一种激光增材制造合金材料的复合抛光液及其抛光方法
By using a combination of H3PO4-HCl-HNO3 acid solution, masking agent, and surfactant, the problem of excessive surface roughness in SLM additive manufacturing alloy materials was solved, resulting in better polishing effect and surface quality.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- AVIC BEIJING INST OF AERONAUTICAL MATERIALS
- Filing Date
- 2024-09-18
- Publication Date
- 2026-07-17
AI Technical Summary
Existing SLM additive manufacturing technology results in excessive surface roughness when printing complex, irregularly shaped alloy materials. The polishing effect of existing polishing fluids is not ideal, especially since traditional strong acid corrosion can easily lead to over-corrosion and cannot selectively remove protruding parts.
A composite polishing slurry is used, comprising a mixed acid solution H3PO4-HCl-HNO3, masking agents such as EDTA, citric acid and tartaric acid, stabilizers such as ethanol and ethylene glycol, and surfactants such as sodium fatty alcohol ether sulfate. By controlling the proportion of acid components and the polishing steps, selective corrosion and uniform polishing are achieved.
It significantly reduces the surface roughness of alloy materials, improves smoothness and gloss, and provides uniform and controllable polishing results, making it suitable for widespread application.
Smart Images
Figure CN119243162B_ABST