Washing device for producing positive electrode material from ternary precursor

Abstract

The invention relates to the technical field of new energy automobiles, in particular to a washing device for a ternary precursor production positive electrode material, which comprises a chassis, a bracket, an evaporation tank, a vertical plate, a liquefaction mechanism, a reaction kettle, a stirrer, a filtering mechanism, a flushing mechanism, a first valve, an air pipe, a tee joint and a second valve, the support and the evaporation tank are fixedly connected to the left end and the right end of the upper surface of the chassis respectively, a heater is arranged in the evaporation tank, and a solution is heated through the evaporation tank; the vertical plate is vertically and fixedly connected to the upper surface of the evaporation tank; the liquefying mechanism is fixedly connected to the top end of the vertical plate; the reaction kettle is fixedly connected to the top end of the bracket; the stirrer and the filtering mechanism are installed at the upper end and the lower end of the reaction kettle respectively, the solution is stirred through the stirrer, and the washing efficiency is improved. The reaction kettle has a deionized water extraction function, can be recycled, saves water resources, realizes comprehensive washing of the reaction kettle, prevents residues of impurities and byproducts, and avoids affecting the quality and efficiency of secondary washing.

Description

Technical Field

[0001] The present invention relates to the technical field of new energy vehicles, and in particular to a water washing device for producing positive electrode materials from ternary precursors. Background Art

[0002] The ternary precursor material is nickel cobalt manganese hydroxide, which is an excellent material for the positive electrode of new energy vehicle batteries. The battery with ternary materials as the positive electrode is safer than the lithium cobalt oxide battery. The production process of ternary precursors includes ingredients, chemical reactions, precipitation filtration, washing, calcination, cooling and grinding, and water washing is to remove impurities and harmful substances; After precipitation and filtration, the ternary precursor filter cake is mixed with deionized water and washed with water under the action of an agitator. For example, the invention with the publication number CN219073763U discloses a water washing device for producing positive electrode materials from ternary precursors, including a water washing box, a circulation mechanism is fixedly connected to the bottom of one side of the water washing box, and the circulation mechanism includes a base, the base and the bottom of one side of the water washing box are fixed to each other, and one side of the base is fixedly connected to a high-flow circulation pump, and both ends of the high-flow circulation pump are fixedly connected to circulation pipes. The middle of the bottom of both ends of the water washing box is provided with circulation ports. It is inevitable that some impurities and by-products will remain. If these residues are not removed in time, it will affect the quality and efficiency of the next reaction. Although stirring with a stirring rod can make the water washing more complete, each water washing requires a large amount of deionized water, which causes a waste of water resources when the water cannot be purified. After each water washing, impurities or by-products will remain on the inner wall of the washing box, which will affect the quality and efficiency of the next water washing. Therefore, the water washing requirements of the ternary precursor cannot be met. Summary of the invention

[0003] In order to overcome the shortcomings of the prior art that water cannot be purified, water washing wastes water resources, and the water washing environment cannot be cleaned, the present invention proposes a water washing device for producing positive electrode materials from ternary precursors.

[0004] To achieve the above-mentioned purpose, the present invention provides the following technical solutions: a water washing device for producing positive electrode materials from ternary precursors, comprising a chassis, a bracket, an evaporator, a vertical plate, a liquefaction mechanism, a reactor, a stirrer, a filtering mechanism, a flushing mechanism, a first valve, an air pipe, a three-way connection, and a second valve, wherein the bracket and the evaporator are respectively fixedly connected to the left and right ends of the upper surface of the chassis, and a heater is provided in the evaporator to heat the solution through the evaporator; the vertical plate is vertically fixedly connected to the upper surface of the evaporator; the liquefaction mechanism is fixedly connected to the top of the vertical plate; the reactor is fixedly connected to the top of the bracket; the stirrer The filter and the filtering mechanism are respectively installed at the upper and lower ends of the reactor, and the solution is stirred by the stirrer to improve the water washing efficiency; the flushing mechanism is installed at the top of the inner cavity of the reactor; the first valve is installed at the top of the left side wall of the evaporator, and the first valve is connected to the filtering mechanism through a water pipe; one end of the air pipe is installed on the upper surface of the evaporator, and the other end is connected to the liquefaction mechanism; the tee is installed on the left side wall of the liquefaction mechanism through a water pipe; there are two second valves, both of which are installed in the tee branch, one of which is connected to the flushing mechanism through a water pipe, and the other second valve is connected to the inner cavity of the reactor.

[0005] Preferably, the purpose is to add deionized water to the reactor to provide water washing conditions. The liquefaction mechanism includes a water tank, a submersible pump, a third valve and a liquefaction component. The water tank is fixedly connected to the top of the vertical plate, and a through hole is opened on the upper surface of the water tank to serve as ventilation; the submersible pump is installed at the bottom of the inner cavity of the water tank; the third valve is installed at the water outlet of the submersible pump, and the third valve is connected to the three-way main line through a water pipe; the liquefaction component is installed on the upper surface of the water tank.

[0006] Preferably, the purpose is to cool down the water vapor to obtain distilled water required for washing, and the liquefaction mechanism includes a first casing, a fan, a heat sink, a flow channel and a heat sink, wherein the first casing is obliquely installed on the upper surface of the water tank; there are two fans, both installed on the front of the first casing; the heat sink is installed in the inner cavity of the first casing, and a flow channel is opened inside the heat sink, one end of the flow channel is connected to the top of the air pipe, and the other end is connected to the inner cavity of the water tank through a water pipe; there are several heat sinks, which are equidistantly installed on the upper surface of the heat sink from left to right to expand the heat dissipation area of ​​the heat sink.

[0007] Preferably, the flow channel is distributed in a serpentine shape inside the heat sink.

[0008] Preferably, the purpose is to filter out the ternary precursor material after washing, and the filtering mechanism includes a fourth valve, a cylinder, a bottom plate, a mesh cylinder and a handle, the fourth valve is installed at the bottom of the reactor; the cylinder is vertically installed at the bottom of the fourth valve; the bottom plate is screwed to the bottom end of the inner wall of the cylinder; the mesh cylinder is installed on the upper surface of the bottom plate, and the solution after washing is filtered through the mesh holes of the mesh cylinder to allow the ternary precursor to remain in the mesh cylinder; the handle is installed on the lower surface of the bottom plate.

[0009] Preferably, the purpose is to achieve a comprehensive flushing of the inner wall of the reactor to prevent affecting the quality of the second water washing. The flushing mechanism includes an annular seat, a guide rod, an annular plate, a rack, a lifting assembly, a water storage pipe, an opening, a pipe sleeve, teeth and a nozzle. The annular seat is fixedly connected to the top of the inner cavity of the reactor; the number of guide rods is equidistantly installed on the lower surface of the annular seat along the circumferential direction; the annular plate can be slidably sleeved on the outer wall of the guide rod; the number of racks is equidistantly installed on the inner wall of the annular plate along the circumferential direction; the lifting assembly is installed It is installed on the upper surface of the reactor, and the annular plate is driven to move up and down by the lifting assembly; the water storage pipe is installed at the bottom end of the guide rod, and the water storage pipe is connected to the second valve through a water pipe, and the outer wall of the water storage pipe is provided with openings equidistantly along the circumferential direction; the pipe sleeve is sleeved on the outer wall of the water storage pipe, and the pipe sleeve corresponds to the position of the opening; there are a plurality of teeth, which are installed on the outer wall of the pipe sleeve along the circumferential direction, and the teeth are meshed with the rack; the nozzle is installed on the outer wall of the pipe sleeve, and the nozzle is connected to the opening, and the nozzle sprays water to the inner wall of the reactor to rinse the reactor.

[0010] Preferably, a sealing ring is provided between the water storage pipe and the pipe sleeve.

[0011] Preferably, the lifting assembly includes a second housing, a sliding rod, a lifting plate, a connecting rod, a pin, a motor, a turntable and a guide groove, and the second housing is installed on the top of the reactor; there are two sliding rods, which are respectively vertically installed at the front and rear ends of the top of the inner cavity of the second housing; the lifting plate can be slid up and down and is sleeved on the outer wall of the sliding rod; one end of the connecting rod is installed at the bottom end of the lifting plate, and the other end is installed at the top of the annular plate to realize the linkage between the lifting plate and the annular plate; the pin is installed on the left side wall of the lifting plate; the motor is installed on the left side wall of the second housing; the turntable is installed on the output end of the motor, and a guide groove is provided on the right side wall of the turntable, and the pin is inserted into the inner cavity of the guide groove.

[0012] Preferably, the guide groove is in a triangular shape, and the corners of the guide groove are chamfered.

[0013] Compared with the prior art, the present invention has the following beneficial effects: 1. The present invention heats the solution through an evaporator, allowing the water in the solution to form water vapor and separate. The water vapor enters the flow channel along the air pipe, and the fan increases the airflow around the heat sink and the heat sink. The airflow takes away the heat, and the water vapor cools down and is converted from gas to liquid to form deionized water that enters the water tank to obtain deionized water for washing. The present invention has a deionized water extraction function and can be recycled to save water resources.

[0014] 2. The present invention drives the turntable to rotate by a motor, and the lifting plate reciprocates up and down under the cooperation of the guide groove and the pin. The transmission between the rack and the teeth causes the nozzle on the pipe sleeve to swing, thereby expanding the water spraying area, achieving comprehensive flushing of the reactor, preventing impurities and by-products from remaining, and avoiding affecting the quality and efficiency of the second water washing. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 It is a schematic diagram of the structure of the present invention; Figure 2 It is a schematic diagram of the structure of the liquefaction mechanism of the present invention; Figure 3 It is a front cross-sectional view of the liquefaction mechanism of the present invention; Figure 4 It is a top cross-sectional view of the heat dissipation plate of the present invention; Figure 5 It is an exploded view of the filtering mechanism of the present invention; Figure 6 It is a front cross-sectional view of the flushing mechanism of the present invention; Figure 7 For the present invention Figure 6 A in the enlarged view; Figure 8 A top view of the water storage pipe of the present invention; Fig. 9 It is a schematic diagram of the turntable structure of the present invention.

[0016] In the figure: 1, chassis; 2, bracket; 3, evaporation tank; 4, vertical plate; 5, liquefaction mechanism; 6, reactor; 7, agitator; 8, filtering mechanism; 9, flushing mechanism; 10, first valve; 11, air pipe; 12, three-way; 13, second valve; 51, water tank; 52, submersible pump; 53, third valve; 54, liquefaction component; 541, first housing; 542, fan; 543, heat sink; 544, flow channel; 545, heat sink; 81 , fourth valve; 82, cylinder; 83, bottom plate; 84, net cylinder; 85, handle; 91, annular seat; 92, guide rod; 93, annular plate; 94, rack; 95, lifting assembly; 96, water storage pipe; 97, opening; 98, pipe sleeve; 99, teeth; 910, nozzle; 951, second housing; 952, sliding rod; 953, lifting plate; 954, connecting rod; 955, pin; 956, motor; 957, turntable; 958, guide groove. DETAILED DESCRIPTION

[0017] The following will be combined with the drawings in the embodiments of the present invention to clearly and completely describe the technical solutions in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present invention.

[0018] The present invention provides a technical solution: a water washing device for producing positive electrode materials from ternary precursors, such as Figure 1-9 As shown, the chassis 1 comprises a chassis 1, universal wheels are arranged at the four corners of the bottom of the chassis 1, a bracket 2 and an evaporation tank 3 are respectively installed at the left and right ends of the upper surface of the chassis 1, a heater is arranged in the evaporation tank 3 to heat the solution and generate water vapor, a reaction kettle 6 is fixedly connected to the top of the bracket 2, the reaction kettle 6 provides a water washing space, a flushing mechanism 9 is installed on the top of the inner cavity of the reaction kettle 6, an agitator 7 and a filtering mechanism 8 are respectively installed at the upper and lower ends of the reaction kettle 6, a first valve 10 is installed on the top of the left wall of the evaporation tank 3, and the filtering mechanism 8 is installed with the first valve 10 through a water pipe to introduce the solution in the reaction kettle 6 into the evaporation tank 3. In the evaporation tank 3, the stirrer 7 stirs the solution in the reactor 6 to improve the water washing efficiency. The upper surface of the evaporation tank 3 is fixedly connected with a vertically arranged upright plate 4, and the top of the upright plate 4 is fixedly connected with a liquefaction mechanism 5. The liquefaction mechanism 5 is connected to the evaporation tank 3 through an air pipe 11. Water vapor enters the liquefaction mechanism 5 along the air pipe 11. A tee 12 is installed on the left wall of the liquefaction mechanism 5 through a water pipe. Diversion is achieved through the tee 12. A second valve 13 is installed on the branch of the tee 12, one of the second valves 13 is connected to the flushing mechanism 9 through a water pipe, and the other second valve 13 is connected to the inner cavity of the reactor 6.

[0019] As a preferred solution, further, the liquefaction mechanism 5 includes a water tank 51 fixedly connected to the top of the vertical plate 4, a submersible pump 52 is installed at the bottom of the inner cavity of the water tank 51, a third valve 53 is installed at the water outlet of the submersible pump 52, the third valve 53 is connected to the main line of the tee 12 through a water pipe, and deionized water is transported to the tee 12 under the suction of the submersible pump 52, and a liquefaction component 54 is installed on the upper surface of the water tank 51.

[0020] The liquefaction component 54 includes a first housing 541 obliquely installed on the upper surface of the water tank 51, and fans 542 are installed on the left and right sides of the front of the first housing 541. The fans 542 provide airflow from front to back. A heat sink 543 is installed in the inner cavity of the first housing 541. The airflow takes away the heat from the surface of the heat sink 543 to cool the heat sink 543. A flow channel 544 is opened inside the heat sink 543. One end of the flow channel 544 is connected to the top of the air pipe 11, and the other end of the flow channel 544 is connected to the water tank 51 through a water pipe, thereby increasing the length of the flow channel 544 in the heat sink 543 and improving the cooling effect on the water vapor passing through the flow channel 544. A number of heat sinks 545 are equidistantly installed from left to right on the upper surface of the heat sink 543 to expand the surface area of ​​the heat sink 543 and improve the cooling effect.

[0021] As a preferred embodiment, further, the filtering mechanism 8 includes a fourth valve 81 installed at the bottom of the reactor 6, a cylinder 82 is installed at the bottom of the fourth valve 81, the cylinder 82 is connected to the first valve 10 through a water pipe, and can introduce the washed solution into the evaporation tank 3, a bottom plate 83 is screwed to the bottom of the inner wall of the cylinder 82, a mesh cylinder 84 is installed on the upper surface of the bottom plate 83, the mesh cylinder 84 uses its own mesh to filter the solution and intercept the ternary precursor material, and a handle 85 is installed on the lower surface of the bottom plate 83.

[0022] As a preferred solution, further, the flushing mechanism 9 includes an annular seat 91 installed at the top of the inner cavity of the reactor 6, at least three guide rods 92 are installed at equal intervals along the circumferential direction at the bottom of the annular seat 91, an annular plate 93 that can slide up and down is sleeved on the outer wall of the guide rod 92, and a plurality of racks 94 are installed at equal intervals along the circumferential direction on the inner wall of the annular plate 93, and a lifting assembly 95 is installed on the top of the reactor 6, and the annular plate 93 is driven to rise or fall along the outer wall of the guide rod 92 by the lifting assembly 95, and an annular water storage pipe 96 is installed at the bottom end of the guide rod 92, and the water storage pipe 96 is connected to the second valve 13 through a water pipe, and the water storage pipe 96 The outer wall is provided with openings 97 equidistantly along the circumferential direction and corresponding to the position of the rack 94. The outer wall of the water storage pipe 96 is also provided with a plurality of pipe sleeves 98 equidistantly along the circumferential direction, and the pipe sleeves 98 correspond to the positions of the openings 97. A sealing ring is provided between the pipe sleeve 98 and the water storage pipe 96 to prevent the water pressure in the water storage pipe 96 from decreasing. The outer wall of the pipe sleeve 98 is provided with a plurality of teeth 99 circumferentially, and the teeth 99 are meshedly connected with the rack 94. A nozzle 910 connected with the opening 97 is provided on the outer wall of the pipe sleeve 98. When the annular plate 93 moves up and down, the nozzle 910 swings inward or outward under the transmission of the rack 94 and the teeth 99.

[0023] The lifting assembly 95 includes a second housing 951 installed on the top of the reactor 6. Slide rods 952 are installed at both ends of the top of the inner cavity of the second housing 951. The outer wall of the slide rod 952 is sleeved with a lifting plate 953 that can slide up and down. One end of a connecting rod 954 is installed at the bottom of the lifting plate 953. The other end of the connecting rod 954 is connected to the top of the annular plate 93 to realize the linkage between the lifting plate 953 and the annular plate 93. A pin 955 is installed on the left side wall of the lifting plate 953. A motor 956 is installed on the left side wall of the casing 951, and a turntable 957 is installed on the output end of the motor 956. A guide groove 958 is opened on the right side wall of the turntable 957, and a pin 955 is inserted in the inner cavity of the guide groove 958. The guide groove 958 is triangular in shape, and the corners are chamfered. When the motor 956 drives the turntable 957 to rotate, the height of the intersection of the guide groove 958 and the plumb line of the pin 955 changes, and the guide groove 958 can drive the lifting plate 953 to rise and fall reciprocatingly.

[0024] Working principle: Step 1: put the ternary precursor filter cake into the top of the reactor 6, open the second valve 13, extract deionized water in the water tank 51 under the suction of the submersible pump 52, add the deionized water into the reactor 6, stir it through the stirrer 7, and wash the ternary precursor material with water; Step 2, open the fourth valve 81 and the first valve 10, filter the solution when passing through the mesh tube 84, and retain the ternary precursor material in the mesh tube 84, while the solution enters the evaporation tank 3, unscrew the bottom plate 83, and take out the ternary precursor material in the mesh tube 84; Step 3: The solution is heated by the evaporator 3 to generate water vapor which flows along the air pipe 11 into the flow channel 544. The fan 542 is powered on to generate airflow from front to back, increasing the airflow around the heat sink 543 and the heat sink 545, allowing the airflow to take away heat and cool the water vapor. The water vapor changes from gas to liquid to obtain deionized water. The deionized water flows along the flow channel 544 into the water tank 51, and the deionized water is extracted to achieve the purpose of reuse. Step 4, when it is necessary to flush the inner wall of the reactor 6, open the second valve 13 connected to the water storage pipe 96, and under the suction of the submersible pump 52, pressurize the deionized water and introduce it into the water storage pipe 96, and the nozzle 910 sprays water outward, and the motor 956 drives the turntable 957 to rotate, and the guide groove 958 rotates. While the pin 955 slides in the guide groove 958, the guide groove 958 moves the lifting plate 953 up and down, and the annular plate 93 drives the rack 94 to rise and fall repeatedly. Under the transmission of the rack 94 and the teeth 99, the nozzle 910 changes the spraying angle, so that the water flow can fully flush the inner wall of the reactor 6 to ensure the cleanliness of the reactor 6.

[0025] Although embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions and variations may be made to the embodiments without departing from the principles and spirit of the present invention, and that the scope of the present invention is defined by the appended claims and their equivalents.

Claims

1. A water washing device for producing positive electrode materials from ternary precursors, comprising a chassis (1), characterized in that: The water washing device for producing positive electrode materials from the ternary precursor also includes: The bracket (2) and the evaporation tank (3) are respectively fixedly connected to the left and right ends of the upper surface of the chassis (1), and a heater is provided in the evaporation tank (3) to heat the solution through the evaporation tank (3); A vertical plate (4) vertically fixedly connected to the upper surface of the evaporation tank (3); A liquefaction mechanism (5) fixedly connected to the top of the vertical plate (4); A reaction kettle (6) fixedly connected to the top of the support (2); The stirrer (7) and the filtering mechanism (8) are respectively installed at the upper and lower ends of the reaction kettle (6), and the solution is stirred by the stirrer (7) to improve the water washing efficiency; A flushing mechanism (9) is installed at the top of the inner cavity of the reaction kettle (6); A first valve (10) is installed at the top of the left side wall of the evaporation tank (3), and the first valve (10) is connected to the filtering mechanism (8) via a water pipe; An air pipe (11), one end of which is mounted on the upper surface of the evaporation tank (3) and the other end of which is connected to the liquefaction mechanism (5); A tee (12) installed on the left side wall of the liquefaction mechanism (5) through a water pipe; Two second valves (13) are installed in the three-way (12) branch, one of the second valves (13) is connected to the flushing mechanism (9) through a water pipe, and the other second valve (13) is connected to the inner cavity of the reaction kettle (6); The liquefaction mechanism (5) comprises: A water tank (51) is fixedly connected to the top of the vertical plate (4), and a through hole is provided on the upper surface of the water tank (51) to play a ventilation role; A submersible pump (52) installed at the bottom of the inner cavity of the water tank (51); A third valve (53) is installed at the water outlet of the submersible pump (52), and the third valve (53) is connected to the main line of the tee (12) through a water pipe; The liquefaction component (54) is mounted on the upper surface of the water tank (51).

2. The water washing device for producing positive electrode materials from ternary precursors according to claim 1, characterized in that: The liquefaction mechanism (5) comprises: A first housing (541) is obliquely mounted on the upper surface of the water tank (51); Two fans (542) are installed on the front of the first housing (541); A heat sink (543) is installed in the inner cavity of the first housing (541), a flow channel (544) is provided inside the heat sink (543), one end of the flow channel (544) is connected to the top of the air pipe (11), and the other end is connected to the inner cavity of the water tank (51) through a water pipe; There are a plurality of heat sinks (545) which are equidistantly mounted on the upper surface of the heat sink (543) from left to right, thereby expanding the heat dissipation area of ​​the heat sink (543).

3. The water washing device for producing positive electrode materials from ternary precursors according to claim 2, characterized in that: The flow channel (544) is distributed in a serpentine shape inside the heat dissipation plate (543).

4. The water washing device for producing positive electrode materials from ternary precursors according to claim 3, characterized in that: The filtering mechanism (8) comprises: A fourth valve (81) is installed at the bottom of the reaction kettle (6); A cylinder (82) vertically mounted at the bottom end of the fourth valve (81); A bottom plate (83) is screwed to the bottom end of the inner wall of the cylinder (82); A mesh cylinder (84) is installed on the upper surface of the bottom plate (83) to filter the washed solution through the mesh holes of the mesh cylinder (84) so ​​that the ternary precursor remains in the mesh cylinder (84); A handle (85) is mounted on the lower surface of the base plate (83).

5. The water washing device for producing positive electrode materials from ternary precursors according to claim 4, characterized in that: The flushing mechanism (9) comprises: An annular seat (91) fixedly connected to the top of the inner cavity of the reaction kettle (6); A plurality of guide rods (92) are installed on the lower surface of the annular seat (91) at equal intervals along the circumferential direction; An annular plate (93) is sleeved on the outer wall of the guide rod (92) so as to be able to slide up and down; A plurality of racks (94) are installed on the inner wall of the annular plate (93) at equal intervals along the circumferential direction; A lifting assembly (95) is installed on the upper surface of the reaction kettle (6), and the lifting assembly (95) drives the annular plate (93) to move up and down; A water storage pipe (96) is installed at the bottom end of the guide rod (92), and the water storage pipe (96) is connected to the second valve (13) via a water pipe, and the outer wall of the water storage pipe (96) is provided with openings (97) at equal intervals along the circumferential direction; A pipe sleeve (98) is sleeved on the outer wall of the water storage pipe (96), and the position of the pipe sleeve (98) corresponds to the position of the opening (97); A plurality of teeth (99) are mounted on the outer wall of the sleeve (98) along the circumferential direction, and the teeth (99) are meshingly connected with the rack (94); The nozzle (910) is mounted on the outer wall of the pipe sleeve (98), and the nozzle (910) is connected to the opening (97). The nozzle (910) sprays water onto the inner wall of the reaction kettle (6) to flush the reaction kettle (6).

6. The water washing device for producing positive electrode materials from ternary precursors according to claim 5, characterized in that: A sealing ring is provided between the water storage pipe (96) and the pipe sleeve (98).

7. The water washing device for producing positive electrode materials from ternary precursors according to claim 6, characterized in that: The lifting assembly (95) comprises: A second housing (951) is installed on the top of the reaction kettle (6); Two slide bars (952) are respectively vertically mounted at the front and rear ends of the top of the inner cavity of the second housing (951); A lifting plate (953) is sleeved on the outer wall of the sliding rod (952) so as to be able to slide up and down; A connecting rod (954), one end of which is mounted on the bottom end of the lifting plate (953) and the other end of which is mounted on the top of the annular plate (93), so as to realize the linkage between the lifting plate (953) and the annular plate (93); A pin (955) is mounted on the left side wall of the lifting plate (953); A motor (956) mounted on the left side wall of the second housing (951); A rotating disk (957) is installed at the output end of the motor (956). A guide groove (958) is provided on the right side wall of the rotating disk (957), and a pin (955) is inserted into the inner cavity of the guide groove (958).

8. The water washing device for producing positive electrode materials from ternary precursors according to claim 7, characterized in that: The guide groove (958) is triangular in shape, and the corners of the guide groove (958) are chamfered.

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