Apparatus, method and photolithography machine for increasing exposure power density of maskless photolithography machine

Abstract

The application discloses a device, a method and a photoetching machine for improving exposure power density of a maskless photoetching machine, the device comprising: a light source, an illumination light path, a modulation unit and a controller, the controller being connected with the light source and also connected with the modulation unit, used for controlling the light source to emit illumination light and sending an original image to the modulation unit or sending a stretched image obtained after stretching the original image to the modulation unit; the modulation unit is used for performing one-way stretching and compressing processing on the original image in a first illumination area to obtain an exposure image, or the modulation unit is used for performing one-way compressing processing on the stretched image in the first illumination area to obtain the exposure image, wherein the first illumination area is greater than or equal to an area occupied by the original image. The application can ensure that the output exposure image is not deformed, the size of the exposure image is consistent with that of the original image, the power density of the exposure surface is improved, the scanning width is not lost, and the cost is reduced.

Description

Technical Field

[0001] The present invention relates to the technical field of photolithography systems, and in particular to a device, method and photolithography machine for improving the exposure power density of a maskless photolithography machine. Background Art

[0002] In the related art, there are two methods to improve the exposure power density of maskless lithography machines. On the one hand, the exposure power density is increased by increasing the laser power, but this will increase the cost of the laser and is limited by the power density that each device can withstand; on the other hand, the exposure power density is increased by increasing the focusing magnification of the optical imaging system, but this will lose the processing scanning width and increase the scanning speed, which has higher requirements for the motion platform and leads to a decrease in the overall processing rate.

[0003] In scanning exposure, since multiple reciprocating scans are required to complete the entire surface processing, the low scanning width and high scanning speed method will increase the number of scanning reciprocations and the platform acceleration and deceleration time, further extending the overall processing time and increasing the cost due to higher requirements for the refresh frequency of the spatial light modulator. Summary of the Invention

[0004] The present invention aims to solve at least one of the technical problems existing in the prior art.

[0005] To this end, one purpose of the present invention is to propose a device for improving the exposure power density of a maskless lithography machine. The device can ensure that the output exposure image is not deformed, so that the exposure image is consistent in size with the original image, thereby improving the power density of the exposure surface and bringing about the coverage capability of a long scanning width at a low scanning speed, significantly reducing the number of scans while reducing costs.

[0006] To this end, a second object of the present invention is to provide a method for improving the exposure power density of a maskless lithography machine.

[0007] To this end, the third object of the present invention is to provide a maskless lithography machine.

[0008] To achieve the above object, the embodiment of the first aspect of the present application discloses a device for improving the exposure power density of a maskless lithography machine, comprising: a light source for providing illumination light; an illumination light path for receiving the illumination light and performing collimation and homogenization processing on the illumination light to output first processed light; a modulation unit for receiving the first processed light and forming a first illumination area; and a controller connected to the light source and also connected to the modulation unit, for controlling the light source to emit the illumination light and sending an original image to the modulation unit or sending a stretched image obtained by stretching the original image to the modulation unit; the modulation unit is used to perform one-way stretching and compression processing on the original image in the first illumination area to obtain an exposure image, or the modulation unit is used to perform one-way compression processing on the stretched image in the first illumination area to obtain the exposure image, wherein the first illumination area is greater than or equal to the area occupied by the original image.

[0009] According to the device for improving the exposure power density of a maskless lithography machine, the controller controls the light source to emit the illumination light, and then the illumination light path performs collimation and homogenization processing to output the first processed light, and forms the first illumination area on the modulation unit. At this time, the controller sends the original image to the modulation unit, and the modulation unit performs one-way stretching and compression processing on the original image in the first illumination area, or the controller stretches the original image and sends the stretched image to the modulation unit, and the modulation unit performs compression processing on the stretched image to output the exposure image. This can ensure that the output exposure image is not deformed, so that the size of the exposure image is consistent with that of the original image, and the power density of the exposure surface is improved without losing the processing scanning width, and the coverage ability of long scanning width at low scanning speed is brought, and the scanning times are significantly reduced.

[0010] In addition, the device for improving the exposure power density of a maskless lithography machine according to the above embodiment of the present application can have the following additional technical features:

[0011] In some embodiments, the modulation unit comprises a spatial light modulator for stretching the original image to output a first processed image; and an imaging light path connected to the spatial light modulator for performing compression processing on the first processed image to output the exposure image, or performing compression processing on the stretched image to output the exposure image.

[0012] In some embodiments, the imaging optical path includes: a cylindrical mirror, which includes a functional direction and a non-functional direction, and is used to compress the first processed image in the functional direction and keep the first processed image parallel in the non-functional direction, or to compress the stretched image in the functional direction and keep the stretched image parallel in the non-functional direction, wherein the functional direction refers to the direction in which the curvature of the cylindrical mirror is non-infinite, and the non-functional direction refers to the direction in which the curvature of the cylindrical mirror is infinite.

[0013] In some embodiments, the imaging optical path further includes: an infinity correction tube lens, which is arranged opposite to the functional direction of the cylindrical mirror and is used to adjust the compression ratio of the cylindrical mirror.

[0014] In some embodiments, the compression ratio is determined based on a ratio of a focal length of the infinity-corrected tube lens to a focal length of the cylindrical lens.

[0015] In some embodiments, the stretching ratio of the original image is consistent with the compression ratio of the first processed image, or the stretching ratio of the original image is consistent with the compression ratio of the stretched image by the imaging optical path.

[0016] In some embodiments, the stretching direction of the original image is consistent with the compression direction of the first processed image; or, the stretching direction of the original image is consistent with the compression direction of the stretched image by the imaging optical path.

[0017] In some embodiments, the device for improving the exposure power density of a maskless lithography machine also includes: a processing unit, which is arranged between the controller and the modulation unit, and the processing unit includes: a substrate for receiving the exposure image; and a motion platform, on which the substrate is arranged to drive the substrate to move to complete the processing of the substrate.

[0018] To achieve the above-mentioned purpose, an embodiment of the second aspect of the present invention discloses a method for improving the exposure power density of a maskless lithography machine, which is used in the device for improving the exposure power density of a maskless lithography machine described in the embodiment of the first aspect of the present invention. The method includes: controlling the light source to emit the illumination light to the illumination light path so that the illumination light path collimates and homogenizes the illumination light and outputs a first processed light; controlling the modulation unit to receive the first processed light and form a first illumination area; controlling the modulation unit to receive the original image, or stretching the original image and sending the obtained stretched image to the modulation unit; controlling the modulation unit to perform unidirectional stretching and compression processing on the original image within the first illumination area to obtain an exposure image, or controlling the modulation unit to perform unidirectional compression processing on the stretched image within the first illumination area to obtain the exposure image, wherein the first illumination area is greater than or equal to the area occupied by the original image.

[0019] According to an embodiment of the present invention, a method for improving the exposure power density of a maskless lithography machine can be used. The method can control the light source to emit illumination light, and then output a first processing light after collimation and uniformization of the illumination light path, and form a first illumination area on the modulation unit. At this time, the original image is sent to the modulation unit, and the modulation unit performs unidirectional stretching and compression processing in the first illumination area after receiving the original image, or, after the original image is stretched, the stretched image is sent to the modulation unit, and the modulation unit compresses the stretched image to output an exposure image. This ensures that the output exposure image is not deformed, so that the exposure image is consistent in size with the original image, and at the same time improves the power density of the exposure surface without losing the processing scanning width, and also brings the coverage capability of long scanning width at low scanning speed, significantly reducing the number of scans.

[0020] To achieve the above-mentioned purpose, an embodiment of the third aspect of the present invention discloses a maskless lithography machine, comprising: the device for improving the exposure power density of the maskless lithography machine as described in the embodiment of the first aspect of the present invention.

[0021] According to the maskless lithography machine of the embodiment of the present invention, the light source is controlled to emit illumination light, and then after the illumination light path is collimated and uniformized, the first processing light is output, and a first illumination area is formed on the modulation unit. At this time, the original image is sent to the modulation unit, and the modulation unit performs unidirectional stretching and compression processing in the first illumination area after receiving the original image. Alternatively, after the original image is stretched, the stretched image is sent to the modulation unit, and the modulation unit compresses the stretched image to output an exposure image. This ensures that the output exposure image is not deformed, so that the exposure image is consistent in size with the original image. At the same time, the power density of the exposure surface is improved without losing the processing scanning width, and it also brings the coverage capability of long scanning width at low scanning speed, which significantly reduces the number of scans.

[0022] Additional aspects and advantages of the present invention will be set forth in part in the description which follows and, in part, will be obvious from the description which follows, or may be learned by practice of the present invention. BRIEF DESCRIPTION OF THE DRAWINGS

[0023] The above and / or additional aspects and advantages of the present invention will become apparent and readily understood from the description of the embodiments with reference to the following drawings, in which:

[0024] Figure 1 1 is a structural block diagram of an apparatus for improving the exposure power density of a maskless lithography machine according to an embodiment of the present invention;

[0025] Figure 2 is a structural block diagram of a modulation unit according to an embodiment of the present invention;

[0026] Figure 3 is a structural block diagram of an imaging optical path according to one embodiment of the present invention;

[0027] Figure 4 is a schematic diagram of an optical path of a cylindrical mirror according to an embodiment of the present invention;

[0028] Figure 5 is a schematic diagram of an imaging optical path structure according to an embodiment of the present invention;

[0029] Figure 6 is a schematic diagram of a unidirectional stretching process according to one embodiment of the present invention;

[0030] Figure 7 is a schematic diagram of unidirectional compression processing according to an embodiment of the present invention;

[0031] Figure 8 is a functional schematic diagram of a spatial light modulator with a stretching function according to an embodiment of the present invention;

[0032] Figure 9is a structural block diagram of an apparatus for improving the exposure power density of a maskless lithography machine according to another embodiment of the present invention;

[0033] Figure 10 1 is a schematic structural diagram of a device for improving the exposure power density of a maskless lithography machine according to an embodiment of the present invention;

[0034] Figure 11 is a flow chart of a method for improving the exposure power density of a maskless lithography machine according to one embodiment of the present invention;

[0035] Figure 12 4 is a structural block diagram of a maskless lithography machine according to an embodiment of the present invention. DETAILED DESCRIPTION

[0036] The embodiments of the present invention will be described in detail below. The embodiments described with reference to the accompanying drawings are exemplary. The embodiments of the present invention will be described in detail below.

[0037] Reference below Figures 1-12 An apparatus, method, and lithography machine for improving the exposure power density of a maskless lithography machine according to an embodiment of the present invention are described.

[0038] Figure 1 FIG. 1 is a structural block diagram of an apparatus for improving the exposure power density of a maskless lithography machine according to an embodiment of the present invention. Figure 1 As shown, the device 100 for improving the exposure power density of a maskless lithography machine includes: a light source 110 , an illumination light path 120 , a modulation unit 130 and a controller 140 .

[0039] Specifically, the light source 110 is used to provide illumination light; the illumination light path 120 is used to receive the illumination light, collimate and homogenize the illumination light, and output a first processed light; the modulation unit 130 is used to receive the first processed light and form a first illumination area.

[0040] The controller 140 is connected to the light source 110 and is also connected to the modulation unit 130 for controlling the light source 110 to emit illumination light and to send the original image to the modulation unit 130 or to stretch the original image and then send the resulting stretched image to the modulation unit 130 .

[0041] The modulation unit 130 is used to perform unidirectional stretching and compression processing on the original image within the first irradiation area to obtain an exposure image, or the modulation unit 130 is used to perform unidirectional compression processing on the stretched image within the first irradiation area to obtain an exposure image, wherein the first irradiation area is greater than or equal to the area occupied by the original image.

[0042] In an embodiment, the controller 140 can control whether the light source 110 can provide illumination light for the illumination light path 120 by, for example, controlling the switch of the light source 110. When the controller 140 controls the light source 110 to turn on, the light source 110 can provide illumination light for the illumination light path 120. When the controller 140 controls the light source 110 to turn off, the light source 110 cannot provide illumination light for the illumination light path 120.

[0043] After receiving the illumination light, the illumination light path 120 collimates the illumination light to adjust the illumination light emitted by the light source 110 into parallel light. This ensures that the illumination light maintains a consistent direction during propagation, reduces the divergence angle of the illumination light, and improves the directionality and parallelism of the illumination light. Simultaneously, the illumination light path 120 also homogenizes the illumination light to even out the intensity distribution of the illumination light. This ensures that the energy of the illumination light is evenly distributed within the illumination area, avoiding areas of excessively high or low intensity, thereby improving the quality of the illumination light. Therefore, after the illumination light path 120 collimates and homogenizes the illumination light, it outputs a first processed light, i.e., a parallel light with uniform intensity.

[0044] The modulation unit 130 will receive the first processing light output by the illumination light path 120 and form a first irradiation area on the modulation unit 130. At this time, the controller 140 sends the original image to the modulation unit 130. After the modulation unit 130 receives the original image, it will perform unidirectional stretching and compression processing on the original image in the first irradiation area to obtain an exposure image, so as to ensure that the output exposure image is not deformed and the size of the exposure image is consistent with that of the original image. At the same time, the power density of the exposure surface is also improved, and the coverage capability of a long scanning width at a low scanning speed is also brought about, which significantly reduces the number of scans.

[0045] Alternatively, when the modulation unit 130 does not have a stretching function, the original image can be selected in the controller 140, and the original image can be stretched by the controller 140 to obtain a stretched image, and then the stretched image is sent to the modulation unit 130. After the modulation unit 130 receives the stretched image, the stretched image is also compressed in one direction within the first irradiation area to obtain an exposure image.

[0046] In addition, in order to ensure that the original image can be completely displayed within the first illumination area, the first illumination area should be larger than or equal to the area occupied by the original image.

[0047] Thus, the above-mentioned device for improving the exposure power density of the maskless lithography machine controls the light source 110 to emit illumination light through the controller 140, and then outputs the first processing light after being collimated and uniformized by the illumination light path 120, and forms a first illumination area on the modulation unit 130. At this time, the controller 140 sends the original image to the modulation unit 130, and the modulation unit 130 performs unidirectional stretching and compression processing in the first illumination area after receiving the original image, or, after the controller 140 stretches the original image, it sends the stretched image to the modulation unit 130, and the modulation unit 130 compresses the stretched image to output the exposure image. This ensures that the output exposure image is not deformed, so that the exposure image is consistent in size with the original image, while also improving the power density of the exposure surface without losing the processing scanning width, and also bringing the coverage capability of long scanning width at low scanning speed, significantly reducing the number of scans.

[0048] In one embodiment of the present invention, Figure 2 As shown, the modulation unit 130 includes: a spatial light modulator 131 and an imaging optical path 132. The spatial light modulator 131 is used to stretch the original image and output a first processed image; the imaging optical path 132 is connected to the spatial light modulator 131 and is used to compress the first processed image and output an exposure image, or to compress the stretched image and output an exposure image.

[0049] In an embodiment, after the controller 140 sends the original image to the spatial light modulator 131, the spatial light modulator 131 will stretch the original image to generate a first processed image that has been stretched. The spatial light modulator 131 then transmits the first processed image to the imaging optical path 132. The imaging optical path 132 receives the first processed image, compresses the first processed image, and then outputs an exposure image, so that the exposure image can maintain the same size as the original image and the output exposure image is not deformed.

[0050] Alternatively, if the spatial light modulator 131 does not have a stretching function, the controller 140 directly sends the stretched image to the spatial light modulator 131. The spatial light modulator 131 then transmits the stretched image to the imaging optical path 132, which compresses the stretched image to output an exposure image. This ensures that regardless of whether the spatial light modulator 131 has a stretching function, the device can flexibly complete the stretching and compression processing of the original image, thereby outputting a high-quality exposure image.

[0051] In one embodiment of the present invention, Figure 3As shown, the imaging optical path 132 includes: a cylindrical mirror 1321, the cylindrical mirror 1321 includes a functional direction and a non-functional direction, and is used to compress the first processed image in the functional direction and keep the first processed image parallel in the non-functional direction, or to compress the stretched image in the functional direction and keep the stretched image parallel in the non-functional direction, wherein the functional direction refers to the direction in which the curvature of the cylindrical mirror 1321 is non-infinite, and the non-functional direction refers to the direction in which the curvature of the cylindrical mirror 1321 is infinite.

[0052] In the examples, reference Figure 4 As shown, cylindrical mirror 1321 includes a functional direction and a non-functional direction. The functional direction refers to the direction in which the curvature of cylindrical mirror 1321 is infinite. In the non-functional direction, the surface of cylindrical mirror 1321 is flat and therefore does not have the optical function of focusing light. When light passes through cylindrical mirror 1321 in the non-functional direction, it will maintain its original parallel or divergent state without any change. In contrast, the curvature of cylindrical mirror 1321 in the functional direction is not infinite, that is, it has a certain degree of curvature. This causes light to be focused when passing through cylindrical mirror 1321 in the functional direction. When parallel light rays are incident on cylindrical mirror 1321 along the functional direction, they are focused to a point (for example, if the cylindrical mirror is a convex cylindrical mirror).

[0053] Therefore, when the imaging optical path 132 performs compression processing on the first processed image, the first processed image will be compressed in the functional direction of the cylindrical mirror 1321, and the first processed image will be kept parallel in the non-functional direction; or, when the imaging optical path 132 processes the stretched image, the stretched image will be compressed in the functional direction of the cylindrical mirror 1321, and the stretched image will be kept parallel in the non-functional direction, so as to ensure that the output exposure image is not deformed.

[0054] In one embodiment of the present invention, the imaging optical path 132 further includes: an infinity correction tube lens 1322 , wherein the infinity correction tube lens 1322 is arranged opposite to the functional direction of the cylindrical mirror 1321 to adjust the compression ratio of the cylindrical mirror 1321 .

[0055] In the examples, reference Figure 5 As shown, the functional directions of the infinity correction tube lens 1322 and the cylindrical mirror 1321 are arranged relative to each other, that is, the curved surfaces of the infinity correction tube lens 1322 and the cylindrical mirror 1321 are arranged relative to each other, which can further adjust the compression ratio of the cylindrical mirror 1321 to the first processed image or the stretched image, thereby improving the flexibility of image processing.

[0056] In one embodiment of the present invention, the compression ratio is determined based on the ratio of the focal length of the infinity-corrected tube lens 1322 to the focal length of the cylindrical lens 1321 .

[0057] In an embodiment, the compression ratio is determined based on the ratio between the focal length of the infinity correction tube lens 1322 and the focal length of the cylindrical lens 1321. By determining the focal lengths of the infinity correction tube lens 1322 and the cylindrical lens 1321, the compression ratio of the first processed image or the stretched image can be determined. For example, if the ratio of the focal lengths of the infinity correction tube lens 1322 and the cylindrical lens 1321 is 4, the compression ratio is 4, thereby achieving accuracy in image processing.

[0058] In one embodiment of the present invention, the stretching ratio of the original image is consistent with the compression ratio of the first processed image, or the stretching ratio of the original image is consistent with the compression ratio of the stretched image by the imaging optical path 132 .

[0059] In an embodiment, the stretching ratio of the original image by the spatial light modulator 131 is consistent with the compression ratio of the first processed image by the cylindrical mirror 1321, or the stretching ratio of the original image by the controller 140 is consistent with the compression ratio of the stretched image by the imaging optical path 132. For example, if the stretching ratio is 4, the compression ratio is also 4. This ensures that after the original image is stretched, the first processed image or the stretched image can be compressed by the cylindrical mirror 1321, and the exposure image obtained by compression processing is consistent with the size of the original image.

[0060] In one embodiment of the present invention, the stretching direction of the original image is consistent with the compression direction of the first processed image; or, the stretching direction of the original image is consistent with the compression direction of the stretched image by the imaging optical path 132 .

[0061] In an embodiment, the stretching direction of the original image by the spatial light modulator 131 is consistent with the compression direction of the first processed image by the cylindrical mirror 1321, or the stretching direction of the original image by the controller 140 is consistent with the compression direction of the stretched image by the cylindrical mirror 1321. Both are unidirectional stretching and compression, and the stretching direction and the compression direction are both functional directions of the cylindrical mirror 1321, which can ensure that the size of the original image is consistent with that of the exposed image.

[0062] For example, the stretch ratio of the original image is 4, and the compression ratio of the first processed image or the stretched image is also 4. When the spatial light modulator is a DMD (Digital Micromirror Device) with a stretching function, after the controller 140 transmits the original image to the spatial light modulator 131, as shown in FIG. Figure 6 As shown, the spatial light modulator 131 stretches the original image by 4 times in the vertical direction to obtain a first processed image.

[0063] Alternatively, when the spatial light modulator does not have a stretching function, the controller 140 determines the original image, such as Figure 6As shown, the original image is stretched 4 times in the vertical direction of the original image to obtain a stretched image.

[0064] On the other hand, Figure 7 As shown, when the spatial light modulator 131 transmits the first processed image or the stretched image to the cylindrical mirror 1321, the cylindrical mirror 1321 will compress the first processed image or the stretched image in the vertical direction to ensure that the exposure image is not deformed, so that the final exposure image is consistent with the size of the original image.

[0065] In addition, when the spatial light modulator 131 is a DMD with a stretching function, the stretching function of the DMD can adjust the size of the image in one direction while maintaining the image quality, and the image data loading time of the DMD stretching function is significantly shortened. Figure 8 As shown, for example, the loading time is reduced to 1 / 4 of the original time, which greatly improves the efficiency of image processing.

[0066] In one embodiment of the present invention, Figure 9 As shown, the device 100 for improving the exposure power density of a maskless lithography machine also includes: a processing unit 150, which is arranged between the controller 140 and the modulation unit 130, and the processing unit 150 includes: a substrate 151 and a motion platform 152, wherein the substrate 151 is used to receive an exposure image; the substrate 151 is arranged on the motion platform 152, and the motion platform 152 is used to drive the substrate 151 to move to complete the processing of the substrate 151.

[0067] In an embodiment, Figure 9 As shown, the substrate 151 is adsorbed on the motion platform 152, the imaging optical path 132 can project the exposure image onto the substrate 151, and the substrate 151 can receive the exposure image. After the substrate 151 receives the exposure image, the controller 140 can control the motion platform 152 to move, so that the motion platform 152 drives the substrate 151 to move. For example, the motion platform 152 moves at a constant speed, so that the substrate 151 can move accurately according to a preset trajectory, which not only enables the exposure image on the substrate 151 to be evenly and efficiently exposed, but also completes the processing of the exposure image on the substrate 151 through the flexible control of the motion platform 152, thereby greatly improving the exposure power density and ensuring the high quality and high efficiency of the lithography process.

[0068] In summary, if Figure 10As shown, when the light source 110 emits illumination light under the control instruction of the controller 140, the illumination light is collimated and uniformized by the illumination light path 120 to obtain a first processed light. The illumination light path 120 outputs the first processed light and irradiates it onto the spatial light modulator 131, forming a first illumination area on the spatial light modulator 131. At this time, the controller 140 sends the original image to the spatial light modulator 131. After receiving the original image, the spatial light modulator 131 stretches the original image and outputs the first processed image to the imaging light path 132. The cylindrical mirror 1321 in the imaging light path 132 compresses the first processed image, wherein the stretching direction of the original image and the compression direction of the first processed image are the same. The stretching ratio of the original image is consistent with the compression ratio of the first processed image. Then, the imaging optical path 132 compresses the first processed image to obtain an exposure image, and projects the exposure image onto the substrate 151. At this time, the controller 140 sends a control instruction to the motion platform 152 to control the motion platform 152 to perform three-dimensional movement. Since the substrate 151 is adsorbed on the motion platform 152, the motion platform 152 can drive the substrate 151 to move, thereby completing the processing of the substrate 151 and ensuring that the exposure image is not deformed. The exposure image obtained in this way is consistent with the size of the original image, and the power density of the exposure surface is effectively improved. Without losing the scanning width, the processing efficiency of the substrate 151 is improved and the cost is reduced.

[0069] The present invention further provides a method for improving the exposure power density of a maskless lithography machine in an embodiment, which is used in the device for improving the exposure power density of a maskless lithography machine described in any one of the above embodiments of the present invention.

[0070] Figure 11 FIG. 1 is a flow chart of a method for improving the exposure power density of a maskless lithography machine according to an embodiment of the present invention. Figure 11 As shown, the method includes the following steps:

[0071] Step S1 : controlling the light source to emit illumination light to the illumination light path, so that the illumination light path performs collimation and homogenization processing on the illumination light and outputs a first processed light.

[0072] Step S2: controlling the modulation unit to receive the first processing light and form a first irradiation area.

[0073] Step S3: Control the modulation unit to receive the original image, or stretch the original image and send the resulting stretched image to the modulation unit.

[0074] Step S4, controlling the modulation unit to perform unidirectional stretching and compression processing on the original image within the first irradiation area to obtain an exposure image, or controlling the modulation unit to perform unidirectional compression processing on the stretched image within the first irradiation area to obtain an exposure image, wherein the first irradiation area is greater than or equal to the area occupied by the original image.

[0075] Therefore, the method for improving the exposure power density of the maskless lithography machine in the above embodiment of the present invention controls the light source to emit illumination light, and then outputs the first processing light after collimation and uniformization of the illumination light path, and forms a first illumination area on the modulation unit. At this time, the original image is sent to the modulation unit, and the modulation unit performs unidirectional stretching and compression processing in the first illumination area after receiving the original image, or, after the original image is stretched, the stretched image is sent to the modulation unit, and the modulation unit compresses the stretched image to output the exposure image. This ensures that the output exposure image is not deformed, so that the exposure image is consistent in size with the original image, and at the same time improves the power density of the exposure surface without losing the processing scanning width, and also brings the coverage capability of long scanning width at low scanning speed, significantly reducing the number of scans.

[0076] In one embodiment of the present invention, an exposure image is obtained based on an original image or a stretched image, including: stretching the original image to output a first processed image; compressing the first processed image to output an exposure image, or compressing the stretched image to output an exposure image.

[0077] In one embodiment of the present invention, compression processing is performed on the first processed image or the stretched image, including: compressing the first processed image in a functional direction and keeping the first processed image parallel in a non-functional direction, or compressing the stretched image in a functional direction and keeping the stretched image parallel in a non-functional direction, wherein the functional direction refers to a direction in which the curvature of the cylindrical mirror is non-infinite, and the non-functional direction refers to a direction in which the curvature of the cylindrical mirror is infinite.

[0078] In one embodiment of the present invention, the method for improving the exposure power density of a maskless lithography machine further includes: adjusting the compression ratio of the cylindrical mirror according to the infinity correction tube lens.

[0079] In another embodiment of the present invention, the compression ratio is determined based on a ratio of a focal length of the infinity-corrected tube lens to a focal length of the cylindrical lens.

[0080] In one embodiment of the present invention, the stretching ratio of the original image is consistent with the compression ratio of the first processed image, or the stretching ratio of the original image is consistent with the compression ratio of the stretched image by the imaging optical path.

[0081] In one embodiment of the present application, the stretching direction of the original image is consistent with the compression direction of the first processed image; or, the stretching direction of the original image is consistent with the compression direction of the stretched image by the imaging light path.

[0082] It should be noted that, when the exposure power density of the maskless lithography machine is improved, the specific implementation of the method for improving the exposure power density of the maskless lithography machine is similar to the specific implementation of the device for improving the exposure power density of the maskless lithography machine described in any one of the above embodiments of the present application, and therefore, for the detailed exemplary description of the method for improving the exposure power density of the maskless lithography machine, please refer to the foregoing description of the device for improving the exposure power density of the maskless lithography machine. In order to reduce redundancy, the detailed exemplary description will not be repeated here.

[0083] According to the method for improving the exposure power density of the maskless lithography machine, the first processed light is output by controlling the light source to emit the irradiation light, collimating and homogenizing the irradiation light through the illumination light path, and forming the first irradiation area on the modulation unit. At this time, the original image is sent to the modulation unit, and the modulation unit performs one-way stretching and compression processing in the first irradiation area after receiving the original image. Alternatively, the original image is stretched, the stretched image is sent to the modulation unit, and the modulation unit performs compression processing on the stretched image to output the exposure image. In this way, the output exposure image can be ensured to be non-deformed, the size of the exposure image is consistent with that of the original image, the power density of the exposure surface is improved, the processing scanning width is not lost, the coverage ability of long scanning width at low scanning speed is brought, and the scanning times are significantly reduced.

[0084] A further embodiment of the present application provides a maskless lithography machine 200.

[0085] As shown in Figure 12 is a structural block diagram of a maskless lithography machine according to an embodiment of the present application. As shown in Figure 12 The maskless lithography machine 200 of the embodiment of the present application includes the device 100 for improving the exposure power density of the maskless lithography machine as described in any one of the above embodiments of the present application.

[0086] It should be noted that, when the exposure power density of the maskless lithography machine is improved, the specific implementation of the method for improving the exposure power density of the maskless lithography machine is similar to the specific implementation of the device for improving the exposure power density of the maskless lithography machine described in any one of the above embodiments of the present application, and therefore, for the detailed exemplary description of the method for improving the exposure power density of the maskless lithography machine, please refer to the foregoing description of the device for improving the exposure power density of the maskless lithography machine. In order to reduce redundancy, the detailed exemplary description will not be repeated here.

[0087] According to the maskless lithography machine 200 of the embodiment of the present application, the maskless lithography machine mainly controls the light source to emit the irradiation light, then the first processing light is output after collimation and homogenization treatment of the illumination light path, and the first irradiation area is formed on the modulation unit, at this time, the original image is sent to the modulation unit, the modulation unit performs one-way stretching and compression processing in the first irradiation area after receiving the original image, or the stretching processing is performed on the original image, then the stretched image is sent to the modulation unit, and the modulation unit performs compression processing on the stretched image, so as to output the exposure image, which can ensure that the output exposure image is not deformed, so that the size of the exposure image is consistent with that of the original image, and the power density of the exposure surface is improved, without losing the processing scanning width, and the coverage ability of long scanning width under low scanning speed is brought, and the scanning times are significantly reduced.

[0088] In the description of the present specification, the description of the terms "one embodiment", "some embodiments", "exemplary embodiment", "example", "specific example", or "some examples" means that the specific features, structures, materials or characteristics described in connection with the embodiment or example are included in at least one embodiment or example of the present application. In the present specification, the exemplary description of the above terms does not necessarily mean the same embodiment or example.

[0089] Although the embodiments of the present application have been shown and described, those skilled in the art can understand that various changes, modifications, replacements and variations can be made to the embodiments without departing from the principles and purposes of the present application, and the scope of the present application is defined by the claims and their equivalents.

Claims

1. A device for improving the exposure power density of a maskless lithography machine, characterized in that: include: Light source, lighting optical path, modulation unit and controller, The light source is used to provide irradiation light; The illumination light path is used to receive the illumination light, collimate and homogenize the illumination light, and output a first processed light; The modulation unit is configured to receive the first processing light and form a first irradiation area, wherein the first irradiation area is an irradiation area formed on the modulation unit by the illumination light path; The controller is connected to the light source and is also connected to the modulation unit, and is used to control the light source to emit the illumination light, and to send the original image to the modulation unit or to send the stretched image obtained after stretching the original image to the modulation unit; The modulation unit is configured to perform unidirectional stretching and compression processing on the original image within the first irradiation area to obtain an exposure image, or the modulation unit is configured to perform unidirectional compression processing on the stretched image within the first irradiation area to obtain the exposure image, wherein the first irradiation area is larger than or equal to an area occupied by the original image; The modulation unit includes a spatial light modulator and an imaging optical path, the spatial light modulator is used to stretch the original image and output a first processed image, and the imaging optical path is connected to the spatial light modulator, and is used to compress the first processed image and output the exposure image; or, the modulation unit includes the spatial light modulator and the imaging optical path, the spatial light modulator is used to receive the stretched image sent by the controller, and the imaging optical path is connected to the spatial light modulator, and is used to compress the stretched image and output the exposure image.

2. The device for improving the exposure power density of a maskless lithography machine according to claim 1, wherein: The imaging optical path includes: A cylindrical mirror, wherein the cylindrical mirror includes a functional direction and a non-functional direction, and is used to compress the first processed image in the functional direction and keep the first processed image parallel in the non-functional direction, or to compress the stretched image in the functional direction and keep the stretched image parallel in the non-functional direction, wherein the functional direction refers to the direction in which the curvature of the cylindrical mirror is non-infinite, and the non-functional direction refers to the direction in which the curvature of the cylindrical mirror is infinite.

3. The device for improving the exposure power density of a maskless lithography machine according to claim 2, wherein: The imaging optical path further includes: The infinity correction tube lens is arranged opposite to the functional direction of the cylindrical lens and is used to adjust the compression ratio of the cylindrical lens.

4. The device for improving the exposure power density of a maskless lithography machine according to claim 3, wherein: The compression ratio is determined based on a ratio of a focal length of the infinity-corrected tube lens to a focal length of the cylindrical lens.

5. The device for improving the exposure power density of a maskless lithography machine according to claim 4, wherein: The stretching ratio of the original image is consistent with the compression ratio of the first processed image, or, The stretching ratio of the original image is consistent with the compression ratio of the imaging optical path on the stretched image.

6. The device for improving the exposure power density of a maskless lithography machine according to claim 1, wherein: The stretching direction of the original image is consistent with the compression direction of the first processed image; or, The stretching direction of the original image is consistent with the compression direction of the stretched image by the imaging light path.

7. The device for improving the exposure power density of a maskless lithography machine according to claim 1, wherein: Also includes: A processing unit is provided between the controller and the modulation unit, and includes: a substrate for receiving the exposure image; A motion platform is provided on which the substrate is arranged, and is used to drive the substrate to move so as to complete processing of the substrate.

8. A method for improving the exposure power density of a maskless lithography machine, characterized in that: The device for improving the exposure power density of a maskless lithography machine according to any one of claims 1 to 7, wherein the method comprises: Controlling the light source to emit the illumination light to the illumination light path, so that the illumination light path performs collimation and homogenization processing on the illumination light and outputs a first processed light; Controlling the modulation unit to receive the first processing light and form a first irradiation area, wherein the first irradiation area is an irradiation area formed by the illumination light path on the modulation unit; Controlling the modulation unit to receive an original image, or stretching the original image and sending the resulting stretched image to the modulation unit; Control the modulation unit to perform unidirectional stretching and compression processing on the original image within the first irradiation area to obtain an exposure image, or control the modulation unit to perform unidirectional compression processing on the stretched image within the first irradiation area to obtain the exposure image, wherein the first irradiation area is greater than or equal to the area occupied by the original image.

9. A maskless lithography machine, characterized in that: The invention comprises a device for improving the exposure power density of a maskless lithography machine as described in any one of claims 1 to 7.

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