Carving process for ultralow-line-number oblique lines

Abstract

The invention relates to the field of oblique line carving, and discloses an ultralow-line-number oblique line carving process which comprises the steps that a to-be-carved plate roller is obtained; in a laser engraving mode, according to the preset engraving requirement, the engraving angle is set to be 40-50 degrees, the pulse length is set to be 80-99 ms, the focusing parameter is set to be 8.5-11, and marking lattice points are initially engraved on the plate roller; the depth of each dot is gradually deepened and the volume of each dot is obviously increased through multiple times of engraving and superposition, so that the ink loading amount is improved, the requirement of a customer for extremely high coating amount is met, each dot can be completely formed through multiple times of engraving and parameter optimization, an expected effect can be achieved even under the condition of low mesh number of a mesh line, and the product quality is improved. The depth of each lattice point is gradually increased through multiple times of engraving instead of removing a large amount of materials at a time, and the reasonable lattice point spacing is matched, so that the risk of plate blocking is effectively reduced, and the engraving speed is improved.

Description

Technical Field

[0001] The invention relates to the field of oblique line engraving, and in particular to an ultra-low line count oblique line engraving process. Background Art

[0002] The existing oblique line engraving mainly uses the editing mode and the direct engraving mode to engrave the engraved plate roller, and the main processing range is 50LPI--800LPI. When the screen count is high, it means that the area of ​​each dot is small, and the amount of ink that each dot can carry is also small. Therefore, when the customer needs a higher plate roller coating amount, the existing engraving method cannot meet customer needs. In order to solve the above problem, an ultra-low line count oblique line engraving process is proposed.

[0003] The above information disclosed in this background technology is only used to increase the understanding of the background technology of the present invention and therefore, it may include information that does not constitute the prior art known to ordinary technicians in this field.

[0004] Invention content

[0005] In order to solve the problem of oblique line engraving, the present invention provides an ultra-low line count oblique line engraving process.

[0006] The present invention provides an ultra-low line count oblique line engraving process using the following technical solutions:

[0007] An ultra-low line count oblique line engraving process specifically comprises the following steps:

[0008] S1: Obtain the plate roller to be engraved;

[0009] S2: By laser engraving, use a screen mesh of 50LPI-800LPI, set the engraving angle to 40°-50°, the pulse length to 80ms-99ms, and the focus parameter to 8.5-11 according to the preset engraving requirements, and initially engrave the marking dots on the plate roller;

[0010] S3: Use a detector to detect whether the mesh bottom and mesh wall of the initial engraved dots in S1 are smooth, and whether the oblique line spacing is between 48 microns and 52 microns;

[0011] S4: Adjust the screen mesh to 10LPI-50LPI, obtain and use the focus parameters in S3, adjust the pulse length to 99ms, and add the setting parameters for the number of single engravings. Use the trial engraving roller to test the above parameters to meet the engraving requirements preset in S2.

[0012] S5: Based on the focusing parameters, pulse length, and single engraving times parameters verified in S4, the plate roller is engraved multiple times to meet the engraving requirements preset in S2;

[0013] S6: polishing the engraved plate roller;

[0014] S7: Clean the polished plate with a cleaning machine.

[0015] Preferably, the initial pulse length is 80 ms.

[0016] Preferably, the standard for determining whether the mesh bottom and mesh wall of the mesh point in S3 are smooth is that the mesh is engraved until there are no burrs or particles observed.

[0017] Preferably, the distance between the oblique line dots in S3 is 50 microns.

[0018] Preferably, based on the single engraving times and focal length parameters verified by the trial engraving roller in S4, after each engraving is completed, the engraving machine automatically adjusts the focal length to be consistent with the previous parameters, and the oblique line dots gradually increase with each engraving depth.

[0019] Preferably, in S6, the engraved plate roller is polished using a diamond polishing belt, and the roughness of the plate roller surface is reduced to 6 microns.

[0020] In summary, compared with the related art, the novel invention has the following beneficial effects:

[0021] 1. Through multiple engraving and superposition, the depth of each dot is gradually deepened, and the volume of each dot is significantly increased, thereby increasing the ink carrying capacity and meeting customers' needs for extremely high coating volume;

[0022] 2. Through multiple engraving and parameter optimization, ensure that each dot can be fully formed, and achieve the expected effect even under low screen count conditions;

[0023] 3. Gradually deepen the depth of each dot through multiple engravings instead of removing a large amount of material at one time, and with a reasonable dot spacing, effectively reduce the risk of plate blocking, which is conducive to increasing the engraving speed;

[0024] 4. Through multiple engraving and polishing, ensure that the surface of the plate roller is smooth and burr-free, improve the wear resistance of the plate roller, reduce local wear, and extend the service life of the plate roller;

[0025] 5. Through multiple engraving and optimization of parameters, ensure that the shape and position of each dot are correct, make the dot shape more regular, and the regular dot shape makes the ink transfer more uniform, thereby improving the transfer rate. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1 is a schematic diagram of a first-view stereoscopic structure of an embodiment of the present invention;

[0027] Figure 2 2 is a comparison diagram of the embodiments of the present invention. DETAILED DESCRIPTION

[0028] The following is combined with Figure 1-2 The present invention is described in further detail.

[0029] The embodiment of the present invention discloses an ultra-low line count oblique line engraving process. Figure 1-2 , an ultra-low line count oblique line engraving process, specifically comprising the following steps:

[0030] S1: Obtain the plate roller to be engraved;

[0031] S2: By laser engraving, use a screen mesh of 50LPI-800LPI, set the engraving angle to 40°-50°, the pulse length to 80ms-99ms, and the focus parameter to 8.5-11 according to the preset engraving requirements, and initially engrave the marking dots on the plate roller;

[0032] S3: Use a detector to detect whether the mesh bottom and mesh wall of the initial engraved dots in S1 are smooth, and whether the oblique line spacing is between 48 microns and 52 microns;

[0033] S4: Adjust the screen mesh to 10LPI-50LPI, obtain and use the focus parameters in S3, adjust the pulse length to 99ms, and add the setting parameters for the number of single engravings. Use the trial engraving roller to test the above parameters to meet the engraving requirements preset in S2.

[0034] S5: Based on the focusing parameters, pulse length, and single engraving times parameters verified in S4, the plate roller is engraved multiple times to meet the engraving requirements preset in S2;

[0035] S6: polishing the engraved plate roller;

[0036] S7: Clean the polished plate with a cleaning machine;

[0037] By adopting the above technical solution, S1: preparing a plate roller with a smooth surface and no obvious damage;

[0038] S2: Fix the plate roller on the engraving machine, set the engraving parameters, where the screen mesh is 50LPI-800LPI, the engraving angle is 45°, the pulse length is 80ms, the focus parameter is 9, perform preliminary engraving, and mark the basic shape of each dot;

[0039] S3: Use a high-precision detector to check whether the bottom and wall of each initially carved dot are smooth, and check whether the spacing between the diagonal lines is within 50 microns;

[0040] S4: Adjust the screen mesh to 10LPI-50LPI, use the focus parameter 9 obtained in S3 to adjust the pulse length to 99ms, add a single engraving number parameter, and use a trial engraving roller to perform a trial engraving verification to ensure that each dot reaches the engraving depth preset in S2;

[0041] S5: setting the engraving machine according to the parameters verified in S4, engraving the plate roller multiple times, gradually increasing the depth of each dot until the engraving depth preset in S2 is reached;

[0042] S6: After engraving, use diamond polishing tape to polish the surface of the plate roller to 6 microns to ensure that the polished surface of the plate roller is smooth and burr-free

[0043] S7: After polishing, use a cleaning machine to thoroughly clean the polished plate to ensure that the plate is clean and free of contamination.

[0044] Further, take a plate roller with a diameter of 300 mm and an engraving depth of 6 mm as an example;

[0045] S1: Prepare a plate roller with a diameter of 300 mm and check that there is no obvious damage on its surface;

[0046] S2: Set the parameters: the initial screen mesh is 80LPI, the engraving angle is 45°, the pulse length is 80ms, and the focus parameter is 9. Perform preliminary engraving according to the set parameters and mark the dots.

[0047] S3: Use a high-precision detector to check whether the bottom and wall of each dot are smooth and whether the oblique line spacing is 50 microns;

[0048] S4: Adjust the screen mesh to 10LPI, use the focus parameter 9 in S3, adjust the pulse length to 99ms, set the number of engravings to 6, and the engraving depth of each time to 1mm. Use a trial engraving roller to perform trial engraving verification to ensure that each dot reaches the preset 6mm;

[0049] S5: setting the engraving machine according to the parameters verified in S4, engraving the plate roller 6 times with a frequency of 1 mm each time, and gradually increasing the depth of each dot to 6 mm;

[0050] S6: Use a diamond polishing tape to polish the surface of the plate roller to 6 microns, ensuring that the polished surface of the plate roller is smooth and burr-free;

[0051] S7: Use a cleaning machine to thoroughly clean the polished plate to ensure that the plate is clean and free of contamination.

[0052] Reference Figure 1-2 , the initial pulse length in step S2 is 80ms;

[0053] By adopting the above technical solution, a screen mesh of 50LPI-800LPI and a pulse length of 80ms are used during the initial engraving to ensure uniform energy distribution of each dot. In step S4, the pulse length is adjusted to 99ms, and the number of single engravings is increased to ensure uniform energy distribution and sufficient depth of each dot. The depth of each dot is gradually deepened through multiple engravings to ensure that each dot can carry more ink and increase the ink carrying capacity.

[0054] Reference Figure 1-2 The standard for determining the smoothness of the mesh bottom and mesh wall in S3 is to carve until there are no burrs or particles;

[0055] It should be noted that burrs refer to irregular protrusions or sharp edges produced during the engraving process, and particles refer to small particles or irregular small protrusions produced during the engraving process. The absence of burrs ensures that the surface of the dots is flat, and the absence of particles ensures that the surface of the dots is smooth.

[0056] By adopting the above technical solution, the smooth mesh bottom and mesh wall can reduce the defects generated during the printing process, and at the same time can improve the adhesion of the ink, so that the ink can better adhere to the dots, thereby increasing the ink carrying capacity.

[0057] Reference Figure 1-2 , the distance between the oblique line dots in S3 is 50 microns;

[0058] By adopting the above technical solution, the spacing of 50 microns is relatively large, which can reduce the risk of ink clogging. The larger spacing allows the ink to flow more smoothly. At the same time, the spacing of 50 microns provides enough space for each dot to carry more ink and meet the needs of high ink loading.

[0059] Reference Figure 1-2 Based on the single engraving times and focal length parameters verified by the trial engraving roller in S4, after each engraving is completed, the engraving machine automatically adjusts the focal length to be consistent with the previous parameters, and the oblique line dots gradually increase with each engraving depth;

[0060] By adopting the above technical solution, the focal length is automatically adjusted to be consistent with the previous parameters after each engraving, ensuring the accuracy and consistency of each engraving, avoiding errors caused by focal length changes, and ensuring that the energy distribution of each engraving is uniform, reducing the generation of burrs and particles. Each dot is gradually deepened through multiple engravings to ensure that each dot can be fully formed with high forming quality.

[0061] Reference Figure 1-2 In S6, the engraved plate roller is polished with a diamond polishing belt, and the roughness of the plate roller surface is reduced to 6 microns;

[0062] By adopting the above technical solution, the surface roughness is reduced to 6 microns, which can significantly reduce defects such as scratches, burrs or granular protrusions generated during the printing process. At the same time, the smooth surface can reduce friction, thereby reducing the wear of the plate roller during use and extending the service life of the plate roller.

[0063] refer to Figure 2 , the left side shows the engraving effect of the plate roller surface engraved by using the above-mentioned ultra-low line count oblique line engraving process, and the right side shows the engraving effect of the plate roller surface engraved without using the above-mentioned ultra-low line count oblique line engraving process;

[0064] By adopting the above technical solution, the roller surface engraved using the above ultra-low line count oblique line engraving process has a low mesh count, clear and smooth dots, and a higher ink carrying capacity, which can better meet the customer's demand for a higher roller surface coating amount.

[0065] Finally, a few points should be explained: First, in the description of the present invention, it should be noted that, unless otherwise specified and limited, the terms "installed", "connected", and "connected" should be understood in a broad sense, which may refer to mechanical connection or electrical connection, or internal communication between two components, or direct connection. "upper", "lower", "left", "right", etc. are only used to indicate relative positional relationships. When the absolute position of the object being described changes, the relative positional relationship may change;

[0066] Secondly: In the drawings of the disclosed embodiments of the present invention, only the structures related to the disclosed embodiments are involved, and other structures can refer to the general design. In the absence of conflict, the same embodiment and different embodiments of the present invention can be combined with each other;

[0067] Finally: The above description is only a preferred embodiment of the present invention and is not intended to limit the present invention. Any modifications, equivalent substitutions, improvements, etc. made within the spirit and principle of the present invention should be included in the protection scope of the present invention.

[0068] The above are all preferred embodiments of the present invention, and are not intended to limit the protection scope of the present invention. Therefore, any equivalent changes made based on the structure, shape, and principle of the present invention should be included in the protection scope of the present invention.

Claims

1. An ultra-low line count oblique line engraving process, characterized in that: The specific steps include: S1: Obtain the plate roller to be engraved; S2: By laser engraving, use a screen mesh of 50LPI-800LPI, set the engraving angle to 40°-50°, the pulse length to 80ms-99ms, and the focus parameter to 8.5-11 according to the preset engraving requirements, and initially engrave the marking dots on the plate roller; S3: Use a detector to detect whether the mesh bottom and mesh wall of the initial engraved dots in S1 are smooth, and whether the oblique line spacing is between 48 microns and 52 microns; S4: Adjust the screen mesh to 10LPI-50LPI, obtain and use the focus parameters in S3, adjust the pulse length to 99ms, and add the setting parameters for the number of single engravings. Use the trial engraving roller to test the above parameters to meet the engraving requirements preset in S2. S5: Based on the focusing parameters, pulse length, and single engraving times parameters verified in S4, the plate roller is engraved multiple times to meet the engraving requirements preset in S2; S6: polishing the engraved plate roller; S7: Clean the polished plate with a cleaning machine.

2. The ultra-low line count oblique line engraving process according to claim 1, characterized in that: The initial pulse length in the S2 step is 80 ms.

3. The ultra-low line count oblique line engraving process according to claim 1, characterized in that: The standard for determining whether the mesh bottom and mesh wall of the S3 are smooth is that the mesh is engraved until there are no burrs or particles observed.

4. The ultra-low line count oblique line engraving process according to claim 1, characterized in that: The distance between the oblique line dots described in S3 is 50 microns.

5. The ultra-low line count oblique line engraving process according to claim 4, characterized in that: Based on the single engraving times and focal length parameters verified by the trial engraving roller in S4, after each engraving is completed, the engraving machine automatically adjusts the focal length to be consistent with the previous parameters, and the oblique line dots gradually increase with each engraving depth.

6. The ultra-low line count oblique line engraving process according to claim 1, characterized in that: In S6, the engraved plate roller is polished using a diamond polishing belt, and the roughness of the plate roller surface is reduced to 6 microns.

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