Coated glass and laminated glass

Abstract

The invention provides coated glass and laminated glass. The coated glass comprises a first glass plate and a heat insulation functional layer arranged on at least one surface of the first glass plate. The heat insulation function layer comprises n metal reflection layers and (n + 1) dielectric lamination layers. And each metal reflecting layer is positioned between two adjacent dielectric laminated layers. The at least one dielectric lamination layer comprises at least one silicon-based absorption layer; wherein n is an integer greater than or equal to 1. The heat insulation effect of the coated glass and the laminated glass can be improved, the mechanical performance, the heat stability and the chemical stability of the heat insulation functional layer can be guaranteed, the optical performance and the appearance quality of the heat insulation functional layer can be improved, the shading effect of the coated glass and the laminated glass can be improved, and the production cost of the laminated glass can be reduced. Meanwhile, light pollution is avoided, and the appearance color of the coated glass is more neutral.

Description

Technical Field

[0001] The present application relates to the technical field of vehicle window glass, and in particular to a coated glass and a laminated glass. Background Art

[0002] As the market demand for new energy vehicles grows, the height space inside the vehicle is shortened due to the loading of power battery components on the chassis of new energy vehicles. More and more automobile manufacturers hope to gain a larger internal height space by canceling the sunshade curtains configured on the traditional sunroof glass. After the sunshade curtains are cancelled, sunlight can directly enter the car through the sunroof glass. Especially for panoramic skylight glass or panoramic sunroof glass, the brightness inside the car will be too high and interfere with the vision of passengers, reduce the comfort of riding, and consume more energy to adjust the temperature inside the car in summer and winter. In order to meet the privacy, heat insulation and shading needs of users, a colored low-transmittance PVB film or glass plate is usually used to manufacture the sunroof glass. For example, Chinese patent CN201880003329.X discloses a composite glass plate with a sunscreen coating and a coating that reflects heat rays, specifically using a colored PVB film with a light transmittance of 2% to 80%. However, for glass manufacturers, the cost of purchasing PVB film with added colorants is high and cannot meet market demand. Summary of the invention

[0003] The present application provides a coated glass and a laminated glass with low light transmittance and high heat insulation effect.

[0004] In one aspect, the present application provides a coated glass, comprising:

[0005] a first glass sheet; and

[0006] A heat-insulating functional layer is arranged on at least one surface of the first glass plate, the heat-insulating functional layer includes n metal reflective layers and (n+1) dielectric stacks, each of the metal reflective layers is located between two adjacent dielectric stacks, and at least one dielectric stack includes at least one silicon-based absorption layer; wherein n is an integer greater than or equal to 1.

[0007] In a possible embodiment, the visible light transmittance of the first glass plate is TL1, the visible light transmittance of the coated glass is TL2, TL1≥80%, and TL1 and TL2 satisfy TL2 / TL1≤0.2.

[0008] In a possible embodiment, at least one of the dielectric stacks includes at least one of the silicon-based absorption layers and at least two dielectric layers, each of the silicon-based absorption layers is located between two adjacent dielectric layers, and the physical thickness of each of the silicon-based absorption layers is 4 nm to 20 nm.

[0009] In a possible embodiment, the dielectric stack closest to the first glass plate is the innermost dielectric stack, and the innermost dielectric stack includes at least one silicon-based absorption layer and at least two dielectric layers, and each silicon-based absorption layer is located between two adjacent dielectric layers.

[0010] In a possible embodiment, n is an integer greater than or equal to 2, the dielectric stack located between two adjacent metal reflective layers is an intermediate dielectric stack, the intermediate dielectric stack includes at least one silicon-based absorption layer and at least two dielectric layers, and each silicon-based absorption layer is located between two adjacent dielectric layers.

[0011] In a possible embodiment, at least one of the intermediate dielectric stacks includes at least two of the silicon-based absorption layers and at least three dielectric layers.

[0012] In a possible embodiment, the dielectric stack farthest from the first glass plate is the outermost dielectric stack, and the outermost dielectric stack includes at least one silicon-based absorption layer and at least two dielectric layers, and each silicon-based absorption layer is located between two adjacent dielectric layers.

[0013] In a possible embodiment, the material of the silicon-based absorption layer includes Si single substance, silicon-based compound Si 1-x M x 、Silicon-based compounds Si (1-z-y) M z N y at least one of;

[0014] in,

[0015] 0<x≤0.35,0<y≤0.1,0<z≤0.35;

[0016] Wherein, the element M is one of aluminum (Al), carbon (C), zirconium (Zr), magnesium (Mg), titanium (Ti), zinc (Zn), tin (Sn), nickel (Ni), chromium (Cr), vanadium (V), boron (B), and gallium (Ga);

[0017] The element N includes one or more of yttrium (Y), niobium (Nb), tantalum (Ta), hafnium (Hf), indium (In), cadmium (Cd), palladium (Pd), and tungsten (W).

[0018] In a possible embodiment, the thermal insulation functional layer includes at least three metal reflective layers and at least four dielectric stacks, the total physical thickness of the at least three metal reflective layers is 30nm to 50nm, at least three of the at least four dielectric stacks include the silicon-based absorption layer, and the total physical thickness of all the silicon-based absorption layers is 15nm to 50nm.

[0019] In a possible embodiment, the thermal insulation functional layer includes an innermost dielectric stack, a first metal reflective layer, a first intermediate dielectric stack, a second metal reflective layer, a second intermediate dielectric stack, a third metal reflective layer and an outermost dielectric stack stacked in sequence, the total physical thickness of all silicon-based absorption layers in the innermost dielectric stack is L1, the total physical thickness of all silicon-based absorption layers in the first intermediate dielectric stack is L2, and the total physical thickness of all silicon-based absorption layers in the second intermediate dielectric stack is L3, L1<L2+L3 or L1<L2.

[0020] In a possible embodiment, the total physical thickness of all silicon-based absorption layers in the outermost dielectric stack is L4, L4<L2+L3 or L4<L3.

[0021] In a possible embodiment, the thickness of the first metal reflective layer is A1, the thickness of the second metal reflective layer is A2, and the thickness of the third metal reflective layer is A3, wherein A1 / A2 is 0.7 to 1.2, and A3 / A2 is 0.7 to 1.2.

[0022] In a possible embodiment, the direct solar light transmittance TE of the coated glass is less than or equal to 12%, and the visible light transmittance TL2 of the coated glass is less than or equal to 15%.

[0023] On the other hand, the present application also provides a laminated glass, comprising a second glass plate, an adhesive layer and the coated glass, wherein one of the second glass plate and the first glass plate is an outer glass plate, and the other is an inner glass plate, the outer glass plate comprises a first surface and a second surface arranged opposite to each other, the inner glass plate comprises a third surface and a fourth surface arranged opposite to each other, the adhesive layer is arranged between the second surface and the third surface, and the visible light transmittance of the adhesive layer is greater than or equal to 80%.

[0024] In a possible embodiment, for visible light incident on the first surface with an incident angle of 40° to 80°, the laminated glass has an outer surface reflection color Lab value, an a value of -5 to 1, a b value of -5 to 1, and a maximum color difference △Cmax less than 3.

[0025] In a possible embodiment, the first glass plate is an outer glass plate, the second glass plate is an inner glass plate, the second glass plate is tinted glass, and the mass fraction of total iron in the second glass plate calculated as Fe2O3 is 0.7% to 2.2%;

[0026] Alternatively, the first glass plate is an inner glass plate, the second glass plate is an outer glass plate, the second glass plate is transparent glass, and a visible light transmittance of the second glass plate is greater than or equal to 80%.

[0027] In a possible embodiment, the laminated glass further includes a low-emissivity coating, and the low-emissivity coating is disposed on the fourth surface. The emissivity of the laminated glass measured from a side of the fourth surface is less than or equal to 0.35.

[0028] In a possible embodiment, the laminated glass further includes a medium radiation coating, and the medium radiation coating is disposed on the fourth surface. The emissivity of the laminated glass measured from a side of the fourth surface is 0.36-0.5.

[0029] In a possible embodiment, the laminated glass further includes a dimming element, which is disposed between the second surface and the third surface, and includes at least one of a polymer dispersed liquid crystal dimming film, a suspended particle dimming film, an electrochromic dimming film, and a dye liquid crystal dimming film.

[0030] The coated glass and laminated glass provided by the present application include a heat-insulating functional layer, the heat-insulating functional layer includes at least one metal reflective layer, the metal reflective layer can reflect infrared rays in sunlight, thereby improving the heat-insulating effect of the coated glass, and the heat-insulating functional layer also includes at least two dielectric stacks, each metal reflective layer is located between two adjacent dielectric stacks, so the dielectric stack can protect the metal reflective layer, so that the mechanical properties, thermal stability and chemical stability of the heat-insulating functional layer can be guaranteed, and the optical properties and appearance quality of the heat-insulating functional layer can be improved. In addition, at least one dielectric stack includes at least one silicon-based absorption layer, and the silicon-based absorption layer can absorb visible light. In this way, the light transmittance of the coated glass can be reduced through the design of the silicon-based absorption layer, the light-shielding effect of the coated glass can be improved, and the coated glass can be used instead of colored PVB film or colored glass to reduce the production cost of laminated glass. At the same time, since the effect of the silicon-based absorption layer on visible light is mainly absorption, the reflection of external light by the coated glass can be reduced to avoid light pollution, and the silicon-based absorption layer is conducive to making the appearance color of the coated glass more neutral while reducing the light transmittance of the coated glass. BRIEF DESCRIPTION OF THE DRAWINGS

[0031] In order to more clearly illustrate the technical solutions of the embodiments of the present application, the drawings required for use in the embodiments are briefly introduced below.

[0032] Figure 1 A schematic diagram of the structure of the coated glass provided in an embodiment of the present application;

[0033] Figure 2 for Figure 1 A schematic cross-sectional view of the coated glass shown;

[0034] Figure 3 for Figure 1 Another schematic cross-sectional view of the coated glass shown;

[0035] Figure 4 for Figure 1 Another cross-sectional schematic diagram of the coated glass shown;

[0036] Figure 5 A schematic cross-sectional view of a laminated glass provided in an embodiment of the present application;

[0037] Figure 6 A schematic cross-sectional view of a laminated glass provided in an embodiment of the present application;

[0038] Figure 7 for Figure 5 The laminated glass shown also includes a cross-sectional schematic diagram of a low-emissivity coating;

[0039] Figure 8 for Figure 5 The coated glass shown also includes a cross-sectional schematic diagram of a medium radiation coating;

[0040] Fig. 9 for Figure 5 The coated glass shown also includes a cross-sectional schematic diagram of a dimming element.

[0041] Description of reference numerals:

[0042] Coated glass 100; first glass plate 10; heat insulation functional layer 20; first metal reflection layer 201; second metal reflection layer 202; third metal reflection layer 203; fourth metal reflection layer 204; first dielectric stack 209; second dielectric stack 208; third dielectric stack 207; fourth dielectric stack 206; fifth dielectric stack 205; first silicon-based absorption layer 290; first dielectric layer 291; second dielectric layer 292; second silicon-based absorption layer 280; third dielectric layer 282; fourth dielectric layer 283; third silicon-based absorption layer 28 1; fifth dielectric layer 284; fourth silicon-based absorption layer 270; sixth dielectric layer 272; seventh dielectric layer 273; fifth silicon-based absorption layer 271; eighth dielectric layer 274; sixth silicon-based absorption layer 260; ninth dielectric layer 262; tenth dielectric layer 263; seventh silicon-based absorption layer 261; eleventh dielectric layer 264; eighth silicon-based absorption layer 250; twelfth dielectric layer 251; thirteenth dielectric layer 252; second glass plate 40; bonding layer 30; low-emissivity coating 50; medium-emissivity coating 60; dimming element 70; laminated glass 200. DETAILED DESCRIPTION

[0043] The technical solution provided by the present application will be described clearly and completely below in conjunction with the accompanying drawings. Obviously, the embodiments described in the present application are only a part of the embodiments, not all of the embodiments. Based on the embodiments described in the present application, all other embodiments obtained by ordinary technicians in this field without creative work are within the scope of protection of the present application.

[0044] Reference to "embodiments" in this application means that a particular feature, structure, or characteristic described in conjunction with the embodiments may be included in at least one embodiment of the present application. The appearance of the phrase in various locations in the specification does not necessarily refer to the same embodiment, nor is it mutually exclusive, independent, or alternative to other embodiments. It can be explicitly and implicitly understood by those skilled in the art that the embodiments described in this application can be combined with other embodiments.

[0045] The terms "first", "second", etc. in the specification and claims of this application are used to distinguish different objects, rather than to describe a specific order. In addition, the terms "including" and "having" and any variations thereof are intended to cover non-exclusive inclusions. For example: a component or device including one or more parts is not limited to the one or more parts listed, but may optionally include one or more parts that are not listed but inherent to the exemplified product, or one or more parts that it should have based on the described function.

[0046] like Figure 1 As shown, Figure 1 The coated glass 100 is a schematic structural diagram of a coated glass 100 provided in an embodiment of the present application. The coated glass 100 includes a first glass plate 10 and a heat insulation functional layer 20 .

[0047] The present application does not specifically limit the thickness of the first glass plate 10. For example, the thickness of the first glass plate 10 may be 0.7 mm to 4.0 mm. The present application does not specifically limit the shape of the first glass plate 10. For example, the first glass plate 10 may be a flat glass plate; or the first glass plate 10 may be a curved glass plate, wherein the curved glass plate has a convex surface and a concave surface facing each other, and the heat insulating functional layer 20 may be specifically disposed on the convex surface or the concave surface.

[0048] The heat-insulating functional layer 20 is disposed on at least one surface of the first glass plate 10. In one possible embodiment, the heat-insulating functional layer 20 may be directly deposited on at least one surface of the first glass plate 10. In another possible embodiment, the heat-insulating functional layer 20 may be deposited on other substrates, such as a plastic substrate or a resin substrate, which is laminated with the first glass plate 10 so that the heat-insulating functional layer 20 is disposed on at least one surface of the first glass plate 10. The heat-insulating functional layer 20 includes n metal reflective layers and (n+1) dielectric laminates, wherein n is an integer greater than or equal to 1.

[0049] The material of the metal reflective layer can be a metal or alloy of at least one element of silver (Ag), gold (Au), copper (Cu), aluminum (Al), and platinum (Pt). The metal reflective layer is used to reflect infrared rays in sunlight and reduce the infrared rays from entering the interior of the vehicle, thereby improving the heat insulation effect of the coated glass 100. In the present application, the material of the metal reflective layer is preferably silver metal or silver alloy, and the silver alloy is preferably an alloy of silver and at least one of gold, aluminum, copper, indium (In), tin (Sn), titanium (Ti), zinc (Zn), and platinum.

[0050] In a possible embodiment, Figure 2 As shown, the heat insulation functional layer 20 may include at least two metal reflective layers and at least three dielectric stacks. Figure 2 Specifically, the heat-insulating functional layer 20 includes two metal reflective layers and three dielectric stacks. The two metal reflective layers are described as the first metal reflective layer 201 and the second metal reflective layer 202 in the following embodiments. The three dielectric stacks are described as the first dielectric stack 209, the second dielectric stack 208 and the third dielectric stack 207 in the following embodiments. In this embodiment, the first dielectric stack 209, the first metal reflective layer 201, the second dielectric stack 208, the second metal reflective layer 202 and the third dielectric stack 207 are sequentially stacked on one of the surfaces of the first glass plate 10, the first dielectric stack 209 is directly disposed on the surface of the first glass plate 10, the first dielectric stack 209 is the dielectric stack closest to the first glass plate 10 in the heat-insulating functional layer 20, the first metal reflective layer 201 is closer to the first glass plate 10 than the second metal reflective layer 202, and the third dielectric stack 207 is the dielectric stack farthest from the first glass plate 10 in the heat-insulating functional layer 20.

[0051] In another possible embodiment, Figure 3 As shown, the heat insulation functional layer 20 may include at least three metal reflective layers and at least four dielectric stacks. Figure 3Specifically, the heat insulation functional layer 20 includes three metal reflective layers and four dielectric stacks. The three metal reflective layers are respectively described as the first metal reflective layer 201, the second metal reflective layer 202 and the third metal reflective layer 203 in the following embodiments. The four dielectric stacks are respectively described as the first dielectric stack 209, the second dielectric stack 208, the third dielectric stack 207 and the fourth dielectric stack 206 in the following embodiments. In this embodiment, the first dielectric stack 209, the first metal reflective layer 201, the second dielectric stack 208, the second metal reflective layer 202, the third dielectric stack 207, the third metal reflective layer 203 and the fourth dielectric stack 206 are sequentially stacked on one surface of the first glass plate 10. The first dielectric stack 209 is directly disposed on the surface of the first glass plate 10. The first dielectric stack 209 is the dielectric stack closest to the first glass plate 10 in the thermal insulation functional layer 20. The first metal reflective layer 201 is the metal reflective layer closest to the first glass plate 10 in the thermal insulation functional layer 20. The third metal reflective layer 203 is the metal reflective layer farthest from the first glass plate 10 in the thermal insulation functional layer 20. The fourth dielectric stack 206 is the dielectric stack farthest from the first glass plate 10 in the thermal insulation functional layer 20.

[0052] In a third possible embodiment, Figure 4 As shown, the heat insulation functional layer 20 may include at least four metal reflective layers and at least five dielectric stacks. Figure 4 Specifically, the heat insulation functional layer 20 includes four metal reflective layers and five dielectric stacks. The four metal reflective layers are described as the first metal reflective layer 201, the second metal reflective layer 202, the third metal reflective layer 203, and the fourth metal reflective layer 204 in the following embodiments. The five dielectric stacks are described as the first dielectric stack 209, the second dielectric stack 208, the third dielectric stack 207, the fourth dielectric stack 206, and the fifth dielectric stack 205 in the following embodiments. In this embodiment, the first dielectric stack 209, the first metal reflective layer 201, the second dielectric stack 208, the second metal reflective layer 202, the third dielectric stack 207, the third metal reflective layer 203, the fourth dielectric stack 206, the fourth metal reflective layer 204 and the fifth dielectric stack 205 are sequentially stacked on one surface of the first glass plate 10. The first dielectric stack 209 is directly disposed on the surface of the first glass plate 10. The first dielectric stack 209 is the dielectric stack closest to the first glass plate 10 in the heat insulation functional layer 20. The first metal reflective layer 201 is the metal reflective layer closest to the first glass plate 10 in the heat insulation functional layer 20. The fourth metal reflective layer 204 is the metal reflective layer farthest from the first glass plate 10 in the heat insulation functional layer 20. The fifth dielectric stack 205 is the dielectric stack farthest from the first glass plate 10 in the heat insulation functional layer 20.

[0053] Of course, in other possible embodiments, the heat insulation functional layer 20 may also include a metal reflective layer and two dielectric stacks.

[0054] Each of the metal reflective layers is located between two adjacent dielectric stacks. Figure 2 , Figure 3 and Figure 4 In the illustrated embodiment, the first metal reflective layer 201 is located between the first dielectric stack 209 and the second dielectric stack 208, and the second metal reflective layer 202 is located between the second dielectric stack 208 and the third dielectric stack 207. Figure 3 and Figure 4 In the illustrated embodiment, the third metal reflective layer 203 is located between the third dielectric stack 207 and the fourth dielectric stack 206. Figure 4 In the illustrated embodiment, the fourth metal reflective layer is located between the fourth dielectric stack 206 and the fifth dielectric stack 205. In the present application, by locating the metal reflective layer between two adjacent dielectric stacks, it is advantageous to prevent the metal reflective layer from directly contacting the first glass plate 10 and the outside air. During the heat treatment process and actual use, the dielectric stack can protect the metal reflective layer, and can prevent the alkali metal inside the first glass plate 10 from diffusing into the metal reflective layer, and can prevent the metal reflective layer from being oxidized. In this way, the mechanical properties, thermal stability and chemical stability of the heat insulation functional layer 20 can be guaranteed, and the optical properties and appearance quality of the heat insulation functional layer 20 can also be improved.

[0055] At least one of the dielectric stacks includes at least one silicon-based absorption layer. In a possible embodiment, among the multiple dielectric stacks included in the thermal insulation functional layer 20, some of the dielectric stacks may include at least one silicon-based absorption layer, and another part of the dielectric stacks may not include a silicon-based absorption layer. In another possible embodiment, among the multiple dielectric stacks included in the thermal insulation functional layer 20, each dielectric stack may include at least one silicon-based absorption layer. In the following embodiments, each dielectric stack includes at least one silicon-based absorption layer as an example.

[0056] Specifically, Figure 2As shown, the first dielectric stack 209 includes at least one silicon-based absorption layer, the second dielectric stack 208 includes at least one silicon-based absorption layer, and the third dielectric stack 207 includes at least one silicon-based absorption layer. In this embodiment, the number of silicon-based absorption layers included in the second dielectric stack 208 may be greater than the number of silicon-based absorption layers included in the first dielectric stack 209, and the number of silicon-based absorption layers included in the first dielectric stack 209 may be the same as the number of silicon-based absorption layers included in the third dielectric stack 207. Optionally, the first dielectric stack 209 includes one silicon-based absorption layer, which is described as the first silicon-based absorption layer 290 in this embodiment, the second dielectric stack 208 includes two silicon-based absorption layers, which are described as the second silicon-based absorption layer 280 and the third silicon-based absorption layer 281 in this embodiment, and the third dielectric stack 207 includes one silicon-based absorption layer, which is described as the fourth silicon-based absorption layer 270 in this embodiment.

[0057] like Figure 3 As shown, the first dielectric stack 209 includes at least one silicon-based absorption layer, the second dielectric stack 208 includes at least one silicon-based absorption layer, the third dielectric stack 207 includes at least one silicon-based absorption layer, and the fourth dielectric stack 206 includes at least one silicon-based absorption layer. In this embodiment, the number of silicon-based absorption layers included in the second dielectric stack 208 may be greater than the number of silicon-based absorption layers included in the first dielectric stack 209, the number of silicon-based absorption layers included in the third dielectric stack 207 may be greater than the number of silicon-based absorption layers included in the fourth dielectric stack 206, the number of silicon-based absorption layers included in the first dielectric stack 209 may be the same as the number of silicon-based absorption layers included in the fourth dielectric stack 206, and the number of silicon-based absorption layers included in the second dielectric stack 208 may be the same as the number of silicon-based absorption layers included in the third dielectric stack 207. Optionally, the first dielectric stack 209 includes a silicon-based absorption layer, which is described as a first silicon-based absorption layer 290 in this embodiment, the second dielectric stack 208 includes two silicon-based absorption layers, which are described as a second silicon-based absorption layer 280 and a third silicon-based absorption layer 281 in this embodiment, the third dielectric stack 207 includes two silicon-based absorption layers, which are described as a fourth silicon-based absorption layer 270 and a fifth silicon-based absorption layer 271 in this embodiment, and the fourth dielectric stack 206 includes a silicon-based absorption layer, which is described as a sixth silicon-based absorption layer 260 in this embodiment.

[0058] like Figure 4 As shown, Figure 4 exist Figure 3 Based on the illustrated embodiment, the fourth dielectric stack 206 includes a seventh silicon-based absorption layer 261 in addition to the sixth silicon-based absorption layer 260 , and the fifth dielectric stack 205 also includes a silicon-based absorption layer, which is described as an eighth silicon-based absorption layer 250 in this embodiment.

[0059] The material of any of the above-mentioned silicon-based absorption layers may include silicon element, and / or silicon-based compounds. The silicon-based absorption layer can absorb visible light. Of course, the silicon-based absorption layer can also absorb infrared and visible light at the same time. Optionally, the absorption rate of the silicon-based absorption layer to visible light is greater than the absorption rate to infrared light. The present application can reduce the transmittance of the coated glass 100 and improve the shading effect of the coated glass 100 through the design of the silicon-based absorption layer, and use the coated glass 100 instead of the colored PVB film or colored glass to reduce the production cost of the laminated glass; at the same time, since the effect of the silicon-based absorption layer on visible light is mainly absorption, the reflection of the coated glass 100 to the external light can be reduced to avoid light pollution, and the silicon-based absorption layer can reduce the transmittance of the coated glass 100 while making the appearance color of the coated glass 100 more neutral.

[0060] In a possible embodiment, the visible light transmittance of the first glass plate 10 is TL1, the visible light transmittance of the coated glass 100 is TL2, TL1≥80%, and TL1 and TL2 satisfy TL2 / TL1≤0.2.

[0061] Optionally, the visible light transmittance TL1 of the first glass plate 10 is greater than or equal to 80% and less than or equal to 98%. Exemplarily, the visible light transmittance TL1 of the first glass plate 10 may be 80%, or 81%, or 82%, or 83%, or 84%, or 85%, or 86%, or 87%, or 88%, or 89%, or 90%, or 91%, or 92%, or 93%, or 94%, or 95%, or 96%, or 97%, or 98%. By making the visible light transmittance of the first glass plate 10 ≥ 80%, the present application can ensure that when light irradiates the coated glass 100, most of the light can pass through the first glass plate 10 and enter the heat insulation functional layer 20, so that the heat insulation functional layer 20 can maximize the infrared reflection effect, and can avoid the use of high-cost tinted glass.

[0062] Optionally, the visible light transmittance TL2 of the coated glass 100 is less than or equal to 15%. Exemplarily, the visible light transmittance TL2 of the coated glass 100 may be 15%, or 14%, or 13%, or 12%, or 11%, or 10%, or 9%, or 8%, or 7%, or 6%, or 5%, or 4%, or 3%. Preferably, the visible light transmittance TL2 of the coated glass 100 is less than or equal to 13%. More preferably, the visible light transmittance TL2 of the coated glass 100 is less than or equal to 10%. More preferably, the visible light transmittance TL2 of the coated glass 100 is less than or equal to 8%. The present application makes the visible light transmittance TL2 of the coated glass 100 less than or equal to 15%, which is conducive to replacing the colored PVB with the coated glass 100 and is more conducive to reducing the product cost.

[0063] In one possible embodiment, please refer to Figure 2 , Figure 3 and Figure 4 , at least one of the dielectric stacks includes at least one of the silicon-based absorption layer and at least two dielectric layers. Each of the silicon-based absorption layers is located between two adjacent dielectric layers. The material of each dielectric layer is independently selected from at least one of oxides, nitrides or oxynitrides, and specific examples include oxides, nitrides or oxynitrides of at least one element selected from zirconium (Zr), niobium (Nb), silicon (Si), antimony (Sb), tin (Sn), zinc (Zn), indium (In), aluminum (Al), nickel (Ni), chromium (Cr), magnesium (Mg), manganese (Mn), vanadium (V), tungsten (W), hafnium (Hf), tantalum (Ta), molybdenum (Mo), gallium (Ga), yttrium (Y), bismuth (Bi), and titanium (Ti), such as aluminum-doped zinc oxide (AZO), niobium oxide (NbOx), titanium oxide (TiOx), zinc aluminum oxide (ZnAlOx), zinc oxide (ZnOx), tin oxide (SnOx), zinc tin oxide (ZnSnOx), zirconium nitride (ZrNx), silicon oxide (SiOx), silicon oxynitride (SiOxNy), silicon aluminum zirconium nitride (SiAlZrNx), silicon zirconium nitride (SiZrNx), silicon nitride (SiNx), silicon zirconium oxide (SiZrOx), silicon aluminum zirconium oxide (SiAlZrOx), indium tin oxide (ITO), etc.

[0064] Specifically, Figure 2 As shown, the first dielectric stack 209 includes a first silicon-based absorption layer 290 and two dielectric layers, which are described as a first dielectric layer 291 and a second dielectric layer 292 in this embodiment, respectively, and the first silicon-based absorption layer 290 is located between the first dielectric layer 291 and the second dielectric layer 292; the second dielectric stack 208 includes a second silicon-based absorption layer 280, a third silicon-based absorption layer 281 and three dielectric layers, which are described as a third dielectric layer 282, a fourth dielectric layer 283 and a fifth dielectric layer 284 in this embodiment, respectively, the second silicon-based absorption layer 280 is located between the third dielectric layer 282 and the fourth dielectric layer 283, and the third silicon-based absorption layer 281 is located between the fourth dielectric layer 283 and the fifth dielectric layer 284; the third dielectric stack 207 includes a fourth silicon-based absorption layer 270 and two dielectric layers, which are described as a sixth dielectric layer 272 and a seventh dielectric layer 273 in this embodiment, respectively, and the fourth silicon-based absorption layer 270 is located between the sixth dielectric layer 272 and the seventh dielectric layer 273.

[0065] The thicknesses of the first silicon-based absorption layer 290, the second silicon-based absorption layer 280, the third silicon-based absorption layer 281, and the fourth silicon-based absorption layer 270 may be the same or different. The thicknesses of the first dielectric layer 291, the second dielectric layer 292, the third dielectric layer 282, the fourth dielectric layer 283, the fifth dielectric layer 284, the sixth dielectric layer 272, and the seventh dielectric layer 273 may be the same or different. The other elements in the materials of the first silicon-based absorption layer 290, the second silicon-based absorption layer 280, the third silicon-based absorption layer 281, and the fourth silicon-based absorption layer 270 except for silicon may be the same or different. The materials of the first dielectric layer 291, the second dielectric layer 292, the third dielectric layer 282, the fourth dielectric layer 283, the fifth dielectric layer 284, the sixth dielectric layer 272, and the seventh dielectric layer 273 may be the same or different.

[0066] like Figure 3 As shown, the first dielectric stack 209 includes a first silicon-based absorption layer 290 and two dielectric layers, which are described as a first dielectric layer 291 and a second dielectric layer 292 in this embodiment, respectively. The first silicon-based absorption layer 290 is located between the first dielectric layer 291 and the second dielectric layer 292; the second dielectric stack 208 includes a second silicon-based absorption layer 280, a third silicon-based absorption layer 281 and three dielectric layers, which are described as a third dielectric layer 282, a fourth dielectric layer 283 and a fifth dielectric layer 284 in this embodiment, respectively. The second silicon-based absorption layer 280 is located between the third dielectric layer 282 and the fourth dielectric layer 283, and the third silicon-based absorption layer 281 is located between the fourth dielectric layer 283 and the fifth dielectric layer 284. The third dielectric stack 207 includes a fourth silicon-based absorption layer 270, a fifth silicon-based absorption layer 271 and three dielectric layers, which are described as the sixth dielectric layer 272, the seventh dielectric layer 273 and the eighth dielectric layer 274 in this embodiment, respectively. The fourth silicon-based absorption layer 270 is located between the sixth dielectric layer 272 and the seventh dielectric layer 273, and the fifth silicon-based absorption layer 271 is located between the seventh dielectric layer 273 and the eighth dielectric layer 274; the fourth dielectric stack 206 includes a sixth silicon-based absorption layer 260 and two dielectric layers, which are described as the ninth dielectric layer 262 and the tenth dielectric layer 263 in this embodiment, respectively. The sixth silicon-based absorption layer 260 is located between the ninth dielectric layer 262 and the tenth dielectric layer 263.

[0067] The thicknesses of the first silicon-based absorption layer 290, the second silicon-based absorption layer 280, the third silicon-based absorption layer 281, the fourth silicon-based absorption layer 270, the fourth silicon-based absorption layer 270, the fifth silicon-based absorption layer 271, and the sixth silicon-based absorption layer 260 may be the same or different. The thicknesses of the first dielectric layer 291, the second dielectric layer 292, the third dielectric layer 282, the fourth dielectric layer 283, the fifth dielectric layer 284, the sixth dielectric layer 272, the seventh dielectric layer 273, the eighth dielectric layer 274, the ninth dielectric layer 262, and the tenth dielectric layer 263 may be the same or different. The other elements in the materials of the first silicon-based absorption layer 290, the second silicon-based absorption layer 280, the third silicon-based absorption layer 281, the fourth silicon-based absorption layer 270, the fifth silicon-based absorption layer 271, and the sixth silicon-based absorption layer 260 except silicon may be the same or different. The materials of the first dielectric layer 291 , the second dielectric layer 292 , the third dielectric layer 282 , the fourth dielectric layer 283 , the fifth dielectric layer 284 , the sixth dielectric layer 272 , the seventh dielectric layer 273 , the eighth dielectric layer 274 , the ninth dielectric layer 262 and the tenth dielectric layer 263 may be the same or different.

[0068] Similarly, if Figure 4 As shown, Figure 4 exist Figure 3 Based on the embodiment shown, the seventh silicon-based absorption layer 261 is located between the tenth dielectric layer 263 and the eleventh dielectric layer 264. The eighth silicon-based absorption layer 250 is located between two adjacent dielectric layers, which are described as the twelfth dielectric layer 251 and the thirteenth dielectric layer 252 in this embodiment.

[0069] By making at least one dielectric stack include at least one silicon-based absorption layer, it is beneficial to improve the effect of the coated glass 100 absorbing visible light to reduce the transmittance, and it is also beneficial to improve the effect of neutralizing the appearance color of the coated glass 100. By making each dielectric stack include at least two dielectric layers, and each silicon-based absorption layer is located between two adjacent dielectric layers, it is beneficial to separate the silicon-based absorption layer from the metal reflection layer through the dielectric layer, so that the uniformity of the deposition of the silicon-based absorption layer and the metal reflection layer can be ensured. At the same time, by separating the silicon-based absorption layer from the metal reflection layer through the dielectric layer, it is also possible to avoid the abnormal growth of the grains of the metal reflection layer during the heat treatment process, so as to ensure the compactness of the metal reflection layer. In addition, by making each dielectric stack include at least two dielectric layers, and each silicon-based absorption layer is located between two adjacent dielectric layers, it is also beneficial to separate the silicon-based absorption layer from the first glass plate 10 through the dielectric layer, and it is beneficial to separate the silicon-based absorption layer from the external air through the dielectric layer, so as to ensure the optical and mechanical properties of each silicon-based absorption layer.

[0070] Optionally, the physical thickness of each silicon-based absorption layer is 4 nm to 20 nm. Preferably, the physical thickness of each silicon-based absorption layer is 4 nm to 15 nm. More preferably, the physical thickness of each silicon-based absorption layer is 5 nm to 10 nm.

[0071] The present application makes the physical thickness of each silicon-based absorption layer 4nm to 20nm, with specific examples being 4nm, 5nm, 6nm, nm, 8nm, 9nm, 10nm, 11nm, 12nm, 13nm, 14nm, 15nm, 16nm, 17nm, 18nm, 19nm, and 20nm. The physical thickness of the silicon-based absorption layer is 4nm to 20nm, which can effectively reduce the reflectivity of the coated glass 100 to external visible light and prevent the coated glass 100 from causing light pollution. At the same time, when the silicon-based absorption layer is too thin, it is not conducive to achieving the effect of low transmittance of the coated glass 100, and when the silicon-based absorption layer is too thick, the reflectivity of the coated glass 100 to external visible light will increase, causing an increased risk of light pollution.

[0072] In one possible embodiment, please refer to Figures 2 to 4 The dielectric stack closest to the first glass plate 10 is the innermost dielectric stack, and the innermost dielectric stack includes at least one silicon-based absorption layer and at least two dielectric layers, and each silicon-based absorption layer is located between two adjacent dielectric layers.

[0073] Understandably, in Figure 2 In the illustrated embodiment, the first dielectric stack 209 is the innermost dielectric stack, wherein the first dielectric stack 209 comprises at least one silicon-based absorption layer and at least two dielectric layers, and each silicon-based absorption layer is located between two adjacent dielectric layers.

[0074] Understandably, in Figure 3 In the illustrated embodiment, the first dielectric stack 209 is the innermost dielectric stack, wherein the first dielectric stack 209 comprises at least one silicon-based absorption layer and at least two dielectric layers, and each silicon-based absorption layer is located between two adjacent dielectric layers.

[0075] Understandably, in Figure 4 In the illustrated embodiment, the first dielectric stack 209 is the innermost dielectric stack, wherein the first dielectric stack 209 comprises at least one silicon-based absorption layer and at least two dielectric layers, and each silicon-based absorption layer is located between two adjacent dielectric layers.

[0076] By making the innermost dielectric stack include at least one silicon-based absorption layer and at least two dielectric layers, it is advantageous to separate the silicon-based absorption layer from the first glass plate 10 through the dielectric layer and effectively reduce the reflectivity of the coated glass 100 .

[0077] In one possible embodiment, please refer to Figures 2 to 4 , n is an integer greater than or equal to 2, the dielectric stack located between two adjacent metal reflective layers is an intermediate dielectric stack, the intermediate dielectric stack includes at least one silicon-based absorption layer and at least two dielectric layers, and each silicon-based absorption layer is located between two adjacent dielectric layers.

[0078] Understandably, in Figure 2 In the illustrated embodiment, the second dielectric stack 208 is an intermediate dielectric stack, wherein the second dielectric stack 208 includes at least one silicon-based absorption layer and at least two dielectric layers, and each silicon-based absorption layer is located between two adjacent dielectric layers.

[0079] Understandably, in Figure 3 In the illustrated embodiment, the second dielectric stack 208 and the third dielectric stack 207 are intermediate dielectric stacks. The second dielectric stack 208 includes at least one silicon-based absorption layer and at least two dielectric layers, each of which is located between two adjacent dielectric layers, and the third dielectric stack 207 includes at least one silicon-based absorption layer and at least two dielectric layers, each of which is located between two adjacent dielectric layers.

[0080] Understandably, in Figure 4 In the illustrated embodiment, the second dielectric stack 208, the third dielectric stack 207 and the fourth dielectric stack 206 are intermediate dielectric stacks. The second dielectric stack 208 includes at least one silicon-based absorption layer and at least two dielectric layers, each of which is located between two adjacent dielectric layers, and the third dielectric stack 207 includes at least one silicon-based absorption layer and at least two dielectric layers, each of which is located between two adjacent dielectric layers, and the fourth dielectric stack 206 includes at least one silicon-based absorption layer and at least two dielectric layers, each of which is located between two adjacent dielectric layers.

[0081] By making the intermediate dielectric stack include at least one silicon-based absorption layer and at least two dielectric layers, it is advantageous to separate the silicon-based absorption layer from the metal reflection layer through the dielectric layer, and effectively reduce the reflectivity of the coated glass 100 .

[0082] Optionally, at least one of the intermediate dielectric stacks includes at least two of the silicon-based absorption layers and at least three dielectric layers.

[0083] Understandably, in Figure 2 In the illustrated embodiment, the second dielectric stack 208 may include at least two silicon-based absorber layers and at least three dielectric layers.

[0084] Understandably, in Figure 3 In the illustrated embodiment, at least one of the second dielectric stack 208 and the third dielectric stack 207 may include at least two silicon-based absorption layers and at least three dielectric layers.

[0085] Understandably, in Figure 4 In the illustrated embodiment, at least one of the second dielectric stack 208 , the third dielectric stack 207 , and the fourth dielectric stack 206 may include at least two silicon-based absorption layers and at least three dielectric layers.

[0086] In a possible embodiment, the dielectric stack farthest from the first glass plate is the outermost dielectric stack, and the outermost dielectric stack includes at least one silicon-based absorption layer and at least two dielectric layers, and each silicon-based absorption layer is located between two adjacent dielectric layers.

[0087] Understandably, in Figure 2 In the illustrated embodiment, the third dielectric stack 207 is the outermost dielectric stack, wherein the third dielectric stack 207 comprises at least one silicon-based absorption layer and at least two dielectric layers, and each silicon-based absorption layer is located between two adjacent dielectric layers.

[0088] Understandably, in Figure 3 In the illustrated embodiment, the fourth dielectric stack 206 is the outermost dielectric stack, wherein the fourth dielectric stack 206 includes at least one silicon-based absorption layer and at least two dielectric layers, and each silicon-based absorption layer is located between two adjacent dielectric layers.

[0089] Understandably, in Figure 4 In the illustrated embodiment, the fifth dielectric stack 205 is the outermost dielectric stack, wherein the fifth dielectric stack 205 comprises at least one silicon-based absorption layer and at least two dielectric layers, and each silicon-based absorption layer is located between two adjacent dielectric layers.

[0090] By making the outermost dielectric stack include at least one silicon-based absorption layer and at least two dielectric layers, it is advantageous to separate the silicon-based absorption layer from the external air through the dielectric layer, and effectively reduce the reflectivity of the coated glass 100 .

[0091] The material of the silicon-based absorption layer includes Si single substance, silicon-based compound Si 1-x M x , silicon-based compounds Si (1-z-y) M z N y Optionally, the material of the silicon-based absorption layer is Si single substance, or a silicon-based compound Si 1-x M x Or silicon-based compounds Si (1-z-y) Mz N y .

[0092] Silicon-based compounds Si 1-x M x The element M is one of aluminum (Al), carbon (C), zirconium (Zr), magnesium (Mg), titanium (Ti), zinc (Zn), tin (Sn), nickel (Ni), chromium (Cr), vanadium (V), boron (B), and gallium (Ga). Wherein 0<x≤0.35, or 0.02~0.35, can ensure that the silicon-based compound has a melting point greater than 800°C, and specific examples include 0.01, 0.02, 0.03, 0.04, 0.05, 0.06, 0.08, 0.1, 0.12, 0.15, 0.18, 0.2, 0.21, 0.22, 0.25, 0.28, 0.3, 0.31, 0.32, 0.33, 0.34, 0.35, etc.

[0093] Silicon-based compounds Si (1-z-y) M z N y The element M is one of aluminum (Al), carbon (C), zirconium (Zr), magnesium (Mg), titanium (Ti), zinc (Zn), tin (Sn), nickel (Ni), chromium (Cr), vanadium (V), boron (B), and gallium (Ga); the element N includes one or more of aluminum (Al), carbon (C), zirconium (Zr), magnesium (Mg), titanium (Ti), zinc (Zn), tin (Sn), nickel (Ni), chromium (Cr), vanadium (V), boron (B), gallium (Ga), yttrium (Y), niobium (Nb), tantalum (Ta), hafnium (Hf), indium (In), cadmium (Cd), palladium (Pd), and tungsten (W). Where 0<y≤0.1, 0<z≤0.35, it can ensure that the silicon-based compound has a melting point greater than 800°C. Alternatively, 0.01≤y≤0.1, specifically 0.01, 0.02, 0.03, 0.04, 0.05, 0.06, 0.07, 0.08, 0.09, 0.1, etc. Alternatively, 0.02≤z≤0.35, specifically 0.01, 0.02, 0.03, 0.04, 0.05, 0.06, 0.08, 0.1, 0.12, 0.15, 0.18, 0.2, 0.21, 0.22, 0.25, 0.28, 0.3, 0.31, 0.32, 0.33, 0.34, 0.35, etc.

[0094] In a possible embodiment, when the heat insulation functional layer 20 includes a plurality of silicon-based absorption layers, the material of some of the silicon-based absorption layers may be Si single substance, and the other part may be a silicon-based compound Si. 1-x M x And / or silicon-based compounds Si (1-z-y) M z Ny In another possible embodiment, when the heat insulation functional layer 20 includes a plurality of silicon-based absorption layers, the material of each silicon-based absorption layer may be Si single substance, or may be a silicon-based compound Si. 1-x M x , can also be silicon-based compounds Si (1-z-y) M z N y .

[0095] Optional, such as Figure 3 As shown, the material of the first silicon-based absorption layer 290 can be Si 1-x Al x The material of the second silicon-based absorption layer 280 can be Si 1-x Al x The material of the third silicon-based absorption layer 281 can be Si 1-x Al x The material of the fourth silicon-based absorption layer 270 can be Si (1-z-y) Al z Mg y The material of the fifth silicon-based absorption layer 271 can be Si 1-x Al x The material of the sixth silicon-based absorption layer 260 can be Si 1-x Al x The values ​​of x in the first silicon-based absorption layer 290, the second silicon-based absorption layer 280, the third silicon-based absorption layer 281, the fifth silicon-based absorption layer 271 and the sixth silicon-based absorption layer 260 may be the same or different. The value of z in the fourth silicon-based absorption layer 270 may be the same or different from the values ​​of x in the first silicon-based absorption layer 290, the second silicon-based absorption layer 280, the third silicon-based absorption layer 281, the fifth silicon-based absorption layer 271 and the sixth silicon-based absorption layer 260.

[0096] The silicon-based compound has a high absorption coefficient in the wavelength range of 300nm-2500nm and can effectively absorb visible light and infrared light. In this embodiment, the material of the silicon-based absorption layer includes Si single substance or silicon-based compound Si 1-x M x Or silicon-based compounds Si (1-z-y) M z N y , meeting the requirements of 600°C high temperature molding resistance of the silicon-based absorption layer and the coated glass 100 during processing and manufacturing. In addition, during the thermal processing, the silicon-based compound can form a stable chemical bond through Si and the O element in the adjacent dielectric layer. A certain content of Si element can ensure sufficient chemical bond formation, thereby making the bond between the silicon-based absorption layer and the adjacent dielectric layer stronger, and each dielectric stack has certain mechanical properties.

[0097] In a possible embodiment, the heat insulation functional layer 20 includes at least three metal reflective layers and at least four dielectric stacks, and the total physical thickness of the at least three metal reflective layers is 30nm to 50nm, and specific examples include 30nm, 31nm, 33nm, 35nm, 36nm, 38nm, 40nm, 42nm, 44nm, 45nm, 48nm, 50nm, etc. The at least four dielectric stacks include at least three silicon-based absorption layers. The total physical thickness of all the silicon-based absorption layers is between 15nm and 50nm, and specific examples include 15nm, 18nm, 20nm, 22nm, 23nm, 25nm, 28nm, 30nm, 31nm, 33nm, 35nm, 36nm, 38nm, 40nm, 42nm, 44nm, 45nm, 48nm, 50nm, etc.

[0098] Optional, such as Figure 3 As shown, taking the case where the heat insulation functional layer 20 includes three metal reflective layers, the thickness of the first metal reflective layer 201 can be 11nm-17nm, the thickness of the second metal reflective layer 202 can be 11nm-17nm, and the thickness of the third metal reflective layer 203 can be 11nm-17nm. Taking the case where the heat insulation functional layer 20 includes six silicon-based absorption layers, the thickness of the first silicon-based absorption layer 290 can be 2nm-9nm, the thickness of the second silicon-based absorption layer 280 can be 2nm-9nm, the thickness of the third silicon-based absorption layer 281 can be 2nm-9nm, the thickness of the fourth silicon-based absorption layer 270 can be 2nm-9nm, the thickness of the fifth silicon-based absorption layer 271 can be 2nm-9nm, and the thickness of the sixth silicon-based absorption layer 260 can be 2nm-9nm.

[0099] The present application makes the heat-insulating functional layer 20 include at least three metal reflective layers, and the total thickness of the metal reflective layers in the heat-insulating functional layer 20 is 30nm to 50nm, which is conducive to ensuring the effect of the heat-insulating functional layer 20 reflecting infrared rays and achieving the high heat-insulating effect of the coated glass 100. When the total thickness of the metal reflective layers in the heat-insulating functional layer 20 is too thin, that is, less than 30nm, the reflection performance of infrared rays is weak, and the coated glass 100 cannot achieve the required heat-insulating effect. When the total thickness of the metal reflective layers in the heat-insulating functional layer 20 is too thick, that is, greater than 50nm, the color of the heat-insulating functional layer 20 is reddish, and the color difference of the reflected color of the light incident at 40° to 80° is large, making it difficult to achieve a neutral color for the appearance of the coated glass 100, which will affect the beauty of the coated glass 100.

[0100] The present application makes the heat-insulating functional layer 20 include at least three silicon-based absorption layers, and the total thickness of the silicon-based absorption layers in the heat-insulating functional layer 20 is 15nm to 50nm, which is conducive to ensuring the effect of the heat-insulating functional layer 20 absorbing visible light, so that the coated glass 100 has a lower light transmittance. When the total thickness of the silicon-based absorption layers in the heat-insulating functional layer 20 is too thin, that is, less than 15nm, the absorption performance of visible light is weak, and the coated glass 100 cannot achieve the required low transmittance effect. When the total thickness of the silicon-based absorption layers in the heat-insulating functional layer 20 is too thick, that is, greater than 50nm, the color difference of the reflected color of the light incident at 40° to 80° is large, and it is difficult to achieve the appearance color of the coated glass 100 as a neutral color, which will affect the beauty of the coated glass 100.

[0101] In a possible embodiment, Figure 3 As shown, the heat-insulating functional layer 20 includes an innermost dielectric stack (i.e., a first dielectric stack 209), a first metal reflective layer 201, a first intermediate dielectric stack (i.e., a second dielectric stack 208), a second metal reflective layer 202, a second intermediate dielectric stack (i.e., a third dielectric stack 207), a third metal reflective layer 203, and an outermost dielectric stack (i.e., a fourth dielectric stack 206) stacked in sequence. The total physical thickness of all silicon-based absorption layers in the innermost dielectric stack is L1, the total physical thickness of all silicon-based absorption layers in the first intermediate dielectric stack is L2, and the total physical thickness of all silicon-based absorption layers in the second intermediate dielectric stack is L3, where L1<L2+L3 or L1<L2.

[0102] Optionally, L1 may be 5 mm to 9 mm, L2 may be 5 mm to 11 mm, and L3 may be 5 mm to 12 mm.

[0103] In a possible embodiment, the total physical thickness of all silicon-based absorption layers in the outermost dielectric stack is L4, L4<L2+L3 or L4<L3.

[0104] Optionally, L4 may be less than 10 mm.

[0105] Optionally, the thickness ratio of two adjacent metal reflective layers is 0.7 to 1.2, and specifically, 0.7, 0.75, 0.8, 0.85, 0.9, 0.95, 1, 1.05, 1.1, 1.15, and 1.2. In other words, when the heat insulation functional layer 20 includes multiple metal reflective layers, the thicknesses of the multiple metal reflective layers are close. For example, the difference in thickness between any two metal reflective layers is less than or equal to 5 nm.

[0106] In a possible embodiment, Figure 3As shown, the thermal insulation functional layer 20 includes a first metal reflective layer 201, a second metal reflective layer 202 and a third metal reflective layer 203 arranged in sequence, the thickness of the first metal reflective layer 201 is A1, the thickness of the second metal reflective layer 202 is A2, and the thickness of the third metal reflective layer 203 is A3, wherein A1 / A2 is 0.7 to 1.2, and A3 / A2 is 0.7 to 1.2.

[0107] It can be understood that the thicknesses of the first metal reflective layer 201, the second metal reflective layer 202 and the third metal reflective layer 203 are similar. Optionally, A1 / A2 is 0.7-1, and A3 / A2 is 0.7-1; or, A1 / A2 is 1-1.2, and A3 / A2 is 1-1.2; or, A1 / A2 is 0.7-1, and A3 / A2 is 1-1.2; or, A1 / A2 is 1-1.2, and A3 / A2 is 0.7-1. For example, the thicknesses of the first metal reflective layer 201, the second metal reflective layer 202 and the third metal reflective layer 203 may decrease in sequence, or the thicknesses of the first metal reflective layer 201, the second metal reflective layer 202 and the third metal reflective layer 203 may increase in sequence, or the thickness of the first metal reflective layer 201 may be less than the thickness of the second metal reflective layer 202, and the thickness of the third metal reflective layer 203 may be less than the thickness of the second metal reflective layer 202, or the thickness of the first metal reflective layer 201 may be less than the thickness of the second metal reflective layer 202, and the thickness of the third metal reflective layer 203 may be greater than the thickness of the second metal reflective layer 202.

[0108] This embodiment sets the thickness of n metal reflective layers in a certain ratio, thereby effectively improving the heat insulation performance of the heat insulation functional layer 20 and ensuring that the color difference of the reflected color of the coated glass 100 for light incident at 40° to 80° is small, so that the appearance of the coated glass 100 is neutral in color and more beautiful.

[0109] In a possible embodiment, the direct solar light transmittance TE of the coated glass 100 is less than or equal to 12%, and the visible light transmittance TL2 of the coated glass 100 is less than or equal to 15%.

[0110] In this embodiment, the solar direct light transmittance TE of the coated glass 100 and the visible light transmittance TL2 of the coated glass 100 are measured and calculated according to the standard ISO9050. Optionally, the solar direct light transmittance TE of the coated glass 100 may be less than or equal to 10%, preferably less than or equal to 7%, and more preferably less than or equal to 5%; the visible light transmittance TL2 of the coated glass 100 may be less than or equal to 12%, preferably less than or equal to 10%, and more preferably less than or equal to 5%.

[0111] In this embodiment, the direct solar transmittance TE of the coated glass 100 is relatively low, and it has good blocking ability in the solar spectrum (300nm-2500nm) band, which can not only block ultraviolet rays and visible light, but also block infrared rays, and has good heat insulation function. When used as skylight glass, it can meet the heat insulation requirements. At the same time, the visible light transmittance TL of the coated glass 100 is relatively low, and it has a better sunshade effect. When used as skylight glass, it can meet the requirements of shading and privacy protection. In addition, in this embodiment, by setting a heat insulation functional layer 20 instead of colored PVB or colored glass, the low transmittance and high heat insulation effect of the coated glass 100 can be achieved. In production and manufacturing, it is beneficial to improve the selectivity of the first glass plate 10 and can effectively reduce production costs.

[0112] Furthermore, if Figure 5 As shown, Figure 5 A cross-sectional schematic diagram of a laminated glass 200 provided in an embodiment of the present application. The laminated glass 200 comprises a second glass plate 40, an adhesive layer 30 and the coated glass 100. One of the first glass plate 10 and the second glass plate 40 is an outer glass plate, and the other is an inner glass plate. The outer glass plate comprises a first surface and a second surface disposed opposite to each other, and the inner glass plate comprises a third surface and a fourth surface disposed opposite to each other. The adhesive layer 30 is disposed between the second surface and the third surface, and the visible light transmittance of the adhesive layer 30 is greater than or equal to 80%.

[0113] The first surface of the outer glass plate faces the outside of the vehicle, and the second surface of the outer glass plate faces the bonding layer 30 ; the third surface of the inner glass plate faces the bonding layer 30 , and the fourth surface of the inner glass plate faces the inside of the vehicle.

[0114] In a possible embodiment, Figure 5 As shown, the first glass plate 10 is an outer glass plate, and the second glass plate 40 is an inner glass plate. The heat insulation functional layer 20 is disposed on the second surface of the outer glass plate.

[0115] In another possible embodiment, Figure 6 As shown, the first glass plate 10 is an inner glass plate, and the second glass plate 40 is an outer glass plate. The heat insulation functional layer 20 is disposed on the third surface of the inner glass plate.

[0116] The present application does not make any specific limitation on the thickness of the first glass plate 10 and the thickness of the second glass plate 40. Optionally, the thickness of the first glass plate 10 may be 1.8 mm to 3.5 mm, and the thickness of the second glass plate 40 may be 0.7 mm to 4 mm. The thickness of the first glass plate 10 and the thickness of the second glass plate 40 may be the same or different. The present application does not make any specific limitation on the material of the bonding layer 30. Optionally, the material of the bonding layer 30 may include polyvinyl butyral (PVB), or ethylene-vinyl acetate copolymer (EVA), or ionic polymer (SGP). The present application does not make any specific limitation on the thickness of the bonding layer 30. Optionally, the thickness of the bonding layer 30 is less than the thickness of the first glass plate 10, and the thickness of the bonding layer 30 may be 0.38 mm to 2.28 mm, and specific examples include 0.38 mm, 0.5 mm, 0.76 mm, 1.14 mm, 1.52 mm, 1.9 mm, 2.28 mm, etc. In a possible embodiment, the material of the adhesive layer 30 may be PVB, and the thickness of the adhesive layer 30 may be 0.76 mm. The adhesive layer 30 may be rectangular or wedge-shaped.

[0117] The laminated glass 200 has an outer surface reflection color Lab value for visible light incident on the first surface with an incident angle between 40° and 80°, an a value between -5 and 1, a b value between -5 and 1, and a maximum color difference ΔCmax less than 3.

[0118] Optionally, the coated glass 100 has a reflected color a value greater than -5 and less than 1 for light incident on the first surface at an incident angle of 40°, and a b value greater than -5 and less than 1, and / or, the coated glass 100 has a reflected color a value greater than -5 and less than 1 for light incident on the first surface at an incident angle of 50°, and a b value greater than -5 and less than 1, and / or, the coated glass 100 has a reflected color a value greater than -5 and less than 1 for light incident on the first surface at an incident angle of 60°. The a value of the reflected color of the light is greater than -5 and less than 1, and the b value is greater than -5 and less than 1, and / or, the a value of the reflected color of the light incident on the first surface of the coated glass 100 with an incident angle of 70° is greater than -5 and less than 1, and the b value is greater than -5 and less than 1, and / or, the a value of the reflected color of the light incident on the first surface of the coated glass 100 with an incident angle of 80° is greater than -5 and less than 1, and the b value is greater than -5 and less than 1.

[0119] In a possible embodiment, the a value of the reflected color of the coated glass 100 for the light incident on the first surface with an incident angle of 40° can be greater than -2 and less than 0.5, and the b value can be greater than -3 and less than 0.5; the a value of the reflected color of the coated glass 100 for the light incident on the first surface with an incident angle of 50° can be greater than -2 and less than 0, and the b value can be greater than -3 and less than 0; the a value of the reflected color of the coated glass 100 for the light incident on the first surface with an incident angle of 60° can be greater than -2 and less than 0, and the b value can be greater than -3 and less than 0. The a value of the reflected color of the light can be greater than -1 and less than 0.5, and the b value can be greater than -3 and less than 0; the a value of the reflected color of the light incident on the first surface of the coated glass 100 with an incident angle of 70° can be greater than -2 and less than 0.8, and the b value can be greater than -2 and less than 0; the a value of the reflected color of the light incident on the first surface of the coated glass 100 with an incident angle of 80° can be greater than -1 and less than 0.5, and the b value can be greater than -1 and less than 0.

[0120] Optionally, the maximum color difference ΔCmax of the laminated glass 200 may be less than or equal to 2, preferably, less than or equal to 1.5. The maximum color difference ΔCmax satisfies the formula:

[0121] In this embodiment, the high-angle reflection color of the laminated glass 200 is close to neutral color or cool color, which is more beautiful. If the color difference deviation is too large, the human eye can distinguish the drastic color change. With the change of angle, the color changes drastically, affecting the overall color beauty of the vehicle, which is not conducive to meeting the demand for aesthetic design in the existing market. The maximum color difference △Cmax of the reflected color at 40° to 80° is less than 3. In a wide angle range, it is not easy for the human eye to distinguish obvious color differences, which improves the appearance design space of the sunroof glass.

[0122] In the embodiment where the first glass plate 10 is an outer glass plate and the second glass plate 40 is an inner glass plate, the second glass plate 40 may be tinted glass, and the mass fraction of total iron in Fe2O3 in the second glass plate 40 is 0.7% to 2.2%.

[0123] When the first glass plate 10 is an outer glass plate, by making the second glass plate 40 a tinted glass, external light can be further prevented from entering the interior of the vehicle, thereby improving the efficiency of the laminated glass 200 in absorbing and reflecting incident light, and achieving the low transmittance and high heat insulation effect of the laminated glass 200.

[0124] The material of the first glass plate 10 may be soda-lime glass, high-aluminum glass, lithium-aluminum glass or borosilicate glass, and the material of the second glass plate 40 may be soda-lime glass, high-aluminum glass, lithium-aluminum glass or borosilicate glass.

[0125] In the embodiment where the first glass plate 10 is an inner glass plate and the second glass plate 40 is an outer glass plate, the second glass plate 40 may be transparent glass, and the visible light transmittance of the second glass plate 40 is greater than or equal to 80%.

[0126] When the first glass plate 10 is the inner glass plate, by making the visible light transmittance of the second glass plate 40 greater than 80%, most of the external incident light can be transmitted through the second glass plate 40 and the bonding layer 30 and incident on the thermal insulation functional layer 20, so that the light transmittance of the coated glass 100 is reduced through the absorption and reflection of the thermal insulation functional layer 20, and the high thermal insulation effect of the coated glass 100 is achieved, and it is avoided that the second glass plate 40 and the bonding layer 30 absorb more infrared rays, which causes the temperature of the coated glass 100 to rise.

[0127] Optional, such as Figure 7 As shown, the laminated glass 200 further includes a low-emissivity coating 50. The low-emissivity coating 50 is disposed on the fourth surface, and the emissivity of the laminated glass 200 measured from the fourth surface side is less than or equal to 0.35.

[0128] Exemplarily, the emissivity of the laminated glass 200 measured from the fourth surface side is 0.15, or 0.16, or 0.17, or 0.18, or 0.19, or 0.2, or 0.21, or 0.22, or 0.23, or 0.24, or 0.25, or 0.26, or 0.27, or 0.28, or 0.29, or 0.3, or 0.31, or 0.32, or 0.33, or 0.34, or 0.35.

[0129] The low-emissivity coating 50 includes at least one transparent conductive oxide (TCO) layer, the material of the transparent conductive oxide layer is selected from at least one of doped zinc oxide, indium tin oxide (ITO), nickel chromium oxide (NiCrOx), and fluorine-doped tin oxide (FTO), and the doped zinc oxide is zinc oxide doped with one or a combination of two or more of aluminum, tungsten, hafnium, gallium, yttrium, niobium, and neodymium elements. The low-emissivity coating 50 can be deposited on the fourth surface by a process such as magnetron sputtering, which can further reduce the emissivity of the laminated glass 200.

[0130] Optional, such as Figure 8 As shown, the laminated glass 200 further includes a medium radiation coating 60. The medium radiation coating 60 is disposed on the fourth surface, and the emissivity of the laminated glass 200 measured from one side of the fourth surface is 0.36-0.5.

[0131] Exemplarily, the emissivity of the laminated glass 200 measured from the fourth surface side is 0.36, or 0.37, or 0.38, or 0.39, or 0.40, or 0.41, or 0.42, or 0.43, or 0.44, or 0.45.

[0132] The material of the medium radiation coating 60 can be selected from at least one of nickel-chromium (NiCr) compounds, nickel-aluminum (NiAl) compounds, nickel-silicon (NiSi) compounds, chromium (Cr), titanium nitride (TiN) compounds, niobium nitride (NbN) compounds, and molybdenum-titanium (MoTi) compounds, which can not only further reduce the emissivity of the laminated glass 200, but also reduce the visible light transmittance and visible light reflectivity of the laminated glass 200.

[0133] By providing the low-emissivity coating 50 or the medium-emissivity coating 60 , the heat radiation flow inside and outside the vehicle and outside the vehicle can be further blocked, so as to enhance the heat insulation effect of the laminated glass 200 .

[0134] Optional, such as Fig. 9 As shown, the laminated glass 200 further includes a dimming element 70. The dimming element 70 is disposed between the second surface and the third surface, and the dimming element 70 includes at least one of a polymer dispersed liquid crystal dimming film, a suspended particle dimming film, an electrochromic dimming film, and a dye liquid crystal dimming film.

[0135] By providing the dimming element 70 , the coated glass 100 can be switched between transparent and opaque, further improving the light shielding effect of the coated glass 100 .

[0136] Comparative Examples 1-3 and Examples 1-8 of Coated Glass 100

[0137] The coated glass 100 of the comparative examples 1-3 and the embodiments 1-8 in the following Tables 1-3 was prepared. The coated glass 100 includes a first glass plate 10 and a heat-insulating functional layer 20. The heat-insulating functional layer 20 includes an innermost dielectric stack, a first metal reflective layer, a first intermediate dielectric stack, a second metal reflective layer, a second intermediate dielectric stack, a third metal reflective layer and an outermost dielectric stack.

[0138] A transparent glass plate with a thickness of 2.1 mm and a visible light transmittance TL1=91% is prepared as the first glass plate 10, and the heat insulation functional layer 20 of comparative examples 1-3 is deposited on one surface of the first glass plate 10 by a magnetron sputtering process to form the coated glass 100 of comparative examples 1-3. The specific structure is shown in Table 1.

[0139] Table 1: Film layer structure of coated glass 100 in Comparative Examples 1-3

[0140]

[0141]

[0142] A transparent glass plate with a thickness of 2.1 mm and a visible light transmittance TL1=91% is prepared as the first glass plate 10, and the heat insulation functional layer 20 of Examples 1-4 is deposited on one surface of the first glass plate 10 by a magnetron sputtering process to form the coated glass 100 of Examples 1-4. The specific structure is shown in Table 2.

[0143] Table 2: Film layer structure of coated glass 100 in Examples 1-4

[0144]

[0145] A transparent glass plate with a thickness of 2.1 mm and a visible light transmittance TL1=91% is prepared as the first glass plate 10, and the heat insulation functional layer 20 of Examples 5-8 is deposited on one surface of the first glass plate 10 by a magnetron sputtering process to form the coated glass 100 of Examples 5-8. The specific structure is shown in Table 3.

[0146] Table 3: Film layer structure of coated glass 100 in Examples 5-8

[0147]

[0148]

[0149] The visible light transmittance TL2 and the direct solar energy transmittance TE of the coated glass 100 of Comparative Examples 1-3 and Examples 1-8 were measured, and the measurement results were recorded in Table 4.

[0150] Table 4: Test results of Comparative Examples 1-3 and Examples 1-8

[0151] Visible light transmittance TL2 Solar direct transmittance TE Comparative Example 1 52.62％ 23.7％ Comparative Example 2 17.81％ 11.45％ Comparative Example 3 13.79％ 10.57％ Example 1 12.31％ 6.95％ Example 2 11.65％ 7.4％ Example 3 10.70％ 11.09％ Example 4 7.90％ 7.12％ Example 5 10.06％ 8.2％ Example 6 5.53％ 6.7％ Example 7 3.75％ 4.9％ Example 8 4.83％ 5.22％

[0152] In Table 4, the visible light transmittance TL is the visible light transmittance of the coated glass 100 when the incident angle is 8° measured and calculated according to standard ISO9050, and the solar direct transmittance TE is the solar direct transmittance of the coated glass 100 when the incident angle is 8° measured and calculated according to standard ISO9050.

[0153] It can be seen from Table 4 that the visible light transmittance TL2 of the coated glass 100 of Comparative Examples 1 to 3 is greater than 13%, or even greater than 50%, and the effect of achieving low light transmittance of the coated glass 100 is not good, and it cannot replace the use of tinted PVB or tinted glass.

[0154] The visible light transmittance TL2 of the coated glass 100 of Examples 1 to 8 is less than 13%, or even less than 10%, and the direct solar energy transmittance TE of the coated glass 100 is also relatively small, so that the direct solar energy transmittance TE of the coated glass 100 is less than 12%, or even less than 8%, that is, the low transmittance and heat insulation effects of the coated glass 100 are both better.

[0155] Laminated glass 200: including coated glass 100 of comparative examples 1-3 and embodiments 1-8

[0156] The laminated glass 200 of the comparative examples 1-3 and the embodiments 1-8 in the following Tables 5 to 7 are prepared. The coated glass 100 in the laminated glass 200 can refer to the above Tables 1 to 3.

[0157] A transparent PVB with a thickness of 0.76 mm and a visible light transmittance of 88% is prepared as a bonding layer, the coated glass 100 of comparative examples 1-3 is prepared as an outer glass plate, and a tinted glass with a thickness of 2.1 mm is prepared as an inner glass plate. Through an automotive glass production process, a laminated glass 200 including the coated glass 100 of comparative examples 1-3 is formed. The specific structure is shown in Table 5.

[0158] Table 5: Laminated glass including the coated glass of Comparative Examples 1-3

[0159]

[0160] A transparent PVB with a thickness of 0.76 mm and a visible light transmittance of 88% is prepared as a bonding layer, the coated glass 100 of Examples 1-4 is prepared as an outer glass plate, and a tinted glass with a thickness of 2.1 mm is prepared as an inner glass plate. Through the automotive glass production process, a laminated glass 200 including the coated glass 100 of Examples 1-4 is formed. The specific structure is shown in Table 6.

[0161] Table 6: Laminated glass including the coated glass of Examples 1-4

[0162]

[0163] A transparent PVB with a thickness of 0.76 mm and a visible light transmittance of 88% is prepared as a bonding layer, the coated glass 100 of Example 5 is prepared as an outer glass plate, and a green glass with a thickness of 2.1 mm is prepared as an inner glass plate. Through the automotive glass production process, a laminated glass 200 including the coated glass 100 of Example 5 is formed. The specific structure is shown in Table 7.

[0164] A transparent PVB with a thickness of 0.76 mm and a visible light transmittance of 88% is prepared as a bonding layer, the coated glass 100 of Example 6 is prepared as an outer glass plate, and a transparent glass with a thickness of 2.1 mm is prepared as an inner glass plate. Through the automotive glass production process, a laminated glass 200 including the coated glass 100 of Example 6 is formed. The specific structure is shown in Table 7.

[0165] A transparent PVB with a thickness of 0.76 mm and a visible light transmittance of 88% is prepared as a bonding layer, the coated glass 100 of Example 7-8 is prepared as an inner glass plate, and a transparent glass with a thickness of 2.1 mm is prepared as an outer glass plate. Through the automotive glass production process, a laminated glass 200 including the coated glass 100 of Example 7-8 is formed. The specific structure is shown in Table 7.

[0166] Table 7: Laminated glass including the coated glass of Examples 5-8

[0167]

[0168]

[0169] The test results of the laminated glass including the coated glass of Comparative Examples 1-3 in Table 5 and the laminated glass including the coated glass of Examples 1-2 in Table 6 are shown in Table 8.

[0170] Table 8: Test results of laminated glass

[0171]

[0172] The test results of the laminated glass including the coated glass of Examples 3-4 in Table 6 and the laminated glass including the coated glass of Examples 5-8 in Table 7 are shown in Table 9.

[0173] Table 9: Test results of laminated glass 2

[0174]

[0175]

[0176] In Tables 8 and 9, the visible light transmittance TL is the visible light transmittance of the laminated glass 200 when the incident angle is 8° measured and calculated according to standard ISO9050; the solar energy direct transmittance TE is the solar energy direct transmittance of the laminated glass 200 when the incident angle is 8° measured and calculated according to standard ISO9050; the outer surface reflection color Lab value is the a value and b value of the reflection color Lab value of the laminated glass 200 for visible light emitted by a D65 light source incident at incident angles of 40°, 50°, 60°, 70°, and 80° measured and calculated from the first surface according to CIE1976.

[0177] Among them, the maximum color difference △Cmax is based on the formula Calculated, a max is the maximum value of a when the incident angle is 40°, 50°, 60°, 70°, and 80°. min is the minimum value of a when the incident angle is 40°, 50°, 60°, 70°, and 80°, and b max is the maximum value of b when the incident angle is 40°, 50°, 60°, 70°, and 80°. min It is the minimum value among the b values ​​when the incident angles are 40°, 50°, 60°, 70°, and 80°.

[0178] It can be seen from Table 8 and Table 9 that:

[0179] Although the laminated glass of Comparative Example 1 adopts gray glass with low light transmittance, the visible light transmittance of the laminated glass is still greater than 15%, which is difficult to meet the ultra-low light transmittance requirement of the laminated glass; the visible light reflectance R1 of the outer surface is greater than 25%, which is easy to cause light pollution; and when the incident angles are 40°, 50°, 60°, 70°, and 80°, the a value of the reflected color on the outer surface is greater than 10, the b value is greater than 10, and the maximum color difference ΔCmax is greater than 25. The appearance color cannot meet the requirements and the neutral color of the appearance cannot be achieved. The color difference deviation at different incident angles is too large, and the human eye can distinguish drastic color changes. As the angle changes, the color changes drastically, affecting the overall color beauty of the vehicle, which is not conducive to meeting the needs of aesthetic design in the existing market.

[0180] The visible light transmittance of the laminated glass of Comparative Example 2 is still greater than 14%, which is difficult to meet the ultra-low light transmittance requirement of laminated glass; and when the incident angles are 40°, 50°, 60°, and 70°, the a value of the reflected color on the outer surface is greater than 1.5, or even greater than 3, and the maximum color difference ΔCmax is greater than 3. The appearance color at most incident angles cannot meet the requirements, and it is difficult to achieve a neutral appearance.

[0181] The visible light reflectivity R1 of the outer surface of the laminated glass of Comparative Example 3 is greater than 11%, which may cause light pollution; and when the incident angle is 40°, the b value of the reflected color of the outer surface is greater than 3, and the maximum color difference ΔCmax is greater than 10. The color difference deviation at different incident angles is too large, and the human eye can distinguish drastic color changes. As the angle changes, the color changes drastically, affecting the overall color appearance of the vehicle, which is not conducive to meeting the needs of aesthetic design in the existing market.

[0182] The visible light transmittance TL of the laminated glass 200 of Examples 1 to 8 is less than or equal to 10%, further less than or equal to 8%, or even less than or equal to 5%, which can meet the requirement of ultra-low light transmittance.

[0183] The solar direct transmittance TE of the laminated glass 200 of Examples 1 to 8 is less than or equal to 6%, further less than or equal to 4%, or even less than or equal to 2%, and has excellent heat insulation effect.

[0184] The visible light reflectance R1 of the outer surface of the laminated glass 200 of Examples 1 to 8 is less than or equal to 10%, further less than or equal to 8%, or even less than or equal to 5%, and will not cause light pollution.

[0185] For the laminated glass 200 of Examples 1 to 8, when the incident angles are 40°, 50°, 60°, 70°, and 80°, the outer surface reflected color a value is -3 to 1, and the b value is -3 to 1, further the a value is -2 to 1, and the b value is -3 to 0.5, and even the a value is -1.5 to 0, and the b value is -2 to 0, which can achieve a neutral color appearance of the laminated glass.

[0186] The maximum color difference △Cmax of the laminated glass 200 of Examples 1 to 8 is less than or equal to 3, further less than or equal to 2, or even less than or equal to 1.5, which can avoid excessive color difference deviation at different incident angles and meet the demand for aesthetic design in the existing market.

[0187] The features mentioned in the specification, claims and drawings can be combined with each other as desired as long as they are meaningful within the scope of the present application. The advantages and features described for the coated glass 100 are applicable to the laminated glass 200 in a corresponding manner.

[0188] Although the embodiments of the present application have been shown and described above, it can be understood that the above embodiments are exemplary and cannot be understood as limitations on the present application. Ordinary technicians in the field can change, modify, replace and modify the above embodiments within the scope of the present application, and these improvements and modifications are also regarded as the scope of protection of the present application.

Claims

1. A coated glass, characterized in that: include: First glass plate; and A heat-insulating functional layer is arranged on at least one surface of the first glass plate, the heat-insulating functional layer includes n metal reflective layers and (n+1) dielectric stacks, each of the metal reflective layers is located between two adjacent dielectric stacks, and at least one dielectric stack includes at least one silicon-based absorption layer; wherein n is an integer greater than or equal to 1.

2. The coated glass according to claim 1, characterized in that: The visible light transmittance of the first glass plate is TL1, the visible light transmittance of the coated glass is TL2, TL1≥80%, and TL1 and TL2 satisfy TL2 / TL1≤0.

2.

3. The coated glass according to claim 1, characterized in that: At least one of the dielectric stacks includes at least one of the silicon-based absorption layers and at least two dielectric layers. Each of the silicon-based absorption layers is located between two adjacent dielectric layers. The physical thickness of each of the silicon-based absorption layers is 4 nm to 20 nm.

4. The coated glass according to claim 3, characterized in that: The dielectric stack closest to the first glass plate is the innermost dielectric stack, and the innermost dielectric stack includes at least one silicon-based absorption layer and at least two dielectric layers, and each silicon-based absorption layer is located between two adjacent dielectric layers.

5. The coated glass according to claim 3, characterized in that: n is an integer greater than or equal to 2, the dielectric stack located between two adjacent metal reflective layers is an intermediate dielectric stack, the intermediate dielectric stack includes at least one silicon-based absorption layer and at least two dielectric layers, and each silicon-based absorption layer is located between two adjacent dielectric layers.

6. The coated glass according to claim 5, characterized in that: At least one of the intermediate dielectric stacks includes at least two of the silicon-based absorption layers and at least three dielectric layers.

7. The coated glass according to claim 3, characterized in that: The dielectric stack farthest from the first glass plate is the outermost dielectric stack, and the outermost dielectric stack includes at least one silicon-based absorption layer and at least two dielectric layers, and each silicon-based absorption layer is located between two adjacent dielectric layers.

8. The coated glass according to claim 1, characterized in that: The material of the silicon-based absorption layer includes Si single substance, silicon-based compound Si 1-x M x 、Silicon-based compounds Si (1-z-y) M z N y at least one of; in, 0<x≤0.35,0<y≤0.1,0<z≤0.35; The element M is one of aluminum (Al), carbon (C), zirconium (Zr), magnesium (Mg), titanium (Ti), zinc (Zn), tin (Sn), nickel (Ni), chromium (Cr), vanadium (V), boron (B), and gallium (Ga); The element N includes one or more of yttrium (Y), niobium (Nb), tantalum (Ta), hafnium (Hf), indium (In), cadmium (Cd), palladium (Pd), and tungsten (W).

9. The coated glass according to claim 1, characterized in that: The thermal insulation functional layer includes at least three metal reflective layers and at least four dielectric stacks, the total physical thickness of the at least three metal reflective layers is 30nm to 50nm, at least three of the at least four dielectric stacks include the silicon-based absorption layer, and the total physical thickness of all the silicon-based absorption layers is 15nm to 50nm.

10. The coated glass according to claim 1, characterized in that: The thermal insulation functional layer includes an innermost dielectric stack, a first metal reflective layer, a first intermediate dielectric stack, a second metal reflective layer, a second intermediate dielectric stack, a third metal reflective layer and an outermost dielectric stack stacked in sequence, the total physical thickness of all silicon-based absorption layers in the innermost dielectric stack is L1, the total physical thickness of all silicon-based absorption layers in the first intermediate dielectric stack is L2, the total physical thickness of all silicon-based absorption layers in the second intermediate dielectric stack is L3, L1<L2+L3 or L1<L2.

11. The coated glass according to claim 10, characterized in that: The total physical thickness of all silicon-based absorption layers in the outermost dielectric stack is L4, L4<L2+L3 or L4<L3.

12. The coated glass according to claim 10, characterized in that: The thickness of the first metal reflective layer is A1, the thickness of the second metal reflective layer is A2, and the thickness of the third metal reflective layer is A3, wherein A1 / A2 is 0.7-1.2, and A3 / A2 is 0.7-1.

2.

13. The coated glass according to claim 1, characterized in that: The solar direct light transmittance TE of the coated glass is less than or equal to 12%, and the visible light transmittance TL2 of the coated glass is less than or equal to 15%.

14. A laminated glass, characterized in that: The coated glass comprises a second glass plate, an adhesive layer and the coated glass according to any one of claims 1 to 13, wherein one of the second glass plate and the first glass plate is an outer glass plate and the other is an inner glass plate, the outer glass plate comprises a first surface and a second surface disposed opposite to each other, the inner glass plate comprises a third surface and a fourth surface disposed opposite to each other, the adhesive layer is disposed between the second surface and the third surface, and the visible light transmittance of the adhesive layer is greater than or equal to 80%.

15. The laminated glass according to claim 14, characterized in that: The laminated glass has an outer surface reflection color Lab value for visible light incident on the first surface with an incident angle of 40° to 80°, an a value of -5 to 1, a b value of -5 to 1, and a maximum color difference ΔCmax of less than 3.

16. The laminated glass according to claim 14, characterized in that: The first glass plate is an outer glass plate, the second glass plate is an inner glass plate, the second glass plate is tinted glass, and the mass fraction of total iron in the second glass plate calculated as Fe2O3 is 0.7% to 2.2%; Alternatively, the first glass plate is an inner glass plate, the second glass plate is an outer glass plate, the second glass plate is transparent glass, and a visible light transmittance of the second glass plate is greater than or equal to 80%.

17. The laminated glass according to claim 14, characterized in that: The laminated glass further includes a low-emissivity coating, which is disposed on the fourth surface. The emissivity of the laminated glass measured from the fourth surface side is less than or equal to 0.

35.

18. The laminated glass according to claim 14, characterized in that: The laminated glass further includes a medium radiation coating, which is disposed on the fourth surface. The emissivity of the laminated glass measured from one side of the fourth surface is 0.36-0.

5.

19. The laminated glass according to claim 14, characterized in that: The laminated glass also includes a dimming element, which is arranged between the second surface and the third surface. The dimming element includes at least one of a polymer dispersed liquid crystal dimming film, a suspended particle dimming film, an electrochromic dimming film, and a dye liquid crystal dimming film.

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