A surface treatment device for nickel-plated parts and its treatment method

Abstract

The present invention discloses a surface treatment device and a treatment method for nickel electroplated parts, belonging to the field of surface treatment technology. It comprises a plurality of cleaning tanks, a rack is arranged above the plurality of cleaning tanks, a driving assembly is installed on the rack, and the driving assembly is connected to a cleaning assembly through a lifting cylinder; the cleaning assembly comprises a driving box, a cleaning basket and a gear, and the driving box is connected to the cleaning basket through the gear; the cleaning tank comprises a tank body, an ultrasonic generator and a heating tube, the heating tube is arranged at the bottom of the tank body, and the ultrasonic generator is installed on the side wall of the tank body. The cleaning area and cleaning effect of the nickel electroplated parts are improved by rotating the cleaning basket and ultrasonic-assisted cleaning.

Description

Technical Field

[0001] The invention relates to the technical field of surface treatment, and in particular to a surface treatment device and a treatment method for a nickel electroplated part. Background Art

[0002] In recent years, with the continuous development of technologies such as smart phones, automobiles, aerospace, etc., the performance requirements for precision electronic devices have become increasingly higher, especially nickel electroplated parts are widely used in manufacturing industries such as smart phones, automobiles, aerospace, machinery, instruments, meters, medical devices, and household appliances.

[0003] The patent document with application number CN202011230933.1 discloses a surface treatment device, which includes a moving component, a lifting component, a clamping component, a rotary cleaning component, a reaction box, and a loading and unloading component. The reaction boxes are provided with two, and the two reaction boxes are symmetrically arranged on the ground. The two reaction boxes are respectively used for electroplating and sealing the electroplated parts. The moving component is fixedly arranged above the two reaction boxes, the lifting component is fixedly arranged on the working end of the moving component, the clamping component is fixedly arranged on the working end of the lifting component, the rotary cleaning component is fixedly arranged between the two reaction box bodies, and the rotary cleaning component is arranged below the moving component, and the loading and unloading components are fixedly arranged on the sides of the reaction box and the rotary cleaning component. Through the cooperation between the above components, the workpiece can be electroplated instead of manually, thereby improving the efficiency of electroplating, but its cleaning effect on nickel electroplated parts is not good. Therefore, a person skilled in the art provides a nickel electroplated part surface treatment device to solve the problems raised in the above background technology. Summary of the invention

[0004] The object of the present invention is to provide a surface treatment device and a treatment method for nickel electroplated parts, which are used to solve the problem of poor cleaning effect of nickel electroplated parts in the prior art.

[0005] The purpose of the present invention can be achieved through the following technical solutions:

[0006] A nickel electroplating part surface treatment device comprises a plurality of cleaning tanks, a frame is arranged above the plurality of cleaning tanks, a driving component is installed on the frame, and the driving component is connected to the cleaning component through a lifting cylinder;

[0007] The cleaning assembly comprises a driving box, a cleaning basket and a gear, wherein the driving box is drivingly connected to the cleaning basket via the gear;

[0008] The cleaning tank comprises a tank body, an ultrasonic generator and a heating tube, wherein the heating tube is arranged at the bottom of the tank body, and the ultrasonic generator is installed on the side wall of the tank body.

[0009] A processing method for the surface treatment device of the above-mentioned nickel electroplated parts for processing nickel electroplated parts, comprising the following steps:

[0010] Place the nickel electroplated parts in the cleaning assembly, the driving assembly drives the cleaning assembly to move above several of the cleaning tanks in sequence, the lifting cylinder extends to immerse the cleaning assembly into the cleaning tank, and the ultrasonic generator and the heating tube are turned on for ultrasonic heating cleaning.

[0011] As a further scheme of the present invention, the preparation method of the nickel electroplated parts comprises the following steps:

[0012] S1. Take a substrate, polish to remove burrs, degrease with alkali, remove rust with acid, and activate to obtain a pretreated substrate;

[0013] S2. Take the pretreated substrate and spray a graphene composite slurry on its surface to obtain a graphene-modified substrate;

[0014] S3. Take the graphene-modified substrate for ultrasonic-assisted electrodeposition nickel plating to obtain the nickel electroplated parts.

[0015] As a further scheme of the present invention, it is characterized in that the preparation method of the graphene composite slurry in step S2 comprises the following steps:

[0016] S21. Take anthracite, crush, deash, and sieve, and perform graphitization treatment at 2500 °C for 2 - 4 h to obtain material A;

[0017] S22. Take the material A, sodium nitrate, and sulfuric acid solution, stir in an ice-water bath for 20 - 30 min, add potassium permanganate, stir at 30 - 40 °C for 1 - 2 h, add deionized water and hydrogen peroxide, stir in an oil bath at 98 °C for 15 - 25 min, filter, take the solid phase for washing, and vacuum freeze-dry to obtain material B;

[0018] S23. Take the material B and deionized water, ultrasonically disperse for 25 - 35 min, add cobalt chloride hexahydrate, ultrasonically disperse for 10 - 12 min, freeze-dry, perform heat treatment in a mixed atmosphere for 1 - 1.5 h, and cool to obtain material C;

[0019] S24. Take the material C, 2-hydroxypyridine, absolute ethanol, and deionized water, ultrasonically stir for 60 - 80 min to obtain the graphene composite slurry.

[0020] As a further scheme of the present invention, in step S22, the dosage ratio of the material A, sodium nitrate, sulfuric acid solution, potassium permanganate, deionized water, and hydrogen peroxide is 1 - 1.2 g: 0.74 - 0.76 g: 33 - 35 mL: 5 g: 50 mL: 4 - 6 mL.

[0021] As a further solution of the present invention, in step S23, the dosage ratio of the material B, deionized water, and cobalt chloride hexahydrate is 0.2 - 0.22 g: 100 mL: 1.4 - 1.6 mg; the mixed atmosphere refers to a mixed atmosphere composed of argon with a flow rate of 150 mL / min and ammonia with a flow rate of 50 mL / min; the temperature of the heat treatment is 650 - 750 °C.

[0022] As a further solution of the present invention, in step S24, the dosage ratio of the material C, 2-hydroxypyridine, absolute ethanol, and deionized water is 35 - 45 mg: 22 - 28 mg: 25 - 30 mL: 50 - 55 mL.

[0023] As a further solution of the present invention, in step S3, the anode plate used for nickel plating is a nickel plate, and the cathode plate is a graphene-modified substrate; the temperature during the nickel plating process is 30 - 50 °C, the current density is 2.6 A / dm 2 , and the electroplating time is 30 - 40 min.

[0024] As a further solution of the present invention, in step S3, the preparation method of the electroplating solution required for nickel plating includes the following steps:

[0025] S31. Take nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, cetyltrimethylammonium bromide, nano molybdenum disulfide, saccharin sodium, and deionized water and mix them, and perform ultrasonic stirring at 50 - 60 °C for 35 - 45 min to obtain the electroplating solution.

[0026] As a further solution of the present invention, the mass ratio of nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, cetyltrimethylammonium bromide, nano molybdenum disulfide, saccharin sodium, and deionized water is 17.4 - 17.6: 3.5 - 3.7: 0.7 - 0.9: 2.2 - 2.4: 3.2 - 3.4: 0.0016 - 0.0022: 0.37 - 0.45: 0.08 - 0.12: 80 - 85.

[0027] Advantages of the present invention:

[0028] A nickel electroplated part surface treatment device and its treatment method disclosed by the present invention place the electroplated nickel electroplated part in a cleaning basket. The servo motor drives the slider to sequentially pass through several cleaning tanks from left to right. After sliding above the cleaning tank, the lifting cylinder is controlled to extend to insert the cleaning component into the cleaning tank. At the same time, the driving box drives the cleaning basket to rotate, the heating tube heats the deionized water in the cleaning tank to 40 °C, the ultrasonic generator performs ultrasonic-assisted cleaning. After washing, the lifting cylinder retracts to drive the cleaning component to rise, and then moves to the next cleaning tank for cleaning again, improving the cleaning area and cleaning effect. Description of the Drawings

[0029] The present invention will be further described below with reference to the accompanying drawings.

[0030] Figure 1 is a schematic diagram of the overall structure of a surface treatment device for nickel-plated parts proposed by the present invention;

[0031] Figure 2 is a schematic diagram of the structure of a cleaning component of a surface treatment device for nickel-plated parts proposed by the present invention;

[0032] Figure 3 is a schematic diagram of the structure of a cleaning tank of a surface treatment device for nickel-plated parts proposed by the present invention.

[0033] In the figure: 1, frame; 2, drive component; 3, lifting cylinder; 4, cleaning component; 5, cleaning tank; 6, control panel; 7, base; 201, slider; 202, servo motor; 401, cleaning basket; 402, gear; 403, drive box; 404, housing; 501, tank body; 502, ultrasonic generator; 503, heating tube. Specific embodiments

[0034] The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, rather than all the embodiments. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present invention without creative efforts shall fall within the protection scope of the present invention.

[0035] As Figures 1 - 3 shown, a surface treatment device for nickel-plated parts includes a base 7, and a plurality of cleaning tanks 5 are installed on the base 7. A frame 1 is arranged above the cleaning tanks 5, and a drive component 2 is installed on the frame 1. The drive component 2 includes a slider 201 and a servo motor 202. The servo motor 202 is connected to the slider 201 through a ball screw;

[0036] A chute is opened on the frame 1. The slider 201 is sleeved on the rod of the ball screw and can be slidably installed in the chute. The servo motor 202 is installed at the right end of the frame 1. The output end of the servo motor 202 is axially connected to one end of the ball screw, and the other end of the ball screw is axially connected to the left end of the frame 1;

[0037] The bottom surface of the slider 201 is installed with a lifting cylinder 3, and the output end of the lifting cylinder 3 is connected with a cleaning component 4;

[0038] The cleaning assembly 4 includes a cleaning basket 401, a gear 402, a drive box 403 and a housing 404. The cleaning basket 401 is axially connected to the housing 404. The cleaning basket 401 is transmission-connected to the drive box 403 through the gear 402. The drive box 403 may be a power source driven by a drive motor, and its transmission connection method is a conventional technology well known to those skilled in the art.

[0039] A plurality of cleaning tanks 5 are sequentially arranged on the base 7. A heating tube 503 is installed at the bottom of the tank body 501 of each cleaning tank 5, and an ultrasonic generator 502 is installed on the inner wall of the tank body 501. All of them are water-proof and insulated.

[0040] A control panel 6 is also mounted on the frame 1 for controlling the operation of each component.

[0041] The working principle of the nickel electroplating surface treatment device and the treatment method disclosed in the present invention is as follows:

[0042] The surface cleaning treatment of the nickel-plated parts after nickel electroplating is performed by using the above-mentioned surface treatment device, which includes the following steps: placing the nickel-plated parts after electroplating in the cleaning basket 401, the servo motor 202 drives the slider 201 to pass through several cleaning tanks 5 from left to right in turn, and after sliding to the top of the cleaning tank 5, the lifting cylinder 3 is controlled to extend to insert the cleaning component 4 into the cleaning tank 5, and at the same time, the driving box 403 drives the cleaning basket 401 to rotate, the heating tube 503 heats the deionized water in the cleaning tank 5 to 40°C, and the ultrasonic generator 502 performs ultrasonic auxiliary cleaning. After washing, the lifting cylinder 3 is recovered to drive the cleaning component 4 to rise, and then moves to the next cleaning tank 5 for cleaning again. The cleaning area and cleaning effect are improved by rotating the cleaning basket 401 and ultrasonic auxiliary cleaning.

[0043] As a further technical solution of the present application, the method for preparing the above-mentioned nickel electroplated part comprises the following steps:

[0044] S1, grinding and removing burrs, alkaline washing and degreasing, pickling and derusting, and activating the substrate to obtain a pre-treated substrate;

[0045] S2, taking the pretreated substrate and spraying the graphene composite slurry on the surface thereof to obtain a graphene modified substrate;

[0046] The graphene composite slurry has a spraying thickness of 200 μm;

[0047] The preparation method of the graphene composite slurry comprises the following steps:

[0048] S21, taking anthracite (purchased from Guangdong Wengjiang Chemical Reagent Co., Ltd.), crushing, deashing, passing through a 325-mesh sieve, and graphitizing at 2500° C. for 2-4 hours to obtain material A;

[0049] The proportions of the main elements in the anthracite (the remainder is impurities) are shown in Table 1 below.

[0050] Table 1

[0051] C(％) H(％) N(％) O(％) S(％) 90.41 3.32 0.75 1.72 0.07

[0052] S22, mix the material A, sodium nitrate and sulfuric acid solution, stir in a water bath at 0-5°C for 20-30 min, add potassium permanganate, stir at 30-40°C for 1-2 h, add deionized water and hydrogen peroxide, stir in an oil bath at 98°C for 15-25 min, filter, wash the solid phase, and freeze-dry in vacuum to obtain material B;

[0053] S23, taking the material B and deionized water, mixing, ultrasonically dispersing for 25-35 minutes, adding cobalt chloride hexahydrate, ultrasonically dispersing for 10-12 minutes, freeze-drying, heat-treating in a mixed atmosphere for 1-1.5 hours, cooling, and obtaining material C; the mixed atmosphere refers to a mixed atmosphere composed of argon with a flow rate of 150 mL / min and ammonia with a flow rate of 50 mL / min; the temperature of the heat treatment is 650-750°C;

[0054] S24, mixing the material C, 2-hydroxypyridine, anhydrous ethanol and deionized water, and stirring ultrasonically for 60-80 minutes to obtain the graphene composite slurry;

[0055] S3, taking the graphene modified substrate and performing ultrasonic assisted electrodeposition nickel plating to obtain the nickel electroplated part;

[0056] The anode plate used for nickel plating is a nickel plate, and the cathode plate is a graphene modified substrate; the temperature of the nickel plating process is 30-50°C, and the current density is 2.6A / dm 2 , the electroplating time is 30-40min, and the coating thickness is 3mm;

[0057] The method for preparing the electroplating solution required for nickel plating comprises the following steps:

[0058] Nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, hexadecyltrimethylammonium bromide, nano molybdenum disulfide (purchased from Shanghai Haohong Biopharmaceutical Technology Co., Ltd.), sodium saccharin, and deionized water are mixed and ultrasonically stirred at 50-60° C. for 35-45 minutes to obtain the electroplating solution; the mass ratio of the nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, hexadecyltrimethylammonium bromide, nano molybdenum disulfide, sodium saccharin, and deionized water is 17.4-17.6: 3.5-3.7: 0.7-0.9: 2.2-2.4: 3.2-3.4: 0.0016-0.0022: 0.37-0.45: 0.08-0.12: 80-85;

[0059] Example 1

[0060] The preparation method of the nickel electroplated part comprises the following steps:

[0061] S1. Take a substrate, polish it to remove burrs, degrease it with alkali, remove rust with acid, and activate it to obtain a pretreated substrate;

[0062] The substrate is an iron substrate in the shape of a cuboid with a length of 80 mm, a width of 10 mm, and a thickness of 3 mm;

[0063] The polishing refers to polishing the burrs on the surface of the substrate flat with 400-mesh silicon carbide sandpaper;

[0064] The alkali washing refers to placing the polished substrate in 100 mL of alkali washing solution, impregnating it at 45 °C for 4 min, taking it out, washing, and drying; the alkali washing solution is prepared by mixing sodium hydroxide solution, trisodium phosphate solution, sodium carbonate solution, and Triton X-100 solution in a volume ratio of 3:1:0.4:0.1; the mass concentration of the sodium hydroxide solution is 26 g / L, the mass concentration of the trisodium phosphate solution is 35 g / L, the mass concentration of the sodium carbonate solution is 36 g / L, and the mass concentration of the Triton X-100 solution is 1.2 g / L;

[0065] The acid washing refers to placing the alkali-washed substrate in 100 mL of acid washing solution, impregnating it at 45 °C for 1 min, taking it out, washing, and drying; the acid washing solution is prepared by mixing hydrochloric acid solution, citric acid solution, and glacial acetic acid solution in a volume ratio of 3:0.1:0.5; the mass concentration of the hydrochloric acid solution is 26 g / L, the mass concentration of the citric acid solution is 60 mg / L, and the mass concentration of the glacial acetic acid solution is 20 g / L;

[0066] The activation refers to placing the acid-washed substrate in 100 mL of sulfuric acid solution with a mass concentration of 184 g / L, impregnating it at room temperature for 3 s for micro-etching activation, taking it out, washing, and drying;

[0067] S2. Take the pretreated substrate and spray graphene composite slurry on its surface to obtain a graphene-modified substrate; the spraying conditions are nozzle diameter of 30 μm, carrier gas volume flow rate of 50 sccm, sheath gas volume flow rate of 140 sccm, spraying speed of 10 mm / min, spraying distance of 8 mm, deposition temperature of 102 °C, and spraying time of 10 min;

[0068] The preparation method of the graphene composite slurry comprises the following steps:

[0069] S21. Take anthracite, crush it, deash it, pass it through a 325-mesh sieve, and perform graphitization treatment at 2500 °C for 2 h to obtain material A;

[0070] S22. Mix the material A, sodium nitrate, and sulfuric acid solution, stir in a 0°C water bath for 20 min, add potassium permanganate, stir at 30°C for 1 h, add deionized water and hydrogen peroxide, stir in an oil bath at 98°C for 15 min, filter, wash the solid phase, and perform vacuum freeze-drying to obtain material B; the dosage ratio of the material A, sodium nitrate, sulfuric acid solution, potassium permanganate, deionized water, and hydrogen peroxide is 1 g: 0.74 g: 33 mL: 5 g: 50 mL: 4 mL; the mass fraction of the sulfuric acid solution is 98%; the mass fraction of the hydrogen peroxide is 30%; the vacuum freeze-drying means drying at 10 Pa and -20°C for 5 h;

[0071] S23. Mix the material B and deionized water, perform ultrasonic dispersion for 25 min, add cobalt chloride hexahydrate, perform ultrasonic dispersion for 10 min, perform freeze-drying at -40°C for 6 h, perform heat treatment in a mixed atmosphere for 1 h, and cool to obtain material C; the dosage ratio of the material B, deionized water, and cobalt chloride hexahydrate is 0.2 g: 100 mL: 1.4 mg; the mixed atmosphere refers to a mixed atmosphere composed of argon with a flow rate of 150 mL / min and ammonia with a flow rate of 50 mL / min; the temperature of the heat treatment is 650°C;

[0072] S24. Mix the material C, 2-hydroxypyridine, absolute ethanol, and deionized water, perform ultrasonic stirring for 60 min to obtain the graphene composite slurry; the dosage ratio of the material C, 2-hydroxypyridine, absolute ethanol, and deionized water is 35 mg: 22 mg: 25 mL: 50 mL;

[0073] S3. Perform ultrasonic-assisted electrodeposition nickel plating on the graphene-modified substrate to obtain the nickel electroplated part;

[0074] The anode plate used for nickel plating is a nickel plate, and the cathode plate is a graphene-modified substrate; the temperature during the nickel plating process is 30°C, and the current density is 2.6 A / dm 2 ², and the electroplating time is 30 min;

[0075] The preparation method of the electroplating solution required for nickel plating includes the following steps:

[0076] Mix nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, cetyltrimethylammonium bromide, nano-molybdenum disulfide, saccharin sodium, and deionized water, and perform ultrasonic stirring at 50°C for 35 min to obtain the electroplating solution; the mass ratio of nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, cetyltrimethylammonium bromide, nano-molybdenum disulfide, saccharin sodium, and deionized water is 17.4: 3.5: 0.7: 2.2: 3.2: 0.0016: 0.37: 0.08: 80.

[0077] Example 2

[0078] The preparation method of the nickel electroplated part comprises the following steps:

[0079] S1. Take a substrate, polish it to remove burrs, degrease it with alkali, remove rust with acid, and activate it to obtain a pretreated substrate;

[0080] The substrate is an iron substrate in the shape of a cuboid with a length of 80 mm, a width of 10 mm, and a thickness of 3 mm;

[0081] The polishing refers to polishing the burrs on the surface of the substrate flat with 600 - mesh silicon carbide sandpaper;

[0082] The alkali washing refers to placing the polished substrate in 100 mL of alkali washing solution, impregnating it at 45 °C for 4.5 min, taking it out, washing, and drying; the alkali washing solution is prepared by uniformly mixing sodium hydroxide solution, trisodium phosphate solution, sodium carbonate solution, and Triton X - 100 solution in a volume ratio of 3.5:1.1:0.5:0.15; the mass concentration of the sodium hydroxide solution is 26 g / L, the mass concentration of the trisodium phosphate solution is 35 g / L, the mass concentration of the sodium carbonate solution is 36 g / L, and the mass concentration of the Triton X - 100 solution is 1.2 g / L;

[0083] The acid washing refers to placing the alkali - washed substrate in 100 mL of acid washing solution, impregnating it at 45 °C for 1.5 min, taking it out, washing, and drying; the acid washing solution is prepared by uniformly mixing hydrochloric acid solution, citric acid solution, and glacial acetic acid solution in a volume ratio of 3.5:0.15:0.6; the mass concentration of the hydrochloric acid solution is 26 g / L, the mass concentration of the citric acid solution is 60 mg / L, and the mass concentration of the glacial acetic acid solution is 20 g / L;

[0084] The activation refers to placing the acid - washed substrate in 100 mL of sulfuric acid solution with a mass concentration of 184 g / L, impregnating it at room temperature for 4 s for micro - etching activation, taking it out, washing, and drying;

[0085] S2. Take the pretreated substrate and spray graphene composite slurry on its surface to obtain a graphene - modified substrate; the spraying conditions are: nozzle diameter is 30 μm, carrier gas volume flow rate is 50 sccm, sheath gas volume flow rate is 140 sccm, spraying speed is 10 mm / min, spraying distance is 8 mm, deposition temperature is 102 °C, and spraying time is 10 min;

[0086] The preparation method of the graphene composite slurry comprises the following steps:

[0087] S21. Take anthracite, crush it, deash it, pass it through a 325 - mesh sieve, and carry out graphitization treatment at 2500 °C for 3 h to obtain material A;

[0088] S22. Mix the material A, sodium nitrate, and sulfuric acid solution, stir in a 2°C water bath for 25 min, add potassium permanganate, stir at 35°C for 1.5 h, add deionized water and hydrogen peroxide, stir in a 98°C oil bath for 20 min, filter, wash the solid phase, and perform vacuum freeze-drying to obtain material B; the dosage ratio of the material A, sodium nitrate, sulfuric acid solution, potassium permanganate, deionized water, and hydrogen peroxide is 1.1 g: 0.75 g: 34 mL: 5 g: 50 mL: 5 mL; the mass fraction of the sulfuric acid solution is 98%; the mass fraction of the hydrogen peroxide is 30%; the vacuum freeze-drying means drying at 15 Pa and -20°C for 6 h;

[0089] S23. Mix the material B and deionized water, perform ultrasonic dispersion for 30 min, add cobalt chloride hexahydrate, perform ultrasonic dispersion for 11 min, perform freeze-drying at -30°C for 7 h, perform heat treatment in a mixed atmosphere for 1.2 h, and cool to obtain material C; the dosage ratio of the material B, deionized water, and cobalt chloride hexahydrate is 0.21 g: 100 mL: 1.5 mg; the mixed atmosphere refers to a mixed atmosphere composed of argon with a flow rate of 150 mL / min and ammonia with a flow rate of 50 mL / min; the temperature of the heat treatment is 700°C;

[0090] S24. Mix the material C, 2-hydroxypyridine, absolute ethanol, and deionized water, perform ultrasonic stirring for 70 min to obtain the graphene composite slurry; the dosage ratio of the material C, 2-hydroxypyridine, absolute ethanol, and deionized water is 40 mg: 25 mg: 28 mL: 53 mL;

[0091] S3. Perform ultrasonic-assisted electrodeposition nickel plating on the graphene-modified substrate to obtain the nickel electroplated part;

[0092] The anode plate used for nickel plating is a nickel plate, and the cathode plate is a graphene-modified substrate; the temperature during the nickel plating process is 40°C, the current density is 2.6 A / dm 2 , and the electroplating time is 35 min;

[0093] The preparation method of the electroplating solution required for nickel plating includes the following steps:

[0094] Mix nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, cetyltrimethylammonium bromide, nano-molybdenum disulfide, saccharin sodium, and deionized water, and perform ultrasonic stirring at 55°C for 40 min to obtain the electroplating solution; the mass ratio of nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, cetyltrimethylammonium bromide, nano-molybdenum disulfide, saccharin sodium, and deionized water is 17.5: 3.6: 0.8: 2.3: 3.3: 0.0019: 0.41: 0.1: 83.

[0095] Example 3

[0096] The preparation method of the nickel electroplated part comprises the following steps:

[0097] S1. Take a substrate, polish it to remove burrs, degrease it with alkali, remove rust with acid, and activate it to obtain a pretreated substrate;

[0098] The substrate is an iron substrate in the shape of a cuboid with a length of 80 mm, a width of 10 mm, and a thickness of 3 mm;

[0099] The polishing refers to polishing the burrs on the surface of the substrate flat with 800-mesh silicon carbide sandpaper;

[0100] The alkali washing refers to placing the polished substrate in 100 mL of alkali washing solution, impregnating it at 45 °C for 5 min, taking it out, washing, and drying; the alkali washing solution is prepared by uniformly mixing sodium hydroxide solution, trisodium phosphate solution, sodium carbonate solution, and Triton X-100 solution according to a volume ratio of 4:1.2:0.6:0.2; the mass concentration of the sodium hydroxide solution is 26 g / L, the mass concentration of the trisodium phosphate solution is 35 g / L, the mass concentration of the sodium carbonate solution is 36 g / L, and the mass concentration of the Triton X-100 solution is 1.2 g / L;

[0101] The acid washing refers to placing the alkali-washed substrate in 100 mL of acid washing solution, impregnating it at 45 °C for 2 min, taking it out, washing, and drying; the acid washing solution is prepared by uniformly mixing hydrochloric acid solution, citric acid solution, and glacial acetic acid solution according to a volume ratio of 4:0.2:0.7; the mass concentration of the hydrochloric acid solution is 26 g / L, the mass concentration of the citric acid solution is 60 mg / L, and the mass concentration of the glacial acetic acid solution is 20 g / L;

[0102] The activation refers to placing the acid-washed substrate in 100 mL of sulfuric acid solution with a mass concentration of 184 g / L, impregnating it at room temperature for 5 s for micro-etching activation, taking it out, washing, and drying;

[0103] S2. Take the pretreated substrate and spray graphene composite slurry on its surface to obtain a graphene-modified substrate; the spraying conditions are: nozzle diameter is 30 μm, carrier gas volume flow rate is 50 sccm, sheath gas volume flow rate is 140 sccm, spraying speed is 10 mm / min, spraying distance is 8 mm, deposition temperature is 102 °C, and spraying time is 10 min;

[0104] The preparation method of the graphene composite slurry comprises the following steps:

[0105] S21. Take anthracite, crush it, deash it, pass it through a 325-mesh sieve, and perform graphitization treatment at 2500 °C for 4 h to obtain material A;

[0106] S22. Mix the material A, sodium nitrate, and sulfuric acid solution, stir in a 5°C water bath for 30 min, add potassium permanganate, stir at 40°C for 2 h, add deionized water and hydrogen peroxide, stir in an oil bath at 98°C for 25 min, filter, wash the solid phase, and perform vacuum freeze-drying to obtain material B. The dosage ratio of the material A, sodium nitrate, sulfuric acid solution, potassium permanganate, deionized water, and hydrogen peroxide is 1.2 g: 0.76 g: 35 mL: 5 g: 50 mL: 6 mL. The mass fraction of the sulfuric acid solution is 98%. The mass fraction of the hydrogen peroxide is 30%. The vacuum freeze-drying means drying at 20 Pa and -20°C for 7 h.

[0107] S23. Mix the material B and deionized water, perform ultrasonic dispersion for 35 min, add cobalt chloride hexahydrate, perform ultrasonic dispersion for 12 min, perform freeze-drying at -20°C for 8 h, perform heat treatment in a mixed atmosphere for 1.5 h, and cool to obtain material C. The dosage ratio of the material B, deionized water, and cobalt chloride hexahydrate is 0.22 g: 100 mL: 1.6 mg. The mixed atmosphere refers to a mixed atmosphere composed of argon with a flow rate of 150 mL / min and ammonia with a flow rate of 50 mL / min. The temperature of the heat treatment is 750°C.

[0108] S24. Mix the material C, 2-hydroxypyridine, absolute ethanol, and deionized water, perform ultrasonic stirring for 80 min to obtain the graphene composite slurry. The dosage ratio of the material C, 2-hydroxypyridine, absolute ethanol, and deionized water is 45 mg: 28 mg: 30 mL: 55 mL.

[0109] S3. Perform ultrasonic-assisted electrodeposition nickel plating on the graphene-modified substrate to obtain the nickel electroplated part.

[0110] The anode plate used for nickel plating is a nickel plate, and the cathode plate is a graphene-modified substrate. The temperature during the nickel plating process is 50°C, the current density is 2.6 A / dm 2 , and the electroplating time is 40 min.

[0111] The preparation method of the electroplating solution required for the nickel plating includes the following steps:

[0112] Mix nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, cetyltrimethylammonium bromide, nano-molybdenum disulfide, saccharin sodium, and deionized water, and perform ultrasonic stirring at 60°C for 45 min to obtain the electroplating solution. The mass ratio of nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, cetyltrimethylammonium bromide, nano-molybdenum disulfide, saccharin sodium, and deionized water is 17.6: 3.7: 0.9: 2.4: 3.4: 0.0022: 0.45: 0.12: 85.

[0113] Comparative Example 1

[0114] The preparation method of the nickel electroplated part comprises the following steps:

[0115] S1. Take a substrate, polish it to remove burrs, degrease it with alkali, remove rust with acid, and activate it to obtain a pretreated substrate;

[0116] The substrate is an iron substrate in the shape of a cuboid with a length of 80 mm, a width of 10 mm, and a thickness of 3 mm;

[0117] The polishing refers to polishing the burrs on the surface of the substrate flat with 600 - mesh silicon carbide sandpaper;

[0118] The alkali cleaning refers to placing the polished substrate in 100 mL of alkali cleaning solution, impregnating it at 45 °C for 4.5 min, taking it out, washing, and drying; the alkali cleaning solution is prepared by mixing sodium hydroxide solution, trisodium phosphate solution, sodium carbonate solution, and Triton X - 100 solution in a volume ratio of 3.5:1.1:0.5:0.15; the mass concentration of the sodium hydroxide solution is 26 g / L, the mass concentration of the trisodium phosphate solution is 35 g / L, the mass concentration of the sodium carbonate solution is 36 g / L, and the mass concentration of the Triton X - 100 solution is 1.2 g / L;

[0119] The acid cleaning refers to placing the alkali - cleaned substrate in 100 mL of acid cleaning solution, impregnating it at 45 °C for 1.5 min, taking it out, washing, and drying; the acid cleaning solution is prepared by mixing hydrochloric acid solution, citric acid solution, and glacial acetic acid solution in a volume ratio of 3.5:0.15:0.6; the mass concentration of the hydrochloric acid solution is 26 g / L, the mass concentration of the citric acid solution is 60 mg / L, and the mass concentration of the glacial acetic acid solution is 20 g / L;

[0120] The activation refers to placing the acid - cleaned substrate in 100 mL of sulfuric acid solution with a mass concentration of 184 g / L, impregnating it at room temperature for 4 s for micro - etching activation, taking it out, washing, and drying;

[0121] S2. Take the pretreated substrate and perform ultrasonic - assisted electro - deposition nickel plating to obtain the nickel electroplated part;

[0122] The anode plate used for nickel plating is a nickel plate, and the cathode plate is a graphene - modified substrate; the temperature during the nickel plating process is 40 °C, the current density is 2.6 A / dm 2 , and the electroplating time is 35 min;

[0123] The preparation method of the electroplating solution required for nickel plating comprises the following steps:

[0124] Mix nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, cetyltrimethylammonium bromide, nano-molybdenum disulfide, saccharin sodium, and deionized water, and ultrasonically stir at 55 °C for 40 min to obtain the electroplating solution; the mass ratio of nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, cetyltrimethylammonium bromide, nano-molybdenum disulfide, saccharin sodium, and deionized water is 17.5: 3.6: 0.8: 2.3: 3.3: 0.0019: 0.41: 0.1: 83.

[0125] Comparative Example 2

[0126] The preparation method of the nickel electroplated part includes the following steps:

[0127] S1. Take the substrate, polish to remove burrs, degrease with alkali, remove rust with acid, and activate to obtain a pretreated substrate;

[0128] The substrate is an iron substrate in the shape of a cuboid with a length of 80 mm, a width of 10 mm, and a thickness of 3 mm;

[0129] The polishing refers to polishing the burrs on the surface of the substrate flat with 600-mesh silicon carbide sandpaper;

[0130] The alkali washing refers to placing the polished substrate in 100 mL of alkali washing solution and impregnating at 45 °C for 4.5 min, taking it out, washing, and drying; the alkali washing solution is prepared by mixing sodium hydroxide solution, trisodium phosphate solution, sodium carbonate solution, and Triton X-100 solution in a volume ratio of 3.5: 1.1: 0.5: 0.15; the mass concentration of the sodium hydroxide solution is 26 g / L, the mass concentration of the trisodium phosphate solution is 35 g / L, the mass concentration of the sodium carbonate solution is 36 g / L, and the mass concentration of the Triton X-100 solution is 1.2 g / L;

[0131] The acid washing refers to placing the alkali-washed substrate in 100 mL of acid washing solution and impregnating at 45 °C for 1.5 min, taking it out, washing, and drying; the acid washing solution is prepared by mixing hydrochloric acid solution, citric acid solution, and glacial acetic acid solution in a volume ratio of 3.5: 0.15: 0.6; the mass concentration of the hydrochloric acid solution is 26 g / L, the mass concentration of the citric acid solution is 60 mg / L, and the mass concentration of the glacial acetic acid solution is 20 g / L;

[0132] The activation refers to placing the acid-washed substrate in 100 mL of sulfuric acid solution with a mass concentration of 184 g / L and impregnating at room temperature for 4 s for micro-etching activation, taking it out, washing, and drying;

[0133] S2. Spray the graphene composite slurry on the surface of the pretreated substrate to obtain a graphene-modified substrate. The spraying conditions are as follows: nozzle diameter is 30 μm, carrier gas flow rate is 50 sccm, sheath gas flow rate is 140 sccm, spraying speed is 10 mm / min, spraying distance is 8 mm, deposition temperature is 102 °C, and spraying time is 10 min.

[0134] The preparation method of the graphene composite slurry includes the following steps:

[0135] S21. Crush anthracite, deash it, and pass it through a 325-mesh sieve. Then, perform graphitization treatment at 2500 °C for 3 h to obtain material A.

[0136] S22. Mix material A, sodium nitrate, and sulfuric acid solution, stir in a water bath at 2 °C for 25 min, add potassium permanganate, stir at 35 °C for 1.5 h, add deionized water and hydrogen peroxide, stir in an oil bath at 98 °C for 20 min, filter, wash the solid phase, and perform vacuum freeze-drying to obtain material B. The dosage ratio of material A, sodium nitrate, sulfuric acid solution, potassium permanganate, deionized water, and hydrogen peroxide is 1.1 g: 0.75 g: 34 mL: 5 g: 50 mL: 5 mL. The mass fraction of the sulfuric acid solution is 98%. The mass fraction of the hydrogen peroxide is 30%. The vacuum freeze-drying means drying at 15 Pa and -20 °C for 6 h.

[0137] S23. Mix material B and deionized water, perform ultrasonic dispersion for 30 min, perform freeze-drying at -30 °C for 7 h, perform heat treatment in a mixed atmosphere for 1.2 h, and then cool to obtain material C. The dosage ratio of material B and deionized water is 0.21 g: 100 mL. The mixed atmosphere is composed of argon with a flow rate of 150 mL / min and ammonia with a flow rate of 50 mL / min. The temperature of the heat treatment is 700 °C.

[0138] S24. Mix material C, 2-hydroxypyridine, absolute ethanol, and deionized water, perform ultrasonic stirring for 70 min to obtain the graphene composite slurry. The dosage ratio of material C, 2-hydroxypyridine, absolute ethanol, and deionized water is 40 mg: 25 mg: 28 mL: 53 mL.

[0139] S3. Perform ultrasonic-assisted electrodeposition nickel plating on the graphene-modified substrate to obtain the nickel electroplated part.

[0140] The anode plate used for nickel plating is a nickel plate, and the cathode plate is the graphene-modified substrate. The temperature during the nickel plating process is 40 °C, the current density is 2.6 A / dm 2 , and the electroplating time is 35 min.

[0141] The preparation method of the electroplating solution required for nickel plating includes the following steps:

[0142] Mix nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, cetyltrimethylammonium bromide, nano molybdenum disulfide, saccharin sodium, and deionized water, and stir ultrasonically at 55 °C for 40 min to obtain the electroplating solution; the mass ratio of nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, cetyltrimethylammonium bromide, nano molybdenum disulfide, saccharin sodium, and deionized water is 17.5:3.6:0.8:2.3:3.3:0.0019:0.41:0.1:83.

[0143] Comparative Example 3

[0144] The preparation method of the nickel electroplated part includes the following steps:

[0145] S1. Take the substrate, polish to remove burrs, degrease with alkali, remove rust with acid, and activate to obtain a pretreated substrate;

[0146] The substrate is an iron substrate in the shape of a cuboid with a length of 80 mm, a width of 10 mm, and a thickness of 3 mm;

[0147] The polishing refers to polishing the burrs on the surface of the substrate flat with 600-mesh silicon carbide sandpaper;

[0148] The alkali washing refers to placing the polished substrate in 100 mL of alkali washing solution and impregnating it at 45 °C for 4.5 min, taking it out, washing, and drying; the alkali washing solution is prepared by mixing sodium hydroxide solution, trisodium phosphate solution, sodium carbonate solution, and Triton X-100 solution in a volume ratio of 3.5:1.1:0.5:0.15; the mass concentration of the sodium hydroxide solution is 26 g / L, the mass concentration of the trisodium phosphate solution is 35 g / L, the mass concentration of the sodium carbonate solution is 36 g / L, and the mass concentration of the Triton X-100 solution is 1.2 g / L;

[0149] The acid washing refers to placing the alkali-washed substrate in 100 mL of acid washing solution and impregnating it at 45 °C for 1.5 min, taking it out, washing, and drying; the acid washing solution is prepared by mixing hydrochloric acid solution, citric acid solution, and glacial acetic acid solution in a volume ratio of 3.5:0.15:0.6; the mass concentration of the hydrochloric acid solution is 26 g / L, the mass concentration of the citric acid solution is 60 mg / L, and the mass concentration of the glacial acetic acid solution is 20 g / L;

[0150] The activation refers to placing the acid-washed substrate in 100 mL of sulfuric acid solution with a mass concentration of 184 g / L and impregnating it at room temperature for 4 s for micro-etching activation, taking it out, washing, and drying;

[0151] S2. Spraying a graphene composite slurry on the surface of the pre-treated substrate to obtain a graphene-modified substrate; the spraying conditions are as follows: nozzle diameter is 30 μm, carrier gas volume flow rate is 50 sccm, sheath gas volume flow rate is 140 sccm, spraying speed is 10 mm / min, spraying distance is 8 mm, deposition temperature is 102 °C, and spraying time is 10 min;

[0152] The preparation method of the graphene composite slurry comprises the following steps:

[0153] S21. Crushing anthracite, deashing it, passing it through a 325-mesh sieve, and subjecting it to graphitization treatment at 2500 °C for 3 h to obtain material A;

[0154] S22. Mixing the material A, sodium nitrate, and sulfuric acid solution, stirring in a water bath at 2 °C for 25 min, adding potassium permanganate, stirring at 35 °C for 1.5 h, adding deionized water and hydrogen peroxide, stirring in an oil bath at 98 °C for 20 min, filtering, washing the solid phase, and performing vacuum freeze-drying to obtain material B; the dosage ratio of the material A, sodium nitrate, sulfuric acid solution, potassium permanganate, deionized water, and hydrogen peroxide is 1.1 g: 0.75 g: 34 mL: 5 g: 50 mL: 5 mL; the mass fraction of the sulfuric acid solution is 98%; the mass fraction of the hydrogen peroxide is 30%; the vacuum freeze-drying means drying at 15 Pa and -20 °C for 6 h;

[0155] S23. Mixing the material B and deionized water, ultrasonically dispersing for 30 min, adding cobalt chloride hexahydrate, ultrasonically dispersing for 11 min, performing freeze-drying at -30 °C for 7 h, performing heat treatment in an argon atmosphere for 1.2 h, and cooling to obtain material C; the dosage ratio of the material B, deionized water, and cobalt chloride hexahydrate is 0.21 g: 100 mL: 1.5 mg; the temperature of the heat treatment is 700 °C;

[0156] S24. Mixing the material C, 2-hydroxypyridine, absolute ethanol, and deionized water, and ultrasonically stirring for 70 min to obtain the graphene composite slurry; the dosage ratio of the material C, 2-hydroxypyridine, absolute ethanol, and deionized water is 40 mg: 25 mg: 28 mL: 53 mL;

[0157] S3. Performing ultrasonic-assisted electrodeposition nickel plating on the graphene-modified substrate to obtain the nickel electroplated part;

[0158] The anode plate used for nickel plating is a nickel plate, and the cathode plate is a graphene-modified substrate; the temperature during the nickel plating process is 40 °C, the current density is 2.6 A / dm 2 , and the electroplating time is 35 min;

[0159] The preparation method of the electroplating solution required for nickel plating comprises the following steps:

[0160] Mix nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, cetyltrimethylammonium bromide, nano-molybdenum disulfide, saccharin sodium, and deionized water, and perform ultrasonic stirring at 55 °C for 40 min to obtain the electroplating solution; the mass ratio of nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, cetyltrimethylammonium bromide, nano-molybdenum disulfide, saccharin sodium, and deionized water is 17.5:3.6:0.8:2.3:3.3:0.0019:0.41:0.1:83.

[0161] Comparative Example 4

[0162] The preparation method of the nickel electroplated part includes the following steps:

[0163] S1. Take the substrate, polish to remove burrs, degrease by alkali washing, remove rust by acid washing, and activate to obtain a pretreated substrate;

[0164] The substrate is an iron substrate in the shape of a cuboid with a length of 80 mm, a width of 10 mm, and a thickness of 3 mm;

[0165] The polishing refers to polishing the burrs on the surface of the substrate flat with 600-mesh silicon carbide sandpaper;

[0166] The alkali washing refers to immersing the polished substrate in 100 mL of alkali washing solution at 45 °C for 4.5 min, taking it out, washing, and drying; the alkali washing solution is prepared by mixing sodium hydroxide solution, trisodium phosphate solution, sodium carbonate solution, and Triton X-100 solution in a volume ratio of 3.5:1.1:0.5:0.15; the mass concentration of the sodium hydroxide solution is 26 g / L, the mass concentration of the trisodium phosphate solution is 35 g / L, the mass concentration of the sodium carbonate solution is 36 g / L, and the mass concentration of the Triton X-100 solution is 1.2 g / L;

[0167] The acid washing refers to immersing the alkali-washed substrate in 100 mL of acid washing solution at 45 °C for 1.5 min, taking it out, washing, and drying; the acid washing solution is prepared by mixing hydrochloric acid solution, citric acid solution, and glacial acetic acid solution in a volume ratio of 3.5:0.15:0.6; the mass concentration of the hydrochloric acid solution is 26 g / L, the mass concentration of the citric acid solution is 60 mg / L, and the mass concentration of the glacial acetic acid solution is 20 g / L;

[0168] The activation refers to immersing the acid-washed substrate in 100 mL of sulfuric acid solution with a mass concentration of 184 g / L at room temperature for 4 s for micro-etching activation, taking it out, washing, and drying;

[0169] S2. Spray the graphene composite slurry on the surface of the pretreated substrate to obtain a graphene-modified substrate. The spraying conditions are as follows: nozzle diameter is 30 μm, carrier gas volume flow rate is 50 sccm, sheath gas volume flow rate is 140 sccm, spraying speed is 10 mm / min, spraying distance is 8 mm, deposition temperature is 102 °C, and spraying time is 10 min.

[0170] The preparation method of the graphene composite slurry includes the following steps:

[0171] S21. Crush, deash, and pass anthracite through a 325-mesh sieve, and perform graphitization treatment at 2500 °C for 3 h to obtain material A.

[0172] S22. Mix the material A, sodium nitrate, and sulfuric acid solution, stir in a water bath at 2 °C for 25 min, add potassium permanganate, stir at 35 °C for 1.5 h, add deionized water and hydrogen peroxide, stir in an oil bath at 98 °C for 20 min, filter, wash the solid phase, and perform vacuum freeze-drying to obtain material B. The dosage ratio of the material A, sodium nitrate, sulfuric acid solution, potassium permanganate, deionized water, and hydrogen peroxide is 1.1 g: 0.75 g: 34 mL: 5 g: 50 mL: 5 mL. The mass fraction of the sulfuric acid solution is 98%. The mass fraction of the hydrogen peroxide is 30%. The vacuum freeze-drying means drying at 15 Pa and -20 °C for 6 h.

[0173] S23. Mix the material B and deionized water, perform ultrasonic dispersion for 30 min, add cobalt chloride hexahydrate, perform ultrasonic dispersion for 11 min, perform freeze-drying at -30 °C for 7 h, perform heat treatment in a mixed atmosphere for 1.2 h, and cool to obtain material C. The dosage ratio of the material B, deionized water, and cobalt chloride hexahydrate is 0.21 g: 100 mL: 1.5 mg. The mixed atmosphere is composed of argon with a flow rate of 150 mL / min and ammonia with a flow rate of 50 mL / min. The temperature of the heat treatment is 700 °C.

[0174] S24. Mix the material C, absolute ethanol, and deionized water, perform ultrasonic stirring for 70 min to obtain the graphene composite slurry. The dosage ratio of the material C, 2-hydroxypyridine, absolute ethanol, and deionized water is 40 mg: 28 mL: 53 mL.

[0175] S3. Perform ultrasonic-assisted electrodeposition nickel plating on the graphene-modified substrate to obtain the nickel electroplated part.

[0176] The anode plate used for nickel plating is a nickel plate, and the cathode plate is the graphene-modified substrate. The temperature during the nickel plating process is 40 °C, and the current density is 2.6 A / dm 2 , and the electroplating time is 35 min.

[0177] The preparation method of the electroplating solution required for nickel plating comprises the following steps:

[0178] Take nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, cetyltrimethylammonium bromide, nano molybdenum disulfide, saccharin sodium, and deionized water, mix them, and perform ultrasonic stirring at 55 °C for 40 min to obtain the electroplating solution; the mass ratio of nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, cetyltrimethylammonium bromide, nano molybdenum disulfide, saccharin sodium, and deionized water is 17.5:3.6:0.8:2.3:3.3:0.0019:0.41:0.1:83.

[0179] Comparative Example 5

[0180] The difference from Example 2 is that saccharin sodium is not added in the preparation method of the electroplating solution required for nickel plating.

[0181] Comparative Example 6

[0182] The difference from Example 2 is that nano molybdenum disulfide is not added in the preparation method of the electroplating solution required for nickel plating.

[0183] Performance Test

[0184] Take the nickel electroplated parts prepared in Examples 1-3 and Comparative Examples 1-6 for wear resistance testing.

[0185] The sliding friction and wear test of the coating is carried out according to the national standard GB / T 12444-2006. The CSM ball friction and wear test equipment is used to test the samples. The test results are expressed by the loss amount (mg) of the weight difference before and after the friction test. During the test, a tribometer is used to monitor the friction coefficient. The test results are shown in Table 2 below.

[0186] Table 2

[0187] Friction loss (mg) Coefficient of friction Example 1 2.071 0.212 Example 2 2.062 0.208 Example 3 2.068 0.210 Comparative Example 1 5.412 0.735 Comparative Example 2 3.711 0.543 Comparative Example 3 3.248 0.507 Comparative Example 4 4.522 0.629 Comparative Example 5 2.447 0.343 Comparative Example 6 2.796 0.382

[0188] As can be seen from Table 2, the nickel electroplated parts prepared in Examples 1-3 of the present application have good wear resistance; by activating the substrate in the present application, it is convenient to coat the graphene composite slurry on the surface of the substrate. By performing dispersion treatment on the graphene and doping cobalt and nitrogen atoms, the pyridine ring is inclined to adsorb on the surface of the graphene to form a dislocation step surface, and then a nickel plating layer is electrodeposited, so that the stress in the nickel electroplated parts is dispersed during the wear process, improving the wear resistance; further, adding wear-resistant nano molybdenum disulfide and saccharin sodium with the effect of refining grains in the electroplating solution increases the wear resistance of the nickel electroplated parts.

[0189] The above has described some embodiments of the present invention in detail, but the above content is only the preferred embodiments of the present invention and cannot be considered as defining the scope of implementation of the present invention. All equivalent changes and improvements made in accordance with the scope of the application of the present invention shall still fall within the scope covered by the patent of the present invention.

Claims

1. A method for preparing a nickel electroplated part, characterized in that: The method for preparing the nickel electroplated part comprises the following steps: S1, grinding and removing burrs, alkaline washing and degreasing, pickling and derusting, and activating the substrate to obtain a pre-treated substrate; S2, taking the pretreated substrate and spraying the graphene composite slurry on the surface thereof to obtain a graphene modified substrate; S3, taking the graphene modified substrate and performing ultrasonic assisted electrodeposition nickel plating to obtain a nickel electroplated part; The method for preparing the graphene composite slurry in step S2 comprises the following steps: S21, crushing, deashing, and sieving anthracite, and graphitizing the anthracite at 2500° C. for 2-4 hours to obtain material A; S22, mix material A, sodium nitrate and sulfuric acid solution, stir in an ice-water bath for 20-30 min, add potassium permanganate, stir at 30-40°C for 1-2 h, add deionized water and hydrogen peroxide, stir in an oil bath at 98°C for 15-25 min, filter, wash the solid phase, and freeze-dry in vacuum to obtain material B; S23, taking material B and deionized water, mixing, ultrasonically dispersing for 25-35 minutes, adding cobalt chloride hexahydrate, ultrasonically dispersing for 10-12 minutes, freeze-drying, heat-treating in a mixed atmosphere for 1-1.5 hours, cooling, and obtaining material C; the dosage ratio of material B, deionized water, and cobalt chloride hexahydrate is 0.2-0.22 g:100 mL:1.4-1.6 mg; S24, taking material C, 2-hydroxypyridine, anhydrous ethanol, and deionized water, mixing them, and ultrasonically stirring for 60-80 minutes to obtain a graphene composite slurry; the amount ratio of the material C, 2-hydroxypyridine, anhydrous ethanol, and deionized water is 35-45 mg: 22-28 mg: 25-30 mL: 50-55 mL; The method for preparing the electroplating solution required for nickel plating comprises the following steps: Nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, hexadecyltrimethylammonium bromide, nano molybdenum disulfide, sodium saccharin and deionized water are mixed and ultrasonically stirred at 50-60° C. for 35-45 minutes to obtain the electroplating solution; the mass ratio of the nickel sulfate hexahydrate, nickel chloride hexahydrate, sodium hypophosphite, citric acid, boric acid, hexadecyltrimethylammonium bromide, nano molybdenum disulfide, sodium saccharin and deionized water is 17.4-17.6: 3.5-3.7: 0.7-0.9: 2.2-2.4: 3.2-3.4: 0.0016-0.0022: 0.37-0.45: 0.08-0.12: 80-85.

2. The method for preparing a nickel-plated part according to claim 1, characterized in that: In step S22, the dosage ratio of material A, sodium nitrate, sulfuric acid solution, potassium permanganate, deionized water and hydrogen peroxide is 1-1.2 g: 0.74-0.76 g: 33-35 mL: 5 g: 50 mL: 4-6 mL.

3. The method for preparing a nickel-plated part according to claim 1, characterized in that: In step S23, the mixed atmosphere refers to a mixed atmosphere composed of argon gas with a flow rate of 150 mL / min and ammonia gas with a flow rate of 50 mL / min; the temperature of the heat treatment is 650-750°C.

4. The method for preparing a nickel-plated part according to claim 1, characterized in that: In step S3, the anode plate used for nickel plating is a nickel plate, and the cathode plate is a graphene modified substrate; the temperature of the nickel plating process is 30-50°C, and the current density is 2.6A / dm 2 , the electroplating time is 30-40min.

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