Wafer bottom surface cleaning device

Abstract

The invention discloses a wafer bottom surface cleaning device in the technical field of wafer cleaning. The wafer bottom surface cleaning device comprises a load plate; a supporting seat; a rotating shaft; a protective tube; an infusion tube; a spray washing nozzle; a carrier plate; a driving mechanism; a rotation limiting assembly; a plurality of support blocks; and a plurality of positioning columns. The protection tube is arranged in the through channel and is in running fit with the rotating shaft, additional protection and support can be provided for the infusion tube, so that the working stability of the infusion tube is improved, vibration and noise generated by rotation are reduced, the stability and reliability of the cleaning process are improved, and the cleaning effect is improved by limiting rotation of the protection tube. The protection pipe, the liquid conveying pipe and the spray washing nozzle are all kept fixed, so that the bottom end of the liquid conveying pipe does not need to be connected with a liquid supply system through a rotary joint, the overall service life is prolonged, the situation that cleaning liquid is polluted by metal impurities generated by abrasion of the rotary joint is avoided, and the cleaning effect is improved.

Description

Technical Field

[0001] The invention relates to the technical field of wafer cleaning, and in particular to a wafer bottom surface cleaning device. Background Art

[0002] In the field of wafer cleaning technology, there is currently a single-wafer cleaning method, which is characterized by the fact that the bottom cleaning and the front cleaning are independent of each other. The core component of the bottom cleaning device is a vertically arranged rotating shaft, and the interior of the rotating shaft is designed with a hollow structure that runs through from top to bottom. In this hollow structure, an infusion tube is inserted, and the lower end of the infusion tube passes through the rotating shaft and is connected to the liquid supply pipeline through a rotating joint. A carrier plate is installed on the top of the rotating shaft, and a through hole is opened on the carrier plate. A nozzle is installed in the through hole, and the nozzle is tightly connected to the upper end of the infusion tube to ensure smooth delivery of the cleaning liquid.

[0003] In actual operation, the rotating shaft is driven by the driving mechanism, driving the wafer placed on the top of the carrier plate to rotate at high speed. At the same time, the infusion tube rotates synchronously with the rotating shaft and continuously delivers cleaning liquid to the nozzle; the nozzle sprays the cleaning liquid from bottom to top onto the bottom surface of the wafer to achieve the cleaning purpose.

[0004] However, although the existing wafer bottom surface cleaning device meets the cleaning needs to a certain extent, there are still problems with poor cleaning effect and short service life. Specifically, since the rotating shaft needs to drive the infusion tube to rotate at high speed, a rotary joint must be set. However, under the condition of high-speed rotation, the rotary joint will be severely worn, which not only shortens the overall service life of the device, but also produces metal impurities, which will mix into the cleaning liquid, causing pollution to the cleaning liquid, and thus seriously affecting the cleaning effect. Summary of the invention

[0005] The purpose of the present invention is to provide a wafer bottom surface cleaning device, which solves the technical problems of poor cleaning effect and short service life of the wafer bottom surface cleaning device in the prior art.

[0006] The invention discloses a wafer bottom surface cleaning device, comprising: Load plate, arranged vertically; A support seat, mounted on one side of the load plate; A rotating shaft is arranged vertically and rotatably mounted on the supporting seat, and has a coaxially arranged through passage inside; A protective tube, passing through the through passage and rotatably cooperating with the rotating shaft, with both ends extending out from the rotating shaft; An infusion tube, inserted into the protection tube, with the bottom end extending out of the protection tube; A spray nozzle, installed at the top of the protection tube and connected to the infusion tube; The carrier plate is arranged horizontally and mounted on the top of the rotating shaft, and the top surface of the carrier plate is provided with a movable through hole adapted to the spray nozzle; A driving mechanism, mounted on the load plate and drivingly connected to the rotating shaft; A rotation limiting assembly is disposed on the load plate and connected to the lower end of the protection tube; A plurality of support blocks are mounted on the top surface of the carrier plate and arranged around the rotating shaft; A plurality of positioning posts are installed on the top surface of the carrier plate, arranged around the rotating shaft, and located at the periphery of the supporting block.

[0007] The present application arranges a protective tube in the through-channel and rotates with the rotating shaft to provide additional protection and support for the internal infusion tube, thereby improving the working stability of the infusion tube, helping to reduce the vibration and noise generated by rotation, and improving the smoothness and reliability of the cleaning process; the rotation of the protective tube is then limited by a rotation limiting component, so that the protective tube, infusion tube and spray nozzle will all remain stationary and fixed, thereby eliminating the need for the bottom end of the infusion tube to be connected to the liquid supply system through a rotating joint, which extends the overall service life of the device, avoids the contamination of the cleaning liquid by metal impurities caused by wear of the rotating joint, and improves the cleaning effect.

[0008] On the basis of the above technical solution, the solution of this application can also be improved as follows: Preferably, the support seat comprises: The support tube is arranged vertically and has first annular grooves at both upper and lower ends; A fixing frame, mounted on the load plate and connected to the support tube; A plurality of first bearings are disposed in the first annular groove in a one-to-one correspondence and sleeved outside the rotating shaft; A top cover, mounted on the top of the support tube and sleeved outside the rotating shaft; Among them, a support ring is provided outside the rotating shaft, and the bottom of the support ring is in contact with the first bearing. The adoption of this solution can enhance structural stability, optimize rotation performance, and improve sealing performance. Through reasonable structural layout and easy-to-disassemble connection method, maintenance costs and downtime are reduced, and the use effect, safety and reliability of the device are improved.

[0009] Preferably, a guide cover is provided outside the rotating shaft, and the guide cover is located above the top cover and covers the opening of the top cover; adopting this solution can prevent the cleaning liquid from flowing into the interior of the support tube through the opening of the top cover, thereby further ensuring the cleanliness and lubrication of the first bearing and improving the stability of long-term use.

[0010] Preferably, the fixing frame comprises: A first support plate is horizontally mounted on the load plate and sleeved on the upper end of the support tube; A second support plate is horizontally mounted on the load plate and sleeved on the lower end of the support tube; Two reinforcing plates are arranged between the load plate and the second support plate, and are respectively located on both sides of the support tube; adopting this solution, the load can be effectively shared, and the bearing performance of the structure is improved, making the structure safer and more reliable, thereby ensuring the stability of the support tube, and increasing the strength, rigidity and stability of the structure, and helping to resist the influence of external forces or vibrations, thereby improving the overall stability of the structure.

[0011] Preferably, flanges are fixedly mounted on the upper and lower ends of the support tube, and the two flanges are respectively attached to the first support plate and the second support plate and bolted together. This solution can be used to vertically limit the support tube, and can be easily disassembled and assembled through bolt connection, thereby improving the efficiency of assembly and maintenance of the device.

[0012] Preferably, the driving mechanism comprises: A motor, mounted on the second support plate; A driving wheel, mounted on the driving shaft of the motor; A driven wheel is arranged below the support cylinder and fixedly sleeved outside the rotating shaft; The transmission belt is sleeved between the driving wheel and the driven wheel; adopting this solution can effectively reduce the impact and vibration load, so the noise generated is small, and the rotating shaft can be driven smoothly and stably to rotate at high speed.

[0013] Preferably, the rotation limiting assembly comprises: A limit bar is arranged horizontally and installed on the outer periphery of the bottom end of the protection tube; The concave block has slots on both sides of the top that match the limit strips; The connecting piece has one end connected to the concave block and the other end connected to the load plate. This solution can stably support and restrict the rotation of the protection tube, and facilitate disassembly and assembly through the snap connection, thereby improving assembly efficiency.

[0014] Preferably, it includes: A photoelectric sensor is mounted on the load board; The shading sheet is arranged horizontally, installed on the rotating shaft, and is located below the supporting tube, and can pass through the sensing area of ​​the photoelectric sensor. By adopting this solution, the rotation speed of the rotating shaft can be stably counted in real time, so as to timely understand the operating status of the equipment and facilitate automatic control.

[0015] Preferably, second annular grooves are provided at both upper and lower ends of the through channel, a second bearing is installed in the second annular groove, and the second bearing is sleeved outside the protective tube; this solution ensures that the protective tube is firmly supported while not being affected by the high-speed rotation of the rotating shaft, thereby improving the running stability, and the second annular groove is provided to provide an installation position for the second bearing, thereby ensuring a stable installation and improving the compactness of the structure.

[0016] Preferably, it includes: A support plate, mounted on the top of the rotating shaft and movably sleeved outside the protection tube, with a top surface connected to the bearing plate; A flow guide cover is installed on the top surface of the support plate and movably sleeved outside the spray nozzle, and has a truncated cone on the top, and the top surface of the truncated cone has a plurality of lower ring plates arranged concentrically and nested; Among them, the outer periphery of the spray nozzle is provided with a retaining ring, and the bottom surface of the retaining ring is provided with a plurality of concentrically nested upper ring plates, and the upper ring plates and the lower ring plates are arranged alternately. The adoption of this scheme plays a sealing role, avoids the cleaning liquid from flowing into the through channel, ensures the cleanliness and lubrication state of the second bearing, improves the stability of long-term operation, and prolongs the service life.

[0017] Through the above technical solution, the present invention achieves the following beneficial effects: 1. The present application provides additional protection and support for the internal infusion tube by arranging the protection tube in the through-channel and rotating with the rotating shaft, thereby improving the working stability of the infusion tube, helping to reduce the vibration and noise generated by the rotation, and improving the stability and reliability of the cleaning process; 2. The present application limits the rotation of the protective tube by setting a rotation limiting assembly, so that the protective tube, the infusion tube and the spray nozzle will remain stationary and fixed, thereby eliminating the need for the bottom end of the infusion tube to be connected to the liquid supply system through a rotating joint, thereby extending the overall service life of the device and avoiding the contamination of the cleaning liquid by metal impurities caused by wear of the rotating joint, thereby improving the cleaning effect. BRIEF DESCRIPTION OF THE DRAWINGS

[0018] In order to more clearly illustrate the specific implementation methods of the present invention or the technical solutions in the prior art, the drawings required for use in the specific implementation methods or the description of the prior art will be briefly introduced below. Obviously, the drawings described below are some implementation methods of the present invention. For ordinary technicians in this field, other drawings can be obtained based on these drawings without paying creative work.

[0019] Figure 1 It is a structural schematic diagram of a wafer bottom surface cleaning device according to a specific embodiment of the present invention; Figure 2 for Figure 1 A front cross-sectional view of a wafer bottom surface cleaning device shown; Figure 3 for Figure 2 The enlarged schematic diagram of point A in the middle; Figure 4 for Figure 2 The enlarged schematic diagram of point B in the middle; Figure 5 for Figure 2 An enlarged schematic diagram of some structures in the wafer bottom surface cleaning device shown; Description of reference numerals: 1. Load plate; 2. Support seat; 3. Rotating shaft; 4. Protective tube; 5. Infusion tube; 6. Spray nozzle; 7. Carrying plate; 8. Driving mechanism; 9. Rotation limiting assembly; 10. Support block; 11. Positioning column; 12. Photoelectric sensor; 13. Shading sheet; 14. Second bearing; 15. Support plate; 16. Guide cover; 21. Support cylinder; 22. Fixed frame; 23. First bearing; 24. Top cover; 31. Through passage; 32. Support ring; 33. Guide cover; 61. Block ring; 62. Upper ring plate; 71. Movable through hole; 81. Motor; 82. Driving wheel; 83. Driven wheel; 84. Transmission belt; 91. Limiting strip; 92. Concave block; 93. Connector; 161, truncated cone; 162, lower ring plate; 211, first ring groove; 212, flange; 221, first support plate; 222, second support plate; 223, reinforcing plate; 311, second ring groove; 921, clamping groove. DETAILED DESCRIPTION

[0020] The following embodiments of the technical solution of the present invention are described in detail in conjunction with the accompanying drawings. The following embodiments are only used to more clearly illustrate the technical solution of the present invention, and are therefore only used as examples, and cannot be used to limit the protection scope of the present invention.

[0021] First of all, it should be noted that in the following description, some directional words involved in order to clearly illustrate the technical solution of the present invention, such as the terms "upper", "lower", "front", "back", "vertical", "horizontal", "top", "bottom", "inside", "outside", etc., are all meanings that are inferred from the normal orientations of components in the wafer bottom surface cleaning device. They are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and therefore cannot be understood as a limitation on the present invention.

[0022] In addition, the terms "first" and "second" are used for descriptive purposes only and should not be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, the features defined as "first" and "second" may explicitly or implicitly include one or more of the said features.

[0023] In this application, unless otherwise clearly specified and limited, the terms "installation" and "connection" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integral connection; it can be a direct connection, or an indirect connection through an intermediate medium, it can be the internal connection of two elements or the interaction relationship between two elements. For ordinary technicians in this field, the specific meanings of the above terms in the present invention can be understood according to specific circumstances.

[0024] In order to better understand the above technical solution, the above technical solution will be described in detail below in conjunction with the accompanying drawings and specific implementation methods.

[0025] Example: like Figure 1 As shown, an embodiment of the present application discloses a wafer bottom surface cleaning device, which is used for rotationally spraying the bottom surface of the wafer, and its specific structure includes: a load plate 1, a support seat 2, a rotating shaft 3, a protective tube 4, an infusion tube 5, a spray nozzle 6, a carrier plate 7, a driving mechanism 8, a rotation limiting assembly 9, a plurality of support blocks 10 and a plurality of positioning columns 11.

[0026] The load plate 1 is arranged vertically, serving as the basic supporting structure of the entire device, and is transmission-connected with the lifting mechanism to realize the overall lifting of the device, thereby cooperating with other devices.

[0027] The support base 2 is installed on one side of the load plate 1 to stably support the entire rotating shaft 3 and the components installed thereon, thereby ensuring that the rotating shaft 3 can remain stable when rotating at high speed without shaking or deflecting.

[0028] The rotating shaft 3 is arranged vertically and rotatably mounted on the supporting seat 2 , and has a coaxially arranged through channel 31 inside; the through channel 31 is used to accommodate and protect other components.

[0029] The protection tube 4 passes through the through channel 31 and is rotatably matched with the rotating shaft 3 , and both ends thereof extend out from the rotating shaft 3 , so as to provide additional protection and support for the infusion tube 5 .

[0030] The infusion tube 5 is inserted into the protection tube 4, and the bottom end extends out of the protection tube 4, which is used to transport the cleaning liquid; it is preferably a PFA tube, which has good high and low temperature resistance, corrosion resistance and aging resistance. The spray nozzle 6 is installed at the top of the protection tube 4 and is connected to the liquid infusion tube 5 for spraying the cleaning liquid onto the bottom surface of the wafer.

[0031] The carrier plate 7 is arranged horizontally and mounted on the top of the rotating shaft 3 , and a movable through hole 71 adapted to the spray nozzle 6 is provided on the top surface thereof for carrying the wafer.

[0032] The driving mechanism 8 is mounted on the load plate 1 and is in driving connection with the rotating shaft 3 , so as to drive the rotating shaft 3 and the supporting plate 7 and the wafer thereon to rotate at a high speed.

[0033] The rotation limiting assembly 9 is disposed on the load plate 1 and connected to the lower end of the protection tube 4 , and is used for supporting and limiting the protection tube 4 to prevent it from rotating along the rotation axis 3 .

[0034] A plurality of support blocks 10 are mounted on the top surface of the carrier plate 7 and arranged around the rotating shaft 3 to support the wafer and keep a certain distance between the wafer and the carrier plate 7, thereby ensuring that the spray nozzle 6 can fully spray the bottom surface of the wafer.

[0035] A plurality of positioning posts 11 are installed on the top surface of the carrier plate 7, arranged around the rotating shaft 3, and located on the periphery of the support block 10, so as to ensure that the wafer can be accurately positioned at a predetermined position when placed, and prevent the wafer from shifting or shaking during rotation or cleaning, which helps to ensure the uniformity and consistency of cleaning and improve the cleaning effect.

[0036] The above technical solution works as follows: The outer edge of the wafer is supported by multiple support blocks 10 to avoid interference with the spray cleaning, and is surrounded by multiple positioning columns 11 to prevent deviation or shaking during the rotation cleaning process; then the driving mechanism 8 is started, and the driving mechanism 8 drives the rotating shaft 3 and the carrier plate 7 and the wafer thereon to rotate at high speed. At the same time, since the protection tube 4 and the rotating shaft 3 are rotationally matched and the rotation limiting component 9 limits the rotation of the protection tube 4, the protection tube 4, the infusion tube 5 and the spray nozzle 6 will all remain stationary and fixed, so that the cleaning liquid can be input from the lower end of the infusion tube 5, and finally the bottom surface of the high-speed rotating wafer is fully sprayed through the spray nozzle 6.

[0037] The present application arranges the protective tube 4 in the through channel 31 and rotates with the rotating shaft 3, so as to provide additional protection and support for the internal infusion tube 5, thereby improving the working stability of the infusion tube 5, and helping to reduce the vibration and noise generated by the rotation, thereby improving the stability and reliability of the cleaning process; the rotation of the protective tube 4 is then limited by the rotation limiting component 9, so that the protective tube 4, the infusion tube 5 and the spray nozzle 6 will all remain stationary and fixed, thereby making it unnecessary for the bottom end of the infusion tube 5 to be connected to the liquid supply system through a rotating joint, which extends the overall service life of the device, and avoids the occurrence of metal impurities caused by the wear of the rotating joint contaminating the cleaning liquid, thereby improving the cleaning effect.

[0038] In some embodiments, Figure 1 , Figure 2 and Figure 4 As shown, in order to improve the support stability, the support seat 2 includes: a support tube 21, a fixing frame 22 and a plurality of first bearings 23, which are specifically arranged as follows: The support cylinder 21 is arranged vertically, and a first annular groove 211 is provided at both ends to provide a stable support, so as to ensure that the rotating shaft 3 does not vibrate or deviate due to structural instability when rotating at a high speed, thereby improving the stability and reliability of the entire cleaning device; The fixing frame 22 is installed on the load plate 1 and connected to the support tube 21 for fixed support; A plurality of first bearings 23 are arranged in the first annular groove 211 in a one-to-one correspondence and sleeved outside the rotating shaft 3. Through the rolling contact characteristics, the friction resistance and energy loss of the rotating shaft 3 during the rotation process are significantly reduced, the rotation efficiency and accuracy are improved, and the service life is also extended; The top cover 24 is installed at the top of the support cylinder 21 and is sleeved outside the rotating shaft 3. It forms a relatively closed structure by cooperating with the first annular groove 211 and the first bearing 23, thereby helping to prevent the cleaning liquid or other contaminants from entering the first bearing 23, ensuring the cleanliness and lubrication of the first bearing 23, and improving its sealing performance and durability. The rotating shaft 3 is provided with a support ring 32 outside, and the bottom of the support ring 32 abuts against the first bearing 23, so as to provide necessary vertical support for the rotating shaft 3 and realize the function of axial limiting.

[0039] The above-mentioned arrangement enhances structural stability, optimizes rotation performance, and improves sealing performance. The reasonable structural layout and easily disassembled connection method reduce maintenance costs and downtime, and improves the use effect, safety, and reliability of the device.

[0040] Based on the above embodiments, Figure 4 As shown, the rotating shaft 3 has a guide cover 33 outside, and the guide cover 33 is located above the top cover 24 and covers the through opening of the top cover 24 .

[0041] By providing the guide cover 33 , it is possible to prevent the cleaning liquid from flowing into the interior of the support tube 21 through the opening of the top cover 24 , thereby further ensuring the cleanliness and lubrication of the first bearing 23 and improving the stability of long-term use.

[0042] Based on the above embodiment, the fixing frame 22 includes: a first support plate 221, a second support plate 222 and two reinforcing plates 223, which are specifically configured as follows: The first support plate 221 is horizontally mounted on the load plate 1 and sleeved on the upper end of the support tube 21; The second support plate 222 is horizontally mounted on the load plate 1 and sleeved on the lower end of the support tube 21; The two reinforcing plates 223 are disposed between the load plate 1 and the second support plate 222 and are located on both sides of the support tube 21 .

[0043] Through the upper and lower supports of the first support plate 221 and the second support plate 222, the load can be effectively shared and the bearing performance of the structure is improved, making the structure safer and more reliable, thereby ensuring the stability of the support tube 21. By setting the reinforcing plate 223, the strength, rigidity and stability of the structure are increased, and it helps to resist the influence of external forces or vibrations, thereby improving the overall stability of the structure.

[0044] In this embodiment, if Figure 2 As shown, flanges 212 are fixedly sleeved on the upper and lower ends of the support tube 21 , and the two flanges 212 are respectively attached to the first support plate 221 and the second support plate 222 and bolted.

[0045] The above arrangement can achieve the function of vertically limiting the support tube 21, and facilitates disassembly and assembly through bolt connection, thereby improving the efficiency of assembly and maintenance of the device.

[0046] In some embodiments, Figure 1 and Figure 2 As shown, the driving mechanism 8 includes: a motor 81, a driving wheel 82, a driven wheel 83 and a transmission belt 84, and its specific configuration is as follows: The motor 81 is mounted on the second support plate 222; The driving wheel 82 is mounted on the driving shaft of the motor 81; The driven wheel 83 is arranged below the support cylinder 21 and is fixedly sleeved outside the rotating shaft 3; The transmission belt 84 is sleeved between the driving wheel 82 and the driven wheel 83 .

[0047] Specifically, the motor 81 is vertically mounted on the bottom of the second support plate 222 through a concave plate, thereby improving the structural compactness of the device.

[0048] Through the above arrangement, since the transmission belt 84 is elastic, it can effectively reduce the impact and vibration load, so the noise generated is small, and the rotating shaft 3 can be driven smoothly and stably to rotate at a high speed.

[0049] In some embodiments, Figure 1 to Figure 3 As shown, the rotation limiting assembly 9 includes: a limiting strip 91, a concave block 92 and a connecting member 93, and its specific configuration is as follows: The limiting strip 91 is arranged horizontally and installed on the outer periphery of the bottom end of the protection tube 4; The top sides of the concave block 92 are provided with slots 921 adapted to the limiting strips 91; One end of the connecting member 93 is connected to the concave block 92, and the other end is connected to the load plate 1; it is preferably an integrally formed part with the concave block 92 and bolted to the load plate 1 to facilitate installation, thereby improving the assembly efficiency of the device, but is not limited to this.

[0050] When in use, the protection tube 4 is passed through the inner side of the concave block 92 , and the two ends of the limiting strip 91 are respectively engaged with a slot 921 .

[0051] Through the above arrangement, the protection tube 4 can be stably supported and rotationally restricted, and can be easily disassembled and assembled through the snap connection, thereby improving the assembly efficiency.

[0052] In some embodiments, Figure 1 and Figure 2 As shown, it also includes: A photoelectric sensor 12 is mounted on the load board 1; The light shielding sheet 13 is arranged horizontally, mounted on the rotating shaft 3 , and is located below the supporting tube 21 , and can pass through the sensing area of ​​the photoelectric sensor 12 .

[0053] Through the above-mentioned setting, the rotation speed of the rotating shaft 3 can be stably counted in real time, so as to timely understand the operating status of the equipment and facilitate automatic control.

[0054] In some embodiments, Figure 1 , Figure 3 and Figure 5 As shown, the upper and lower ends of the through-channel 31 are both provided with second annular grooves 311 , and the second bearing 14 is installed in the second annular groove 311 . The second bearing 14 is sleeved outside the protective tube 4 .

[0055] By providing a second bearing 14 as a connecting piece 93 between the rotating shaft 3 and the protective tube 4, it is ensured that the protective tube 4 is not affected by the high-speed rotation of the rotating shaft 3 while being firmly supported, thereby improving the running stability. By providing a second annular groove 311, an installation position is provided for the second bearing 14, thereby ensuring a stable installation and improving the compactness of the structure.

[0056] In some embodiments, Figure 1 and Figure 5 As shown, including: The support plate 15 is mounted on the top of the rotating shaft 3 and is movably sleeved outside the protection tube 4, and the top surface is connected to the bearing plate 7; The guide cover 16 is mounted on the top surface of the support plate 15 and is movably sleeved outside the spray nozzle 6. The top of the guide cover 16 has a truncated cone 161. The top surface of the truncated cone 161 has a plurality of concentrically nested lower ring plates 162. The outer periphery of the spray nozzle 6 is provided with a baffle ring 61 , and the bottom surface of the baffle ring 61 is provided with a plurality of concentrically nested upper ring plates 62 , and the upper ring plates 62 and the lower ring plates 162 are arranged alternately.

[0057] When in use, the cleaning liquid on the top surface of the supporting plate 7 falls onto the truncated cone 161 of the guide cover 16 through the movable through hole 71, then flows along the truncated cone 161 to the supporting plate 15 and is thrown out; wherein, due to the covering of the retaining ring 61 and the alternating blocking of 63 and the lower ring plate 162, the cleaning liquid cannot flow into the gap between the spray nozzle 6 and the guide cover 16.

[0058] The above arrangement achieves a sealing effect, preventing the cleaning fluid from flowing into the through channel 31, thereby ensuring the cleanliness and lubrication of the second bearing 14, improving the stability of long-term operation, and extending the service life.

[0059] In the description of the present invention, a large number of specific details are described. However, it is understood that embodiments of the present invention can be practiced without these specific details. In some instances, well-known methods, structures and techniques are not shown in detail so as not to obscure the understanding of this description.

[0060] In the description of this specification, the description with reference to the terms "one embodiment", "some embodiments", "example", "specific example" or "some examples" etc. means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described may be combined in any one or more embodiments or examples in a suitable manner. In addition, those skilled in the art may combine and combine the different embodiments or examples described in this specification and the features of the different embodiments or examples, unless they are contradictory.

[0061] Finally, it should be noted that the above embodiments are only used to illustrate the technical solutions of the present invention, rather than to limit it. Although the present invention has been described in detail with reference to the aforementioned embodiments, those skilled in the art should understand that they can still modify the technical solutions described in the aforementioned embodiments, or replace some or all of the technical features therein by equivalents. These modifications or replacements do not make the essence of the corresponding technical solutions deviate from the scope of the technical solutions of the embodiments of the present invention, and they should all be included in the scope of the claims and specification of the present invention.

Claims

1. A wafer bottom surface cleaning device, characterized in that: include: Load plate, arranged vertically; A support seat, mounted on one side of the load plate; A rotating shaft is arranged vertically and rotatably mounted on the supporting seat, and has a coaxially arranged through passage inside; A protective tube, passing through the through passage and rotatably cooperating with the rotating shaft, with both ends extending out from the rotating shaft; An infusion tube, inserted into the protection tube, with the bottom end extending out of the protection tube; A spray nozzle, installed at the top of the protection tube and connected with the infusion tube; The carrier plate is arranged horizontally and mounted on the top of the rotating shaft, and the top surface of the carrier plate is provided with a movable through hole adapted to the spray nozzle; A driving mechanism, mounted on the load plate and drivingly connected to the rotating shaft; A rotation limiting assembly is disposed on the load plate and connected to the lower end of the protection tube; A plurality of support blocks are mounted on the top surface of the carrier plate and arranged around the rotating shaft; A plurality of positioning posts are installed on the top surface of the carrier plate, arranged around the rotating shaft, and located at the periphery of the supporting block.

2. The wafer bottom surface cleaning device according to claim 1, characterized in that: The support base comprises: The support tube is arranged vertically and has first annular grooves at both upper and lower ends; A fixing frame, mounted on the load plate and connected to the support tube; A plurality of first bearings are disposed in the first annular groove in a one-to-one correspondence and sleeved outside the rotating shaft; A top cover, mounted on the top of the support tube and sleeved outside the rotating shaft; Wherein, a support ring is provided outside the rotating shaft, and the bottom of the support ring abuts against the first bearing.

3. The wafer bottom surface cleaning device according to claim 2, characterized in that: A guide cover is disposed outside the rotating shaft, and the guide cover is located above the top cover and covers the through opening of the top cover.

4. The wafer bottom surface cleaning device according to claim 2, characterized in that: The fixing frame comprises: A first support plate is horizontally mounted on the load plate and sleeved on the upper end of the support tube; A second support plate is horizontally mounted on the load plate and sleeved on the lower end of the support tube; Two reinforcing plates are arranged between the load plate and the second support plate and are respectively located on both sides of the support tube.

5. The wafer bottom surface cleaning device according to claim 4, characterized in that: The upper and lower ends of the support tube are respectively fixed with flanges, and the two flanges are respectively attached to the first support plate and the second support plate and connected with bolts.

6. The wafer bottom surface cleaning device according to claim 4, characterized in that: The driving mechanism comprises: A motor, mounted on the second support plate; A driving wheel, mounted on the driving shaft of the motor; A driven wheel is arranged below the support cylinder and fixedly sleeved outside the rotating shaft; The transmission belt is sleeved between the driving wheel and the driven wheel.

7. The wafer bottom surface cleaning device according to claim 1, characterized in that: The rotation limiting component comprises: A limit bar is arranged horizontally and installed on the outer periphery of the bottom end of the protection tube; The concave block has slots on both sides of the top that match the limit strips; A connecting piece, one end of which is connected to the concave block, and the other end of which is connected to the load plate.

8. The wafer bottom surface cleaning device according to claim 2, characterized in that: include: A photoelectric sensor is mounted on the load board; The light shielding sheet is arranged horizontally, installed on the rotating shaft, located below the supporting tube, and can pass through the sensing area of ​​the photoelectric sensor.

9. The wafer bottom surface cleaning device according to claim 2, characterized in that: The upper and lower ends of the through-channel are both provided with second annular grooves, a second bearing is installed in the second annular groove, and the second bearing is sleeved outside the protection tube.

10. The wafer bottom surface cleaning device according to claim 1, characterized in that: include: A support plate, mounted on the top of the rotating shaft and movably sleeved outside the protection tube, with a top surface connected to the bearing plate; A guide cover is installed on the top surface of the support plate and movably sleeved outside the spray nozzle, and has a truncated cone on the top, and the top surface of the truncated cone has a plurality of lower ring plates arranged concentrically and nested; The outer periphery of the spray nozzle is provided with a baffle ring, and the bottom surface of the baffle ring is provided with a plurality of concentrically nested upper ring plates, and the upper ring plates and the lower ring plates are arranged alternately.

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