplary flow chart of a cleaning and disinfection method for an ultrasound probe according to some embodiments of the present application. The cleaning and disinfection method 100 for an ultrasound probe mainly includes the following steps: In step 101, the disinfection device is started, and the radio frequency excitation state of the disinfection device when disinfecting the ultrasound probe is monitored.

[0020] In a specific implementation, after starting the disinfection device, the ultrasound probe is placed in the sterilization chamber of the disinfection device, and then the radio frequency excitation state of the ultrasound probe is monitored during a specified period of time when the disinfection device is disinfecting the ultrasound probe.

[0021] It should be noted that the disinfection equipment described in this application uses a hydrogen peroxide low-temperature plasma sterilizer, wherein the hydrogen peroxide low-temperature plasma sterilizer uses liquid hydrogen peroxide as the main sterilizing agent. Hydrogen peroxide is atomized into gas through the injection system inside the equipment, and then plasma is generated by radio frequency excitation. The plasma contains high-energy ions, free radicals and other active substances. These substances have strong oxidizing properties and can destroy the cell membranes, DNA and proteins of microorganisms, thereby achieving a disinfection and sterilization effect.

[0022] It should also be noted that the hydrogen peroxide low-temperature plasma sterilizer described in the present application is composed of a sterilization chamber, a hydrogen peroxide supply system, a radio frequency power generator, a plurality of plasma generators and other equipment, wherein the radio frequency power generator is composed of a radio frequency oscillator, a power amplifier and other equipment, and the main function of the radio frequency power generator is to generate high-frequency radio frequency power, output it in the form of a radio frequency signal, and distribute it evenly along the circumference in the sterilization chamber of the hydrogen peroxide low-temperature plasma sterilizer to form a ring layout, and the main function of the plasma generator is to ionize the gas to generate plasma, and use the applied electric field to convert atoms and molecules in the gas into ions and free electrons, and the plasma generator needs to use the high-frequency radio frequency power provided by the radio frequency power generator to generate plasma.

[0023] In addition, it should be noted that the RF excitation state data in the present application is a set consisting of RF current data, RF frequency data and RF power data, wherein the RF current data is a set consisting of multiple RF current segments, each RF current segment is an ordered sequence of multiple RF current values ​​provided to the corresponding plasma generator, wherein each RF current segment corresponds to a plasma generator, the RF frequency data is a set consisting of multiple RF frequency segments, each RF frequency segment is an ordered sequence of multiple RF frequency values ​​provided to the corresponding plasma generator, wherein each RF frequency segment corresponds to a plasma generator, the RF power data is a set consisting of multiple RF power segments, each RF power segment is an ordered sequence of multiple RF power values ​​provided to the corresponding plasma generator, wherein each RF power segment corresponds to a plasma generator, and in addition, the specified time period refers to a time period within 10 minutes after the hydrogen peroxide gas begins to ionize. In other embodiments, the specified time period may also be other time intervals after the hydrogen peroxide gas begins to ionize, which is not limited here.

[0024] In step 102, the scattering characteristics of the plasma in the disinfection equipment during the ionization process are extracted from the monitored radio frequency excitation state.

[0025] In some embodiments, the following steps may be used to extract the scattering characteristics of the plasma in the disinfection device during the ionization process from the monitored RF excitation state: Preprocessing the radio frequency current data, radio frequency frequency data and radio frequency power data in the radio frequency excitation state respectively to obtain a radio frequency preprocessing data set; The scattering characteristics of the plasma in the disinfection equipment during the ionization process are determined based on the preset model and the radio frequency preprocessing data set.

[0026] In specific implementation, the RF current data, RF frequency data and RF power data in the RF excitation state are preprocessed respectively, and the preprocessed RF data set can be obtained by the following method, namely: using a median filtering algorithm to filter the RF current data in the RF excitation state, and then performing minimum-maximum normalization on the data obtained after the filtering process, and the data obtained after the minimum-maximum normalization is used as the RF current preprocessing data; using a bandpass filtering algorithm to filter the RF frequency data in the RF excitation state, and then performing Z-score normalization on the data obtained after the filtering process, and the data obtained after the Z-score normalization is used as the RF frequency preprocessing data; using a low The RF power data in the RF excitation state is filtered through a filtering algorithm, and then the data obtained after the filtering process is minimum-maximum normalized, and the data obtained after the minimum-maximum normalization is used as the RF power preprocessing data, so that the set consisting of the RF current preprocessing data, the RF frequency preprocessing data and the RF power preprocessing data is used as the RF preprocessing data set, wherein the RF current preprocessing data is a set consisting of multiple preprocessed RF current segments, the RF frequency preprocessing data is a set consisting of multiple preprocessed RF frequency segments, and the RF power preprocessing data is a set consisting of multiple preprocessed RF power segments. Other methods can also be used to achieve this in other embodiments, which are not limited here.

[0027] It should be noted that the preset model in the present application can adopt a long short-term memory network (LSTM), and use historical RF current data, RF frequency data and RF power data to train the LSTM network, and use the model obtained after the training as the long short-term memory network RF model. The long short-term memory network RF model can effectively capture the long-term dependence of historical RF current data, RF frequency data and RF power data, and can identify the changing trend and periodic characteristics of plasma during the ionization process.

[0028] In specific implementation, the scattering characteristics of the plasma in the disinfection equipment during the ionization process are determined based on the preset model and the RF preprocessing data set, which can be achieved in the following manner, namely: selecting a plasma generator as the selected plasma generator, selecting the RF current segment, RF frequency segment and RF power segment corresponding to the selected plasma generator from the RF preprocessing data set, and using the selected RF current segment, RF frequency segment and RF power segment as input data of the preset model. After the forward operation of the model is completed, the vector of the model in the fully connected layer is obtained, and the obtained vector is used as the scattering state vector of the plasma of the selected plasma generator during the ionization process, and the scattering state vectors of the plasma of the remaining plasma generators during the ionization process are continued to be determined, so that the set of all scattering state vectors is used as the scattering characteristics of the plasma in the disinfection equipment during the ionization process, wherein each plasma generator corresponds to a scattering state vector, that is, a scattering state vector corresponds to an ionization position. In other embodiments, other methods can also be used to implement it, which will not be repeated here.

[0029] It should be noted that the scattering characteristics described in the present application are a set of multiple scattering state vectors, each of which represents the spatial scattering distribution state of the plasma at the plasma generator during the ionization process. The spatial scattering distribution state reflects the dynamic changes in the plasma ionization process, including changes in electron migration, reaction rate and ionization state.

[0030] In step 103, the generation feedback of the plasma at different ionization positions in the disinfection equipment is determined according to the scattering characteristics and the power constraint of the radio frequency current in the disinfection equipment, and the generation feedback of the plasma at different ionization positions is suppressed by the diffusion amount of the plasma when the disinfection equipment reaches a stable state, so as to obtain the excitation constraint of the plasma of the ultrasonic probe during the disinfection process.

[0031] In some embodiments, reference Figure 2 As shown, this figure is a schematic diagram of the process of determining the generation feedback in some embodiments of the present application. In this embodiment, the generation feedback of the plasma at different ionization positions in the disinfection device is determined according to the scattering characteristics and the power constraint of the radio frequency current in the disinfection device, which can be implemented by the following steps: First, in step 1031, a scattering state vector is selected from the scattering features as a selected scattering state vector, and the selected scattering state vector corresponds to an ionization position; Secondly, in step 1032, the scattering feedback of the plasma at the ionization position corresponding to the selected scattering state vector in the disinfection device is determined according to the selected scattering state vector and the remaining scattering state vectors; Then, in step 1033, the generation feedback of the plasma at the ionization position corresponding to the selected scattering state vector in the disinfection device is determined by the scattering feedback and the power constraint of the radio frequency current in the disinfection device; Finally, in step 1034, the generation feedback of the plasma at the ionization position corresponding to the remaining scattering state vector in the disinfection device is continuously determined.

[0032] It should be noted that the ionization position described in the present application refers to a specific position where plasma ionization occurs. In the present application, the ionization position is the position where the plasma generator is located, wherein each ionization position corresponds to a plasma generator.

[0033] In specific implementation, the scattering feedback of the plasma at the ionization position corresponding to the selected scattering state vector in the disinfection equipment is determined based on the selected scattering state vector and the remaining scattering state vectors. This can be achieved in the following manner, namely: first, the cosine similarity between the selected scattering state vector and the remaining scattering state vectors is calculated to obtain multiple cosine similarities, and then the largest cosine similarity is selected from all the cosine similarities, and then the remaining cosine similarities are subtracted from the largest cosine similarities, and then, the average of all the subtracted values ​​is calculated, and the average value obtained is used as the scattering feedback of the plasma at the ionization position corresponding to the selected scattering state vector in the disinfection equipment. In other embodiments, other methods can also be used for implementation, which are not limited here.

[0034] It should be noted that the scattering feedback described in the present application refers to the difference feedback between the plasma scattering state at the ionization position and the scattering state at other ionization positions during the plasma ionization process. The scattering feedback can reflect the uniform distribution of active species in the plasma.

[0035] In addition, it should be noted that the power constraint of the RF current described in the present application refers to the parameters that describe and adjust the power transmission efficiency of the RF current during the plasma generation process, reflects the constraints or limitations imposed on the power supply system when transferring energy to the plasma, and ensures that the power input can effectively generate and maintain the plasma. By adjusting the power constraint coefficient of the RF current, the power input in the plasma can be controlled so that the generation of active species (such as free radicals and ions) reaches an optimal level.

[0036] In specific implementation, the generation feedback of the plasma at the ionization position corresponding to the selected scattering state vector in the disinfection equipment is determined by the scattering feedback and the power constraint of the radio frequency current in the disinfection equipment. This can be achieved in the following manner, namely: multiplying the scattering feedback and the power constraint of the radio frequency current in the disinfection equipment, and using the multiplied value as the generation feedback of the plasma at the ionization position corresponding to the selected scattering state vector in the disinfection equipment. In other embodiments, other methods can also be used to achieve this, which will not be repeated here.

[0037] It should be noted that the generation feedback in the present application represents the feedback parameter that affects the concentration of active species in the plasma during the plasma generation process on its own generation efficiency. By analyzing the generation feedback, the disinfection ability of the plasma at different ionization positions can be judged to ensure that the active species can effectively penetrate the biofilm and improve the sterilization effect. Each generation feedback corresponds to an ionization position.

[0038] In some embodiments, the generation feedback of plasma at different ionization positions is suppressed by the diffusion amount of plasma when the plasma reaches a stable state in the disinfection device, and the excitation constraint of the plasma of the ultrasonic probe during the disinfection process can be achieved by the following steps: Determine the diffusion volume when the plasma reaches a steady state in the disinfection equipment; Determining the generation suppression amount when the plasma in the disinfection device reaches a steady state based on all generation feedbacks; The excitation confinement of the plasma during the sterilization process of the ultrasonic probe is determined by the generation inhibition amount and the diffusion amount.

[0039] It should be noted that in the present application, the plasma reaching a stable state refers to the state in which the key parameters of the disinfection equipment, such as active species concentration, temperature, current, power and airflow, have reached equilibrium after a period of time and no longer show significant changes.

[0040] In specific implementation, determining the diffusion amount of the plasma in the disinfection equipment when it reaches a stable state can be achieved in the following manner, namely: first, using a gas analyzer to measure the concentration of the plasma at different ionization positions when the plasma reaches a stable state, and then using the difference method to calculate the concentration gradient at adjacent ionization positions, and secondly, the diffusion coefficient of the concentration is calculated based on the molecular motion theory, and then, Fick's first law is applied to all concentration gradients and all diffusion coefficients to calculate the diffusion flux, thereby obtaining the diffusion flux at each ionization position, and then all diffusion fluxes are summed, and the summed value is used as the diffusion amount of the plasma in the disinfection equipment when it reaches a stable state. In other embodiments, other methods can also be used to achieve this, which will not be repeated here.

[0041] It should be noted that the diffusion amount described in the present application represents the parameter amount of diffusion when the distribution of active species in the plasma reaches a dynamic equilibrium, and the diffusion amount can reflect the stability and uniformity of the plasma.

[0042] In specific implementation, the generation inhibition amount when the plasma in the disinfection equipment reaches a stable state is determined according to all the generation feedbacks, which can be achieved in the following manner, namely: first, a generation feedback is selected as the selected generation feedback, and the concentration of the plasma at the ionization position corresponding to the selected generation feedback is calculated using a negative exponential function with the natural logarithm e as the base, and then the value obtained after calculating the negative exponential function with the natural logarithm e as the base is multiplied by the selected generation feedback, and the multiplied value is used as the state constraint amount of the selected generation feedback, and the state constraint amounts of the remaining generation feedbacks are continued to be determined, and then all the state constraint amounts are summed, and the summed value is used as the generation inhibition amount when the plasma in the disinfection equipment reaches a stable state. In other embodiments, other methods can also be used for implementation, which are not limited here.

[0043] It should be noted that the generation inhibition amount described in the present application represents the parameter amount under which the generation rate of active species in plasma is conditionally restricted. The generation inhibition amount ensures that the generation rate of active species is consistent with the consumption rate, prevents excessive accumulation or depletion of active species in the system, and thus maintains the stability of the plasma.

[0044] In addition, it should be noted that the excitation constraint represents the constraint amount set in the plasma excitation state to ensure the effective generation of active species and maintain their activity. The excitation constraint can ensure that the generation of active species is strong enough to enable them to effectively penetrate the biofilm and penetrate into the cells, thereby improving the effectiveness of disinfection. As a preferred embodiment, the excitation constraint of the plasma of the ultrasonic probe during the disinfection process is determined by the generation inhibition amount and the diffusion amount. It can be achieved in the following way, that is, dividing the generation inhibition amount by the diffusion amount, and using the value obtained by the division as the excitation constraint of the plasma of the ultrasonic probe during the disinfection process. In other embodiments, other methods can also be used to achieve this, which will not be repeated here.

[0045] In step 104, the gas pressure in the sterilization chamber when the disinfection equipment disinfects the ultrasonic probe is collected, the pressure fluctuation around the ultrasonic probe is determined based on the gas pressure, and the distribution degree of the plasma at each ionization position in the disinfection equipment is determined by the pressure fluctuation and the concentration gradient of the plasma at each ionization position.

[0046] In a specific implementation, a gas pressure sensor installed in the sterilization chamber near the ultrasonic probe is used to collect the pressure of hydrogen peroxide gas within a specified time period, thereby obtaining the gas pressure in the sterilization chamber when the ultrasonic probe is disinfected.

[0047] It should be noted that the specified time period in the present application refers to a time period within 10 minutes after the hydrogen peroxide gas begins to ionize, and the gas pressure is an ordered sequence consisting of multiple gas pressure values.

[0048] In some embodiments, determining the pressure fluctuation around the ultrasound probe according to the gas pressure may be achieved by using the following steps: Performing peak analysis on the gas pressure to identify multiple peaks and multiple valleys of the pressure; The pressure fluctuations around the ultrasound probe are determined based on all the peaks and all the valleys.

[0049] In specific implementation, the peak analysis of the gas pressure is performed to identify multiple peaks and multiple valleys of the pressure, which can be achieved in the following manner, namely: using MATLAB to extract the peaks and valleys of the gas pressure, thereby obtaining multiple peaks and multiple valleys of the pressure; determining the pressure fluctuation around the ultrasonic probe based on all the peaks and all the valleys can be achieved in the following manner, namely: using MATLAB to calculate the pressure difference between each peak and the corresponding valley, thereby obtaining multiple pressure differences, and then calculating the mean of all the pressure differences, and using the obtained mean as the pressure fluctuation around the ultrasonic probe. In other embodiments, other methods can also be used for implementation, which will not be repeated here.

[0050] It should be noted that the pressure fluctuation described in the present application represents the difference between the peak value and the valley value of the pressure, and the pressure fluctuation reflects the stability of the pressure around the ultrasonic probe.

[0051] In addition, it should be noted that the concentration gradient of the plasma at each ionization position in the disinfection equipment can be determined by the difference method. In some embodiments, determining the distribution of the plasma at each ionization position in the sterilization device by the pressure fluctuation and the concentration gradient of the plasma at each ionization position can be achieved by the following steps: Performing linear fitting on the concentration gradient of plasma at all ionization positions to obtain a concentration gradient curve; The distribution degree of plasma at each ionization position is determined according to the concentration gradient curve and the pressure fluctuation.

[0052] In a specific implementation, the concentration gradients of the plasma at all ionization positions are linearly fitted to obtain a concentration gradient curve, which can be achieved in the following manner, namely: first, the concentration gradients of the plasma at all ionization positions are sorted in ascending order, and the sequence obtained after sorting is fitted using the least squares support vector machine algorithm in the prior art, and the fitted curve is used as the concentration gradient curve. In other embodiments, other methods can also be used for implementation, which are not limited here.

[0053] It should be noted that the values ​​on the concentration gradient curve described in this application are all concentration gradient fitting values, and each concentration gradient corresponds to a concentration gradient fitting value.

[0054] In a specific implementation, the distribution degree of the plasma at each ionization position is determined according to the concentration gradient curve and the pressure fluctuation, which can be achieved in the following manner, namely: an ionization position is selected as the selected ionization position, the concentration gradient of the plasma at the selected ionization position is multiplied by the concentration gradient fitting value on the concentration gradient curve corresponding to the concentration gradient, the multiplied value is then divided by the pressure fluctuation, and the divided value is used as the distribution degree of the plasma at the selected ionization position, and the distribution degree of the plasma at the remaining ionization positions is continuously determined. In other embodiments, other methods can also be used for implementation, which will not be repeated here.

[0055] It should be noted that the distribution degree described in the present application indicates the distribution degree of the active species of the plasma at the ionization position in the sterilization chamber. The higher the distribution degree, the higher the concentration of active species at the ionization position, which enhances the ability to penetrate the biofilm, thereby improving the sterilization effect, and vice versa.

[0056] In step 105, the penetration flux of the plasma at each ionization position is determined according to the excitation constraint of the plasma of the ultrasonic probe during the disinfection process and the distribution degree of the plasma at each ionization position, and the radio frequency power generator in the disinfection equipment is adaptively adjusted based on all the penetration fluxes to complete the disinfection and sterilization of the ultrasonic probe.

[0057] In some embodiments, reference Figure 3 As shown in FIG. 1 , this figure is a schematic diagram of a flow chart for determining a penetration flux in some embodiments of the present application. In this embodiment, the penetration flux of the plasma at each ionization position is determined according to the excitation constraint of the plasma of the ultrasonic probe during the disinfection process and the distribution degree of the plasma at each ionization position, which can be achieved by the following steps: First, in step 1051, the distribution degree of the plasma at all ionization positions is converted into a distribution degree sequence; Secondly, in step 1052, the maximum distribution amount of the plasma at each ionization position is determined according to the preset sliding window and the distribution degree sequence; Then, in step 1053, the penetration flux of the plasma at each ionization position is determined by the maximum distribution amount of the plasma at each ionization position and the excitation confinement of the plasma of the ultrasonic probe during the sterilization process.

[0058] In specific implementation, the distribution degrees of plasma at all ionization positions may be converted into a distribution degree sequence in the following manner, namely, the distribution degrees of plasma at all ionization positions are sorted in ascending order, and the sequence obtained after sorting is used as the distribution degree sequence.

[0059] It should be noted that the sliding window described in the present application represents a sequence for processing a distribution degree sequence, which can be set using a fixed-length sequence, wherein the fixed length can be set using a value obtained by taking the square root of the total number of distribution degrees in the distribution degree sequence and rounding it down.

[0060] In specific implementation, the maximum distribution amount of plasma at each ionization position is determined according to the preset sliding window and the distribution degree sequence, which can be achieved in the following manner, namely: aligning the sliding window with each distribution degree in the distribution degree sequence in turn, selecting the largest distribution degree and the smallest distribution degree from the distribution degrees covered by the sliding window, subtracting the smallest distribution degree from the largest distribution degree, and using the subtracted value as the maximum distribution amount of plasma at the ionization position corresponding to each distribution degree, thereby obtaining the maximum distribution amount of plasma at each ionization position. In other embodiments, other methods can also be used for implementation, which will not be repeated here.

[0061] In specific implementation, the penetration flux of the plasma at each ionization position is determined by the maximum distribution amount of the plasma at each ionization position and the excitation constraint of the plasma of the ultrasonic probe during the disinfection process. This can be achieved in the following manner, namely: the maximum distribution amount of the plasma at each ionization position is multiplied by the excitation constraint of the plasma of the ultrasonic probe during the disinfection process, and the multiplied value is used as the penetration flux of the plasma at each ionization position. In other embodiments, other methods can also be used for implementation, which are not limited here.

[0062] It should be noted that the penetration flux described in this application represents a quantitative indicator of the ability of active species in plasma to pass through the biofilm. The greater the penetration flux, the more active species can effectively contact and destroy microorganisms, thereby enhancing the sterilization effect, and vice versa.

[0063] In specific implementation, the RF power generator in the disinfection equipment is adaptively adjusted based on all the penetration fluxes, and the disinfection and sterilization of the ultrasonic probe can be achieved in the following manner, namely: first, the mean of all the penetration fluxes is calculated, and the obtained mean is used as the penetration flux equilibrium value, and then all the penetration fluxes greater than the penetration flux equilibrium value are summed, and the summed value is used as the excess penetration flux, and then all the penetration fluxes less than the penetration flux equilibrium value are summed, and the summed value is used as the under-balanced penetration flux, and then the excess penetration flux is subtracted from the under-balanced penetration flux, and the subtraction value is used as the adjustment amount, and the microcontroller or programmable logic controller is further used to convert the adjustment amount into a control signal, and the control signal is sent to the power amplifier in the RF power generator to adjust its output power. In other embodiments, other methods can also be used to achieve this, which will not be repeated here.

[0064] In addition, in another aspect of the present application, in some embodiments, the present application provides a cleaning and disinfection system for an ultrasound probe, referring to Figure 4 , which is a schematic diagram of the structure of a cleaning and disinfecting system for an ultrasound probe according to some embodiments of the present application. The cleaning and disinfecting system 400 for an ultrasound probe includes: an acquisition module 401, a processing module 402 and an execution module 403, which are described as follows: Monitoring module 401, in this application, the acquisition module 401 is mainly used to monitor the radio frequency excitation state of the disinfection device when the disinfection device disinfects the ultrasound probe after starting the disinfection device; Processing module 402, in the present application, the processing module 402 is used to extract the scattering characteristics of the plasma in the disinfection equipment during the ionization process from the monitored radio frequency excitation state; It should be noted that the processing module 402 in the present application is also used to determine the generation feedback of the plasma at different ionization positions in the disinfection equipment according to the scattering characteristics and the power constraint of the radio frequency current in the disinfection equipment, and suppress the generation feedback of the plasma at different ionization positions by the diffusion amount of the plasma in the disinfection equipment when it reaches a stable state, so as to obtain the excitation constraint of the plasma of the ultrasonic probe during the disinfection process; It should also be noted that the processing module 402 in the present application is also used to collect the gas pressure in the sterilization chamber when the disinfection equipment disinfects the ultrasonic probe, determine the pressure fluctuation around the ultrasonic probe according to the gas pressure, and determine the distribution degree of the plasma at each ionization position in the disinfection equipment through the pressure fluctuation and the concentration gradient of the plasma at each ionization position; Execution module 403. In the present application, execution module 403 is mainly used to determine the penetration flux of the plasma at each ionization position according to the excitation constraint of the plasma during the disinfection process of the ultrasonic probe and the distribution degree of the plasma at each ionization position, and adaptively adjust the radio frequency power generator in the disinfection equipment based on all the penetration fluxes to complete the disinfection and sterilization of the ultrasonic probe.

[0065] In addition, the present application also provides a computer device, which includes a memory and a processor, wherein the memory stores codes, and the processor is configured to obtain the codes and execute the above-mentioned cleaning and disinfection method for an ultrasound probe.

[0066] In some embodiments, reference Figure 5 , which is a schematic diagram of the structure of a computer device for implementing a cleaning and disinfection method for an ultrasound probe according to some embodiments of the present application. The cleaning and disinfection method for an ultrasound probe in the above embodiment can be performed by Figure 5The computer device 500 shown in the figure is implemented, and the computer device 500 includes at least one processor 501, a communication bus 502, a memory 503 and at least one communication interface 504.

[0067] The processor 501 may be a general-purpose central processing unit (CPU), an application specific integrated circuit (ASIC), or one or more processors for controlling the execution of the cleaning and disinfection method for an ultrasound probe in the present application.

[0068] The communication bus 502 may be used to transmit information between the above-mentioned components.

[0069] The memory 503 may be a read only memory (ROM) or other types of static storage devices that can store static information and instructions, a random access memory (RAM) or other types of dynamic storage devices that can store information and instructions, or an electrically erasable programmable read only memory (EEPROM), a compact disc read only memory (CD ROM) or other optical disc storage, an optical disc storage (including a compressed optical disc, a laser disc, an optical disc, a digital versatile disc, a Blu-ray disc, etc.), a magnetic disk or other magnetic storage device, or any other medium that can be used to carry or store the desired program code in the form of an instruction or data structure and can be accessed by a computer, but is not limited thereto. The memory 503 may exist independently and be connected to the processor 501 via the communication bus 502. The memory 503 may also be integrated with the processor 501.

[0070] The memory 503 is used to store the program code for executing the solution of the present application, and the execution is controlled by the processor 501. The processor 501 is used to execute the program code stored in the memory 503. The program code may include one or more software modules. The method described in the above method embodiment can be implemented by the processor 501 and one or more software modules in the program code in the memory 503.

[0071] The communication interface 504 uses any transceiver or other device for communicating with other devices or communication networks, such as Ethernet, radio access network (RAN), wireless local area networks (WLAN), etc.

[0072] In a specific implementation, as an embodiment, a computer device may include multiple processors, each of which may be a single-core (single CPU) processor or a multi-core (multi CPU) processor. The processor here may refer to one or more devices, circuits, and / or processing cores for processing data (such as computer program instructions).

[0073] The above-mentioned computer device may be a general-purpose computer device or a special-purpose computer device. In a specific implementation, the computer device may be a desktop computer, a portable computer, a network server, a personal digital assistant (PDA), a mobile phone, a tablet computer, a wireless terminal device, a communication device or an embedded device. The embodiment of the present application does not limit the type of computer device.

[0074] In addition, the present application also provides a computer-readable storage medium, which stores a computer program. When the computer program is executed by a processor, the above-mentioned cleaning and disinfection method for an ultrasound probe is implemented.

[0075] In summary, in the cleaning and disinfection method and related equipment for ultrasonic probes disclosed in the embodiments of the present application, the disinfection device is first started to monitor the radio frequency excitation state when the disinfection device disinfects the ultrasonic probe; the scattering characteristics of the plasma in the disinfection device during the ionization process are extracted from the monitored radio frequency excitation state; the generation feedback of the plasma at different ionization positions in the disinfection device is determined according to the scattering characteristics and the power constraint of the radio frequency current in the disinfection device, and the generation feedback of the plasma at different ionization positions is suppressed by the diffusion amount of the plasma in the disinfection device when the plasma reaches a stable state, so as to obtain the excitation constraint of the plasma of the ultrasonic probe during the disinfection process; the gas pressure in the sterilization chamber when the disinfection device disinfects the ultrasonic probe is collected, the pressure fluctuation around the ultrasonic probe is determined according to the gas pressure, and the distribution degree of the plasma at each ionization position in the disinfection device is determined according to the pressure fluctuation and the concentration gradient of the plasma at each ionization position; the penetration flux of the plasma at each ionization position is determined according to the excitation constraint of the plasma of the ultrasonic probe during the disinfection process and the distribution degree of the plasma at each ionization position, and the radio frequency power generator in the disinfection device is adaptively adjusted based on all the penetration fluxes to complete the disinfection and sterilization of the ultrasonic probe. The solution of the present application can enhance the penetration ability of active species in plasma into biofilms, thereby improving the disinfection and sterilization effect.

[0076] Although the preferred embodiments of the present application have been described, those skilled in the art may make other changes and modifications to these embodiments once they have learned the basic creative concept. Therefore, the appended claims are intended to be interpreted as including the preferred embodiments and all changes and modifications falling within the scope of the present application.

[0077] Obviously, those skilled in the art can make various changes and modifications to the present application without departing from the spirit and scope of the present application. Thus, if these modifications and variations of the present application fall within the scope of the claims of the present application and their equivalents, the present application is also intended to include these modifications and variations.

Claims

1. A method for cleaning and disinfecting an ultrasonic probe, characterized in that: The steps include: Start the disinfection equipment and monitor the radio frequency excitation state when the disinfection equipment disinfects the ultrasound probe; Extract the scattering characteristics of the plasma in the disinfection equipment during the ionization process from the monitored RF excitation state; Determining the generation feedback of plasma at different ionization positions in the disinfection device according to the scattering characteristics and the power constraint of the radio frequency current in the disinfection device, suppressing the generation feedback of plasma at different ionization positions by the diffusion amount of the plasma in the disinfection device when it reaches a stable state, and obtaining the excitation constraint of the plasma of the ultrasonic probe during the disinfection process; Collecting the gas pressure in the sterilization chamber when the disinfection equipment disinfects the ultrasonic probe, determining the pressure fluctuation around the ultrasonic probe according to the gas pressure, and determining the distribution degree of the plasma at each ionization position in the disinfection equipment according to the pressure fluctuation and the concentration gradient of the plasma at each ionization position; The penetration flux of the plasma at each ionization position is determined according to the excitation constraint of the plasma of the ultrasonic probe during the disinfection process and the distribution degree of the plasma at each ionization position. The radio frequency power generator in the disinfection equipment is adaptively adjusted based on all the penetration fluxes to complete the disinfection and sterilization of the ultrasonic probe.

2. The method according to claim 1, characterized in that The scattering characteristics of the plasma in the disinfection equipment during the ionization process are extracted from the monitored RF excitation state, including: Preprocessing the radio frequency current data, radio frequency frequency data and radio frequency power data in the radio frequency excitation state respectively to obtain a radio frequency preprocessing data set; The scattering characteristics of the plasma in the disinfection equipment during the ionization process are determined based on the preset model and the radio frequency preprocessing data set.

3. The method according to claim 1, characterized in that Determining the generation feedback of plasma at different ionization positions in the disinfection device according to the scattering characteristics and the power constraint of the radio frequency current in the disinfection device specifically includes: Selecting a scattering state vector from the scattering feature as a selected scattering state vector, wherein the selected scattering state vector corresponds to an ionization position; Determining scattering feedback of plasma at an ionization position corresponding to the selected scattering state vector in the disinfection device according to the selected scattering state vector and the remaining scattering state vectors; Determining the generation feedback of the plasma at the ionization position corresponding to the selected scattering state vector in the disinfection device through the scattering feedback and the power constraint of the radio frequency current in the disinfection device; Continue to determine the generation feedback of plasma at the ionization position corresponding to the remaining scattering state vector in the disinfection device.

4. The method according to claim 1, characterized in that The generation feedback of plasma at different ionization positions is suppressed by the diffusion amount of plasma when the plasma in the disinfection equipment reaches a stable state, and the excitation constraint of the plasma of the ultrasonic probe during the disinfection process is obtained, which specifically includes: Determine the diffusion volume when the plasma reaches a steady state in the disinfection equipment; Determining the generation suppression amount when the plasma in the disinfection device reaches a steady state based on all generation feedbacks; The excitation confinement of the plasma during the sterilization process of the ultrasonic probe is determined by the generation inhibition amount and the diffusion amount.

5. The method according to claim 1, characterized in that Determining the distribution of the plasma at each ionization position through the pressure fluctuation and the concentration gradient of the plasma at each ionization position in the disinfection device specifically includes: Performing linear fitting on the concentration gradient of plasma at all ionization positions to obtain a concentration gradient curve; The distribution degree of plasma at each ionization position is determined according to the concentration gradient curve and the pressure fluctuation.

6. The method according to claim 1, characterized in that Determining the penetration flux of the plasma at each ionization position according to the excitation constraint of the plasma of the ultrasonic probe during the disinfection process and the distribution degree of the plasma at each ionization position specifically includes: Converting the distribution degrees of the plasma at all ionization positions into a distribution degree series; Determining the maximum distribution amount of plasma at each ionization position according to a preset sliding window and the distribution degree sequence; The penetration flux of the plasma at each ionization position is determined by the maximum distribution amount of the plasma at each ionization position and the excitation confinement of the plasma of the ultrasonic probe during the sterilization process.

7. The method according to claim 1, characterized in that The disinfection equipment is a hydrogen peroxide low-temperature plasma sterilizer.

8. A cleaning and disinfection system for an ultrasonic probe, characterized in that: include: A monitoring module, used to monitor the radio frequency excitation state of the disinfection device when the disinfection device disinfects the ultrasonic probe after the disinfection device is started; A processing module, used to extract the scattering characteristics of the plasma in the disinfection equipment during the ionization process from the monitored radio frequency excitation state; The processing module is further used to determine the generation feedback of plasma at different ionization positions in the disinfection device according to the scattering characteristics and the power constraint of the radio frequency current in the disinfection device, suppress the generation feedback of plasma at different ionization positions by the diffusion amount of the plasma in the disinfection device when it reaches a stable state, and obtain the excitation constraint of the plasma of the ultrasonic probe during the disinfection process; The processing module is further used to collect the gas pressure in the sterilization chamber when the disinfection equipment disinfects the ultrasonic probe, determine the pressure fluctuation around the ultrasonic probe according to the gas pressure, and determine the distribution degree of the plasma at each ionization position in the disinfection equipment through the pressure fluctuation and the concentration gradient of the plasma at each ionization position; The execution module is used to determine the penetration flux of the plasma at each ionization position according to the excitation constraint of the plasma of the ultrasonic probe during the disinfection process and the distribution degree of the plasma at each ionization position, and adaptively adjust the radio frequency power generator in the disinfection equipment based on all the penetration fluxes to complete the disinfection and sterilization of the ultrasonic probe.

9. A computer device comprising a memory and a processor, wherein the memory stores a computer program, wherein: When the processor executes the computer program, the cleaning and disinfection method for an ultrasound probe according to any one of claims 1 to 7 is implemented.

10. A computer-readable storage medium storing a computer program, characterized in that: When the computer program is executed by a processor, the cleaning and disinfection method for an ultrasound probe according to any one of claims 1 to 7 is implemented.

Images